U.S. patent number 3,929,532 [Application Number 05/489,393] was granted by the patent office on 1975-12-30 for method for etching apertured work piece.
This patent grant is currently assigned to RCA Corporation. Invention is credited to Henry William Kuzminski.
United States Patent |
3,929,532 |
Kuzminski |
December 30, 1975 |
Method for etching apertured work piece
Abstract
Method for etching an apertured work piece, such as a shadow
mask for a color television picture tube, comprises coating
opposite major surfaces of a thin metal sheet with etch-resistant
patterns. The pattern on one major surface comprises an array of
larger open areas surrounded by etch-resistant material, and the
pattern on the opposite major surface comprises smaller open areas
of similar shape and registered with the larger open areas on the
one major surface. Each of the smaller open areas has therein a
still-smaller solid area of etch-resistant material. The coated
sheet is then etched from both sides to produce the desired
apertures, and then the coatings are removed from the sheet.
Inventors: |
Kuzminski; Henry William
(Ephrata, PA) |
Assignee: |
RCA Corporation (New York,
NY)
|
Family
ID: |
23943671 |
Appl.
No.: |
05/489,393 |
Filed: |
July 17, 1974 |
Current U.S.
Class: |
216/12;
216/47 |
Current CPC
Class: |
H01J
9/142 (20130101); C23F 1/02 (20130101) |
Current International
Class: |
H01J
9/14 (20060101); B29C 017/08 () |
Field of
Search: |
;156/3,8,11,13,18
;96/36.1,36,38.3 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Drummond; Douglas J.
Assistant Examiner: Massie; Jerome W.
Attorney, Agent or Firm: Bruestle; G. H. Greenspan; L.
Claims
I claim:
1. A method for producing an array of tapered apertures in a thin
metal sheet comprising
a. coating opposite major surfaces of said sheet with
etch-resistant patterns, the pattern on one major surface
comprising an array of open areas surrounded by etch-resistant
material, and the pattern on the opposite major surface comprising
open areas of smaller shape but smaller than the open areas on said
one major surface and registered with said larger open areas, each
of said smaller open areas having therein a solid area of
etch-resistant material that is still smaller than said smaller
open area, each still-smaller solid area being continuous and
unbroken by open areas,
b. simultaneously etching both sides of said coated sheet until
said tapered apertures are produced in said sheet,
c. and then removing said etch-resistant patterns from both major
surfaces of said sheet.
2. The method defined in claim 1 wherein said still-smaller solid
area is, in at least one dimension thereof, at least 1.0-mil wide
and at least 2.0 mils smaller than said smaller open area.
3. The method defined in claim 2 wherein, in said one dimension,
said smaller open areas are about 6 to 10 mils wide and said
still-smaller solid area is about 2 to 3 mils wide.
4. The method defined in claim 1 wherein said larger open areas are
substantially circular areas about 12 to 20 mils in diameter, and
said smaller open areas are substantially circular areas about 6 to
10 mils in diameter.
5. The method defined in claim 4 wherein said still-smaller solid
areas are circular and concentrically placed within said smaller
open circular areas, said smaller open areas being about 2 mils in
diameter larger than said still-smaller solid areas.
6. The method defined in claim 1 wherein said larger open areas are
substantially rectangular areas about 12 to 20 mils wide and said
smaller open areas are substantially rectangular areas about 4 to
10 mils wide in the same dimension as said larger rectangular
areas.
7. The method defined in claim 6 wherein said smaller open areas
are about 2 mils wider than said still-smaller solid areas.
8. The method defined in claim 6 wherein the lengths of said
still-smaller solid areas are equal to the lengths of said smaller
open areas.
9. The method defined in claim 6 wherein the lengths of said
still-smaller solid areas are ar least 2 mils shorter than the
lengths of said smaller open areas.
Description
BACKGROUND OF THE INVENTION
This invention relates to a novel method for etching an apertured
work piece and particularly for etching the apertures in a shadow
mask for a color television picture tube.
A shadow-mask-type color television picture tube includes a
color-selection electrode closely spaced within the tube from a
viewing-screen structure. The electrode is in the form of a
perforate or apertured mask which shadows portions of the viewing
screen from the electron beams during the operation of the tube. In
order to reduce scattering of beam electrons off the sides of the
apertures, during electron-beam scanning, it is the practice to
taper the apertures, with the smaller-sized part of the taper
towards the electron-beam source and the larger-sized part of the
taper towards the screen structure. For practical reasons in the
fabrication process, the narrowest part of each aperture is a
"knife edge" which is located a short distance in from the mask
surface. The short distance is referred to as the "step height" of
the knife edge.
In U.S. Pat. Nos. 2,750,524 to F. G. Braham and 3,679,500 to N.
Kubo et al., there are described methods for etching the mask
apertures for a color-selection electrode in a manner which results
in a small step height. Both methods involve two separate etching
steps and two separate resistcoating steps.
SUMMARY OF THE INVENTION
The novel method for producing an array of tapered apertures in a
metal sheet comprises coating opposite major surfaces of the sheet
with etch-resistant patterns, the one pattern on the one major
surface comprising larger open areas surrounded by etch-resistant
material, and the other pattern on the opposite major surface of
the sheet comprising similarly-shaped, but smaller, open areas
registered with the larger areas on the one side. Each of the
smaller open areas has therein a still-smaller solid area of
etch-resistant material. Preferably, the still-smaller solid area
is in at least one dimension thereof, at least 1.0 mil wide and at
least 2.0 mils smaller than the smaller open area. The both sides
of the coated sheet are etched simultaneously until the desired
tapered apertures are produced in the sheet. Then, the etching is
stopped, and the etch-resistant patterns are removed from both
major surfaces.
By employing the still-smaller solid areas of etch-resistant
material within the smaller open areas as described above, the step
height can be reduced and the uniformity of the knife edge can be
improved over prior processes. The use of the openings produced by
this combination of etch-resistant patterns permits etching to
occur from both surfaces of the sheet but controllably limits the
etching from the surface carrying the pattern with the smaller open
areas. The novel method requires only a single coating step and a
single etching step to achieve what is achieved in two steps with
the above-cited prior-art methods.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a plan view of a metal sheet after etching according to
the novel method.
FIGS. 2 through 6 are sectional views through one aperture of a
metal sheet illustrating the steps of one embodiment of the novel
method.
FIG. 7 is superimposed plan views of the etch-resistant patterns
for one element of a master plate for producing circular apertures
according to one embodiment of the invention.
FIG. 8 is superimposed plan views of the etch-resistant patterns
for one element of a master plate for producing slit apertures
according to another embodiment of the invention.
FIG. 9 is superimposed plan views of the etch-resistant patterns
for one element of a master plate for producing slit apertures
according to still another embodiment of the invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
FIG. 1 shows a plan view of an etched apertured mask blank 21 as it
emerges from the etching machine. The mask blank 21 (which is to be
used in a color television picture tube) is in a metal sheet 23
comprising a succession of such mask blanks 21a, 21, and 21b which
are etched through at the margins 25 thereof except at convenient
points (not indicated) sufficient to hold the mask blank 21 in
place in the sheet 23. The mask blank 21 is comprised of an
apertured central portion 27 defined by the broken line 28; and a
skirt or peripheral portion 29 which is not apertured, although in
some embodiments it may be etched partly through. This application
is particularly concerned with etching the apertures in the
apertured central portion 27. The apertures may be round and
arranged in a hexagonal, diamond-shaped or other array. Or, the
apertures may be rectangular slits arranged in vertical rows; for
example, 6-mil by 30-mil slits on 30-mil centers. The apertures may
be of other shapes and arrangements. In any of the embodiments, the
width may be uniform or may be graded in width or diameter from the
center to the edge of the array as is known in the art.
The mask blank 21 is etched into a regular-carbon or low-carbon
cold-rolled-steel sheet about 4 to 10 mils in thickness. The
etching may also be conducted in sheets of other materials, such as
invar alloy, or a copper-nickel alloy. The sheet 23 is unwound from
a first roll thereof, passed through the various operations
including cleaning, coating, drying, exposing, developing, etching,
washing and drying (as will be described below), then rewound on a
second roll. Subsequently, the second roll is unwound and the mask
blanks 21 are stripped or torn from the sheet 23. The mask blanks
21 are then heat treated (annealed), roller leveled, formed on a
press, and then blackened as is known in the art, to produce masks
suitable for assembly into a picture tube.
FIGS. 2 through 6 show a sequence of steps that may be used in
making a round aperture in the central portion 27 of a hexagonal
array of apertures in a 6-mil-thick strip of cold-rolled steel, as
shown in FIG. 1. The sheet 23 is coated on both major surfaces with
suitable light-sensitive coatings 31 and 33 of etch-resistant
materials, such as dichromate-sensitized fish glue, as shown in
FIG. 2. After the coatings have dried, the coated strip is
positioned in a chase, such as is shown in U.S. Pat. No. 3,751,250
to J. J. Moscony et al., between two light-opaque master patterns;
one master pattern 35 for the coating 31 on the one major surface
of the sheet 23; and the other master pattern 37 for the other
coating 23 on the other major surface of the sheet 23, as shown in
FIG. 3. The light-opaque patterns may be of chromium or nickel
metal coated on the inner surfaces of glass plates 39 and 41
respectively so that the patterns are physically against the
coatings 31 and 33. The one master pattern is annular or ring
shaped about 5-mils outside diameter and 3-mils inside diameter.
The other master pattern 37 is disc or solid circular shaped about
16 mils in diameter. Center lines of the one and the other master
patterns are coincident, but may be offset from one another if
desired.
As shown in FIG. 3, the coatings 31 and 33 on the one and the other
surfaces of the sheet 23 are now exposed to hardening radiation
(shown by the arrows above and below the glass plates 39 and 41),
as from a carbon-arc source, which radiation passes through the
glass plates 39 and 41 incident on the coatings 31 and 33. The
radiation insolubilizes the coatings 31 and 33 except where the one
and the other master patterns 35 and 37 shadow the coatings. When
the coatings are suitably exposed, the exposure is stopped, and the
master patterns removed.
The coatings are now developed as by flushing with water or other
aqueous solvent to remove the unexposed, shadowed portions of the
coatings 31 and 33. As shown in FIG. 4, after development, the
sheet 23 carries on its one surface an etch-resistant coating
having an annular opening 43 therein and, on its other major
surface, an etch-resistant coating 33 having a circular or
disc-shaped opening 45 therein.
The sheet 23 with the etch-resistant coatings thereon is now etched
in a single step to produce the desired tapered aperture. FIGS. 5
and 6 show the coated sheet 23 at an early stage (FIG. 5) and then
at the end of etching (FIG. 6). The etching is conducted in the
usual manner employing a ferric chloride-hydrochloric acid liquid
etchant. At the initial stage shown in FIG. 5, the etchant has
dissolved a small amount of the surfaces of the sheet 23 in the
uncoated areas thereof. FIG. 5 also shows, by dotted lines, various
subsequent etching surfaces that the etchant is believed to advance
to.
The use of an annular opening 43 instead of a disc-shaped opening
on the one major surface severly restricts the effective etching
from that surface to defining the aperture shape, thereby imparting
only a small step height 47, as shown in FIG. 6. If the annular
opening 43 were replaced with a disc-shaped opening, the step
height would be substantially greater. The coatings 31 and 33 on
the one and the other surfaces of the sheet 23 are removed from the
strip after the etching has been completed, and the work piece is
ready for further processing.
FIG. 7 shows, superimposed upon one another, the one and the other
master patterns in the working plates in plan view. The significant
dimensions of the annular openings of the one master pattern are
the inside diameter 53, the outside diameter 55, and the width 59
of the annular opening, which is one half the difference between
the inside diameter and the outside diameter. In practical
embodiments, the inside diameter 53 of the annular area should be
about 1.0 to 8.0 mils, and the outside diameter 55 should be about
3 to 10 mils. Preferably, the difference between the inside and
outside diameter is at least 2.0 mils so that the width 59 of the
annulus is at least 1.0 mil. The significant dimension for the
circular opening of the other master pattern is the diameter 57,
which may be, in practical embodiments, about 12 to 20 mils. Where
the apertures are graded in size from the center to the edge of the
apertured portion 27, the diameters of the annular openings are
graded. In a typical case, the outside diameter of the annular
opening 35 may grade from about 9.5 mils at the center of the mask
to about 7.5 mils at the edge of the apertured portion 27 of the
mask. The inner diameter of the annular opening 53 may also be
graded, but the width 59 is preferably at least 1.0 mil using
present state-of-the-art etch-resistant patterns. As the width 59
decreases, the step height decreases to a minimum of about 1.0 mil
and then increases. In this embodiment, the diameter 57 of the
circular area on the reverse side is about 16 mils but is not
critical and may be between 12 and 24 mils. Where the apertures are
graded in size, the larger circular areas may or may not be graded
in size. A typical center-to-center aperture spacing is about 25
mils.
The invention may be applied to producing rectangular slit
apertures, as shown for the superimposed master patterns shown in
FIG. 8. The one master pattern 35' (solid lines) and the other
master pattern 37' (dotted line) are shown in the shape of
rectangles with rounded corners. For the one master pattern 35',
the outside width 65 is about 5 mils and the outside length is
about 30 mils in one embodiment. The inside width 63 is about 2
mils and the inside length is about 27 mils. In other embodiments
of the one master pattern, the inside width 65 may vary from 1 to
10 mils and the outside width may vary from 3 to 20 mils. However,
the difference between the inside width and the outside width is
preferably at least 2 mils so the width of the annular spacing 69
and 61 is at least 1 mil. The other master pattern 37' may vary
between 12 and 24 mils in width and between 20 and 50 mils in
length. However, each of the length and width dimensions of the
other master patterns should be larger than the corresponding
dimension of the one master pattern.
FIG. 9 shows still another embodiment of the invention as an array
of rectangular slits. The slit aperture master pattern shown in
FIG. 9 differs from that of FIG. 8 in that, in the one master
pattern 35", the length of the still-smaller solid area is equal to
the length of the smaller open area. For practical reasons, it has
been found that annular spacing 61 of the one master pattern of
FIG. 8 may be omitted and substantially equivalent results may be
obtained to those obtained with the master patterns shown in FIG.
8. Thus, in the slit aperture embodiment shown by the master
patterns in FIG. 9, it is necessary in only one dimension of the
one master pattern that the still-smaller solid area is at least
2.0 mils smaller than the smaller open area. This requirement is
satisfied by the horizontal pattern and dimensions shown in FIG.
9.
* * * * *