U.S. patent number 3,893,749 [Application Number 05/409,160] was granted by the patent office on 1975-07-08 for process for the determination of an assembly having isotropic oblique reflection in an extensive spectral region and assemblies obtained by this process.
This patent grant is currently assigned to Societe d'Optique, Precision Electronique et Mechanique - Sopelem. Invention is credited to Michael Ferray.
United States Patent |
3,893,749 |
Ferray |
July 8, 1975 |
Process for the determination of an assembly having isotropic
oblique reflection in an extensive spectral region and assemblies
obtained by this process
Abstract
A reflecting assembly for polarized white light includes at
least one mir associated with a birefringent compensator preventing
the reflected light from having a large phase anisotropy. The
mirror or mirrors are metallic and covered with a protective silica
layer having a geometric thickness of from 0 to about 400A. The
birefringent compensator is a crystalline plate of predetermined
thickness depending upon the thickness of the protective layer.
Known compensators may be used in place of the birefringent
plate.
Inventors: |
Ferray; Michael
(Chevilly-Larue, FR) |
Assignee: |
Societe d'Optique, Precision
Electronique et Mechanique - Sopelem (Paris,
FR)
|
Family
ID: |
9107383 |
Appl.
No.: |
05/409,160 |
Filed: |
October 24, 1973 |
Foreign Application Priority Data
|
|
|
|
|
Nov 20, 1972 [FR] |
|
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72.41106 |
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Current U.S.
Class: |
359/489.05;
359/585 |
Current CPC
Class: |
G02B
5/08 (20130101); G02B 5/3083 (20130101) |
Current International
Class: |
G02B
5/08 (20060101); G02B 5/30 (20060101); G02b
005/30 () |
Field of
Search: |
;350/147,157,159 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Smith; Alfred E.
Assistant Examiner: Tokar; Michael J.
Attorney, Agent or Firm: Cameron, Kerkam, Sutton, Stowell
& Stowell
Claims
I claim:
1. Optical assembly for the oblique reflection of a beam of
polarized light covering a wide spectrum of wave lengths comprising
a plane metallic mirror, a protective layer of transparent
dielectric on said mirror having an optical thickness of between 0
and 600A, the beam of light impinging on and being reflected by the
mirror and protective layer and crystalline birefringent
compensating means receiving the reflected light having
birefringent compensation equivalent to that of a crystalline plate
having a thickness for which the anisotropy of phases created by
said means compensates exactly for the anisotrophy of phases
created by said mirror for the means wave length of the spectrum of
the beam of light.
2. Method of compensating for the anisotrophy of phases created by
the reflection of a polarized beam of light covering a wide
spectrum of wave lengths by a plane metallic mirror protected by a
layer of transparent dielectric having a thickness of 0 to 600A,
the steps of directing the reflected beam of light through a
birefringent compensating crystalline plate, adjusting the
thickness of the plate whereby the anisotrophy of phases created by
the plate compensates for the anisotrophy of phases created by the
mirror for the mean wave length of the spectrum of the beam of
light, determining the adjusted thickness of the plate by measuring
the anisotrophy of phases created by the mirror as a function of
wave length, preparing a set of curves of the variation of the
anisotrophy of phases of the birefringent plate as a function of
the wave length and for a series of thicknesses for the plate and
then finding the thickness of the plate from the curve providing
exact compensation for the mean wave length of the spectrum.
3. Method of compensating for the anisotrophy of phases created by
the reflection of a polarized beam of light covering a wide
spectrum of wave lengths by a plane metallic mirror protected by a
layer of transparent dielectric having a thickness of 0 to 600A,
the steps of directing the reflected beam of light through a
birefringent compensating crystalline plate, adjusting the
thickness of the protective layer as a function of the thickness of
the plate whereby the anisotrophy of phases created by the mirror
compensates for anisotrophy of phases created by the plate for the
mean wave length of the spectrum of the beam light, determining the
adjusted thickness of the layer by measuring the variation of the
anisotrophy of phases of the plate as a function of wave length,
preparing a set of curves of the variation of anisotrophy of phases
for the mirror as a function of wave length and for a series of
thicknesses of the layer and then finding the thickness of the
layer from the curve providing exact compensation for the mean wave
length of the spectrum.
4. An optical assembly as described in claim 1 for reflection at an
angle of incidence of 45.degree. of white polarized light, the
mirror being bare aluminum and the plate being a quartz plate
having a thickness of 2.2.mu..
5. An optical assembly as described in claim 4, for the reflection
at an angle of incidence of 45.degree. of white polarized light,
the mirror being bare aluminum and the birefringent compensating
means being a birefringent compensator.
6. An optical assembly as described in claim 1 for the reflection
at an angle of incidence of 45.degree. of polarized white light,
the mirror being bare aluminum and the plate being a magnesium
fluoride plate having a thickness of 1.7.mu..
7. An optical assembly as described in claim 1 for the reflection
at an angle of incidence 45.degree. of white polarized light, the
mirror being bare aluminum and the birefringent compensating means
being a birefringent compensator.
Description
The present invention relates to a process for the determination of
a reflecting assembly which does not affect the state of
polarization of an oblique incident wave, in an extensive spectral
region. It likewise relates to the assemblies having isotropic
oblique reflection thus obtained.
The invention applies in particular to all instruments using
polarized light when it is necessary to bend the beam for reasons
of space. This is particularly the case in modern optical
microscopes using polarized light, in which it is an advantage to
introduce auxiliary systems such as zoom or a pupillary relay
between the objective and the eye-piece, without increasing the
height of the instrument as a result. Up to now, it has been
impossible to bend the beam without disturbing the state of
polarization of the incident wave.
Actually, it is known that any oblique reflection of a polarized
wave on a metallic surface is anisotropic. This is due to the
inequality of the reflection coefficients corresponding to the
states of polarization parallel (polarization:p) and perpendicular
(polarization:s) to the plane of incidence. These coefficients
generally have a complex expression of the form re.sup.j.sup..phi.
and may differ either by their modulus r or by their phase .phi..
The inequality in the moduli leads to a rotation of the direction
of incident polarization which can easily be compensated by
rotation of the polarizer, while the inequality in the phases leads
to transforming a rectilinear incident vibration into an elliptical
reflected vibration. When these two inequalities coexist,
corresponding to a rectilinear incident vibration there is an
elliptical reflected vibration, the major axis of which does not
coincide with the direction of the incident polarization.
In practice, this anisotropy of phases is expressed by two
impossiblities:
IMPOSSIBILITY OF OBTAINING AN EXTINCTION BETWEEN CROSSED POLARIZERS
PLACED ONE AT EACH SIDE OF A MIRROR AND HAVING ANY ORIENTATION;
IMPOSSIBILITY OF MEASURING, BY COMPENSATION, THE BIREFRINGENCE OF
AN OBJECT PLACED IN FRONT OF A MIRROR.
Various partial solutions to this problem are known. For example,
it is possible to compensate a first mirror by a second, identical
to the first, on condition that their planes of incidence are
perpendicular. The vibration parallel to the plane of incidence of
the first becomes perpendicular to that of the second, and vice
versa; this solution, proposed by CAPDECOMME, has the disadvantage
of complicating the optical arrangement considerably and is not
always compatible with the available space.
It is also possible to dispose, between two mirrors working under
the same conditions, a half-wave crystal plate orientated in such a
manner that it permutes the vibrations parallel and perpendicular
to the plane of incidence. In this case, however, the compensation
is only effective for the wavelength for which the plate is
half-wave, hence the impossibility of working with complex light
and more particularly with white light. In any case, this solution,
like previous one, has the disadvantage of having recourse to two
mirrors or at least to an even number of mirrors.
Nor does a total-reflecting prism constitute a solution; it does
not have any anisotropy of amplitude but the anisotropy of phase is
considerable (about 51.degree. for a glass of incidence 1.6) and
substantially constant in the visible spectrum.
It is also known to compensate, for a given wavelength, the
anisotropy of phase of any mirror or of a total-reflecting prism,
by a birefringent compensator; but this compensation is not valid
in an extensive spectral region and in particular in white light.
This is the case, in particular, with the conventional aluminium
mirrors which are protected by a coating of silica having a
thickness of the order of 1000 A.
FIG. 1 is a table of the values in degrees of the anisotropy of
phase for an aluminum mirror coated with silica having a thickness
of about 1000A;
FIG. 2 is a table of values of the coefficients of the index of
aluminum and silver;
FIG. 3 is a series of curves showing in full line curves of the
differences in phase depending on wave length for an aluminum
mirror receiving a beam of polarized white light at an incidence of
45.degree. corresponding to thicknesses of the protective layer
from 0 to 1020A and in broken lines curves relating to quartz
plates of various thickness;
FIG. 4 is a table of values for a bare aluminum mirror showing
anisotropy of phase, the anisotrophy of phase in degrees introduced
by a quartz plate and the residue of compensation;
FIG. 5 is a series of curves over the visible spectrum of the value
in degrees of the residue of compensation for a bare aluminum
mirror;
FIG. 6 is a table of values similar to FIG. 4 for a bare silver
mirror;
FIG. 7 is a table of values for an aluminum mirror covered with a
protective layer of silica 150A thick;
FIG. 8 is a diagrammatic showing of polarized light reflected from
a mirror and passing through a crystalline birefringent plate;
and
FIG. 9 is a showing similar to that of FIG. 8 in which the
crystalline birefringent plate is replaced by an equivalent
compensator.
The table of FIG. 1 gives, in its first line, the values in degrees
of the anisotropy of phase introduced by such a mirror for an
incidence of 45.degree. and for the whole of the visible spectrum.
In order to retain zero anisotropy in the middle of the spectrum,
it would be necessary to use a 60-micron-wave quartz plate which
produces a birefringence of 360.degree. for this wavelength. The
second line of the table indicates, in degrees, the anisotropy of
phase introduced by this quartz plate depending on the wavelengths
of the spectrum. The third line of the table gives the compensation
residue, that is to say the difference in phase existing after
reflection of the beam of the mirror and passage through the quartz
plate. It will be seen that in fact here the birefringent
compensator only provides real compensation in a very narrow zone
about the middle of the spectrum; on the contrary, it increases the
defect as soon as there is a very slight movement away from this
median wavelength. It would be the same if a precise correction
were aimed at on another wavelength.
The object of the present invention is to permit the constitution
of an assembly associating a birefringent compensator with one or
more mirrors, so that this assembly can be used in polarized light
in an extensive spectral region. The invention relates to a process
for the determination of the characteristics of the elements of
this assembly and likewise relates to the assemblies thus
constituted.
The invention applies to an assembly consisting of at least one
metallic mirror, which may or may not be covered with a thin layer
of transparent dielectric, with which there is associated a
crystalline compensator device equivalent to a thin plate.
According to the invention, for a given incidence, the thickness of
the dielectric layer of the mirror or mirrors and the thickness of
the compensating crystal plate are determined depending on one
another, working out by calculation:
on the one hand the variation in the difference in the complex
coefficient phases of reflection on the mirror or mirrors, relating
to the polarization parallel to and to the polarization
perpendicular to the plane of incidence, and this for different
thickness of the dielectric, depending on the wavelength, in the
spectral region under consideration,
on the other hand the variation, depending on the same wavelengths,
in the difference in the phases, relating to these two directions
of polarization, introduced by the passage through the crystal
plate, for different thicknesses of the plate,
finally the variation, depending on the same wavelengths, in the
residue of compensation for the differences in phase for each
assembly associating in pairs a thickness of crystal plate and a
thickness of mirror dielectric, in such a manner that the
respective differences in phase are equal in absolute value and of
opposite sign for the median wavelength of the spectral region
under consideration,
the final selection of the pair of thicknesses being made taking
into consideration the minimum thickness of dielectric compatible
with the mechanical behaviour of the mirror when this factor is
determinant, or taking into consideration the maximum permissible
residue of compensation when the use of the mirror allows the
corresponding thicknesses of dielectric to be accepted.
The invention will now be described in more detail and will be
illustrated by four specific examples of embodiment.
First of all, it may be recalled that for a metallic mirror
protected by a layer of dielectric, the reflection coefficient
corresponding to a state of polarization p or s is expressed by the
formula: ##EQU1## in which: r, (rp or rs) is the modulus of the
complex reflection coefficient for the polarization p or s.
.phi. (.phi. p or .phi. s) is the phase of the complex reflection
coefficient for the polarization p or s.
r1, (r1p or r1s) is the real reflection coefficient air-layer for
the polarization p or s,
r2, (r.sub.2p or r.sub.2s) is the modulus of the complex reflection
coefficient metal-layer for the polarization p or s.
.alpha. (.alpha.p or .alpha.s) is the phase of the complex
reflection coefficient metal-layer for the polarization p or s.
.beta. = 4 .pi.(d/.lambda.)n1 cos i1
with
.lambda. = wavelength
d = thickness of the layer
On the other hand it is known that ##EQU2## with i0 = angle of
incidence
i1 = angle of refraction in the layer
i2 = complex angle of refraction in the metal
These angles being connected by the relationships
n0 sin i0 = n1 sin i1 = n2 sin i2
in which
n0 = (real) index of the air
n1 = (real) index in the layer
n2 = (complex) index in the metal = n - jk
It should be noted that the complex index n - jk in a metal such as
aluminium or silver is not an absolutely constant data but may vary
very substantially depending on the method of producing the
metallic layer. For the examples given below, the coefficients of
the index of aluminium and of silver had the values given in the
table of FIG. 2.
Knowing the angle of incidence i0 and the optical characteristics
of the metal and of the layer, it is therefore possible, for a
given thickness of layer and a given wavelength, to obtain the
phase .phi.p and the phase .phi.s corresponding to the states of
polarization p and s, and to deduce therefrom the difference in
phases .phi.p - .phi.s introduced by the reflection on the mirror.
It is thus possible to prepare a network of curves giving the
differences in phase depending on different wavelengths of the
spectral region under consideration, and for various thicknesses of
layer.
The graph of FIG. 3 gives, in full lines, such a network of curves
relating to an aluminium mirror receiving a beam of polarized white
light at an incidence of 45.degree.. The various curves correspond
to various thickness of the protective layer of silica, varying
from 0 (bare mirror) to 1020 A, this last thickness corresponding
to conventional practice for such protected mirrors.
On the other hand, it may be recalled that the anisotropy of phase
introduced by a crystal plate is expressed by the formula: ##EQU3##
in which: D is the thickness of the crystal plate, is the
wavelength of the light,
N.sub.e is the extraordinary index of the crystal,
N.sub.o is the ordinary index of the crystal.
If, in the first instance, the spectral variation in the difference
in the indices of the crystal is ignored, it will be seen that the
anisotropy of phase varies substantially as the inverse of the
wavelength, and for each thickness of crystal, the curve of the
anisotropy of phase depending on the wavelength has a hyperbolic
shape.
The graph of FIG. 3 gives, in broken lines, a network of curves
relating to quartz plates of various thickness.
It will be seen first of all in the graph of FIG. 3 that in order
to obtain a compensation for anisotropy of phase which is valid
throughout the spectral region under consideration, by the
association of a mirror and a crystal plate, it is necessary for
the curves of difference in phase relating to the mirror and the
plate to be as symmetrical as possible in relation to the axis of
the abscissae. If the thickness of the silica deposited on the
mirror exceeds 400 A, or more generally if the optical thickness
(product of the geometrical thickness by the index) exceeds 600 A,
the curve relating to the mirror assumes such a shape that the
compensation cannot be effected over the whole of the visible
spectrum. This is what was already seen above for a conventional
aluminium mirror covered with a layer of 1020 A of silica.
The examples which will now be given will enable the mode of
determination of the association of a mirror 10, silica coating 11
and a crystal plate 12 as generally indicated in FIG. 8 with a view
to obtaining the improved correction of the anisotropy of phase to
be better understood, bearing in mind the mechanical strength
requirements of the mirrors.
EXAMPLE 1
A bare aluminium mirror is used, that is to say not covered with
dielectric. The table in FIG. 4 gives, in its first line, the
values in degrees of the anisotropy of phase introduced by the
mirror under an incidence of 45.degree., for the whole of the
visible spectrum. The thickness of the quartz plate which brings a
precise correction for the median wavelength of the visible
spectrum, namely about 5500 A will then be sought. The second line
of the table indicates in degrees the anisotropy of phase
introduced by this quartz plate 2.17 microns thick, and the third
line of the table gives the residue of compensation, that is to say
the difference in phase existing after reflection of the beam on
the mirror and passage through the quartz plate.
It will be seen that this residue of compensation remains
particularly low over the whole extent of the visible spectrum. In
fact the maximum defect is only 0.86.degree., in the extreme red,
which corresponds to an optical path of .lambda./420.
The residue of compensation varies with the angle of incidence, but
it may be noted that it always remains small. The graph of FIG. 5
gives, over the extent of the visible spectrum, the values in
degrees of this residue of compensation for this same bare
aluminium mirror compensated by a quartz plate of 2.17 microns, and
for incidences from 22.degree.30' to 60.degree..
The compensation is all the better, the less the difference between
the indices of the crystal varies depending on the wavelength. It
is for this reason that magnesium fluoride is even more suitable
than quartz, and the last two lines of the table in FIG. 4 give on
the one hand the anisotropy of phase introduced by a magnesium
fluoride plate 1.68 microns thick, which precisely corrects the
bare aluminium mirror for the median wavelength of the spectrum,
and on the other hand the residue of compensation. It will be seen
that here it is even less than in the case of quartz.
There is no doubt that the use of a bare aluminium mirror is
difficult and necessitates special precautions, particularly at the
moment when the mirror is mounted in its mount and at the moment
when it is cleaned.
EXAMPLE 2
This example is illustrated by the table of FIG. 6 and relates to a
bare silver mirror, without dielectric protection. As for the
previous example, the thickness D = 3.92 microns of the quartz
plate was determined in such a manner as to ensure precise
compensation for the median wavelength of the spectrum. The third
line of the table gives, in degrees, the residues of compensation.
Here it will be seen that aluminium might be preferred to silver
for the mirror because the residues of compensation are ultimately
greater than in the previous example of a bare aluminium
mirror.
EXAMPLE 3
This example is illustrated by the first part of the table of FIG.
7 and relates to an aluminium mirror covered with a protective
layer of silica 150 A thick, which corresponds to an optical
thickness of 220 A; it gives the residues of compensation here
resulting from its associated with a quartz plate 3.39 microns
thick. It will be seen that the residues of compensation are higher
than in Example 1 but still remain broadly acceptable for numerous
application.
EXAMPLE 4
This example is illustrated by the second part of the table of FIG.
7 and gives, under the same conditions as before, the residue of
compensation resulting from the association of an aluminium mirror
covered with 300 A of silica (optical thickness 440 A) with a
quartz plate 4.45 microns thick.
Thus it will be seen that the residues of compensation increase at
the same time as the thickness of the protective layer of silica is
increased. The final selection will therefore be made depending on
the preponderant requirements in the intended application. If an
attempt is made to minimize the residual anisotropy of phase in the
mirror and compensating plate assembly it would be necessary to
accept limitation of the protective dielectric layer to very low
values, even to use a bare mirror, which necessitates special
conditions for mounting the mirror in the instrument. On the other
hand, if it is the mechanical strength of the mirror which is the
preponderant element, the minimum thickness of dielectric to be
deposited would be fixed first, the thickness of the compensating
quartz plate would be determined, and the corresponding residues of
compensation could be deduced therefrom.
Everything which has been described previously has been presented
in a detailed manner for greater clarity of the explanation. In
reality, all these calculations can be effected quickly and easily
by a computer.
Needless to say, the invention is not strictly limited to the
examples which have been described but likewise covers the
equivalent modes of embodiment. Thus, instead of crystal plates,
when their thickness is impracticable, recourse may be had to a
suitably adjusted compensator, for example of the Babinet Soleil
type as generally indicated at 13 in FIG. 9. Similarly, although
the examples described relate to the correction of a single mirror,
it is likewise possible to compensate a plurality of mirrors by
means of a single plate; in this case the thickness of the
compensating crystal plate would be multiplied by the number of
mirrors, as would the residue of compensation.
* * * * *