U.S. patent number 3,885,157 [Application Number 05/424,159] was granted by the patent office on 1975-05-20 for electron beam image processing device.
This patent grant is currently assigned to Electron Optical Research and Technology Corporation. Invention is credited to Klaus Heinemann.
United States Patent |
3,885,157 |
Heinemann |
May 20, 1975 |
Electron beam image processing device
Abstract
A device containing and providing selection between a plurality
of electron beam processing units is located in the vacuum chamber
of a microscope, so that the latter can be used in a wide variety
of applications without breaking the vacuum.
Inventors: |
Heinemann; Klaus (Sunnyvale,
CA) |
Assignee: |
Electron Optical Research and
Technology Corporation (Fremont, CA)
|
Family
ID: |
23681691 |
Appl.
No.: |
05/424,159 |
Filed: |
December 12, 1973 |
Current U.S.
Class: |
250/311;
250/440.11 |
Current CPC
Class: |
H01J
37/22 (20130101); H01J 37/244 (20130101); H01J
2237/24507 (20130101); H01J 2237/2444 (20130101) |
Current International
Class: |
H01J
37/22 (20060101); H01J 37/244 (20060101); G01n
021/26 (); G01n 023/12 () |
Field of
Search: |
;250/311,439,440,442,444,457,491 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
Primary Examiner: Chatmon, Jr.; Saxfield
Attorney, Agent or Firm: Botsford; Charles L.
Claims
I claim:
1. Device for analysis of corpuscular rays, such as an electron
beam after the beam has left the specimen stage of a transmission
electron microscope, the device comprising:
a chamber having walls enclosing a space relatively devoid of
matter, a portion of the chamber adapted to admit incoming
corpuscular rays, such as an electron beam;
a plurality of spaced electron-beam processing units located within
the chamber, the units comprising:
a first processing unit comprising:
a phosphor screen having a relatively small hole extending through
a portion thereof; and,
a single channel electron multiplier aligned with the hole, with
the screen located in front of the multiplier relative to an
incoming electron beam;
a second processing unit comprising:
a plurality of spaced multichannel electron multipliers; and
a phosphor screen, with the multipliers located in front of the
screen relative to an incoming electron beam;
a third processing unit comprising a phosphor screen:
means for selecting a processing unit and aligning said unit with
an electron beam in the chamber; and
means for selectively applying voltage potentials to a selected
processing unit.
2. Device of claim 1 wherein said means for selecting and aligning
a processing unit comprises a moveable platform within which said
processing units are mounted, and a lever mechanically coupled to
the platform and extending outside the chamber.
3. Device of claim 2 wherein the lever is mechanically coupled by a
gear mechanism, and the platform has longitudinal movement.
4. Device of claim 1 wherein said chamber is a portion of an
electron microscope.
5. Device of claim 2 wherein the moveable platform comprises a
rotatable turntable.
6. Device of claim 1 wherein said voltage potential applying means
comprises a plurality of spaced electrical leads electrically
coupled between an external power source and electrical terminals
of processing units within the chamber.
7. Device of claim 1 further defined by a portion of one wall of
the chamber comprising transparent material, so that an image
produced by an electron-beam processing unit can be viewed external
to the chamber.
8. Device of claim 1 further defined by a deflection means located
along a portion of the chamber adapted to admit incoming electron
beams, and means for selectively applying voltage potentials to the
deflection means.
9. Device of claim 8 wherein the deflection means comprises a
plurality of spaced coils.
10. Device of claim 8 wherein the deflection means comprises a
plurality of spaced conductive plates.
11. Device of claim 8 wherein the voltage potential applying means
comprises spaced leads electrically coupled between an external
power source and electrical terminals of the deflection means.
12. Device of claim 11 further defined by a multiposition switch
located outside the chamber, and having output terminals
electrically coupled to the electrical leads, so that when
potentials of different magnitudes are applied to the input
terminals of the switch, the position of the switch controls the
potential applied to the deflection means.
13. Device of claim 12 further defined by a timer coupled to the
switch to move periodically the switch through each of its
positions.
14. Method of selecting between electron beam processing units for
use in an electron microscope without breaking the vacuum in the
chamber thereof, the steps comprising:
modifying a portion of the microscope chamber;
mounting a plurality of electron beam processing units onto a
movable platform having a lever mechanically coupled thereto;
inserting a movable platform into the modified portion of the
chamber so that the lever extends outside the chamber; and,
moving the lever so as to align a processing unit with an incoming
electron beam.
15. An electron image processing device for use in an electron beam
instrument, the device comprising:
a microdensitometer unit;
an image intensifier unit;
a transmission phosphor screen unit; and,
a moveable platform within which each of the units is mounted and
spaced apart.
16. Device of claim 15 wherein the microdensitometer unit
comprises:
a phosphor screen having a relatively small hole extending through
a portion thereof; and,
a single channel electron multiplier aligned with the hole, with
the screen located in front of the multiplier relative to an
incoming electron beam.
17. Device of claim 15 wherein the image intensifier unit
comprises:
a plurality of spaced multichannel electron multipliers; and,
a phosphor screen, with the multipliers located in front of the
screen relative to an incoming electron beam.
18. A microdensitometer device comprising:
a phosphor screen having a relatively small hole extending through
a portion thereof; and,
a single channel electron multiplier aligned with the hole, with
the screen located in front of the multiplier relative to an
incoming electron beam.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to a device for a method of multiple
analysis of corpuscular rays, such as electron beams. In
particular, this invention relates to a device containing, and
providing selection between, a plurality of electron beam
processing units for use in transmission electron microscopy.
2. Description of the Prior Art
Transmission electron microscopy enables visual examination to be
made of structures too fine to be resolved with ordinary, or light,
microscopes, and thus has become an essential research tool in such
fields as biology, chemistry and metallurgy.
Briefly, the transmission electron microscope comprises a "light"
source supplying a beam of electrons of uniform velocity, a
condenser lens for concentrating the electrons on a specimen, a
specimen stage for displacing the specimen which transmits the
electron beam, an objective lens, several projector lenses, and a
fluorescent screen that receives electrons and emits corresponding
light rays to provide an image. Electrons are strongly scattered by
all forms of matter including air, so that the entire microscope is
evacuated to about 10.sup.-.sup.4 millimeters of mercury (that is,
10.sup.-.sup.7 atmospheric pressure).
In the prior art, several approaches have been used to process
electron beams after they leave the specimen stage of an electron
microscope. One, mentioned above, comprises a fluorescent screen
that receives electrons and produces a visual image. A fluorescent
screen projects a bright, usuable image provided that a large
number of incident electrons are available at the screen.
Another approach is used when the large number of electrons needed
at the fluorescent screen for a bright image would damage or
detrimentally affect a specimen located in an earlier stage of the
microscope. A low number of electrons are used at the specimen
stage, which are then increased after the specimen stage to a large
number by use of multi-channel electron multipliers located between
the specimen stage and the fluorescent screen. A multi-channel
electron multiplier functions to increase greatly the number of
electrons in a beam passing therethrough without distorting the
electron pattern. When the increased number of electrons reach the
fluorescent screen, a bright usuable image is produced. Use of a
low number of electrons at the specimen stage thus prevents damage
to the specimen, while use of the multiplier allows a bright image
to be obtained from the screen.
Still another approach is used when it is desirable to determine
the number of electrons per unit area in a beam, that is, the
electron density. An electron detector is placed before or after
the fluorescent screen, which indicates the density as an image is
produced by the screen.
As mentioned above, the chamber of the electron microscope is a
vacuum to avoid scattering of electrons. Keeping a vacuum in the
chamber makes it difficult to change easily an electron-beam
processing unit in the microscope. As a consequence, use of the
microscope is limited to applications compatible with the
processing unit already located therein. For other applications,
another microscope must be used, or else the vacuum in the first
microscope must be broken in order to change the processing unit,
and the chamber must then be re-evacuated. Either way is
undesirable. Therefore, a device and method are needed that allow
selection between various electron-beam processing units for use in
a single electron microscope, without affecting its vacuum.
SUMMARY OF THE INVENTION
The device containing, and method for selecting between, a
plurality of electron-beam processing units overcomes the
above-mentioned disadvantages of the prior art because, according
to the invention, a number of different processing units are
located in the chamber of a single microscope at the same time, and
selection is made between the units without affecting the vacuum in
the chamber. Briefly, the device of the invention comprises a
movable platform located in the chamber and a lever mechanically
coupled thereto, the lever extending outside the chamber. A
plurality of electron-beam processing units are mounted on the
movable platform and are selectively aligned by use of the lever. A
deflection apparatus is also provided so that the electron beam can
be selectively deflected at various angles.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a simplified cross-sectional view of a portion of the
chamber of an electron microscope modified to contain the movable
platform located therein, the lever mechanically coupled to the
platform and extending outside the chamber, and the plurality of
electron-beam processing units mounted on the platform.
FIG. 2 is a simplified two-dimensional top view of three
electron-beam processing units mounted on the platform within the
microscope chamber.
FIG. 3 is a simplified schematic drawing of circuitry for a switch
to control deflection of electron beams.
FIG. 4 is a simplified two dimensional top view of a portion of a
chamber of an electron microscope modified to contain an
alternative embodiment of the movable platform.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Referring to FIG. 1, the device for multiple analysis of
corpuscular rays, such as electron beams, comprises a chamber 1
having walls 2 enclosing space that is relatively devoid of matter,
such as a vacuum. Suitably, the space is evacuated to below
10.sup.-.sup.4 millimeters of mercury (10.sup.-.sup.7 atmospheric
pressure). The evacuated space avoids unwanted scattering of
electrons, which are caused by collisions between electrons and
particles including air in the atmosphere. Preferably, chamber 1 is
a portion of a microscope, such as a transmission electron
microscope, and is located after the specimen stage thereof. An
opening 3 is provided to allow an electron beam to enter chamber 1
from another portion of the microscope. Another opening 4 provides
for external viewing of a portion of the contents of chamber 1.
Suitably, opening 4 is covered by a transparent material 5, such as
glass or clear plastic, that allows retention of the vacuum seal in
chamber 1.
A movable platform, such as turntable 10, is located within chamber
1. Preferably, turntable 10 is mounted so as to provide rotational
movement about an axis. A lever 11 extends outside of chamber 1 and
is mechanically coupled to the turntable 10 by means of torus 12.
Lever 11 provides external control of the position of turntable 10
in chamber 1. Mounted on turntable 10 are a plurality of
electron-beam processing units. For example, one processing unit on
turntable 10 comprises a fluorescent screen 20 (shown in FIG. 2).
Fluorescent screen 20 functions in a manner similar to that of a
cathode ray tube, that is, screen 20 receives electrons on one side
and emits corresponding light rays from the other side thereof.
Screen 20 comprises a suitable fluorescent material well known in
the art and hereinafter is referred to as a phosphor screen.
Phosphor screen 20 is aligned between openings 3 and 4 of chamber 1
by use of lever 11, so that an electron beam entering opening 3
strikes one side of screen 20 and an image on the other side
thereof corresponding to the electron pattern is viewed through
opening 4. Phosphor screen 20 produces good images when the energy
of electrons in the beam is in the range of 50 to 200 kiloelectron
volts, and when the electron intensity is in the range of
10.sup.-.sup.8 to 10.sup.-.sup.11 amperes per square
centimeter.
Another example of an electron-beam processing unit located in
turntable 10 comprises a plurality of electron multipliers 30 and
31 located over a phosphor screen 32 (see FIGS. 1 and 2).
Preferably, each electron multiplier comprises an array of
cylindrical channels or tubes formed of an insulative material,
such as glass. A high resistive coating having secondary emissive
effects is located on the inside of each channel or tube. For
example, the coating resistance is about 1,000 megohms per square,
and the coating material comprises tin oxide or antimony oxide. The
diameter of each tube is relatively small compared to its length,
so that electrons entering the tube impinge upon the resistive
coating, causing secondary emission and multiplication of
electrons.
Preferably, the channels or tubes in multipliers 30 and 31 are
tilted at a small angle from the direction of the electron beam.
For example, the angle of tilt of the channels in multiplier 30 is
8.degree. in a clockwise direction from the path of the electron
beam, and the angle of tilt in multiplier 31 is about 8.degree.
counterclockwise from the electron beam path. The use of the
channels or tubes tilted at a small angle increases the number of
times electrons travelling therein collide with the high resistive
coating, and thereby increases the secondary emission effects.
The ends of the channels or tubes on one side of an array are
electrically connected to each other and to a lead, such as lead 35
for multiplier 30 (see FIG. 1). Suitably, lead 35 comprises a thin
metal strip or film of conductive material. The ends of the
channels or tubes on the other side of the array are electrically
connected to each other and to a lead, such as lead 36, for
multiplier 30. An accelerating field across the channels or tubes
can be provided by applying the proper voltages to leads 35 and 36.
Leads 37 and 38 provide electrical connections respectively to the
two sides of the array of channels or tubes of multiplier 31.
Electrical insulation between leads 36 and 37 is provided by a thin
insulation material 39, such as mylar. Suitably, the arrays are
supported securely above the phosphor screen 32 by posts 40, which
are also of an insulating material, such as ceramic. An external
voltage source is coupled to electrical leads 35 to 38 and screen
32 by use of conductive wires 41 to 45 that extend from leads 35 to
38 and screen 32 through the mid portion of turntable 10 and torus
12 to an external source.
Still another example of an electron-beam processing unit comprises
a phosphor screen 50 with a small hole 51 extending completely
therethrough, the screen 50 mounted on turntable 10. Hole 51, for
example, has a diameter of about 3 millimeters. Underneath screen
50 and aligned with hole 51 is an electron multiplier 53. Unlike
multipliers 30 and 31, multiplier 53 has a single channel. The
lining of the channel of multiplier 53 comprises a resistive
coating. When incoming electrons impinge upon the coating,
secondary emission effects occur, resulting in electron
multiplication that is proportional to the number of electrons
entering the multiplier. An ammeter capable of indiating very low
current values, such as in the picoampere range, can be
electrically coupled to the output of multiplier 53 to detect
electrical impulses generated when electrons have passed through
hole 51 and entered multiplier 53. The magnitude of a pulse is
proportional to the number of electrons passing through hole
51.
Conductive wires 55 and 56 extend through the mid portion of torus
12 and turntable 10 and are electrically connected to electron
multiplier 53 and phosphor screen 50 respectively, thereby
providing connections to an external voltage source.
An electron beam striking one side of screen 50 results in the
image appearing on the other side thereof, while at the same time a
portion of electrons in the beam pass through hole 51 and enter
multiplier 53, thereby allowing determination of electron density
at the same time the image is being viewed.
Referring to FIG. 1, spaced deflecting coils or plates 60 and 61
are provided for deflecting thet incoming electron beam as it
enters through opening 3. The deflecting elements may be
electrostatic or electromagnetic. For deflection in two directions,
such as X- and Y-directions, a pair of spaced coils is provided,
one pair for each direction. The degree of deflection in each
direction is determined by the magnatude of the potential applied
to a selected pair of deflection coils. Spaced electrical leads 63
and 64, coupled respectively to electrical terminals of deflectors
60 and 61, extend outside the chamber to enable application of
voltage potentials to deflectors 61 and 62 from an external
source.
An insulating material, such as "TorrSeal" or equivalent, is
provided at the location where the leads 63 and 64 pass through the
chamber wall, in order to protect the vacuum in the chamber.
A multiposition switch, such as switch 70 as shown in FIG. 3, along
with the circuit components, is provided to selectively control the
magnitude of the potential applied to deflectors 60 and 61, and
thereby control the various degrees of deflection in one direction.
Each of four terminals 75 through 78 of multiposition switch 70 is
electrically coupled via resistors 85 through 88 to a center tap of
one of four voltage dividers 81 through 84. Resistors 85 through 88
ensure linear deflection upon adjustment of the center tap. The
output from the center arm 71 of switch 70 is electrically coupled
via electrical leads 63 and 64 to deflectors 60 and 61 in the
microscope chamber, indicated symbolically in FIG. 3 as coil 61.
The source of the voltage potential, for example, can be a
direct-current power supply 90 coupled across voltage dividers 81
through 84 by resistors 91 and 92. Preferably, the center arm 71 of
switch 70 is connected to a timer (not shown), which periodically
moves arm 71 through each of the four terminals 75 through 78,
thereby changing the potential on coil 61 and controlling the
degree of deflection of an incoming electron beam in chamber 1.
Switch 70 enables one to determine the electron density of four
different portions of the beam. Another switch is provided for
shifting the beam in another direction, such as the Y-direction. If
desired, a multilevel switch can be used for shifting the beam in
various directions at the same time.
As mentioned above, the entire chamber 1 is sealed to preserve the
integrity of the vacuum therein. Suitably, the sealing means
comprises a rubber or viton O-ring seal 100 (FIG. 1) at each place
where portions of the chamber come together. In addition, a
cylinder 101 may be fastened to the chamber wall 102 in the
vicinity of the torus 12 in order to compress the O-ring seal
against the torus 12 and prevent any leakage of air into the
chamber, especially during axial rotation of the torus 12.
Referring to FIG. 4, an alternative embodiment of the movable
platform provides for longitudinal movement, rather than
rotational. Platform 110 is moved longitudinally in chamber 111 by
means of a gear mechanism 112 and 113. Gear 113 is mechanically
coupled to external lever 114 by member 115. Rubber or viton O-ring
seals 116 are provided to maintain the vacuum in the chamber.
Mounted on platform 110 are various electron beam-processing units
similar to those located on turntable 10 of FIG. 1. For example,
one processing unit comprises a phosphor screen 20. Another unit
comprises a phosphor screen 32 with microchannel electron
multipliers 30 located thereover. Still another unit comprises a
phosphor screen 50 with a small hole 51 extending therethrough to
accommodate an electron detector located thereunder. As desired,
platform 110 can also contain an empty hole or leaded plate 120,
particularly in applications where no special processing unit is
required.
While the invention has been described with reference to particular
embodiments, it includes numerous other modifications, which will
be obvious to one skilled in the art.
* * * * *