U.S. patent number 3,876,304 [Application Number 05/394,863] was granted by the patent office on 1975-04-08 for phase reticle design.
This patent grant is currently assigned to ARDAC, Inc.. Invention is credited to Frank A. Novak.
United States Patent |
3,876,304 |
Novak |
April 8, 1975 |
Phase reticle design
Abstract
Disclosed is a reticle assembly readily adaptable for use in
radiation sensitive paper security validation apparatus. A
transparent lens containing thereon a plurality of evenly spaced
parallel reticle lines comprises the assembly. The reticle lines
are of such a nature that when the reticle assembly and the paper
security to be validated are placed in close operative positional
relationship the reticle lines diagonally transverse the lines of
the cross-hatched grid pattern contained on the paper security
being validated.
Inventors: |
Novak; Frank A. (Seven Hills,
OH) |
Assignee: |
ARDAC, Inc. (Chesterland,
OH)
|
Family
ID: |
23560699 |
Appl.
No.: |
05/394,863 |
Filed: |
September 6, 1973 |
Current U.S.
Class: |
356/71; 250/237R;
356/395 |
Current CPC
Class: |
G07D
7/12 (20130101) |
Current International
Class: |
G07D
7/00 (20060101); G07D 7/12 (20060101); G06k
009/08 () |
Field of
Search: |
;356/71,239,69
;250/556,557,237G,237 ;350/205,162SF |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Wibert; Ronald L.
Assistant Examiner: Godwin; Paul K.
Attorney, Agent or Firm: oldham & Oldham Co.
Claims
What is claimed is:
1. A reticle assembly to be placed in close positional relationship
with a cross-hatched pattern created by the intersection of two
sets of lines on a material to be authenticated such that relative
positional changes between the reticle and the cross-hatched
pattern result in fluctuations in the amount of light passing
therethrough, comprising:
a substantially transparent window; and
a plurality of apertures positioned upon the window in spaced
relationship according to the spacing of diagonals through the
intersection of the two sets of lines forming the cross-hatched
pattern such that when the reticle is operationally positioned with
respect to the cross-hatched pattern the apertures of the reticle
pass transversely to the two sets of lines thereof.
2. The reticle assembly as recited in claim 1 wherein the plurality
of apertures positioned upon the window are parallel with respect
to each other.
3. The reticle assemble as recited in claim 1 wherein the plurality
of apertures positioned upon the lens are equally spaced upon the
lens with respect to each other.
4. The reticle assembly as recited in claim 1 wherein the plurality
of apertures positioned upon the window are, when the reticle is in
operative positional relationship with the cross-hatched pattern,
diagonally transverse to the intersection points of the two sets of
lines of the cross-hatched pattern.
5. The reticle assembly as recited in claim 4 wherein the plurality
of apertures positioned upon the window are equally spaced with
relation to each other such that each intersection point of the
cross-hatched pattern directly opposite the reticle is transversed
by one of the lines on the window.
6. A reticle assembly to be placed in close positional relationship
with a multi-lined grid pattern to determine the validity of the
pattern, comprising a transparent window and a plurality of reticle
elements upon the window of such a nature that when the reticle
assembly is operatively within a close positional relationship with
the grid pattern the reticle elements are obliquely angled with
respect to the lines of the pattern.
7. The reticle assembly as recited in claim 6 wherein the portion
of the window not containing the plurality of reticle elements is
masked.
8. The reticle assembly as recited in claim 6 wherein the reticle
elements are so angled that when the reticle assembly is
operatively positioned with respect to the grid pattern the reticle
elements diagonally transverse the points of intersection of the
lines of the pattern.
9. The reticle assembly as recited in claim 6 wherein the reticle
elements comprise a plurality of evenly spaced parallel apertures.
Description
BACKGROUND OF THE INVENTION
Heretofore various types of apparatus have been known which provide
means for determining the authenticity of paper securities. Such
apparatus generally utilize a photoelectric technique to operate
upon a preselected area of the paper security and, depending upon
the results of the authenticity tests performed on this particular
area, thereby determine the authenticity of the entire paper. In
particular, apparatus for validating paper money generally test the
sets of parallel printed lines behind the portrait thereon. This
test is accomplished by utilizing a reticle assembly having a lined
pattern similar to either the horizontal or vertical lined pattern
in the portrait background. The positional relationship between the
reticle and the paper money is augmented while light energy is
passed through the paper money and reticle; the light energy so
passed being detected by a photocell or other detector. The
relative movement between the reticle and the portrait background
causes alignment and misalignment of the lines which allow an
accurate measurement to be made of the authenticity of the
background of the currency.
A serious drawback of the type of reticle just described has become
apparent. This type of reticle only recognizes and authenticates
one set of lines, either the vertical or the horizontal, existing
in the cross-hatched pattern of the portrait background. Indeed, if
a reticle of the type now in use contained only vertical lines it
would be unaffected by the absence of horizontal lines in the
portrait background of the paper being validated. This problem has
become quite serious since photocopy equipment is now available
which can reproduce the minute lines present in the portrait
background of paper currency. However, it has been noted that such
photocopy equipment is generally capable of only accurately
reproducing the extremely fine lines of the portrait background in
either the horizontal or vertical direction but not both
directions. Consequently, it has become necessary to produce a
reticle which is capable of testing both the horizontal and
vertical lines present on paper securities.
It is therefore an object of the instant invention to present an
improved reticle readily adaptable for use in radiation sensitive
paper security validation equipment which simultaneously tests the
validity of both the horizontal and vertical lines present on paper
securities.
A further object of the invention is to present an improved reticle
which is substantially insensitive to horizontal or vertical
misalignment of the paper security with relation to the
reticle.
Yet another object of the invention is to present an improved
reticle which is simplistic in design, readily adaptable for use
with presently existing validation systems, highly accurate, and
more capable of determining the authenticity of paper securities
than presently existing reticles.
These objects and other objects which will become apparent as the
detailed description is presented are achieved by a reticle
assembly comprising a substantially transparent lens and a
plurality of apertures positioned upon the lens in such a manner
that when the reticle is operatively positioned with respect to the
cross-hatched pattern to be validated the apertures of the reticle
pass transversely to the two sets of lines of the cross-hatched
pattern.
For a full understanding of the techniques and apparatus of the
invention reference should be had to the detailed description and
accompanying drawings wherein:
FIG. 1 is an exploded view of a typical grid or cross-hatched
pattern;
FIG. 2 is a prior art showing of a reticle assembly;
FIG. 3 shows a reticle assembly having a reticle pattern which is
substantially a photonegative of the grid pattern of FIG. 1;
FIG. 4 shows a reticle assembly wherein the reticle pattern
comprises diagonally related boxes;
FIG. 5 shows a diagonal reticle according to the teachings of the
invention;
FIG. 6, comprising FIGS. 6a and 6b, show the operational technique
of the reticle assembly according to the teachings of the
invention;
FIG. 7 is a slight variation on the theme of the instant invention
comprising two sets of phase reticle elements;
FIG. 8 is a slight variation on the theme of the invention wherein
the apertures of the reticle are phase shifted; and
FIG. 9 is a showing of a grid which may be validated with the
reticle of FIG. 8.
Referring now to the drawings and more particularly FIG. 1, a
cross-hatched or grid pattern similar to that which is
characteristically present on many paper securities is shown. This
pattern is designated generally by the numeral 10 and is achieved
by the intersection of a plurality of dark vertical lines 12 with a
second plurality of dark horizontal lines 14. The intersections of
these lines result in the creation of the plurality of light boxes
16. Although the grid pattern 10 is shown in FIG. 1 to have the
spacing of the vertical lines 12 equivalent to the spacing of the
horizontal lines 14 and the thickness of said lines to be
equivalent to the spacing therebetween, such need not be the case.
Indeed, the spacing of the vertical lines 12 might be different
from that of the horizontal lines 14 and the thicknesses thereof
may be substantially less than the spacings therebetween. The boxes
16 would then be rectangular in shape as is characteristic of many
paper currencies. It will of course be understood that the grid
pattern 10 of FIG. 1 may have any of numerous characteristics and
still be tested by the techniques and apparatus of the
invention.
A prior art reticle assembly 18 is shown in FIG. 2 to be
characterized by the presence of a plurality of equally spaced
parallel dark reticle lines 20, present upon a transparent lens 21.
Consistent with prior art teachings, these lines 20 are present in
the same number per inch ratio as are the evenly spaced parallel
dark lines 12 of the grid pattern 10. Of course, the spacing of the
lines 20 could similarly be consistent with the spacing of the
lines 14. General paper security validation techniques teach that
the grid pattern 10 and the reticle assembly 18 are placed in a
close positional relationship such that the lines 20 are
substantially parallel to and opposite the lines 12. A light source
is caused to shine upon the grid pattern 10 passing through the
boxes 16, through portions of the lens 21, and onto a photo or
solar cell which emits signals indicative of the amount of light
incident thereon. As the positional relationship between the
reticle assembly 18 and the grid pattern 10 is augmented in a
direction perpendicular to the direction of the lines 20 and 12 the
boxes 16 are alternately opened and closed as to light passage as
the lines 20 fall into and out of alignment with the lines 12. As
the light passage through the boxes 16 is gradually increased and
decreased resultant signals are emitted from the photocell
indicative of the degree of correlation between the spacing and
thickness of the lines 20 and the lines 12. It should be noted
however that the magnitude of fluctuation of the signal emitted by
the photocell would not be significantly affected if the lines 14
of the grid 10 were absent. Indeed, the applicants have found that
prior art reticles used in conjunction with validation apparatus
similar to that described in U.S. Pat. No. 3,457,421 could possibly
allow a photocopy of paper security which only accurately contained
the lines 12 of the cross-hatched pattern 10 to pass the validation
test.
The applicants have found that the simplest approach to developing
a reticle which tests both the horizontal and vertical lines of the
grid pattern is to characterize the reticle assembly with the
presence of the negative of that pattern. FIG. 3 illustrates a
reticle assembly 22 containing upon the lens 23 thereof a plurality
of dark boxes 24 of similar size and positioning as the light boxes
16 of the pattern 10. It can be seen that if the reticle 22 and the
pattern 10 are placed in close positional relationship with each
other such that the dark boxes 24 are aligned with the light boxes
16 then a validation test similar to that described hereinabove may
be performed. Here it can be seen that if the vertical lines 12 are
missing in the cross-hatched pattern 10 then a constant level of
light emission from the light source of the photocell will be
experienced and a resultant voltage indicative of this condition
will be evidenced at the output of the photocell. In other words,
with the set of lines 14 missing there will never be a total
blackout or prevention of light passage to the photocell, and
consequently the fluctuation of the output signal of the photocell
will not be sufficient to indicate authenticity.
It should be noted however that the reticle 22 is quite sensitive
to misalignments between the reticle 22 and the cross-hatched
pattern 10. Particularly, if the reticle 22 and the pattern 10 are
positioned such that the dark boxes 24 are opposite the lines 14
and if relative movement between the reticle assembly 22 and the
pattern 10 is caused to be made parallel to the lines 14 then no
fluctuation of light passage or voltage output from the photocell
will be realized since the boxes 24 will never intercept the boxes
16. It should be seen then that the attributes of the reticle
assembly 22 might be defeated by a very slight misalignment.
To circumvent the misalignment problem present with the reticle
assembly 22, the reticle assembly 25 of FIG. 4 was developed. As
can be seen, this reticle comprises a first plurality of rows of
dark reticle boxes 26 similar in size and spaced relationships as
the light boxes 16. The reticle assembly 25 further contains a
second plurality of rows of dark reticle boxes 28 which are also of
substantially the same size and spaced relationship as the boxes
16. However, it should be noted that the group of boxes 26 and the
group of boxes 28 are offset from each other a distance equivalent
to the height and width of one of the boxes. In other words, there
exists a phase difference relationship between the boxes 28 and the
boxes 26. This offset of phase shift of the groups of boxes
alleviates the misalignment problem. It can be seen that when the
reticle assembly 25 is brought into close positional relationship
with the grid pattern 10 in such a manner that the boxes 26 are
misaligned with the boxes 16 then the boxes 28 will be aligned
therewith. Similarly, if the boxes 28 are misaligned with the boxes
16 then the boxes 26 will be aligned therewith. It should be
observed that as the boxes 26 come into a greater degree of
alignment with the boxes 16 the boxes 28 come into a lesser degree
of alignment so that the total degree of alignment realized by the
reticle assembly 25 will be constant.
With the reticle of FIG. 4 it should become readily apparent that
if either of the sets of lines 12 or 14 is absent from the
cross-hatch pattern 10 then no validation signal will be generated
when the reticle is placed in operative positional engagement
therewith.
It can be observed that the boxes 26 and 28 of the reticle assembly
25 lie along the diagonal lines 30. Upon the basis of this
observation, the applicants recognized that a reticle having
diagonally spaced lines thereon would achieve the purpose of
testing for the presence of both the lines 12 and the lines 14 of
the pattern 10 while alleviating the misalignment problem.
A phase reticle according to the teachings of the instant invention
is shown in FIG. 5. The reticle 34 is characterized by the presence
of the dark parallel evenly spaced lines 36. These diagonal lines
36 define apertures therebetween and are at the same angle and
spacing as would be the lines passing through diagonally opposite
corners of the boxes 16 of the pattern 10. Of course, if the
spacing of the lines 12 were different from the spacing of the
lines 14 then the diagonal reticle lines 36 of the reticle assembly
34 would not be at a 45.degree. angle but would be augmented
therefrom and spaced in accordance with the particular
characteristics of the grid pattern to be validated.
FIG. 6, comprising FIGS. 6a and 6b, shows the validation technique
to be used with the reticle assembly 34. The reticle 34 is brought
into close positional relationship with the pattern 10 and that
relationship is augmented by relative motion between the two
parallel to the lines 14. FIG. 6a shows the positional relationship
between the reticle 34 and the pattern 10 which would allow the
least light to pass to the photocell while FIG. 6b shows that
positional relationship allowing the most light to pass thereto. As
was described hereinabove, and as is well know to those skilled in
the art, the degree and number of light passage fluctuations
experienced during a test result in characteristic signal output
from the photocell which indicate the validity or invalidity of the
material being sensed. Indeed, the apparatus described in U.S. Pat.
No. 3,457,421 would be readiliy conducive to operation with the
disclosed phase reticle with only a slight change being required in
a DC restorer which would compensate for a constant DC level
resulting from the photocell due to the fact that the diagonal
reticle never completely cuts off light transmission thereto. The
voltage fluctuations, both as to number and amplitude, which would
be experienced at the output of the photocell would be readily
adaptable for use by the associated circuitry described in that
patent.
It should of course be noted that the phase reticle may be varied
in many respects and that the reticle lines 36 may be of any
numerous characteristics, those characteristics being determined by
the particular substance to be validated. In particular, the
thickness of the lines 36, the actual number to be placed upon the
reticle assembly 34, and the specific positioning of the lines 36
may readily be varied with due consideration given to the quality
of the material being validated and the sensitivity of the
circuitry processing the photocell signals.
FIG. 7 shows a reticle assembly which slightly varies on the theme
of the instant invention. In understanding the slight variation it
will be appreciated that the basic concept of presenting a
validation reticle which tests both the horizontal and vertical
lines in the grid pattern is to guarantee that the elements of the
reticle are of such a nature that when the positional relationship
between the reticle and grid pattern is operatively changed,
positional relationship changes occur between the elements of the
reticle and both sets of lines 12 and 14 comprising the grid
pattern. When the relative motion between the reticle and the grid
pattern is to be parallel to one of the sets of lines comprising
the grid pattern then it is incumbent that the reticle element be
angled with respect to both sets of lines. The maximum degree of
fluctuation to be achieved using a reticle assembly having angled
reticle elements would of course be realized when the reticle
elements diagonally transverse the sets of lines comprising the
grid pattern.
FIG. 7 shows a reticle assembly 38 according to the teachings of
the invention wherein the reticle elements comprise a plurality of
dovetails 40. Each of the dovetails 40 is comprised of two
elements, one element being diagonally transversed with the
elements of the grid pattern along one diagonal, and the other
element along the other diagonal. Relative motion between the
reticle assembly 38 and the grid pattern 10 parallel to either of
the lines 12 or 14 will produce the fluctuating output signals
necessary to control the validity device with which the reticle
assembly 38 is associated.
A slight variation on a theme of the apparatus of the instant
invention is shown in FIG. 8. Here a phase reticle 46 is shown
having two groups of dark parallel lines 42 and 44 present thereon.
The lines 42 and the lines 44 define apertures therebetween through
which light may pass during the validation exercise. As can be
seen, the lines 42 and the lines 44 are phase shifted with respect
to each other by 180.degree.. The reticle 46 is contemplated to be
used in validating a grid comprised of two sets of vertical lines
48 and 50 as shown in FIG. 9. It can be seen the relative
horizontal movement between the reticle 46 and the grid pattern 52
would result in alternating on-off signals from the validating
apparatus. If one of the sets of lines 48 or 50 were missing such
that the grid 52 comprised merely a plurality of parallel vertical
lines then there would be no signal output when the reticle 46 were
brought into operative engagement with the grid 52 since the phase
between the lines 42 and 44 of the reticle 46 would guarantee a
constant degree of alignment between the apertures of the reticle
46 and the lines of the grid 52. Thus it can be seen that the phase
shifted relationship between the apertures of the reticle 46
guarantees that validation of both sets of lines 48 and 50
comprising the grid pattern 52 will be achieved. Again, as was
presented in the embodiments hereinabove, it is the aggregate
signal achieved from the various phase shifted apertures of the
reticle which culminates in a signal indicative of the presence or
absence of element of the grid.
It should be appreciated that the improved reticle and the
variations thereof which have been disclosed herein serve the
unique purpose of testing the spacing and characteristics of the
grid patterns so commonly contained on security instruments and
paper. But for the unique arrangement of the reticle elements upon
the lens of the reticle assembly, the reticle assembly of the
instant invention is quite similar in nature to those presently in
the art. Particularly, it should be understood that in normal
operation a mask would be associated with the reticle assembly to
assure that the effective portion of the assembly is that portion
of the lens which contains thereon the angled reticle elements.
Further, the general materials and techniques utilized in
constructing reticle assemblies now available in the art are
readily conducive to the construction and assembly of the improved
reticle of the instant invention.
It should now be understood that the objects of the invention have
been achieved by the techniques and apparatus of the phase reticle
presented herein and described in detail. While in accordance with
the Patent Statutes only the best known and preferred embodiment of
the invention has been disclosed, it is to be understood that the
invention is not limited thereto or thereby. Consequently, for an
appreciation of the true scope of the invention reference should be
had to the accompanying claims.
* * * * *