U.S. patent number 3,874,942 [Application Number 05/292,554] was granted by the patent office on 1975-04-01 for electrophotographic photosensitive member.
This patent grant is currently assigned to Canon Kabushiki Kaisha. Invention is credited to Takashi Ihara, Takao Komiya, Tatsuo Masaki, Hirokazu Negishi, Takashi Saito.
United States Patent |
3,874,942 |
Negishi , et al. |
April 1, 1975 |
**Please see images for:
( Certificate of Correction ) ** |
ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER
Abstract
An electrophotographic photosensitive member has an inorganic
insulating layer laminated on the photoconductive layer thereof.
This electrophotographic photosensitive member shows high
dielectric strength and no deterioration against repeated use over
a long period of time.
Inventors: |
Negishi; Hirokazu (Yokohama,
JA), Saito; Takashi (Tokyo, JA), Komiya;
Takao (Yokohama, JA), Masaki; Tatsuo (Yokohama,
JA), Ihara; Takashi (Kawasaki, JA) |
Assignee: |
Canon Kabushiki Kaisha (Tokyo,
JA)
|
Family
ID: |
27455989 |
Appl.
No.: |
05/292,554 |
Filed: |
September 27, 1972 |
Related U.S. Patent Documents
|
|
|
|
|
|
|
Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
|
11520 |
Feb 16, 1970 |
|
|
|
|
Foreign Application Priority Data
|
|
|
|
|
Feb 22, 1969 [JA] |
|
|
44-13418 |
Mar 26, 1969 [JA] |
|
|
44-22940 |
|
Current U.S.
Class: |
430/67 |
Current CPC
Class: |
G03G
5/14721 (20130101); G03G 5/14726 (20130101); G03G
5/14782 (20130101); G03G 5/147 (20130101); G03G
5/14752 (20130101); G03G 5/14704 (20130101) |
Current International
Class: |
G03G
5/147 (20060101); G03g 005/00 () |
Field of
Search: |
;96/1.5,1 ;117/132R |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Smith; Ronald H.
Assistant Examiner: Goodrow; John L.
Attorney, Agent or Firm: Fitzpatrick, Cella, Harper &
Scinto
Parent Case Text
This is a continuation, of application Ser. No. 11,520, filed Feb.
16, 1970, now abandoned.
Claims
What is claimed is:
1. An electrophotographic photosensitive member comprising a base,
a photoconductive layer and a separate insulating layer on the
photoconductive layer at least substantially transparent to actinic
radiation and composed of a laminate of an inorganic insulating
layer composed of inorganic insulating material having a dielectric
constant of at least 2 and an organic insulating material having an
insulative resistance of at least 10.sup.12 ohm-cm, said laminate
having a thickness of 1 to 40 microns.
2. An electrophotographic photosensitive member as set forth in
claim 1, in which the base is composed of a conductive
substance.
3. An electrophotographic photosensitive member as set forth in
claim 1, in which the base is a laminate of a conductive substance
and an insulating substance and the conductive substance is in
contact with the photoconductive layer.
4. An electrophotographic photosensitive member as set forth in
claim 1, in which the base is a laminate of a conductive substance
and an insulating substance and the insulating substance is in
contact with the photoconductive layer.
5. An electrophotographic photosensitive member as set forth in
claim 1, in which the base is composed of an insulating substance.
Description
This invention relates to an eletrophotgraphic photosensitive
member and more particularly to a photosensitive member comprising
basically a base body, a photoconductive layer, and an insulating
layer, in which the insulating layer comprises inorganic substances
or inorganic and organic substances.
It is already widely known that in general electrophotographic
processes, for example, in electrophotographic methods which
comprises, in combination, steps of electrostatic image formation,
development, and fixation, and transfer and fixation, a highly
contrasty electrostatic image of high charge density must be formed
when forming an electrostatic image, which corresponds to the
original image to be copied, on a photosensitive member, in order
to obtain a highly contrasty and sharp copy.
The formation of an electrostatic image having such a high contrast
and charge density is attained by first applying a high voltage, at
charging step for forming an electrostatic image, to the surface of
the photosensitive member on which an electrostatic image is to be
formed and by giving a high electric charge to the surface of the
photosensitive member stated previously. As these
electrophotographic system, there are known Xerography system,
Electrofax system, etc.
Among them, as one of the excellent systems, a method, which, for
example, is disclosed in U.S. applications of Ser. No. 563,899,
filed July 8, 1966 and Ser. No. 571,538, filed Aug. 10, 1966 and
which consists of three steps -- primary corona discharge,
secondary corona discharge with simultaneous exposure or AC
discharge, and whole surface exposure, and which forms a highly
contrasty electrostatic image, is offered.
The photosensitive member used in this process is characterized by
the three layer structure comprising a conductive base plate, a
photoconductive layer, and a surface insulating layer or the four
layer structure having an insulating layer interposed between the
base plate and the photoconductive layer in the above-mentioned
three layer stracture. These features are not observed in
conventional Xerographic plate and Electrofax paper.
Since the surface of photosensitive member is covered with an
insulating layer of high abrasion resistance, the fragile
photoconductive layer, is protected against damage and the
durability of the photosensitive member is improved.
Moreover, since the surface insulating layer responsible for
maintaining electric charge and the photoconductive layer, which is
sensitive to such radiations as the optical image at time of
secondary charging like a kind of switching operation, assume the
responsibilities separately, the photosensitive member can be made
from wide variety of materials as compared with conventional
photosensitive member comprizing a single photoconductive
layer.
For example, highly sensitive photoconductors can not be used in
conventional Xerography system and Electrofax system because they
have, in general, a low resistance and a large dark decay.
These high sensitive materials have not become enabled to be
used.
However, as the above-mentioned surface insulating layer, there are
used, in general, organic insulating materials composing of
polyethylene terephthalate (registered trade mark: Mylar) and other
highpolymer films. The surface insulating layer maintains an
electrostatic latent image of high contrast potential and, after
developing the latent image, image transfer is preformed by
applying a high external electric field. It shows a poor dielectric
strength against impressed voltage and sometimes cause insulation
breakdown of the surface insulating layer. For this reason it has
been impossible to apply a voltage higher than a certain limit.
This means that, even if a voltage higher than the above-mentioned
limit can be applied, the phenomenon of insulation breakdown of the
photosensitive member or of production of pin holes, a form of
insulation breakdown, which extremely deteriorates the
photosensitive member, occurs jointly and gives image of poor
guality.
An object of this invention is to eliminate the above-mentioned
defects and provide a photosensitive member having a high
dielectric strength capable of forming electrostatic latent images
of high contrast, and showing no deterioration against repeated use
over a long period of time.
A further object of this invention is to provide a photosensitive
member which can maintain a high density electric charge against
charging process contained in the formation of the electrostatic
image and which is quite free from the production of insulation
breakdown or the pin holes, one form of insulation breakdown,
against a high voltage application.
Another object of this invention is to improve drastically the
mechanical strength of insulating layer, especially that of the
surface thereof, and to strengthen the durability against electric
stress compared with conventional insulating layers.
To be concrete, the insulating layer is composed of inorganic
substance or of inorganic insulating layer combined with organic
insulating layer.
Embodiment of each photosensitive member having the invented
inorganic insulating layer will be described in the following
referring to the drawings:
FIGS. 1, 3, 4, 5 and 6 are enlarged cross sectional views of
embodiment of photosensitive member according to this invention;
and
FIGS. 2A - 2D diagrammatically show an example for making the
photosensitive member of this invention.
The most fundamental photosensitive layer according to this
invention comprizes a base 1, a photoconductive layer 2 laid
thereon, and an inorganic insulating layer 3 formed further thereon
as shown in FIG. 1. For example, it is possible to improve
drastically the mechanical strength of the surface and to
strengthen the durability against electric stess compared with
conventional insulating materials by applying a coat of inorganic
insulating layer 3 consisting of such inorganic insulating matters
as glass and ceramic materials on the photoconductive layer 2,
When providing an inorganic insulating layer on the photoconductive
layer as stated above, the insulating layer is sometime subject to
restriction in the material or coating method for reasons of
smoothness, heat resistivity, etc. of the photosensitive layer. In
such case, it is considered to remove the restrictions and perform
lamination by, for example, employing the following method.
That is, the insulating layer and the photoconductive layer are
separately formed and finally they are laminated as shown in FIG.
2.
In FIG. 2A, an inorganic insulating layer 3 is provided on the base
11, interposing a stripping layer 12 therebetween, and a polymer
film 4 is made to adhere to the inorganic insulating layer 3 by way
of an adhesive layer 13.
On the other hand, a photosensitive layer comprizing base 1 and
photoconductive layer 2 is formed separately as shown in FIG. 2B
and, the above-mentioned insulating layer is laminated on said
photoconductive layer 2.
In other words, the insulating layer shown in FIG. 2A is peeled by
means of the stripping layer 12 and is laminated on the
photoconductive layer 2 shown in FIG. 2B.
As for the structure, the above-mentioned, stripped insulating
layer is made to adhere to the photoconductive layer 2 in layer as
is clearly shown in FIG. 2C.
The symbol 13' represents the adhesive layer used for adhesion of
both layers.
In this way, an inorganic insulating layer is formed on the surface
of the photosensitive member.
When using a polymer film 4 merely as the temporary protective
layer of the inorganic insulating layer 3, the polymer film 4 is
interposed in layer between the inorganic insulating layer 3 and
the stripping layer 12 as shown in FIG. 2D, and, after adhering
said inorganic insulating layer 3 to the photoconductive layer 2
shown in FIG. 2B, the polymer film 4 is stripped off.
As have been described above, by the employment of an inorganic
insulating layer having an insulating characteristic of high
dielectric strength, it is possible not only to prevent the
occurrence of the phenomena which bring about deterioration of
photosensitive member such as insulation breakdown or pin holes,
but also to increase the mechanical and physical strength of the
photosensitive member.
Furthermore, it is also effective to provide an organic insulating
material on the surface of the insulating layer to increase such
properties of above-mentioned photosensitive member as water
non-absorbing property, moisture non-permeating property, and
adhesiveness of developer grains.
When using such an organic insulating material, in the
electrophotographic process following the formation of
electrostatic latent image, it is possible, by the use of an
organic insulating layer in order to obtain a visible transferred
image that corresponds to the highly contrasty electrostatic image,
to form a more excellent electrostatic image.
Therefore, in view of the above, it is possible to obtain a more
effective photosensitive member by using both an inorganic
insulating layer and an organic insulating layer simultaneously.
This mode will be described hereinafter. The photosensitive element
shown in FIG. 3 comprizes four layers, conductive layer 21,
photoconductive layer 2, inorganic insulating layer 3, and organic
insulating layer 5, in which either the layer composed of the
inorganic insulating layer 3 and the organic insulating layer 5
which sandwiches the photoconductive layer 2 or the conductive
layer 21 is permeable to radiations to which the photoconductive
layer 2 is sensible and the inorganic insulating layer 3 and
organic insulating layer 5 are used as the insulating section of
the photosensitive member.
As another embodiment of photosensitive member, the one shown in
FIG. 4 can also be considered. In this photosensitive member, the
photosensitive member is composed of five layers, that is,
conductive layer 21, insulating layer 14 consisting of either
inorganic substance or organic substance, photosensitive layer 2,
inorganic insulating layer 3, and organic insulating layer 5, in
which either the inorganic insulating layer 3 and organic
insulating layer 5 or the conductive layer 21 and insulating layer
14 is permeated to the radiations to which the photosensitive layer
2 is sensitive. Therefore, this photosensitive member like the
photosensitive member shown in FIG. 3, has as its insulating
section the two layers of inorganic insulating layer 3 and organic
insulating layer 5 and the organic insulating layer 5 as the
surface layer of the photosensitive member to build the layer
formation to attain the same object as the photosensitive member of
FIG. 3.
Moreover, this photosensitive member is characterized in that the
two layers sandwiching the so-called photosensitive layer are two
insulating layers, which, in charging process by means of high
voltage applied thereto for forming an electrostatic image, the
insulating layer 14 is charged in reverse polarity to the charge of
the organic insulating layer 5, and, by maintaining high density
charge with the organic insulating layer, succeeds in forming a
high contrasty electrostatic image. Therefore, the insulating layer
14 preferably comprises the above-mentioned insulating inorganic
substances having, as insulating characteristics, a high dielectric
strength in order to maintain the high density charge. However,
usual above-mentioned insulating organic substances can also attain
the object of this invention.
The construction materials of each layer of the photosensitive
member of this invention will be described in the following.
As inorganic insulating materials, they must meet the requirements
that the dielectric constant is 2 or more at normal temperatures
and humidities, volume resistivity is 10.sup.12 .OMEGA. - cm or
more, dielectric strength is 120 kv/mm, and the layer is 1.about.40
.mu. in thickness (the layer is weak when it is thinner than 1 .mu.
and its flexibility is reduced when it is thicker than 40 .mu.).
Suitable materials are glass materials and ceramic materials such
as high silicate glass, crown glass, borosilicate glass, SiO.sub.2,
Al.sub.2 O.sub.3, TiO.sub.2, CaF.sub.2, BN, Ti.sub.2 O.sub.3 and
mixtures of them. For reasons of manufacture, such substances as
Se, PbO, CaO, B.sub.2 O.sub.3, SrO and MgO may be contained in
order to color the layer produce filter effect simultaneously.
As the materials for organic insulating layer substances having as
insulating resistance of more than 10.sup.12 .OMEGA.-cm such as,
for example, polyethylene, polypropylene, polyethylene
terephthalate, polystyrene, polyester, polycarbonate, polyvinyl
chloride, ethyl cellulose and cellulose acetate can be used.
As for photoconductive substances, they are required to form a
layer of approximately 5.about.200 .mu. thick. Concretely, the
photoconductive layer is composed mainly of, for example, sulfur,
zinc oxide, zinc-cadmium alloy, sulfide fluorescent substances,
amorphous selenium, selenium-tellurium alloy, cadmium sulfide
activated by copper, CdS - CdSe, and other inorganic
photoconductive substances in the form of single layer or binder
dispersion system. Or the photoconductive layer is composed mainly
of anthracene, 3,6-dibromopoly-N-vinylcarbazole, nitrated
poly-N-vinylcarbazole, brominated poly-N-vinylcarbazole, polyvinyl
anthracene, and other organic photoconductive substances.
As for the base, metals such as copper, aluminum, iron, stainless
steel, and tin, or conductive glass formed by depositing, tin oxide
layer called Nesaglass (Trade mark) and other substances which
allow to be used as the conductive layer of the photosensitive
member can be used.
As the materials for the stripping layer used in the example shown
in FIG. 2, silicone resin oil which is heat resistant up to
250.degree.C, for example, dimethyl siloxane (100.about.10,000
c.p.s.) or tetrafluoroethylene (Trade mark, Teflon) which is heat
resistive to more than 300.degree.C, FEP, etc. can be used. These
substances are sufficiently effective with a minimum required
amount.
As the adhesives, transparent solventless adhesives such as epoxy
resin, polyester resin, vinyl acetate-polyethlene copolymer type
hot melt adhesive can be used. When using them, it is resuired to
apply them uniformly and keep the thickness within 5.mu..
Materials for constructing each layer have been described so far.
However, the materials described are only the representatives of
the usable materials and, of course, materials applicable to this
invention can all be used.
In the embodiments of this invention described so far, the
numerical characteristic of the dielectric strength of the
above-mentioned inorganic insulating layer is, for example,
approximately 180 kv/mm or more when the above-mentioned inorganic
substance is mica. On the other hand, in the case of polyethylene
terephthalate, which is considered to be excellent in dielectric
strength as the insulating organic substance used in
above-mentioned organic insulating layer, the dielectric strength
is 120 kv/mm. Therefore, in the layer formation of insulating
section of the photosensitive member formed by the piling of the
above-mentioned inorganic insulating layer and organic insulating
layer, for example, in the case of a 20 micron thick inorganic
insulating layer composing of mica and a 10 micron thick organic
insulating layer composing of polyethylene terephthalate, the toal
dielectric strength becomes approximately over 4,000V as is clear
from simple arithmetical calculation based on the numerical values
of dielectric strengths of the above-mentioned mica and
polyethylene phthalate. This shows that the insulating layer of the
photosensitive member has a higher dielectric strength than when
only the insulating organic substance is used as the insulating
layer. Furthermore, as to the dielectric constant in the system of
insulating section of the photosensitive member, the dielectric
constant of mica is approximately 9 and that of polyethylene
phthalate is approximately 3, and that constant of the insulating
section is approximately 5.4 Such values of dielectric constant are
most preferable for the electrostatic image forming process in
which a high voltage is applied to the photosensitive member.
Furthermore, the above-mentioned inorganic insulating substances
and organic insulating substances are, of course, allowed to be
selected and used freely depending on the operating environmental
condition of the photosensitive member and, as a result, it is
possible to form the insulating section of the photosensitive
member having any dielectric strength and dielectric constant
within optimum ranges.
The photosensitive member according to this invention is not
limited to the one stated above, but the photosensitive members
concerned with electrophotographic system in which an electrostatic
image is formed in the insulating layer of the photosensitive
member are all contained.
In composition, the photosensitive member of this invention refers
to a photosensitive member comprizing as fundamental composition
three layer of an insulating layer, a photosensitive layer, a
conductive or insulating layer, or four layers of an insulating
layer, a photosensitive layer, an insulating layer, and a
conductive layer, in which each insulating layer is either composed
of a single inorganic insulating layer or composed of
above-mentioned two layers of organic insulating layer and
inorganic insulating layer piled on upon another, or composed of
above-mentioned inorganic insulating substance.
As stated above, the photosensitive member according to this
invention is basically composed of three or four layers. However,
in other case, for example, where the composition of the base is
different, the photosensitive member may take more complicated
composition.
To illustrate this, in FIG. 5, when the insulating layer is a
single layer of inorganic insulating layer, the base takes a two
layer formation by the combination of conductive substances and
insulating substances. In FIG. 5, although the conductive layer is
represented by 21 and the insulating layer by 22, of course, the
layer formation is not restricted to this layer formation.
When the insulating layer have a two layer formation, formed by the
conbination of inorganic insulating layer and organic insulating
layer, as shown, for example, in FIG. 6, symbol 7 or 8, the same
thing can be applied to the composition of the base. In short, the
layer formation of the base can be selected freely depending on the
purpose.
As have so far been described, the photosensitive member according
to this invention has a high dielectric strength, maintains a high
density charge against the charging process of electrostatic image
formation and, accordingly, forms an electrostatic image of high
electrostatic contrast, and even upon application of high voltage,
does not causes insulation breakdown or pin holes which are the
main causes of the deterioration of photosensitive member, and
shows no deterioration after repeated use over a long period of
time. Furthermore, the photosensitive member according to this
invention is enabled to visualize a high contrast electrostatic
image faithfully and to obtain a copied image by making the surface
layer from the above-mentioned organic insulating layer which is
excellent in no-water-absorbing property, no-moisute premeating
property, adhesiveness of developer powder, and mechanical
strength.
Still further, by selecting and using the above-mentioned inorganic
and organic layer composing materials freely depending upon the
operating environmental conditions of the photosensitive member, it
is possible to offer a photosensitive member having optimum
dielectric strength and dielectric constant.
This invention is further illustrated by the following
nonlimitative examples.
EXAMPLE 1
On an aluminum foil of 50 microns in thickness was coated
electrophotographic photosensitive material solution composed in
weight composition of
Cadmium sulfide activated by copper 100 parts Vinyl chloride -
vinyl acetate resin (as solid) 10 parts Methyl ethyl ketone 100
parts
The foil was dried with air heated to 70.degree.C, and a
photosensitive layer of 80 microns in thickness was prepared.
On the other hand, a 12 micron thick polyethylene terephthalate
(trade name: Diafoil, a product of MITSUBISHI JUSHI Co.) and a 20
micron thick mica were adhered to each other by using a
polyacrylicvinyl adhesive (trade name: Esudai, a product of SEKISUI
KAGAKU Co.). These layers were then adhered to the surface of the
above-mentioned photosensitive layer by using an epoxyresin (Trade
name a Epikote, a product of SHELL CHEMICAL Co.) to form a
photosensitive plate. As for the thickness of the adhesive layer,
the polyacrylic vinyl adhesive layer was 2 microns in thickness and
the epoxy resin adhesive layer was 2-5 microns in thickness, and
total thickness of the photosensitive plate was 145 microns in
average.
Next, by using this photosensitive member, and according to the
electrophotographic process applied for patent by this applicant
and disclosed in U.S. application Ser. No. 571,538, filed Aug. 10,
1966, by corona discharge wire established 10mm above the surface
of the photosensitive member, a +6KV corona discharge was applied
to the surface of polyethylene terephthalate insulating layer of
the photosensitive plate to charge the surface uniformly with
positive (+) charge and, following this, an original image was
projected for about 0.1 to 0.3 second by a tungsten lamp of about
10 lux onto the surface of the above-mentioned insulating layer
and, contemporaneously, an AC 6KV corona discharge was applied.
Further, the whole surface of the above-mentioned layer was exposed
uniformly to the 10W tungsten lamp for 1.about.2 seconds to form an
electrostatic image which conformed with the dark-bright pattern of
the original image. Then, the resulting electrostatic latent images
were developed by a magnet-brush method and excellent visible
images of high fidelity to the original pattern were produced.
Moreover, this photosensitive plate was subject to above-mentioned
charging process repeatedly in succession to test the electrical
strength. Even after 70 thousand times of charging process, the
result obtained by carrying out the above-mentioned
electrophotographic process showed no degradation of image quality
and a very good copied image was obtained.
EXAMPLE 2
Onto a 50 micron thick aluminum foil was adhered a 12 micron thick
polyethylene terephthalate film by using epoxy resin. The thickness
of epoxy resin was about 3 microns. Next, the photosensitive layer,
mica, and polyethylene terephthalate layer were adhered, in this
order, to the polyethylene terephthalate film in a similar way to
Example 1 and a photosensitive plate of 160 microns in average
total thickness was prepared. Next, using this photosensitive plate
and according to the electrophotographic process filed by the
present applicant and disclosed in U.S. application Ser. No.
563,899, filed July 8, 1966, a charging process similar to Example
1 was applied, and the surface of the polyethylene terephthalate
insulating layer was uniformly charged with positive (+) charge.
Next, an original image was projected to the photosensitive plate
for about 0.5 second by a tungsten lamp of about 10 lux and
contemporaneously a corona discharge having reversed polarity was
applied thereto. Then, the surface of the above-mentioned
insulating layer was exposed to a 10W tungsten lamp uniformly for
1.about.2 seconds and an electrostatic image that conformed with
the dark-bright pattern of the original image was formed. Next, as
a result of carrying out the electrophotographic process to develop
the electrostatic image by cascade developing method, a visible
image faithful to the original image and of good quality was
obtained.
Moreover, upon testing the electric strength of this photosensitive
plate under the same condition as Example 1, even after 70 thousand
times of charging process, the result obtained after carrying out
the above-mentioned electrophotographic process was an extremely
excellent copied image showing no degradation in image quality.
EXAMPLE 3
On an aluminum base plate was formed a photoconductive layer
comprising CdS fine grains bonded by epoxy resin. The plate was
mounted to the anode of high frequency cathode spattering equipment
and 96 percent silica glass was provided on the cathode.
The interior of the equipment was maintained at vacuum of
10.sup.-.sup.3 Torr, and the above-mentioned photosensitive member
material was made to contact with a water-cooled plate by way of
indium foil to control the temperature within the range of
100.degree.C to 150.degree.C during spattering. Moreover, in
carrying out spattering, the efficiency was improved by joint
application of magnetic filed. Thus a silica glass layer having the
specified thickness of 8 .mu. was formed on the photoconductive
layer in about 1 hour.
The surface insulating layer thus obtained was an insulating layer
excellent in dielectric strength and surface characteristics.
* * * * *