U.S. patent number 3,845,305 [Application Number 05/358,970] was granted by the patent office on 1974-10-29 for microbeam probe apparatus.
This patent grant is currently assigned to Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.. Invention is credited to Helmut Liebl.
United States Patent |
3,845,305 |
Liebl |
October 29, 1974 |
MICROBEAM PROBE APPARATUS
Abstract
The invention relates to a microbeam probe in which a test
surface is subted to an intense beam of ions or electrons and the
resulting secondary particles are analysed. An apparatus is
provided in which a common electrostatic lens of short focal length
acts as an objective for the primary beam and also as a collecting
lens for the secondary particles. The common lens comprises two
rotationally symmetrical lenses of short focal length in series
with an apertured diaphragm between them.
Inventors: |
Liebl; Helmut (Eching,
DT) |
Assignee: |
Max-Planck-Gesellschaft zur
Foerderung der Wissenschaften e.V. (Gottingen,
DT)
|
Family
ID: |
5844786 |
Appl.
No.: |
05/358,970 |
Filed: |
May 10, 1973 |
Foreign Application Priority Data
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|
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May 12, 1972 [DT] |
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2223367 |
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Current U.S.
Class: |
250/309; 250/310;
432/60; 250/398 |
Current CPC
Class: |
H01J
37/256 (20130101); H01J 37/228 (20130101) |
Current International
Class: |
H01J
37/252 (20060101); H01J 37/256 (20060101); H01j
037/26 () |
Field of
Search: |
;250/309,310,311,396,398 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Lawrence; James w.
Assistant Examiner: Anderson; B. C.
Attorney, Agent or Firm: Brisebois & Kruger
Claims
1. A microbeam probe apparatus comprising an ion or an electron
particle source (10) for producing an essentially collimated
primary beam (12) of charged particles having a relatively high
energy,
a charged particle objective system including first and second sets
of electrodes (26, 24--24, 22) to produce first and second
electrostatic lens fields of short focal lengths in first and
second areas of space respectively, said fields being positioned to
be transversed by the path of said primary beam 12 in the order
named,
a diaphragm (32) having a fine aperture (34) positioned between
said first and second areas of space,
a conductive surface (16) comprising a sample area to be
investigated positioned in spaced relationship near said second set
of electrodes on the side thereof, remote from said first set,
means for biasing said electrodes of said first and second sets,
and said conductive surface to
a. produce first and second electrostatic lens fields which
cooperate to focus said primary beam through said aperture (34)
into a small spot on said sample area,
b. cause secondary charged particles, which emerge from said sample
area under the action of said primary beam to accelerate towards
said second set of electrodes, and be focused by said second lens
field into a focus area within said aperture (34),
c. and collimate said secondary particles passing through said
opening into a secondary beam (40) of relatively low energy
traveling in a direction essentially opposite to that of said
primary beam (12), and
deflecting means (62) acting on said primary and secondary beams to
deflect said relatively low energy secondary beam (40) away from
the path of said primary beam while leaving said relatively high
energy primary beam
2. The apparatus according to claim 1 wherein said first set of
electrodes comprises first and second apertured electrodes (26, 24)
transversed by the path of the primary beam (12) in the order
named; said second set of electrodes comprises said second
electrode (24) and a third apertured electrode (22) transversed by
the path of said primary beam 12 in the order named; said second
electrode having a substantial thickness in the direction of said
beam path to form a substantially field-free space within its
aperture; said aperture diaphragm (32) being positioned within
3. Apparatus according to claim 1 wherein said first electrode (26)
is of annular shape; said second electrode (24) has the form of a
relatively thick plate which has a bore having a portion of large
diameter facing said first electrode, and a contiguous annular
portion of smaller diameter, and said third electrode (22) has the
shape of an apertured
4. Apparatus according to claim 3 in which the apertured diaphragm
(32) is
5. Apparatus according to claim 1 further including first
deflecting means positioned to deflect the primary beam across said
sample surface, and second, auxiliary deflecting means positioned
near said objective system between said objective system and said
first deflecting means to compensate for lateral shifts of said
primary beam caused by said first
6. Apparatus according to claim 1 further comprising a
light-optical system of the Schwarzschild type for observing said
sample area of said surface; said light-optical system comprising a
first reflecting surface (56) on the side of the third electrode
(22) facing said second electrode (24), and a second reflecting
surface (58) on the side of said second electrode (24) facing said
third electrode (22) to deflect a light beam extending from said
sample area to an observer.
Description
The present invention relates to a microbeam probe, that is to say
a device in which a desired portion (test field) of the surface of
an object to be examined (test sample) is bombarded with an
intensely concentrated beam of particles (electron beam or ion
beam), and in which the secondary particles evaporated or otherwise
released from the surface are delivered to an analyzing device,
which consists in general of a mass spectrometer or the like. A
microbeam probe usually includes a particle source, which delivers
a substantially parallel, or possibly slightly divergent beam of
primary rays (the angle of divergence being, for example, smaller
than 5.degree., and preferably smaller than about 1.degree.), an
objective with at least one microbeam optical lens for focussing
the primary bundle of rays upon a small test field of the surface
to be investigated, and an electrode arrangement, whereby the
secondary particles which are generated in the test field by the
bundle of primary rays may reach the analyzing device.
In the known microbeam probes the secondary particles which are to
be investigated are in general accelerated away from the test field
in a lateral direction (that is to say along a path which forms an
angle to the axis of the primary beam) (see, for example, German
Offenlegungschrift 1,937,482). On this account the distance between
the objective and the test sample, and therefore also the focal
length of the objective, must be relatively large in order to allow
space for accommodating the electrode arrangement of the secondary
beam optical system, accelerating the secondary particles away from
the test field and making it possible for these to be completely
detected (quantitatively). On the other hand however it is
desirable to make the focal length of the objective as small as
possible, this being for two reasons. In the first place the degree
of reduction achievable by the objective is the greater, the
shorter is the focal length, this reduction being in fact the ratio
of the diameter of the primary particle source, or of the region of
smallest cross section of the bundle of primary rays (crossover
point, intermediate focus) and the diameter of the test sample
impinged upon by the primary beam. Secondly, in the case of a
microbeam lens, in particular an electrostatic lens, its spherical
aberration decreases with the focal length, that is to say as the
focal length decreases the space angle increases, from which the
primary particles can be focussed into a test field of desired
diameter, and accordingly the greater becomes the current density
in the test field.
Accordingly the present invention takes as its basic purpose the
provision of a microbeam probe having an objective of substantially
shorter focal length than that of the known microbeam probes
without detracting from a comprehensive quantitative detection of
the charged secondary particles and the transfer thereof into an
analyzing device.
According to the present invention this problem is solved by a
microbeam probe of the above mentioned type in which the objective
comprises two rotationally symmetrical electrostatic lenses of
short focal length arranged in series and an intervening apertured
diaphragm; these lenses as well as the surface to be investigated
being so dimensioned and arranged with respect to the energy of the
beam of primary particles that this beam is focussed onto the test
field by the combined action of the electrical fields of the
objective -- whilst the diaphragm functions as an aperture
diaphragm for the primary beam. At the same time the secondary
particles generated in the test field are focussed in the aperture
of the apertured diaphragm by the further lens constituted by the
electrodes of the second lens of the objective and the conductive
surface, and are also collimated by the first lens of the objective
to form an at least substantially parallel beam of secondary
particles, which latter beam leaves the objective in a direction
which is substantially opposite to that of the bundle of primary
rays, and between the primary beam source and the objective there
is arranged a device for generating a deflecting field, which
separates the primary beam from the secondary beam by virtue of the
different acceleration voltages of the particles of these
beams.
By the expression "lens of short focal length" there is to be
understood preferably a lens whose focal length is of the same
order of magnitude as the free diameter of the bored electrodes
associated with the lens.
Therefore, in the microbeam probe according to the present
invention the secondary particles are accelerated opposite to the
direction of the primary beam and are delivered to the analyzing
device by the same electrodes which also form the objective for the
primary beam. Because an intermediate focus or crossover region of
the secondary ray beam lies in the plane of the diaphragm defining
the aperture of the primary beam, a high intensity of the secondary
beam is ensured. The objective of the microbeam probe according to
the present invention can have a focal length of 5 mm and less,
whilst an objective focal length of less than 30 mm cannot be
obtained with the known microbeam probes operating with secondary
particle analysis. Having regard to the achievable reduction and
the acceptable space angle, the microbeam probe according to the
invention represents a substantial advance over the state of the
art.
The microbeam probe is not restricted to a particular sign of the
particles, but on the contrary, given suitable poling of the bias
voltages, can operate with an electron beam as well as with a
primary ion beam, and independently thereof can detect positive or
negative secondary particles.
Further extensions and modifications of the invention are
characterised in the subordinate claims.
A practical example of the invention will be explained in more
detail with reference to the accompanying drawings, in which
FIG. 1 is a somewhat simplified, partly cut away, side elevation of
the electrode system of a microbeam probe according to one
practical example of the invention;
FIG. 2 is a sectional elevation of the objective and a portion of
an adjacent spherical condenser of the microbeam probe according to
FIG. 1 on an enlarged scale as compared thereto;
FIG. 3 is a still further enlarged cross sectional elevation of a
part of the objective of the microbeam according to FIG. 1 and 2;
and
FIG. 4 is a sectional elevation of a part of the objective of the
microbeam probe according to FIGS. 1 to 3, somewhat expanded in the
horizontal direction as compared with FIG. 3, and with an
indication of the path of the primary beam and the secondary
beam.
The electrode system represented in FIG. 1 is in practice arranged
in an evacuable vacuum vessel, which is accessible through a lock,
through which there may be introduced an object having the surface
to be investigated. The electrode system contains a primary beam
source 10 which is indicated only schematically, which can be
designed in any known manner and which delivers a primary beam 12
of ions or electrons. The primary beam has a region of minimum
cross section determined by the primary ray source or a crossover
region (intermediate focus) of the primary beam, which by means of
a microbeam optical objective, shown only schematically at 14 in
FIG. 1, is imaged upon a surface 16 of a test object which is to be
investigated. The test field bombarded by the primary beam 12 can
be scanned in known manner by two sets 18 and 20 of electrostatic
deflecting plates effecting a raster type deflection over the
surface to be investigated (like the motion of the electron beam
over the picture screen of a television tube).
The objective comprises three mutually insulated bored electrodes
22, 24 and 26, as may be seen particularly from FIG. 3. The test
surface 16 to be examined, which should be electrically conductive
or coated with a conducting layer, is arranged closely adjacent
under the bore of the electrode 22 at the object side. When using a
primary ray beam consisting of ions, the electrode 26 is preferably
placed at earth potential (U.sub.3 = 0), the electrode 24 is placed
at high voltage (for example U.sub.2 = -20 kV), the electrode 22 at
a relatively low voltage (for example U.sub.1 = -500V) and the test
surface 16 is placed at the potential which should correspond to
the exit energy of the secondary particles (for example U.sub.0 = +
1 kV).
The potential values and signs given here as an example will apply
when positive secondary particles are to be investigated.
The fields 28 and 30 here schematically represented between on the
one hand the electrodes 26 and 24, and on the other hand the
electrodes 24 and 22, function as condenser lenses. By suitable
choice of the ratio of U.sub.2 to the energy of the primary ray
beam 12, the result can be achieved that the primary ray beam is
focussed upon the test surface 16 by the combined action of these
two lenses 24-26 and 22-24, as is represented in FIG. 4. This
condition can be achieved both for positive as well as for negative
primary particles in the energy range between about 5 and 25kV.
Between the two lenses there is situated within the relatively
thick electrode 24 a short space which is free of field. In this
position there is arranged an apertured diaphragm 32 with a fine
opening 34, which serves for defining the aperture of the primary
beam 12. The arrangement of the apertured diaphragm is most
favourable at this position, because under the conditions of the
raster type deflection of the primary beam the deviation of the
beam path from the lens axis remains small in both lenses.
In respect of the secondary particles (that is to say ions in the
example here considered), which proceed from the test fields 36
(FIG. 4) impinged upon by the focussed primary beam, the conducting
surface 16, the electrode 22 and the electrode 24 function as an
electrostatic lens in the form of a triode system, whose field can
be so adjusted by suitable choice of potential of the electrode 22
that the secondary beam emitted from the test field 16 is focussed
in a crossover region, which lies in the plane, that is to say the
aperture 34, of the diaphragm 32. The magnitude of the aperture 34
determines the maximum possible exploration field of the test
surface 16, that is to say the field under view. So long as one
remains within this field of view, all of the secondary particles
pass with adequate initial energies through the diaphragm 32. In
respect of the secondary ions, the field between the electrodes 24
and 26 functions as a retarding immersion lens, whose lower focal
plane coincides with the plane of the apertured diaphragm 32.
Because the secondary beam has a crossover region at this position,
the beam is formed by this lens into a parallel beam. By virtue of
the raster type of deflection of the primary beam, there takes
place a corresponding periodic angular deflection of this parallel
beam. This can be removed, in respect of one deflection coordinate,
by a electrical field E between the two auxiliary deflection plates
38 synchronised with the raster deflection, so that the emerging
secondary beam 40 (FIG. 4) only moves parallel to itself. The same
applies for the other coordinate of the raster deflection, which is
compensated by a field between auxiliary deflecting plates 42.
It is possible to employ either positive or negative primary
particles, and independently thereof positive or negative secondary
particles can be brought out for analysis. The poling of the bias
voltages at the electrodes 22 and 24 and the test surface 16
depends upon the sign of the secondary particles which are used.
The poling is so selected that the secondary particles are
accelerated between the surface 16 and the electrode 24. When
investigating positive secondary ions, the electrode 24 therefore
receives a negative bias voltage with respect to the surface 16,
whilst in the case of investigation of negative secondary ions or
secondary electrons, the electrode 24 must be positive with respect
to the surface 16. The condition that the primary beam must be
focussed upon the test surface, permits of fulfilment in both cases
and for primary particles of both signs (positive or negative ions,
electrons), by suitable choice of the energy of the particles, that
is to say the accelerating voltage.
From FIG. 2 it is clear how the objective can be constructed from
the mechanical viewpoint. For the purpose of mutual electrical
insulation of the metal parts forming the three electrodes 22, 24
and 26, there is provided a single insulator 44, which includes a
flange-like portion, which mutually insulates the electrodes 22 and
26, and an annular portion with an inwardly projecting edge, in
which the electrode 24 is seated in an insulated manner. For the
sake of clearness the leads to the electrodes are not shown. The
effective portion of the electrode 22 has the shape of a
comparatively thin plate (FIG. 3), whilst the electrode 24 is
comparatively thick. The bore of the electrode 24 has, at its
object side, a cylindrical part 46 of smaller diameter and a
contiguous portion 48 of larger diameter. At the step formed
between the two parts 46 and 48 there is positioned the diaphragm
32 in the form of a disc. The electrode 26 has the shape of a tube,
with a somewhat constricted end and contains the auxiliary
deflecting plates 38, 42. The objective may, as shown in FIG. 2,
contain a light microscopic device of the black screen type for
observing the surface 16 under test. The observation device
comprises, in a known manner, an annular concave mirror 48, a
convex mirror 50, which includes a bore for the beam of particles,
and a similarly bored deflecting mirror 52. The path taken by the
light beam 54 is shown in FIGS. 2 and 3. The known observation
devices of this type cannot however be directly employed in the
presently described microbeam probe on account of the short focal
length objective and the correspondingly small electrode spacing
distances. Accordingly, in the presently described microbeam probe
the light ray beam is deflected in the manner shown in FIG. 3 by
means of two reflecting surfaces 56 and 58 which are either formed
by the upper side of the electrode 22 and the under side of the
electrode 24 respectively or are arranged upon said electrodes, so
that the beam can pass from the concave mirror 48 through the
aperture of the electrode 22. The electrode 24 is provided with
cavities 60 of ring sector shape for the light beam.
The separation of the primary beam 12 and the secondary beam 40 can
be effected externally of the objective, for example, by means of a
spherical condenser 62 (a condenser with plates in the form of
portions of spherical surfaces), which deflects the secondary beam
40 emitted by the objective 14 out of the path of the primary beam
12, which condenser may, for example, be the constituent part of a
double focussing mass spectrometer (see for example German
Offenlegungschrift 2,031,811). The outer plate of the spherical
condenser 62 has a bore 64 proceeding in the direction of the
objective axis, through which the primary beam 12 enters. Because
the energy of the primary beam 12 is substantially greater than
that of the secondary beam 40, the primary beam suffers only a
slight deflection in passing along the short length of path through
the spherical condenser 62, which deflection can be compensated by
applying a suitable bias voltage to the pair of deflecting plates
20.
The lens fields 28 and 30 (FIG. 3) operate upon the primary beam
like a composite objective, which in the practical example here
represented has a focal length of about 5 mm. The known types of
microbeam probe, which work upon secondary particle analysis, have
focal lengths of at least 30 mm. Thus the presently described
microbeam probe represents a substantial technical advance as
compared with the state of the art.
* * * * *