U.S. patent number 3,767,539 [Application Number 05/186,548] was granted by the patent office on 1973-10-23 for acid galvanic copper bath.
This patent grant is currently assigned to Schering AG. Invention is credited to Wolfgang Clauss, Hans-Gunther Todt.
United States Patent |
3,767,539 |
Clauss , et al. |
October 23, 1973 |
ACID GALVANIC COPPER BATH
Abstract
Acid aqueous electrolytes for the deposition of bright,
low-tension, ductile copper coatings containing organo selenium
compounds are used.
Inventors: |
Clauss; Wolfgang (Berlin,
DT), Todt; Hans-Gunther (Berlin, DT) |
Assignee: |
Schering AG (Berlin and
Bergkamen, DT)
|
Family
ID: |
5786940 |
Appl.
No.: |
05/186,548 |
Filed: |
October 4, 1971 |
Foreign Application Priority Data
|
|
|
|
|
Oct 29, 1970 [DT] |
|
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P 20 53 860.7 |
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Current U.S.
Class: |
205/298; 205/294;
205/296 |
Current CPC
Class: |
C25D
3/38 (20130101) |
Current International
Class: |
C25D
3/38 (20060101); C23b 005/20 () |
Field of
Search: |
;204/52R,52Y,44 ;106/1
;117/13E |
References Cited
[Referenced By]
U.S. Patent Documents
Other References
H Koretzky, IBM Tech. Disclosure Bulletin, Vol. 9, No. 11, Apr.
1967..
|
Primary Examiner: Kaplan; G. L.
Claims
What is claimed is:
1. In an acidic electrolyte for the electrodeposition of copper
essentially consisting of water, sources of copper ions and of
hydrogen ions, and a brightening composition in an amount
sufficient to increase the luster of copper electrodeposited from
said electrolyte, the improvement in said brightening composition
which comprises at least one compound of the formula R.sub.1 -
(Se).sub.n - R.sub.2 or a salt thereof, the amount of said compound
or salt being between 0.0005 g and 0.5 g per liter of said
electrolyte, in said formula R.sub.1 and R.sub.2 being identical or
different, R.sub.1 being a radical of mono- or multi-substituted
aromatic, aliphatic, cycloaliphatic, araliphatic, or heterocyclic
hydrocarbon, R.sub.2 being a radical of a mono- or
multi-substituted aromatic, aliphatic, cycloaliphatic, araliphatic,
or heterocyclic hydrocarbon, cyano or the sulfonic acid group, at
least one of said R.sub.1 and R.sub.2 containing a sulfonic acid
group, and n being 1 or 2.
2. In an electrolyte as set forth in claim 1, the amount of said at
least one compound being not more than 0.1 g per liter of said
electrolyte.
3. In an electrolyte as set forth in claim 1, said sources having
respective anionic moieties selected from the group consisting of
sulfate, fluoborate, and phosphate.
4. Electrolyte according to claim 1, wherein R.sub.1 is phenyl,
nitrophenyl, alkylphenyl, alkoxyphenyl, carboxyphenyl,
carbmethoxyphenyl, dimethylaminophenyl), alkylmercaptophenyl,
aminophenyl, alkyl containing from 2 to 8 carbon atoms, benzyl,
phenoxyalkyl, sulfolanyl, furyl, cyclohexylalkyl, pyridylalkyl,
carboxyalkyl, dihydroxypropyl, sulfoalkyl containing 2 to 6 carbon
atoms, sulfophenyl, alkoxysulfophenyl, alkylmercapto-sulfophenyl,
halogen-sulfophenyl, sulfonaphthyl, di-sulfonaphthyl or
sulfophenyl-alkyl, R.sub.2 is sulfoalkyl containing 2 to 6 carbon
atoms, sulfophenyl, alkoxysulfophenyl, alkylmercapto-sulfophenyl,
halogen-sulfophenyl, sulfonaphthyl, disulfonaphthyl or
sulfophenylalkyl.
5. An electrolyte according to claim 1, wherein R.sub.1 is
sulfoalkyl containing 2 to 6 carbons atoms, sulfophenyl,
alkoxysulfophenyl, alkylmercapto-sulfophenyl, halogen-sulfophenyl,
sulfonaphthyl, disulfonaphthyl, sulfonphenylalkyl, R.sub.2 is the
cyanide or the sulfonic acid group, and n is the number 1.
Description
The invention relates to an acid aqueous electrolyte for the
deposition of bright, low-tension, ductile copper coatings.
It is known that certain organic substances can be added in small
quantities to acid copper electrolytes, particularly the most
widely used sulfuric acid types, in order to obtain bright copper
coatings instead of a crystalline, dull deposition. There have been
proposed for this purpose chiefly organic thio compounds, such as
thio-alkanosulfonic acids (German Pat. No. 1,037,80l), derivatires
of acid sulfur containing phosphorus derivatives (German Pat. No.
1,168,208, No. 1,196,464, No. 1,201,152), and organic sulfides
containing at least one sulfonic acid in mixture or in chemical
bond with a polyether (German Pat. application No. 1,521,062).
These thio compounds, however, often adversely affect the working
of the acid electrolytes and the properties of the copper
precipitates deposited therefrom. Thus, for example, in certain
current density ranges the deposits turn out with black streaks due
to the formation of copper sulfide, or there are deposited coatings
having a high hardness or high internal macro tensions, which show
an inferior corrosion behavior, especially under mechanical
stresses. Many of the organic thio compounds, moreover, are very
critical in their proportioning and must be added to the
electrolyte in a very narrow concentration range if coatings with
constant properties are to be obtained.
The problem underlying the invention herein, therefore, is to
prevent the formation of black, streaky depositions and to make
possible the precipitation of lustrous, low tension and ductile
copper depositions of high anti-corrosion value over a wide current
density range.
This problem is solved according to the present invention by using
an acid aqueous copper electrolyte which is characterized by a
content of at least one compound of the general formula
R.sub.1 - (Se).sub.n -R.sub.2
in which R.sub.1 and R.sub.2 are identical or different and
represent possibly a mono- or multi-substituted aromatic,
aliphatic, cycloaliphatic, araliphatic, or heterocyclic hydrocarbon
radical, at least one of the two radicals containing a sulfonic
acid group, or in which R.sub.1 has the above-stated meaning and
R.sub.2 represents the cyanide or the sulfonic acid group and n is
equal to 1 or 2, or the salts thereof.
Especially suitable for this invention are, as additions, those
compounds wherein the above general formula, R.sub.1 is phenyl,
nitrophenyl, alkylphenyl, alkoxyphenyl, carboxyphenyl,
carbmethoxyphenyl, dimethylaminophenyl, alkylmercaptophenyl,
aminophenyl, alkyl containing preferably 2 to 8 carbon atoms,
benzyl, phenoxyalkyl, sulfonlanyl, furyl, cyclohexylalkyl,
pyridylalkyl, carboxyalkyl, dihydroxpropyl, sulfoalkyl containing
preferably 2 to 6 carbon atoms, sulfophenyl, alkoxy-sulfophenyl,
alkylmercapto-sulfophenyl, halogen-sulfophenyl, sulfonaphthyl,
disulfonaphthyl or sulfophenyl-alkyl, R.sub.2 represents sulfoalkyl
containing preferably 2 to 6 carbon atoms, sulfophenyl,
alkoxysulfophenyl, alkylmercapto-sulfophenyl, halogen-sulfophenyl,
sulfonaphthyl, disulfonaphthyl or sulfophenylalkyl, and n is 1 or
2, or in which R.sub.1 represents sulfoalkyl containing preferably
2 to 6 carbon atoms, sulfophenyl, alkoxysulfophenyl,
alkylmercaptosulfophenyl, halogen-sulfophenyl, sulfonaphthyl,
disulfonaphthyl, sulfophenylalkyl, R.sub.2 represents the cyanide
or the sulfonic acid group, and n is the number 1.
The compounds to be used according to the invention are known in
themselves or can be produced by methods known in themselves, as
described for example in HOUBEN-WEYL "Methoden der organischen
Chemie," volume 9 (1955), pages 972 - 1002 and pages 1,086 -
1,099.
Thus the alkyl- or aryl-selenoalkylsulfonic acids can be prepared
by reaction of the respective alkali selenolates with sulfoalkyl
halides.
The symmetrical sulfoalkyl- or sulfoaryl-diselenides are formed,
for example, by hydrolysis of the respective selenoxyanates of the
alkali-alkyl-selenosulfates.
Alkylselenocyanates and, or, respectively, alkylselenosulfates are
formed by reaction of alkyl halides with alkali-selenocyanates or
selenosulfates.
Aromatic selenocyanates are formed by reaction of corresponding
diazonium slats with alakli-selenocyanates.
The characterized compounds are used as such or better in the form
of their salts, e.g. the alkali, ammonium or amino salts. As an
example there may be named the sodium, potassium, ammonium and
triethylammonium salt. The following table lists compounds to be
used according to the invention: ##SPC1## ##SPC2## ##SPC3##
##SPC4##
As additives to be used according to the invention there are
suitable also those compounds which contain, besides a sulfo
group-containing organic radical at the selenium atom, the cyanide
or the sulfonic acid group. These seleno-cyanates or selenosulfates
split in the highly acid copper electrolytes to diselenides, which
then constitute what are actually the active compounds. The
following table lists some such selenocyanates and seleno-sulfates
##SPC5##
As electrolyte for the deposition of copper coatings with the
addition of the substances according to the invention a sulfuric
acid copper sulfate solution of the following composition is
generally used:
Copper sulfate CuSO.sub.4 . 5 H.sub.2 O 125 to 260 g/liter
Sulfuric acid H.sub.2 SO.sub.4 20 to 85 g/liter.
Instead of copper sulfate, other copper salts may be used in toto
or at least in part. The sulfuric acid may be replaced in part or
entirely by fluoroboric acid, phosphoric acid and/or other acids.
The electrolyte may be chloride-free or, and this is usually
advantageous for improving the luster and the leveling, it may
contain chlorides,such as alkali chlorides, or hydrochloric acid in
quantities of from 0.001 to 0.2 g/liter.
The quantities in which the substances according to the invention
must be added to the copper baths in order to achieve an
improvement of the copper deposition are, surprisingly, very low
and amount to about 0.0005 to 0.5 g/liter, preferably 0.0005 to 0.1
g/liter. With these additions one obtains a definite fining of the
grain, in certain current density ranges even lustrous copper
coatings.
The substances according to the invention are also especially
suitable, in conjunction with other common luster-formers and/or
wetting agents, for depositing high-luster coatings which show a
great leveling of rugosities of the base material and yet are very
ductile and possess a high extensibility.
As known additives which can be used together with the substances
according to the invention there are suitable primarily
oxygen-containing high-molecular compounds. The quantities of these
substances that one adds to the copper electrolyte are about 0.01
to 20.0 g/liter, preferably 0.02 to 8.0 g/liter. Table III contains
examples of oxygen-containing high-molecular compounds.
TABLE III
1. polyvinyl alcohol
2. Carboxymethyl cellulose
3. Polyethylene glycol
4. Polypropylene glycol
5. Stearic acid polyglycol ester
6. Oleic acid polyglycol ester
7. Stearyl alcohol polyglycol ether
8. Nonylphenol-polyglycol ether
9. Reaction products of alkylene oxides with amines.
As additional compounds known in the art and which can be added to
the copper electrolyte the following, for example, may be used:
Polymeric phenazonium compounds, polyalkylenimines,
polyvinylamines, polyvinylimidazol, polyvinylpyrrolidone, phenazine
dyes as well as the organic thio-compounds already mentioned.
The following examples will illustrate but not restrict the use of
the substances according to the invention.
EXAMPLE 1
Copper sulfate (CuS0.sub.4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 50 g/liter Di-(3-potassiumsulfopropyl)-diselenide 0.05
g/liter Temperature: 25.degree.C Current density: 4.0 A/dm.sup.2
Stock is mixed by agitation
EXAMPLE 2
Copper fluoroborate (Cu(BF.sub.4).sub.2) 300 g/liter Fluoroboric
acid 20 g/liter 2-(phenylseleno)-ethylsulfonate of sodium 0.3
g/liter Temperature: 25.degree.C Current density: 8.0 A/dm.sup.2
The electrolyte is agitated by injection of air
EXAMPLE 3
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 200 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.03 g/liter
Di-(3-sulfopropyl)-diselenide 0.08 g/liter Temperature: 22.degree.C
Current density: 4.0 A/dm.sup.2 Stock is stirred or agitated
EXAMPLE 4
Copper sulfate (CuSO.sub. 4.5H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
Di-(3-potassiumsulfopropyl)-diselenide 0.01 g/liter Polypropylene
glycol 0.5 g/liter Temperature: 26.degree.C Current density: 5.0
A/dm.sup.2 The stock is mixed by injection of air
EXAMPLE 5
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
Di-(4-sodiumsulfophenyl)-diselenide 0.03 g/liter
Monylphenol-polyglycol ether 4.0 g/liter Temperature: 22.degree.C;
Current desnity: 4.0 A/dm.sup.2 ; Stock is agitated
EXAMPLE 6
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.02 g/liter
Di-(4-methoxy-3-sodiumsulfo-phenyl)-diselenide 0.02 g/liter
Polyethylene glycol 0.2 g/liter Temperature: 22.degree.C Current
density: 5.0 A/dm.sup.2 The mixture is treated by injection of
air
EXAMPLE 7
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 150 g/liter Sulfuric acid,
conc. 30 g/liter Chloride ions 0.03 g/liter
3-(phenylseleno)-propylsulfonate of sodium 0.1 g/liter
Carboxymethyl cellulose 0.1 g/liter Temperature: 22.degree.C
Current density: 3.0 A/dm.sup.2 The stock is agitated
EXAMPLE 8
Copper sulfate (CuSO.sub. 4 .5H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 50 g/liter Chloride ions 0.08 g/liter
3-(benzylseleno)-propylsulfonate of sodium 0.01 g/liter
omega-potassiumsulfohexylselenocyanate 0.02 g/liter
Polyethyleneglycol 0.01 g/liter Temperature: 25.degree.C Current
density: 5.0 A/dm.sup.2 The mixture is treated by injection of
air
EXAMPLE 9
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 30 g/liter Fluoroboric acid 10 g/liter Chloride ions 0.05
g/liter 3-(p-carbmethoxyphenylseleno)-propyl-sulfonate of potassium
0.04 g/liter Oleic acid polyglycol ester 1.0 g/liter Temperature:
25.degree.C Current desnity: 4.0 A/dm.sup.2 The stock is mixed by
agitation or stirring
EXAMPLE 10
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
3-(sulfolanylseleno)-propylsulfonate of potassium 0.06 g/liter
Stearyl alcohol polyglycol ether 1.5 g/liter Temeprature:
25.degree.C Current density: 4.0 A/dm.sup.2 The stock is mixed by
agitation or stirring
EXAMPLE 11
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
3-(m-methylmercaptophenylseleno)-propylsulfonate of potassium 0.02
g/liter Stearyl alcohol polyglycol ether 1.5 g/liter Temperature:
25.degree.C Current desnity: 4.0 A/dm.sup.2 The stock is mixed by
stirring
EXAMPLE 12
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
Bis-(4-sodiumsulfobutyl)-selenide 0.01 g/liter omega-potassium
sulfohexylselenosulfonate of potassium 0.01 g/liter Polypropylene
glycol 0.3 g/liter Temperature: 25.degree.C Current density: 5.0
A/dm.sup.2 The ingredients are mixed by injection of air
EXAMPLE 13
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.03 g/liter
3-(ethyleseleno)-propylsulfonate of sodium 0.08 g/liter
Nonylphenol-polyglycol ether 1.03 g/liter Temperature: 25.degree.C
Current density: 5.0 A/dm.sup.2 The stock is mixed by agitation
EXAMPLE 14
Copper sulfate (CuSO.sub. 4.5H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.03 g/liter
3-(octylseleno)-propylsulfonate of potassium 0.1 g/liter
Polypropylene glycol 0.3 g/liter Temperature: 30.degree.C Current
density: 5.0 A/dm.sup.2 The stock is mixed by stirring
EXAMPLE 15
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
omega-potassiumsulfoethylselenocyanate 0.05 g/liter Stearic acid
polyglycol ester 2.0 g/liter Temperature: 25.degree.C Current
density: 4.0 A/dm.sub.2 The ingredients are mixed by injection of
air
EXAMPLE 16
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.05 g/liter
omega-potassiumsulfoethylselenosulfonate 0.02 g/liter of potassium
Polyethylene glycol 2.0 g/liter Temperature: 25.degree.C Current
density: 5.0 A/dm.sup.2 The ingredients are mixed by injection of
air
EXAMPLE 17
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.04 g/liter omega-potassium
sulfoethylselenosulfonate of potassium 0.03 g/liter Nonylphenol
polyglycol ether 1.0 g/liter Temperature: 25.degree.C Current
desnity: 4.0 A/dm.sup.2 The ingredients are mixed by injection of
air
EXAMPLE 18
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 200 g/liter Sulfuric acid,
conc. 50 g/liter Chloride ions 0.06 g/liter
p-(sodiumsulfo)-benzylselenocyanate 0.06 g/liter
Nonylpenol-polyglycol ether 2.0 g/liter Temperature: 20.degree.C
Current density: 3.0 A/dm.sup.2 The ingredients are mixed by
injection of air
EXAMPLE 19
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 220 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.04 g/liter
7-(sodiumsulfo)-2-naphthylseleno-cyanate 0.02 g/liter Stearyl
alcohol polyglycol ether 1.5 g/liter Temperature: 25.degree.C
Current density: 4.0 A/dm.sup.2 The ingredients are mixed by
injection of air
EXAMPLE 20
Copper sulfate (CuSO.sub. 4.5 H.sub.2 O) 200 g/liter Sulfuric acid,
conc. 60 g/liter Chloride ions 0.04 g/liter
4-methoxy-3-sodiumsulfo-phenyl-selenocyanate 0.06 g/liter
Polyethylene glycol 0.6 g/liter Temperature: 25.degree.C Current
density: 5.0 A/dm.sup.2 The ingredients are mixed by injection of
air
* * * * *