U.S. patent number 3,763,392 [Application Number 05/218,496] was granted by the patent office on 1973-10-02 for high pressure method for producing an electrodeless plasma arc as a light source.
This patent grant is currently assigned to Charybdis Inc.. Invention is credited to Donald D. Hollister.
United States Patent |
3,763,392 |
Hollister |
October 2, 1973 |
HIGH PRESSURE METHOD FOR PRODUCING AN ELECTRODELESS PLASMA ARC AS A
LIGHT SOURCE
Abstract
Method of generating an electrodeless plasma arc as a light
source including confining a plasma-forming gas such as xenon
within a quartz sphere, pressurizing while confining the gas, and
generating of power exteriorally of the container so as to develop
an induction field extending through the container and into the gas
such that the gas is ionized as a plasma arc within the
container.
Inventors: |
Hollister; Donald D.
(Placentia, CA) |
Assignee: |
Charybdis Inc. (Irwine,
CA)
|
Family
ID: |
22815360 |
Appl.
No.: |
05/218,496 |
Filed: |
January 17, 1972 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
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063870 |
Aug 14, 1970 |
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Current U.S.
Class: |
315/248; 313/571;
313/161; 313/607 |
Current CPC
Class: |
H01J
65/048 (20130101); H05H 1/46 (20130101) |
Current International
Class: |
H01J
65/04 (20060101); H05H 1/46 (20060101); H01j
061/12 (); H05b 041/24 () |
Field of
Search: |
;313/184,220,221,224,225,227,226,161 ;315/248 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
Primary Examiner: Demeo; Palmer C.
Parent Case Text
CROSS-REFERENCES TO RELATED APPLICATIONS
This application is a continuation of application Ser. No. 63,870,
filed Aug. 14, 1970, and now abandoned.
Claims
I claim:
1. Method for producing an electrodeless plasma arc as a high
intensity light source comprising:
A. confining a plasma-forming gas within an electrodeless
container;
B. pressurizing said plasma forming gas to at least one
atmosphere;
C. generating radio-frequency electromagnetic energy exteriorally
of said container, so as to develop magnetically an induction field
extending through said container and into said gas, such gas is
ionized as a plasma arc suspended within said container
independently of the walls of said container;
D. further including pressurizing said gas, limiting frequency and
magnitude of induction field so that the discharge of said plasma
arc is of lesser diameter than the diameter of said container.
2. Method for producing an electrodeless plasma arc as in claim 1,
wherein said plasma forming gas is xenon.
3. Method for producing an electrodeless plasma arc as in claim 2,
wherein the gravitational buoyance of said ionized xenon is
counteracted by use of a less dense, light background gas selected
from the group consisting of argon, neon, helium, and hydrogen.
4. Method for producing an electrodeless plasma arc as in claim 1,
wherein said plasma forming gas is mercury vapor.
5. Method for producing an electrodeless plasma arc as in claim 1,
wherein said plasma forming gas is an alkali metal vapor.
Description
BACKGROUND OF THE INVENTION
This invention relates to the specific application of an
electrodeless arc discharge to the production of high intensity
radiation, including radiation in the visible, ultraviolet, and
infrared bands, and to a specific, integrated system design for the
efficient recovery, direction, and projection of such radiant
energy, both for purposes of lighting and for radiant heating, and
for combinations thereof in application. There are two basic types
of luminous systems; however, no clear-cut delineation exists
between them. One type is a system which is optically limited by a
stop or a set of stops and is called an "aperture-limited" system.
Examples of aperture-limited systems are given by narrow-beam
searchlights and projection and similar systems. The other type of
luminous system is optically limited by the source itself and is
called a "source-limited" system. Typical examples of
source-limited systems are floodlights and industrial luminaires.
The preferred embodiment of the present invention is an
aperture-limited system; however, source-limited forms of the
invention exist.
RF induction plasmas (electrodeless arcs) have not as yet found
significant application as illumination sources. Most known studies
of the electrodeless arc have reported the use of gas throughflow
as being required for discharge stability, but the power loss
suffered by the discharge system through the forced convection of
high enthalpy plasma from the discharge seriously degrades the
efficiency with which an electrodeless arc that is struck in a
flowing gas can radiate. Gas throughflow recently was found
unnecessary for discharage stability; therefore, a convective loss
need not be present in an electrodeless arc. The resulting
stationary discharge dissipates electrical energy and balances this
against conductive wall-transport, radiation, and a relatively
small internal convective circulation in a sealed-off discharge
vessel. Radiation conversion efficiences (i.e., rf power to
radiated power) as high as 90 percent have been computed for such
systems, and efficiences as high as 65 percent actually have been
measured in prototype devices using xenon as the discharage gas.
The present invention enables an approach to the theoretical limit
for radiation production efficiency and enables the fabrication of
the novel and useful luminaries and hybrid ilumination/heating
systems.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a fragmentary perspective view of an electrodeless plasma
arc assembly showing a quartz sphere positioned axially with
respect to a radio-frequency coil, the plasma arc having been
developed as a white light source within the sphere;
FIG. 2 is a transverse section of an electrodeless arc radiation
production system developed as a white light source;
FIG. 3 is a circuit diagram of a circuit for limiting magnitude and
frequency, so as to regulate the discharge parameters of the plasma
arc;
FIG. 4 is a simplified circuit diagram, showing a vacuum tube
circuit for energizing the apparatus in FIG. 3; and
FIG. 5 is a simplified circuit digram, showing a solid state
circuit for energizing the apparatus shown in FIG. 4.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The electrodeless discharge described herein is a gaseous discharge
occuring within the volume of a solenoid that carriers high
frequency current. The axially directed alternating magnetic field
inside the solenoid induces an alternating azimuthal electric field
in accordance with Faraday's law, and azimuthal currents, driven by
this field, ohmically heat the gas and maintain ionization within
the discharge. The discharge can be produced in a gas in the
absence of central mass-flow, under which conditions it is
self-stabilizing through a balance of electrodynamic and
thermodynamic forces. This balance occurs subject to a condition of
existence for the electrodeless arc that is based on a principle of
minimum entropy production and is independent of the
discharge-vessel wall boundary conditions; hence, the discharge is
not attached to the wall or any other physical boundary, but,
rather, obtains a circular cross-section normal to the direction of
the induction field and is suspended within the discharge vessel
near the axial position at which the induction field has the
greatest magnitude. Upon application of the miniumum required
"discharge maintenance power," and in the absence of gravity and
gravitational effects, the shape of the plasmoid "fireball" would
be approximately spherical; however, in practice, a somewhat
flattened discharge is observed in a pure gas at pressures greater
than atmospheric. This effect is most pronounced in the heavier
gases (i.e., xenon) and is attributable to the buoyancy of the
discharge in the unionized background gas. Mixtures of gases,
therefore, are often employed to offset plasma buoyancy, such as
xenon illuminant in an argon, neon, or hydrogen atmosphere, it
having been found that the gas with the lesser ionization potential
will break down within such a mixture while the background gas will
exhibit little or no participation in the electrical or radiative
transport phenomena which occur. Application of power in excess of
the minimum discharge maintenance power causes an elongation of the
plasma, forming a constricted plasma column, or thermal
"pinch."
The electrodeless arc has been found to exhibit a three-dimensional
set of operational characteristics which are exploited in the
invention to produce a novel optical source with unique properties
which is highly versatile in its operation. This development is
based on the fact that the physical parameters which actually
specify the electrodeless arc, that is, those parameters which
determine both the discharge energy balance and the internal
electric and thermodynamic distribution functions, are the gas in
which the discharge is formed, its pressure and the magnitude and
frequency of the induction field impressed on the discharage. Thus,
given a discharge gas at a given pressure, one is enabled to adjust
the total dissipation and the discharge temperature profile (hence,
the discharge radiation and its color temperature) by adjusting the
magnitude and frequency of the induction field. Since these
parameters are capable of adjustment by means entirely external to
the discharge, the discharge radiation output and color temperature
are externally adjustable.
In the preferred embodiment of the invention, the gas in which the
electrodeless arc is struck is contained at high pressure within a
sealed, spherical envelope 10 made of quartz glass, which is
hereinafter referred to as the "source". The source is positioned
within an optically reflecting cavity including reflector 22 and
lens 24, which is coaxial with the high frequency induction coil 18
of the electrodeless arc generator. The reflecting cavity has a
shape and curvature which depend on the system's intended
application. In this description, the cavity is assumed to have
spherical shape, and the source is concentrically positioned within
the cavity such that radiation emitted by the source is reflected
back into the discharge wherever it strikes the reflecting wall
surface. The choice of a spherical reflecting chamber in this
disclosure is intended for purposes of demonstration and
information, rather than for purposes of suggesting an application.
The essential feature of the reflecting chamber is manifest by the
presence of a high-pressure electrodeless arc-discharge at a focal
position within the chamber. The discharge is maintained at
conditions of pressure and temperature such that it is optically
thick, and, hence, can reabsorb its own radiation. Under these
circumstances, the discharges obtain a nearly rectangular
temperature profile and require appreciably less maintenance power
than would be required in the absence of the reflecting chamber.
The high pressure source is cooled by liquid flow. A suitable
coolant at high pressure enters the bottom area of the reflecting
chamber and flows by the spherical source, removing heat from the
source envelope by conduction, and exits the chamber at the top.
Heat is removed from the coolant by means of a heat exchange
mechanism that is completely sealed. The induction coil 18 is
mounted in such a manner as to surround the reflecting chamber and
is cooled by liquid throughflow which can be provided either by
means of the source-cooling system or an additional, independent
cooling system. The coil is embedded within a glass-cloth
tape-wound structure which has been wound under tension about the
reflecting chamber, thereby compressively stressing the chamber.
This method of assembly tends to offset the tensile stress placed
on the chamber by the high-pressure coolant, which, itself, places
the spherical source under a compresive load and, thus, enables the
electrodeless arc discharge which is contained within this
spherical source to operate at a pressure in excess of that allowed
by the tensile strength of quartz. An opening in the reflecting
cavity allows a fractiom of the total radiant emission to leave the
cavity and enter a modified Cassegranian optical system where it
impinges on a hyperbolic or similarly shaped reflecting surface and
is redirected onto an additional relfecting surface of suitable
curvature for the formation of an optical beam.
The liquid coolant can incorporate absorbing material for
specialized application. Thus, a completely covert infrared
illuminator would require a coolant which passes infrared and
absorbs radiation in the UV and visible bands. Similar principles
apply to UV and white light illuminators.
In the source-limited configuration of the invention, the spherical
(or equivalent) reflecting chamber is absent and is replaced by a
conventional optical projection system. The induction coil in this
configuration is wound about the reflector to avoid shadowing
effects. Convective cooling of the source is employed in this
configuration.
Discharge vessels for the electrodeless arc plasma source are
classified according to the application to which the discharge
plasma is put. Several examples of discharge vessel are presented
below for purposes of illustration. These are only "typical" cases
and are not intended to express or imply limits of applicability in
any way. Thus, the discharge vessel for an electrodeless arc light
source would require no provision for throughflow because a
convective mode of energy transport, if present, would degrade the
discharges radiation production efficiency. The simplest and most
easily fabricated discharge vessel for employment as an
electrodeless arc source of white light is a quartz sphere into
which a predetermined amount of illuminant gas has been sealed.
When properly sized according to the intended operating frequency
and power level, such sealed-off sources yield discharge plasmas of
approximate spherical shape which do not contact the walls of the
quartz discharge vessel. Such a source 10 and its coil 18 and
electrodeless arc discharge 16 are shown in FIG. 1. The white light
source 10 in general will contain a heavy gas at high pressure -
xenon, for example, at several atmospheres pressure when at STP. A
source designed for UV production may include a mercury or similar
seeding material or pure mercury initially at a relatively low
partial pressure, while a highly efficient electrodeless arc IR
source is provided by the discharge in cesium (or a similar alkali
metal) vapor at approximately one atmosphere pressure. Because of
the chemical activity of hot alkali metals in quartz, however, the
discharage vessel for the IR production application is best
fabricated of sapphire (presently available in cylinder form only)
or one of several similar appropriate commercial ceramics.
* * * * *