U.S. patent number 3,748,089 [Application Number 05/253,601] was granted by the patent office on 1973-07-24 for treating articles for a controlled duration.
Invention is credited to Lynn F. Boyer, Charles R. Fegley, Anderson F. Johnson, Jr..
United States Patent |
3,748,089 |
Boyer , et al. |
July 24, 1973 |
TREATING ARTICLES FOR A CONTROLLED DURATION
Abstract
In a method and apparatus for baking photoresist on
semiconductor slices, the length of baking time is controlled
independently of the number of slices being baked or the position
of the first slice placed on a rotary baking table. The position of
the first slice is detected photoelectrically and marked with a
magnet. The magnet actuates a combination selector-stepping switch
each revolution of the rotary table. Continuity through the switch
after a preselected number of revolutions initiates slice removal
and, thereby, controls the baking time. BACKGROUND OF THE INVENTION
1. Field of the Invention This invention relates to methods and
apparatus for treating articles for a controlled duration and, more
particularly, for baking photoresist on semiconductor slices for a
predetermined time. 2. Description of Prior Art In the manufacture
of semiconductor devices, slices of semiconductor material must be
coated with a photosensitive material or a photoresist which is
exposed to an image of the device or devices to be reproduced in or
on the semiconductor slice. The photoresist is then developed and
baked so that the portions remaining after development become a
very adherent mask. This mask protects portions of the
semiconductor slice in the shape of a desired image. In prior
methods, the photoresist was baked on the slices by placing the
slices on a baking means, such as a hot plate which had reached a
predetermined stable temperature and setting a buzzer to signal the
time when the slices should be removed from the hot plate. That is,
the slices were manually loaded on the hot plate, manually timed,
and manually unloaded. Such manual handling of slices is
undesirable because of potential damage that may be caused by it.
Also, this manual handling is costly and manual timer setting is
subject to mistakes. It is desirable, therefore, to automate the
loading of slices onto the baking means, the control of the baking
time, and the unloading of the slices. This is most easily done by
making the baking means rotate and yield the advantage of
automatically returning any slices placed on it to the starting
point to be removed. Some prior art methods control the number of
revolutions or length of time by means of a magnet fixed to a disc,
a sealed contact, and a counter-timer. The magnet operates the
sealed contact and a counter counts during the time interval which
a timer permits. However, where it is possible to rotate a baking
means at constant speed, the length of baking time may be governed
by controlling the number revolutions of the baking means. This
yields the further advantage of eliminating the timer as such. As
is well known in the semiconductor and thin film art, the
photoresist must be baked to achieve the adherence and toughness
necessary to withstand the processing involved in the manufacture
of thin film and semiconductor devices. The adherence and toughness
improve with length of baking time; so much so, that the
photoresist becomes difficult to remove if baked too long. There is
an advantage, therefore, to limiting the baking to some
predetermined amount which provides the best compromise between
adherence and ease of removal. This advantage is achieved by
identifying the location of the first slice placed on the baking
means so that the baking time of it and all other slices following
it in sequence, may be precisely controlled. SUMMARY OF THE
INVENTION Accordingly, an object of the invention is to provide new
and improved methods and apparatus for treating articles for a
controlled duration. With this and other objects in view, the
present invention contemplates a method for treating articles, such
as semiconductor slices coated with photoresist. The articles are
automatically loaded on a heated, endless, constant-speed conveyor
and the location of the first article on the conveyor is detected.
Then, a marker is positioned on the conveyor in response to the
detection and in relation to the first article. Next, a
selector-stepping switch is actuated by the marker and continuity
is established through the actuated switch after a preselected
number of cycles of the endless conveyor and, therefore, a
preselected treating time has occurred. Finally, both the marker
and articles are removed in response to the continuity to terminate
the treatment after the controlled duration. A suitable apparatus
for practicing the contemplated invention provides a rotary table
for transporting the slices through a predetermined number of heat
treating cycles. A photocell detector and relay are provided
adjacent the table to detect the location of the first slice loaded
on the table. A magnet holder, responsive to the photocell detector
and relay, is provided for placing the magnet on the table in
relation to the first slice to mark or identify it. The magnet
actuates a combination selector-stepping switch which is provided
for energizing the magnet holder to remove the magnet and
initiating slice removal to end the treatment.
Inventors: |
Boyer; Lynn F. (Reading,
PA), Fegley; Charles R. (Laureldale, PA), Johnson, Jr.;
Anderson F. (Sinking Spring, PA) |
Family
ID: |
22960944 |
Appl.
No.: |
05/253,601 |
Filed: |
May 15, 1972 |
Current U.S.
Class: |
432/52 |
Current CPC
Class: |
G03F
7/40 (20130101) |
Current International
Class: |
G03F
7/40 (20060101); F27b 009/16 () |
Field of
Search: |
;432/51,52,57 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Camby; John J.
Claims
What is claimed is:
1. A method of treating articles, wherein the duration of treatment
is controlled by a marker, which comprises the steps of:
a. placing a series of the articles on an endless conveyor for
treatment;
b. detecting the location of the first article of the series of
articles placed on the conveyor;
c. positioning the marker on the conveyor in response to the
detection of the location to identify such location;
d. actuating a switching device by means of the marker to count the
number of cycles completed by the endless conveyor and to establish
continuity through the switching device when a predetermined number
of cycles has been completed; and
e. removing the marker and the articles from the conveyor to
terminate the treatment, in response to the continuity and
beginning with the first article as identified by the marker.
2. The method of claim 1 wherein the marker is dropped on the
conveyor.
3. The method of claim 2 wherein the marker is magnetic.
4. The method of claim 1 wherein there is only one article in the
series.
5. The method of claim 1 wherein the switching device is a
combination selector-stepping switch.
6. The method of claim 5 wherein the articles are semiconductor
slices coated with photoresist and the treatment is baking the
photoresist.
7. The method of claim 6 wherein the endless conveyor is a rotating
table.
8. The method of claim 7 wherein the magnetic marker operates a
sealed contact to actuate the switching device.
9. A method of baking photoresist on semiconductor slices, wherein
the length of baking time is controlled by a magnetic marker, which
comprises of steps of:
a. positioning a selector portion of a selector-stepping switch to
a preselected contact representing the number of revolutions of a
rotary table which will yield the desired length of baking
time;
b. rotating the table to sequentially receive a plurality of slices
from a carrier;
c. conveying the slices sequentially from the carrier into each of
a plurality of slices positions on the rotary table;
d. heating the table to bake the photoresist on the slices;
e. detecting the position of the first slice;
f. dropping a magnetic marker on the rotary table in alignment with
the first slice to mark its position;
g. positioning a magnetic flux sensitive switch adjacent the rotary
table, the switch being aligned with a carrier at an unload station
and capable of operating the stepping portion of the
selector-stepping switch;
h. actuating the flux-sensitive switch by means of the magnetic
marker to operate the stepping portion of the selector-stepping
switch each revolution of the table until continuity is established
through the preselected contact;
i. lifting the magnetic marker from the table in response to the
continuity; and
j. removing the slices from their positions on the table in
response to the continuity, starting with the first slice, to
terminate the baking of the photoresist on each slice at the end of
the preselected length of time.
10. An apparatus for treating articles, which comprises:
a. means for transporting the articles through a predetermined
number of treating cycles;
b. means for loading the articles sequentially on the transporting
means;
c. means for detecting the first article loaded on the transporting
means;
d. means for marking the location of the first article;
e. means, responsive to the detecting means, for placing the
marking means on the transporting means at the beginning of
treatment, to mark the location of the first article, and for
removing the marking means at the end of treatment;
f. means, responsive to the marking means, for controlling the
number of treating cycles the first article makes and thereby the
total duration of the treatment of the articles; and
g. means, responsive to the cycle controlling means, for removing
the articles sequentially from the transporting means beginning
with the first article marked by the magnet.
11. An apparatus, as recited in claim 10, wherein the means for
marking the location of the first article comprises a permanent
magnet positioned in relation to the first article.
12. An apparatus, as recited on claim 11, wherein the transporting
means comprises a rotary table.
13. An apparatus, as recited in claim 12, wherein the means for
detecting the first slice comprises a photocell and a photoelectric
relay.
14. An apparatus, as recited in claim 13, wherein the means
responsive to the detecting means comprises a solenoid having a
plunger which may be raised or lowered to position the marking
means in relation to the first article.
15. An apparatus, as recited in claim 14, wherein the means
responsive to the marking means comprises a sealed contact and
combination selector-stepping switch.
16. An apparatus, as recited in claim 15, wherein the articles are
photoresist coated semiconductor slices and the treatment comprises
baking the photoresist.
17. An apparatus for baking photoresist on semiconductor slices,
which comprises:
a. a base;
b. a rotary table supported by the base and having baking positions
for baking the photoresist on the slices;
c. a loading station for loading the slices sequentially into each
baking position;
d. a photocell detector to determine the baking position of the
first slice;
e. a combination selector-stepping switch for selecting the number
of revolutions through which the table is to be rotated, and for
counting the revolutions of the table to control the baking
time;
f. a marker, positionable on the table to mark the location of the
first slice;
g. a switch, operated by the marker once each revolution, to
actuate the stepping portion of the selector-stepping switch and
count the revolutions of the table;
h. a marker holder, aligned with and responsive to the photocell
detector for positioning the marker on the table in line with the
first slice and responsive to the selector-stepping switch for
removing the marker from the table after the preselected number of
revolutions;
i. an unloading station adjacent the table to receive the baked
slices; and
j. means for removing the slices sequentially from the table,
beginning with the first slice, and conveying the slices into the
unloading station in response to the selector-stepping switch,
thereby ending the slice baking.
18. An apparatus for baking photoresist on semiconductor slices,
which comprises:
a. a base;
b. a rotary table supported by the base for baking the photoresist
on the slices, the table having a heated upper level and a lower
level;
c. a loading station adjacent the upper level of the table for
loading slices sequentially into a baking position for each slice
on the table;
d. a photocell detector adjacent the upper level of the table to
determine the baking position of the first slice;
e. a combination selector-stepping switch for selecting the number
of revolutions through which the table is to be rotated and
counting the revolutions to control the baking time, continuity
therethrough being established when the preselected number of
revolutions have been counted;
f. a magnet, positionable on the lower level of the table, to mark
the location of the first slice;
g. a flux-sensitive switch, adjacent the lower level of the table,
the switch being closed by the flux of the magnet once each
evolution of the table to actuate the stepping portion of the
selector-stepping switch to count the number of revolutions;
h. a magnet holder adjacent the lower level of the table and
aligned with the photocell detector, the holder being responsive to
the photocell detector for depositing the magnet on the lower level
of the table, and responsive to continuity through the combination
selector-stepping switch for removing the magnet from the table
after the preselected number of revolutions;
i. an unload station adjacent the upper level of the table to
receive the baked slices; and
j. means for removing the slices sequentially from the table,
beginning with the first slice, and conveying the slices into the
unloading station in response to continuity through the
selector-stepping switch, thereby ending the slice baking.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
The invention can be understood best from the following more
detailed description taken in conjunction with the accompanying
drawings:
FIG. 1 is an isometric view, partially cut away, of a semiconductor
slice coated with photoresist;
FIG. 2 is an isometric view, partially cut away, of an apparatus
for baking the photoresist on the semiconductor slices;
FIG. 3 is a plan view of the apparatus showing how some of the
parts are arranged around the center of the apparatus;
FIG. 4 is a plan view of a load station and baking position showing
how the slices are conveyed to their baking position on a rotary
table;
FIG. 5 is a cross section along line 5--5 of FIG. 4, of the load
station and baking position;
FIG. 6 is an electrical schematic showing how a selector switch and
stepping switch are connected to form a combination
selector-stepping switch, how a sealed contact operates the
stepping switch, and how the combination operates to remove the
slices and the marker magnet to end the baking;
FIG. 7 is a partial cross section, along line 7--7 of FIG. 3,
showing a marker magnet and magnet holder in elevation, for placing
the magnet on and lifting it off a rotary table;
FIG. 8 is a partial cross section, along the line 8--8 of FIG. 3,
showing the marker magnet on the table and an adjacent sealed
contact which operates the stepping switch;
FIG. 9 is a plan view of an unload station and baking position;
and
FIG. 10 is a cross section of the unload station and baking
position along the line 10--10 of FIG. 9.
DETAILED DESCRIPTION
Methods and apparatus embodying the invention will be described in
connection with baking photoresist on semiconductor slices.
However, it is to be understood the invention may be used for other
articles.
Referring now to FIG. 1, a silicon slice 18 is coated with a
photoresist 20 to form a coated slice designated generally by the
numeral 22. The photoresist 20 may be that sold by the Eastman
Kodak Company under the trade designation"KPR."
The photoresist 20 may be baked best with a rotary apparatus, refer
to FIG. 2, in which a base 23 supports a rotary table 24 having an
upper level 25 and a lower level 26. The upper level 25 is
indirectly heated from below by convection and radiation and its
proximity to a plate 27 which is directly heated by a heater 28,
e.g., a 1,000 watt Chromalox No. A-90 ring heater. In this way, the
coated slices 22 are heated from the bottom and the photoresist 20
is baked outward from its contact with the slice 18 so that gas
bubbles are not trapped in it. The upper level 25 is Teflon coated
and is rotated at a constant speed, e.g., one r.p.m. The constant
speed provides uniform heating of the upper level 25 by the plate
27 and permits the number of revolutions to determine the total
heating or baking time in minutes. For example, 20 revolutions will
yield a 20 minute total baking time.
Both the upper level 25 and lower level 26 are fixed to a vertical
shaft 30 so that they rotate together as a unit, i.e., the table
24, when the shaft 30 is revolved by a drive motor 31.
Referring now to FIGS. 3, 4 and 5, there is shown a load station
34, which is part of a stationary table 35, for loading photoresist
coated slices 22 into baking positions 36 on the upper level 25 of
the table 24. The slices 22 are handled in carriers 38 and one of
these carriers, having the slices to be baked, is inserted in the
vertical indexing mechanism of a load station sender, designated
generally by the numeral 39, of the type sold for that purpose by
the Industrial Modular Systems Corporation. The slices 22 are
evenly spaced in the carrier 38 and are removed therefrom by an air
conveyor 40 which includes plenum 42, nozzles 44 facing toward the
center of rotation, and a solenoid valve 46.
There are a plurality of baking positions 36, e.g., twenty-five,
only some of which are shown. The baking positions 36 include
guides 48; stops 50; and three plenums, one plenum 52 having
nozzles 54 directed toward the center of rotation and two plenums
56 having nozzles 58 directed away from the center of rotation.
Air is admitted to the load station plenum 42 and baking position
plenum 52 by the solenoid valve 46 via connections 60 and 61,
orifice 62 and port 64; and it flows out through the nozzles 44 and
54, respectively. This air is preheated by passage through tubing
65, attached to the plate 27, refer to FIG. 2, so that it will not
cool the upper level 25. Since the nozzles 44 and 54 are directed
toward the center of rotation, the slice 22 is conveyed by air from
the sender carrier 38 to the baking position 36 where it lodges
against the stop 50. The stop 50 is off center, as shown, in order
to prevent bouncing of the slice 22. Further understanding of this
may be had from L. F. Boyer and A. F. Johnson, Jr. "Air Bearing
Stop," technical digest, Western Electric Company, Issue 20,
October 1970, pages 13 and 14.
Sequential loading of the slices 22 onto the upper level 25 of the
table 24 may start at any baking position 36. However, the baking
position 36, into which the first slice 22 is loaded, must be
identified so taht the start of baking and the number of
revolutions of the table 24, and thereby the total baking time, may
be controlled.
The location of the first slice 22 and its baking position 36 may
be determined by means of a photocell detector 66. The detector 66,
refer to FIGS. 2, 3 and 6, projects light downward toward the upper
level 25 and receives any light reflected back again. If enough
light is reflected back, as when a slice 22 passes beneath the
detector 66, the reflected light activates the detector 66 which
operates a photoelectric relay 67, FIG. 6, and causes a magnet 68
to be dropped on the lower level 26 of the table 24. Thus, the
magnet 68 marks the position of the first slice 22 above on the
upper level 25.
The total baking time for the photoresist 20 is obtained by
processing the slice 22 through enough bake cycles (revolutions of
the table 24) to add to the total baking time desired. Control of
the number of revolutions of the table 24 and thereby, the total
baking time is achieved, preferably, by a switching device in the
form of a combination selector-stepping switch 70.
Referring to FIG. 6, a selector arm 72 of the switch 70 may be set
to contact any one of the plurality of selector contacts 74; e.g.,
a contact 74h as in FIG. 6, which will yield the correct number of
revolutions as determined from the desired baking time and known
speed of the table 24. The contacts 74a to 74j are connected in
parallel to like stepping contacts 76a to 76j, i.e., the selector
contact 74a is connected to the stepping contact 76a, the selector
contact 74b is connected to the stepping contact 76b, etc.
A stepping arm 78 is fixed to a ratchet wheel 80 or the equivalent,
and a pawl 82, actuated by a solenoid 84, moves the ratchet wheel
80 and, thereby, the stepping arm 78. Each time the solenoid 84 is
energized the arm 78 steps from one contact 76 to another.
The magnet 68, refer to FIG. 8, which is placed on the lower level
26 of the table 24 to mark the position of the first slice 22 may
be a disc or ring of permanent magnet material, preferably a ring
of Alnico V or the like about 7/8 inch O.D. .times. 3/8 inch I.D.
.times. 1/4 inch thick, magnetized axially.
When the lower level 26 rotates and the magnet 68 is resting on it,
the magnet passes a sealed contact 86 which is sensitive to the
flux of the magnet. The sealed contact 86 is a hermetically-sealed,
normally-open, flux-sensitive switch, sometimes called a dry reed
switch in the art, which is closed by the magnetic flux when the
magnet 68 is adjacent to it. Switch closure occurs which the first
slice 22 is above the sealed contact 86, because the first slice 22
is on the upper level 25 of the table 24 above the marker magnet
68. Since the contact 86 is positioned along the same radius as an
unload station 88, refer to FIG. 3, each closure of the contact 86
signals both: that one revolution of the table 24, and therefore
one bake cycle, has been completed; and that the first slice 22 is
at the proper location to be conveyed from its baking position 36
into the carrier 38 at the unload station 88.
The magnet 68 is picked up from and dropped into a groove 89 in the
lower level 25 of the table 24 by a magnet holder 90. The magnet
holder 90, refer to FIG. 7, includes a solenoid 92 having a
vertically moving plunger 94, and a nonmagnetic separator plate 96.
The holder 90 is in radial alignment with the detector 66, refer to
FIG. 3, and its solenoid 92 lifts the plunger 94 from or drops it
onto the nonmagnetic separator plate 96. The plunger 94 is magnetic
but not permanently magnetizable. When the plunger 94 is on the
plate 96, the magnet 68 resting in the annular groove 89 of the
lower level 26 of the table 24 will attract itself to the plunger
and lift itself a short distance up against the underside of the
nonmagnetic separator plate 96. Thus, the magnet 68 will remain
suspended free of the lower level 26 as long as the solenoid 92
remains unenergized. When the solenoid 92 is energized, such as
when the photocell detector 66 detects a slice 22 and actuates the
associated electrical circuit, the solenoid lifts the plunger 94
far enough to make the space between the end of the plunger and the
separator plate 96 so large that the force of attraction between
the magnet 68 and the plunger becomes too weak to support the
magnet. Consequently, the magnet 68 drops into the groove 89 on the
lower level 26 of the table 24.
For best results, solenoid 92 should be supplied with the current
connected so that the magnetic field of the solenoid is in the
opposite direction to that of the magnet 68. This may be
accomplished with a rectifier 93. The magnet 68 may be placed at
any position in the groove 89 around the lower level 26 by
energizing and de-energizing the solenoid 92 at the appropriate
time.
It is to be noted that the magnet 68 could be placed on and removed
from the upper level 25. However, the use of the lower level 26
removes the contact 86 and magnet holder 90 from the heat above the
upper level 25 and, thereby, increases the life of these
components.
Although the foregoing method of picking up the magnet 68 is
preferred, there are other well known ways to pick it up. For
example, a vacuum nozzle may be substituted for the plunger 94 and
the vacuum controlled by a solenoid valve to pickup or drop the
magnet 68 as desired. In addition, a disc with a reflective surface
may be substituted for the magnet 68 and a photocell detector
substituted for the sealed contact 86 to achieve results similar to
the much less costly sealed contact and magnet.
In any case, when the presence of the first slice 22 loaded on the
upper level 25 of the table 24 is detected, the magnet 68, or its
equivalent, is dropped on the lower level 26 at the same angular
position as the slice, refer to FIG. 3, because the holder 90 is
aligned along the same radius as the detector 66. The magnet 68
remains in this position marking or identifying the location above,
of the slice 22 on the upper level 25.
The stepping arm 78 of the switch 70 is connected to one side of a
voltage source 100, refer to FIG. 6, and the selector arm 72 is
connected to the other side through: a solenoid valve 102, a time
delay relay 104, and a sealed contact 106; and a relay 108. When
the selector arm 72 is set to contact 74h, as in FIG. 6, and the
table 24 revolved eight times to cause the magnet 68 to close the
sealed contact 86 eight times, the stepping arm 78 is on contact
76h, relay 108 is actuated, normally open contacts 113 are closed,
and the solenoid valve 102 is in condition to be operated by
closure of the sealed contact 106. The contact 106 may be located
any whole number of baking positions 36 away from the center line
of the unload station 88. Also, when arms 72 and 78 are on contacts
74h and 76h, respectively, continuity ensues and the relay 108
opens its normally-closed contacts 110 to disconnect the magnet
solenoid 92 from the source of voltage. This drops the plunger 94
onto the separator plate 96 so that the magnet 68 attaches itself
to the underside of the plate. Thus, the holder 90 removes the
magnet 68 in response to continuity through the selector-stepping
switch 70.
The valve 102, refer to FIGS. 9 and 10, admits preheated air both
to: an unload station conveyor 111, having a plenum 112 with
nozzles 114 directed toward the carrier 38, through a connection
116; and the two plenums 56 in the upper level 25 through two
connections 117, two orifices 118 and two entrance ports 120. The
air is preheated by passage through tubing 121 attached to the
underside of the plate 27. Each orifice 118 aligns with its
respective port 120 at the same time that the baking position 36
aligns with the unload station 88. Consequently, air flowing out
the nozzles 58 and 114 conveys the slice 22 from the baking
position 36 to the carrier 38 which is indexed vertically by the
index mechanism of an unload station receiver, generally designated
by the numeral 122, identical to the sender 39.
A plurality of magnets 123, refer to FIG. 3, are fixed to the upper
level 25, one at each baking position 36 approximately on its
centerline. The magnets 123 may be 1/8 inch diameter by 1 inch long
rod magnets such as type CR-400 - 1 sold by Indiana General
Corporation. Each magnet 123 closes the sealed contact 106 as each
baking position 36 aligns with the unload station 88. The air valve
102 is made to operate at the precise time that the orifices 118
are aligned with the ports 120 and the baking position 36 is
aligned with the unload station 88, by adjusting the time delay
relay 104. Thus, the slices 22 are conveyed one after the other,
i.e., sequentially, from the baking positions 36.
Although sealed contacts, such as contact 106, operated by the rod
magnets 123 are preferred because no rubbing surfaces are involved,
the sealed contacts may be replaced by microswitches having
followers bearing against the upper level 25 of the table 24 and
the magnets may be replaced by rods or the equivalent made of
material other than magnet material. As is known in the art, the
rods will act as cam lobes which will operate the microswitches.
Thus, cam lobes and microswitches will replace magnets and sealed
contacts but, of course, are subject to much more wear.
OPERATION
The operation of the baking apparatus may be understood best by:
referring to FIGS. 2, 3 and 6; assuming that the speed of rotation
of the table 24 is 1 rpm; and assuming that the photoresist 20 must
be baked for five minutes. The schematic diagram of FIG. 6 does not
show the circuits for the drive motor 31 or heater 28 because these
are well known in the art.
The arm 72 of the selector-stepping switch 70 is set to contact
74e, the fifth contact from OFF; the heater 28 and motor 31 are
energized; and the upper level 25 of the table 24 is allowed to
rotate in the direction of the arrow until thermal equilibrium is
reached.
When equilibrium is reached, a sender switch 124 is closed so that
the sender 39 and solenoid valve 46 are connected to the voltage
source 100 through sealed contacts 126 and 128, respectively. The
contact 128 is closed by one of the magnets 123 and operates the
valve 46 admitting air to the load station 34 and baking position
36. This removes the first slice 22 from the sender carrier 38.
Precise timing so that the valve 46 operates when the load station
34 and baking position 36 are aligned, is achieved by adjustment of
a time delay relay 129.
Contact 126 closes, following closure of contact 128, and indexes
the sender 39 mechanism one step downward. This lowers the next
slice 22 into position to be conveyed or sent into the next baking
position 36. The closure of contact 126 occurs after closure of
contact 128 because the sealed contact 126 is located one and one
half baking positions 36 beyond the contact 128 in the direction of
rotation (see FIG. 3). However, if the switch 124 is closed when
the table 24 rotation is such that two of the magnets 123 are
between the sealed contacts 128 and 126, the carrier 38 in the
sender 39 may index downward and break a slice 22 before air is
admitted to the sender conveyor 40. This may be prevented by a
sealed contact 130, time delay relay 132 and a relay 134 having
contacts 136. When switch 124 is closed, the contacts 136 of relay
134 are open until the sealed contact 130 is closed by a magnet
123. This sealed contact is located adjacent the upper level 25 a
few degrees in advance of contact 128, e.g., about 5.degree. (or
any even number of baking positions plus 5.degree.). Closure of
contact 130 energizes the time delay relay 132 which, in turn,
energizes the relay 134 for about 1.4 seconds. During this interval
the orientation of the magnets 123 with respect to the sealed
contacts 128 and 126 is such that they will be operated in that
order, i.e., the proper sequence. Thus, the slices 22 are
sequentially removed from the sender carrier 38 and placed in
adjacent baking positions 36, by sequentially operating the sealed
contact 128 first and the contact 126 second. Baking then takes
place at the temperature of the upper level 25.
The position 36 of the first slice 22 loaded on the upper level 25
is detected by light reflected from the slice back into the
photocell detector 66, which is a part of a photoelectric relay 67.
Reflected light seen by the photocell detector 66 causes the relay
67 to energize the magnet-holder solenoid 92 and the plunger 94 to
be lifted. The magnet 68, as a consequence, drops to the lower
level 26 and marks the position of the first slice 22.
The first slice 22 will have been carried through essentially one
revolution and one baking cycle when it arrives at the unload
station 88. The sealed contact 86, positioned adjacent the lower
level 26 in line with the station 88, is closed by the marker
magnet 68 and energizes the stepping-switch solenoid 84 to move the
arm 78 to the first contact 76a. This is repeated as the table 24
rotates until, at the end of five minutes, the arm 78 establishes
electrical continuity from one side of the voltage source 100
through the relay 108, the arm 78 itself, the contact 76e, the
contact 74e and the selector switch arm 72 to the other side of the
source. This energizes the relay 108 which opens the normally
closed contacts 110, de-energizes the magnet-holder solenoid 92,
drops the plunger 94 and lifts;the magnet 68 from the lower level
26. At the same time, the relay 108 resets photoelectric relay 67
and closes its normally open contacts 113 to connect the unload
solenoid valve 102 to the voltage source. Thus, each time one of
the magnets 123 closes the sealed contact 106, the valve 102 admits
air to the baking position 36 and the unload station 88. This
conveys the first slice 22 into the receiver carrier 38 and ends
the baking of the photoresist 20 for that slice. Shortly
thereafter, one of the magnets 123 closes a sealed contact 138,
refer to FIG. 3, which energizes the indexing mechanism of the
receiver 122 once and raises the receiver carrier 38 one step into
position to receive the next slice 22. This is repeated until all
slices are removed in sequence. Then, the selector-stepping switch
70 is reset so that the next lot of slices may be baked.
It is to be noted that the slices may be baked starting with the
table 24 in any position and a wide range in baking times may be
had by proper choice of the speed of the table and the number of
contacts for the selector-stepping switch 70.
Thus, a method and apparatus for carrying out the method have been
disclosed for treating articles for a controlled duration
independently of the number of articles or where the first one is
placed on the apparatus.
While specific embodiments have been described in the foregoing
specification to illustrate the invention, it will be understood
that the invention is not limited to these embodiments. Various
changes and modifications may be made without departing from the
spirit and scope of the invention.
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