U.S. patent number 3,656,454 [Application Number 05/092,359] was granted by the patent office on 1972-04-18 for vacuum coating apparatus.
This patent grant is currently assigned to Air Reduction Company, Incorporated. Invention is credited to Robert L. Schrader.
United States Patent |
3,656,454 |
Schrader |
April 18, 1972 |
**Please see images for:
( Certificate of Correction ) ** |
VACUUM COATING APPARATUS
Abstract
Vacuum coating apparatus is described wherein substrates to be
coated supported on a substrate holder are moved into and from a
coating chamber through ingress and egress vacuum locks, and
wherein the coating chamber is maintained under continuous vacuum.
A substrate holder support carriage is disposed in each of the
respective vacuum locks, means reciprocate each carriage between
its associated vacuum lock and the coating chamber and further
means is operable to remove or deliver a substrate holder with
respect to said carriages.
Inventors: |
Schrader; Robert L. (Castro
Valley, CA) |
Assignee: |
Air Reduction Company,
Incorporated (New York, NY)
|
Family
ID: |
22232846 |
Appl.
No.: |
05/092,359 |
Filed: |
November 23, 1970 |
Current U.S.
Class: |
118/724; 118/719;
118/728; 118/733; 414/939; 118/725; 118/729; 414/217 |
Current CPC
Class: |
C23C
14/505 (20130101); H01L 21/67754 (20130101); C23C
14/566 (20130101); Y10S 414/139 (20130101) |
Current International
Class: |
C23C
14/56 (20060101); C23C 14/50 (20060101); C23c
013/08 () |
Field of
Search: |
;118/47-50.1,500,503,620
;214/1NQ ;266/4B ;335/288 ;204/297M ;294/65.5 ;269/8 ;198/1NQ
;134/1NQ ;317/1NQ |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Kaplan; Morris
Claims
What is claimed is:
1. Vacuum coating apparatus comprising, a coating chamber, a
support device within said coating chamber for engaging and
supporting at least one substrate holder therein at a position for
coating substrates held thereon, a vapor or ion source within said
coating chamber, means for maintaining said coating chamber under
continuous vacuum, a pair of vacuum locks operable to communicate
with said coating chamber and with regions outside said coating
chamber, a pair of carriages for supporting substrate holders
thereon at a position to be engaged by said support device when one
of said carriages is in said coating chamber, and means located
entirely within each of said vacuum locks and structurally
connected to respective ones of said carriages for reciprocally
moving each of said carriages between a respective one of said
vacuum locks and said coating chamber to transfer substrate holders
into and out of said coating chamber said support device being
operable to remove said substrate holders from respective ones of
said carriages.
2. Apparatus according to claim 1 wherein said means for
reciprocally moving said carriages comprise a pair of crank arm
mechanisms.
3. Apparatus according to claim 1 including a shutter positioned
between said vapor or ion source and the coating position for
blocking off vapor or ions when substrates are being moved to and
from the coating position.
4. Apparatus according to claim 1 including heating means in at
least one of said vacuum locks for heating substrates prior to
coating.
5. Apparatus according to claim 1 including cooling means in at
least one of said vacuum locks for cooling substrates subsequent to
coating.
6. Apparatus according to claim 1 wherein said vapor or ion source
is mounted on a plate, and wherein said plate is removable from
said coating chamber to facilitate replacement of said source.
7. Apparatus according to claim 1 wherein said support device
includes magnetic means for engaging and disengaging the substrate
holders.
Description
This invention relates to vacuum coating apparatus and, more
particularly, to vacuum coating apparatus capable of meeting the
need for high production rates for a wide variety of substrates and
coatings.
The coating of substrates within a high vacuum has been recognized
for some time as being a highly advantageous one in many
applications. For example, vacuum coating may be used to provide
non-metallic coatings for the control of optical properties of
lenses, zinc or aluminum coated papers and plastics for electrical
capacitors and decorative applications, refined high pressure
metals, the production of metallic foils, and various other
applications where high purity or unusual alloy compositions are
desirable.
A typical vacuum coating system includes a vacuum tight enclosure
in which a vapor source or sputtering cathode is positioned. The
vapor source may comprise a crucible or boat in which molten metal
is contained and wherein the molten metal is heated by a resistance
heated filament. Where longer production runs, high evaporation
rates, or high purity is desired, electron beam evaporation may be
employed. Typically, in electron beam evaporation, the evaporant is
contained within a cooled crucible so that the material to be
evaporated is insulated from the crucible by a solid skull of its
own composition. The material in the crucible is heated by
directing an electron beam or a plurality of electron beams at the
surface of the material.
In addition to the vapor source or sputtering cathode, the
substrate to be coated is also positioned within the vacuum
enclosure. Frequently it is desirable to rotate or otherwise move
the substrate with respect to the vapor source or sputtering
cathode in order to ensure uniformity of deposition over the entire
surface of the substrate, or with respect to other adjacent
substrates. In many cases, the substrate or several substrates may
be suitably mounted to a device for supporting and moving the
substrate or substrates in the vapor or sputter ion flow prior to
the time the vacuum enclosure is evacuated. Such arrangements, most
often comprising the well known bell jar type of vacuum enclosure,
are usually unsatisfactory for high production rates. This is
because the vacuum enclosure must be pumped down for each new
substrate or batch of substrates which are to be coated.
Accordingly, it is an object of the present invention to provide
improved vacuum coating apparatus.
Another object of the invention is to provide vacuum coating
apparatus capable of very high production rates.
Another object of the invention is to provide vacuum coating
apparatus in which it is unnecessary to pump down the vacuum
coating chamber for each new substrate or batch of substrates which
are to be coated.
Other objects of the invention will become apparent to those
skilled in the art from the following description, taken in
connection with the accompanying drawings wherein:
FIG. 1 is a schematic full section view of vacuum coating apparatus
constructed in accordance with the invention; and
FIGS. 2, 3 and 4 are views similar to FIG. 1 illustrating the
sequence of operation of the apparatus of FIG. 1.
Very, generally, the apparatus of the invention comprises a coating
chamber 11 and a support device 12 within the coating chamber for
supporting at least one substrate holder 13 therein at a position
for coating a substrate or substrates (not shown) held thereon. A
vapor or ion source 15 is provided within the coating chamber and
means 16 are provided for maintaining the coating chamber under a
continuous vacuum. A pair of vacuum locks 17 and 18 communicate
with the coating chamber through the sides thereof. Transfer means
19 and 21 are provided for moving substrate holders between each of
the vacuum locks and the coating chamber to a position in the
coating chamber to be engaged by the support device.
Referring now more particularly to FIG. 1, the vacuum coating
system illustrated schematically therein includes a vacuum tight
enclosure 20 defining the coating chamber 11 in which the vacuum
coating operation takes place. The chamber 11 is evacuated through
a duct 25 in the lower wall of the enclosure 20 by the vacuum
maintaining means 16 which comprise a suitable vacuum pump. An
opening 29 is provided in the top wall of the enclosure 20 for
accommodating the support device 12, explained more fully
below.
The source 15 in the illustrated embodiment comprises a vapor
source although it is to be understood that a source of sputter
ions such as a sputtering cathode could also be used. A water
cooled copper crucible 31 has a plurality of coolant passages 32
therein through which coolant is circulated by suitable means, not
shown. As a result of the cooling, a skull 35 of solidified
evaporant material forms between the cooled crucible 31 and a
molten pool 37 from which the vapor for coating is produced. The
molten pool is heated by an electron beam 39 produced by an
electron beam gun 41. The electron beam gun may be of the type
shown in U.S. Pat. No. 3,177,535 assigned to the assignee of the
present invention. Means, not shown, are provided for establishing
transverse magnetic fields in order to deflect the beam 39 through
the curving path illustrated to impinge upon the top of the molten
pool 37. By positioning the electron beam gun 41 beneath the
crucible, the gun is less susceptible to impingement of vapor
particles thereon which would deleteriously affect its
operation.
Ingress and egress to and from the chamber 11 are provided by a
pair of vacuum valves 43 and 45. The vacuum valve 43 includes a
pair of walls 47 and 49 forming a valve chamber 51. Openings 53 and
55 are provided in the walls 47 and 49, respectively, thereby
forming a port through which objects may pass into the chamber 11.
A valve plate 57 is movable in the chamber 51 in a sealed
relationship with the walls 47 and 49 by means of a pneumatic
actuator 59 having an extensible actuator rod 61 attached to the
valve plate 57. The valve plate 57 is shown in its closed position
in FIG. 1, thereby maintaining the valve 43 in the closed
condition. The valve 45 is identical to the valve 43 and is
illustrated in FIG. 1 in the closed condition.
In order to pass objects through the vacuum valve 43 into the
chamber 11 without having to bring the chamber 11 up to atmospheric
pressure, the vacuum lock 17 is provided. Similarly, in order to
remove objects from the chamber 11 without having to bring the
chamber 11 up to atmospheric pressure, the vacuum lock 18 is
provided. The vacuum lock 17 communicates with the chamber 11
through the valve 43 and the vacuum lock 18 communicates with the
chamber 11 through the valve 45.
The vacuum lock 17 includes an evacuated chamber 67 which is
evacuated through a port 69 in the lower wall of the chamber 67 by
a suitable vacuum pump 71. The vacuum lock 18 includes a vacuum
tight chamber 73 which is evacuated through a port 75 in the lower
wall thereof by a vacuum pump 77. A vacuum valve 79 identical with
the vacuum valve 43 is disposed at the opposite end of the vacuum
lock 17 from the valve 43. A similar vacuum valve 81 closes the end
of the vacuum lock 18 opposite the vacuum valve 45. Thus, the locks
17 and 18 may be opened to the atmosphere without loss of vacuum in
the chamber 11 provided that the valves 43 and 45 are closed at
appropriate times. Flow of materials into and out of the chamber 11
may be on a straight line basis for production efficiency and the
use of the vacuum locks enables loading and unloading of substrates
while at the same time other substrates are being coated in the
chamber 11.
In order to support a substrate or substrates for coating, one or
more substrate holders 13 are provided. One of the substrate
holders 13 is illustrated in FIG. 1 and is dome shaped and the
substrates, not shown, are attached to the concave side of the
substrate holder. The illustrated transfer means 19 is a cart
having a plurality of wheels 87. The wheels 87 are guided on a
track 89 which extends through the vacuum lock 17, the chamber 11,
and the vacuum lock 18 to facilitate the straight line throughput
arrangement for moving the substrates through the vacuum system.
The substrate holder 13 is at least partially ferromagnetic for
reasons which will be explained below. In the particular design of
the substrate holder illustrated in FIG. 1, a ferromagnetic plate
95 is secured to the top of the holder and constitutes the
ferromagnetic part of the substrate holder.
In operating the apparatus of the invention, the chamber 67 is
evacuated and the cart 19 is moved through the open valve 43 into
the chamber 11 with a substrate holder 13 supported on the cart, as
shown in FIG. 2. The support device 12 is employed to support the
substrate holder 13 within the chamber 11 independently of the cart
19. In this manner, the cart may be removed from the chamber 11
prior to beginning the vacuum coating operation. During many vacuum
coating operations, it is desirable to rotate or otherwise move the
substrates being coated within the vapor flow in order to assure
uniformity of deposit. This is because the amount of vapor and
hence the amount of condensation of the vapor on the substrates in
different regions of the chamber may vary. Pseudo random exposure
of the substrates to all regions of the vapor will aid in achieving
uniform coating thicknesses and quality. In order to provide for
picking up the substrate holders and for rotating them within the
chamber during coating, the support device 12 is provided with an
armature 96 which depends from an actuator 97 into the chamber and
which is axially as well as rotatably movable by suitable means in
the actuator 97. An electromagnet 98 is attached to the armature
96. Suitable energization of the electromagnet 98 causes the magnet
to magnetically engage and secure to the metallic plate 95 on the
substrate holder 19. The armature may then be raised axially to
raise the substrate holder off of the carriage and to rotate it
within the chamber once the carriage is removed. This is shown in
FIG. 3. A support device suitable for use as the support device 12
is shown and described in co-pending application Ser. No. 21,837,
assigned to the present assignee.
In operating the apparatus of the invention, the substrate holder
is first brought into the coating chamber on the cart 19. The
electromagnet 98 is in the raised position by appropriately
actuating the support device 12 as previously explained. Once the
substrate holder 19 is centered in the vacuum chamber 11, with the
ferromagnetic plate 95 directly underneath the electromagnet 98,
the electromagnet is moved down into position immediately adjacent
the plate 95. The electromagnet 98 is then energized and the
substrate holder is picked up. In order to provide ample clearance,
the electromagnet with the substrate holder attached thereto is
raised again and the cart 19 is removed from the vacuum chamber 23.
The motor 97 is then energized and rotary motion is transmitted to
the shaft 96 for rotating the electromagnet and the substrate
holder thereon.
Operation and construction of the support device 12 is not
described in greater detail herein. The device 12 may be of any
suitable construction, but is preferably the construction shown and
described in detail in the aforementioned co-pending
application.
In order to prevent vapor from the source from coating up the carts
or carriages 19 and 21 while the substrate holders are moved to the
coating position, a shutter 101 is provided between the vapor
source and the coating position. With the shutter positioned as
shown in FIGS. 1, 2 and 4, the vapor from the vapor source is
blocked off when the substrates are being moved to and from the
coating position. As shown in FIG. 3, the shutter is moved out of
the way on a pivot shaft 102 during the coating operation to allow
the vapor to reach the substrates.
Once coating of the substrates is completed, the valve 45 is opened
and the cart 21 is moved from the chamber 73 into the chamber 11
beneath the substrate holder 12. Prior to opening the valve 45, of
course, the chamber 73 is evacuated. The support device 12 is then
operated to lower the substrate holder 13 onto the cart 12 and the
substrate holder is released from the support device by
de-energizing the electromagnet 98. This is shown in FIG. 4.
The cart 21 is then moved back through the open valve 45 into the
chamber 73 and the valve 45 is closed. Once the substrates have
cooled sufficiently, the chamber 73 is brought to atmosphere, the
valve 81 is opened, and the substrate holder is removed from the
chamber 73. At the same time, a new substrate holder with
substrates thereon may be placed on the cart 19 in the chamber 67
to repeat the sequence of operation as shown in FIG. 1.
The means for moving the carts 19 and 21 between their respective
positions may be any suitable mechanism, such as a hydraulic or
pneumatic or mechanical linkage. In the drawings, such means
comprise crank arms 103 and 104, which are turned by actuators 105
and 106, respectively, to move the carts on their tracks.
The coating chamber 11 is under vacuum at all times. This
continuously outgasses the sources, prevents contamination, permits
high evaporation rates, and yields products superior to those
produced in bell jar systems, which must be pumped down for each
load. The load and unload locks, being isolated from the coating
chamber 11 by the gate valve, may be provided with heaters 107 and
a cooling system 108, respectively, so that the substrates may be
heated prior to coating and may be cooled prior to removal. In this
manner maximum utilization of the coating chamber can be achieved.
By placing the vacuum locks in alignment with each other on
opposite sides of the coating chamber, straight through operation
may be undertaken for greater efficiency. If desired, vapor sources
additional to the single source shown may be provided for
simultaneous, sequential, or graded operation.
In order to permit ready repair or replacement of the various
elements of the vapor source 15, all vapor sources and associated
elements and mechanisms are mounted on a single plate 99. The plate
is removably secured in the lower portion of the coating chamber 11
and, once the associated water and electrical leads (not shown) are
disconnected, the plate can be removed through a suitable access
port, not shown, to remove all the elements mounted on the plate.
In this manner, a complete second unit may be kept for immediate
placement in the coating chamber and the unit therein removed in
the event any repair or replacement becomes necessary. Accordingly,
the down time of the vacuum coating apparatus of the invention is
minimized.
Operation of the apparatus of the invention may be completely
automated. Suitable controls may be provided for each of the
elements operating in the sequence of operation to thereby render
the apparatus unaffected by human inconsistency. Suitable
interlocks may be used to assure that each phase is completed
before the subsequent one in the cycle is initiated.
It may therefore be seen that the apparatus of the invention
affords a substantial improvement over known prior art devices. The
apparatus of the invention is capable of operation at high
production rates and produces a superior quality evaporated coating
on the substrates.
Various modifications of the invention in addition to those shown
and described herein will become apparent to those skilled in the
art from the foregoing description and accompanying drawings. Such
modifications are intended to fall description the scope of the
appended claims.
* * * * *