U.S. patent number 3,631,303 [Application Number 05/003,948] was granted by the patent office on 1971-12-28 for iii-v cathodes having a built-in gradient of potential energy for increasing the emission efficiency.
This patent grant is currently assigned to Varian Associates. Invention is credited to George A. Antypas, Ronald L. Bell.
United States Patent |
3,631,303 |
Antypas , et al. |
December 28, 1971 |
III-V CATHODES HAVING A BUILT-IN GRADIENT OF POTENTIAL ENERGY FOR
INCREASING THE EMISSION EFFICIENCY
Abstract
A gradient of potential energy was established in the active
layer of a III-V photocathode for enhancing free electron diffusion
toward the emissive surface of the cathode. The energy gradient was
provided by decreasing the bandgap energy across the active layer
which caused the conduction level to slope downwards from the
substrate to the emissive surface through progressive changes in
the concentration of the III-V elements forming the active layer.
Alternatively, a nonuniform concentration of active layer
dopant--heavy on the substrate side and light on the emissive side
of the active layer--established a built-in electric field across
the active layer. The graded bandgap and/or dopant levels promote
free electron drift toward the outer surface of the active layer.
Layers of cesium, cesium oxide, or both, were provided over the
active layer to lower the work function of the photocathode
emissive surface.
Inventors: |
Antypas; George A. (Mountain
View, CA), Bell; Ronald L. (Woodside, CA) |
Assignee: |
Varian Associates (Palo Alto,
CA)
|
Family
ID: |
21708362 |
Appl.
No.: |
05/003,948 |
Filed: |
January 19, 1970 |
Current U.S.
Class: |
257/10;
148/DIG.42; 148/DIG.49; 148/DIG.65; 148/DIG.67; 148/DIG.72;
148/DIG.120; 257/184; 257/191; 313/346R; 313/544; 438/20;
438/936 |
Current CPC
Class: |
H01J
1/34 (20130101); Y10S 438/936 (20130101); Y10S
148/065 (20130101); Y10S 148/072 (20130101); Y10S
148/049 (20130101); Y10S 148/12 (20130101); Y10S
148/042 (20130101); H01J 2201/3423 (20130101); Y10S
148/067 (20130101) |
Current International
Class: |
H01J
1/34 (20060101); H01J 1/02 (20060101); H01l
015/00 () |
Field of
Search: |
;317/235 (27)/ ;317/235
(46)/ ;317/235 (48.2)/ |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Huckert; John W.
Assistant Examiner: Edlow; Martin H.
Claims
What is claimed is:
1. In a III-V semiconductor cathode for providing free electrons
and having a built-in gradient of potential energy for enhancing
the flow of free electrons therethrough towards an emissive
surface, the combination comprising:
support means; and
an active layer supported by the support means and formed by a
III-V semiconductor crystalline solid comprising a first
constituent which is at least one element listed under column III
of the periodic table and a second constituent which is at least
one element listed under column V of the periodic table and a third
constituent which is at least one additional element for
determining the conduction band profile of the active layer in
accordance with the concentration of the third constituent, the
concentration of the third constituent being higher proximate one
major surface of the active layer and lower proximate the other
major surface of the active layer causing a decrease in the
conduction band across the active layer thereby establishing the
gradient of energy potential which promotes free electron drift
toward the emissive surface.
2. The III-V cathode as specified in claim 1, wherein a thin cesium
layer is formed over the emissive surface of the active layer to
decrease the work function of the cathode.
3. The III-V cathode as specified in claim 2 wherein a cesium oxide
layer is provided over the cesium layer to further reduce the work
function.
4. The III-V cathode as specified in claim 1, wherein the support
means is a III-V crystalline solid substrate upon which the active
layer is grown by epitaxy.
5. The III-V cathode as described in claim 1 wherein the first
constituent is at least one element selected from the group
consisting of Al, Ga, and In, and the second constituent is at
least one element selected from the group consisting of P, As, and
Sb.
6. The III-V cathode as specified in claim 5, wherein the
additional material is at least one element selected from either of
the two groups of claim 5.
7. The III-V cathode as described in claim 1 wherein the cathode is
a photocathode, and the changing composition of the active layer
causes the conduction band to have a slope at least KT in a
distance which is the inverse of the absorption depth for the
incident photons.
8. The photocathode as described in claim 1 wherein the third
constituent is a P-dopant material which decreases in concentration
across the active layer from about 10.sup.20 atoms/cc. near the
support means to about 10.sup.18 atoms/cc. near the emissive
surface.
Description
The invention herein described was made in the course of Government
Contract No. F33615-68-C-1396 with the United States Air Force.
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to photocathodes and more particularly to
photocathodes having a gradient of potential energy thereacross for
establishing electron drift towards the emissive surface.
2. Description of the Prior Art
Heretofore, the application of external electric fields across
cathodes to increase electron emission has been limited. Generally
these fields are generated by applying a voltage across a pair of
space SnO layers positioned on either side of the cathode. An
inherent limitation in this structure is that electrons of low
energy cannot penetrate the thin conductive layer placed over the
emissive surface.
Internal electric fields established by nonuniform doping have been
employed in the drift transistor art as described in John N.
Shive's book entitled "The Properties, Physics, and Design of
Semiconductor Devices" page 231. The purpose of the built-in
electric field in this application was to accelerate minority
carriers across the transistor junction. Further, the concept of a
graded bandgap layer is known in the graded bandgap base (GBGB)
transistor art. However, these sources of internal fields or
potential energy gradients have not heretofore been employed to
increase the emission efficiency of III-V photocathodes.
SUMMARY OF THE INVENTION
It is therefore an object of this invention to provide a more
efficient III-V semiconductor cathode.
It is a further object of this invention to provide a III-V
semiconductor cathode having a faster response time.
It is another object of this invention to provide a III-V
semiconductor cathode having a unidirectional electron flow for
avoiding the loss of free electrons in the interior portion of the
active layer.
Briefly these and other objects are achieved by providing a
substrate means, preferably a binary or compound III-V crystalline
solid, upon which is grown a III-V semiconductor crystalline solid
active layer formed by: a first constituent which is at least one
element listed under column III of the periodic table; a second
constituent which is at least one element listed under column V of
the periodic table; and a third or additional material which is at
least one nonuniformly present element which progressively changes
in concentration across the active layer for establishing the
gradient of potential energy. The gradient of potential energy
across the graded active layer biases the movement of free
electrons therein towards the emissive surface. In one embodiment
the gradient is established by progressively decreasing the bandgap
energy of the active layer, from the substrate side to the emissive
surface side by progressively altering the concentrations of
elements forming the compound semiconductor crystal. In another
embodiment, the gradient may be established by nonuniformly doping
the active layer with heavy concentrations of a suitable P-type
dopant near the substrate region of the active layer and decreasing
concentrations of the dopant toward the emissive surface. The
dopant captures free electrons from the balance band, causing a
nonuniformly distributed negative charged across the active layer.
The simultaneously created holes in the the valance band of the
semiconductor are mobile and by diffusion tend to distribute
themselves evenly across the active layer. The negative charge
concentration toward the substrate side of the active layer tends
to prevent this diffusion of the positive holes. However, a
sufficient diffusion of holes does take place to establish an
electric field across the active layer which is positive on the
emissive surface and negative adjacent to the substrate. The
gradient of electron energy potential created by the graded band
energy and dopant concentrations establish a unidirectional flow of
electrons toward the emissive surface. This bias on the electron
diffusion minimizes the loss of electrons into the substrate and
the interior region of the active layer. The enhanced electron
diffusion increases the emissive efficiency of the photocathode and
establishes a faster response time between photon absorption and
electron emission.
BRIEF DESCRIPTION OF THE DRAWINGS
Further objects and advantages of the present invention and the
cause and operation of the gradient of energy potential will become
apparent from the following description taken in conjunction with
the drawings in which:
FIG. 1 is a schematic diagram, in section, of an infrared image
converter showing the inventive photocathode, employed in a
reflective optical system,
FIG. 2 is an enlarged sectional view of the inventive photocathode
taken along lines 2--2 of FIG. 1,
FIG. 3 is an energy level diagram for the graded bandgap embodiment
of the photocathode, and
FIG. 4 is an energy level diagram of the graded dopant embodiment
of the photocathode.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Referring now to FIG. 1 there is shown an infrared image
intensifier tube 10, representing one of the uses of the present
invention. An object 12 to be viewed, gives off or reflects optical
radiation in the near infrared spectrum. Rays emanating from object
12 are focused on the photosensitive surface of photocathode 14
through a lens 16 and a 45.degree. mirror 18 disposed within an
evacuated envelope 20. Vacuum envelope 20 is preferably evacuated
to a suitably low pressure such as 10.sup..sup.-9 Torr. The image
of object 12 is reflected from mirror 18 onto photocathode 14 which
converts the near infrared image into a corresponding electron
image emitted from photocathode 14. The emitted electrons are
accelerated by a relatively high voltage such as 30 kv. via
accelerating electrodes 22, and focused onto a fluorescent screen
24. The optical image appearing on fluorescent screen 24 is a
greatly intensified image of object 12 and is viewed through
fluorescent screen 24 by the eye or a suitable optical pickup
device. A reflection optical system is depicted in FIG. 1; however,
a transmission optical system may be employed with a suitably thin
photocathode active layer grown on a suitably transparent
substrate.
Referring now to FIG. 2, photocathode 14 is shown in greater
detail. Photocathode 14 includes a heavily doped P-type
semiconductor substrate 32 with a graded active layer 34 thereover,
both supported on a conductive electrode 36. Preferably, a layer 38
of alkali metal up to 5 monolayers thick is formed on the clean
surface of graded active layer 34 for filling the surface energy
states of active layer 34. A layer 40 of cesium oxide [Cs.sub.2 O]
is then preferably formed on alkali metal layer 38 for lowering the
work function of the photocathode as described by Ronald L. Bell in
application Ser. No. 698, 941, filed Jan. 18, 1968, entitled
"Photoemitter Having A P-Type Semiconductor Substrate Overlaid with
Cesium and N-Type Cesium Oxide Layers," and assigned to the present
assignee.
In operation, optical radiation in the near infrared range and
forming the image to be converted, falls onto the emissive surface
of photocathode 14 and passes through cesium oxide layer 40 and
alkali metal layer 38 and is absorbed in P-semiconductor active
layer 34. Upon absorption, the infrared radiation produces an
electron hole pair pattern corresponding to the optical image. The
electrons drift toward the cesium oxide emissive surface under the
influence of the gradient of potential energy developed by the
graded bandgap levels or graded dopant concentration in graded
layer 34. The electrons so accelerated pass through alkali metal
layer 38 and cesium oxide layer 40 and are emitted into the vacuum
to form an electron image which is then accelerated to fluorescent
screen 24.
Referring now to the energy level diagram shown in FIG. 3, graded
active layer 34 is selected to have a semiconductive energy bandgap
preferably equal to or slightly greater than the work function of
cesium oxide layer 40. The junction of active layer 34 with cesium
layer 38 and cesium oxide layer 40 causes severe band bending of
the conduction band level 50 and the valance band level 52 in
active layer 34. Substrate 32 is heavily doped with P-dopants such
as Zn or Be to bring the fermi level within the semiconductive
material near to the top of valance band 52. The preferred cesium
oxide layer 40 is N-type to bring its fermi level near the bottom
of its conduction band 54. Conduction band 50 across active layer
34 is shown sloping downward to the right toward the emissive
surface as dictated by the progressively changing composition of
active layer 34. The effect of the gradient will become
particularly noticeable with a downwards slope of several times KT
[thermal energy for the operating temperature] in a distance which
is the inverse of the absorption depth for photon energies of
greatest interest. A gradient energy potential of 1,000 volts per
centimeter may easily be established in this embodiment. Of course,
greater electric fields may be established if required, subject to
the breakdown limitations of the graded layer material. For
emission purposes it is desirable to maintain conduction level 50
at about 1 ev. adjacent to emissive layer 40. This boundary
condition limits the steepness of the slope in graded active layer
34. Another consideration in determining the maximum slope of the
gradient is how much shift in response frequency caused by the
decreasing bandgap is permissible.
A number of techniques exist for making the graded bandgap
embodiment. For instance bandgap could be gradually lowered by
incorporating an increased fraction of the bandgap lowering element
into the growth of the compound active layer 34 on substrate layer
32. All of the techniques available must allow for controlled
variation of the bandgap by variation of the growth parameters.
Some variations in growth parameters occur naturally, such as the
depletion of one component of the melt in the case of liquid
epitaxy, or different incorporation rates from a given environment
with varying temperature in the case of liquid or vapor epitaxy.
Another possibility involving the dynamics of growth initiation is
that a composition and bandgap gradient may be induced in the base
layer simply by growing from an environment of constant composition
onto a substrate of higher bandgap than the equilibrium solid
deposited. Further, films of these materials formed by evaporation
of compounds or their elements in high vacuum may be deposited in a
controlled way to produce graded properties of the types discussed
above.
More specifically, GaAs.sub. 0.85 Sb.sub. 0.15 was grown on GaAs
substrates by liquid phase epitaxy resulting in the epitaxial layer
having a bandgap gradient which varies from about 700 volts per
centimeter near the substrate [1-2.mu.from the substrate] to about
20 volts per centimeter at a distance greater than 10.mu. from the
substrate. As another example, a 2.mu. GaAs.sub. 0.94 Sb.sub. 0.06
photocathode was grown on a GaAs substrate resulting in a bandgap
gradient of approximately 200 volts per centimeter. This example
had a surprisingly good performance comparable to highly cleaned
GaAs. In both of these examples, the first and second constituents
were Ga and As respectively, while the third or additional material
was Sb. The above examples had a measured sensitivity of
approximately 700 .mu.amps per meter, with the second example
having a lower threshold. Generally, the column III elements Ga,
In, and Al; and the column V elements As, Sb, and P, are the
preferred constituents of the III-V crystal because they may be
combined in many combinations and proportions to produce binary or
compound substrates and active layers. In some applications the
remaining III-V elements B, Tl, N, and B.sub.1 may also be
used.
FIG. 4 shows the energy level diagram for the graded dopant
concentration embodiment. Except for the dopant, the composition of
the III-V semiconductor remains constant throughout the active
layer which in this embodiment may be a binary III-V crystalline
solid. The concentration of the P-dopant, heaviest near substrate
32 and lightest near the emissive surface, causes conduction band
50 to slope downward toward the emissive surface. Thermal electrons
from valance band 52 are captured by the dopant centers producing a
nonuniform negative charge distribution across active layer 34. The
positive holes generated by the escaping thermal electrons tend to
diffuse themselves uniformly across the thickness of the active
layer. An electric field develops between the stationary negatively
charged dopants and the diffusing positively charged holes. The
presence of this electric field limits the diffusion process
resulting in an equilibrium condition. Thus substantial electric
fields are generated causing conduction band 50 and valance band 52
to slope as shown. More specifically, a field of 750 volts/cm. was
developed across a 2-micron active layer due to a Zn dopant
gradient of from 10.sup.20 atoms/cc. on the substrate side to
10.sup.18 atoms/cc. on the vacuum side of the active layer. As the
net bandgap between conduction band 50 and valance band 52 remains
constant throughout the sloping region, no shift in response peaks
is notice in the graded dopant embodiment. Many possibilities are
available for accomplishing this gradiation of concentration. In
the case of vapor phase epitaxy, a gradient of dopant could be
effected by reducing the dopant content of the growth atmosphere,
for example, by reducing the rate of injection of an organozinc
vapor into the growth area, or by lowering the temperature of a
zinc metallic or alloy doping source, during the growth
process.
Clearly, various changes may be made in the structure and
embodiments shown herein without departing from the concept of the
present invention. For example, other III-V semiconductor materials
and dopants may be employed. In some cases, the cesium layer may be
employed along without the cesium oxide or both layers eliminated
altogether. Thin active layers are preferably grown on a III-V
substrate; however a thick active layer could be mounted on glass
or other suitable material. Further, the features and advantages of
each modification may be employed with the other modifications. For
instance, the graded bandgap and graded dopants embodiments may be
used separately or combined in a single photocathode.
It will be apparent to those skilled in the art that the objects of
this invention have been achieved by providing a gradient of
potential energy across the active layer for accelerating the free
electrons thereacross and improving the response time of the
cathode. The force generated by the gradient of energy potential
biases the free electron motion toward the emissive surface and
avoids electron loss in the substrate and interior regions of the
active layer.
* * * * *