U.S. patent number 3,628,140 [Application Number 04/874,632] was granted by the patent office on 1971-12-14 for scanning element and aperture wafer for electronic particle counting and sizing apparatus.
This patent grant is currently assigned to Coulter Electronics, Inc.. Invention is credited to Wallace H. Coulter, Walter R. Hogg.
United States Patent |
3,628,140 |
Hogg , et al. |
December 14, 1971 |
**Please see images for:
( Certificate of Correction ) ** |
SCANNING ELEMENT AND APERTURE WAFER FOR ELECTRONIC PARTICLE
COUNTING AND SIZING APPARATUS
Abstract
An aperture wafer which is adapted to be mounted to an aperture
tube scanning element for use with a Coulter-type electronic
particle counting and sizing apparatus. The wafer is formed of the
usual materials such as ruby, sapphire and the like. The aperture
is located substantially in the center of the wafer and dimensioned
as conventionally formed apertures in known wafers, but differs
from the prior art by having the body of the wafer thickened as
much as feasible contiguously to the aperture. The configuration of
the resulting structure provides a conical chamber leading to the
aperture, which consequently is located at the apex of the chamber.
The chamber and aperture are symmetrical about the aperture axis.
The aperture wafer provides decreased capacitive losses and also
focuses the field of the aperture giving increased resolution
without substantial loss in sensitivity. The scanning element has
the wafer mounted thereto with the chamber opening to the inside of
the aperture tube.
Inventors: |
Hogg; Walter R. (Miami Lakes,
FL), Coulter; Wallace H. (Miami Springs, FL) |
Assignee: |
Coulter Electronics, Inc.
(Hialeah, FL)
|
Family
ID: |
25364208 |
Appl.
No.: |
04/874,632 |
Filed: |
November 6, 1969 |
Current U.S.
Class: |
324/71.1;
138/44 |
Current CPC
Class: |
G01N
15/1218 (20130101) |
Current International
Class: |
G01N
15/10 (20060101); G01N 15/12 (20060101); G06m
011/00 () |
Field of
Search: |
;18/8SM,8SS,8SF ;65/36
;138/44,103 ;156/108 ;161/109 ;324/71CP |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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|
|
|
|
|
|
665,776 |
|
May 1929 |
|
FR |
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447,465 |
|
Mar 1968 |
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CH |
|
Primary Examiner: Earls; Edward J.
Claims
We claim:
1. An aperture wafer used in combination with electronic particle
counting and sizing apparatus of the type which includes structure
establishing an electric field in a path of very small dimensions
whereby a particle flowing in a liquid suspension through said
field changes the impedance characteristics of said field in a
detectable manner and wherein said path is defined by said aperture
wafer which comprises a relatively thin disc of highly heat
resistant material having an aperture therethrough and which is
mounted to the wall of an aperture vessel and in which apparatus
electrical means are provided to detect the passage of said
particles in terms of change of the impedance characteristics of
said field, said aperture wafer disc has opposite substantially
parallel faces, said aperture being formed through the disc
substantially at the center of said disc and having a generally
cylindrical configuration, with the axis of the cylinder
perpendicular to the faces of the disc and the diameter and axial
length of said aperture being of the same order of dimension, a
chamber of generally conical configuration formed in said wafer
coaxial with the aperture and having its apex end connecting with
one axial end of the aperture and its base end opening at one face
of the disc, the second axial end of said aperture being connected
with the second face of said disc, and the configuration of the
chamber being such as to provide a portion of the disc contiguous
to the one axial end of said aperture which is substantially
thicker in an axial direction than the axial length of said
aperture.
2. The aperture tube as claimed in claim 1 in which the second
axial end of the aperture opens directly to the second face of the
disc.
3. The aperture tube as claimed in claim 1 in which there is a
second substantially similar conical chamber formed in said wafer
in mirror position relative to said first-mentioned chamber, and
the second axial end of the aperture connects with the apex end of
said second chamber.
4. The aperture wafer as claimed in claim 1 in which the conical
angle of said chamber considered on a diametral plane is
approximately 90.degree..
5. The aperture wafer as claimed in claim 1 in which the apex of
the chamber is slightly spherical with the radius of such apex
being no more than several times the diameter of the aperture.
6. The aperture wafer as claimed in claim 1 in which the juncture
between the chamber and the aperture is substantially sharp.
7. A scanner element used in combination with electronic particle
counting and sizing apparatus of the type which includes a vessel
having an aperture therein through which fluids carrying
suspensions of particles are adapted to pass and in which there is
established an electric field and electrical means are provided to
detect the passage of particles in terms of a change in the
impedance characteristics of said electric field, said scanner
element comprising:
a. an aperture tube adapted to be connected into a closed fluid
system so that a suspension may be drawn into the interior of the
tube through a wall thereof and
b. means providing a passageway through the wall of the tube, said
means comprising
i. a flat-faced corundum disc secured to said wall,
ii. a cylindrical aperture in said disc having a diameter and
length of the same dimensional order,
iii. the aperture axis being substantially perpendicular to the
faces of said disc,
iv. a chamber of generally conical configuration formed in said
wafer coaxial with said aperture and having its apex connecting
with one axial end of said aperture and its base end opening to one
face of said disc, and
v. the second axial end of said aperture being connected with the
second face of said disc.
8. The scanner element as claimed in claim 7 in which there is one
conical chamber only and the one face of said disc to which the
base end of the conical chamber opens is on the interior of the
aperture tube the second axial end of the aperture opens directly
to the second face of the disc.
9. The scanner element as claimed in claim 8 in which the disc is
fusedly secured to the wall of the aperture tube with its flat
surface disposed in position to be rubbed from the outside of the
aperture tube.
Description
BACKGROUND OF THE INVENTION
The field of the invention is the art of studying particulate
matter suspended in diluents. U.S. Pat. No. 2,656,508 discloses an
apparatus which operates on the so-called Coulter principle in
accordance with which a particle flowing in a liquid suspension
through an electric field established in a path of very small
dimensions will change the impedance characteristics of that field
in a detectable manner. Apparatus constructed in accordance with
that principle has generally used a microscopic aperture in an
insulating wall to provide the path, placing an electrode in each
of the respective bodies of liquid located on opposite sides of the
wall and connecting these electrodes to a source of current so that
the electric current will flow through the aperture. The current is
of low current density while passing through the bodies of liquid
to the aperture, but will be concentrated in a relatively high
current density when said electric current flows through the
aperture. A detector also connected across the same electrodes will
respond to the changes in the impedance of the aperture each time
that a particle passes through the same, the theory involved being
well known. Briefly, the normal particle may be considered an
insulating body passing through the aperture and displacing its own
volume of the conductive diluent which is in the aperture. The
decrease in the volume of conductive liquid caused by the presence
of a particle will increase the impedance of the aperture by a
measurable amount which is proportional to the amount of liquid
displaced.
The aperture of such apparatus is desirably quite small, having an
internal diameter of the order of several times the diameter of the
particles to be studied, for example. In practice, apertures even
several hundred times the volume of the particles being studied
will give satisfactory results. Thus, for red blood cells having an
equivalent spherical diameter of about five and one-half (51/2)
microns, apertures of the order of seventy (70) microns in diameter
to several times that have been successfully used. The problem of
providing an aperture with stable dimensions of this size has been
solved by utilizing wafers of corundum, such as ruby or sapphire,
having microscopic holes drilled in them by watch-jewel-making
techniques. The resulting wafer is mounted in an orifice that is
formed in the side wall of a glass tube, by any suitable method.
One effective method is by fusing.
The construction of aperture tubes using this type of wafer and the
techniques involved are disclosed in U.S. Pat. No. 2,985,830. In
this latter patent, the aperture tube with its aperture is referred
to as a scanner element because in effect the stream of particles
in suspension is scanned for obtaining signals when it passes
through the aperture that is provided in the sidewall of said
tube.
The current distribution through the aperture is not perfectly
uniform in its geometry, because the liquid of the suspension
spreads immediately outside of the ends and hence the current
density fans out also. This bulges the strong field within the
aperture and makes the aperture in effect slightly longer than its
actual axial dimension. It is desirable to have as short an
aperture as possible to obtain maximum sensitivity of the signals
produced by the passage of particles therethrough, but as long an
aperture as possible to obtain maximum resolution. It can also be
seen readily that the statistical advantage of passing
high-concentration suspensions through an aperture can be decreased
by the presence of more than one particle in the aperture, because
the latter occurrence will produce only one signal, albeit of
greater amplitude. Shortening the aperture will decrease the
probability of coincidence and may enable multiple particles to be
distinguished from large particles by the character of their
signals but will lower resolution also.
In the case of apparatus which utilizes alternating current in the
aperture, another problem arises. The wafer itself will pass
capacitive current depending upon its dielectric constant, this
being referred to as displacement current. If the displacement
current can be decreased, thereby decreasing the losses in the
electrolyte in the immediate vicinity of the aperture, the
signal-to-noise ratio and hence the sensitivity and response of the
scanner element will be increased.
In any aperture, the forces of liquid flow and electric current
flow are extremely difficult to predict and ascertain. Several
factors and the interactions between them are at least the partial
cause for this difficulty, including the formation of the vena
contracta, the response of liquid flow to the presence of sharp
corners, the distribution of current caused by sharp corners, the
presence of stagnant sections within the aperture because of vena
contracta flow, the effects of heating due to high current
concentration, etc. Accordingly, the solution to the problems
described above is not obvious or simple.
The solution of the problem which arises in connection with
apertures that are required to pass electric current at high
frequency obtained by the invention herein has additionally
provided an improved resolution of signals, even where the aperture
current is DC or of very low frequency. A theory for this benefit
will be set forth as a suggestion, but the exact reason is not
certain and no limitations are intended on account of such
explanation.
SUMMARY OF THE INVENTION
According to the invention, a wafer of corundum or other hard
material is constructed in which there is an aperture of axial
dimension not substantially different from the axial dimension of
similar diameter apertures formed in known wafers, but in which the
wafer itself thickens quite substantially contiguous to the
entrance and/or exit of the aperture, preferably as a conical
chamber, the aperture and conical chamber or chambers being
substantially symmetrical about the axis of the aperture. The wafer
is secured to the wall of an aperture tube by any known technique
in order to form a scanning element. In the case of a wafer which
has only one end of the aperture provided with a conical chamber,
the wafer is mounted in such a manner that the conical chamber
opens on the downstream side considering the flow of the liquid
suspension through the aperture.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a median sectional view on an exaggerated scale of an
aperture wafer constructed in accordance with the invention,
portions being broken away to enable proper proportions to be
illustrated;
FIG. 2 is a view similar to that of FIG. 1 but showing a slightly
modified form of the invention;
FIGS. 3 and 4 are views similar to those of FIGS. 1 and 2, but
illustrating wafers constructed in accordance with the prior
art;
FIG. 5 is a view similar to that of FIGS. 1 and 2, but illustrating
another form of the invention;
FIG. 6 is a fragmentary sectional view of the aperture of the
structure of FIG. 5;
FIG. 7 is a diagrammatic sectional view showing an aperture tube in
the environment of normal use, having a wafer of the preferred
construction mounted in the aperture tube; and
FIG. 8 is a fragmentary vertical median sectional view taken
through the aperture wafer of FIG. 7.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The prior art structures which are referred to in said U.S. Pat.
No. 2,985,830 have generally taken the form of those wafers which
are illustrated in FIGS. 3 and 4. The wafers 10 and 12 are cut,
ground and drilled from a highly heat resistant material, such as
ruby or sapphire, with their surfaces lapped and finished. The
wafer 10 is in the form of a circular disc having a central
aperture 14 which is drilled as cylindrical as possible. The
surface 16 and 18 are ground, polished, and/or lapped flat and
parallel one to the other. The aperture 14 is drilled in the center
of a spherical depression 20 that is formed below the surface 18.
This arrangement is quite similar to the construction of watch
jewels. The dimensions of the aperture are fairly square, that is,
the length C along the axis perpendicular to the surfaces 16 and 18
is substantially the same as the diameter B. In many wafers this
ratio may be 2/3 or 3/2 or thereabouts. This is generally accepted
as standard in aperture wafers. The thickness E of the wafer 10 for
this type of structure is of the order of 0.5 to 1 millimeter.
Since this is several times thicker than the wafer 12 of FIG. 4, it
is relatively easier to manufacture. The diameter A of the wafer 10
is of the order of 3 or 4 millimeters, since this provides an
easily manipulated article and also provides sufficient overlap to
enable the wafer to be mounted to a glass tube. Practically all
wafers have approximately this diameter.
The wafer 12 is much thinner than the wafer 10, since it has no
spherical depression similar to 20. All of the dimensions of this
wafer are about the same as those of the wafer 10 except for the
thickness. The square dimensions are usual for the aperture 22, and
normally the thickness E is the same as the axial dimension of the
aperture 22. The surfaces 24 and 26 are flat and without
depression. The short axial length of the aperture 22 is a
compromise of sensitivity and resolution. The corners defined by
the ends of the aperture 22 are fairly sharp. It has been found
that it is easier to clear debris from an aperture that opens to a
flat surface, and when both ends of an aperture open to flat
surfaces, there is no need to choose one of a pair of different
opposite faces to be secured to the glass tube. For example, in the
case of the wafer 10, debris will be found more readily to clog the
aperture 14 if the flow is into the depression 20 than out of the
depression 20. Furthermore, even if the aperture clogs, it is
easier to clear from the flat side 16 if this is the upstream end
of the aperture.
The most simple forms of the invention are illustrated in FIGS. 1
and 2, and in each case the same reference characters will be used
to designate the same or equivalent parts.
The two wafers are designated generally 40 and 40'. The wafers 40
and 40' are substantially thicker than the wafer 12 but may be as
thick as the wafer 10. The aperture 42 is drilled at the apex of a
conical chamber 44 that opens to the surface 46. The chamber 44 is
preferably at the downstream end of the aperture 42, so that the
surface 48 which is shown to be flat, has the upstream end of the
aperture 42 opening directly to it. In each case the angle of the
conical chamber is about 90.degree. as indicated, but this is a
noncritical dimension. The chamber 44 of the wafer 40 terminates in
a slightly spherical surface 50 which has a radius R which is about
three times the diameter B of the aperture 42. This structure
provides a relatively wider mouth than the straight conical chamber
44 of wafer 40' where the formation 50 is omitted.
Insofar as the decrease of displacement current is concerned where
high-frequency current is used in the aperture, it will be seen
that the thickness of the wafer at 52 immediately contiguous to the
aperture has in each case been substantially increased over those
instances where the aperture opens directly to a flat surface. This
latter is true for the wafers 10 and 12.
Insofar as improved resolution is concerned, this is believed due
to current focusing effect. In some manner, the sharp corner
current density concentration which is believed to occur in prior
wafers seems to have been shifted toward the axis of the aperture,
or is decreased so that the amplitudes of signals derived from the
aperture have dependence upon the portion of the aperture traversed
by the respective particles producing the same. For example, a
particle coming through an area of high current density at a sharp
corner of prior apertures will produce a different signal than if
it went through the center of the aperture. In the case of the
aperture wafers 40 and 40' this disparity seems to have been
reduced. In any event, such aperture wafers have better resolution
without substantial loss of sensitivity.
The effect of such structures is to render the data obtained from
the sizing of particles to be more accurate since many of the
larger and apparently spurious signals due to nonuniform current
density in the effective portion of the aperture will not be
generated.
In FIGS. 5 and 6 there is illustrated a wafer 60 in which the
aperture 62 opens at both ends to conical chambers 64 and 66. In
this structure the benefits of the increased resolution are
provided at both sides of the aperture 62, and it is less fragile
and thus easier to handle during mounting to a glass tube. The face
which is secured to the surface of the tube may be either 68 or 70
which obviates the need for making a proper choice of face during
assembly. The thickness of the wafer at 72 contiguous to the
aperture is much greater than if only one conical chamber were
provided. Accordingly, the signal-to-noise ratio for apparatus
which uses aperture currents of high frequency would be improved
over that using a one-sided conical chamber in its wafer.
FIG. 7 illustrates the environment in which the invention is used
and shows a scanning element 78 comprising a glass aperture tube
having a wafer such as 40 secured in its wall 80 as shown in FIG.
8, being mounted to the outer face 84 of the wall 80 adjacent the
bottom thereof. The scanning element 78 is here shown having a
configuration which is well known, having an upper flared mouth 77
by means of which it is connected into the closed fluid system to
provide for aspiration in the manner described in U.S. Pat. No.
2,869,078. Only a portion of the glassware normally associated with
such a system is shown at 79. In the use of this type of scanning
element 78, it is immersed in a body of fluid 81 carried in a
vessel 83, such vessel being a small beaker or cuvette containing a
suspension to be tested, and being brought into engagement with the
bottom end of the scanning element 78. The interior of the scanning
element 78 and the remainder of the fluid system will contain the
second fluid body 85 whose composition is normally of little
consequence, providing it is conductive. Generally, it may comprise
saline solution previously introduced, or may contain the remains
of several prior-tested samples.
The electrodes 87 and 89 in the respective bodies of fluid enable
the coupling of the apparatus to the electrical portions of the
apparatus by way of suitable conductors, such as the leads 91 and
93. The block 95 generally represents the electrical components,
including a source of electric current, detectors, counters,
controls, etc. The benefits of the invention are particularly
advantageous where the source of current includes at least one
alternating current power source, but, as previously mentioned,
were also found to improve the operation of the apparatus even
where the current source is DC or low frequency.
The view of FIG. 8 is taken as a vertical median section through
the left side of the aperture tube 78 of FIG. 7 but on a greatly
enlarged scale. As noted, the flat surface 48 of the wafer 40 faces
outwardly and normally will be slightly raised from the glass face
84 so that the operator may easily rub his finger over such
surface. In the event that debris is captured by the aperture, it
will generally block across the opening to the aperture 42 or a
portion will hang in the aperture and protrude slightly. The
rubbing of the finger or other implement over such surface will
clear the debris in practically all cases. This is not as readily
accomplished with apertures whose entrances are below the surface
of the wafer. The situation can be envisioned by considering that
the flow of suspension is from right to left in FIG. 8, instead of
from left to right as indicated by the arrow. The setup of FIG. 7
contemplates that the normal usage of the apparatus will require
the movement of the test suspension from the body of fluid 81
through the aperture 42 and to the body of fluid 85.
The wafer 40 of FIGS. 7 and 8 has been fusedly secured to the wall
80 of the tube 78 over a generally conical orifice 86 formed in the
tube by glassblowing or other glass-handling techniques. The
orifice is relatively large but somewhat smaller than the diameter
A of the aperture wafer 40. The surface 46 faces inwardly and hence
the chamber 44 also faces inwardly, this being the downstream end
of the liquid flow through the aperture 42.
In the construction of the aperture wafers, the angle of the
conical chamber should be chosen so that the current density in the
cone will not be high enough to produce any substantial signal
after the particle has passed through the aperture. The angle
should likewise not be so flattened that the effect will be not
much different from a wafer of the type shown in FIGS. 3 and 4. The
90.degree. angle chosen has given excellent results for the
conditions under which it was used. Variations of this also
produced advantageous results. What it is desired to secure by
Letters Patent of the United States is the following.
* * * * *