U.S. patent number 3,619,684 [Application Number 05/031,147] was granted by the patent office on 1971-11-09 for ion source.
This patent grant is currently assigned to U.S. Philips Corporation. Invention is credited to Derek Andrew, Thomas Chrisholm, Lawrence Graham Pittaway.
United States Patent |
3,619,684 |
Andrew , et al. |
November 9, 1971 |
ION SOURCE
Abstract
A nonmagnetic, electron impact ion source comprising an
evacuated envelope having means for passing ionizing gases through
the envelope. Within the envelope, an electron emitting cathode is
positioned adjacent a grid-shaped ionization chamber. A conducting
wall section of the ionization chamber that is impenetrable to ions
has an ion exiting aperture, which is adjacent to a grid-shaped
electrode for extracting ions. The extracting electrode is
positioned at a distance of a few tenths of a mm. from the ion
exiting aperture, and kept at a small negative voltage not
exceeding 5 volts relative to the ionization chamber. An
acceleration electrode adjacent to the extracting electrode forms
ions from the ionization chamber into beams. A screen grid placed
between the extracting and acceleration electrodes prevents the
high negative voltage of the acceleration electrode from affecting
the electric field within the ionization chamber.
Inventors: |
Andrew; Derek (Charlwood,
EN), Pittaway; Lawrence Graham (Crawley,
EN), Chrisholm; Thomas (Crawley, EN) |
Assignee: |
U.S. Philips Corporation
(N/A)
|
Family
ID: |
10163206 |
Appl.
No.: |
05/031,147 |
Filed: |
April 23, 1970 |
Foreign Application Priority Data
|
|
|
|
|
Apr 28, 1969 [GB] |
|
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21453-69 |
|
Current U.S.
Class: |
315/111.31;
250/427; 324/462 |
Current CPC
Class: |
H01J
49/14 (20130101) |
Current International
Class: |
H01J
49/14 (20060101); H01J 49/10 (20060101); H05h
001/00 () |
Field of
Search: |
;250/41.9SB ;313/63
;324/33 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Hossfeld; Raymond F.
Claims
We claim:
1. A nonmagnetic ion source comprising an evacuated envelope having
means for receiving ionizing gases, an electron emitting cathode
operating at a negative voltage within said envelope, an ionization
chamber adjacent to said cathode and operating at a positive
voltage relative to said cathode for containing ions produced by
collisions of electrons from said cathode with said ionizing gases,
said ionization chamber formed from grid-shaped, electrically
conductive walls and an electrically conductive wall section
impenetrable to ions, said wall section having an ion exiting
aperture, a grid-shaped ion extracting electrode operating at a
negative voltage not greater than 5 volts relative to said
ionization chamber, said extracting electrode positioned within a
distance of a few tenths of a mm. adjacent to said ion exiting
aperture, and an accelerating electrode adjacent to said ion
extracting electrode and operating at a negative voltage relative
to said chamber to form said ions into beams.
2. A nonmagnetic ion source as claimed in claim 1 further
comprising a grid-shaped electrode between said cathode and said
envelope and operating at a negative voltage relative to said
cathode for directing electrons from said filament to said
ionization chamber.
3. A nonmagnetic ion source as claimed in claim 1 further
comprising a reflector electrode operating at a positive voltage
relative to said ionization chamber and surrounding said ionization
chamber to prevent ions from escaping through said grid-shaped
walls.
4. A nonmagnetic ion source as claimed in claim 1 further
comprising a screen grid operating at a negative voltage relative
to said ionization chamber and positioned between said extracting
and accelerating electrodes to prevent the electric field of said
accelerating electrode from penetrating into said ionization
chamber through said extracting electrode.
Description
The invention relates to an ion source comprising an ionization
chamber into which electrons are injected without using a magnetic
field influencing the electrons, for ionizing a gas, and an
accelerating electrode, said ionization chamber comprising
grid-shaped electrically conductive wall parts and an electrically
conductive wall part which is impenetrable to ions and comprises an
ion exit aperture.
Such an ion source is known from the article "La sensibilite de la
jauge a collecteur cache" in "Le Vide" of July/Aug., 1968 , pp.
240- 244. The device described in this article is an ion source
which is used as an ionization manometer. The use of the device
described as an ionization manometer or as an ion source requires
in both cases a flow of ions which is as large as possible.
Moreover, the use as an ion source requires a small energy spread
of the ions in the beam formed.
The operation of such an ion source is as follows. Electrons are
injected into the ionization chamber by means of, for example, a
filament which is arranged outside the ionization chamber and has a
negative voltage relative to the latter. The electrons emitted by
the filament are accelerated to the ionization chamber by the
electric field between the filament and the ionization chamber and
pass the grid-shaped wall parts thereof. The ions formed in the
ionization chamber are accelerated to the accelerating electrode--
which is provided outside the ionization chamber before the ion
exit aperture and has a negative voltage relative to the ionization
chamber-- by the electric field between the wall of the ionization
chamber and the accelerating electrode. The potential field between
the accelerating electrode and the wall of the ionization chamber
has such a large gradient within the ionization chamber of the
known ion source that ions which are formed at various places in
the ionization chamber traverse, on their way to the accelerating
electrode, various voltage differences so that a large energy
spread occurs in the ion beam.
It is the object of the invention to provide an ion source in which
a large ion current intensity is associated with a small energy
spread.
According to the invention, an ion source comprising an ionization
chamber in which electrons are injected without using a magnetic
field influencing the electrons, for ionizing a gas, and an
accelerating electrode, said ionization chamber comprising
grid-shaped electrically conductive wall parts and an electrically
conductive wall part which is impenetrable to ions and comprises an
ion exit aperture, is characterized in that the ion source
comprises a grid-shaped extraction electrode covering the ion exit
aperture, said extraction electrode being situated within a
distance of a few tenths of a mm. from the wall part with the ion
exit aperture and, during operation of the ion source, having a
negative voltage of at most 5 volt relative to said wall part.
The invention is based on the recognition of the fact that in the
ionization chamber a space charge is formed by the electrons
injected into the ionization chamber and the ions formed by
ionization. The total space charge is negative by the excess of
injected electrons. If the extraction electrode has the same
potential as the walls of the ionization chamber, the space charge
in the ionization chamber has a potential field of which the
potential in any point is lower than on walls of the ionization
chamber and of which a point approximately in the center of the
ionization chamber has a lowest potential of, for example, -2.5
volt. As a result of this the field strength in any point of the
ionization chamber is directed to a point approximately in the
center so that the positive ions always experience a force towards
that point. So the ions are captured in a potential trough and can
only reach points of said trough which do not have a higher
potential than the point where they are formed. According to the
invention, a grid-shaped extraction electrode is provided
immediately in front of an ion exit aperture in the wall of the
ionization chamber at a voltage of, for example, -1 volt. This has
for its result that at the area of the ion exit aperture the
potential field has the potential of the extraction electrode. As a
result of this the height of the edge of the potential trough at
the area of the ion exit aperture has become 1.5 volt instead of
2.5 volt. As a result of this all the ions which are formed in a
point of the ionization chamber the potential of which lies between
-1 volt and 0 volt can leave the ionization chamber via the
grid-shaped extraction electrode. The extracted ion beam
consequently has an energy spread of maximally 1 volt. In practice,
the energy spread in the direction of the beam is still slightly
smaller because the direction in which the ions emanate in general
does not coincide with the direction of the beam in which it is
accelerated by the accelerating electrode. A part of the energy
spread hence influences only the lateral ion speeds. By making the
extraction electrode more negative a larger part of the ions formed
in the ionization chamber can be extracted. When the extraction
electrode is made more negative than the depth of the potential
trough with extraction electrode at 0 volt, all the formed ions are
extracted, in principle. The ion efficiency increased in this
manner is, of course, associated with a larger energy spread in the
beam.
An ion source according to the invention can advantageously be
constructed so that the grid-shaped wall parts of the ionization
chamber are surrounded by a reflector electrode. If said reflector
electrode is given a small positive voltage of, for example, 1 volt
relative to the wall of the ionization chamber, ions which might
escape through the meshes of the grid-shaped wall portions are
reflected. The use of a reflector electrode hence permits larger
meshes of the grid-shaped wall parts of the ionization chamber.
An advantageous construction of the ion source according to the
invention is furthermore such that a screen grid is situated
between the extraction electrode and the accelerating electrode. It
is prevented by means of said screen grid that the electric field
of the accelerating electrode can penetrate through the meshes of
the extraction electrode, so that the energy spreading would be
adversely influenced.
In order that the invention may be readily carried into effect, it
will now be described in greater detail, by way of example, with
reference to the accompanying drawing, in which
FIG. 1 is a longitudinal cross-sectional view of an ion source
according to the invention,
FIG. 2 is a diagrammatic arrangement of the electrodes of an ion
source according to the invention having a screen grid between the
extraction electrode and the accelerating electrode,
FIG. 3 is a graphical representation of the ion current as a
function of the voltage of the extraction electrode,
FIG. 4 is a diagrammatic longitudinal cross-sectional view of an
ion source according to the invention with an alternative
arrangement of the filament.
FIG. 5 is a diagrammatic longitudinal cross-sectional view of an
ion source according to the invention comprising a target plate for
ion bombardment.
FIG. 6 is an embodiment having the alternative filament arrangement
diagrammatically shown in FIG. 4.
Referring now to FIG. 1, an ionization chamber 1 within an envelope
20 is formed by a coiled grid 2 wound on supporting wires 15, a
grid 3 and a plate 4 comprising an ion exit aperture 5. The grids 2
and 3 and the plate 4 are conductively interconnected. A
cylindrical metal reflector electrode 6 surrounds the grid 2 and
comprises at one end a grid 7 which is conductively connected to
the electrode 6. An electron-emitting filament 8 is situated
between a grid 9 and the grid 7. A fine-mesh grid 10 which is
connected to the extraction electrode 11 is situated immediately in
front of the ion exit aperture 5.
An accelerating electrode 12 comprising a grid 13 accelerates the
ions emanating through the grid 10. The electrodes are supported by
three glass rods 14 of which only two are visible in the drawing.
The envelope 20 is evacuated via an exhaust tube 21, the gas to be
ionized is supplied to the ionization chamber 1 via an inlet 22 and
an aperture 23 in the reflector electrode 6. The gas may also
generally be present within the envelope 20 and reach the
ionization chamber via all kinds of apertures in the electrode
system. The rods 14 are secured to an end plate which is detachably
secured to the envelope 20 and also comprises connections 25 for
the electrodes.
During operation of the ion source the filament 8 has a negative
voltage of, for example, 50 volt to 150 volt relative to the
ionization chamber 1 and emits electrons. The electrons are
injected into the chamber 1 via the grid 3 with an energy which is
sufficient to ionize gas molecules. The grid 9 is at a negative
potential relative to the filament 8 and directs the beam of
emitted electrons in the direction of the chamber 1.
The grid 10 of the extraction electrode 11 is at a small negative
potential of, for example, 1 volt relative to the wall of the
chamber 1 and extracts ions from said chamber. The extracted ions
are accelerated by the accelerating electrode 12 which has a
potential of, for example, - 50 volt to - 5 k.volt relative to the
chamber 1 and pass the grid 13 of same as a substantially parallel
beam.
FIG. 2 diagrammatically shows how a screen grid 30 can be arranged
between the grid 10 of the extraction electrode and the grid 13 of
the accelerating electrode. The strong accelerating field then is
between the grids 13 and 30 and does substantially not penetrate
through the meshes of the grid 10 in the chamber 1. The voltage of
the screen grid 30 is, for example, from - 50 volt to - 100 volt
relative to the chamber 1 dependent upon the voltage at the grid
13.
In the graphic representation of FIG. 3 it is shown that the ion
current i with small voltages V of the extraction electrode
relative to the wall of the chamber 1 rapidly increases with the
voltage. For larger voltages a saturation occurs. Point A is
indicated as a suitable adjusting point for sufficient ion current
at a sufficiently low voltage and hence small energy spread.
FIG. 4 diagrammatically shows an alternative arrangement for the
filament. The filament in the construction shown consists of two
parts 31 and 32 which are arranged at the side of the chamber 1. In
this case the reflector electrode should also be gridlike and is
denoted by a grid 36. A grid 39 is at a negative potential relative
to the filaments 31 and 32 and direct the emitted electrons towards
the chamber 1.
FIG. 5 diagrammatically shows an arrangement for ion bombardment of
a target plate 40.
FIG. 6 shows an ion source, comprising the alternative arrangement
for the filament as already shown in FIG. 4. In this ion source
penetration of the electron accelerating and reflecting field into
the ionization space is reduced by employing fine-mesh electrically
conducting material having good screening properties for the
permeable walls 52 and 53 of the ionization chamber 51. The mesh is
constructed from a metal which can be readily outgassed and can be
of woven construction. In one example a woven tungsten wire mesh
was employed having approximately 80 apertures per cm. and an
electron transparency of approximately 70 percent. The mesh is
supported at the edges of the walls 52 and 53 and intermediately
where necessary by a wire frame 65 and by the outer rim of the
aperture plate 54. Electron emissive hairpin filaments 68, 78
provided with respective supports 79, are located outside the
chamber 51 to either side thereof, and are independently connected
to respective terminal connections 85 which pass in vacuumtight
manner through the mounting and support flange 86. It is convenient
to employ both the filaments 68, 78 for heating the metal parts of
the apparatus by electron bombardment while outgassing, but only
one filament, for example 68, would normally be employed during
operation of the ion source. A conducting screen 59, at least a
part 80 of which can be of conducting mesh to allow the free
passage of gas molecules within the apparatus, is provided and
biased in operation slightly negatively with respect to the
filament 68. In this way an electron reflecting field is thus
provided outside the walls 52, 53 of the chamber 51, so that
electron emerging via the walls 52, 53 will be reflected and caused
to pass again through the ionization space within the chamber 1
thus improving their ionizing effect. The source shown in FIG. 6 is
in nude form being mounted on the flange 86 ready for attachment to
apparatus as desired. The remaining construction and arrangement of
this embodiment is however substantially the same as that of the
embodiment described with reference to FIG. 1.
The dimensions of the embodiment shown in FIG. 1 are as follows:
The chamber 1 is 2 cm. long and has a diameter also of 2 cm. The
ion exit aperture has a diameter of 5 mm. and the distance between
the grid 10 and the plate 4 is 0.1 mm. At a voltage of - 1 volt of
the grid 10 relative to the plate 4, the current intensity of the
extracted ion beam is 100 .mu.a. with an energy spreading of 0.6
ev. With the extraction voltage increasing, for example, the
current intensity is 10 ma. with an energy spread of 1.0 ev.
It is to be noted that there exist several alternative methods of
producing an ionizing electron beam in addition to all kinds of
arrangements of the filament. The invention comprises all said
methods. An alternative method is, for example, the mounting of
radioactive source in the proximity of the ion source, which emits
.beta. -particles into the chamber 1.
It is also to be noted that within the scope of the invention the
grids 10, 13 and 30 can be formed so that they exert a lens effect
on the ion beam so as to obtain, for example, an accurate parallel
beam.
* * * * *