U.S. patent number 3,616,434 [Application Number 04/722,435] was granted by the patent office on 1971-10-26 for apparatus with power source for plating.
This patent grant is currently assigned to Nova-Chrome, Inc.. Invention is credited to Johann Karl Hausner.
United States Patent |
3,616,434 |
Hausner |
October 26, 1971 |
APPARATUS WITH POWER SOURCE FOR PLATING
Abstract
Apparatus and method for plating with a pulsating direct current
variable in frequency so as to obtain desirable plating
characteristics. The amplitude as well as the frequency of the
plating current may be adjusted to obtain superior plating
results.
Inventors: |
Hausner; Johann Karl (Chicago,
IL) |
Assignee: |
Nova-Chrome, Inc. (Chicago,
IL)
|
Family
ID: |
24901823 |
Appl.
No.: |
04/722,435 |
Filed: |
April 18, 1968 |
Current U.S.
Class: |
204/229.5;
204/DIG.9; 205/103 |
Current CPC
Class: |
H02M
3/04 (20130101); C25D 5/18 (20130101); Y10S
204/09 (20130101) |
Current International
Class: |
C25D
5/18 (20060101); C25D 5/00 (20060101); H02M
3/04 (20060101); B01k 003/00 () |
Field of
Search: |
;204/228,45.9,51,35,224 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
Primary Examiner: Mack; John H.
Assistant Examiner: Valentine; D. R.
Claims
I claim as my invention:
1. In an electroplating apparatus having a plating bath and
electrodes, an improved source of power comprising:
a source of direct current voltage attached to said electrodes,
an alternating current pulse generator producing a series of output
pulses which are superimposed on the output of the source of direct
current voltage, means for adjusting the length of each output
pulse as a function of time forming a part of said pulse generator,
means for adjusting the time off of each of said output pulses
independent of the length of said pulses forming a part of said
pulse generating, means for adjusting the amplitude of said output
pulses forming a part of said pulse generator, and means for
adjusting the amplitude of the output of said direct current
source.
2. A source of power according to claim 1 wherein the ratio of the
time on to time off of the pulse generator varies from on 10
percent of the time to on 80 percent of the time.
3. A source of power according to claim 1 wherein the frequency of
said pulse generator is between 500 to 700 hertz.
4. A source of power according to claim 1 where the frequency of
said pulse generator is in the vicinity of 550 hertz.
5. A source of power according to claim 1 including means for
preventing feedback in the pulse generator.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates in general to plating, and in particular to a
new and novel plating apparatus and method wherein an alternating
current is superimposed on a direct current applied to a plating
bath and the amplitude and frequency of superimposed alternating
current produces improved plating characteristics.
2. Description of the Prior Art
My prior patent entitled "Electroplating," U.S. Pat. No. 2,824,830
discloses superimposing on a DC field in a plating bath at least
two high-frequency fields of relatively high frequencies.
SUMMARY OF THE INVENTION
An improved apparatus and method of plating which uses
semiconductor devices for producing a direct current plating signal
upon which is superimposed alternating current pulses of varying
amplitudes and which may be varied in frequency and in time on and
time off to control the shape of the AC pulses and obtain much
improved plating results over the prior art. An amplifier is
provided which when connected in the circuit prevents feedback.
Other and further objects of this invention will be apparent to
those skilled in this art from the following detailed description
of the annexed sheets of drawings which, by way of a preferred
embodiment of the invention, illustrate one example of the
invention.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic diagram of the plating apparatus of this
invention.
FIG. 2 is a graph of the plating response in which the AC signal
has a frequency of 450 hertz.
FIG. 3 is a graph of the plating response using an AC pulse of 550
hertz.
FIG. 4 illustrates a plating characteristic utilizing an AC pulse
of 700 hertz;
FIG. 5 illustrates a plating characteristic utilizing a 600 hertz
signal; and
FIG. 6 illustrates a plating response utilizing an AC signal of
1,800 hertz .
DESCRIPTION OF THE PREFERRED EMBODIMENTS
FIG. 1 illustrates a plating bath 10 which includes a cathode 11
and an anode 12 to which plating leads 13 and 14 are attached,
respectively. A cathode-ray oscilloscope 16 connected across the
leads 13 and 14 indicates to an operator the wave shape of the
applied signal to the plating bath.
For example, plating may be carried out in a chrome plating aqueous
electrolyte bath, having 250 grams per liter of CrO.sub.3 (as
chromic acid), 1.8 percent sulfuric acid (H.sub.2 SO.sub.4), 3
percent boric acid (H.sub.3 BO.sub.4), and 1 percent oxalic acid.
In this bath, the essential pH control is provided by the sulfuric
acid, but superior results are obtained by the use also of
substantially 0.5-5.0 percent boric acid and 0.1-3.0 percent oxalic
acid. (Unless otherwise specified, the terms "parts" and
"percentage" mean the same by weight.) The plating bath is
maintained at 135.degree. F., while plating with a cathode current
density of about 2-3 amperes per square inch. The anode may be lead
or other conventional material. The specific cathode A.S.I. (DC) is
measured when the pulsating current in operation is recited with
other operating conditions in FIGS. 2 through 6, and under the
conditions established in such figures.
A resistor R.sub.1 is also connected across leads 13 and 14. An
ammeter 17 is connected in line 13 and is bridged by a suitable
shunt R.sub.2. A diode D.sub.1 is connected to resistor R.sub.2 and
a condenser C.sub.1 is connected from line 14 to diode D.sub.1. A
voltmeter 18 is connected across condenser C.sub.1. A source of
3-phase 220 volts, for example, AC is connected to terminals 19, 20
and 21 and through a circuit breaker 22 to a Y primary 23 of a
transformer. A light 24, for indicating that power is on, is
connected between contacts 20 and 19 in series with a resistor
R.sub.3. A delta-connected portion of the transformer is designated
as 24 and is connected to adjustable wiper contacts 26, 27 and 28
which engage the Y-connected primary 23 to vary the voltage to the
unit 24 of the transformer. A Y-connected output 29 is magnetically
coupled to the portion 24 and is connected to a full-wave rectifier
designated generally as 31, and which comprises the diodes D.sub.2
through D.sub.7. An inductor L.sub.1 is connected between the
diodes D.sub.2, D.sub.3 and D.sub.4 and the diode D.sub.1. Thus the
rectifier 31 supplies rectified direct current to the plating bath.
The inductor L.sub.1 and capacitor C.sub.1 provide a smoothing
filter. Lead 32 is connected to lead 14 and provides an input lead
for superimposing an AC pulsing signal on the direct current
supplied to the plating bath. A second lead 33 provides the second
lead for providing the AC pulsating input to the plating bath. A
pair of input leads 34 and 36 are connected to a suitable AC source
as, for example, 120-volt single-phase alternating current power.
The circuit breaker 37 is connected in circuit with input terminals
34 and 36. A resistor R.sub.4 and indicator light 38 are connected
across the input terminals 34 and 36. Primary 39 of an auto
transformer is connected to terminals 34 and 36, and has a
secondary 41 which has a slide contact that may be controlled by
the knob 42. A secondary 43 is coupled to the winding 41, and
supplies an input to a rectifier designated generally as 44,
comprising the diodes D.sub.8 through D.sub.11. Condenser C.sub.2
is connected across the output terminals of the rectifier 44. A
variable potentiometer 46 is connected to point B and controls the
time off of the alternating current output. The potentiometer 46 is
connected to the base of a transistor T.sub.1 which has its
collector connected to the base of a transistor T.sub.2. The
collector of transistor T.sub.2 is connected to a tunnel diode
D.sub.12. A time-on potentiometer 47 is connected to the emitter of
transistor T.sub.1. A pair of diodes D.sub.30 and D.sub.14 are
connected in series between the emitters of transistors T.sub.1 and
T.sub.2. A resistor R.sub.5 is connected between the tunnel diode
D.sub.12 and the base of a transistor T.sub.3. The emitter of the
transistor T.sub.3 is connected to the base of transistor T.sub.4.
The collector of transistor T.sub.4 is connected to the bases of
transistors T.sub.5 through T.sub.9. A lead 48 is also connected to
the potentiometer 46 and to resistors R.sub.6 through R.sub.11
which have their opposite sides connected to the emitters of the
transistors T.sub.5 through T.sub.9. An input terminal for reverse
bias 49 is connected to lead 48 and a terminal 51 is connected to
the bases of the transistors T.sub.5 through T.sub.9 through the
resistor R.sub.12. Lead 33 is connected to the collectors of the
transistors T.sub.5 through T.sub.9 through a switch 52. The switch
52 is closed when the solenoid 53 is energized. A bias voltage is
supplied by rectifiers 54 and 56 which respectively comprise diodes
D.sub.13 through D.sub.16 and diodes D.sub.17 through D.sub.20. The
rectifier 54 is connected across the secondary 57 of a transformer
which has its primary 58 connected to the power leads 34 and 36. A
primary 59 of a transformer is also connected to the input power
leads 34 and 36 and has its secondary 61 connected to the rectifier
56. A resistor R.sub.13 is connected to one output of the rectifier
54 and condensers C.sub.5, C.sub.6 and C.sub.7 are connected in
parallel between the other output lead of the rectifier 54 and
resistor R.sub.13. A lead 62 is connected between the resistor
R.sub.13 and point B of the rectifier 44. The time-on potentiometer
is also connected to the condensers C.sub.5, C.sub.6 and C.sub.7. A
lead 63 is connected to the output of the rectifiers 54 and 56 and
a resistor R.sub.14 is connected between the lead 63 and the
collector of the transistor T.sub.2. Lead 63 is also connected to
the emitter of the transistor T.sub.4. A light 64 is connected
across the output of the rectifier 56. A resistor R.sub.15 is
connected in series with a diode D.sub.21 in one output line of the
rectifier 56 and a pair of condensers C.sub.8 and C.sub.9 are
connected in parallel between the leads 66 and 67. A resistor
R.sub.16 and a variable resistor R.sub.17 and a resistor R.sub.18
and a capacitor C.sub.10 are connected between the collector of
transistor T.sub.1 and lead 66. A resistor R.sub.19 is connected
from resistor R.sub.16 to a unijunction transistor UT.sub.1 and
particularly to the base 1 terminal. The emitter terminal of the
unijunction UT.sub.1 is connected to the junction point between the
resistor R.sub.18 and the capacitor C.sub.10. The base 2 electrode
of the unijunction transistor UT.sub.1 is connected to resistors
R.sub.20 and R.sub.21 which have their opposite sides connected to
the lead 66. A diode D.sub.22 is connected from the base 2 of the
unijunction transistor UT.sub.1 to a resistor R.sub.22 which has
its opposite side connected to resistor R.sub.19 and a resistor
R.sub.23 which has its opposite side connected to the lead 67. A
capacitor C.sub.13 is connected between resistor R.sub.23 and a
resistor R.sub.24 which has its opposite side connected to the lead
67. An SCR.sub.1 is connected between capacitor C.sub.13 and lead
66 and has its control electrode connected to the base 2 of the
unijunction transistor UT.sub.1. A second SCR.sub.2 is connected
between resistor R.sub.24 and lead 66 and has its control electrode
connected to the base 2 electrode of a unijunction transistor
UT.sub.2. A resistor R.sub.25 is connected between the control
electrode of the SCR.sub.2 and lead 66. A resistor R.sub.26 is
connected from resistor R.sub.24 to the first base electrode of the
unijunction transistor UT.sub.2. Variable resistor R.sub.27 is
connected in series with the resistor R.sub.28 between the resistor
R.sub.26 and the emitter of the unijunction transistor UT.sub.2.
The condenser C.sub.11 is connected between lead 66 and resistor
R.sub.26. The solenoid 53 is connected across the output terminals
of the rectifier 56.
In operation, power is applied to terminals 19, 20, 21, 34 and 36,
and the potentiometers 46 and 47 are adjusted with knob 42 and
contacts 26, 27 and 28 to obtain an input to the electrodes 11 and
12 of the plating bath to obtain a greatly improved plating
characteristic. The AC pulses applied by leads 32 and 33 to the
bath are superimposed upon the direct current from the rectifier 31
and the frequency of the pulses may be adjusted as well as the "on"
and "off" duty cycle by controlling the potentiometers 46 and 47,
for example. The transistors T.sub.1 through T.sub.9 operate as a
pulse generator and a meter 70 is connected from lead 48 to lead 32
and indicates the amplitude of the pulses. The unijunction
transistors UT.sub.1 and UT.sub.2 and SCRs, SCR.sub.1 and SCR.sub.2
prevent feedback and provide an improved output of the pulse
generator.
FIGS. 2 through 6 illustrate the plating characteristics that may
be obtained with different adjustments at the circuit of FIG. 1.
FIG. 2, for example, illustrates the plating characteristic
utilizing an output AC pulse of 450 hertz with an amplitude of 7
volts and with the direct current voltage read by meter 18 being 5
volts, and the meter 17 reading 3 amperes, and with the pulse
current being equal to 11/2 amperes. It was found that the plating
had a Rockwell hardness of C68, that the quality of the plating was
poor, that the throwing power was poor and that the buildup was
heavy, but that there were no bleeders. As shown in FIG. 2, the
plating rate was relatively slow.
FIG. 3 illustrates the plating characteristic using a frequency
output of the pulse generator of 550 hertz with meter 70 reading 7
volts, the meter 18 reading 5 volts, and the DC current read by
meter 17 being 3 amperes, and the pulse amperage being 11/2
amperes. The Rockwell hardness was C72; quality of the plating was
excellent; throwing power was excellent, and there were no bleeders
or buildup. It is to be particularly noted that the plating rate
was over twice as great as the plating which occurred under the
conditions of FIG. 2. Specifically, in 4 hours of plating, the
characteristics of FIG. 2 resulted in a thickness of 0.006 inch,
whereas the characteristic of FIG. 3 resulted in a plating
thickness of 0.014 inch.
FIG. 4 is a plating characteristic utilizing a pulse frequency of
700 hertz at an amplitude of 6 volts and with a DC voltage being
equal to 5 volts and a DC amperage equal to 3 amperes, and the
pulse amperage being 11/2. The Rockwell hardness for the plating
was C70; the quality was good; the throwing power was good; there
were no bleeders, and there was only slight buildup.
FIG. 5 illustrates a plating characteristic utilizing a pulse
frequency of 600 hertz at an amplitude of 5 volts, with the DC
voltage being 6, the DC amperage being 3 and the pulse amperage
being 11/2. The Rockwell hardness was C72; the quality and throwing
power were excellent, and there were no bleeders or buildup.
FIG. 6 illustrates a plating characteristic utilizing 1,800 hertz
for the pulse frequency, with the amplitude equal to 5 volts. The
DC voltage was 5; pulse voltage was 31/2; DC amperage was 2
amperes, and the pulse amperage was 11/2. The Rockwell hardness was
C70; the quality and throwing power were fair; there were no
bleeders, and there was only slight buildup.
It is seen that the characteristics illustrated in FIG. 3 give much
improved results over the characteristics illustrated in the other
figures -- 2, 4, 5 and 6. Thus, by controlling the amplitude of the
pulses and the frequency of the pulses, much-improved plating
results may be obtained. The pulse-on and pulse-off time controls
the pulse current, and the conditions illustrated in FIG. 3 provide
much-improved plating results.
It is interesting to note the plating speed variation as a function
of frequency. Note that at 450 and 1,800 hertz, the plating
thickness is 0.006 of an inch after 4 hours; whereas at 550 hertz
the plating reaches 0.014 of an inch at 4 hours.
Although I have herein set forth my invention with respect to
certain specific principles and details thereof, it will be
understood that these may be varied without departing from the
spirit and scope of the invention as set forth in the hereunto
appended claims.
* * * * *