U.S. patent number 3,569,777 [Application Number 04/845,352] was granted by the patent office on 1971-03-09 for impedance matching network for plasma-generating apparatus.
This patent grant is currently assigned to International Plasma Corporation. Invention is credited to Harvey James Beaudry.
United States Patent |
3,569,777 |
Beaudry |
March 9, 1971 |
IMPEDANCE MATCHING NETWORK FOR PLASMA-GENERATING APPARATUS
Abstract
A passive impedance-matching network specifically designed to
provide an interface between a fixed radio frequency power output
of a generator and the capacitive electrodes of the gaseous plasma
chamber of a plasma-generating apparatus, the network having the
particular characteristic of providing a close impedance match over
a relatively wide changing impedance range of the plasma in
accordance with a known program.
Inventors: |
Beaudry; Harvey James (Fremont,
CA) |
Assignee: |
International Plasma
Corporation (N/A)
|
Family
ID: |
25295042 |
Appl.
No.: |
04/845,352 |
Filed: |
July 28, 1969 |
Current U.S.
Class: |
315/111.21;
333/32; 204/298.08; 315/276; 313/607; 331/74; 216/6; 216/67;
156/345.44 |
Current CPC
Class: |
H05B
41/30 (20130101); H05H 1/30 (20130101) |
Current International
Class: |
H05H
1/26 (20060101); H05H 1/30 (20060101); H05B
41/30 (20060101); H01j 001/24 (); H01j
011/00 () |
Field of
Search: |
;315/111,276 ;313/201
;331/74,75 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Lake; Roy
Assistant Examiner: Demeo; Palmer C.
Claims
I claim:
1. In a plasma-generating apparatus including an RF generator
having substantially a resistive impedance and a fixed frequency
power output, a gaseous plasma chamber and means for flowing gas
therethrough and capacitive electrodes for exciting the gas
therein, the improvement comprising an impedance-matching network
having input and common line terminals adapted for connection to
said generator output and output and common line terminals adapted
for connection to said electrodes, a first inductor having one end
connected to said input terminal, a second inductor having one end
connected to the other end of said first inductor and its other end
connected to said output terminal, said inductors being mounted in
mutually coupled relation, a first capacitor having its opposite
sides connected respectively to said input and common line
terminals, and means providing a second capacitor having its
opposite sides connected respectively to the junction between said
inductors and said common line terminal.
2. The impedance matching network as defined in claim 1, said means
providing a resistor in parallel with said second capacitor.
3. The impedance matching network as defined in claim 1, and a
third inductor of relatively high impedance compared to said first
and second inductors and being connected in parallel across said
first capacitor for the protection thereof prior to initiation of a
plasma in said chamber.
4. A plasma-generating apparatus comprising: means providing a
gaseous plasma chamber and means for flowing gas therethrough and
capacitive electrodes for exciting the gas in said chamber, a
substantially fixed frequency RF generator having a substantially
resistive output impedance having one side connected to one of said
electrodes, an air core transformer having mutually coupled
windings having first ends connected to place said windings in
series and opposite ends connected to the other side of said
generator output and the other of said electrodes, respectively, a
capacitor connected across said generator output and means
providing a second capacitor having its opposite sides connected to
said first winding ends and said first named generator side.
5. The apparatus as defined in claim 4, said last named means
providing a resistor in parallel with said second capacitor.
6. The apparatus as defined in claim 5, a third inductor of
relatively high impedance compared to said windings and being
connected in parallel across said first named capacitor, said
inductor having an inductance sufficiently high to exhibit a
substantially open circuit characteristic during operation of a
plasma in said chamber and sufficiently low to provide protection
for said first named capacitor prior to initiation of said plasma.
Description
The invention relates to plasma-generating machines and more
particularly to an impedance converter for connecting the radio
frequency power output of the generator to the plasma-producing
electrodes.
Electrodeless gas excitation devices, more popularly referred to as
plasma machines, operate to provide a relatively low temperature
gas plasma. These machines are used for a variety of programs such
as low temperature ashing of organic samples for analysis and
diagnostic work, the removal of photoresist from silicone wafers in
the process of manufacturing solid state components, and other
applications.
The plasma-generating apparatus consists briefly of a glass or
quartz tube or envelope providing a plasma chamber and having inlet
and discharge passages adapted for connection to a gas source and a
vacuum pump for flowing gas through the chamber at controlled flow
rates and pressures, electrodes mounted externally of the envelope
for exciting the gas in the chamber to form the plasma, and a radio
frequency generator for supplying high frequency power to the
electrodes. In the instance of plasma ashing, for example, the
species in the plasma are chemically "consumed" in the ashing
process, and optimum ashing conditions require a predetermined
program of a proper balance of power, gas flow and pressure. By a
series of experiments, a program may be evolved for ashing a given
type of sample which involves the controlling, with time, of
varying amounts of power, gas flow, and pressure, and degree of
sample temperature and ashing rate. In a similar manner, a program
may be evolved for varying these same parameters for the removal of
photoresist from silicone wafers, and the like.
Changes in the operating parameters of the plasma, gas flow rate,
pressure and power affect the load impedance of the plasma as seen
at the capacitive electrodes. Accordingly, an impedance converter
is customarily inserted between the generator output and the plasma
electrodes so as to provide an impedance match therebetween. As
will be understood, an impedance mismatch between the generator and
the plasma results in loss of power and efficiency. Such a
converter usually includes a variable capacitor and a variable
inductor which are required to be varied during the operation of
the program to provide impedance matching. The periodic and
critical manual tuning of these variable impedances is difficult to
accomplish quickly, and consequently the processing program must be
constantly interrupted while the operator searches for impedance
settings required to minimize the reflected power as the above
parameters are changed. What is equally disconcerting is the so far
lack of dependable repeatability in subsequently reproducing the
earlier set of balanced conditions. The actual amount of energy
delivered to the gas will not always reproduce precisely with the
result that even though records are kept of the impedance
adjustments made, satisfactory impedance matching may not result by
returning such impedances to the same settings in subsequent
processing cycles. The problem is further complicated by the use of
different gases in the plasma, a placing of solids in the system,
and the release of vapors into the plasma.
It is accordingly an object of the invention to provide an
impedance-matching network for plasma-generating apparatus which
will automatically provide, without any required manual adjustment
whatever, substantial impedance matching between the generator and
capacitive electrodes of the gaseous plasma chamber continuously
and throughout a range of changing parameters required to carry out
a known plasma-chemical process.
Another object of the present invention is to provide an
impedance-matching network of the character above which functions
in a passive manner to provide automatic matching without
necessitating, except for initial adjustment, the need for or use
of moving parts.
A further object of the present invention is to provide an
automatic impedance-matching network of the character described
which is interchangeable with the existing manually operable
converter.
Further and more specific objects and advantages of the present
invention are made apparent in the following specification wherein
a preferred form of the invention is described with reference to
the following drawings.
In the drawings:
FIG. 1 is a diagrammatic representation of a plasma-generating
apparatus embodying the improvement of the present invention.
FIG. 2 is a schematic wiring diagram of an impedance-matching
network constructed in accordance with the present invention and
shown connected to the plasma chamber.
FIG. 3 is a chart showing processing parameters of the power,
pressure and gas flow for which the present device will provide
satisfactory and automatic impedance matching.
With reference to the accompanying drawing, the plasma-generating
apparatus comprises briefly a gaseous plasma chamber 11 provided by
a glass or quartz tube or envelope 12 formed with inlet and
discharge connections 13 and 14 adapted for connection, as by
conduits 16 and 17, to a source 18 of gas under pressure and a
vacuum pump 19 respectively, to provide a flowing of gas through
chamber 11; capacitive electrodes 21 and 22 mounted exteriorly on
envelope 12 for exciting the gas therein; and means 23 for
supplying radio frequency power via a converter 24 to electrodes 21
and 22; the converter functioning to provide an impedance matching
between the output of the generator 23 and the plasma as seen at
electrodes 21 and 22. Conventionally also a wattmeter 31 is
inserted in the line 32 between generator 23 and converter 24 in
order to measure and indicate the forward and reflected power; the
electrical connections between these components being preferably
provided by coaxial conductors 32 and 33, and between converter 24
and electrodes 21 and 22 by conductors 26 and 27.
Radio frequency (sometimes hereinafter abbreviated RF) generators
employed to provide power for plasma machines customarily operate
on an F.C.C. preset frequency of 13.56 mHz., and must be designed
to deliver power under widely changing load impedance conditions. A
preferred generator construction is disclosed in my copending
application, U.S. Ser. No. 753,474, for RADIO FREQUENCY GENERATOR
CIRCUITS AND COMPONENTS THEREFOR. The equivalent circuit for the
generator may be represented as a resistance (see resistor 36 in
FIG. 2) equal to the internal plate impedance of the generator at
resonance. The generator's own internal network transposes the
relatively high plate impedance of its power tube to the equivalent
of a relatively low impedance, say 50 ohms, for feeding into a 50
ohm coaxial line 32. Thus, for present purposes, the equivalent
circuit of the generator may be considered as that of the coaxial
line 32--33 connected to the converter, or with reference to FIG. 2
as that of resistor 36 representing a 50 ohm output generator
supplying radio frequency energy to the input of the matching
network.
Wattmeter 31 should be designed to provide a showing of both
forward and reflected power, the latter evidencing a mismatch
between the output impedance of the generator and the plasma load.
The wattmeter must have the further characteristic of being
insertable in the transmission line without itself significantly
changing the load impedance conditions. A preferred wattmeter
construction is disclosed in my copending application U.S. Serial
No. 753,681, for RADIO FREQUENCY WATTMETER.
Plasma-generating apparatus, including the several above-described
components, and having a manually tunable converter to provide
impedance matching between the RF generator and the plasma chamber
are commercially available, as for example, the Plasma Machine
Model 1101 manufactured by International Plasma Corporation of
Hayward, California.
The plasma equivalent circuit as shown in FIG. 2 of the drawing may
be reduced to a parallel connected capacitor 38 and resistor 39.
The capacitance in the absence of a plasma is of a very small
magnitude, being the capacitance across electrodes 21 and 22, and
is in the order of 20 pico farads-- perhaps 1 percent of the
capacitance when the plasma is present. During operation of the
plasma, the capacitance may be in the order of 2000 pico farads,
but will vary with gas flow rate and pressure, and power. As
illustrated in FIG. 1, a manually controlled valve 66, pressure
meter 67, and flow rate meter 68 are customarily incorporated in
the gas conduit 16 leading to the plasma chamber for controlling
and regulating the gas flow rate and pressure. Generally, as more
power is applied to a given quantity of gas, greater ionization
results with an increase in capacitance and a decrease in
resistance. On the other hand, at a constant power, say, 1000
watts, the impedance will change with the flow rate and pressure at
a relatively high vacuum of a few microns, say, 10 microns, the
capacitance may be on the order of perhaps 100 pico farads and the
effective resistance high, say, several hundred ohms. At the other
extreme, let's say a pressure of 50,000 microns, the resistance
will be in the order of a few ohms, perhaps 3 or 4 ohms, and the
capacitance several thousand, perhaps 5000 or 6000 pico farads.
The matching network which is the improvement of the present
invention is here provided with input and common line terminals 41
and 42 adapted for connection to the generator output terminals 43
and 44, and output and common line terminals 46 and 47 adapted for
connection to input terminals 48 and 49 of the plasma electrodes 21
and 22. The network comprises briefly an inductor 51 having one end
52 connected by conduit 53 to input terminal 41; a second inductor
56 having one end 57 connected to the other end 58 of inductor 51
and its opposite end 59 connected to output terminal 46; inductors
51 and 56 being mounted in mutually coupled relation to provide an
air core transformer; a capacitor 61 having its opposite sides
connected, respectively, to input terminal 41 and common terminal
42; and a capacitor 62 having its opposite sides connected
respectively to the junction 63 between inductors 51 and 56 and the
common line terminal 42--47, the common line here being a common
ground and being generally identified by numeral 64.
The basic network as above described will be seen as two mutually
coupled networks which cofunction with the input and load
impedances to automatically provide close impedance matching
between the output of the generator and the plasma load over a
limited range of changing parameters of power, flow rate and
pressure. While the operation of the converter is not perfect in
covering all possible combinations, it is extremely good in such a
large number of combinations as to be very useful and completely
effective in maintaining the reflected power to a minimum, say,
below 5 percent, in various preprogrammed operations. Ideally all
of the voltage and all of the energy leaving the generator would
undergo no phase shift and would be delivered directly into the
load impedance of the ionized gas. Theoretically this optimum
efficiency occurs when the Qs of the connected circuits are exactly
the same, that is the output Q of the generator, the input Q of the
network, the output Q of the network and the Q of the plasma. One
concept of the present converter is that the Q of the matching
network is not greatly upset within its intended range of operation
with the result that there will be within such range very little
reflected power. Without the present network the reflected power
may well be in the range of several hundred watts, representing
perhaps 30 or 40 percent of the applied power. The dynamics of the
network are most complicated due to changes in impedances,
temperature of coil windings, the Qs of the inductors, circulating
losses and time constants involved in the foregoing all operating
in a complex integral relationship which stabilizes for a given set
of plasma parameters to provide the substantial impedance matching
described, but which make a complete explanation of the operation
of the circuit most complex and difficult.
The automatic response of the circuit is broadened measurably by
the introduction of a resistance, shown as resistor 71, connected
in parallel across capacitor 62. In practice this resistor may be
obtained by using a very lossy ceramic capacitor. Resistor 71
functions to stabilize and shape the Q of the network to correspond
with the Q of the plasma and also tends to limit to some extent the
change in Q of the plasma, because its Q is determined also by some
of the reactance coupled from the network.
In order to obtain an initial setting of the network, capacitor 61
is selected of a variable type; a trimmer inductor 76 is connected
across inductor 51 to adjust the effective inductance thereof; and
a trimmer capacitor 77 is connected in parallel across capacitor
62. These variable components are factory-adjusted with the plasma
in operation under a predetermined set of parameters until the
reflected power substantially disappears for such operation.
Thereafter a change in the parameters of the plasma over a known
program for which the network is suited will not materially affect
the amount of reflected power. For most programs the network of the
present invention will effect a delivery of better than 95 percent
of the applied power to the plasma.
Another important feature of the present network is the ability to
handle very high amounts of reflected power which occurs on
initiating operation and prior to the establishment of a plasma
within chamber 11. This feature is provided by an inductor 78 which
is connected across capacitor 62 and serves to protect the
capacitor against arcing under the impact of the high standing wave
energy which accompanies the complete mismatch condition prior to
initiation of the ionized plasma. Inductor 78 is preferably wound
like a radio frequency choke and has an inductance very much higher
than inductors 51 and 56 so as to present a substantial circuit
under normal operating conditions but still being sufficiently low
so as to provide the desired protection for capacitor 61. By way of
example, inductor 78 may be in the millihenry range while inductors
51 and 56 are in the microhenry range.
A specific example follows using for purposes of illustration a
plasma generating apparatus having a plurality, in this case six 3"
.times. 6" long plasma reaction chambers; an RF generator output of
up to 1000 watts at 13.56 mHz. and a gas flow of up to 1000 cc per
minute over a pressure range of about 700 to 10,000 microns of Hg.
A plasma was established using oxygen gas and, with the generator
and gas controls set to deliver approximately 400 watts of power
and a gaseous flow rate of about 400 cc., the variable reactances
61, 76 and 77 were tuned to provide less than 1 watt of reflected
power. The component values selected and thus arrived at were as
follows:
inductor 51 15 microhenrys
inductor 76 2 microhenrys
inductor 56 1.8 microhenrys
inductor 78 1 millihenry
capacitor 61 17 pico farads
capacitor 62 100 pico farads
capacitor 77 560 pico farads
resistor 71 approximately 50 megohms
(here being the
internal resistance
of capacitor 62)
The performance of the foregoing apparatus is illustrated in FIG. 3
showing the chart of an envelope of parameters within which the
reflected power was found to be less than about 5 percent of the
forward or applied power. In FIG. 3 applied power over a range of
up to 1000 watts is plotted as the ordinate and gas flow rate
ranging up to 1000 cc. per minute as the abscissa. The
corresponding gaseous pressure ranging up to 10,000 microns Hg is
also shown along the abscissa. It will be observed that the
envelope of operating parameters for which the converter of the
present invention is best suited, generally follows the
relationship of 1 watt of power for each cc per minute gas flow,
which is a generally recommended relationship for various
plasma-chemical processes. It will be observed that in all 1-to-1
power to gas flow relationships the automatic impedance-matching
network of the present invention will transmit 95 percent or better
of the applied power. However, the apparatus is capable of
automatic accommodation to other plasma parameter relationships.
For example, with applied power of 300 watts there will be less
than 5 percent reflected power for gas flow rates between about 150
and 500 cc. per minute. Similarly, at 100 watts the flow rate may
vary from about 200 to about 800 cc. per minute; at 500 watts from
about 300 to 900 cc. per minute; at 600 watts from about 350 to
about 950 cc. per minute; and at 700 watts from about 500 cc. to
1000 cc. per minute. Other permissible power, gas flow rate and
pressure relationships resulting in a delivery of at least 95
percent of the applied power may be readily taken from the
chart.
A present automatic converter is designed for direct
interchangeability with existing manually tunable converters, thus
facilitating a user's exploring of diverse applications of his
plasma machine and also to enable the user to establish the optimum
power-gas-flow rate for a given plasma-chamical process which may
thereafter be carried out with the automatic impedance matching
network of the present invention.
* * * * *