U.S. patent application number 17/723160 was filed with the patent office on 2022-08-04 for manufacturing method of processed resin substrate and laser processing apparatus.
The applicant listed for this patent is Laser Systems Inc., NICHIA CORPORATION. Invention is credited to Masayuki HAYASHIDA, Masakazu SAKAMOTO, Kock Khuen SEET, Hiroto TAMAKI.
Application Number | 20220241901 17/723160 |
Document ID | / |
Family ID | |
Filed Date | 2022-08-04 |
United States Patent
Application |
20220241901 |
Kind Code |
A1 |
SEET; Kock Khuen ; et
al. |
August 4, 2022 |
MANUFACTURING METHOD OF PROCESSED RESIN SUBSTRATE AND LASER
PROCESSING APPARATUS
Abstract
A manufacturing method of a processed resin substrate includes:
preparing a resin substrate including a resin layer and a metal
layer that covers at least a part of one surface of the resin
layer; and forming a through hole in the resin substrate by
irradiating the resin substrate with pulsed laser light. In the
forming of the through hole, an interval of irradiation of the
pulsed laser light at each point on the resin substrate is 5 msec
or more.
Inventors: |
SEET; Kock Khuen; (Hokkaido,
JP) ; HAYASHIDA; Masayuki; (Tokushima, JP) ;
SAKAMOTO; Masakazu; (Tokushima-shi, JP) ; TAMAKI;
Hiroto; (Anan-shi, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Laser Systems Inc.
NICHIA CORPORATION |
Hokkaido
Tokushima |
|
JP
JP |
|
|
Appl. No.: |
17/723160 |
Filed: |
April 18, 2022 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
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15337513 |
Oct 28, 2016 |
11338393 |
|
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17723160 |
|
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International
Class: |
B23K 26/382 20060101
B23K026/382; H05K 3/00 20060101 H05K003/00; B23K 26/18 20060101
B23K026/18; B23K 26/0622 20060101 B23K026/0622; B23K 26/082
20060101 B23K026/082; B23K 26/402 20060101 B23K026/402 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 30, 2015 |
JP |
2015-214787 |
Claims
1. A laser processing apparatus that forms a through hole by
irradiating a resin substrate with pulsed laser light, the laser
processing apparatus comprising: a laser light source that emits
pulsed laser light; a stage on which to place a resin substrate
including a resin layer and a metal layer that covers at least a
part of one surface of the resin layer; an optical system that
guides the pulsed laser light emitted from the laser light source
to the resin substrate placed on the stage; a scanning section that
moves at least one of the stage and a condensing point of the
pulsed laser light guided by the optical system to relatively move
the resin substrate placed on the stage and the condensing point of
the pulsed laser light; and a control section that controls an
operation of the scanning section, wherein: the control section
controls the scanning section to perform a plurality of laps of
scanning with the pulsed laser light along a predetermined
circumference of the through hole, wherein an interval of
irradiation of the pulsed laser light at each point on the
predetermined circumference between each lap is 5 msec or more.
2. The laser processing apparatus according to claim 1, wherein: a
scanning time of one lap of the predetermined circumference with
the pulsed laser light is less than 5 msec; and irradiation of the
pulsed laser light is intermittently stopped such that the interval
of irradiation of the pulsed laser light at each point on the
predetermined circumference between each lap is 5 msec or more.
3. The laser processing apparatus according to claim 1, wherein the
pulsed laser light includes a pulse width of 10 psec to 100
nsec.
4. The laser processing apparatus according to claim 1, wherein the
pulsed laser light includes a repetition frequency of 100 kHz or
greater.
5. The laser processing apparatus according to claim 1, wherein:
the interval of irradiation including: an interval of the pulsed
laser light at a given point along the predetermined circumference
of the through hole on the resin substrate, and an interval between
irradiation with the pulsed laser light of an nth-round and
irradiation with the pulsed laser light of an (n+1)th-round.
6. The laser processing apparatus according to claim 1, wherein: a
scanning speed of the pulsed laser light to the resin substrate is
200 mm/sec or more; and an output of the pulsed laser light is 10 W
or greater.
7. The laser processing apparatus according to claim 1, wherein: a
wavelength of the pulsed laser light is 250 to 2000 nm; and an
output of the pulsed laser light is 10 W or greater.
8. The laser processing apparatus according to claim 1, wherein:
the condensing point of the pulsed laser light is located in the
resin layer; a wavelength of the pulsed laser light is 355 nm; a
pulse energy of the pulsed laser light is 3 .mu.J or greater; a
fluence of the pulsed laser light on the surface of the resin
substrate is 3 J/cm.sup.2 or greater; and a fluence of the pulsed
laser light at the condensing point is 10 J/cm.sup.2 or greater.
Description
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional of U.S. patent application
Ser. No. 15/337,513, filed on Oct. 28, 2016, which is entitled to
and claims the benefit of Japanese Patent Application No.
2015-214787, filed on Oct. 30, 2015, the disclosure of which
including the specification, drawings and abstract is incorporated
herein by reference in its entirety.
BACKGROUND
Technical Field
[0002] The present invention relates to a manufacturing method of a
processed resin substrate and a laser processing apparatus.
Description of Related Art
[0003] In the field of printed substrates such as a glass epoxy
substrate, resins such as epoxy resin and polyimide are often used
as the insulating material. In a printed substrate having such a
resin layer, a plurality of through holes are provided for various
purposes. Conventionally, through holes have been formed by machine
processing using drills, rooters, and the like. In recent years,
through holes are formed by laser processing in some situation.
[0004] For example, Japanese Patent Application Laid-Open No.
2012-61480 discloses a method for forming a through hole by
irradiating a flexible printed substrate including a polyimide
resin layer having a thickness of 25 .mu.m with pulsed laser light
having a wavelength equal to or greater than 400 nm and smaller
than 9 .mu.m. In this method, a through hole is formed by
performing scanning with pulsed laser light in multiple rounds
along an annular path or a spiral path corresponding to a
predetermined outer edge line of the through hole.
SUMMARY
[0005] According to one aspect of the present invention relates to
a manufacturing method of a processed resin substrate including:
preparing a resin substrate including a resin layer and a metal
layer that covers at least a part of one surface of the resin
layer; and forming a through hole in the resin substrate by
irradiating the resin substrate with pulsed laser light. In the
forming of the through hole, an interval of irradiation of the
pulsed laser light at each point on the resin substrate is 5 msec
or more.
[0006] Further, according to another aspect of the present
invention relates to a laser processing apparatus that irradiates a
resin substrate with pulsed laser light to form a through hole, the
laser processing apparatus including: a laser light source that
emits pulsed laser light; a stage on which to place a resin
substrate including a resin layer and a metal layer that covers at
least a part of one surface of the resin layer; an optical system
that guides the pulsed laser light emitted from the laser light
source to the resin substrate placed on the stage; a scanning
section that moves at least one of the stage and a condensing point
of the pulsed laser light guided by the optical system to
relatively move the resin substrate placed on the stage and the
condensing point of the pulsed laser light; and a control section
that controls an operation of the scanning section. The control
section controls the scanning section such that the pulsed laser
light is applied in multiple rounds along a predetermined outer
edge line of the through hole, and that an interval of irradiation
at each point on the predetermined outer edge line between each
round is 5 msec or more.
BRIEF DESCRIPTION OF DRAWINGS
[0007] A more complete appreciation of the invention and many of
the attendant advantages thereof will be readily obtained as the
same becomes better understood by reference to the following
detailed description when considered in connection with the
accompanying drawings.
[0008] FIG. 1A to FIG. 1C are schematic views for describing steps
for forming a through hole in a resin substrate with a laser
processing method according to an embodiment of the present
invention;
[0009] FIG. 2 is a schematic view illustrating an example of a
laser processing apparatus according to the embodiment of the
present invention;
[0010] FIG. 3A to FIG. 3F are photographs of surfaces of substrates
showing experiment results of Example 1;
[0011] FIG. 4A to FIG. 4Q are photographs of surfaces of substrates
showing experiment results of Example 2;
[0012] FIG. 5A and FIG. 5B are photographs of surfaces of
substrates showing experiment results of Example 3;
[0013] FIG. 6A to FIG. 6H are photographs of cross sections of
substrates showing experiment results of Example 3;
[0014] FIG. 7A to FIG. 7H are photographs of surfaces of substrates
showing experiment results of Example 4; and
[0015] FIG. 8 is a photograph of a substrate surface showing an
experiment result of Example 5.
DESCRIPTION OF EMBODIMENT
[0016] The embodiments will now be described with reference to the
accompanying drawings, wherein like reference numerals designate
corresponding or identical elements throughout the various
drawings.
1. Manufacturing Method of Processed Resin Substrate
[0017] A manufacturing method of a processed resin substrate
according to the present embodiment is a method for obtaining a
processed resin substrate by forming a through hole by laser
processing in a resin substrate including a resin layer and a metal
layer that covers at least a part of one surface of the resin
layer. Here, the term "resin substrate" means a resin substrate
before laser processing, and the term "processed resin substrate"
means a resin substrate after laser processing. While the name of a
resin substrate is different between before and after the laser
processing, the physical property, the composition and the like of
the resin substrate are not significantly different between before
and after the laser processing.
[0018] In addition, "through hole" (broader concept) that is formed
by the manufacturing method of a processed resin substrate
according to the present embodiment includes a dotted "through
hole" (narrower concept) which is formed without performing laser
light scanning, and an "opening" which is formed by laser light
scanning. Further, the "opening" includes "hole having a shape
substantially identical to a scanning line" which is formed by
scanning with laser light in a linear and/or a curved manner, and
"hole having a shape substantially identical to a given region"
which is formed by scanning with pulsed laser light enclosing the
given region.
[0019] The manufacturing method of a processed resin substrate
according to the present embodiment includes a first step of
preparing a resin substrate, and a second step of forming a through
hole by irradiating the resin substrate with pulsed laser light.
The steps will be described below.
(First Step)
[0020] In the first step, as a processing object, a resin substrate
including a resin layer and a metal layer that covers at least a
part of one surface of the resin layer is prepared. The resin
substrate may be prepared by buying a commercially available
product, or by producing a resin substrate. The resin substrate is,
but not limited to, a rigid printed circuit substrate, for
example.
[0021] The type of the resin of the resin layer is not limited.
Examples of the resin of the resin layer include epoxy resin,
polyimide resin, polyethylene terephthalate resin, polyethylene
naphthalate resin, bismaleimide triazine resin, phenol resin,
silicone resin, modified silicone resin, epoxy modified silicone
resin, polyphenylene ether resin, liquid crystal polymer resin and
combinations thereof.
[0022] In addition, the resin layer may include a reinforcement for
improving the strength, or may not include a reinforcement.
Examples of the reinforcement include a glass fiber, ceramics, a
ceramics fiber, paper, cloth, a carbon fiber, an aramid fiber and
combinations thereof. Examples of the resin layer include a glass
epoxy substrate and a polycarbonate substrate. The thickness of the
resin layer is, but not limited to, 200 to 500 .mu.m, for
example.
[0023] The metal layer covers at least a part of one surface of the
resin layer. To be more specific, the metal layer covers at least
one surface of the resin layer of at least a part where the through
hole is formed. The metal layer has a high thermal conductivity,
and therefore has a function of effectively dissipating the
excessive thermal energy accumulated in a region around the surface
of the resin layer during the processing. In addition, the metal
layer has a function of blocking transmission of oxygen into the
resin layer from the outside. By the synergistic effect of the
above-mentioned functions, the metal layer suppresses undesirable
thermal damages such as burning and digging during the processing.
In view of the foregoing, preferably, the metal layer covers the
both surfaces of the resin layer, or more preferably, the metal
layer covers the both surfaces of the resin layer in whole. In
addition, one or more metal layers may be provided.
[0024] The type of the metal of the metal layer is not limited.
Preferably, the metal of the metal layer has high thermal
conductivity from the viewpoint of suppressing undesirable thermal
damage in the second step. Examples of the metal of the metal layer
include one or more metals selected from the group consisting of
copper, silver, gold and aluminum, and alloys which contain the
above-mentioned metals as the main component. The metal layer can
be formed by sputtering, vapor deposition, plating and the
like.
[0025] The thickness of the metal layer is, but not limited to, 2
to 50 .mu.m, for example. The metal layer may be a thin layer such
as a metal foil. As described above, the metal layer may cover the
both surfaces of the resin layer, or two or more metal layers may
be disposed on one surface of the resin layer. With such
configurations, the thickness of each metal layer can be reduced.
On the other hand, in the case where one metal layer is disposed on
only one surface of the resin layer, it is necessary to increase
the thickness of the metal layer to a certain degree from the
viewpoint of suppressing thermal damage of the resin layer.
[0026] In addition, another metal layer intended for improvement of
bonding force, prevention of migration and the like may be disposed
between the resin layer and the metal layer for the heat
transmission. Examples of such a metal layer include a Ni layer, a
Cr layer, and a NiCr alloy layer having a thickness of about
hundreds of nanometers, and the like.
(Second Step)
[0027] In the second step, a portion of the resin substrate whose
at least one surface is covered with the metal layer prepared in
the first step is irradiated with pulsed laser light to form a
through hole. For example, in the case where an opening is formed
as a through hole (broader concept), the through hole (opening) is
formed by repeating, in multiple rounds, the scanning with pulsed
laser light along a predetermined outer edge line of the opening to
be formed. At this time, preferably, the scanning with the pulsed
laser light is performed in multiple rounds. In addition,
preferably, the pulsed laser light is applied to the resin
substrate from the side on which the metal layer is disposed from
the viewpoint of suppressing thermal damage of the resin layer. In
this case, the pulsed laser light is applied not only to the resin
layer but also to the metal layer.
[0028] FIG. 1A to FIG. 1C are schematic views of steps of forming
opening 140 as a through hole in resin substrate 110. In the
example illustrated in FIG. 1A to FIG. 1C, the both surfaces of
resin layer 110 are covered with metal layer 120.
[0029] As illustrated in FIG. 1A, while irradiating resin substrate
100 having resin layer 110 and metal layer 120 covering the both
surfaces of resin layer 110 with pulsed laser light 130, the
relative position of the condensing point of pulsed laser light 130
and resin substrate 100 is changed. At this time, the condensing
point of pulsed laser light 130 is located at an inner portion of
resin layer 110, and scanning with pulsed laser light 130 along
predetermined outer edge line 150' of the opening 140 to be formed
is performed in multiple rounds. By performing the scanning with
pulsed laser light 130 in multiple rounds in the above-mentioned
manner, groove 160 having a depth equal to the thickness of resin
substrate 100 can be formed over the whole circumference of outer
edge 150 of opening 140 as illustrated in FIG. 1B. Thereafter, as
illustrated in FIG. 1C, opening 140 is formed by removing the
portion separated by groove 160. Through the above-mentioned
procedure, opening 140 can be formed in resin substrate 100. In
this manner, a processed resin substrate can be manufactured.
[0030] It is to be noted that the shape of opening 140 is not
limited to the shape illustrated in FIG. 1C. The cross-sectional
shape of opening 140 in the direction along the substrate surface
is not limited, and is, for example, a circular shape, an ellipse
shape, a rectangular shape, or an elongated round shape.
Alternatively, the cross-sectional shape of opening 140 in the
direction along the substrate surface may be more complicated
shapes. In addition, the scanning direction of pulsed laser light
130 is not limited to the clockwise direction illustrated in FIG.
1C, and may be the counterclockwise direction.
[0031] In addition, the position of the condensing point of pulsed
laser light 130 is not limited to the position illustrated in FIG.
1A. For example, with the condensing point of pulsed laser light
130, scanning may be performed on predetermined outer edge line
150', or performed inside predetermined outer edge line 150' in a
direction substantially parallel to predetermined outer edge line
150'. In addition, the position (depth) of the condensing point of
pulsed laser light 130 in the thickness direction of resin
substrate 100 may be constant regardless of the progress of the
processing, or may be changed in accordance with the progress of
the processing. For example, in the case where the thickness of
resin substrate 100 is non-uniform, the position (depth) of the
condensing point of pulsed laser light 130 may be changed in
accordance with the thickness of resin substrate 100.
[0032] In the laser processing method according to the present
embodiment, scanning with pulsed laser light 130 is performed such
that the interval of irradiation at each point on predetermined
outer edge line 150' of opening 140 between each round is 5 msec or
more. For example, scanning with pulsed laser light 130 is
performed such that, at point A located on predetermined outer edge
line 150' in FIG. 1A, the interval between irradiation with pulsed
laser light 130 of nth-round and irradiation with pulsed laser
light 130 of (n+1)th-round is 5 msec or more. In this manner, the
excessive thermal energy accumulated in resin layer 110 can be
effectively dissipated to metal layer 120 in a period between each
round, and thermal damage at the processing portion of resin layer
110 can be suppressed.
[0033] The method for applying pulsed laser light 130 such that the
interval of irradiation at each point on predetermined outer edge
line 150' of opening 140 between each round is 5 msec or more is
not limited, and may be appropriately selected in accordance with
the shape, size, and number of opening 140, and the like. For
example, the above-mentioned condition can be satisfied by reducing
the scanning speed of pulsed laser light 130. In addition, even in
the case where the scanning speed of pulsed laser light 130 is high
(for example, 1000 mm/sec or more), the scanning time of one round
of pulsed laser light 130 is 5 msec or more when opening 140 is
large.
[0034] On the other hand, in the case where the scanning speed of
pulsed laser light 130 is high (for example, 1000 mm/sec or more),
and the size of opening 140 is small, the scanning time of one
round of pulsed laser light 130 is less than 5 msec. In this case,
it suffices to intermittently stop irradiation (scanning) with
pulsed laser light 130 such that the interval of irradiation at
each point on predetermined outer edge line 150' of opening 140
between each round is 5 msec or more. For example, in the case
where the scanning time of one round of pulsed laser light 130 is 3
msec, it suffices to stop the scanning with pulsed laser light 130
for 2 msec or more in each round. The timing of stopping the
irradiation with pulsed laser light 130 is not limited, and the
irradiation may be stopped on a half-round basis, for example.
[0035] In addition, in the case where a plurality of openings 140
are formed in one resin substrate 100, the irradiation region of
pulsed laser light 130 (the region where opening 140 is to be
formed) may be changed for each round. For example, when forming
two openings, a first opening and a second opening, it suffices to
perform irradiation such that, after pulsed laser light is applied
along the predetermined outer edge line of the first opening in one
round, pulsed laser light is applied along the predetermined outer
edge line of the second opening in one round before performing the
next irradiation along the predetermined outer edge line of the
first opening. By alternately applying the pulsed laser light to
the region where the first opening is to be formed and the region
where the second opening is to be formed in the above-mentioned
manner, the interval of irradiation at each point on predetermined
outer edge line 150' of opening 140 between each round can be set
to 5 msec or more without significantly reducing the processing
efficiency.
[0036] The wavelength of pulsed laser light 130 is not limited as
long as groove 160 can be appropriately formed in resin substrate
100. From the viewpoint of suppressing undesirable thermal damage
at the processing portion of resin layer 110, the wavelength of
pulsed laser light 130 is preferably 250 to 2000 nm, more
preferably, 250 to 1500 nm. For example, the wavelength of pulsed
laser light 130 is 355 nm.
[0037] The pulse energy of pulsed laser light 130 is not limited as
long as groove 160 can be appropriately formed in resin substrate
100. From the viewpoint of increasing the processing speed, the
pulse energy of pulsed laser light 130 is preferably 3 .mu.J or
greater.
[0038] The output of pulsed laser light 130 is not limited as long
as groove 160 can be appropriately formed in resin substrate 100.
From the viewpoint of increasing the processing speed, the output
of pulsed laser light 130 is preferably 10 W or greater.
[0039] The pulse width of pulsed laser light 130 is not limited as
long as groove 160 can be appropriately formed in resin substrate
100. From the viewpoint of improving the processing quality, the
pulse width of pulsed laser light 130 is preferably 10 psec to 100
nsec.
[0040] The repetition frequency of pulsed laser light 130 is not
limited as long as groove 160 can be appropriately formed in resin
substrate 100. From the viewpoint of improving the processing
quality, the repetition frequency of pulsed laser light 130 is
preferably 100 kHz or greater, or more preferably 1 MHz or
greater.
[0041] The pulse energy and the fluence of pulsed laser light 130
is not limited as long as groove 160 can be appropriately formed in
resin substrate 100. For example, in the case where the wavelength
of pulsed laser light 130 is 355 nm, the pulse energy of pulsed
laser light 130 is preferably 3 .mu.J or greater from the viewpoint
of increasing the processing speed. Likewise, in the case where the
wavelength of pulsed laser light 130 is 355 nm, the fluence of
pulsed laser light 130 on the surface of resin substrate 100 (the
surface of metal layer 110 on which pulsed laser light 130 is
applied) is preferably 3 J/cm.sup.2 or greater, and the fluence of
pulsed laser light 130 at the condensing point is preferably 10
J/cm.sup.2 or greater from the viewpoint of increasing the
processing speed. Here, "the surface of resin substrate 100" means
the surface of metal layer 120 in the case where pulsed laser light
130 is applied to the surface where metal layer 120 is formed in
the surface of resin layer 110, or is the surface of resin layer
110 in the case where pulsed laser light 130 is applied to the
surface where metal layer 120 is not formed in the surface of resin
layer 110.
[0042] While the scanning speed of pulsed laser light 130 is not
limited, the scanning speed of pulsed laser light 130 is preferably
1000 mm/sec or more from the viewpoint of increasing the processing
speed. In addition, the number of cycles of scanning with pulsed
laser light 130 for each opening 140 is not limited as long as
groove 160 having a depth equal to the thickness of resin substrate
100 can be formed, and may be appropriately set in accordance with
the material of resin substrate 100, the output of pulsed laser
light 130 and the like.
[0043] As described above, in the manufacturing method of a
processed resin substrate according to the present embodiment, at
least a part of one surface of the resin layer is covered with the
metal layer, and the interval of irradiation of the pulsed laser
light at each point on the resin substrate is set to 5 msec or
more. In this manner, the manufacturing method of a processed resin
substrate according to the present embodiment can form a through
hole in the resin substrate (the resin layer) while suppressing
undesirable thermal damages such as burning and digging even when
laser light having a high output (for example, 10 W or greater) is
applied at a high scanning speed (for example, 1000 mm/sec or
more). Accordingly, the manufacturing method of a processed resin
substrate according to the present embodiment can speedily form a
through hole in a resin substrate without reducing the processing
quality. In addition, even when a reinforcement such as a glass
fiber is present in the resin layer, the manufacturing method of a
processed resin substrate according to the present embodiment can
form a through hole in the resin substrate without melting the
reinforcement.
[0044] The way of implementing the manufacturing method of a
processed resin substrate according to the present embodiment is
not limited. For example, the manufacturing method of a processed
resin substrate according to the present embodiment can be
implemented with the laser processing apparatus according to the
present embodiment described below.
2. Laser Processing Apparatus
[0045] The laser processing apparatus according to the present
embodiment is used in the second step of the laser processing
method according to the present embodiment. That is, the laser
processing apparatus according to the present embodiment is an
apparatus that irradiates a resin substrate including a resin layer
and a metal layer that covers at least a part of one surface of the
resin layer with pulsed laser light to form a through hole.
[0046] The laser processing apparatus according to the present
embodiment includes, at least, a laser light source that emits
pulsed laser light, a stage, an optical system that guides pulsed
laser light emitted from the laser light source to a resin
substrate placed on the stage, a scanning section that relatively
moves the resin substrate placed on the stage and the condensing
point of the pulsed laser light, and a control section that
controls the operation of the scanning section. Each component is
described below.
[0047] The laser light source emits pulsed laser light for
irradiating the resin substrate. The type of the laser used as the
laser light source is not limited, and is appropriately selected in
accordance with the type of the resin substrate and the like.
Examples of the laser include a fiber laser and the like.
[0048] On the stage, a processing object, that is, a resin
substrate including a resin layer, and a metal layer that covers at
least a part of one surface of the resin layer is placed.
[0049] The optical system guides pulsed laser light emitted from
the laser light source to the resin substrate placed on the stage
such that the condensing point is located at a desired position.
Normally, the optical system includes a telescope optical system
that optimizes the beam diameter of pulsed laser light, a condenser
lens that condenses pulsed laser light at a desired position, and
the like.
[0050] The scanning section moves at least one of the stage and the
condensing point of the pulsed laser light to relatively move the
resin substrate placed on the stage and the condensing point of the
pulsed laser light. In this manner, it is possible to form a
through hole (opening) in the resin substrate by performing
scanning such that the condensing point of the pulsed laser light
is applied along a predetermined outer edge line of the through
hole (opening) to be formed. The scanning section may move the
stage on which the resin substrate is placed, or the condensing
point of the pulsed laser light, or both. The driving section is,
for example, an XY-stage controller, a galvano scanner, or the
like.
[0051] The control section controls the scanning section such that
pulsed laser light is applied along the predetermined outer edge
line of the through hole (opening) to be formed in multiple rounds,
and the interval of irradiation at each point on the predetermined
outer edge line between each round is 5 msec or more. The control
section is, for example, a computer connected with the scanning
section.
[0052] Further, the laser processing apparatus may include an
automatic aiming system for setting the position of the condensing
point of the pulsed laser light at a desired position in a resin
substrate and the like.
[0053] FIG. 2 is a schematic view illustrating a laser processing
apparatus according to the embodiment of the present invention. As
illustrated in FIG. 2, laser processing apparatus 200 includes
laser light source 210, telescope optical system 220, galvano
scanner 230, f.theta. lens 240, stage 250, AF camera 260, XY-stage
controller 270, Z-controller 280 and computer 290. In this example,
resin substrate 100 as a processing object includes resin layer
110, and metal layer 120 that covers the both surfaces of resin
layer 110.
[0054] Laser light source 210 emits pulsed laser light 130 having a
given wavelength. As described above, the type of the laser used as
laser light source 210 is appropriately selected in accordance with
the type of resin substrate 110 as the processing object and the
like.
[0055] Telescope optical system 220 optimizes the beam diameter of
pulsed laser light 130 emitted from laser light source 210 to
obtain a preferable processing shape.
[0056] In response to a request from computer 290, galvano scanner
230 changes the travelling direction of pulsed laser light 130
optimized by telescope optical system 220. Pulsed laser light 130
whose travelling direction is controlled by galvano scanner 230 is
condensed in resin substrate 100 by f.theta. lens 240. With such a
combination of galvano scanner 230 and f.theta. lens 240, scanning
with the condensing point of pulsed laser light 130 can be
performed along predetermined outer edge line 150' of the opening
140 to be formed at a constant speed.
[0057] Stage 250 includes a mounting stand on which resin substrate
100 is placed, and a driving mechanism that can move the mounting
stand. The driving mechanism can move the mounting stand in the
X-axis direction or the Y-axis direction, and can rotate the
mounting stand around the X axis or the Y axis. Resin substrate 100
on stage 250 is moved in the XY-axis direction by the driving
mechanism.
[0058] AF camera 260 is a camera for acquiring the profile of the
surface of a processing portion of resin substrate 100. The
acquired profile is output to computer 290.
[0059] In response to a request from computer 290, XY-stage
controller 270 moves stage 250 in the XY-axis direction such that
the condensing point of pulsed laser light 130 is located at the
region where opening 140 is to be formed in resin substrate
100.
[0060] In response to a request from computer 290, Z-controller 280
moves f.theta. lens 240 in the Z-axis direction such that the
condensing point of pulsed laser light 130 is located in the resin
layer 120.
[0061] Computer 290 is connected with laser light source 210,
galvano scanner 230, AF camera 260, XY-stage controller 270 and
Z-controller 280, and comprehensively controls the connected
components. For example, computer 280 controls AF camera 260 and
XY-stage controller 270 to acquire the profile of the surface of
resin substrate 100. In addition, computer 290 controls galvano
scanner 230 and Z-controller 270 to perform scanning with pulsed
laser light 130 in multiple rounds along predetermined outer edge
line 150' of opening 140. In addition, computer 280 controls
XY-stage controller 260 to move stage 250 such that the region
where opening 140 is to be formed can be irradiated with pulsed
laser light 130.
[0062] Next, procedure of forming opening 140 as a through hole in
resin substrate 100 with use of laser processing apparatus 200 is
described.
[0063] First, resin substrate 100 is placed on the mounting stand
of stage 250, and the profile of the surface of resin substrate 100
is acquired with AF camera 260 and XY-stage controller 270.
[0064] Next, resin substrate 100 is moved to a given position with
XY-stage controller 270, and thereafter pulsed laser light 130 is
emitted from laser light source 210 to irradiate resin substrate
100 with pulsed laser light 130. At this time, the travelling
direction of pulsed laser light 130 is changed with galvano scanner
230 to thereby perform scanning with pulsed laser light 130 in
multiple rounds along predetermined outer edge line 150' of opening
140 to be formed (see FIG. 1A). In addition, the scanning with
pulsed laser light 130 is performed such that the interval of
irradiation at each point on predetermined outer edge line 150' of
opening 140 between each round is 5 msec or more. For example, the
scanning with pulsed laser light 130 is stopped for a given time in
each round such that the interval of irradiation at each point on
predetermined outer edge line 150' of opening 140 between each
round is 5 msec or more. By applying pulsed laser light 130 in this
manner, groove 160 that reaches the rear surface of resin substrate
100 can be formed along predetermined outer edge line 150' of
opening 140 while suppressing undesirable thermal damages such as
burning and digging (see FIG. 1B). In the case where a plurality of
openings 140 are formed in resin substrate 100, it suffices to
repeat the above-mentioned steps after moving resin substrate 100
with XY-stage controller 270.
[0065] Finally, the portion separated by groove 160 is removed, and
thus opening 140 is formed (see FIG. 1C).
[0066] Through the above-mentioned procedure, a through hole can be
formed in resin substrate 100 while suppressing undesirable thermal
damages such as burning and digging.
[0067] While FIG. 2 illustrates an example case where the
travelling direction of pulsed laser light 130 is changed with
galvano scanner 230 to apply pulsed laser light 130 along
predetermined outer edge line 150' of opening 140, the way of
applying pulsed laser light 130 along predetermined outer edge line
150' of opening 140 is not limited as long as the condensing point
of pulsed laser light 130 and resin substrate 100 can be relatively
moved. For example, stage 250 or the optical system (telescope
optical system 220 and the condenser lens) may be moved without
using galvano scanner 230.
EXAMPLES
[0068] The present invention will be described in detail with
Examples. The present invention is not limited to Examples.
Example 1
[0069] As a processing object, a glass epoxy substrate (thickness:
300 to 330 .mu.m) on which a copper layer (thickness: 2 to 5 .mu.m)
is bonded on the both sides thereof was prepared.
[0070] With use of the laser processing apparatus illustrated in
FIG. 2, the glass epoxy substrate was irradiated with pulsed laser
light along the predetermined outer edge line of the opening to
form an opening having an elongated round shape (the length of the
straight line portion: 2 mm, the diameter of the arc portion: 0.55
mm). The scanning time of one round of the predetermined outer edge
line of the opening was 2.9 msec. In addition, in each round of the
scanning with the pulsed laser light, irradiation (scanning) with
the pulsed laser light was stopped for a given time (0 to 150 msec)
to change the interval of the irradiation between each round at
each point on the predetermined outer edge line of the opening. The
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening is calculated by "2.9
msec (scanning time of one round)+0 to 150 msec (scanning stop
time)."
[0071] The condition of the processing was as follows. The "spot
diameter" means the diameter of the range up to the light intensity
of 1/e.sup.2 with respect to the center portion (the same applies
to the following Examples).
[0072] Wavelength: 355 nm
[0073] Pulse width: 2 ns
[0074] Output: 30 W
[0075] Pulse energy: 15 .mu.J
[0076] Repetition frequency: 2 MHz
[0077] Position of condensing point: 100 .mu.m from the surface of
the copper layer on the front side
[0078] Spot diameter of the surface of the copper layer on the
front side: 10.5 .mu.m
[0079] Fluence of the surface of the copper layer on the front
side: 18 J/cm.sup.2
[0080] Spot diameter at the condensing point: 5.6 .mu.m
[0081] Fluence at the condensing point: 61 J/cm.sup.2
[0082] Scanning speed: 2000 mm/s
[0083] Scanning cycle: 60 cycles
[0084] FIG. 3A to FIG. 3F are photographs (plan views) of
substrates after pulsed laser light is applied along the
predetermined outer edge line of the opening in 60 cycles (see FIG.
1B). FIG. 3A is a photograph of a substrate irradiated with pulsed
laser light with a scanning stop time of 0 msec (continuous scan).
FIG. 3B is a photograph of a substrate irradiated with pulsed laser
light with a scanning stop time of 10 msec. FIG. 3C is a photograph
of a substrate irradiated with pulsed laser light with a scanning
stop time of 20 msec. FIG. 3D is a photograph of a substrate
irradiated with pulsed laser light with a scanning stop time of 50
msec. FIG. 3E is a photograph of a substrate irradiated with pulsed
laser light with a scanning stop time of 100 msec. FIG. 3F is a
photograph of a substrate irradiated with pulsed laser light with a
scanning stop time of 150 msec.
[0085] As illustrated in FIG. 3A, in the case where the interval of
the irradiation between each round at each point on the
predetermined outer edge line of the opening was 2.9 msec (in the
case where the scanning stop time was 0 msec), burning occurred in
a region around the processing portion. On the other hand, as
illustrate in FIG. 3B to FIG. 3F, in the case where the interval of
the irradiation between each round at each point on the
predetermined outer edge line of the opening was 12.9 msec or more
(in the case where the scanning stop time was 10 to 150 msec),
almost no burning occurred in a region around the processing
portion. From the above-mentioned results, it can be said that
undesirable thermal damages such as burning can be suppressed by
setting the interval of the irradiation between each round at each
point on the predetermined outer edge line of the opening to 5 msec
or more.
Example 2
[0086] As a processing object, a glass epoxy substrate (thickness:
300 to 330 .mu.m) on which a copper layer (thickness: 2 to 5 .mu.m)
is bonded on the both sides thereof was prepared.
[0087] With use of the laser processing apparatus illustrated in
FIG. 2, the glass epoxy substrate was irradiated with pulsed laser
light along the predetermined outer edge line of the opening to
form an opening having a circular shape (having a diameter of 1
mm). The scanning time of one round of the predetermined outer edge
line of the opening was 0.8 msec. In addition, in each round of the
scanning with the pulsed laser light, irradiation (scanning) with
the pulsed laser light was stopped for a given time (0 to 100 msec)
to change the interval of the irradiation between each round at
each point on the predetermined outer edge line of the opening. The
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening is calculated by "0.8
msec (scanning time of one round)+0 to 100 msec (scanning stop
time)."
[0088] The condition of the processing was as follows.
[0089] Wavelength: 355 nm
[0090] Pulse width: 2 ns
[0091] Output: 30 W
[0092] Pulse energy: 15 .mu.J
[0093] Repetition frequency: 2 MHz
[0094] Position of condensing point: 100 .mu.m from the surface of
the copper layer on the front side
[0095] Spot diameter of the surface of the copper layer on the
front side: 10.5 .mu.m
[0096] Fluence of the surface of the copper layer on the front
side: 18 J/cm.sup.2
[0097] Spot diameter at the condensing point: 5.6 .mu.m
[0098] Fluence at the condensing point: 61 J/cm.sup.2
[0099] Scanning speed: 2000 mm/s
[0100] Scanning cycle: 60 cycles
[0101] FIG. 4A to FIG. 4Q are photographs (plan views) of
substrates after pulsed laser light is applied along the
predetermined outer edge line of the opening in 60 cycles (see FIG.
1B). FIG. 4A is a photograph of a substrate irradiated with pulsed
laser light with a scanning stop time of 0 msec (continuous scan).
FIG. 4B is a photograph of a substrate irradiated with pulsed laser
light with a scanning stop time of 1 msec. FIG. 4C is a photograph
of a substrate irradiated with pulsed laser light with a scanning
stop time of 2 msec. FIG. 4D is a photograph of a substrate
irradiated with pulsed laser light with a scanning stop time of 3
msec. FIG. 4E is a photograph of a substrate irradiated with pulsed
laser light with a scanning stop time of 4 msec. FIG. 4F is a
photograph of a substrate irradiated with pulsed laser light with a
scanning stop time of 5 msec. FIG. 4G is a photograph of a
substrate irradiated with pulsed laser light with a scanning stop
time of 6 msec. FIG. 4H is a photograph of a substrate irradiated
with pulsed laser light with a scanning stop time of 7 msec. FIG.
4I is a photograph of a substrate irradiated with pulsed laser
light with a scanning stop time of 8 msec. FIG. 4J is a photograph
of a substrate irradiated with pulsed laser light with a scanning
stop time of 9 msec. FIG. 4K is a photograph of a substrate
irradiated with pulsed laser light with a scanning stop time of 10
msec. FIG. 4L is a photograph of a substrate irradiated with pulsed
laser light with a scanning stop time of 15 msec. FIG. 4M is a
photograph of a substrate irradiated with pulsed laser light with a
scanning stop time of 20 msec. FIG. 4N is a photograph of a
substrate irradiated with pulsed laser light with a scanning stop
time of 25 msec. FIG. 4O is a photograph of a substrate irradiated
with pulsed laser light with a scanning stop time of 30 msec. FIG.
4P is a photograph of a substrate irradiated with pulsed laser
light with a scanning stop time of 50 msec. FIG. 4Q is a photograph
of a substrate irradiated with pulsed laser light with a scanning
stop time of 100 msec.
[0102] As illustrated in FIG. 4A to FIG. 4E, in the case where the
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening was 0.8 to 4.8 msec
(in the case where the scanning stop time was 0 to 4 msec), burning
occurred in a region around the processing portion. On the other
hand, as illustrated in FIG. 4F to FIG. 4Q, in the case where the
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening was 5.8 msec or more
(in the case where the scanning stop time was 5 to 100 msec),
almost no burning occurred in a region around the processing
portion. From the above-mentioned results, it can be said that
undesirable thermal damages such as burning can be suppressed by
setting the interval of the irradiation between each round at each
point on the predetermined outer edge line of the opening to 5 msec
or more.
Example 3
[0103] As a processing object, a glass epoxy substrate (thickness:
300 to 330 .mu.m) on which a copper layer (thickness: 2 to 5 .mu.m)
is bonded on the both sides thereof was prepared.
[0104] With use of the laser processing apparatus illustrated in
FIG. 2, the glass epoxy substrate was irradiated with pulsed laser
light along the predetermined outer edge line of the opening to
form openings of two types (the length of the straight line
portion: 2 mm or 14.6 mm, the diameter of the arc portion: 0.55 mm)
having an elongated round shape which differ from each other in
length of the straight line portion. The scanning time of one round
of the predetermined outer edge line of the opening whose length of
the straight line portion is 2 mm was 2.9 msec. The scanning time
of one round of the predetermined outer edge line of the opening
whose length of the straight line portion is 14.6 mm was 15.5 msec.
In addition, in each round of the scanning with the pulsed laser
light, irradiation (scanning) with the pulsed laser light was
stopped for a given time (0 to 100 msec) to change the interval of
the irradiation between each round at each point on the
predetermined outer edge line of the opening. The interval of the
irradiation between each round at each point on the predetermined
outer edge line of the opening whose length of the straight line
portion is 2 mm is calculated by "2.9 msec (scanning time of one
round)+0 to 100 msec (scanning stop time)." Likewise, the interval
of the irradiation between each round at each point on the
predetermined outer edge line of the opening whose length of the
straight line portion is 14.6 mm is calculated by "15.5 msec
(scanning time of one round)+0 to 100 msec (scanning stop
time)."
[0105] The condition of the processing was as follows.
[0106] Wavelength: 355 nm
[0107] Pulse width: 2 ns
[0108] Output: 30 W
[0109] Pulse energy: 15 .mu.J
[0110] Repetition frequency: 2 MHz
[0111] Position of condensing point: 100 .mu.m from the surface of
the copper layer on the front side
[0112] Spot diameter of the surface of the copper layer on the
front side: 10.5 .mu.m
[0113] Fluence of the surface of the copper layer on the front
side: 18 J/cm.sup.2
[0114] Spot diameter at the condensing point: 5.6 .mu.m
[0115] Fluence at the condensing point: 61 J/cm.sup.2
[0116] Scanning speed: 2000 mm/s
[0117] Scanning cycle: 60 cycles
[0118] FIG. 5A and FIG. 5B are photographs (plan views) of
substrates after pulsed laser light is applied along the
predetermined outer edge line of the opening in 60 cycles (see FIG.
1B). FIG. 5A is a photograph of a substrate after pulsed laser
light was applied to form an opening whose length of the straight
line portion is 2 mm, and FIG. 5B is a photograph of a substrate
after pulsed laser light was applied to form an opening whose
length of the straight line portion is 14.6 mm. In the two
substrates, seven openings were formed for each scanning stop time.
For example, the seven irradiation regions of the upper right
portion enclosed with the broken line were irradiated with pulsed
laser light with a scanning stop time of 0 msec (continuous scan),
and the seven irradiation regions of the lower left portion
enclosed with the broken line were irradiated with pulsed laser
light with a scanning stop time of 100 msec.
[0119] As illustrated in FIG. 5A, in the case where the scanning
time of one round of the predetermined outer edge line of the
opening was 2.9 msec, burning occurred in a region around the
processing portion when the interval of the irradiation between
each round at each point was 2.9 to 4.9 msec (when the scanning
stop time was 0 to 2 msec), whereas almost no burning occurred in a
region around the processing portion when the interval of the
irradiation between each round at each point was 5.9 to 102.9 msec
(when the scanning stop time was 3 to 100 msec). On the other hand,
as illustrated in FIG. 5B, in the case where the scanning time of
one round of the predetermined outer edge line of the opening was
15.5 msec, almost no burning occurred in a region around the
processing portion regardless of the scanning stop time. From the
above-mentioned results, it can be said that undesirable thermal
damages such as burning can be suppressed by setting the interval
of the irradiation between each round at each point on the
predetermined outer edge line of the opening to 5 msec or more. In
addition, it can be said that the scanning with pulsed laser light
is not required to be stopped in the case where the scanning time
of one round of the predetermined outer edge line of the opening is
5 msec or more.
[0120] FIG. 6A to FIG. 6H are photographs (cross sections) of
openings after formation of the openings (see FIG. 1C). FIG. 6A to
FIG. 6C are photographs of the processed cross sections of openings
whose length of the straight line portion is 2 mm, and FIG. 6D to
FIG. 6H are photographs of processed cross sections of openings
whose length of the straight line portion is 14.6 mm FIG. 6A and
FIG. 6D illustrate openings formed with a scanning stop time of 0
msec (continuous scan). FIG. 6E illustrates an opening formed with
a scanning stop time of 10 msec. FIG. 6F illustrates an opening
formed with a scanning stop time of 20 msec. FIG. 6B and FIG. 6G
illustrate openings formed with a scanning stop time of 50 msec.
FIG. 6C and FIG. 6H illustrate openings formed with a scanning stop
time of 100 msec.
[0121] As illustrated in FIG. 6A to FIG. 6C, in the case where the
scanning time of one round of the predetermined outer edge line of
the opening was 2.9 msec, the glass fiber was melted at the
processed portion when the interval of the irradiation between each
round at each point is 2.9 msec (when the scanning stop time was 0
msec), whereas almost no glass fiber was melted when the interval
of the irradiation between each round at each point is 12.9 to
102.9 msec (when the scanning stop time was 10 to 100 msec). On the
other hand, as illustrated in FIG. 6D to FIG. 6H, in the case where
the scanning time of one round of the predetermined outer edge line
of the opening was 15.5 msec, the almost no glass fiber was melted
regardless of scanning stop time. From the above-mentioned results,
it can be said that reduction in processing quality such as melting
of the glass fiber can be suppressed by setting the interval of the
irradiation between each round at each point on the predetermined
outer edge line of the opening to 5 msec or more. In addition, it
can be said that the scanning with pulsed laser light is not
required to be stopped in the case where the scanning time of one
round of the predetermined outer edge line of the opening is 5 msec
or more.
Example 4
[0122] As a processing object, a glass epoxy substrate (thickness:
300 to 330 .mu.m) on which a copper layer (thickness: 2 to 5 .mu.m)
is bonded on the both sides thereof was prepared.
[0123] With use of the laser processing apparatus illustrated in
FIG. 2, the glass epoxy substrate was irradiated with pulsed laser
light along the predetermined outer edge line of the opening to
form an opening (diameter 0.4 mm) having a circular shape. The
scanning time of one round of the predetermined outer edge line of
the opening was 2.1 msec. At this time, the pulse energy was
changed (8.3 to 50.3 .mu.J). In addition, in each round of the
scanning with the pulsed laser light, irradiation (scanning) with
the pulsed laser light was stopped for 100 msec (continuous
irradiation was also performed for comparison purpose). The
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening is calculated by "2.1
msec (scanning time of one round)+100 msec (scanning stop
time)."
[0124] The condition of the processing was as follows.
[0125] Wavelength: 355 nm
[0126] Pulse width: 2 ns
[0127] Output: 4.98 to 30.18 W
[0128] Pulse energy: 8.3 to 50.3 .mu.J
[0129] Repetition frequency: 600 kHz
[0130] Position of condensing point: 100 .mu.m from the surface of
the copper layer on the front side
[0131] Spot diameter of the surface of the copper layer on the
front side: 10.5 .mu.m
[0132] Fluence of the surface of the copper layer on the front
side: 10.0 to 60.0 J/cm.sup.2
[0133] Spot diameter at the condensing point: 5.6 .mu.m
[0134] Fluence at the condensing point: 33.7 to 204 J/cm.sup.2
[0135] Scanning speed: 600 mm/s
[0136] Scanning cycle: 10 cycles
[0137] FIG. 7A to FIG. 7H are photographs (plan views) of
substrates after pulsed laser light was applied along the
predetermined outer edge line of the opening in 10 cycles (see FIG.
1B). FIG. 7A to FIG. 7D are photographs of substrates irradiated
with pulsed laser light with a scanning stop time of 0 msec
(continuous scan), and FIG. 7E to FIG. 7H are photographs of
substrates irradiated with pulsed laser light with a scanning stop
time of 100 msec. FIG. 7A and FIG. 7E are photographs of substrates
irradiated with pulsed laser light having a pulse energy of 8.3 pJ
(surface fluence: 10.0 J/cm.sup.2, internal condense light fluence:
33.7 J/cm.sup.2). FIG. 7B and FIG. 7F are photographs of substrates
irradiated with pulsed laser light having a pulse energy of 10.6
.mu.J (surface fluence: 12.7 J/cm.sup.2, internal condense light
fluence: 43.1 J/cm2). FIG. 7C and FIG. 7G are photographs of
substrates irradiated with pulsed laser light having a pulse energy
of 13.8 .mu.J (surface fluence: 16.6 J/cm.sup.2, internal condense
light fluence: 56.1 J/cm.sup.2). FIG. 7D and FIG. 7H are
photographs of substrates irradiated with pulsed laser light having
a pulse energy of 50.3 .mu.J (surface fluence: 60.0 J/cm.sup.2,
internal condense light fluence: 204 J/cm.sup.2). It is to be noted
that, in FIG. 7D and FIG. 7H, portions separated by irradiation
with laser are dropped off.
[0138] As illustrated in FIG. 7A to FIG. 7D, in the case where the
interval of the irradiation between each round at each point on the
predetermined outer edge line of the opening was 2.1 msec (in the
case where the scanning stop time was 0 msec), burning occurred in
a region around the processing portion regardless of the pulse
energy. On the other hand, as illustrated in FIG. 7E to FIG. 7H, in
the case where the interval of the irradiation between each round
at each point on the predetermined outer edge line of the opening
was 102.1 msec (in the case where the scanning stop time was 100
msec), almost no burning occurred in a region around the processing
portion regardless of the pulse energy. From the above-mentioned
results, it can be said that undesirable thermal damages such as
burning can be suppressed, regardless of the pulse energy, by
setting the interval of the irradiation between each round at each
point on the predetermined outer edge line of the opening to 5 msec
or more.
Example 5
[0139] As a processing object, a glass epoxy substrate (having a
thickness, including the copper layer, of 200 .mu.m) on which a
copper layer (thickness: 2 to 5 .mu.m) is bonded on the both sides
thereof was prepared.
[0140] With use of the laser processing apparatus illustrated in
FIG. 2, the glass epoxy substrate was irradiated with pulsed laser
light along the predetermined outer edge line of the opening to
form an opening having an elongated round shape (the length of the
straight line portion: 5.5 mm, the diameter of the arc portion: 0.5
mm). The scanning time of one round of the predetermined outer edge
line of the opening was 63 msec. In addition, in each round of the
scanning with the pulsed laser light, irradiation (scanning) with
the pulsed laser light was stopped for 184 msec. The interval of
the irradiation between each round at each point on the
predetermined outer edge line of the opening is calculated by "63
msec (scanning time of one round)+184 msec (scanning stop
time)."
[0141] The condition of the processing was as follows.
[0142] Wavelength: 1064 nm
[0143] Pulse width: 15 ps
[0144] Output: 12 W
[0145] Pulse energy: 60 .mu.J
[0146] Repetition frequency: 200 kHz
[0147] Position of condensing point: 70 .mu.m from the surface of
the copper layer on the front side
[0148] Spot diameter of the surface of the copper layer on the
front side: 9.9 .mu.m
[0149] Fluence of the surface of the copper layer on the front
side: 78 J/cm.sup.2
[0150] Spot diameter at the condensing point: 5 .mu.m
[0151] Fluence at the condensing point: 300 J/cm.sup.2
[0152] Scanning speed: 200 mm/s
[0153] Scanning cycle: 30 cycles
[0154] FIG. 8 is a photograph (plan view) of a substrate after
pulsed laser light was applied (see FIG. 1B) along the
predetermined outer edge line of the opening in 30 cycles. At a
center portion of the irradiation region, a portion separated by
irradiation with laser is dropped off. As illustrated in FIG. 8, in
the case where the interval of the irradiation between each round
at each point on the predetermined outer edge line of the opening
was 247 msec, almost no burning occurred in a region around the
processing portion. From the above-mentioned results, it can be
said that undesirable thermal damages such as burning can be
suppressed by setting the interval of the irradiation between each
round at each point on the predetermined outer edge line of the
opening to 5 msec or more, even in the case where pulsed laser
light having a wavelength of 1064 nm is used.
[0155] The manufacturing method of a processed resin substrate
according to the embodiment of the present invention can speedily
form a through hole in a resin substrate without reducing the
processing quality. For example, with the manufacturing method of a
processed resin substrate according to the embodiment of the
present invention, speedup of the manufacturing process of a
semiconductor device can be achieved.
* * * * *