U.S. patent application number 17/472943 was filed with the patent office on 2021-12-30 for trichlorodisilane.
This patent application is currently assigned to Jiangsu Nata Opto-Electronic Materials Co. Ltd.. The applicant listed for this patent is Jiangsu Nata Opto-Electronic Materials Co. Ltd.. Invention is credited to Byung K. Hwang, Travis Sunderland, Xiaobing Zhou.
Application Number | 20210403330 17/472943 |
Document ID | / |
Family ID | 1000005836437 |
Filed Date | 2021-12-30 |
United States Patent
Application |
20210403330 |
Kind Code |
A1 |
Hwang; Byung K. ; et
al. |
December 30, 2021 |
TRICHLORODISILANE
Abstract
The present disclosure includes a composition for forming a
silicon-containing film on a substrate, comprising: a silicon
precursor and a nitrogen precursor. The silicon-containing film is
an elemental silicon film, a silicon carbon film, a silicon
nitrogen film, or a silicon oxygen film. The substrate is a
semiconductor material. The silicon precursor comprises
trichlorodisilane. The trichlorodisilane is
1,1,1-trichlorodisilane.
Inventors: |
Hwang; Byung K.; (Midland,
MI) ; Sunderland; Travis; (Midland, MI) ;
Zhou; Xiaobing; (Midland, MI) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Jiangsu Nata Opto-Electronic Materials Co. Ltd. |
Suzhou |
|
CN |
|
|
Assignee: |
Jiangsu Nata Opto-Electronic
Materials Co. Ltd.
Suzhou
CN
|
Family ID: |
1000005836437 |
Appl. No.: |
17/472943 |
Filed: |
September 13, 2021 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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16327872 |
Feb 25, 2019 |
11142462 |
|
|
PCT/US17/52609 |
Sep 21, 2017 |
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17472943 |
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62399709 |
Sep 26, 2016 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
C23C 16/45542 20130101;
C23C 16/345 20130101; C01B 33/107 20130101; C01B 33/1071 20130101;
C23C 16/45553 20130101 |
International
Class: |
C01B 33/107 20060101
C01B033/107; C23C 16/34 20060101 C23C016/34; C23C 16/455 20060101
C23C016/455 |
Claims
1. A composition for forming a silicon-containing film on a
substrate, comprising: a silicon precursor comprising
trichlorodisilane and a nitrogen precursor.
2. The composition of claim 1, wherein the silicon-containing film
is an elemental silicon film, a silicon carbon film, a silicon
nitrogen film, or a silicon oxygen film.
3. The composition of claim 1, wherein the silicon-containing film
has a wet etch rate that is less than the wet etch rate for a
silicon-containing film deposited from hexachlorodisilane.
4. The composition of claim 1, wherein said composition obtained by
a process comprising: subjecting a first vapor of the silicon
precursor and a second vapor comprising helium or hydrogen to
deposition conditions in the presence of the substrate so as to
form the silicon-containing film on the substrate, wherein the
silicon-containing film is an elemental silicon film.
5. The composition of claim 1, wherein said composition obtained by
a process comprising: subjecting a first vapor of the silicon
precursor and a second vapor of a carbon precursor comprising a
hydrocarbon, hydrocarbylsilane or a combination of a hydrocarbon,
hydrocarbylsilane to deposition conditions in the presence of the
substrate so as to form the silicon-containing film on the
substrate, wherein the silicon-containing film is a silicon carbon
film.
6. The composition of claim 1, wherein said composition obtained by
a process comprising: subjecting a first vapor of the silicon
precursor and a second vapor of a nitrogen precursor comprising
molecular nitrogen, ammonia, amine, hydrazine, or a combination of
any two or three thereof to deposition conditions in the presence
of the substrate so as to form a silicon-containing film on the
substrate, wherein the silicon-containing film is a silicon
nitrogen film.
7. The composition of claim 1, wherein said composition obtained by
a process comprising: subjecting a first vapor of the silicon
precursor and a second vapor of an oxygen precursor comprising
molecular oxygen, ozone, nitric oxide, nitrogen dioxide, water,
hydrogen peroxide, or a combination of any two or three thereof to
deposition conditions in the presence of the substrate so as to
form the silicon-containing film on the substrate, wherein the
silicon-containing film is a silicon oxygen film.
8. The composition of claim 3, wherein: said substrate obtained by
being heated and disposed in a deposition reactor that is
configured for atomic layer deposition; said composition obtained
by a process comprising: repeatedly feeding the first vapor of a
silicon precursor comprising trichlorodisilane, purging with an
inert gas, feeding the second vapor into the deposition reactor,
and purging with an inert gas so as to form the silicon-containing
film on the heated substrate using an atomic layer deposition;
wherein the atomic layer deposition comprises a plasma enhanced
atomic layer deposition or a thermal atomic layer deposition; and
wherein feeds may be the same or different.
9. The composition of claim 3, wherein the atomic layer deposition
is a plasma enhanced atomic layer deposition and wherein the plasma
is ammonia plasma in nitrogen or argon, forming gas plasma,
nitrogen plasma, or oxygen plasma.
10. The composition of claim 3, wherein said substrate obtained by
being heated and disposed in a deposition reactor that is
configured for chemical vapor deposition, wherein said composition
obtained by a process comprising: feeding the first vapor of a
silicon precursor and feeding the second vapor into the deposition
reactor so as to form the silicon-containing film on the heated
substrate using chemical vapor deposition, wherein feeds may be the
same or different.
11. The composition of claim 6, wherein the first and second vapor
lack carbon and oxygen and the silicon nitrogen film comprises a
silicon nitride film.
12. The composition of claim 1, wherein the substrate is a
semiconductor material.
13. The composition of claim 1, wherein the trichlorodisilane is
1,1,1-trichlorodisilane.
Description
[0001] The present invention generally relates to a precursor
compound and composition for film forming, to a method for forming
a film with the precursor compound or composition via a deposition
apparatus, and to the film formed by the method.
[0002] Elemental silicon, and other silicon materials such as
silicon oxide, silicon carbide, silicon nitride, silicon
carbonitride, and silicon oxycarbonitride, have a variety of known
uses. For example, silicon film may be used as a semiconductor, an
insulating layer or a sacrificial layer in the manufacture of
electronic circuitry for electronic or photovoltaic devices.
[0003] Known methods of preparing the silicon material may use one
or more silicon precursors. Use of these silicon precursors is not
limited to making silicon for electronic or photovoltaic
semiconductor applications. For example, silicon precursors may be
used to prepare silicon-based lubricants, elastomers, and
resins.
[0004] We see a long-felt need in the electronics and photovoltaic
industries for improved silicon precursors. We think improved
precursors would enable lowering of deposition temperatures and/or
making finer semiconductor features for better performing
electronic and photovoltaic devices.
SUMMARY OF THE INVENTION
[0005] We have discovered an improved silicon precursor. The
present invention provides each of the following embodiments:
[0006] A precursor compound for deposition, the precursor compound
comprising trichlorodisilane (hereinafter, "Silicon Precursor
Compound").
[0007] A composition for film forming, the composition comprising
the Silicon Precursor Compound and at least one of an inert gas,
molecular hydrogen, a carbon precursor, nitrogen precursor, and
oxygen precursor.
[0008] A method of forming a silicon-containing film on a
substrate, the method comprising subjecting a vapor of a silicon
precursor consisting of trichlorodisilane to deposition conditions
in the presence of the substrate so as to form a silicon-containing
film on the substrate, wherein the silicon-containing film is a
silicon nitrogen film or a silicon oxygen film and the method uses
atomic layer deposition.
[0009] A film formed in accordance with the method.
DETAILED DESCRIPTION OF THE INVENTION
[0010] The Brief Summary and Abstract are incorporated here by
reference. The invention embodiments, uses and advantages
summarized above are further described below.
[0011] Aspects of the invention are described herein using various
common conventions. For example, all states of matter are
determined at 25.degree. C. and 101.3 kPa unless indicated
otherwise. All % are by weight unless otherwise noted or indicated.
All % values are, unless otherwise noted, based on total amount of
all ingredients used to synthesize or make the composition, which
adds up to 100%. Any Markush group comprising a genus and subgenus
therein includes the subgenus in the genus, e.g., in "R is
hydrocarbyl or alkenyl," R may be alkenyl, alternatively R may be
hydrocarbyl, which includes, among other subgenuses, alkenyl. For
U.S. practice, all U.S. patent application publications and patents
referenced herein, or a portion thereof if only the portion is
referenced, are hereby incorporated herein by reference to the
extent that Incorporated subject matter does not conflict with the
present description, which would control in any such conflict.
[0012] Aspects of the invention are described herein using various
patent terms. For example, "alternatively" indicates a different
and distinct embodiment. "Comparative example" means a
non-invention experiment. "Comprises" and its variants (comprising,
comprised of) are open ended. "Consists of" and its variants
(consisting of) is closed ended. "Contacting" means bringing into
physical contact. "May" confers a choice, not an imperative.
"Optionally" means is absent, alternatively is present.
[0013] Aspects of the invention are described herein using various
chemical terms. The meanings of said terms correspond to their
definitions promulgated by IUPAC unless otherwise defined herein.
For convenience, certain chemical terms are defined.
[0014] The term "deposition" is a process of generating, on a
specific place, condensed matter. The condensed matter may or may
not be restricted in dimension. Examples of deposition are
film-forming, rod-forming, and particle-forming depositions.
[0015] The term "film" means a material that is restricted in one
dimension. The restricted dimension may be characterized as
"thickness" and as the dimension that, all other things being
equal, increases with increasing length of time of a process of
depositing said material to form the film.
[0016] The term "halogen" means fluorine, chlorine, bromine or
iodine, unless otherwise defined.
[0017] The term "IUPAC" refers to the International Union of Pure
and Applied Chemistry.
[0018] The term "lack" means free of or a complete absence of.
[0019] "Periodic Table of the Elements" means the version published
2011 by IUPAC.
[0020] The term "precursor" means a substance or molecule
containing atoms of the Indicated element and being useful as a
source of that element in a film formed by a deposition method.
[0021] The term "separate" means to cause to physically move apart,
and thus as a result is no longer in direct touching.
[0022] The term "substrate" means a physical support having at
least one surface upon which another material may be hosted.
[0023] This invention provides the Silicon Precursor Compound and
the composition for film forming. The Silicon Precursor Compound is
particularly suitable for deposition process for forming
silicon-containing films, although the Silicon Precursor Compound
is not limited to such applications. For example, the Silicon
Precursor Compound may be utilized in other applications, e.g. as a
reactant for preparing siloxane or silazane materials. This
invention further provides the method of forming a film and the
film formed in accordance with the method.
[0024] The Silicon Precursor Compound has the chemical name,
trichlorodisilane, which is of the general formula
R.sub.3SiSiR.sub.3, where each R is independently H or Cl, provided
that three of the R groups are Cl (i.e., is according to the
chemical formula H.sub.3Si.sub.2Cl.sub.3). When the Silicon
Precursor Compound is used in the present composition and method,
the Silicon Precursor Compound may have a purity of from 99 area %
(GC) to 99.9999999 area % (GC).
[0025] The Silicon Precursor Compound may be provided in any
manner. For example, the Silicon Precursor Compound may by
synthesized or otherwise obtained for use in the method. In an
embodiment the Silicon Precursor Compound is synthesized by thermal
coupling (heating at 450.degree. C.) of silane (SiH.sub.4) and
silicon tetrachloride (SiCl.sub.4). Additional embodiments for
synthesizing the Silicon Precursor Compound include reductive
coupling of silicon tetrachloride with hydrogen in the presence or
absence of silicon, dehydrochlorinative coupling between silicon
tetrachloride and silane, hydrochlorination of silicon or metal
silicides such as magnesium silicide and copper silicide, partial
reduction of hexachlorodisilane with metal hydrides such as LiH,
LiAlH.sub.4, NaH, NaAlH.sub.4, LiAl(OBu-t).sub.3H,
LiAl(Bu-i).sub.2(OBu-t)H, diisobutylaluminum hydride, Vitride
NaBH.sub.4, Mg(BH.sub.4).sub.2, (CH.sub.3).sub.4N(BH.sub.4),
KB(C.sub.2Hs).sub.3H, N-Selectride, L-Selectride, K-Selectride and
KS-Selectride, and chlorination of disilane. The Silicon Precursor
Compound may be separated via evaporation or stripping.
[0026] As mentioned above, the composition for film forming
comprises the Silicon Precursor Compound and at least one of an
inert gas, molecular hydrogen, a carbon precursor, a nitrogen
precursor, and an oxygen precursor, alternatively an inert gas, a
nitrogen precursor, and an oxygen precursor. The molecular hydrogen
may be used with the Silicon Precursor Compound in the composition
for forming an elemental silicon film including amorphous,
polycrystalline silicon and monocrystalline films. A vaporous or
gaseous state of the molecular hydrogen, carbon precursor, nitrogen
precursor or oxygen precursor may be generally referred to herein
as an additional reactant gas.
[0027] The carbon precursor may be used with the Silicon Precursor
Compound in the composition for forming a silicon carbon film
according to an embodiment of the method. The silicon carbon film
contains Si and C atoms and may comprise silicon carbide. The
carbon precursor may comprise, alternatively consist essentially
of, alternatively consist of C, H, and optionally Si atoms. The
carbon precursor that comprises C, H, and optionally Si atoms may
further comprise N or O atoms when the carbon precursor is used in
the method for forming a silicon carbonitride film or silicon
oxycarbide film, respectively, or may further comprise N and O
atoms when the carbon precursor is used in the method for forming a
silicon oxycarbonitride film. The carbon precursor that consists
essentially of C, H, and optionally Si atoms lacks N and O atoms,
but may optionally have one or more halogen atoms (e.g., Cl).
Examples of the carbon precursor consisting of C and H atoms are
hydrocarbons such as alkanes. Examples of the carbon precursor
consisting of C, H and Si atoms are hydrocarbylsilanes such as
butyldisilane or tetramethylsilane.
[0028] The nitrogen precursor may be used with the Silicon
Precursor Compound in the composition for forming a silicon
nitrogen film according to an embodiment of the method. The silicon
nitrogen film contains Si and N atoms and optionally C and/or O
atoms and may comprise silicon nitride, silicon oxynitride, or
silicon oxycarbonitride. The silicon nitride may be Si.sub.xN.sub.y
wherein subscript x is 1, 2 or 3 and subscript y is an integer from
1 to 5. The nitrogen precursor may comprise N atoms and optionally
H atoms, alternatively the nitrogen precursor may consist
essentially of N atoms and optionally H atoms, alternatively the
nitrogen precursor may consist of N and optionally H atoms. The
nitrogen precursor that comprises N and optionally H atoms may
further comprise C or O atoms when the nitrogen precursor is used
in the method for forming a silicon carbonitride film or silicon
oxynitride film, respectively, or may further comprise C and O
atoms when the nitrogen precursor is used in the method for forming
a silicon oxycarbonitride film. The nitrogen precursor that
consists essentially of N atoms and optionally H atoms lacks C and
O atoms, but optionally may have one or more halogen atoms (e.g.,
Cl). An example of the nitrogen precursor consisting of N atoms is
molecular nitrogen. Examples of the nitrogen precursor consisting
of N and H atoms are ammonia and hydrazine. An example of the
nitrogen precursor consisting of O and N atoms is nitric oxide
(N.sub.2O) and nitrogen dioxide (NO.sub.2).
[0029] The oxygen precursor may be used with the Silicon Precursor
Compound in the composition for forming a silicon oxygen film
according to an embodiment of the method. The silicon oxygen film
contains Si and O atoms and optionally C and/or N atoms and may
comprise silicon oxide, silicon oxycarbide, silicon oxynitride, or
silicon oxycarbonitride. The silicon oxide may be SIO or SiO.sub.2.
The oxygen precursor may comprise O atoms and optionally H atoms,
alternatively may consist essentially of O atoms and optionally H
atoms, alternatively may consist of O atoms and optionally H atoms.
The oxygen precursor that comprises O atoms and optionally H atoms
may further comprise C or N atoms when the oxygen precursor is used
in the method for forming a silicon oxycarbide or silicon
oxynitride film, respectively, or may further comprise C and N
atoms when the oxygen precursor is used in the method for forming a
silicon oxycarbonitride film. Examples of the oxygen precursor
consisting of O atoms are molecular oxygen and ozone. Ozone can be
delivered at up to 5% v/v in air or up to 14% v/v in molecular
oxygen. Examples of the oxygen precursor consisting of O and H
atoms are water and hydrogen peroxide. An example of the oxygen
precursor consisting of O and N atoms is nitric oxide and nitrogen
dioxide.
[0030] The inert gas may be used in combination with any one of the
foregoing precursors and any embodiment of the composition or
method. Examples of the inert gas are helium, argon, and a mixture
thereof. For example, helium may be used in combination with the
Silicon Precursor Compound and molecular hydrogen in an embodiment
of the method wherein the silicon containing film that is formed is
an elemental silicon film. Alternatively, helium may be used with
the Silicon Precursor Compound and any one of the carbon precursor,
nitrogen precursor and oxygen precursor in an embodiment of the
method wherein the silicon containing film that is formed is a
silicon carbon film, silicon nitrogen film, or silicon oxygen film
respectively.
[0031] The film formed by the method is a material containing Si
and is restricted in one dimension, which may be referred to as
thickness of the material. The silicon containing film may be an
elemental silicon film, a silicon carbon film, a silicon nitrogen
film, or a silicon oxygen film. (e.g., silicon nitride, silicon
carbonitride, silicon oxynitride, or silicon oxycarbonitride film,
alternatively a silicon nitrogen film or a silicon oxygen film
(e.g., silicon nitride, silicon oxide). The elemental silicon film
formed by the method lacks C, N and O atoms and may be an amorphous
or crystalline Si material. The silicon carbon film formed by the
method contains Si and C atoms and optionally N and/or O atoms. The
silicon nitrogen film formed by the method contains Si and N atoms
and optionally C and/or O atoms. The silicon oxygen film formed by
the method contains SI and O atoms and optionally C and/or N
atoms.
[0032] The film may be useful in electronics and photovoltaic
applications. E.g., the silicon nitride film may be formed as an
Insulator layer, passivation layer, or a dielectric layer between
polysilicon layers in capacitors.
[0033] A method of forming a silicon-containing film on a
substrate, the method comprising subjecting a vapor of a silicon
precursor comprising trichlorodisilane to deposition conditions in
the presence of the substrate so as to form a silicon-containing
film on the substrate
[0034] The method of forming a film uses an atomic layer deposition
apparatus. The deposition apparatus utilized in the method is
generally selected based upon the desired method of forming the
film and may be any deposition apparatus known by those of skill in
the art.
[0035] In certain embodiments, the deposition apparatus comprises a
physical vapor deposition apparatus. In these embodiments, the
deposition apparatus is typically selected from a sputtering
apparatus and a direct current (DC) magnetron sputtering apparatus.
The optimum operating parameters of each of these physical
deposition vapor apparatuses are based upon the Silicon Precursor
Compound utilized in the method and the desired application in
which the film formed via the deposition apparatus is utilized. In
certain embodiments, the deposition apparatus comprises a
sputtering apparatus. The sputtering apparatus may be, for example,
an ion-beam sputtering apparatus, a reactive sputtering apparatus,
or an ion-assisted sputtering apparatus.
[0036] Preferably, however, the deposition apparatus comprises an
atomic layer deposition apparatus. In embodiments using the atomic
layer deposition apparatus, the method of forming the film may be
referred to as an atomic layer deposition method and includes
plasma enhanced atomic layer deposition (PEALD), spatial atomic
layer deposition (SALD) and thermal atomic layer deposition (TALD).
Atomic layer deposition methods are generally well known in the
art.
[0037] In embodiments of the method using the chemical vapor
deposition apparatus, the chemical vapor deposition apparatus may
be selected from, for example, a flowable chemical vapor apparatus,
a thermal chemical vapor deposition apparatus, a plasma enhanced
chemical vapor deposition apparatus, a photochemical vapor
deposition apparatus, an electron cyclotron resonance apparatus, an
inductively coupled plasma apparatus, a magnetically confined
plasma apparatus, a low pressure chemical vapor deposition
apparatus and a jet vapor deposition apparatus. The optimum
operating parameters of each of these chemical deposition vapor
apparatuses are based upon the Silicon Precursor Compound utilized
in the method and the desired application in which film formed via
the deposition apparatus is utilized. In certain embodiments, the
deposition apparatus comprises a plasma enhanced chemical vapor
deposition apparatus. In other embodiments, the deposition
apparatus comprises a low pressure chemical vapor deposition
apparatus.
[0038] In chemical vapor deposition, gases for forming the film are
typically mixed and reacted in a deposition chamber. The reaction
forms the proper film elements or molecules in a vapor state. The
elements or molecules then deposit on a substrate (or wafer) and
build up to form the film. Chemical vapor deposition generally
requires the addition of energy to the system, such as heating of
the deposition chamber and substrate.
[0039] Reaction of gaseous species is generally well known in the
art and any conventional chemical vapor deposition (CVD) technique
can be carried out via the present method. For example, methods
such as simple thermal vapor deposition, plasma enhanced chemical
vapor deposition (PECVD), electron cyclotron resonance (ECRCVD),
atmospheric pressure chemical vapor deposition (APCVD), low
pressure chemical vapor deposition (LPCVD), ultrahigh vacuum
chemical vapor deposition (UHVCVD), aerosol-assisted chemical vapor
deposition (AACVD), direct liquid injection chemical vapor
deposition (DLICVD), microwave plasma-assisted chemical vapor
deposition (MPCVD), remote plasma-enhanced chemical vapor
deposition (RPECVD), atomic layer chemical vapor deposition
(ALCVD), hot wire chemical vapor deposition (HWCVD), hybrid
physical-chemical vapor deposition (HPCVD), rapid thermal chemical
vapor deposition (RTCVD), and vapor-phase epitaxy chemical vapor
deposition (VPECVD), photo-assisted chemical vapor disposition
(PACVD), flame assisted chemical vapor deposition (FACVD), or any
similar technique may be used.
[0040] When plasma enhanced atomic layer deposition methods are
employed, the plasma comprises forming gas plasma, nitrogen plasma
or ammonia plasma in either nitrogen or argon gas as a carrier or
oxygen plasma. Forming gas comprises nitrogen and hydrogen. One
skilled in the art would understand the composition of forming
gas.
[0041] Chemical vapor deposition may be utilized to form films
having a wide variety of thicknesses contingent on a desired end
use of the film. For instance, the film may have a thickness of a
few nanometers or a thickness of a few microns, or a greater or
lesser thickness (or a thickness falling between these values).
These films may optionally be covered by coatings, such as
SiO.sub.2 coatings, SiO.sub.2/modifying ceramic oxide layers,
silicon-containing coatings, silicon carbon-containing coatings,
silicon carbide-containing coatings, silicon nitrogen-containing
coatings, silicon nitride-containing coatings, silicon nitrogen
carbon-containing coatings, silicon oxygen nitrogen containing
coatings, and/or diamond like carbon coatings. Such coatings and
their methods of deposition are generally known in the art.
[0042] The substrate utilized in the method is not limited. In
certain embodiments, the substrate is limited only by the need for
thermal and chemical stability at the temperature and in the
environment of the deposition chamber. Thus, the substrate can be,
for example, glass, metal, plastic, ceramic, semiconductor
including silicon (e.g. monocrystalline silicon, polycrystalline
silicon, amorphous silicon, etc).
[0043] Embodiments of the present method may include a reactive
environment comprising nitrous oxide (N.sub.2O). Such reactive
environments are generally known in the art. In these embodiments,
the method generally involves decomposing the Silicon Precursor
Compound in the presence of nitrous oxide. An example of such a
method is described in U.S. Pat. No. 5,310,583. Utilizing nitrous
oxide may modify the composition of the resulting film formed in
the chemical vapor deposition method.
[0044] The chemical vapor deposition apparatus and, thus, the
chemical vapor deposition method utilized is generally selected by
balancing a number of factors, including, but not limited to, the
Silicon Precursor Compound, desired purity of the film, geometric
configuration of the substrate, and economic considerations.
[0045] The main operating variables manipulated in chemical vapor
deposition and atomic layer deposition include, but are not limited
to, reactor temperature, substrate temperature, pressure, a
concentration in the gas phase of the Silicon Precursor Compound,
any additional reactant gas concentration (e.g., concentration of
gas of any carbon precursor, nitrogen precursor, and/or oxygen
precursor), and total gas flow and substrate. Chemical vapor
deposition and atomic layer deposition is generated from chemical
reactions which include, but are limited to, pyrolysis, oxidation,
reduction, hydrolysis, and combinations thereof. Selecting the
optimal temperature for chemical vapor deposition and atomic layer
deposition requires an understanding of both the kinetics and
thermodynamics of the Silicon Precursor Compound and the chosen
chemical reaction.
[0046] Conventional chemical vapor deposition and atomic layer
deposition methods generally require significantly high reactor
temperatures, such as greater than 600.degree. C., e.g. 600.degree.
to 1000.degree. C. However, it is believed that the Silicon
Precursor Compound may be utilized in chemical vapor deposition and
atomic layer deposition at much lower reactor temperatures. For
example, the method may be carried out at a reactor temperature of
from 100.degree. to 1000.degree., alternatively from 200.degree. to
800.degree., alternatively from 200.degree. to 600.degree.,
alternatively from 200.degree. to 500.degree., alternatively from
200.degree. to 400.degree. C., alternatively from 100.degree. to
300.degree. C. The reactor temperature at which the method is
carried out may be isothermal or dynamic.
[0047] Chemical vapor deposition and atomic layer deposition
processes are conducted at a pressure from approximately 0.01 torr
to 100 torr, alternatively from 0.01 to 10 torr, alternatively from
0.1 to 10 torr, alternatively from 1 to 10 torr.
[0048] Chemical vapor deposition and atomic layer deposition
processes generally involve generating a precursor, transporting
the precursor into a reaction chamber, and either absorption of
precursors onto a heated substrate or chemical reaction of the
precursor and subsequent absorption onto the substrate. The
following sets forth a cursory survey of chemical vapor deposition
and atomic layer deposition methods to Illustrate some of the vast
options available. These methods can be adapted for atomic layer
deposition by one skilled in the art.
[0049] In Chemical vapor deposition and atomic layer deposition
processes, the film produced has a thickness from 0.01 nm to 1
.mu.m alternatively from 0.1 to 100 nm, alternatively from 1 to 100
nm, alternatively from 10 to 100 nm.
[0050] Chemical vapor deposition and atomic layer deposition
processes involve a substrate. The substrate can be, for example,
glass, metal, plastic, ceramic, semiconductor including silicon
(e.g. monocrystalline silicon, polycrystalline silicon, amorphous
silicon, etc). The substrate can have a flat or a patterned
surface. A patterned surface has features with an aspect ratio
ranging from 1 to 500, alternatively from 1 to 50, alternatively
from 10 to 50. The CVD or ALD films can be conformal on both the
flat or patterned substrate surface.
[0051] In thermal CVD, the film is deposited by passing a stream of
a vaporized form of the Silicon Precursor Compound over a heated
substrate. When the vaporized form of the Silicon Precursor
Compound contacts the heated substrate, the Silicon Precursor
Compound generally reacts and/or decomposes to form the film.
[0052] In PECVD, a vaporized form of the Silicon Precursor Compound
is reacted by passing it through a plasma field to form a reactive
species. The reactive species is then focused and deposited on the
substrate the form the film. Generally, an advantage of PECVD over
thermal CVD is that lower substrate temperature can be used. The
plasmas utilized in PECVD comprise energy derived from a variety of
sources such as electric discharges, electromagnetic fields in the
radio-frequency or microwave range, lasers or particle beams.
Generally, PECVD utilizes radio frequency (10 kilohertz (kHz)-102
megahertz (MHz)) or microwave energy (0.1-10 gigahertz (GHz)) at
moderate power densities (0.1-5 watts per square centimeter
(W/cm.sup.2)), although any of these variables may be modified. The
specific frequency, power, and pressure, however, are generally
tailored to the deposition apparatus.
[0053] In AACVD, the Silicon Precursor Compound is dissolved in a
chemical medium to form a mixture. The mixture comprising the
Silicon Precursor Compound and the chemical medium is packaged in a
traditional aerosol. The aerosol atomizes and introduces the
Silicon Precursor Compound into a heated chamber where the Silicon
Precursor Compound undergoes decomposition and/or chemical
reaction. One advantage of AACVD is the ability to form the film
without necessitating a vacuum.
[0054] In plasma enhanced atomic layer deposition (PEALD), the
vapor of the Silicon Precursor Compound is flowed into a PEALD
reactor for a certain length of time. The ALD reactor is then
purged with an Inert gas to remove any residual vapor of the
Silicon Precursor Compound. Next, a reactant gas plasma is flowed
over the substrate surface for a certain length of time. The ALD
reactor is then purged with an inert gas to remove any residual
reactant gas plasma. The foregoing sequence of steps (Silicon
Precursor, purging, reactant gas plasma, purging) is then repeated
until a conformal silicon-containing film with a desired thickness
is formed on the substrates.
In thermal atomic layer deposition (ALD), the vapor of the Silicon
Precursor Compound Is flowed into a thermal ALD reactor for a
certain length of time. The ALD reactor is then purged with an
inert gas to remove any residual vapor of the Silicon Precursor
Compound. Next, a reactant gas is flowed over the substrate surface
for a certain length of time. The ALD reactor is then purged with
an inert gas to remove any residual reactant gas. The foregoing
sequence of steps (Silicon Precursor, purging, reactant gas,
purging) is then repeated until a conformal silicon-containing film
with a desired thickness is formed on the substrates.
[0055] The chosen deposition process and operating parameters will
have impact on the structure and properties of the film. Generally,
it is possible to control the orientation of film structure, the
manner in which the film coalesces, the uniformity of the film, and
crystalline/non-crystalline structure of the film.
[0056] It is to be noted that environments which facilitate the
desired deposition can also be used in the deposition chamber. For
instance, reactive environments such as air, oxygen, oxygen plasma,
ammonia, amines, hydrazine, etc. or inert environments may all be
used herein.
[0057] Additionally, the present invention provides a film formed
in accordance with the method. The composition and structure of the
film is a function of not only the deposition apparatus and its
parameters, but also the Silicon Precursor Compound utilized and
the presence or absence of any reactive environment during the
method. The Silicon Precursor Compound may be utilized in
combination with any other known precursor compounds or may be
utilized in the method free from any other precursor compounds.
[0058] Because the Silicon Precursor Compound lacks at least one
Si--N bond and Si--C bond and Si--O bond, the Silicon Precursor
Compound may be utilized to form elemental silicon film.
[0059] Alternatively, the Silicon Precursor Compound may be
utilized with other silicon-based precursor compounds traditionally
utilized to form silicon films comprising crystalline silicon or
silicon nitride. In such embodiments, the films may be, for
example, crystalline or epitaxial. Contingent on the presence of
reactive environments during the method, the film may further
comprise oxygen and/or carbon in addition to silicon and
nitrogen.
[0060] Etch resistance is an important characteristics of dense and
defect-free silicon-containing films. Etch resistance can be
measured with a dry etch method or a wet etch method known in the
art. A low etch rate, e.g., a low wet etch rate (WER), is an
indicator for a dense and defect-free, and therefore, a high
quality films. There always is a need for etch resistant
silicon-containing films with low dry or wet etch rate.
[0061] In one embodiment, the silicon-containing film deposited at
500.degree. C. has a WER of less than 3.6, alternatively less than
2.0, alternatively less than 1.2 nanometers/minute at using a 500:1
HF:water solution.
[0062] Purity of the Silicon Precursor Compound may be determined
by .sup.29Si-NMR, reverse phase liquid chromatography or, more
likely, by gas chromatography (GC) as described later. For example,
the purity determined by GC may be from 60 area % to .ltoreq.100
area % (GC), alternatively from 70 area % to .ltoreq.100 area %
(GC), alternatively from 80 area % to .ltoreq.100 area % (GC),
alternatively from 90 area % to .ltoreq.100 area % (GC),
alternatively from 93 area % to .ltoreq.100 area % (GC),
alternatively from 95 area % to .ltoreq.100 area % (GC),
alternatively from 97 area % to .ltoreq.100 area % (GC),
alternatively from 99.0 area % to .ltoreq.100 area % (GC). Each
.ltoreq.100 area % (GC) independently may be as defined
previously.
Examples
[0063] The invention is further illustrated by, and an invention
embodiment may include any combinations of features and limitations
of, the non-limiting examples thereof that follow. Ambient
temperature is about 23.degree. C. and all percents are weight
percent unless indicated otherwise. The following table includes
abbreviations used in the examples.
TABLE-US-00001 TABLE 1 abbreviations used in the Examples.
Abbreviation sccm Standard cubic centimeters per minute .degree. C.
Degrees Celsius WER Wet etch rate GPC Growth per cycle measured in
angstroms (.ANG.) RI Refractive Index nm Nanometers RF Plasma power
in Watts SiN Silicon nitride HF Hydrogen Fluoride min Minute FG
Forming gas (10% H.sub.2 and balance N.sub.2) .ANG. Angstroms
[0064] Thin Film Characterization Method: The thickness of thin
film and refractive index (at 632.8 nm) of silicon nitride were
measured using spectroscopic ellipsometry (M-2000D1, J. A.
Woollam). Ellipsometry data were collected from 375 nm to 1690 nm
and analyzed using either Cauchy or Tauc-Lorentz oscillator model
with a software provided by J. A. Woollam.
[0065] Wet Etch Rate (WER): Wet etch rate tests of the thin films
grown by PEALD process were performed using 500:1 HF:water solution
at room temperature. The wet etch rate was calculated from the
thickness difference before and after etching for a specified
amount of time.
[0066] Gas Chromatography Thermal Conductivity Detector (GC-TCD)
conditions: a capillary column with 30 meters length, 0.32 mm inner
diameter, and containing a 0.25 .mu.m thick stationary phase in the
form of a coating on the inner surface of the capillary column,
wherein the stationary phase was composed of phenyl methyl
siloxane. Carrier gas is helium gas used at a flow rate of 105 mL
per minute. GO Instrument Is an Agilent model 7890A gas
chromatograph. Inlet temperature is 200.degree. C. GO experiment
temperature profile consist of soaking (holding) at 50.degree. C.,
for 2 minutes, ramping temperature up at a rate of 15.degree.
C./minute to 250.degree. C., and then soaking (holding) at
250.degree. C. for 10 minutes.
[0067] GC-MS instrument and conditions: Sample is analyzed by
electron impact ionization and chemical ionization gas
chromatography-mass spectrometry (EI GO-MS and CI GC-MS). Agilent
6890 GC conditions include a DB-1 column with 30 meters
(m).times.0.25 millimeter (mm).times.0.50 micrometer (.mu.m) film
configuration. An oven program of soaking at 50.degree. C. for 2
minutes, ramping at 15.degree. C./minute to 250.degree. C., and
soaking at 250.degree. C. for 10 minutes. Helium carrier gas
flowing at constant flow of at 1 mL/minute and a 50:1 split
injection. Agilent 5973 MSD conditions include a MS scan range from
15 to 800 Daltons, an EI ionization and CI ionization using a
custom Cl gas mix of 5% NH.sub.3 and 95% CH.sub.4.
[0068] .sup.29Si-NMR instrument and solvent: a Varian 400 MHz
Mercury spectrometer is used. C.sub.6D.sub.6 is used as the
solvent.
[0069] .sup.1H-NMR instrument and solvent: a Varian 400 MHz Mercury
spectrometer is used. C.sub.6D.sub.6 is used as the solvent.
[0070] Example 1 (prophetic): synthesis of trichlorodisilane: heat
silane and silicon tetrachloride at a temperature of 450.degree. C.
to yield trichlorodisilane according to known methods from the
literature, and distill the trichlorodisilane from the resulting
reaction mixture to give a purified trichlorodisilane.
[0071] Example 2 (prophetic): forming an elemental silicon film
using the Silicon Precursor Compound with LPCVD: using a LPCVD
reactor and a bubbler containing the Silicon Precursor Compound and
in fluid communication with the LPCVD reactor. Then flow hydrogen
carrier gas through the bubbler to carry vapor of the Silicon
Precursor Compound into the LPCVD reactor, wherein the LPCVD
reactor contains a plurality of vertically oriented and spaced
apart silicon wafers heated to 700.degree. C. so a conformal
elemental silicon film is formed on the wafers.
[0072] Example 3 (prophetic): forming a silicon nitride film using
the Silicon Precursor Compound and ammonia (NH.sub.3) with LPCVD:
using a LPCVD reactor and a bubbler containing the Silicon
Precursor Compound and in fluid communication with the LPCVD
reactor. Then flow He carrier gas through the bubbler to carry
vapor of the Silicon Precursor Compound into the LPCVD reactor,
wherein the LPCVD reactor contains vaporous ammonia and a plurality
of vertically oriented and spaced apart silicon wafers heated to
500.degree. C. so a conformal silicon nitride film is formed on the
wafers.
[0073] Example 4 (prophetic): forming a silicon nitride film using
the Silicon Precursor Compound with ammonia and PECVD: using a
PECVD reactor and a bubbler in fluid communication with the PECVD
reactor. Then flow He carrier gas through the bubbler to carry
vapor of the Silicon Precursor Compound into the PECVD reactor,
wherein the PECVD reactor has an ammonia-derived plasma and
contains a plurality of horizontally oriented and spaced apart
silicon wafers heated to 500.degree. C. such that a conformal
silicon nitride film is formed on the wafers.
[0074] Example 5 (prophetic): forming a silicon oxide film using
the Silicon Precursor Compound with LPCVD: using a LPCVD reactor
and a bubbler in fluid communication with the LPCVD reactor. Then
flow He carrier gas through the bubbler to carry vapor of the
Silicon Precursor Compound into the LPCVD reactor, wherein the
LPCVD reactor has an oxygen atmosphere and contains a plurality of
vertically oriented and spaced apart silicon wafers heated to
500.degree. C. such that a conformal silicon oxide film is formed
on the wafers.
[0075] Example 6 (prophetic): forming a silicon carbide film using
the Silicon Precursor Compound with methane and PECVD: using a
PECVD reactor and a bubbler in fluid communication with the PECVD
reactor. Then flow He carrier gas through the bubbler to carry
vapor of the Silicon Precursor Compound into the PECVD reactor,
wherein the PECVD reactor has a methane-derived plasma and contains
a plurality of horizontally oriented and spaced apart silicon
wafers heated to 500.degree. C. such that a conformal silicon
carbide film is formed on the wafers.
[0076] Example 7 (prophetic): forming a silicon nitride film using
an ALD reactor and a bubbler in fluid communication with the ALD
reactor. The ALD reactor is purged with argon, wherein the ALD
reactor contained a plurality of horizontally oriented and spaced
apart silicon wafers heated to 500 to 800.degree. C. Then the vapor
of Silicon Precursor Compound is flowed into the ALD reactor for 10
seconds. The ALD reactor is then purged again with argon to remove
any residual vapor of the Silicon Precursor Compound. Next, ammonia
is flowed into the ALD reactor for 10 seconds. Then the ALD reactor
is purged again with argon to remove any residual ammonia. The
foregoing sequence of steps (Silicon Precursor, purging, ammonia,
purging) is then repeated until a conformal silicon nitride film
with a desired thickness is formed on the wafers.
[0077] Example 8: forming a silicon nitride using a PEALD reactor
and a bubbler in fluid communication with the PEALD reactor. The
PEALD reactor is purged with nitrogen, wherein the PEALD reactor
contains a plurality of horizontally oriented and spaced apart
silicon wafers heated to a temperature from 350 to 500.degree. C.
Then the vapor of Silicon Precursor Compound is flowed into the
PEALD reactor. The PEALD reactor was then purged again with
nitrogen to remove any residual vapor of the Silicon Precursor
Compound. Next, nitrogen atom containing species such as ammonia,
nitrogen, mixture of nitrogen and hydrogen (forming gas) are flowed
into the PEALD reactor with plasma power on. The PEALD reactor was
then purged again with nitrogen to remove any residual reactive
species generated by plasma. The foregoing sequence of steps was
then repeated until a conformal silicon nitride film with a desired
thickness was formed on the wafers.
[0078] Example 9 (prophetic): forming a silicon oxide film using an
ALD reactor and a bubbler in fluid communication with the ALD
reactor. The ALD reactor is purged with Ar, wherein the ALD reactor
contains a plurality of horizontally oriented and spaced apart
silicon wafers heated to either 400 to 800.degree. C. Then the
vapor of Silicon Precursor Compound was flowed into the ALD
reactor. The ALD reactor was purged again with Ar to remove any
residual vapor of the Silicon Precursor Compound. Then ozone is
flowed into the ALD reactor. The ALD reactor was purged again with
Ar to remove any ozone. The foregoing sequence of steps was
repeated until a conformal silicon oxide film with a desired
thickness is formed on the wafers.
[0079] Comparative Examples (1-4): forming a silicon nitride film
using the hexachlorodisilane (HCDS) or pentachlorodisilane (PCDS)
with ammonia (NH.sub.3)/nitrogen and PEALD. A PEALD reactor and a
small cylinder containing the HCDS or PCDS in fluid communication
with the PEALD reactor was used. The cylinder was maintained at the
room temperature or heated to increase the vapor pressure of the
HCDS or PCDS. The PEALD reactor was purged with nitrogen (N.sub.2).
The PEALD reactor contained a plurality of horizontally oriented
and spaced silicon wafers heated to the set point of
400-500.degree. C. Then PEALD SiN film was grown with HCDS or PCDS
in the following sequences: HCDS or PCDS dose, 1 sec/N.sub.2 Purge,
30 sec/Plasma with NH.sub.3+N.sub.2, 15 sec/N.sub.2 Purge, 30 sec.
The foregoing sequence of steps were repeated until a silicon
nitride film with a desired thickness was formed on the wafers.
[0080] Examples (10-18): forming a silicon nitride film using the
trichlorodisilane (3CDS) with ammonia/nitrogen and PEALD: A PEALD
reactor and a small cylinder containing the 3CDS and in fluid
communication with the PEALD reactor were used. The cylinder was
maintained at room temperature or heated to increase vapor pressure
of the 3CDS. The PEALD reactor was purged with nitrogen (N.sub.2).
The PEALD reactor contained a plurality of horizontally oriented
and spaced silicon wafers heated to the set point of
350-500.degree. C. Then PEALD SiN films were grown with 3CDS in
following sequences: 3CDS dose, 1-7 sec/N.sub.2 Purge, 30
sec/Plasma with NH.sub.3+N.sub.2, 15 sec/N.sub.2 Purge, 30 sec. The
foregoing sequence of steps were repeated until a silicon nitride
film with a desired thickness was formed on the wafers. The films
deposited from 3CDS have much lower WER than the films deposited
from HCDS or PCDS under the same conditions. HCDS is an incumbent
precursor for PEALD SiN films.
TABLE-US-00002 TABLE 2 Results of testing of films for Examples
10-18 and Comparative Examples 1-4 (C1-C4 in table). WER of
Precursor Set RF PEALD SiN in Example Pulse Time Temp Power** GPC
RI @ 500:1 HF # Precursor *(sec) (.degree. C.) (W) ( /cycle) 632.8
nm solution (nm/min) 18 3CDS 1 350 100 0.50 1.83 3.8 10 3CDS 3 350
100 0.56 1.80 4.3 11 3CDS 7 350 100 0.55 1.80 4.1 12 3CDS 1 400 100
0.53 1.83 3.1 13 3CDS 3 400 100 0.57 1.83 2.1 14 3CDS 7 400 100
0.58 1.83 2.2 15 3CDS 1 500 100 0.56 1.86 1.1 16 3CDS 3 500 100
0.57 1.85 0.9 17 3CDS 7 500 100 0.60 1.86 0.9 C-1 PCDS 1 400 100
0.88 1.83 5.8 C-2 PCDS 1 500 100 0.85 1.84 3.6 C-3 HCDS 1 400 100
0.73 1.81 6.3 C-4 HCDS 1 500 100 0.65 1.82 4.9
The invention is further defined by the following aspects of the
invention.
[0081] Aspect 1. A method of forming a silicon-containing film on a
substrate, the method comprising subjecting a vapor of a silicon
precursor consisting of trichlorodisilane to deposition conditions
in the presence of the substrate so as to form a silicon-containing
film on the substrate, wherein the silicon-containing film is a
silicon nitrogen film or a silicon oxygen film and the method uses
atomic layer deposition.
[0082] Aspect 2. The method of aspect 1 comprising subjecting a
first vapor of the silicon precursor and a second vapor comprising
helium or hydrogen to deposition conditions in the presence of the
substrate so as to form the silicon-containing film on the
substrate.
[0083] Aspect 3. The method of aspect 1 comprising subjecting a
first vapor of the silicon precursor and a second vapor of a
nitrogen precursor comprising molecular nitrogen, ammonia, amine,
hydrazine, or a combination of any two or three thereof to
deposition conditions in the presence of the substrate so as to
form the silicon-containing film on the substrate, wherein the
silicon-containing film is the silicon nitrogen film.
[0084] Aspect 4. The method of aspect 1 comprising subjecting a
first vapor of the silicon precursor and a second vapor of an
oxygen precursor comprising molecular oxygen, ozone, nitric oxide,
nitrogen dioxide, water, hydrogen peroxide, or a combination of any
two or three thereof to deposition conditions in the presence of
the substrate so as to form the silicon-containing film on the
substrate, wherein the silicon-containing film is the silicon
oxygen film.
[0085] Aspect 5. The method of any one of aspects 2-4 wherein the
substrate is heated and disposed in a deposition reactor that is
configured for atomic layer deposition, the method comprising
repeatedly feeding the first vapor of the silicon precursor,
purging with an inert gas, feeding the second vapor into the
deposition reactor, and purging with an inert gas so as to form the
silicon-containing film on the heated substrate, wherein the feeds
may be the same or different.
[0086] Aspect 6. The method of aspect 1, wherein the atomic layer
deposition is plasma enhanced atomic layer deposition and wherein
the plasma is ammonia plasma in nitrogen or argon or wherein the
plasma is forming gas plasma.
[0087] Aspect 7. The method of aspect 1, wherein the atomic layer
deposition is thermal atomic layer deposition.
[0088] Aspect 8. The method of aspect 3, wherein the vapor
deposition conditions lack carbon and oxygen and the silicon
nitrogen film comprises a silicon nitride film.
[0089] Aspect 8. The method of any one of the preceding aspects
wherein the substrate is a semiconductor material.
[0090] Aspect 9. A composition for forming a silicon nitrogen film,
the composition comprising a silicon precursor consisting of
trichlorodisilane and a nitrogen precursor.
[0091] Aspect 10. Use of the composition of aspect 9 in a method of
forming of a silicon nitrogen film.
[0092] The below claims are incorporated by reference here, and the
terms "claim" and "claims" are replaced by the term "aspect" or
"aspects," respectively. Embodiments of the invention also include
these resulting numbered aspects.
* * * * *