U.S. patent application number 16/972859 was filed with the patent office on 2021-08-12 for display device.
The applicant listed for this patent is SAKAI DISPLAY PRODUCTS CORPORATION, SHARP KABUSHIKI KAISHA. Invention is credited to KATSUHIKO KISHIMOTO, KIYOSHI MINOURA, YOZO NARUTAKI, SHINJI SHIMADA.
Application Number | 20210247637 16/972859 |
Document ID | / |
Family ID | 1000005563842 |
Filed Date | 2021-08-12 |
United States Patent
Application |
20210247637 |
Kind Code |
A1 |
KISHIMOTO; KATSUHIKO ; et
al. |
August 12, 2021 |
DISPLAY DEVICE
Abstract
The present invention has: a reflective liquid crystal display
element (30) that is formed in a first region (R) on a TFT
substrate (20) and having at least the upper surface thereof
comprising an inorganic insulating film (25b), and that has a
reflective electrode (31), a liquid crystal layer (32), and a
counter electrode (33); and a light-emitting element (40) that is
formed in a second region (T) above the insulating layer of the TFT
substrate, and that has a first electrode (41), a light-emitting
layer (43), and a second electrode (44). In addition, the
light-emitting element has an encapsulating layer (45) formed of an
inorganic insulating layer that covers the entirety of each
light-emitting region, and an end portion of the encapsulating
layer is bonded to the inorganic insulating film of the insulating
layer.
Inventors: |
KISHIMOTO; KATSUHIKO;
(Sakai-shi, Osaka, JP) ; NARUTAKI; YOZO;
(Sakai-shi, Osaka, JP) ; SHIMADA; SHINJI;
(Sakai-shi, Osaka, JP) ; MINOURA; KIYOSHI;
(Sakai-shi,. Osaka, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
SAKAI DISPLAY PRODUCTS CORPORATION
SHARP KABUSHIKI KAISHA |
Sakal-shi, Osaka
Sakai-shi, Osaka |
|
JP
JP |
|
|
Family ID: |
1000005563842 |
Appl. No.: |
16/972859 |
Filed: |
June 11, 2018 |
PCT Filed: |
June 11, 2018 |
PCT NO: |
PCT/JP2018/022278 |
371 Date: |
December 7, 2020 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 27/3258 20130101;
G02F 1/1368 20130101; H01L 51/5253 20130101; H01L 51/5218 20130101;
H01L 51/5293 20130101 |
International
Class: |
G02F 1/1368 20060101
G02F001/1368; H01L 51/52 20060101 H01L051/52; H01L 27/32 20060101
H01L027/32 |
Claims
1. A display apparatus comprising: a TFT substrate in which an
insulating layer is formed on a driving element; a liquid crystal
layer containing a liquid crystal composition; an opposing
substrate comprising a transparent electrode opposing the TFT
substrate via the liquid crystal layer; and a polarizing plate
provided on a surface of the opposing substrate, the surface being
opposite to a surface opposing the liquid crystal layer, wherein
the display apparatus comprises a plurality of pixels in a display
region, each of the plurality of pixels comprising a first region
and a second region, the first region and the second region being
adjacent to each other; the first region comprises a reflection
electrode above the insulating layer of the TFT substrate; the
second region comprises a light emitting element, in which a first
electrode, a light emitting layer, and a second electrode are
deposited on the insulating layer of the TFT substrate; at least in
the second region, a first surface facing the opposing substrate of
the insulating layer is formed of a first inorganic insulating film
and a metal film provided by joining to a surface facing the
opposing substrate of the first inorganic insulating film, the
metal film being connected to the driving element; the light
emitting element comprises an encapsulating layer at least
comprising a second inorganic insulating film covering the entirety
of each light emitting region of the display apparatus; and an end
portion of the encapsulating layer is joined to the insulating
layer to cause the light emitting layer and the second electrode to
be sealed by the first inorganic insulating film of the insulating
layer and the second inorganic insulating film of the encapsulating
layer.
2. The display apparatus according to claim 1, wherein the light
emitting element is an organic EL display element.
3. The display apparatus according to claim 1, wherein the
encapsulating layer comprises deposited films including a plurality
of inorganic insulating films and an organic film, and joining of
each of the end portion of the second inorganic insulating film and
an end portion of a third inorganic insulating film constituting
the plurality of inorganic insulating films to the first inorganic
insulating film is performed, thereby causing the light emitting
layer and the second electrode to be sealed.
4. The display apparatus according to claim 1, wherein a contact
hole is not provided in a layer upper to the insulating layer in
the second region in which the light emitting element is
formed.
5. The display apparatus according to claim 1, wherein the
insulating layer comprises an organic insulating film on a surface
being opposite to the first surface of the first inorganic
insulating film.
6. The display apparatus according to claim 1, wherein the
insulating layer is formed only of the first inorganic insulating
film.
7. The display apparatus according to claim 1, the display
apparatus further comprising: a second insulating layer on the
first surface of the TFT substrate, the second insulating layer to
partition the light emitting region of the light emitting element,
wherein the second insulating layer is also arranged in the first
region on the insulating layer; and the first inorganic insulating
film and the second inorganic insulating film are joined in a
groove formed by splitting the second insulating layer between the
first region and the second region.
8. The display apparatus according to claim 1, the display
apparatus further comprising: a second insulating layer on the
first surface of the TFT substrate, the second insulating layer to
partition the light emitting region of the light emitting element,
wherein the second insulating layer is also arranged in the first
region on the insulating layer; and an end portion of the
reflection electrode is joined to the first inorganic insulating
film in a groove formed by splitting the second insulating layer
between the first region and the second region.
9. The display apparatus according to claim 1, wherein the
reflection electrode and the driving element are electrically
connected via a contact hole; and the contact hole is formed outer
to a joining portion of the first inorganic insulating film and the
second inorganic insulating film, the joining portion sealing the
light emitting layer and the second electrode of the light emitting
element.
10. The display apparatus according to claim 1, wherein a switching
TFT to switch between displaying in the first region and displaying
in the second region is formed on the TFT substrate.
11. The display apparatus according to claim 1, wherein the liquid
crystal layer is aligned to realize normally black, and the
polarizing plate is formed of a circularly polarizing plate and is
also formed in the second region.
12. The display apparatus according to claim 1, wherein the TFT
substrate comprises a first liquid crystal alignment layer on a
surface opposing the liquid crystal layer; the opposing substrate
comprises a second liquid crystal alignment layer on a surface
opposing the liquid crystal layer; and liquid crystal molecules of
the liquid crystal layer are aligned substantially vertically in a
vicinity of the TFT substrate and have a pretilt with respect to a
surface of the opposing substrate.
13. The display apparatus according to claim 12, wherein an angle
of the pretilt is an angle from 80.degree. to 89.9.degree. with
respect to the surface of the opposing substrate.
Description
TECHNICAL FIELD
[0001] The present invention relates to a composite (hybrid)
display apparatus combining a reflective liquid crystal display
element, and a light emitting element such as an organic
electro-luminance (EL) display element.
BACKGROUND ART
[0002] In recent years, portable equipment units such as a personal
digital assistant (PDA), including a mobile telephone have been
spreading widely. Such portable equipment units require a
particularly low battery power consumption. For this reason, in a
liquid crystal display element, for example, a reflective liquid
crystal display element not having backlight but utilizing external
light can be utilized. However, in a display element utilizing
external light, such as the reflective liquid crystal display
element, there is a problem that displaying is not feasible at
night, or in indoors in which available external light is
insufficient. Therefore, a display apparatus using an organic EL
display element having a low electric power consumption, in
addition to the reflective liquid crystal display element, is being
proposed (for example, see Patent Document 1).
[0003] This display apparatus is configured to have a structure
such as a cross-sectional view thereof illustrated in FIG. 5, for
example. In other words, a TFT 82 for a liquid crystal display
element, a TFT 83 for an organic EL display element, and bus lines
(not illustrated) are formed on an insulating substrate 81, and a
planarizing film 84 is formed on surfaces of these members. Then,
as illustrated in FIG. 5, the display apparatus is divided into a
reflective region P and a transmissive region Q, on the planarizing
film 84 of the transmissive region Q a light reflective anode
electrode 91 for an organic EL display element 90 is fat med. Then,
an insulating layer 92, an organic light emitting layer 93, a
cathode electrode 94, and a transparent insulating layer 95 are
formed to form the organic EL display element 90. Moreover, in the
reflective region P, a reflection electrode (pixel electrode) 85, a
liquid crystal layer 86, a counter electrode 87, and an opposing
substrate 88 are provided on the transparent insulating layer 95,
and a polarizing plate 89 is formed on an outer surface thereof to
form a reflective liquid crystal display element 80. According to
the illustrated example, the polarizing plate 89 is configured to
be a circularly polarizing plate by a quarter-wavelength
retardation plate 89b being laminated on a linear polarizing plate
89a. At this time, the cathode electrode 94 and the transparent
insulating layer 95 of the organic EL display element 90 are also
formed in the reflective region P, and the liquid crystal layer 86,
the counter electrode 87, the opposing substrate 88, and the
polarizing plate 89 for the liquid crystal display element 80 are
formed to also extend directly into the transmissive region Q.
Moreover, a color filter layer 88a is formed between the counter
electrode 87 and the opposing substrate 88.
PRIOR ART DOCUMENT
[0004] Patent Document 1: JP 3898012 B1
SUMMARY OF THE INVENTION
Problem to be Solved by the Invention
[0005] As described previously, in the conventional composite
display apparatus combining the reflective liquid crystal display
element 80 and the organic EL display element 90, the cathode
electrode 94 and the transparent insulating layer 95 for the
organic EL display element 90, and the liquid crystal layer 86, the
counter electrode 87, the opposing substrate 88, and the polarizing
plate 89 for the liquid crystal display element 80 are formed such
that each of them is formed to also extend into the counterpart
region thereof. This is believed to be based on that there is no
adverse effect even when each of them is formed to extend into the
counterpart region thereof, that it is difficult to form the liquid
crystal layer 86 only in the reflective region P of the liquid
crystal display element 80, that the thickness of the liquid
crystal layer 86 is preferably almost the same between the
reflective region P and the transmissive region Q, and that
underlying layers thereof are required to have substantially the
same height. Therefore, it is believed that the cathode electrode
94 for the organic EL display element 90, and the transparent
insulating layer 95 formed on the surface thereof be also formed in
the reflective region P of the liquid crystal display element
80.
[0006] However, with such a composite display apparatus, there are
problems that the organic EL display element 90 has a short life
and that the performance thereof, such as output, tends to
deteriorate within a short time. An intensive investigation by the
present inventors examining the cause of the problems has revealed
that, while the insulating layer 95 formed of an inorganic layer
such as tantalum pentoxide is formed on the outermost surface of
the organic EL display element 90 to prevent the infiltration of
moisture, there is insufficiency in preventing the infiltration of
moisture.
[0007] To solve such problems, an object of the present invention
is to provide a composite display apparatus comprising a liquid
crystal display element and an organic EL display element, wherein
the composite display apparatus has a structure in which a light
emitting element such as the organic EL display element is
independent from the liquid crystal display element, and, even
more, only a portion in the vicinity of the light emitting element
is completely sealed by an inorganic layer, which structure is
capable of surely shutting out the infiltration of moisture and
oxygen into a cathode electrode and a light emitting layer of the
light emitting element.
Means to Solve the Problem
[0008] A display apparatus according to an embodiment of the
present invention comprises a TFT substrate in which an insulating
layer is formed on a driving element; a liquid crystal layer
containing a liquid crystal composition; an opposing substrate
comprising a transparent electrode opposing the TFT substrate via
the liquid crystal layer; and a polarizing plate provided on a
surface of the opposing substrate, the surface being opposite to a
surface opposing the liquid crystal layer, wherein the display
apparatus comprises a plurality of pixels in a display region, each
of the plurality of pixels comprising a first region and a second
region, the first region and the second region being adjacent to
each other; the first region comprises a reflection electrode above
the insulating layer of the TFT substrate; the second region
comprises a light emitting element, in which a first electrode, a
light emitting layer, and a second electrode are deposited on the
insulating layer of the TFT substrate; at least in the second
region, a first surface facing the opposing substrate of the
insulating layer is formed of a first inorganic insulating film and
a metal film provided by joining to a surface facing the opposing
substrate of the first inorganic insulating film, the metal film
being connected to a TFT; the light emitting element comprises an
encapsulating layer at least comprising a second inorganic
insulating film covering the entirety of each light emitting region
of the display apparatus; and an end portion of the encapsulating
layer is joined to the insulating layer to cause the light emitting
layer and the second electrode to be sealed by the first inorganic
insulating film of the insulating layer and the second inorganic
insulating film of the encapsulating layer.
Effects of the Invention
[0009] According to an embodiment of the present invention, second
electrode and light emitting layer portions of a light emitting
element are sealed by joining of each inorganic layer of the
encapsulating layer formed of a second inorganic insulating film,
and a first surface comprising an inorganic layer which is formed
of the first inorganic insulating film and the metal film being
embedded in a contact hole of the insulating layer and being joined
on the upper surface of the first inorganic insulating film.
Therefore, the infiltration of moisture and oxygen into the light
emitting layer and the second electrode of the light emitting
element is completely prevented, improving the reliability of the
light emitting element.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] FIG. 1A is a cross-sectional view illustrating a display
apparatus according to an embodiment of the present invention.
[0011] FIG. 1B is an enlarged view to explain that a portion of a
light emitting element in FIG. 1A is completely sealed by an
inorganic layer.
[0012] FIG. 1C is an explanatory view showing a variation of an
encapsulating layer in FIG. 1B.
[0013] FIG. 1D is an explanatory view showing another variation of
the encapsulating layer in FIG. 1B.
[0014] FIG. 2 is an equivalent circuit diagram of TFTs and wirings
formed in a TFT substrate in FIG. 1.
[0015] FIG. 3A is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0016] FIG. 3B is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0017] FIG. 3C is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0018] FIG. 3D is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0019] FIG. 3E is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0020] FIG. 3F is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0021] FIG. 3G is a cross-sectional view illustrating a
manufacturing process of the display apparatus illustrated in FIG.
1.
[0022] FIG. 4A is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0023] FIG. 4B is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0024] FIG. 4C is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0025] FIG. 4D is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0026] FIG. 4E is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0027] FIG. 4F is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0028] FIG. 4G is a plan view illustrating a manufacturing process
of the display apparatus illustrated in FIG. 1.
[0029] FIG. 5 is a cross-sectional view illustrating a conventional
composite display apparatus combining a liquid crystal display
element and an organic EL display element.
EMBODIMENT FOR CARRYING OUT THE INVENTION
[0030] Next, a display apparatus according to a first embodiment of
the present invention will be described in detail with reference to
the drawings. FIG. 1A is a schematic cross-sectional view of a
part, corresponding to one pixel, of the display apparatus
according to the embodiment. FIG. 1B is a view to explain a light
emitting element sealing structure in FIG. 1A. FIG. 2 illustrates
an equivalent circuit of a driving element portion in FIG. 1A.
FIGS. 3A to 3G and FIGS. 4A to 4G are cross-sectional views and
plan views, each illustrating a manufacturing process of the
display apparatus.
[0031] As illustrated in the cross-sectional views of FIGS. 1A and
1B, the display apparatus according to an embodiment of the present
invention comprises a TFT (driving element) 11 (see FIG. 2), a TFT
substrate 20 having an insulating layer 25 formed on the driving
element, a liquid crystal layer 32 containing a liquid crystal
composition, an opposing substrate 50 comprising a transparent
electrode 33, the opposing substrate 50 opposing the TFT substrate
20 via the liquid crystal layer 32, and a polarizing plate 34
provided on a surface of the opposing substrate 50, the surface
being opposite to a surface opposing the liquid crystal layer 32.
Then, the display apparatus comprises a plurality of pixels, each
of which comprises a first region R and a second region T being
adjacent to each other in a display region. A reflection electrode
31 is provided above the insulating layer 25 of the TFT substrate
20 in the first region R. A light emitting element 40 in which a
first electrode 41, a light emitting layer 43, and a second
electrode 44 are deposited on the insulating layer 25 of the TFT
substrate 20 is provided in the second region T. At least in the
second region T, a first surface facing the opposing substrate 50
of the insulating layer 25 is formed of a first inorganic
insulating film 25b and a metal film (contacts 41a, 41, 18c2) which
is connected to the TFT 11 (see FIG. 2) and TFTs 12, 13, and is
provided such that it is joined to a surface facing the opposing
substrate 50 of the first inorganic insulating film 25b, and the
light emitting element 40 comprises an encapsulating layer 45
formed of a second inorganic insulating film covering the entirety
of each of light emitting regions of the display apparatus, and
joining of an end portion of the encapsulating layer 45 to the
first inorganic insulating film 25b causes the light emitting layer
43 and the second electrode 44 to be sealed. While the light
emitting element 40 has a particularly great advantageous effect in
a case of an organic EL display element, it is construed to be not
limited thereto, so that it can comprise a quantum dot LED (QLED),
a micro LED, and an inorganic LED. In the explanations below, the
light emitting element 40 can also be used to mean the organic EL
display element. Moreover, the light emitting layer 43 not only
comprises a layer to emit light, but also layers above and below
the layer to promote light emission.
[0032] Here, "sealing" means sealing such that there is no room for
gas and liquid being harmful to the light emitting layer and the
second electrode, such as moisture and oxygen, to infiltrate
thereinto. Specifically, according to the present embodiment, the
light emitting element 40 is sealed by joining the encapsulating
layer 45b to a first surface of inorganic films which is formed of
a first inorganic insulating film 25b of the insulating layer 25
and metal films (contacts) 41a, 41, 18c2 joined on the first
inorganic insulating film 25b, the metal films filling a contact
hole formed in the first inorganic insulating film 25b, or, in
other words, the first surface of the insulating layer 25 facing
the opposing substrate 50. Thereby, it prevents the light emitting
layer 43 and the second electrode 44 from deteriorating due to
moister or the like. Therefore, it is preferable that a through
hole such as a contact hole be not formed in an inorganic film to
cover the light emitting element 40 as a matter of course and also
a contact hole completed in an inside of a region being sealed by
joined inorganic films, is not present. This is because, when a
contact hole (42c in FIG. 1A, for example) is formed above an upper
surface (a first surface) of the insulating layer 25, in a case
that the light emitting layer 43 is formed, the light emitting
layer 43 deteriorates due to moister or the like at the time of
forming the contact hole 42c, and, even when the contact hole 42c
is formed before the light emitting layer 43 is formed, moisture at
the time of forming thereof can remain therein. Moreover, the end
portion means a portion to be joined to the insulating layer 25,
such as the peripheral edge of the encapsulating layer 45.
[0033] In other words, as an enlarged view of a portion of the
light emitting element 40 in FIG. 1A is shown in FIG. 1B, for
example, the insulating layer 25 is formed of deposited films being
an organic insulating film 25a and the first inorganic insulating
film 25b, for example, and an upper surface thereof is formed of
the first inorganic insulating film 25b. Then, the present
embodiment is characterized in that the light emitting element 40
is formed on the upper surface of the insulating layer 25, on the
upper surface (a surface facing the opposing substrate 50) of which
insulating layer 25 is formed the first inorganic insulating film
25b such as Si.sub.3N.sub.4, and also that an end portion of the
encapsulating layer 45 to be formed in the surrounding thereof is
joined to the first inorganic insulating film 25b. The
encapsulating layer 45 is formed by CVD, plasma CVD, or sputtering,
and, even more, is formed in a very close contact without gaps as
long as the underlying layer thereof is an inorganic film such as
Si.sub.3N.sub.4, the inorganic film being of the same type. Even
more, the metal films 41a (41), 18c2 are embedded in contact holes
25c2, 25c3 to penetrate through the first inorganic insulating film
25b, and the peripheral edge thereof is joined to the first
inorganic insulating film 25b. Therefore, the light emitting
element 40 is sealed by the joined inorganic films 45, 25b, 41,
18c2. An organic insulating film being present in a part of the
sealed film makes it easy for moister or the like to be absorbed
and, even when it is joined to an inorganic film, makes it easy for
moister or the like to infiltrate through the interface thereof or
the interior of the organic insulating film. However, the inorganic
film is formed by CVD as described previously, so that no
absorption of moister or the like occurs, and, moreover, the
interface is also surely joined in close contact, making it
possible to surely shut out the infiltration of moister or the
like. The above-mentioned inorganic film is construed to be not
limited to an inorganic insulating film and a metal film also has
the same property as the inorganic insulating film, so that, by
being surrounded by the metal film and the inorganic insulating
film, the light emitting element 40 enclosed therein greatly
improves in reliability.
[0034] As described previously, the present inventors have found
that, with the conventional display apparatus illustrated in FIG.
5, the organic light emitting layer 93 deteriorates due to the
infiltration of moisture despite the transparent insulating layer
95 formed of the inorganic film being formed on the surface
thereof. Then, as a result of further intensive investigations, the
present inventors have found that, with the conventional structure
illustrated in FIG. 5, the infiltration of moisture occurs in a
process for forming a contact 85a to connect the reflection
electrode (pixel electrode) 85 of the liquid crystal display
element 80 and the drain of the TFT 82 for the liquid crystal
display element 80. In other words, forming the contact 85a
requires forming a contact hole penetrating through both the
transparent insulating layer 95 and the cathode electrode 94.
Therefore, it has been found that, in the process for forming the
contact hole, the infiltration of moisture occurs, and the moisture
reaches the organic light emitting layer 93 to cause the organic
light emitting layer 93 to deteriorate. In particular, while Mg--Ag
having light transmitting properties is a representative material
to be used for the cathode electrode 94, the present inventors have
found that the cathode electrode 94 of the organic EL display
element 90 is easily corroded by moisture irrespective of whether
the material is Mg--Ag, and the corrosion generated at the time of
forming the contact hole spreads over the entire layer of the
cathode electrode 94 and causes deterioration of the organic light
emitting layer 93.
[0035] Then, the present inventors have studied the structure in
which, even when the light emitting element 40 is an element
vulnerable to moister or the like, such as an organic EL display
element, it is completely sealed from moister or the like, and have
come up with the above-described configuration. In the display
apparatus according to the present embodiment, a reflective liquid
crystal display element 30 is formed in the first region R of one
pixel and the light emitting element 40 such as the organic EL
display element, for example, is formed in the second region T
adjacent to the first region R of one pixel. The first region R and
second region T are adjacent to each other in a plan view and do
not overlap with respect to the vertical relationship in the
direction perpendicular to the plane. The reflective liquid crystal
display element 30 comprises the reflection electrode 31, the
liquid crystal layer 32, the transparent electrode 33, and the
polarizing plate 34. The liquid crystal layer 32, the opposing
substrate 50 comprising the transparent electrode 33, and the
polarizing plate 34 are formed in the entirety of the display
apparatus, extending into second region T. Moreover, the light
emitting element 40 comprises the first electrode 41, a second
insulating layer 42 to define a light emitting region, the second
insulating layer 42 being referred to as a so-called insulating
bank, the light emitting layer 43, the second electrode 44, and the
encapsulating layer 45 to cover the surrounding thereof.
[0036] While the second insulating layer 42 is also formed on the
insulating layer 25 in the first region R with the same material
and to almost the same thickness, it is separated from the second
insulating layer 42 in the second region T, which second insulating
layer is referred to as the so-called insulating bank, so that the
second insulating layer 42 in the first region R is called a third
insulating layer 42a. According to the present embodiment, the
encapsulating layer 45 of the light emitting element 40 covers the
light emitting layer 43 (organic light emitting layer) and the
second electrode 44 in a case of the organic EL display element
such that it encloses the light emitting layer 43 (organic light
emitting layer) and the second electrode 44 to cause the end
portion thereof to be joined to the first surface of the insulating
layer 25. As at least the first surface (upper surface) of the
insulating layer 25 is formed by the first inorganic insulating
film 25b, the encapsulating layer 45 being formed of a second
inorganic insulating film is a joining between inorganic films.
[0037] While the configuration of the light emitting element 40
will be described in detail below, according to the present
embodiment, as shown in FIGS. 1A and 1B, the second electrode (a
cathode electrode) 44 of the light emitting element 40 is covered
together with the light emitting layer 43 by the encapsulating
layer (TFE; Thin Film Encapsulation) 45 being formed in an upper
layer of the light emitting element 40 in the second region T. Even
more, as described previously, the end portion of the encapsulating
layer 45 is joined to the first inorganic insulating film 25b being
an upper surface of the insulating layer 25. The metal films 41a
(41), 18c2 are embedded in the first inorganic insulating film 25b,
which metal films 41a (41), 18c2 are embedded in the contact holes
25c2, 25c3 being formed in the insulating layer 25, and each of the
peripheral edges of the metal films 41a (41), 18c2 is joined to the
upper surface of the first inorganic insulating film 25b of the
insulating layer 25. As a result, the light emitting layer 43 and
the second electrode 44 of the light emitting element 40 are
completely sealed by the first surface of the insulating layer 25,
which is formed of the first inorganic insulating film 25b and the
metal films 41a (41), 18c2, and the encapsulating layer 45. As
described previously, joining between the encapsulating layer 45
and the first inorganic insulating film 25b, and joining between
the first inorganic insulating film 25b and the metal films 41a
(41), 18c2 are each joining between inorganic films, so that they
are adequately joined to be able to endure sealing.
[0038] As described previously, as sealing means sealing to be able
to completely block the infiltration of moister or the like, it is
preferable that a contact hole to penetrate through an inorganic
film to cover the light emitting element 40 be not formed as a
matter of course, and also a contact hole not penetrating through
the inorganic film to cover the light emitting element 40 but being
completed in the interior thereof is not present. In other words,
when the encapsulating layer 45 is formed so as to seal in a drain
third contact 13d3 to be connected to the reflection electrode 31
of the first region R shown in FIG. 1A, for example, even when the
light emitting layer 43 of the light emitting element 40 is sealed
in by the encapsulating layer 45 and the first inorganic insulating
film 25b, there is a risk of harming the light emitting layer 43 at
the time of forming a contact hole 42c for the drain third contact
13d3 to be connected to the reflection electrode 31. Even when the
contact hole 42c is formed before forming the light emitting layer
43, moister or the like easily remains therein.
[0039] As shown in FIGS. 1A and 1B, preferably, the second
electrode 44 is formed such that it surrounds the surrounding of
the second insulating layer (insulating bank) 42 and, moreover, on
the outer surface thereof, the encapsulating layer 45 is formed
such that it covers the second electrode 44, and the end portion
thereof is joined to the first inorganic insulating film 25b of the
insulating layer 25. The light emitting layer 43 and the second
electrode 44 being needed for protection can be sealed in with a
minimum space, making it possible to improve the reliability of the
light emitting element 40. In other words, when the insulating
layer 25 being formed of only organic insulating films and the end
portion of the encapsulating layer 45 being sealed in by being
joined with a substrate 21, for example, the insulating layer 25
formed of the organic insulating films, the TFT 12 comprising a
contact, and a cathode bus line (wiring) 18 are enclosed at the
interior thereof, and a source contact 12s1 of the TFT 12, a
cathode first contact 18c1 of the cathode bus line 18, and the
cathode bus line 18 are also contained therein, thereby moisture or
the like at the time of forming the contact holes can remain
therein, so that the infiltration thereof into the light emitting
layer 43 can be of concern. However, according to the embodiment,
the light emitting element 40 is sealed in by an upper surface of
the insulating layer 25 on which the first electrode 41 of the
light emitting element 40 is formed, and the encapsulating layer 45
to be formed on the second electrode 44, so that above-mentioned
gas source is not enclosed therein. As a result, only the light
emitting element 40 comprising the light emitting layer 43 and the
second electrode 44 is sealed in by only inorganic films. Moreover,
the counterpart to which the end portion of the encapsulating layer
45 is joined is an upper surface of the insulating layer 25, on
which the first electrode 41 of the light emitting element 40 is
formed, so that etching to expose a joining surface to join the
encapsulating layer 45 is also very easy.
[0040] To configure the upper surface of the insulating layer 25 to
be the first inorganic insulating film 25b, as shown in FIGS. 1A
and 1B, for example, the insulating layer 25 is preferably
configured to have a two-layer structure being the organic
insulating film 25a and the first inorganic insulating film 25b.
This is because configuring it to have such a structure causes the
surface of the TFT substrate 20 whose surface due to forming of
TFTs is uneven to be planarized by the organic insulating film 25a,
so that the first inorganic insulating film 25b such as
Si.sub.3N.sub.4 can be formed on the surface of the organic
insulating film 25a by CVD, plasma CVD, or sputtering. As a result,
planarizing of a surface can be easily carried out by a liquid
organic insulating material and it can be carried out in a shorter
time than carrying out planarizing by only the first inorganic
insulating film 25b. In this case, the thickness of the organic
insulating film 25a is approximately greater than or equal to 2
.mu.m and less than or equal to 4 .mu.m, while the thickness of the
first inorganic insulating film 25b is approximately greater than
or equal to 200 nm and less than or equal to 1000 nm. As forming of
the organic insulating film 25a is carried out by applying and
hardening of a liquid resin, even a thick film is formed in a short
time, so that the insulating layer 25 whose surface is planarized
in a very short time can be formed.
[0041] However, the insulating layer 25 is construed to be not
limited to having a deposition structure of the organic insulating
film 25a and the first inorganic insulating film 25b. It can be
comprised of only an inorganic insulating film being formed by SOG
or CVD, for example, or it can be formed by a combination of at
least three layers. In essence, it suffices that an inorganic
insulating film be formed on an upper surface. In a case that the
first inorganic insulating film 25b is formed on an upper surface
of the organic insulating film 25a, as described previously, the
first inorganic insulating film 25b is formed by plasma CVD, so
that it can also adhere firmly to the organic insulating film 25a.
Moreover, as the first inorganic insulating film 25b is formed to
the thickness of greater than or equal to 200 nm and leas than or
equal to 1000 nm, an adequate barrier effect is demonstrated,
making it possible to prevent the infiltration, toward the light
emitting element 40, of even moister or the like passing through
the organic insulating film 25a to infiltrate therein.
[0042] As described previously, it is preferable that the thickness
of the liquid crystal layer 32 be not so different between the
first region R and the second region T. Then, as illustrated in
FIG. 1A, at the time of forming the second insulating layer 42
defining the light emitting region of the light emitting element
40, an insulating layer formed of the same material as that of the
second insulating layer 42 is also formed in the first region R.
However, according to the example illustrated in FIG. 1A, the
second insulating layer 42 is also formed in the first region R and
then split at a boundary portion between the first region R and the
second region T, and a groove is formed therebetween, so that the
first surface (the upper surface) of the insulating layer 25 is
exposed in the groove. Each of an end portion of the encapsulating
layer 45 and an end portion of the reflecting electrode 31 is
joined to the above-mentioned exposed first surface of the
insulating layer 25. As a result, the encapsulating layer 45
completely contains therein also the second insulating layer 42 to
seal the light emitting element 40. A layer located at the first
region R end, the layer being formed of the same material as that
of the second insulating layer 42, is referred to as the third
insulating layer 42a. In this way, forming the third insulating
layer 42a also in the first region R can bring the height of the
lower layer of the liquid crystal layer 32 to close between the two
regions R and T (strictly speaking, there is a difference of
approximately 1 .mu.m in the thickness of the encapsulating layer
45), while exposing the insulating layer 25 by splitting the second
insulating layer 42 to form the third insulating layer 42a, and can
facilitate the joining between the encapsulating layer 45 and the
insulating layer 25. As a result, the encapsulating layer 45 can
easily seal the light emitting layer 43 and the second electrode
44. The boundary between the second insulating layer 42 and the
third insulating layer 42a is construed to be not limited to the
boundary portion between the first region R and the second region
T. As described previously, the splitting can be carried out
anywhere as long as the portion where a contact hole 42c for the
drain third contact 13d3 to connect to the reflection electrode 31,
for example, is formed is positioned to be at the third insulating
layer 42a end, for example.
[0043] (TFT Substrate 20)
[0044] In the TFT substrate 20, on a surface of an insulation
substrate 21 formed of a glass substrate, or a resin film such as
polyimide, for example, are formed TFTs such as a driving TFT (thin
film transistor; hereinafter, simply referred to as a TFT) 11, a
current supplying TFT 12, and a switching TFT 13 (see FIG. 2) and
wirings such as bus lines, and is formed the insulating layer 25 to
planarize the surface thereof, the insulating layer 25 being
referred to as a so-called planarizing film. The insulating layer
25 is preferably formed of an organic material such as polyimide,
because it is aimed at planarizing the surface by eliminating
unevenness between a portion where the TFT is formed and a portion
where the TFT is not formed. However, as described previously,
taking into account joining to the encapsulating layer 45 for
sealing, having the first inorganic insulating film 25b is needed
on an upper surface of the insulating layer 25, the upper surface
being a surface to join to at least the encapsulating layer 45.
Therefore, in the example shown in FIGS. 1A and 1B, the insulating
layer 25 is formed by a composite layer of the organic insulating
film 25a and the first inorganic insulating film 25b. As described
previously, the insulating layer 25 can be formed of only an
inorganic material. In a case that the insulating layer 25 is
formed of an inorganic material such as SiO.sub.2 or SiN.sub.x
according to CVD, the thickness required for planarizing is several
.mu.m, so that the layer forming time increases. However,
planarizing can easily be carried out by spin-on-glass (SOG). In
the view illustrated in FIG. 1A, the element structure is
conceptually shown, and not all the respective elements are
precisely described.
[0045] In a case that the insulating layer 25 is formed of the
organic insulating film 25a and the first inorganic insulating film
25b, the organic insulating film 25a is easily formed to the
thickness of several .mu.m by applying and hardening a liquid resin
such as a polyimide resin or an acrylic resin. A method of applying
can be applying by dispensing, spin coating, or printing. For the
first inorganic insulating film 25b, silicon oxide SiO.sub.2,
silicon nitride SiN.sub.x, alumina Al.sub.2O.sub.3, or tantalum
peroxide Ta.sub.2O.sub.5 can be formed to the thickness of greater
than or equal to 200 nm and less than or equal to 1000 nm by plasma
CVD or sputtering. When the above-mentioned thickness is less than
200 nm, it is highly likely that the barrier property of moister or
the like be not adequately demonstrated. Moreover, while bringing
it to the thickness being greater than 1000 nm does not cause the
barrier property to further improve, film stress increases, causing
warping of a substrate. As a result, a likelihood of the
characteristics of the drive circuit or the light emitting element
40 deteriorating can occur.
[0046] As shown in FIG. 1A, on the upper surface of the insulating
layer 25, a drain second contact 13d2 to connect to a drain first
contact 13d1 connected to a drain 13d of the TFT 13 is formed in
the first region R. Moreover, in the second region T, an electrode
contact 41a connected to the source contact 12s1 connected to a
source 12s of the TFT 12 and a cathode second contact 18c2
connected to the cathode first contact 18c1 connected to the
cathode bus line 18 are formed. With respect to these contacts
13d2, 41a, 18c2, each of contact holes 25c1, 25c2, 25c3 is formed
in the insulating layer 25, and, thereafter, they are formed of a
metal film in which a metal such as titanium/aluminum/titanium is
embedded in the contact holes 25c1, 25c2, 25c3 by sputtering or
electrical soldering. As described below, the electrode contact 41a
and the first electrode 41 can be formed using the same material,
or can be formed using different materials. Therefore, in a case of
the same material, a boundary thereof is not present.
[0047] On the other hand, the contact holes 25c1, 25c2, 25c3 are
formed, before the light emitting layer 43 and the second electrode
44 of the light emitting element 40 are formed, so that the contact
holes 25c1, 25c2, 25c3 can be subjected to etching. Even more, as
described previously, a metal film to be embedded in the contact
holes 25c1, 25c2, 25c3 is an inorganic film, so that it is joined
to the first inorganic insulating film 25b on an upper surface of
the insulating layer 25 with excellent adhesive strength.
Therefore, even when moisture remains in the contact holes 25c1,
25c2, 25c3, it never leaches out onto the upper surface of the
first inorganic insulating film 25b of the insulating layer 25. In
other words, the upper surface of the insulating layer 25 is sealed
by the first inorganic insulating film 25b, and the metal films 41a
(41), 18c2 being contacts.
[0048] A circuit for driving the liquid crystal display element 30
and the light emitting element 40 has a configuration as shown in
an equivalent circuit diagram in FIG. 2, for example. In other
words, the driving TFT 11 has the gate thereof connected to a gate
bus line 16, and applying a gate signal (a selection signal) to the
gate bus line 16 makes it possible to select a row of pixels
aligned horizontally. Moreover, the driving TFT 11 has the source
thereof connected to a source bus line 15, so that a data signal
can be input to a column of pixels aligned vertically. Then, the
circuit is configured to be capable of displaying only a pixel
positioned on a crossing point of the gate bus line 16 to which the
selection signal is provided and the source bus line 15 to which
the data signal is provided based on the provided data signal. The
driving TFT 11 has the drain thereof connected to the gate of the
current supplying TFT 12 to control current flowing in the light
emitting element 40 in correspondence with display information.
Furthermore, the drain of the driving TFT 11 is connected, via the
switching TFT 13, to the liquid crystal layer 32 and an auxiliary
capacitance 14 for the liquid crystal. In FIG. 2, a capacitor and a
resistor are connected in parallel with each other to constitute an
equivalent circuit, as an electrical expression of the liquid
crystal layer 32. The auxiliary capacitance 14 connected in
parallel with the liquid crystal layer 32 is formed such that it
holds the voltage of the reflection electrode 31 at the time of
active matrix display scanning.
[0049] A second gate bus line 19 is connected to the gate of the
switching TFT 13 to control ON/OFF of the operation of the
switching TFT 13. The switching TFT 13 has the source thereof
connected to the drain of the driving TFT 11 and the gate of the
current supplying TFT 12. The current supplying TFT 12 has the
drain thereof connected to a current bus line 17 and the source
thereof connected to an anode electrode of the light emitting
element 40. The cathode electrode 44 of the light emitting element
40 is connected to the cathode bus line 18 at a contact H (18c1,
18c2).
[0050] The switching TFT 13 is provided to switch between
displaying by the liquid crystal display element 30 and displaying
by the light emitting element 40. In other words, when a pixel is
selected by the driving TFT 11 and the switching TFT 13 is turned
on in response to a signal given to the second gate bus line 19
connected to the gate of the switching TFT 13, the source bus line
15 is connected to the liquid crystal layer 32 and an image is
displayed by the liquid crystal display element 30. In a case that
the switching TFT 13 in an ON state, the current bus line 17 is
turned off to prevent current from flowing through the current
supplying TFT 12. In a case that the driving TFT 11 is selected and
the switching TFT 13 is turned off, the driving TFT 11 is not
connected to the liquid crystal layer 32, and turning on the
current supplying TFT 12 causes the light emitting element 40 to
display an image.
[0051] The switching TFT 13 is provided to enable each of the
liquid crystal display element 30 and the light emitting element 40
to be independently driven. In other words, the light emitting
element 40 often has a wide color reproduction range of 100% in
NTSC ratio. However, the reflective liquid crystal display element
30 is often designed to be capable of having a narrow color
reproduction range to realize brighter displaying. Therefore,
simultaneously displaying the liquid crystal display element 30 and
the light emitting display element 40 causes displaying of the
light emitting element 40 to be hindered. Therefore, the liquid
crystal display element 30 is configured to be not operated at the
time of operation of the light emitting element 40.
[0052] (Liquid Crystal Display Element 30)
[0053] The liquid crystal display element 30 is formed as a
reflective liquid crystal display element constituted by the
reflection electrode 31, the liquid crystal layer 32, a counter
electrode 33, and the polarizing plate 34, which are formed on the
entire surface of the first region R occupying approximately a half
of one pixel. Forming the liquid crystal layer 32 only in the first
region R is difficult, so that the liquid crystal layer 32 and the
counter electrode 33 are formed on the entire surface of the first
region R and the second region T. According to the example
illustrated in FIG. 1A, a color filter 35 is formed between an
insulation substrate 51 of the opposing substrate 50 and the
counter electrode 33. Although not illustrated, a liquid crystal
alignment layer is formed on a surface of the opposing substrate
50, the surface being in contact with the liquid crystal layer
32.
[0054] The reflection electrode 31 is a so-called pixel electrode
formed on substantially the entire surface of the first region R.
The reflection electrode 31 is formed on the third insulating layer
42a at the first region R end simultaneously with and using the
same material as that for the second insulating layer 42 to be an
insulation bank to define the light emitting region of the light
emitting element 40 in each pixel of the light emitting element 40
to be described below. The reflection electrode 31 is connected to
a drain 13d of the previously-described switching TFT 13 via the
drain first contact 13d1, the drain second contact 13d2 formed in
the insulating layer 25, and the drain third contact 13d3 formed in
the third insulating layer 42a. The reflection electrode 31 is
formed as deposited layers constituted by, for example, an aluminum
(Al) layer having a thickness being greater than or equal to 0.05
.mu.m and less than or equal to 0.2 .mu.m and an indium zinc oxide
(IZO) layer having a thickness being greater than or equal to 0.01
.mu.m and less than or equal 0.05 .mu.m.
[0055] The liquid crystal layer 32 contains the liquid crystal
composition containing a desired liquid crystal material, and, for
the liquid crystal layer 32, a liquid crystal material applicable
to various display modes such as the electrically controlled
birefringence (ECB) mode, for example, can be used. A guest/host
type liquid crystal material can be used in a case that displaying
is carried out without providing any polarizing plate. The liquid
crystal layer 32 and the polarizing plate 34 cooperatively block or
pass an incoming light, for each pixel, in accordance with voltage
ON/OFF between both electrodes of the reflection electrode 31 and
the counter electrode 33. In the ECB mode, the liquid crystal layer
32 is preferably formed to a thickness capable of causing a phase
difference of quarter wavelength, at the timing of voltage on,
before the light passes through the liquid crystal layer 32 to
reach the reflection electrode 31. Liquid crystal alignment layers
(not illustrated) are formed on both surfaces facing the liquid
crystal layer 32, or, in other words, on an outermost surface of
the TFT substrate 20, the outermost surface facing the liquid
crystal layer 32, and an outermost surface of the opposing
substrate 50, the outermost surface facing the liquid crystal layer
32. The liquid crystal alignment layer regulates alignment of
liquid crystal molecules, and the direction of alignment can be
regulated by ultraviolet light irradiation or rubbing
processing.
[0056] While the liquid crystal alignment layer controls the
alignment of the liquid crystal layer, it is controlled such that
liquid crystal molecules are aligned vertically in a state where no
voltage is applied to both surfaces of the liquid crystal layer 32,
for example. Such a control can realize black displaying, namely,
normally black, while preventing reflected light of external light
from exiting in a state where a voltage being greater than or equal
to a threshold is not applied between the reflection electrode 31
and the counter electrode 33 as described in detail below. In this
case, in the TFT substrate 20 since the organic EL display element
40 is formed under the liquid crystal alignment layer, it is
difficult to carry out the rubbing processing or ultraviolet light
irradiation. Therefore, a pretilt angle (gradient) is not formed,
and substantially vertical alignment can be realized. However, it
is preferable to form a pretilt angle of between 80.degree. and
89.9.degree. in the liquid crystal alignment layer at the opposing
substrate 50 end. Forming the pretilt angle as mentioned above
enables liquid crystal molecules around the center primarily in the
cell thickness direction to easily shift into horizontal alignment
when a voltage is applied between both electrodes.
[0057] According to the example illustrated in FIG. 1A, for the
polarizing plate 34, a circularly polarizing plate is used. The
circularly polarizing plate is formed by combining a linearly
polarizing plate and a quarter-wavelength retardation plate.
Furthermore, a half-wavelength plate can also be used in
combination to demonstrate quarter-wavelength conditions in a wider
range of wavelengths. The retardation plate is composed of a
uniaxially stretched optical film. Light having passed through the
linearly polarizing plate is, for example, a right polarized light
having a phase of a linearly polarized light shifted by a quarter
wavelength using the retardation plate. As described previously, if
a voltage being greater than or equal to the threshold is not
applied between the reflection electrode 31 and the counter
electrode 33 provided on both surfaces of the liquid crystal layer
32, and the liquid crystal layer 32 is vertical aligned, external
light will directly pass through the liquid crystal layer 32 and
will be reflected by the reflection electrode 31, thereby causing
the polarized light to change from a right circularly polarized
light to a left circularly polarized light. Accordingly, the
external light returning to the circularly polarizing plate 34 by
reversing the incoming direction becomes a linearly polarized light
having an angle orthogonal to the transmission axis of the linearly
polarizing plate and unable to pass through the polarizing plate
34, thereby realizing black displaying. On the other hand, when a
voltage being greater than or equal to the threshold is applied to
the electrodes on both surfaces of the liquid crystal layer 32, the
liquid crystal molecules are aligned horizontally and the phase of
the external light is further shifted by a quarter wavelength in
the liquid crystal layer 32. Therefore, when reaching the
reflection electrode 31, the external light has a phase difference
of a half wavelength and is reflected as a linearly polarized
light. The reflected external light advances along a path opposite
to the incoming direction, so that it passes through the polarizing
plate to realize white displaying. The polarizing plate 34 is not
limited to the circularly polarizing plate, so that a linearly
polarizing plate can be employable depending on the display
mode.
[0058] As described previously, the counter electrode 33 is an
electrode common to all pixels to selectively apply a voltage to
each pixel of the liquid crystal layer 32. Therefore, the counter
electrode 33 is formed on the entire surface of a display screen,
and is also formed in the second region T in which the light
emitting element 40 as described below is formed. Since the counter
electrode 33 is required to transmit light, it is formed of a
translucent (transparent) conductive layer, such as indium tin
oxide (ITO) or indium zinc oxide (IZO), for example.
[0059] (Light Emitting Element)
[0060] While various light emitting elements can be applied for the
light emitting element 40 as described previously, in a case of an
organic EL display element in particular, the light emitting layer
43 and the second electrode thereof is likely to be infiltrated
with moisture, so that the advantageous effect of the present
embodiment is great. Therefore, as the light emitting element 40,
an example of the organic EL display element will be described. The
light emitting element 40 is formed in the second region T of one
pixel, and, as illustrated in FIG. 1A, comprises the first
electrode 41 formed on the upper surface of the insulating layer 25
in the second region T, the second insulating layer 42 formed
around the first electrode 41, the light emitting layer 43 (organic
light emitting layer) formed on the first electrode (anode
electrode) 41 surrounded by the second insulating layer 42, the
second electrode (cathode electrode) 44 formed on substantially the
entire surface of the light emitting element 40 thereon, and the
encapsulating layer 45 to cover the surrounding thereof. The
encapsulating layer 45 is formed by a second inorganic insulating
film formed of one layer or a plurality of layers.
[0061] The first electrode 41 is, for example, formed as the anode
electrode. As illustrated in FIG. 1A, the first electrode 41 is
simultaneously formed in a continuous manner with the electrode
contact 41a. However, it can be formed using a material being
different from that of the electrode contact 41a. In a case of
forming using the different material, preferably, the first
electrode 41 is formed to cover the electrode contact 41a and the
peripheral edge thereof is joined to the upper surface of the
insulating layer 25. In a case of the present embodiment, since the
display screen is viewed from the upper end of FIG. 1A, the first
electrode 41 is formed as a reflection electrode and has a
structure to advance all emitted lights upward. Therefore, the
material of the first electrode 41 is selected from light
reflective materials in consideration of the work function
relationship with respect to the light emitting layer 43 being in
contact with the electrode 41. For example, the first electrode 41
can be formed of deposited layers of ITO/Ag or APC/ITO in which the
surface and the bottommost layers are an ITO layer and Ag or APC is
sandwiched therebetween. The ITO layer is also an inorganic layer,
so that it can be handled equivalently to the metal film. Ag or APC
is formed to the thickness of approximately 100 nm. In a case of
the bottom emission type, the ITO layer is formed to the thickness
of from 300 nm to 1 .mu.m.
[0062] The second insulating layer 42, which is also referred to as
an insulation bank or a partition wall, is formed in such a way as
to define the light emitting region of the light emitting element
40 and prevent the anode electrode 41 and the cathode electrode 44
from contacting and conducting with each other. The light emitting
layer 43 is deposited on the first electrode 41 surrounded by the
second insulating layer 42. For example, the second insulating
layer 42 is formed of a resin material, such as polyimide or an
acrylic resin. As described previously, the second insulating layer
42 is also formed in the first region R of the liquid crystal
display element 30 to equalize the height between the first region
R and the second region T. In other words, a liquid resin is
applied on the entire surface and subsequently patterned to form
the second insulating layer 42 around the first electrode 41 of the
light emitting display element 40 and to form the third insulating
layer 42a in the first region R. There is also no likelihood of
moisture remaining when the patterning uses dry etching. At this
time, by splitting an insulating layer into the second insulating
layer 42 at the light emitting element 40 end and the third
insulating layer 42a at the liquid crystal display element 30 end,
the insulating layer 25 can be exposed in a groove to be formed
therebetween. Such an arrangement is convenient for completely
covering and sealing the organic light emitting layer (light
emitting layer 43) and the second electrode (cathode electrode) 44
of the organic EL display element (light emitting element 40) with
the encapsulating layer 45. As described previously, the splitting
location does not necessarily have to be the boundary between the
first region R and the second region T, so that it can be any
position as long as the second insulating layer 42 does not include
the contact hole.
[0063] The light emitting layer 43 is deposited on the exposed
first electrode 41 surrounded by the second insulating layer 42.
Although the light emitting layer 43 is illustrated as a single
layer in FIG. 1A, it can be formed by a plurality of layers with
various materials being deposited. Moreover, the light emitting
layer 43 is vulnerable to moisture and it is infeasible to carry
out the patterning after forming it on the entire surface.
Therefore, a vapor-deposition mask is usable for selectively
vapor-depositing the evaporated or sublimated organic material only
on necessary portions to form the light emitting layer 43.
[0064] More specifically, a hole-injection layer formed of a
material excellent in matching of ionization energy can be provided
as a layer in contact with the first electrode (anode electrode)
41, for example, which layer is to improve hole-injection
properties. A hole-transporting layer capable of improving the
stable transportation of holes and enabling electron confinement
(energy barrier) into the light emitting layer is formed on the
hole-injection layer by using, for example, an amine-based
material. Moreover, a light emitting layer to be selected in
accordance with the light emitting wavelength is formed thereon,
for example, by Alq.sub.3 being doped with a red or green organic
fluorescent material for red or green color. Furthermore, a
DSA-based organic material is used as a blue-based material. On the
other hand, in a case of carrying out the coloring by using the
color filter 35, forming the light emitting layer with the same
material as that for other color pixels is feasible without doping.
An electron-transporting layer to further improve the electron
injection properties and to transport electrons stably is formed,
by using Alq.sub.3, on the light emitting layer. These
multi-deposited layers, each having a thickness of several tens of
nanometers, form a deposited light emitting layer 43. In some
cases, an electron-injection layer to improve the electron
injection properties, such as LiF or Liq, can be provided between
the light emitting layer 43 and the second electrode 44. According
to the present embodiment, the light emitting layer 43 can comprise
each of the light emitting layers and inorganic layers.
[0065] As described previously, in the deposited light emitting
layer 43, the light emitting layers, each of which is formed of a
material corresponding to each color of R, G, and B, can be
deposited. According to the example illustrated in FIG. 1A, the
light emitting layers are formed of the same organic material, and
the color filter 35 specifies the color of light emitted. Moreover,
if the light emission performance is emphasized, it is preferable
that the hole-transporting layer and the electron-transporting
layer be separately deposited using different materials suitable
for the light emitting layer. However, in consideration of material
costs, the light emitting layers, each of which is formed of the
same material being common to two or three colors of R, G, and B
can be deposited.
[0066] After the deposited light emitting layer 43 comprising the
electron-injection layer such as a LiF layer is formed, the second
electrode 44 is formed on the surface thereof. More specifically,
the second electrode (e.g., cathode electrode) 44 is formed on the
light emitting layer 43. While the second electrode 44 can also be
formed to extend into the first region R in a manner similar to the
previously-described bank layer, it is to be formed to extend only
to the location in which the contact hole is not formed and, even
more, it is needed to be completely covered with the encapsulating
layer 45. This is because the second electrode 44 is formed of a
translucent material such as a thin-film Mg--Ag eutectic film and
is easily corroded by moisture.
[0067] The encapsulating layer 45 being formed of an inorganic
insulating material such as Si.sub.3N.sub.4 or SiO.sub.2, for
example, is formed as a single film or two or more films on the
surface of the second electrode 44. For example, it is preferably
formed in approximately two deposited films, each film having a
thickness of approximately from 0.01 .mu.m to 1.0 .mu.m. While the
encapsulating layer 45 can be a single film using an inorganic
insulating film, forming in a plurality of films is preferable,
because even if some pinholes are formed in each of the plurality
of films of the encapsulating layer, locations of the pinholes
seldom match with each other completely, so that the encapsulating
layer 45 is completely blocked from outer air. The encapsulating
layer 45 can be formed not in a plurality of films comprising only
the inorganic insulating films, but in a three-layer structure
having interposed an organic film between the inorganic insulating
films.
[0068] In other words, as shown in FIG. 1C, the encapsulating layer
45 can be configured by forming an organic film 45b on a second
inorganic insulating film 45a and further formed thereon a third
inorganic insulating film 45c being extremely thin. While the
elasticity is eliminated when the encapsulating layer 45 increases
in thickness with only inorganic films, an organic film being
interposed causes the elasticity to increase, resulting in the
encapsulating layer 45 being excellent in flexibility, and the
reliability to improve. To obtain flexibility, the third inorganic
insulating film 45c is preferably thinner. The organic film 45b
does not necessarily need to be continuously formed on the upper
portion of the second inorganic insulating film 45a being formed on
the light emitting element 40, and it can be formed such that it is
present locally here and there. The end portion of the third
inorganic insulating film 45c is also preferably joined to the
first inorganic insulating film 25b which is the upper surface of
the insulating layer 25 as shown in FIG. 3D. In this joining,
joining in close contact is carried out by depositing the second
inorganic insulating film 45a or the third inorganic insulating
film 45c on the encapsulating layer 45 being the upper surface of
the insulating layer 25 at the time it is formed by plasma CVD. In
this way, as described previously, the encapsulating layer 45 is
formed such that it completely seals the light emitting layer 43
and the second electrode 44.
[0069] The light emitting element 40 is formed in according with
the above. As illustrated in FIG. 1A, the liquid crystal layer 32
and the counter electrode 33 are formed also on the light emitting
element 40. This is because it is difficult to form the liquid
crystal layer 32 only in the first region R as described
previously. And, with respect to an electrode, only the counter
electrode is present, and no electrode corresponding to the
reflection electrode (pixel electrode) 31 is present. Therefore,
the situation is the same as the previously-described case in which
the voltage applied to both surfaces of the liquid crystal layer 32
is OFF. In other words, while it is normally black with respect to
external light, as the liquid crystal layer 32 is aligned
vertically, which effect is the same as that in a case that the
liquid crystal layer 32 is not present, so that the light emitted
by the light emitting element 40 passes through the circularly
polarizing plate 34 without causing any change. Then, the light
passing through the circularly polarizing plate 34 can be visually
recognized as it is, so that an image displayed by light emission
of the light emitting element 40 can be visually recognized
directly from the front.
[0070] The light emitted from the light emitting element 40 is
attenuated by the circularly polarizing plate 34 to approximately a
half level by passing therethrough. However, the circularly
polarizing plate 34 is preferably formed also in the second region
T. The reason is that, in a case external light enters from the
front, the first electrode 41 of the light emitting element 40 is
formed of the light reflective material as described previously, so
that it becomes very difficult to see the display screen when the
light incoming from the front is reflected by the first electrode
41 in the light emitting element 40 to exit the light emitting
element 40. However, in a case that the circularly polarizing plate
34 is present, when the light is reflected by the first electrode
41 as described previously, the rotational direction of the
circularly polarized light is reversed, so that the reflected light
cannot pass through the circularly polarizing plate. As a result,
the reflected light can be cut off. While the light emitting
element 40 is not operated when the amount of external light is
large, the reflected light occurs irrespective of the
presence/absence of the operation of the light emitting element 40
even when the liquid crystal display element 30 is in operation, so
that, even when the liquid crystal display element is in operation,
the visual recognition characteristics of the liquid crystal
display element will deteriorate substantially unless the
circularly polarizing plate 34 is present in the second region
T.
[0071] (Opposing Substrate)
[0072] With respect to the opposing substrate 50, the color filter
35 and the counter electrode 33 are formed on a substrate such as
glass or a transparent (translucent) film, for example. While there
are various methods to color the display screen in the liquid
crystal display element 30, the color filter 35 can be provided,
for each pixel, to form a color pixel of one of three primary
colors, red (R), green (G), and blue (B). While a color filter can
be used to realize color displaying even at the light emitting
element 40 end, as described previously, in a case that the
material of the light emitting layer is selected to directly emit
light of red (R), green (G), or blue (B), no color filter is
necessary. Although not illustrated in the drawing, a liquid
crystal alignment layer is formed on a surface of the opposing
substrate 50, the surface facing the liquid crystal layer 32, and
rubbing processing is carried out.
[0073] The opposing substrate 50 is bonded to the TFT substrate 20,
in which TFT substrate 20 the light emitting element 40 is formed,
with a surrounding sealing agent layer (not illustrated), while
keeping a predetermined gap therebetween so that the reflection
electrode 31 and the counter electrode 33 oppose each other. Then,
injecting the liquid crystal composition into the gap causes the
previously-described liquid crystal layer 32 to be formed. Then,
the previously-described circularly polarizing plate 34 is provided
on a surface of the opposing substrate 50, the surface being
opposite to the liquid crystal layer 32.
[0074] (Method for Manufacturing TFT Substrate and Light Emitting
Element)
[0075] Next, processes for manufacturing the TFT substrate 20 and
the light emitting element 40 to be formed thereon will be
described in detail below with reference to FIGS. 3A to 3G and
FIGS. 4A to 4G.
[0076] First, as illustrated in FIG. 3A, a semiconductor layer 22
and the cathode bus line 18 are formed on the insulation substrate
21, and a gate insulating layer 23 formed of SiO.sub.2 is formed
thereon. Then, predetermined regions of the semiconductor layer 22
are doped with impurities to form each of a source 13s and the
drain 13d (see FIG. 1A) of the switching TFT 13 and a drain 12d and
the source 12s (see FIG. 1A) of the current supplying TFT 12. Then,
a gate electrode 13g of the switching TFT 13, a gate electrode 12g
of the current supplying TFT 12, and an electrode 14d of the
auxiliary capacitance 14 are formed on the surface of the gate
insulating layer 23. Then, a passivation layer 24 formed of
SiN.sub.x is fat med on the surface thereof. Then, a source contact
13s1 and the drain first contact 13d1 of the switching TFT 13, a
source contact 12s1 and a drain contact 12d1 of the current
supplying TFT 12, and the cathode first contact 18c1 are formed and
the insulating layer 25 to planarize the surface thereof is formed
by a plurality of films being the organic insulating film 25a
formed of polyimide, for example, and the first inorganic
insulating film 25b formed of SiN.sub.x. As described previously,
the insulating layer 25 can be formed of one inorganic film such as
SOG. FIG. 4A is a plan view illustrating an arrangement of the TFTs
and bus lines.
[0077] Next, as illustrated in FIG. 3B, to connect to the drain 13d
(see FIG. 1A) of the switching TFT 13, the drain second contact
13d2 is formed in the insulating layer 25 to be connected to the
drain first contact 13d1. Then, each of the electrode contact 41a
to connect to the source contact 12s1 and the first electrode 41 of
the light emitting element 40, and the cathode second contact 18c2
to connect to the cathode first contact 18c1 is formed in the
insulating layer 25. These contacts are joined to the upper surface
of the insulating layer 25 by forming contact holes 25c1, 25c2,
25c3 in the insulating layer 25 and embedding therein a metal film
using plating or the like, on the surface thereof, a flange portion
to be joined to the upper surface of the insulating layer 25. At
least the peripheral edge of these metal films can be joined to the
first inorganic insulating film 25b on the upper surface of the
insulating layer 25 to seal the upper portion thereof. While the
drain second contact 13d2 for liquid crystal is formed by forming
the contact hole 25c1 and embedding therein an electrically
conducting layer such as copper, the first electrode (anode
electrode) for the light emitting element 40 is related to the
light emitting layer 43 as described previously and can be formed
of deposited films of ITO/APC(Ag--Pd--Cu alloy)/ITO. FIG. 4B is a
plan view illustrating this step.
[0078] Next, as illustrated in FIG. 3C, the second insulating layer
42 is formed using polyimide, or an acrylic resin. The second
insulating layer 42 has the role of dividing each pixel of the
light emitting element 40 and is therefore formed in such a way as
to have a protruding portion surrounding the first electrode 41.
The second insulating layer 42 is formed using the
previously-described resin. Accordingly, a liquid resin film is
formed on the entire surface and subsequently it is patterned in a
desired shape at a desired position. According to the present
embodiment, the liquid resin film is applied on the entire surface
of the TFT substrate 20 to have a thickness comparable to the
height of the protruding portion being formed around the first
electrode 41, and the patterning is carried out in such a way as to
expose the first electrode 41 and a boundary between the second
insulating layer 42 and the third insulating layer 42a. At this
time, although the third insulating layer 42a is also formed in the
first region R, the second insulating layer 42 and the third
insulating layer 42a are separated from each other such that at
least the drain second contact 13d2 to be connected to the pixel
electrode 31 is located in the third insulating layer 42a at the
first region R, so that the insulating layer 25 is exposed between
the separated insulating layers 42 and 42a. As described
previously, this is to make it possible for the encapsulating layer
45 to be formed thereon to completely cover the light emitting
layer 43 and the second electrode 44 of the light emitting element
40.
[0079] At the time of patterning of the second insulating layer 42,
a contact hole (not illustrated) to connect to the drain first
contact 13d1 of the first region R is formed and the drain third
contact 13d3 is formed. As a result, with respect to the second
insulating layer 42 and the third insulating layer 42a, as shown in
FIG. 4C, for example, the second insulating layer 42 is formed in
the surrounding of the first electrode 41, and, in the outer
periphery thereof, the third insulating layer 42a is formed in
separation from the second insulating layer 42. Then, the drain
third contact 13d3 connected to the drain of the driving TFT 11 is
exposed at a part of the third insulating layer 42a.
[0080] Subsequently, as illustrated in FIGS. 3D and 4D, the light
emitting layer 43 is formed. The light emitting layer 43 is
vulnerable to moisture and oxygen and the patterning is
unemployable, so that a vapor-deposition mask is used to
vapor-deposit only a required region. In other words, the
vapor-deposition mask is arranged in alignment with a location
being on the protruding portion of the second insulating layer 42
illustrated in FIG. 3D, and a sublimated or vaporized organic
material from a crucible is deposited only onto the first electrode
41 surrounded by the second insulating layer 42. As described
previously, the organic material is deposited using various
materials.
[0081] Next, as illustrated in FIGS. 3E and 4E, the second
electrode 44 to be a cathode electrode is formed on substantially
the entire surface of the light emitting element 40, including the
light emitting layer 43 and the protruding portion of the second
insulating layer 42. The second electrode 44 uses, for example, an
Mg--Ag alloy and is formed by vapor deposition using a
vapor-deposition mask. While the second electrode 44 is formed such
that the second insulating layer 42 remains in the surrounding
thereof as shown in the plan view in FIG. 4E, it is formed such
that a part thereof extends beyond the second insulating layer 42.
Even in this case, the second electrode 44 is formed such that
there is a predetermined gap between the second electrode 44 and
the third insulating layer 42a (in other words, the insulating
layer 25 is exposed).
[0082] Subsequently, as illustrated in FIGS. 3F and 4F, the
encapsulating layer 45 is formed. The encapsulating layer 45 is a
layer to protect the light emitting layer 43 from moisture and
oxygen and is formed of an inorganic film such as SiN.sub.x or
SiO.sub.2. Even more, pinholes can be formed in the film at the
time of forming the film, so that it is preferable to form the
encapsulating layer 45 as multiple films constituted by at least
two films. The encapsulating layer 45 is formed by CVD or atomic
layer deposition (ALD). The encapsulating layer 45 can be deposited
in multiple films using different materials. While the
encapsulating layer 45 is formed on the light emitting element 40
as illustrated in FIG. 4F, for example, it can be formed to extend
toward the liquid crystal display element 30 being the first
region. In this case, the encapsulating layer 45 needs to not
extend across the drain third contact 13d3. When the encapsulating
layer 45 is formed on the drain third contact 13d3, a need arises
to form, in the encapsulating layer 45, a through hole for the
contact. This is because forming the contact hole in the
encapsulating layer 45 induces the infiltration of moisture therein
and the moisture advances toward the second electrode 44 and the
light emitting layer 43 along an inner surface of the encapsulating
layer 45.
[0083] The encapsulating layer 45 can be formed on the entire
surface and then patterned by etching. This is because the
encapsulating layer 45 is joined to the insulating layer 25,
preventing the infiltration of moisture. However, the encapsulating
layer 45 can be deposited only at a desired location using a mask.
The latter is preferable from the viewpoint of preventing the
infiltration of moisture.
[0084] Subsequently, as illustrated in FIGS. 3G and 4G, the
reflection electrode (pixel electrode) 31 for the liquid crystal
display element 30 is formed on the surface of the third insulating
layer 42a in the first region R. As a result, the reflection
electrode 31 is connected to the drain third contact 13d3 also
electrically. The reflection electrode 31 is formed of Al and IZO,
for example. The reflection electrode 31 is also formed on
substantially the entire surface of one pixel, except for the
entire surface of the light emitting element 40. Even in this case,
a reflection layer formed on the entire surface by vapor deposition
can be formed by patterning. This is because the light emitting
layer 43 is completely covered by the encapsulating layer 45.
However, the reflection electrode 31 can be formed in only a
desired region by covering the desired region with a mask. In this
way, devices at the TFT substrate 20 end in the first region R and
the second region T are formed. Subsequently, although not
illustrated, a liquid crystal alignment layer is formed on the
entire surface thereof.
[0085] On the other hand, at the opposing substrate 50 end, as
illustrated in FIG. 1A, the translucent counter electrode 33 is
formed on the insulation substrate 51 such as a glass plate or a
resin film and, as needed, the color filter 35 or a liquid crystal
alignment layer (not illustrated) is formed such that it overlaps
the translucent counter electrode 33. The polarizing plate 34 is
provided on a surface of the insulation substrate 51, the surface
being opposite to the counter electrode 33. In a case that the
polarizing plate 34 is a circularly polarizing plate, a
quarter-wavelength retardation plate is arranged at the insulating
substrate end and a linearly polarizing plate is arranged such that
it overlaps the quarter-wavelength retardation plate.
[0086] Then, the TFT substrate 20, on which the light emitting
element 40 or the like is formed, and the opposing substrate 50 are
bonded to each other with a sealing agent layer at surrounding
thereof, while keeping a predetermined gap therebetween so that
both electrodes thereof oppose each other. Thereafter, the liquid
crystal composition is injected into the gap to cause the liquid
crystal layer 32 to be formed. As a result, the reflective liquid
crystal display element 30 is formed in the first region where the
reflection electrode 31 is formed and the light emitting element 40
is formed in the second region T to obtain a display apparatus
comprising one pixel.
[0087] (Operation of Display Apparatus)
[0088] In the display apparatus, when external light is bright, the
switching TFT 13 is operated in response to a signal sent to the
second gate bus line 19 and the driving TFT 11 is selected in
response to both the selection signal supplied to the gate bus line
16 and the data signal supplied to the source bus line 15, thereby
causing the liquid crystal display element 30 in the first region R
to display an image according to the data signal supplied to the
source bus line 15. On the other hand, at night, or in a dark
location such as indoors, no signal is supplied to the second gate
bus line 19 and the switching TFT 13 is turned off. At the same
time, the current bus line 17 is connected and, in a case that the
driving TFT 11 selects this pixel, the current supplying TFT 12 is
turned on to control lighting of the light emitting element 40 in
response to the data signal supplied to the source bus line 15,
thereby controlling lighting of the light emitting element 40, and
an image is displayed on the entire screen.
[0089] As described above, the display apparatus according to the
present embodiment can operate as a reflective liquid crystal
display element in a case that external light is sufficient, such
as during the daytime, and displays an image by using a light
emitting element having relatively small electric power consumption
when the external light is insufficient. As a result, a display
apparatus having a very small electric power consumption and less
battery consumption is obtained. Therefore, the display apparatus
according to the present embodiment can be conveniently used as
portable equipment units such as a mobile telephone and a personal
digital assistant (PDA).
[0090] Usually, the area available for displaying is approximately
80% of the entire display area, as it excludes spaces between
pixels. In a case of forming the light emitting layer using vapor
deposition, the area of the light emitting layer 43 (inner to the
second insulating layer 42) needs to be brought to approximately
less than or equal to 30%, so that the remaining 50% is available
as the reflection display region R. In this case, while the
reflectance of the reflection display portion is approximately 8%,
the luminance of the reflection display portion is brought to be
800 cd/m.sup.2 when the illuminance of external light is 30,000 lux
(cloudy sky), making it possible to realize sufficiently bright
displaying.
[0091] The luminance of the light emitting element 40 is, normally,
approximately 500 cd/m, for the reason that visibility under
external light can be assured. According to the present embodiment,
owing to the effect of the reflection display portion, there is no
need to obtain such a high luminance. Moreover, there is also an
advantage that a selection of a light emitting material can be
carried out with an emphasis on reliability rather than
luminance.
CONCLUSION
[0092] (1) A display apparatus according to an embodiment of the
present invention comprises:
[0093] a TFT substrate in which an insulating layer is formed on a
driving element;
[0094] a liquid crystal layer containing a liquid crystal
composition;
[0095] an opposing substrate comprising a transparent electrode
opposing the TFT substrate via the liquid crystal layer; and
[0096] a polarizing plate provided on a surface of the opposing
substrate, the surface being opposite to a surface opposing the
liquid crystal layer,
[0097] wherein the display apparatus comprises a plurality of
pixels in a display region, each of the plurality of pixels
comprising a first region and a second region, the first region and
the second region being adjacent to each other;
[0098] the first region comprises a reflection electrode above the
insulating layer of the TFT substrate;
[0099] the second region comprises a light emitting element, in
which a first electrode, a light emitting layer, and a second
electrode are deposited on the insulating layer of the TFT
substrate;
[0100] at least in the second region, a first surface facing the
opposing substrate of the insulating layer is formed of a first
inorganic insulating film and a metal film provided by joining to a
surface facing the opposing substrate of the first inorganic
insulating film, the metal film being connected to a TFT;
[0101] the light emitting element comprises an encapsulating layer
at least comprising a second inorganic insulating film covering the
entirety of each light emitting region of the display apparatus;
and
[0102] an end portion of the encapsulating layer is joined to the
insulating layer to cause the light emitting layer and the second
electrode to be sealed by the first inorganic insulating film of
the insulating layer and the second inorganic insulating film of
the encapsulating layer.
[0103] According to the present embodiment, an upper surface of the
insulating layer to planarize the surface of a TFT substrate is
formed of an inorganic insulating film, and on the upper surface an
end portion of the encapsulating layer is joined, so that the light
emitting layer and the second electrode of the light emitting
element comprising an organic EL display element is completely
sealed by the encapsulating layer and inorganic layers being formed
of the inorganic insulating film and the metal film being embedded
in a contact hole formed in the insulating layer. As the light
emitting element is formed on the insulating layer, it is sealed in
by only the inorganic films with a very small space. Therefore, the
infiltration of moister or the like can be prevented effectively,
so that the reliability of the light emitting element is
substantially improved.
[0104] (2) In a case that the light emitting element is an organic
EL display element, it is effective since an organic light emitting
layer of the organic EL display element is particularly vulnerable
to moister or the like.
[0105] (3) The encapsulating layer comprising deposited films
including a plurality of inorganic insulating films and an organic
film, and joining of each of the end portion of the second
inorganic insulating film and an end portion of a third inorganic
insulating film constituting the plurality of inorganic insulating
films to the first inorganic insulating film being performed,
thereby causing the light emitting layer and the second electrode
to be sealed, thereby it is possible to maintain elasticity while
surely carrying out sealing.
[0106] (4) A contact hole being not provided in a layer upper to
the insulating layer in the second region in which the light
emitting element is formed is preferable from the viewpoint of
improving the reliability of the light emitting element.
[0107] (5) The insulating layer comprising an organic insulating
film on a surface being opposite to the first surface of the first
inorganic insulating film is preferable in that it is easy to form
an upper surface of an insulating layer with an inorganic
insulating film while carrying out planarizing of a surface formed
with TFTs being dotted in a short time.
[0108] (6) The insulating layer can be formed only of the first
inorganic insulating film. When it is formed of SOG, for example,
the upper surface thereof can be configured to be an inorganic
insulating film while being able to carry out planarizing in a
short time.
[0109] (7) The display apparatus further comprising a second
insulating layer on the first surface of the TFT substrate, the
second insulating layer to partition the light emitting region of
the light emitting element, the second insulating layer being also
arranged in the first region on the insulating layer; and the first
inorganic insulating film and the second inorganic insulating film
are joined in a groove formed by splitting the second insulating
layer between the first region and the second region is preferable.
As a result, the height of the deposition structure can be
approximated between the first region and the second region while
the second insulating layer is separated from the first region end.
As a result, improvement in the performance of a liquid crystal
display element and a light emitting element and improvement in
reliability with respect to moister or the like is achieved.
[0110] (8) The display apparatus further comprising: a second
insulating layer on the first surface of the TFT substrate, the
second insulating layer to partition the light emitting region of
the light emitting element, the second insulating layer being also
arranged in the first region on the insulating layer; and an end
portion of the reflection electrode is joined to the first
inorganic insulating film in a groove formed by splitting the
second insulating layer between the first region and the second
region is preferable. The first region and the second region can
surely be split.
[0111] (9) The reflection electrode and the TFT being electrically
connected via a contact hole; and the contact hole being formed
outer to a joining portion of the first insulating film and the
second insulating film, the joining portion sealing the light
emitting layer and the second electrode of the light emitting
element, are preferable from the viewpoint of sealing a light
emitting element with only inorganic films.
[0112] (10) Preferably, a switching TFT to switch between
displaying in the first region and displaying in the second region
is formed on the TFT substrate. This is because each illumination
(displaying) is carried out without causing any interference.
[0113] (11) Preferably, the liquid crystal layer is aligned to
realize normally black, and the polarizing plate is formed of a
circularly polarizing plate and is also formed in the second
region. This is because the circularly polarizing plate can cut off
reflected light of external light in the second region.
[0114] (12) Preferably, the TFT substrate comprises a first liquid
crystal alignment layer on a surface opposing the liquid crystal
layer; the opposing substrate comprises a second liquid crystal
alignment layer on a surface opposing the liquid crystal layer; and
liquid crystal molecules of the liquid crystal layer are aligned
substantially vertically in a vicinity of the TFT substrate and
have a pretilt with respect to a surface of the opposing substrate.
This is because, in the case of normally black, light emission of
the light emitting element is not affected at all by the liquid
crystal layer intervening at the light emitting element end.
[0115] (13) Preferably, an angle of the pretilt is an angle from
80.degree. to 89.9.degree. with respect to the surface of the
opposing substrate. This is because the transition to the
horizontal alignment becomes smooth.
DESCRIPTION OF REFERENCE NUMERALS
[0116] 11 driving TFT [0117] 12 current supplying TFT [0118] 12s1
source contact (metal film) [0119] 13 switching TFT [0120] 18
cathode bus line [0121] 18c2 cathode second contact (metal film)
[0122] 20 TFT substrate [0123] 25 insulating layer (planarizing
film) [0124] 25a organic insulating film [0125] 25b first inorganic
insulating film [0126] 30 liquid crystal display element [0127] 31
reflection electrode (pixel electrode) [0128] 32 liquid crystal
layer [0129] 33 counter electrode [0130] 40 light emitting element
[0131] 41 first electrode (metal film) [0132] 41a electrode contact
(metal film) [0133] 42 second insulating layer [0134] 42a third
insulating layer [0135] 43 light emitting layer [0136] 44 second
electrode [0137] 45 encapsulating layer [0138] 45a second inorganic
insulating film [0139] 45b organic film [0140] 45c third inorganic
insulating film [0141] 50 opposing substrate [0142] R first region
[0143] T second region
* * * * *