U.S. patent application number 17/059783 was filed with the patent office on 2021-07-08 for anti-reflective film, polarizing plate, and display apparatus.
This patent application is currently assigned to LG CHEM, LTD.. The applicant listed for this patent is LG CHEM, LTD.. Invention is credited to Jinseok BYUN, Yeongrae CHANG, Dong Hyun KIM, So Young KIM, Kyung Moon KO, Jung Hyun SEO.
Application Number | 20210206935 17/059783 |
Document ID | / |
Family ID | 1000005505651 |
Filed Date | 2021-07-08 |
United States Patent
Application |
20210206935 |
Kind Code |
A1 |
BYUN; Jinseok ; et
al. |
July 8, 2021 |
ANTI-REFLECTIVE FILM, POLARIZING PLATE, AND DISPLAY APPARATUS
Abstract
The present invention relates to an anti-reflective film that
has a low reflectance deviation and a light transmittance
deviation, can simultaneously realize high scratch resistance and
anti-fouling property, and can increase screen sharpness of a
display apparatus, a polarizing plate and a display apparatus
comprising the same.
Inventors: |
BYUN; Jinseok; (Daejeon,
KR) ; KIM; So Young; (Daejeon, KR) ; SEO; Jung
Hyun; (Daejeon, KR) ; KIM; Dong Hyun;
(Daejeon, KR) ; KO; Kyung Moon; (Daejeon, KR)
; CHANG; Yeongrae; (Daejeon, KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
LG CHEM, LTD. |
Seoul |
|
KR |
|
|
Assignee: |
LG CHEM, LTD.
Seoul
KR
|
Family ID: |
1000005505651 |
Appl. No.: |
17/059783 |
Filed: |
October 17, 2019 |
PCT Filed: |
October 17, 2019 |
PCT NO: |
PCT/KR2019/013679 |
371 Date: |
November 30, 2020 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
G02B 5/305 20130101;
C08K 2201/011 20130101; C08K 3/36 20130101; C08G 18/673 20130101;
C08J 2367/02 20130101; B82Y 30/00 20130101; C08J 7/042 20130101;
G02B 1/14 20150115; G02B 1/12 20130101; C08J 7/046 20200101; C08G
77/045 20130101; C08L 25/14 20130101; C08J 5/18 20130101; C08J
2475/06 20130101; C08J 2483/04 20130101; C08K 7/22 20130101; C08G
18/7621 20130101 |
International
Class: |
C08J 7/046 20060101
C08J007/046; G02B 1/12 20060101 G02B001/12; G02B 1/14 20060101
G02B001/14; G02B 5/30 20060101 G02B005/30; C08J 5/18 20060101
C08J005/18; C08K 3/36 20060101 C08K003/36; C08J 7/04 20060101
C08J007/04; C08K 7/22 20060101 C08K007/22; C08G 77/04 20060101
C08G077/04; C08L 25/14 20060101 C08L025/14; C08G 18/67 20060101
C08G018/67; C08G 18/76 20060101 C08G018/76 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 17, 2018 |
KR |
10-2018-0123703 |
Oct 17, 2018 |
KR |
10-2018-0123704 |
Oct 17, 2019 |
KR |
10-2019-0128927 |
Oct 17, 2019 |
KR |
10-2019-0128928 |
Claims
1. An anti-reflective film comprising a low moisture permeable
polymer film; a hard coating layer; and a low refractive index
layer, wherein a first peak appears at 2.theta. value of greater
than or equal to 22 and less than or equal to 24.degree., and a
second peak at 2.theta. value of greater than 24 and less than or
equal to 27.degree., in reflection mode X-ray diffraction (XRD)
pattern.
2. The anti-reflective film according to claim 1, wherein a ratio
of the intensity of the first peak (P1) to the intensity of the
second peak (P2) is at least 0.4.
3. The anti-reflective film according to claim 1, wherein the low
refractive index layer comprises a binder resin, and inorganic fine
particles dispersed in the binder resin.
4. The anti-reflective film according to claim 3, wherein the
binder resin comprises (co)polymer of photopolymerizable
compounds.
5. The anti-reflective film according to claim 4, wherein the
binder resin further comprises crosslinked polymer of a
photopolymeriazble compound, a fluorine-containing compound
comprising a photoreactive functional group, and polysilsesquioxane
substituted with one or more reactive functional groups.
6. The anti-reflective film according to claim 5, wherein the
fluorine-containing compound comprising a photoreactive functional
group comprises one or more selected from the group consisting of
i) aliphatic compounds or alicyclic compounds substituted with one
or more photoreactive functional groups, in which at least one
carbon is substituted with one or more fluorine atoms; ii)
heteroaliphatic compounds or heteroalicyclic compounds substituted
with one or more photoreactive functional groups, in which at least
one hydrogen is replaced with fluorine, and at least one carbon is
replaced with silicon; iii) polydialkyl siloxane-based polymer
substituted with one or more photoreactive functional groups, in
which at least one silicon is substituted with one or more fluorine
atoms; and iv) polyether compounds substituted with one or more
photoreactive functional groups, in which at least one hydrogen is
replaced with fluorine.
7. The anti-reflective film according to claim 5, wherein the
reactive functional group substituted at polysilsesquioxane
includes one or more functional groups selected from the group
consisting of alcohol, amine, carboxylic acid, epoxide, imide,
(meth)acrylate, nitrile, norbornene, olefin, polyethyleneglycol,
thiol and vinyl groups.
8. The anti-reflective film according to claim 3, wherein the
inorganic fine particles include one or more selected from the
group consisting of solid inorganic nanoparticles having an average
diameter of 0.5 to 100 nm and hollow inorganic nanoparticles having
an average diameter of 1 to 200 nm.
9. The anti-reflective film according to claim 1, wherein the hard
coating layer comprises a binder resin comprising a photocurable
resin, and organic or inorganic fine particles dispersed in the
binder resin.
10. The anti-reflective film according to claim 9, wherein the
binder resin of the hard coating layer further comprises high
molecular weight (co)polymer having a number average molecular
weight of at least 10,000.
11. The anti-reflective film according to claim 1, wherein the low
moisture permeable polymer film has a thickness direction
retardation (Rth) of at least 5,000 nm as measured at a wavelength
of 400 nm to 800 nm, and a ratio of a tensile strength in one
direction to a tensile strength in a direction perpendicular to the
one direction, of at least 2, and wherein the tensile strength in a
direction perpendicular to the one direction is smaller than the
tensile strength in one direction.
12. The anti-reflective film according to claim 1, wherein the low
moisture permeable polymer film is a polyethylene terephthalate
film.
13. The anti-reflective film according to claim 1, wherein the
anti-reflective film has an average reflectance of 2.0% or less in
a wavelength region of 380 nm to 780 nm.
14. The anti-reflective film according to claim 1, wherein the
anti-reflective film has an average reflectance deviation of 0.2% p
or less, and a light transmittance deviation of 0.2% p or less.
15. A polarizing plate comprising the anti-reflective film
according to claim 1, and a polarizer.
16. A display apparatus comprising the anti-reflective film
according to claim 1.
Description
CROSS-REFERENCE TO RELATED APPLICATION(S)
[0001] This application is a 35 U.S.C. 371 National Phase Entry
Application from PCT/KR2019/013679 filed Oct. 17, 2019, which
claims the benefit of Korean Patent Application No. 10-2018-0123703
filed on Oct. 17, 2018, Korean Patent Application No.
10-2018-0123704 filed on Oct. 17, 2018, Korean Patent Application
No. 10-2019-0128927 filed on Oct. 17, 2019, and Korean Patent
Application No. 10-2019-0128928 filed on Oct. 17, 2019 with the
Korean Intellectual Property Office, the disclosures of which are
herein incorporated by reference in their entirety.
FIELD OF THE INVENTION
[0002] The present invention relates to an anti-reflective film, a
polarizing plate, and a display apparatus.
BACKGROUND OF THE INVENTION
[0003] In general, in flat panel display devices such as PDP, LCD,
etc., an anti-reflective film is installed so as to minimize the
reflection of incident light from the outside. Methods for
minimizing the reflection of light include a method of dispersing
filler such as inorganic fine particles, etc. in resin, coating it
on a substrate film, and forming unevenness (anti-glare: AG
coating); a method of using light interference by forming plural
layers having different refractive indexes on a substrate film
(anti-reflective; AR coating), or a method of using them together,
etc.
[0004] Among them, in the case of AG coating, although the absolute
amount of reflected light is equivalent to common hard coatings,
low reflection effect can be obtained by reducing the amount of
light entering the eyes using light scattering through unevenness.
However, since the AG coating has lowered screen sharpness due to
the surface unevenness, recently, many studies are being progressed
on AR coating.
[0005] As a film using the AR coating, those having a multi-layered
structure in which a hard coating layer (high refractive index
layer), low reflective index coating layer, etc. are stacked on a
light transmitting substrate film are being commercialized.
However, the existing anti-reflective film using AR coating has a
problem in that reflectance deviation and light transmittance
deviation are large according to the part of the film. And, since
the method of forming plural layers separately conducts the
processes of forming each layer, it has a disadvantage in that
scratch resistance is lowered due to weak interlayer adhesion
(interface adhesion).
[0006] And, previously, in order to improve scratch resistance of
the low refractive index layer included in the anti-reflective
film, a method of adding various particles of nanometer size (for
example, silica, alumina, zeolite, etc.) was mainly attempted.
However, in case nanometer-sized particles are used, it was
difficult to simultaneously increase scratch resistance while
lowering the reflectance of the low refractive layer, and due to
the nanometer-sized particles, the anti-fouling property of the
surface of the low refractive index layer was significantly
deteriorated.
[0007] Accordingly, in order to reduce the absolute reflection
amount of incident light from the outside, reduce reflectance
deviation and light transmittance deviation according to the part
of the film, and improve anti-fouling property as well as scratch
resistance of the surface, many studies are being progressed, but
the resulting property improvement degree is unsatisfactory.
BRIEF SUMMARY OF THE INVENTION
[0008] The present invention provides an anti-reflective film that
has low reflectance deviation and light transmittance deviation,
can simultaneously realize high scratch resistance and anti-fouling
property, and can increase screen sharpness of a display
apparatus.
[0009] The present invention also provides a polarizing plate
comprising the above anti-reflective film.
[0010] The present invention further provides a display apparatus
that comprises the above anti-reflective film and provides high
screen sharpness.
[0011] An anti-reflective film is provided herein, which comprises
a low moisture permeable polymer film; a hard coating layer; and a
low refractive index layer, wherein a first peak appears at
2.theta. value of 22 to 24.degree., and a second peak appears at
2.theta. value of 24 to 27.degree., in reflection mode X-ray
diffraction (XRD) pattern.
[0012] And, a polarizing plate comprising the above explained
anti-reflective film is also provided herein.
[0013] And, a display apparatus comprising the above explained
anti-reflective film is also provided herein.
DETAILED DESCRIPTION OF THE INVENTION
[0014] Hereinafter, an anti-reflective film, a polarizing plate and
a display apparatus according to specific embodiments of the
invention will be explained in more detail.
[0015] As used herein, the terms `first` and `second` are used to
explain various constructional elements, and the terms are used
only to distinguish one constructional element from the other
constructional element.
[0016] And, a low refractive index layer may mean a layer having
low refractive index, for example, a layer having refractive index
of about 1.2 to 1.8 at the wavelength of 550 nm.
[0017] And, for specific measured quantities x and y, when a y
value is recorded while changing an X value, a peak refers to an
area or a point where the maximum value (or extreme y value) of the
y value appears. The maximum value means the largest value in the
peripheral part, and the extreme value means a value where
instantaneous rate of change is 0.
[0018] And, hollow inorganic particles mean particles wherein an
empty space exists on the surface and/or inside of the inorganic
particles.
[0019] And, (meth)acryl includes both acryl and methacryl.
[0020] And, (co)polymer includes both copolymer and
homopolymer.
[0021] And, a fluorine-containing compound means a compound
comprising at least one fluorine atom in the compound.
[0022] As used herein, a photopolymerizable compound commonly
designates a polymer compound that is polymerized by the
irradiation of light, for example, by the irradiation of visible
rays or ultraviolet rays.
[0023] According to one embodiment of the invention, an
anti-reflective film comprising a low moisture permeable polymer
film; a hard coating layer; and a low refractive index layer,
wherein a first peak appears at 2.theta. value of 22 to 24.degree.,
and a second peak appears at 2.theta. value of 24 to 27.degree., in
reflection mode X-ray diffraction (XRD) pattern, is provided. The
present inventors progressed studies on an anti-reflective film,
confirmed through experiments that an anti-reflective film wherein
a first peak appears at 2.theta. value of 22 to 24.degree., and a
second peak appears at 2.theta. value of 24 to 27.degree. in
reflection mode X-ray diffraction (XRD) pattern, exhibits similar
reflectance and light transmittance throughout the whole
anti-reflective film, and thus, has small reflectance deviation and
light transmittance deviation, can simultaneously realize high
scratch resistance and anti-fouling property, and has screen
sharpness of a display apparatus, and completed the present
invention.
[0024] The anti-reflective film has small reflectance deviation and
light transmittance deviation throughout the whole film, and thus,
can increase screen sharpness of a display apparatus, and has
excellent scratch resistance and high anti-fouling property, and
thus, can be easily applied for the manufacturing process of a
display apparatus or a polarizing plate, and the like, without
specific limitations.
[0025] Specifically, the X-ray diffraction pattern can be
calculated using a reflection mode, among X-ray irradiation
modes.
[0026] In the reflection mode X-ray diffraction (XRD) pattern
obtained from the anti-reflective film according to one embodiment,
two or more peaks may appear.
[0027] Specifically, two peaks may appear at 2.theta. of 22 to
27.degree.. Among the two peaks appearing at 2.theta. of 22 to
27.degree., the peak appearing at relatively small 2.theta. is
defined as a first peak, and the peak appearing at relatively large
2.theta. is defined as a second peak. More specifically, the first
peak and the second peak may be distinguished based on
24.degree..
[0028] For specific example, a peak appearing at 2.theta. of 22 to
24.degree. is a first peak, and a peak appearing at 2.theta. of 24
to 27.degree. is a second peak.
[0029] In the anti-reflective film, each peak appears at 2.theta.
of 22 to 24.degree. and 2.theta. of 24 to 27.degree., and a ratio
of the intensity of the first peak (P1) to the intensity of the
second peak (P2) may be 0.4 or more, 0.45 to 2.5, or 0.5 to 2.
Thereby, similar reflectance and light transmittance may be
exhibited through the whole anti-reflective film, thus realizing an
anti-reflective film having low reflectance deviation and light
transmittance deviation, and having improved scratch resistance or
anti-fouling property.
[0030] Meanwhile, the incident angle (.theta.) means an angle made
by a crystal plane and X-ray, when X-ray is irradiated to a
specific crystal plane, and the diffraction peak means a point
where the first derivative (gradient of tangent line, dy/dx) is 0,
where the first derivative (gradient of tangent line, dy/dx) of the
y-axis of diffraction intensity to the x-axis of 2.theta. value
changes from positive to negative, as the x-axis of 2 times
(2.theta.) of the incident angle of entering X-ray increases in a
positive direction, in a graph wherein the x-axis of the x-y plane
is 2 times (2.theta.) of the incident angle of entering X-ray, and
the y-axis of x-y plane is diffraction intensity.
[0031] The 2.theta. values of the first peak and the second peak
may result from the crystalline state of polymer in the low
moisture permeable polymer film, and the ratio of the intensity of
the first peak (P1) to the intensity of the second peak (P2) may
result from the arrangement degree of polymer crystals in the low
moisture permeable polymer film.
[0032] Specifically, the crystalline state of polymer in the low
moisture permeable polymer film may be shown by peak generation in
reflection mode X-ray diffraction (XRD) pattern. More specifically,
a (100) crystal plane in the low moisture permeable polymer film
may be shown as the second peak at 2.theta. of 24 to 27.degree.,
and a (-110) crystal plane in the low moisture permeable polymer
film may be shown as the first peak at 2.theta. of 22 to
24.degree..
[0033] And, the arrangement degree of polymer crystals in the low
moisture permeable polymer film may be shown as a ratio of the
intensity of the first peak (P1) to the intensity of the second
peak (P2), and as the ratio is higher, the arrangement degree of
polymer crystals is higher, and thus, polymer crystals may be
evenly arranged in the low moisture permeable polymer film.
[0034] The low refractive index layer may comprise binder resin,
and inorganic nanoparticles dispersed in the binder resin.
[0035] Meanwhile, the binder resin may comprise (co)polymer of
photopolymerizable compounds. The photopolymerizable compound
forming the binder resin may include monomers or oligomers
comprising vinyl groups or (meth)acrylate. Specifically, the
photopolymerizable compound may include monomers or oligomers
comprising 1 or more, or 2 or more, or 3 or more vinyl groups or
(meth)acrylate.
[0036] As specific examples of the monomers or oligomers comprising
(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol
tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate,
dipentaerythritol hexa(meth)acrylate, tri pentaerythritol
hepta(meth)acrylate, trimethylolpropane tri(meth)acrylate,
trimethylolpropane polyethoxy tri(meth)acrylate, trimethylolpropane
trimethacrylate, ethyleneglycol dimethacrylate, butanediol
dimethacrylate, hexaethyl methacrylate, butyl methacrylate or
mixtures of two or more kinds thereof, or urethane modified
acrylate oligomer, epoxide acrylate oligomer, ether acrylate
oligomer, dendritic acrylate oligomer, or mixtures of two or more
kinds thereof may be mentioned. Wherein, the molecular weight of
the oligomer may be 1,000 to 10,000.
[0037] As specific examples of the monomers or oligomers comprising
vinyl groups, divinyl benzene, styrene or paramethyl styrene may be
mentioned.
[0038] Although the content of a part derived from the
photopolymerizable compounds in the binder resin is not
significantly limited, considering the mechanical properties of the
finally prepared low refractive index layer or anti-reflective
film, the content of the photopolymerizable compounds may be 10 wt
% to 80 wt %, 15 to 70 wt %, 20 to 60 wt %, or 30 to 50 wt %. If
the content of the photopolymerizable compounds is less than 10 wt
%, scratch resistance or anti-fouling property of the low
refractive index layer may be significantly deteriorated, and if it
exceeds 80 wt %, reflectance may increase.
[0039] Meanwhile, the binder resin may further comprise crosslinked
polymer of a photopolymeriazble compound, a fluorine-containing
compound comprising a photoreactive functional group, and
polysilsesquioxane substituted with one or more reactive functional
groups.
[0040] Due to the properties of the fluorine atom included in the
fluorine-containing compound comprising a photoreactive functional
group, the interaction energy of the anti-reflective film with
liquids or organic substances may be lowered, and thus, the amount
of pollutants transferred to the anti-reflective film may be
reduced, transferred pollutants may be prevented from remaining on
the surface, and pollutants themselves may be easily removed.
[0041] And, in the process of forming the low refractive index
layer and anti-reflective film, the reactive functional group
included in the fluorine-containing compound comprising a
photoreactive functional group may act as crosslink, thereby
increasing physical durability, scratch resistance and thermal
stability of the low refractive index layer and anti-reflective
film.
[0042] In the fluorine-containing compound comprising a
photoreactive functional group, one or more photoreactive
functional groups may be included or substituted, and the
photoreactive functional group means a functional group capable of
participating in a polymerization reaction by the irradiation of
light, for example, by the irradiation of visible rays or
ultraviolet rays. The photoreactive functional group may include
various functional groups capable of participating in a
polymerization reaction by the irradiation of light, and specific
examples thereof may include a (meth)acrylate group, an epoxide
group, a vinyl group or a thiol group.
[0043] The fluorine-containing compound comprising a photoreactive
functional group may have weight average molecular weight (weight
average molecular weight converted in terms of polystyrene,
measured by GPC) of 2,000 to 200,000, preferably 5,000 to
100,000.
[0044] If the weight average molecular weight of the
fluorine-containing compound comprising a photoreactive functional
group is too small, the fluorine-containing compounds may not be
uniformly and effectively arranged on the surface of the low
refractive index layer but be positioned inside, and thus, the
anti-fouling property of the surface of the low refractive index
layer and anti-reflective film may be deteriorated, and the
crosslinking density inside of the low refractive index layer and
anti-reflective film may be lowered, and thus, mechanical
properties such as overall strength or scratch resistance, and the
like may be deteriorated. And, if the weight average molecular
weight of the fluorine-containing compound comprising a
photoreactive functional group is too high, haze of the low
refractive index layer and anti-reflective film may increase, or
light transmittance may decrease, and the strength of the low
refractive index layer and anti-reflective film may be also
deteriorated.
[0045] Specifically, the fluorine-containing compound comprising a
photoreactive functional group may be one or more selected from the
group consisting of i) aliphatic compounds or alicyclic compounds
substituted with one or more photoreactive functional groups, in
which at least one carbon is substituted with one or more fluorine
atoms; ii) heteroaliphatic compounds or heteroalicyclic compounds
substituted with one or more photoreactive functional groups, in
which at least one hydrogen is substituted with fluorine, and at
least one carbon is substituted with silicon; iii) polydialkyl
siloxane-based polymer substituted with one or more photoreactive
functional groups, in which at least one silicon is substituted
with one or more fluorine atoms (for example,
polydimethylsiloxane-based polymer); iv) polyether compounds
substituted with one or more photoreactive functional groups, in
which at least one hydrogen is substituted with fluorine.
[0046] The binder resin included in the low refractive index layer
may comprise crosslinked polymer of a photopolymerizable compound
and a fluorine-containing compound comprising a photoreactive
functional group.
[0047] The crosslinked polymer may comprise, based on 100 parts by
weight of parts derived from the photopolymerizable compound, 1 to
300 parts by weight, 2 to 250 parts loll by weight, 3 to 200 parts
by weight, 5 to 190 parts by weight, or 10 to 180 parts by weight
of parts derived from the fluorine-containing compound comprising a
photoreactive functional group, The content of the
fluorine-containing compound comprising a photoreactive functional
group to the photopolymerizable compound is based on the total
content of the fluorine-containing compound comprising a
photoreactive functional group. If the fluorine-containing compound
comprising a photoreactive functional group is excessively added
compared to the photopolymerizable compound, the low refractive
index layer may not have sufficient durability or scratch
resistance. And, if the content of the fluorine-containing compound
comprising a photoreactive functional group compared to on the
photopolymerizable compound is too small, the low refractive index
layer may not have sufficient mechanical properties such as
anti-fouling property or scratch resistance, and the like.
[0048] The fluorine-containing compound comprising a photoreactive
functional group may further comprise silicon or a silicon
compound. Namely, the fluorine-containing compound comprising a
photoreactive functional group may optionally contain silicon or a
silicon compound inside, and specifically, the content of silicon
in the fluorine-containing compound comprising a photoreactive
functional group may be 0.1 to 20 wt %.
[0049] The content of silicon or a silicon compound included in the
fluorine-containing compound comprising a photoreactive functional
group may be confirmed by a commonly known analysis method, for
example, ICP [Inductively Coupled Plasma] analysis.
[0050] The silicon included in the fluorine-containing compound
comprising a photoreactive functional group may increase
compatibility with other components included in the low refractive
index layer, thereby preventing generation of haze in the finally
prepared low refractive index layer and increasing transparency,
and may improve slip property of the surface of the finally
prepared low refractive index layer or anti-reflective film to
increase scratch resistance.
[0051] Meanwhile, if the content of silicon in the
fluorine-containing compound comprising a photoreactive functional
group becomes too large, the low refractive index layer or
anti-reflective film may not have sufficient light transmittance or
anti-reflection performance, and anti-fouling property of the
surface may be also deteriorated.
[0052] Meanwhile, the polysilsesquioxane substituted with one or
more reactive functional groups may increase mechanical properties,
for example, scratch resistance of the low refractive index layer
due to the reactive functional groups existing on the surface, and
contrary to the case of using previously known fine particles such
as silica, alumina, zeolite, and the like, it may improve alkali
resistance of the low refractive index layer, and improve average
reflectance or appearance property such as color, and the like.
[0053] The polysilsesquioxane may be written as
(RSiO.sub.1.5).sub.n (wherein, n is 4 to 30 or 8 to 20), and it may
have various structures such as a random structure, a ladder type,
a cage and a partial cage, and the like. Preferably, in order to
increase the properties and quality of the low refractive index
layer and anti-reflective film, as the polysilsesquioxane
substituted with one or more reactive functional groups, polyhedral
oligomeric silsesquioxane of a cage structure substituted with one
or more reactive functional groups may be used.
[0054] And, more preferably, the polyhedral oligomeric
silsesquioxane of a cage structure substituted with one or more
reactive functional groups may comprise 8 to 20 silicon atoms in
the molecule.
[0055] And, at least one of the silicon of the polyhedral
oligomeric silsesquioxane of a cage structure may be substituted
with a reactive functional group, and the silicon not substituted
with a reactive functional group may be substituted with the
above-explained non-reactive functional groups.
[0056] Since at least one of the silicon atoms of the polyhedral
oligomeric silsesquioxane of a cage structure is substituted with a
reactive functional group, the mechanical properties of the low
refractive index layer and the binder resin may be improved, and
since remaining silicon atoms are substituted with non-reactive
functional groups, steric hindrance appears to significantly
decrease the frequency or probability of siloxane bonds (--Si--O--)
being exposed outside, thereby improving alkali resistance of the
low refractive index layer and the binder resin.
[0057] The reactive functional group substituted at
polysilsesquioxane may include one or more functional groups
selected from the group consisting of alcohol, amine, carboxylic
acid, epoxide, imide, (meth)acrylate, nitrile, norbornene, olefin
(allyl, cycloalkenyl or vinyldimethylsilyl, and the like),
polyethyleneglycol, thiol and vinyl groups, preferably, epoxide or
(meth)acrylate.
[0058] As specific examples of the reactive functional groups,
(meth)acrylate, C1-20 alkyl (meth)acrylate, C3-20 cycloalkyl
epoxide, C1-10 alkyl cycloalkane epoxide may be mentioned. The
alkyl (meth)acrylate means that another part of `alkyl` that is not
bonded with (meth)acrylate is a bonding position, the cycloalkyl
epoxide means that another part of `cycloalkyl` that is not bonded
with epoxide is a bonding position, and the alkyl cycloalkane
epoxide means that another part of `alkyl` that is not bonded with
cycloalkane epoxide is a bonding position.
[0059] Meanwhile, the polysilsesquioxane substituted with one or
more reactive functional groups may further comprise one or more
non-reactive functional groups selected from the group consisting
of a C1-20 linear or branched alkyl group, a C6-20 cyclohexyl group
and a C6-20 aryl group, in addition to the above explained reactive
functional groups. Since reactive functional groups and
non-reactive functional groups are substituted on the surface of
the polysilsesquioxane, in the polysilsesquioxane substituted with
one or more reactive functional groups, siloxane bonds (--Si--O--)
may be positioned inside of the molecule without being exposed
outside, thereby further increasing alkali resistance and scratch
resistance of the low refractive index layer and anti-reflective
film.
[0060] As examples of the polyhedral oligomeric silsesquioxane
(POSS) substituted with one or more reactive functional groups and
having a cage structure, POSS substituted with one or more alcohol
such as TMP diolIsobutyl POSS, cyclohexanediol isobutyl POSS,
1,2-propanediolIsobutyl POSS, octa(3-hydroxy-3
methylbutyldimethylsiloxy) POSS, and the like; POSS substituted
with one or more amine such as aminopropylIsobutyl POSS,
aminopropylIsooctyl POSS, aminoethylaminopropyl isobutyl POSS,
N-phenylaminopropyl POSS, N-methylaminopropyl isobutyl POSS,
octaAmmonium POSS, aminophenyl cyclohexyl POSS, aminophenyl
isobutyl POSS, and the like; POSS substituted with one or more
carboxylic acid such as maleamic acid-cyclohexyl POSS, maleamic
acid-isobutyl POSS, octa maleamic acid POSS, and the like; POSS
substituted with one or more epoxide such as epoxy cyclohexyl
isobutyl POSS, epoxy cyclohexyl POSS, glycidyl POSS, glycidylethyl
POSS, glycidylisobutyl POSS, glycidylisooctyl POSS, and the like;
POSS substituted with one or more imide such as POSS maleimide
cyclohexyl, POSS maleimide isobutyl, and the like; POSS substituted
with one or more (meth)acrylate such as acryloIsobutyl POSS,
(meth)acryl isobutyl POSS, (meth)acrylate cyclohexyl POSS,
(meth)acrylate isobutyl POSS, (meth)acrylate ethyl POSS,
(meth)acryl ethyl POSS, (meth)acrylate isooctyl POSS, (meth)acryl
isooctyl POSS, (meth)acryl phenyl POSS, (meth)acryl POSS, acrylo
POSS, and the like; POSS substituted with one or more nitrile
groups such as cyanopropylIsobutyl POSS, and the like; POSS
substituted with one or more norbornene groups such as norbornenyl
ethyl ethyl POSS, norbornenyl ethyl isobutyl POSS, norbornenyl
ethyl disilanoisobutyl POSS, trisnorbornenyl isobutyl POSS, and the
like; POSS substituted with one or more vinyl groups such as allyl
isobutyl POSS, monovinylisobutyl POSS,
octacyclohexenyldimethylsilyl POSS, octavinyldimethylsilyl POSS,
octavinyl POSS, and the like; POSS substituted with one or more
olefin such as allylisobutyl POSS, monovinylisobutyl POSS,
octacyclohexenyldimethylsilyl POSS, octavinyldimethylsilyl POSS,
octavinyl POSS, and the like; POSS substituted with C5-30 PEG; POSS
substituted with one or more thiol groups such as
mercaptopropylIsobutyl POSS or mercaptopropylIsooctyl POSS, and the
like, may be mentioned.
[0061] The crosslinked polymer of a photopolymeriazble compound, a
fluorine-containing compound comprising a photoreactive functional
group, and polysilsesquioxane substituted with one or more reactive
functional groups may comprise, based on 100 parts by weight of the
photopolymeriazble compound, 0.5 to 60 parts by weight, 1.5 to 45
parts by weight, 3 to 40 parts by weight, or 5 to 30 parts by
weight of the polysilsesquioxane substituted with one or more
reactive functional groups.
[0062] If the content of parts derived from the polysilsesquioxane
substituted with one or more reactive functional groups compared to
parts derived from the photopolymeriazble compound in the binder
resin is too small, it may be difficult to sufficiently secure
scratch resistance of the low refractive index layer. And, if the
content of parts derived from the polysilsesquioxane substituted
with one or more reactive functional groups compared to parts
derived from the photopolymeriazble compound in the binder resin is
too large, transparency of the low refractive index layer or
anti-reflective film may be deteriorated, and scratch resistance
may be deteriorated to the contrary.
[0063] Meanwhile, the inorganic fine particles mean inorganic
particles having nanometer or micrometer sized diameters.
[0064] Specifically, the inorganic fine particles may include solid
inorganic nanoparticles and/or hollow inorganic nanoparticles.
[0065] The solid inorganic nanoparticles mean particles having an
average diameter of 100 nm or less, inside of which an empty space
does not exist.
[0066] And, the hollow inorganic nanoparticles mean particles
having an average diameter of 200 nm or less, on the surface and/or
inside of which an empty space exists.
[0067] The solid inorganic nanoparticles may have an average
diameter of 0.5 to 100 nm, 1 to 80 nm, 2 to 70 nm or 5 to 60
nm.
[0068] The hollow inorganic nanoparticles may have an average
diameter of 1 to 200 nm, 10 to 150 nm, 20 to 130 nm, 30 to 110 nm
or 40 to 100 nm.
[0069] Meanwhile, each of the solid inorganic nanoparticles and the
hollow inorganic nanoparticles may include one or more reactive
functional groups selected from the group consisting of a
(meth)acrylate group, an epoxide group, a vinyl group and a thiol
group on the surface. Since each of the solid inorganic
nanoparticles and the hollow inorganic nanoparticles includes the
above explained reactive functional groups on the surface, the low
refractive index layer may have higher crosslinking density,
thereby securing further improved scratch resistance and
anti-fouling property.
[0070] As the hollow inorganic nanoparticles, nanoparticles coated
with a fluorine-containing compound on the surface may be used
alone, or in combination with hollow inorganic nanoparticles that
are not coated with a fluorine-containing compound on the surface.
If the surface of the hollow inorganic nanoparticles is coated with
a fluorine-containing compound, surface energy may be further
lowered, thereby further increasing durability or scratch
resistance of the low refractive index layer.
[0071] As a method of coating a fluorine-containing compound on the
surface of the hollow inorganic nanoparticles, commonly known
particle coating method or polymerization method may be used
without specific limitations, and for example, the hollow inorganic
nanoparticles and fluorine-containing compound may be subjected to
a sol-gel reaction in the presence of water and a catalyst to bind
the fluorine-containing compound on the surface of the hollow
inorganic nanoparticles through hydrolysis and condensation
reaction.
[0072] Specific examples of the hollow inorganic nanoparticles may
include hollow silica particles. The hollow silica may comprise
functional groups substituted on the surface so that it may be more
easily dispersed in an organic solvent. Examples of the organic
functional groups that can be substituted on the surface of the
hollow silica particles are not significantly limited, and for
example, a (meth)acrylate group, a vinyl group, a hydroxyl group,
an amine group, an allyl group, an epoxy group, an isocyanate
group, an amine group, or fluorine, and the like may be substituted
on the surface of the hollow silica.
[0073] The binder resin of the low refractive index layer may
comprise, based on 100 parts by weight of the photopolymerizable
compound, 10 to 600 parts by weight of, 20 to 550 parts by weight
of, 50 to 500 parts by weight of, 100 to 400 parts by weight of, or
150 to 350 parts by weight of the inorganic fine particles. If the
inorganic fine particles are excessively added, due to decrease in
the content of binder, scratch resistance or abrasion resistance of
the coating film may be deteriorated.
[0074] Meanwhile, the low refractive index layer may be obtained by
coating a photocurable coating composition comprising a
photopolymerizable compound, a fluorine-containing compound
comprising a reactive functional group, polysilsesquioxane
substituted with one or more reactive functional groups, and the
inorganic fine particles on the low moisture permeable polymer
film, and photocuring the coated product.
[0075] And, the photocurable coating composition may further
comprise a photoinitiator. Thus, in the low refractive index layer
prepared from the above explained photocurable coating composition,
the photopolymerization initiator may remain.
[0076] As the photopolymerization initiator, compounds known to be
usable in a photocurable resin composition may be used without
specific limitations, and specifically, a benzophenon-based
compound, an acetophenon-based compound, a biimidazole-based
compound, a triazine-based compound, an oxime-based compound or
mixtures of two or more thereof may be used.
[0077] Based on 100 parts by weight of the photopolymerizable
compound, the photopolymerization initiator may be used in the
content of 1 to 100 parts by weight, 5 to 90 parts by weight, 10 to
80 parts by weight, 20 to 70 parts by weight, or 30 to 60 parts by
weight. If the amount of the photopolymerization initiator is too
small, materials that are not-cured in the photocuring step and
remain may be generated. If the amount of the photopolymerization
initiator is too large, non-reacted initiator may remain as
impurity or crosslinking density may decrease, and thus, the
mechanical properties of the prepared film may be deteriorated or
reflectance may be significantly increased.
[0078] And, the photocurable coating composition may further
comprise an organic solvent. Non-limiting examples of the organic
solvent may include ketones, alcohols, acetates and ethers, or
mixtures of two or more kinds thereof.
[0079] As specific examples of the organic solvent, ketones such as
methylethyl ketone, methyl isobutyl ketone, acetylacetone or
isobutyl ketone, and the like; alcohols such as methanol, ethanol,
n-propanol, i-propanol, n-butanol, i-butanol or t-butanol, and the
like; acetates such as ethyl acetate, i-propyl acetate, or
polyethyleneglycol monomethylether acetate, and the like; ethers
such as tetrahydrofuran or propyleneglycol monomethylether, and the
like; mixtures of two or more kinds thereof may be mentioned.
[0080] The organic solvent may be added when mixing each component
included in the photocurable coating composition, or it may be
included in the photocurable coating composition while each
component is dispersed or mixed in the organic solvent and added.
If the content of the organic solvent in the photocurable coating
composition is too small, flowability of the photocurable coating
composition may be deteriorated to generate defects such as stripes
in the finally prepared film. And, if the organic solvent is
excessively added, solid content may decrease, and thus, coating
and film formation may not be sufficiently achieved, and the
properties or surface properties of the film may be deteriorated,
and defects may be generated during drying and curing processes.
Thus, the photocurable coating composition may comprise an organic
solvent such that the total solid content concentration of the
included components may become 1 wt % to 50 wt %, or 2 to 20 wt
%.
[0081] Meanwhile, for the application of the photocurable coating
composition, commonly used methods and apparatuses may be used
without specific limitations, and for example, bar coating such as
Meyer bar, etc., gravure coating, 2 roll reverse coating, vacuum
slot die coating, 2 roll coating, etc. may be used.
[0082] In the step of photocuring the photocurable coating
composition, UV of 200-400 nm wavelength or visible rays may be
irradiated, wherein the exposure amount may be preferably 100 to
4,000 mJ/cm.sup.2. The exposure time is not specifically limited,
and may be appropriately changed according to the exposure
apparatus used, the wavelength of irradiated light rays or exposure
amount.
[0083] And, in the step of photocuring the photocurable coating
composition, nitrogen purging, etc. may be conducted so as to apply
nitrogen atmosphere condition.
[0084] Meanwhile, as the hard coating layer, commonly known hard
coating layers may be used without specific limitations.
[0085] One example of the hard coating layer may include a hard
coating layer comprising binder resin comprising photocurable
resin; and organic or inorganic fine particles dispersed in the
binder resin.
[0086] The photocurable resin included in the hard coating layer
may be polymer of photocurable compounds capable of inducing a
polymerization reaction if light such as UV, etc. is irradiated,
commonly known in the art. Specifically, the photocurable resin may
include one or more selected from the group consisting of: reactive
acrylate oligomers such as urethane acrylate oligomer, epoxide
acrylate oligomer, polyester acrylate, and polyether acrylate; and
multifunctional acrylate monomers such as dipentaerythritol
hexaacrylate, di pentaerythritol hydroxy pentaacrylate,
pentaerythritol tetraacrylate, pentaerythritol triacrylate,
trimethylene propyl triacrylate, propoxylated glycerol triacrylate,
trimethylpropane ethoxy triacrylate, 1,6-hexanediol acrylate,
propoxylated glycerol triacrylate, tripropylene glycol diacrylate,
and ethylene glycol diacrylate.
[0087] Although the particle diameter of the organic or inorganic
fine particles is not specifically limited, for example, the
organic fine particles may have a particle diameter of 1 to 10
.mu.m, and the inorganic fine particles may have a particle
diameter of 1 nm to 500 nm, or 1 nm to 300 nm. The particle
diameter of the organic or inorganic fine particles may be defined
as a volume average particle diameter.
[0088] And, although specific examples of the organic or inorganic
fine particles included in the hard coating layer are not limited,
for example, the organic or inorganic fine particles may be organic
fine particles selected from the group consisting of acryl-based
resin, styrene-based resin, epoxide resin and nylon resin, or
inorganic fine particles selected from the group consisting of
silicon oxide, titanium dioxide, indium oxide, tin oxide, zirconium
oxide and zinc oxide.
[0089] The binder resin of the hard coating layer may further
comprise high molecular weight (co)polymer having a number average
molecular weight of 10,000 or more. 13,000 or more, 15,000 to
100,000, or 20,000 to 80,000. The high molecular weight (co)polymer
may be one or more selected from the group consisting of
cellulose-based polymer, acryl-based polymer, styrene-based
polymer, epoxide-based polymer, nylon-based polymer, urethane-based
polymer, and polyolefin-based polymer.
[0090] Meanwhile, another example of the hard coating layer may
include a hard coating layer comprising organic polymer resin of
photocurable resin; and an antistatic agent dispersed in the
organic polymer resin.
[0091] The antistatic agent may be a quaternary ammonium salt
compound; a pyridinium salt; a cationic compound having 1 to 3
amino groups; an anionic compound such as sulfonic acid base,
sulfuric ester base, phorphoric ester base, phosphonic acid base,
and the like; an amphoteric compound such as an amino acid-based or
an amino sulfuric ester-based compound, and the like; a non-ionic
compound such as an imino alcohol-based compound, a glycerine-based
compound, a polyethylene glycol-based compound, and the like; an
organometallic compound such as a metal alkoxide compound including
tin or titanium, and the like; a metal chelate compound such as an
acetylacetonate salt of the organometallic compound; a reaction
product or polymerization product of two or more kinds thereof; a
mixture of two or more kinds thereof. Here, the quaternary ammonium
salt compound may be a compound having one or more quaternary
ammonium salt groups in the molecule, and low molecular type or
high molecular type may be used without limitations.
[0092] And, as the anti-static agent, conductive polymer and metal
oxide fine particles may be also used. As the conductive polymer,
aromatic conjugated poly(paraphenylene), heterocyclic conjugated
polypyrrole, polythiophene, aliphatic conjugated polyacetylene,
conjugated polyaniline containing hetero atoms, mixed type
conjugated poly(phenylene vinylene), double chain type conjugated
compounds having multiple conjugated chains in the molecule,
conductive composites wherein conjugated polymer chains are grafted
or block-polymerized to saturated polymer, and the like may be
mentioned. And, as the metal oxide fine particles, zinc oxide,
antimony oxide, tin oxide, cerium oxide, indium tin oxide, indium
oxide, aluminum oxide, antimony doped tin oxide, aluminum doped
zinc oxide, and the like may be mentioned.
[0093] The hard coating layer comprising organic polymer resin of
photocurable resin; and an anti-static agent dispersed in the
organic polymer resin may further comprise one or more compounds
selected from the group consisting of alkoxy silane-based oligomer
and metal alkoxide-based oligomer.
[0094] Although the alkoxy silane-based compound may be one
commonly used in the art, for example, it may be one or more
compounds selected form the group consisting of tetramethoxysilane,
tetraethoxysilane, tetraisopropoxysilane, methyltrimethoxysilane,
methyltriethoxysilane, methacryloxypropyltrimethoxysilane,
glycidoxy propyl trimethoxy silane, and glycidoxy propyl triethoxy
silane.
[0095] And, the metal alkoxide-based oligomer may be prepared by
the sol-gel reaction of a composition comprising a metal
alkoxide-based compound and water. The sol-gel reaction may be
conducted by a method similar to the above explained preparation
method of alkoxy silane-based oligomer. However, since the metal
alkoxide-based compound may rapidly react with water, the sol-gel
reaction may be conducted by diluting the metal alkoxide-based
compound in an organic solvent, and then, slowly dropping water. At
this time, considering the reaction efficiency, it is preferable
that the mole ratio of the metal alkoxide-based compound to water
(based on metal ions) is controlled within a range of 3 to 170.
[0096] Here, the metal alkoxide-based compound may be one or more
compounds selected from the group consisting of titanium
tetra-isopropoxide, zirconium isopropoxide and aluminum
isopropoxide.
[0097] Meanwhile, the low moisture permeable film may be a
transparent film having light transmittance of 90% or more, and
haze of 1% or less.
[0098] The low moisture permeable film may be a polymer film having
low moisture permeability in which moisture permeation, i.e., the
movement of moisture from a place having high vapor pressure to a
place having low vapor pressure, hardly occurs through the film,
and for example, the low moisture permeable polymer film may have
moisture permeability of 50 g/m.sup.2day or less, 30 g/m.sup.2day
or less, 20 g/m.sup.2day or less or 15 g/m.sup.2day or less, under
temperature of 30 to 40.degree. C. and relative humidity of 90 to
100%. If the moisture permeability of the low moisture permeable
polymer film is greater than 10 g/m.sup.2day, moisture may be
permeated into the anti-reflective film, and thus, deterioration of
a display applying the anti-reflective film may be generated under
a high temperature environment.
[0099] As explained above, the 2.theta. values of the first peak
and the second peak may result from the crystalline state of
polymer in the low moisture permeable polymer film, and the ratio
of the intensity of the first peak (P1) to the intensity of the
second peak (P2) may result from the arrangement degree of polymer
crystals in the low moisture permeable polymer film.
[0100] And, the arrangement degree of polymer crystals in the low
moisture permeable polymer film may be related to a draw ratio in
the manufacturing process of a low moisture permeable polymer film,
drawing temperature, and cooling speed after drawing, and it may be
also related to tensile strength ratio in one direction and a
direction perpendicular to the one direction of the low moisture
permeable polymer film.
[0101] Specifically, the low moisture permeable polymer film
exhibits different tensile strength values in one direction and in
a direction perpendicular to the one direction, and for example, a
ratio of tensile strength in one direction to tensile strength in a
direction perpendicular to the one direction may be 2 or more, 2.1
to 20, 2.2 to 10, or 2.3 to 5. Wherein, the tensile strength in a
direction perpendicular to the one direction is smaller than the
tensile strength in one direction. If the tensile strength ratio is
less than 2, reflectance deviation and light transmittance
deviation according to the part of the anti-reflective film may be
large, and rainbow phenomenon due to the interference of UV may be
generated.
[0102] The tensile strength in one direction may be tensile
strength in MD (Machine Direction) or TD (Transverse Direction) of
the low moisture permeable polymer film, and specifically, it may
be 30 Mpa to 1 Gpa, 40 Mpa to 900 Mpa, or 50 Mpa to 800 Mpa.
[0103] The tensile strength perpendicular to the one direction may
be tensile strength in MD or TD of the low moisture permeable
polymer film, and specifically, it may be 30 Mpa to 1 Gpa, 40 Mpa
to 900 Mpa, or 50 Mpa to 800 Mpa.
[0104] The low moisture permeable polymer film may have thickness
direction retardation (Rth) measured at a wavelength of 400 nm to
800 nm, of 5,000 nm or more, 7,000 to 50,000 nm, or 8,000 to 40,000
nm. As specific examples of such low moisture permeable polymer
film, a uniaxially drawn polyethylene terephthalate film or a
biaxially drawn polyethylene terephthlate film may be
mentioned.
[0105] If the thickness direction retardation (Rth) of the low
moisture permeable polymer film is less than 5,000 nm, reflectance
deviation and light transmittance deviation according to the part
of the anti-reflective film may be large, and rainbow phenomenon
due to the interference of UV may be generated.
[0106] The thickness direction retardation may be confirmed through
commonly known measuring method and measuring apparatus. For
example, as the measuring apparatus of thickness direction
retardation, a product name AxoScan manufactured by AXOMETRICS Inc.
may be mentioned.
[0107] For example, the thickness direction retardation (Rth) may
be calculated by inputting the refractive index value (589 nm) of
the light-transmitting substrate film in the measuring device, and
then, measuring the thickness direction retardation of the
light-transmitting substrate film using light of 590 nm wavelength
under temperature of 25.degree. C. and humidity of 40%, and
converting it into a retardation value per a film thickness of 10
.mu.m, based on the measured value of thickness direction
retardation (value obtained by the automatic measurement (automatic
calculation) of the measuring device). And, the size of the
light-transmitting substrate is not specifically limited as long as
it is larger than a sidelight part (diameter: about 1 cm) of the
stage of the measuring device, but it may have a dimension of
height 76 mm, width 52 mm and thickness 13 mm.
[0108] And, the value of refractive index of the light-transmitting
substrate (589 nm) that is used for the measurement of thickness
direction retardation (Rth) may be calculated by forming a
non-drawn film comprising the same kind of a resin film to the
light transmitting substrate that forms a film of which retardation
is to be measured, and then, measuring refractive index to 589 nm
light of the in-plane direction of a measuring sample (a direction
vertical to the thickness direction), using the non-drawn film as a
measuring sample (in case a film to be measured is a non-drawn
film, the film itself may be used as a measurement sample), using a
refractive measuring apparatus (product name NAR-1T SOLID
manufactured by Atagoa Co., Ltd), using a light source of 589 nm,
under temperature condition of 23.degree. C.
[0109] And, the material of the low moisture permeable polymer film
may be triacetylcellulose, cycloolefin polymer, polyacrylate,
polycarbonate, polyethylene terephthate, and the like. And, the
thickness of the base film may be 10 to 300 mm considering
productivity, and the like, but not limited thereto.
[0110] The anti-reflective film of one embodiment exhibits low
reflectance, and thus, can realize high light transmittance and
excellent optical properties. Specifically, the anti-reflective
film may have an average reflectance of 2.0% or less, 1.6% or less,
1.2% or less, 0.05% to 0.9%, 0.10% to 0.70%, or 0.2% to 0.5%, in
the UV wavelength region of 380 nm to 780 nm.
[0111] And, the anti-reflective film of one embodiment exhibits low
reflectance deviation and light transmittance deviation, and thus,
can realize excellent optical properties. Specifically, the average
reflectance deviation of the anti-reflective film may be 0.2% p or
less, 0.01 to 0.15% p or 0.01 to 0.1% p. And, the light
transmittance deviation of the anti-reflective film may be 0.2% p
or less, 0.01 to 0.15% p or 0.01 to 0.1% p.
[0112] The average reflectance deviation means a difference
(absolute value) between each average reflectance in the UV
wavelength region of 380 to 780 nm of two or more specific points
selected in the anti-reflective film, and the mean of the average
reflectances. Specifically, the average reflectance deviation may
be calculated by 1) selecting two or more points in an
anti-reflective film, 2) measuring each average reflectance at the
two or more points, 3) calculating the arithmetic mean of the
average reflectances measured in the step 2), and 4) calculating a
difference (absolute value) between the average reflectance of each
point and the arithmetic mean of step 3), thus finally calculating
two or more average reflectance deviations. Wherein, among the two
or more average reflectance deviations, the largest average
reflectance deviation may be 0.2% p or less.
[0113] Meanwhile, the light transmittance deviation means a
difference (absolute value) between each light transmittance of two
or more specific points selected in the anti-reflective film, and
the mean of the light transmittances, and the light transmittance
deviation may be calculated by the same method as the method of
calculating the average reflectance deviation, except that light
transmittance is measured instead of average reflectance. Wherein,
among the two or more light transmittance deviations, the largest
light transmittance deviation may be 0.2% p or less.
[0114] According to another embodiment of the invention, a
polarizing plate comprising the anti-reflective film according to
the above embodiment is provided. The polarizing plate may comprise
a polarizer and an anti-reflective film formed on at least one side
of the polarizer.
[0115] The material and preparation method of the polarizing film
are not specifically limited, and those commonly known in the art
may be used. For example, the polarizer may be a
polyvinylalcohol-based polarizer.
[0116] The polarizer and the anti-reflective film may be laminated
by adhesive such as aqueous adhesive or non-aqueous adhesive, and
the like.
[0117] According to yet another embodiment of the invention, a
display apparatus comprising the above explained anti-reflective
film is provided. Although specific examples of the display
apparatus are not limited, for example, it may be a liquid crystal
display, a plasma display apparatus, an organic light emitting
diode, and the like.
[0118] For example, the display apparatus may be a liquid crystal
display apparatus comprising one pair of polarizing plates facing
each other; a thin film transistor, a color filer and a liquid
crystal cell sequentially stacked between the one pair of
polarizing plates; and a backlight unit.
[0119] In the display apparatus, the anti-reflective film may be
positioned at the side of an observer of a display panel or at the
outermost surface of the backlight.
[0120] In the display apparatus comprising the anti-reflective
film, an anti-reflective film may be positioned on one side of the
polarizing plate relatively distant from the backlight unit, among
the one pair of polarizing plates.
[0121] And, the display apparatus may comprise a display panel, a
polarizer positioned on at least one side of the panel, and an
anti-reflective film positioned on the opposite side.
Advantageous Effects
[0122] According to the present invention, an anti-reflective film
that has low reflectance deviation and light transmittance
deviation, can simultaneously realize high scratch resistance and
anti-fouling property, and can increase screen sharpness of a
display apparatus, a polarizing plate comprising the
anti-reflective film, and a display apparatus comprising the
anti-reflective film, are provided.
BRIEF DESCRIPTION OF THE DRAWINGS
[0123] FIG. 1 show X-ray diffraction (XRD) pattern of the
anti-reflective film of Example 1.
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0124] The present invention will be explained in detail in the
following Examples. However, these examples are presented only as
the illustrations of the present invention, and the scope of the
present invention is not limited thereby.
Preparation Example 1: Preparation of a Coating Solution for
Forming a Hard Coating Layer
[0125] The components described in the following Table 1 were mixed
to prepare coating solutions (B1, B2 and B3) for forming a hard
coating layer.
TABLE-US-00001 TABLE 1 (unit: g) B1 B2 B3 DPHA -- 6.237 -- PETA
16.421 10.728 13.413 UA-306T 3.079 2.069 6.114 8BR-500 6.158 6.537
6.114 IRG-184 1.026 1.023 1.026 Tego-270 0.051 0.051 0.051 BYK350
0.051 0.051 0.051 2-butanol 25.92 32.80 36.10 IPA 45.92 38.80 35.70
XX-103BQ(2.0 .mu.m 1.515) 0.318 0.460 0.600 XX-113BQ(2.0 .mu.m
1.555) 0.708 0.563 0.300 MA-ST(30% in MeOH) 0.342 0.682 0.542 DPHA:
dipentaerythritol hexaacrylate PETA: pentaerythritol triacrylate
UA-306T: urethane acrylate, a reaction product of toluene
diisocyante and pentaerythritol triacrylate (a product from
Kyoeisha) 8BR-500: photocurable urethane acrylate polymer (Mw
200,000, a product from Taisei Fine Chemical) IRG-184: initiator
(Irgacure 184, a product from Ciba) Tego-270: leveling agent (a
product from Tego) BYK350: leveling agent (a product from BYK) IPA
isopropyl alcohol XX-103BQ (diameter: 2.0 .mu.m, Refractive index:
1.515): copolymer particles of polystyrene and polymethyl
methacrylate (a product from Sekisui Plastic) XX-113BQ (diameter:
2.0 .mu.m, Refractive index: 1.555): copolymer particles of
polystyrene and polymethyl methacrylate (a product from Sekisui
Plastic) MA-ST (30% in MeOH): dispersion in which nanosilica
particles having a size of 10~15 nm are dispersed in methyl alcohol
(a product from Nissan Chemical)
Preparation Example 2-1: Preparation of a Coating Solution (C1) for
Forming a Low Refractive Index Layer
[0126] 100 g of trimethylolpropane triacrylate (TMPTA), 283 g of
hollow silica nanoparticles (diameter range: about 42 nm to 66 nm,
a product from JSC catalyst and chemicals), 59 g of solid silica
nanoparticles (diameter range: about 12 nm to 19 nm), 115 g of a
first fluorine-containing compound (X-71-1203M, a product from
ShinEtsu), 15.5 g of a second fluorine-containing compound (RS-537,
a product from DIC) and 10 g of an initiator (Irgacure 127, a
product from Ciba) were diluted in a solvent of MIBK (methyl
isobutyl ketone) such that solid content concentration became 3 wt
%, thus preparing a coating solution (a photocurable coating
composition) for forming a low refractive index layer.
Preparation Example 2-2: Preparation of a Coating Solution (C2) for
Forming a Low Refractive Index Layer
[0127] 100 g of dipentaerythritol hexaacrylate (DPHA), 143 g of
hollow silica nanoparticles (diameter range: about 51 nm to 72 nm,
a product from JSC catalyst and chemicals), 29 g of solid silica
nanoparticles (diameter range: about 12 nm to 19 nm), 56 g of a
fluorine-containing compound (RS-537, a product from DIC) and 3.1 g
of an initiator (Irgacure 127, a product from Ciba) were diluted in
a solvent of MIBK (methyl isobutyl ketone) such that solid content
concentration became 3.5 wt %, thus preparing a coating solution (a
photocurable coating composition) for forming a low refractive
index layer.
Examples and Comparative Examples: Preparation of Anti-Reflective
Films
[0128] On each low moisture permeable polymer film (thickness 80
mm) described in the following Table 2, each coating solution (B1,
B2, B3) for forming a hard coating layer prepared above was coated
with #12 mayer bar, and then, dried at 60.degree. C. for 2 minutes,
and UV cured to form a hard coating layer (coating thickness 5 mm).
As an UV lamp, H bulb was used, and a curing reaction was
progressed under nitrogen atmosphere. The quantity of UV irradiated
during curing was 100 mJ/cm.sup.2.
[0129] On the hard coating layer, each coating solution (C1, C2)
for forming a low refractive index layer was coated with #4 mayer
bar to a thickness of about 110 to 120 nm, and dried at 40.degree.
C. for 1 minute and cured. During curing, UV was irradiated at 252
mJ/of to the dried coating solution under nitrogen purging.
TABLE-US-00002 TABLE 2 Anti-reflective film Tensile strength Low
refractive ratio* Hard coating layer index layer Example 1 4.1
Coating solution (B1) Coating solution (C1) Example 2 3.7 Coating
solution (B2) Coating solution (C1) Example 3 3.1 Coating solution
(B2) Coating solution (C1) Example 4 2.7 Coating solution (B3)
Coating solution (C1) Example 5 2.3 Coating solution (B1) Coating
solution (C2) Comparative 1.9 Coating solution (B3) Coating
solution (C1) Example 1 Comparative 1.5 Coating solution (B2)
Coating solution (C1) Example 2 Comparative 1.2 Coating solution
(B2) Coating solution (C1) Example 3 Comparative 1.7 Coating
solution (B1) Coating solution (C2) Example 4 *tensile strength
ratio: a ratio of tensile strength in one direction having larger
value, to tensile strength in a direction perpendicular to the one
direction having smaller value, in the low moisture permeable
polymer film
[0130] Evaluation
[0131] 1. Evaluation of Reflection Mode X-Ray Diffraction (XRD)
[0132] For the anti-reflective films obtained in Examples and
Comparative Examples, 2 cm*2 cm (width*length) samples were
prepared, and then, Cu-K.alpha. rays of 1.54 .ANG. wavelength were
irradiated to measure reflection mode X-ray diffraction (XRD)
pattern.
[0133] Specifically, on a low background Si holder (a product from
Bruker), the sample was fixed without being lifted, and as the
measuring apparatus, Bruker AXS D4 Endeavor XRD was used.
[0134] The voltage and current used were respectively 40 kV and 40
mA, and the optics and detector used were as follows. [0135]
Primary (incident beam) optics: motorized divergence slit, soller
slit 2.3.degree. [0136] Secondary (diffracted beam) optics: soller
slit 2.3.degree. [0137] LynxEye detector (1 D detector)
[0138] The measurement mode was a coupled 2.theta./.theta. mode,
and a region having 2.theta. of 6.degree. to 70.degree. was
measured using FDS (Fixed Divergence Slit) 0.3.degree., every
0.04.degree. for 175 seconds.
[0139] Thereafter, in case where a peak appears at 2.theta. of 22
to 27.degree., the 2.theta. value was described in the following
Table 3. And, in case where two peaks appear at 2.theta. of 22 to
27.degree., a ratio of the intensity of a peak having relatively
small 2.theta. to the intensity of a peak having relatively large
2.theta. was calculated and the result was shown in the following
Table 3.
[0140] Meanwhile, FIG. 1 shows a X-ray diffraction (XRD) pattern of
the anti-reflective film of Example 1.
[0141] 2. Evaluation of Average Reflectance
[0142] The rear side (one side of the low moisture permeable
polymer film on which a hard coating layer is not formed) of each
anti-reflective film obtained in Examples and Comparative Examples
was darkened, and then, average reflectance in the wavelength
region of 380 nm to 780 nm was measured using a reflectance mode of
Solidspec 3700 (SHIMADZU), and the results were shown in the
following Table 3.
[0143] 3. Evaluation of Average Reflectance Deviation
[0144] For each anti-reflective film obtained in Examples and
Comparative Examples, 20 points were randomly selected, and for
each point, average reflectance was measured by the method of 2.
Evaluation of average reflectance. Thereafter, the arithmetic mean
of the measured average reflectance of 20 points was calculated.
Thereafter, a difference (absolute value) between the average
reflectance at each point and the arithmetic mean was defined as
average reflectance deviation, and each average reflectance
deviation was calculated at each of 20 points. Among the 20 average
reflectance deviations, the largest average reflectance deviation
was described in the following Table 3.
[0145] 4. Evaluation of Light Transmittance Deviation
[0146] For each anti-reflective film obtained in Examples and
Comparative Examples, 20 points were randomly selected, and for
each point, light transmittance was measured.
[0147] Specifically, average light transmittance in the wavelength
region of 380 to 780 nm was measured using a transmittance mode of
Solidspec 3700 (SHIMADZU).
[0148] Thereafter, the arithmetic mean of the measured light
transmittances of 20 points was calculated. Thereafter, a
difference (absolute value) between the light transmittance at each
point and the arithmetic mean was defined as light transmittance
deviation, and each light transmittance deviation was calculated at
each of 20 points. Among the 20 light transmittance deviations, the
largest light transmittance deviation was described in the
following Table 3.
[0149] 5. Evaluation of Moisture Permeability
[0150] The moisture permeability of each anti-reflective film
obtained in Examples and Comparative Examples was measured at a
temperature of 38.degree. C. and relative humidity of 100%, using
MOCON test apparatus (PERMATRAN-W, MODEL 3/61).
TABLE-US-00003 TABLE 3 Average Light Peak Average reflectance
transmittance Moisture intensity reflectance deviation deviation
permeability Peak(.degree.) ratio* (%) (% p) (% p) (g/m.sup.2 day)
Example 1 22.9/25.6 0.66 1.1 0.05 0.03 10.75 Example 2 22.8/26.0
0.71 1.3 0.13 0.08 11.78 Example 3 22.9/25.6 0.63 1.15 0.08 0.02
11.98 Example 4 22.8/25.8 0.59 1.05 0.15 0.1 12.24 Example 5
23.1/25.7 0.91 1.6 0.03 0.15 11.81 Comparative 25.7 -- 1.11 0.3
0.28 10.49 Example 1 Comparative -- -- 1.04 0.26 0.23 10.54 Example
2 Comparative -- -- 0.99 0.28 0.3 11.38 Example 3 Comparative 25.8
-- 1.51 0.33 0.25 12.01 Example 4 *peak intensity ratio: in case
two peaks appear at 2.theta. of 22 to 27.degree., a ratio of the
intensity of a peak having relatively small 2.theta. to the
intensity of a peak having relatively large 2.theta.
[0151] According to the Table 3, it was confirmed that in Examples
1 to 5, each peak appears at 2.theta. of 22 to 24.degree. and
2.theta. of 24 to 27.degree., a peak intensity ratio is 0.4 or
more, and an average reflectance deviation and a light
transmittance deviation are remarkably low, compared to Comparative
Examples 1 to 4.
* * * * *