U.S. patent application number 16/895614 was filed with the patent office on 2021-05-13 for display apparatus and method of manufacturing the same.
This patent application is currently assigned to Samsung Display Co., Ltd.. The applicant listed for this patent is Samsung Display Co., Ltd.. Invention is credited to Hyungbin CHO, Pilsoon HONG, Hyein KIM, Chulwon PARK, Gwuihyun PARK, Koichi SUGITANI.
Application Number | 20210143333 16/895614 |
Document ID | / |
Family ID | 1000004940010 |
Filed Date | 2021-05-13 |
United States Patent
Application |
20210143333 |
Kind Code |
A1 |
SUGITANI; Koichi ; et
al. |
May 13, 2021 |
DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
Abstract
Provided are a display apparatus and a method of manufacturing
the same. The display apparatus includes a substrate, a first
conductive layer disposed on the substrate, and a first insulating
pattern disposed on the first conductive layer. The first
insulating pattern includes a fluorine compound and a nitrogen
compound. The nitrogen compound is represented by Formula 1:
NR.sub.1R.sub.2R.sub.3OH <Formula 1> wherein in Formula 1,
R.sub.1 to R.sub.3 are each independently selected from hydrogen, a
substituted or unsubstituted C.sub.1-C.sub.20 alkyl group, a
substituted or unsubstituted C.sub.6-C.sub.30 aryl group, and a
substituted or unsubstituted C.sub.7-C.sub.30 aralkyl group.
Inventors: |
SUGITANI; Koichi;
(Yongin-si, KR) ; KIM; Hyein; (Yongin-si, KR)
; PARK; Gwuihyun; (Yongin-si, KR) ; PARK;
Chulwon; (Yongin-si, KR) ; CHO; Hyungbin;
(Yongin-si, KR) ; HONG; Pilsoon; (Yongin-si,
KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Samsung Display Co., Ltd. |
Yongin-si |
|
KR |
|
|
Assignee: |
Samsung Display Co., Ltd.
Yongin-si
KR
|
Family ID: |
1000004940010 |
Appl. No.: |
16/895614 |
Filed: |
June 8, 2020 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 51/5253 20130101;
H01L 51/0023 20130101; H01L 27/3244 20130101; H01L 2227/323
20130101; H01L 51/0094 20130101; H01L 51/56 20130101 |
International
Class: |
H01L 51/00 20060101
H01L051/00; H01L 27/32 20060101 H01L027/32 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 12, 2019 |
KR |
10-2019-0143933 |
Claims
1. A display apparatus comprising: a substrate; a conductive layer
disposed on the substrate; and a first insulating pattern disposed
on the conductive layer, wherein the first insulating pattern
comprises a fluorine compound.
2. The display apparatus of claim 1, wherein concentration of the
fluorine compound is reduced from a first surface of the first
insulating pattern to a second surface of the first insulating
pattern, and the first surface faces the second surface.
3. The display apparatus of claim 2, wherein the second surface of
the first insulating pattern is in contact with the conductive
layer.
4. The display apparatus of claim 1, wherein the first insulating
pattern comprises a nitrogen compound.
5. The display apparatus of claim 4, wherein the nitrogen compound
is represented by Formula 1: NR.sub.1R.sub.2R.sub.3OH <Formula
1> wherein in Formula 1, R.sub.1 to R.sub.3 are each
independently selected from hydrogen, a substituted or
unsubstituted C.sub.1-C.sub.20 alkyl group, a substituted or
unsubstituted C.sub.6-C.sub.30 aryl group, and a substituted or
unsubstituted C.sub.7-C.sub.30 aralkyl group.
6. The display apparatus of claim 4, wherein concentration of the
nitrogen compound is reduced from a first surface of the first
insulating pattern to a second surface of the first insulating
pattern, and the first surface faces the second surface.
7. The display apparatus of claim 6, wherein the second surface of
the first insulating pattern is in contact with the conductive
layer.
8. The display apparatus of claim 1, wherein the first insulating
pattern further comprises a nitrogen compound and a first material,
and the first material is different from the fluorine compound and
the nitrogen compound.
9. The display apparatus of claim 8, wherein the first insulating
pattern consists essentially of the first material.
10. The display apparatus of claim 8, wherein the first material
includes an alkali soluble polymer.
11. The display apparatus of claim 8, wherein the first material
includes a siloxane-based polymer.
12. The display apparatus of claim 8, wherein the first insulating
pattern comprises a first region and a second region, the second
region is between the conductive layer and the first region, and an
amount of the first material in the first region is greater than an
amount of the first material in the second region.
13. The display apparatus of claim 12, wherein a ratio of the
amount of the fluorine compound in the first region to the amount
of the fluorine compound in the second region is from about 10:1 to
about 10,000:1.
14. The display apparatus of claim 12, wherein a ratio of the
thickness of the first region to the thickness of the second region
is from about 1:10 to about 1:1,000.
15. The display apparatus of claim 1, wherein the conductive layer
comprises molybdenum, aluminum, titanium, neodymium, copper, or a
combination thereof.
16. The display apparatus of claim 1, further comprising: a pixel
electrode disposed on the first insulating pattern and electrically
connected to the conductive layer.
17. The display apparatus of claim 16, wherein the first insulating
pattern includes an opening exposing a portion of the conductive
layer, and the pixel electrode contacts the conductive layer
through the opening.
18. The display apparatus of claim 17, wherein the portion of the
conductive layer exposed by the opening comprises molybdenum.
19. The display apparatus of claim 16, further comprising: a second
insulating pattern disposed on the pixel electrode and contacting
the first insulating pattern outside the pixel electrode.
20. The display apparatus of claim 19, wherein the first insulating
pattern comprises a first material, the second insulating pattern
comprises a second material, and the first material and the second
material comprise a same material.
21. A method of manufacturing a display apparatus, the method
comprising: forming a conductive layer on a substrate; forming a
preliminary insulating pattern on the conductive layer; forming an
insulating pattern by developing with a first solution; and
treating the insulating pattern with a second solution, wherein the
first solution comprises a nitrogen compound, and the second
solution comprises HF.
22. The method of claim 21, further comprising, prior to the
treating, forming a pixel electrode on the insulating pattern,
wherein the pixel electrode is electrically connected to the
conductive layer.
23. The method of claim 21, further comprising, after the treating,
forming a pixel electrode on the insulating pattern, wherein the
pixel electrode is electrically connected to the conductive layer.
Description
CROSS-REFERENCE TO RELATED APPLICATION(S)
[0001] This application claims the priority to and benefits of
Korean Patent Application No. 10-201 9-0143933 under 35 U.S.C.
.sctn. 119, filed on Nov. 12, 2019 in the Korean Intellectual
Property Office, the entire contents of which are incorporated
herein by reference.
BACKGROUND
1. Technical Field
[0002] Embodiments of the disclosure relate to a display apparatus,
and to a display apparatus that is capable of preventing or
reducing the deterioration of image quality during a manufacturing
process or use.
2. Description of the Related Art
[0003] Display apparatuses have been diversified in use. In recent
developments, the thickness of the display apparatuses is smaller
and the weight thereof is lighter, and thus, they are used in a
wider range of use. For example, the use of display apparatuses is
expanding to not only small devices such as MP3 players and mobile
phones, but also medium and large devices such as big-screen
televisions.
[0004] In addition, there has been research and development of
foldable or rollable display apparatuses. To this end, it is
desirable to improve the flexibility of substrates of display
apparatuses.
SUMMARY
[0005] Embodiments of the disclosure provide a display apparatus
that is capable of preventing or reducing the deterioration of
image quality during a manufacturing process or use and a method of
manufacturing the same.
[0006] Technical objectives to be achieved by the disclosure are
not limited to the above-mentioned embodiments, and other technical
objectives which have not been described will be clearly understood
by those skilled in the art from the description of the
disclosure.
[0007] Additional aspects will be set forth in part in the
description which follows and, in part, will be apparent from the
description, or may be learned by practice of the presented
embodiments of the disclosure.
[0008] In one embodiment, a display apparatus may include a
substrate, a first conductive layer disposed on the substrate, and
a first insulating pattern disposed on the first conductive layer,
wherein the first insulating pattern includes a fluorine
compound.
[0009] In one embodiment, concentration of the fluorine compound
may be reduced from a first surface of the first insulating pattern
to a second surface of the first insulating pattern, and the first
surface faces the second surface.
[0010] In one embodiment, the second surface of the first
insulating pattern is in contact with the conductive layer.
[0011] In one embodiment, the first insulating pattern may further
include a nitrogen compound.
[0012] In one embodiment, the nitrogen compound may be represented
by Formula 1.
NR.sub.1R.sub.2R.sub.3OH <Formula 1>
[0013] In Formula 1, R.sub.1 to R.sub.3 may each independently be
selected from hydrogen, a substituted or unsubstituted
C.sub.1-C.sub.20 alkyl group, a substituted or unsubstituted
C.sub.6-C.sub.30 aryl group, and a substituted or unsubstituted
C.sub.7-C.sub.30 aralkyl group.
[0014] In one embodiment, concentration of the nitrogen compound
may be reduced from a first surface of the first insulating pattern
to a second surface of the first insulating pattern, wherein the
first surface faces the second surface.
[0015] In one embodiment, the first insulating pattern may further
include a nitrogen compound and a first material, and the first
material may be different from the fluorine compound and the
nitrogen compound.
[0016] In one embodiment, the first insulating pattern consists
essentially of the first material.
[0017] In one embodiment, the first material may be an alkali
soluble polymer.
[0018] In one embodiment, the first material may be a
siloxane-based polymer.
[0019] In one embodiment, the first insulating pattern includes a
first region and a second region, the second region may be between
the first conductive layer and the first region, and an amount of
the first material in the first region may be greater than an
amount of the first material in the second region.
[0020] In one embodiment, a ratio of the amount of the fluorine
compound in the first region to the amount of the fluorine compound
in the second region may be from about 10:1 to about 10,000:1.
[0021] In one embodiment, a ratio of the thickness of the first
region to the thickness of the second region may be from about 1:10
to about 1:1,000.
[0022] In one embodiment, the first conductive layer may include
molybdenum, aluminum, titanium, neodymium, copper, or a combination
thereof.
[0023] In one embodiment, the display apparatus may further include
a pixel electrode that is disposed on the first insulating pattern
and electrically connected to the first conductive layer.
[0024] In one embodiment, the first insulating pattern may include
an opening that exposes a portion of the first conductive layer,
and the pixel electrode may contact the first conductive layer
through the opening.
[0025] In one embodiment, a portion of the first conductive layer
exposed by the opening may include molybdenum.
[0026] In one embodiment, the display apparatus may further include
a second insulating pattern disposed on the pixel electrode and
contacts the first insulating pattern outside the pixel
electrode.
[0027] In one embodiment, the first insulating pattern may include
a first material, the second insulating pattern may include a
second material, and the first material and the second material may
comprise a same material.
[0028] In one embodiment, a method of manufacturing a display
apparatus includes forming a first conductive layer on a substrate,
forming a preliminary first insulating pattern on the first
conductive layer, forming a first insulating pattern by developing
with a first solution, and treating the first insulating pattern
with a second solution, wherein the first solution includes a
nitrogen compound and the second solution includes HF.
[0029] In one embodiment, the method may further include, prior to
the treating, forming a pixel electrode on the first insulating
pattern wherein the pixel electrode may be electrically connected
to the first conductive layer.
[0030] In one embodiment, the method may further include, after the
treating, forming a pixel electrode on the first insulating pattern
wherein the pixel electrode is electrically connected to the first
conductive layer.
BRIEF DESCRIPTION OF THE DRAWINGS
[0031] The above and other aspects, features, and advantages of
certain embodiments of the disclosure will be more apparent from
the following description taken in conjunction with the
accompanying drawings, in which:
[0032] FIG. 1 is a schematic perspective view showing a display
apparatus according to an embodiment;
[0033] FIG. 2 is a schematic cross-sectional view showing a display
apparatus according to an embodiment;
[0034] FIGS. 3 to 5 are schematic cross-sectional views
illustrating a method of manufacturing a display apparatus
according to an embodiment;
[0035] FIG. 6 is a schematic block diagram showing the structure of
an electronic device apparatus according to an embodiment; and
[0036] FIGS. 7A and 7B are schematic perspective views showing an
electronic device according to an embodiment.
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0037] Reference will now be made in detail to the embodiments,
examples of which are illustrated in the accompanying drawings,
wherein like reference numerals refer to like elements throughout.
In this regard, the embodiments may have various modifications and
different forms and should not be construed as being limited to the
descriptions set forth herein. Rather, all modifications,
equivalents, and substituents which are included in the spirit and
technical scope of the invention should be included. Accordingly,
the embodiments are merely described below, by referring to the
figures, to explain aspects of the description.
[0038] Hereinafter, embodiments of the disclosure will be described
in detail with reference to the accompanying drawings. The same or
corresponding components will be denoted by the same reference
numerals, and thus redundant description thereof will be
omitted.
[0039] As used herein, the term "and/or" includes any and all
combinations of one or more of the associated listed items.
Throughout the disclosure, the expression "at least one of a, b or
c" may indicate only a, only b, only c, both a and b, both a and c,
both b and c, all of a, b, and c, or variations thereof.
[0040] It will be understood that although the terms "first,"
"second," etc. may be used herein to describe various components,
these components should not be limited by these terms. These
components are only used to distinguish one component from
another.
[0041] As used herein, the singular forms "a," "an" and "the" are
intended to include the plural forms as well, unless the context
clearly indicates otherwise.
[0042] It will be further understood that the terms "contains,"
"containing," "includes," "including," "comprises," and/or
"comprising" used herein specify the presence of stated features or
components, but do not preclude the presence or addition of one or
more other features or components.
[0043] It will be understood that when a layer, region, or
component is referred to as being "on" or "onto" another layer,
region, or component, it may be directly or indirectly formed on
the other layer, region, or component. For example, intervening
layers, regions, or components may be present. It will also be
understood that when a layer, region, or component is referred to
as being "directly on" or "directly onto" another layer, region, or
component, it may be directly formed on the other layer, region, or
component, and intervening layers, regions, or components may not
be present.
[0044] Sizes of elements in the drawings may be exaggerated for
convenience of explanation. In other words, since sizes and
thicknesses of components in the drawings are arbitrarily
illustrated for convenience of explanation, the following
embodiments of the disclosure are not limited thereto.
[0045] When an embodiment is implementable otherwise, a particular
process order may be performed differently from the order
described. For example, two processes described in succession may
be performed substantially simultaneously or in a reverse
order.
[0046] It will be understood that when a layer, region, or
component is referred to as being "connected to" another layer,
region, or component, the layer, region, or component may be
directly connected to the another layer, region, or component, or
indirectly connected to the another layer, region, or component as
intervening layer, region, or component is present. For example, it
will be understood that when a layer, region, or component is
referred to as being "electrically connected to" another layer,
region, or component, the layer, region, or component may be
directly electrically connected to the another layer, region, or
component, or indirectly electrically connected to the another
layer, region, or component as intervening layer, region, or
component is present.
[0047] The term "C.sub.1-C.sub.20 alkyl group" as used herein
refers to a linear or branched aliphatic saturated hydrocarbon
monovalent group having 1 to 20 carbon atoms, and examples thereof
include a methyl group, an ethyl group, a propyl group, an isobutyl
group, a sec-butyl group, a tert-butyl group, a pentyl group, an
isoamyl group, and a hexyl group.
[0048] The term "C.sub.3-C.sub.10 cycloalkyl group" as used herein
refers to a monovalent saturated hydrocarbon monocyclic group
having 3 to 10 carbon atoms, and examples thereof include a
cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a
cyclohexyl group, and a cycloheptyl group.
[0049] The term "C.sub.6-C.sub.30 aryl group" as used herein refers
to a monovalent group having a carbocyclic aromatic system having 6
to 30 carbon atoms. Examples of the C.sub.6-C.sub.30 aryl group
include a phenyl group, a naphthyl group, an anthracenyl group, a
phenanthrenyl group, a pyrenyl group, and a chrysenyl group. When
the C.sub.6-C.sub.30 aryl group includes two or more rings, the
rings may be fused to each other.
[0050] The term "C.sub.7-C.sub.30 aralkyl group" as used herein
refers to a group having 7 to 30 carbon atoms in which the alkyl
group is substituted with the aryl group. Examples of the
C.sub.7-C.sub.60 aralkyl group include a benzyl group.
[0051] FIG. 1 is a schematic perspective view showing a display
apparatus 1 according to an embodiment.
[0052] Referring to FIG. 1, the display apparatus 1 includes a
display area DA and a non-display area NDA outside the display area
DA. In the display area DA, various display devices such as an
organic light-emitting device (OLED) may be positioned or disposed.
In the non-display area NDA, various wires through which electrical
signals are transmitted to the display area DA may be positioned or
disposed.
[0053] Although FIG. 1 illustrates the display apparatus 1
including a rectangular display area DA, the invention is not
limited thereto. The shape of the display area DA may be a circle,
an ellipse, or a polygon such as a triangle or a pentagon.
[0054] Although the display apparatus 1 of FIG. 1 is a display
apparatus having a flat shape, the display apparatus 1 may be
implemented in various forms such as a curved display apparatus, a
flexible display apparatus, a foldable display apparatus, and a
rollable display apparatus.
[0055] Hereinafter for convenience, an organic light-emitting
display apparatus will be described as an example of the display
apparatus 1 according to an embodiment, but the display apparatus
according to the disclosure is not limited thereto. In one or more
embodiments, various other display apparatuses, such as an
inorganic light-emitting display apparatus or a quantum dot
light-emitting display apparatus, may instead be used.
[0056] FIG. 2 is a schematic cross-sectional view showing the
display apparatus 1 according to an embodiment.
[0057] Referring to FIG. 2, the display apparatus 1 according to an
embodiment includes a substrate 100, a first conductive layer 160
disposed on the substrate 100; and a first insulating pattern 170
disposed on the first conductive layer 160.
[0058] The substrate 100 may include various materials, such as
glass, metal, metal oxide, metal nitride, or plastic. For example,
the substrate 100 may include polyethersulfone, polyacrylate,
polyetherim ide, polyethylene napthalate,
polyethyeleneterepthalate, polyphenylene sulfide, polyarylate,
polyimide, polycarbonate, cellulose acetate propionate, or the
like.
[0059] The substrate 100 may be flexible, rollable, or bendable.
The substrate 100 may have a multi-layered structure, and layers
constituting the multilayer structure may have different
materials.
[0060] A buffer layer 110 may be disposed on the substrate 100 to
planarize the top surface of the substrate 100 and to block
impurities from flowing from the substrate 100. The buffer layer
110 may have a single-layered structure or a multi-layered
structure, each structure including an inorganic material such as
silicon nitride (SiN.sub.x) and/or silicon oxide (SiO.sub.x). The
buffer layer 110 may be omitted.
[0061] An activation layer 120 may be disposed on the buffer layer
110. The activation layer 120 may include organic semiconductors,
inorganic semiconductors, and/or silicon semiconductors.
[0062] A first insulating layer 130 may be disposed on the
activation layer 120, and a gate electrode 140 may be disposed on
the first insulating layer 130.
[0063] The first insulating layer 130 may include at least one
insulating film selected from SiO.sub.2, SiN.sub.x, SiON,
Al.sub.2O.sub.3, TiO.sub.2, HfO.sub.2, ZrO.sub.2, BST, and PZT in
the form of a single layer or multiple layers. The first insulating
layer 130 may be an inorganic insulating film.
[0064] The gate electrode 140 may include aluminum (Al), platinum
(Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au),
nickel (Ni), neodymium (Nd), iridium (Ir), and chromium (Cr),
lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti),
tungsten (W), copper (Cu), or any combination thereof, in the form
of a single layer or multiple layers. The gate electrode 140 may be
connected to a gate line through which an electrical signal is
applied thereto.
[0065] The first conductive layer 160 and/or a second conductive
layer 161 may be disposed on the gate electrode 140 with a second
insulating layer 150 therebetween. The first conductive layer 160
and/or the second conductive layer 161 may be electrically
connected to the activation layer 120 through contact holes formed
in the second insulating layer 150 and the first insulating layer
130.
[0066] The first conductive layer 160 may include aluminum (Al),
platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold
(Au), nickel (Ni), neodymium (Nd), iridium (Ir), and chromium(Cr),
lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti),
tungsten (W), copper (Cu), or any combination thereof, in the form
of a single layer or multiple layers. For example, the first
conductive layer 160 may have a three-layered Mo/Al/Mo, Mo/Al/Ti,
or Ti/Al/Ti structure. In an embodiment, the first conductive layer
160 may include a Mo/Al/Ti structure. The composition and structure
of the second conductive layer 161 may be understood by referring
to the description of the first conductive layer 160.
[0067] The first insulating pattern 170 may be disposed on the
second insulating layer 150.
[0068] In one embodiment, the first insulating pattern 170 may
include a fluorine compound.
[0069] In one embodiment, the concentration of the fluorine
compound may be reduced from a first surface of the first
insulating pattern 170 to a second surface of the first insulating
pattern 170, wherein the first surface faces the second
surface.
[0070] The first insulating pattern 170 may be formed from a
preliminary first insulating pattern and developing the same with
an alkaline solution containing a nitrogen compound. A residual
amount of the nitrogen compound may remain in the first insulating
pattern 170, which may reduce the lifespan of a display apparatus.
To minimize residual nitrogen compounds, a treatment is performed
thereon with a solution containing HF. Due to the HF used in the
treatment, fluorine compounds derived from HF may be included in
the first insulating pattern 170. Although the amount of the
fluorine compound is not limited, the amount of the fluorine
compound included therein may be substantially zero or a relatively
small amount. Although the amount of the nitrogen compound is not
limited, the amount of the nitrogen compound included therein may
be substantially zero or a relatively small amount.
[0071] For example, the amount of the fluorine compound in the
first insulating pattern 170 may be less than about 1 wt %.
[0072] In one or more embodiments, the amount of the fluorine
compound in the first insulating pattern 170 may be less than or
equal to about 0.5 wt %.
[0073] In one embodiment, the first insulating pattern 170 may
further include a nitrogen compound.
[0074] For example, the amount of the nitrogen compound in the
first insulating pattern 170 may be less than about 1 wt %.
[0075] In one or more embodiments, the amount of the nitrogen
compound in the first insulating pattern 170 may be less than or
equal to about 0.5 wt %.
[0076] In one embodiment, the concentration of the nitrogen
compound may be reduced from a first surface of the first
insulating pattern 170 to the other a second surface of the first
insulating pattern 170, wherein the first surface faces the second
surface.
[0077] As described above, since the fluorine compound is derived
from the HF contained in the solution used for the treatment, the
concentration of the fluorine compound may be the highest on the
surface of the first insulating pattern 170 which is in direct
contact with the solution. In one embodiment, the concentration of
the fluorine compound may be reduced from a first surface of the
first insulating pattern 170 to a second surface of the first
insulating pattern 170, wherein the first surface faces the second
surface. The second surface of the first insulating pattern 170 may
be in contact with the first conductive layer 160.
[0078] In one embodiment, the first insulating pattern 170 may not
include the nitrogen compound. Herein, the absence of the nitrogen
compound may indicate that the nitrogen compound is included in the
first insulating pattern 170 in an amount that is less than the
detection limit of detection equipment.
[0079] The nitrogen compound may be represented by Formula 1:
NR.sub.11R.sub.12R.sub.13OH <Formula 1>
[0080] In Formula 1, R.sub.11 to R.sub.13 may each independently be
selected from hydrogen, a substituted or unsubstituted
C.sub.1-C.sub.20 alkyl group, a substituted or unsubstituted
C.sub.6-C.sub.30 aryl group, and a substituted or unsubstituted
C.sub.7-C.sub.30 aralkyl group.
[0081] For example, R.sub.11 to R.sub.13 in Formula 1 may each
independently be selected from hydrogen, a methyl group, an ethyl
group, an n-propyl group, an iso-propyl group, an n-butyl group, an
iso-butyl group, a sec-butyl group, a tert-butyl group, and a
benzyl group.
[0082] In one or more embodiments, the nitrogen compound may be
tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide
(TEAH), tetrapropylammonium hydroxide (TPAH), tetrabutylammonium
hydroxide (TBAH), benzyltrimethylammonium hydroxide,
benzyltriethylammonium hydroxide, or any combination thereof.
[0083] The first insulating pattern 170 may further include the
nitrogen compound and a first material, wherein the first material
is different from the fluorine compound and the nitrogen compound.
In an embodiment, the first insulating pattern 170 may consist
essentially of the first material. Herein, the phrase "consist
essentially of the first material" may indicate that the nitrogen
compound and the fluorine compound are included in the first
insulating pattern 170 in amounts that are less than the detection
limit of detection equipment.
[0084] For example, the amount of the first material in the first
insulating pattern 170 may be greater than or equal to about 98 wt
%. In one or more embodiments, the amount of the first material in
the first insulating pattern 170 may be greater than about 99 wt
%.
[0085] The first material may be an alkali soluble polymer. In one
embodiment, the first material may be a siloxane-based polymer, but
embodiments of the disclosure are not limited.
[0086] For example, the first material may include a repeating unit
represented by Formula 2, but embodiments of the disclosure are not
limited:
##STR00001##
[0087] In Formula 2,
[0088] L.sub.21 and L.sub.22 may each independently be
C(R.sub.23)(R.sub.24) or O--Si--O,
[0089] a21 and a22 may each independently be 0, 1, 2, or 3,
[0090] X.sub.21 may be 0 or O--Si--O,
[0091] b21 may be 1, 2, or 3, and
[0092] R.sub.21 to R.sub.24 may each independently be selected from
hydrogen, a hydroxyl group, a substituted or unsubstituted
C.sub.1-C.sub.20 alkyl group, a substituted or unsubstituted
C.sub.3-C.sub.10 cycloalkyl group, a substituted or unsubstituted
C.sub.6-C.sub.30 aryl group, and a substituted or unsubstituted
C.sub.7-C.sub.30 aralkyl group.
[0093] In one embodiment, the first material may have an average
molecular weight of about 1,000 to about 15,000, but embodiments of
the disclosure are not limited thereto. In one embodiment, the
first material may have a weight average molecular weight of about
1,000 to about 10,000.
[0094] As described above, since the nitrogen compound is included
in a developer, the concentration of the nitrogen compound may be
the highest on the surface of a preliminary first insulating
pattern which is in direct contact with the developer. In one
embodiment, the concentration of the nitrogen compound may be
reduced from a first surface of the first insulating pattern 170 to
a second surface of the first insulating pattern 170, where the
first surface faces the second surface. The second surface of the
first insulating pattern 170 may be in contact with the first
conductive layer 160.
[0095] For example, the first insulating pattern 170 may include a
first region and a second region. The second region may be between
the first conductive layer 160 and the first region, and the amount
of the first material in the first region may be greater than the
amount of the first material in the second region.
[0096] In one embodiment, the ratio of the amount of the fluorine
compound in the first region to the amount of the fluorine compound
in the second region may be from about 10:1 to about 10,000:1, but
embodiments of the disclosure are not limited thereto.
[0097] The ratio of the thickness of the first region to the
thickness of the second region may be from about 1:10 to about
1:1,000, but embodiments of the disclosure are not limited. A
surface of the second region may contact the first conductive layer
160.
[0098] In one embodiment, the ratio of the amount of the nitrogen
compound in the first region to the amount of the nitrogen compound
in the second region may be from about 10:1 to about 10,000:1, but
embodiments of the disclosure are not limited thereto.
[0099] The ratio of the thickness of the first region to the
thickness of the second region may be from about 1:10 to about
1:1,000, but embodiments of the disclosure are not limited. The
surface of the second region may contact the first conductive layer
160.
[0100] In one embodiment, the first insulating pattern 170 may have
a first opening that exposes a portion of the first conductive
layer 160, and a pixel electrode 180 may contact the first
conductive layer 160 through the first opening of the first
insulating pattern 170. In one embodiment, the portion of the first
conductive layer 160 exposed by the first opening may include
molybdenum (Mo). In one embodiment, the first conductive layer 160
may have a Mo/Al/Ti structure, and the portion of the first
conductive layer 160 exposed by the first opening may include Mo.
Since Mo has a relatively high resistance to HF (for example,
higher resistance to HF than Ti), even though the first conductive
layer 160 is exposed to HF during the manufacture of the display
apparatus 1, the deterioration of the display apparatus 1 may be
relatively small or absent.
[0101] When an organic light-emitting device OLED is a top emission
type light-emitting device, the pixel electrode 180 may be formed
as a reflective electrode. The reflective electrode may include Ag,
Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or any combination thereof in
the form of a single layer or multiple layers. For example, the
reflective electrode may include a reflective layer including Ag,
Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or any combination thereof, and
a transparent or semi-transparent electrode layer formed on the
reflective layer.
[0102] When the organic light-emitting device OLED is a bottom
emission type light-emitting device, the pixel electrode 180 may
include a transparent material such as ITO, IZO, ZnO, or
In.sub.2O.sub.3, and may be formed as a transparent or
semi-transparent electrode. For example, the pixel electrode 180
may have a stacked structure of ITO/Ag/ITO.
[0103] A second insulating pattern 191 may be disposed on the pixel
electrode 180 and may contact the first insulating pattern 170
outside the pixel electrode 180. The second insulating pattern 191
may have a second opening exposing a portion of the pixel electrode
180, for example, a center portion thereof. As a result, a
light-emitting area is defined in a pixel.
[0104] The second insulating pattern 191 may include a
siloxane-based polymer, an imide polymer, an amide polymer, an
olefin polymer, an acrylic polymer, a phenol polymer, or any
combination thereof.
[0105] In one embodiment, the first insulating pattern 170 may
include the first material, the second insulating pattern 191 may
include a second material, and the first material and the second
material may comprise a same material. In one embodiment, the first
material may be identical to the second material. In one
embodiment, the first material and the second material may each be
a siloxane-based polymer, but embodiments of the disclosure are not
limited. On the cross-section of the display apparatus 1, a
boundary between the first insulating pattern 170 and the second
insulating pattern 191 may be substantially absent or not
observed.
[0106] The organic light-emitting device OLED may include the pixel
electrode 180 disposed on the first insulating pattern 170, an
opposite electrode 210 facing the pixel electrode 180, and a middle
layer 200 between the pixel electrode 180 and the opposite
electrode 210.
[0107] The middle layer 200 includes an emission layer that emits
light, and at least one functional layer selected from a hole
injection layer (HIL), a hole transport layer (HTL), an electron
transport layer (ETL), and an electron injection layer (EIL).
However, the embodiment is not limited thereto, and various other
functional layers may be disposed on the pixel electrode 180.
[0108] The emission layer may be a red emission layer, a green
emission layer, or a blue emission layer. In one or more
embodiments, the emission layer may have a multi-layered structure
in which a red emission layer, a green emission layer, and a blue
emission layer are stacked to emit white light, or may have a
single-layered structure including a red light-emitting material, a
green light-emitting material, and a blue light-emitting
material.
[0109] In one embodiment, the middle layer 200 may be provided only
to an emission area AA by using a mask having an opening
corresponding to the emission area AA of the display apparatus 1,
for example, a fine metal mask (FMM).
[0110] In one or more embodiments, the emission layer of the middle
layer 200 is provided only to the emission area AA by using an FMM
having an opening corresponding to the emission area AA of the
display apparatus 1, and the other functional layers thereof may be
provided to the emission area AA and a non-emission area NAA by
using an open mask.
[0111] The opposite electrode 210 may be disposed on the middle
layer 200. The opposite electrode 210 may be a reflective
electrode, a transparent electrode, or a semi-transparent
electrode. For example, the opposite electrode 210 may include a
metal having a small work function, and may include Li, Ca, LiF/Ca,
LiF/Al, Al, Ag, Mg, or any combination thereof.
[0112] Although not shown in FIG. 2, an opposite substrate may be
further provided on the opposite electrode 210. The opposite
substrate may be understood by referring to the description
provided in connection with the substrate 100.
[0113] Although not shown in FIG. 2, a black matrix BM and a color
filter CF may be disposed on a surface of the opposing substrate
facing the substrate 100. The color filter CF may be arranged to
correspond to the emission area AA of the display apparatus 1. The
black matrix BM may be disposed to correspond to a region other
than the emission area AA of display apparatus 1.
[0114] Although not shown in FIG. 2, a protective layer may be
disposed between the opposite substrate and the opposite electrode
210. The protective layer may include an inorganic film and/or an
organic film in the form of one or more layers.
[0115] Although not shown in FIG. 2, various functional layers may
be further provided on the opposite substrate. For example, a
functional layer may be an anti-reflection layer that minimizes
reflection on the upper surface of the opposite substrate, or an
anti-fouling layer that prevents contamination, such as marks made
by the hands of a user (for example, fingerprints).
[0116] In one or more embodiments, instead of the opposite
substrate, a thin film encapsulation layer may be disposed on the
substrate 100. The thin film encapsulation layer may include an
inorganic encapsulation layer including at least one inorganic
material and an organic encapsulation layer including at least one
organic material. In one or more embodiments, the thin film
encapsulation layer may have a stacked structure of a first
inorganic encapsulation layer/an organic encapsulation layer/a
second inorganic encapsulation layer.
[0117] Hereinafter, a method of manufacturing the display apparatus
1 will be described with reference to FIGS. 3 to 5. FIGS. 3 to 5
are schematic cross-sectional views illustrating a method of
manufacturing the display apparatus 1 according to an
embodiment.
[0118] Referring to FIGS. 3 to 5, a method of manufacturing the
display apparatus 1 according to an embodiment includes: providing
the substrate 100; forming a first conductive layer 160 disposed on
the substrate 100; forming a preliminary first insulating pattern
170A on the first conductive layer 160; forming a first insulating
pattern 170 by developing with a first solution; and treating the
first insulating pattern 170 with a second solution, wherein the
first solution includes a nitrogen compound and the second solution
includes HF.
[0119] For example, the first conductive layer 160 may be formed by
a dry process. Materials included in the first conductive layer 160
are the same as described above.
[0120] For example, the preliminary first insulating pattern 170A
may be formed by spin coating or screen printing a composition
including the first material.
[0121] In one embodiment, the preliminary first insulating pattern
170A may be exposed through a mask having an opening prior to the
development using the first solution. As a light source used for
the exposure, a low pressure mercury lamp, a high pressure mercury
lamp, an ultra high pressure mercury lamp, a metal halide lamp, an
argon gas laser, etc. may be used, and ultraviolet rays, an X-ray,
an electron beam, etc. may also be used. The exposure intensity
depends on the type of components included in the preliminary first
insulating pattern 170A, the mixed ratio of the components, and a
dry-film thickness thereof. For example, the exposure intensity may
be from about 10 mW/cm.sup.3 to about 50 mW/cm.sup.3 (by a 365 nm
sensor), and the irradiation time may be from about 5 seconds to
about 1 minute, but embodiments of the disclosure are not limited
thereto.
[0122] The developing is performed using the first solution to form
the first insulating pattern 170. The nitrogen compound in the
first solution may be understood to be the same as described above,
and may be an alkaline aqueous solution. The amount of the nitrogen
compound in the first solution may be from about 0.1 wt % to about
5 wt %. In one embodiment, the amount of the nitrogen compound in
the first solution may be from about 2 wt % to about 3 wt %.
However, embodiments of the disclosure are not limited thereto.
[0123] The first insulating pattern 170 may be cured. The curing
method may be thermosetting or photocuring, and is not specifically
limited thereto. In one embodiment, the first insulating pattern
170 may be thermally cured at about 200.degree. C. to about
270.degree. C. By curing the first insulating pattern 170, the heat
resistance, light resistance, adhesion, crack resistance, chemical
resistance, strength, storage stability, and the like of the first
insulating pattern 170 may be improved.
[0124] In one embodiment, a residue may be removed by dry etching.
When the first insulating pattern 170 is formed by developing using
the first solution, the first insulating pattern 170 may be left
undesirably on the first conductive layer 160. Dry etching may be
performed to remove the residues that may remain on the first
conductive layer 160. Dry etching may be performed using oxygen
(O.sub.2) gas or CF.sub.4 gas, but embodiments of the disclosure
are not limited.
[0125] The second solution may be used for a treatment. Since the
treatment is performed using the second solution, the first
insulating pattern 170 may not include the nitrogen compound, or
the amount of the nitrogen compound in the first insulating pattern
may be less than about 1 wt %. As a result, the deterioration of
the display apparatus 1 when the treatment is performed with the
second solution may be relatively lower than that when the
treatment with the second solution is not performed.
[0126] In one embodiment, when the display apparatus 1 is treated
with the second solution, the lifespan thereof may be increased to
at least twice that of the display apparatus 1 when the treatment
using the second solution is not performed. The HF of the second
solution may inhibit a hydrogen bond that may be formed between the
first material and the nitrogen compound in the first insulating
pattern 170. As a result, the concentration of the nitrogen
compound in the first insulating pattern 170 may be lowered. As an
example, when the preliminary first insulating pattern 170A is a
siloxane-based polymer, the surface of the preliminary first
insulating pattern 170A may have an OH group. When the
siloxane-based polymer is treated with the first solution including
a nitrogen compound having an OH group such as TMAH, a hydrogen
bond may be formed between the OH group of the siloxane-based
polymer and the OH group of TMAH. When the resultant structure is
treated with the second solution containing HF, the hydrogen bond
may be inhibited, and accordingly, the concentration of the
nitrogen compound in the first insulating pattern 170 may be
lowered.
[0127] For example, the second solution may include a buffer oxide
etchant (BOE), but embodiments of the disclosure are not limited
thereto.
[0128] In one embodiment, the method may further include, prior to
the treating, forming the pixel electrode 180 that is disposed on
the first insulating pattern 170 and is electrically connected to
the first conductive layer 160. In this embodiment, since the first
conductive layer 160 is not substantially exposed to the second
solution, the material included in the first conductive layer 160
is not limited.
[0129] In one embodiment, the method may further include, after the
treating, forming the pixel electrode 180 that is disposed on the
first insulating pattern 170 and is electrically connected to the
first conductive layer 160. In this embodiment, since a portion of
the first conductive layer 160 is exposed to the second solution,
the material included in the first conductive layer 160 may have a
relatively high resistance to HF. In one embodiment, the portion of
the first conductive layer 160 exposed by the first opening may
include molybdenum (Mo).
[0130] The display apparatus 1 may be embodied as an electronic
device 1000, such as a mobile phone, a video phone, a Smartphone, a
smart pad, a smart watch, a tablet PC, a laptop computer, a
computer monitor, a television, a digital broadcasting terminal, a
personal digital assistant (PDA), a portable multimedia player
(PMP), a head mounted display (HMD), a vehicle navigation
apparatus, or the like.
[0131] FIG. 6 is a schematic block diagram showing the structure of
the electronic device 1000 according to an embodiment; and FIGS. 7A
and 7B are schematic perspective views showing an electronic device
1000 according to an embodiment of the disclosure.
[0132] Referring to FIG. 6, the electronic device 1000 may include
a processor 1010, a memory apparatus 1020, a storage apparatus
1030, an input/output apparatus 1040, a power supply 1050, and a
display apparatus 1060. The display apparatus 1060 may correspond
to the display apparatus 1 of FIG. 1. The electronic device 1000
may further include various ports that communicate with a video
card, a sound card, a memory card, a USB apparatus, or the like, or
that are capable of communicating with other systems.
[0133] In one embodiment, as shown in FIG. 7A, the electronic
device 1000 may be implemented as a television. In one embodiment,
as shown in FIG. 7B, the electronic device 1000 may be implemented
as a smartphone. However, these are illustrative examples of the
electronic device 1000, and embodiments of the disclosure are not
limited thereto.
[0134] According to various embodiments of the disclosure, a
display apparatus that is capable of preventing or reducing the
deterioration of image quality during a manufacturing process or
use and a method of manufacturing the display apparatus are
provided.
[0135] However, the above-described effects are an example, and the
effects of the embodiments will be described in detail with
reference to the following description.
[0136] It should be understood that embodiments described herein
should be considered in a descriptive sense only and not for
purposes of limitation. Descriptions of features or aspects within
each embodiment should typically be considered as available for
other similar features or aspects in other embodiments. While one
or more embodiments have been described with reference to the
figures, it will be understood by those of ordinary skill in the
art that various changes in form and details may be made therein
without departing from the spirit and scope as defined by the
following claims.
* * * * *