U.S. patent application number 16/452311 was filed with the patent office on 2020-11-26 for structure of memory device and fabrication method thereof.
This patent application is currently assigned to United Microelectronics Corp.. The applicant listed for this patent is United Microelectronics Corp.. Invention is credited to Zhiguo Li, Chi Ren, Liang Yi.
Application Number | 20200373436 16/452311 |
Document ID | / |
Family ID | 1000004157202 |
Filed Date | 2020-11-26 |
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United States Patent
Application |
20200373436 |
Kind Code |
A1 |
Yi; Liang ; et al. |
November 26, 2020 |
STRUCTURE OF MEMORY DEVICE AND FABRICATION METHOD THEREOF
Abstract
A structure of a memory device and a fabrication method thereof
are provided. The structure of the memory device includes a
tunneling layer disposed on a substrate. A first
oxide/nitride/oxide (ONO) layer is disposed on the substrate
abutting to the tunneling layer. A floating gate is disposed on the
tunneling layer, wherein a side portion of the floating gate is
also disposed on the first ONO layer. A second ONO layer is
disposed on the floating gate. A control gate is disposed on the
second ONO layer. An isolation layer is disposed on first sidewalls
of the floating gate and sidewalls of the control gate. An erase
gate is disposed on the first ONO layer, wherein the erase gate is
isolated from the floating gate and the control gate by the
isolation layer.
Inventors: |
Yi; Liang; (Singapore,
SG) ; Li; Zhiguo; (Singapore, SG) ; Ren;
Chi; (Singapore, SG) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
United Microelectronics Corp. |
Hsinchu |
|
TW |
|
|
Assignee: |
United Microelectronics
Corp.
Hsinchu
TW
|
Family ID: |
1000004157202 |
Appl. No.: |
16/452311 |
Filed: |
June 25, 2019 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 29/7887 20130101;
H01L 29/66833 20130101; H01L 29/66825 20130101; H01L 29/42328
20130101; H01L 29/7923 20130101; H01L 29/42344 20130101 |
International
Class: |
H01L 29/792 20060101
H01L029/792; H01L 29/788 20060101 H01L029/788; H01L 29/423 20060101
H01L029/423; H01L 29/66 20060101 H01L029/66 |
Foreign Application Data
Date |
Code |
Application Number |
May 20, 2019 |
CN |
201910418713.2 |
Claims
1. A structure of a memory device, comprising: a tunneling layer,
disposed on a substrate; a first oxide/nitride/oxide (ONO) layer,
disposed on the substrate abutting to the tunneling layer; a
floating gate, disposed on the tunneling layer, wherein a side
portion of the floating gate is also disposed on the first ONO
layer; a second ONO layer, disposed on the floating gate; a control
gate, disposed on the second ONO layer; an isolation layer,
disposed on first sidewalls of the floating gate and sidewalls of
the control gate; and an erase gate, disposed on the first ONO
layer, wherein the erase gate is isolated from the floating gate
and the control gate by the isolation layer.
2. The structure of the memory device according to claim 1, further
comprising a vertical dielectric layer on second sidewalls of the
side portion of the floating gate, wherein the second sidewalls
abut to a shallow trench isolation structure and are merged with
the first ONO layer.
3. The structure of the memory device according to claim 2, wherein
the vertical dielectric layer occupies a space to reduce a width of
the floating gate.
4. The structure of the memory device according to claim 2, wherein
the vertical dielectric layer comprises an oxide layer and a
nitride layer stacked on the second sidewalls.
5. The structure of the memory device according to claim 1, wherein
the isolation layer comprises a first portion disposed on the first
sidewalls of the floating gate and a second portion disposed on the
sidewalls of the control gate.
6. The structure of the memory device according to claim 5, wherein
the first portion of the isolation layer is an oxide layer, and the
second portion of the isolation layer is a third ONO layer.
7. The structure of the memory device according to claim 1, wherein
the control gate does not completely cover over the side portion of
the floating gate.
8. The structure of the memory device according to claim 7, wherein
the erase gate comprises a protruding portion at a top region,
covering over the side portion of the floating gate and isolated by
a portion of the isolation layer.
9. The structure of the memory device according to claim 1, wherein
the substrate comprises: active lines extending in a first
direction; and shallow trench isolation lines to isolate the active
lines, wherein the control gate is a control gate line and the
erase gate is an erase gate line, and the control gate line and the
erase gate line extend in a second direction perpendicular to the
first direction.
10. The structure of the memory device according to claim 1,
wherein the substrate comprises a P-type well region and an N-type
well region in the P-type well region, wherein the floating gate
covers over the P-type well region and the N-type well region, and
the erase gate covers over the N-type well region.
11. A method of fabricating a memory device, comprising: forming a
tunneling layer on a substrate; forming a first oxide/nitride/oxide
(ONO) layer on the substrate abutting to the tunneling layer;
forming a floating gate on the tunneling layer, wherein a side
portion of the floating gate is also disposed on the first ONO
layer; forming a second ONO layer on the floating gate; forming a
control gate on the second ONO layer; forming an isolation layer on
first sidewalls of the floating gate and sidewalls of the control
gate; and forming an erase gate on the first ONO layer, wherein the
erase gate is isolated from the floating gate and the control gate
by the isolation layer.
12. The method of fabricating the memory device according to claim
11, further comprising: forming a vertical dielectric layer on
second sidewalls of the side portion of the floating gate, wherein
the second sidewalls abut to a shallow trench isolation structure
and are merged with the first ONO layer.
13. The method of fabricating the memory device according to claim
12, wherein the vertical dielectric layer occupies a space to
reduce a width of the floating gate.
14. The method of fabricating the memory device according to claim
12, wherein the vertical dielectric layer comprises an oxide layer
and a nitride layer stacked on the second sidewalls.
15. The method of fabricating the memory device according to claim
11, wherein the formed isolation layer comprises a first portion
disposed on the first sidewalls of the floating gate and a second
portion disposed on the sidewalls of the control gate.
16. The method of fabricating the memory device according to claim
15, wherein the first portion of the isolation layer is an oxide
layer, and the second portion of the isolation layer is a third ONO
layer.
17. The method of fabricating the memory device according to claim
11, wherein the control gate does not completely cover over the
side portion of the floating gate.
18. The method of fabricating memory device according to claim 17,
wherein the erase gate comprises a protruding portion at a top
region, covering over the side portion of the floating gate and
isolated by a portion of the isolation layer.
19. The method of fabricating the memory device according to claim
11, wherein the formed substrate comprises: active lines extending
in a first direction; and shallow trench isolation lines to isolate
the active lines, wherein the control gate is a control gate line
and the erase gate is an erase gate line, and the control gate line
and the erase gate line extend in a second direction perpendicular
to the first direction.
20. The method of fabricating the memory device according to claim
11, wherein the substrate comprises a P-type well region and an
N-type well region in the P-type well region, wherein the floating
gate covers over the P-type well region and the N-type well region,
and the erase gate covers over the N-type well region.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims the priority benefit of Chinese
patent application serial no. 201910418713.2, filed on May 20,
2019. The entirety of the above-mentioned patent application is
hereby incorporated by reference herein and made a part of this
specification.
BACKGROUND OF THE INVENTION
1. Field of the Invention
[0002] The present invention relates to a semiconductor fabrication
technology, and more particularly to a structure of a memory device
and a fabrication method thereof.
2. Description of Related Art
[0003] A non-volatile memory is almost a necessity in digital
electronic products. Digital electronic products such as computers,
mobile phones, cameras, and video recorders are also indispensable
products in daily life. Therefore, the non-volatile memory is
generally required.
[0004] The non-volatile memory is, for example, a flash memory
including a control gate and a floating gate. Since the data stored
in the memory is frequently changed according to actual operations,
in addition to the operations of writing and reading, the operation
of erasing data is often performed. Therefore, the efficiency of
erasing data also affects the overall performance of the
memory.
[0005] The structure of the flash memory is also continuing to be
developed in order to improve the overall performance of the
memory.
SUMMARY OF THE INVENTION
[0006] The present invention provides a structure of a memory
device and a fabrication method thereof. The memory device is a
structure based on a structure including a control gate and a
floating gate, which can reduce the capacitance value between the
floating gate and an erase gate and increase the capacitance value
between the floating gate and a substrate, thereby improving the
efficiency of erasing data.
[0007] In one embodiment, the present invention provides a
structure of a memory device, including a tunneling layer disposed
on a substrate. A first oxide-nitride-oxide (ONO) layer is disposed
on the substrate abutting to the tunneling layer. A floating gate
is disposed on the tunneling layer, wherein a side portion of the
floating gate is also disposed on the first ONO layer. A second ONO
layer is disposed on the floating gate. A control gate is disposed
on the second ONO layer. An isolation layer is disposed on first
sidewalls of the floating gate and sidewalls of the control gate.
An erase gate is disposed on the first ONO layer, wherein the erase
gate is isolated from the floating gate and the control gate by the
isolation layer.
[0008] In one embodiment, the structure of the memory device
further includes a vertical dielectric layer on second sidewalls of
the side portion of the floating gate, wherein the second sidewalls
abut to a shallow trench isolation structure and are merged with
the first ONO layer.
[0009] In one embodiment, for the structure of the memory device,
the vertical dielectric layer occupies a space to reduce a width of
the floating gate.
[0010] In one embodiment, for the structure of the memory device,
the vertical dielectric layer includes an oxide layer and a nitride
layer stacked on the second sidewalls.
[0011] In one embodiment, for the structure of the memory device,
the isolation layer includes a first portion disposed on the first
sidewalls of the floating gate and a second portion disposed on the
sidewalls of the control gate.
[0012] In one embodiment, for the structure of the memory device,
the first portion of the isolation layer is an oxide layer, and the
second portion of the isolation layer is a third ONO layer.
[0013] In one embodiment, for the structure of the memory device,
the control gate does not completely cover over the side portion of
the floating gate.
[0014] In one embodiment, for the structure of the memory device,
the erase gate includes a protruding portion at a top region,
covering over the side portion of the floating gate and isolated by
a portion of the isolation layer.
[0015] In one embodiment, for the structure of the memory device,
the substrate includes: active lines extending in a first
direction; and shallow trench isolation lines to isolate the active
lines. The control gate is a control gate line and the erase gate
is an erase gate line, and the control gate and the erase gate
extend in a second direction perpendicular to the first
direction.
[0016] In one embodiment, for the structure of the memory device,
the substrate includes a P-type well region and an N-type well
region in the P-type well region, wherein the floating gate covers
over the P-type well region and the N-type well region, and the
erase gate covers over the N-type well region.
[0017] In one embodiment, the present invention also provides a
method of fabricating a memory device, including: a tunneling layer
is formed on a substrate. The method further includes that a first
oxide/nitride/oxide (ONO) layer abutting to the tunneling layer is
formed on the substrate. A floating gate is formed on the tunneling
layer, wherein a side portion of the floating gate is also disposed
on the first ONO layer. A second ONO layer is formed on the
floating gate. A control gate is formed on the second ONO layer. An
isolation layer is formed on first sidewalls of the floating gate
and sidewalls of the control gate. An erase gate is formed on the
first ONO layer, wherein the erase gate is isolated from the
floating gate and the control gate by the isolation layer.
[0018] In one embodiment, the method of fabricating the memory
device further includes that a vertical dielectric layer is formed
on second sidewalls of the side portion of the floating gate. The
second sidewalls abut to a shallow trench isolation structure and
are merged with the first ONO layer.
[0019] In one embodiment, for the method of fabricating the memory
device, the vertical dielectric layer occupies a space to reduce a
width of the floating gate.
[0020] In one embodiment, for the method of fabricating the memory
device, the vertical dielectric layer includes an oxide layer and a
nitride layer stacked on the second sidewalls.
[0021] In one embodiment, for the method of fabricating the memory
device, the formed isolation layer includes a first portion
disposed on the first sidewalls of the floating gate and a second
portion disposed on the sidewalls of the control gate.
[0022] In one embodiment, for the method of fabricating the memory
device, the first portion of the isolation layer is an oxide layer,
and the second portion of the isolation layer is a third ONO
layer.
[0023] In one embodiment, for the method of fabricating the memory
device, the control gate does not completely cover over the side
portion of the floating gate.
[0024] In one embodiment, for the method of fabricating the memory
device, the erase gate includes a protruding portion at a top
region, covering over the side portion of the floating gate and
isolated by a portion of the isolation layer.
[0025] In one embodiment, for the method of fabricating the memory
device, the formed substrate includes: active lines extending in a
first direction; and shallow trench isolation lines to isolate the
active lines. The control gate is a control gate line and the erase
gate is an erase gate line, and the control gate and the erase gate
extend in a second direction perpendicular to the first
direction.
[0026] In one embodiment, for the method of fabricating the memory
device, the substrate includes a P-type well region and an N-type
well region in the P-type well region, wherein the floating gate
covers over the P-type well region and the N-type well region, and
the erase gate covers over the N-type well region.
BRIEF DESCRIPTION OF THE DRAWINGS
[0027] The accompanying drawings are included to provide a further
understanding of the present invention. The accompanying drawings
are incorporated into and constitute a part of this specification.
The accompanying drawings illustrate the embodiments of the present
invention, and serve to explain the principles of the present
invention together with the description.
[0028] FIG. 1A is a layout view of a memory device in accordance
with the present invention.
[0029] FIG. 1B is a cross-sectional view of the memory device in
accordance with the present invention taken along cutting line A-A'
of FIG. 1A.
[0030] FIG. 2 is a layout view of a memory device in accordance
with one embodiment of the present invention.
[0031] FIG. 3 is a cross-sectional and three-dimensional view of
the memory device 2 taken along cutting line I-I' of FIG. 2 in
accordance with one embodiment of the present invention.
[0032] FIG. 4 is a top view of a floating gate of a memory device
in accordance with one embodiment of the present invention.
[0033] FIG. 5 is a cross-sectional view of the memory device taken
along cutting line II-II' of FIG. 2 in accordance with one
embodiment of the present invention.
[0034] FIG. 6 is a cross-sectional view of the memory device taken
along the cutting line I-I' of FIG. 2 in accordance with one
embodiment of the present invention.
[0035] FIG. 7 is a partial enlarged view of a memory device in
accordance with one embodiment of the present invention.
[0036] FIG. 8 is a schematic view showing the capacitive effect of
a memory device between a floating gate and a substrate in FIG. 7
in accordance with one embodiment of the present invention.
[0037] FIG. 9 is a flow chart of a method of fabricating a memory
device in accordance with one embodiment of the present
invention.
DESCRIPTION OF THE EMBODIMENTS
[0038] The present invention relates to a structure of a memory
device and a fabrication method thereof. In one embodiment, the
memory device is a structure based on a structure including a
control gate and a floating gate. The structure of the memory
device provided by the present invention can reduce the capacitance
value between the floating gate and the erase gate and increase the
capacitance value between the floating gate and the substrate,
thereby improving the efficiency of erasing data.
[0039] The present invention is illustrated by the following
embodiments, but the present invention is not limited to the
embodiments. These embodiments can also be combined with each
other.
[0040] The present invention proposes to look into the possible
drawbacks of the structure of the memory before proposing
improvements to the structure of the memory device.
[0041] FIG. 1A is a drawing, schematically illustrating a layout
view of a memory device in accordance with the present invention.
FIG. 1B is a drawing, schematically illustrating a cross-sectional
view of the memory device in accordance with the present invention
taken along cutting line A-A' of FIG. 1A. According to FIG. 1A and
FIG. 1B, memory cells of the memory device 60 are distributed in
arrays. From the top view layout, a plurality of active lines 80 on
a substrate 100 extends in a first direction as an active region of
a component. The memory cells of the memory device 60 are
fabricated on the region of the active lines 80 of the substrate
100. A plurality of shallow trench isolation structures 70 is also
formed on the substrate 100 to isolate the active lines 80. The
memory device 60 further includes a floating gate 112, a control
gate 114, and an erase gate 110, which are also linear structures
extending in a second direction that is perpendicular to the first
direction. The control gate 114 and the erase gate 110 of FIG. 1B
correspond to the control gates 114 and CG and the erase gates 110
and EG of FIG. 1A. Furthermore, word lines 108 and WL are on the
other side of the control gates 114 and CG. The intersection region
of the active line 80 and the control gates 114 and CG has the
floating gate 112 and constitutes a memory cell of the memory
device 60.
[0042] As can be seen more clearly from FIG. 1B, the region of the
active line 80 of the substrate 100 is formed with a P-type well
region which is a doped region of the substrate 100. In the P-type
well region, an N-type well region 104 is formed corresponding to
the erase gate 100, and in the N-type well region 104, an N-type
doped region 105 with a large concentration is formed in the
substrate 100 below the erase gate 110, and is used as a selection
line. An N-type doped region 102 to be connected to a bit line is
also formed at both ends of the active line.
[0043] An oxide layer 102 is first formed on the substrate. A
portion of the oxide layer 102 corresponding to the floating gate
112 also serves as a tunneling layer. On the other hand, the oxide
layer 106 also provides the floating gate 112 and a gate insulation
layer of the substrate 100 opposite to the erase gate 100. The
floating gate 112 and the control gate 114 are stacked on the oxide
layer 102. An oxide/nitride/oxide (ONO) layer 116 is arranged
between the floating gate 112 and the control gate 114. The gate
insulation layer between the floating gate 112 and the substrate
100 is provided by a portion of the oxide layer 102. The sidewalls
of the control gate 114 comprise an isolation layer 118, such as an
ONO structure, to isolate the upper portion of the erase gate 110.
The gate insulation layer between the erase gate 110 and the
substrate 100 is also provided by a portion of the oxide layer 102.
The lower portion of the erase gate 110 is also isolated by the
oxide layer 120 from the floating gate 112. As needed, the top of
the control gate 114 also comprises an oxide layer and a nitride
layer as a protective mask layer 124. The sidewalls of the mask
layer 124 in the present embodiment are covered by the oxide layer.
However, in another embodiment, the sidewalls of the mask layer 124
may also extend from the isolation layer 118, also being an ONO
structure. The present invention is not limited to the embodiments
provided.
[0044] For the structure of the memory device of FIG. 1B. In the
data erasing operation, a capacitor C.sub.eg-fg exists between the
erase gate 110 and the floating gate 112, and another capacitor
C.sub.fg-sub also exists between the floating gate 112 and the
substrate 100.
[0045] The present invention looks into, for example, the structure
of FIG. 1B and finds that the smaller the capacitance value of the
capacitor C.sub.eg-fg, the better the erasing efficiency. In
addition, the larger the capacitance value of the capacitor
C.sub.fg-sub, the better the erasing efficiency.
[0046] In one embodiment, the present invention further provides a
further design of the memory device to at least reduce the
capacitance value of the capacitor C.sub.eg-fg and increase the
capacitance value of the capacitor C.sub.fg-sub. In this way, at
least the performance of the memory device on the erasing operation
can be improved.
[0047] FIG. 2 is a drawing, schematically illustrating a layout
view of the memory device in accordance with one embodiment of the
present invention. According to FIG. 2, the layout of the memory
device is similar to that described in FIG. 1B, but the structure
of the floating gate 112 is further adjusted. In order to be able
to understand the more detailed structure, the cross-sectional
structure corresponding to cutting lines I-I' and II-II' is
described in detail below.
[0048] FIG. 3 is a drawing, schematically illustrating a
cross-sectional and three-dimensional view of the memory device
taken along the cutting line I-I' of FIG. 2 in accordance with one
embodiment of the present invention. According to FIG. 2 and FIG.
3, a plurality of active lines 80 are formed on the substrate 100.
A plurality of shallow trench isolation structures 70 is also
formed on the substrate 100 to isolate the active lines 80. The
active line 80 is a doped region in the substrate 100. An oxide
layer 106 is formed on the active line 80.
[0049] In one embodiment, the basic structure of the floating gate
112, the control gate 114, the erase gate 110, and the like of the
memory device is similar to that of FIG. 1B, and an ONO layer 116
is arranged between the floating gate 112 and the control gate 114.
Parts similar to those of FIG. 1B will be omitted herein. In
addition, other components of the same reference numerals will be
omitted herein.
[0050] The further features of the present invention are described
below in accordance with an embodiment. In the present invention,
an ONO layer 200 is formed between the erase gate 110 and the
substrate 100 to replace a portion of the oxide layer 106. The ONO
layer 200 also extends to the side portion of the floating gate
112. The isolation layer 118 and the isolation layer 120 may be
integrated into two portions of the isolation layer 121 at the
sidewalls of the floating gate 112 and the control gate to achieve
an isolation effect. In one embodiment, the side portion of the
floating gate 112 is, for example, corresponding to the region
covered by the upper portion of the erase gate 110.
[0051] The cutting line II-II' indicated in FIG. 2 is shown in FIG.
3 to pass through the side portion of the floating gate 112, so
that the structural relationship between the ONO layer 200 and the
floating gate 112 is clearly described. The floating gate 112 is
provided corresponding to the region of the memory cell, and is
used for controlling stored charges to conduct the operation on the
memory cell. In other words, the floating gate 112 is not a
linearly extending structure.
[0052] FIG. 4 is a drawing, schematically illustrating a top view
of a floating gate of a memory device in accordance with one
embodiment of the present invention. According to FIG. 4, in one
embodiment, the floating gate 112 is substantially rectangular or
square in geometry as viewed from above. The sidewalls 112B of the
floating gate 112 are protected by an oxide layer 102. However,
since the ONO layer 200 also extends to the side portion of the
floating gate 112, in one embodiment, the other pair of sidewalls
112A of the floating gate 112 are also covered, for example, by the
ONO layer 200. In one embodiment, as shown in FIG. 5, which will be
described later, a dielectric material covering the sidewalls 112A
of the floating gate 112 may generally be a vertical dielectric
layer 202. Since the ONO layer 200 occupies the space, the width of
the subsequently formed floating gate 112 at the side portion is
reduced. Thus, the area between the floating gate 112 and the erase
gate 110 is reduced, and the capacitor C.sub.eg-fg generated by the
relative has a small capacitance value. After the research of the
present invention, the present invention finds that the capacitor
C.sub.eg-fg with a smaller capacitance value is advantageous for
the erasing operation of the memory device. In addition, since the
ONO layer 200 also extends below the floating gate 112, the
capacitance value of the capacitor C.sub.fg-sub is also increased,
which is also advantageous for the erasing operation of the memory
device. Embodiments are provided below to describe the generation
mechanism of the capacitor in more detail.
[0053] FIG. 5 is a drawing, schematically illustrating a
cross-sectional view of the memory device taken along the cutting
line II-II' of FIG. 2 in accordance with one embodiment of the
present invention. According to FIG. 5, in one embodiment, the
floating gate 112 along the cutting line II-II' in FIG. 2 is on the
active line 80 of the substrate. The active line 80 is isolated by
a shallow trench isolation structure 70. The active line 80
comprises the ONO layer 200 thereon. The floating gate 112 is
formed on the ONO layer 200. The upper surface of the floating gate
112 comprises an ONO layer 116 that extends in another direction.
The control gate 114 also extends in the another direction and is
formed on the ONO layer 116.
[0054] In one embodiment, the ONO layer 200 of the present
invention is also formed on the sidewalls 112A of the side portion
of the floating gate 112. The portion of the sidewalls 112A may be
considered as the vertical dielectric layer 202 in terms of general
effect of adjusting the capacitance value. That is, the vertical
dielectric layer 202 may not be an ONO structure as the ONO layer
200. In one embodiment, the vertical dielectric layer 202 may
include, for example, an oxide layer and a nitride layer. The stack
of vertical dielectric layers 202 can be formed correspondingly by
the employed fabricating process. The vertical dielectric layer 202
is formed first, and then the floating gate 112 is filled, so that
the floating gate 112 is surrounded and occupied by the vertical
dielectric layer 202 and thus recessed at the side portion. As the
thickness of the vertical dielectric layer 202 is increased, the
width of the floating gate 112 is reduced, and the capacitance
value generated is also reduced, which is advantageous for the
erasing operation.
[0055] FIG. 6 is a drawing, schematically illustrating a
cross-sectional view of the memory device taken along the cutting
line I-I' of FIG. 2 in accordance with one embodiment of the
present invention. According to FIG. 6, the structure of the memory
device 90 is the same as the cross-sectional structure of the end
face of FIG. 3. In one embodiment, as described above, the sidewall
of the mask layer 124 may be a general oxide layer, and does not
need to extend from the isolation layer 118, or substantially
change the formation of the ONO layer 200 and the vertical
dielectric layer 202. The sidewalls 112B of the side portion of the
floating gate 112 are isolated by the isolation layer 120 from the
lower portion of the erase gate 110.
[0056] In the region 300 indicated, the ONO layer 200 produces a
capacitance effect between the floating gate 112 and the substrate
100.
[0057] FIG. 7 is a drawing, schematically illustrating a partial
enlarged view of a memory device in accordance with one embodiment
of the present invention. FIG. 8 is a drawing, schematically
illustrating a schematic view showing the capacitive effect of the
memory device between the floating gate and the substrate in FIG. 7
in accordance with one embodiment of the present invention.
[0058] According to FIG. 7 and FIG. 8, the ONO layer 200 extends to
the side portion of the floating gate 112 and is located between
the floating gate 112 and the substrate 100 to constitute an
equivalent capacitor 304. In addition, the oxide layer 106 between
the floating gate 112 and the substrate 100 constitutes an
equivalent capacitor 302. The capacitor 302 is connected in
parallel with the capacitor 304. Since the ONO layer 200 provides a
larger average dielectric constant value, a larger capacitance
value is produced. In terms of a circuit, the total capacitance
value of the capacitor C.sub.fg-sub increases, which is
advantageous for the erasing operation.
[0059] Features of the present invention are described below in
terms of a semiconductor fabrication process. FIG. 9 a drawing,
schematically illustrating is a flow chart of a method of
fabricating the memory device in accordance with one embodiment of
the present invention.
[0060] According to FIG. 9, in one embodiment, the present
invention also provides a method of fabricating the memory device,
including: a tunneling layer is formed on a substrate as shown in
step S100. The method further includes step S102 in which a first
oxide/nitride/oxide layer abutting to the tunneling layer is formed
on the substrate. In step S104, a floating gate is formed on the
tunneling layer, wherein a side portion of the floating gate is
also disposed on the first ONO layer. In step S106, a second ONO
layer is formed on the floating gate. In step S108, a control gate
is formed on the second ONO layer. In step S110, an isolation layer
is formed on first sidewalls of the floating gate and sidewalls of
the control gate. In step S112, an erase gate is formed on the
first ONO layer, wherein the erase gate is isolated from the
floating gate and the control gate by the isolation layer.
[0061] In one embodiment, the method of fabricating the memory
device further includes that a vertical dielectric layer 202 is
formed on sidewalls 112A of the side portion of the floating gate
112. The sidewalls 112A abut to a shallow trench isolation
structure 70 and are merged with the ONO layer 200.
[0062] Finally, it should be noted that the above embodiments are
only used to illustrate instead of limiting the technical solutions
of the present invention. Although the present invention has been
described in detail with reference to the foregoing embodiments,
those skilled in the art should understand that the technical
solutions described in the foregoing embodiments may be modified or
equivalently substituted for some or all of the technical features.
These modifications and substitutions do not depart from the scope
of the technical solutions of the embodiments of the present
invention.
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