U.S. patent application number 16/370066 was filed with the patent office on 2020-10-01 for secondary electron detection efficiency.
The applicant listed for this patent is FEI Company. Invention is credited to Jim MCGINN, Peter TVAROZEK, Qinsong Steve WANG, Amir WEISS.
Application Number | 20200312608 16/370066 |
Document ID | / |
Family ID | 1000004032208 |
Filed Date | 2020-10-01 |
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United States Patent
Application |
20200312608 |
Kind Code |
A1 |
WANG; Qinsong Steve ; et
al. |
October 1, 2020 |
SECONDARY ELECTRON DETECTION EFFICIENCY
Abstract
Systems and devices for improving the efficiency of secondary
electron detection in charged particle beam systems include a
charged particle detector, a first elongate member coupled with the
charged particle detector, and a second elongate member coupled
with the charged particle detector. The first elongate member and
the second elongate member each extend away from the charged
particle detector. The system also includes at least one drawing
member that is coupled with the first elongate member.
Additionally, at least one electrical connection point is arranged
to supply at least one bias voltage to the first elongate member,
the second elongate member, and the drawing member. The drawing
member is configured to generate an electromagnetic field that
applies a drawing force that draws charged particles away from the
charged particle source, and/or reduces the amount of charged
particles from the charged particle source that strike the charged
particle tool.
Inventors: |
WANG; Qinsong Steve;
(Fremont, CA) ; MCGINN; Jim; (Portland, OR)
; TVAROZEK; Peter; (Fremont, CA) ; WEISS;
Amir; (Sunnyvale, CA) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
FEI Company |
Hillsboro |
OR |
US |
|
|
Family ID: |
1000004032208 |
Appl. No.: |
16/370066 |
Filed: |
March 29, 2019 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01J 37/21 20130101;
H01J 2237/2448 20130101; H01J 37/244 20130101 |
International
Class: |
H01J 37/244 20060101
H01J037/244; H01J 37/21 20060101 H01J037/21 |
Claims
1. A charged particle detector assembly comprising: a charged
particle detector; a first elongate member coupled with the charged
particle detector; a second elongate member coupled with the
charged particle detector, wherein the first elongate member and
the second elongate member extend away from the charged particle
detector; a drawing member coupled with the first elongate member,
wherein the drawing member extends away from the first elongate
member and toward the second elongate member, and comprises a first
side that is coupled to the first elongate member and a second side
that is opposite the first side and coupled to the second elongate
member; and at least one electrical connection point arranged to
supply at least one bias voltage to the first elongate member, the
second elongate member, and the drawing member.
2. The charged particle detector assembly of claim 1, wherein the
charged particle detector assembly is adapted for use with a
charged particle tool having a platform for supporting a sample and
wherein the charged particle detector is arranged proximate to the
platform.
3. The charged particle detector assembly of claim 2, wherein when
the at least one bias voltage is supplied to the first elongate
member, the second elongate member, and the drawing member: the
first elongate member and the second elongate member are configured
to introduce a collecting electric field proximate the sample
supported on the platform that guides charged particles emitted by
the sample to the charged particle detector; and the drawing member
is configured to introduce a drawing electric field proximate the
sample supported on the platform that guides the charged particles
emitted by the sample away from a surface of the sample and into a
stronger region of the collecting electric field.
4. The charged particle detector assembly of claim 3, wherein the
charged particle tool comprises a focused charged beam system, and
the charged particles are emitted by the sample based on a focused
charged particle beam being incident on the sample.
5. The charged particle detector assembly of claim 2, further
comprising a conductive projection member that is electrically
connected to the drawing member, wherein the conductive projection
member extends from the drawing member and toward the sample.
6. The charged particle detector assembly of claim 2, wherein the
drawing member is coupled with the first elongate member via an
attachment member, wherein the attachment member comprises a first
surface that is coupled to the first elongate member and a second
surface that is coupled to the drawing member, and wherein the
second surface of the attachment member is more proximate to the
sample than the first surface of the attachment member.
7. The charged particle detector assembly of claim 1, wherein the
drawing member comprises a first side that is coupled to the first
elongate member and a second side that is opposite the first side
and coupled to the second elongate member.
8. The charged particle detector assembly of claim 1, wherein the
drawing member is electrically connected to the first elongate
member, and electrically insulated from the second elongate
member.
9. The charged particle detector assembly of claim 1, wherein the
drawing member comprises a first side that is coupled to the first
elongate member and a second side that is opposite the first side,
and wherein the first side is more proximate to the charged
particle detector than the second side.
10. The charged particle detector assembly of claim 1, wherein the
drawing member comprises a first side that is coupled to the first
elongate member, a second side that is opposite the first side, and
a midpoint between the first side and the second side, and wherein
the midpoint is less proximate to the charged particle detector
than the first side or the second side.
11. The charged particle detector assembly of claim 1, wherein the
first elongate member comprises a first end that is coupled with
the charged particle detector and a second end that is opposite the
first end, and wherein the drawing member is coupled with the
second end of the first elongate member.
12. The charged particle detector assembly of claim 1, wherein the
drawing member is a first drawing member, and the charged particle
detector assembly further comprising a second drawing member that
is coupled with the first elongate member and the second elongate
member, and wherein the second drawing member extends is positioned
between the first drawing member and the charged particle
detector.
13. The charged particle detector assembly of claim 1, wherein the
drawing member is a first drawing member, and the charged particle
detector assembly further comprising a second drawing member
coupled with the second elongate member, wherein the second drawing
member extends away from the second elongate member and toward the
drawing member.
14. The charged particle detector assembly of claim 1, wherein the
drawing member is a wire.
15. The charged particle detector assembly of claim 1, wherein the
drawing member is a plate.
16. The charged particle detector assembly of claim 1, wherein the
charged particle detector assembly further comprises a path
stabilization member coupled with the first elongate member,
wherein the path stabilization member extends away from the first
elongate member and toward the second elongate member, and the at
least one electrical connection point is further arranged to supply
the at least one bias voltage to the path stabilization member.
17. The charged particle detector assembly of claim 16, wherein the
path stabilization member is coupled to the first elongate member
at a location on the first elongate member between the charged
particle detector and the location where the drawing member is
coupled to the first elongate member.
18. The charged particle detector assembly of claim 16, wherein
when the at least one bias voltage is applied to each of the first
elongate member, the second elongate member, the drawing member,
and the path stabilization member: the first elongate member, the
second elongate member, and the drawing member generate a first
electromagnetic field that defines a charged particle flow path
within which a majority of charged particles travel from a sample
to the charged particle detector, and the path stabilization member
generates a second electromagnetic field that applies a force that
increases a number of charged particles that remain within the
charged particle flow path as the charged particles travel from the
sample and to the charged particle detector.
19. The charged particle detector assembly of claim 18, wherein the
charged particle flow path passes through a first location between
the first elongate member, the second elongate member, the drawing
member, and the path stabilization member, and a second location
between the first elongate member, the second elongate member, the
path stabilization member, and the charged particle detector.
20. A charged particle guide assembly comprising: a first elongate
member configured to be coupled with a charged particle detector; a
second elongate member configured to be coupled with the charged
particle detector, wherein when the first elongate member and the
second elongate member are coupled with the charged particle
detector the first elongate member and the second elongate member
extend away from the charged particle detector; a plurality of
drawing members coupled between the first and second elongate
members, wherein at least one drawing member of the plurality of
drawing members: comprises a first side that is coupled to the
first elongate member and a second side that is opposite the first
side and coupled to the second elongate member; and is electrically
connected to at least one of the first elongate member and extends
from the first elongate member toward the second elongate member;
and at least one electrical connection point arranged to supply at
least one bias voltage to the first elongate member, the second
elongate member, and the drawing member.
Description
BACKGROUND OF THE INVENTION
[0001] Charged particle beam systems, such as focused ion beam
(FIB) systems are presently used in many areas of science and
industry. For example, in the semiconductor industry, FIB systems
are used for integrated circuit probe point creation, circuit
editing, failure analysis, and numerous other applications. To
perform these functions well, it is important that FIB systems have
imaging capabilities to enable users to view a grounded sample
(i.e., sample, integrated circuit, etc.) that the FIB system is
being used to interface with. To achieve such imaging capabilities,
some current FIB systems include a secondary electron detector
(SED) that utilizes the secondary electrons emitted as a result of
the ion beam being incident on the grounded sample to obtain
high-resolution images of the grounded sample.
[0002] As the processes and components within contemporary
integrated circuits continue to get smaller, the imaging
capabilities of the FIB systems need to be continuously modified to
improve the image resolution of the obtained images. One method of
achieving high imaging resolution is to reduce ion beam current,
However, reducing the ion beam current results in a reduced
quantity of secondary electrons, which limits the resolution of
images obtained by the SED. Accordingly, new methods, devices, and
systems are desired to improve the resolution of images obtained by
the SED by increasing the efficiency at which SED detectors convert
the secondary electrons into images.
SUMMARY OF THE INVENTION
[0003] Systems and devices for improving the efficiency of
secondary electron detection in charged particle beam systems
include a charged particle detector, a first elongate member
coupled with the charged particle detector, and a second elongate
member coupled with the charged particle detector. The first
elongate member and the second elongate member each extend away
from the charged particle detector. The system also includes at
least one drawing member that is coupled with the first elongate
member. Additionally, at least one electrical connection point is
arranged to supply at least one bias voltage to the first elongate
member, the second elongate member, and the drawing member. The
drawing member extends away from the first elongate member and
toward the second elongate member and is configured to generate an
electromagnetic field that applies a drawing force that draws
charged particles away from the charged particle source, and/or
reduces the amount of charged particles from the charged particle
source that strike the charged particle tool.
[0004] Moreover, the electromagnetic field generated by the first
elongate member, the second elongate members, and the drawing
member defines a charged particle flow path within which a majority
of charged particles travel from the sample to the charged particle
detector. The systems and device may also optionally include at
least one path stabilization member that is coupled with the first
elongate member at a location between the charged particle detector
and the drawing member. The path stabilization member extends away
from the first elongate member and toward the second elongate
member, and the at least one electrical connection point is further
arranged to supply the at least one bias voltage to the path
stabilization member. When the bias voltage is applied to the path
stabilization member, an electromagnetic field is generated that
applies a stabilization force that increases the number of charged
particles that remain within a charged particle flow path as the
charged particles travel from the sample and to the charged
particle detector.
BRIEF DESCRIPTION OF THE DRAWINGS
[0005] The detailed description is described with reference to the
accompanying figures. In the figures, the left-most digit(s) of a
reference number identify the figure in which the reference number
first appears. The same reference numbers in different figures
indicates similar or identical items.
[0006] FIG. 1 illustrates an example prior art charged particle
beam system.
[0007] FIG. 2 is a schematic view of example charged particle
detector assemblies for improving the efficiency of charged
particle detection in charged particle beam systems.
[0008] FIG. 3 illustrates an example charged particle beam system
that includes an improved charged particle guide according to the
present disclosure.
[0009] FIG. 4 is a schematic view of an example improved charged
particle guide that includes a drawing member coupled with the
second elongate member.
[0010] FIG. 5 is a schematic view of an example improved charged
particle guide that includes a cylindrical drawing member coupled
with the elongate members.
[0011] FIG. 6 is a schematic view of an example improved charged
particle guide that includes two symmetrical drawing members
coupled to separate elongate members.
[0012] FIG. 7 is a schematic view of an example improved charged
particle guide that planar drawing member coupled with the elongate
members.
[0013] FIG. 8 is a schematic view of an example improved charged
particle guide that drawing member coupled with an end of the
elongate members.
[0014] FIG. 9 is a schematic view of an example improved charged
particle guide having a curvilinear drawing member pointing.
[0015] FIG. 10 is a schematic view of an example improved charged
particle guide having a chevron shaped drawing member pointing away
from a charged particle detector.
[0016] FIG. 11 is a schematic view of an example improved charged
particle guide having a chevron shaped drawing member pointing
toward a charged particle detector.
[0017] FIG. 12 is a schematic view of an example improved charged
particle guide having a chevron shaped drawing member pointing
toward a sample.
[0018] FIG. 13 is a schematic view of an example improved charged
particle guide that includes a drawing member with a conductive
projection member.
[0019] FIG. 14 is a schematic view of an example improved charged
particle guide that includes a drawing member coupled with the
elongate members via one or more attachment members.
[0020] FIG. 15 is a schematic view of an example improved charged
particle guide that a drawing member coupled with the elongate
members via one or more attachment members and having a projection
member.
[0021] FIG. 16 is a schematic view of an example improved charged
particle guide that includes a drawing member having a projection
member.
[0022] FIG. 17 is a schematic view of an example improved charged
particle guide that includes a stabilization member.
[0023] FIG. 18 illustrates the detection of charged particles
emitted from within a hole by a prior art charged particle beam
system.
[0024] FIG. 19 illustrates the detection of charged particles
emitted from within a hole by a charged particle beam system that
includes an example improved charged particle guide.
[0025] Like reference numerals refer to corresponding parts
throughout the several views of the drawings.
DETAILED DESCRIPTION OF EMBODIMENTS
[0026] Systems and devices for improving the efficiency of charged
particle detection in charged particle beam systems are disclosed.
More specifically, the disclosure includes systems and devices that
improve upon prior charged particle guide technology, enabling the
generation of high-resolution images of a sample that are otherwise
unable to be acquired due to hardware limitations. For example, the
technical improvements of the charged particle detector assemblies
disclosed herein improve the efficiency of charged particle
detection by increasing the number of charged particles that are
drawn toward the detector, reducing the number of collisions
between charged particles and the sample and/or other structures,
and stabilizing the region of the charged particle detector upon
which the charged particles are incident.
[0027] Generally, in the figures, elements that are likely to be
included in a given example are illustrated in solid lines, while
elements that are optional to a given example are illustrated in
broken lines. However, elements that are illustrated in solid lines
are not essential to all examples of the present disclosure, and an
element shown in solid lines may be omitted from a particular
example without departing from the scope of the present
disclosure.
[0028] FIG. 1 is an illustration of an example prior art charged
particle beam system 100 that includes a charged particle beam tool
102, a chemistry injection tool 104, and a charged particle
detection system 106. The charged particle beam tool 102 includes a
column 108 that provides a focused charged particle beam 110
directed towards a sample 112 positioned on a platform 114. To
provide the focused charged particle beam 110, the column 108 can
include an ion source, optics, and other structure. For example,
the column 108 may be a coaxial photon-ion column, which is
configured to provide a focused ion beam. The chemistry injection
tool 104 is shown as including a chemistry injector tube 116
configured to provide a gas from a chemical repository 118 to the
sample 112.
[0029] FIG. 1 illustrates a charged particle detection system 106
for detecting charged particles 120 emitted as a result of the
focused charged particle beam 110 being incident on the sample 112.
Charged particle detection system 106 includes a charged particle
detector 122 and a charged particle guide 124. A bias voltage is
applied to the charged particle guide 124 that causes the charged
particle guide 124 to generate an electric field that applies
forces to charged particles 120 and guides the charged particles
120 to the charged particle detector 122. For example, application
of a focused ion beam to a sample may also cause emission of
positively charged secondary ions. To configure the charged
particle guide 124 to collect positively charged secondary ions, a
negative bias, at a much higher voltage than for collection of
secondary electrons, is applied to the charged particle guide 124.
In another example, application of an electron beam tool causes the
emission of secondary electrons. A positive bias can be applied to
the charged particle guide 124 to attract and guide the secondary
electrons to the charged particle detector 122.
[0030] In this way, the electric field generated by the charged
particle guide 124 defines a charged particle flow path 126 within
which a majority of the charged particles 120 travel from the
sample 112 to the charged particle detector 122. Unfortunately, in
prior art charged particle beam systems 100 many charged particles
120 do not reach the charged particle detector 122 for many
reasons, such as the charged particles 120 not being drawn into the
charged particle flow path 126, striking the column 108 (e.g. at
location 128), striking the platform 114 (e.g. at location 130),
striking portions of the sample 112, and striking the charged
particle guide 124.
[0031] FIGS. 2-17 and 19 provide examples of charged particle beam
systems, charged particle detection systems, improved charged
particle guide devices, and/or features thereof according to the
present disclosure. Elements that serve similar, or at least
substantially similar, purpose are labeled with like numbers in
each of FIGS. 2-17 and 19, and these elements may not be discussed
in detail herein with reference to each of FIGS. 2-17 and 19.
Similarly, all elements may not be labeled in each of FIGS. 2-17
and 19, but reference numerals associated therewith may be utilized
herein for consistency. Elements, components, and/or features that
are discussed herein with reference to one or more of FIGS. 2-17
and 19 may be included in and/or utilized with any of FIGS. 2-17
and 19 without departing from the scope of the present
disclosure.
[0032] FIG. 2 is a schematic view of example charged particle
detector assemblies 200 for improving the efficiency of charged
particle detection in charged particle beam systems. Example
charged particle detector assemblies 200 include a charged particle
detector 202 and an improved charged particle guide 204. According
to the present disclosure, the charged particle detector 202 is a
sensor device configured to detect charged particles emitted by a
sample in response to a focused charged particle beam (e.g., a
focused ion beam, an electron beam, etc.) being incident on the
sample. The sample can be a biological sample, material sample,
device under test (DUT) (e.g., a semiconductor device, an
integrated circuit, a transistor component thereof, etc.), or other
types of sample. In an embodiment, the charged particle detector
202 can be a secondary electron detector (SED) that is configured
to detect secondary electrons that are emitted as a result of a
focused ion beam (e.g., a gallium ion beam, helium ion beam, neon
ion beam, krypton ion beam, etc.) being incident upon an integrated
circuit. For example, the charged particle detector 202 can include
an Everhart-Thornley type design using scintillator.
[0033] In FIG. 2, the improved charged particle guide 204 is
illustrated as being composed of a first elongate member 206 and a
second elongate member 208. In some embodiments, the improved
charged particle guide 204 may have fewer elongate members or may
have one or more additional elongate members. In an embodiment,
each elongate member is a wire or rod that is at least partially
composed of an electrically conductive material, such as stainless
steel, nickel, chromium, platinum, palladium, alloys, etc.
[0034] The first elongate member 206 and the second elongate member
208 include a first end 210 and a second end 212 that is opposite
the first end 210. In some embodiments, the first end 210 may be
positioned adjacent to the sample being examined with a charged
particle beam system and/or the path through which the focused
charged beam passes before it is incident on the sample. For
example, the first end 210 of each of the first elongate member 206
and the second elongate member 208 may be positioned within 1 mm of
the path through which a focused ion beam passes through before it
is incident on a DUT. Alternatively, the first elongate member 206
and the second elongate member 208 may be trimmed back so that the
first end 210 is a further distance removed from the path of the
focused charged beam (e.g., 0.5 mm, 1 mm, 1.905 mm, 2 mm, 5 mm from
the path of the focused charged beam). The second end 212 can be
mechanically coupled to the charged particle detector 202 via a
coupling body 214. For example, FIG. 2 shows the first elongate
member 206 and the second elongate member 208 as being welded to a
ring structure which is adapted to be fastened around the charged
particle detector 202.
[0035] When a bias voltage is applied to the first elongate member
206 and the second elongate member 208, an electric field is
created that attracts charged particles from a charged particle
source and toward the charged particle detector 202. For example,
the electric field can apply an attractive force to attract
secondary electrons emitted when a focused charged particle beam is
incident on a sample towards the charged particle detector 202. In
this way, the electric field generated by the first elongate member
206 and the second elongate member 208 defines a charged particle
flow path within which a majority of the charged particles emitted
as a result of a focused charged beam being incident on the sample
travel from the sample to the charged particle detector 202. The
voltage applied to one or more of the elongate members may vary
depending on the geometry of the charged particle guide 204 and/or
charged particle beam system.
[0036] FIG. 2 further illustrates the charged particle guide 204
including a drawing member 216. The drawing member 216 is shown as
being coupled with each of the first elongate member 206 and the
second elongate member 208. FIG. 2 further shows the charged
particle guide 204 as optionally including one or more additional
drawing members (i.e., 218, 220, 222, and 224). In various
embodiments, individual drawing members 216-224 can be a wire, a
rod, a bar, a plate, a sheet, a piece of tape, or a combination
thereof. The individual drawing members 216-224 are electrically
conductive. For example, drawing member 216 is shown as an
electrically conductive rod that projects radially outward from a
first coupling point on the first elongate member 206 and to a
second coupling point on the second elongate member 208. In another
example, a drawing member can be a portion of conductive tape that
is welded and/or adhesively coupled to one or more elongate
structures. The drawing members 216-224 can be at least partially
composed of an electrically conductive material, such as stainless
steel, nickel, chromium, platinum, palladium, alloys, etc.
Individual ones of drawing members 216-224 can be composed of the
same material and/or collection of materials as the elongate
members, or they may be composed of a different material and/or
collection of materials.
[0037] In FIG. 2, drawing member 216 is shown as a straight rod.
However, in other embodiments, drawing member 216 or any of the
additional drawing members 218-224 may be curvilinear, arcuate,
and/or have one or more angles, corners, or bends. For example, a
drawing member may have a midpoint segment that comprises a bend,
such that the drawing member has the overall shape of a chevron
with the point of the chevron leading in a direction toward the
charged particle detector 202, away from the charged particle
detector 202, toward the sample, toward the charged particle
source, or in another direction. Alternatively, or in addition, a
drawing member may be curvilinear such that the distance from the
focused charge beam and/or location where the focused charge beam
is incident on the sample is uniform across the drawing member.
[0038] When a bias voltage is applied to the drawing member 216
and/or the additional drawing members, an electric field is created
that attracts charged particles away from the surface of the sample
from which the charged particles are being emitted and/or
reflected. For example, the electric field generated by the drawing
member 216 can apply a drawing force to secondary electrons emitted
by a DUT in a direction away from the surface of the DUT and/or
towards the drawing member 216. In various embodiments, the drawing
member 216 and/or additional drawing members can be electrically
connected to one or both of the first elongate member 206 and the
second elongate member 208. In such an embodiment, the bias voltage
applied to the drawing member 216 and/or additional drawing members
is the same as the bias voltage applied to one or both of the first
elongate member 206 and the second elongate member 208.
Alternatively, or in addition, individual ones of the drawing
members can be electrically insulated from one or more elongate
members and/or other drawing members. In such an embodiment, a
different bias voltage may be applied to the insulated drawing
member than to the one or more elongate members and/or other
drawing members from which it is insulated.
[0039] The drawing member 216 and the additional drawing members
are rigidly coupled (e.g., via welding, adhesion, a mechanical
coupling, etc.) to the first elongate member 206 and/or the second
elongate member 208. For example, the drawing member 216 and
optional additional drawing member 218 are illustrated in FIG. 2 as
being directly coupled to each of the first elongate member 206 and
the second elongate member 208. In such an arrangement, the drawing
member 216 can act as a conductive bridge that electrically
connects the first elongate member 206 to the second elongate
member 208. The drawing member 216 is shown as being coupled at a
location proximate to the first end 210 of the elongate members
(e.g., at a location within 0.05 mm, 1 mm, 2 mm, and/or 5 mm of the
first end 210). In various embodiments, the locations at which the
drawing member 216 and/or the additional drawing members are
coupled to the elongate members can be selected so that the
electric field created by the drawing member 216 and/or the
additional drawing members applies a more optimal drawing force to
charged particles emitted as a result of a focused charged beam
being incident on the grounded sample. That is, the drawing member
216 and/or the additional drawing members may be coupled to the
elongate members at locations that improve the efficiency that such
charged particles are attracted to the charged particle detector
202. For example, in an embodiment where the elongate members are
trimmed back such that the first ends 210 are 1.905 mm removed from
the path of the focused charged beam, the drawing member 216 may be
coupled at a location on the elongate members that is 2.35 mm from
the path of the focused charged beam. In another embodiment, the
drawing member 216 may be coupled to the first end 210 of the
elongate structures.
[0040] In FIG. 2 additional drawing member 220 is shown as being
coupled to only the first elongate member 206 and additional
drawing member 222 is shown as being coupled to only the second
elongate member 208. Each of the drawing members 216-224 are
illustrated as projecting radially outward from corresponding
elongate members in a direction perpendicular to an axis of the
corresponding elongate members. For example, the additional drawing
member 220 and the additional drawing member 222 are illustrated as
each projecting from a corresponding elongate member symmetrically
toward each other. However, in other embodiments, one or more of
the drawing members 216-224 may project outward from a
corresponding elongate member at an angle towards or away from the
charged particle detector 202. In another embodiment according to
the present disclosure, one or more drawing member 216-224 may be a
component element of the first elongate member 206 and/or the
second elongate member 208. For example, in some embodiments, one
or more elongate members and the drawing member 216 may be
manufactured as a single continuous structure, where the drawing
member 216 is an arm that projects from the one or more elongate
members.
[0041] FIG. 2 further illustrates optional additional drawing
member 224 as being coupled to the first elongate member 206 and
the second elongate member 208 by attachment members 226. This
allows the additional drawing member 224 to be positioned closer
than the first end 210 of the elongate structures to the sample
being examined with a charged particle beam system, the platform
upon which the sample rests, and/or the path through which the
focused charged beam passes before it is incident on the sample.
Alternatively, the attachment members 226 may allow the additional
drawing member 224 to be positioned in a different location so that
the electric field generated by the drawing member 224 provides a
more optimal drawing force to the charged particles emitted as a
result of a focused charged beam being incident on the grounded
sample. While additional drawing member 224 is shown as being
coupled to each of the first elongate member 206 and the second
elongate member 208, in some embodiments, the additional drawing
member 224 can be coupled to a single elongate member via a single
attachment member 226. The attachment members 226 can be made of
the same material/combination of materials as the drawing member
216, the elongate members, and/or both. In some embodiments, one or
more of the attachment members 226 may be at least partially
electrically conductive, so as to form an electrical bridge between
the drawing member 224 and at least one elongate member.
[0042] Additionally, FIG. 2 further illustrates the example charged
particle guide 204 as optionally including a projection member 228.
While projection member 228 is shown as being coupled to and/or an
integrated component of additional drawing member 224, in other
embodiments, the projection member 228 can be coupled to and/or an
integrated component of drawing member 216. Projection member 228
can be an electrically conductive cone, cylinder, horn, wire or
other type of projection. The projection member 228 extends away
from the drawing member to which it is coupled, and toward one or
more of the sample being examined with a charged particle beam
system, the platform upon which the sample rests, and/or the path
through which the focused charged beam passes before it is incident
on the sample.
[0043] Charged particle guide 204 optionally include one or more
stabilization members 230 coupled to one or more elongate members.
For example, FIG. 2 shows two stabilization members 230 that are
each coupled to the first elongate member 206 and the second
elongate member 208. The one or more stabilization members 230 are
coupled between the drawing member 216 and the charged particle
detector 202. As noted above, the elongate members generate an
electric field that creates a charged particle flow path within
which a majority of the charged particles emitted as a result of a
focused charged beam being incident on the sample travel from the
sample to the charged particle detector 202. When a bias voltage is
applied to the one or more stabilization members 230 an electric
field is created that applies a stabilization force to charged
particles that causes an increased number of charged particles to
travel within the flow path. That is, the stabilization force
influences the charged particles to travel within the flow path,
thus limiting the number of electrons that collide with a portion
of a charged particle beam tool, that collide with the sample, that
collide a platform that supports the sample, that collide with
elongate member 206 and/or 208, or whose momentum carries them
outside of the flow path. For example, the electric field generated
by the one or more stabilization members 230 can apply a
stabilization force to secondary electrons emitted by a DUT that
modifies the momentum of the secondary electrons such that a larger
number of the secondary electrons travel within the flow path to
the charged particle detector 202.
[0044] FIG. 3 is an illustration of an example charged particle
beam system 300 that includes charged particle beam tool 102,
chemistry injection tool 104, and a charged particle detector
assembly 200 that includes a charged particle detector 202 and an
improved charged particle guide 204. When one or more bias voltages
are applied to the improved charged particle guide 204 an electric
field is created that attracts charged particles 120 emitted as a
result of a focused charged beam 110 being incident on the sample
112 travel from the sample 122 to the charged particle detector
202.
[0045] Specifically, when one or more bias voltages are applied to
the improved charged particle guide 204 the first elongate member
206 and the second elongate member 208 create an electric field
that applies an attractive force to attract charged particles 120
emitted when a focused charged particle beam 110 is incident on
sample 112 towards the charged particle detector 202. This
attractive force causes a portion of the charged particles to
travel from the sample 112 to the charged particle detector 202
within flow path 302. Additionally, when the one or more bias
voltages are applied to the drawing member 216 and/or the
additional drawing member 218, an electric field is generated that
applies a drawing force to the charged particles 120 in a direction
away from the surface of sample 112 and/or towards the drawing
members 216 and 218. In this way, the drawing member 216 and/or the
additional drawing member 218 cause an increased number of the
charged particles 120 to flow toward the charged particle detector
202 within the flow path 302.
[0046] Moreover, when the one or more bias voltages are applied to
the optional stabilization members 230, an electric field is
generated that applies a stabilization force to the charged
particles 120 that modifies the momentum of the charged particles
120 such that fewer charged particles 120 collide with the column
108, collide with the sample 112, collide a platform 114, or travel
outside of the flow path 302. This causes an increased number of
charged particles 120 to travel within the flow path 302 to the
charged particle detector 202, which in turn enhances the
resolution of the images that can be obtained by the charged
particle detector 202.
[0047] In various embodiments of the improved charged particle
guide 204, the positions of the drawing member 216, additional
drawing member 218, and one or more stabilization members 230, may
be selected such that the drawing force and the stabilization force
cause an optimal amount of charged particles 120 to flow from the
sample 112 to the charged particle detector 202. For example, in a
certain embodiment, the drawing member 216 is positioned 1.905 mm
from the centerline 304 of the charged particle beam tool 102,
while the additional drawing member 218 is positioned 2.64 mm from
the centerline 304. In such an embodiment, a first stabilization
member 230 may be positioned 7.992 mm from the centerline 304, a
second stabilization member 230 may be positioned 8.964 mm from the
centerline 304, and a third stabilization member 230 may be
positioned 9.983 mm from the centerline 304. The optimal
positioning of and bias voltages to be applied to each of the
drawing member 216, additional drawing member 218, and one or more
stabilization members 230 will differ depending on the geometry
(e.g., shape, scale, positioning, orientations, size, etc.) and
characteristics (e.g., type of charged particle tool, current of
the focused charged particle beam, etc.) charged particle beam
system 300.
[0048] FIGS. 4-17 are schematic diagrams of example particle guide
devices according to the present disclosure. However, the invention
of the present disclosure is not limited to the example embodiments
shown in FIGS. 4-17. Rather, they are merely introduced to show
examples of how the elements, components, and/or features described
in the present disclosure may be implemented. Accordingly, a person
having skill in the art would understand that the elements
components, and/or features that are discussed herein with
reference to one or more of FIGS. 2-17 may be included in and/or
utilized with any of FIGS. 4-17 without departing from the scope of
the present disclosure.
[0049] Specifically, FIGS. 4-17 illustrate an example improved
charged particle guide 204 that may optionally be coupled to a
charged particle detector 202. FIG. 4 illustrates an example
improved charged particle guide 400 that includes a drawing member
402 coupled with the second elongate member 208. The drawing member
402 extends away from the second elongate member 208 and toward the
first elongate member 206. FIG. 4 further illustrates that the
drawing member 402 may optionally extend 404 so that it is also
physically coupled to the first elongate member 206. Two optional
stabilization members 406 are shown as being coupled to the
elongate members at positions between the drawing member 402 and
the charged particle detector 202.
[0050] FIG. 5 illustrates an example improved charged particle
guide 500 that includes a cylindrical drawing member 502 coupled
with the elongate members. FIG. 5 further illustrates that the
multiple optional cylindrical drawing members 504 coupled to the
first elongate members. An optional stabilization member 506 is
shown as being coupled to the elongate members at a position
between the drawing members 502 and 504 and the charged particle
detector 202.
[0051] FIG. 6 illustrates an example improved charged particle
guide 600 that includes two symmetrical drawing members coupled to
separate elongate members. Drawing member 602 is coupled to the
first elongate structure 206 and drawing member 604 is coupled to
the second elongate structure 208. While drawing members 602 and
604 are shown as extending towards each other, in other embodiments
the drawing members 602 and 604 may extend in other directions. For
example, the drawing members 602 and 604 may extend partially or
directly toward the charged particle detector 202, a sample, a
focused charge beam. FIG. 6 further illustrates multiple optional
pairs of drawing members 606 coupled to the elongate members.
[0052] FIG. 7 illustrates an example improved charged particle
guide 700 that planar drawing member coupled with the elongate
members. Drawing member 702 is a conductive plate that includes a
first side that is coupled to the first elongate structure 206 and
a second side opposite the first side that is coupled to the second
elongate structure 208. The drawing member 702 may be a conductive
plate, a conductive sheet, a piece of conductive tape, etc. In FIG.
7 the drawing member 702 is shown as being rectilinear. However, in
some embodiments, the drawing member 702 may have curved sides 704
and/or one or more cutouts 706.
[0053] FIG. 8 illustrates an example improved charged particle
guide 800 that drawing member coupled with an end of the elongate
members. Drawing member 802 is coupled to an end of each of the
first elongate member 206 and the second elongate member 208 that
is opposite the charged particle detector 202. FIG. 8 further
illustrates an optional additional drawing member 804 and an
optional stabilization member 806. FIG. 9 illustrates an example
improved charged particle guide 900 having a curvilinear drawing
member pointing. Drawing member 902 is illustrated as having a
curved shape.
[0054] FIGS. 10-12 illustrate example improved charged particle
guides having a chevron shaped drawing member. FIG. 10 illustrates
an example improved charged particle guide 1000 having a chevron
shaped drawing member 1100 pointing away from a charged particle
detector. Drawing member 1002 has a bend 1004 that causes the
drawing member 1002 to have a substantially chevron shape. FIG. 11
illustrates an example improved charged particle guide 1100 having
a chevron shaped drawing member 1102 pointing toward a charged
particle detector. Drawing member 1102 has a bend 1104 that causes
the drawing member 1102 to have a substantially chevron shape. FIG.
12 illustrates an example improved charged particle guide 1200
having a chevron shaped drawing member 1202 pointing toward a
sample. Drawing member 1202 has a bend 1204 that causes the drawing
member 1102 to have a substantially chevron shape. In other
embodiments, the drawing members 1002, 1102, and 1202 may have one
or more additional bends. FIG. 11 further illustrates an optional
additional drawing member 1106.
[0055] FIG. 13 illustrates an example improved charged particle
guide 1300 that includes a drawing member 1302 with a conductive
projection member 1304. The projection member 1302 is coupled to
and/or a component element of the drawing member 1302. The
projection member 1302 can extend from the drawing member 1302
towards a sample, a focused charge beam, or in a different
direction.
[0056] FIG. 14 illustrates an example improved charged particle
guide 1400 that includes a drawing member 1402 coupled with the
elongate members via one or more attachment members. The drawing
member 1402 extends away from the second elongate member 208 and
toward the first elongate member 206. This allows the drawing
member 1402 to be positioned so that the electric field it
generates provides a more optimal drawing force. While drawing
member 1402 is shown as being coupled to each of the first elongate
member 206 via an attachment member 1404 and the second elongate
member 208 via a different attachment member 1404, in some
embodiments, the additional drawing member 1402 can be coupled to a
single elongate member via a single attachment member 1404. The
attachment members 1404 can be made of the same
material/combination of materials as the drawing member 1402, the
elongate members, and/or both. In some embodiments, one or more of
the attachment members 1404 may be at least partially electrically
conductive, so as to form an electrical bridge between the drawing
member 1402 and at least one elongate member. FIG. 14 further
illustrates an optional drawing member 1406 coupled to the elongate
members.
[0057] FIG. 15 illustrates an example improved charged particle
guide 1500 that a drawing member 1502 coupled with the elongate
members via one or more attachment members 1504 and having a
projection member 1506. FIG. 16 illustrates an example improved
charged particle guide 1600 that includes a drawing member 1602
having a projection member 1604. Drawing member 1602 is shown as
having two bends and extending from the elongate members and toward
a sample being examined with a charged particle beam system, the
platform upon which such a sample rests, and/or the path through
which the focused charged beam passes before it is incident on the
sample. The projection member 1604 is illustrated as a conductive
cone.
[0058] FIG. 17 illustrates an example improved charged particle
guide 1700 that includes a stabilization member 1702. The
stabilization member 1702 coupled to one or more elongate members
and positioned so that the electric field created by the
stabilization member 1702 applies a stabilization force that causes
an increased number of charged particles to travel within a charged
particle source and the charged particle detector 202. FIG. 17
further illustrates a plurality of optional additional
stabilization members 1704 and an optional drawing member 1706
coupled to the elongate members.
[0059] In addition to improving the efficiency that charged
particles emitted by the surface of a sample are detected by a
charged particle detector, the improved charged particle guides 204
disclosed herein also improve the efficiency that charged particles
emitted from within a hole and/or via are detected. FIGS. 18 and 19
illustrate the detection of charged particles emitted from within a
hole by a prior art charged particle beam system, and a charged
particle beam system that includes an example charged particle
guide 204, respectively.
[0060] FIGS. 18 and 19 show a focused charge beam 110 being
directed to mill a high aspect ratio hole 1802 into a sample 112.
For example, the focused charge beam 110 may be a focused ion beam
that is being directed to mill a hole 1802 in an integrated circuit
1804. The integrated circuit 1804 is shown as including a metal
layer 1806 and an upper layer 1808 through which the focused charge
beam 110 is being used to mill a hole through to reach the metal
layer 1806. In such a milling operation, the "end point" occurs
when the focused charge beam 110 is incident on the metal layer
1806. When the focused charge beam 110 is incident on the metal
layer 1806, the focused charge beam 110 causes a quantity of
charged particles 120 to be emitted. Detection of this quantity of
electrons 120 can be used as evidence of the milling operation's
"end point" having occurred, signaling that the milling operation
should be stopped.
[0061] FIG. 18 is a diagram illustrating the detection of charged
particles 120 emitted from within a hole by a prior art charged
particle beam system 1800. It can be seen that, while some of the
charged particles 120 are collected by the prior art charged
particle detection system 106, a portion of the charged particles
120 are not detected because they strike the sidewalls 1810 of the
hole 1802. FIG. 19 is a diagram illustrating the detection of
charged particles emitted from within a hole by a charged particle
beam system 1900 that includes an example improved charged particle
guide 204. As can be seen in FIG. 19, the example improved charged
particle guide 204 increases the efficiency that the charged
particles 120 emitted from within the hole 1802 reach the charged
particle detector 202. This is because the electric field created
when a bias voltage is applied to the drawing member 216 applies a
drawing force to the charged particles 120 in a direction away from
the metal layer 1806. This causes the charged particles 120 to move
in a direction more perpendicular to the surface of sample 112
and/or bottom surface of the hole 1802, which reduces the number of
charged particles 120 that strike the sidewalls 1810 of the hole
1802. Because more of the charged particles 120 emitted when the
focused charge beam 110 is incident on the metal layer 1806 reach
and/or are detected by the charged particle detector 202, a
stronger "end point" signal is detected. This allows operators
and/or automated milling systems to more accurately determine when
the milling operation should be stopped.
[0062] As used herein, the term "and/or" placed between a first
entity and a second entity means one of (1) the first entity, (2)
the second entity, and (3) the first entity and the second entity.
Multiple entities listed with "and/or" should be construed in the
same manner, i.e., "one or more" of the entities so conjoined.
Other entities may optionally be present other than the entities
specifically identified by the "and/or" clause, whether related or
unrelated to those entities specifically identified. Thus, as a
non-limiting example, a reference to "A and/or B," when used in
conjunction with open-ended language such as "comprising" may
refer, in one embodiment, to A only (optionally including entities
other than B); in another embodiment, to B only (optionally
including entities other than A); in yet another embodiment, to
both A and B (optionally including other entities). These entities
may refer to elements, actions, structures, steps, operations,
values, and the like.
[0063] As used herein, the phrase "at least one," in reference to a
list of one or more entities should be understood to mean at least
one entity selected from any one or more of the entity in the list
of entities, but not necessarily including at least one of each and
every entity specifically listed within the list of entities and
not excluding any combinations of entities in the list of entities.
This definition also allows that entities may optionally be present
other than the entities specifically identified within the list of
entities to which the phrase "at least one" refers, whether related
or unrelated to those entities specifically identified. Thus, as a
non-limiting example, "at least one of A and B" (or, equivalently,
"at least one of A or B," or, equivalently "at least one of A
and/or B") may refer, in one embodiment, to at least one,
optionally including more than one, A, with no B present (and
optionally including entities other than B); in another embodiment,
to at least one, optionally including more than one, B, with no A
present (and optionally including entities other than A); in yet
another embodiment, to at least one, optionally including more than
one, A, and at least one, optionally including more than one, B
(and optionally including other entities). In other words, the
phrases "at least one," "one or more," and "and/or" are open-ended
expressions that are both conjunctive and disjunctive in operation.
For example, each of the expressions "at least one of A, B and C,"
"at least one of A, B, or C," "one or more of A, B, and C," "one or
more of A, B, or C" and "A, B, and/or C" may mean A alone, B alone,
C alone, A and B together, A and C together, B and C together, A, B
and C together, and optionally any of the above in combination with
at least one other entity.
[0064] As used herein the terms "adapted" and "configured" mean
that the element, component, or other subject matter is designed
and/or intended to perform a given function. Thus, the use of the
terms "adapted" and "configured" should not be construed to mean
that a given element, component, or other subject matter is simply
"capable of" performing a given function but that the element,
component, and/or other subject matter is specifically selected,
created, implemented, utilized, programmed, and/or designed for the
purpose of performing the function. It is also within the scope of
the present disclosure that elements, components, and/or other
recited subject matter that is recited as being adapted to perform
a particular function may additionally or alternatively be
described as being configured to perform that function, and vice
versa.
[0065] As used herein, the phrase, "for example," the phrase, "as
an example," and/or simply the term "example," when used with
reference to one or more components, features, details, structures,
and/or embodiments according to the present disclosure, are
intended to convey that the described component, feature, detail,
structure, and/or embodiment is an example of components, features,
details, structures, and/or embodiments according to the present
disclosure. Thus, the described component, feature, detail,
structure, and/or embodiment is not intended to be limiting,
required, or exclusive/exhaustive; and other components, features,
details, structures, and/or embodiments, including structurally
and/or functionally similar and/or equivalent components, features,
details, structures, and/or embodiments, are also within the scope
of the present disclosure.
[0066] Examples of inventive subject matter according to the
present disclosure are described in the following enumerated
paragraphs.
[0067] A1. A charged particle detector assembly comprising: a
charged particle detector; a first elongate member coupled with the
charged particle detector; a second elongate member coupled with
the charged particle detector, wherein the first elongate member
and the second elongate member extend away from the charged
particle detector; a drawing member coupled with the first elongate
member, wherein the drawing member extends away from the first
elongate member and toward the second elongate member; and at least
one electrical connection point arranged to supply at least one
bias voltage to the first elongate member, the second elongate
member, and the drawing member.
[0068] A2. The charged particle detector assembly of paragraph A1,
wherein the charged particle detector assembly is adapted for use
with a charged particle tool having a platform for supporting a
sample and wherein the charged particle detector is arranged
proximate to the platform.
[0069] A2.1. The charged particle detector assembly of paragraph
A2, wherein the first elongate member and the second elongate
member are arranged to introduce a collecting electric field
proximate the sample supported on the platform.
[0070] A2.2. The charged particle detector assembly of any of
paragraphs A2-A2.1, wherein the sample is a DUT.
[0071] A2.2.1. The charged particle detector assembly of paragraph
A2.2, wherein the DUT is a semiconductor chip.
[0072] A2.3. The charged particle detector assembly of any of
paragraphs A2-A2.2.1, wherein the sample is a biological
sample.
[0073] A2.4. The charged particle detector assembly of any of
paragraphs A2-A2.3, wherein the sample is a material sample.
[0074] A2.5. The charged particle detector assembly of any of
paragraphs A2-A2.4, wherein the charged particle tool comprises a
focused charged beam system.
[0075] A2.5.1. The charged particle detector assembly of paragraph
A2.5, wherein the focused charged beam system is a focused ion beam
(FIB) system.
[0076] A2.6. The charged particle detector assembly of any of
paragraphs A2-A2.5.1, wherein the charged particles are secondary
electrons.
[0077] A2.6.1. The charged particle detector assembly of paragraph
A2.6, wherein the secondary electrons are emitted by the sample as
a result of a focused charged beam being incident on the
sample.
[0078] A3. The charged particle detector assembly of any of
paragraphs A1-A2.6.1, wherein the first elongate member and the
second elongate member are configured to generate an
electromagnetic field that draws charged particles from a charged
particle source and to the charged particle detector.
[0079] A4. The charged particle detector assembly of any of
paragraphs A1-A3, wherein the drawing member is configured to
generate an electromagnetic field that applies a force that draws
charged particles away from the charged particle source.
[0080] A4.1. The charged particle detector assembly of paragraph
A4, wherein the drawing member is configured to generate an
electromagnetic field that applies a force that reduces the amount
of charged particles from the charged particle source that strike
the charged particle tool.
[0081] A5. The charged particle detector assembly of any of
paragraphs A1-A4.1, wherein the drawing member is a conductive
wire.
[0082] A6. The charged particle detector assembly of any of
paragraphs A1-A5, wherein the drawing member is curvilinear.
[0083] A7. The charged particle detector assembly of any of
paragraphs A1-A6.1, wherein the drawing member is a conductive
plate.
[0084] A7.1. The charged particle detector assembly of paragraph
A7, wherein the drawing member is a conductive tape.
[0085] A8. The charged particle detector assembly of any of
paragraphs A1-A7.1, wherein the first elongate member comprises a
first end that is coupled with the charged particle detector and a
second end that is opposite the first end.
[0086] A8.1. The charged particle detector assembly of paragraph
A8, wherein the drawing member is coupled with the second end.
[0087] A8.2. The charged particle detector assembly of any of
paragraphs A8-A8.1, wherein the drawing member is coupled to the
first elongate member at a location within 0.05 mm, 1 mm, 2 mm,
and/or 5 mm of the second end.
[0088] A9. The charged particle detector assembly of any of
paragraphs A1-A8.2, wherein the drawing member extends radially
outward from the first elongate member.
[0089] A10. The charged particle detector assembly of any of
paragraphs A1-A9, wherein the drawing member comprises a first end
that is coupled to the first elongate member and a second end that
is opposite the first end.
[0090] 10.1. The charged particle detector assembly of paragraph
A10, wherein the second end is more proximate to the charged
particle detector than the first end.
[0091] A10.2. The charged particle detector assembly of paragraph
A10, wherein the first end is more proximate to the charged
particle detector than the second end.
[0092] A10.3. The charged particle detector assembly of any of
paragraphs A10-A10.2, wherein the drawing member further comprises
a midpoint located between the first end and the second end, and
wherein the midpoint is more proximate to the charged particle
detector than the first end or the second end.
[0093] A10.4. The charged particle detector assembly of any of
paragraphs A10-A10.3, wherein the drawing member further comprises
a midpoint located between the first end and the second end, and
wherein the midpoint is less proximate to the charged particle
detector than the first end or the second end.
[0094] A11. The charged particle detector assembly of any of
paragraphs A1-A10.4, wherein the drawing member further extends
from the first elongate member at an angle toward from the charged
particle detector.
[0095] A12. The charged particle detector assembly of any of
paragraphs A1-A11, wherein the drawing member is further coupled
with the second elongate member.
[0096] A13. The charged particle detector assembly of any of
paragraphs A1-A12, wherein the drawing member is a first drawing
member, and the charged particle detector assembly further
comprising a second drawing member.
[0097] A13.1. The charged particle detector assembly of paragraph
A13, wherein the second drawing member is coupled with the second
elongate member, and wherein the second drawing member extends away
from the second elongate member and toward the first elongate
member.
[0098] A13.2. The charged particle detector assembly of any of
paragraphs A13-A13.1, wherein the second drawing member is coupled
with the second elongate member, and wherein the second drawing
member extends away from the second elongate member and toward the
drawing member.
[0099] A13.3. The charged particle detector assembly of any of
paragraphs A13-A13.2, wherein the second drawing member is coupled
with the first elongate member, and wherein the second drawing
member extends away from the first elongate member and toward the
second elongate member.
[0100] A13.4. The charged particle detector assembly of any of
paragraphs A13-A13.3, wherein the at least one electrical
connection point is further arranged to supply the at least one
bias voltage to the second drawing member.
[0101] A14. The charged particle detector assembly of any of
paragraphs A1-A13.4, further comprising a plurality of additional
drawing members coupled with the first elongate member, wherein
each of the additional drawing members extends away from the first
elongate member and toward the second elongate member.
[0102] A14.1. The charged particle detector assembly of paragraph
A14, wherein the first elongate member and the second elongate
member each comprise a wire.
[0103] A15. The charged particle detector assembly of any of
paragraphs A1-A14.1, wherein the drawing member is coupled with the
first elongate member via an attachment member, wherein the
attachment member comprises a first surface that is coupled to the
first elongate member and a second surface that is coupled to the
drawing member, wherein the second surface of the attachment member
is more proximate to a/the sample than the first surface of the
attachment member.
[0104] A16. The charged particle detector assembly of any of
paragraphs A1-A15, wherein the charged particle detector assembly
further comprises a projecting member coupled to the drawing
member, wherein the projecting member extends away from the drawing
member.
[0105] A16.1. The charged particle detector assembly of paragraph
A16, wherein the projecting member extends toward the sample.
[0106] A16.2. The charged particle detector assembly of any of
paragraphs A16-A16.1, wherein the projecting member is a cone.
[0107] A16.3. The charged particle detector assembly of any of
paragraphs A16-A16.2, wherein the projecting member is a wire.
[0108] A17. The charged particle detector assembly of any of
paragraphs A1-A16.3, wherein the charged particle detector assembly
further comprises a path stabilization member coupled with the
first elongate member, wherein the path stabilization member
extends away from the first elongate member and toward the second
elongate member, and the at least one electrical connection point
is further arranged to supply the at least one bias voltage to the
path stabilization member.
[0109] A17.1. The charged particle detector assembly of paragraph
A17.1, wherein the path stabilization member is coupled to the
first elongate member at a location on the first elongate member
between the charged particle detector and the location where the
drawing member is coupled to the first elongate member.
[0110] A17.2. The charged particle detector assembly of any of
paragraphs A17-A17.1, wherein an electromagnetic field generated by
the first elongate member, the second elongate members, and the
drawing member defines a charged particle flow path within which a
majority of the charged particles travel from the sample to the
charged particle detector.
[0111] A17.2.1. The charged particle detector assembly of paragraph
A17.2, wherein the path stabilization member generates an
electromagnetic filed that applies a force that increases the
number of charged particles that remain within the charged particle
flow path as the charged particles travel from the sample and to
the charged particle detector.
[0112] A17.2.2. The charged particle detector assembly of any of
paragraphs A17.2-A17.2.1, wherein the electron flow path passes
through a first location between the first elongate member, the
second elongate member, the drawing member, and the path
stabilization member, and a second location between the first
elongate member, the second elongate member, the path stabilization
member, and the charged particle detector.
[0113] A18. The charged particle detector assembly of any of
paragraphs A1-A17.2.2, wherein the charged particle detector
comprises a secondary electron detector.
[0114] A18.1. The charged particle detector assembly of paragraph
A18, wherein the secondary electron detector comprises a
scintillator.
[0115] A18.1.1. The charged particle detector assembly of paragraph
A18.1, wherein the secondary electron detector comprises a ring
arranged circumferentially about the scintillator, and wherein the
first elongate member, the second elongate member, and the drawing
member are electrically coupled with the ring.
[0116] A18.2. The charged particle detector assembly of any of
paragraphs A18.1-A18.1, wherein the scintillator defines a disk
shape defining an axis.
[0117] A18.2.1. The charged particle detector assembly of paragraph
A18.2, wherein the drawing mechanism extends generally
perpendicular to the axis.
[0118] A18.2.2. The charged particle detector assembly of any of
paragraphs A18.2-A18.2.1, wherein the first elongate member and the
second elongate member are coupled with the ring and each define a
first section extending from the secondary electron detector
generally parallel with the axis of the scintillator.
[0119] A18.2.2.1. The charged particle detector assembly of
paragraph A18.2.2, wherein the first and the second elongate member
each define a second section electrically coupled with the first
section, the second section extending toward the axis of the
scintillator.
[0120] A18.2.2.2. The charged particle detector assembly of any of
paragraphs A18.2.2-A18.2.2.1, wherein first elongate member and the
second elongate member each define a third section electrically
coupled with the second section, the third section extending toward
the axis of the scintillator at less an angle than the second
section.
[0121] A18.2.2.3. The charged particle detector assembly of any of
paragraphs A18.2.2-A18.2.2.2, wherein first elongate member and the
second elongate member each define a fourth section electrically
coupled with the third section, the fourth sections extending
Substantially parallel to each other and further extending at an
angle with respect to the axis of the scintillator.
[0122] A19. The charged particle detector assembly of any of
paragraphs A1-A18.2.2.3, wherein the wire is of a material selected
from the group comprising stainless steel, Ni, Cr, Pd, and Pt.
[0123] A20. The charged particle detector assembly of any of
paragraphs A1-A19, further comprising: at least one additional
elongate member coupled with the charged particle detector, the
first, the second, and the at least one additional elongate member
extending from the charged particle detector, and the at least one
electrical connection point arranged to supply the at least one
bias Voltage to the first, the second, and the at least one
additional elongate member.
[0124] A21. The charged particle detector assembly of any of
paragraphs A1-A20, wherein the first elongate member, the second
elongate member, and the drawing member are electrically insulated
from the charged particle detector.
[0125] A21.1. The charged particle detector assembly of paragraph
21, further comprising a first electrical connection adapted to
supply a first bias Voltage to the charged particle detector and a
second electrical connection adapted to supply a second bias
Voltage to the first elongate member and the second elongate
member.
[0126] A21.1.1. The charged particle detector assembly of paragraph
21.1, wherein the first bias voltage is different than the second
bias Voltage.
[0127] A21.1.2. The charged particle detector of any of paragraphs
A21.1-A21.1.1, where the second voltage is less than the first
voltage.
[0128] A21.1.2.1. The charged particle detector of paragraph
A21.1.2. wherein the first and second voltages are positive to
create a first positive collecting electrical field and a second
positive collecting field to attract secondary electrons emitted
from a sample.
[0129] A21.1.2.2. The charged particle detector assembly of any of
paragraphs A1-A21.1.2.1, wherein the first elongate member is
electrically isolated from the second elongate member and wherein
the at least one electrical connection point comprises a first
electrical connection to provide a first bias voltage to the first
elongate member and a second electrical connection to provide a
second bias voltage to the second elongate member.
[0130] B1. A charged particle detector assembly comprising: a
charged particle detector; a first elongate member coupled with the
charged particle detector; a second elongate member coupled with
the charged particle detector, wherein the first elongate member
and the second elongate members extend away from the charged
particle detector; a path stabilization member coupled with the
first elongate member, wherein the path stabilization member
extends away from the first elongate member and toward the second
elongate member; and at least one electrical connection point
arranged to supply at least one bias voltage to first elongate
member, the second elongate member, and the path stabilization
member.
[0131] B2. The charged particle detector assembly of paragraph B1,
wherein the first elongate member and the second elongate member
are configured to generate an electromagnetic field that draws
charged particles from a source and to the charged particle
detector.
[0132] B2.1. The charged particle detector assembly of paragraph
B2, wherein the electromagnetic field further applies a force that
reduces the amount of charged particles from the source that strike
the charged particle tool.
[0133] B2.2. The charged particle detector assembly of any of
paragraphs B2-B2.1, wherein electromagnetic field defines a charged
particle flow path within which a majority of the charged particles
travel from the sample to the detector, and wherein the path
stabilization member generates an electromagnetic filed that
applies a force that increases the number of charged particles that
remain within the charged particle flow path as the charged
particles travel from the sample and to the charged particle
detector.
[0134] B2.3. The charged particle detector assembly of any of
paragraphs B2-B2.2, wherein the electron flow path passes through a
first location between the first elongate member, the second
elongate member, the drawing member, and the path stabilization
member, and a second location between the first elongate member,
the second elongate member, the path stabilization member, and the
charged particle detector.
[0135] C1. A charged particle tool comprising: a platform for
supporting a sample; a charged particle beam source configured to
cause a focused charged particle beam to be incident on the sample;
and the charged particle assembly of paragraphs A1-A21.1.2.2. or
B1-B2.3, wherein the charged particle detector is arranged
proximate to the platform.
[0136] D1. Use of the charged particle detector assembly of any of
paragraphs A1-A21.1.2.2.
[0137] E1. Use of the charged particle detector assembly of any of
paragraphs B1-B2.1.
[0138] F1. Use of the charged particle tool of paragraph C1.
* * * * *