U.S. patent application number 16/259172 was filed with the patent office on 2020-06-11 for semiconductor laser mounting with intact diffusion barrier layer.
The applicant listed for this patent is SpectraSensors, Inc.. Invention is credited to Alfred Feitisch, Gabi Neubauer, Mathias Schrempel.
Application Number | 20200185880 16/259172 |
Document ID | / |
Family ID | 46727630 |
Filed Date | 2020-06-11 |
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United States Patent
Application |
20200185880 |
Kind Code |
A1 |
Feitisch; Alfred ; et
al. |
June 11, 2020 |
SEMICONDUCTOR LASER MOUNTING WITH INTACT DIFFUSION BARRIER
LAYER
Abstract
A first contact surface of a semiconductor laser chip can be
formed to a target surface roughness selected to have a maximum
peak to valley height that is substantially smaller than a barrier
layer thickness. A barrier layer that includes a non-metallic,
electrically-conducting compound and that has the barrier layer
thickness can be applied to the first contact surface, and the
semiconductor laser chip can be soldered to a carrier mounting
along the first contact surface using a solder composition by
heating the soldering composition to less than a threshold
temperature at which dissolution of the barrier layer into the
soldering composition occurs. Related systems, methods, articles of
manufacture, and the like are also described.
Inventors: |
Feitisch; Alfred; (Los
Gatos, CA) ; Neubauer; Gabi; (Los Gatos, CA) ;
Schrempel; Mathias; (Alta Loma, CA) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
SpectraSensors, Inc. |
Rancho Cucamonga |
CA |
US |
|
|
Family ID: |
46727630 |
Appl. No.: |
16/259172 |
Filed: |
January 28, 2019 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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15652177 |
Jul 17, 2017 |
10224693 |
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16259172 |
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14873080 |
Oct 1, 2015 |
9711937 |
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15652177 |
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13212085 |
Aug 17, 2011 |
9166364 |
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14873080 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 2224/05664
20130101; H01L 2224/29109 20130101; H01L 2224/0383 20130101; H01L
2224/29139 20130101; H01L 2224/05664 20130101; H01L 2224/0568
20130101; H01L 2224/29144 20130101; H01S 5/02272 20130101; H01L
2224/0568 20130101; H01L 2224/05686 20130101; H01L 2224/0567
20130101; H01L 2224/32245 20130101; H01L 2224/05686 20130101; H01L
24/05 20130101; H01L 2224/83801 20130101; H01L 2224/05686 20130101;
H01L 2224/29144 20130101; H01L 2224/05573 20130101; H01L 24/83
20130101; H01L 2224/05666 20130101; H01L 2224/05681 20130101; H01S
5/02276 20130101; H01L 24/32 20130101; H01L 2224/29144 20130101;
H01L 24/03 20130101; H01S 5/02212 20130101; H01L 2224/05684
20130101; H01L 2224/29139 20130101; H01L 2224/05624 20130101; H01L
2224/29139 20130101; H01L 2224/05686 20130101; H01L 2924/12042
20130101; H01L 2924/15747 20130101; H01L 2224/29144 20130101; H01L
2224/05686 20130101; H01L 2224/0567 20130101; H01L 2224/05624
20130101; H01S 5/068 20130101; H01L 2224/05669 20130101; H01L
2224/05669 20130101; H01L 24/29 20130101; H01L 2224/05684 20130101;
G01N 2021/399 20130101; H01L 2224/29139 20130101; H01L 2224/05663
20130101; H01L 2224/29111 20130101; H01L 2224/05666 20130101; H01L
2924/15747 20130101; H01L 2224/04026 20130101; H01L 2224/05681
20130101; G01N 21/39 20130101; H01L 2924/00014 20130101; H01L
2924/12042 20130101; H01L 2924/014 20130101; H01L 2924/014
20130101; H01L 2924/00014 20130101; H01L 2924/00014 20130101; H01L
2924/00 20130101; H01L 2924/0105 20130101; H01L 2924/014 20130101;
H01L 2924/049 20130101; H01L 2924/01032 20130101; H01L 2924/01082
20130101; H01L 2924/014 20130101; H01L 2924/00014 20130101; H01L
2924/0105 20130101; H01L 2924/0105 20130101; H01L 2924/04941
20130101; H01L 2924/01014 20130101; H01L 2924/01022 20130101; H01L
2924/00014 20130101; H01L 2924/0105 20130101; H01L 2924/00014
20130101; H01L 2924/00 20130101; H01L 2924/053 20130101; H01L
2924/01029 20130101; H01L 2924/00014 20130101; H01L 2924/014
20130101; H01L 2924/00014 20130101 |
International
Class: |
H01S 5/022 20060101
H01S005/022; H01S 5/068 20060101 H01S005/068; G01N 21/39 20060101
G01N021/39 |
Claims
1. A method for frequency stabilization of semiconductor lasers
comprising: forming a first contact surface of a semiconductor
single-frequency laser chip for a tunable laser-based trace gas
analyzer to a target surface roughness; applying a metallization
layer comprising 60010.sup.-10 m of titanium to the first contact
surface; applying a metallic diffusion barrier layer to the first
contact surface over the metallization layer, the metallic
diffusion barrier layer including multiple layers of differing
materials, wherein applying the metallic diffusion barrier layer
includes: applying a first metallic diffusion barrier layer, the
first metallic diffusion barrier layer comprising platinum; and
applying a second metallic diffusion barrier layer underlaying the
first metallic diffusion barrier layer, the second metallic
diffusion barrier layer includes palladium, nickel, tungsten,
molybdenum, titanium, tantalum, zirconium, cerium, gadolinium,
chromium, manganese, aluminum, beryllium, or yttrium; applying a
solder preparation layer to the first contact surface subsequent to
applying the metallic diffusion barrier layer and prior to
soldering, wherein the solder preparation layer includes an
approximately 2000 to 500010.sup.-10 m thickness of gold; and
soldering the laser chip along the first contact surface to a
carrier mounting using a solder composition, wherein the soldering
includes melting the solder composition by heating the solder
composition to less than a threshold temperature at which
dissolution of the metallic diffusion barrier layer into the solder
composition occurs, wherein subsequent to the soldering, the
metallic diffusion barrier layer remains contiguous and intact such
that no direct contact occurs between semiconductor materials of
the laser chip and the solder composition, such that no direct path
exists by which constituents of any of the laser chip, the solder
composition and the carrier mounting can diffuse across the
metallic diffusion barrier layer.
2. The method of claim 1, wherein, subsequent to the soldering, the
solder composition has substantially temporally stable electrical
and thermal conductivities.
3. The method of claim 1, further comprising providing the solder
composition as at least one of a solder preform that is
substantially non-oxidized and a deposited layer that is
substantially non-oxidized.
4. The method of claim 1, wherein the soldering includes melting
the solder composition under at least one of a reducing atmosphere
and a non-oxidizing atmosphere.
5. The method of claim 1, wherein the solder composition is
selected from a group consisting of gold germanium, gold silicon,
gold tin, silver tin, silver tin copper, silver tine lead, silver
tin lead indium, silver tin antimony, tin lead, lead, silver,
silicon, germanium, tin, antimony, bismuth, indium, and copper.
6. The method of claim 1, wherein the forming of the first contact
surface includes polishing the first contact surface to achieve the
target surface roughness prior to applying the metallic diffusion
barrier layer.
7. The method of claim 6, wherein the target surface roughness is
less than approximately 10010.sup.-10 m RMS, and/or wherein the
target surface roughness is less than approximately 4010.sup.-10 m
RMS.
8. The method of claim 1, wherein the threshold temperature is less
than approximately 400.degree. C.
9. The method of claim 8, wherein the threshold temperature is less
than approximately 370.degree. C.
10. The method of claim 9, wherein the threshold temperature is
less than approximately 340.degree. C.
11. The method of claim 1, further comprising applying another
barrier layer to a second contact surface of the carrier mounting,
and soldering the laser chip to the carrier mounting along the
second contact surface.
12. The method of claim 1, further comprising applying a solder
facilitation layer between the first contact surface and a second
contact surface on the carrier mounting prior to the soldering, the
solder facilitation layer including a metal that is not a component
of the solder preparation layer on either the first contact surface
or the second contact surface.
13. The method of claim 12, wherein applying the solder
facilitation layer includes at least one of placing a sheet of the
metal between the first contact surface and the second contact
surface prior to the soldering, and depositing a layer of the metal
that is not a component of the solder composition onto one or both
of the first contact surface and the second contact surface prior
to the soldering.
14. The method of claim 1, further comprising matching a first
thermal expansion characteristic of the carrier mounting to a
second thermal expansion characteristic of the semiconductor laser
chip.
15. A tunable laser-based trace gas analyzer, comprising: a
semiconductor single-frequency laser chip including: a first
contact surface having a target surface roughness; a metallization
layer of 60010.sup.-10 m of titanium applied to the first contact
surface; a metallic diffusion barrier layer applied to the
metallization layer, wherein the metallic diffusion barrier layer
includes multiple layers of differing materials; and a solder
preparation layer applied to the metallic diffusion barrier layer,
wherein the solder preparation layer includes an approximately 2000
to 500010.sup.-10 m thickness of gold; and a carrier mounting to
which the laser chip is soldered along the first contact surface of
the laser chip using a solder composition, wherein the solder
composition is heated to less than a threshold temperature at which
dissolution of the metallic diffusion barrier layer into the solder
composition occurs, and wherein the metallic diffusion barrier
layer is contiguous such that the solder composition does not
directly contact semiconductor materials of the laser chip, such
that there is no direct path by which constituents of any of the
laser chip, the solder composition and the carrier mounting can
diffuse across the metallic diffusion barrier layer.
16. The tunable laser-based trace gas analyzer of claim 15, wherein
the tunable laser-based trace gas analyzer is a tunable diode laser
absorption spectrometer.
17. The tunable laser-based trace gas analyzer of claim 15, wherein
the metallic diffusion barrier layer includes a first metallic
diffusion barrier layer including platinum and a second metallic
diffusion barrier layer underlaying the first metallic diffusion
barrier layer, the second metallic diffusion barrier layer
including palladium, nickel, tungsten, molybdenum, titanium,
tantalum, zirconium, cerium, gadolinium, chromium, manganese,
aluminum, beryllium, or yttrium.
18. The tunable laser-based trace gas analyzer of claim 15, wherein
the target surface roughness is less than approximately
10010.sup.-10 m RMS, and/or wherein the target surface roughness is
less than approximately 4010.sup.-10 m RMS.
19. The tunable laser-based trace gas analyzer of claim 15, further
comprising a solder facilitation layer between the first contact
surface and a second contact surface on the carrier mounting, the
solder facilitation layer including a metal that is not a component
of the solder preparation layer on either the first contact surface
or the second contact surface.
20. The tunable laser-based trace gas analyzer of claim 15, further
comprising another barrier layer applied to a second contact
surface of the carrier mounting, wherein the laser chip is soldered
to the carrier mounting along the second contact surface.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] The present application is a continuation of and claims the
priority benefit of U.S. patent application Ser. No. 15/652,177,
filed Jul. 17, 2017, which is a continuation of U.S. Ser. No.
14/873,080, filed Oct. 1, 2015, which is a divisional of U.S. Ser.
No. 13/212,085, filed Aug. 17, 2011. The present application is
also related to co-owned U.S. patent application Ser. No.
13/026,921, filed on Feb. 14, 2011, and to co-owned U.S. patent
application Ser. No. 13/027,000, filed on Feb. 14, 2011. The
disclosure of each application identified in this paragraph is
incorporated by reference herein in its entirety.
TECHNICAL FIELD
[0002] The present disclosure relates to an amperometric sensor for
determining measurement values of a measurand representing a
chlorine dioxide content of a measuring fluid.
[0003] The subject matter described herein relates to frequency
stabilization of semiconductor lasers, in particular to mounting
techniques for such lasers.
BACKGROUND
[0004] A tunable laser-based trace gas analyzer, such as for
example a tunable diode laser absorption spectrometer (TDLAS) can
employ a narrow line width (e.g. approximately single frequency)
laser light source that is tuned across a trace gas absorption
frequency range of a target analyte for each measurement of a
sample volume of gas. Ideally, the laser light source in such an
analyzer exhibits no material change in the starting and ending
frequency of successive laser scans under a constant laser
injection current and operating temperature. Additionally, long
term stability of the frequency tuning rate of the laser as a
function of the laser injection current, over the scan range, and
over repetitive scans over a prolonged period of service can also
be desirable.
[0005] Depending on the operational wavelength, however, currently
available tunable laser sources (e.g. diode lasers and
semiconductor lasers) can typically exhibit a wavelength drift on
the order of a few picometers (on the order of gigahertz) per day
to fractions of picometers per day. A typical trace gas absorption
band line width can in some instances be on the order of a fraction
of a nanometer to microns. Thus, drift or other variations in the
output intensity of the laser light source can, over time,
introduce critical errors in identification and quantification of
trace gas analytes, particularly in gas having one or more
background compounds whose absorption spectra might interfere with
absorption features of a target analyte.
SUMMARY
[0006] In one aspect of the present disclosure, a method for
frequency stabilization of semiconductor lasers comprises forming a
first contact surface of a semiconductor single-frequency laser
chip for a tunable laser-based trace gas analyzer to a target
surface roughness, applying a metallization layer comprising
60010-10 m of titanium to the first contact surface, and applying a
metallic diffusion barrier layer to the first contact surface over
the metallization layer, the metallic diffusion barrier layer
including multiple layers of differing materials. The method
further comprises applying a solder preparation layer to the first
contact surface subsequent to applying the metallic diffusion
barrier layer and prior to soldering, wherein the solder
preparation layer includes an approximately 2000 to 500010-10 m
thickness of gold, and soldering the laser chip along the first
contact surface to a carrier mounting using a solder composition,
wherein the soldering includes melting the solder composition by
heating the solder composition to less than a threshold temperature
at which dissolution of the metallic diffusion barrier layer into
the solder composition occurs, wherein subsequent to the soldering,
the metallic diffusion barrier layer remains contiguous and intact
such that no direct contact occurs between semiconductor materials
of the laser chip and the solder composition, such that no direct
path exists by which constituents of any of the laser chip, the
solder composition and the carrier mounting can diffuse across the
metallic diffusion barrier layer. In an embodiment, subsequent to
the soldering, the solder composition has substantially temporally
stable electrical and thermal conductivities.
[0007] In at least one embodiment, applying the metallic diffusion
barrier layer includes applying a first metallic diffusion barrier
layer, the first metallic diffusion barrier layer comprising
platinum, and applying a second metallic diffusion barrier layer
underlaying the first metallic diffusion barrier layer, the second
metallic diffusion barrier layer includes palladium, nickel,
tungsten, molybdenum, titanium, tantalum, zirconium, cerium,
gadolinium, chromium, manganese, aluminum, beryllium, or yttrium.
In at least one embodiment, the method further comprises providing
the solder composition as at least one of a solder preform that is
substantially non-oxidized and a deposited layer that is
substantially non-oxidized. In an embodiment, the soldering
comprises melting the solder composition under at least one of a
reducing atmosphere and a non-oxidizing atmosphere. In a further
embodiment, the solder composition is selected from a group
consisting of gold germanium, gold silicon, gold tin, silver tin,
silver tin copper, silver tine lead, silver tin lead indium, silver
tin antimony, tin lead, lead, silver, silicon, germanium, tin,
antimony, bismuth, indium, and copper.
[0008] In another embodiment, the forming of the first contact
surface includes polishing the first contact surface to achieve the
target surface roughness prior to applying the metallic diffusion
barrier layer. In an embodiment, the target surface roughness is
less than approximately 10010.sup.-10 m RMS, and/or the target
surface roughness is less than approximately 4010.sup.-10 m RMS. In
a further embodiment, the threshold temperature is less than
approximately 400.degree. C. In yet another embodiment, the
threshold temperature is less than approximately 370.degree. C. In
still another embodiment, the threshold temperature is less than
approximately 340.degree. C.
[0009] In at least one embodiment, the method further comprises
applying another barrier layer to a second contact surface of the
carrier mounting, and soldering the laser chip to the carrier
mounting along the second contact surface. In a further embodiment,
the method further comprises applying a solder facilitation layer
between the first contact surface and a second contact surface on
the carrier mounting prior to the soldering, the solder
facilitation layer including a metal that is not a component of the
solder preparation layer on either the first contact surface or the
second contact surface. In such an embodiment, applying the solder
facilitation layer includes at least one of placing a sheet of the
metal between the first contact surface and the second contact
surface prior to the soldering, and depositing a layer of the metal
that is not a component of the solder composition onto one or both
of the first contact surface and the second contact surface prior
to the soldering. In another embodiment, the method further
comprises matching a first thermal expansion characteristic of the
carrier mounting to a second thermal expansion characteristic of
the semiconductor laser chip.
[0010] Another aspect of the present disclosure includes a tunable
laser-based trace gas analyzer comprising a semiconductor
single-frequency laser chip including a first contact surface
having a target surface roughness, a metallization layer of
60010.sup.-10 m of titanium applied to the first contact surface, a
metallic diffusion barrier layer applied to the metallization
layer, wherein the metallic diffusion barrier layer includes
multiple layers of differing materials, and a solder preparation
layer applied to the metallic diffusion barrier layer, wherein the
solder preparation layer includes an approximately 2000 to
500010.sup.-10 m thickness of gold, and a carrier mounting to which
the laser chip is soldered along the first contact surface of the
laser chip using a solder composition, wherein the solder
composition is heated to less than a threshold temperature at which
dissolution of the metallic diffusion barrier layer into the solder
composition occurs, and wherein the metallic diffusion barrier
layer is contiguous such that the solder composition does not
directly contact semiconductor materials of the laser chip, such
that there is no direct path by which constituents of any of the
laser chip, the solder composition and the carrier mounting can
diffuse across the metallic diffusion barrier layer.
[0011] In at one least one embodiment, the tunable laser-based
trace gas analyzer is a tunable diode laser absorption
spectrometer. In an embodiment, the metallic diffusion barrier
layer includes a first metallic diffusion barrier layer including
platinum and a second metallic diffusion barrier layer underlaying
the first metallic diffusion barrier layer, the second metallic
diffusion barrier layer including palladium, nickel, tungsten,
molybdenum, titanium, tantalum, zirconium, cerium, gadolinium,
chromium, manganese, aluminum, beryllium, or yttrium. In a further
embodiment, the target surface roughness is less than approximately
10010.sup.-10 m RMS, and/or the target surface roughness is less
than approximately 4010.sup.-10 m RMS.
[0012] In at least one embodiment, the tunable laser-based trace
gas analyzer further comprises a solder facilitation layer between
the first contact surface and a second contact surface on the
carrier mounting, the solder facilitation layer including a metal
that is not a component of the solder preparation layer on either
the first contact surface or the second contact surface. In another
embodiment, the tunable laser-based trace gas analyzer further
comprises another barrier layer applied to a second contact surface
of the carrier mounting, wherein the laser chip is soldered to the
carrier mounting along the second contact surface.
[0013] The details of one or more variations of the subject matter
described herein are set forth in the accompanying drawings and the
description below. Other features and advantages of the subject
matter described herein will be apparent from the description and
drawings, and from the claims.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] The accompanying drawings, which are incorporated in and
constitute a part of this specification, show certain aspects of
the subject matter disclosed herein and, together with the
description, help explain one or more features or the principles
associated with the disclosed implementations. In the drawings:
[0015] FIG. 1 is a graph illustrating effects of laser drift on
performance of a laser absorption spectrometer;
[0016] FIG. 2 is a second graph illustrating additional effects of
laser drift on performance of a laser absorption spectrometer;
[0017] FIG. 3 is a schematic diagram illustrating a semiconductor
laser chip secured to a carrier mount;
[0018] FIG. 4 is a process flow diagram illustrating aspects of a
method having one or more features consistent with implementations
of the current subject matter;
[0019] FIG. 5 is a diagram showing an end elevation view of a
conventional TO-can mount such as are typically used for mounting
semiconductor laser chips;
[0020] FIG. 6 is a diagram showing a magnified view of a carrier
mount and a semiconductor laser chip affixed thereto;
[0021] FIG. 7 is a scanning electron micrograph showing a solder
joint between a semiconductor laser chip and a carrier mount;
[0022] FIG. 8 is a chart showing a phosphorous concentration
measured by X-ray diffraction as a function of depth in the
apparatus shown in FIG. 7;
[0023] FIG. 9 is a chart showing a nickel concentration measured by
X-ray diffraction as a function of depth in the apparatus shown in
FIG. 7;
[0024] FIG. 10 is a chart showing an indium concentration measured
by X-ray diffraction as a function of depth in the apparatus shown
in FIG. 7;
[0025] FIG. 11 is a chart showing a tin concentration measured by
X-ray diffraction as a function of depth in the apparatus shown in
FIG. 7;
[0026] FIG. 12 is a chart showing a lead concentration measured by
X-ray diffraction as a function of depth in the apparatus shown in
FIG. 7;
[0027] FIG. 13 is a chart showing a tungsten concentration measured
by X-ray diffraction as a function of depth in the apparatus shown
in FIG. 7; and
[0028] FIG. 14 is a chart showing a gold concentration measured by
X-ray diffraction as a function of depth in the apparatus shown in
FIG. 7.
[0029] When practical, similar reference numbers denote similar
structures, features, or elements.
DETAILED DESCRIPTION
[0030] Experimental data have revealed that laser emission
wavelength changes as small as 1 picometer (pm) or less between
spectral scans in a laser absorption spectrometer using a scannable
or tunable laser source can materially alter a trace gas
concentration determination with respect to a measurements
obtainable with a spectral analyzer in its original calibration
state. An example of spectral laser spectroscopy using a
differential spectroscopy approach is described in co-owned U.S.
Pat. No. 7,704,301, the disclosure of which is incorporated herein
in its entirety. Other experimental data have indicated that a
tunable diode laser-based analyzer designed for low analyte
concentration detection and quantification (e.g. on the order of
parts per million (ppm) of hydrogen sulfide (H.sub.2S) in natural
gas) and employing a harmonic (e.g. 2f) wavelength modulation
spectral subtraction approach can unacceptably deviate from its
calibration state due to a shift in laser output of as small as 20
picometers (pm) at constant injection current and constant
temperature (e.g. as controlled by a thermoelectric cooler).
[0031] In general terms, a laser frequency shift that can be
acceptable for maintaining an analyzer calibration within its
accuracy specification drops with smaller target analyte
concentrations and also with increasing spectral interferences from
other components of a sample mixture at the location of the target
analyte absorption. For measurements of higher levels of a target
analyte in a substantially non-absorbing background, larger laser
frequency shifts can be tolerated while maintaining the analyzer
calibration state.
[0032] The graphs 100 and 200 shown in FIG. 1 and FIG. 2,
respectively, show experimental data illustrating potential
negative impacts of laser output variations that may be caused by
changes in characteristics (e.g. physical, chemical, and the like)
of a semiconductor laser source over time. The reference curve 102
shown in the graph 100 of FIG. 1 was obtained with a tunable diode
laser spectrometer for a reference gas mixture containing
approximately 25% ethane and 75% ethylene. The test curve 104 was
obtained using the same spectrometer after some time had passed for
a test gas mixture containing 1 ppm acetylene in a background of
approximately 25% ethane and 75% ethylene. Acetylene has a spectral
absorption feature in the range of about 300 to 400 on the
wavelength axis of the chart 100 in FIG. 1. If the spectrometer
were not adjusted in some manner to compensate for the drift
observed in the test curve 104 relative to the reference curve 102,
the measured concentration of acetylene from the spectrometer would
be, for example, -0.29 ppm instead of the correct value of 1
ppm.
[0033] Similarly, in FIG. 2, the chart 200 shows a reference curve
202 obtained with a tunable diode laser spectrometer for a
reference gas mixture containing approximately 25% ethane and 75%
ethylene. The test curve 204 was obtained for a test gas mixture
containing 1 ppm acetylene in a background of approximately 25%
ethane and 75% ethylene. As shown in FIG. 2, the line shape of the
test curve 204 is distorted relative to the line shape of the
reference curve 202 due to drift or other factors affecting
performance of the laser absorption spectrometer over time. If the
test curve 204 were not corrected to compensate for the distortion
observed in the test curve 204 relative to the reference curve 202,
the measured concentration of acetylene in the test gas mixture
determined by the spectrometer would be, for example, 1.81 ppm
instead of the true concentration of 1 ppm.
[0034] Based on Ohm's Law (i.e. P=I2R where P is the power, I is
the current, and R is the resistance), a current-driven
semiconductor laser chip will generate waste heat that increases
approximately as the square of the injection current driving the
laser. While the resistance, R, of the semiconductor diode laser
assembly is not typically linear or constant with changes in
temperature, an approximately quadratic increase in waste heat with
increases in current is generally representative of real-world
performance. Thermal roll-over, in which the power output of a
laser is reduced at excessive temperatures, can typically occur
because the lasing efficiency of a typical band-gap type direct
semiconductor laser diode decreases with increasing p-n junction
operating temperature. This is especially true for infrared lasers,
such as for example lasers based on indium phosphide (InP) or
gallium antimonide (GaSb) material systems.
[0035] Single frequency operation of an infrared semiconductor
laser can be achieved by employing DFB (distributed feedback)
schemes, which typically use optical gratings, either incorporated
in the laser ridge of the semiconductor laser crystal in the form
of semiconductor crystal index of refraction periodicities or
placed laterally to the laser ridge as metal bars. The effective
optical periods of the approaches of the various gratings
determining the laser emission wavelength can typically depend upon
the physical spacing of the metal bars of the grating or upon the
physical dimension of the ridge-regrown semiconductor material
zones with different index of refraction and the index of
refraction of the respective semiconductor materials. In other
words, the emission wavelength of a semiconductor laser diode, such
as are typically used for tunable diode laser spectroscopy, can
depend primarily upon the laser p-n junction and on the laser
crystal operating temperature and secondarily on the carrier
density inside the laser. The laser crystal temperature can change
the grating period as a function of the temperature dependent
thermal expansion of the laser crystal along its long optical
cavity axis and as a function of the temperature dependent index of
refraction.
[0036] Typical injection current-related and temperature-related
wavelength tuning rates of infrared lasers useable for tunable
diode laser trace gas analyzers can be on the order of
approximately 0.1 nanometers per .degree. C. and approximately 0.1
nanometers per milli-ampere. As such, it can be desirable to
maintain semiconductor laser diodes for precision TDLAS devices at
a constant operating temperature within a few thousandths of a
.degree. C. and at injection currents that are controlled to within
a few nano-amperes.
[0037] Long term maintenance and regeneration of a TDLAS
calibration state and the related long term measurement fidelity
with respect to the original instrument calibration can require the
ability to substantially replicate the correct laser operating
parameters in the wavelength space for any given measurement. This
can be desirable for spectroscopy techniques employing subtraction
of spectral traces (e.g. differential spectroscopy), such as is
described in co-owned U.S. Pat. No. 7,704,301; pending U.S. patent
applications Ser. Nos. 13/027,000 and 13/026,091 and 12/814,315;
and U.S. Provisional Application No. 61/405,589, the disclosures of
which are incorporated by reference herein.
[0038] Commercially available single frequency semiconductor lasers
that are suitable for trace gas spectroscopy in the 700 nm to 3000
nm spectral range have been found to generally exhibit a drift of
their center frequency over time. Drift rates of several picometers
(pm) to fractions of a pm per day have been confirmed by performing
actual molecular trace gas spectroscopy over periods of 10 days to
more than 100 days. Lasers that may behave as described can
include, but are not limited to, lasers limited to single frequency
operation by gratings etched into the laser ridge (e.g.
conventional telecommunications grade lasers), Bragg gratings (e.g.
vertical cavity surface emitting lasers or VCSELs), multiple layer
narrow band dielectric mirrors, laterally coupled gratings, and the
like. Frequency drift behavior has been observed with semiconductor
diode lasers; VCSELs; horizontal cavity surface emitting lasers
HCSEL's (HCSELs); quantum cascade lasers built on semiconductor
materials including but not limited to indium phosphide (InP),
gallium arsenide (GaAs), gallium antimonide (GaSb), gallium nitride
(GaN), indium gallium arsenic phosphide (InGaAsP), indium gallium
phosphide (InGaP), indium gallium nitride (InGaN), indium gallium
arsenide (InGaAs), indium gallium aluminum phosphide (InGaAlP),
indium aluminum gallium arsenide (InAlGaAs), indium gallium
arsenide (InGaAs), and other single and multiple quantum well
structures.
[0039] Approaches have been previously described to re-validate the
performance of a tunable laser. For example, as described in U.S.
patent application Ser. Nos. 13/026,921 and 13/027,000 referenced
above, a reference absorption line shape collected during a
calibrated state of an analyzer can be compared to a test
absorption line shape collected subsequently. One or more operating
parameters of the analyzer can be adjusted to cause the test
absorption line shape to more closely resemble the reference
absorption line shape.
[0040] Reduction of the underlying causes of frequency instability
in semiconductor-based tunable lasers can also be desirable, at
least because compensation of laser shift and outputted line shapes
to maintain analyzer calibration by adjusting the semiconductor
diode laser operating temperature or the median drive current may
only be possible over limited wavelength shifts due to a typically
non-linear correlation between injection current and frequency
shift in semiconductor laser diodes (e.g. because of thermal
roll-over as discussed above). The nonlinearity of the frequency
shift as a function of injection current may change as a function
of laser operating temperature set by a temperature control device
(e.g. a thermoelectric cooler or TEC) and the median injection
current. At higher control temperatures, thermal roll-over may
occur at lower injection currents while at lower control
temperatures, the roll-over may occur at higher injection currents.
Because the control temperature and injection current combined
determine the laser emission wavelength, not all combinations of
control temperature and median injection current used to adjust the
laser wavelength to the required target analyte absorption line
will provide the same frequency scan and absorption spectra.
[0041] Accordingly, one or more implementations of the current
subject matter relate to methods, systems, articles or manufacture,
and the like that can, among other possible advantages, provide
semiconductor-based lasers that have substantially improved
wavelength stability characteristics due to a more temporally
stable chemical composition of materials used in affixing a
semiconductor laser chip to a mounting device. Some implementations
of the current subject matter can provide or include a
substantially contiguous and intact diffusion barrier layer that
includes at least one non-metallic layer and alternatively at least
one non-metallic and at least one metallic barrier layer at or near
a contact surface between a semiconductor laser chip and a mounting
surface. Drift of single frequency lasers can be reduced or even
minimized, according to one or more implementations, by employing
semiconductor laser designs, laser processing, electrical
connections, and heat sinking features that reduce changes in heat
conductivity, in stress and strain on the active laser, and in
electrical resistivity of the injection current path over time.
[0042] FIG. 3 illustrates an example of an apparatus 300 including
a semiconductor laser chip 302 affixed to a mounting device 304 by
a layer of solder 306 interposed between a contact surface 310 of
the semiconductor laser chip 302 and the mounting device 304. The
mounting device can function as a heat sink and can provide one or
more electrical connections to the semiconductor laser chip 302.
One or more other electrical connections 312 can be provided to
connect a p or n junction of the semiconductor laser chip 302 to a
first polarity and the other junction to a second polarity, for
example via conduction through the solder layer 306 into the
carrier mount 304.
[0043] FIG. 4 shows a process flow chart illustrating a method
including features that can be present in one or more
implementations of the current subject matter. At 402, a first
contact surface of a semiconductor laser chip is formed to a target
surface roughness. The target surface roughness is selected to have
a maximum peak to valley height that is substantially smaller than
a barrier layer thickness of a barrier layer to be applied to the
first contact surface. At 404, that barrier layer is applied to the
first contact surface with the barrier layer thickness. The barrier
layer includes the at least one non-metallic,
electrically-conducting compound, examples of which include but are
not limited to titanium nitride (TiNX), titanium oxy-nitride
(TiNXOY), cerium gadolinium oxy-nitride (CeGdOyNX) cerium oxide
(CeO2), and tungsten nitride (WNx). At 406, the semiconductor laser
chip is soldered to a carrier mounting along the first contact
surface using a solder composition. The soldering includes melting
the soldering composition by heating the soldering composition to
less than a threshold temperature at which dissolution of the
barrier layer into the soldering composition occurs.
[0044] In some implementations, a contact surface 310 of a laser
semiconductor chip 302 can be polished or otherwise prepared to
have a target surface roughness of less than approximately 100
.ANG. RMS (root mean square), or alternatively of less than
approximately 40 .ANG. RMS. Conventional approaches have typically
not focused on the surface roughness of the contact surface 310 and
have consequently had surface roughness values of greater than
approximately 1 .mu.m RMS. Subsequent to preparing a sufficiently
smooth contact surface 310, the contact surface 310 can be treated
to form one or more barrier layers.
[0045] Creation of a barrier layer that can survive the soldering
process can be aided by polishing of the first contact surface 310
to a low surface roughness. In general, a total thickness of a
metallic barrier layer, for example one made of platinum, may only
be deposited at a limited thickness due to very high stresses that
can lead to a separation of thicker layers from the semiconductor
material of the semiconductor laser chip 302. The barrier layer can
include multiple layers of differing materials. In an
implementation, at least one of the barrier layers can include a
non-metallic, electrically conducting compound, such as for example
titanium nitride (TiNX), titanium oxy-nitride (TiNXOY), cerium
gadolinium oxy-nitride (CeGdyONX), cerium oxide (CeO2), and
tungsten nitride (WNx). One or more additional barrier layers
overlaying or underlaying the first barrier layer can include a
metal including but not limited to platinum (Pt), palladium (Pd),
nickel (Ni), tungsten (W), molybdenum (Mo) titanium (Ti), tantalum
(Ta), zirconium (Zr), cerium (Ce), gadolinium (Gd), chromium (Cr),
manganese (Mn), aluminum (Al), beryllium (Be), and Yttrium (Y).
[0046] A solder composition can in some implementations be selected
from a composition having a liquidus temperature, i.e. the maximum
temperature at which solid crystals of an alloy can co-exist with
the melt in thermodynamic equilibrium, of less than approximately
400.degree. C., or optionally of less than approximately
370.degree. C., or optionally of less than approximately
340.degree. C. Examples of solder compositions consistent with one
or more implementations of the current subject matter can include,
but are not limited to gold germanium (AuGe), gold silicon (AuSi),
gold tin (AuSn), silver tin (AgSn), silver tin copper (AgSnCu),
silver tin lead (AgSnPb), silver tin lead indium (AgSnPbIn), silver
tin antimony (AgSnSb), tin lead (SnPb), and lead (Pb). Examples of
specific solder compositions that are consistent with one or more
implementations of the current subject matter include, but are not
limited to the following: approximately 48% Sn and approximately
52% In; approximately 3% Ag and approximately 97% In; approximately
58% Sn and approximately 42% In; approximately 5% Ag, approximately
15% Pb, and approximately 80% In; approximately 100% In;
approximately 30% Pb and approximately 70% In; approximately 2% Ag,
approximately 36% Pb, and approximately 62% Sn; approximately 37.5%
Pb, approximately 37.5% Sn, and approximately 25% In; approximately
37% Pb and approximately 63% Sn; approximately 40% Pb and
approximately 60% In; approximately 30% Pb and approximately 70%
Sn; approximately 2.8% Ag, approximately 77.2% Sn, and
approximately 20% In; approximately 40% Pb and approximately 60%
Sn; approximately 20% Pb and approximately 80% Sn; approximately
45% Pb and approximately 55% Sn; approximately 15% Pb and
approximately 85% Sn; approximately 50% Pb and approximately 50%
In; approximately 10% Pb and approximately 90% Sn; approximately
10% Au and approximately 90% Sn; approximately 3.5% Ag and
approximately 96.5% Sn; approximately 60% Pb and approximately 40%
In; approximately 3.5% Ag, approximately 95% Sn, and approximately
1.5% Sb; approximately 2.5% Ag and approximately 97.5% Sn;
approximately 100% Sn; approximately 99% Sn and approximately 1%
Sb; approximately 60% Pb and approximately 40% Sn; approximately
97% Sn and approximately 3% Sb; approximately 95% Sn and
approximately 5% Sb; approximately 63.2% Pb, approximately 35% Sn,
and approximately 1.8% In; approximately 70% Pb and approximately
30% Sn; approximately 75% Pb and approximately 25% In;
approximately 80% Pb approximately 20% Sn; approximately 81% Pb and
approximately 19% In; approximately 80% Au and approximately 20%
Sn; approximately 86% Pb, approximately 8% Bi, approximately 4% Sn,
and approximately 1% In, approximately 1% Ag; approximately 85% Pb
and approximately 15% Sn; approximately 2% Ag, approximately 88%
Pb, and approximately 10% Sn; approximately 5% Ag, approximately
90% Pb, and approximately 5% Sn; approximately 95% Pb and
approximately 5% Sb; approximately 2.5% Ag, approximately 92.5% Pb,
and approximately 5% Sn; approximately 2.5% Ag, approximately 92.5%
Pb, and approximately 5% In; approximately 90% Pb and approximately
10% Sn; approximately 2.5% Ag and approximately 97.5% Pb;
approximately 2.5% Ag; approximately 95.5% Pb, and approximately 2%
Sn; approximately 78% Au and approximately 22% Sn; approximately
1.5% Ag, approximately 97.5% Pb, and approximately 1% Sn;
approximately 5% Ag, approximately 90% Pb, and approximately 5% In;
approximately 95% Pb and approximately 5% In; and approximately 95%
Pb and approximately 5% Sn.
[0047] FIG. 5 shows an end elevation view of a conventional
transistor outline can (TO-can) mount 500 such as is typically used
in mounting of semiconductor laser chips for use in
telecommunications applications. TO-cans are widely used
electronics and optics packaging platforms used for mechanically
mounting, electrically connecting, and heat sinking semiconductor
chips such as lasers and transistors and are available in a variety
of different sizes and configurations. An outer body 502 encloses a
post or heat sink member 504 which can be made of metal, such as
for example a copper tungsten sintered metal, copper-diamond
sintered metal, or iron-nickel alloys including Kovar, alloy 42,
and alloy 52. Two insulated electrical pass-throughs 506 can be
included to provide electrical contacts for connection to the p and
n junctions on a semiconductor laser chip 302. The semiconductor
laser chip 302 can be mounted to a carrier sub-mount, which can in
some examples be formed of silicon. As noted above, the
semiconductor laser chip 302 can be joined to the carrier mount 304
(also referred to as a carrier mounting) by a layer of solder 306,
which is not shown in FIG. 5 due to scale constraints. FIG. 6 shows
a magnified view 600 of the post or heat sink member 504, the
carrier mount 304, the semiconductor laser chip 302, and the solder
306 joining the semiconductor laser chip 302 to the carrier mount.
The carrier mount 304 can in turn be soldered to the post or heat
sink member 504 by a second solder layer 602.
[0048] According to one or more implementations of the current
subject matter, mono-component layers (or surfaces) of a material
dissimilar from the solder preparation layer, which includes but is
not limited to gold, can serve similarly as solder alloys, enabling
low temperature joining of two gold surfaces for instance. In
joining metal components, this is commonly referred to as liquidus
or liquid diffusion bonding since it apparently creates a very thin
liquid interface layer between certain dissimilar metals which are
brought in physical contact under elevated temperature. The
temperature necessary to cause this effect to occur is typically
significantly lower than the component melting temperatures. Once
the initial joining has taken place, thermal separation can
typically require quite high temperatures, approaching or reaching
the component melting temperatures. In one example, contact between
a silver surface and a gold surface can result in a hermetic joint
at a temperature of approximately 150.degree. C. to approximately
400.degree. C., which is significantly lower than the separate
melting temperatures of silver (950.degree. C.) and gold
(1064.degree. C.). In another example, copper oxide can serve as a
bonding promotion layer which can reduce a joining temperature
between two metal surfaces significantly below the metal melting
points.
[0049] Thus, in some implementations, solder compositions including
lead (Pb), silver (Ag), silicon (Si), germanium (Ge), tin (Sn),
antimony (Sb), bismuth (Bi), indium (In), and copper (Cu) as well
as those discussed elsewhere herein can be used in association with
deposition of one or more solder-facilitating mono-component
material layers or thin sheets (e.g. preforms) on the first contact
surface 310 and/or second contact surface 314 prior to the
soldering process. The one or more solder-facilitating
mono-component material layers or thin sheets can be dissimilar
from other barrier and/or metallization layers on the first contact
surface 310 and/or second contact surface 314. One example of a
method for applying solder-facilitating mono-component material
layers or thin sheets can include depositing a thin layer of a
metal differing from those metals present in the solder preparation
layer on top of the barrier and/or metallization layers on the
first contact surface 310 and/or second contact surface 314. Such a
thin layer can be evaporated or otherwise deposited onto one or
both of the first contact surface 310 and the second contact
surface 314 shortly before the heat assisted joining process takes
place, in order to prevent or minimize oxidation. Alternately, a
thin sheet of a metal dissimilar from the solder preparation layer
can be placed between the semiconductor laser chip 302 and the
mounting device 304. The soldering process can then proceed as
discussed above.
[0050] FIG. 7 shows an electron micrograph 700 showing a highly
magnified solder layer 306 interposed between a semiconductor laser
chip 302 and a carrier mount 304. A second barrier layer 702 of
nickel is also provided on the second contact surface 704 of the
carrier mount 304. A vertical axis 706 is displayed atop the
electron micrograph to delineate distance from an arbitrarily
chosen origin coordinate (marked as "0" on the axis 706) to a
linear distance of 50 microns away (marked as "50" on the axis
706). The semiconductor laser chip 302 shown in FIG. 7 was not
prepared with a smooth first contact surface 310 as described
herein consistent according various implementations of the current
subject matter. As a result, the first contact surface 310 exhibits
substantial surface roughness, and no contiguous barrier layer
remains to separate the material of the semiconductor laser chip
302 from the solder after the soldering process. FIG. 8 through
FIG. 14 show a series of charts 800, 900, 1000, 1100, 1200, 1300,
and 1400 showing relative concentrations of phosphorous, nickel,
indium, tin, lead, tungsten, and gold, respectively, as a function
of distance along the axis 706 in FIG. 7. The relative
concentrations were determined by an X-ray diffraction
technique.
[0051] As shown in the chart 800 of FIG. 8, a large phosphorous
concentration is observed in the semiconductor laser chip 302
(distance greater than about 36 .mu.m) due to the semiconductor
laser chip 302 being a crystal of indium phosphide (InP).
Additional high relative concentrations of phosphorous are observed
in the nickel barrier layer 702, which is actually formed of a
first layer 710 of nickel deposited by an electroless process that
incorporates some phosphorous into the deposited nickel and a
second layer of nickel deposited by an electrolytic process that
incorporates less or no phosphorous into the deposited nickel. A
non-zero concentration of phosphorous occurs both in the solder
(which is composed of a tin-lead alloy and does not contain any
phosphorus in its original state) and in the electrolytic second
layer 712 of nickel. These non-zero concentrations are respectively
due to diffusion of phosphorous from the crystal structure of the
semiconductor laser chip 302 and from the electroless first layer
710 of nickel.
[0052] FIG. 9 illustrates that some nickel also diffuses into the
solder 306 from the nickel layer 702 and further into the crystal
structure of the semiconductor laser chip 302. Similarly, indium
diffuses into the solder 306 and from there into the carrier mount
across the nickel barrier layer 702 as shown in the chart 1000 of
FIG. 10. Tin, which is a primary component of the solder 306, does
not remain in the solder 306, but also diffuses into the crystal
structure of the semiconductor laser chip 302 as shown in the chat
1100 of FIG. 11. Lead also diffuses out of the solder layer 306 as
shown in the chart 1200 of FIG. 12, but to a lesser degree than
does the tin from the solder 306. Tungsten from the tungsten-copper
carrier mount 304 and gold from solder preparation layers deposited
on both of the first contact surface 310 and the second contact
surface 702 diffuse into the solder and to a small extent into the
semiconductor laser chip 302 as shown in the charts 1300 and 1400
of FIG. 13 and FIG. 14.
[0053] Accordingly, features of the current subject matter that
allow the maintenance of a contiguous, intact barrier layer at
least at the first contact surface 310 of the semiconductor laser
chip 302, and also desirably at the second contact surface 704 of
the carrier mount 304 can be advantageous in minimizing diffusion
of elements from the carrier mount and/or semiconductor laser chip
across the barrier layer and can thereby aid in maintaining a more
temporally consistent composition of both the solder layer 306 and
the crystal structure of the semiconductor laser chip 302. The
presence of phosphorous and/or other reactive compounds or
elements, such as for example oxygen, antimony, silicon, iron and
the like in the solder layer 306 can increase a tendency of the
solder alloy components to react and thereby change in chemical
composition, in crystal structure, hermeticity and, more
importantly, in electrical and/or thermal conductivity. Such
changes can lead to alteration in the laser emission
characteristics of a semiconductor laser chip 302 in contact with
the solder layer 306.
[0054] Furthermore, diffusion of solder components, such as for
example lead; silver; tin; and the like; and/or carrier mount
components such as tungsten, nickel, iron, copper and the like,
into the crystal structure of the semiconductor laser chip 302 can
also cause changes in the laser emission characteristics over
time.
[0055] Implementations of the current subject matter can provide
one or more advantages, including but not limited to maintaining a
contiguous diffusion barrier layer between a laser crystal or other
semiconductor chip and its physical mounting, preventing
inter-diffusion of solder compounds into the laser crystal and vice
versa, and preventing contamination of the solder. Inter-diffusion
and/or electro-migration have been found to cause changes in the
electrical resistivity, and to a lesser extent the heat conduction
properties, of the contact. Very small changes in resistive heating
of even one of the electrical contacts providing a driving current
to a semiconductor laser chip can lead to frequency changes in the
light produced by the semiconductor laser chip.
[0056] In some observed examples using conventional semiconductor
laser chip mounting approaches, induced shifts in the laser output
can be greater than a picometer per day. Implementations of the
current subject matter can therefore include one or more techniques
for improving barrier layers at one or more of the first contact
surface 310 between the solder layer 306 and the semiconductor
laser chip 302 and the second contact layer 702 between the solder
layer 306 and the carrier mount 304. In one example, an improved
barrier layer at the second contact surface 702 can include an
electroless plated nickel underlayer 710, for example to preserve
edge definition of a copper tungsten submount or the like, covered
by a minimum thickness of an electrolytic nickel layer 712 as the
final layer before deposition of a gold solder preparation layer.
In another example, a single layer of a sputtered barrier material,
including but not limited to at least one of nickel, platinum,
palladium, and electrically conducting non-metallic barrier layers,
can be used as a single barrier layer at the first contact surface
310. As oxidation of the solder material prior to soldering of the
semiconductor laser chip 302 to the carrier mount 304 can introduce
oxygen and other potentially reactive contaminants, it can be
advantageous to use solder forms that have not been allowed to
substantially oxidize prior to use. Alternatively, the soldering
process can be performed under a non-oxidizing atmosphere or under
a reducing atmosphere including but not limited to vacuum, pure
nitrogen pure hydrogen gas (H.sub.2), forming gas (approximately 5%
hydrogen in 95% nitrogen), and formic acid in nitrogen carrier gas
to remove or at least reduce the presence of oxidized compounds in
the solder composition on the metalized semiconductor contact
surface and the carrier mounting surface.
[0057] Suitable barrier layers to be deposited on the first contact
surface 310 and/or the second contact surface 702 can include, but
are not limited to, platinum (Pt), palladium (Pd), nickel (Ni),
titanium nitride (TiN.sub.X), titanium oxy-nitride
(TiN.sub.XO.sub.Y), tungsten nitride (WN.sub.x), cerium oxide
(CeO.sub.2), and cerium gadolinium oxy-nitride
(CEGDO.sub.YN.sub.X). These compounds, as well as other comparable
compounds that can be deposited by sputtering or vapor deposition
onto the first and/or second contact surfaces, can provide a
barrier layer that has a sufficiently high temperature resistance
during the soldering process as to not dissolve in the solder or
otherwise degrade sufficiently to cause breakdown of the barrier
qualities necessary to prevent cross-barrier diffusion of
semiconductor laser materials into the solder or solder components
into the semiconductor laser crystal. The second barrier layer 702
applied to the second contact surface 704 can in some
implementations include a sintered diamond-copper layer. A process
for creation of a non-metallic, electrically-conducting barrier
layer 702 can include first depositing titanium via a thin film
deposition process, including but not limited to sputtering,
electron beam evaporation, chemical vapor deposition, atomic layer
deposition, and the like, and then adding nitrogen to react with
the deposited titanium. In another implementation, a first
metallization layer can be deposited by a thin film deposition
process, and nitrogen ions can be used for sputtering titanium, for
example in a nitrogen gas background, to create the non-metallic
barrier layer. Chemical vapor deposition can also or alternatively
be used to create non-metallic barrier layers. In another
implementation, gas phase reactions of the components elements or
compounds forming the non-metallic electrically conductive compound
can be used to create multi-component non-metallic barrier
layers.
[0058] In some implementations, the heat conductivity of a carrier
mount 304 can advantageously exceed 50 Watts per meter-Kelvin or,
optionally 100 Watts per meter-Kelvin or, optionally 150 Watts per
meter-Kelvin. Suitable carrier mount materials can include, but are
not limited to copper tungsten, tungsten, copper-diamond, aluminum
nitride, silicon, silicon nitride, silicon carbide, beryllium
oxide, alumina (Al2O3), Kovar, Alloy 42, Alloy 52, and the like. A
heat spreader or carrier mount 304 that is thermally expansion
matched to the semiconductor laser chip 302 can be used in some
implementations. In one example consistent with an implementation
of the current subject matter, an approximately 15% copper,
approximately 85% tungsten sintered metal heat spreader, a
beryllium oxide heat spreader, an alumina heat spreader, a sapphire
heat spreader, a copper-diamond heat spreader, or the like can
provide a good thermal expansion match to a gallium antimonide
(GaSb) semiconductor laser chip 302 at around approximately 7
ppm.degree. C.-1. In another example consistent with an
implementation of the current subject matter, a pure tungsten heat
spreader, a silicon heat spreader, a silicon nitride heat spreader,
a silicon carbide heat spreader, a sapphire heat spreader, a copper
diamond heat spreader, or an aluminum nitride (AlN) heat spreader
can be used as a carrier mount 304 to provide a good thermal
expansion match to an indium phosphide (InP) semiconductor laser
chip 302 at around 4.5 ppm.degree. C.-1. A silicon, silicon
carbide, silicon nitride, aluminum nitride, tungsten, copper
diamond heat spreader, or the like can also be used as the carrier
sub-mount 304, for example for an indium phosphide (InP)
semiconductor laser chip 302.
[0059] Other carrier mounts consistent with implementations of the
current subject matter include, but are not limited to shaped
copper tungsten heat spreaders, including but not limited to
semiconductor laser industry standard c-mounts and CT-mounts,
TO-cans, pattern metallized ceramics, pattern metallized silicon,
pattern metallized silicon carbide, pattern metallized silicon
nitride, pattern metallized beryllium oxide, pattern metallized
alumina, pattern metallized aluminum nitride, copper-diamond, pure
copper with one or more sections of expansion-matched submounts to
match to one or more semiconductor laser chip compositions,
tungsten submounts brazed into a copper or copper tungsten c-mount,
or the like. Semiconductor laser chips 302 can be formed, without
limitation of indium phosphide crystals, gallium arsenide crystals,
gallium antimonide crystals, gallium nitride crystals, and the
like.
[0060] The subject matter described herein can be embodied in
systems, apparatus, methods, and/or articles depending on the
desired configuration. The implementations set forth in the
foregoing description do not represent all implementations
consistent with the subject matter described herein. Instead, they
are merely some examples consistent with aspects related to the
described subject matter. Although a few variations have been
described in detail above, other modifications or additions are
possible. In particular, further features and/or variations can be
provided in addition to those set forth herein. For example, the
implementations described above can be directed to various
combinations and subcombinations of the disclosed features and/or
combinations and subcombinations of several further features
disclosed above. In addition, the logic flows depicted in the
accompanying figures and/or described herein do not necessarily
require the particular order shown, or sequential order, to achieve
desirable results. Other implementations may be within the scope of
the following claims.
* * * * *