U.S. patent application number 16/725155 was filed with the patent office on 2020-05-14 for semiconductor devices and methods of fabricating the same.
The applicant listed for this patent is SAMSUNG ELECTRONICS CO., LTD.. Invention is credited to SANGHOON BAEK, JUNG-HO DO, JONGHOON JUNG, SEUNGYOUNG LEE, JINYOUNG LIM, TAEJOONG SONG, GIYOUNG YANG.
Application Number | 20200152640 16/725155 |
Document ID | / |
Family ID | 58721935 |
Filed Date | 2020-05-14 |
View All Diagrams
United States Patent
Application |
20200152640 |
Kind Code |
A1 |
DO; JUNG-HO ; et
al. |
May 14, 2020 |
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
Abstract
A semiconductor device including: a conductor disposed on a
substrate; a first contact disposed on the conductor; a second
contact having a first portion disposed on the first contact and a
second portion protruded away from the first portion in a direction
parallel to the substrate, wherein the first and second contacts
are disposed in an insulating layer; a via disposed on the
insulating layer and the second portion of the second contact; and
a metal line disposed on the via.
Inventors: |
DO; JUNG-HO; (YONGIN-SI,
KR) ; LEE; SEUNGYOUNG; (SEOUL, KR) ; JUNG;
JONGHOON; (SEONGNAM-SI, KR) ; LIM; JINYOUNG;
(SEOUL, KR) ; YANG; GIYOUNG; (SEOUL, KR) ;
BAEK; SANGHOON; (SEOUL, KR) ; SONG; TAEJOONG;
(SEONGNAM-SI, KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
SAMSUNG ELECTRONICS CO., LTD. |
SUWON-SI |
|
KR |
|
|
Family ID: |
58721935 |
Appl. No.: |
16/725155 |
Filed: |
December 23, 2019 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
15355159 |
Nov 18, 2016 |
10541243 |
|
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16725155 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 27/1104 20130101;
H01L 28/00 20130101; H01L 23/485 20130101; H01L 21/76895 20130101;
H01L 23/5226 20130101 |
International
Class: |
H01L 27/11 20060101
H01L027/11; H01L 23/522 20060101 H01L023/522; H01L 49/02 20060101
H01L049/02; H01L 21/768 20060101 H01L021/768 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 19, 2015 |
KR |
10-2015-0162668 |
Nov 19, 2015 |
KR |
10-2015-0162675 |
Apr 20, 2016 |
KR |
10-2016-0048379 |
Jul 8, 2016 |
KR |
10-2016-0086996 |
Claims
1. A semiconductor device, comprising: a first conductor disposed
on a substrate; a first contact disposed on the first conductor; a
second contact disposed on the substrate and spaced apart from the
first conductor and the first contact; and a third contact directly
disposed on the first and second contacts and connecting the first
and second contacts to each other.
2. The semiconductor device of claim 1, wherein the first to third
contacts are disposed in an insulating layer.
3. The semiconductor device of claim 1, wherein the first and
second contacts are disposed in an insulating layer and the third
contact is disposed on the insulating layer.
4. The semiconductor device of claim 1, further comprising: a via
disposed on the third contact; and a metal line disposed on the
via.
5. The semiconductor device of claim 4, wherein an upper surface of
the third contact is coplanar with an upper surface of each of the
first and second contacts.
6. The semiconductor device of claim 4, wherein a bottom surface of
the third contact is coplanar with an upper surface of each of the
first and second contacts.
7. The semiconductor device of claim 1, further comprising: a
second conductor disposed on the substrate, wherein the second
contact is disposed between the first and second conductors.
8. The semiconductor device of claim 1, wherein the first conductor
is a gate electrode and the first to third contacts are conductive
structures.
9. A semiconductor device, comprising: a first trench silicide
disposed on a substrate; a first contact disposed on an upper
surface of the first trench silicide, wherein the upper surface of
the first trench silicide is wider than a lower surface of the
first contact; a second trench silicide disposed on the substrate;
a second contact disposed on the second trench silicide; and a
third contact directly disposed on the first and second contacts
and connecting the first and second contacts to each other.
10. The semiconductor device of claim 9, wherein the first to third
contacts are disposed in an insulating layer.
11. A semiconductor device, comprising: a first contact disposed on
a substrate and extending lengthwise in a first direction; a second
contact disposed on the substrate and extending lengthwise in the
first direction; a conductor disposed between the first and second
contacts and extending lengthwise in the first direction; and a
third contact disposed on the first and second contacts and
extending lengthwise in a second direction crossing the first
direction, wherein a first portion of the third contact protrudes
beyond an edge of the first contact such that the first contact is
disposed between the first portion and the conductor in the second
direction.
12. The semiconductor device of claim 11, wherein a second portion
of the third contact protrudes beyond an edge of the second contact
such that the second contact is disposed between the second portion
and the conductor in the second direction.
13. The semiconductor device of claim 11, wherein the width of the
bottom surface of the third contact in the second direction is
greater than the width from a leftmost edge of the first contact to
a rightmost edge of the second contact in the second direction.
14. The semiconductor device of claim 11, wherein the first and
second contacts are disposed in an insulating layer and the third
contact is disposed on the insulating layer.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional of U.S. patent application
Ser. No. 15/355,159, filed on Nov. 18, 2016, which claims priority
under 35 U.S.C. .sctn. 119 to Korean Patent Application Nos.
10-2015-0162668, 10-2015-0162675, 10-2016-0048379 and
10-2016-0086996, filed on Nov. 19, 2015, Nov. 19, 2015, Apr. 20,
2016 and Jul. 8, 2016, respectively, in the Korean Intellectual
Property Office, the disclosures of which are incorporated by
reference herein in their entireties.
TECHNICAL FIELD
[0002] The present inventive concept relates to semiconductor
devices and methods of fabricating the same, and more particularly,
to semiconductor devices including field effect transistors and
methods of fabricating the same.
DISCUSSION OF RELATED ART
[0003] Due to their small-sizes, multifunctional, and/or low-cost
characteristics, semiconductor devices are ubiquitous in the
electronic industry. Semiconductor devices may be a memory device
for storing data, a logic device for processing data, or a hybrid
device including both of memory and logic elements. To meet
increased demand for electronic devices with fast speed and/or low
power consumption, semiconductor devices with high reliability,
high performance, and/or multiple functions are desired. To satisfy
these technical requirements, the complexity and/or integration
density of semiconductor devices are being increased.
SUMMARY
[0004] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a conductor disposed on a substrate; a first contact
disposed on the conductor; a second contact having a first portion
disposed on the first contact and a second portion protruded away
from the first portion in a direction parallel to the substrate,
wherein the first and second contacts are disposed in an insulating
layer; a via disposed on the insulating layer and the second
portion of the second contact; and a metal line disposed on the
via.
[0005] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a dummy conductor disposed on a substrate; a first
contact disposed on the dummy conductor; a trench silicide disposed
on the substrate and spaced apart from the dummy conductor; a
second contact disposed on the trench silicide; and a third contact
directly disposed on the first and second contacts and connecting
the first and second contacts to each other.
[0006] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a first conductor disposed on a substrate; a first
contact disposed on the first conductor; a second contact disposed
on the substrate and spaced apart from the first conductor and the
first contact; and a third contact directly disposed on the first
and second contacts and connecting the first and second contacts to
each other.
[0007] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a first trench silicide disposed on a substrate; a first
contact disposed on an upper surface of the first trench silicide,
wherein the upper surface of the first trench silicide is wider
than a lower surface of the first contact; a second trench silicide
disposed on the substrate; a second contact disposed on the second
trench silicide; and a third contact directly disposed on the first
and second contacts and connecting the first and second contacts to
each other.
[0008] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a first contact disposed on a substrate and extending
lengthwise in a first direction; a second contact disposed on the
substrate and extending lengthwise in the first direction; a
conductor disposed between the first and second contacts and
extending lengthwise in the first direction; and a third contact
disposed on the first and second contacts and extending lengthwise
in a second direction crossing the first direction, wherein a first
portion of the third contact protrudes beyond an edge of the first
contact such that the first contact is disposed between the first
portion and the conductor in the second direction.
[0009] According to an exemplary embodiment of the present
inventive concept, there is provided a semiconductor device
including: a first conductor disposed on a substrate; a first
contact disposed on the first conductor; a second conductor
disposed on the substrate and spaced apart from the first
conductor; a second contact disposed on the second conductor; and a
third contact directly disposed on the first and second contacts
and connecting the first and second contacts to each other.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] FIG. 1 is a block diagram illustrating a computer system for
performing a semiconductor design process, according to exemplary
embodiments of the present inventive concept.
[0011] FIG. 2 is a flow chart illustrating a method of designing
and fabricating a semiconductor device, according to exemplary
embodiments of the present inventive concept.
[0012] FIG. 3 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0013] FIG. 4 is a perspective view illustrating a semiconductor
device that is formed based on the layout of FIG. 3 according to
exemplary embodiments of the preset inventive concept.
[0014] FIG. 5 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0015] FIG. 6 is a perspective view illustrating a semiconductor
device that is formed based on the layout of FIG. 5 according to
exemplary embodiments of the preset inventive concept.
[0016] FIG. 7 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0017] FIG. 8 is a perspective view illustrating a semiconductor
device that is formed based on the layout of FIG. 7 according to
exemplary embodiments of the preset inventive concept.
[0018] FIG. 9 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0019] FIG. 10 is a perspective view illustrating a semiconductor
device that is formed based on the layout of FIG. 9 according to
exemplary embodiments of the preset inventive concept.
[0020] FIG. 11 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0021] FIG. 12 is a perspective view illustrating a semiconductor
device according to exemplary embodiments of the present inventive
concept.
[0022] FIG. 13 is a layout diagram including standard cell layouts
according to exemplary embodiments of the present inventive
concept.
[0023] FIG. 14A is a layout diagram illustrating a region `M` of
FIG. 13 according to exemplary embodiments of the present inventive
concept.
[0024] FIG. 14B is a layout diagram illustrating the region `M` of
FIG. 13 according to a comparative example.
[0025] FIG. 15A is a layout diagram illustrating a region `N` of
FIG. 13 according to exemplary embodiments of the inventive
concept.
[0026] FIG. 15B is a layout diagram illustrating the region `N` of
FIG. 13 according to a comparative example.
[0027] FIG. 16 is a plan view illustrating a semiconductor device
according to exemplary embodiments of the inventive concept.
[0028] FIGS. 17A, 17B, 17C, 17D, 17E, 17F, 17G, 17H, 17I, 17J, 17K,
17L, 17M, 17N, 17O, 17P, 17Q and 17R are sectional views taken
along lines A-A', B-B', C-C', D-D', E-E', F-F', G-G', H-H', I-I',
J-J', K-K', L-L', M-M', N-N', O-O', P-P', Q-Q', and R-R',
respectively, of FIG. 16 according to exemplary embodiments of the
preset inventive concept.
[0029] FIGS. 18A and 18B are sectional views taken along the line
A-A' of FIG. 16 to illustrate a semiconductor device according to
exemplary embodiments of the present inventive concept.
[0030] FIG. 18C is a sectional view taken along the line F-F' of
FIG. 16 to illustrate a semiconductor device according to exemplary
embodiments of the present inventive concept.
[0031] FIGS. 19, 21, 23, 25, 27, 29, and 31 are plan views
illustrating a method of fabricating a semiconductor device,
according to exemplary embodiments of the present inventive
concept.
[0032] FIGS. 20A, 22A, 24A, 26A, 28A, 30A, and 32A are sectional
views taken along lines A-A' of FIGS. 19, 21, 23, 25, 27, 29, and
31, respectively, according to exemplary embodiments of the preset
inventive concept.
[0033] FIGS. 20B, 22B, 24B, 26B, 28B, 30B, and 32B are sectional
views taken along lines B-B' of FIGS. 19, 21, 23, 25, 27, 29, and
31, respectively, according to exemplary embodiments of the preset
inventive concept.
[0034] FIGS. 22C, 24C, 26C, 28C, 30C, and 32C are sectional views
taken along lines C-C' of FIGS. 21, 23, 25, 27, 29, and 31,
respectively, according to exemplary embodiments of the preset
inventive concept.
[0035] FIGS. 28D, 30D, and 32D are sectional views taken along
lines D-D' of FIGS. 27, 29, and 31, respectively, according to
exemplary embodiments of the preset inventive concept.
[0036] FIGS. 30E and 32E are sectional views taken along lines E-E'
of FIGS. 29 and 31, respectively, according to exemplary
embodiments of the preset inventive concept.
[0037] FIG. 33 is a plan view illustrating a semiconductor device
that is fabricated based on standard cell layouts according to an
exemplary embodiment of the present inventive concept.
[0038] FIG. 34 is a plan view illustrating a semiconductor device
according to exemplary embodiments of the present inventive
concept.
[0039] FIGS. 35A through 35C are sectional views taken along lines
A-A', B-B', and C-C' of FIG. 34, respectively, according to
exemplary embodiments of the preset inventive concept.
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0040] FIG. 1 is a block diagram illustrating a computer system for
performing a semiconductor design process, according to exemplary
embodiments of the present inventive concept. Referring to FIG. 1,
a computer system may include a central processing unit (CPU) 10, a
working memory 30, an input-output device 50, and an auxiliary
memory device 70. In exemplary embodiments of the present inventive
concept, the computer system may be a customized system for
performing a layout design process according to exemplary
embodiments of the present inventive concept. Furthermore, the
computer system may include a computing system configured to
execute various design and check simulation programs.
[0041] The CPU 10 may be configured to run a variety of software,
such as application programs, operating systems, and device
drivers. For example, the CPU 10 may be configured to run an
operating system loaded on the working memory 30. Furthermore, the
CPU 10 may be configured to run various application programs on the
operating system. For example, the CPU 10 may be configured to run
a layout design tool 32 loaded on the working memory 30.
[0042] The operating system or application programs may be loaded
on the working memory 30. For example, when the computer system
starts a booting operation, an operating system (OS) image stored
in the auxiliary memory device 70 may be loaded on the working
memory 30 according to a booting sequence. In the computer system,
input/output operations may be managed by the operating system.
Certain application programs, which may be selected by a user or be
provided for basic services, may be loaded on the working memory
30. According to exemplary embodiments of the present inventive
concept, the layout design tool 32 prepared for a layout design
process may be loaded on the working memory 30, from the auxiliary
memory device 70.
[0043] The layout design tool 32 may provide a function for
changing biasing data for specific layout patterns. For example,
the layout design tool 32 may be configured to allow the specific
layout patterns to have shapes and positions different from those
defined by a design rule. The layout design tool 32 may be
configured to perform a design rule check (DRC) under the changed
condition of the biasing data. The working memory 30 may be a
volatile memory device (e.g., a static random access memory (SRAM)
or dynamic random access memory (DRAM) device) or a nonvolatile
memory device (e.g., a phase change random access memory (PRAM),
magnetoresistive random access memory (MRAM), resistive random
access memory (ReRAM), ferroelectric (FRAM), or NOR FLASH memory
device).
[0044] In addition, a simulation tool 34 may be loaded on the
working memory 30 to perform an optical proximity correction (OPC)
operation on the designed layout data.
[0045] The input-output device 50 may be configured to control user
input and output operations of user interface devices. For example,
the input-output device 50 may include a keyboard or a monitor,
allowing a designer to input relevant information. By using the
input-output device 50, the designer may receive information on
several regions or data paths, to which adjusted operating
characteristics can be applied, of a semiconductor device. The
input-output device 50 may be configured to display a progress
status or a process result of the simulation tool 34.
[0046] The auxiliary memory device 70 may be a storage medium for
the computer system. The auxiliary memory device 70 may be
configured to store application programs, an OS image, and various
data. The auxiliary memory device 70 may be provided in the form of
memory cards (e.g., a multimedia card (MMC), an embedded multimedia
card (eMMC), secure digital (SD), MicroSD, and so forth) or a hard
disk drive (HDD). The auxiliary memory device 70 may include a NAND
FLASH memory device with a large memory capacity. The auxiliary
memory device 70 may include nonvolatile memory devices (e.g.,
PRAM, MRAM, ReRAM, or FRAM) or NOR FLASH memory devices.
[0047] A system interconnector 90 may serve as a system bus for
realizing a network in the computer system. The CPU 10, the working
memory 30, the input-output device 50, and the auxiliary memory
device 70 may be electrically connected to each other through the
system interconnector 90, and thus, data may be exchanged
therebetween. However, the system interconnector 90 may not be
limited to the afore-described configuration. For example, the
system interconnector 90 may include an additional element for
increasing efficiency in data communication.
[0048] FIG. 2 is a flow chart illustrating a method of designing
and fabricating a semiconductor device, according to exemplary
embodiments of the present inventive concept.
[0049] Referring to FIG. 2, a high-level design process for a
semiconductor integrated circuit may be performed using the
computer system described with reference to FIG. 1 (in S110). For
example, in the high-level design process, an integrated circuit to
be designed may be described in terms of a high-level computer
language (e.g., C language). Circuits designed by the high-level
design process may be more concretely described by a register
transfer level (RTL) coding or a simulation. Furthermore, codes
generated by the RTL coding may be converted into a netlist, and
the results may be combined with each other to wholly describe a
semiconductor device. The combined schematic circuit may be
verified by a simulation tool. In exemplary embodiments of the
present inventive concept, an adjusting step may be further
performed, in consideration of a result of the verification
step.
[0050] A layout design process may be performed to realize a
logically complete form of the semiconductor integrated circuit on
a silicon wafer (in S120). For example, the layout design process
may be performed, based on the schematic circuit prepared in the
high-level design process or the corresponding netlist. The layout
design process may include a routing step of placing and connecting
various standard cells that are provided from a cell library, based
on a predetermined design rule. A diffusion prevention pattern may
be introduced at a boundary of at least one of the standard cells
and may be configured to have technical features suitable for
electric characteristics of the corresponding standard cell. Such a
redesigned standard cell may be provided in the cell library.
[0051] The cell library may contain information on operation,
speed, and power consumption of a plurality of cells. In exemplary
embodiments of the present inventive concept, a cell library for
representing a layout of a circuit in a gate level may be defined
in or by the layout design tool. Here, the layout may be prepared
to define or describe shapes, positions, or dimensions of patterns
constituting transistors and metal interconnection lines, which
will be actually formed on a silicon wafer. For example, to
actually form an inverter circuit on a silicon wafer, it may be
necessary to prepare or draw a layout for patterns (e.g., p-channel
metal oxide semiconductor (PMOS), n-channel metal oxide
semiconductor (NMOS), N-WELL, gate electrodes, and metal
interconnection lines thereon). For this reason, at least one of
the inverters defined in the cell library may be selected.
[0052] A routing step of connecting the selected cells to each
other may also be performed. For example, the routing step may be
performed on the selected and disposed standard cells to connect
them to upper interconnection lines. These steps may be
automatically or manually performed in the layout design tool. In
exemplary embodiments of the present inventive concept, a step of
placing the standard cells and establishing routing structures
thereto may be automatically performed by a Place & Routing
tool.
[0053] After the routing step, a verification step may be performed
on the layout to check whether there is a portion violating the
design rule. In exemplary embodiments of the present inventive
concept, the verification step may include evaluating verification
items, such as a design rule check (DRC), an electrical rule check
(ERC), and a layout vs. schematic (LVS). The evaluating of the DRC
item may be performed to evaluate whether the layout meets the
design rule. The evaluating of the ERC item may be performed to
evaluate whether there is an issue of electrical disconnection in
the layout. The evaluating of the LVS item may be performed to
evaluate whether the layout is prepared to coincide with the
gate-level netlist.
[0054] An optical proximity correction (OPC) step may be performed
(in S130). The OPC step may be performed to correct optical
proximity effects, which may occur when a photolithography process
is performed on a silicon wafer using a photomask manufactured
based on the layout. The optical proximity effect may be an
unintended optical effect (such as refraction or diffraction) which
may occur in the exposing process using the photomask manufactured
based on the layout. In the OPC step, the layout may be modified to
have a reduced difference in shape between designed patterns and
actually-formed patterns, which may be caused by the optical
proximity effects. As a result of the optical proximity correction
step, the designed shapes and positions of the layout patterns may
be slightly changed.
[0055] A photomask may be manufactured, based on the layout
modified by the OPC step (in S140). For example, the photomask may
be manufactured by patterning a chromium layer provided on a glass
substrate, using the layout pattern data.
[0056] The photomask manufactured may be used to manufacture a
semiconductor device (in S150). In the actual fabricating process,
the exposing and etching steps may be repeatedly performed, and
thus, patterns defined in the layout design process may be
sequentially formed on a semiconductor substrate.
[0057] FIG. 3 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept.
[0058] Referring to FIG. 3, a standard cell layout may include a
layout for an active region AR (hereinafter, also referred to as an
active region AR), a layout for a gate electrode GE (hereinafter,
also referred to as a gate pattern GP), a layout for a conductive
structure CP (hereinafter, also referred to as a conductive pattern
CL), a layout for a via (hereinafter, also referred to as via
pattern V0), and a layout for an interconnection line ML
(hereinafter, also referred to as a conductive line M1).
[0059] The active region AR may be a PMOSFET region or an NMOSFET
region. The gate pattern GP may cross the active region AR and
extend in a first direction D1. A portion of the active region AR,
which is not overlapped with the gate pattern GP, may serve as a
source/drain region SD.
[0060] The conductive pattern CL may include a connection pattern
M0 and an active contact pattern CA. The active contact pattern CA
may be disposed on the active region AR. The active contact pattern
CA may be spaced apart from the gate pattern GP in a second
direction D2 crossing the first direction D1. The connection
pattern M0 and the active contact pattern CA may be partially
overlapped with each other. The connection pattern M0 may extend in
the second direction D2.
[0061] The via pattern V0 and the conductive line M1 may be
disposed on the connection pattern M0. The via pattern V0 may be
overlapped with the connection pattern M0 but may be spaced apart
from the active contact pattern CA in the second direction D2. The
conductive line M1 may be overlapped with the via pattern V0 and
may extend in the first direction D1.
[0062] FIG. 4 is a perspective view illustrating a semiconductor
device according to exemplary embodiments of the present inventive
concept. For example, FIG. 4 is a perspective view illustrating a
semiconductor device that is formed based on the layout of FIG.
3.
[0063] Referring to FIG. 4, a substrate 100 with an active pattern
FN may be provided. The active pattern FN may be formed in
accordance with the active region AR described with reference to
FIG. 3. The active pattern FN may include a pair of source/drain
regions SD and a channel region AF between the source/drain regions
SD.
[0064] A gate electrode GE may be disposed on the channel region AF
to cross the active pattern FN. The gate electrode GE may extend in
a first direction D1 parallel to a top surface of the substrate
100. The gate electrode GE may be a pattern that is formed in
accordance with the gate pattern GP described with reference to
FIG. 3. A gate insulating pattern may be interposed between the
channel region AF and the gate electrode GE. The gate electrode GE
may include doped semiconductor materials, conductive metal
nitrides (e.g., titanium nitride or tantalum nitride), or metals
(e.g., aluminum or tungsten).
[0065] A conductive structure CP may be provided on at least one of
the source/drain regions SD. The conductive structure CP may
include a first portion P1 and a second portion P2. The conductive
structure CP may be a pattern that is formed in accordance with the
conductive pattern CL previously described with reference to FIG.
3. For example, the first portion P1 may be a pattern that is
formed in accordance with the connection pattern M0 described with
reference to FIG. 3, and the second portion P2 may be a pattern
that is formed in accordance with the active contact pattern CA
previously described with reference to FIG. 3.
[0066] The second portion P2 may be electrically connected to the
source/drain region SD. For example, the second portion P2 may
serve as a contact plug that is in direct contact with the
source/drain region SD. The second portion P2 may be spaced apart
from the gate electrode GE in a second direction D2 crossing the
first direction D1. The second portion P2 may extend in the first
direction D1.
[0067] The first portion P1 may extend from the second portion P2
in the second direction D2. Furthermore, the first portion P1 may
include a first end portion TP1 protruding from at least one
sidewall (e.g., a first sidewall SW1) of the second portion P2. The
first sidewall SW1 may be a sidewall that extends in the first
direction D1 and faces the gate electrode GE. In other words, the
first portion P1 may have a shape passing through a top portion of
the second portion P2.
[0068] A top surface P1t of the first portion P1 may be
substantially coplanar with a top surface P2t of the second portion
P2. A bottom surface P1b of the first portion P1 may be positioned
at a level higher than that of a bottom surface P2b of the second
portion P2. In other words, the bottom surface P1b of the first
portion is higher than the bottom surface P2b of the second portion
P2 with respect to an upper surface of the substrate 100. In
addition, the bottom surface P1b of the first portion P1 may be
positioned at a level higher than that of the top surface of the
gate electrode GE.
[0069] The first portion P1 and the second portion P2 may be
connected to each other to constitute the conductive structure CP,
which is provided in the form of a single body. The conductive
structure CP may include conductive metal nitrides (e.g., titanium
nitride or tantalum nitride) or metals (e.g., aluminum or
tungsten).
[0070] An interconnection line ML may be provided on the conductive
structure CP. The interconnection line ML may include a line
portion LI extending in the first direction D1 and a contact
portion VI vertically connecting the line portion LI to the
conductive structure CP. The line portion LI may be a pattern that
is formed in accordance with the conductive line M1 previously
described with reference to FIG. 3, and the contact portion VI may
be a pattern that is formed in accordance with the via pattern V0
previously described with reference to FIG. 3. The interconnection
line ML may include conductive metal nitrides (e.g., titanium
nitride or tantalum nitride) or metals (e.g., aluminum or
tungsten).
[0071] When viewed in a plan view, the line portion LI may be
spaced apart from the second portion P2 in the second direction D2.
However, the line portion LI may be electrically connected to the
second portion P2 through the contact portion VI and the first
portion P1. In other words, the line portion LI may be electrically
connected to the source/drain region SD. As a result, when the line
portion LI is horizontally spaced apart from the second portion P2,
the line portion LI and the second portion P2 may be electrically
connected to each other through the first portion P1. This may
allow electrical signals to be input to or output from the
source/drain region SD through the interconnection line ML.
[0072] Referring back to FIG. 3, the connection pattern M0 of the
conductive pattern CL may be used to increase a degree of freedom
in placing the conductive line M1 in a layout design process. As a
result, the routing step described with reference to FIG. 2 can be
easily performed on a standard cell layout.
[0073] FIG. 5 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept. In the following description of the
present embodiment, an element previously described with reference
to FIG. 3 may not be described in much further detail for the sake
of brevity.
[0074] Referring to FIG. 5, a standard cell layout may include an
active region AR, a gate pattern GP, a conductive pattern CL, a via
pattern V0, and a conductive line M1. The conductive pattern CL may
include a connection pattern M0 and a gate contact pattern CB. The
gate contact pattern CB may be disposed on the gate pattern GP. The
gate contact pattern CB may be overlapped with the connection
pattern M0. The connection pattern M0 may have a longitudinal axis
that is parallel to a second direction D2.
[0075] The via pattern V0 and the conductive line M1 may be
disposed on the connection pattern M0. The via pattern V0 may be
overlapped with the connection pattern M0 but may be spaced apart
from the gate contact pattern CB in the second direction D2. The
conductive line M1 may be overlapped with the via pattern V0 and
may extend in a first direction D1.
[0076] FIG. 6 is a perspective view illustrating a semiconductor
device according to exemplary embodiments of the present inventive
concept. For example, FIG. 6 is a perspective view illustrating a
semiconductor device that is formed based on the layout of FIG. 5.
In the following description of the present embodiment, an element
previously described with reference to FIG. 4 may not be described
in much further detail for the sake of brevity.
[0077] Referring to FIG. 6, a conductive structure CP may be
disposed on a gate electrode GE. The conductive structure CP may
include a first portion P1 and a third portion P3. The third
portion P3, not the second portion P2, may be provided in the
conductive structure CP, unlike the conductive structure CP
previously described with reference to FIG. 4. The first portion P1
may be a pattern that is formed in accordance with the connection
pattern M0 previously described with reference to FIG. 5, and the
third portion P3 may be a pattern that is formed in accordance with
the gate contact pattern CB previously described with reference to
FIG. 5.
[0078] The third portion P3 may be electrically connected to the
gate electrode GE. For example, the third portion P3 may serve as a
contact plug that is in direct contact with the source/drain
regions SD. The third portion P3 may be vertically spaced apart
from the source/drain regions SD.
[0079] The first portion P1 may be extended from the third portion
P3 in a direction opposite to the second direction D2. Furthermore,
the first portion P1 may include second end portions TP2 protruding
from both sidewalls (e.g., second sidewalls SW2) of the third
portion P3. In other words, the first portion P1 may have a line
width greater than that of the third portion P3.
[0080] A top surface P1t of the first portion P1 may be
substantially coplanar with a top surface P3t of the third portion
P3. A bottom surface P1b of the first portion P1 may be higher than
a bottom surface P3b of the third portion P3. For example, the
bottom surface P1b of the first portion P1 is higher than the
bottom surface P3b of the third portion P3 with respect to an upper
surface of the substrate 100. Since the bottom surface P3b of the
third portion P3 is positioned at substantially the same level as
the top surface of the gate electrode GE, the bottom surface P1b of
the first portion P1 may be higher than the top surface of the gate
electrode GE.
[0081] An interconnection line ML may be provided on the conductive
structure CP. When viewed in a plan view, a line portion LI of the
interconnection line ML may be spaced apart from the third portion
P3 in the second direction D2. However, the line portion LI may be
electrically connected to the third portion P3 via a contact
portion VI and the first portion P1. For example, the line portion
LI may be electrically connected to the gate electrode GE. As a
result, when the line portion LI is horizontally spaced apart from
the third portion P3, the line portion LI and the third portion P3
may he electrically connected to each other through the first
portion P1. This may allow electrical signals to be input or output
to or from the gate electrode GE through the interconnection line
ML.
[0082] FIG. 7 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept. In the following description of the
present embodiment, an element previously described with reference
to FIGS. 3 and 5 may not be described in much further detail for
the sake of brevity.
[0083] Referring to FIG. 7, a standard cell layout may include an
active region AR, a gate pattern GP, a conductive pattern CL, a via
pattern V0, and a conductive line M1. The conductive pattern CL may
include a connection pattern M0, an active contact pattern CA and a
gate contact pattern CB.
[0084] The active contact pattern CA may be disposed on the active
region AR, and the gate contact pattern CB may be disposed on the
gate pattern GP. The active contact pattern CA and the connection
pattern M0 may be partially overlapped with each other, and the
gate contact pattern CB may be overlapped with the connection
pattern M0.
[0085] To reduce complexity in the drawings and to provide better
understanding of exemplary embodiments of the inventive concept,
the via pattern V0 and the conductive line M1 are not shown in FIG.
7; however, they may be freely disposed on the connection pattern
M0, as previously described with reference to FIGS. 3 and 5, for
example.
[0086] FIG. 8 is a perspective view illustrating a semiconductor
device according to exemplar embodiments of the present inventive
concept. For example, FIG. 8 is a perspective view illustrating a
semiconductor device that is formed based on the layout of FIG. 7.
In the following description of the present embodiment, an element
previously described with reference to FIGS. 4 and 6 may not be
described in much further detail for the sake of brevity.
[0087] Referring to FIG. 8, a conductive structure CP may be
disposed on a substrate 100. The conductive structure CP may
include a first portion P1, a second portion P2, and a third
portion P3. The second portion P2 may be disposed on and
electrically connected to the source/drain region SD, and the third
portion P3 may be disposed on and electrically connected to the
gate electrode GE. The first portion P1 may extend in a second
direction D2 and may connect the second portion P2 and the third
portion P3 to each other.
[0088] A top surface P1t of the first portion P1, a top surface P2t
of the second portion P2, and a top surface P3t of the third
portion P3 may be substantially coplanar with each other. A bottom
surface P1b of the first portion P1, a bottom surface P2b of the
second portion P2, and a bottom surface P3b of the third portion P3
may be positioned at different heights with respect to an upper
surface of the substrate 100. For example, the bottom surface P1b
of the first portion P1 may be higher than the bottom surface P3b
of the third portion P3, and the bottom surface P3b of the third
portion P3 may be higher than the bottom surface P2b of the second
portion P2.
[0089] An interconnection line ML, as previously described with
reference to FIGS. 3 and 5, may be provided on the conductive
structure CP.
[0090] FIG. 9 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept. In the following description of the
present embodiment, an element previously described with reference
to FIG. 3 may not be described in much further detail for the sake
of brevity.
[0091] Referring to FIG. 9, a standard cell layout may include an
active region AR, a gate pattern GP, a conductive pattern CL, a via
pattern V0, and a conductive line M1. The conductive pattern CL may
include a connection pattern M0 and a pair of active contact
patterns CA.
[0092] The active contact patterns CA may be respectively disposed
on opposite portions of the active region AR that are positioned at
both sides of the gate pattern GP. Each of the active contact
patterns CA may be overlapped with the connection pattern M0. The
connection pattern M0 may cross the gate pattern GP and extend in a
second direction D2.
[0093] To reduce complexity in the drawings and to provide better
understanding of exemplary embodiments of the present inventive
concept, the via pattern V0 and the conductive line M1 are not
shown in FIG. 9; however, they may be freely disposed on the
connection pattern M0, as previously described with reference to
FIG. 3, for example.
[0094] FIG. 10 is a perspective view illustrating a semiconductor
device according to exemplary embodiments of the present inventive
concept. For example, FIG. 10 is a perspective view illustrating a
semiconductor device that is formed based on the layout of FIG. 9.
In the following description of the present embodiment, an element
previously described with reference to FIG. 4 may not be described
in much further detail for the sake of brevity.
[0095] Referring to FIG. 10, a conductive structure CP may be
disposed on a substrate 100. The conductive structure CP may
include a first portion P1 and a pair of second portions P2. The
second portions P2 may be disposed on and electrically connected to
the source/drain regions SD, respectively, which are disposed at
both sides of the gate electrode GE. Here, the first portion P1 may
be formed to cross the gate electrode GE and extend in a second
direction D2 and may be used to connect the second portions P2 to
each other. In other words, the first portion P1 may connect the
second portions P2, which are spaced apart from each other with the
gate electrode GE interposed therebetween, to each other.
[0096] An interconnection line ML may be provided on the conductive
structure CP, as previously described with reference to FIG. 3.
[0097] FIG. 11 is a layout diagram illustrating a portion of a
standard cell layout according to exemplary embodiments of the
present inventive concept. In the following description of the
present embodiment, an element previously described with reference
to FIG. 5 may not be described in much further detail for the sake
of brevity.
[0098] Referring to FIG. 11, a standard cell layout may include an
active region AR, gate patterns GP, a conductive pattern CL, a via
pattern V0, and a conductive line M1. The conductive pattern CL may
include a connection pattern M0 and a pair of gate contact patterns
CB.
[0099] The gate contact patterns CB may be disposed on the gate
patterns GP, respectively. The gate contact patterns CB may be
overlapped with the connection pattern M0. The connection pattern
M0 may cross the gate patterns GP and extend in a second direction
D2.
[0100] To reduce complexity in the drawings and to provide better
understanding of exemplary embodiments of the present inventive
concept, the via pattern V0 and the conductive line M1 are not
shown in FIG. 11; however, they may be freely disposed on the
connection pattern M0, as previously described with reference to
FIG. 5, for example.
[0101] FIG. 12 is a perspective view illustrating a semiconductor
device according to exemplary embodiments of the present inventive
concept. For example, FIG. 12 is a perspective view illustrating a
semiconductor device that is formed based on the layout of FIG. 11.
In the following description of the present embodiment, an element
previously described with reference to FIG. 6 may not be described
in much further detail for the sake of brevity.
[0102] Referring to FIG. 12, a conductive structure CP may be
disposed on gate electrodes GE that are formed on a substrate 100.
The conductive structure CP may include a first portion P1 and a
pair of third portions P3. The third portions P3 may be
electrically connected to the gate electrodes GE, respectively.
Here, the first portion P1 may extend in a second direction D2 to
cross the gate electrodes GE, and the third portions P3 may be
connected to each other by the first portion P1.
[0103] An interconnection line ML may be provided on the conductive
structure CP, as previously described with reference to FIG. 3.
[0104] FIG. 13 is a layout diagram including standard cell layouts
according to exemplary embodiments of the present inventive
concept. In the following description of the present embodiment, an
element previously described with reference to FIGS. 3, 5, 7, 9,
and 11 may not be described in much further detail for the sake of
brevity.
[0105] Referring to FIG. 13, a layout design tool may be used to
dispose standard cell layouts side by side. As an example, the
standard cell layouts may include first to third standard cell
layouts STD1, STD2, and STD3. The first to third standard cell
layouts STD1, STD2, and STD3 may be arranged in a second direction
D2. Each of the first to third standard cell layouts STD1, STD2,
and STD3 may include a logic layout for logic transistors, an
interconnection line layout for interconnection lines provided on
the logic transistors, and a contact layout for contacts connecting
the logic transistors and the interconnection lines to each
other.
[0106] The logic layout may include active layouts for active
regions. The active layouts may include a PMOSFET region PR and an
NMOSFET region NR. The PMOSFET region PR and the NMOSFET region NR
may be spaced apart from each other in a first direction D1
crossing the second direction D2.
[0107] The logic layout may include layouts (e.g., gate patterns
GP) for gate electrodes, which extend in the first direction D1 and
cross the PMOSFET region PR and the NMOSFET region NR. The gate
patterns GP may be spaced apart from each other in the second
direction D2. The PMOSFET region PR, the NMOSFET region NR, and the
gate patterns GP may constitute logic transistors provided on a
semiconductor substrate 100.
[0108] The contact layout may include layouts (e.g., lower
conductive patterns LP) for a lower conductive structure overlapped
with or connected to each of the PMOSFET region PR and the NMOSFET
region NR, layouts (e.g., connection patterns M0a-M0h) for
connection patterns M0, layouts (e.g., active contact patterns
CAa-CAl) for an active contact AC overlapped with or connected to
the lower conductive patterns LP, and layouts (e.g., gate contact
patterns CBa-CBh) for gate contacts GC overlapped with or connected
to the gate patterns GP. Each of the connection patterns M0a-M0h
may be overlapped with or connected to at least one of the active
contact patterns CAa-CAl and the gate contact patterns CBa-CBh. In
addition, layouts (e.g., conductive patterns CL1-CL8) for a
conductive structure CP may be defined in the contact layout. The
conductive patterns CL1-CL8 may include first to eighth conductive
patterns CL1-CL8.
[0109] The interconnection line layout may include layouts (e.g.,
via patterns V0) for via patterns, layouts (e.g., conductive lines
M1a-M1g) for interconnection lines, and layouts (e.g., power lines
PM1 and PM2) for power interconnection lines. Each of the first and
second power lines PM1 and PM2 may be a line-shaped structure
extending in the second direction D2. The first and second power
lines PM1 and PM2 may be connected to some of the active contact
patterns CAa-CAl through the via patterns V0. The conductive lines
M1a-M1g may be connected to some of the connection patterns
M0a-M0h, some of the active contact patterns CAa-CAl, and some of
the gate contact patterns CBa-CBh through the via patterns V0.
[0110] The first standard cell layout STD1 will now be described.
For example, first active contact patterns CAa may be provided to
be overlapped with the first and second power lines PM1 and PM2,
respectively. The first and second power lines PM1 and PM2 may be
respectively connected to the first active contact patterns CAa
through the via patterns V0. A first gate contact pattern CBa may
be provided to be overlapped with at least one of the gate patterns
GP. The first conductive line M1a may be connected to the first
gate contact pattern CBa through the via pattern V0.
[0111] A pair of first conductive patterns CL1 may be disposed to
be adjacent to the first conductive line M1a. The pair of first
conductive patterns CL1 may be disposed on the PMOSFET region PR
and the NMOSFET region NR, respectively. Each of the first
conductive patterns CL1 may include a second active contact pattern
CAb and a first connection pattern M0a. The second active contact
pattern CAb and the first connection pattern M0a may be partially
overlapped with each other. A second conductive line M1b may be
connected to the pair of first conductive patterns CL1,
respectively, through the via patterns V0.
[0112] A pair of second conductive patterns CL2 may be disposed on
a boundary between the first standard cell layout STD1 and the
second standard cell layout STD2. The pair of second conductive
patterns CL2 may be disposed on the PMOSFET region PR and the
NMOSFET region NR, respectively. Each of the second conductive
patterns CL2 may include a second gate contact pattern CBb, a
second connection pattern M0b, and a third active contact pattern
CAc. The second gate contact pattern CBb may be overlapped with the
second connection pattern M0b. The third active contact pattern CAc
and the second connection pattern M0b may be partially overlapped
with each other. However, the second gate contact pattern CBb and
the third active contact pattern CAc may be spaced apart from each
other in the second direction D2. The first and second power lines
PM1 and PM2 may be connected to the pair of second conductive
patterns CL2, respectively, through the via patterns V0.
[0113] The second standard cell layout STD2 will now be described.
A pair of third conductive patterns CL3 may be disposed on the
substrate 100. The pair of third conductive patterns CL3 may be
disposed on the PMOSFET region PR and the NMOSFET region NR,
respectively. Each of the third conductive patterns CL3 may include
a fourth active contact pattern CAd, a fifth active contact pattern
CAe, and a third connection pattern M0c. The fourth and fifth
active contact patterns CAd and CAe may be spaced apart from each
other in the second direction D2 with the gate pattern GP
interposed therebetween. The third connection pattern M0c may cross
the gate pattern GP and extend in the second direction D2. The
fourth active contact pattern CAd and the third connection pattern
M0c may be partially overlapped with each other, and the fifth
active contact pattern CAe and the third connection pattern M0c may
be partially overlapped with each other.
[0114] A fourth conductive pattern CL4 may be disposed to be
adjacent to the pair of third conductive patterns CL3. The fourth
conductive pattern CL4 may be disposed between the PMOSFET region
PR and the NMOSFET region NR. The fourth conductive pattern CL4 may
include a third gate contact pattern CBc, a fourth gate contact
pattern CBd, and a fourth connection pattern M0d. The third and
fourth gate contact patterns CBc and CBd may each be overlapped
with adjacent gate patterns GP. The fourth connection pattern M0d
may cross the gate patterns GP and extend in the second direction
D2. The third and fourth gate contact patterns CBc and CBd may be
overlapped with the fourth connection pattern M0d. A third
conductive line M1c may be connected to the fourth conductive
pattern CL4 through the via pattern V0.
[0115] A pair of sixth active contact patterns CAf may be disposed
between the gate patterns GP connected to the third and fourth gate
contact patterns CBc and CBd, respectively. The pair of sixth
active contact patterns CAf may be disposed on the PMOSFET region
PR and the NMOSFET region NR, respectively. A fourth conductive
line M1d may be connected to the pair of sixth active contact
patterns CAf through the via patterns V0.
[0116] If the fourth connection pattern M0d is omitted, the third
and fourth conductive lines M1c and M1d may not be formed in the
shapes and positions shown in FIG. 13. For example, the first and
second conductive lines M1a and M1b may have shapes and positions
similar to those shown in FIG. 14B.
[0117] A pair of fifth conductive patterns CL5 may be disposed on a
boundary between the second standard cell layout STD2 and the third
standard cell layout STD3. The pair of fifth conductive patterns
CL5 may be disposed on the PMOSFET region PR and the NMOSFET region
NR, respectively. Each of the fifth conductive patterns CL5 may
include a seventh active contact pattern CAg, a fifth connection
pattern M0e, a fifth gate contact pattern CBe, and an eighth active
contact pattern CAh. The fifth gate contact pattern CBe may be
overlapped with the fifth connection pattern M0e. The seventh
active contact pattern CAg and the fifth connection pattern M0e may
be partially overlapped with each other, and the eighth active
contact pattern CAh and the fifth connection pattern M0e may be
partially overlapped with each other. The seventh and eighth active
contact patterns CAg and CAh and the fifth gate contact pattern CBe
may be spaced apart from each other in the second direction D2. The
eighth active contact pattern CAh may extend in the first direction
D1 and may be partially overlapped with the power lines PM1 and
PM2. The first and second power lines PM1 and PM2 may be connected
to the pair of fifth conductive patterns CL5, respectively, through
the via patterns V0.
[0118] The third standard cell layout STD3 will now be described.
For example, a sixth gate contact pattern CBf and a seventh gate
contact pattern CBg may be provided on the substrate 100. The sixth
and seventh gate contact patterns CBf and CBg may be disposed
between the PMOSFET region PR and the NMOSFET region NR. The sixth
and seventh gate contact patterns CBf and CBg may be respectively
overlapped with the gate patterns GP that are adjacent to each
other. Furthermore, the sixth and seventh gate contact patterns CBf
and CBg may be overlapped with a fifth conductive line M1e. The
fifth conductive line M1e may include a first portion, which is
overlapped with the sixth and seventh gate contact patterns CBf and
CBg and extends in the second direction D2, and a second portion
extending in the first direction D1. The fifth conductive line M1e
may be connected to the sixth and seventh gate contact patterns CBf
and CBg through the via patterns V0.
[0119] A sixth conductive pattern CL6 may be disposed to be
adjacent to the fifth conductive line M1e. The sixth conductive
pattern CL6 may be disposed between the PMOSFET region PR and the
NMOSFET region NR. The sixth conductive pattern CL6 may include an
eighth gate contact pattern CBh and a sixth connection pattern M0f.
The eighth gate contact pattern CBh may extend in the second
direction D2 and may be overlapped with a pair of the gate patterns
GP that are adjacent to each other. The sixth connection pattern
M0f may include a first portion, which extends in the second
direction D2 and is overlapped with the eighth gate contact pattern
CBh, and a second portion extending in the first direction D1. The
second portion of the sixth connection pattern M0f may be
overlapped with the sixth conductive line M1f. The sixth conductive
line M1f may be connected to the sixth conductive pattern CL6
through the via pattern V0.
[0120] A seventh conductive pattern CL7 may be provided on the
NMOSFET region NR. The seventh conductive pattern CL7 may include a
ninth active contact pattern CAi, a tenth active contact pattern
CAj, and a seventh connection pattern M0g. The ninth and tenth
active contact patterns CAi and CAj may be spaced apart from each
other in the second direction D2 with the gate patterns GP
interposed therebetween. The seventh connection pattern M0g may
include a first portion, which extends in the first direction D1
and is overlapped with the ninth active contact pattern CAi, a
second portion, which extends in the first direction D1 and is
overlapped with the tenth active contact pattern CAj, and a third
portion, which extends in the second direction D2 and crosses the
gate patterns GP.
[0121] An eighth conductive pattern CL8 may be disposed to be
adjacent to the sixth conductive pattern CL6. The eighth conductive
pattern CL8 may extend from the PMOSFET region PR to the NMOSFET
region NR. The eighth conductive pattern CL8 may include an
eleventh active contact pattern CAk, a twelfth active contact
pattern CAl, and an eighth connection pattern M0h. The eleventh and
twelfth active contact patterns CAk and CAl may be disposed on the
PMOSFET region PR and the NMOSFET region NR, respectively. The
eleventh active contact pattern CAk may be overlapped with the
sixth conductive line M1f. The eighth connection pattern M0h may
include a first portion, which extends in the second direction D2
and is overlapped with the eleventh active contact pattern CAk, a
second portion, which extends in the second direction D2 and is
overlapped with the twelfth active contact pattern CAl, and a third
portion, which extends in the first direction D1 and connects the
first and second portions to each other. The first portion of the
eighth connection pattern M0h may cross at least one of the gate
patterns GP. Furthermore, the eighth connection pattern M0h and a
seventh conductive line M1g may be partially overlapped with each
other. The seventh conductive line M1g may be connected to the
eighth connection pattern M0h through the via pattern V0.
[0122] In the pair of first conductive patterns CL1 described
above, a pair of the second active contact patterns CAb may be
connected to each other through the first connection patterns M0a
and the second conductive line M1b. In the eighth conductive
pattern CL8, the eleventh and twelfth active contact patterns CAk
and CAl may be electrically connected to each other through only
the eighth connection pattern M0h.
[0123] So far, examples of the first to eighth conductive patterns
CL1-CL8, which are disposed on the first to third standard cell
layouts STD1, STD2, and STD3, have been described. However, the
inventive concept may not be limited thereto. For example, the
active contact patterns, the gate contact patterns, and the
connection patterns may be changed in terms of their shapes and
positions and may be connected to each other in various
manners.
[0124] FIG. 14A is a layout diagram illustrating a region `M` of
FIG. 13 according to exemplary embodiments of the present inventive
concept. FIG. 14B is a layout diagram illustrating the region `M`
of FIG. 13 according to a comparative example.
[0125] Referring to FIG. 14A, the first gate contact pattern CBa,
the pair of first conductive patterns CL1, and the first and second
conductive lines M1a and M1b that have been previously described
with reference to FIG. 13 may be disposed on the substrate 100. The
first conductive line M1a may be connected to the first gate
contact pattern CBa through a via pattern V0. Each of the first
conductive patterns CL1 may include a second active contact pattern
CAb and a first connection pattern M0a. The first connection
pattern M0a and the second conductive line M1b may be partially
overlapped with each other. Accordingly, the second conductive line
M1b may be connected to the pair of the first connection patterns
M0a through the via patterns V0.
[0126] Each of the first and second conductive lines M1a and M1b
may include pin regions PI for establishing routing paths to upper
interconnection lines. As an example, each of the first and second
conductive lines M1a and M1b may include five pin regions PI, which
are arranged parallel to its longitudinal axis or in the first
direction D1. In other words, the first and second conductive lines
M1a and M1b may include ten pin regions PI.
[0127] Referring to FIG. 14B, a first gate contact pattern CBa, a
pair of second active contact patterns CAb, and first and second
conductive lines M1a and M1b may be disposed on a substrate.
However, unlike that of FIG. 14A, the first connection patterns M0a
are not included. The second conductive line M1b may include a
first portion extending in a first direction D1 and second
portions, which extend in a second direction D2 and are overlapped
with the pair of second active contact patterns CAb, respectively.
The second conductive line M1b may be connected to the pair of
second active contact patterns CAb through via patterns V0.
[0128] Each of the first and second conductive lines M1a and M1b
may include pin regions PI for establishing routing paths to upper
interconnection lines. Due to the second portions of the second
conductive line M1b, a length of the first conductive line M1a in
the first direction D1 may be shorter than that of the first
conductive line M1a of FIG. 14A. Thus, the first conductive line
M1a may include, for example, three pin regions PI, and the second
conductive line M1b may include five pin regions PI. As a result,
the first and second conductive lines M1a and M1b may include eight
pin regions PI. In other words, the number of the pin regions PI on
the first and second conductive lines M1a and M1b may be less than
that in the embodiment described with reference to FIG. 14A.
[0129] FIG. 15A is a layout diagram illustrating a region `N` of
FIG. 13 according to exemplary embodiments of the present inventive
concept. FIG. 15B is a layout diagram illustrating the region `N`
of FIG. 13 according to a comparative example.
[0130] Referring to FIG. 15A, the sixth conductive pattern CL6, the
eighth conductive pattern CL8, and the sixth and seventh conductive
lines M1f and M1g previously described with reference to FIG. 13
may be disposed on the substrate 100. The sixth conductive pattern
CL6 may include an eighth gate contact pattern CBh and a sixth
connection pattern M0f. The eighth conductive pattern CL8 may
include an eleventh active contact pattern CAk, a twelfth active
contact pattern CAl, and an eighth connection pattern M0h. The
sixth connection pattern M0f and the sixth conductive line M1f may
be partially overlapped with each other, and the eighth connection
pattern M0h and the seventh conductive line M1g may be partially
overlapped with each other. Accordingly, the sixth conductive line
M1f may be connected to the sixth connection pattern M0f through
the via pattern V0, and the seventh conductive line M1g may be
connected to the eighth connection pattern M0h through the via
pattern V0.
[0131] Each of the sixth and seventh conductive lines M1f and M1g
may include pin regions PI for establishing routing paths to upper
interconnection lines. As an example, each of the sixth and seventh
conductive lines M1f and M1g may include five pin regions PI, which
are arranged parallel to its longitudinal axis or in the first
direction D1. In other words, the sixth and seventh conductive
lines M1f and M1g may include ten pin regions PI.
[0132] Referring to FIG. 15B, a sixth conductive pattern CL6, an
eleventh active contact pattern CAk, a twelfth active contact
pattern CAl, and sixth and seventh conductive lines M1f and M1g may
be disposed on a substrate. However, unlike that of FIG. 15A, the
eighth connection pattern M0h is not included. The seventh
conductive line M1g may include a first portion extending in a
first direction D1 and second portions, which extend in a second
direction D2 and are overlapped with the eleventh and twelfth
active contact patterns CAk and CAl, respectively. The seventh
conductive line M1g may be connected to each of the eleventh and
twelfth active contact patterns CAk and CAl through via patterns
V0.
[0133] Each of the sixth and seventh conductive lines M1f and M1g
may include pin regions PI for establishing routing paths to upper
interconnection lines. Due to the second portions of the seventh
conductive line M1g, a length of the sixth conductive line M1f in
the first direction D1 may be shorter than that of the sixth
conductive line M1f of FIG. 15A. Thus, the sixth conductive line
M1f may include, for example, three pin regions PI, and the seventh
conductive line M1g may include five pin regions PI. As a result,
the sixth and seventh conductive lines M1f and M1g may include
eight pin regions PI. In other words, the number of the pin regions
PI on the sixth and seventh conductive lines M1f and M1g may be
less than that in the embodiment described with reference to FIG.
15A.
[0134] As described with reference to FIGS. 14 and 15, a standard
cell layout according to exemplary embodiments of the present
inventive concept may include an additional connection pattern, as
well as an active contact pattern and a gate contact pattern. Thus,
it is possible to increase a degree of freedom in placing a layout
for interconnection lines or conductive lines and to increase an
area of pin regions for establishing routing paths to upper
interconnection lines. In other words, the connection pattern makes
it possible to more easily construct a routing structure.
[0135] FIG. 16 is a plan view illustrating a semiconductor device
according to exemplary embodiments of the present inventive
concept. FIGS. 17A through 17R are sectional views taken along
lines A-A', B-B', C-C', D-D', E-E', F-F', G-G', H-H', I-I', J-J',
K-K', L-L', M-M', N-N', O-O', P-P', Q-Q', and R-R', respectively,
of FIG. 16. For example, FIG. 16 and FIGS. 17A through 17R
illustrate an example of a semiconductor device that is formed
based on the standard cell layouts of FIG. 13. In the following
description of the present embodiment, an element previously
described with reference to FIGS. 4, 6, 8, 10, and 12 may not be
described in much further detail for the sake of brevity.
[0136] In a semiconductor device to be described with reference to
FIGS. 16 and 17A to 17R, each element of the semiconductor device
may be integrated on a semiconductor substrate 100 through the
photolithography process S150 of FIG. 2, and thus, they may not be
identical to corresponding patterns constituting the standard cell
layout of FIG. 13. The semiconductor device may be, for example, a
system-on-chip.
[0137] Referring to FIGS. 16 and 17A to 17R, second device
isolation patterns ST2 may be provided on a substrate 100 to define
a PMOSFET region PR and an NMOSFET region NR. The second device
isolation patterns ST2 may be provided in an upper portion of the
substrate 100. In exemplary embodiments of the present inventive
concept, the substrate 100 may be a silicon substrate, a germanium
substrate, or a silicon-on-insulator (SOI) substrate.
[0138] The PMOSFET and NMOSFET regions PR and NR may be spaced
apart from each other, in a first direction D1 parallel to a top
surface of the substrate 100, by the second device isolation
patterns ST2 interposed therebetween. Although each of the PMOSFET
and NMOSFET regions PR and NR is illustrated to be a single region,
each of the PMOSFET and NMOSFET regions PR and NR may include a
plurality of regions spaced apart from each other by the second
device isolation patterns ST2.
[0139] A plurality of first active patterns FN1 may be provided on
the PMOSFET region PR to extend in a second direction D2 crossing
the first direction D1, and a plurality of second active patterns
FN2 may be provided on the NMOSFET region NR to extend in the
second direction D2. The first and second active patterns FN1 and
FN2 may be parts of the substrate 100 and may have a protruding
shape. In other words, they may protrude from the substrate 100.
The first and second active patterns FN1 and FN2 may be arranged in
the first direction D1. First device isolation patterns ST1
extending in the second direction D2 may be disposed at both sides
of each of the first and second active patterns FN1 and FN2.
[0140] Between the first device isolation patterns ST1, upper
portions of the first and second active patterns FN1 and FN2 may
vertically protrude with respect to the first device isolation
patterns ST1. In other words, each of the upper portions of the
first and second active patterns FN1 and FN2 may have a fin-shaped
structure, between the first device isolation patterns ST1.
[0141] The second device isolation patterns ST2 may be
substantially connected to the first device isolation patterns ST1
to form a single insulating pattern. The second device isolation
patterns ST2 may be thicker than the first device isolation
patterns ST1. In this case, the first device isolation patterns ST1
and the second device isolation patterns ST2 may be formed by
different processes. As an example, the first and second device
isolation patterns ST1 and ST2 may be formed of or include a
silicon oxide layer.
[0142] Gate electrodes GE may be provided on the first and second
active patterns FN1 and FN2 to extend in the first direction D1 and
to cross the first and second active patterns FN1 and FN2. The gate
electrodes GE may be spaced apart from each other in the second
direction D2. Each of the gate electrodes GE may extend in the
first direction D1 and cross the PMOSFET region PR, the second
device isolation patterns ST2, and the NMOSFET region NR.
[0143] In exemplary embodiments of the present inventive concept,
dummy gate electrodes DM may be respectively provided on a boundary
between a first standard cell STDC1 and a second standard cell
STDC2 and on a boundary between the second standard cell STDC2 and
a third standard cell STDC3. Each of the dummy gate electrodes DM
may be divided into two electrodes, by the second device isolation
pattern ST2, but the present inventive concept may not be limited
thereto. The dummy gate electrodes DM may have substantially the
same structure as the gate electrodes GE and may be formed of
substantially the same material as the gate electrodes GE. In a
circuit, the dummy gate electrodes DM may serve as a conductive
line, of a transistor.
[0144] A gate insulating pattern GI may be provided below each of
the gate electrodes GE, and gate spacers GS may be provided at both
sides of each of the gate electrodes GE. Furthermore, a capping
pattern CP may be provided to cover a top surface of each of the
gate electrodes GE. However, in exemplary embodiments of the
present inventive concept, the capping pattern CP may be partially
removed from a portion of the top surface of the gate electrode GE,
to which a gate contact GC to be described below is connected. The
gate insulating pattern GI may be vertically extended to cover both
sidewalls of the gate electrode GE. For example, the gate
insulating pattern GI may be interposed between the gate electrode
GE and the gate spacer GS. First to third interlayer insulating
layers 110-130 may be provided to cover the first and second active
patterns FN1 and FN2 and the gate electrodes GE.
[0145] The gate electrodes GE may be formed of or include doped
semiconductor materials, conductive metal nitrides, or metals. The
gate insulating pattern GI may be formed of or include a silicon
oxide layer, a silicon oxynitride layer, or high-k dielectric
materials, whose dielectric constants are lower than that of
silicon oxide. Each of the capping pattern CP and the gate spacers
GS may include a silicon oxide layer, a silicon nitride layer, or a
silicon oxynitride layer. Each of the first to third interlayer
insulating layers 110-130 may include a silicon oxide layer or a
silicon oxynitride layer.
[0146] Source/drain regions SD may be provided on or in the upper
portions of the first and second active patterns FN1 and FN2. The
source/drain regions SD on the PMOSFET region PR may be p-type
impurity regions, and the source/drain regions SD on the NMOSFET
region NR may be n-type impurity regions. Channel regions AF may be
provided in the upper portion of each of the first and second
active patterns FN1 and FN2 that are overlapped with the gate
electrodes GE, respectively. Each of the channel regions AF may be
interposed between the source/drain regions SD.
[0147] The source/drain regions SD may be epitaxial patterns formed
by a selective epitaxial growth process. Accordingly, the
source/drain regions SD may have top surfaces positioned at a
higher level than those of the channel regions AF. The source/drain
regions SD may include a semiconductor element different from those
of the substrate 100. As an example, the source/drain regions SD
may be formed of or include a semiconductor material having a
lattice constant different from (for example, greater or smaller
than) the substrate 100. Accordingly, the source/drain regions SD
may exert a compressive stress or a tensile stress on the channel
regions AF.
[0148] Lower conductive structures TS may be provided on the
PMOSFET and NMOSFET regions PR and NR between the gate electrodes
GE. The lower conductive structures TS may be a pattern that is
formed in accordance with the lower conductive patterns LP of FIG.
13. The lower conductive structures TS may be provided in the first
interlayer insulating layer 110 and may be directly connected to
the source/drain regions SD. The lower conductive structures TS may
extend in the first direction D1. Each of the lower conductive
structures TS may be partially overlapped with a first or second
power interconnection line PL1 or PL2, when viewed in a plan view.
The lower conductive structures TS may have top surfaces that are
substantially coplanar with that of the first interlayer insulating
layer 110. In the present embodiment, each of the lower conductive
structures TS are illustrated to be in contact with a plurality of
the source/drain regions SD, but the present inventive concept may
not be limited thereto. As an example, at least one of the lower
conductive structures TS may be in contact with one or two of the
source/drain regions SD. The lower conductive structures TS may be
formed of or include doped semiconductor materials, conductive
metal nitrides, metals, or metal silicides.
[0149] Conductive structures GC, AC, and CP1-CP8 may be provided in
the second interlayer insulating layer 120. The conductive
structures GC, AC, and CP1-CP8 may include gate contacts GC, active
contacts AC, and first to eighth conductive structures CP1-CP8. The
conductive structures GC, AC, and CP1-CP8 may be patterns that are
formed in accordance with the connection patterns M0a-M0h, the
active contact patterns CAa-CAl, and the gate contact patterns
CBa-CBh of FIG. 13. The conductive structures GC, AC, and CP1-CP8
may include conductive metal nitrides or metals.
[0150] The conductive structures GC, AC, and CP1-CP8 may have top
surfaces that are substantially coplanar with that of the second
interlayer insulating layer 120. In addition, the active contacts
AC may have bottom surfaces that are substantially coplanar with
that of the second interlayer insulating layer 120. The bottom
surfaces of the gate contacts GC may be lower than that of the
second interlayer insulating layer 120. In other words, the bottom
surfaces of the gate contacts GC may be lower than those of the
active contacts AC. The first to eighth conductive structures
CP1-CP8 will be described in more detail below.
[0151] Barrier patterns BL may be respectively interposed between
the second interlayered insulating layer 120 and the conductive
structures GC, AC, and CP1-CP8. The barrier pattern BL may directly
cover side and bottom surfaces of the conductive structures GC, AC,
and CP1-CP8, except for top surfaces thereof. The barrier patterns
BL may include a metal nitride for preventing metallic elements in
the conductive structures GC, AC, and CP1-CP8 from being diffused.
For example, the barrier patterns BL may be formed of or include
TiN.
[0152] First and second power interconnection lines PL1 and PL2 and
first to sixth interconnection lines ML1-ML6 may be provided in the
third interlayer insulating layer 130. The first and second power
interconnection lines PL1 and PL2 may be patterns that are formed
in accordance with the power lines PM1 and PM2 of FIG. 13, and the
first to sixth interconnection lines ML1-ML6 may be patterns that
are formed in accordance with the conductive lines M1a-M1f of FIG.
13.
[0153] Each of the first and second power interconnection lines PL1
and PL2 and each of the first to sixth interconnection lines
ML1-ML6 may include a line portion LI extending parallel to the top
surface of the substrate 100 and a contact portion VI, which is
vertically connected to the conductive structures GC, AC, and
CP1-CP8. The contact portion VI may be a pattern that is formed in
accordance with the via pattern V0 of FIG. 13.
[0154] Barrier patterns BL may be respectively interposed between
the third interlayer insulating layer 130 and the first and second
power interconnection lines PL1 and PL2 and between the third
interlayer insulating layer 130 and the first to sixth
interconnection lines ML1-ML6. The barrier patterns BL may include
a metal nitride for preventing metallic elements from being
diffused. For example, the barrier patterns BL may be formed of or
include TiN.
[0155] The first standard cell STDC1 will be described with
reference to FIGS. 16 and 17A to 17E. A pair of the active contacts
AC may be provided on the lower conductive structures TS disposed
below the first or second power interconnection line PL1 or PL2. In
other words, when viewed in a sectional view, the pair of active
contacts AC may be interposed between the first or second power
interconnection line PL1 and PL2 and the lower conductive
structures TS. The pair of active contacts AC may be patterns that
are formed in accordance with the pair of first active contact
patterns CAa of FIG. 13. The pair of active contacts AC may be
electrically connected to the first and second power
interconnection lines PL1 and PL2. A power or ground voltage
applied to the first and second power interconnection lines PL1 and
PL2 may be applied to the lower conductive structures TS through
the pair of active contacts AC (e.g., see FIG. 17D). Here, since,
when viewed in a plan view, the lower conductive structures TS may
be overlapped with the first and second power interconnection lines
PL1 and PL2, the power or ground voltage may be applied to the
lower conductive structures TS through a vertical and straight
current path.
[0156] The gate contact GC may be provided on at least one gate
electrode GE of the first standard cell STDC1. The gate contact GC
may be provided on the second device isolation pattern ST2 between
the PMOSFET region PR and the NMOSFET region NR. The gate contact
GC may be a pattern that is formed in accordance with the first
gate contact pattern CBa of FIG. 13. The first interconnection line
ML1 may be provided on and connected to the gate contact GC. For
example, the first interconnection line ML1 and the gate electrode
GE may be electrically connected to each other through the gate
contact GC.
[0157] A pair of the first conductive structures CP1 may be
provided on the PMOSFET region PR and the NMOSFET region NR of the
first standard cell STDC1, respectively. The pair of first
conductive structures CP1 may be patterns that are formed in
accordance with the pair of first conductive patterns CL1 of FIG.
13. Each of the first conductive structures CP1 may include a first
portion P1 and a second portion P2.
[0158] The first portion P1 may be a pattern that is formed in
accordance with the first connection pattern M0a of FIG. 13, and
the second portion P2 may be a pattern that is formed in accordance
with the second active contact pattern CAb of FIG. 13. For example,
the second portion P2 may be connected to the lower conductive
structure TS, and the first portion P1 may extend from the second
portion P2 in a direction parallel to a top surface of the
substrate 100.
[0159] The first conductive structures CP1 may be similar to the
conductive structure CP previously described with reference to FIG.
4. However, the semiconductor device according to the present
embodiment may further include the lower conductive structure TS
provided between the active regions AR and the first conductive
structures CP1. For example, the first portion P1 and the second
portion P2 may have top surfaces that are substantially coplanar
with each other, but a bottom surface of the first portion P1 may
be higher than that of the second portion P2. The bottom surface of
the second portion P2 may be positioned at substantially the same
height as those of the active contacts AC.
[0160] The second interconnection line ML2 may be provided on and
connected to the first conductive structures CP1. In other words,
the second interconnection line ML2 and the lower conductive
structures TS may be electrically connected to each other through
the first conductive structures CP1. In addition, the source/drain
regions SD on the PMOSFET region PR may be electrically connected
to the source/drain regions SD on the NMOSFET region NR through the
lower conductive structures TS, the first conductive structures
CP1, and the second interconnection line ML2.
[0161] The second conductive structures CP2 provided at an
interface between the first standard cell STDC1 and the second
standard cell STDC2 will be described with reference to FIGS. 16
and 17F to 17H. A pair of the second conductive structures CP2 may
be provided on the PMOSFET region PR and the NMOSFET region NR,
respectively. The pair of second conductive structures CP2 may be
patterns that are formed in accordance with the pair of second
conductive patterns CL2 of FIG. 13. Each of the second conductive
structures CP2 may include a first portion P1, a second portion P2,
and a third portion P3.
[0162] The first portion P1 may be a pattern that is formed in
accordance with the second connection pattern M0b of FIG. 13, the
second portion P2 may be a pattern that is formed in accordance
with the third active contact pattern CAc of FIG. 13, and the third
portion P3 may be a pattern that is formed in accordance with the
second gate contact pattern CBb of FIG. 13. For example, the second
portion P2 may be connected to the lower conductive structure TS,
and the third portion P3 may be connected to the gate electrode GE.
The first portion P1 may extend in a direction parallel to a top
surface of the substrate 100 and connect the second portion P2 and
the third portion P3 to each other.
[0163] The second conductive structures CP2 may be similar to the
conductive structure CP previously described with reference to FIG.
8. For example, the first portion P1, the second portion P2, and
the third portion P3 may have top surfaces that are substantially
coplanar with each other. However, the first portion P1, the second
portion P2, and the third portion P3 may have bottom surfaces that
are positioned at different heights. For example, the bottom
surface of the second portion P2 may be higher than that of the
third portion P3, and the bottom surface of the first portion P1
may be higher than that of the second portion P2. The bottom
surface of the third portion P3 may be positioned at the same
height as bottom surfaces of the gate contacts GC.
[0164] The first and second power interconnection lines PL1 and PL2
may be connected to the second conductive structures CP2,
respectively, through the second portions P2. In other words, the
first and second power interconnection lines PL1 and PL2 may be
electrically connected to the lower conductive structures TS and
the gate electrodes GE through the second conductive structures
CP2.
[0165] The second standard cell STDC2 will be described with
reference to FIGS. 16 and 17I to 17M. A pair of the third
conductive structures CP3 may be provided to be adjacent to each of
the pair of second conductive structures CP2. The pair of third
conductive structures CP3 may be provided on the PMOSFET region PR
and the NMOSFET region NR, respectively. The pair of third
conductive structures CP3 may be patterns that are formed in
accordance with the pair of third conductive patterns CL3 of FIG.
13. Each of the third conductive structures CP3 may include a first
portion P1 and a pair of second portions P2.
[0166] The first portion P1 may be a pattern that is formed in
accordance with the third connection pattern M0c of FIG. 13, and
the second portions P2 may be patterns that are respectively formed
in accordance with the fourth active contact pattern CAd and the
fifth active contact pattern CAe of FIG. 13. For example, the pair
of second portions P2 may be respectively connected to a pair of
the lower conductive structures TS, which are disposed to be
adjacent to each other with the gate electrode GE interposed
therebetween. The first portion P1 may extend parallel to the top
surface of the substrate 100 and may connect the second portions P2
to each other.
[0167] The third conductive structures CP3 may be similar to the
conductive structure CP previously described with reference to FIG.
10. For example, the first portion P1 and the second portions P2
may have top surfaces that are substantially coplanar with each
other, but a bottom surface of the first portion P1 may be higher
than that of the second portions P2. Since the bottom surface of
the first portion P1 is higher than top surfaces of the lower
conductive structures TS and a top surface of the gate electrode
GE, the third conductive structure CP3 may electrically connect the
lower conductive structures TS, which are spaced apart from each
other in the second direction D2, to each other. This way, the gate
electrode GE is not short circuited. In other words, the third
conductive structures CP3 may each serve as a juniper for
electrically connecting the source/drain regions SD that are
separated from each other in the second direction D2.
[0168] A fourth conductive structure CP4 may be provided on an
adjacent pair of the gate electrodes GE of the second standard cell
STDC2. The fourth conductive structure CP4 may be provided on a
second device isolation pattern ST2 between the PMOSFET and NMOSEET
regions PR and NR. The fourth conductive structure CP4 may be a
pattern that is formed in accordance with the fourth conductive
pattern CL4 of FIG. 13. The fourth conductive structure CP4 may
include a first portion P1 and a pair of third portions P3.
[0169] The first portion P1 may be a pattern that is formed in
accordance with the fourth connection pattern M0d of FIG. 13, and
the third portions P3 may be patterns that are respectively formed
in accordance with the third gate contact pattern CBc and the
fourth gate contact pattern CBd of FIG. 13. For example, the pair
of third portions P3 may be connected to the pair of gate
electrodes GE, respectively. The first portion P1 may extend
parallel to the top surface of the substrate 100 and may connect
the third portions P3 to each other.
[0170] The fourth conductive structure CP4 may be similar to the
conductive structure CP previously described with reference to FIG.
12. For example, the first portion P1 and the third portions P3 may
have top surfaces that are substantially coplanar with each other,
but a bottom surface of the first portion P1 may be higher than
that of the third portions P3. Since the bottom surface of the
first portion P1 is higher than the top surfaces of the lower
conductive structures TS, the third conductive structure CP3 may
connect the pair of gate electrodes GE electrically to each other,
without shorting the lower conductive structures TS adjacent
thereto.
[0171] The third interconnection line ML3 may be provided on and
connected to the fourth conductive structure CP4. When viewed in a
plan view, the third interconnection line ML3 may be spaced apart
from the pair of gate electrodes GE in the second direction D2.
When the third interconnection line ML3 is not overlapped with at
least one of the pair of gate electrodes GE in a plan view, the
third interconnection line ML3 may be electrically connected to the
pair of gate electrodes GE through the first portion P1.
[0172] A pair of the active contacts AC may be respectively
provided on the PMOSFET region PR and the NMOSFET region NR to be
adjacent to the fourth conductive structure CP4. The pair of active
contacts AC may be patterns that are formed in accordance with the
pair of sixth active contact patterns CAf of FIG. 13.
[0173] The fourth interconnection line ML4 may be provided on and
connected to the pair of active contacts AC. When viewed in a plan
view, the fourth interconnection line ML4 may cross the fourth
conductive structure CP4 and extend in the first direction D1.
Since a bottom surface of the line portion LI of the fourth
interconnection line ML4 is higher than a top surface of the fourth
conductive structure CP4, the fourth interconnection line ML4 may
be vertically separated from the fourth conductive structure
CP4.
[0174] The fifth conductive structures CP5, which are provided at
an interface between the second standard cell STDC2 and the third
standard cell STDC3, will be described with reference to FIGS. 16
and 17N. A pair of the fifth conductive structures CP5 may be
provided on the PMOSFET region PR and the NMOSFET region NR,
respectively. The pair of fifth conductive structures CP5 may be
patterns that are formed in accordance with the pair of fifth
conductive patterns CL5 of FIG. 13. Each of the fifth conductive
structures CP5 may include a first portion P1, second portions P2,
and a third portion P3.
[0175] The first portion P1 may be a pattern that is formed in
accordance with the fifth connection pattern M0e of FIG. 13, the
second portions P2 may be patterns that are respectively formed in
accordance with the seventh active contact pattern CAg and the
eighth active contact pattern CAh of FIG. 13, and the third portion
P3 may be a pattern that is formed in accordance with the fifth
gate contact pattern CBe of FIG. 13. For example, the second
portions P2 may be connected to a pair of the lower conductive
structures TS that are adjacent to each other, and the third
portion P3 may be connected to the gate electrode GE between the
pair of lower conductive structures TS. In other words, when viewed
in a plan view, the third portion P3 may be interposed between the
second portions P2. One of the second portions P2 may extend
farther in the first direction D1, compared with the other, and
thus, it may be overlapped with the first or second power
interconnection line PL1 and PL2, when viewed in a plan view. The
first portion P1 may extend the second direction D2 and may connect
the second portions P2 and the third portion P3 to each other.
Except that a plurality of second portions P2 are provided, the
fifth conductive structures CP5 may be similar to the second
conductive structures CP2 described above.
[0176] The third standard cell STDC3 will be described with
reference to FIGS. 16 and 17O to 17R. A first gate group GG1 and a
second gate group GG2 may be provided on the third standard cell
STDC3. Each of the first and second gate groups GG1 and GG2 may
include a pair of the gate electrodes GE that are disposed to be
adjacent to each other. Furthermore, the first gate group GG1 and
the second gate group GG2 may be adjacent to each other.
[0177] A pair of the gate contacts GC may be provided on the pair
of gate electrodes GE, respectively, of the first gate group GG1.
Furthermore, a sixth conductive structure CP6 may be provided on
the second gate group GG2. The pair of gate contacts GC may be
patterns that are respectively formed in accordance with the sixth
gate contact pattern CBf and the seventh gate contact pattern CBg
of FIG. 13. The sixth conductive structure CP6 may be a pattern
that is formed in accordance with the sixth conductive pattern CL6
of FIG. 13. The sixth conductive structure CP6 may include a first
portion P1 and a third portion P3.
[0178] The first portion P1 may be a pattern that is formed in
accordance with the sixth connection pattern M0f of FIG. 13, and
the third portion P3 may be a pattern that is formed in accordance
with the eighth gate contact pattern CBh of FIG. 13. The third
portion P3 may extend in the second direction D2 and may be
connected to both of the pair of gate electrodes GE of the second
gate group GG2. The first portion P1 of the sixth conductive
structure CP6 may include a first extended portion HP1 extending in
the second direction D2 and a second extended portion HP2 extending
in the first direction D1. The first extended portion HP1 may be
overlapped with the third portion P3. In this case, the first
extended portion HP1 and the third portion P3 may be connected to
each other to constitute a single body.
[0179] A fifth interconnection line ML5 may be provided on the pair
of gate contacts GC, and a sixth interconnection line ML6 may be
provided on the sixth conductive structure CP6. The fifth
interconnection line ML5 may include a first region extending in
the first direction D1 and a second region extending from the first
region in the second direction D2. The second region of the fifth
interconnection line ML5 may be overlapped with the pair of gate
contacts GC, when viewed in a plan view. The fifth interconnection
line ML5 may be connected to the pair of gate contacts GC through
the second region.
[0180] The second extended portion HP2 of the sixth conductive
structure CP6 may be partially overlapped with the sixth
interconnection line ML6, when viewed in a plan view. The sixth
interconnection line ML6 may be connected to the sixth conductive
structure CP6 through the second extended portion HP2.
[0181] A seventh conductive structure CP7 may be provided on the
NMOSFET region NR to be adjacent to the pair of gate contacts GC
and the sixth conductive structure CP6. The seventh conductive
structure CP7 may be a pattern that is formed in accordance with
the seventh conductive pattern CL7 of FIG. 13. The seventh
conductive structure CP7 may include a first portion P1 and a pair
of second portions P2. The seventh conductive structure CP7 may be
similar to the third conductive structure CP3 described above.
[0182] The first portion P1 may be a pattern that is formed in
accordance with the seventh connection pattern M0g of FIG. 13, and
the second portions P2 may be patterns that are respectively formed
in accordance with the ninth active contact pattern CAi and the
tenth active contact pattern CAj of FIG. 13. The second portions P2
may be spaced apart from each other with at least one of the gate
electrodes GE interposed therebetween. The first portion P1 of the
seventh conductive structure CP7 may include a first extended
portion HP1 extending in the second direction D2 and a pair of
second extended portions HP2 extending in the first direction D1.
The pair of second extended portions HP2 may be overlapped with the
pair of second portions P2, respectively. In other words, the first
portion P1 may connect the pair of second portions P2 to each
other.
[0183] An eighth conductive structure CP8 may be provided to be
adjacent to the seventh conductive structure CP7. The eighth
conductive structure CP8 may extend from the PMOSFET region PR to
the NMOSFET region NR. The eighth conductive structure CP8 may be a
pattern that is formed in accordance with the eighth conductive
pattern CL8 of FIG. 13. The eighth conductive structure CP8 may
include a first portion P1 and a pair of second portions P2.
[0184] The first portion P1 may be a pattern that is formed in
accordance with the eighth connection pattern M0h of FIG. 13, and
the second portions P2 may be patterns that are respectively formed
in accordance with the eleventh and twelfth active contact patterns
CAk and CAl of FIG. 13.
[0185] For example, the second portions P2 may be connected to the
lower conductive structure TS on the PMOSFET region PR and the
lower conductive structure TS on the NMOSFET region NR,
respectively. As an example, the second portion P2 on the PMOSFET
region PR may be overlapped with the sixth interconnection line
ML6, when viewed in a plan view.
[0186] The first portion P1 of the eighth conductive structure CP8
may include a pair of first extended portions HP1 extending in the
second direction D2 and a second extended portion HP2 extending in
the first direction D1. The pair of first extended portions HP1 may
be overlapped with the pair of second portions P2, respectively.
For example, the first extended portion HP1 on the PMOSFET region
PR may be provided to cross at least one of the gate electrodes GE.
In other words, the first portion P1 may connect the pair of second
portions P2 to each other. As a result, the source/drain regions SD
on the PMOSFET region PR and the source/drain regions SD on the
NMOSFET region NR may be electrically connected to each other
through the lower conductive structures TS and the eighth
conductive structure CP8.
[0187] In the case of the first conductive structures CP1 described
above, the source/drain regions SD on the PMOSFET region PR and the
source/drain regions SD on the NMOSFET region NR may be connected
to each other in the first direction D1 through the second
interconnection line ML2. In the case of the eighth conductive
structure CP8, the source/drain regions SD on the PMOSFET region PR
and the source/drain regions SD on the NMOSFET region NR may be
electrically connected to each other in the first direction D1
through the first portion P1 of the eighth conductive structure
CP8.
[0188] A seventh interconnection line ML7 may be provided on the
eighth conductive structure CP8. The second extended portion HP2 of
the eighth conductive structure CP8 may be partially overlapped
with the seventh interconnection line ML7, when viewed in a plan
view. The seventh interconnection line ML7 may be connected to the
eighth conductive structure CP8 through the second extended portion
HP2.
[0189] FIGS. 18A and 18B are sectional views taken along line A-A'
of FIG. 16 to illustrate a semiconductor device according to
exemplary embodiments of the present inventive concept. FIG. 18C is
a sectional view taken along line F-F' of FIG. 16 to illustrate a
semiconductor device according to exemplary embodiments of the
present inventive concept. In the following description of the
present embodiment, an element previously described with reference
to FIG. 16 and FIGS. 17A through 17P may not be described in much
further detail for the sake of brevity.
[0190] Referring to FIGS. 16 and 18A, a first conductive structure
CP1 may be provided. Unlike the first conductive structure CP1 of
FIG. 17A, the first conductive structure CP1 may further include a
first vertically-extended portion VP1. For example, a second
portion P2 of the first conductive structure CP1 may include the
first vertically-extended portion VP1 vertically extending toward a
substrate 100. The first vertically-extended portion VP1 may be
provided to cover an upper portion of a sidewall of a lower
conductive structure TS. A bottom surface of the first
vertically-extended portion VP1 may be lower than a top surface of
the lower conductive structure TS. When viewed in a plan view, the
first vertically-extended portion VP1 may be overlapped with a
first portion P1 of the first conductive structure CP1.
[0191] Referring to FIGS. 16 and 18B, a first conductive structure
CP1 may be provided. Unlike the first conductive structure CP1 of
FIG. 17A, the first conductive structure CP1 may further include a
pair of first vertically-extended portions VP1. For example, a
second portion P2 of the first conductive structure CP1 may include
the pair of first vertically-extended portions VP1 vertically
extending toward a substrate 100. The pair of first
vertically-extended portions VP1 may be provided to cover upper
portions of both sidewalls of the lower conductive structure TS.
Bottom surfaces of the first vertically-extended portions VP1 may
be lower than a top surface of the lower conductive structure TS.
When viewed in a plan view, the first vertically-extended portions
VP1 may be overlapped with a first portion P1 of the first
conductive structure CP1.
[0192] Referring to FIGS. 16 and 18C, a second conductive structure
CP2 may be provided. Unlike the second conductive structure CP2 of
FIG. 17F, the second conductive structure CP2 may further include a
first vertically-extended portion VP1 and a second
vertically-extended portion VP2. For example, a second portion P2
of the second conductive structure CP2 may include the first
vertically-extended portion VP1 vertically extending toward a
substrate 100, and a third portion P3 of the second conductive
structure CP2 may include the second vertically-extended portion
VP2 vertically extending toward the substrate 100. The first
vertically-extended portion VP1 may be provided to cover an upper
portion of a sidewall of a lower conductive structure TS. A bottom
surface of the first vertically-extended portion VP1 may be lower
than a top surface of the lower conductive structure TS. The second
vertically-extended portion VP2 may be provided to cover an upper
portion of a sidewall of a gate electrode GE. A bottom surface of
the second vertically-extended portion VP2 may be lower than a top
surface of the gate electrode GE. When viewed in a plan view, the
first and second vertically-extended portions VP1 and VP2 may be
overlapped with a first portion P1 of the second conductive
structure CP2.
[0193] FIGS. 19, 21, 23, 25, 27, 29, and 31 are plan views
illustrating a method of fabricating a semiconductor device,
according to exemplary embodiments of the present inventive
concept. FIGS. 20A, 22A, 24A, 26A, 28A, 30A, and 32A are sectional
views taken along lines A-A' of FIGS. 19, 21, 23, 25, 27, 29, and
31, respectively, FIGS. 20B, 22B, 24B, 26B, 28B, 30B and 32B are
sectional views taken along lines B-B' of FIGS. 19, 21, 23, 25, 27,
29, and 31, respectively, FIGS. 22C, 24C, 26C, 28C, 30C, and 32C
are sectional views taken along lines C-C' of FIGS. 21, 23, 25, 27,
29, and 31, respectively, FIGS. 28D, 30D, and 32D are sectional
views taken along lines D-D' of FIGS. 27, 29, and 31, respectively,
and FIGS. 30E and 32E are sectional views taken along lines E-E' of
FIGS. 29 and 31, respectively. A method of fabricating a
semiconductor device using the standard cell layout of FIG. 13 will
be described below. For the sake of simplicity, the description
that follows will refer to an example related to a fabrication
method using the first standard cell STDC1 of FIG. 16; however,
this method may be applied for other standard cells (e.g., STDC2,
STDC3, and so forth).
[0194] Referring to FIGS. 19, 20A, and 20B, a substrate 100 may be
provided. In exemplary embodiments of the present inventive
concept, the substrate 100 may be a silicon substrate, a germanium
substrate, or a silicon-on-insulator (SOI) substrate. Active
patterns FN may be formed in an upper portion of the substrate 100.
First device isolation patterns ST1 may be formed to fill a gap
between the active patterns FN. The first device isolation patterns
ST1 may be recessed to expose upper portions of the active patterns
FN. Second device isolation patterns ST2 may be formed on the
substrate 100 to define a border between a PMOSFET region PR and an
NMOSFET region NR. In exemplary embodiments of the present
inventive concept, when the second device isolation patterns ST2
are formed, the active patterns FN may be removed from regions
other than the PMOSFET and NMOSFET regions PR and NR. The active
patterns FN on the PMOSFET region PR may be referred to as `first
active patterns FN1`, and the active patterns FN on the NMOSFET
region NR may be referred to as `second active patterns FN2`.
[0195] The first and second device isolation patterns ST1 and ST2
may be formed by a shallow trench isolation (STI) process. The
first and second device isolation patterns ST1 and ST2 may be
formed of or include silicon oxide. The first device isolation
patterns ST1 may be formed to have a depth less than that of the
second device isolation patterns ST2. In this case, the first
device isolation patterns ST1 and the second device isolation
patterns ST2 may be formed by different processes. In exemplary
embodiments of the present inventive concept, the first device
isolation patterns ST1 may be formed to have substantially the same
depth as that of the second device isolation patterns ST2. For
example, the first device isolation patterns ST1 and the second
device isolation patterns ST2 may be formed at substantially the
same time by the same process.
[0196] Referring to FIGS. 21 and 22A to 22C, gate electrodes GE may
be formed to cross the first and second active patterns FN1 and FN2
and to extend in a first direction D1. The gate electrodes GE may
be spaced apart from each other in a second direction D2. A gate
insulating pattern GI may be formed below each of the gate
electrodes GE, and gate spacers GS may be formed on both side
surfaces of each of the gate electrodes GE. In addition, a capping
pattern CP may be formed to cover a top surface of each of the gate
electrodes GE.
[0197] For example, the formation of the gate electrodes GE may
include forming sacrificial patterns to cross the first and second
active patterns FN1 and FN2, forming gate spacers GS at both sides
of the sacrificial patterns, and replacing the sacrificial patterns
with the gate electrodes GE.
[0198] The gate electrodes GE may be formed of or include doped
semiconductor materials, conductive metal nitrides, or metals. The
gate insulating pattern GI may be formed of or include a silicon
oxide layer, a silicon oxynitride layer, or high-k dielectric
materials, whose dielectric constants are lower than that of
silicon oxide. Each of the capping pattern CP and the gate spacers
GS may be formed of or include a silicon oxide layer, a silicon
nitride layer, or a silicon oxynitride layer.
[0199] Source/drain regions SD may be formed on or in the upper
portions of the first and second active patterns FN1 and FN2. The
source/drain regions SD on the PMOSFET region PR may be doped with
p-type impurities, while the source/drain regions SD on the NMOSFET
region NR may be doped with n-type impurities.
[0200] In exemplary embodiments of the present inventive concept,
the source/drain regions SD may be epitaxial patterns, which are
formed using a selective epitaxial growth process. For example, the
formation of the source/drain regions SD may include partially
recessing the first and second active patterns FN1 and FN2 at both
sides of each of the gate electrodes GE and performing the
epitaxial growth process to form the source/drain regions SD in the
recessed regions of the first and second active patterns FN1 and
FN2. The epitaxial growth process may be performed using a
semiconductor material different from that of the substrate 100. As
an example, the source/drain regions SD may be formed of or include
a semiconductor material having a lattice constant different from
(for example, greater or smaller than) the substrate 100. Since the
source/drain regions SD are formed of a semiconductor material
different from that of the substrate 100, the source/drain regions
SD may exert a compressive stress or a tensile stress on the
channel regions AF therebetween.
[0201] Next, a first interlayer insulating layer 110 may be formed
to cover the source/drain regions SD and the gate electrodes GE.
The first interlayer insulating layer 110 may be formed of or
include a silicon oxide layer or a silicon oxynitride layer.
[0202] Referring to FIGS. 23 and 24A to 24C, lower conductive
structures TS may be formed on the source/drain regions SD of the
PMOSFET and NMOSFET regions PR and NR. Each of the lower conductive
structures TS may include at least a portion extending in the first
direction D1 or may have a line- or bar-shaped structure. In
addition, a portion of each of the lower conductive structures TS
may be positioned on the second device isolation pattern ST2, which
is adjacent to the PMOSFET region PR or the NMOSFET region NR. The
lower conductive structures TS may be formed to have top surfaces
that are substantially coplanar with that of the first interlayer
insulating layer 110.
[0203] For example, the formation of the lower conductive
structures TS may include patterning the first interlayer
insulating layer 110 to form holes exposing the source/drain
regions SD and filling the holes with a conductive material. Upper
portions of the source/drain regions SD may be etched or removed
during the formation of the holes. The lower conductive structures
TS may be formed of or include doped semiconductor materials,
conductive metal nitrides, metals, or metal silicides.
[0204] Referring to FIGS. 25 and 26A to 26C, a second interlayer
insulating layer 120 may be formed on the first interlayer
insulating layer 110. The second interlayer insulating layer 120
may be formed of a silicon oxide layer or a silicon oxynitride
layer.
[0205] A first photoresist pattern 125 may be formed on the second
interlayer insulating layer 120. The first photoresist pattern 125
may include openings, which are formed in accordance with the first
connection patterns M0a of FIG. 13. For example, the formation of
the first photoresist pattern 125 may include forming a first
photoresist layer on the second interlayer insulating layer 120 and
then performing an exposure and development process on the first
photoresist layer using a first photomask manufactured based on the
first connection patterns M0a of FIG. 13 (e.g., see steps S140 and
S150 of FIG. 2).
[0206] The second interlayer insulating layer 120 may be patterned
using the first photoresist pattern 125 as an etch mask to form
connection holes M0aH. The connection holes M0aH may be formed to
partially (e.g., not completely) penetrate the second interlayer
insulating layer 120. In other words, bottoms of the connection
holes M0aH may be higher than top surfaces of the lower conductive
structures TS and the gate electrodes GE. Accordingly, the
connection holes M0aH may not expose the top surfaces of the lower
conductive structures TS and the gate electrodes GE.
[0207] Referring to FIGS. 27 and 28A to 28D, the first photoresist
pattern 125 may be selectively removed. Thereafter, a first mask
layer 140 may be formed on the second interlayer insulating layer
120. The first mask layer 140 may be formed to wholly fill the
connection holes M0aH.
[0208] A second photoresist pattern 145 may be formed on the first
mask layer 140. The second photoresist pattern 145 may include
openings formed in accordance with the first active contact
patterns CAa and the second active contact patterns CAb of FIG. 13.
For example, the formation of the second photoresist pattern 145
may include forming a second photoresist layer on the first mask
layer 140 and then performing an exposure and development process
on the second photoresist layer using a second photomask
manufactured based on the first and second active contact patterns
CAa and CAb of FIG. 13.
[0209] The first mask layer 140 and the second interlayer
insulating layer 120 may be sequentially patterned using the second
photoresist pattern 145 as an etch mask to form first active holes
CAaH and second active holes CAbH. The first active holes CAaH may
be hole patterns that are respectively formed in accordance with
the first active contact patterns CAa of FIG. 13, and the second
active holes CAbH may be hole patterns that are respectively formed
in accordance with the second active contact patterns CAb of FIG.
13.
[0210] The first and second active holes CAaH and CAbH may be
formed to completely penetrate the second interlayered insulating
layer 120. In other words, the first and second active holes CAaH
and CAbH may be formed to expose the top surfaces of the lower
conductive structures TS. When viewed in a plan view, each of the
second active holes CAbH may be partially overlapped with a
corresponding one of the connection holes M0aH. Each of the second
active holes CAbH, in conjunction with each of the connection holes
M0aH, may be formed to constitute a single connection hole.
[0211] Referring back to FIG. 18A, if there is a misalignment in a
process of forming the second active hole CAbH, a
vertically-extended hole may be formed on a region that is
overlapped with both of the second active hole CAbH and the
connection hole M0aH. In a subsequent step, the vertically-extended
hole may be used to form a first vertically-extended portion VP1,
as shown in FIG. 18A. As a result of the process for forming the
connection holes M0aH, a portion of the second interlayer
insulating layer 120 may be thinner than other portions, and thus,
the vertically-extended hole may be formed by the process for
forming the second active hole CAbH.
[0212] As another example, if, as shown in FIG. 18B, the second
active hole CAbH is formed to be wider than the lower conductive
structure TS in the second direction D2, the vertically-extended
hole may be formed on a region that is overlapped with both of the
second active hole CAbH and the connection hole M0aH. In a
subsequent step, the vertically-extended hole may be used to form a
first vertically-extended portion VP1, as shown in FIG. 18B.
[0213] Referring to FIGS. 29 and 30A to 30E, the second photoresist
pattern 145 may be selectively removed. Next, a second mask layer
150 may be formed on the first mask layer 140. The second mask
layer 150 may be formed to fill the whole regions of the first and
second active holes CAaH and CAbH.
[0214] A third photoresist pattern 155 may be formed on the second
mask layer 150. The third photoresist pattern 155 may include an
opening formed in accordance with the first gate contact pattern
CBa of FIG. 13. For example, the formation of the third photoresist
pattern 155 may include forming third photoresist layer on the
second mask layer 150 and then performing an exposure and
development process on the third photoresist layer using a third
photomask manufactured based on the first gate contact pattern CBa
of FIG. 13.
[0215] A gate hole CBaH may be formed by sequentially patterning
the second mask layer 150, the first mask layer 140, and the second
interlayer insulating layer 120 using the third photoresist pattern
155 as an etch mask.
[0216] The gate hole CBaH may be formed to completely penetrate the
second interlayer insulating layer 120. In addition, the gate hole
CBaH may be formed to penetrate an upper portion of the first
interlayer insulating layer 110. In other words, the gate hole CBaH
may be formed to expose the top surface of the gate electrode
GE.
[0217] In exemplary embodiments of the present inventive concept,
referring back to FIG. 18C, if there is a misalignment in a process
of forming the gate hole CBaH or if the gate hole CBaH is formed to
have an increased width in the second direction D2, a
vertically-extended hole may be formed on a region that is
overlapped with both of the gate hole CBaH and the connection hole
M0aH. In a subsequent step, the vertically-extended hole may be
used to form a second vertically-extended portion VP2, as shown in
FIG. 18C.
[0218] Referring to FIGS. 31 and 32A to 32E, the third photoresist
pattern 155, the second mask layer 150, and the first mask layer
140 may be removed. Next, conductive structures AC, GC, and CP1 may
be formed by filling the connection holes M0aH, the first and
second active holes CAaH and CAbH, and the gate hole CBaH with a
conductive material.
[0219] For example, active contacts AC may be formed in the first
active holes CAaH. A gate contact GC may be formed in the gate hole
CBaH. First conductive structures CP1 may be formed in the
connection holes M0aH and the second active holes CAbH,
respectively. For example, the first conductive structure CP1 may
be formed by filling the connection hole, which is formed by the
connection hole M0aH and the second active hole CAbH, with the
conductive material. In exemplary embodiments of the present
inventive concept, the active contacts AC, the gate contact GC, and
the first conductive structures CP1 may be formed at substantially
the same time using the same process.
[0220] Barrier patterns BL may be respectively formed between the
second interlayer insulating layer 120 and the active contacts AC,
between the second interlayer insulating layer 120 and the gate
contact GC, and between the second interlayer insulating layer 120
and the first conductive structures CP1.
[0221] For example, the formation of the conductive structures AC,
GC, and CF1 and the barrier patterns BL may include conformally
forming a barrier layer to cover the connection holes M0aH, the
first and second active holes CAaH and CAbH, and the gate hole
CBaH, forming a conductive layer to completely fill the connection
holes M0aH, the first and second active holes CAaH and CAbH, and
the gate hole CBaH, and performing a planarization process on the
conductive layer and the barrier layer to expose the second
interlayer insulating layer 120. The conductive layer may include
conductive metal nitrides or metals, and the barrier layer may
include metal nitrides capable of preventing diffusion of metallic
elements.
[0222] Referring back to FIGS. 16 and 17A to 17E, a third
interlayer insulating layer 130 may be formed on the second
interlayer insulating layer 120. The third interlayer insulating
layer 130 may be formed of or include a silicon oxide layer or a
silicon oxynitride layer. First and second power interconnection
lines PL1 and PL2 and first and second interconnection lines ML1
and ML2 may be formed in the third interlayer insulating layer 130.
The first and second power interconnection lines PL1 and PL2 and
the first and second interconnection lines ML1 and ML2 may be
formed using a method that is similar to that for forming the
conductive structures AC, GC, and CP1.
[0223] FIG. 33 is a plan view illustrating a semiconductor device
that is fabricated based on standard cell layouts according to an
exemplary embodiment of the present inventive concept. In the
present embodiment, the third standard cell layout STD3 of FIG. 13
is exemplarily illustrated, but the present inventive concept may
not be limited thereto. In the following description of the present
embodiment, an element previously described with reference to FIG.
13 may not be described in much further detail for the sake of
brevity.
[0224] Referring to FIG. 33, the lower conductive patterns LP may
not be included, unlike the previous embodiment of FIG. 13.
Thirteenth to eighteenth active contact patterns CAm, CAn, CAo,
CAp, CAq, and CAr may be additionally disposed in place of the
lower conductive patterns. Each of the thirteenth to eighteenth
active contact patterns CAm, CAn, CAo, CAp, CAq, and CAr may be
overlapped with or connected to one of the PMOSFET region PR or the
NMOSFET region NR.
[0225] The fifteenth active contact pattern Cao may be spaced apart
from (e.g., not overlapped with) the seventh connection pattern
M0g. The seventeenth active contact pattern CAq may be spaced apart
from (e.g., not overlapped with) the sixth connection pattern M0f.
The eighteenth active contact pattern CAr may be spaced apart from
(e.g., not overlapped with) the eighth connection pattern M0h.
[0226] FIG. 34 is a plan view illustrating a semiconductor device
according to exemplary embodiments of the present inventive
concept. FIGS. 35A through 35C are sectional views taken along
lines A-A', B-B', and C-C', respectively, of FIG. 34. For example,
FIG. 34 and FIGS. 35A through 35C show an example of a
semiconductor device to be fabricated based on the standard cell
layouts of FIG. 33. In the following description of the present
embodiment, an element previously described with reference to FIGS.
16 and 17A to 17R may not be described in much further detail for
the sake of brevity.
[0227] Referring to FIGS. 34 and 35A to 35C, the lower conductive
structures TS may not be included, unlike the previous embodiments
of FIGS. 16 and 17A to 17R. First to sixth active contacts AC1-AC6
may be additionally disposed in place of the lower conductive
structures. The first to sixth active contacts AC1-AC6 may be
structures that are defined by the thirteenth to eighteenth active
contact patterns CAm, CAn, CAo, CAp, CAq, and CAr, respectively, of
FIG. 33.
[0228] The source/drain regions SD adjacent to each other may be
merged to constitute a single body. Each of the first to sixth
active contacts AC1-AC6 may be in contact with at least a portion
of the merged source/drain regions SD. Since the merged
source/drain regions SD are connected to constitute the single
body, it is unnecessary for each of the first to sixth active
contacts AC1-AC6 to completely cover the merged source/drain
regions SD. In addition, the second portion P2 of each of the
fifth, seventh, and eighth conductive structures CP5, CP7, and CP8
may also be in contact with the merged source/drain regions SD,
similar to the previous embodiments of FIG. 4.
[0229] As an example, referring to FIG. 35B, the third active
contact AC3 may be in contact with a portion of the merged
source/drain regions SD. Accordingly, the first portion P1 of the
seventh conductive structure CP7 may be disposed to cross the
merged source/drain regions SD, without short circuiting the third
active contact AC3.
[0230] The first to sixth active contacts AC1-AC6 may have bottom
surfaces, which are lower than those of the gate contacts GC and
that of the third portion P3 of the sixth conductive structure CP6.
Bottom surfaces of the second portions P2 of the fifth, seventh and
eighth conductive structures CP5, CP7, and CP8 may be lower than
those of the gate contacts GC and that of the third portion P3 of
the sixth conductive structure CP6.
[0231] According to exemplary embodiments of the present inventive
concept, a semiconductor device may include a conductive structure
that is electrically connected to impurity regions or gate
electrodes. The conductive structure may include a horizontally
extending portion, and thus, it is possible to freely dispose
interconnection lines on the conductive structure. This makes it
possible to realize a semiconductor device with reliable operation
characteristics.
[0232] While the present inventive concept has been particularly
shown and described with reference to exemplary embodiments
thereof, it will be understood by one of ordinary skill in the art
that variations in form and detail may be made thereto without
departing from the spirit and scope of the present inventive
concept as defined by the attached claims.
* * * * *