U.S. patent application number 16/227402 was filed with the patent office on 2019-04-25 for semiconductor treatment composition.
This patent application is currently assigned to JSR CORPORATION. The applicant listed for this patent is JSR CORPORATION. Invention is credited to Takahiro HAYAMA, Yasutaka KAMEI, Satoshi KAMO, Naoki NISHIGUCHI, Tomotaka SHINODA.
Application Number | 20190122896 16/227402 |
Document ID | / |
Family ID | 63037366 |
Filed Date | 2019-04-25 |
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United States Patent
Application |
20190122896 |
Kind Code |
A1 |
HAYAMA; Takahiro ; et
al. |
April 25, 2019 |
SEMICONDUCTOR TREATMENT COMPOSITION
Abstract
A semiconductor treatment composition includes potassium,
sodium, and a compound A represented by the formula (1), and has a
potassium content M.sub.K (ppm) and a sodium content M.sub.Na (ppm)
that satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to
1.times.10.sup.4.
Inventors: |
HAYAMA; Takahiro;
(Minato-ku, JP) ; KAMEI; Yasutaka; (Minato-ku,
JP) ; NISHIGUCHI; Naoki; (Minato-ku, JP) ;
KAMO; Satoshi; (Minato-ku, JP) ; SHINODA;
Tomotaka; (Minato-ku, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
JSR CORPORATION |
Minato-ku |
|
JP |
|
|
Assignee: |
JSR CORPORATION
Minato-ku
JP
|
Family ID: |
63037366 |
Appl. No.: |
16/227402 |
Filed: |
December 20, 2018 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
15608176 |
May 30, 2017 |
|
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16227402 |
|
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 21/3212 20130101;
B24B 37/042 20130101; H01L 21/02074 20130101; H01L 21/31133
20130101; B24B 49/16 20130101; H01L 21/30604 20130101; H01L
21/30625 20130101 |
International
Class: |
H01L 21/321 20060101
H01L021/321; H01L 21/306 20060101 H01L021/306 |
Foreign Application Data
Date |
Code |
Application Number |
Feb 8, 2017 |
KR |
10-2017-0017335 |
Claims
1. A concentrated semiconductor treatment composition, comprising:
potassium; sodium; a water-soluble polymer having a weight average
molecular weight of 1,000 to 1,500,000; and a compound A
represented by the following general formula (1), wherein the
concentrated semiconductor treatment composition has a potassium
content M.sub.K (ppm) and a sodium content M.sub.Na (ppm) that
satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to 1.times.10.sup.4:
##STR00006## wherein each of R.sup.1 to R.sup.4 is a hydrogen atom
or an organic group, independently, and M.sup.-is an anion.
2. The concentrated semiconductor treatment composition according
to claim 1, the concentrated semiconductor treatment composition
being used in a 30 to 300-fold diluted state.
3. The concentrated semiconductor treatment composition according
to claim 1, wherein the concentrated semiconductor treatment
composition has a viscosity of less than 5 mPas at 25.degree.
C.
4. The concentrated semiconductor treatment composition according
to claim 1, further comprising an amino acid.
5. The concentrated semiconductor treatment composition according
to claim 1, wherein the water-soluble polymer has a weight average
molecular weight of 3,000 to 1,200,000.
6. A semiconductor treatment composition, comprising: potassium;
sodium; a water-soluble polymer having a weight average molecular
weight of 1,000 to 1,500,000; and a compound A represented by the
following general formula (1), wherein the semiconductor treatment
composition is suitable for being used without being diluted, and
the semiconductor treatment composition has a potassium content
M.sub.K (ppm) and a sodium content .sub.MNa (ppm) that satisfy
M.sub.K/M.sub.Na=1.times.10.sup.-1 to 1.times.10.sup.4:
##STR00007## wherein each of R.sup.1 to R.sup.4 is a hydrogen atom
or an organic group, independently, and M.sup.- is an anion.
7. The semiconductor treatment composition according to claim 6,
wherein the semiconductor treatment composition has a viscosity of
less than 5 mPas at 25.degree. C.
8. The semiconductor treatment composition according to claim 6,
further comprising an amino acid.
9. The semiconductor treatment composition according to claim 6,
wherein the water-soluble polymer has a weight average molecular
weight of 3,000 to 1,200,000.
10. The concentrated semiconductor treatment composition according
to claim 1, wherein the potassium content M.sub.K (ppm) is
1.times.10.sup.-4 to 5.times.10.sup.3 ppm, and the sodium content
M.sub.Na (ppm) is 1.times.10.sup.-6 to 1.times.10.sup.2 ppm.
11. The semiconductor treatment composition according to claim 6,
wherein the potassium content M.sub.K (ppm) is 1.times.10.sup.-6 to
5.times.10.sup.3 ppm, and the sodium content M.sub.Na (ppm) is
1.times.10.sup.-8 to 1.times.10.sup.2 ppm.
Description
CROSS-REFERENCE TO RELATED PATENT APPLICATIONS
[0001] This application is a continuation application of prior U.S.
patent application Ser. No. 15/608,176, filed on May 30, 2017, the
entire content of which is incorporated herein by reference, and
this application claims the benefit of Korean Patent Application
No. 2017-0017335 filed on Feb. 8, 2017 in the Korean Intellectual
Property Office, the disclosure of which is incorporated herein in
its entirety by reference.
BACKGROUND OF THE INVENTION
[0002] The present invention relates to a semiconductor treatment
composition, and a treatment method that utilizes the semiconductor
treatment composition.
[0003] Chemical mechanical polishing (CMP) that is used to produce
a semiconductor device is a technique that causes the processing
target (polishing target) and a polishing pad to come in sliding
contact with each other while pressing the processing target
against the polishing pad, and supplying a chemical mechanical
polishing aqueous dispersion (hereinafter may be referred to as
"CMP slurry") to the polishing pad to chemically and mechanically
polish the processing target. The CMP slurry includes abrasive
grains, and a chemical such as an etchant, and polishing waste
(debris) is formed during CMP. A fatal device defect may occur if
such polishing waste remains. Therefore, it is indispensable to
perform a cleaning step after completion of CMP.
[0004] A metal wire material (e.g., copper and tungsten), an
insulating material (e.g., silicon oxide), a barrier metal material
(e.g., tantalum nitride and titanium nitride), and the like are
exposed on the surface of the processing target that has been
subjected to CMP. When such different materials are present on the
polished surface, it is necessary to remove only contaminants from
the polished surface so that damage such as corrosion does not
occur. For example, JP-A-2010-258014 discloses technology that
suppresses corrosion of the polished surface on which the wiring
material and the barrier metal material are exposed, by utilizing
an acidic semiconductor treatment composition. JP-A-2009-055020 and
JP-A-2013-157516 disclose technology that treats the polished
surface on which the wiring material and the barrier metal material
(e.g., cobalt) are exposed, by utilizing a neutral to alkaline
semiconductor treatment composition.
SUMMARY
[0005] However, the circuit structure has been further refined in
recent years, and it has been desired to provide a treatment
technique that can further reduce damage applied to a metal wire
and the like that are included in the treatment target, and can
still effectively remove contaminants from the surface of the
treatment target.
[0006] For example, when subjecting a polishing target that
includes a tungsten wire to CMP, a CMP slurry that includes iron
nitrate and an additional oxidizing agent (e.g., hydrogen peroxide
and potassium iodate) is used. Since an iron ion included in the
CMP slurry is easily adsorbed on the surface of the polishing
target, the polishing target surface is easily contaminated with
iron. Iron can be removed by treating the polished surface using
diluted hydrofluoric acid. In this case, however, the polished
surface is easily etched and damaged. Therefore, it has been
desired to provide a treatment technique that can reduce damage
applied to a metal wire and the like included in the treatment
target as much as possible, and can still effectively remove
contaminants from the surface of the treatment target.
[0007] Several aspects of the invention may solve at least some of
the above problems, and may provide a semiconductor treatment
composition that is superior in productivity, can reduce damage
applied to a metal wire and the like that are included in the
treatment target, and can still effectively remove contaminants
from the surface of the treatment target, and a treatment method
that utilizes the semiconductor treatment composition.
[0008] The invention may be implemented as described below (see the
following application examples).
APPLICATION EXAMPLE 1
[0009] According to a first aspect of the invention, there is
provided a concentrated semiconductor treatment composition
including potassium, sodium, and a compound A represented by the
following general formula (1),
[0010] the concentrated semiconductor treatment composition having
a potassium content M.sub.K (ppm) and a sodium content M.sub.Na
(ppm) that satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to
1.times.10.sup.4:
##STR00001##
wherein each of R.sup.1 to R.sup.4 is a hydrogen atom or an organic
group, independently, and M.sup.- is an anion.
APPLICATION EXAMPLE 2
[0011] The concentrated semiconductor treatment composition
according to Application Example 1 may be used in a 1 to 500-fold
diluted state.
APPLICATION EXAMPLE 3
[0012] According to a second aspect of the invention, there is
provided a semiconductor treatment composition including potassium,
sodium and a compound A represented by the following general
formula (1), and being used without being diluted,
[0013] the semiconductor treatment composition having a potassium
content M.sub.K (ppm) and a sodium content M.sub.Na (ppm) that
satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to 1.times.10.sup.4:
##STR00002##
wherein each of R.sup.1 to R.sup.4 is a hydrogen atom or an organic
group, independently, and M.sup.- is an anion.
APPLICATION EXAMPLE 4
[0014] The semiconductor treatment composition according to any one
of Application Examples 1 to 3 may have a viscosity less than 5
mPas at 25.degree. C.
APPLICATION EXAMPLE 5
[0015] The semiconductor treatment composition according to any one
of Application Examples 1 to 4 may further include an organic
acid.
APPLICATION EXAMPLE 6
[0016] The semiconductor treatment composition according to any one
of Application Examples 1 to 5 may further include a water-soluble
polymer.
APPLICATION EXAMPLE 7
[0017] According to a third aspect of the invention, there is
provided a treatment method including:
[0018] treating a wiring board by using the semiconductor treatment
composition according to any one of Application Examples 1 to 6,
the wiring board containing a wiring material and a barrier metal
material, the wiring material containing copper or tungsten, and
the barrier metal material containing at least one material
selected from the group consisting of tantalum, titanium, cobalt,
ruthenium, manganese, and compounds thereof.
APPLICATION EXAMPLE 8
[0019] According to a fourth aspect of the invention, there is
provided a treatment method including:
[0020] treating a wiring board that contains tungsten as a wiring
material by using the semiconductor treatment composition according
to any one of Application Examples 1 to 6, after subjection the
wiring board to chemical mechanical polishing by using a
composition that contains iron ions and peroxides.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING
[0021] FIG. 1 is a cross-sectional view schematically illustrating
a process that produces a wiring board that is used in connection
with a treatment method according to one embodiment of the
invention.
[0022] FIG. 2 is a cross-sectional view schematically illustrating
a process that produces a wiring board that is used in connection
with a treatment method according to one embodiment of the
invention.
[0023] FIG. 3 schematically illustrates the configuration of the
filtration device used in connection with the examples.
ADVANTAGEOUS EFFECTS OF INVENTION
[0024] The semiconductor treatment composition according to one
embodiment of the invention has an excellent filtration
characteristic, thereby being superior in productivity. In
addition, the semiconductor treatment composition according to the
embodiment of the invention can reduce damage applied to a metal
wire and the like included in the processing target, and can still
effectively remove contaminants from the surface of the processing
target.
DETAILED DESCRIPTION OF THE EMBODIMENT
[0025] The exemplary embodiments of the invention are described in
detail below. Note that the invention is not limited to the
exemplary embodiments described below. The invention includes
various modifications that may be implemented without departing
from the scope of the invention.
1. Semiconductor Treatment Composition
[0026] A semiconductor treatment composition according to one
embodiment of the invention includes potassium, sodium, and a
compound A represented by the following general formula (1), and
has a potassium content M.sub.K (ppm) and a sodium content M.sub.Na
(ppm) that satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to
1.times.10.sup.4. The semiconductor treatment composition may be a
concentrated-type semiconductor treatment composition that is used
after being diluted with a liquid medium (e.g., purified water and
organic solvent), or may be a non-dilution-type semiconductor
treatment composition that is used without being diluted. The term
"semiconductor treatment composition" used herein includes both the
concentrated-type semiconductor treatment composition and the
non-dilution-type semiconductor treatment composition unless
otherwise specified.
[0027] The semiconductor treatment composition may be used as a
treatment agent such as a cleaning agent for removing particles,
metal impurities, and the like present on the surface of the
treatment target (polishing target) after completion of CMP, a
resist stripper for removing a resist from a semiconductor
substrate that has been processed using a resist, and an etchant
for shallowly etching the surface of a metal wire or the like to
remove a surface contaminant. Note that the term "treatment agent"
used herein includes a cleaning agent for cleaning a semiconductor
surface, a resist stripper, an etchant, and the like. Each
component included in the semiconductor treatment composition is
described in detail below.
1.1 Potassium and Sodium
[0028] The semiconductor treatment composition includes potassium
and sodium. It is generally considered that an alkali metal such as
sodium and potassium is an impurity that should be removed as much
as possible during a semiconductor production process (see
JP-A-2000-208451, for example). However, it was found contrary to
the above concept that it is possible to improve treatment
performance without causing significant deterioration in
semiconductor properties by utilizing a semiconductor treatment
composition that includes potassium and sodium in a predetermined
ratio when implementing a cleaning step that is performed after
completion of CMP, a resist removal step, an etching step, and the
like.
[0029] The semiconductor treatment composition has a potassium
content M.sub.K (ppm) and a sodium content M.sub.Na (ppm) that
satisfy M.sub.K/M.sub.Na=1.times.10.sup.-1 to 1.times.10.sup.4,
preferably M.sub.K/M.sub.Na=3.times.10.sup.-1 to 7.times.10.sup.3,
more preferably M.sub.K/M.sub.Na=5.times.10.sup.-1 to
5.times.10.sup.3, and particularly preferably
M.sub.K/M.sub.Na=1.times.10.degree. to 4.times.10.sup.3. It is
considered that, when the content ratio of potassium to sodium is
within the above range, it is possible to suppress a situation in
which a metal material (e.g., copper and tungsten) that is exposed
on the treatment target surface is etched to an excessive extent,
and eluted during the semiconductor treatment step. If the content
ratio of potassium to sodium in the semiconductor treatment
composition exceeds the above range, sodium and potassium may
adhere to and remain on the treatment target, and the electrical
characteristics of the resulting semiconductor circuit (i.e.,
treatment target) may deteriorate, whereby a decrease in yield and
the like may occur. If the content ratio of potassium to sodium in
the semiconductor treatment composition is less than the above
range, the balance with respect to the ionic product of a metal
material (e.g., copper and tungsten) that is exposed on the
treatment target surface, and sodium and potassium included in the
semiconductor treatment composition may be impaired, and the metal
material (e.g., copper and tungsten) may be etched to an excessive
extent, whereby deterioration in the flatness of the treatment
target surface and electrical characteristics may occur.
[0030] It is preferable that the concentrated-type semiconductor
treatment composition have a sodium content of 1.times.10.sup.-6 to
1.times.10.sup.2 ppm, more preferably 1.times.10.sup.-5 to
5.times.10.sup.1 ppm, and particularly preferably 1.times.10.sup.-4
to 5.times.10.degree. ppm. It is preferable that the
concentrated-type semiconductor treatment composition have a
potassium content of 1.times.10.sup.-4 to 5.times.10.sup.3 ppm,
more preferably 5.times.10.sup.-4 to 3.times.10.sup.3 ppm, and
particularly preferably 1.times.10.sup.-3 to 2.times.10.sup.3
ppm.
[0031] It is preferable that the non-dilution-type semiconductor
treatment composition have a sodium content of 1.times.10.sup.-8 to
1.times.10.sup.2 ppm, more preferably 1.times.10.sup.-7 to
5.times.10.sup.1 ppm, and particularly preferably 1.times.10.sup.-6
to 5.times.10.degree. ppm. It is preferable that the
non-dilution-type semiconductor treatment composition have a
potassium content of 1.times.10.sup.-6 to 5.times.10.sup.3 ppm,
more preferably 5.times.10.sup.-6 to 3.times.10.sup.3 ppm, and
particularly preferably 1.times.10.sup.-5 to 2.times.10.sup.3
ppm.
[0032] It is considered that, when the content ratio of potassium
to sodium, the potassium content, and the sodium content in the
semiconductor treatment composition are within the above ranges, it
is possible to more effectively suppress a situation in which a
metal material (e.g., copper and tungsten) that is exposed on the
treatment target surface is etched to an excessive extent, and
eluted during the treatment step, and maintain stable treatment
performance.
[0033] Potassium and sodium may be used in the form of a
water-soluble salt when producing the semiconductor treatment
composition. Examples of the water-soluble salt of potassium/sodium
include a salt of potassium/sodium hydroxide, potassium/sodium
carbonate, a potassium/sodium ammonium salt, a potassium/sodium
halide, and the like.
[0034] The potassium content M.sub.K (ppm) and the sodium content
M.sub.Na (ppm) in the semiconductor treatment composition may be
calculated by subjecting the semiconductor treatment composition to
ICP atomic emission spectrometry (ICP-AES), ICP mass spectrometry
(ICP-MS), or atomic absorption spectrophotometry (AA). An ICP
atomic emission spectrometer "ICPE-9000" (manufactured by Shimadzu
Corporation) or the like may be used for ICP atomic emission
spectrometry. An ICP mass spectrometer "ICPE-8500" (manufactured by
Shimadzu Corporation), "ELAN DRC PLUS" (manufactured by
Perkin-Elmer), or the like may be used for ICP mass spectroscopy.
An atomic absorption spectrophotometer "AA-7000" (manufactured by
Shimadzu Corporation), "ZA3000" (manufactured by Hitachi High-Tech
Science Corporation), or the like may be used for atomic absorption
spectrophotometry.
[0035] When subjecting a treatment target (polishing target) that
includes tungsten as a wiring material to CMP, a CMP slurry that
includes an iron ion and a peroxide (e.g., hydrogen peroxide and
potassium iodate) is used. Since the iron ion included in the CMP
slurry is easily adsorbed on the surface of the treatment target
(polishing target), the polishing target surface is easily
contaminated with iron. In this case, when the polishing target
surface is cleaned (washed) using the semiconductor treatment
composition, production of a soluble salt (e.g., potassium
tungstate and sodium tungstate) is promoted during the cleaning
step. This makes it possible to reduce contamination of the wiring
board with a metal, and efficiently remove a polishing residue
while reducing damage applied to the treatment target.
1.2. Compound A
[0036] The semiconductor treatment composition according to one
embodiment of the invention includes a compound A represented by
the following general formula (1) (hereinafter may be referred to
as a "compound A"). The compound A is used to adjust the pH of the
semiconductor treatment composition and remove the organic
residue:
##STR00003##
wherein each of R.sup.1 to R.sup.4 is a hydrogen atom or an organic
group, independently, and M.sup.- is an anion.
[0037] In the general formula (1) above, it is preferable that a
hydrocarbon group be used as the organic group represented by
R.sup.1 to R.sup.4. Examples of the hydrocarbon group may include
any one of an aliphatic hydrocarbon group, an aromatic hydrocarbon
group, an araliphatic hydrocarbon group, or alicyclic hydrocarbon
group, and may include a hetero atom such as an oxygen atom, a
sulfur atom, and a halogen atom; a part of the hydrocarbon group
may be substituted with an additional substituent. The aliphatic
hydrocarbon group and the aliphatic group of araliphatic
hydrocarbon group may be a saturated or unsaturated aliphatic
hydrocarbon group and may be a linear or branched-chain group.
Examples of these hydrocarbon groups may include a saturated or
unsaturated alkyl group, aralkyl group, aryl group, or the like
which is a linear, branched-chain, or cyclic group.
[0038] Examples of the alkyl group may include generally preferably
a lower alkyl group having 1to 6 carbon atoms, and particularly
preferably a lower alkyl group having 1 to 4 carbon atoms, and may
include a substituent such as a halogen atom and a hydroxyl group.
Specifically, examples of the alkyl group may include a methyl
group, an ethyl group, an n-propyl group, an iso-propyl group, an
n-butyl group, an iso-butyl group, a sec-butyl group, a tert-butyl
group, an n-pentyl group, an iso-pentyl group, a sec-pentyl group,
a tert-pentyl group, a neopentyl group, an n-hexyl group, an
iso-hexyl group, a sec-hexyl group, a tert-hexyl group, a
cyclopentyl group, a cyclohexyl group, a vinyl group, an n-propenyl
group, an iso-propenyl group, an n-butenyl group, an iso-butenyl
group, a sec-butenyl group, a tert-butenyl group, and the like.
[0039] Examples of the aralkyl group may generally preferably
include an aralkyl group having 7 to 12 carbon atoms. Specifically,
examples of the aralkyl group may include a benzyl group, a
phenethyl group, a phenylpropyl group, a phenylbutyl group, a
phenylhexyl group, a methylbenzyl group, a methylphenethyl group,
an ethylbenzyl group, and the like.
[0040] Examples of the aryl group may generally preferably include
a aryl group having 6 to 14 carbon atoms. Specifically, examples of
the aryl group may include a phenyl group, an o-tolyl group, an
m-tolyl group, a p-tolyl group, a 2,3-xylyl group, a 2,4-xylyl
group, a 2,5- xylyl group, a 2,6- xylyl group, a 3,5-xylyl group, a
naphthyl group, an anthryl group, and the like.
[0041] An aromatic ring of the aryl group or the aralkyl group may
include a lower alkyl group such as a methyl group and an ethyl
group, a halogen atom, a nitro group, an amino group, or the like
as a substituent.
[0042] In the general formula (1) above, examples of an anion
represented by M.sup.- may include a hydroxide ion (OH.sup.-) and
the like.
[0043] The compound represented by the general formula (1) above
may be a quaternary ammonium compound. Specific examples of the
quaternary ammonium compound include tetramethylammonium hydroxide
(TMAH), trimethyl-2-hydroxyethylammonium hydroxide (choline),
tetraethylammonium hydroxide (TEAH), tetrapropyl ammonium
hydroxide, tetrabutyl ammonium hydroxide, monomethyl triethyl
ammonium hydroxide, dimethyl diethyl ammonium hydroxide, trimethyl
monoethyl ammonium hydroxide, monomethyl tripropyl ammonium
hydroxide, dimethyl dipropyl ammonium hydroxide, trimethyl
monopropyl ammonium hydroxide, monomethyl tributyl ammonium
hydroxide, dimethyl dibutyl ammonium hydroxide, trimethyl monobutyl
ammonium hydroxide, monoethyl tripropyl ammonium hydroxide, diethyl
dipropyl ammonium hydroxide, triethyl monopropyl ammonium
hydroxide, monoethyl tributyl ammonium hydroxide, diethyl dibutyl
ammonium hydroxide, triethyl monobutyl ammonium hydroxide,
monopropyl tributyl ammonium hydroxide, dipropyl dibutyl ammonium
hydroxide, tripropyl monobutyl ammonium hydroxide,
triethyl-2-hydroxyethyl ammonium hydroxide,
tripropyl-2-hydroxyethyl ammonium hydroxide,
tributyl-2-hydroxyethyl ammonium hydroxide,
trimethyl-3-hydroxypropyl ammonium hydroxide,
triethyl-3-hydroxypropyl ammonium hydroxide,
tripropyl-3-hydroxypropyl ammonium hydroxide,
tributyl-3-hydroxypropyl ammonium hydroxide,
trimethyl-4-hydroxybutyl ammonium hydroxide,
triethyl-4-hydroxybutyl ammonium hydroxide,
tripropyl-4-hydroxybutyl ammonium hydroxide,
tributyl-4-hydroxybutyl ammonium hydroxide,
trimethyl-3-hydroxybutyl ammonium hydroxide,
triethyl-3-hydroxybutyl ammonium hydroxide,
tripropyl-3-hydroxybutyl ammonium hydroxide,
tributyl-3-hydroxybutyl ammonium hydroxide,
dimethylethyl-2-hydroxyethyl ammonium hydroxide,
methyldiethyl-2-hydroxyethyl ammonium hydroxide,
dimethylethyl-3-hydroxypropyl ammonium hydroxide,
methyldiethyl-3-hydroxypropyl ammonium hydroxide,
dimethylethyl-4-hydroxybutyl ammonium hydroxide,
methyldiethyl-4-hydroxybutyl ammonium hydroxide,
dimethylethyl-3-hydroxybutyl ammonium hydroxide,
methyldiethyl-3-hydroxybutyl ammonium hydroxide, dimethyl di
(2-hydroxyethyl) ammonium hydroxide, dimethyl di (3-hydroxypropyl)
ammonium hydroxide, dimethyl di (3-hydroxybutyl) ammonium
hydroxide, dimethyl di (4-hydroxybutyl) ammonium hydroxide, diethyl
di (2-hydroxyethyl) ammonium hydroxide, diethyl di
(3-hydroxypropyl) ammonium hydroxide, diethyl di (3-hydroxybutyl)
ammonium hydroxide, diethyl di (4-hydroxybutyl) ammonium hydroxide,
methyl ethyl di (2-hydroxyethyl) ammonium hydroxide, methyl ethyl
di (3-hydroxypropyl) ammonium hydroxide, methyl ethyl di
(4-hydroxybutyl) ammonium hydroxide, methyl tri (2-hydroxyethyl)
ammonium hydroxide, ethyl tri (2-hydroxyethyl) ammonium hydroxide,
propyl tri (2-hydroxyethyl) ammonium hydroxide, butyl tri
(2-hydroxyethyl) ammonium hydroxide, methyl tri (3-hydroxypropyl)
ammonium hydroxide, ethyl tri (3-hydroxybutyl) ammonium hydroxide,
methyl tri (4-hydroxybutyl) ammonium hydroxide, ethyl tri
(4-hydroxybutyl) ammonium hydroxide, methyl tri (3-hydroxybutyl)
ammonium hydroxide, and the like. Among these, tetramethylammonium
hydroxide (TMAH) may be used particularly preferably. These
quaternary ammonium compounds may be used either alone or in
combination.
[0044] The content of the compound A in the semiconductor treatment
composition may be appropriately changed taking account of a metal
wire material (e.g., copper and tungsten), an insulating material
(e.g., silicon oxide), a barrier metal material (e.g., tantalum
nitride and titanium nitride), and the like that are exposed on the
surface of the treatment target that has been subjected to CMP, and
the composition of the CMP slurry.
[0045] The content of the compound A in the semiconductor treatment
composition may also be appropriately changed taking account of the
degree of dilution with respect to the concentrated-type
semiconductor treatment composition. The content of the compound A
in the semiconductor treatment composition is preferably 0.0001 to
10 parts by mass, more preferably 0.001 to 5 parts by mass, and
particularly preferably 0.01 to 3 parts by mass based on 100 parts
by mass of a treatment agent prepared by diluting the
concentrated-type semiconductor treatment composition, or based on
100 parts by mass of the non-dilution-type semiconductor treatment
composition (treatment agent). When the content of the compound A
is within the above range, the pH of the treatment agent can be
changed to weaken the affinity of the organic residue and the wafer
(surface), thereby making the affinity of the treatment agent and
the organic residue stronger. Therefore, it is possible to
effectively remove the contaminants on the wafer.
1.3. Additional Component
[0046] The semiconductor treatment composition according to one
embodiment of the invention may include a water-soluble polymer, an
organic acid, an amine, and the like in addition to a liquid medium
(i.e., main component).
1.3.1. Water-Soluble Polymer
[0047] The semiconductor treatment composition according to one
embodiment of the invention may include a water-soluble polymer.
The water-soluble polymer adheres to the treatment target surface,
and reduces corrosion. Therefore, corrosion of the treatment target
surface can be reduced by adding the water-soluble polymer to the
semiconductor treatment composition. Note that the term
"water-soluble" used herein in connection with a substance means
that 0.1 g or more of the substance is dissolved in 100 g water at
20.degree. C. The term "water-soluble polymer" used herein refers
to a water-soluble compound in which two or more repeating units
are bonded linearly or in a mesh-like manner through a covalent
bond.
[0048] Examples of the water-soluble polymer include, but are not
limited to, polyacrylic acid, polymethacrylic acid, polymaleic
acid, polyvinylsulfonic acid, polyallylsulfonic acid,
polystyrenesulfonic acid, and salts thereof; a copolymer of a
monomer such as styrene, alpha-methylstyrene, or 4-methylstyrene,
and an acid monomer such as (meth)acrylic acid or maleic acid, a
polymer that includes a repeating unit including an aromatic
hydrocarbon group obtained by condensing benzenesulfonic acid,
naphthalenesulfonic acid, or the like using formalin, and salts
thereof; a vinyl-based synthetic polymer such as polyvinyl alcohol,
polyoxyethylene, polyvinylpyrrolidone, polyvinylpyridine,
polyacrylamide, polyvinylformamide, polyethylenimine,
polyvinyloxazoline, polyvinylimidazole, and polyallylamine; a
modified natural polysaccharide such as hydroxyethyl cellulose,
carboxymethyl cellulose, and modified starch; and the like. These
water-soluble polymers may be used either alone or in
combination.
[0049] The water-soluble polymer used in connection with one
embodiment of the invention may be a homopolymer, or may be a
copolymer obtained by copolymerizing two or more monomers. For
example, a monomer that includes a carboxyl group, a monomer that
includes a sulfonic acid group, a monomer that includes a hydroxyl
group, a monomer that includes a polyethylene oxide chain, a
monomer that includes an amino group, a monomer that includes a
heterocyclic ring, and the like may be used as the monomers.
[0050] The weight average molecular weight (Mw) of the
water-soluble polymer used in connection with one embodiment of the
invention is preferably 1,000 to 1,500,000, and more preferably
3,000 to 1,200,000. Note that the term "weight average molecular
weight" used herein refers to a polyethylene glycol-equivalent
weight average molecular weight determined by gel permeation
chromatography (GPC).
[0051] The viscosity of the semiconductor treatment composition at
25.degree. C. is preferably less than 5 mPas, more preferably 4
mPas or less, further preferably 2 mPas or less, further more
preferably 1.2 mPas or less, and particularly preferably 1 mPas or
less. When the viscosity at 25.degree. C. of the semiconductor
treatment composition is within the above range, sufficient
filtration rate can be obtained at the time of purifying the
semiconductor treatment composition by filtration, thereby
achieving enough throughput to be of practical use. In addition,
when the viscosity at room temperature of the semiconductor
treatment composition is within the above range, even in a case
where irregularities remain on the polishing target surface, the
composition enters the irregularities and can come in contact with
the surfaces of the irregularities during the treatment step using
the semiconductor treatment composition, so that the polishing
target surface can be more uniformly treated. If the viscosity at
25.degree. C. of the semiconductor treatment composition exceeds
the above range, viscosity becomes too high, and thus the
semiconductor treatment composition may hardly be supplied to the
polishing target. Since the viscosity of the semiconductor
treatment composition is substantially determined by the weight
average molecular weight and the content of the water-soluble
polymer to be added, the content of the water-soluble polymer may
be adjusted taking account of the balance therebetween.
[0052] In this specification, the Ubbelohde viscosity measured
according to JIS K2283 is used as the viscosity.
[0053] The content of the water-soluble polymer in the
semiconductor treatment composition may be appropriately changed
taking account of a metal wire material (e.g., copper and
tungsten), an insulating material (e.g., silicon oxide), a barrier
metal material (e.g., tantalum nitride and titanium nitride), and
the like that are exposed on the surface of the treatment target
that has been subjected to CMP, and the composition of the CMP
slurry.
[0054] The content of the water-soluble polymer in the
semiconductor treatment composition may also be appropriately
changed taking account of the degree of dilution with respect to
the concentrated-type semiconductor treatment composition. The
lower limit of the content of the water-soluble polymer in the
semiconductor treatment composition is preferably 0.001 parts by
mass or more, and more preferably 0.01 parts by mass or more, based
on 100 parts by mass of a treatment agent prepared by diluting the
concentrated-type semiconductor treatment composition, or based on
100 parts by mass of the non-dilution-type semiconductor treatment
composition (treatment agent). The upper limit of the content of
the water-soluble polymer in the semiconductor treatment
composition is preferably 1 part by mass or less, and more
preferably 0.1 parts by mass or less, based on 100 parts by mass of
a treatment agent prepared by diluting the concentrated-type
semiconductor treatment composition, or based on 100 parts by mass
of the non-dilution-type semiconductor treatment composition
(treatment agent). When the content of the water-soluble polymer is
within the above range, it is possible to remove particles and
metal impurities included in the CMP slurry from the wiring board
while suppressing the occurrence of corrosion, and obtain a more
excellently treated surface.
1.3.2. Organic Acid
[0055] The semiconductor treatment composition according to one
embodiment of the invention may include an organic acid. It is
preferable that the organic acid include one or more acidic groups
(e.g., carboxy group and sulfo group). Note that the term "organic
acid" used herein excludes the water-soluble polymer described
above.
[0056] Specific examples of the organic acid include citric acid,
maleic acid, malic acid, tartaric acid, oxalic acid, malonic acid,
succinic acid, ethylenediaminetetraacetic acid, acrylic acid,
methacrylic acid, benzoic acid, phenyllactic acid,
hydroxyphenyllactic acid, phenylsuccinic acid, naphthalenesulfonic
acid, salts thereof, and the like. These organic acids may be used
either alone or in combination.
[0057] An amino acid may also be used as the organic acid. Examples
of the amino acid include a compound represented by the following
general formula (2), and the like:
##STR00004##
wherein R.sup.1 is an atom or a group selected from the group
consisting of a hydrogen atom, a hydrocarbon group having 1 to 10
carbon atoms, and an organic group having 1 to 20 carbon atoms that
includes a hetero atom.
[0058] Examples of the hydrocarbon group having 1 to 10 carbon
atoms that may be represented by R.sup.1 in the general formula
(2), include a saturated aliphatic hydrocarbon group having 1 to 10
carbon atoms, a saturated cyclic hydrocarbon group having 1 to 10
carbon atoms, an aromatic hydrocarbon group having 6 to 10 carbon
atoms, and the like. Among these, a saturated aliphatic hydrocarbon
group having 1 to 10 carbon atoms is preferable.
[0059] Examples of the organic group having 1 to 20 carbon atoms
that includes a hetero atom that may be represented by R.sup.1 in
the general formula (2), include a hydrocarbon group having 1 to 20
carbon atoms that includes a carboxy group, a hydrocarbon group
having 1 to 20 carbon atoms that includes a hydroxy group, a
hydrocarbon group having 1 to 20 carbon atoms that includes an
amino group, a hydrocarbon group having 1 to 20 carbon atoms that
includes a mercapto group, an organic group having 1 to 20 carbon
atoms that includes a heterocyclic ring, and the like. These groups
may further include a hetero atom such as an oxygen atom, a sulfur
atom, and a halogen atom, and may be substituted with an additional
substituent.
[0060] Examples of the compound represented by the general formula
(2) include alanine, arginine, asparagine, aspartic acid, cysteine,
glutamine, glutamic acid, glycine, isoleucine, leucine, lysine,
methionine, phenylalanine, serine, threonine, tyrosine, valine,
tryptophan, histidine, 2-amino-3-aminopropanoic acid, and the like.
These amino acids may be used either alone or in combination.
[0061] It is also preferable to use a compound represented by the
following general formula (3) as the organic acid:
##STR00005##
wherein R.sup.2 is an organic group having 1 to 20 carbon
atoms.
[0062] Examples of the organic group having 1 to 20 carbon atoms
that is represented by R.sup.2 in the general formula (3), include
a saturated aliphatic hydrocarbon group having 6 to 20 carbon
atoms, an unsaturated aliphatic hydrocarbon group having 6 to 20
carbon atoms, an organic group having 6 to 20 carbon atoms that
includes a saturated cyclic hydrocarbon group, an organic group
having 6 to 20 carbon atoms that includes an unsaturated cyclic
hydrocarbon group, a hydrocarbon group having 1 to 20 carbon atoms
that includes a carboxy group, a hydrocarbon group having 1 to 20
carbon atoms that includes a hydroxy group, a hydrocarbon group
having 1 to 20 carbon atoms that includes an amino group, an
organic group having 1 to 20 carbon atoms that includes a
heterocyclic ring, and the like. Among these, an organic group
having 6 to 20 carbon atoms that includes an unsaturated cyclic
hydrocarbon group, and a hydrocarbon group having 1 to 20 carbon
atoms that includes a carboxy group, are preferable, and an organic
group having 6 to 20 carbon atoms that includes an aryl group, and
a carboxymethyl group are particularly preferable. Note that the
compound represented by the general formula (3) excludes the
compound represented by the general formula (2).
[0063] Specific examples of the compound represented by the general
formula (3) include hydroxyphenyllactic acid, hydroxymalonic acid,
and the like. Among these, hydroxyphenyllactic acid is preferable.
These compounds may be used either alone or in combination.
[0064] The content of the organic acid in the semiconductor
treatment composition may be appropriately changed taking account
of a metal wire material (e.g., copper and tungsten), an insulating
material (e.g., silicon oxide), a barrier metal material (e.g.,
tantalum nitride and titanium nitride), and the like that are
exposed on the surface of the treatment target that has been
subjected to CMP, and the composition of the CMP slurry.
[0065] The content of the organic acid in the semiconductor
treatment composition may also be appropriately changed taking
account of the degree of dilution with respect to the
concentrated-type semiconductor treatment composition. The lower
limit of the content of the organic acid in the semiconductor
treatment composition is preferably 0.0001 parts by mass or more,
and more preferably 0.0005 parts by mass or more, based on 100
parts by mass of a treatment agent prepared by diluting the
concentrated-type semiconductor treatment composition, or based on
100 parts by mass of the non-dilution-type semiconductor treatment
composition (treatment agent). The upper limit of the content of
the organic acid in the semiconductor treatment composition is
preferably 1 part by mass or less, and more preferably 0.5 parts by
mass or less, based on 100 parts by mass of a treatment agent
prepared by diluting the concentrated-type semiconductor treatment
composition, or based on 100 parts by mass of the non-dilution-type
semiconductor treatment composition (treatment agent). When the
content of the organic acid is within the above range, it is
possible to effectively remove impurities that adhere to the
surface of the wiring material. It is also possible to more
effectively suppress a situation in which etching proceeds to an
excessive extent, and obtain an excellently treated surface.
1.3.3. Amine
[0066] The semiconductor treatment composition according to one
embodiment of the invention may include an amine (excluding an
amino acid). It is considered that an amine functions as an
etchant. It is considered that the addition of an amine makes it
possible to etch and remove a metal oxide film (e.g., CuO layer,
Cu.sub.2O layer, and Cu(OH).sub.2 layer) and an organic residue
(e.g., BTA layer) on the wiring board in the treatment step that is
performed after completion of CMP.
[0067] It is preferable that the amine be a water-soluble amine.
The term "water-soluble" used herein in connection with an amine
means that 0.1 g or more of the amine is dissolved in 100 g water
at 20.degree. C. Examples of the amine include an alkanolamine, a
primary amine, a secondary amine, a tertiary amine, and the
like.
[0068] Examples of the alkanolamine include monoethanolamine,
diethanolamine, triethanolamine, N-methylethanolamine,
N-methyl-N,N-diethanolamine, N,N-dimethylethanolamine,
N,N-diethylethanolamine, N,N-dibutylethanolamine,
N-(beta-aminoethyl)ethanolamine, N-ethylethanolamine,
monopropanolamine, dipropanolamine, tripropanolamine,
monoisopropanolamine, diisopropanolamine, triisopropanolamine, and
the like. Examples of the primary amine include methylamine,
ethylamine, propylamine, butylamine, pentylamine,
1,3-propanediamine, and the like. Examples of the secondary amine
include piperidine, piperazine, and the like. Examples of the
tertiary amine include trimethylamine, triethylamine, and the like.
These amines may be used either alone or in combination.
[0069] Among these, monoethanolamine and monoisopropanolamine are
preferable, and monoethanolamine is more preferable, since it is
possible to effectively etch a metal oxide film and an organic
residue on the wiring board.
[0070] The content of the amine in the semiconductor treatment
composition may be appropriately changed taking account of a metal
wire material (e.g., copper and tungsten), an insulating material
(e.g., silicon oxide), a barrier metal material (e.g., tantalum
nitride and titanium nitride), and the like that are exposed on the
surface of the treatment target that has been subjected to CMP, and
the composition of the CMP slurry.
[0071] The content of the amine in the semiconductor treatment
composition may also be appropriately changed taking account of the
degree of dilution with respect to the concentrated-type
semiconductor treatment composition. The lower limit of the content
of the amine in the semiconductor treatment composition is
preferably 0.0001 parts by mass or more, and more preferably 0.0005
parts by mass or more, based on 100 parts by mass of a treatment
agent prepared by diluting the concentrated-type semiconductor
treatment composition, or based on 100 parts by mass of the
non-dilution-type semiconductor treatment composition (treatment
agent). The upper limit of the content of the amine in the
semiconductor treatment composition is preferably 1 part by mass or
less, and more preferably 0.5 parts by mass or less, based on 100
parts by mass of a treatment agent prepared by diluting the
concentrated-type semiconductor treatment composition, or based on
100 parts by mass of the non-dilution-type semiconductor treatment
composition (treatment agent). When the content of the amine is
within the above range, it is possible to effectively etch and
remove a metal oxide film and an organic residue on the wiring
board in the cleaning step that is performed after completion of
CMP.
1.3.4. Liquid Medium
[0072] The semiconductor treatment composition according to one
embodiment of the invention is a liquid that includes a liquid
medium as the main component. The liquid medium may be
appropriately selected taking account of the intended use (e.g.,
cleaning, etching, and resist removal) of the treatment target. For
example, when the semiconductor treatment composition is used as a
cleaning agent, it is preferable that the liquid medium include
water as the main component, and function as a solvent. Examples of
such a liquid medium include water, a mixed medium that includes
water and an alcohol, a mixed medium that includes water and a
water-miscible organic solvent, and the like. It is preferable to
use water or a mixed medium that includes water and an alcohol. It
is more preferable to use water.
[0073] For example, when the semiconductor treatment composition is
used as an etchant or a resist stripper, it is preferable that the
liquid medium include an organic solvent as the main component, and
function as a solvent. Examples of the organic solvent include a
known organic solvent that can be used for a semiconductor
treatment, such as a polar solvent, e.g., a ketone-based solvent,
an ester-based solvent, an ether-based solvent, and an amide-based
solvent, and a hydrocarbon-based solvent.
[0074] Examples of the ketone-based solvent include 1-octanone,
2-octanone, 1-nonanone, 2-nonanone, acetone, 2-heptanone,
4-heptanone, 1-hexanone, 2-hexanone, diisobutyl ketone,
cyclohexanone, methylcyclohexanone, phenylacetone, methyl ethyl
ketone, methyl isobutyl ketone, acetylacetone, acetonylacetone,
ionone, diacetonyl alcohol, acetylcarbinol, acetophenone, methyl
naphthyl ketone, isophorone, propylene carbonate,
gamma-butyrolactone, and the like.
[0075] Examples of the ester-based solvent include a linear
ester-based solvent such as methyl acetate, butyl acetate, ethyl
acetate, isopropyl acetate, pentyl acetate, isopentyl acetate,
ethyl methoxyacetate, ethyl ethoxyacetate, propylene glycol
monomethyl ether acetate, ethylene glycol monoethyl ether acetate,
ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl
ether acetate, ethylene glycol monophenyl ether acetate, diethylene
glycol monomethyl ether acetate, diethylene glycol monopropyl ether
acetate, diethylene glycol monoethyl ether acetate, diethylene
glycol monophenyl ether acetate, diethylene glycol monobutyl ether
acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate,
4-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate,
3-ethyl-3-methoxybutyl acetate, propylene glycol monomethyl ether
acetate, propylene glycol monoethyl ether acetate, propylene glycol
monopropyl ether acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl
acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate,
3-methoxypentyl acetate, 4-methoxypentyl acetate,
2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate,
3-methyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate,
propylene glycol diacetate, methyl formate, ethyl formate, butyl
formate, propyl formate, ethyl carbonate, propyl carbonate, butyl
carbonate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl
pyruvate, methyl acetoacetoate, ethyl acetoacetate, methyl
propionate, ethyl propionate, propyl propionate, isopropyl
propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate,
ethyl 3-ethoxypropionate, and propyl 3-methoxypropionate; a cyclic
ester-based solvent such as a lactone (e.g., gamma-butyrolactone);
and the like.
[0076] Examples of the ether-based solvent include a glycol
ether-based solvent such as ethylene glycol dibutyl ether,
propylene glycol dimethyl ether, propylene glycol diethyl ether,
diethylene glycol dimethyl ether, diethylene glycol diethyl ether,
and diethylene glycol dibutyl ether; diisopentyl ether, diisobutyl
ether, dioxane, tetrahydrofuran, anisole,
perfluoro-2-butyltetrahydrofuran, perfluorotetrahydrofuran,
1,4-dioxane, and the like.
[0077] Examples of the amide-based solvent include
N-methyl-2-pyrrolidone, N,N-dimethylacetamide,
N,N-dimethylformamide, hexamethyiphosphoric triamide,
1,3-dimethyl-2-imidazolidinone, and the like. Examples of a further
polar solvent include dimethyl sulfoxide and the like.
[0078] Examples of the hydrocarbon-based solvent include an
aliphatic hydrocarbon-based solvent such as pentane, hexane,
octane, decane, 2,2,4-trimethylpentane, 2,2,3-trimethylhexane,
perfluorohexane, perfluoroheptane, limonene, and pinene; and an
aromatic hydrocarbon-based solvent such as toluene, xylene,
ethylbenzene, propylbenzene, 1-methylpropylbenzene,
2-methylpropylbenzene, dimethylbenzene, diethylbenzene,
ethylmethylbenzene, trimethylbenzene, ethyldimethylbenzene, and
dipropylbenzene.
1.3.5. Further Additional Component
[0079] The semiconductor treatment composition according to one
embodiment of the invention may appropriately (optionally) further
include a pH-adjusting agent, a surfactant, and the like.
<pH-Adjusting Agent>
[0080] When the semiconductor treatment composition is used to
treat the treatment target surface that includes copper as a wiring
material, the lower limit of the pH of the semiconductor treatment
composition is preferably 9 or more, and more preferably 10 or
more, and the upper limit of the pH of the semiconductor treatment
composition is preferably 14 or less. When the semiconductor
treatment composition is used to treat the treatment target surface
that includes tungsten as a wiring material, the upper limit of the
pH of the semiconductor treatment composition is preferably 7 or
less, and more preferably 6 or less, and the lower limit of the pH
of the semiconductor treatment composition is preferably 2 or
more.
[0081] When the pH of the semiconductor treatment composition
cannot be adjusted to the desired value by adding the organic acid
and the amine mentioned above, a pH-adjusting agent may be added to
the semiconductor treatment composition in order to adjust the pH
of the semiconductor treatment composition within the above range.
Examples of the pH-adjusting agent include an alkali metal
hydroxide such as sodium hydroxide, potassium hydroxide, rubidium
hydroxide, and cesium hydroxide, and a basic compound such as
ammonia. These pH-adjusting agents may be used either alone or in
combination.
<Surfactant>
[0082] A known component may be used as the surfactant. It is
preferable to use a nonionic surfactant or an anionic surfactant as
the surfactant. The addition of the surfactant may improve the
effect of removing particles and metal impurities included in the
CMP slurry from the wiring board, and a more excellently treated
surface may be obtained.
[0083] Examples of the nonionic surfactant include a
polyoxyethylene alkyl ether such as polyoxyethylene lauryl ether,
polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, and
polyoxyethylene ( )ey' ether; a polyoxyethylene aryl ether such as
polyoxyethylene octyl phenyl ether and polyoxyethylene nonyl phenyl
ether; a sorbitan fatty acid ester such as sorbitan monolaurate,
sorbitan monopalmitate, and sorbitan monostearate; a
polyoxyethylene sorbitan fatty acid ester such as polyoxyethylene
sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, and
polyoxyethylene sorbitan monostearate; and the like. These nonionic
surfactants may be used either alone or in combination.
[0084] Examples of the anionic surfactant include an
alkylbenzenesulfonic acid such as dodecylbenzenesulfonic acid; an
alkylnaphthalenesulfonic acid; an alkyl sulfate such as lauryl
sulfate; a sulfuric acid ester of a polyoxyethylene alkyl ether,
such as polyoxyethylene lauryl sulfate; a naphthalenesulfonic acid
condensate; an alkyliminodicarboxylic acid; lignin sulfonic acid;
and the like. These anionic surfactants may be used in the form of
a salt. Examples of the counter cation include a sodium ion, a
potassium ion, an ammonium ion, and the like. Among these, an
ammonium ion is preferable from the viewpoint of preventing an
excessive increase in potassium or sodium content.
[0085] When subjecting a treatment target (polishing target) that
includes tungsten as a wiring material to CMP, a CMP slurry that
includes an iron ion and a peroxide (e.g., hydrogen peroxide and
potassium iodate) is used. Since the iron ion included in the CMP
slurry is easily adsorbed on the surface of the treatment target
(polishing target), the polishing target surface is easily
contaminated with iron. In this case, since the iron ion is
positively charged, it may be possible to effectively remove iron
from the polished surface by adding the anionic surfactant to the
semiconductor treatment composition.
[0086] The content of the surfactant in the semiconductor treatment
composition may be appropriately changed taking account of a metal
wire material (e.g., copper and tungsten), an insulating material
(e.g., silicon oxide), a barrier metal material (e.g., tantalum
nitride and titanium nitride), and the like that are exposed on the
surface of the treatment target that has been subjected to CMP, and
the composition of the CMP slurry.
[0087] The content of the surfactant in the semiconductor treatment
composition may also be appropriately changed taking account of the
degree of dilution with respect to the concentrated-type
semiconductor treatment composition. The content of the surfactant
in the semiconductor treatment composition is preferably 0.001 to 1
part by mass based on 100 parts by mass of a treatment agent
prepared by diluting the concentrated-type semiconductor treatment
composition, or based on 100 parts by mass of the non-dilution-type
semiconductor treatment composition (treatment agent). When the
content of the surfactant is within the above range, it is possible
to effectively remove an organic residue in the treatment step that
is performed after completion of CMP while reducing corrosion of
the treatment target.
1.3. Method for Preparing Semiconductor Treatment Composition
[0088] The semiconductor treatment composition may be prepared
using a known method (arbitrary method). The semiconductor
treatment composition may be prepared by dissolving each component
in the liquid medium (e.g., water or organic solvent), and
filtering the solution. The components may be mixed in an arbitrary
order using an arbitrary method.
[0089] When preparing the semiconductor treatment composition
according to one embodiment of the invention, it is preferable to
control the amount of particles by filtering the solution using a
depth-type filter or a pleat-type filter. The term "depth-type
filter" used herein refers to a high-performance filter that is
also referred to as "depth filtration filter" or "volume filtration
filter". The depth-type filter may have a stacked structure that is
formed by stacking filtration membranes in which a number of pores
are formed, or may be formed by rolling up a fiber bundle, for
example. Specific examples of the depth-type filter include Profile
II, Nexis NXA, Nexis NXT, Poly-Fine XLD, and Ultipleat Profile
(manufactured by Pall Corporation); Depth Cartridge Filter and
Wound Cartridge Filter (manufactured by Advantec Co., Ltd.); CP
Filter and BM Filter (manufactured by Chisso Corporation);
SLOPE-PURE, DIA, and MICRO-CILIA (manufactured by Roki Techno Co.,
Ltd.); and the like.
[0090] Examples of the pleat-type filter include a tubular
high-performance filter that is obtained by pleating a
microfiltration membrane sheet formed of a nonwoven fabric, filter
paper, metal mesh, or the like, forming the microfiltration
membrane sheet to have a tubular shape, liquid-tightly sealing the
joint of the sheet, and liquid-tightly sealing each end of the
tubular sheet. Specific examples of the pleat-type filter include
HDC II and Poly-Fine II (manufactured by Pall Corporation); PP
Pleated Cartridge Filter (manufactured by Advantec Co., Ltd.);
POROUSFINE (manufactured by Chisso Corporation); CERTAIN-PORE and
MICRO-PURE (manufactured by Roki Techno Co., Ltd.); and the
like.
[0091] It is preferable to use a filter having a nominal filtration
rating of 0.01 to 20 micrometers. When the nominal filtration
rating is within the above range, it is possible to efficiently
obtain a filtrate in which the number (per mL) of particles having
a particle size of 20 micrometers or more measured using a particle
counter is 0. Moreover, since the number of large particles trapped
by the filter is minimized, the service life of the filter
increases.
2. Treatment Agent
[0092] The term "treatment agent" used herein refers to a liquid
agent that is prepared by diluting the concentrated-type
semiconductor treatment composition with a liquid medium, or
prepared using the non-dilution-type semiconductor treatment
composition, and is used to treat the treatment target surface. The
concentrated-type semiconductor treatment composition is normally a
composition in which each component is concentrated. Each user
prepares the treatment agent by appropriately diluting the
concentrated-type semiconductor treatment composition with a liquid
medium, or utilizes the non-dilution-type semiconductor treatment
composition directly as the treatment agent, and uses the treatment
agent as a cleaning agent, an etchant, or a resist stripper.
[0093] The liquid medium that is used to dilute the
concentrated-type semiconductor treatment composition is the same
as the liquid medium that is included in the semiconductor
treatment composition, and may be appropriately selected from the
liquid media mentioned above taking account of the type of
treatment agent.
[0094] The concentrated-type semiconductor treatment composition
may be diluted with the liquid medium using a method that mixes the
concentrated-type semiconductor treatment composition supplied from
a pipe that supplies the concentrated-type semiconductor treatment
composition, and the liquid medium supplied from a pipe that
supplies the liquid medium, and supplies the mixture (treatment
agent) to the treatment target surface. The concentrated-type
semiconductor treatment composition and the liquid medium may be
mixed using an ordinary method such as a method that causes the
concentrated-type semiconductor treatment composition and the
liquid medium to collide (be mixed) with each other through a
narrow passage in a state in which pressure is applied; a method
that causes the flow of the liquid to be repeatedly divided and
joined by charging the pipe with a packing material such as glass
tubes; and a method that provides a power-driven blade inside the
pipe.
[0095] The concentrated-type semiconductor treatment composition
may be diluted with the liquid medium using a method that provides
a pipe that supplies the concentrated-type semiconductor treatment
composition and a pipe that supplies the liquid medium so as to be
independent of each other, and supplies a predetermined amount of
liquid to the treatment target surface from each pipe so that the
concentrated-type semiconductor treatment composition and the
liquid medium are mixed on the treatment target surface. The
concentrated-type semiconductor treatment composition may also be
diluted with the liquid medium using a method that charges a
container with a predetermined amount of concentrated-type
semiconductor treatment composition and a predetermined amount of
liquid medium, mixes the concentrated-type semiconductor treatment
composition and the liquid medium, and supplies the mixture
(treatment agent) to the treatment target surface.
[0096] Regarding the dilution ratio employed when diluting the
concentrated-type semiconductor treatment composition with the
liquid medium, it is preferable to dilute 1 part by mass of the
concentrated-type semiconductor treatment composition with the
liquid medium so that 1 to 500 parts by mass (1 to 500-fold
amount), more preferably 20 to 500 parts by mass (20 to 500-fold
amount), and particularly preferably 30 to 300 parts by mass (30 to
300-fold amount), of a mixture is obtained. Note that it is
preferable to dilute the concentrated-type semiconductor treatment
composition with the same liquid medium as that included in the
concentrated-type semiconductor treatment composition. When the
semiconductor treatment composition is concentrated, it is possible
to transport and store the semiconductor treatment composition
using a small container as compared with the case where the
treatment agent prepared using the semiconductor treatment
composition is transported and stored. This makes it possible to
reduce the transport-storage cost. Since the purification volume is
reduced as compared with the case where the treatment agent is
purified by filtration or the like, it is possible to reduce the
purification time, and implement mass production.
3. Treatment Method
[0097] A treatment method according to one embodiment of the
invention includes treating a wiring board using the semiconductor
treatment composition (i.e., treatment agent (e.g., cleaning agent,
etchant, or resist stripper)), the wiring board including a wiring
material and a barrier metal material, the wiring material being
copper or tungsten, and the barrier metal material being at least
one material selected from the group consisting of tantalum,
titanium, cobalt, ruthenium, manganese, and compounds thereof. An
example of the treatment method is described in detail below with
reference to the drawings.
<Production of Wiring Board>
[0098] FIG. 1 is a cross-sectional view schematically illustrating
a process that produces the wiring board that is used in connection
with the treatment method. The wiring board is produced as
described below.
[0099] FIG. 1 is a cross-sectional view schematically illustrating
the polishing target that is to be subjected to CMP. As illustrated
in FIG. 1, a polishing target 100 includes a substrate 10. The
substrate 10 may include a silicon substrate, and a silicon oxide
film that is formed on the silicon substrate, for example. A
functional device such as a transistor (not illustrated in FIG. 1)
may be formed on the substrate 10.
[0100] The polishing target 100 includes an insulating film 12
which is formed on the substrate 10 and in which a wiring recess 20
is formed, a barrier metal film 14 that is formed to cover the
surface of the insulating film 12 and the bottom and the inner wall
surface of the wiring recess 20, and a metal film 16 that is formed
on the barrier metal film 14 so that the wiring recess 20 is filled
with the metal film 16, the insulating film 12, the barrier metal
film 14, and the metal film 16 being sequentially stacked.
[0101] The insulating film 12 may be a silicon oxide film formed by
a vacuum process (e.g., a plasma enhanced-TEOS film (PETEOS film),
a high-density plasma enhanced-TEOS film (HDP film), or a silicon
oxide film obtained by thermal chemical vapor deposition), an
insulating film referred to as fluorine-doped silicate glass (FSG),
a borophosphosilicate film (BPSG film), an insulating film referred
to as silicon oxynitride (SiON), silicon nitride, or the like.
[0102] Examples of a metal that is used to form the barrier metal
film 14 include tantalum, titanium, cobalt, ruthenium, manganese,
compounds thereof, and the like. The barrier metal film 14 is
normally formed using one material among these material. Note that
the barrier metal film 14 may be formed using two or more materials
(e.g., tantalum and tantalum nitride) among these materials.
[0103] As illustrated in FIG. 1, the wiring recess 20 must be
completely filled with the metal film 16. Therefore, a metal film
having a thickness of 10,000 to 15,000 angstroms is normally
deposited by chemical vapor deposition or electroplating. Examples
of a material that is used to form the metal film 16 include copper
and tungsten. When using copper, copper having high purity, or a
copper alloy may be used. The copper content in the copper alloy is
preferably 95 mass % or more.
[0104] The metal film 16 included in the polishing target 100
illustrated in FIG. 1 is subjected to CMP (polished) at a high
speed in an area other than the area situated within the wiring
recess 20 until the barrier metal film 14 is exposed (first
polishing step). The exposed barrier metal film 14 is subjected to
CMP (polished) (second polishing step). A wiring board 200
illustrated in FIG. 2 is thus obtained.
<Treatment of Wiring Board>
[0105] The surface (treatment target surface) of the wiring board
200 illustrated in FIG. 2 is treated using the treatment agent
(cleaning agent). The treatment method can suppress corrosion of
the wiring material and the barrier metal material, and efficiently
remove an oxide film and an organic residue on the wiring board
when treating the wiring board which has been subjected to CMP, and
on which the wiring material and the barrier metal material are
present.
[0106] It is very effective to perform the treatment method when
the wiring board includes tungsten as the wiring material, and has
been subjected to CMP using a composition (Fenton's reagent) that
includes an iron ion and a peroxide (see JP-A-H10-265766). When
subjecting the polishing target that includes tungsten as the
wiring material to CMP, a CMP slurry that includes an iron ion and
a peroxide (e.g., hydrogen peroxide and potassium iodate) is used.
Since the iron ion included in the CMP slurry is easily adsorbed on
the surface of the treatment target (polishing target), the
polishing target surface is easily contaminated with iron. Iron can
be removed by treating the polished surface using diluted
hydrofluoric acid. In this case, however, the polished surface is
easily etched and damaged. On the other hand, the semiconductor
treatment composition includes potassium and sodium in a
predetermined ratio, and production of a soluble salt (e.g.,
potassium tungstate and sodium tungstate) is promoted during the
treatment step. This makes it possible to reduce contamination of
the wiring board with a metal, and efficiently remove a polishing
residue while reducing damage applied to the treatment target.
[0107] The treatment method is implemented by bringing the cleaning
agent into direct contact with the wiring board 200, for example.
The cleaning agent may be brought into direct contact with the
wiring board 200 using a dipping method that fills a cleaning tank
with the cleaning agent, and immerses the wiring board in the
cleaning agent; a spin method that rotates the wiring board at a
high speed while supplying the cleaning agent to the wiring board
from a nozzle; a spray method that sprays the cleaning agent onto
the wiring board; or the like. Examples of a device used to
implement such a method include a batch-type treatment device that
simultaneously treats a plurality of wiring boards placed in a
cassette, a single-wafer treatment device that treats a single
wiring board that is held by a holder, and the like.
[0108] When implementing the treatment method, the cleaning agent
is normally used at room temperature. Note that the cleaning agent
may be heated as long as the performance of the cleaning agent is
not impaired. For example, the cleaning agent may be heated to
about 40.degree. C. to about 70.degree. C.
[0109] It is also preferable to use a treatment method that
utilizes a physical force in combination with the method that
brings the cleaning agent into direct contact with the wiring board
200. This makes it possible to more effectively remove
contamination due to particles that adhere to the wiring board 200,
and reduce the treatment time. Examples of the treatment method
that utilizes a physical force include a scrubbing cleaning method
that utilizes a cleaning brush, and an ultrasonic cleaning
method.
[0110] A cleaning step that utilizes ultrapure water or purified
water may be performed before and/or after the cleaning step that
utilizes the treatment method.
4. Examples
[0111] The invention is further described below by way of examples.
Note that the invention is not limited to the following examples.
The units "parts" and "%" used in connection with the examples
respectively refer to "parts by mass" and "mass %" unless otherwise
indicated.
4.1. Example 1
4.1.1. Preparation of Semiconductor Treatment Composition
(Concentrated-Type Semiconductor Treatment Composition)
[0112] A polyethylene container was charged with each component
listed in Table 1 in the ratio listed in Table 1. After the
addition of a proper quantity of ion-exchanged water, the mixture
was stirred for 15 minutes. Ion-exchanged water, potassium
hydroxide, and sodium hydroxide were optionally added to the
mixture so that the total amount of the components was 100 parts by
mass to prepare a composition having the pH, the K content, and the
Na content listed in Table 1.
[0113] After the addition of 0.01 parts by mass of colloidal silica
("PL-1" manufactured by Fuso Chemical Co., Ltd., primary particle
size: 15 nm) to 100 parts by mass of the composition, the mixture
was filtered using the filtration device 300 illustrated in FIG. 3
(filtration step). The filtration device 300 illustrated in FIG. 3
includes a supply tank 210 that stores and supplies the composition
from which foreign matter has not been removed, a constant volume
pump 220 that discharges the composition (from which foreign matter
has not been removed) at a constant flow rate, a filter 240 that
includes a cartridge filter (not illustrated in FIG. 3) and a
housing that holds (is fitted with) the cartridge filter, a
pulsation protector 230 that is situated between the constant
volume pump 220 and the filter 240, a first manometer 270a that is
disposed between the pulsation protector 230 and the filter 240,
and a second manometer 270b that is disposed on the downstream side
of the filter 240. The filtration device 300 also includes a return
conduit 260 that returns the semiconductor treatment composition
from the filter 240 to the supply tank 210, and a discharge conduit
250 that discharges the semiconductor treatment composition that
has been filtered through the filter 240.
[0114] In Example 1, a filter in which a membrane-type cartridge
filter "WATER-FINE" (manufactured by Pall Corporation, nominal
filtration rating: 0.05 micrometers, length: 10 inches) was
provided in a housing, was used as the filter 240. An air-driven
diaphragm pump was used as the constant volume pump 220. The
differential pressure across the filter was set to 0.2 to 0.3 MPaG,
and the flow rate of the composition was set to 50 L/min.
[0115] The composition was sampled on a timely basis, and
filtration was stopped when the number of particles having a
particle size of 0.1 to 0.3 micrometers included in the composition
had reached the value (concentration) listed in Table 1 to obtain a
semiconductor treatment composition (concentrated-type
semiconductor treatment composition) of Example 1. Note that the
number of particles per mL of the composition was measured as
described below.
[0116] A liquid-borne particle sensor "KS-42AF" (manufactured by
RION Co., Ltd.) was used as a particle counter. Blank measurement
was repeated using ultrapure water until the number of particles
measured became "30 per mL (0.1 micrometers)" (i.e., the number of
particles having a particle size of more than 0.1 micrometers was
30 or less per mL). 100 mL of the concentrated-type semiconductor
treatment composition (sample) was provided, and placed in a
syringe sampler "KZ-31W". The number of particles having a particle
size of 0.1 to 0.3 micrometers per mL of the sample was measured
twice using the liquid-borne particle sensor, and the average value
thereof was calculated. The average value was taken as the number
of particles having a particle size of 0.1 to 0.3 micrometers per
mL of the semiconductor treatment composition.
[0117] The viscosity of the semiconductor treatment composition was
measured according to JIS K2283 by maintaining the solution
temperature of the obtained semiconductor treatment composition
(concentrated-type semiconductor treatment composition) at
25.degree. C. in the glass tube for measuring Ubbelohde viscosity,
measuring the time required for moving a predetermined distance,
and multiplying a constant by the moving time.
4.1.2. Evaluation Tests
<Filterability Evaluation>
[0118] The filterability in production of a composition is
considered as an index for determining the productivity of
composition. When the filterability is evaluated as "Bad", the
productivity of composition may deteriorate significantly and the
composition may deteriorate due to contact with the atmosphere or
heat generated by the motor used for filtration. Accordingly, the
fast filtration flow rate is an index that the composition is
determined to be good.
[0119] The filterability evaluation is performed by filtering the
semiconductor treatment composition using a membrane filter such as
a 10-inch Varafine VFSG (nominal filtration rating: 0.05
micrometers)(manufactured by Pall Corporation) which is mounted to
a filter housing connected to the magnetic pump MD-F (manufactured
by IWAKI Co., Ltd). The results are listed in Table 1. The
following evaluation standard was used.
[0120] (Evaluation Standard)
[0121] The semiconductor treatment composition passed through the
filter was collected for one minute and the weight thereof was
measured. The filtration flow rate was calculated from the obtained
filtration weight and the specific gravity. A case where the
obtained filtration flow rate is 5 L/min or higher was evaluated as
"Very good", a case where the obtained filtration flow rate is 1
L/min or higher and less than 5 L/min was evaluated as "Good"
(acceptable in practical use), and a case where the obtained
filtration flow rate is less than 1 L/min was evaluated as "Bad"
(unacceptable).
<Foaming Evaluation>
[0122] When the semiconductor treatment composition foams in the
treatment step, the foaming becomes a false defect on the surface
of the substrate, whereby the treatment efficiency deteriorates
significantly, for example, the number of particles is increased
reversely. Accordingly, when the foaming is small, it is an index
that the semiconductor treatment composition is determined to be
good.
[0123] A small amount of the semiconductor treatment composition
was put in a plastic measuring cylinder having a capacity of 1000
mL (inner diameter of 6.2 cm) to sufficiently make the wall surface
thereof wet. And then, 100 mL of the semiconductor treatment
composition was put into the measuring cylinder so as not to foam.
On the other hand, 100 mL of the same semiconductor treatment
composition is put into an exclusive burette so as not to foam. The
burette was fixed such that the tip of the burette was located at
the height of 70 cm over the liquid level in the measuring
cylinder. The cock of the burette was fully opened and the
semiconductor treatment composition was dropped into the center of
the liquid level in the measuring cylinder. The cock was closed at
the time of completing dropping of 100 mL of the semiconductor
treatment composition, and the height of foaming from the liquid
level was measured. The results are listed in Table 1. The
following evaluation standard was used.
[0124] (Evaluation Standard)
[0125] A case where the height of foaming was less than 5 mm was
evaluated as "Very good", a case where the height of foaming was
equal to or more than 5 mm to less than 1 cm was evaluated as
"Good" (acceptable), and a case where the height of foaming was 1
cm or more was evaluated as "Bad" (unacceptable).
<Watermark Evaluation>
[0126] A decrease in yield in semiconductor production is caused by
the defects called "watermarks" occurred over the entire surface of
the substrate that had been subjected to the treatment with the
semiconductor treatment composition. Accordingly, when the number
of watermarks is small as much as possible, it is an index that the
semiconductor treatment composition is determined to be good.
[0127] The semiconductor treatment composition (concentrated-type
semiconductor treatment composition) prepared as described above
was diluted with ultrapure water (number of particles having a
particle size of 0.3 micrometers or more: 10 or less per mL, pH:
6.5) in the dilution ratio listed in Table 1 to prepare a treatment
agent (cleaning agent), and the surface of the silicon wafer that
had been stacked with a silicon oxide film having a thickness of
20000 angstroms was treated (cleaned) on the platen using a
chemical mechanical polishing device "AWAT Reflexion LK"
(manufactured by Applied Materials, Inc.,) under the following
conditions. A brush scrubbing treatment (cleaning) was then
performed.
<Treatment (Cleaning) on Platen>
[0128] Treatment agent: treatment agent (cleaning agent) prepared
as described above [0129] Head rotational speed: 70 rpm [0130] Head
load: 100 g/cm.sup.2 [0131] Platen rotational speed: 71 rpm [0132]
Treatment agent supply rate: 300 mL/min [0133] Treatment time: 30
sec
<Brush Scrubbing Treatment (Cleaning)>
[0133] [0134] Treatment agent: treatment agent (cleaning agent)
prepared as described above [0135] Upper brush rotational speed:
400 rpm [0136] Lower brush rotational speed: 400 rpm [0137]
Substrate rotational speed: 50 rpm [0138] Treatment agent supply
rate: 1200 mL/min [0139] Treatment time: 40 sec
[0140] The surface of the substrate that had been subjected to
treatment was then subjected to the defect inspection process using
a wafer surface defects observation apparatus "KLA 2351"
(manufactured by KLA Tencor Corp.,), thereby inspecting the number
of watermarks (defects) on the entire surface of the treatment
target. The results are listed in Table 1. The following evaluation
standard was used.
[0141] (Evaluation Standard)
[0142] A case where the number of watermarks over the entire
surface of the substrate was 5 or less was evaluated as "Very
good", a case where the number of watermarks over the entire
surface of the substrate was more than 5 and 10 or less was
evaluated as "Good" (acceptable), and a case where number of
watermarks over the entire surface of the substrate was more than
10, was evaluated as "Bad" (unacceptable).
4.2. Examples 2 to 23 and Comparative Examples 1 to 5
[0143] The used semiconductor treatment composition was prepared in
the same manner as in Example 1, except that the composition was
changed as listed in Tables 1 to 2, and a treatment agent (cleaning
agent) was prepared in the same manner as in Example 1, except that
the composition was changed as listed in Tables 1 to 2. Various
evaluation tests were performed in the same manner as in Example
1.
4.3. Example 24
4.3.1. Preparation of Semiconductor Treatment Composition
(Non-Dilution-Type Semiconductor Treatment Composition)
[0144] A polyethylene container was charged with each component
listed in Table 3 in the ratio listed in Table 3. After the
optional addition of potassium hydroxide and sodium hydroxide so
that the pH, the K content, and the Na content listed in Table 3
were obtained, the mixture was stirred for 15 minutes.
[0145] The resulting semiconductor treatment composition
(non-dilution-type semiconductor treatment composition) was
filtered in the same manner as in Example 1, except that a filter
in which a membrane-type cartridge filter "PE-CLEAN" (manufactured
by Pall Corporation, nominal filtration rating: 0.05 micrometers,
length: 10 inches) was provided in a housing, was used as the
filter 240. The composition was sampled on a timely basis, and
filtration was stopped when the number of particles having a
particle size of 0.1 to 0.3 micrometers included in the
semiconductor treatment composition had reached the value
(concentration) listed in Table 3 to obtain a semiconductor
treatment composition (non-dilution-type semiconductor treatment
composition) of Example 24. The evaluation tests were performed in
the same manner as in Example 1, except that the semiconductor
treatment composition was used directly as the treatment agent
(etchant) as it is.
4.4. Example 25
[0146] A semiconductor treatment composition (non-dilution-type
semiconductor treatment composition) was prepared in the same
manner as in Example 24, except that the composition was changed as
listed in Table 3, and used directly as a treatment agent (resist
stripper) as it is. Various evaluation tests were performed in the
same manner as in Example 24.
4.5. Examples 26 to 29 and Comparative Examples 6 to 9
[0147] A semiconductor treatment composition (non-dilution-type
semiconductor treatment composition) was prepared in the same
manner as in Example 24, except that the composition was changed as
listed in Table 3, and used directly as a treatment agent (etchant
or resist stripper) without being diluted. Various evaluation tests
were performed in the same manner as in Example 24.
4.6. Evaluation Results
[0148] The composition of each semiconductor treatment composition
and the evaluation results are listed in Tables 1 to 3.
TABLE-US-00001 TABLE 1 Example 1 2 3 4 5 6 7 Semiconductor Compound
A TMAH 0.01 0.2 treatment TEAH 0.02 0.1 composition TPAH 0.01
(concentrated-type TBAH 0.02 semiconductor Choline 0.01 treatment
Ammonium hydroxide composition) Water-soluble polymer Polyacrylic
acid (Mw = 700,000) Polyacrylic acid (Mw = 55,000) Polyacrylic acid
(Mw = 6,000) Polymaleic acid (Mw = 2,000) Styrene-maleic acid
copolymer 0.5 0.2 0.05 0.5 Styrene-maleic acid half ester copolymer
0.1 0.07 Naphthalenesulfonic acid-formalin 0.2 condensate Na salt
Organic acid Serine Histidine Arginine Phenylalanine 1 Benzoic acid
0.5 Hydroxyphenyllactic acid Phenylsuccinic acid 3 1
Naphthalenesulfonic acid 1 Amine Monoethanolamine 6 3 1 3 3 1.5
Isopropanolamine 2 K/Na content M.sub.K (ppm) 1.0 .times. 10.sup.1
3.0 .times. 10.sup.0 1.0 .times. 10.sup.1 5.0 .times. 10.sup.0 7.0
.times. 10.sup.1 2.0 .times. 10.sup.0 5.0 .times. 10.sup.0 M.sub.Na
(ppm) .sup. 1.8 .times. 10.sup.-1 .sup. 3.0 .times. 10.sup.-2 .sup.
1.5 .times. 10.sup.-2 .sup. 2.0 .times. 10.sup.-1 .sup. 2.0 .times.
10.sup.-1 .sup. 3.0 .times. 10.sup.-2 1.2 .times. 10.sup.0
M.sub.K/M.sub.Na 5.6 .times. 10.sup.1 1.0 .times. 10.sup.2 6.7
.times. 10.sup.2 2.5 .times. 10.sup.1 3.5 .times. 10.sup.2 6.7
.times. 10.sup.1 4.2 .times. 10.sup.0 Number of particles Number of
particles having particle size of 0.1 to 8.8 .times. 10.sup.2 1.4
.times. 10.sup.3 5.0 .times. 10.sup.1 3.0 .times. 10.sup.2 2.3
.times. 10.sup.2 8.5 .times. 10.sup.1 1.4 .times. 10.sup.3 0.3
micrometers (per mL) Viscosity (mPa s) 2.4 1.5 1.3 1.1 1.2 2.5 1.4
pH 13.1 12.4 11.5 12.4 12.4 12.4 12.5 Production conditions
Dilution ratio 300 100 50 100 100 100 50 Treatment agent K/Na
content M.sub.K (ppm) .sup. 3.3 .times. 10.sup.-2 .sup. 3.0 .times.
10.sup.-2 .sup. 2.0 .times. 10.sup.-1 .sup. 5.0 .times. 10.sup.-2
.sup. 7.0 .times. 10.sup.-1 .sup. 2.0 .times. 10.sup.-2 .sup. 1.0
.times. 10.sup.-1 M.sub.Na (ppm) .sup. 6.0 .times. 10.sup.-4 .sup.
3.0 .times. 10.sup.-4 .sup. 3.0 .times. 10.sup.-4 .sup. 2.0 .times.
10.sup.-3 .sup. 2.0 .times. 10.sup.-3 .sup. 3.0 .times. 10.sup.-4
.sup. 2.4 .times. 10.sup.-2 M.sub.K/M.sub.Na 5.6 .times. 10.sup.1
1.0 .times. 10.sup.2 6.7 .times. 10.sup.2 2.5 .times. 10.sup.1 3.5
.times. 10.sup.2 6.7 .times. 10.sup.1 4.2 .times. 10.sup.0 Number
of particles Number of particles having particle size of 0.1 to 3.5
.times. 10.sup.1 1.7 .times. 10.sup.2 1.2 .times. 10.sup.1 3.6
.times. 10.sup.1 2.8 .times. 10.sup.1 1.0 .times. 10.sup.1 3.4
.times. 10.sup.2 0.3 micrometers (per mL) Viscosity (mPa s) 1.2 1 1
1 1 1.2 1 pH 10.6 10.8 10.6 10.6 10.4 10.6 11.8 Type Cleaning
Cleaning Cleaning Cleaning Cleaning Cleaning Cleaning Evaluation
item Filterability evaluation Very good Very good Very good Very
good Very good Good Very good Foaming evaluation Very good Very
good Very good Very good Very good Good Very good Watermark
evaluation Very good Very good Very good Very good Very good Very
good Very good Example 8 9 10 11 12 13 14 Semiconductor Compound A
TMAH 0.1 treatment composition TEAH 0.2 (concentrated-type TPAH 0.2
0.1 semiconductor TBAH 0.1 treatment composition) Choline 0.2
Ammonium hydroxide 0.1 Water-soluble polymer Polyacrylic acid (Mw =
700,000) 0.14 0.01 Polyacrylic acid (Mw = 55,000) 0.2 Polyacrylic
acid (Mw = 6,000) 0.3 Polymaleic acid (Mw = 2,000) 0.1 0.07
Styrene-maleic acid copolymer Styrene-maleic acid half ester
copolymer Naphthalenesulfonic acid-formalin 0.05 condensate Na salt
Organic acid Serine 0.35 Histidine 0.2 0.5 Arginine 0.3 0.3
Phenylalanine Benzoic acid Hydroxyphenyllactic acid 0.15
Phenylsuccinic acid Naphthalenesulfonic acid Amine Monoethanolamine
1.4 2.1 2.1 2.1 1 3 Isopropanolamine 3.5 0.5 K/Na content M.sub.K
(ppm) 2.5 .times. 10.sup.1 3.0 .times. 10.sup.0 4.0 .times.
10.sup.1 4.0 .times. 10.sup.0 1.0 .times. 10.sup.2 5.0 .times.
10.sup.1 3.0 .times. 10.sup.2 M.sub.Na (ppm) .sup. 2.8 .times.
10.sup.-1 1.7 .times. 10.sup.0 .sup. 3.0 .times. 10.sup.-2 .sup.
2.8 .times. 10.sup.-1 1.7 .times. 10.sup.0 .sup. 2.0 .times.
10.sup.-2 5.0 .times. 10.sup.0 M.sub.K/M.sub.Na 8.9 .times.
10.sup.1 1.8 .times. 10.sup.0 1.3 .times. 10.sup.3 1.4 .times.
10.sup.1 5.9 .times. 10.sup.1 2.5 .times. 10.sup.3 6.0 .times.
10.sup.1 Number of particles Number of particles having particle
size of 0.1 to 1.4 .times. 10.sup.3 1.2 .times. 10.sup.3 9.5
.times. 10.sup.2 1.2 .times. 10.sup.2 6.0 .times. 10.sup.2 1.5
.times. 10.sup.2 1.2 .times. 10.sup.3 0.3 micrometers (per mL)
Viscosity (mPa s) 1.1 3.3 2.5 1.6 1.2 3 1.2 pH 13.1 13.8 13.8 13.8
13.8 13.4 13.9 Production conditions Dilution ratio 70 70 70 70 70
50 100 Treatment agent K/Na content M.sub.K (ppm) .sup. 3.6 .times.
10.sup.-1 .sup. 4.3 .times. 10.sup.-2 .sup. 5.7 .times. 10.sup.-1
.sup. 5.7 .times. 10.sup.-2 1.4 .times. 10.sup.0 1.0 .times.
10.sup.0 3.0 .times. 10.sup.0 M.sub.Na (ppm) .sup. 4.0 .times.
10.sup.-3 .sup. 2.4 .times. 10.sup.-2 .sup. 4.3 .times. 10.sup.-4
.sup. 4.0 .times. 10.sup.-3 .sup. 2.4 .times. 10.sup.-2 .sup. 4.0
.times. 10.sup.-4 .sup. 5.0 .times. 10.sup.-2 M.sub.K/M.sub.Na 8.9
.times. 10.sup.1 1.8 .times. 10.sup.0 1.3 .times. 10.sup.3 1.4
.times. 10.sup.1 5.9 .times. 10.sup.1 2.5 .times. 10.sup.3 6.0
.times. 10.sup.1 Number of particles Number of particles having
particle size of 0.1 to 2.4 .times. 10.sup.2 2.1 .times. 10.sup.2
1.6 .times. 10.sup.2 2.1 .times. 10.sup.1 1.0 .times. 10.sup.2 3.6
.times. 10.sup.1 1.4 .times. 10.sup.2 0.3 micrometers (per mL)
Viscosity (mPa s) 1 1.4 1.2 1 1 1.3 1 pH 11.8 11.7 11.5 11.7 11.7
11.6 11.7 Type Cleaning Cleaning Cleaning Cleaning Cleaning
Cleaning Cleaning Evaluation item Filterability evaluation Very
good Good Good Very good Very good Good Very good Foaming
evaluation Very good Good Good Very good Very good Good Very good
Watermark evaluation Very good Very good Very good Very good Very
good Very good Very good
TABLE-US-00002 TABLE 2 Example 15 16 17 18 19 20 21 22 23
Semiconductor Compound A TMAH 0.2 treatment TEAH 0.1 composition
TPAH 0.05 (concentrated-type TBAH 0.2 0.1 semiconductor Choline 0.1
0.05 treatment Ammonium hydroxide 0.05 0.05 composition)
Water-soluble Polyacrylic acid (Mw = 700,000) 0.1 0.03 0.1 0.0001
polymer Polyacrylic acid (Mw = 55,000) 0.03 0.001 Polyacrylic acid
(Mw = 6,000) 0.1 0.01 Polymaleic acid (Mw = 2,000) 0.05 Organic
acid Serine 0.2 Cysteine 0.05 0.01 0.003 N-Acetyl-L-cysteine 0.01
0.05 0.001 Histidine 0.3 Arginine Phenylalanine 0.1 Amine
Monoethanolamine 1 1 2 1 3 1 0.05 0.01 Hydroxylamines 1 Other KOH
K/Na content M.sub.K(ppm) 5.0 .times. 10.sup.0 4.0 .times. 10.sup.1
3.0 .times. 10.sup.0 1.0 .times. 10.sup.2 1.0 .times. 10.sup.0 1.0
.times. 10.sup.0 3.0 .times. 10.sup.1 .sup. 1.0 .times. 10.sup.-2
2.0 .times. 10.sup.-3 M.sub.Na(ppm) 30 .times. 10.sup.0 .sup. 1.0
.times. 10.sup.-2 3.0 .times. 10.sup.0 .sup. 5.0 .times. 10.sup.-2
.sup. 1.5 .times. 10.sup.-1 .sup. 1.0 .times. 10.sup.-1 .sup. 4.0
.times. 10.sup.-1 .sup. 7.0 .times. 10.sup.-3 6.0 .times. 10.sup.-3
M.sub.K/M.sub.Na 1.7 .times. 10.sup.0 4.0 .times. 10.sup.3 1.0
.times. 10.sup.0 2.0 .times. 10.sup.3 6.7 .times. 10.sup.0 1.0
.times. 10.sup.1 7.5 .times. 10.sup.1 1.4 .times. 10.sup.0 3.3
.times. 10.sup.-1 Number of Number of particles having particle
size of 1.4 .times. 10.sup.3 5.3 .times. 10.sup.2 8.1 .times.
10.sup.1 1.9 .times. 10.sup.3 1.5 .times. 10.sup.3 1.1 .times.
10.sup.3 5.0 .times. 10.sup.2 9.0 .times. 10.sup.1 2.0 .times.
10.sup.1 particles 0.1 to 0.3 micrometers (per mL) Viscosity (mPa
s) 4.5 1.5 1.6 3.5 1.1 4.8 1.2 1.1 1 pH 13.5 13.4 12.6 13.6 13.8
13.9 13.1 12.4 12.8 Production Dilution ratio 100 100 100 70 80 100
70 50 50 conditions Treatment agent K/Na content M.sub.K(ppm) .sup.
5.0 .times. 10.sup.-2 .sup. 4.0 .times. 10.sup.-1 .sup. 3.0 .times.
10.sup.-2 1.4 .times. 10.sup.0 .sup. 1.3 .times. 10.sup.-2 .sup.
1.0 .times. 10.sup.-2 .sup. 4.3 .times. 10.sup.-1 .sup. 2.0 .times.
10.sup.-4 4.0 .times. 10.sup.-5 M.sub.Na(ppm) .sup. 3.0 .times.
10.sup.-2 .sup. 1.0 .times. 10.sup.-4 .sup. 3.0 .times. 10.sup.-2
.sup. 7.1 .times. 10.sup.-4 .sup. 1.9 .times. 10.sup.-3 .sup. 1.0
.times. 10.sup.-3 .sup. 5.7 .times. 10.sup.-3 .sup. 1.4 .times.
10.sup.-4 1.2 .times. 10.sup.-4 M.sub.K/M.sub.Na 1.7 .times.
10.sup.0 4.0 .times. 10.sup.3 1.0 .times. 10.sup.0 2.0 .times.
10.sup.3 6.7 .times. 10.sup.0 1.0 .times. 10.sup.1 7.5 .times.
10.sup.1 1.4 .times. 10.sup.0 3.3 .times. 10.sup.-1 Number of
Number of particles having particle size of 1.7 .times. 10.sup.2
6.4 .times. 10.sup.1 9.7 .times. 10.sup.0 3.3 .times. 10.sup.2 2.3
.times. 10.sup.2 1.3 .times. 10.sup.2 8.6 .times. 10.sup.1 2.2
.times. 10.sup.1 4.8 .times. 10.sup.0 particles 0.1 to 0.3
micrometers (per mL) Viscosity (mPa s) 1.4 1 1 1.3 1 1.5 1 1 1 pH
11.8 11.5 10.8 12 11.5 11.7 11.5 11.2 11.5 Type Cleaning Cleaning
Cleaning Cleaning Cleaning Cleaning Cleaning Cleaning Cleaning
Evaluation item Filterability evaluation Good Very good Very good
Good Very good Good Very good Very good Very good Foaming
evaluation Good Very good Very good Good Very good Good Very good
Very good Very good Watermark evaluation Very good Very good Very
good Very good Very good Very good Very good Very good Very good
Comparative Example 1 2 3 4 5 Semiconductor Compound A TMAH 0.01
treatment TEAH 0.03 composition TPAH (concentrated- TBAH type
Choline semiconductor Ammonium hydroxide 0.01 treatment
Water-soluble Polyacrylic acid (Mw = 700,000) 0.1 0.3 0.5 0.3
composition) polymer Polyacrylic acid (Mw = 55,000) Polyacrylic
acid (Mw = 6,000) 0.01 Polymaleic acid (Mw = 2,000) Organic acid
Serine Cysteine N-Acetyl-L-cysteine Histidine Arginine
Phenylalanine 0.01 Amine Monoethanolamine 1 1 Hydroxylamines Other
KOH 0.5 0.7 0.5 0.5 K/Na content M.sub.K (ppm) 3.5 .times. 10.sup.3
4.9 .times. 10.sup.3 4.5 .times. 10.sup.3 5.0 .times. 10.sup.3 1.0
.times. 10.sup.0 M.sub.Na (ppm) .sup. 1.0 .times. 10.sup.-1 .sup.
7.0 .times. 10.sup.-1 .sup. 2.0 .times. 10.sup.-1 .sup. 3.0 .times.
10.sup.-1 2.0 .times. 10.sup.1 M.sub.K/M.sub.Na 3.5 .times.
10.sup.4 7.0 .times. 10.sup.3 2.3 .times. 10.sup.4 1.7 .times.
10.sup.4 .sup. 5.0 .times. 10.sup.-2 Number of Number of particles
having particle size of ND 9.0 .times. 10.sup.2 ND 1.2 .times.
10.sup.3 6.0 .times. 10.sup.2 particles 0.1 to 0.3 micrometers (per
mL) Viscosity (mPa s) 8 9 1.1 7 8 pH 13.9 13.8 12.9 13.2 13.6
Production Dilution ratio 100 70 50 50 100 conditions Treatment
agent K/Na content M.sub.K (ppm) 3.5 .times. 10.sup.1 7.0 .times.
10.sup.1 9.0 .times. 10.sup.1 1.0 .times. 10.sup.2 .sup. 1.0
.times. 10.sup.-2 M.sub.Na (ppm) .sup. 1.0 .times. 10.sup.-3 .sup.
1.0 .times. 10.sup.-2 .sup. 4.0 .times. 10.sup.-3 .sup. 6.0 .times.
10.sup.-3 .sup. 2.0 .times. 10.sup.-1 M.sub.K/M.sub.Na 3.5 .times.
10.sup.4 7.0 .times. 10.sup.3 2.3 .times. 10.sup.4 1.7 .times.
10.sup.4 .sup. 5.0 .times. 10.sup.-2 Number of particles Number of
particles having particle size of 0.1 to 0.3 micrometers (per ND
1.5 .times. 10.sup.2 ND 2.9 .times. 10.sup.2 7.2 .times. 10.sup.1
mL) Viscosity (mPa s) 1.7 1.8 1 1.6 1.7 pH 12.1 11.9 11.5 11.8 11.7
Type Cleaning Cleaning Cleaning Cleaning Cleaning Evaluation item
Filterability evaluation Bad Bad Good Bad Bad Foaming evaluation
Bad Good Bad Good Good Watermark evaluation Bad Good Bad Good
Good
TABLE-US-00003 TABLE 3 Example Comparative Example 24 25 26 27 28
29 6 7 8 9 Semiconductor Compound A TMAH 3 1.5 treatment TEAH 3 1
composition (non- Choline 2 2 dilution-type
Monomethyltrihydroxyethylammonium 2.5 2 semiconductor hydroxide
treatment Dimethylbis(2-hydroxyethyl)ammonium 1.5 composition)
hydroxide Ammonium hydroxide 2 Organic acid Cysteine 0.05 0.1
N-Acetyl-L-cysteine 0.1 Histidine 0.1 Arginine 0.05 0.2 Solvent 2-P
30 30 DMI 15 40 GBL 30 PG 30 10 10 15 10 35 15 30 20 45 PGME 10 15
30 NMP 30 20 Sulfolane 30 30 30 Other KOH 0.5 K/Na content M.sub.K
(ppm) 1.2 .times. 10.sup.3 5.5 .times. 10.sup.2 5.3 .times.
10.sup.2 1.2 .times. 10.sup.3 5.3 .times. 10.sup.2 1.0 .times.
10.sup.2 2.0 .times. 10.sup.4 1.5 .times. 10.sup.-2 9.5 .times.
10.sup.2 1.2 .times. 10.sup.-2 M.sub.Na (ppm) 1.5 .times. 10.sup.1
5.0 .times. 10.sup.1 1.0 .times. 10.sup.0 1.5 .times. 10.sup.1 1.0
.times. 10.sup.0 5.0 .times. 10.sup.1 .sup. 1.0 .times. 10.sup.-1
1.2 .times. 10.sup.2 .sup. 1.0 .times. 10.sup.-2 1.7 .times.
10.sup.0 M.sub.K/M.sub.Na 8.0 .times. 10.sup.1 1.1 .times. 10.sup.1
5.3 .times. 10.sup.2 8.0 .times. 10.sup.1 5.3 .times. 10.sup.2 2.0
.times. 10.sup.0 2.0 .times. 10.sup.5 1.3 .times. 10.sup.-4 9.5
.times. 10.sup.4 7.1 .times. 10.sup.-3 Number of Number of
particles having particle size of 9.0 .times. 10.sup.0 4.0 .times.
10.sup.0 1.1 .times. 10.sup.1 1.2 .times. 10.sup.1 1.1 .times.
10.sup.1 5.5 .times. 10.sup.0 1.2 .times. 10.sup.1 2.0 .times.
10.sup.0 ND 8.0 .times. 10.sup.0 particles 0.1 to 0.3 micrometers
(per mL) Viscosity (mPa s) 5.8 3.5 2.9 3.7 3 9.2 3.8 6 4.1 13 pH
>14 >14 >14 >14 >14 >14 >14 >14 >14
>14 Type of treatment agent Etching Resist Resist Resist Resist
Resist Etching Resist Resist Resist removal removal removal removal
removal removal removal removal Evaluation Filterability evaluation
Good Very good Very good Very good Very good Good Bad Bad Good Bad
item Foaming evaluation Very Very good Very good Very good Very
good Good Good Good Bad Bad good Watermark evaluation Very Very
good Very good Very good Very good Very good Good Good Bad Bad
good
[0149] In Tables 1 to 3, the unit for the amount (ratio) of each
component is "parts by mass". In each example and comparative
example, the total amount of the components was 100 parts by mass,
and the balance was ion-exchanged water. The details of each
component listed in Tables 1 to 3 are as follows.
<Compound A>
[0150] TMAH (tetramethylammonium hydroxide): manufactured by
Hayashi Pure Chemical Ind., Ltd. [0151] TEAH (tetraethylammonium
hydroxide): manufactured by Junsei Chemical Co., Ltd. [0152] TPAH
(tetrapropylammoniurn hydroxide): manufactured by Wako Pure
Chemical Industries, Ltd. [0153] TBAH (tetrabutylammonium
hydroxide): manufactured by Wako Pure Chemical Industries, Ltd.
[0154] Choline: manufactured by Tama Chemicals Co., Ltd. [0155]
Ammonium hydroxide: manufactured by Wako Pure Chemical Industries,
Ltd. Used as ammonia water containing 28% to 30% ammonia (the
numerical values in Table are ammonium hydroxide reduced values)
[0156] Monomethyltrihydroxyethylammonium hydroxide: manufactured by
Yokkaichi Chemical Co., Ltd. [0157]
Dimethylbis(2-hydroxyethyl)ammonium hydroxide: manufactured by
Yokkaichi Chemical Co., Ltd.
<Water-Soluble Polymer>
[0157] [0158] Polyacrylic acid (Mw=700,000): "JURYMER AC-10H"
manufactured by Toagosei Co., Ltd. [0159] Polyacrylic acid
(Mw=55,000): "JURYMER AC-10L" manufactured by Toagosei Co., Ltd.
[0160] Polyacrylic acid (Mw=6,000): "ARON A-IDSL" manufactured by
Toagosei Co., Ltd. [0161] Polymaleic acid (Mw=2,000): "NONPOL
PWA-50W" manufactured by NOF Corporation [0162] Styrene-maleic acid
copolymer: "DKS DISCOAT N-10" manufactured by DKS Co. Ltd. [0163]
Styrene-maleic acid half ester copolymer: "DKS DISCOAT N-14"
manufactured by DKS Co. Ltd. [0164] Naphthalenesulfonic
acid-formalin condensate Na salt: "LAVELIN FD-40" manufactured by
DKS Co. Ltd.
<Organic Acid>
[0164] [0165] Serine: manufactured by Nippon Rika Co., Ltd. [0166]
Cysteine: manufactured by Nippon Rika Co., Ltd. [0167]
N-Acetyl-L-cysteine: manufactured by Nippon Rika Co., Ltd. [0168]
Histidine: manufactured by Nippon Rika Co., Ltd. [0169] Arginine:
manufactured by Nippon Rika Co., Ltd. [0170] Phenylalanine:
manufactured by Kyowa Hakko Bio Co., Ltd. [0171] Benzoic acid:
manufactured by DMS Japan [0172] Hydroxyphenyllactic acid:
manufactured by Tokyo Kasei Kogyo Co., Ltd. [0173] Phenylsuccinic
acid: manufactured by Tokyo Kasei Kogyo Co., Ltd. [0174]
Naphthalenesulfonic acid: manufactured by Wako Pure Chemical
Industries, Ltd.
<Amine>
[0174] [0175] Monoethanolamine: manufactured by Hayashi Pure
Chemical Ind., Ltd. [0176] Hydroxylamines: manufactured by Tokyo
Kasei Kogyo Co., Ltd. [0177] Isopropanolamine: manufactured by Toko
Chemicals Inc.
<Solvent>
[0177] [0178] 2-P (2-pyrrolidone): manufactured by Wako Pure
Chemical Industries, Ltd. [0179] DMI
(1,3-dimethyl-2-imidazolidinone): manufactured by Tokyo Kasei Kogyo
Co., Ltd. [0180] GBL (gamma-butyrolactone): manufactured by Tokyo
Kasei Kogyo Co., Ltd. [0181] PG (propylene glycol): manufactured by
Wako Pure Chemical Industries, Ltd. [0182] PGME (propylene glycol
monomethyl ether): manufactured by Sankyo Chemical Co., Ltd. [0183]
NMP (N-methylpyrrolidone): manufactured by Mitsubishi Chemical
Corporation [0184] Sulfolane: manufactured by Sankyo Chemical Co.,
Ltd.
<Other>
[0184] [0185] KOH: manufactured by Kanto Chemical Co., Inc.
(pH-adjusting agent)
[0186] As is clear from Tables 1 to 3, the semiconductor treatment
compositions of Examples 1 to 29 had an excellent filtration
characteristic, and thus high productivity was achieved. When the
semiconductor treatment compositions of Examples 1 to 29 were used,
foaming characteristic was reduced, the number of defects (water
marks) was also small on the surface of the substrate in all of the
compositions, and an excellently treated state of the polishing
target could be obtained.
[0187] The invention is not limited to the embodiments described
above. Various modifications and variations may be made of the
embodiments described above. For example, the invention includes
various other configurations substantially the same as the
configurations described above in connection with the embodiments
(e.g., a configuration having the same function, method, and
results, or a configuration having the same objective and results).
The invention also includes a configuration in which an
unsubstantial element described above in connection with the
embodiments is replaced by another element. The invention also
includes a configuration having the same effects as those of the
configurations described above in connection with the embodiments,
or a configuration capable of achieving the same objective as that
of the configurations described above in connection with the
embodiments. The invention further includes a configuration in
which a known technique is added to the configurations described
above in connection with the embodiments.
[0188] Although only some embodiments of the invention have been
described in detail above, those skilled in the art would readily
appreciate that many modifications are possible in the embodiments
without materially departing from the novel teachings and
advantages of the invention. Accordingly, all such modifications
are intended to be included within the scope of the invention.
* * * * *