U.S. patent application number 15/725045 was filed with the patent office on 2019-02-14 for positive and negative ion source based on radio-frequency inductively coupled discharge.
This patent application is currently assigned to Dalian University of Technology. The applicant listed for this patent is Dalian University of Technology. Invention is credited to Fei GAO, Younian WANG.
Application Number | 20190051486 15/725045 |
Document ID | / |
Family ID | 60226379 |
Filed Date | 2019-02-14 |
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United States Patent
Application |
20190051486 |
Kind Code |
A1 |
GAO; Fei ; et al. |
February 14, 2019 |
POSITIVE AND NEGATIVE ION SOURCE BASED ON RADIO-FREQUENCY
INDUCTIVELY COUPLED DISCHARGE
Abstract
The present invention discloses a positive and negative ion
source based on radio-frequency inductively coupled discharge,
comprising a tube, a middle portion of which is communicated with
an intake pipe; discharge coils electrically connected to a matched
network and a radio-frequency power supply successively are wound
on the tube; one end of the tube is connected to a first cover
plate in a sealed manner, and the first cover plate is connected
with a positive ion extraction gate via an insulating medium; the
positive ion extraction gate is electrically connected to a
negative pole of a DC power supply; the other end of the tube is
connected to a second cover plate in a sealed manner, the second
cover plate is connected to a third cover plate in a sealed manner
via a sidewall, and the third cover plate is connected with a
negative ion extraction gate via an insulating medium; and the
negative ion extraction gate is electrically connected to a
positive pole of the DC power supply. In the present invention, the
positive ions and the electrons and negative ions can be extracted
simultaneously, and the problems of contamination of the ion source
by particles sputtered from the backplane and overheating of the
backplane are thus solved.
Inventors: |
GAO; Fei; (Dalian City,
CN) ; WANG; Younian; (Dalian City, CN) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Dalian University of Technology |
Dalian City |
|
CN |
|
|
Assignee: |
Dalian University of
Technology
Dalian City
CN
|
Family ID: |
60226379 |
Appl. No.: |
15/725045 |
Filed: |
October 4, 2017 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01J 37/24 20130101;
H01J 2237/082 20130101; H05H 2001/4652 20130101; H01J 27/205
20130101; H01J 2237/0825 20130101; H01J 37/08 20130101; H01J 27/16
20130101; H01J 37/321 20130101; H01J 2237/0817 20130101; H01J 37/05
20130101; H05H 1/46 20130101 |
International
Class: |
H01J 27/20 20060101
H01J027/20; H01J 37/08 20060101 H01J037/08; H01J 37/32 20060101
H01J037/32; H01J 37/24 20060101 H01J037/24; H01J 37/05 20060101
H01J037/05 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 11, 2017 |
CN |
201710687473.7 |
Claims
1. A positive and negative ion source based on radio-frequency
inductively coupled discharge, comprising a tube, a middle portion
of which is communicated with an intake pipe; and discharge coils
electrically connected to a matched network and a radio-frequency
power supply successively are wound on the tube; one end of the
tube is connected to a first cover plate in a sealed manner, and
the first cover plate is connected with a positive ion extraction
gate via an insulating medium; and the positive ion extraction gate
is electrically connected to a negative pole of a DC power supply;
and the other end of the tube is connected to a second cover plate
in a sealed manner, the second cover plate is connected to a third
cover plate in a sealed manner via a sidewall, and the third cover
plate is connected with a negative ion extraction gate via an
insulating medium; and the negative ion extraction gate is
electrically connected to a positive pole of the DC power supply,
wherein the end of the tube and the other end of the tube are
opposite ends of the tube, and the first cover plate and the second
cover plate are arranged on two end faces of the tube which are
opposite to each other.
2. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, characterized
in that the positive ion extraction gate comprises a first positive
ion extraction gate and a second positive ion extraction gate which
are successively arranged from inside out, the first positive ion
extraction gate and the second positive ion extraction gate are
each electrically connected to a negative pole of a DC power
supply, and a negative voltage at the second positive ion
extraction gate is higher than a negative voltage at the first
positive ion extraction gate.
3. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 2, characterized
in that a positive pole of the DC power supply to which the first
positive ion extraction gate and the second positive ion extraction
gate are electrically connected is grounded.
4. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, characterized
in that the negative ion extraction gate comprises a first negative
ion extraction gate and a second negative ion extraction gate which
are successively arranged from inside out, the first negative ion
extraction gate and the second negative ion extraction gate are
each electrically connected to a positive pole of a DC power
supply, and a positive voltage at the second negative ion
extraction gate is higher than a positive voltage at the first
negative ion extraction gate.
5. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 4, characterized
in that a negative pole of the DC power supply to which the first
negative ion extraction gate and the second negative ion extraction
gate are electrically connected is grounded.
6. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, characterized
in that the matched network is electrically connected to one end of
the discharge coils via a first coaxial transmission line whose
middle portion is grounded, and the matched network is electrically
connected to the other end of the discharge coils via a second
coaxial transmission line.
7. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, characterized
in that a flange joint for connecting a vacuometer and/or a
detection system is provided on the second cover plate.
8. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, characterized
in that a shield, which is grounded, is sleeved on an outer side of
the discharge coils.
9. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, further
comprising a support platform and a support frame, the support
platform being connected to the insulating medium and the sidewall
via the support frame.
10. The positive and negative ion source based on radio-frequency
inductively coupled discharge according to claim 1, further
comprising vacuum systems, the first cover plate and the third
cover plate being each communicated with one vacuum system.
Description
[0001] This application claims priority to Chinese application
number 201710687473.7, filed Aug. 11, 2017, with a title of
POSITIVE AND NEGATIVE ION SOURCE BASED ON RADIO-FREQUENCY
INDUCTIVELY COUPLED DISCHARGE. The above-mentioned patent
application is incorporated herein by reference in its
entirety.
TECHNICAL FIELD
[0002] The present invention relates to the technical field of an
ion source generation apparatus and in particular to a positive and
negative ion source based on radio-frequency inductively coupled
discharge.
BACKGROUND
[0003] The ion source has been widely applied in aspects such as
injection into solid surfaces, micro-machining, material surface
modification and neutral beam injection, and has become an
indispensable apparatus in many basic research fields, for example,
studies of atomic physics, plasma chemistry, nuclear physics,
material modification, etc. Ion beams extracted from the ion source
have become an indispensable machining process and manufacturing
approach in fields such as high-energy physics, microelectronics,
photoelectronics, metallurgy, aerospace, medical instruments,
mechanical manufacturing and heating for nuclear fusion.
[0004] For a conventional ion source generation apparatus, during
the extraction from a pure positive ion source or a pure negative
ion source, backstreaming of charged particles occurs. The
backstreaming of the charged particles will result in sputtering or
overheating of the backplane opposite to the extraction gate in the
plasma generation region. For example, when a negative DC voltage
is applied to the positive ion source extraction gate, the positive
ions are extracted while the electrons and negative ions are
repelled; and the electrons and negative ions are accelerated to
high energy where they pass through the plasma generation region
and hit onto the backplane to result in overheating and sputtering
of the backplane. Similarly, when a positive DC voltage is applied
to the negative ion source extraction gate, the negative ions and
electrons are extracted while positive ions are repelled; and the
positive ions are accelerated to high energy where they pass
through the plasma generation region and hit onto the backplane to
result in sputtering and overheating of the backplane. The
backplane suffering from long-term sputtering and overheating will
have greatly decreased service life, and particles sputtered from
the backplane will contaminate the plasma or even the ion
source.
SUMMARY
[0005] An objective of the present invention is to provide a
positive and negative ion source based on radio-frequency
inductively coupled discharge to solve the problems in the prior
art so that the positive ions and the electrons and negative ions
can be extracted simultaneously, and the problems of contamination
of the ion source by particles sputtered from the backplane and
overheating of the backplane are thus solved.
[0006] For this purpose, the present invention provides the
following technical solutions.
[0007] The present invention provides a positive and negative ion
source based on radio-frequency inductively coupled discharge,
including a tube, a middle portion of which is communicated with an
intake pipe; discharge coils electrically connected to a matched
network and a radio-frequency power supply successively are wound
on the tube; one end of the tube is connected to a first cover
plate in a sealed manner, and the first cover plate is connected
with a positive ion extraction gate via an insulating medium; the
positive ion extraction gate is electrically connected to a
negative pole of a DC power supply; the other end of the tube is
connected to a second cover plate in a sealed manner, the second
cover plate is connected to a third cover plate in a sealed manner
via a sidewall, and the third cover plate is connected with a
negative ion extraction gate via an insulating medium; and the
negative ion extraction gate is electrically connected to a
positive pole of the DC power supply.
[0008] Preferably, the positive ion extraction gate includes a
first positive ion extraction gate and a second positive ion
extraction gate which are successively arranged from inside out,
the first positive ion extraction gate and the second positive ion
extraction gate are each electrically connected to a negative pole
of a DC power supply, and a negative voltage at the second positive
ion extraction gate is higher than a negative voltage at the first
positive ion extraction gate.
[0009] Preferably, a positive pole of the DC power supply to which
the first positive ion extraction gate and the second positive ion
extraction gate are electrically connected is grounded.
[0010] Preferably, the negative ion extraction gate includes a
first negative ion extraction gate and a second negative ion
extraction gate which are successively arranged from inside out,
the first negative ion extraction gate and the second negative ion
extraction gate are each electrically connected to a positive pole
of a DC power supply, and a positive voltage at the second negative
ion extraction gate is higher than a positive voltage at the first
negative ion extraction gate.
[0011] Preferably, a negative pole of the DC power supply to which
the first negative ion extraction gate and the second negative ion
extraction gate are electrically connected is grounded.
[0012] Preferably, the matched network is electrically connected to
one end of the discharge coils via a first coaxial transmission
line whose middle portion is grounded, and the matched network is
electrically connected to the other end of the discharge coils via
a second coaxial transmission line.
[0013] Preferably, a flange joint for connecting a vacuometer
and/or a detection system is provided on the second cover
plate.
[0014] Preferably, a shield, which is grounded, is sleeved on an
outer side of the discharge coils.
[0015] Preferably, the positive and negative ion source further
includes a support platform and a support frame, the support
platform being connected to the insulating medium and the sidewall
via the support frame.
[0016] Preferably, the positive and negative ion source further
includes vacuum systems, the first cover plate and the third cover
plate being each communicated with one vacuum system.
[0017] Compared with the prior art, the present invention has the
following technical effects.
[0018] The radio-frequency power supply outputs a radio-frequency
power which is input to the discharge coils via the matched
network. The radio-frequency power generates an electromagnetic
field by the discharge coils, and the electromagnetic field ionizes
the working gas in the tube to generate the plasma. After the
generation of the plasma, a negative DC voltage is applied to the
positive ion extraction gate on the positive ion extraction side to
extract positive ion beams; and a positive DC voltage is applied to
the negative ion extraction gate on the negative ion extraction
side to extract the electrons or negative ion beams. When the
electrons or negative ion beams move to between the second cover
plate and the third cover plate from the tube, the energy of the
high-energy electrons is decreased due to a certain distance of
transport, and thus more low-energy electrons are formed and
adsorbed by electronegative or electroneutral atoms or molecules to
generate more negative ions. In this way, high-density negative
ions are generated, which is more convenient for ion extraction. In
the present invention, the positive ions and the electrons and
negative ions are extracted from two sides of the tube,
respectively; the backplane is omitted, so that the problems of
sputtering and overheating of the backplane during the extraction
of pure positive ions and pure negative ions are solved, and
meanwhile, the ion source constituted by the positive ions and the
electrons and negative ions will not be contaminated by the
sputtering.
BRIEF DESCRIPTION OF THE DRAWING
[0019] To describe the technical solutions in the embodiments of
the present invention or in the prior art more clearly, the
accompanying drawings to be used in the description of the
embodiments will be briefly described below. Apparently, the
drawings described hereinafter are some of the embodiments of the
present invention, and a person of ordinary skill in the art can
obtain other drawings according to these drawings without paying
any creative effort.
[0020] FIG. 1 is a structural diagram of a positive and negative
ion source based on radio-frequency inductively coupled discharge
according to the present invention,
[0021] in which: [0022] 1: tube; [0023] 2: intake pipe; [0024] 3:
discharge coil; [0025] 4: matched network; [0026] 5:
radio-frequency power supply; [0027] 6: first cover plate; [0028]
7: insulating medium; [0029] 8: DC power supply; [0030] 9: second
cover plate; [0031] 10: sidewall; [0032] 11: third cover plate;
[0033] 12: first positive ion extraction gate; [0034] 13: second
positive ion extraction gate; [0035] 14: first negative ion
extraction gate; [0036] 15: second ion extraction gate; [0037] 16:
first coaxial transmission line; [0038] 17: second coaxial
transmission line; [0039] 18: flange joint; [0040] 19: shield;
[0041] 20 support platform; [0042] 21: support frame.
DETAILED DESCRIPTION
[0043] The technical solutions in the embodiments of the present
invention will be clearly and completely described below with
reference to the accompanying drawings in the embodiments of the
present invention. Apparently, the embodiments described herein are
merely a part but not all of the embodiments of the present
invention. All other embodiments obtained by a person of ordinary
skill in the art without any creative effort on the basis of the
embodiments in the present invention shall fall into the protection
scope of the present invention.
[0044] An objective of the present invention is to provide a
positive and negative ion source based on radio-frequency
inductively coupled discharge to solve the problems in the prior
art so that the positive ions and the electrons and negative ions
can be extracted simultaneously, and the problems of contamination
of the ion source by particles sputtered from the backplane and
overheating of the backplane are thus solved.
[0045] To make the objectives, features and advantages of the
present invention more obvious and comprehensible, the present
invention will be further described below in detail by specific
implementations with reference to the accompanying drawings.
[0046] As shown in FIG. 1, this embodiment provides a positive and
negative ion source based on radio-frequency inductively coupled
discharge, including a tube 1. The tube 1 is preferably made of
quartz. A middle portion of the tube 1 is communicated with an
intake pipe 2. Discharge coils 3 are wounded on the tube 1. The
discharge coils 3 are generally wounded on the tube 1 by a copper
tube. There is at least 1 turn, preferably 5-10 turns, of discharge
coils 3. A cooling liquid may be fed into the copper tube for
cooling. A shield 19 is sleeved on an outer side of the discharge
coils 3. The shield 19 is required to be grounded. The shield 19 is
preferably made of Al. The discharge coils 3 are electrically
connected to a matched network 4 and a radio-frequency power supply
5 successively. An input end of the matched network 4 is
electrically connected to an output end of the radio-frequency
power supply 5 via a first coaxial transmission line 16, and an
output end of the matched network 4 is electrically connected to an
end of the discharge coils 3. A middle portion of the first coaxial
transmission line 16 is grounded. The output end of the matched
network 4 is also electrically connected to the other end of the
discharge coils 3 via a second coaxial transmission line 17. The
matched network 4 is used for adjusting the impedance
characteristic of the discharge coils 3 so that the adsorption of
the radio-frequency power by the plasma is maximized.
[0047] One end of the tube 1 is connected to a first cover plate 6
in a sealed manner. The sealing structure is preferably a loose nut
or a loose flange. The first cover plate 6 is connected with a
positive ion extraction gate via an insulating medium 7 (the
insulating medium is preferably made of ceramic). The positive ion
extraction gate includes a first positive ion extraction gate 12
and a second positive ion extraction gate 13 which are successively
arranged from inside out. The first positive ion extraction gate 12
and the second positive ion extraction gate 13 are each
electrically connected to a negative pole of a DC power supply 8,
and a positive pole of the DC power supply 8 to which the first
positive ion extraction gate 12 and the second positive ion
extraction gate 13 are electrically connected is grounded. The DC
power supply 8 is used for providing a negative voltage to the
first positive ion extraction gate 12 and the second positive ion
extraction gate 13, a negative voltage at the second positive ion
extraction gate 13 is higher than a negative voltage at the first
positive ion extraction gate 12.
[0048] One end of the tube 1 is connected to a second cover plate 9
in a sealed manner. The sealing structure is preferably a loose nut
or a loose flange. A flange joint 18 for connecting a vacuometer, a
detection system or a test system is provided on the second cover
plate 9. The second cover plate 9 is connected to a third cover
plate 11 in a sealed manner via a sidewall 10, the second cover
plate 9, the sidewall 10 and the third cover plate 11 are
preferably connected by welding, and the third cover plate 11 is
connected with a negative ion extraction gate via an insulating
medium 7. The negative ion extraction gate includes a first
negative ion extraction gate 14 and a second negative ion
extraction gate 15 which are successively arranged from inside out,
and the first negative ion extraction gate 14 and the second
negative ion extraction gate 15 are each electrically connected to
a positive pole of a DC power supply 8. A negative pole of the DC
power supply 8 to which the first negative ion extraction gate 14
and the second negative ion extraction gate 15 are electrically
connected is grounded. The DC power supply 8 is used for providing
a positive voltage to the first negative ion extraction gate 14 and
the second negative ion extraction gate 15, a positive voltage at
the second negative ion extraction gate 15 is higher than a
positive voltage at the first negative ion extraction gate 14.
[0049] The first cover plate 6, the second cover plate 9, the third
cover plate 11 and the sidewall 10 are preferably made of metal,
for example, stainless steel.
[0050] The positive and negative ion source based on
radio-frequency inductively coupled discharge in this embodiment
further includes a support platform 20 and a support frame 21. The
support platform 20 is arranged horizontally and the support frame
21 is arranged vertically. The support platform 20 supports the
insulating medium 7 and the sidewall 10 via the support frame 21 so
that the tube 1 is kept in the horizontal state.
[0051] The positive ion extraction gate, the first cover plate 6,
the tube 1, the second cover plate 9, the sidewall 10, the third
cover plate 11, the negative ion extraction gate and the insulating
medium 7 form a vacuum chamber in this embodiment. The first cover
plate 6 and the third cover plate 11 should be each communicated
with a vacuum system when operating.
[0052] The operating process of this embodiment is as follows.
[0053] 1) the vacuum chamber is vacuumized so that the pressure
inside it is not higher than 10.sup.-4 Pa;
[0054] 2) a proper amount of a working gas (for example, Ar,
N.sub.2, O.sub.2, CF.sub.4, H.sub.2, D.sub.2, SF.sub.6, etc.) is
fed from the intake pipe 2, and the vacuum systems on the two sides
are started so that the pressure inside the vacuum chamber can be
kept dynamically balanced from 0.1 Pa to 100 Pa and can be kept
unchanged;
[0055] 3) the radio-frequency power supply 5 outputs a
radio-frequency power which may be a radio-frequency power from 0 W
to 1000 W at 13.56 MHz; the radio-frequency power is input to the
discharge coils 3 via the matched network 4; and the
radio-frequency power generates an electromagnetic field by the
discharge coils 3, and the electromagnetic field ionizes the
working gas in the tube 1 to generate the plasma; and
[0056] 4) After the generation of the plasma, a negative DC voltage
is applied to the positive ion extraction gate to extract positive
ion beams; and a positive DC voltage is applied to the negative ion
extraction gate to extract the electrons or negative ion beams
(corresponding negative ions can be generated and extracted only
when the working gas is an electronegative gas, for example,
O.sub.2, H.sub.2, D.sub.2, CF.sub.4, SF.sub.6, etc.).
[0057] In this embodiment, the positive ions and the electrons and
negative ions are extracted from two sides of the tube 1,
respectively; the backplane is omitted, so that the problems of
sputtering and overheating of the backplane during the extraction
of pure positive ions and pure negative ions are solved, and
meanwhile, the ion source constituted by the positive ions and the
electrons and negative ions will not be contaminated by the
sputtering, so that the ion source becomes more "clean".
[0058] The principle and implementations of the present invention
have been described by specific examples herein. The description of
embodiments is merely used for helping the understanding of the
method of the present invention and its key concepts. Meanwhile,
for a person of ordinary skill in the art, changes may be made to
the specific implementations and application ranges according to
the concepts of the present invention. In conclusion, the contents
of the description shall not be regarded as limitations to the
present invention.
* * * * *