U.S. patent application number 16/076940 was filed with the patent office on 2019-02-14 for surface plate for finish polishing, finish polishing device, and polishing method.
The applicant listed for this patent is JAPAN AGENCY FOR MARINE-EARTH SCIENCE AND TECHNOLOGY. Invention is credited to Kenji Shimizu.
Application Number | 20190047111 16/076940 |
Document ID | / |
Family ID | 59625150 |
Filed Date | 2019-02-14 |
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United States Patent
Application |
20190047111 |
Kind Code |
A1 |
Shimizu; Kenji |
February 14, 2019 |
SURFACE PLATE FOR FINISH POLISHING, FINISH POLISHING DEVICE, AND
POLISHING METHOD
Abstract
Provided is a finish polishing surface plate configured such
that a polishing film is mounted thereon. The finish polishing
surface plate includes a plate body having a planar surface; and a
plurality of island shaped protrusions formed on the surface of the
plate body. In the plurality of island shaped protrusions,
continuous grooved recesses are formed between the respective
island shaped protrusions.
Inventors: |
Shimizu; Kenji; (Yokosuka
-shi, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
JAPAN AGENCY FOR MARINE-EARTH SCIENCE AND TECHNOLOGY |
Yokosuka-shi, Kanagawa |
|
JP |
|
|
Family ID: |
59625150 |
Appl. No.: |
16/076940 |
Filed: |
February 9, 2017 |
PCT Filed: |
February 9, 2017 |
PCT NO: |
PCT/JP2017/004746 |
371 Date: |
August 9, 2018 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
B24B 37/14 20130101;
B24B 37/16 20130101; B24B 37/042 20130101; B24B 37/044
20130101 |
International
Class: |
B24B 37/16 20060101
B24B037/16; B24B 37/14 20060101 B24B037/14; B24B 37/04 20060101
B24B037/04 |
Foreign Application Data
Date |
Code |
Application Number |
Feb 15, 2016 |
JP |
2016-026048 |
Claims
1. A finish polishing surface plate configured such that a
polishing film is mounted thereon, the plate comprising: a plate
body which has a planar surface; and a plurality of island shaped
protrusions which is formed on the surface of the plate body,
wherein in the plurality of island shaped protrusions, continuous
grooved recesses are formed between the respective island shaped
protrusions.
2. The finish polishing surface plate according to claim 1, wherein
a diameter dimension of the island shaped protrusions is set within
a range of 1.5 to 2.5 times a width dimension of the grooved
recesses.
3. The finish polishing surface plate according to claim 1, wherein
the island shaped protrusions adjacent to each other are arranged
such that a separation distance therebetween is equal to the width
dimension of the grooved recesses on the whole surface of the plate
body.
4. The finish polishing surface plate according to claim 1, wherein
each of the island shaped protrusions has a polygonal shape in plan
view.
5. The finish polishing surface plate according to claim 1, wherein
a diameter dimension of the island shaped protrusions is set within
a range of 1/2 to 3/2 with respect to a diameter dimension of a
polishing target surface of a polishing sample.
6. The finish polishing surface plate according to claim 1, wherein
a polishing target surface of a polishing sample has regions having
different hardnesses, and a Mohs hardness difference between a
high-hardness region and a low-hardness region in the polishing
target surface is 3 or more.
7. A finish polishing device comprising: the finish polishing
surface plate according to claim 1; and a rotating device that
rotates the finish polishing surface plate with respect to a
rotational axis orthogonal to the surface of the plate body.
8. The finish polishing device according to claim 7, wherein the
rotating device has a rotating plate that rotates around the
rotational axis, and a holding part that holds the finish polishing
surface plate to the rotating plate.
9. The finish polishing device according to claim 8, wherein the
finish polishing surface plate is formed of stainless steel having
magnetism, and wherein the holding part is capable of magnetizing
the finish polishing surface plate.
10. A polishing method using the finish polishing device according
to claim 1, the method comprising: performing polishing using a
planar surface plate and polishing abrasive grains to generate edge
sagging in a polishing sample; and performing polishing using the
finish polishing device and a polishing film to eliminate the edge
sagging to flatten the polishing target surface of the polishing
sample.
11. The polishing method according to claim 10, wherein the
polishing abrasive grains are alumina paste.
12. The finish polishing surface plate configured such that a
polishing film is mounted thereon, wherein a diameter dimension of
the island shaped protrusion is set within a range of 8 to 20 mm or
2 to 8 mm, and a diameter dimension of the grooved recesses is 1/2
of the diameter dimension of the island shaped protrusion.
Description
[0001] This application is a 371 National Stage Application of
International Application No. PCT/JP2017/004746, filed on Feb. 9,
2017, published as International Publication No. WO 2017/141812,
which claims priority to Japanese Patent Application No.
2016-026048, filed Feb. 15, 2016, the content of which is
incorporated herein by reference.
TECHNICAL FIELD
[0002] The present invention relates to a surface plate for finish
polishing, a finish polishing device, and a polishing method.
BACKGROUND ART
[0003] In the related art, as polishing devices in which a
polishing film is provided on a surface plate, there are known a
polishing device in which the polishing film is fixed to the
surface plate via an elastic body on the surface plate, and a
polishing device in which the polishing film is directly fixed to
the surface plate. These well-known polishing devices are
disclosed, for example, in Patent Document 1. Patent Document 1
discloses a polishing device in which two types of polishing films
including a polishing film for rough processing and a polishing
film for finish polishing are mounted on a polishing surface plate,
and an elastic body is mounted between the polishing target surface
plate and the polishing film if necessary.
[0004] In a case where the elastic body is mounted between the
polishing target surface plate and the polishing film or in a case
where a polishing cloth having loose abrasive grains dispersed
thereon is used, an edge sagging may be caused. The edge sagging is
a phenomenon in which a soft part of a polishing sample may be
excessively polished and excavated, and a circumferential edge of a
hard part surrounded by the soft part may also be excessively
polished. Particularly in a case where polishing is performed with
the loose abrasive grains interposed, the edge sagging is likely to
occur.
[0005] If a film of lubricant, such as water, is thick in a case
where a fixed abrasive grain film is mounted on a smooth polishing
surface plate, there is a concern that the lubricant may be
interposed between the fixed abrasive grain film and the polishing
sample and polishing may not be performed. Additionally, there is
also a concern that the polishing target surface of the polishing
sample may be sucked to the fixed abrasive grain film like a
suction cup and polishing may not be easy. Moreover, there is also
a concern that shavings may enter between the polishing target
surface of the polishing sample and the fixed abrasive grain film
and may damage the polishing target surface of the polishing
sample.
[0006] As a technique of solving these problems, Patent Document 2
discloses a finishing polishing surface plate in which a number of
grooves, having a width of several millimeters, parallel to a
planar glass plate are formed.
CITATION LIST
Patent Literature
[0007] [Patent Document 1] Japanese Unexamined Patent Application,
First Publication No. 2007-185754 [0008] [Patent Document 2]
Japanese Patent No. 5317095
SUMMARY OF INVENTION
Technical Problem
[0009] A polishing wrapping film disclosed in the above Patent
Document 1 and Patent Document 2 is a film that is sufficient in
smoothly polishing materials. On the other hand, in a case where a
flat polishing sample is made using the polishing wrapping film,
the polishing wrapping film is placed on a hard plate (glass plate)
having high planarity, and the sample is manually polished while
causing the lubricant, such as water, flow to the polishing
wrapping film. In this case, as the degree of the abrasive grains
becomes smaller, the sample to be polished and the film are brought
into closer contact with each other, and resistance increases.
Accordingly, there is a case where the polishing sample may not
smoothly slide on the polishing film and may not be cleanly
polished. As the polishing target surface of the polishing sample
becomes larger, it is noticeable that the polishing sample does not
smoothly slide on the polishing film.
[0010] Additionally, there is a case where a lot of scratches may
be formed on the polishing target surface of the polishing sample
due to shavings. As the polishing target surface of the polishing
sample becomes larger, the scratches become conspicuous.
[0011] Moreover, in Patent Document 2, particularly as the
polishing target surface of the polishing sample becomes larger for
manual polishing, there is a concern that prolonged work is
required for mirror-finishing the sample. For that reason, there is
a demand to shorten the time required for the mirror finishing.
[0012] Additionally, due to polishing in a certain direction
(length), in manual polishing, a skillful technique is required for
evenly polishing the sample surface. For this reason, particularly
as the polishing target surface of the polishing sample becomes
larger, there is a case where a polishing state may change
depending on a worker's skill level.
[0013] Additionally, in a case where the above-described edge
sagging has occurred and in a case where the polishing target
surface of the polishing sample is analyzed by secondary ion mass
spectroscopy (SIMS), there is a case where the flatness of an
analysis surface (polishing target surface) may be insufficient,
and the analysis may not be performed well. For this reason,
particularly as the polishing target surface of the polishing
sample becomes larger, there is a concern that analysis processing
time may increase.
[0014] Additionally, if the polishing sample is small, time
relating to flattening processing by polishing is also short. On
the other hand, since there is a concern that the time related to
flattening processing by polishing may become long if the polishing
sample is large, there is demand to shorten this time. Moreover, if
the polishing sample becomes large, the flattening processing by
polishing will become difficult. As a result, the efficiency and
accuracy of the sample making will be dependent on a worker's skill
level. For that reason, there is a demand to eliminate the
dependability onto the worker's skill level.
[0015] The present invention has been made in view of the above
situation to achieve the following objects. [0016] 1. Elimination
of edge sagging. [0017] 2. Suppression of uneven polishing or the
like in each region resulting from hardness difference. [0018] 3.
Suppression of sticking of polishing sample to polishing device.
[0019] 4. Suppression of damage to polishing target surface of
polishing sample. [0020] 5. Suppression of damage of polishing
film. [0021] 6. Adaptation to large polishing sample. [0022] 7.
Elimination of dependability on worker's skill level.
Solution to Problem
[0023] A finish polishing surface plate related to a first aspect
of the present invention is configured such that a polishing film
is mounted thereon. The finish polishing surface plate includes a
plate body having a planar surface; and a plurality of island
shaped protrusions formed on the surface of the plate body. In the
plurality of island shaped protrusions, continuous grooved recesses
are formed between the respective island shaped protrusions.
[0024] A diameter dimension of the island shaped protrusions may be
set within a range of 1.5 to 2.5 times a width dimension of the
grooved recesses.
[0025] The island shaped protrusions adjacent to each other may be
arranged such that a separation distance therebetween is equal to
the width dimension of the grooved recesses on the whole surface of
the plate body.
[0026] Each of the island shaped protrusions may have a polygonal
shape in plan view.
[0027] A diameter dimension of the island shaped protrusions may be
set within a range of 1/2 to 3/2 with respect to a diameter
dimension of a polishing target surface of a polishing sample.
[0028] A polishing target surface of a polishing sample may have a
region having different hardnesses, and a Mohs hardness difference
between a high-hardness region and a low-hardness region in the
polishing target surface may be 3 or more.
[0029] A finish polishing device related to a second aspect of the
present invention includes the finish polishing surface plate
related to the first aspect; and a rotating device that rotates the
finish polishing surface plate with respect to a rotational axis
orthogonal to the surface of the plate body.
[0030] The rotating device may have rotating plate that rotates
around the rotational axis, and a holding part that holds the
finish polishing surface plate to the rotating plate.
[0031] The finish polishing surface plate may be formed of
stainless steel having magnetism, and the holding part may be
capable of magnetizing the finish polishing surface plate.
[0032] A polishing method related to a third aspect of the present
invention includes performing polishing using a planar surface
plate and polishing abrasive grains to generate edge sagging in a
polishing sample; and performing polishing using the finish
polishing device related to the above second aspect and a polishing
film to eliminate the edge sagging to flatten the polishing target
surface of the polishing sample.
[0033] According to the finish polishing surface plate related to
the first aspect, since the continuous grooved recesses are formed
between the respective island shaped protrusions in the plurality
of island shaped protrusions, it is possible to efficiently exhibit
a drainage effect from the grooved recesses extending in multiple
directions rather than one direction. For that reason, it is
possible to improve the ease of drainage of lubricant, such as
water. The polishing target surface of the polishing sample and the
polishing film can easily come into contact with each other, and
polishing efficiency can be improved. Additionally, since shavings
generated from the polishing sample are easily discharged to the
outside of a working plane via the grooved recesses of the surface
plate, a frequency at which the polishing target surface is damage
can be remarkably lowered.
[0034] Additionally, since the island shaped protrusions are split
by the grooved recesses, edge parts of the island shaped
protrusions corresponding to regions to be subjected to polishing
extend in the multiple directions rather than one direction. As a
result, even in a case where the polishing target surface has
regions having different hardnesses, it is possible to prevent
occurrence of sagging.
[0035] Simultaneously, since the island shaped protrusions are
split by the grooved recesses extending in the multiple directions
rather than one direction, it is possible to prevent a situation
where the polishing target surface of the polishing sample and the
polishing film may be brought into close contact with each other
and polishing may not be performed, when the polishing target
surface of the polishing sample and the polishing film perform
polishing by moving relative to each other.
[0036] Additionally, since the drainage of the lubricant is easily
performed by the grooved recesses, the polishing target surface of
the polishing sample and the polishing film can easily come into
contact with each other, the polishing efficiency can be performed,
and the processing time can be shortened even in a case where the
polishing target surface of the polishing sample becomes large.
[0037] Additionally, in the finish polishing surface plate related
to the first aspect, since the diameter dimension of the island
shaped protrusions is set within a range of 1.5 to 2.5 times the
width dimension of the grooved recesses, the drainage of the
lubricant, prevention of sticking of the polishing sample, and
prevention of the sagging can be effectively realized.
[0038] Additionally, in the finish polishing device related to the
first aspect, since the separation distance between the island
shaped protrusions adjacent to each other is equal to the width
dimension of the grooved recesses on the whole surface of the plate
body, the drainage of the lubricant, prevention of sticking of the
polishing sample, and prevention of the sagging can be effectively
realized.
[0039] Additionally, in the finish polishing surface plate related
to the first aspect, since the shapes of the island shaped
protrusions in plan view are the polygonal shapes, the drainage of
the lubricant, and the island shaped protrusions are split by the
grooved recesses extending in the multiple directions rather than
one direction, the drainage of the lubrication, prevention of
sticking of the polishing sample, and prevention of the sagging can
be effectively realized.
[0040] Additionally, in the finish polishing surface plate related
to the first aspect, since the diameter dimension of the island
shaped protrusions is set within a range of 1/2 to 3/2 with respect
to the diameter dimension of the polishing target surface of the
polishing sample, the drainage of the lubricant, prevention of
sticking of the polishing sample, and prevention of the sagging can
be effectively realized.
[0041] Additionally, in the finish polishing device related to the
first aspect, even in a case where the polishing target surface of
the polishing sample has regions having different hardnesses, and
the Mohs hardness difference between the high-hardness region and
the low-hardness region in the polishing target surface is 3 or
more, the drainage of the lubricant, prevention of sticking of the
polishing sample, and prevention of the sagging can be effectively
realized.
[0042] Additionally, since the finish polishing device related to
the above second aspect includes the finish polishing surface plate
related to the first aspect; and the rotating device that rotates
the finish polishing surface plate with respect to the rotational
axis orthogonal to the surface of the plate body, polishing can be
performed by changing a state where the polishing target surface of
the polishing sample and the polishing film come into contact with
each other. For that reason, ease of drainage of the lubricant can
be further improved using rotation, and prevention of sticking of
the polishing sample and prevention of the sagging can be
effectively realized.
[0043] Additionally, in the finish polishing device related to the
first aspect, since the rotating device has the rotating plate that
rotates around the rotational axis, and the holding part that holds
the finish polishing surface plate to the rotating plate, the
drainage of the lubricant, prevention of sticking of the polishing
sample, and prevention of the sagging can be effectively realized.
Accordingly, it is possible to perform polishing processing without
being dependent on a worker's skill level.
[0044] Additionally, in the finish polishing device related to the
first aspect, since the finish polishing surface plate is formed of
stainless steel having magnetism, and the holding part is capable
of magnetizing the finish polishing surface plate, ease of
replacement of the polishing film and close contact of the
polishing film with the surface plate can be improved.
[0045] Additionally, the polishing method related to the third
aspect of the present invention includes performing polishing using
a planar surface plate and polishing abrasive grains to generate
edge sagging in a polishing sample; and performing polishing using
the finish polishing device related to the second aspect and a
polishing film to eliminate the edge sagging to flatten the
polishing target surface of the polishing sample. Additionally, the
polishing abrasive grains may be alumina paste. Accordingly, since
the amount (surface area) of the polishing sample to be cut with
the polishing film can be made small, it is possible to further
shorten working hours required for flattening to quickly perform
polishing by the planar surface plate and polishing abrasive
grains.
[0046] Therefore, since further gaps can also be formed between the
polishing film and the polishing sample, the shavings are not
easily brought into contact with the polishing target surface, and
can also be easily discharged, thereby reducing a rate at which a
sample surface is damaged.
Advantageous Effects of Invention
[0047] According to the above aspects of the present invention, the
occurrence of the sagging in the polishing sample can be prevented.
Additionally, occurrence of uneven polishing or the like in each
region resulting from a hardness difference on the polishing target
surface of the polishing sample can be prevented. Additionally, the
sticking of the polishing sample to the polishing film can be
prevented. Additionally, occurrence of the damage on the polishing
target surface resulting from the shavings can be prevented.
Additionally, damage of the polishing film by the sticking or other
causes can be prevented. Additionally, the possibility of coping
with the size of the polishing sample can be realized, and
producing the polishing sample without depending on a worker's
skill level can be realized.
BRIEF DESCRIPTION OF DRAWINGS
[0048] FIG. 1 is a plan view illustrating a finish polishing
surface plate related to a first embodiment of the present
invention.
[0049] FIG. 2 is an enlarged sectional view illustrating the finish
polishing surface plate related to the first embodiment of the
present invention.
[0050] FIG. 3 is a schematic front view illustrating the finish
polishing device related to the first embodiment of the present
invention.
[0051] FIG. 4 is a view illustrating a state where a polishing film
including a fixed abrasive grain film is mounted on the finish
polishing device related to the first embodiment of the present
invention to polish a polishing sample.
[0052] FIG. 5 is a plan view illustrating a finish polishing
surface plate related to a second embodiment of the present
invention.
[0053] FIG. 6 is an image illustrating a sample polishing target
surface polished by the finish polishing surface plate related to
the embodiment of the present invention.
[0054] FIG. 7 is an image illustrating a sample polishing target
surface polished by the finish polishing surface plate related to
the embodiment of the present invention.
[0055] FIG. 8 is an image illustrating a sample polishing target
surface polished by the finish polishing surface plate related to
the embodiment of the present invention.
[0056] FIG. 9 is an image illustrating a sample polishing target
surface polished by the finish polishing surface plate related to
the embodiment of the present invention.
DESCRIPTION OF EMBODIMENTS
[0057] Hereinafter, a finish polishing surface plate and a finish
polishing device related to a first embodiment of the present
invention will be described with reference to the drawings. The
present invention is not to be interpreted as being limited to
this, and various changes, modifications, and improvements can be
made on the basis of the knowledge of those skilled in the art
without departing from the scope of the present present
invention.
[0058] FIG. 1 is a plan view of the finish polishing surface plate
related to the present embodiment. FIG. 2 is an enlarged sectional
view illustrating the finish polishing surface plate related to the
present embodiment. FIG. 3 is a schematic front view illustrating
the finish polishing device in the present embodiment.
[0059] A finish polishing surface plate 1 related to the present
embodiment is used when polishing a composite material with
different hardnesses to form a thin sample piece. As shown in FIGS.
1 and 2, for example, a plurality of island shaped protrusion 5,
and grooved recesses 3 that are continuously provided between the
island shaped protrusions 5 are provided on the surface of a plate
body 2.
[0060] In the present embodiment, the plate body 2 has a flat disk
shape. As the plate body 2, for example, a metal plate or the like
having well-known magnetism can be used. It is preferable that the
plate body 2 is formed of a stainless plate having magnetism. The
size of the plate body 2 is .PHI.100 to 300 mm and particularly
preferably about .PHI.150 mm (.+-.15 mm) or 200 mm (.+-.20 mm).
Additionally, the thickness of the plate body 2 is 1.5 to 3 mm and
particularly preferably about 2 mm (.+-.0.2 mm). Additionally, SUS
200 series can be applied.
[0061] As shown in FIGS. 1 and 2, the island shaped protrusions 5
have a regular hexagonal shape in plan view, and the individual
island shaped protrusions 5 are arranged to be densest in a
mutually separated state.
[0062] A diameter dimension T1 of each island shaped protrusion 5
can be set to correspond to the size of a polishing target surface
in a polishing sample 8. For example, T1 can be set to a range of
1/2 to 3/2 with respect to the diameter dimension of the sample
polishing target surface (polishing target surface) of the
polishing sample 8. Specifically, the diameter dimension T1 of the
island shaped protrusion 5 can be set to about 12 mm (.+-.1.2 mm)
within a range of 8 mm to 20 mm. In addition, the diameter
dimension T1 of the island shaped protrusion 5 is a distance
between opposed sides of the island shaped protrusion 5.
[0063] Separation distances between adjacent island shaped
protrusions 5 (distances between opposed sides of two adjacent
island shaped protrusions 5) may be equal to each other. In
addition, although the profiles of the island shaped protrusions 5
are not hexagonal shapes in portions that interferes with an edge
part of the plate body 2, these portions may be formed such that
separation distances between adjacent island shaped protrusions 5
are equal to each other.
[0064] Although the planar profiles of the island shaped
protrusions 5 have a regular hexagonal shape in the present
embodiment, the planar profiles are not limited to this as long as
the island shaped protrusions are arranged on a plane in the
closest state. A circular shape, an elliptical shape, or a
polygonal shape with a larger number of corners than 6 can also be
adopted. In this case, although the width of each grooved recess 3
to be described below becomes uneven depending on locations, the
arrangement state of the island shaped protrusion 5 may be
maintained in the same manner as in the case of the regular
hexagonal shape.
[0065] At the profile position of each island shaped protrusion 5,
an end part of the island shaped protrusion 5 is formed in a state
where the grooved recess 3 is formed by polishing, that is, in a
state where the end part is cut upright such that a side surface of
the island shaped protrusion 5 or the grooved recess 3 is equal to
a normal direction of a principal surface of the plate body 2.
[0066] As shown in FIGS. 1 and 2, the grooved recess 3 is formed
between the two adjacent island shaped protrusions 5 and is
provided such that a width dimension T2 of the grooved recess 3 is
equal to the separation distance between the island shaped
protrusions 5. The widths dimensions T2 of the grooved recesses 3
may be set to be equal to each other on the whole surface of a
working plane of the plate body 2 and may be set to be equal to
about half of the diameter dimension T1 of the island shaped
protrusion 5. Specifically, the width dimension T2 of each grooved
recess 3 can be about 6 mm (.+-.0.6 mm) within a range of 4 mm to
10 mm.
[0067] Additionally, the grooved recess 3 is engraved such that the
depth dimension from a top part of the island shaped protrusion 5
is within a range of 50 to 300 .mu.m, preferably about 100 to 200
.mu.m (.+-.10 .mu.m). The grooved recess 3 extends between the
island shaped protrusion 5 and island shaped protrusion 5 adjacent
to each other, and all the grooved recesses 3 are brought into a
continuous state on the surface of the plate body 2.
[0068] The grooved recesses 3 can be formed on the surface of the
plate body 2 made of metal by well-known methods, such as etching,
polishing, and cutting.
[0069] A corner part 6 of a boundary line between each grooved
recess 3 and each island shaped protrusion 5 can also be formed by
rounding off a corner to the same extent as a curvature radius that
is half of the depth of the grooved recess 3.
[0070] Although a polishing film 7 mounted on the finish polishing
surface plate 1 in the present embodiment is not particularly
described, for example, a well-known fixed abrasive grain film for
finishing application having an abrasive grain diameter of about
0.3 .mu.m to 3 .mu.m is used.
[0071] The present embodiment can also be applied to the polishing
sample 8 in which a polishing target surface has regions having
different hardnesses, and a Mohs hardness difference between a
high-hardness region and a low-hardness region in this polishing
target surface is 3 or more. If there is a hardness difference on
the polishing target surface, sagging is likely to occur. However,
in the finish polishing surface plate 1 of the present embodiment,
polishing can be suitably performed even in such a polishing
sample.
[0072] Additionally, the high-hardness region has a Mohs hardness
of about 4 to 8 and can include glass, a mineral, metal, or the
like, and the low-hardness region can include a mineral or the like
having a lower viscosity than resin. The low-hardness region has a
Mohs hardness of about 1 to 3 and can include indium.
[0073] The polishing sample includes, for example, a sample in
which a plurality of polishing samples, such as rock, are embedded
on a surface of a resinous cylindrical base material having a
diameter dimension of about 25 mm.
[0074] As shown in FIG. 3, the finish polishing device 10 in the
present embodiment has, as a rotating device that rotates the
finish polishing surface plate 1 with a rotational axis C
orthogonal to the principal surface (horizontal plane) used as the
working plane at the time of polishing as a center, a rotating
plate 11 that rotates around the rotational axis C, and a driving
source 12, such as a motor, which rotates the rotating plate 11.
Additionally, the finish polishing device 10 has, as a holding part
that holds the finish polishing surface plate 1 to the rotating
plate 11, a magnetizing part 13 that is capable of magnetizing the
finish polishing surface plate 1 and is provided for fixing the
finish polishing surface plate 1 to the rotating plate 11.
Moreover, the finish polishing surface plate 1 has a supply part 14
that can supply lubricant 9, such as water, from above the rotating
plate 11 to the working plane.
[0075] As shown in FIG. 3, the rotating plate 11 is a disk that has
a diameter approximately equal to the finish polishing surface
plate 1 or is larger than the finish polishing surface plate 1 and
has an upper surface formed as a flat surface in which the
magnetizing part 13 is embedded. The rotating plate 11 is connected
to the driving source 12 via a rotating mechanism 11a, and the
rotating mechanism 11a is erected at a center position of a lower
surface of the rotating plate 11.
[0076] As shown in FIG. 3, the magnetizing part 13 can be
electromagnet that is flush with an upper surface of the rotating
plate 11 and is capable of switching ON/OFF of magnetization.
Additionally, the magnetizing part 13 may be an anisotropic rubber
magnet sheet which is provided with a uniform thickness on the
entire surface of the rotating plate 11 and in which an upper
surface is a flat surface.
[0077] As shown in FIG. 4, the finish polishing device 10 places
the finish polishing surface plate 1 mounted with the polishing
film 7 on the rotating plate 11 to rotate the rotating plate 11 by
the driving source 12. Along with this, polishing processing is
performed by supplying the lubricant 9 from the supply part 14 to
an upper surface of the polishing film 7 to push the polishing
sample 8 against the polishing film 7. Accordingly, excessive
lubricant 9 is discharged from any continuous grooved recesses 3 on
the entire working plane of the plate body 2, the polishing film 7
is sunken along the shapes of the grooved recesses 3 in the
portions of the grooved recesses 3 of the finish polishing surface
plate 1, and arcuate recesses 4a having a shape corresponding to
the shape of each grooved recess 3 is formed in the surface of the
polishing film 7.
[0078] In this way, for example, excessive lubricant 9, such as
water, on the working plane of the plate body 2 is discharged from
the working plane of the plate body 2 by the grooved recesses 3 and
the arcuate recesses 4a formed in the surface of the polishing film
7. Accordingly, the lubricant 9 is not substantially interposed
between the polishing target surface of the polishing sample 8 and
the polishing film 7 immediately above the island shaped
protrusions 5. Accordingly, the polishing target surface of the
polishing sample 8 and the polishing film 7 can easily come into
contact with each other above the island shaped protrusions 5, and
polishing efficiency can be improved.
[0079] Additionally, since the contact area between the polishing
target surface of the polishing sample 8 and the polishing film 7
is limited by the formation of the arcuate recesses 4a. Therefore,
suction of the polishing target surface of the polishing sample 8
to the polishing film 7 is suppressed. Therefore, an acting force
required for the polishing can be reduced, and polishing processing
time can be shortened. Moreover, since shavings K generated from
the polishing sample 8 accumulates within the arcuate recesses 4a
of the polishing film or are discharged to the outside via the
arcuate recesses 4a, the frequency at which the shavings K damages
the polishing target surface decreases remarkably.
[0080] Even in a case where the polishing sample 8 made of a
composite material having a hardness difference on the polishing
target surface is polished, it is possible to prevent sagging or
prevent partial variation of a polishing state to realize polishing
having planarity and flatness.
[0081] According to the present embodiment, even if the operation
skill level is low, it is possible to easily produce a polishing
sample 8 having high planarity and flatness in a short time.
Therefore, the possibility that the polishing sample 8 itself is
damaged can be reduced, and the present embodiment can also be
applied to a valuable sample without alternatives, such as a single
article.
[0082] Hereinafter, a finish polishing surface plate related to a
second embodiment of the present invention will be described with
reference to a drawing.
[0083] FIG. 5 is a plan view illustrating a finish polishing
surface plate related to the present embodiment.
[0084] The present embodiment is different from the above-described
first embodiment in terms of the dimensions of the island shaped
protrusions 5 and the grooved recesses 3, and corresponding
constituent elements other than this will be designated by the same
reference signs and the description thereof will be omitted.
[0085] In the present embodiment, the width T2 of each grooved
recess 3 is made smaller than the diameter T1 of each island shaped
protrusion 5, and the diameter T1 of the island shaped protrusion 5
can be set to about 4 mm (.+-.4 mm) within a range of 2 to 8
mm.
[0086] The width T2 of the grooved recess 3 is provided so as to be
equal to a separation distance between two adjacent island shaped
protrusions 5. The widths T2 of the grooved recesses 3 are equal to
each other on the whole surface of the working plane of the plate
body 2. Specifically, the width T2 of each grooved recess 3 can be
set to about 2 mm (.+-.0.2 mm) within a range of 1 to 4 mm.
[0087] The present embodiment can also be applied to the polishing
sample 8 in which a polishing target surface has regions having
different hardnesses and a Mohs hardness difference between a
high-hardness region and a low-hardness region in this polishing
sample surface is 3 or more. If there is a hardness difference on
the polishing target surface, sagging is likely to occur. However,
in the finish polishing surface plate 1 of the present embodiment,
polishing can be suitably performed even in such a polishing
sample.
[0088] The present embodiment can also be applied to, for example,
a polishing sample in which a plurality of polishing samples, such
as rock, are embedded on a surface of a resinous cylindrical base
material having a diameter of about 5 to 10 mm.
[0089] In the present embodiment, polishing can be performed so as
to correspond to a polishing sample 8 smaller than the polishing
sample 8 in the first embodiment by setting the width T2 of the
grooved recess 3 and the diameter T1 of the island shaped
protrusion 5 as described above.
[0090] Additionally, in the present embodiment, first, a first
polishing step is performed by supplying alumina paste to a surface
plate without the ordinary grooved recesses 3, and then, a second
polishing step is performed using the finish polishing surface
plate 1 and the polishing film 7 of the present embodiment.
[0091] In the first polishing step, the processing of forming a
polishing target surface having area and flatness sufficient to
perform finish polishing on the polishing sample 8 is performed. On
the other hand, in a case where the high-hardness region and the
low-hardness region having different hardnesses on the polishing
target surface are included because the surface plate having no
grooved recesses 3 and island shaped protrusions 5 are included on
the working plane, there is a case where the sagging may occur.
Additionally, there is a case where the low-hardness region may be
excessively polished.
[0092] However, in the present embodiment, by performing the second
polishing step after the first polishing step, the amount (surface
area) of the polishing sample to be cut with the polishing film can
be made small by the first polishing step (first step), and
flattening can be made by the second polishing step (second step).
Accordingly, it is possible to further shorten working hours to
quickly perform polishing.
[0093] Additionally, gaps resulting from the further arcuate
recesses can also be formed between the polishing film 7 and the
polishing sample 8. Therefore, the shavings K are not easily
brought into contact with the polishing target surface and can also
be easily discharged, thereby reducing a rate at which a sample
surface is damaged.
Examples
[0094] Hereinafter, examples related to the present invention will
be described.
[0095] FIG. 6 is an image illustrating a polishing sample obtained
by performing the first step in the second embodiment, using a
surface plate having no grooved recesses 3.
[0096] Here, polishing processing was performed, using 0.3 .mu.m
alumina paste as loose abrasive grains. As shown in FIG. 6, it can
be seen that remarkable edge sagging occurs due to a difference in
material hardness.
[0097] In addition, in FIG. 6, the hardnesses in the polishing
sample are hardnesses: clay mineral (black portion)<volcanic
glass (light grey color)<pyrogenetic mineral (white polygonal
portion).
[0098] FIG. 7 shows an image illustrating a polishing sample
obtained by performing the second step in the second embodiment on
the polishing sample shown in FIG. 6, using the finish polishing
surface plate 1.
[0099] Here, after polishing was performed for 1 minute in a state
where the rotating plate 11 was rotated at 300 rpm using one having
an abrasive grain diameter of 3 .mu.m as a polishing film (wrapping
film), finish polishing was performed for 2 minutes in a state
where the rotating plate 11 was rotated at 300 rpm using one having
an abrasive grain diameter of 0.5 .mu.m as a polishing film
(wrapping film).
[0100] As shown in FIG. 7, it can be seen that, even if there is a
difference in material hardness, sagging does not occur and the
sample is flattened.
[0101] FIG. 8 is an image illustrating a polishing sample obtained
by performing the first step in the second embodiment, using a
surface plate having no grooved recesses 3.
[0102] Here, polishing processing was performed, using 0.3 .mu.m
alumina paste as loose abrasive grains. As shown in FIG. 8, it can
be seen that remarkable edge sagging occurs due to a difference in
material hardness.
[0103] In addition, in FIG. 8, the hardnesses in the polishing
sample are hardnesses: clay mineral (black portion)<volcanic
glass (light grey color)<pyrogenetic mineral (white polygonal
portion).
[0104] FIG. 9 shows an image illustrating a polishing sample
obtained by performing the second step on the polishing sample
shown in FIG. 8, using the finish polishing surface plate 1 in the
above-described second embodiment.
[0105] Here, polishing was performed for 3 minutes in a state where
the rotating plate 11 was rotated at 300 rpm, using one having an
abrasive grain diameter of 0.5 .mu.m as a polishing film (wrapping
film).
[0106] As shown in FIG. 9, it can be seen that, even if there is a
difference in material hardness, sagging does not occur and the
sample is flattened.
[0107] In addition, those including a pyroxene (Mohs hardness 6.5
to 7) olivines (Mohs hardness 7) spinel (Mohs hardness 8) indium
metal (Mohs hardness 1.2) kaolinite; or clay (Mohs hardness 1-2)
iron nickel alloy (Mohs hardness 4) can be included as the
polishing sample 8.
[0108] From these results, it can be seen that sufficient
planarizing and flattening can be realized for a polishing sample
subjected to the second step using the finish polishing surface
plate 1 in the embodiment.
[0109] Accordingly, it is possible for the polishing sample 8
flattened in the present invention to sufficiently satisfy
smoothness required for application to SIMS (secondary ion mass
spectroscopy). Specifically, a state where a sample surface can be
suitably observed using an objective lens (Nikon L Plan
2.5.times.0.075 EPI) having a relatively shallow depth of focus
with reflected light of a polarization microscope that is a
criterion for determining whether or not analysis performed by the
SIMS is possible can be satisfied.
INDUSTRIAL APPLICABILITY
[0110] The present invention makes it possible to quickly and
smoothly polish a composite material having remarkably different
hardnesses, and can be widely utilized in individual fields
involved in processing of hard-to-work materials, including the
materials science field.
REFERENCE SIGNS LIST
[0111] 1: FINISH POLISHING SURFACE PLATE [0112] 2: PLATE [0113] 3:
GROOVED RECESS [0114] 4A: ARCUATE RECESSES [0115] 5: ISLAND SHAPED
PROTRUSION [0116] 6: CORNER PART [0117] 7: POLISHING FILM [0118] 8:
POLISHING SAMPLE [0119] 9: LUBRICANT [0120] 10: FINISH POLISHING
DEVICE [0121] 11: ROTATING PLATE [0122] 11A: ROTATING MECHANISM
[0123] 12: DRIVING SOURCE [0124] 12, 13: MAGNETIZING PART
(ANISOTROPIC RUBBER MAGNET SHEET) [0125] K: SHAVINGS
* * * * *