U.S. patent application number 15/665437 was filed with the patent office on 2019-02-07 for non-volatile memory device with reduced distance between control gate electrode and selecting gate electrode and manufacturing method thereof.
The applicant listed for this patent is UNITED MICROELECTRONICS CORP.. Invention is credited to Meng-Chun Chen, Wen-Peng Hsu, Kuo-Lung Li, Chih-Hao Pan, Ping-Chia Shih, Chia-Wen Wang.
Application Number | 20190043877 15/665437 |
Document ID | / |
Family ID | 65200357 |
Filed Date | 2019-02-07 |
United States Patent
Application |
20190043877 |
Kind Code |
A1 |
Li; Kuo-Lung ; et
al. |
February 7, 2019 |
NON-VOLATILE MEMORY DEVICE WITH REDUCED DISTANCE BETWEEN CONTROL
GATE ELECTRODE AND SELECTING GATE ELECTRODE AND MANUFACTURING
METHOD THEREOF
Abstract
A non-volatile memory device includes a semiconductor substrate,
a control gate electrode, a first oxide-nitride-oxide (ONO)
structure, a selecting gate electrode, a second ONO structure, and
a spacer structure. The control gate electrode and the selecting
gate electrode are disposed on the semiconductor substrate. The
first ONO structure is disposed between the control gate electrode
and the semiconductor substrate. The second ONO structure is
disposed between the control gate electrode and the selecting gate
electrode in a first direction. The spacer structure is disposed
between the control gate electrode and the second ONO structure in
the first direction. A distance between the control gate electrode
and the selecting gate electrode in the first direction is smaller
than or equal to a sum of a width of the second ONO structure and a
width of the spacer structure in the first direction.
Inventors: |
Li; Kuo-Lung; (Yunlin
County, TW) ; Shih; Ping-Chia; (Tainan City, TW)
; Hsu; Wen-Peng; (New Taipei City, TW) ; Wang;
Chia-Wen; (Tainan City, TW) ; Chen; Meng-Chun;
(Kaohsiung City, TW) ; Pan; Chih-Hao; (Kaohsiung
City, TW) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
UNITED MICROELECTRONICS CORP. |
Hsin-Chu City |
|
TW |
|
|
Family ID: |
65200357 |
Appl. No.: |
15/665437 |
Filed: |
August 1, 2017 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 29/42344 20130101;
H01L 29/792 20130101; H01L 27/11568 20130101; H01L 29/66833
20130101; H01L 29/40117 20190801 |
International
Class: |
H01L 27/11568 20060101
H01L027/11568; H01L 29/423 20060101 H01L029/423 |
Claims
1. A non-volatile memory device, comprising: a semiconductor
substrate; a control gate electrode disposed on the semiconductor
substrate; a first oxide-nitride-oxide (ONO) structure disposed
between the control gate electrode and the semiconductor substrate,
wherein the control gate electrode directly and physically contacts
the first ONO structure; a selecting gate electrode disposed on the
semiconductor substrate; a second ONO structure disposed between
the control gate electrode and the selecting gate electrode in a
first direction; and a spacer structure disposed between the
control gate electrode and the second ONO structure in the first
direction, wherein a distance between the control gate electrode
and the selecting gate electrode in the first direction is smaller
than or equal to a sum of a width of the second ONO structure and a
width of the spacer structure in the first direction.
2. The non-volatile memory device according to claim 1, wherein the
first ONO structure is disposed between the control gate electrode
and the semiconductor substrate in a second direction perpendicular
to the first direction, and the first ONO structure comprises a
first bottom oxide layer, a first nitride layer, and a first top
oxide layer overlapping one another in the second direction.
3. The non-volatile memory device according to claim 2, wherein the
second ONO structure comprises a second bottom oxide layer, a
second nitride layer, and a second top oxide layer overlapping one
another in the first direction.
4. The non-volatile memory device according to claim 3, wherein the
first bottom oxide layer is directly connected with the second
bottom oxide layer, and the material of the first bottom oxide
layer is the same as the material of the second bottom oxide
layer.
5. The non-volatile memory device according to claim 3, wherein the
first nitride layer is directly connected with the second nitride
layer, and the material of the first nitride layer is the same as
the material of the second nitride layer.
6. The non-volatile memory device according to claim 3, wherein the
first top oxide layer is directly connected with the second top
oxide layer, and the material of the first top oxide layer is the
same as the material of the second top oxide layer.
7. The non-volatile memory device according to claim 3, wherein a
material density of the first top oxide layer is different from the
material density of the second top oxide layer.
8. The non-volatile memory device according to claim 3, wherein the
spacer structure comprises a first spacer and a second spacer, and
the second spacer is disposed between the first spacer and the
control gate electrode in the first direction.
9. The non-volatile memory device according to claim 8, wherein the
material of the first spacer is different from the material of the
second spacer, and the material of the second spacer is the same as
the first top oxide layer.
10. A manufacturing method of a non-volatile memory device,
comprising: forming a control gate electrode on a semiconductor
substrate; forming a first oxide-nitride-oxide (ONO) structure
between the control gate electrode and the semiconductor substrate;
forming a selecting gate electrode on the semiconductor substrate;
and forming a second ONO structure and a spacer structure between
the control gate electrode and the selecting gate electrode in a
first direction, wherein a distance between the control gate
electrode and the selecting gate electrode in the first direction
is smaller than or equal to a sum of a width of the second ONO
structure and a width of the spacer structure in the first
direction.
11. The manufacturing method of the non-volatile memory device
according to claim 10, wherein the step of forming the spacer
structure comprises: forming a first gate material layer on the
semiconductor substrate; forming a recess penetrating the first
gate material layer and exposing a part of the semiconductor
substrate; forming an oxide-nitride-oxide stack layer conformally
on the first gate material layer and in the recess; forming an
insulation layer on the oxide-nitride-oxide stack layer; and
performing an etching process to remove a part of the insulation
layer for forming a first spacer in the recess and exposing a part
of the oxide-nitride-oxide stack layer on the first gate material
layer and a part of the oxide-nitride-oxide stack layer in the
recess.
12. The manufacturing method of the non-volatile memory device
according to claim 11, wherein the step of forming the second ONO
structure comprises: forming a second gate material layer on the
semiconductor substrate after the etching process, wherein a part
of the second gate material layer is formed in the recess, and a
part of the second gate material layer is formed on the
oxide-nitride-oxide stack layer located on the first gate material
layer; and performing a planarization process to remove the second
gate material layer outside the recess and the oxide-nitride-oxide
stack layer on the first gate material layer for forming the second
ONO structure between the first gate material layer and the second
gate material layer in the first direction.
13. The manufacturing method of the non-volatile memory device
according to claim 12, wherein the second gate material layer in
the recess is patterned to become the control gate electrode after
the planarization process.
14. The manufacturing method of the non-volatile memory device
according to claim 12, wherein the first gate material layer is
patterned to become the selecting gate electrode after the
planarization process.
15. The manufacturing method of the non-volatile memory device
according to claim 12, wherein the oxide-nitride-oxide stack layer
in the recess is patterned to become the first ONO structure after
the planarization process.
16. The manufacturing method of the non-volatile memory device
according to claim 12, wherein the oxide-nitride-oxide stack layer
comprises a first oxide layer, a nitride layer, and a second oxide
layer sequentially formed on the semiconductor substrate, and the
step of forming the first ONO structure comprises: removing the
second oxide layer of the oxide-nitride-oxide stack layer formed in
the recess and exposed by the insulation layer after the etching
process and before the step of forming the second gate material
layer; and forming a third oxide layer on the nitride layer in the
recess before the step of forming the second gate material layer,
wherein the first oxide layer, the nitride layer, and the third
oxide layer in the recess are patterned to become the first ONO
structure after the planarization process.
17. The manufacturing method of the non-volatile memory device
according to claim 16, wherein the third oxide layer is further
formed on the first spacer and formed outside the recess, and the
planarization process further remove the third oxide layer formed
outside the recess for forming a second spacer on the first spacer,
wherein the spacer structure comprises the first spacer and the
second spacer.
18. The manufacturing method of the non-volatile memory device
according to claim 12, wherein the planarization process comprises:
a first step configured to remove the second gate material layer
outside the recess and stopped at the oxide-nitride-oxide stack
layer; a second step performed after the first step, wherein the
second step is configured to remove the oxide-nitride-oxide stack
layer on the first gate material layer and stopped at the first
gate material layer; and a third step performed after the second
step and configured to remove a part of the first gate material
layer and a part of the second gate material layer, wherein a top
surface of the first gate material layer and a top surface of the
second gate material layer are lower than a top surface of the
spacer structure after the third step of the planarization
process.
19. The manufacturing method of the non-volatile memory device
according to claim 10, wherein the first ONO structure is located
between the control gate electrode and the semiconductor substrate
in a second direction perpendicular to the first direction, and the
first ONO structure comprises a first bottom oxide layer, a first
nitride layer, and a first top oxide layer overlapping one another
in the second direction.
20. The manufacturing method of the non-volatile memory device
according to claim 19, wherein the second ONO structure comprises a
second bottom oxide layer, a second nitride layer, and a second top
oxide layer overlapping one another in the first direction, and the
second ONO structure is directly connected with the first ONO
structure.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
[0001] The present invention relates to a memory device and a
manufacturing method thereof, and more particularly, to a
non-volatile memory device including an oxide-nitride-oxide (ONO)
structure and a manufacturing method thereof.
2. Description of the Prior Art
[0002] Semiconductor memory devices are used in computer and
electronics industries as a means for retaining digital information
or data. Typically, the semiconductor memory devices are divided
into volatile and non-volatile memory devices. The non-volatile
memory devices, which can retain their data even when the power
supply is interrupted, have been widely employed. As one kind of
the non-volatile memory technology, a SONOS memory structure is to
build a silicon nitride layer sandwiched between two silicon oxide
layers for serving as the charge trapping layer while the two
silicon oxide layers respectively serve as a charge tunnel layer
and a charge block layer. This oxide-nitride-oxide (ONO)
multilayered structure is disposed on a semiconductor substrate, a
silicon floating gate may be disposed on the ONO multilayered
structure, and thus a SONOS memory structure is constructed.
[0003] Since the microprocessors have become more powerful,
requirement to memory devices of large-capacity and low-cost is
raised. To satisfy such trend and achieve challenge of high
integration in semiconductor devices, memory miniaturization is
kept on going, and thus fabrication process of memory structure is
getting complicated. Therefore, it is always a target for the
related industries to effectively enhance integrity and density of
the memory cells by modifying the designs.
SUMMARY OF THE INVENTION
[0004] A non-volatile memory device and a manufacturing method
thereof are provided by the present invention. A control gate
electrode and a selecting gate electrode are separated from each
other by an oxide-nitride-oxide (ONO) structure and a spacer
structure in a first direction, and a distance between the control
gate electrode and the selecting gate electrode in the first
direction is smaller than or equal to a sum of a width of the ONO
structure and a width of the spacer structure in the first
direction. Accordingly, the distance between the control gate
electrode and the selecting gate electrode may be reduced and the
density of memory cells in the non-volatile memory device may be
enhanced.
[0005] According to one embodiment of the present invention, a
non-volatile memory device is provided. The non-volatile memory
device includes a semiconductor substrate, a control gate
electrode, a first oxide-nitride-oxide (ONO) structure, a selecting
gate electrode, a second ONO structure, and a spacer structure. The
control gate electrode and the selecting gate electrode are
disposed on the semiconductor substrate. The first ONO structure is
disposed between the control gate electrode and the semiconductor
substrate. The second ONO structure is disposed between the control
gate electrode and the selecting gate electrode in a first
direction. The spacer structure is disposed between the control
gate electrode and the second ONO structure in the first direction.
A distance between the control gate electrode and the selecting
gate electrode in the first direction is smaller than or equal to a
sum of a width of the second ONO structure and a width of the
spacer structure in the first direction.
[0006] According to one embodiment of the present invention, a
manufacturing method of a non-volatile memory device is provided.
The manufacturing method includes the following steps. A control
gate electrode is formed on a semiconductor substrate. A first
oxide-nitride-oxide (ONO) structure is formed between the control
gate electrode and the semiconductor substrate. A selecting gate
electrode is formed on the semiconductor substrate. A second ONO
structure and a spacer structure are formed between the control
gate electrode and the selecting gate electrode in a first
direction. A distance between the control gate electrode and the
selecting gate electrode in the first direction is smaller than or
equal to a sum of a width of the second ONO structure and a width
of the spacer structure in the first direction.
[0007] These and other objectives of the present invention will no
doubt become obvious to those of ordinary skill in the art after
reading the following detailed description of the preferred
embodiment that is illustrated in the various figures and
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0008] FIGS. 1-8 are schematic drawings illustrating a
manufacturing method of a non-volatile memory device according to a
first embodiment of the present invention, wherein
[0009] FIG. 2 is a schematic drawing in a step subsequent to FIG.
1,
[0010] FIG. 3 is a schematic drawing in a step subsequent to FIG.
2,
[0011] FIG. 4 is a schematic drawing in a step subsequent to FIG.
3,
[0012] FIG. 5 is a schematic drawing in a step subsequent to FIG.
4,
[0013] FIG. 6 is a schematic drawing in a step subsequent to FIG.
5,
[0014] FIG. 7 is a schematic drawing in a step subsequent to FIG.
6, and
[0015] FIG. 8 is a schematic drawing in a step subsequent to FIG.
7.
[0016] FIG. 8 is a schematic drawing illustrating the non-volatile
memory device according to the first embodiment of the present
invention.
[0017] FIGS. 9-12 are schematic drawings illustrating a
manufacturing method of a non-volatile memory device according to a
second embodiment of the present invention, wherein
[0018] FIG. 10 is a schematic drawing in a step subsequent to FIG.
9,
[0019] FIG. 11 is a schematic drawing in a step subsequent to FIG.
10, and
[0020] FIG. 12 is a schematic drawing in a step subsequent to FIG.
11.
[0021] FIG. 12 is a schematic drawing illustrating the non-volatile
memory device according to the second embodiment of the present
invention.
DETAILED DESCRIPTION
[0022] In the following description, numerous specific details are
set forth, such as particular structures, components, materials,
dimensions, processing steps and techniques, in order to provide a
thorough understanding of the present invention. However, it will
be appreciated by one of ordinary skill in the art that the
invention maybe practiced without these specific details. In other
instances, well-known structures or processing steps have been
described in detail in order to avoid obscuring the invention.
[0023] It will be understood that when an element is referred to as
being "formed" on another element, it can be directly or
indirectly, formed on the given element by growth, deposition,
etch, attach, connect, or couple. And it will be understood that
when an elements or a layer is referred to as being "on",
"connected to", or "coupled to" another element or layer, it can be
directly on, connected or coupled to the other element or layer or
intervening elements or layers may be present.
[0024] It will be understood that, although the terms first,
second, etc. may be used herein to describe various elements,
components, regions, layers and/or sections, these elements,
components, regions, layers and/or sections should not be limited
by these terms. These terms are only used to distinguish one
element, component, region, layer and/or section from another.
Thus, a first element, component, region, layer or section
discussed below could be termed a second element, component,
region, layer or section without departing from the teachings of
the disclosure.
[0025] Please refer to FIGS. 1-8. FIGS. 1-8 are schematic drawings
illustrating a manufacturing method of a non-volatile memory device
according to a first embodiment of the present invention. As shown
in FIG. 8, the manufacturing method in this embodiment may include
the following steps. A control gate electrode 22G is formed on a
semiconductor substrate 10. A first oxide-nitride-oxide (ONO)
structure S1 is formed between the control gate electrode 22G and
the semiconductor substrate 10. A selecting gate electrode 21G is
formed on the semiconductor substrate 10. A second ONO structure S2
and a spacer structure P are formed between the control gate
electrode 22G and the selecting gate electrode 21G in a first
direction D1. A distance DS between the control gate electrode 22G
and the selecting gate electrode 21G in the first direction D1 is
smaller than or equal to a sum of a width of the second ONO
structure S2 (such as a first width W1 shown in FIG. 8) and a width
of the spacer structure P (such as a second width W2 shown in FIG.
8) in the first direction D1. In other words, the control gate
electrode 22G and the selecting gate electrode 21G in the first
direction D1 by the second ONO structure S2 and the spacer
structure P only for reducing the distance DS between the control
gate electrode 22G and the selecting gate electrode 21G in the
first direction D1 and enhancing the density of memory cells in the
non-volatile memory device.
[0026] In some embodiments, the method of forming the control gate
electrode 22G, the selecting gate electrode 21G, the first ONO
structure S1, the second ONO structure S2, and the spacer structure
P mentioned above may include but is not limited to the following
steps. As shown in FIG. 1, a first gate material layer 21 is formed
on the semiconductor substrate 10, and a recess RS is formed. The
recess RS may penetrate the first gate material layer 21 and expose
a part of the semiconductor substrate 10. In some embodiments, a
gate dielectric layer 11 may be formed on the semiconductor
substrate 10 before the step of forming the first gate material
layer 21, and the first gate material layer 21 may be formed on the
gate dielectric layer 11, but not limited thereto. In some
embodiments, the recess RS may penetrate the first gate material
layer 21 and the gate dielectric layer 11 for exposing a part of
the semiconductor substrate 10. In other words, the recess RS may
be formed by removing a part of the first gate material layer 21
and the gate dielectric layer 11, but not limited thereto. The
semiconductor substrate 10 may include a silicon substrate, an
epitaxial substrate, a silicon carbide substrate, or a
silicon-on-insulator (SOI) substrate, but not limited thereto. The
gate dielectric layer 11 may include silicon oxide, silicon
oxynitride, or other appropriate dielectric materials, and the
first gate material layer 21 may include polysilicon or other
appropriate conductive materials.
[0027] As shown in FIG. 2, an oxide-nitride-oxide stack layer 30 is
then conformally on the first gate material layer 21 and in the
recess RS. In some embodiments, a doped region (not shown) may be
formed in the semiconductor substrate exposed by the recess RS
before the step of forming the oxide-nitride-oxide stack layer 30,
but not limited thereto. In some embodiments, the
oxide-nitride-oxide stack layer may include a first oxide layer 31,
a nitride layer 32, and a second oxide layer 33 sequentially formed
on the semiconductor substrate 10. In other words, the nitride
layer 32 is sandwiched between the first oxide layer 31 and the
second oxide layer 32, a part of the first oxide layer 31 is
located between the semiconductor substrate 10 and the nitride
layer 32 in a thickness direction of the semiconductor substrate 10
(such as a second direction shown in FIG. 2), and a part of the
first oxide layer 31 is located between the first gate material
layer 21 and the nitride layer 32 in a horizontal direction (such
as the first direction D1 shown in FIG. 2). In some embodiments,
the first oxide layer 31 may be a silicon oxide layer formed by a
thermal growing process, and a part of the semiconductor substrate
10 may be consumed to form the first oxide layer 31, but not
limited thereto. In some embodiments, the first oxide layer 31 may
be formed by other suitable processes, such as a chemical vapor
deposition process. After the step of forming the
oxide-nitride-oxide stack layer 30, an insulation layer 40 may be
formed on the oxide-nitride-oxide stack layer 30, and a part of the
insulation layer 40 is formed in the recess RS. In some
embodiments, the insulation layer 40 may be conformally formed on
the oxide-nitride-oxide stack layer 30 for forming the spacer
structure mentioned above.
[0028] As shown in FIG. 2 and FIG. 3, an etching process 91 is then
performed to remove a part of the insulation layer 40 for forming a
first spacer P1 in the recess RS and exposing a part of the
oxide-nitride-oxide stack layer 30 on the first gate material layer
21 and a part of the oxide-nitride-oxide stack layer 30 in the
recess RS. The first spacer P1 may be at least a part of the spacer
structure mentioned above. The etching process 91 maybe an
anisotropic etching process preferably, but not limited thereto.
The material of the insulation layer 40 may be different from the
second oxide layer 33 for forming the first spacer P1 by the
etching process 91 with higher etching selectivity between the
insulation layer 40 and the second oxide layer 33. In some
embodiments, the insulation layer 40 may include a nitride material
or other appropriate insulation materials. As shown in FIG. 3 and
FIG. 4, a second gate material layer 22 is formed on the
semiconductor substrate 10 after the etching process 91. A part of
the second gate material layer 22 may be formed in the recess RS,
and a part of the second gate material layer 22 may be formed on
the oxide-nitride-oxide stack layer 30 located on the first gate
material layer 21. In some embodiments, the recess RS may be filled
with the oxide-nitride-oxide stack layer 30, the first spacer P1
and the second gate material layer 22, but not limited thereto. The
second gate material layer 22 may include polysilicon or other
appropriate conductive materials.
[0029] As shown in FIGS. 4-7, a planarization process 92 is
performed to remove the second gate material layer 22 outside the
recess RS and the oxide-nitride-oxide stack layer 30 located on the
first gate material layer 21 in the second direction D2 for forming
the second ONO structure S2 between the first gate material layer
21 and the second gate material layer 22 in the first direction D1.
In some embodiments, the planarization process 92 may include a
chemical mechanical polishing (CMP) process or other appropriate
planarization approaches, and the planarization process 92 may
include a plurality of steps for different removing effects. For
example, as shown in FIG. 5, the planarization process 92 may
include a first step 92A configured to remove the second gate
material layer 22 outside the recess RS and stopped at the
oxide-nitride-oxide stack layer 30. In some embodiments, the area
ratio of the oxide-nitride-oxide stack layer 30 located outside the
recess RS on the semiconductor substrate 10 may be higher than 50%
for enhancing the performance of the endpoint detection in the
first step 92A of the planarization process 92, but not limited
thereto.
[0030] As shown in FIG. 5 and FIG. 6, the planarization process 92
may further include a second step 92B performed after the first
step 92A, and the second step 92B may be configured to remove the
oxide-nitride-oxide stack layer 30 located on the first gate
material layer 21 in the second direction D2 and stopped at the
first gate material layer 21. In some embodiments, apart of the
spacer structure P and a part of the second gate material layer 22
may be removed by the second step 92B of the planarization process
92, and the second step 92B of the planarization process 92 may be
a chemical mechanical polishing step with fixed time, but not
limited thereto. In some embodiments, a top surface of the first
gate material layer 21 (such as a first top surface 21S shown in
FIG. 7), a top surface of the second gate material layer 22 (such
as a second top surface 22S shown in FIG. 7), a top surface of the
oxide-nitride-oxide stack layer 30 (such as a third top surface 30S
shown in FIG. 7), and a top surface of the spacer structure P (such
as a fourth top surface 40S) may be substantially coplanar after
the second step 92B of the planarization process 92, but not
limited thereto. Additionally, the second ONO structure S2 may be
formed after the second step 92B of the planarization process 92,
and the second ONO structure S2 may be composed of the first oxide
layer 31, the nitride layer 32, and the second oxide layer 33
sequentially stacked in the first direction D1.
[0031] As shown in FIG. 6 and FIG. 7, the planarization process 92
may further include a third step 92C performed after the second
step 92B and configured to remove a part of the first gate material
layer 21 and a part of the second gate material layer 22 for
reducing the heights of the first gate material layer 21 and the
second gate material layer 22. In other words, the first top
surface 21S of the first gate material layer 21 and the second top
surface 22S of the second gate material layer 22 maybe lower than
the third top surface 30S of the oxide-nitride-oxide stack layer 30
and the fourth top surface 40S of the spacer structure P in the
second direction D2 after the third step 92C of the planarization
process 92.
[0032] As shown in FIG. 7 and FIG. 8, after the planarization
process 92, the first gate material layer 21 may be patterned to
become the selecting gate electrode 21G, the second gate material
layer 22 in the recess RS may be patterned to become the control
gate electrode 22G, and the oxide-nitride-oxide stack layer 30 in
the recess RS may be patterned to become the first ONO structure
S1. A SONOS memory structure may be constructed by the
semiconductor substrate 10, the first ONO structure S1, and the
control gate electrode 22G stacked in the second direction D2. The
first ONO structure S1 is located between the control gate
electrode 22G and the semiconductor substrate 10 in the second
direction D2 perpendicular to the first direction D1, and the first
ONO structure S1 includes a first bottom oxide layer S11, a first
nitride layer S12, and a first top oxide layer S13 overlapping one
another in the second direction D2. Additionally, in some
embodiments, a third spacer 50 may be formed on the outer sidewalls
of the selecting gate electrode 21G and the control gate electrode
22G, a lightly doped region 61 may be formed in the semiconductor
substrate 10 under the third spacer 50, a source line 62 may be
formed in the semiconductor substrate 10 at an outer side of the
selecting gate electrode 21G, and a bit line 63 may be formed in
the semiconductor substrate 10 at an outer side of the control gate
electrode 22G. The structure shown in FIG. 8 may be regarded as a
memory cell of a non-volatile memory device 101, but not limited
thereto. The distance DS between the control gate electrode 22G and
the selecting gate electrode 21G in the first direction D1 may be
smaller than or equal to the sum of the first width W1 of the
second ONO structure S2 in the first direction D1 and the second
width W2 of the spacer structure P in the first direction D1
because the selecting gate electrode 21G and the control gate
electrode 22G may be separated from each other in the first
direction D1 by the second ONO structure S2 and the spacer
structure P only. The distance DS between the control gate
electrode 22G and the selecting gate electrode 21G may be reduced
accordingly, and the density of the memory cells in the
non-volatile memory device 101 may be enhanced because the area of
each of the memory cells may be reduced also.
[0033] In some embodiments, the second ONO structure S1 may include
a second bottom oxide layer S21, a second nitride layer S22, and a
second top oxide layer S23 overlapping one another in the first
direction D1, and the second ONO structure S2 maybe directly
connected with the first ONO structure S1. Additionally, the first
width W1 of the second ONO structure S2 in the first direction D1
may also be regarded as the sum of the thickness of the second
bottom oxide layer S21, the thickness of the second nitride layer
S22, and the thickness of the second top oxide layer S23 in the
first direction D1.
[0034] As shown in FIG. 8, the non-volatile memory device 101 in
this embodiment may include the semiconductor substrate 10, the
control gate electrode 22G, the first ONO structure S1, the
selecting gate electrode 21G, the second ONO structure S2, and the
spacer structure P. The control gate electrode 22G and the
selecting gate electrode 21G are disposed on the semiconductor
substrate 10. The first ONO structure S1 is disposed between the
control gate electrode 22G and the semiconductor substrate 10. The
second ONO structure S2 is disposed between the control gate
electrode 22G and the selecting gate electrode 21G in the first
direction D1. The spacer structure P is disposed between the
control gate electrode 22G and the second ONO structure S2 in the
first direction D1. The distance DS between the control gate
electrode 22G and the selecting gate electrode 21G in the first
direction D1 may be smaller than or equal to the sum of the first
width W1 of the second ONO structure S2 and the second width W2 of
the spacer structure P in the first direction D1 because the
selecting gate electrode 21G and the control gate electrode 22G may
be separated from each other in the first direction D1 by the
second ONO structure S2 and the spacer structure P only.
[0035] A shown in FIG. 8, the first ONO structure S1 is disposed
between the control gate electrode 22G and the semiconductor
substrate 10 in the second direction D2 perpendicular to the first
direction D1, and the first ONO structure S1 may include the first
bottom oxide layer S11, the first nitride layer S12, and the first
top oxide layer S13 overlapping one another in the second direction
D2. In other words, the first bottom oxide layer S11 is disposed
between the first nitride layer S12 and the semiconductor substrate
10, and the first nitride layer S12 is disposed between the first
bottom oxide layer S11 and the first top oxide layer S13. The
second ONO structure S2 may include the second bottom oxide layer
S21, the second nitride layer S22, and the second top oxide layer
S23 overlapping one another in the first direction D1. In other
words, the second bottom oxide layer S21 is disposed between the
second nitride layer S22 and the selecting gate electrode 21G in
the first direction D1, and the second nitride layer S22 is
disposed between the second bottom oxide layer S21 and the second
top oxide layer S23 in the first direction D1. In some embodiments,
the first bottom oxide layer S11 may be directly connected with the
second bottom oxide layer S21, and the material of the first bottom
oxide layer S11 may be the same as the material of the second
bottom oxide layer S21, but not limited thereto. In some
embodiments, the first nitride layer S12 may be directly connected
with the second nitride layer S22, and the material of the first
nitride layer S12 may be the same as the material of the second
nitride layer S22, but not limited thereto. In some embodiments,
the first top oxide layer S13 may be directly connected with the
second top oxide layer S23, and the material of the first top oxide
layer S13 may be the same as the material of the second top oxide
layer S23, but not limited thereto. In other words, the first oxide
layer 31 disposed between the nitride layer 32 and the
semiconductor substrate 10 in the second direction D2 may be
regarded as the first bottom oxide layer S11, and the first oxide
layer 31 disposed between the nitride layer 32 and the selecting
gate electrode 21G in the first direction D1 may be regarded as the
second bottom oxide layer S21. The nitride layer 32 disposed
between the first oxide layer 31 and the second oxide layer 33 in
the second direction D2 may be regarded as the first nitride layer
S12 of the first ONO structure S1, and the nitride layer 32
disposed between the first oxide layer 31 and the second oxide
layer 33 in the first direction D1 may be regarded as the second
nitride layer S22 of the second ONO structure S2. The second oxide
layer 33 disposed between the control gate electrode 22G and the
nitride layer 32 in the second direction D2 and the second oxide
layer 33 disposed between the spacer structure P and the nitride
layer 32 in the second direction D2 may be regarded as the first
top oxide layer S13, and the second oxide layer 33 disposed between
the spacer structure P and the nitride layer 32 in the first
direction D1 may be regarded as the second top oxide layer S23.
[0036] A shown in FIG. 8, in some embodiments, the non-volatile
memory device 101 may further include the gate dielectric layer 11,
the third spacer 50, the lightly doped region 61, the source line
62, and the bit line 63, but not limited thereto. The third spacer
50 may be formed on the outer sidewalls of the selecting gate
electrode 21G and the control gate electrode 22G, the lightly doped
region 61 may be formed in the semiconductor substrate 10 under the
third spacer 50, the source line 62 may be formed in the
semiconductor substrate 10 at the outer side of the selecting gate
electrode 21G, and the bit line 63 may be formed in the
semiconductor substrate 10 at the outer side of the control gate
electrode 22G. The density of the memory cells in the non-volatile
memory device 101 may be enhanced because the area of each of the
memory cells may be reduced by reducing the distance DS between the
selecting gate electrode 21G and the control gate electrode 22G
within the same memory cell.
[0037] The following description will detail the different
embodiments of the present invention. To simplify the description,
identical components in each of the following embodiments are
marked with identical symbols. For making it easier to understand
the differences between the embodiments, the following description
will detail the dissimilarities among different embodiments and the
identical features will not be redundantly described.
[0038] Please refer to FIG. 3 and FIGS. 9-12. FIGS. 9-12 are
schematic drawings illustrating a manufacturing method of a
non-volatile memory device 102 according to a second embodiment of
the present invention, and FIG. 9 maybe regarded as a schematic
drawing in a step subsequent to FIG. 3. As shown in FIG. 3 and FIG.
9, in the manufacturing method of this embodiment, a removing
process 93 may be performed to remove the second oxide layer 33 of
the oxide-nitride-oxide stack layer 30 formed in the recess RS and
exposed by the insulation layer 40 after the etching process 91 of
forming the first spacer P1 and before the step of forming the
second gate material layer (not shown in FIG. 3 and FIG. 9). In
other words, a part of the second oxide layer 33 is not covered by
the first spacer P1 after the etching process 91, and the second
oxide layer 33 which is not covered by the first spacer P1 may be
removed by the removing process 93. The removing process 93 may
include an oxide pre-clean process or other appropriate removing
processes. As shown in FIG. 9 and FIG. 10, a third oxide layer 34
may be formed on the nitride layer 32 in the recess RS after the
etching process 93 and before the step of forming the second gate
material layer (not shown in FIG. 9 and FIG. 10). The third oxide
layer 34 may be formed by a thermal oxidation process, such as an
in-situ steam generation (ISSG) technology, but not limited
thereto. In some embodiments, the third oxide layer 34 may be
formed by other appropriate oxidation processes or deposition
processes. Accordingly, a material density of the third oxide layer
34 may be different from the material density of the second oxide
layer 33. For example, a silicon oxide density of the third oxide
layer 34 may be higher than a silicon oxide density of the second
oxide layer 33 for improving the electrical performance of the
non-volatile memory device, but not limited thereto. In addition,
the third oxide layer 34 may be further formed on the first spacer
P1 and formed outside the recess RS. As shown in FIG. 10 and FIG.
11, the planarization process 92 may further remove the third oxide
layer 34 formed outside the recess RS for forming a second spacer
P2 on the first spacer P1. In other words, the third oxide layer 34
formed on the first spacer P1 may become the second spacer P2 by
the planarization process 92, and the spacer structure P in this
embodiment may be composed of the first spacer P1 and the second
spacer P2.
[0039] As shown in FIG. 11 and FIG. 12, the first oxide layer 31,
the nitride layer 32, and the third oxide layer 34 in the recess RS
are patterned to become the first ONO structure S1 after the
planarization process 92. As shown in FIG. 12, the difference
between the non-volatile memory device 102 and the non-volatile
memory device in the first embodiment mentioned above is that the
first top oxide layer S13 of the first ONO structure S1 may include
the third oxide layer 34 described above, and a material density of
the first top oxide layer S13 may be different from the material
density of the second top oxide layer S23. Additionally, the spacer
structure P in this embodiment may include the first spacer P1 and
the second spacer P2, and the second spacer P2 is disposed between
the first spacer P1 and the control gate electrode 22G in the first
direction D1. The material of the first spacer P1 may be different
from the material of the second spacer P2, and the material of the
second spacer P2 may be the same as the first top oxide layer S13.
For example, in some embodiments, the first spacer P1 may be a
nitride spacer, and the second spacer P2 maybe an oxide spacer, but
not limited thereto.
[0040] To summarize the above descriptions, according to the
non-volatile memory device and the manufacturing method thereof in
the present invention, the distance between the control gate
electrode and the selecting gate electrode may be reduced by
separating the control gate electrode and the selecting gate
electrode with the spacer structure and the second ONO structure
only. The area of each of the memory cells may be reduced
accordingly, and the density of memory cells in the non-volatile
memory device may be enhanced.
[0041] Those skilled in the art will readily observe that numerous
modifications and alterations of the device and method may be made
while retaining the teachings of the invention. Accordingly, the
above disclosure should be construed as limited only by the metes
and bounds of the appended claims.
* * * * *