U.S. patent application number 15/491827 was filed with the patent office on 2018-09-20 for growth substrate for forming optoelectronic devices, method for manufacturing such a substrate, and use of the susbstrate, in particular in the field of micro-display screens.
The applicant listed for this patent is Soitec. Invention is credited to Olivier Bonnin, Olivier Ledoux, David Sotta.
Application Number | 20180269253 15/491827 |
Document ID | / |
Family ID | 61027774 |
Filed Date | 2018-09-20 |
United States Patent
Application |
20180269253 |
Kind Code |
A1 |
Sotta; David ; et
al. |
September 20, 2018 |
GROWTH SUBSTRATE FOR FORMING OPTOELECTRONIC DEVICES, METHOD FOR
MANUFACTURING SUCH A SUBSTRATE, AND USE OF THE SUSBSTRATE, IN
PARTICULAR IN THE FIELD OF MICRO-DISPLAY SCREENS
Abstract
A method for manufacturing a plurality of crystalline
semiconductor islands having a variety of lattice parameters
comprises providing a substrate including a medium, a flow layer
disposed on the medium, and a plurality of strained crystalline
semiconductor islands having an initial lattice parameter arranged
on the flow layer. The strained semiconductor islands are
selectively treated so as to form a first group of strained islands
having a first lateral expansion potential, and a second group of
strained islands having a second lateral expansion potential that
is different from the first lateral expansion potential. The
substrate is heat treated at a temperature at or above a glass
transition temperature of the flow layer to cause differentiated
relaxation of the islands of the first and second groups, such that
a lattice parameter of the first group of relaxed islands differs
from a lattice parameter of the second group of relaxed
islands.
Inventors: |
Sotta; David; (Grenoble,
FR) ; Ledoux; Olivier; (Grenoble, FR) ;
Bonnin; Olivier; (Bresson, FR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Soitec |
Bernin |
|
FR |
|
|
Family ID: |
61027774 |
Appl. No.: |
15/491827 |
Filed: |
April 19, 2017 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 21/02458 20130101;
H01L 25/0753 20130101; H01L 33/0093 20200501; H01L 21/02639
20130101; H01L 33/025 20130101; H01L 21/02422 20130101; H01L
21/0254 20130101 |
International
Class: |
H01L 27/15 20060101
H01L027/15; H01L 33/00 20060101 H01L033/00; H01L 33/44 20060101
H01L033/44; H01L 33/32 20060101 H01L033/32; H01L 25/16 20060101
H01L025/16 |
Foreign Application Data
Date |
Code |
Application Number |
Mar 17, 2017 |
FR |
1752230 |
Claims
1. A method for manufacturing a plurality of crystalline
semiconductor islands having a variety of lattice parameters,
comprising: providing a substrate including a medium, a flow layer
disposed on the medium, and a plurality of strained crystalline
semiconductor islands having an initial lattice parameter arranged
on the flow layer; selectively treating the strained crystalline
semiconductor islands so as to form a first group of strained
islands having a first lateral expansion potential, and a second
group of strained islands having a second lateral expansion
potential that is different from the first lateral expansion
potential; heat-treating the substrate at a temperature that is
higher than or equal to a glass transition temperature of the flow
layer to cause differentiated relaxation of the islands of the
first and second groups such that a lattice parameter of the first
group of relaxed islands differs from a lattice parameter of the
second group of relaxed islands.
2. The method of claim 1, wherein the crystalline semiconductor
islands are made of III-N material.
3. The method of claim 1, wherein selectively treating the strained
crystalline semiconductor islands includes the formation of a
stiffening layer having a first thickness on the first group of
strained islands and having a second thickness on the second group
of strained islands.
4. The method of claim 3, wherein selectively treating the strained
crystalline semiconductor islands includes the formation of an
initial stiffening layer of uniform thickness on the first and
second group of strained islands, and the thinning or thickening of
the initial stiffening layer on the first group of islands or on
the second group of strained islands.
5. The method of claim 3, wherein the stiffening layer comprises a
material selected from the group consisting of silicon oxide and
silicon nitride.
6. The method of claim 1, wherein selectively treating the strained
crystalline semiconductor islands includes the formation, on the
first group of strained islands, of a stiffening layer formed from
a first material and the formation, on the second group of strained
islands, of a stiffening layer formed from a second material that
is different from the first material.
7. The method of claim 1, wherein selectively treating the strained
crystalline semiconductor islands includes reducing a thickness of
the strained islands of the first group and/or of the strained
islands of the second group, such that the strained islands of the
first group and the strained islands of the second group have
different thicknesses.
8. The method of claim 1, further comprising performing a
preliminary heat treatment on the substrate before selectively
treating the strained crystalline semiconductor islands.
9. The method of claim 1, further comprising performing an
additional heat treatment on the substrate after selectively
treating the strained crystalline semiconductor islands.
10. The method of claim 9, further comprising selectively treating
the first and second groups of islands after heat-treating the
substrate and before performing the additional heat treatment on
the substrate.
11. The method of claim 1, wherein heat-treating the substrate
comprises heat-treating the substrate at a temperature in a range
extending from 400.degree. C. to 900.degree. C.
12. The method of claim 1, further comprising transferring the
relaxed islands of the first group and the relaxed islands of the
second group to a growth medium.
13. The method of claim 12, further comprising transferring the
relaxed islands of the first group and the relaxed islands of the
second group to an intermediary medium prior to transferring the
relaxed islands of the first group and the relaxed islands of the
second group to the growth medium.
14. A method for the collective manufacture of a plurality of
optoelectronic devices comprising active layers of varying
composition, comprising: providing a growth substrate comprising a
first group of crystalline semiconductor islands having a first
lattice parameter and a second group of crystalline semiconductor
islands having a second lattice parameter that is different from
the first lattice parameter; exposing the growth substrate to an
atmosphere comprising an initial concentration of an atomic element
to form a first active layer incorporating the atomic element in a
first concentration on the islands of the first group and to form a
second active layer incorporating the atomic element in a second
concentration on the islands of the second group, the second
concentration being different from the first concentration.
15. The method of claim 14, wherein the crystalline semiconductor
islands comprise a III-N material.
16. The method of claim 15, wherein the crystalline semiconductor
islands comprise InGaN.
17. The method of claim 14, wherein the atmosphere comprises one or
more precursor gases selected from the group consisting of
trimethylgallium (TMGa), triethylgallium (TEGa), trimethylindium
(TMIn), and ammonia.
18. The method of claim 14, wherein the atomic element is
indium.
19. The method of claim 18, wherein the first and the second active
layers comprise an n-doped InGaN layer, a multiple quantum well,
and a p-doped InGaN or GaN layer.
20. A growth substrate for forming optoelectronic devices,
comprising: a growth medium; and a first group of crystalline
semiconductor islands having a first lattice parameter and a second
group of crystalline semiconductor islands having a second lattice
parameter that is different from the first lattice parameter, the
first group of crystalline semiconductor islands and the second
group of crystalline semiconductor islands arranged on the growth
medium.
21. The growth substrate of claim 20, wherein the growth medium is
a silicon or sapphire wafer.
22. The growth substrate of claim 20, wherein the crystalline
semiconductor islands comprise III-N material.
23. The growth substrate of claim 22, wherein the crystalline
semiconductor islands comprise InGaN.
24. The growth substrate of claim 20, wherein the islands have a
circular, square, triangular, or hexagonal shape.
25. The growth substrate of claim 20, further comprising at least a
third group of crystalline semiconductor islands having a third
lattice parameter that is different from the first lattice
parameter and the second lattice parameter.
26. The growth substrate of claim 20, wherein each island of the
first group is placed next to an island of the second group to form
a pixel.
27. A monolithic micro-panel of light-emitting diodes comprising a
panel support and a plurality of LEDs arranged on the panel
support, wherein the plurality of LEDs comprises: a first group of
LEDs capable of directly emitting a light radiation having a first
wavelength; and a second group of LEDs capable of directly emitting
a light radiation having a second wavelength that is different from
the first wavelength.
28. A micro-display screen comprising an assembly including a
monolithic micro-panel of light-emitting diodes as recited in claim
27 and a pilot circuit, wherein the pilot circuit comprises a
plurality of LED driving circuits, each driving circuit being in
contact with one LED of the plurality of LEDs of the monolithic
micro-panel of light-emitting diodes.
Description
PRIORITY CLAIM
[0001] This application claims the benefit of the filing date of
French Patent Application Serial No. 1752230, filed Mar. 17, 2017,
for "Growth Substrate for Forming Optoelectronic Devices, Method
for Manufacturing Such a Substrate, and Use of the Substrate, in
Particular in the Field of Micro-Display Screens."
TECHNICAL FIELD
[0002] The present invention relates to a growth substrate for
forming optoelectronic devices as well as a method for
manufacturing this substrate. It also applies to the use of this
substrate for the collective manufacture of devices having
optoelectronic properties that can be different from one another.
The invention can particularly be applied in the field of
micro-display screens.
BACKGROUND
[0003] The documents EP2151852 and EP2151856 disclose a technology
intended to form, on a substrate, islands of relaxed or partially
relaxed crystalline semiconductor material. These islands can be
used for the collective manufacture of light-emitting diodes
(LEDs), as explained in detail in document EP2865021, for
example.
[0004] Multiple products combine LEDs emitting at various
wavelengths to form a colored light point. This is among others,
the case for display screens that enable an image consisting of
pixels to be formed, each pixel combining a red, a green, and a
blue LED, whose emission can be controlled individually to form a
light point of the selected color, by combining light
emissions.
[0005] The LEDs that are combined to form the pixel are generally
not manufactured from the same materials and using the same
technologies. Thereby, blue or green LEDs may consist of nitride
(with the general formula InGaN) and red LEDs of phosphide (with
the general formula AlGaInP). Manufacturing a screen involves the
assembly of the diodes, one-by-one, to form the pixels of the final
device, e.g., using a pick-and-place technique.
[0006] Since the materials do not have the same properties, the
characteristics pertaining to the aging, thermal/electrical
behavior, and/or efficiency of the devices that use them are
generally very different. These variabilities must be taken into
account when designing a product that includes LEDs consisting of
different materials, which may sometimes render the design very
complex.
[0007] Other solutions provide for forming the pixels from diodes
that are all identical, manufactured on the same substrate and/or
using the same technology. Monolithic micro-LED panels having a
reduced size and a high resolution can then be realized. By way of
example of such a realization, one may refer to the document
entitled "360 PPI Flip-Chip Mounted Active Matrix Addressable Light
Emitting Diode on Silicon (LEDoS) Micro-Displays," Zhao Jun Liu et
al., Journal of Display Technology, April 2013. The light radiation
emitted by the micro-panel's LEDs can be chosen in the ultraviolet
range and selectively converted, from one diode to another, to
various wavelengths in order to correspond to red, green, and blue
light emissions so as to form a color screen. This conversion can
be achieved by placing a phosphorescent material on the emitting
face of the LEDs. However, the conversion consumes light energy,
which reduces the quantity of light emitted by each pixel and thus
the efficiency of the display device. It also requires dispensing
the phosphorescent materials on the emitting surfaces of the LEDs,
which renders the manufacturing method of these micro-panels more
complex.
[0008] In order to overcome the limitations discussed above, it
would be desirable to be able to simultaneously manufacture, on the
same substrate, using the same technology, LEDs capable of emitting
in different wavelengths. More generally, it would be advantageous
to collectively manufacture devices having optoelectronic
properties that are different one from another.
BRIEF SUMMARY
[0009] In view of achieving one of these goals, in a first aspect,
the invention provides a method for manufacturing a plurality of
crystalline semiconductor islands having a variety of lattice
parameters, wherein the method includes the following steps: [0010]
providing a substrate that comprises a medium, a flow layer
disposed on the medium and, arranged on the flow layer, a plurality
of strained crystalline semiconductor islands having an initial
lattice parameter; [0011] selectively treating the strained islands
so as to form a first group of strained islands having a first
lateral expansion potential, and a second group of strained islands
having a second lateral expansion potential that is different from
the first; [0012] heat-treating the substrate at a temperature that
is higher than or equal to the glass transition temperature of the
flow layer to cause differentiated relaxation of the islands of the
first and second groups, the lattice parameters of the first group
of relaxed islands and of the second group of relaxed islands then
have different values.
[0013] According to other advantageous and non-restrictive
characteristics of the invention, taken either separately or in any
technically feasible combination: [0014] the crystalline
semiconductor islands are made of III-N material; [0015] the
selective treatment includes the formation of a stiffening layer
having a first thickness on the first group of strained islands and
having a second thickness on the second group of strained islands;
[0016] the selective treatment includes the formation of an initial
stiffening layer of uniform thickness on the first and second
groups of strained islands; and the thinning or thickening of the
initial stiffening layer on the first group of islands or on the
second group of strained islands; [0017] the selective treatment
includes the formation, on the first group of islands, of a
stiffening layer formed from a first material and the formation, on
the second group of islands, of a stiffening layer formed from a
second material that is different from the first material; [0018]
the stiffening layer is formed from a material chosen from the
group consisting of silicon oxide and silicon nitride; [0019] the
selective treatment includes the reduction in thickness of the
islands of the first group and/or of the islands of the second
group, so that they have different thicknesses; [0020] the method
includes a preliminary heat treatment step performed on the
substrate before the selective treatment step is performed on the
strained islands; [0021] the method includes an additional heat
treatment step performed on the substrate after the selective
treatment step is performed on the strained islands; [0022] the
method includes a new selective treatment step performed on the
strained islands between the heat treatment step and the additional
heat treatment step; [0023] the heat treatment and, if used, the
preliminary and additional heat treatment steps are performed at a
temperature ranging from 400.degree. C. to 900.degree. C.; [0024]
the method includes a step during which relaxed islands of the
first group and relaxed islands of the second group are transferred
to a growth medium; [0025] the transfer step includes carrying over
the relaxed islands of the first group and the relaxed islands of
the second group to an intermediary medium.
[0026] In another aspect, the invention provides a method for the
collective manufacture of a plurality of optoelectronic devices
comprising active layers of varying composition, wherein the method
includes the following steps: [0027] providing a growth substrate
that comprises a first group of crystalline semiconductor islands
having a first lattice parameter and a second group of crystalline
semiconductor islands having a second lattice parameter that is
different from the first; [0028] exposing the growth substrate to
an atmosphere comprising an initial concentration of an atomic
element to form a first active layer incorporating the atomic
element in a first concentration on the islands of the first group
and to form a second active layer incorporating the atomic element
in a second concentration, which is different from the first
concentration, on the islands of the second group.
[0029] According to other advantageous and non-restrictive
characteristics, taken either separately or in any technically
feasible combination: [0030] the crystalline semiconductor islands
are made of III-N material; [0031] the crystalline semiconductor
islands are made of InGaN; [0032] the atmosphere is formed from
precursor gases including trimethylgallium (TMGa), triethylgallium
(TEGa), trimethylindium (TMIn), and ammonia; [0033] the atomic
element is indium; [0034] the first and the second active layers
comprise an n-doped InGaN layer, a multiple quantum well, a p-doped
InGaN or a GaN layer.
[0035] In yet another aspect, the invention provides a growth
substrate for forming the optoelectronic devices comprising a
growth medium and, placed on the growth medium, a first group of
crystalline semiconductor islands having a first lattice parameter
and a second group of crystalline semiconductor islands having a
second lattice parameter that is different from the first.
[0036] According to other advantageous and non-restrictive
characteristics of this growth substrate, taken either separately
or in any technically feasible combination: [0037] the growth
medium is a silicon or sapphire wafer; [0038] the crystalline
semiconductor islands are made of III-N material; [0039] the
crystalline semiconductor islands are made of InGaN; [0040] the
islands have a circular, square, triangular, or hexagonal shape;
[0041] the growth substrate comprises at least one third group of
islands having a third lattice parameter that is different from the
first and second; [0042] each island of the first group is placed
next to an island of the second group to form a pixel.
[0043] The invention further provides a monolithic micro-panel of
light-emitting diodes comprising a panel support and a plurality of
LEDs mounted on the panel support, wherein the plurality of LEDs
includes at least: [0044] a first group of LEDs capable of directly
emitting a light radiation having a first wavelength and; [0045] a
second group of LEDs capable of directly emitting a light radiation
having a second wavelength that is different from the first.
[0046] Lastly, the invention provides a micro-display screen
comprising an assembly consisting of a monolithic micro-panel as
provided above and a pilot circuit, wherein the pilot circuit
comprises a plurality of LED driving circuits, each driving circuit
being in contact with one LED of the monolithic micro-panel's
plurality of LEDs.
BRIEF DESCRIPTION OF THE DRAWINGS
[0047] Further characteristics and advantages of the invention will
be clear from the detailed description of the invention, made in
reference to the accompanying drawings, among which:
[0048] FIGS. 1a and 1b schematically show a cross-section and a top
view of a growth substrate according to the invention;
[0049] FIGS. 2a, 2b, and 2c show an example of how the crystalline
semiconductor islands can be arranged and distributed on the
surface of a growth medium; and
[0050] FIGS. 3a to 3e show a method for manufacturing a growth
substrate according to the invention.
DETAILED DESCRIPTION
Growth Substrate
[0051] In a first aspect, the present disclosure relates to a
growth substrate 1 for forming optoelectronic devices. FIGS. 1a and
1b schematically show, respectively, a cross-section and a top view
of such a substrate. The growth substrate 1 is intended to be
placed in deposition equipment, such as an epitaxy frame, in order
to form active layers of optoelectronic components on the exposed
surface of the substrate 1. The substrate 1 can also serve as a
mechanical support allowing for devices to be manipulated during
further manufacturing steps (formation of electrical contacts,
isolation of one device from the other, etc.) leading to the
achievement of a functional device.
[0052] The growth substrate 1 includes a growth medium 2. This can
be a circular wafer of material(s), e.g., silicon or sapphire, of
standardized dimensions, e.g., 2 inches (50 mm), 4 inches (100 mm)
or even 8 inches (200 mm) in diameter. However, the disclosure is
in no way restricted to these dimensions or this shape.
[0053] The nature of the growth medium 2 is generally selected so
as to be able to withstand treatments (such as depositions, heat
treatments, etc.) implemented when manufacturing the actual growth
substrate 1 and when manufacturing optoelectronic devices.
Preferably, the growth medium 2 has a thermal expansion factor
similar or close to that of the materials that will form the useful
layer of the optoelectronic device so as to limit the significant
strains that could damage these devices following their
production.
[0054] The growth substrate 1 also comprises a plurality of
crystalline semiconductor islands 3 (hereinafter simply referred to
as "island(s)"), placed on the growth medium 2. Each island 3 is
intended to carry the active layers of an optoelectronic device,
such as an LED, a laser or a photovoltaic cell. To this end, the
islands 3 can be made of III-N materials. For the formation of
nitride-based LEDs, the islands 3 can thus consist of InGaN, in
which the indium proportion may vary between 1.5% and 8%.
[0055] The term "island" refers to a block of material that is
entirely separate from the other islands arranged on the growth
medium 2. The term "crystalline" means that the atoms making up an
island 3 are assembled in an orderly manner to form a block of
monocrystalline material, the block may nevertheless comprise
arrangement defects such as dislocation, slip plane or point
defects.
[0056] The islands 3 are separated one from another by trenches 4.
The trenches 4 may have a lateral dimension, separating two islands
3, ranging from 1 to 50 microns (e.g., about 20 microns). Each
island 3 has a relatively reduced size in relation to the growth
substrate. For example, each island 3 may have a largest dimension
of from 1 micron to 1 mm, depending on the intended final
application. Each island 3 can have any shape, e.g., circular,
square, triangular, hexagonal or rectangular, when viewed from
above. Each island 3 may have a thickness of about 200 nm or less,
particularly when it consists of InGaN. The islands 3 can all be of
identical or different shapes and dimensions.
[0057] As will be made apparent in the description of the
manufacturing method for the growth substrate 1, all islands 3
consist of the same material. However, according to the present
disclosure, the islands 3 do not all have the same lattice
parameter. Thus, a first group of islands 3a has a first lattice
parameter and a second group of islands 3b has a second lattice
parameter that is different from the first lattice parameter.
[0058] Since the materials of the islands 3 are identical to each
other, the existence of a difference in the lattice parameter
indicates the existence of a different stain state between the
islands 3 that make up the two groups 3a and 3b.
[0059] This characteristic of the growth substrate 1 will be used
advantageously to collectively manufacture optoelectronic devices
that have distinct optical (e.g., light) properties, using a single
manufacturing technology and on a single growth substrate.
[0060] As an example, on the first group of islands 3a that has the
first lattice parameter, it will be possible to form a first LED
that directly emits at a first wavelength, e.g., in the green
range, and on the second group of islands 3b that has the second
lattice parameter, a second LED directly emitting at a second
wavelength, e.g., in the blue range. The terms "directly emitting"
are used to indicate that the emission corresponds to the light
radiations emitted by an LED's active layers (quantum wells),
without needing to use phosphorus conversion.
[0061] It may also be provided that the growth substrate 1
comprises at least one third group of islands, this third group of
islands having a third lattice parameter that is different from the
first and the second. Generally, the growth substrate 1 may
comprise any number of island groups, each group being formed by
islands having a lattice parameter that is different from that of
the islands belonging to other groups. In this way, it will be
possible to obtain a growth substrate 1 allowing the formation of
LEDs emitting in the range of red, green, blue, and infrared
wavelengths on the same substrate using a single technology.
[0062] The distribution and arrangement of the groups of islands
3a, 3b on the surface of the growth medium 2 is not an essential
characteristic of the disclosure, and all possible distributions
and arrangements are contemplated. Distribution and arrangement may
sometimes be dictated by the application under consideration.
[0063] A first example of a distribution and arrangement of the
first and second groups of islands 3a, 3b on the surface of the
medium 2 has thus been represented on FIGS. 1a and 1b. In this
example, the first group of islands 3a occupies a first area of the
medium 2 and the second group of islands 3b a second area of the
medium 2, which are separate one from the other and adjacent to
each other.
[0064] One can advantageously choose to place the islands 3, 3',
3'' of a first, second, and third group of islands next to each
other, which would allow the respective formation of LEDs emitting
in different colors, e.g., red, green, and blue, respectively. This
arrangement has been represented schematically in FIG. 2a. Such a
combination of LEDs constitutes a bright pixel P whose emission
color can be controlled. The islands 3, 3', 3'' that will carry the
LEDs constituting these pixels P can be arranged in a regular
manner on the surface of the growth medium 2 (FIG. 1a). Monolithic
pixels P may thus be formed, i.e., placed on the same substrate and
handleable as a pixel, e.g., by a component insertion device, in
order to be included in a functional device.
[0065] In the case where the formation of a monolithic micro-panel
of LEDs is aimed, e.g., for a color micro-display screen, the
pixels P could, for example, be distributed evenly according to
lines and rows to form a matrix M, as represented in FIG. 2b. A
growth substrate 1 may comprise a plurality of such matrices M, as
represented in FIG. 2c.
[0066] Returning to the description of FIGS. 1a and 1b, and beyond
the growth medium 2 and the crystalline semiconductor islands 3,
the growth substrate 1 may comprise other elements or other layers.
It may thus be provided that at least one assembly layer 5 is used
to facilitate the manufacturing of the growth substrate 1, as will
be described below. This assembly layer 5 may be a silicon oxide or
silicon nitride layer, or may consist of a stack of such
layers.
Method for Manufacturing a Growth Substrate
[0067] With reference to FIGS. 3a to 3e, disclosed is an example of
a method for manufacturing a growth substrate according to the
disclosure.
[0068] The method implements the principles of the crystalline
semiconductor island transfer and relaxation technology, such as
they are described in documents EP 2151852, EP 2151856 or FR
2936903.
[0069] Recalling that, according to an exemplary implementation
that complies with this approach, one starts by forming a strained
crystalline semiconductor layer on a donor substrate. This layer is
then transferred to a substrate comprising a flow layer by bonding
and by thinning and/or fracturing the donor substrate. The islands
are then defined in the transferred layer, and a heat treatment is
subsequently performed on the substrate and the islands at a
temperature that is higher than the viscosity transition
temperature of the flow layer, which may consist of
borophosphosilicate glass (BPSG), for example, which leads to at
least partial relaxation of the islands. The degree of relaxation
achieved following the relaxation heat treatment can reach 70% to
80% of the maximum degree of relaxation corresponding to the
achievement of a perfectly relaxed layer. This degree of relaxation
depends on the thickness of the islands, as well as on the duration
and extent of the heat treatment.
[0070] To assist this relaxation and prevent an island warpage
phenomenon during the plastic deformation that takes place during
relaxation, a stiffening layer may be formed on the islands prior
to applying the relaxation heat treatment. As explained in detail
in the document entitled "Buckling Suppression of SiGe Islands on
Complaint Substrates," Yin et al. (2003), Journal of Applied
Physics, 94(10), 6875-6882, the degree of relaxation of an island
achieved after this heat treatment step is that which balances the
strains in the stiffening layer and in the island. Note that the
stiffening layer can be formed from (or include) a residue of the
donor substrate that would have been preserved on the strained
layer following its transfer to the flow layer.
[0071] The present disclosure takes advantage of the relaxation
phenomenon to provide a method for manufacturing a plurality of
crystalline semiconductor islands having a variety of lattice
parameters.
[0072] As shown in FIG. 3a, the manufacturing method according to
the disclosure includes the supply of a relaxation substrate
comprising a relaxation medium 7, a flow layer 8 disposed on the
medium 7 and, arranged on the flow layer 8, a plurality of strained
crystalline semiconductor islands 9. The strained islands 9 all
have the same lattice parameter. One can refer to the
above-mentioned documents regarding the state of the art to choose
the composition and configuration of the relaxation medium 7 and of
the flow layer 8.
[0073] The strained islands 9 may come from a donor substrate and
may have been transferred to the flow layer 8 of the relaxation
substrate 6 using the bonding and thinning steps briefly mentioned
above. As an example, the donor substrate may consist of a sapphire
base medium, a GaN buffer layer formed on the base substrate, and
an InGaN strained layer with a proportion of indium ranging from
1.5% to 10% on the GaN buffer layer. Traditional photolithography,
resin depositing, and etching steps may have been used to define
the strained InGaN islands 9 from the continuous InGaN layer. These
steps may have been applied before or after the transfer steps. As
mentioned above, the islands 3 may carry a stiffening layer 10'
that is a residue of the donor substrate. Stiffening layer 10'
could be the GaN from 10 nm to 100 nm thick that initially formed
the buffer layer of the donor substrate.
[0074] Regardless of the manner in which the relaxation substrate 6
may have been formed, in a subsequent step of the manufacturing
method, the strained islands 9 of the relaxation substrate are
treated selectively so as to form a first group of strained islands
9a having a first lateral expansion potential and a second group of
strained islands 9b having a second lateral expansion potential
that is different from the first. In other terms, the strain energy
contained in an island of the first group of strained islands 9a is
different from the strain energy contained in an island of the
second group of strained islands 9b.
[0075] Such selective treatment may include the formation of a
stiffening layer 10 having a first thickness on the first group of
strained islands 9a of the relaxation substrate 6 and having a
second thickness on the second group of strained islands 9b. This
arrangement is represented in FIG. 3c.
[0076] This thickness configuration of the stiffening layer 10 may
be achieved by forming an initial stiffening layer 10' of uniform
thickness on all islands 9, as shown in FIG. 3b, and then by
selectively thinning this layer 10' to reduce its thickness on one
of the two groups of islands 9a, 9b. Again, lithographic
photo-masking steps can be used to protect the stiffening layer 10
disposed on one of the two island groups 9a, 9b against this
thinning treatment. As an alternative to thinning, one can also
choose to thicken the initial stiffening layer 10' on one of the
two island groups 9a, 9b to end up with the configuration in FIG.
3c. As discussed above, this stiffening layer 10' of uniform
thickness can consist of a residue of the donor substrate.
[0077] As an alternative or in addition, rather than modifying the
thickness of the stiffening layer 10 or one island group in
relation to another, one can choose to vary its nature. One can
thus have a stiffening layer 10 formed from a first material on a
first group of islands 9a and a stiffening layer 10 formed from a
second material having a stiffness or rigidity that is different
from the first material on the second group of islands 9b. In this
case, the stiffening layer 10 may have a uniform thickness from one
group of strained islands 9a, 9b to another.
[0078] For reasons of availability and cost, the stiffening layer
10 is typically composed of a silicon oxide or a silicon nitride.
In additional embodiments, the stiffening layer 10 may be any other
material that is sufficiently rigid to modify the lateral expansion
potential of the island 9 on which it rests and potentially reduce
or prevent the warpage of this island 9 during the relaxation heat
treatment that follows. According to the nature of this layer and
on the expected degree of relaxation of the island 9 on which it is
disposed, the stiffening layer 10 can have a thickness ranging from
10 nm to several hundreds of nm, such as 200 nm.
[0079] In some embodiments, certain islands 9 may not be coated
with a stiffening layer 10. This is particularly the case when the
island's degree of strain is relatively low and, thus, when the
risk of warpage of the island is low.
[0080] The selective treatment aiming to affect the lateral
expansion capacity of the islands 9 in a differentiated manner may
also include the thinning of certain islands 9, i.e., reducing the
thickness of the islands 9a of the first group and/or the thickness
of the islands 9b of the second group of islands so that these
islands 9a, 9b have different thicknesses following this treatment.
This may, for example, include thinning at least one group of
islands 9a, 9b, by 10% to 50% of its initial thickness in order to
create a difference in thickness between the groups of islands that
can be greater than 10%.
[0081] Any two or more of the selective treatments that have just
been described may be combined with one another in some
embodiments. In all cases, following this treatment aiming to form
at least two groups of islands 9a, 9b, there is a first group of
islands 9a having at least one characteristic (thickness, thickness
or nature of a carried stiffening layer) that differs from the
characteristic of a second group of islands 9b. Consequently, they
have a differing lateral expansion potential or capacity.
[0082] In a subsequent step of the manufacturing method, shown in
FIG. 3d, the relaxation substrate 6 is heat-treated at a
temperature that is higher or equal to the glass transition
temperature of the flow layer 8. According to the nature of flow
layer 8, this heat treatment may include exposing the relaxation
substrate 6 to a temperature comprised between 400.degree. C. and
900.degree. C. for a period ranging from a few minutes to several
hours. This is particularly the case when the flow layer consists
of BPSG. Proceeding in this way causes the relaxation of the
strained islands 9 of the first and second groups of islands 9a, 9b
to form at least partially relaxed islands 3, shown in FIG. 3e. As
has been well documented, the degree of relaxation achieved during
and following the relaxation heat treatment depends on the
thickness of the island 9, the thickness and/or on the nature of
the stiffening layer 10 that may possibly cover this island 9.
[0083] The strained islands of the first group 9a and the strained
islands of the second group 9b have different characteristics and
thus a different lateral expansion potential, the heat treatment
leads to relaxing, to varying degrees, the initially strained
islands 9 of the first and second group 9a, 9b. In other terms,
following the relaxation heat treatment, the lattice parameter of
the islands 3 of the first group 3a is different from the lattice
parameter of the islands 3 of the second group 3b.
[0084] To reach the right level of relaxation and the target
lattice parameter for each of the groups of islands 3a, 3b, the
relaxation heat treatment step may be repeated in some
embodiments.
[0085] For example, a preliminary relaxation heat treatment step
may be provided prior to selectively treating the islands 9 in view
of differentiating them. In this case, all the islands 9 are
relaxed to the same degree of relaxation. It may also be provided
that the thickness of the islands 9 is modified or that the
stiffening layer 10 of the first group and/or of the second group
of islands 3a, 3b, or of any other group of islands, is thinned or
thickened prior to applying an additional relaxation heat treatment
step. In this way, the lattice parameters of the islands 3 arranged
on the relaxation substrate 6 may be refined by repeating a cycle
of selective treatment of the islands and of application of a
relaxation heat treatment. As has already been mentioned, more than
two groups of islands 3a, 3b may be formed and processed as
described herein.
[0086] Generally, any step aiming to modify a characteristic of a
group of strained islands 9a, 9b affecting the lateral expansion
capacity of the islands may be combined with relaxation heat
treatment steps, so that each island has a lattice parameter that
is close or identical to a target lattice parameter following this
treatment.
[0087] Following the manufacturing method described above, the
relaxed islands 3 may be transferred to another medium. This
transfer may include carrying the islands 3 over to an intermediary
medium prior to transferring them to the other medium. For example,
one can choose to transfer the islands 3 to a growth medium 2,
possibly via an assembly layer 5, which would then allow having a
growth substrate 1 such as has been described above and shown in
FIG. 1a. A growth substrate that does not contain any flow layer is
thus obtained, since the flow layer may be incompatible with the
steps required to manufacture the active layers of the
optoelectronic devices. Moreover, in the case where the islands are
composed of a polar material, this transfer allows retrieving the
initial polarity of this material, such as it had been formed on
the donor substrate, from the exposed face of the growth medium
1.
Method for Manufacturing a Plurality of Optoelectronic Devices
[0088] According to another aspect, the disclosure also relates to
a method for the collective manufacture of a plurality of
optoelectronic devices. According to the disclosure, these devices
each comprise active layers that may be different from one device
to another. The devices then have optoelectronic properties that
differ from each other. The term "collective manufacturing" is used
to mean that the manufacture of these devices uses a single
technology applied to a single substrate to form the active
layers.
[0089] This method includes supplying a growth substrate 1 in line
with the general description provided above. It therefore at least
comprises a first group of crystalline semiconductor islands 3a
having a first lattice parameter and a second group of crystalline
semiconductor islands 3b having a second lattice parameter that is
different from the first lattice parameter.
[0090] The following step is aimed at forming the active layers by
growth on the exposed face of the islands 3. As is well known as
such, to achieve this, the growth substrate is placed in a
deposition chamber, e.g., that of an epitaxy frame. During
deposition, streams of precursor gases flow through such a chamber,
these gases comprising the atomic elements that compose the active
layers to be deposited on the islands 3. The precursor gases are
heated to a temperature above the growth substrate 1 so as to free
the atomic elements and to enable their adsorption on the surface
of the growth substrate 1 and, in particular, on the surface of the
islands 3. According to the nature, the relative concentration, and
the period during which these precursor gases circulate, the nature
and the thickness of these layers, which are progressively formed
on the crystalline semiconductor islands 3, can be controlled. If
this is necessary, it may be provided that p-type or n-type doping
agents are introduced in the chamber to form doped layers. In
particular, the precursor gases can be controlled to form active
layers of electronic devices, such as quantum wells or LED
heterostructures, on the islands.
[0091] By way of example, an active layer of LEDs may include the
following layer stack on an island 3 composed of InGaN having an In
concentration ranging from 1.5% to 10%, and at least partially
relaxed (typically to the order of 70%): [0092] an n-doped InGaN
layer having an In concentration similar to that of the island 3;
[0093] a multiple quantum well comprising a plurality of layers,
each layer comprising a distinct proportion of indium, having a
difference of a few percentage points in relation to that of the
underlying n-doped layer. The quantum well is capable of emitting a
light radiation of a wavelength selected according to the nature of
the layers that it consists of; [0094] a p-doped InGaN layer having
an In concentration ranging from 0 to 10%. To simplify its
manufacturing, the p-doped layer may be formed from GaN.
[0095] The precursor gases used to form these active layers of LEDs
can include trimethylgallium (TMGa), triethylgallium (TEGa),
trimethylindium (TMIn), and ammonia (NH.sub.3).
[0096] The incorporation of certain atomic elements of the
precursor gases in the deposited layer is affected by the lattice
parameter of this layer. This is particularly the case for what
concerns the incorporation of indium in an InGaN layer, as has been
reported in the document entitled "Strain Effects on Indium
Incorporation and Optical Transitions in Green-Light InGaN
Heterostructures of Different Orientations," by M. V. Durnev et
al., Phys. Status Solidi A 208, No. 11, 2671-2675 (2011). It
appears that the solubility of indium in a material increases as
the lattice parameter of this material increases. In other words,
all other things being equal, the incorporation of indium in a
material during its formation by deposition increases with the
lattice parameter of the material into which it is
incorporated.
[0097] The present disclosure takes advantage of this observation
to form the growth substrate 1 of the active layers of a plurality
of optoelectronic devices, these active layers may be different
from one device to another. The method generally implements a step
in which the growth substrate 1 is exposed to an atmosphere
comprising at least one initial concentration of an atomic
element.
[0098] On the islands 3 of the first group of islands 3a of the
growth substrate 1, which has a first lattice parameter, the atomic
element is incorporated in the active layer in a first
concentration. On the islands 3 of the second group of islands 3b,
which has a second lattice parameter that is different from the
first lattice parameter, the atomic element is incorporated in the
active layer according to a second concentration that is different
from the first. If the second lattice parameter is greater than the
first, the second concentration will be greater than the first
concentration.
[0099] In other words, the first and second concentrations are
determined by the initial concentration of the atomic species in
the chamber and by the first and the second lattice parameters of
the islands. As is well-known in the field of material growth,
other parameters may also influence the nature of the layers that
are formed as, for example, the partial pressure of the chamber,
the temperature, the respective flow of the precursor gases,
etc.
[0100] By providing a growth substrate for which the first and the
second lattice parameters have been adequately selected, it is
possible to form active layers having different optoelectronic
properties. By way of example, the proportion of indium
incorporated in the InGaN active layers deposited on the islands of
the first group of islands may lead to the formation of LEDs
directly emitting a radiation within the blue range. At the same
time, the proportion of indium incorporated in the InGaN active
layers deposited on the islands of the second group of islands can
lead to the formation of LEDs directly emitting a radiation within
the green range.
[0101] Once the active layers have been formed on the islands, one
can proceed with the method of manufacturing electronic devices, in
particular to form the electrical contacts and to isolate the
devices one from another, as is described in U.S. Pat. No.
9,478,707, for example. It may also be provided that the islands 3
coated with their active layers are carried over to an LED support
and that the growth medium 2 is eliminated.
Application to the Manufacturing of a Monolithic Micro-Panel of
LEDs and to a Micro-Display Screen
[0102] A specific application of the growth substrate and of the
collective manufacturing method described above aims to manufacture
a monolithic micro-panel of LEDs.
[0103] Such a micro-panel consists in an arrangement of LEDs,
generally all identical and of very small size, arranged into rows
and columns at a constant pitch on a panel support. When the LEDs
have been manufactured collectively, the micro-panel is said to be
"monolithic." This characteristic is advantageous, since the LEDs
then have very similar properties (such as the current and/or
voltage behavior, changes with ageing, etc.), which facilitates the
design and the manufacturing of the micro-panel. Within the scope
of the present disclosure, a micro-panel in which all the LEDs have
been manufactured collectively and extracted collectively from the
same manufacturing medium to form the micro-panel will be
designated as a "monolithic micro-panel"; or as "a micro-panel
consisting of monolithic pixels," i.e., each pixel consists of LEDs
manufactured collectively and extracted collectively from the same
manufacturing medium. In this case, the monolithic pixels are
assembled together so as to form the micro-panel.
[0104] The monolithic micro-panel of LEDs can be assembled with a
pilot circuit using a "flip-chip" technology, which allows
performing the electrical connection of each LED of the micro-panel
with a driving circuit of the pilot circuit. This assembly process
may involve assembling an entire monolithic micro-panel with a
pilot circuit, each LED of the micro-panel being associated with a
driving circuit after assembly. In other embodiments, the assembly
process may involve successively assembling one or a plurality of
monolithic pixels to the pilot circuit to associate them with the
pilot circuit. Regardless of the chosen approach, a monolithic
micro-display screen is formed when proceeding in this way.
[0105] Since the LEDs all have identical or similar electrical
properties, the driving circuits of the pilot circuit may also have
identical or similar electrical properties, which facilitates the
manufacturing of the micro-display screen.
[0106] A detailed discussion of this device and its manufacturing
method can be found in "Monolithic LED Microdisplay on Active
Matrix Substrate Using Flip-Chip Technology," Liu et al., IEEE
Journal of Selected Topics in Quantum Electronics (Vol. 15, Issue
4, July-August. 2009).
[0107] Known monolithic micro-panels all consist of LEDs directly
emitting a single wavelength thus enabling monochrome display.
Color display is achieved via the phosphorus conversion placed on
the emitting face of some of these LEDs, or by optically combining
a plurality of micro-panels each emitting a radiation chosen in a
combination of complementary colors, e.g., red, green and blue.
These techniques are not advantageous for obvious reasons of
complexity of implementation, of efficiency, and of density, as has
been previously discussed herein.
[0108] On the contrary, the methods and substrates according to the
present disclosure can be used to provide a monolithic micro-panel
of LEDs comprising a panel support and a plurality of LEDs arranged
on this panel. The plurality of LEDs includes a first group of LEDs
capable of directly emitting a light radiation having a first
wavelength and a second group of LEDs capable of directly emitting
a second light radiation having a second wavelength that is
different from the first wavelength.
[0109] A micro-panel according to the disclosure is, thus, capable
of emitting different colors without needing to optically combine a
plurality of micro-panels or to apply conversion means. For
applications in the field of color displays, the micro-panel
comprises at least three groups of LEDs, each group emitting a
wavelength that is different from that of the others. There can,
for example, be a first group of LEDs directly emitting in the red,
a second group of LEDs directly emitting a radiation in the green,
and a third group of LEDs directly emitting a radiation in the
blue. Having a fourth group of LEDs directly emitting in the
infrared can also be considered, this illumination being used to
provide additional features to the device in which the micro-panel
is integrated (tactile function, eye iris recognition, motion
sensing, etc.).
[0110] For applications in the field of color displays, the LEDs of
each group are arranged evenly on the panel support, e.g., spaced
at a constant pitch along rows and columns in order to form a
display matrix. The LEDs are also arranged side-by-side, or more
precisely, in close proximity to each other, an LED of each group
so as to form a bright pixel, whose color can be controlled, in
each location of the matrix.
[0111] The micro-panel may consist of LEDs that can be used to form
a matrix of large-sized pixels, e.g., of 50 pixels by 50 pixels, or
of 200 pixels by 200 pixels, if not more.
[0112] Even though the bright pixels of the panel consist of LEDs
emitting in different wavelengths, these LEDs have been formed
collectively using a single technology and on a single substrate.
They thus have properties, and more specifically electrical and
ageing properties, that are very similar with each other, which
allows associating them with a pilot circuit consisting of driving
circuits that are all identical or very similar.
[0113] Now disclosed is an example of how a micro-panel and/or a
micro-display screen is prepared.
[0114] A growth substrate 1 comprising a growth medium 2 provided
with a silicon oxide assembly layer 3 is first prepared. The growth
medium 2 may, for example, consist of a silicon wafer 150 mm in
diameter. The growth substrate 1 includes three groups of InGaN
islands 3a, 3b, 3c containing 8% of indium. The islands 3a, 3b, 3c,
all have a thickness of 200 nm and a square shape of 50 microns on
a side. The first group of islands 3a has a lattice parameter of
0.3190 nanometers, the second group of islands 3b has a lattice
parameter of 0.3200 nanometers, and the third group of islands 3c
has a lattice parameter of 0.3205 nm. These target lattice
parameters have been chosen so that the collective manufacturing
step of the active layers of LEDs leads to the formation of LEDs
emitting radiations in the blue, green, and red.
[0115] The islands 3 that make up each of these groups are
distributed and arranged on the growth medium 2 according to a
matrix arrangement in line with what has been disclosed in relation
with the description of FIGS. 2a to 2c. Three islands 3, 3', and
3'' of each of the groups are thus arranged in close proximity to
each other so as to define a pixel, and these groupings of islands
are distributed according to a matrix along the rows and lines on
the surface of the growth substrate 1. Panel trenches 4' (FIG. 2c)
that are larger than the trenches 4 separating the two islands may
be provided to separate the matrices one from another, each matrix
delimiting a set of islands 3, 3', 3'' intended to carry the LEDs
of a micro-panel.
[0116] To manufacture this growth substrate 1, a relaxation
substrate 6 comprising a relaxation medium 7, e.g., made of
sapphire and also 150 mm, and a flow layer 8 consisting of BPSG are
first prepared. The relaxation substrate 6 also comprises strained
InGaN islands 9 containing 8% indium. These strained islands 9 are
arranged in a similar manner as what has been described above for
the relaxed islands 3 of the growth substrate 1. Likewise, the
lattice parameter of these strained islands 9 is 0.3185
nanometers.
[0117] The strained islands 9 are coated with an initial GaN
stiffening layer 10' having a thickness of 50 nm, which is a
residue of a GaN buffer layer of a donor substrate used to realize
the relaxation substrate. A relaxation heat treatment is performed,
for example, at 800.degree. C. for one hour. This treatment leads
to the relaxation of the initially strained islands 9 to form
partially relaxed islands 3 that have a lattice parameter close to
0.3190 nanometers following the relaxation heat treatment. If this
is not the case, the relaxation heat treatment can be applied
again, possibly by thinning the initial stiffening layer to promote
the relaxation of the islands 3.
[0118] Only the stiffening layer 10' that covers the islands 3 of
the second and third groups is then eliminated through etching, and
then the relaxation heat treatment is renewed. It may also be
provided that the islands 3 of the second and third groups are
thinned, e.g., by 40 nm, to promote their relaxation. Following the
treatment, the lattice parameter of the islands of the first group,
coated with the stiffening layer 10, has not changed much, e.g.,
close to 0.3190 nm. However, the lattice parameter of the islands
of the second and third groups has increased to close to 0.3200
nm.
[0119] In a subsequent step, only the islands of the third group
are thinned, e.g., by 70 nm, and the relaxation heat treatment is
applied again. The lattice parameters of the islands of the first
and second groups remain relatively constant and are in any case
less affected by this heat treatment than the lattice parameter of
the islands of the third group, which is then close to 0.3205
nm.
[0120] This final relaxation heat treatment can be renewed,
possibly in combination with a thinning of the stiffening layer
disposed on the islands of the first group or a thinning of the
islands of the second and third groups to make the lattice
parameters of these islands converge toward their target lattice
parameters.
[0121] In any event, repeating these steps leads to the selective
relaxation of the island groups and, following these steps, the
first group of islands 3a has a lattice parameter of, or close to,
0.3190 nanometers, the second group has a lattice parameter of, or
close to, 3.200 nanometers, and the third group has a lattice
parameter of, or close to, 3.205 nm.
[0122] The partially relaxed InGaN islands 3 are then carried over
by bonding on a growth medium 2 provided with an assembly layer 5,
e.g., a multilayer of silicon dioxide and nitride.
[0123] The resulting structure is then placed in a chamber of an
epitaxy frame, in which a set of precursor gases (TMGa, TMIn, and
NH.sub.3) is circulated in order to make active layers of
nitride-based LEDs grow on each of the islands.
[0124] The lattice parameters of the islands of the first group, of
the second group, and of the third group of islands being different
from each other, the incorporation of indium in the active layers
of InGaN that form on the islands of these groups also is
different. On the islands of the first group, LEDs directly
emitting radiation in the blue range are obtained, on the islands
of the second group LEDs directly emitting radiation in the green
range are obtained, and on the islands of the third group LEDs
directly emitting radiation in the red range are formed.
[0125] Following this deposition step, on the growth substrate 1,
there, thus, are active layers of LEDs arranged at the level of a
pixel and emitting colors in the red, green, and blue ranges.
[0126] The manufacturing of a functional LED on the growth
substrate can be completed, among others, by forming the LED
contacts on either side of the active layers.
[0127] If at this stage, monolithic micro-panels are desired, the
wafer on which the formed LEDs rest can be cut along the trenches
4' defining the pixel matrices. Each of these matrices then
constitutes a micro-panel.
[0128] Alternatively, the wafer comprising the micro-panels may
also be assembled with a second wafer on which pilot circuits,
consisting of a matrix of driving circuits, have been formed. Each
matrix is arranged on the surface of this wafer according to the
same arrangement as the LEDs on the growth substrate. The assembly
enables electrically contacting each diode with a driving circuit.
A plurality of display screens is constituted in a single
contacting step. It can then be decided that the growth medium 7 be
eliminated, e.g., by laser irradiation, and the assembly layer 8,
e.g., by chemical etching, so as to expose a light emission surface
of the LEDs. These surfaces can be prepared using optical surface
treatments or protection elements in order to improve the quality
and the robustness of the screen. The wafer can be cut out in a
conventional manner so as to isolate the screens from each other in
view of packaging them.
* * * * *