U.S. patent application number 15/454353 was filed with the patent office on 2018-09-13 for device for thickening a cryogenic slurry using cross-flow filtration.
The applicant listed for this patent is Larry Baxter, Stephanie Burt, Skyler Chamberlain, Nathan Davis, David Frankman, Steven Malone, Eric Mansfield, Kyler Stitt. Invention is credited to Larry Baxter, Stephanie Burt, Skyler Chamberlain, Nathan Davis, David Frankman, Steven Malone, Eric Mansfield, Kyler Stitt.
Application Number | 20180257007 15/454353 |
Document ID | / |
Family ID | 63445974 |
Filed Date | 2018-09-13 |
United States Patent
Application |
20180257007 |
Kind Code |
A1 |
Baxter; Larry ; et
al. |
September 13, 2018 |
Device for Thickening a Cryogenic Slurry using Cross-Flow
Filtration
Abstract
A device for thickening a cryogenic slurry is disclosed. The
device comprises a cryogenic slurry flow path, a cryogenic liquid
discharge path, and a filter medium between the cryogenic slurry
flow path and the cryogenic liquid discharge path. The cryogenic
slurry comprises a solid and a cryogenic liquid. The cryogenic
slurry is fed into the cryogenic slurry flow path, generally
tangential to the filter medium. This causes a portion of the
cryogenic liquid to cross the filter medium into the cryogenic
liquid discharge path as a cryogenic liquid discharge and the
cryogenic slurry to thicken to produce a thickened slurry. The
filter medium comprises a cryogenically-stable material such that
adsorption of gases is inhibited, deposition of solids is
prevented, and temperature-change induced expansion and contraction
of the filter medium is optimized.
Inventors: |
Baxter; Larry; (Orem,
UT) ; Mansfield; Eric; (Spanish Fork, UT) ;
Burt; Stephanie; (Provo, UT) ; Stitt; Kyler;
(Lindon, UT) ; Frankman; David; (Provo, UT)
; Chamberlain; Skyler; (Provo, UT) ; Davis;
Nathan; (Bountiful, UT) ; Malone; Steven;
(Manti, UT) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Baxter; Larry
Mansfield; Eric
Burt; Stephanie
Stitt; Kyler
Frankman; David
Chamberlain; Skyler
Davis; Nathan
Malone; Steven |
Orem
Spanish Fork
Provo
Lindon
Provo
Provo
Bountiful
Manti |
UT
UT
UT
UT
UT
UT
UT
UT |
US
US
US
US
US
US
US
US |
|
|
Family ID: |
63445974 |
Appl. No.: |
15/454353 |
Filed: |
March 9, 2017 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
F25J 3/08 20130101; B01D
25/302 20130101; B01D 39/20 20130101; B01D 39/2075 20130101; B01D
39/1692 20130101; B01D 17/00 20130101; B01D 25/215 20130101; B01D
17/10 20130101 |
International
Class: |
B01D 29/35 20060101
B01D029/35; B01D 29/56 20060101 B01D029/56; F25J 3/08 20060101
F25J003/08 |
Claims
1. A device for thickening a cryogenic slurry comprising: a
cryogenic slurry flow path, a cryogenic liquid discharge path, and
a filter medium between the cryogenic slurry flow path and the
cryogenic liquid discharge path, wherein the cryogenic slurry,
comprising a solid and a cryogenic liquid, is fed into the
cryogenic slurry flow path, generally tangential to the filter
medium, causing a portion of the cryogenic liquid to cross the
filter medium into the cryogenic liquid discharge path as a
cryogenic liquid discharge and the cryogenic slurry to thicken to
produce a thickened slurry; and, the filter medium comprising a
cryogenically-stable material such that adsorption of gases is
inhibited, deposition of solids is prevented, and
temperature-change induced expansion and contraction of the filter
medium is optimized.
2. The device of claim 1, wherein the cryogenically-stable material
comprises sintered ceramics, polytetrafluoroethylene,
polychlorotrifluoroethylene, natural diamond, man-made diamond,
chemical-vapor deposition diamond, polycrystalline diamond, or
combinations thereof.
3. The device of claim 1, wherein optimization of
temperature-change induced expansion and contraction of the filter
medium comprises decreasing expansion and contraction of the filter
medium to prevent damage to the filter medium or increasing
expansion and contraction of the filter medium to cause the filter
medium to become self-cleaning.
4. The device of claim 1, wherein the filter medium comprises a
sparger with openings comprising an effective diameter of at most
25 microns, a hole with a diameter of at most 25 microns, or a
combination thereof.
5. The device of claim 1, wherein a portion of the cryogenic slurry
flow path and a portion of the liquid discharge path are enclosed
perpendicular to the cryogenic slurry flow path and the liquid
discharge path by the cryogenically-stable material.
6. The device of claim 5, wherein the cryogenically-stable material
comprises sintered ceramics, polytetrafluoroethylene,
polychlorotrifluoroethylene, natural diamond, man-made diamond,
chemical-vapor deposition diamond, polycrystalline diamond, or
combinations thereof.
7. The device of claim 1, wherein the solid comprises carbon
dioxide, nitrogen oxide, sulfur dioxide, nitrogen dioxide, sulfur
trioxide, hydrogen sulfide, hydrogen cyanide, water, hydrocarbons
with a freezing point above the temperature of the cryogenic
liquid, or combinations thereof.
8. The device of claim 1, wherein the cryogenic liquid comprises
any compound or mixture of compounds with a freezing point below
the temperature at which the solid melts.
9. The device of claim 1, wherein the cryogenic slurry flow path is
provided with a back pressure by a restricted outlet for the
thickened slurry.
10. The device of claim 1, further comprising: a double-walled pipe
comprising an inner pipe and an outer pipe separated by a liquid
plenum; a space inside the inner pipe defining the cryogenic slurry
flow path; the inner pipe comprising cylindrical side walls forming
the filter medium, being perforated by at least one hole with a
diameter of less than 25 microns; the liquid plenum between the
outer pipe and the inner pipe defining the cryogenic liquid
discharge path; the cryogenic slurry is provided to the cryogenic
slurry flow path and thickened to produce the thickened slurry and
the cryogenic liquid discharge; the cryogenic liquid discharge is
removed through the cylindrical side walls and passes through the
liquid plenum; and, the thickened slurry is removed through an
outlet of the inner pipe.
11. The device of claim 10, wherein the double-walled pipe defines
a generally spiral flow pattern.
12. The device of claim 10, wherein the double-walled pipe defines
a u-tube bundle pattern.
13. The device of claim 1, wherein: the device comprises a head
plate, a slurry plate, an end plate, and the filter medium, the
filter medium further comprising a first filter plate and a second
filter plate; the first filter plate is secured between the head
plate and a first face of the slurry plate; the second filter plate
is secured between a second face of the slurry plate and the end
plate; the cryogenic slurry flow path passes through the head plate
and the slurry plate into the end plate, connecting to a thickened
slurry flow path in the end plate; the thickened slurry flow path
leaves the end plate and passes through the slurry plate and the
head plate; the cryogenic liquid discharge path begins in the end
plate in an end plate liquid removal chamber and passes through the
slurry plate and the head plate, with additional cryogenic liquid
provided to the liquid discharge path in the head plate by a head
plate liquid removal chamber; the cryogenic slurry flow path in the
slurry plate comprises generally spiraling paths on the first face
of the slurry plate and the second face of the slurry plate,
wherein the cryogenic slurry flow path is shaped generally like a
half-pipe, with an open face of the half-pipe facing the first
filter plate and the second filter plate; the head plate comprises
a raised lip to insert the first filter plate such that an open
space is provided between the first filter plate and the head
plate, the open space defining the head plate liquid removal
chamber; the end plate comprises a raised lip to insert the second
filter plate such that an open space is provided between the second
filter plate and the end plate, the open space defining the end
plate liquid removal chamber; the slurry plate comprises a central
portion with the generally spiraling paths, the central portion
rimmed with a narrower outside portion; the head plate and the end
plate are shaped in a manner that they will fit over the central
portion of the slurry plate, causing the combination of the head
plate, the slurry plate, the end plate, the first filter plate, and
the second filter plate to form a right rectangular prism; and, the
cryogenic slurry passes through the central portion of the slurry
plate generally tangential to the first filter plate and the second
filter plate, causing the cryogenic liquid to pass into the head
plate liquid removal chamber and the end plate liquid removal
chamber and the thickened cryogenic slurry to pass through the
thickened slurry flow path.
14. The device of claim 13, wherein the half-pipe of the slurry
plate comprises a diameter that varies to provide consistent
pressure.
15. The device of claim 13, wherein the cryogenically-stable
material inhibits adsorption of gases, prevents deposition of
solids, or a combination thereof, the cryogenically-stable material
comprising sintered ceramics, polytetrafluoroethylene,
polychlorotrifluoroethylene, natural diamond, man-made diamond,
chemical-vapor deposition diamond, polycrystalline diamond, or
combinations thereof.
16. The device of claim 1, wherein: the device comprises a head
plate, an even number of slurry plates, one fewer liquid removal
plates than the total number of slurry plates, an end plate, and
the filter medium, the filter medium comprising a filter plate for
each face of each slurry plate, the filter plate for the head plate
being a first filter plate, the filter plate for the end plate
being a last filter plate, and the filter plates for use between
the slurry plates and the liquid removal plates being middle filter
plates; the first filter plate is secured between the head plate
and a first face of a first slurry plate; the last filter plate is
secured between the end plate and a second face of a last slurry
plate; the middle filter plates are secured between the liquid
removal plates and the slurry plates; the cryogenic slurry flow
path passes through the head plate, the slurry plates, and the
liquid removal plates into the end plate, connecting to a thickened
slurry flow path in the end plate; the thickened slurry flow path
leaves the end plate and passes through the slurry plates, the
liquid removal plates, and the head plate; the cryogenic liquid
discharge path begins in the end plate in an end plate liquid
removal chamber and passes through the slurry plates, the liquid
removal plates, and the head plate, with additional cryogenic
liquid provided to the liquid discharge path from the liquid
removal plates by two liquid removal chambers for each of the
liquid removal plates, and from the head plate by a head plate
liquid removal chamber; the cryogenic slurry flow path in the
slurry plates comprises generally spiraling paths on the first face
of the slurry plates and the second face of the slurry plates,
wherein the cryogenic slurry flow path is shaped generally like a
half-pipe, with the open face of the half-pipe facing the filter
plates; the head plate comprises a raised lip to insert the first
filter plate such that an open space is provided between the first
filter plate and the head plate, the open space defining the head
plate liquid removal chamber; the end plate comprises a raised lip
to insert the last filter plate such that an open space is provided
between the last filter plate and the end plate, the open space
defining the end plate liquid removal chamber; the liquid removal
plates comprise a first face and a second face, each with a raised
lip to insert the middle filter plates such that an open space is
provided between the middle filter plates and the liquid removal
plates, the open spaces comprising the middle liquid removal
chambers; the slurry plates comprise a central portion with the
generally spiraling paths, the central portion rimmed with a
narrower outside portion; the head plate, the end plate, and the
liquid removal plates shaped in a manner that they will fit over
the central portion of the slurry plates, causing the combination
of the head plate, the slurry plates, the liquid removal plates,
the end plate, and the filter plates to form a right rectangular
prism; and, the cryogenic slurry passes through the central portion
of the slurry plates generally tangential to the filter plates,
causing the cryogenic liquid to pass into the head plate liquid
removal chamber, the end plate liquid removal chamber, and the
middle liquid removal chambers, and the thickened cryogenic slurry
to pass through the thickened slurry flow path.
17. The device of claim 16, wherein the half-pipe of the slurry
plates comprises a diameter that varies to provide consistent
pressure.
18. The device of claim 16, wherein the cryogenically-stable
material inhibits adsorption of gases, prevents deposition of
solids, or a combination thereof, the cryogenically-stable material
comprising sintered ceramics, polytetrafluoroethylene,
polychlorotrifluoroethylene, natural diamond, man-made diamond,
chemical-vapor deposition diamond, polycrystalline diamond, or
combinations thereof.
19. The device of claim 1, further comprising a head plate, a
slurry plate, an end plate, and the filter medium, the filter
medium further comprising a first filter plate and a second filter
plate, wherein the head plate, the slurry plate, and the end plate
define the cryogenic liquid discharge path and the cryogenic slurry
flow path.
20. The device of claim 1, further comprising a head plate, an even
number of slurry plates, one fewer liquid removal plates than the
total number of slurry plates, an end plate, and the filter medium,
the filter medium comprising a filter plate for each face of each
slurry plate, wherein the head plate, the slurry plates, the liquid
removal plates, and the end plate define the cryogenic liquid
discharge path and the cryogenic slurry flow path.
Description
FIELD OF THE INVENTION
[0001] This invention relates generally to the field of cross-flow
filtration. More particularly, we arc interested in thickening
cryogenic slurries.
BACKGROUND
[0002] The removal of carbon dioxide, other acid gases, and
contaminants from flue gas, syngas, and other gas streams can be
accomplished by desublimation into cryogenic liquids, resulting in
a cryogenic slurry. The ability to separate these and other
cryogenic solids from a cryogenic liquid is of critical importance
of greenhouse gas mitigation efforts. However, most separation
technologies are ineffective, inefficient, expensive, or all
three.
[0003] Cross-flow filtration, sometimes referred to as tangential
filtration, is a common method for removing solids in reverse
osmosis, nanofiltration, ultrafiltration, and microfiltration. Most
modern applications are in biotechnology, wastewater treatment, and
mineral processing. Common filter media include various textiles,
cellulose, room-temperature and elevated-temperature ceramics, and
sand. The ceramics used are not suitable for cryogenics. Filter
media still tends to collect solids over time unless a filter media
is selected on which the solids do not easily adsorb. Solids to be
filtered are sent to laboratories where large numbers of filter
media are tested until the ideal filter media is found. While there
are filter media intended for dead-end style filters, no filter
media available commercially is intended for or tested for
cross-flow filtration of cryogenic temperature solids, such acid
gas solids.
[0004] A method and apparatus capable of overcoming these and other
obstacles is needed for cryogenic solid-liquid separations.
[0005] U.S. Pat. No. 5,749,232 to Sauer teaches an apparatus and
method for producing and injecting sterile cryogenic liquids. The
cryogenic liquids are filtered through a dead-end style filter that
filters and retains microbes from the liquid using sintered ceramic
material filters. The present disclosure differs from this
disclosure in that the filter media retains foulants rather than
removing them, and therefore has to be shut down to clean or
replace the filter media. This disclosure is pertinent and may
benefit from the methods disclosed herein and is hereby
incorporated for reference in its entirety for all that it
teaches.
[0006] U.S. Pat. No. 2,364,386 to Jahreis teaches fractional
removal of liquids from liquid-solid suspensions. Most prior art in
this disclosure relies on the teachings of this publication for the
basic design or method of their disclosures. This publication
discusses the idea of passing a slurry through a channel tangential
to the surface of a filter cloth to provide fractional removal of
liquids from the slurry. The present disclosure differs from this
disclosure in that this disclosure makes no accommodations for
removing liquids from a cryogenic slurry. This disclosure utilizes
wood and metal plates, which are not suitable for cryogenic
slurries. This disclosure is pertinent and may benefit from the
methods disclosed herein and is hereby incorporated for reference
in its entirety for all that it teaches.
[0007] U.S. Pat. No. 2,417,958 to Teale teaches an apparatus for
reducing the fluid content of a fluid-solid intermixture. This
disclosure teaches the same concepts as the first prior art, above,
with modified, horizontal plates. The present disclosure differs
from this disclosure in that this disclosure makes no
accommodations for removing liquids from a cryogenic slurry. This
disclosure provides only for "non-rigid" of "pliable" materials,
and does not anticipate the need for materials that could handle
extremely low temperatures. This disclosure is pertinent and may
benefit from the methods disclosed herein and is hereby
incorporated for reference in its entirety for all that it
teaches.
[0008] U.S. Pat. No. 3,502,211 to Von Polnitz et al. teaches a
process and apparatus for recovering solids in enriched and
purified form. This disclosure teaches the same concepts as the
first prior art, above, with modified plates and a reversible flow
for filter media cleaning. The present disclosure differs front
this disclosure in that this disclosure makes no accommodations for
removing liquids from a cryogenic slurry, making no disclosure as
to what materials with which to construct the apparatus. This
disclosure is pertinent and may benefit from the methods disclosed
herein and is hereby incorporated for reference in its entirety for
all that it teaches.
[0009] U.S. Pat. No. 5,240,805 to Winzeler teaches a spiral filter
for removal of aerosols, gaseous and liquid suspensions, and
colloidal or true solutions. This disclosure teaches the same
concepts as the first prior art, above, with round plates and the
ability to filter gas phase suspensions. The present disclosure
differs from this disclosure in that this disclosure teaches
methods of handling ambient or similar temperature gases, and not
cryogenic liquids. This disclosure is pertinent and may benefit
from the methods disclosed herein and is hereby incorporated for
reference in its entirety for all that it teaches.
[0010] U.S. Pat. No. 6,314,591 to Winzeler teaches a spiral filter
for removal of aerosols, gaseous and liquid suspensions, and
colloidal or true solutions. This disclosure teaches the same
concepts as the first prior art, above, with round plates and the
ability to filter gas phase suspensions. The present disclosure
differs from this disclosure in that this disclosure teaches
methods of handling ambient or similar temperature gases, and not
cryogenic liquids. This disclosure is pertinent and may benefit
from the methods disclosed herein and is hereby incorporated for
reference in its entirety for all that it teaches.
[0011] United Suites patent publication number 3398834 to Nuttall
et al. teaches an apparatus for reverse osmosis water purification.
The present disclosure differs from this disclosure in that this
disclosure utilizes reverse osmosis. This disclosure is pertinent
and may benefit from the methods disclosed herein and is hereby
incorporated for reference in its entirety for all that it
teaches.
SUMMARY
[0012] A device for thickening a cryogenic slurry is disclosed. The
device comprises a cryogenic slurry flow path, a cryogenic liquid
discharge path, and a filter medium between the cryogenic slurry
flow path and the cryogenic liquid discharge path. The cryogenic
slurry comprises a solid and a cryogenic liquid. The cryogenic
slurry is fed into the cryogenic slurry flow path, generally
tangential to the filter medium. This causes a portion of the
cryogenic liquid to cross the filter medium into the cryogenic
liquid discharge path as a cryogenic liquid discharge and the
cryogenic slurry to thicken to produce a thickened slurry. The
filter medium comprises a cryogenically-stable material such that
adsorption of gases is inhibited, deposition of solids is
prevented, and temperature-change induced expansion and contraction
of the filter medium is optimized.
[0013] The cryogenically-stable material may comprise sintered
ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene,
natural diamond, man-made diamond, chemical-vapor deposition
diamond, polycrystalline diamond, or combinations thereof.
[0014] The filter medium may comprise a hole with a diameter of at
most 25 microns, or a sparger with openings comprising an effective
diameter of at most 25 microns.
[0015] A portion of the cryogenic slurry flow path and a portion of
the liquid discharge path may be enclosed perpendicular to the
cryogenic slurry flow path and the liquid discharge path by the
cryogenically-stable material.
[0016] The solid may comprise carbon dioxide, nitrogen oxide,
sulfur dioxide, nitrogen dioxide, sulfur trioxide, hydrogen
sulfide, hydrogen cyanide, water, hydrocarbons with a freezing
point above the temperature of the cryogenic liquid, or
combinations thereof. The cryogenic liquid may comprise any
compound or mixture of compounds with a freezing point below the
temperature at which the solid melts.
[0017] Optimization of the expansion and contraction may comprise
reducing expansion and contraction of the filter medium to prevent
damage to the filter medium. Optimization may comprise increasing
expansion and contraction of the filter medium, causing the filter
medium to become self-cleaning, the movement removing foulant from
the filter medium.
[0018] The cryogenic slurry flow path may be provided with a back
pressure by a restricted outlet for the thickened slurry.
[0019] The device may comprise a double-walled pipe comprising an
inner pipe and an outer pipe separated by a liquid plenum. A space
inside the inner pipe may define the cryogenic slurry flow path.
The inner pipe may comprise cylindrical side walls forming the
filter medium, being perforated by at least one hole with a
diameter of less than 25 microns. The liquid plenum between the
outer pipe and the inner pipe may define the cryogenic liquid
discharge path. The cryogenic slurry may be provided to the
cryogenic slurry flow path and thickened to produce the thickened
slurry and the cryogenic liquid discharge. The cryogenic liquid
discharge may be removed through the cylindrical side walls and
passed through the liquid plenum. The thickened slurry may be
removed through an outlet of the inner pipe. The double-walled pipe
may define a generally spiral flow pattern, or a u-tube bundle
pattern.
[0020] The device may comprise a head plate, a slurry plate, an end
plate, and the filter medium, the filter medium further comprising
a first filter plate and a second filter plate. The first filter
plate may be secured between the head plate and a first face of the
slurry plate, with the second filter plate secured between a second
face of the slurry plate and the end plate. The cryogenic slurry
flow path may pass through the head plate and the slurry plate into
the end plate, connecting to a thickened slurry flow path in the
end plate. The thickened slurry flow path may leave the end plate
and pass through the slurry plate and the head plate. The cryogenic
liquid discharge path may begin in the end plate in an end plate
liquid removal chamber and pass through the slurry plate and the
head plate, with additional cryogenic liquid provided to the liquid
discharge path in the head plate by a head plate liquid removal
chamber. The cryogenic slurry flow path in the slurry plate may
comprise generally spiraling paths on the first face of the slurry
plate and the second face of the slurry plate, wherein the
cryogenic slurry flow path is shaped generally like a half-pipe,
with an open face of the half-pipe facing the first filter plate
and the second filter plate. The head plate may comprise a raised
lip to insert the first filter plate such that an open space is
provided between the first filter plate and the head plate, the
open space defining the head plate liquid removal chamber. The end
plate may comprise a raised lip to insert the second filter plate
such that an open space is provided between the second filter plate
and the end plate, the open space defining the end plate liquid
removal chamber. The slurry plate may comprise a central portion
with the generally spiraling paths, the central portion rimmed with
a narrower outside portion. The head plate and the end plate may be
shaped in a manner that they will fit over the central portion of
the slurry plate, causing the combination of the head plate, the
slurry plate, the end plate, the first filter plate, and the second
filter plate to form a right rectangular prism. The cryogenic
slurry may pass through the central portion of the slurry plate
generally tangential to the first filter plate and the second
filter plate, causing the cryogenic liquid to pass into the head
plate liquid removal chamber and the end plate liquid removal
chamber and the thickened cryogenic slurry to pass through the
thickened slurry flow path. The half-pipe of the slurry plates may
comprise a diameter that varies to provide consistent pressure.
[0021] The device may comprise a head plate, an even number of
slurry plates, one fewer liquid removal plates than the total
number of slurry plates, an end plate, and the filter medium. the
filter medium comprising a filter plate for each face of each
slurry plate, the filter plate for the head plate being a first
filter plate, the filter plate for the end plate being a last
filter plate, and the filter plates for use between the slurry
plates and the liquid removal plates being middle filter plates.
The first filter plate may be secured between the head plate and a
first face of a first slurry plate. The last filter plate may be
secured between the end plate and a second face of a last slurry
plate. The middle filter plate may be secured between the liquid
removal plates and the slurry plates. The cryogenic slurry flow
path may pass through the head plate, the slurry plates, and the
liquid removal plates into the end plate, connecting to a thickened
slurry flow path in the end plate. The thickened slurry flow path
may leave the end plate and pass through the slurry plates, the
liquid removal plates, and the head plate. The cryogenic liquid
discharge path may begin in the end plate in an end plate liquid
removal chamber and pass through the slurry plates, the liquid
removal plates, and the head plate, with additional cryogenic
liquid provided to the liquid discharge path from the liquid
removal plates by two liquid removal chambers for each of the
liquid removal plates, and from the head plate by a head plate
liquid removal chamber. The cryogenic slurry flow path in the
slurry plates may comprise generally spiraling paths on the first
face of the slurry plates and the second face of the slurry plates,
wherein the cryogenic slurry flow path is shaped generally like a
half-pipe, with the open face of the half-pipe facing the filter
plates. The head plate may comprise a raised lip to insert the
first filter plate such that an open space is provided between the
first filter plate and the head plate, the open space defining the
head plate liquid removal chamber. The end plate may comprise a
raised lip to insert the last filter plate such that an open space
is provided between the last filter plate and the end plate, the
open space defining the end plate liquid removal chamber. The
liquid removal plates may comprise a first face and a second face,
each with a raised lip to insert the filter plates such that an
open space is provided between the filter plates and the liquid
removal plates, the open spaces comprising the middle liquid
removal chambers. The slurry plates may comprise a central portion
with the generally spiraling paths, the central portion rimmed with
a narrower outside portion. The head plate, the end plate, and the
liquid removal plates may be shaped in a manner that they will fit
over the central portion of the slurry plates, causing the
combination of the head plate, the slurry plates, the liquid
removal plates, the end plate, and the filter plates to form a
right rectangular prism. The cryogenic slurry may pass through the
central portion of the slurry plates generally tangential to the
filter plates, causing the cryogenic liquid to pass into the head
plate liquid removal chamber, the end plate liquid removal chamber,
and the middle liquid removal chambers, and the thickened cryogenic
slurry to pass through the thickened slurry flow path. The
half-pipe of the slurry plates may comprise a diameter that varies
to provide consistent pressure.
BRIEF DESCRIPTION OF THE DRAWINGS
[0022] In order that the advantages of the invention will be
readily understood, a more particular description of the invention
briefly described above will be rendered by reference to specific
embodiments illustrated in the appended drawings. Understanding
that these drawings depict only typical embodiments of the
invention and are not therefore to be considered, limiting of its
scope, the invention will be described and explained with
additional specificity and detail through use of the accompanying
drawings, in winch:
[0023] FIG. 1 shows a process flow diagram as per one embodiment of
the present invention.
[0024] FIGS. 2A-B show an isometric cross-sectional view of a
double-walled pipe cross-flow filter and a cross-section of the
double-walled pipe.
[0025] FIGS. 3A-C show isometric views of a cross-flow filter
device, both disassembled and assembled.
[0026] FIGS. 4A-C show isometric views of a cross-flow filter
device, both disassembled and assembled.
DETAILED DESCRIPTION
[0027] It will be readily understood that the components of the
present invention, as generally described and illustrated in the
Figures herein, could be arranged and designed in a wide variety of
different configurations. Thus, the following more detailed
description of the embodiments of the invention, as represented in
the Figures, is not intended to limit the scope of the invention,
as claimed, but is merely representative of certain examples of
presently contemplated embodiments in accordance with the
invention.
[0028] Referring to FIG. 1, a process flow diagram is shown at 100,
as per one embodiment of the present invention. Cryogenic slurry
102 enters cryogenic slurry flow path 104, passing generally
tangentially across filter medium 106. Cryogenic slurry 102
comprises solid 108 and cryogenic liquid 110. A portion of
cryogenic liquid 110 crosses filter medium 106 to form cryogenic
liquid discharge 112, which enters cryogenic liquid discharge path
114. Cryogenic slurry 102 is thereby thickened to produce thickened
slurry 116. Filter medium 104 comprises a cryogenically-stable
material. Cryogenically-stable materials inhibit adsorption of
gases, prevent deposition of solids, and optimize
temperature-change induced expansion and contraction of the filter
medium. In some embodiments, optimization may include reducing
expansion and contraction of the filter medium. In other
embodiments, optimization may include increasing expansion and
contraction of the filter medium, causing the filter medium to
become self-cleaning, the movement removing foulant from the filter
medium.
[0029] Referring to FIGS. 2A-B, an isometric cross-sectional view
of a double-walled pipe cross-flow filter is shown at 200, with a
cross-section of the double-walled pipe shown at 202, as per one
embodiment of the present invention. The double-walled pipe
cross-flow filter comprises inner pipe 204 and outer pipe 206, with
a liquid plenum between them, the liquid plenum defining cryogenic
liquid discharge path 208. The space inside the inner pipe defines
cryogenic slurry flow path 210. Inner pipe 204 has cylindrical
walls that form filter medium 212. Filter medium 212 is perforated
by at least one hole of less than 25 microns. Cryogenic slurry 214,
comprising cryogenic liquid 216 and solid 218, is provided to
cryogenic slurry flow path 210 and is thickened to produce
thickened slurry 220 by removal of the cryogenic liquid through
filter medium 212, producing cryogenic liquid discharge 222. In
some embodiments, the double-walled pipe defines a generally spiral
flow pattern. In other embodiments, the double-walled pipe defines
a u-tube bundle pattern. In some embodiments, cryogenic slurry flow
path 210 and cryogenic liquid discharge path 208 are switched. In
some embodiments, inner pipe 204 forms a spiral or u-tube bundle
pattern inside of outer pipe 206.
[0030] Referring to FIGS. 3A-C, isometric views of a cross-flow
filter device are shown, disassembled wire mesh at 300,
disassembled external at 301 and assembled external at 302, as per
one embodiment of the present invention. The device comprises head
plate 304, slurry plate 306, end plate 308, and a filter medium,
the filter medium further comprising first filter plate 310 and
second filter plate 312. First filter plate 310 is secured between
head plate 304 and first face 314 of slurry plate 306. Second
filter plate 312 is secured between second face 310 of slurry plate
306 and end plate 308. Cryogenic slurry flow path 318 passes
through head plate 304 and slurry plate 306 into end plate 308,
connecting to thickened slurry flow path 338 in end plate 308.
Thickened slurry flow path 338 leaves end plate 308 and passes
through slurry plate 306 and head plate 304. Cryogenic liquid
discharge path 320 begins in end plate 308 in end plate liquid
removal chamber 322 and passes through slurry plate 306 and head
plate 304, with additional cryogenic liquid discharge 324 provided
to cryogenic liquid discharge path 320 in head plate 304 by head
plate liquid removal chamber 326. Cryogenic slurry flow path 318 in
the slurry plate comprises generally spiraling paths 336 on first
face 314 of slurry plate 306 and second face 316 of slurry plate
306, wherein cryogenic slurry flow path 318 is shaped generally
like a half-pipe, with an open face of the hall-pipe facing first
filter plate 310 and second filter plate 312. Head plate 304
comprises raised lip 328 to insert first filter plate 310 such that
an open space is provided between first filter plate 310 and head
plate 304, the open space defining head plate liquid removal
chamber 326. End plate 308 comprises raised lip 330 to insert
second filter plate 312 such that an open space is provided between
second filter plate 312 and end plate 308, the open space defining
end plate liquid removal chamber 322. Slurry plate 306 comprises
central portion 334 with generally spiraling paths 336, central
portion 334 rimmed with narrower outside portion 340. Head plate
304 and end plate 308 are shaped in a manner that they will fit
over central portion 334 of slurry plate 306, causing the
combination of head plate 304, slurry plate 306, end plate 308,
first filter plate 310, and second filter plate 312 to form a right
rectangular prism. Cryogenic slurry 342 passes through central
portion 334 of slurry plate 306 generally tangential to first
filter plate 310 and second filter plate 312, causing cryogenic
liquid discharge 324 to pass into head plate liquid removal chamber
326 and end plate liquid removal chamber 322 and thickened
cryogenic slurry 344 to pass through thickened slurry flow path
338.
[0031] Referring to FIGS. 4A-C, isometric views of a cross-flow
filter device are shown, disassembled wire mesh at 400,
disassembled external at 401, and assembled external at 402, as per
one embodiment of the present invention. The device comprises head
plate 404, an even number of slurry plates 406, one fewer liquid
removal plates 408 than the total number of slurry plates 406, an
end plate 410, and the filter medium. The filter medium comprises a
filter plate for each face of each slurry plate 406, the filter
plate for the head plate being first filter plate 412, the filter
plate for the end plate being last filter plate 414, and the filter
plates for use between slurry plates 406 and liquid removal plates
408 being middle filter plates 416. First filter plate 412 is
secured between head plate 404 and a first slurry plate 406. Last
filter plate 414 is secured between end plate 410 and a last slurry
plate 406. Middle filter plates 416 are secured between liquid
removal plates 408 and slurry plates 406. Cryogenic slurry flow
path 418 passes through head plate 404, slurry plates 406, and
liquid removal plates 408 into end plate 410, connecting to
thickened slurry flow path 430 in end plate 410. Thickened slurry
flow path 430 leaves end plate 410 and passes through slurry plates
406, liquid removal plates 408, and head plate 404. Cryogenic
liquid discharge path 420 begins in end plate 410 in end plate
liquid removal chamber 422 and passes through slurry plates 406,
liquid removal plates 408, and head plate 404, with additional
cryogenic liquid provided to cryogenic liquid discharge path 420
from liquid removal plates 408 by two liquid removal chambers 426
for each of liquid removal plates 408, and from head plate 404 by
head plate liquid removal chamber 428. Cryogenic slurry flow path
418 in slurry plates 406 comprises generally spiraling paths 456 on
first face 434 of slurry plates 406 and second face 436 of slurry
plates 406, wherein cryogenic slurry flow path 418 is shaped
generally like a half-pipe, with the open face of the half-pipe
facing the filter plates. Head plate 404 comprises raised lip 438
to insert first filter plate 412 such that an open space is
provided between the first filter plate and the head plate, the
open space defining head plate liquid removal chamber 440. End
plate 410 comprises raised lip 442 to insert last filter plate 414
such that an open space is provided between last filter plate 412
and end plate 410, the open space defining end plate liquid removal
chamber 444 Liquid removal plates 408 comprise first face 446 and
second face 448, each with raised lip 450 to insert middle filter
plates 416 such that an open space is provided between middle
filter plates 416 and liquid removal plates 408, the open spaces
comprising middle liquid removal chambers 452. Slurry plates 406
comprise central portion 454 with generally spiraling paths 456,
central portion 454 rimmed with narrower outside portion 458. Head
plate 404, end plate 410, and liquid removal plates 408 shaped in a
manner that they will fit over central portion 454 of slurry plates
406, causing the combination of head plate 404, slurry plates 406,
liquid removal plates 408, end plate 410, and the filter plates to
form a right rectangular prism. Cryogenic slurry 432 passes through
central portion 454 of slurry plates 406 generally tangential to
the filter plates, causing cryogenic liquid discharge 424 to pass
into head plate liquid removal chamber 440, end plate liquid
removal chamber 444, and middle liquid removal chambers 452, and
thickened cryogenic slurry 460 to pass through thickened slurry
flow path 430.
[0032] In some embodiments, head plate 304 is a single-face slurry
plate in conjunction with a single filter plate and end plate 308.
In other embodiments, end plats 308 is a single-face slurry plate
in conjunction with a single filter plate and head plate 304. In
some embodiments, the plates of FIGS. 3A-C and FIGS. 4A-C are all
circular rather than square. In some embodiments, the spiral
pattern of slurry plates 306/400 are replaced by a criss-cross
pattern symmetric to the edges or at a 45 degree angle to one of
the edges. In some embodiments, the right-rectangular prism is
oriented horizontally. In others, the right-rectangular prism is
oriented vertically. In some embodiments, the half-pipe of the
slurry plates comprises a diameter that varies to provide
consistent pressure.
[0033] In some embodiments, the filter medium comprises a hole with
a diameter of at most 25 microns. In some embodiments, the filter
medium comprises a sparger with openings comprising an effective
diameter of at most 25 microns.
[0034] In some embodiments, a portion of the cryogenic slurry flow
path and a portion of the liquid discharge path are enclosed
perpendicular to the cryogenic slurry flow path and the liquid
discharge path by the cryogenically-stable material. In some
embodiments, the cryogenic liquid comprises any compound or mixture
of compounds with a freezing point below the temperature at which
the solid melts.
[0035] In some embodiments, the solid comprises carbon dioxide,
nitrogen oxide, sulfur dioxide, nitrogen dioxide, sulfur trioxide,
hydrogen sulfide, hydrogen cyanide, water, hydrocarbons with a
freezing point above the temperature of the cryogenic liquid, or
combinations thereof.
[0036] In some embodiments, cryogenically-stable materials comprise
sintered ceramics, polytetrafluoroethylene,
polychlorotrifluoroethylene, natural diamond, man-made diamond,
chemical-vapor deposition diamond, polycrystalline diamond, or
combinations thereof.
[0037] In some embodiments, the cryogenic slurry flow path is
provided with a back pressure by a restricted outlet for the
thickened slurry. The restricted outlet comprises a reduction in
the inner pipe, a nozzle, an orifice plate, a valve, a turbine, or
a combination thereof.
* * * * *