U.S. patent application number 15/604267 was filed with the patent office on 2017-11-30 for apparatus and method for treating substrate.
The applicant listed for this patent is SEMES CO., LTD.. Invention is credited to YOUNG HUN LEE, EUI SANG LIM.
Application Number | 20170345641 15/604267 |
Document ID | / |
Family ID | 60418400 |
Filed Date | 2017-11-30 |
United States Patent
Application |
20170345641 |
Kind Code |
A1 |
LEE; YOUNG HUN ; et
al. |
November 30, 2017 |
APPARATUS AND METHOD FOR TREATING SUBSTRATE
Abstract
Disclosed is a method for liquid-treating a substrate. In a
method for treating a substrate, the substrate may be treated by
supplying a treatment liquid onto the rotating substrate by using a
first nozzle and a second nozzle, the first nozzle supplies the
treatment liquid to an area including a central area on the
substrate, and the second nozzle supplies the treatment liquid to a
peripheral area of the substrate.
Inventors: |
LEE; YOUNG HUN;
(Chungcheongnam-do, KR) ; LIM; EUI SANG;
(Cheonan-si, KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
SEMES CO., LTD. |
Chungcheongnam-do |
|
KR |
|
|
Family ID: |
60418400 |
Appl. No.: |
15/604267 |
Filed: |
May 24, 2017 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
B08B 2203/0229 20130101;
B08B 3/024 20130101; H01L 21/67051 20130101 |
International
Class: |
H01L 21/02 20060101
H01L021/02; B08B 3/10 20060101 B08B003/10; B08B 3/08 20060101
B08B003/08; H01L 21/67 20060101 H01L021/67; B08B 3/02 20060101
B08B003/02 |
Foreign Application Data
Date |
Code |
Application Number |
May 27, 2016 |
KR |
10-2016-0065859 |
Claims
1. A method for treating a substrate, wherein the substrate is
treated by supplying a treatment liquid onto the rotating substrate
by using a first nozzle and a second nozzle, wherein the first
nozzle supplies the treatment liquid to an area including a central
area on the substrate, and wherein the second nozzle supplies the
treatment liquid to a peripheral area of the substrate.
2. The method of claim 1, comprising: a first supply operation of
supplying the treatment liquid onto the substrate by using the
first nozzle and supplying the treatment liquid to the peripheral
area by using the second nozzle at the same time; and thereafter, a
second supply operation of supplying the treatment liquid by using
the first nozzle and stopping supply of the treatment liquid by
using the second nozzle.
3. The method of claim 2, wherein in the first supply operation,
the first nozzle supplies the treatment liquid while moving a first
supply point that is a supply point of the treatment liquid
supplied from the first nozzle on the substrate.
4. The method of claim 3, wherein in first supply operation, the
second nozzle supplies the treatment liquid such that a second
supply point that is a supply point of the treatment liquid
supplied from the second nozzle on the substrate is fixed to a
first location of the peripheral area.
5. The method of claim 4, wherein in the first supply operation,
the first nozzle supplies the treatment liquid while the first
supply point moves between the central area and the peripheral area
of the substrate.
6. The method of claim 4, wherein the first supply operation is
performed while the treatment liquid is supplied while the first
supply point moves from the center of the substrate to the first
location once.
7. The method of claim 6, wherein in the second supply operation,
immediately after the first supply operation is performed, the
first nozzle supplies the treatment liquid while the first supply
point moves from the first location to an end of the substrate.
8. The method of claim 5, wherein the first supply operation is
performed while the first supply point moves from the central area
to the peripheral area once.
9. The method of claim 5, wherein the first supply operation is
performed while the first supply point reciprocates between the
central area and the peripheral area once.
10. The method of claim 3, wherein in the first supply operation,
the second nozzle supplies the treatment liquid while a second
supply point that is a supply point of the treatment liquid
supplied from the second nozzle on the substrate moves between the
second location and the third location of the peripheral area, and.
wherein the second location is a location that is closer to the
central area of the substrate than the third location.
11. The method of claim 10, wherein in the first supply operation,
the first nozzle supplies the treatment liquid while the first
supply point moves between the central area and the peripheral area
of the substrate.
12. The method of claim 11, wherein the first supply operation is
performed while the first supply point moves from the central area
to the peripheral area once.
13. The method of claim 11, wherein the first supply operation is
performed while the first supply point reciprocates between the
central area and the peripheral area once.
14. The method of claim 4, wherein in the second supply operation,
the first nozzle discharges the treatment liquid while the first
supply point is fixed to the central area after the treatment
liquid is supplied while the first supply point is moved.
15. The method of claim 14, further comprising: before the first
supply operation, a pre-wet operation of supplying a pre-wet liquid
onto the substrate.
16. The method of claim 14, wherein the pre-wet liquid is pure
water (DIW).
17. The method of claim 1, wherein in the first supply operation
and the second supply operation, the substrate is rotated at 200 to
800 rpms.
18. The method of claim 5, wherein in the first supply operation
and the second supply operation, a time period for which the first
supply point moves from the central area to the peripheral area
once and a time period for which the first supply point moves from
the peripheral area to the central area once are 1.0 to 1.2
seconds.
19. The method of claim 1, wherein the treatment liquid is an
organic solvent.
20. The method of claim 19, wherein the organic solvent includes
isopropyl alcohol (IPA).
21. The method of claim 4, wherein the substrate is a wafer having
a diameter of 300 mm, and wherein the first location is a location
that is spaced apart from the center of the wafer by 140 mm.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] A claim for priority under 35 U.S.C. .sctn.119 is made to
Korean Patent Application No. 10-2016-0065859 filed May 27, 2016,
in the Korean Intellectual Property Office, the entire contents of
which are hereby incorporated by reference.
BACKGROUND
[0002] The inventive concept relates to an apparatus and a method
for treating a substrate.
[0003] Contaminants such as particles, organic contaminants, and
metallic contaminants on a surface of a substrate greatly influence
the characteristics and yield rate of a semiconductor device. Due
to this, a cleaning process of removing various contaminants
attached to a surface of a substrate is very important, and a
process of cleaning a substrate is performed before and after unit
processes for manufacturing a semiconductor. In general, a process
of cleaning a substrate includes a chemical treating process of
removing metallic substances, organic substances, and particles
residing on a substrate by using a treatment liquid such as a
chemical, a rinsing process of removing the chemical residing on
the substrate by using pure water, and a drying process of drying
the substrate by using an organic solvent, a supercritical fluid,
or a nitrogen gas.
[0004] FIG. 1 is a view illustrating a supporting unit that
supports a substrate and a liquid supply unit that supplies a
liquid of a general substrate treating apparatus. FIG. 2 is a view
illustrating the substrate of FIG. 1, to which the liquid is
supplied, when viewed from the top. Referring to FIGS. 1 and 2, in
general, when an organic solvent 32 is supplied onto the substrate
31 to dry the substrate, the liquid supply unit 33 discharges the
organic solvent 32 to the substrate 31 supported by the substrate
support unit 34 while the substrate 31 is rotated. In this case,
fingerings are caused by a centrifugal force of the substrate 31 in
a process in which the organic solvent 32 is applied to the whole
substrate 31. As a time period until the organic solvent 32 is
applied becomes longer, areas between the fingerings 35 are dried
so that a surface of the substrate 31 is exposed. Further, when a
rinsing process is performed by using pure water 36 before the
organic solvent 32 is supplied, an area 37 in which the pure water
36 is dried is generated between the organic solvent 32 diffused on
the substrate 31 and the pure water 36 that is preliminarily
supplied, by humid heat between the organic solvent 32 and the
substrate 31 and a difference between the surface tensions of the
pure water 36 and the organic solvent 32. As the surface of the
substrate 31 is exposed by the drying phenomenon, the surface of
the substrate 31 may be contaminated by particles or a leaning
phenomenon may occur in a pattern of the substrate 31.
SUMMARY
[0005] The inventive concept provides an apparatus and a method for
minimizing a drying area generation time of a substrate when a
liquid is supplied.
[0006] The inventive concept also provides an apparatus and a
method for preventing contamination of a substrate due to
particles.
[0007] The inventive concept also provides an apparatus and a
method for preventing a leaning phenomenon of a substrate.
[0008] The problems that are to be solved by the inventive concept
are not limited to the above-mentioned problems, and the
unmentioned problems will be clearly understood by those skilled in
the art to which the inventive concept pertains from the
specification and the accompanying drawings.
[0009] The inventive concept provides a method for treating a
substrate. In a method for treating a substrate, the substrate may
be treated by supplying a treatment liquid onto the rotating
substrate by using a first nozzle and a second nozzle, the first
nozzle may supply the treatment liquid to an area including a
central area on the substrate, and the second nozzle may supply the
treatment liquid to a peripheral area of the substrate.
[0010] The method includes a first supply operation of supplying
the treatment liquid onto the substrate by using the first nozzle
and supplying the treatment liquid to the peripheral area by using
the second nozzle at the same time, and thereafter, a second supply
operation of supplying the treatment liquid by using the first
nozzle and stopping supply of the treatment liquid by using the
second nozzle.
[0011] In the first supply operation, the first nozzle may supply
the treatment liquid while moving a first supply point that is a
supply point of the treatment liquid supplied from the first nozzle
on the substrate.
[0012] In the first supply operation, the second nozzle may supply
the treatment liquid such that a second supply point that is a
supply point of the treatment liquid supplied from the second
nozzle on the substrate is fixed to a first location of the
peripheral area.
[0013] In the first supply operation, the first nozzle may supply
the treatment liquid while the first supply point moves between the
central area and the peripheral area of the substrate.
[0014] The first supply operation may be performed while the
treatment liquid is supplied while the first supply point moves
from the center of the substrate to the first location once.
[0015] In the second supply operation, immediately after the first
supply operation is performed, the first nozzle may supply the
treatment liquid while the first supply point moves from the first
location to an end of the substrate.
[0016] The first supply operation may be performed while the first
supply point moves from the central area to the peripheral area
once.
[0017] The first supply operation may be performed while the first
supply point reciprocates between the central area and the
peripheral area once.
[0018] Unlike this, in the first supply operation, the second
nozzle may supply the treatment liquid while a second supply point
that is a supply point of the treatment liquid supplied from the
second nozzle on the substrate moves between the second location
and the third location of the peripheral area, and. the second
location may be a location that is closer to the central area of
the substrate than the third location.
[0019] In the first supply operation, the first nozzle may supply
the treatment liquid while the first supply point moves between the
central area and the peripheral area of the substrate.
[0020] The first supply operation may be performed while the first
supply point moves from the central area to the peripheral area
once.
[0021] The first supply operation may be performed while the first
supply point reciprocates between the central area and the
peripheral area once.
[0022] In the second supply operation, the first nozzle may
discharge the treatment liquid while the first supply point is
fixed to the central area after the treatment liquid is supplied
while the first supply point is moved.
[0023] The method may further include, before the first supply
operation, a pre-wet operation of supplying a pre-wet liquid onto
the substrate.
[0024] The pre-wet liquid may be pure water (DIW).
[0025] In the first supply operation and the second supply
operation, the substrate may be rotated at 200 to 800 rpms.
[0026] In the first supply operation and the second supply
operation, a time period for which the first supply point moves
from the central area to the peripheral area once and a time period
for which the first supply point moves from the peripheral area to
the central area once may be 1.0 to 1.2 seconds.
[0027] The treatment liquid may be an organic solvent including
isopropyl alcohol (IPA).
[0028] The substrate may be a wafer having a diameter of 300 mm,
and the first location may be a location that is spaced apart from
the center of the wafer by 140 mm.
[0029] The inventive concept provides an apparatus for treating a
substrate. An apparatus for treating a substrate includes a housing
that provides a space for performing a substrate treating process
therein, a support unit that supports the substrate within the
housing and rotates the substrate, a first nozzle that supplies a
treatment liquid to an area including a central area on the
substrate positioned on the support unit, a second nozzle that
supplies a treatment liquid to a peripheral area on the substrate
positioned on the support unit, and a controller that controls the
first nozzle and the second nozzle.
[0030] The controller may control the first nozzle and the second
nozzle such that a first supply operation of supplying the
treatment liquid onto the substrate by using the first nozzle and
supplying the treatment liquid to the peripheral area by using the
second nozzle at the same time, and a second supply operation of,
thereafter, supplying the treatment liquid by using the first
nozzle and stopping supply of the treatment liquid by using the
second nozzle are sequentially performed.
[0031] In the first supply operation, the controller may control
the first nozzle such that the treatment liquid is supplied while a
first supply point that is a supply point of the treatment liquid
supplied from the first nozzle on the substrate is moved.
[0032] In the first supply operation, the controller may control
the second nozzle such that a second supply point that is a supply
point of the treatment liquid supplied from the second nozzle on
the substrate is fixed to a first location of the peripheral
area.
[0033] In the first supply operation may be performed while the
treatment liquid is supplied while the first supply point moves
from the center of the substrate to the first location once.
[0034] The controller may control the first nozzle such that in the
second supply operation, immediately after the first supply
operation is performed, the treatment liquid is supplied while the
first supply point moves from the first location to an end of the
substrate.
[0035] The first supply operation may be performed while the first
supply point moves from the central area to the peripheral area
once.
[0036] In the first supply operation, the controller may control
the second nozzle such that a second supply point that is a supply
point of the treatment liquid supplied from the second nozzle on
the substrate moves between the second location and the third
location of the peripheral area, and the second location may be a
location that is closer to the central area of the substrate than
the third location.
[0037] The treatment liquid may be an organic solvent.
BRIEF DESCRIPTION OF THE FIGURES
[0038] The above and other objects and features will become
apparent from the following description with reference to the
following figures, wherein like reference numerals refer to like
parts throughout the various figures unless otherwise specified,
and wherein:
[0039] FIG. 1 is a view illustrating a supporting unit that
supports a substrate and a liquid supply unit that supplies a
liquid of a general substrate treating apparatus;
[0040] FIG. 2 is a view illustrating the substrate of FIG. 1, to
which the liquid is supplied, when viewed from the top;
[0041] FIG. 3 is a plan view schematically illustrating a substrate
treating system 1 according to the inventive concept;
[0042] FIG. 4 is a sectional view illustrating an example of the
substrate treating apparatus 300;
[0043] FIG. 5 is a flowchart illustrating a method for treating a
substrate according to an embodiment of the inventive concept;
[0044] FIGS. 6 to 10 are views sequentially illustrating the method
for treating a substrate according to an embodiment;
[0045] FIG. 11 is a view illustrating a first supply operation
according to another embodiment; and
[0046] FIGS. 12 and 13 are views illustrating a first supply
operation according to other embodiments respectively.
DETAILED DESCRIPTION
[0047] Hereinafter, exemplary embodiments of the inventive concept
will be described in more detail with reference to the accompanying
drawings. The embodiments of the inventive concept may be modified
in various forms, and the scope of the inventive concept should not
be construed to be limited to the following embodiments. The
embodiments of the inventive concept are provided to describe the
inventive concept for those skilled in the art more completely.
Accordingly, the shapes of the components of the drawings are
exaggerated to emphasize clearer description thereof.
[0048] In an embodiment of the inventive concept, a substrate
treating apparatus for performing a process of cleaning a substrate
will be described. However, the inventive concept is not limited
thereto, but may be applied to various types of apparatuses that
apply a liquid onto a substrate.
[0049] Hereinafter, examples of the apparatus and the method of the
inventive concept will be described in detail with reference to the
accompanying drawings.
[0050] FIG. 3 is a plan view schematically illustrating a substrate
treating system 1 according to the inventive concept. Referring to
FIG. 3, the substrate treating system 1 has an index module 10 and
a process treating module 20, and the index module 10 has a
plurality of load ports 120 and a feeding frame 140. The load ports
120, the feeding frame 140, and the process treating module 20 may
be sequentially arranged in a row. Hereinafter, a direction in
which the load port 120, the feeding frame 140, and the process
treating module 20 will be referred to a first direction 12. A
direction perpendicular to the first direction 12 when viewed from
the top will be referred to as a second direction 14, and a
direction normal to a plane including the first direction 12 and
the second direction 14 will be referred to as a third direction
16.
[0051] A carrier 18, in which a substrate W is received, is seated
on the load port 120. A plurality of load ports 120 are provided,
and are arranged along the second direction 14 in a row. FIG. 1
illustrates that four load ports 120 are provided. The number of
the load ports 120 may be increased or decreased according to the
process efficiency of the process treating module 20, a footprint
condition, and the like. A plurality of slots (not illustrated)
provided to support peripheries of substrates W are formed in the
carrier 18. A plurality of slots are provided along the third
direction 16, and the substrate W is situated in the carrier 130
such that the substrates W are stacked to be spaced apart from each
other along the third direction 16. A front opening unified pod
(FOUP) may be used as the carrier 18.
[0052] The process treating module 20 includes a buffer unit 220, a
feeding chamber 240, and a plurality of process chambers 260. The
feeding chamber 240 is arranged such that the lengthwise direction
thereof is in parallel to the first direction 12. The process
chambers 260 are arranged on opposite sides of the feeding chamber
240 along the second direction 14. The process chambers 260
situated on one side of the feeding chamber 240 and the process
chambers 260 situated on an opposite side of the feeding chamber
240 are symmetrical to each other with respect to the feeding
chamber 240. Some of the process chambers 260 are arranged along
the lengthwise direction of the feeding chamber 240. Furthermore,
some of the process chambers 260 are arranged to be stacked on each
other. That is, the process chambers 260 having an array of A by B
(A and B are natural numbers) may be arranged on one side of the
feeding chamber 240. Here, A is the number of the process chambers
260 provided in a row along the first direction 12, and B is the
number of the process chambers 260 provided in a row along the
third direction 16. When four or six process chambers 260 are
provided on one side of the feeding chamber 240, the process
chambers 260 may be arranged in an array of 2 by 2 or 3 by 2. The
number of the process chambers 260 may increase or decrease. Unlike
the above-mentioned description, the process chambers 260 may be
provided only on one side of the feeding chamber 240. Further,
unlike the above-mentioned description, the process chambers 260
may be provided on one side or opposite sides of the feeding
chamber 240 to form a single layer.
[0053] A buffer unit 220 is arranged between the feeding frame 140
and the feeding chamber 240. The buffer unit 220 provides a space
in which the substrates W stay before being transported, between
the feeding chamber 240 and the feeding frame 140. Slots (not
illustrated) in which the substrates W are positioned are provided
in the buffer unit 220, and a plurality of slots (not illustrated)
are provided to be spaced apart from each other along the third
direction 16. Faces of the buffer unit 220 that face the feeding
frame 140 and face the feeding chamber 240 are opened.
[0054] The feeding frame 140 transports the substrates W between
the carrier 18 seated on the load port 120 and the buffer unit 220.
An index rail 142 and an index robot 144 are provided in the
feeding frame 140. The index rail 142 is arranged such that the
lengthwise direction thereof is in parallel to the second direction
14. The index robot 144 is installed on the index rail 142, and is
linearly moved in the second direction 14 along the index rail 142.
The index robot 144 has a base 144a, a body 144b, and a plurality
of index arms 144c. The base 144a is installed to be moved along
the index rail 142. The body 144b is coupled to the base 144a. The
body 144b is provided to be moved along the third direction 16 on
the base 144a. The body 144b is provided to be rotated on the base
144a. The index arms 144c are coupled to the body 144b, and are
provided to be moved forwards and rearwards with respect to the
body 144b. A plurality of index arms 144c are provided to be driven
individually. The index arms 144c are arranged to be stacked so as
to be spaced apart from each other along the third direction 16.
Some of the index arms 144c are used when the substrates W are
transported to the carrier 18 from the process treating module 20,
and some of the index arms 144c may be used when the substrates W
are transported from the carrier 18 to the process treating module
20. This structure may prevent particles generated from the
substrates W before the process treatment from being attached to
the substrates W after the process treatment in the process of
carrying the substrates W in and out by the index robot 144.
[0055] The feeding chamber 240 transports the substrates W between
the buffer unit 220 and the process chambers 260, and between the
process chambers 260. A guide rail 242 and a main robot 244 are
provided in the feeding chamber 240. The guide rail 242 is arranged
such that the lengthwise direction thereof is in parallel to the
first direction 12. The main robot 244 is installed on the guide
rail 242, and is linearly moved along the first direction 12 on the
index rail 242. The main robot 244 has a base 244a, a body 244b,
and a plurality of main arms 244c. The base 244a is installed to be
moved along the guide rail 242. The body 244b is coupled to the
base 244a. The body 244b is provided to be moved along the third
direction 16 on the base 244a. The body 244b is provided to be
rotated on the base 244a. The main arms 244c are coupled to the
body 244b, and are provided to be moved forwards and rearwards with
respect to the body 244b. A plurality of main arms 244c are
provided to be driven individually. The main arms 244c are arranged
to be stacked so as to be spaced apart from each other along the
third direction 16. The main arms 244c used when the substrates W
are transported from the buffer unit 220 to the process chambers
260 and the main arms 244c used when the substrates W are
transported from the process chambers 260 to the buffer unit 220
may be different.
[0056] Substrate treating apparatuses 300 that perform cleaning
processes on the substrates W are provided in the process chambers
260. The substrate treating apparatuses 300 provided in the
respective process chambers 260 may have different structures
according to the types of performed cleaning processes.
Selectively, the substrate treating apparatuses 300 in the
respective process chambers 260 may have the same structure.
Selectively, the process chambers 260 may be classified into a
plurality of groups such that the substrate treating apparatuses
300 provided in the process chambers 260 pertaining to the same
group have the same structure and the substrate treating
apparatuses 300 provided in the process chambers 260 pertaining to
different groups have different structures from each other. For
example, when the process chambers 260 are classified into two
groups, the first group of process chambers 260 may be provided on
one side of the feeding chamber 240 and the second group of process
chambers 260 may be provided on an opposite side of the feeding
chamber 240. Selectively, the first group of process chambers 260
may be provided on the lower side of the feeding chamber 240 and
the second group of process chambers 260 may be provided on the
upper side of the feeding chamber 240, on opposite sides of the
feeding chamber 240. The first group of process chambers 260 and
the second group of process chambers 260 may be classified
according to the kinds of the used chemicals or the types of
cleaning methods.
[0057] Hereinafter, an example of a substrate treating apparatus
300 that cleans a substrate W by using a treatment liquid will be
described. FIG. 4 is a sectional view illustrating an example of
the substrate treating apparatus 300. Referring to FIG. 4, the
substrate treating apparatus 300 includes a housing 320, a support
unit 340, an elevation unit 360, a first supply unit 380, a second
supply unit 390, and a controller 400.
[0058] The housing 320 has a space for performing a substrate
treating process in the interior thereof, and an upper side of the
housing 320 is opened. The housing 320 has an inner recovery vessel
322, an intermediate recovery vessel 324, and an outer recovery
vessel 326. The respective recovery vessels 322, 324, and 326
recover different treatment liquids used in the process. The inner
recovery vessel 322 has an annular ring shape that surrounds the
support unit 340, the intermediate recovery vessel 324 has an
annular ring shape that surrounds the inner recovery vessel 322,
and the outer recovery vessel has an annular ring shape that
surrounds the intermediate recovery vessel 324. An inner space 322a
of the inner recovery vessel 322, a space 324a between the inner
recovery vessel 322 and the intermediate recovery vessel 324, and a
space 326a between the intermediate recovery vessel 324 and the
outer recovery vessel 326 function as inlets through which the
treatment liquids are introduced into the inner recovery vessel
322, the intermediate recovery vessel 324, and the outer recovery
vessel 326 respectively. Recovery lines 322b, 324b, and 326b
extending from the recovery vessels 322, 324, and 326
perpendicularly in the downward direction of the bottom surfaces
thereof are connected to the recovery vessels 322, 324, and 326,
respectively. The recovery lines 322b, 324b, and 326b discharge the
treatment liquids introduced through the recovery vessels 322, 324,
326, respectively. The discharged treatment liquids may be reused
through an external treatment liquid recycling system (not
illustrated).
[0059] The support unit 340 is arranged in the housing 320. The
support unit 340 supports the substrate W. The support unit 340 may
be provided as the spin head 340 that rotates the supported
substrate W. According to an embodiment, the spin head 340 is
arranged within the housing 320. The spin head 340 supports and
rotates the substrate W during the process. The spin head 340 has a
body 342, a plurality of support pins 334, a plurality of chuck
pins 346, and a support shaft 348. The body 342 has an upper
surface having a substantially circular shape when viewed from the
top. The support shaft 348 that may be rotated by a motor 349 is
fixedly coupled to the bottom of the body 342. A plurality of
support pins 334 are provided. The support pins 334 may be arranged
to be spaced apart from each other at a periphery of the upper
surface of the body 342 and protrude upwards from the body 342. The
support pins 334 are arranged to have a generally annular ring
shape through combination thereof. The support pins 334 support a
periphery of a rear surface of the substrate W such that the
substrate W is spaced apart from the upper surface of the body 342
by a predetermined distance. A plurality of chuck pins 346 are
provided. The chuck pins 346 are arranged to be more distant from
the center of the body 342 than the support pins 334. The chuck
pins 346 are provided to protrude upwards from the body 342. The
chuck pins 346 support a side of the substrate W such that the
substrate W is not separated laterally from a proper place when the
spin head 340 is rotated. The chuck pins 346 are provided to be
linearly moved between a standby position and a support position
along a radial direction of the body 342. The standby position is a
position that is more distant from the center of the body 342 than
the support position. When the substrate W is loaded on or unloaded
from the spin head 340, the chuck pins 346 are located at the
standby position, and when a process is performed on the substrate
W, the chuck pins 346 are located at the support position. The
chuck pins 346 are in contact with the side of the substrate W at
the support position.
[0060] The elevation unit 360 linearly moves the housing 320
upwards and downwards. When the housing 320 moves upwards and
downwards, a relative height of the housing 320 to the spin head
340 is changed. The elevation unit 360 has a bracket 362, a movable
shaft 364, and a driver 366. The bracket 362 is fixedly installed
on an outer wall of the housing 320, and the movable shaft 364 that
moves upwards and downwards by the driver 366 is fixedly coupled to
the bracket 362. The housing 320 is lowered such that, when the
substrate W is positioned on the spin head 340 or is lifted from
the spin head 340, the housing 320 is lowered such that the spin
head 340 protrudes to the upper side of the housing 320. When the
process is performed, the height of the housing 320 is adjusted
such that the treatment liquid are introduced into the preset
recovery vessel 360 according to the kind of the treatment liquid
supplied to the substrate W. For example, the substrate W is
located at a height corresponding to an interior space 322a of the
inner recovery vessel 322 while the substrate W is treated by a
first treatment fluid. Further, the substrate W may be located at a
height corresponding to a space 324a between the inner recovery
vessel 322 and the intermediate recovery vessel 324 and a space
326a between the intermediate recovery vessel 324 and the outer
recovery vessel 326 while the substrate W is treated by a second
treatment liquid and a third treatment liquid respectively. Unlike
those described above, the elevation unit 360 may move the spin
head 340, instead of the housing 320, upwards and downwards.
[0061] The first supply unit 380 has a first nozzle 384 that
supplies a treatment liquid onto the substrate W positioned on the
spin head 340. For example, the first supply unit 380 has a nozzle
support 382, a first nozzle 384, a support shaft 386, and a driver
388.
[0062] The lengthwise direction of the support shaft 386 is
provided along the third direction 16, and the driver 388 is
coupled to a lower end of the support shaft 386. The driver 388
rotates and elevates the support shaft 386. The nozzle support 382
is coupled to an end of the support shaft 386, which is opposite to
an end of the support shaft 386 coupled to the driver 388,
perpendicularly to the support shaft 386. The first nozzle 384 is
installed on a bottom surface of an end of the nozzle support 382.
The first nozzle 384 moves to a process location and a standby
location by the driver 388. The process location is a location at
which the first nozzle 384 is arranged at a vertical upper portion
of the housing 320, and the standby location is a location that
deviates from the vertical upper portion of the housing 320.
[0063] The first nozzle 384 supplies a treatment liquid to an area
including a central area on the substrate W positioned on the spin
head 340. A storage container 371 that stores the treatment liquid
is connected to the first nozzle 384 through a supply line. A valve
372 is installed in the supply line.
[0064] The second supply unit 390 has a second nozzle 394 that
supplies a treatment liquid onto the substrate W positioned on the
spin head 340. The second nozzle 394 supplies a treatment liquid to
a peripheral area of the substrate W positioned on the spin head
340. A storage container 371 that stores the treatment liquid is
connected to the second nozzle 394 through a supply line. A valve
373 is installed in the supply line. The second supply unit 390 has
a driver 398 to change a treatment liquid supply point of the
second nozzle 394. The other configurations and structures of the
second supply unit 390 are similar to those of the first supply
unit 380. The treatment liquids supplied through the first nozzle
384 and the second nozzle 394 may be the same. The treatment liquid
may be an organic solvent such as isopropyl alcohol (IPA).
[0065] The controller 400 controls the valves 372 and 373 connected
respectively to the first nozzle 384 and the second nozzle 394 and
the drivers 388 and 398 to determine whether the liquid is
discharged through the first nozzle 384 and the second nozzle 394
and adjust the supply points of the first nozzle 384 and the second
nozzle 394 on the substrate W. Hereinafter, a method for treating
the substrate W by controlling the first nozzle 384 and the second
nozzle 394 by the controller 400 to supply the treatment liquid to
the substrate W supported by the spin head 340 will be described in
detail.
[0066] Hereinafter, the method for treating a substrate according
to the embodiment of the inventive concept by using the
above-mentioned substrate treating apparatus will be described for
convenience of description.
[0067] FIG. 5 is a flowchart illustrating a method for treating a
substrate according to an embodiment of the inventive concept.
Referring to FIGS. 4 and 5, the treatment liquid is supplied onto a
rotating substrate by using the first nozzle 384 and the second
nozzle 394 to treat the substrate. The substrate treating method
includes a pre-wet operation S110, a first supply operation S120,
and a second supply operation S130. According to an embodiment, the
controller 400 controls the valves 372 and 373 and the drivers 388
and 398 to sequentially perform the first supply operation S120 and
the second supply operation S130.
[0068] The pre-wet operation S110 is selectively performed if
necessary before the first supply operation S120. In the pre-wet
operation S110, a pre-wet liquid is supplied onto the substrate W
positioned on the spin head 340. According to an embodiment, the
pre-wet liquid may be pure water (DIW). Optionally, the pre-wet
operation S110 may not be performed.
[0069] FIGS. 6 to 10 are views sequentially illustrating the method
for treating a substrate according to an embodiment.
[0070] FIG. 6 is a view illustrating that the first nozzle 384 and
the second nozzle 394 move to perform the first supply operation
S120. Referring to FIG. 6, in a preparation operation, the
controller 400 controls the drivers 388 and 398 such that the first
nozzle 384 and the second nozzle 394 are located to initial
locations at which the treatment liquid may be supplied onto the
substrate. For example, the controller 400 controls the drivers 388
and 398 such that the first nozzle 384 is located at a location at
which the treatment liquid may be discharged to a central area of
the substrate W and the second nozzle 394 is located at a location
at which the treatment liquid may be discharged to a peripheral
area of the substrate W.
[0071] FIG. 7 is a view illustrating a first supply operation S120.
Referring to FIG. 7, in the first supply operation S120, the
treatment liquid is supplied to the substrate W positioned on the
spin head 340 by using the first nozzle 384, and the treatment
liquid is supplied to the substrate W positioned on the spin head
340 by using the second nozzle 394 at the same time. According to
an embodiment, the controller 400 controls the valve 372 and the
driver 388 such that a first supply point that is a supply point of
the treatment liquid supplied from the first nozzle 384 on the
substrate moves between the central area and the peripheral area of
the substrate W to be supplied with the treatment liquid during the
first supply operation S120. For example, as illustrated in FIG. 7,
the first supply operation S120 is performed while the treatment
liquid is supplied while the first supply point moves from the
center of the substrate W to a first location 41 once as the first
nozzle 384 controlled by the controller 400 moves. At the same
time, the controller 400 controls the driver 398 such that a second
supply point that is a supply point of the treatment liquid
supplied from the second nozzle 394 is fixed to the first location
41 of the peripheral area of the substrate W during the first
supply operation S120. The substrate W may be a wafer having a
radius of 300 mm, and the first location 41 may be a location that
is spaced apart from the center of the wafer by 140 mm.
[0072] FIGS. 8 to 10 are views sequentially illustrating a second
supply operation S130.
[0073] In the second supply operation S130, the first nozzle 384
supplies the treatment liquid and the second nozzle 394 stops
supplying the treatment liquid. Referring to FIG. 8, the controller
400 controls the valve 372 and the driver 388 such that the first
nozzle 384 supplies the treatment liquid while moving the first
supply point. For example, the controller 400 controls the valve
372 and the driver 388 such that, after the treatment liquid is
supplied while the first supply point moves from the first location
41 that is a final location in the first supply operation S120 to
an end of the substrate W, the treatment liquid is supplied while
the first supply point moves to the center of the substrate W.
[0074] Referring to FIG. 9, thereafter, the controller 400 controls
the valve 372 and the driver 388 such that the first supply point
moves between the peripheral area of the substrate W and the
central area of the substrate W several times. For example, the
controller 400 controls the valve 372 and the driver 388 such that
the first supply point moves between an end of the substrate W and
the center of the substrate W several times.
[0075] Referring to FIG. 10, thereafter, the controller 400
controls the valve 372 and the driver 388 such that the treatment
liquid may be supplied while the first supply point is fixed to the
central area of the substrate W. For example, in this case, the
first supply point may be the center of the substrate W.
[0076] Although FIGS. 8 to 10 illustrates a state in which the
second supply point of the second nozzle 394 is fixed to the first
location during the second supply operation S130 in which the
second nozzle 394 does not discharge the treatment liquid,
optionally, the second nozzle 394 may be located to deviate from a
location that faces the substrate W supported by the spin head 340
when viewed from the top during the second supply operation
S130.
[0077] During the first supply operation S120 and the second supply
operation S130, the substrate W supported by the spin head 340 may
be rotated at 100 to 800 rpms. In this case, a time period for
which the first supply point and the second supply point move from
the central area of the substrate W to the peripheral area of the
substrate W once and a time period for which the first supply point
and the second supply point move from the peripheral area of the
substrate W to the central area of the substrate W once may be 1.0
to 1.2 seconds. The rotational speed of the substrate W and the
movement speed of the first supply point may be set differently
from the above-description. When the rotational speed of the
substrate W is less than 100 rpms, the movement time of the
substrate W may be set to less than 1.0 seconds. Further, when the
rotational speed of the substrate W exceeds 800 rpms, the movement
time of the substrate W may be set to more than 1.2 seconds.
[0078] FIG. 11 is a view illustrating a first supply operation S120
according to another embodiment. Referring to FIG. 11, unlike FIG.
7, during the first supply operation S120, optionally, the
controller 400 controls the valve 373 and the driver 398 such that
the treatment liquid may be supplied while the second supply point
moves between the second location 42 and the third location 43 of
the peripheral area of the substrate W. The second location 42 is a
location that is closer to the central area of the substrate W than
the third location 43. For example, the second location 42 is a
location that is closer to the central area of the substrate W than
the first location 41, and the third location 43 is a location that
is closer to an end of the substrate W than the first location
41.
[0079] FIGS. 12 and 13 are views illustrating a first supply
operation S120 according to other embodiments respectively.
[0080] Referring to FIG. 12, unlike FIG. 7, the first supply
operation S120 is performed while the first supply point moves from
the central area of the substrate W to the peripheral area of the
substrate W once. For example, the controller 400 controls the
valve 372 and the driver 388 such that the treatment liquid may be
supplied while the first supply point moves between the center of
the substrate W and an end of the substrate W once during the first
supply operation S120. Thereafter, the second supply operation S130
is performed as in FIGS. 9 and 10.
[0081] Referring to FIG. 13, unlike FIGS. 7 and 12, the first
supply operation is performed while the first supply point
reciprocates between the central area of the substrate W and the
peripheral area of the substrate W once. For example, the
controller 400 controls the valve 372 and the driver 388 such that
the treatment liquid may be supplied while the first supply point
reciprocates between the center of the substrate W and an end of
the substrate W once during the first supply operation S120.
Thereafter, the second supply operation S130 is performed as in
FIGS. 9 and 10.
[0082] Unlike FIGS. 7, 12, and 13, the movement of the first supply
point in the first supply operation S120 allows the treatment
liquid to be supplied while the first supply point moves between
various locations and/or various numbers of times.
[0083] As mentioned above, the inventive concept may prevent
contamination of the substrate due to particles and a leaning
phenomenon due to the substrate drying phenomenon by providing the
second nozzle 394 that discharges the treatment liquid to the
peripheral area of the substrate in addition to the first nozzle
384 to shorten a time period for which the treatment liquid is
applied to the whole substrate W when the liquid is supplied and
minimize a time for generation of the drying area of the
substrate.
[0084] According to the embodiments of the inventive concept, a
time for generation of a drying area of the substrate may be
minimized when the liquid is supplied.
[0085] Further, according to the embodiments of the inventive
concept, contamination of the substrate due to particles may be
prevented.
[0086] Further, according to the embodiments of the inventive
concept, leaning of the substrate due to particles may be
prevented.
* * * * *