U.S. patent application number 15/600898 was filed with the patent office on 2017-09-07 for lithography apparatus comprising a plurality of individually controllable write heads.
The applicant listed for this patent is Carl Zeiss SMT GmbH. Invention is credited to Markus Deguenther, Dirk Doering, Enrico Geissler, Lakshmanan Senthil Kumar, Stefan Richter, Guenter Rudolph, Martin Voelcker.
Application Number | 20170255110 15/600898 |
Document ID | / |
Family ID | 53039409 |
Filed Date | 2017-09-07 |
United States Patent
Application |
20170255110 |
Kind Code |
A1 |
Richter; Stefan ; et
al. |
September 7, 2017 |
LITHOGRAPHY APPARATUS COMPRISING A PLURALITY OF INDIVIDUALLY
CONTROLLABLE WRITE HEADS
Abstract
The disclosure relates to a lithography apparatus for writing to
substrate wafers. The apparatus includes: a light generating device
including one or a plurality of light sources for generating light;
a writing device; a light transferring device including a number of
optical waveguides for transferring the light from the light
generating device to a writing device, the writing device including
a plurality of individually controllable write heads for projecting
the light from the one or the plurality of light sources in
different regions of a substrate wafer; a transport device for
moving the substrate wafer relative to the writing device in a
predefined transport direction; and a control device for
controlling the writing process on the substrate wafer.
Inventors: |
Richter; Stefan; (Jena,
DE) ; Geissler; Enrico; (Jena, DE) ; Doering;
Dirk; (Erfurt-Hochheim, DE) ; Kumar; Lakshmanan
Senthil; (Erfurt, DE) ; Rudolph; Guenter;
(Jena, DE) ; Voelcker; Martin; (Koenigsbronn-Zang,
DE) ; Deguenther; Markus; (Aalen, DE) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Carl Zeiss SMT GmbH |
Oberkochen |
|
DE |
|
|
Family ID: |
53039409 |
Appl. No.: |
15/600898 |
Filed: |
May 22, 2017 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
PCT/EP2015/059143 |
Apr 28, 2015 |
|
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|
15600898 |
|
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
B23K 26/0604 20130101;
G03F 7/70383 20130101; G03F 7/70791 20130101; G03F 7/7085 20130101;
G02B 6/4206 20130101; G02B 26/123 20130101 |
International
Class: |
G03F 7/20 20060101
G03F007/20; B23K 26/06 20060101 B23K026/06; G02B 6/42 20060101
G02B006/42; G02B 26/12 20060101 G02B026/12 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 27, 2014 |
DE |
102014224314.9 |
Claims
1. An apparatus, comprising: a light generating device comprising
at least one light source configured to generate light; a writing
device comprising a plurality of individually controllable write
heads configured to project the light from the at least one light
source onto different regions of a substrate wafer; a light
transferring device comprising a plurality of optical waveguides
configured to transfer the light from the light generating device
to the writing device; a transport device configured to provide
relative movement between the writing device and the substrate
wafer in a transport direction; and a control device configured to
control writing on the substrate wafer, wherein the apparatus is a
lithography apparatus.
2. The apparatus of claim 1, wherein each write head comprises: a
light input coupling device configured to couple the light from the
plurality of optical waveguides into the write head; an optical
device configured to generate a light spot comprised of the light
beams from the individual optical waveguides on the substrate
wafer; and a scanning device configured to move the light spot in a
scanning manner on the substrate wafer in a scanning direction
which is transverse to the transport direction.
3. The apparatus of claim 2, wherein: for at least one of the write
heads, the scanning device comprises an oscillating scanning mirror
configured to generate a sinusoidal movement trajectory of the
light spot on the substrate wafer moving in the transport
direction; and the control device is configured to vary a light
intensity of at least one of the light beams forming the light spot
on the substrate wafer depending on a current speed of the light
spot on the substrate wafer during a scanning period.
4. The apparatus of claim 1, wherein: each write head is configured
to a strip-shaped region of the substrate wafer; and the
strip-shaped regions exposed by different write heads are offset
relative to each other in the transport direction so that the
strip-shaped regions form a continuous area.
5. The apparatus of claim 1, further comprising a detection device
comprising a plurality of measuring devices, wherein each measuring
device: is individually assigned to the individual write heads to
monitor a width and/or an orientation of the strip-shaped regions;
and comprises at least two photodiodes arranged one behind the
other in a scanning direction of the light beam in a scanning
region of the respective write head, the scanning direction being
transverse to the transport direction.
6. The apparatus of claim 5, wherein the measuring device is
configured to individually detect each light beam of the light spot
comprised of the light beams from the individual optical
waveguides.
7. The apparatus of claim 1, further comprising: a detection device
comprising a plurality of measuring devices; and a light detector,
wherein: each measuring device is assigned to the individual write
heads to monitor a width and an orientation of the strip-shaped
regions; each measuring device comprises two reflective structures
on the substrate wafer along a scanning direction which is
transverse to the transport direction; each measuring device is
configured to capture by the light spot of the respective write
head and a light detector; and the light detector is in the
respective write head and configured to detect light reflected back
from the reflective structures.
8. The apparatus of claim 7, wherein the measuring device is
configured to individually detect each light beam of the light spot
comprised of the light beams from the individual optical
waveguides.
9. The apparatus of claim 1, wherein a light source is in each case
assigned to a single write head, and each light source is
individually drivable.
10. The apparatus of claim 1, wherein: a light source is assigned
to a plurality of the write heads; and each write head is assigned
an individual electro-optical modulator configured to modulate a
light intensity of the light provided by the light source assigned
to the write head.
11. The apparatus of claim 1, wherein each optical waveguides
assigned to a write head is respectively assigned a separately
drivable electro-optical modulator.
12. A write head, comprising: a light input coupling device; an
optical device; and a scanning device, wherein: the write head is
configured to be used with the apparatus of claim 1 such that
during use with the apparatus of claim 1: the light input coupling
device couples the light from a plurality of optical waveguides;
and the optical device generates a light spot comprised of the
light beams from the individual optical waveguides on the substrate
wafer; and the scanning device moves the light spot in a scanning
manner on the substrate wafer in a scanning direction which is
transverse to the transport direction.
13. The write head of claim 12, wherein: the light input coupling
device comprises a plurality of waveguide structures in a
transparent substrate; on an input side, the waveguide structures
are at least at a distance from each other that corresponds to a
diameter of the individual optical waveguides; and on an output
side, the waveguide structures converge to form a spatially
narrowly delimited waveguide bundle.
14. The write head of claim 13, wherein: the input coupling device
comprises a plurality of microlenses and a telescope optical unit
optically downstream of the microlenses; for each microlens, the
microlens is configured to image, in a magnified fashion, the
output of an optical waveguide assigned to the microlens; and the
telescope optical unit is configured to the image so that the light
spot comprised of the light beams of the individual optical
waveguides arises on the substrate wafer.
15. The write head of claim 12, wherein: the scanning device
comprises a scanning mirror that is movable about a scanning axis
and that is configured to guide the light spot imaged on the
substrate wafer in a periodic scanning movement over the substrate
wafer; and the periodic scanning movement is transverse to the
transport direction.
16. The write head of claim 15, wherein the scanning device is
configured to perform a periodic line compensation movement of the
light spot on the substrate wafer.
17. The write head of claim 12, wherein: the optical device
comprises a collimator optically upstream of the scanning device to
generate parallel light beams; and a telecentric imaging optical
unit and/or f-theta lens optically downstream of the scanning
device to focus the parallel light beams on the substrate
wafer.
18. A method, comprising: providing the apparatus of claim 1;
moving the substrate wafer in the transport direction; projecting a
plurality of light beams onto the substrate wafer to generate on
the substrate wafer a light spot formed from a plurality of
individual light spots; oscillating the light spot transverse to
the transport direction to generate a sinusoidal movement
trajectory of the light spot on the substrate wafer; and varying a
light intensity of at least one of the light beams during a
scanning period depending on a current speed of the light spot on
the substrate wafer.
19. An apparatus, comprising: at least one light source configured
to generate light; a plurality of individually controllable write
heads configured to project the light from the at least one light
source onto different regions of a substrate wafer; a plurality of
optical waveguides configured to transfer the light from the at
least one light source to the write heads; a device configured to
provide relative movement between the writing device and the
substrate wafer in a transport direction; and a control device
configured to control writing on the substrate wafer, wherein the
apparatus is a lithography apparatus.
20. An apparatus, comprising: at least one light source configured
to generate light; a plurality of individually controllable write
heads configured to project the light from the at least one light
source onto different regions of a substrate wafer; a plurality of
optical waveguides configured to transfer the light from the at
least one light source to the write heads; and a device configured
to provide relative movement between the writing device and the
substrate wafer in a transport direction, wherein the apparatus is
a lithography apparatus.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application is a continuation of, and claims
benefit under 35 USC 120 to, international application
PCT/EP2015/059143, filed Apr. 28, 2015, which claims benefit under
35 USC 119 of German Application No. 10 2014 224 314.9, filed Nov.
27, 2014. The entire disclosure of international application
PCT/EP2015/059143 and German Application No. 10 2014 224 314.9 are
incorporated by reference herein.
FIELD
[0002] The disclosure relates to a lithography apparatus including
a plurality of write heads for writing to substrates. Furthermore,
the disclosure relates to a write head for such a lithography
apparatus.
BACKGROUND
[0003] Photolithographic patterning methods are typically used for
producing microstructures, in which methods the desired structure
is transferred into a photosensitive layer arranged on a substrate
and the substrate is patterned in a desired manner via the exposed
photosensitive layer in subsequent chemical and physical processes.
Either imaging or directly writing exposure systems are used for
transferring the respective structures into the photosensitive
layer. In the first case, a pattern produced in a mask beforehand
is projected onto the substrate in a greatly reduced fashion via a
complex projection system. By using suitable masks, with the aid of
a projection system it is possible to transfer a relatively large
number of structures to the substrate all at once, which becomes
apparent in a high throughput, in particular. On account of the
high precision during the imaging of structures in the micrometres
and nanometres range, projection exposure systems are constructed
in a very complex fashion and are therefore also very
cost-intensive both in terms of procurement and in operation. By
contrast, directly writing lithography exposure systems, in which
the desired structures are written directly into the photosensitive
layer on the substrate wafer via a laser, manage with a
significantly less complex construction.
[0004] However, the writing speed of such directly writing laser
systems does not suffice to obtain a throughput comparable with the
projection exposure systems.
SUMMARY
[0005] The disclosure seeks to provide a directly writing
lithography exposure apparatus which firstly can be constructed
expediently from standard components and at the same time enables a
sufficiently high throughput.
[0006] In one general aspect, the disclosure provides a lithography
apparatus for writing to substrate wafers. The apparatus includes a
light generating device that includes one or a plurality of light
sources for generating light. The apparatus also includes a writing
device and a light transferring device. The light transferring
device includes a number of optical waveguides for transferring the
light from the light generating device to the writing device. The
writing device includes a plurality of individually controllable
write heads for projecting the light from the one or the plurality
of light sources in different regions of a substrate wafer. The
apparatus also includes a transport device for moving the substrate
wafer relative to the writing device in a predefined transport
direction. In addition, the apparatus includes a control device for
controlling the writing process on the substrate wafer.
[0007] In another general aspect, the disclosure provides a write
head for such a lithography apparatus. The write head includes a
light input coupling device for coupling the light from a plurality
of optical waveguides into the write head. The write head also
includes an optical device for generating a light spot composed of
the light beams from the individual optical waveguides on the
substrate wafer. The write head further includes a scanning device
for moving the light spot in a scanning manner on the substrate
wafer in a scanning direction transversely with respect to the
transport direction.
[0008] In a further general aspect, the disclosure provides a
method for writing to a substrate wafer with the aid of such a
lithography apparatus. The substrate wafer is moved in a transport
direction. A plurality of light beams are projected onto the
substrate wafer in order to generate on the substrate wafer a light
spot formed from a plurality of individual light spots. The light
spot is moved in an oscillating fashion transversely with respect
to the transport direction in order to generate a sinusoidal
movement trajectory of the light spot on the substrate wafer. The
light intensity of at least one of the light beams is varied during
a scanning period in a manner dependent on the current speed of the
light spot on the substrate wafer.
[0009] The disclosure provides a lithography apparatus for writing
to substrate wafers including a light generating device including
one or a plurality of light sources for generating light, a light
transferring device including a number of optical waveguides for
transferring the light from the light generating device to a
writing device, the writing device including a plurality of
individually controllable write heads for projecting the light from
the one or the plurality of light sources in different regions of a
substrate wafer, a transport device for moving the substrate wafer
relative to the writing device in a predefined transport direction,
and a control device for controlling the writing process on the
substrate wafer. By using a plurality of individually controllable
write heads, it is possible to significantly increase the exposure
time of the substrate wafer and, in association therewith, also the
throughput of the lithography apparatus.
[0010] In one embodiment it is provided that the write heads in
each case include a light input coupling device for coupling the
light from a plurality of optical waveguides into the respective
write head, an optical device for generating a light spot composed
of the light beams from the individual optical waveguides on the
substrate wafer, and a scanning device for moving the light spot in
a scanning manner on the substrate wafer in a scanning direction
transversely with respect to the transport direction. By
integrating the components into a single housing, it is possible to
produce particularly compact write heads. By using light beams from
a plurality of optical waveguides, it is possible to generate a
particularly light-intensive light spot on the substrate. The
latter in turn enables particularly high scanning speeds, which
becomes apparent in a higher throughput. Furthermore, by setting
the light intensity of the individual light beams, it is possible
to vary the profile of the light spot used for writing. Different
distortions of the writing beam can thus be compensated for.
Furthermore, the resolution obtained during the writing process can
thus also be varied.
[0011] In a further embodiment it is provided that the scanning
device of at least one write head includes an oscillating scanning
mirror, which generates a sinusoidal movement trajectory of the
light spot on the substrate wafer moving in the transport
direction. In this case, the control device is designed to vary the
light intensity of at least one of the light beams forming the
light spot on the substrate wafer in a manner dependent on the
current speed of the light spot on the substrate wafer during a
scanning period. By varying the light intensity, it is possible to
compensate for a different exposure of the substrate strip to be
written to in regions of the turning points of the sinusoidal
movement trajectory and, consequently, to achieve a homogeneous
exposure over the entire width of the strip-shaped region to be
written to. In particular, the light intensity is reduced in a
suitable manner in the regions of the turning points of the
sinusoidal trajectory. This can be carried out jointly both for
individual light beams and for all light beams. With the use of
pulsed light beams, a reduction of the light intensity can also be
achieved by adapting the duty ratio of switch-on and switch-off
times. In this case, in the regions of the turning points, the
switch-on times of the light beams or of the respective light
sources are reduced and/or the corresponding switch-off times are
lengthened.
[0012] In a further embodiment, the write heads are designed to
scan in each case separate window-shaped regions of the substrate
wafer, wherein the window-shaped regions of the individual write
heads are arranged in a manner offset relative to one another in
the transport direction in such a way that the strip-shaped regions
of the substrate wafer which are exposed by the individual write
heads on account of the transport movement of the substrate wafer
relative to the writing device form a continuous area. By this
means, even relatively large areas can be written to particularly
rapidly and precisely.
[0013] A further embodiment provides for the write heads of the
writing device to be arranged one behind another and/or alongside
one another in the transport direction of the substrate wafer. The
arrangement one behind another allows the use of write heads whose
diameter turns out to be significantly wider in comparison with
their scanning region. By arranging the scanning heads alongside
one another, it is possible for a plurality of groups including in
each case a number of scanning heads arranged one behind another to
be combined to form larger writing units.
[0014] In a further embodiment it is provided that provision is
made of a detection device including a plurality of measuring
devices assigned in each case individually to the individual write
heads and serving for monitoring the width and/or the orientation
of the strip-shaped regions exposed via the individual write heads.
In this case, each measuring device includes at least two
photodiodes arranged one behind another in the scanning direction
of the light beam in a scanning region of the respective write
head. With the aid of said detection device, the strip-shaped
regions exposed by the different write heads can be coordinated
with one another, with the result that a seamless overall area
results therefrom. In this case, the light beams can be measured
particularly simply with the aid of the photodiodes arranged below
the write head.
[0015] In an alternative embodiment it is provided that a measuring
device assigned to a write head includes two reflective structures,
which are arranged in each case on a substrate wafer in a manner
distributed along a scanning direction transversely with respect to
the transport direction and in a manner enabling capture by the
light spot of the respective write head, and a light detector,
which is arranged in the respective write head and detects the
light reflected from the reflective structures. A simple and
precise measurement of the light beams can be obtained with the aid
of this measuring device, too.
[0016] In a further embodiment it is provided that the measuring
device is designed to individually detect each light beam of the
light spot composed of the light beams from the individual optical
waveguides. The profile of the light spot writing on the substrate
wafer can be monitored by this means. This in turn makes it
possible to produce structures having a higher resolution in the
x-direction.
[0017] In a further embodiment it is provided that each light
source is in each case assigned to a single write head, wherein the
respective light source is individually drivable. By this means,
the light intensity of the light beams of the respective write head
can be achieved particularly simply by modulation of the light
source. A specific electro-optical modulation device can therefore
be omitted.
[0018] In a further embodiment it is provided that a light source
is assigned to a plurality of write heads, wherein each of said
write heads is assigned an individual electro-optical modulator for
modulating the light intensity of the light provided by the light
source. This makes it possible to use individual high-power light
sources.
[0019] In a further embodiment it is provided that each of the
optical waveguides assigned to a write head is respectively
assigned a separately drivable electro-optical modulator. The light
intensity of the individual beams of the write head can thus be
controlled individually. By this means, in turn, the profile of the
light spot generated by the respective write head on the substrate
surface can be varied particularly simply.
[0020] The disclosure furthermore provides a write head for a
lithography apparatus, wherein the write head includes a light
input coupling device for coupling the light from a plurality of
optical waveguides into the write head, an optical device for
generating a light spot composed of the light beams from the
individual optical waveguides on the substrate wafer, and a
scanning device for moving the light spot in a scanning manner on
the substrate wafer in a scanning direction transversely with
respect to the transport direction. Such a write head can be
constructed particularly compactly. By virtue of its small size, it
is possible for a multiplicity of such individually drivable write
heads to be combined to form larger writing units. Furthermore, the
integration of the respective components into the write head
housing permits particularly rapid installation and demounting of
the respective write head.
[0021] In a further embodiment it is provided that the light input
coupling device includes a plurality of waveguide structures formed
in a transparent substrate, said waveguide structures, on the input
side, being arranged at least at a distance from one another that
corresponds to the diameter of the individual optical waveguides
and, on the output side, converging to form a spatially narrowly
delimited waveguide bundle. With the aid of such waveguide
structures, the light beams from the individual optical waveguides
that are used for the composite light spot can be aligned very
precisely with respect to one another.
[0022] In a further embodiment it is provided that the input
coupling device includes an arrangement of a plurality of
microlenses and a telescope optical unit disposed optically
downstream of the microlenses, wherein each of the microlenses is
designed to image in a magnified fashion the output of an optical
waveguide assigned to the respective microlens. The telescope
optical unit is furthermore designed to reduce the imaging
generated in this case, such that the light spot composed of the
light beams of the individual optical waveguides arises on the
substrate wafer. A precise alignment of the light beams of the
individual optical waveguides can be realized relatively simply
with the aid of the microlenses, too.
[0023] In a further embodiment it is provided that the scanning
device includes at least one scanning mirror which is movable about
a scanning axis and which is designed to guide the light spot
imaged on the substrate wafer in a periodic scanning movement over
the substrate wafer, said periodic scanning movement being carried
out transversely with respect to the transport direction of the
substrate wafer. With the aid of such a scanning device, it is
possible to expose a relatively wide strip-shaped region via the
light spot of a write head.
[0024] In a further embodiment it is provided that the scanning
device is furthermore designed to perform a periodic line
compensation movement of the light spot on the substrate wafer.
With the aid of the periodic line compensation movement, it is
possible to realize rectangular movement trajectories of the light
spot on the substrate wafer, which enables a particularly effective
exposure of the substrate area. Overall, it is thus possible to
increase the writing speed of the write head and thus also the
throughput of the lithography apparatus.
[0025] Finally, in a further embodiment it is provided that the
optical device includes a collimator disposed optically upstream of
the scanning device and serving for generating parallel light beams
and a telecentric imaging optical unit and/or f-theta lens disposed
optically downstream of the scanning device and serving for
focussing the parallel light beams on the substrate wafer. With the
aid of these devices, it is possible to obtain a particularly high
precision during the projection of the light spot on the substrate
wafer.
[0026] The disclosure furthermore provides a method for writing to
a substrate wafer with the aid of a lithography apparatus, wherein
the substrate wafer is moved in a transport direction and wherein a
plurality of light beams are projected onto the substrate wafer in
order to generate on the substrate wafer a light spot formed from a
plurality of individual light spots. The light spot is furthermore
moved in an oscillating fashion transversely with respect to the
transport direction in order to generate a sinusoidal movement
trajectory of the light spot on the substrate wafer. In this case,
the light intensity of at least one of the light beams is varied
during a scanning period in a manner dependent on the current speed
of the light spot on the substrate wafer. By varying the light
intensity, it is possible to compensate for the different exposure
of the substrate strip to be written to and, consequently, to
achieve a homogeneous exposure over the entire width of the
strip-shaped region to be written to. In particular, the light
intensity is reduced in the regions of the turning points of the
sinusoidal trajectory. This can be carried out jointly both for
individual light beams and for all light beams. With the use of
pulsed light beams, a reduction of the light intensity can also be
achieved by adapting the duty ratio of switch-on and switch-off
times. In this case, in the regions of the turning points, the
switch-on times of the light beams or of the respective light
sources are reduced and/or the corresponding switch-off times are
lengthened.
[0027] The disclosure is described in greater detail below with
reference to figures, in which:
[0028] FIG. 1 schematically shows a lithography apparatus according
to the disclosure with a writing device including a plurality of
write heads;
[0029] FIG. 2 shows by way of example a write head for a
lithography apparatus with a multiplicity of write heads arranged
in matrix form;
[0030] FIG. 3 shows by way of example the construction of a write
head of the writing device from FIG. 2;
[0031] FIG. 4 shows by way of example an input coupling device for
coupling a plurality of optical waveguides into a write head from
FIG. 3;
[0032] FIG. 5 shows an alternative embodiment of the write head
with an input coupling device including a microlens
arrangement;
[0033] FIG. 6 shows by way of example the distribution of the light
intensity of a light spot formed from a plurality of light
beams;
[0034] FIG. 7 shows the distribution of the light intensity in the
case of a light spot whose width is reduced by modulation of the
outer light beams;
[0035] FIG. 8 schematically shows the exposure process of a
substrate strip via an oscillating light spot;
[0036] FIG. 9 schematically shows an alternative form of scanning
the substrate via a light spot guided in a rectangular trajectory
over the substrate;
[0037] FIG. 10 schematically shows the scanning process of a
continuous substrate area via a matrix-type arrangement of a
plurality of write heads;
[0038] FIG. 11 schematically shows an alternative arrangement of
the write heads for realizing a closed scanning area;
[0039] FIG. 12 schematically shows the construction of a detection
device realized via photodiodes and serving for monitoring the
writing beam of a write head of the lithography apparatus;
[0040] FIG. 13 schematically shows a plan view of a detection
device from FIG. 12 arranged below the substrate wafers;
[0041] FIG. 14 shows the basic construction of an alternative
detection device, which has a test substrate having reflective
structures and serving for monitoring the writing process of a
write head of the lithography apparatus;
[0042] FIG. 15 shows a plan view of a test substrate arranged
between two regular substrate wafers;
[0043] FIG. 16 shows a diagram with temporal profiles of different
variables for illustrating the manner of operation of the detection
device;
[0044] FIG. 17 shows a scanning movement of the light spot with a
relatively large amplitude and long dark phases;
[0045] FIG. 18 shows a scanning movement of the light spot with a
relatively small scanning amplitude and for avoiding dark
phases;
[0046] FIG. 19 shows a first partial exposure pattern during the
falling edges of the scanning movement; and
[0047] FIG. 20 shows a second partial exposure pattern during the
rising edges of the scanning movement.
[0048] In order to realize a novel lithography apparatus, the
intention is to use a preferably fixed compact write device
including a plurality of individually drivable scanning write
heads. In this case, the write heads are arranged above the
substrate in such a way that a seamless exposure or inscription of
the entire substrate surface is carried out via a transport
movement of the substrate below the writing device. FIG. 1
schematically shows the basic construction of the lithography
apparatus 100 according to the disclosure. In this case, such a
lithography apparatus 100 includes a light generating device 110
for generating light having a desired wavelength and coherence, a
light transferring device 120 for transferring the light from the
light generating device 110 to the writing device 140, the writing
device 140 including a plurality of individually operating write
heads 200.sub.1, 200.sub.2, 200.sub.3 for writing to a substrate
wafer 300.sub.2 (wafer) via a plurality of light beams 401.sub.1,
401.sub.2, 401.sub.3, a transport device 150 arranged below the
writing device 140 and serving for precisely moving a substrate
wafer 300.sub.2 during the writing process below the writing device
140, and a control device 170 for coordinating the operation of the
individual components during the writing process. For the purpose
of monitoring and calibration of the writing device 140, the
lithography apparatus 100 can furthermore include a specific
detection device 160.
[0049] The writing device 140 forms a central part of the
lithography apparatus 100 according to the disclosure, said writing
device substantially consisting of a specific arrangement of a
plurality of write heads. The writing device 140 includes means for
precisely positioning and aligning the write heads 200.sub.i within
the writing device 140. The write heads 200, here are in each case
designed to write to the semiconductor wafer 300.sub.2 via an
individually controllable light beam 401.sub.i. For this purpose,
each write head 200.sub.1, 200.sub.2, 200.sub.3 is connected to one
or a plurality of light sources 111.sub.i, 112.sub.i, 113.sub.i of
the light generating device 110 via a plurality of optical
waveguides 122.sub.j of an optical waveguide group 121.sub.i
individually assigned to the respective write head 200.sub.i. In
the present exemplary embodiment, each write head 200.sub.i is
assigned in each case three light sources 111.sub.i, 112.sub.i,
113.sub.i, wherein the light from the individual light sources is
transferred to the respective write head 200.sub.i in each case via
a single optical waveguide 122.sub.1-122.sub.N of the associated
optical waveguide group 121.sub.i. Alternatively, the light from a
light source can also be fed to the respective write head 200.sub.i
via a plurality of optical waveguides. In order to obtain a high
energy throughput, monomode optical waveguides are preferably used.
It is provided that the intensity of the light fed to a write head
200.sub.i via an optical waveguide group 121.sub.i is individually
modulatable for each optical waveguide 122.sub.1-122.sub.N of the
optical waveguide group 121.sub.i. In the case where each optical
waveguide 122.sub.1-122.sub.N of the optical waveguide group
121.sub.i is assigned in each case one light source 111.sub.i,
112.sub.i, 113.sub.i, this can be carried out via an individual
control of the respective light source 111.sub.i, 112.sub.i,
113.sub.i. By contrast, if a plurality of optical waveguides
122.sub.1-122.sub.N are assigned to a common light source
111.sub.i, 112.sub.i, 113.sub.i, the light intensity in the
individual optical waveguides 122.sub.1-122.sub.N can be
individually controlled via electro-optical modulators 131.sub.i
arranged in the transfer path between the respective light source
111.sub.i, 112.sub.i, 113.sub.i and the assigned write head
200.sub.i. A corresponding modulation device 130 including a
plurality of electro-optical modulators 131.sub.1, 131.sub.2,
131.sub.3 is shown by way of example in FIG. 1. For the coordinated
driving of the modulation device 130, the latter is connected to
the central control device 170 via a control line 172. The light
generating device 110 is also connected to the central control
device 170 via a dedicated control line 171 for the purpose of
individual driving of individual light sources 111.sub.i,
112.sub.i, 113.sub.i or light source groups including a plurality
of said light sources 111.sub.i, 112.sub.i, 113.sub.i.
[0050] In order to generate a suitable writing beam 401.sub.i for
writing to the substrate wafer 300.sub.2, each write head 200.sub.i
includes an input coupling device 220 for coupling in the light
from the associated optical waveguides 122.sub.1-122.sub.N of the
optical waveguide group 121, assigned to the respective write head
200.sub.i, a beam shaping device 230 for shaping a suitable light
beam bundle 401 composed of the light beams 400.sub.1-400.sub.N
from the individual optical waveguides 122.sub.1-122.sub.2, a
scanning device 240 for producing a scanning movement of the light
beam bundle 401, and also an exit optical unit for projecting the
generated light beam bundle 401 onto the surface of the substrate
wafer 300.sub.2 to be written to. For controlling the scanning
movement of each individual write head 200.sub.i, the writing
device 140 is connected to the central control device 170 via at
least one control line 173.
[0051] In order that the scanning movement of the light beam bundle
401.sub.i, which scanning movement is restricted only to a limited
region of the substrate wafer 300.sub.2, is converted into a
continuous writing movement, the substrate wafer 300.sub.2 to be
written to is moved via the transport device 150 in a controlled
movement below the writing device 140 in a predefined transport
direction 501. In this case, the transport device 150 used can be
any suitable device with the aid of which a precisely controllable
transport movement of one or a plurality of substrate wafers 300 is
possible. By way of example, the transport device 150 can be
realized in the form of a conveyor belt for continuously
transporting a plurality of substrate wafers 300.sub.1, 300.sub.2,
300.sub.3. For controlling the transport movement 50, the transport
device 150 is connected to the central control device 170 via at
least one control line 174.
[0052] For calibrating individual write heads 200 and monitoring
the joint writing process of a plurality of write heads 200.sub.i,
the lithography apparatus 100 furthermore includes a specific
detection device 160 including preferably a plurality of detectors
161.sub.i. The detection device 160, which is connected to the
central control device 170 via at least one control line 175,
captures the position and, if appropriate, also the beam profile of
the writing beams 401.sub.i of the individual write heads
200.sub.i. Such a detection device can be realized in various ways,
in principle. In the present exemplary embodiment, the detection
device 160 arranged below the substrate wafer 300.sub.2 to be
written to includes a plurality of measuring devices 161.sub.i
having in each case a plurality of specifically arranged
photodiodes, said measuring devices being arranged in the writing
beams 401.sub.i of the individual write heads 200.sub.i.
[0053] FIG. 2 shows by way of example a perspective sectional
illustration through the writing device 140 of the lithography
apparatus 100 according to the disclosure. The writing device 140
includes a baseplate 141 and a plurality of write heads 200.sub.i,j
arranged in matrix form and fixed within the baseplate 141. The
write heads 200.sub.i,j arranged in the form of rows and columns
are in this case incorporated vertically in the z-direction in
respective opening regions 142 specifically formed in the baseplate
141 and are individually alignable via specific holding elements
144 and associated adjusting screws 143. Within the write head
arrangement 145 in matrix form, the individual write heads
200.sub.i,j are arranged in the form of columns one behind another
in the x-direction, which corresponds to the transport direction of
the substrate 300, and alongside one another in the
y-direction.
[0054] FIG. 3 shows the internal construction of a write head 200
according to the disclosure. The write head 200 has a pin-shaped
housing 210, in which all the components of the write head 200 are
integrated. The substantially cylindrical housing 210 has, shaped
at the end, a housing cover 211 having an opening 212 for receiving
optical waveguides 122.sub.1 to 122.sub.N of an optical waveguide
group 121.sub.1 assigned to the respective write head 200.sub.i. In
this case, the opening 212 is preferably embodied in a slot-type
fashion, such that the optical waveguides enter the write head 200
in a manner arranged alongside one another in the x-direction. In
order to efficiently couple in the light from the optical
waveguides 122.sub.1 to 122.sub.N, the write head 200 includes an
input coupling device 220, which in the present case includes a
suitable glass substrate 223 with waveguide structures 224.sub.1,
224.sub.N which are formed therein and are respectively
individually assigned to the optical waveguides 122.sub.1 to
122.sub.N. For fixing and precisely aligning the optical waveguides
122.sub.1 to 122.sub.N, the input coupling device 220 furthermore
includes an optical waveguide receptacle 221, which can include for
example a glass substrate having V-shaped grooves 222. The
waveguide structures 224 combine the light beams from the
individual optical waveguides 122.sub.1 to 122.sub.N on the output
side to form a narrow light beam bundle. The quality of the focus
and the spacing of the beams on the substrate wafer result directly
from the arrangement of the waveguides with respect to one
another.
[0055] The light beams 400 emerging from the input coupling device
220 are subsequently shaped in a desired manner to form a parallel
beam bundle in a beam shaping device 230, which includes a
collimator lens 231 in the present exemplary embodiment. The
collimator 231 ensures that the exit ends of the light waveguides,
which are provided with a certain exit angle, are collimated. The
parallel light beams 400.sub.1-400.sub.N now arranged offset at an
angle with respect to one another subsequently pass into a scanning
device 240 having at least one scanning mirror 241 for producing a
periodic scanning movement of the writing beam 401 on the substrate
wafer 300. In this case, the beams meet in a pupil plane, in which
the scanning mirror 241 is situated in the case of a
one-dimensional scanning device 240. In order to achieve a compact
design of the write head 200, the scanning device 240 furthermore
includes further deflection elements 242, 243 in the form of
mirrors or prisms, with the aid of which the parallel light beams
400 are aligned again in the z-direction. A particularly compact
design of the write head 200 is made possible as a result.
Afterward, the parallel light beams 400.sub.1-400.sub.N fanned out
at the scanning mirror 241 leave the write head 200 via a specific
exit optical unit 250 (scanning objective lens), which focuses the
individual light beams 400.sub.1-400.sub.N in the form of a
converging writing beam bundle 401 onto the substrate wafer. In
this case, parallel individual light spots 410.sub.1-410.sub.N
(foci), arise, which represent a reduced imaging of the exit of the
individual waveguides 122.sub.1-122.sub.N. The parallel individual
light spots 410.sub.1-410.sub.N are guided over the surface 301 of
the substrate wafer 300 by the scanning movement.
[0056] The exit optical unit 250 preferably includes a plurality of
optical elements 251, 252, 253, 254, which project the collimated
light beams 400 deflected via the scanning device 240 into a
corresponding number of individual light spots 410.sub.i-410.sub.N,
which are focussed on or in the region of the substrate surface 301
and converge to form a total light spot 420, on the surface 301 of
the substrate wafer 300 or a light-sensitive layer arranged thereon
(not shown here). In order to generate the most precise possible
imaging of the individual light spots 410.sub.i-410.sub.N on the
substrate surface 301, the optical elements 251, 252, 253, 254 can
be embodied in the form of a telecentric scanning objective lens
and/or in the form of an F-theta lens. From the superimposition of
the light spots 410.sub.i-410.sub.N from the individual optical
waveguides 122.sub.1 to 122.sub.N, a continuous light spot 420
extending preferably in the x-direction is formed in this way.
[0057] With the aid of the input coupling device 220 and the beam
shaping device 230, the spatially separate arrangement of the
outputs of the individual optical waveguides 122.sub.1-122.sub.N is
converted into a corresponding number of collimated light beams
400.sub.1-400.sub.N, separated from one another at an angle. In
this case the pupil plane of these collimated light beams
400.sub.i-400.sub.N is formed by the minimum diameter of the
overlapping light beams. In this case, the scanning element 241 is
preferably arranged within the pupil plane and deflects the
individual light beams according to their entrance angle. In the
case where a plurality of scanning elements are used for a
two-dimensional scanning movement, said scanning elements are
preferably arranged as near as possible to the pupil plane (not
shown here). In this case, the light beams 400 are deflected
preferably in the y-direction, which runs perpendicularly to the
plane of the drawing in FIG. 3. The scanning movement can be
carried out sinusoidally (harmonically), in this case, wherein the
scanning mirror 241 or the respective scanning element oscillates
in a resonant fashion. Particularly high scanning amplitudes 433
are possible by this means. Furthermore, a rectangular driving of
the scanning mirror 241 or of the scanning element or scanning
elements is also possible.
[0058] In the present exemplary embodiment, the light from the
individual optical waveguides 122.sub.1-122.sub.N is coupled in via
a specific input coupling device 220, which is illustrated in
greater detail in FIG. 4. In the present exemplary embodiment, the
input coupling device 220 includes a flat waveguide substrate 223,
in the surface of which a number of waveguides 224.sub.1-224.sub.N
corresponding to the number of connected optical waveguides
122.sub.1-122.sub.N are formed. Such waveguides can be produced via
ion diffusion, for example. For coupling the light from the optical
waveguides 122.sub.1-122.sub.N into the waveguides, a receptacle
plate 221 is provided, for example a glass plate, in which
specifically shaped grooves 222.sub.1-222.sub.N for receiving the
individual optical waveguides 122.sub.1-122.sub.N are formed. With
the aid of the for example V-shaped grooves (V-grooves) the optical
waveguides 122.sub.1-122.sub.N can be precisely aligned and fixed
in relation to the waveguides 224.sub.1-224.sub.N. The receptacle
plate 221 can also be embodied integrally with the waveguide plate
223.
[0059] The waveguides 224.sub.1-224.sub.N converge in a bell-shaped
fashion on the waveguide plate 223, such that the light beams
entering the waveguides over a width 226 on the input side are
combined to a significantly smaller output width 227 in the
waveguide substrate 223. As an alternative to the use of
waveguides, a bundling of the light beams entering the write head
via the optical waveguides 122.sub.1 to 122.sub.n can also be
realized with the aid of a microlens arrangement. FIG. 5
schematically shows an alternative embodiment of the write head 200
including a corresponding microlens arrangement 228. The microlens
arrangement 228 includes a number of microlenses
229.sub.1-229.sub.N corresponding to the number of entering optical
waveguides 122.sub.1-122.sub.N, via which microlenses the outputs
of the corresponding optical waveguides 122.sub.1-122.sub.N are
firstly magnified, for example by a factor of 20.times.. Afterward,
the magnified image is reduced to the desired size, for example by
the factor 1/20.times., via a telescope 230 including the optical
elements 231, 232, 233, for example. The correspondingly shaped
light beams 400.sub.1-400.sub.N can subsequently be deflected in a
desired manner in a scanning device 240 including a scanning mirror
241 or other scanning elements. The deflected light beams 401 are
then projected via an exit optical unit 250, which is illustrated
merely in the form of an exit lens in FIG. 5, in a suitable manner
onto the surface 301 of the substrate 300 or a light-sensitive
layer (not shown here) arranged on the substrate 300, in the form
of a light spot 420 composed of a plurality of individual light
spots 410.sub.1-410.sub.N.
[0060] FIG. 6 shows by way of example the intensity distribution of
a light spot 420 composed of a total of ten individual light spots
410.sub.1-410.sub.10. The intensity distribution of the individual
light spots 410.sub.1-410.sub.10 is illustrated in each case in the
form of a Gaussian curve with an intensity maximum identified via a
vertical line. The individual light spots 410.sub.1-410.sub.10,
preferably arranged at identical distances alongside one another in
the x-direction, are superimposed in this case to such an extent
that a continuous light spot 420 that is elongate in the
x-direction and has a desired width results therefrom. By
individual modulation of the light beams 400.sub.1-400.sub.N
coupled into the respective write head 201 by the individual
optical waveguides 122.sub.1-122.sub.N, the intensity profile of
the composite light spot 420 can be varied arbitrarily. In
particular, the width of the composite light spot 420 can be
altered by a reduction of the light intensity of the marginal rays.
Besides the width variation, by introducing individual light beams
on one side and simultaneously masking out individual light beams
on the opposite side, it is also possible to realize a lateral
displacement of the total light spot 420 generated by
superimposition of the individual light spots 410.sub.1-410.sub.N.
These possibilities for variation of the width and the lateral
position of the light spot 420 can be used for better control of
the writing process on the substrate. In particular, an improvement
of the resolution obtained can be realized via the variation of the
width of the light spot. Furthermore, distortions which can arise
in the image field during operation can also be compensated for by
variation of the line width.
[0061] FIG. 7 shows by way of example a composite light spot 420
having a total width reduced by the reduction of the light
intensity of the outer beams 410.sub.1, 410.sub.2, 410.sub.9,
410.sub.10.
[0062] As already described in connection with FIG. 1, the writing
process of a write head 200 is carried out via a superimposition of
the transport movement of the substrate wafer 300 in the
x-direction and a scanning movement 502 of the light spot 420
projected onto the substrate surface 301, said scanning movement
being carried out transversely with respect to the transport
movement. FIG. 8 elucidates the process of writing to a defined
strip 430 of the substrate surface 301 via the superimposition of
the periodic scanning movement 502 and the transport movement 501.
The illustration shows a plan view of a region of the substrate
surface 301 situated below a write head 200. In this case, the
substrate wafer 300 performs the transport movement 501
continuously in the x-direction. In this case, the light spot 420
projected onto the substrate surface 301 simultaneously performs a
preferably resonant oscillation movement 502 in a predefined
scanning direction 506. In the case of a one-dimensional scanning
movement 502, the scanning region 251 that can be captured directly
by the light spot 420 is predefined in particular by the width of
the light spot 420 and the scanning amplitude 433 in the
x-direction. The superimposition of the transport movement 501 and
the oscillation movement 502 results in a substantially harmonic or
sinusoidal movement trajectory 504 of the light spot 420 on the
substrate wafer 300. In this case, the speeds of the transport
movement 501 and of the oscillation movement 502 are coordinated
with one another in such a way that the light spot 420 passes at
least once every region of the exposed strip 430 of the substrate
surface 301, said exposed strip being delimited via the dotted
lines. Since a substantially sinusoidal exposure pattern is
generated in this case, regions exposed to different extents are
generally present. If the transport speed 501 of the substrate 300
is too high, adjacent loops of the sinusoidal exposure pattern can
be so far apart from one another that specific substrate regions
between the loops remain unexposed. In order to prevent this and
thus to enable higher transport speeds of the substrate and hence
also higher writing speeds, an alternative scanning device having a
two-dimensional scanning movement can be used. In the case of this
scanning device, besides the periodic oscillation movement carried
out transversely with respect to the transport movement 501, an
additional line compensation movement 503 in the x-direction is
also carried out. In this respect, FIG. 9 shows by way of example
an exposure trajectory 505 realized via such a 2D scanning device.
While the exposure spot 420, on account of the oscillation movement
of the scanning mirror 241, still carries out a preferably harmonic
oscillation movement 502 in the scanning direction 506, a periodic
line compensation movement 503--carried out in a line compensation
direction 507 transversely with respect to the scanning direction
506--for compensation of the transport movement 501 of the
substrate 300 can be realized with the aid of the same scanning
mirror 241 or with the aid of a further scanning element of the
write head 200.sub.i,j.
[0063] Since the amplitude of the compensation movement 503
typically turns out to be significantly smaller than the amplitude
433 of the scanning movement 502, a non-harmonically oscillating
scanning element can also be used in this case. Given optimum
coordination of the two periodic movements 502, 503 with one
another, it is thus possible even to realize a substantially
rectangular movement trajectory 505 of the light spot 420 on the
substrate 300. As a result of the significantly more uniform
exposure of the strip 430 in this case, higher transport speeds and
thus higher writing speeds can also be realized by this means in
comparison with a scanning device that operates only
one-dimensionally.
[0064] Both in the case of one-dimensional scanning and in the case
of two-dimensional scanning, however, the scanning direction 506
need not necessarily correspond to the y-direction predefined by
the lithography apparatus 100, which is the case as in the examples
in FIGS. 8 and 9. Rather, the scanning movement 502 can also be
carried out in a direction that deviates from the y-direction. The
same also applies to the line compensation direction 507, which
corresponds to the x-direction in the present example.
[0065] As is shown in detail in FIGS. 8 and 9, each write head
200.sub.i,j of the writing device 140 in each case writes to a
dedicated substrate strip 430.sub.i,j having a strip width 431
determined by the scanning amplitude 433 of the respective write
head 200.sub.i,j. For transferring the desired structures into the
substrate or in a light-sensitive layer arranged on the substrate,
the scanning light spot 420 is switched on and off by modulation of
the light sources or of the individual optical waveguides of the
respective write head. This can be carried out repeatedly during an
up or down movement of the light spot 420 corresponding to half a
scanning period 432, depending on the desired resolution. In this
regard, structure widths corresponding to the extent of the light
spot 420 in the y-direction can be realized, in principle, in the
y-direction. On the other hand, by switching on and off the
marginal regions or else the central regions of the light spot 420,
it is possible to obtain in the x-direction, too, structure widths
corresponding, in principle, to the dimensions of an individual
light spot 410.sub.1-410.sub.N of which the spot 420 is
composed.
[0066] The use of a plurality of write heads 200.sub.i,j having
writing or scanning regions 251 respectively offset relative to one
another in the transport direction 501 allows parallel writing to
larger continuous substrate areas 450. In this respect, FIG. 10
shows a first exemplary embodiment including a matrix-type
arrangement of a total of 15 write heads 200.sub.i,j. In this case,
the write heads 200.sub.i,j are combined in three columns each
having five write heads 200.sub.i,1-200.sub.i,5. In this case, the
individual scanning regions 251 of the write heads
200.sub.i,1-200.sub.i,5 are arranged in a manner offset with
respect to one another in each case by a maximum of a strip width
431 in the y-direction for example via an individual setting of the
scanning mirrors 241 of the respective write heads
200.sub.i,1-200.sub.i,5. This results in strips
430.sub.i,1-430.sub.i,5 which touch one another or slightly overlap
and which together produce a seamlessly closed area 440.sub.i. Via
a corresponding arrangement of the write heads 200.sub.i,j, the
strip-shaped areas 440.sub.i formed from the write heads
200.sub.i,1-200.sub.i,5 arranged one behind another in each case in
the x-direction can be combined seamlessly to form a strip-shaped
total area 450.
[0067] As an alternative to the offset arrangement of the scanning
regions of individual write heads, the write heads
200.sub.i,1-200.sub.i,5 arranged one behind another in the
x-direction can also be arranged in a manner offset relative to one
another in each case by a strip width 431 in the y-direction, in
order to obtain a closed wider strip 440.sub.i. A corresponding
embodiment is shown by way of example in FIG. 11.
[0068] As a result of the total area 450 written to being composed
of individual strip regions written to parallel to one another
(referred to as stitching), lithography apparatus for writing to
substrate wafers of arbitrary size can be realized in principle. In
order to be able to precisely control the distance between the
individual strips or their overlap region, the width and position
of the individual strip-shaped regions written are coordinated with
one another. This is particularly important since the components of
the lithography apparatus 100 during operation are subject to
various disturbing influences which can influence the writing
process of individual write heads differently. In this regard, the
scanning regions of adjacent write heads can drift apart for
example on account of temperature differences of the corresponding
components. Therefore, by way of example, the detection device 160
already described in connection with FIG. 1 is used for calibrating
and monitoring the operation of the writing device 140. Such a
detection device 160 can consist for example of one or a plurality
of measuring devices 161.sub.i,j each having a pair of photodiodes,
said measuring devices being installed below the substrate wafer in
a positionally fixed manner relative to the respective write head
200.sub.i,j. FIG. 12 shows by way of example a measuring device
161.sub.i,j of such a detection device 160 having two photodiodes
162 and 163 arranged at a predefined distance from one another. The
two photodiodes 162, 163 are fixed on a carrier substrate 164,
which preferably consists of a material having the smallest
possible temperature drift, such as "Zerodur", for example. The
measuring device 161.sub.i,j can be installed for example in a
positionally fixed manner relative to the respectively associated
write head 200.sub.i,j below the receptacle device 151 of a
processed substrate wafer 300. The measuring device 161.sub.i,j,
initially concealed by the substrate wafer 300 during the writing
process, is freed by the further transport of the respective
substrate wafer 300 after the end of the writing process. For this
purpose, a specific window region 152 between adjacent substrate
wafers 300.sub.1, 300.sub.2 can be provided in the transport
direction 150. Each of the two photodiodes 162 and 163 detects in
each case the point in time of the passage of the oscillating light
spot 420. On the basis of the temporal deviation of the detector
signals from a reference signal, the amplitude 433 and/or lateral
position of the scanning region 251 of the respective write head
200.sub.i,j can be deduced. For detecting each individual light
spot 410.sub.1-410.sub.N of the composite light spot 420, the
measuring device 161.sub.i,j can have a corresponding number of
pairs of photodiodes arranged closely alongside one another (not
shown here). Such a measuring device 161.sub.i,j also enables
monitoring or calibration of the light spot profile of the
respective light spot 420, such as e.g. its width and
y-position.
[0069] Since the detection is carried out in each case for the
individual write head, each of the write heads 200.sub.i,j used is
individually assigned in each case at least one measuring device
161.sub.i,j. FIG. 13 shows a possible arrangement of a plurality of
measuring devices 161.sub.i,j of the detector device 160 below a
writing device including a total of nine write heads 200.sub.i,j.
The individual measuring devices 161.sub.i,j here are arranged in
each case exactly below the associated write heads 200.sub.i,j, the
position of which is indicated here via a dashed line. A window
region 152 produced between two substrate wafers 300.sub.1,
300.sub.2 or specifically embodied in the form of an opening in the
transport device 150 frees the respective measuring devices 161
after the passage of the substrate wafer 300.sub.2 that has
undergone writing to a finish.
[0070] FIG. 14 shows an alternative possibility for realizing a
corresponding detection device 160. A test substrate 310 having
reflective test structures 311, 312 is used in this case. The test
structures 311, 312 are arranged here in each case such that when
the test substrate 310 passes below the respective write head 200,
the incident light beams are reflected back from the test
structures 311, 312 into the write head 200. The light 402
reflected back preferably passes via the same optical path to the
scanning mirror 241 and is subsequently deflected by a beam
splitter 265 to a detecting photodiode 166 or an arrangement
including a plurality of photodiodes (not shown here) respectively
assigned to the individual light beams. Each detector signal is
subsequently compared with a corresponding reference signal. On the
basis of the comparison result, statements can then be made about
the scanning amplitude 433, scanning position and, if appropriate,
also about the light spot profile.
[0071] FIG. 15 shows a corresponding test substrate 310 between two
regular substrate wafers 300.sub.1, 300.sub.2. In this case, one or
a plurality of pairs of such test structures 311, 312 are arranged
on the test substrate 310 for each write head 200.sub.i,j. In this
case, the number and arrangement of the test structures on the test
substrate can be adapted to the respective desired properties. As
an alternative or in addition thereto, it is also possible for
corresponding test structures also to be arranged on the regular
substrate wafers 300.sub.1, 300.sub.2 (not shown here). Such test
structures can preferably be arranged in regions which are not
written to anyway or are specifically provided for calibration.
[0072] In order, on the basis of the detector signal of the
photodiodes 161, 162, 166 to be able to make a statement about the
amplitude 433 of the scanning movement 502 of the light spot on the
substrate wafer and the lateral position of the strip-shaped region
respectively written to, the temporal sequence of the respective
signals is analysed. In this respect, FIG. 16 shows by way of
example the relationship between the temporal change in a detector
signal and the corresponding variations of the scanning movements.
In this case, the upper part of the diagram illustrates the
temporal change in the y-position of the light spot 410, 420
carrying out an oscillating movement in various operating
situations. In this case, the curve 510 depicted by a solid line
represents the movement of the light spot 420 oscillating with the
desired amplitude 433 and in the desired position. The upper
horizontal line 513 represents for example the y-position of the
first photodiode 162 of the detector device assigned to the
respective write head 200, while the lower horizontal line 514
represents the y-position of the second photodiode 163. In the case
of the alternative detection device, the horizontal lines 513, 514
in each case represent the y-positions of the two test structures
131, 132 of the respective write head 200. The points of
intersection of the individual curves 510, 511, 512 with the two
horizontal lines 513, 514 correspond in each case to the passing of
the scanning light spot 410, 420 over one of the photodiodes 162,
163 or test structures 131, 132. These events define the points in
time of the associated excursions of the respective detector
signal. The lower region of the diagram illustrates the profiles of
the three detector signals 515, 516, 517, that are respectively
assigned to one of the three curves 510, 511, 512. In this case,
the second curve 515 shows the profile of the detector signal for
the "regular" scanning process represented via the solid line. In
this case, the detector signal exhibits a specific regular pattern
that can be used as a reference signal for the other operating
situations. In this regard, an increase in the scanning amplitude
433, as is the case for the curve 511 shown via the dashed line,
has the effect that the signal excursions of the two photodiodes
162, 163 are shifted symmetrically with respect to one another.
This is evident in the second detector signal profile 516 by a
comparison with the reference signal.
[0073] By contrast, if the position of the exposed strip drifts
along the y-direction, as is the case for example for the curve 512
shown via the dash-dotted line, then the corresponding detector
signal 517 exhibits an asymmetrical shift in the signal excursions
of the two photodiodes 162, 163.
[0074] As already described in connection with FIGS. 8 and 9, the
scanning movement of the light spot for writing to the respective
substrate strip can be carried out both one-dimensionally and
two-dimensionally. In the case of the two-dimensional scanning
movement, it is desirable for the line compensation movement
carried out in the transport direction of the substrate to be
precisely coordinated with the scanning movement carried out
transversely with respect to the transport direction of the
substrate. This is achieved in particular via two micromechanical
mirrors that are controllable independently of one another. In
contrast thereto, in the case of the one-dimensional scanning
movement, only one scanning mirror is used, as a result of which
the outlay on apparatus is significantly reduced in comparison with
the two-dimensional scanning movement.
[0075] However, a harmonically oscillating scanning mirror without
a corresponding line compensation movement produces a sinusoidal
trajectory of the light spot on the substrate moving underneath. On
account of the sinusoidal form, the trajectory in the regions of
the upper and lower turning points deviates very greatly from a
straight line. Furthermore, at the turning points the speed of the
light spot decreases in comparison with the central scanning
region. Consequently, the residence duration of the light spot
increases in the region of a turning point. In the case of an
illumination intensity kept constant over the entire period, an
increased residence duration and the curved trajectory would lead
to significantly more highly exposed outer regions of the strip
written to by the respective write head. This can be prevented in
various ways. By way of example, the oscillation amplitude of the
scanning mirror can be chosen to have a magnitude such that the
upper and lower turning regions of the sinusoidal trajectory of the
light spot lie distinctly outside the strip to be written to. Via
suitable shading or via switching off the light source in the upper
turning regions, it can be ensured that the illumination takes
place only within the strip-shaped substrate region. Such an
arrangement is illustrated schematically by way of example in FIG.
17. As is evident here, the upper and lower turning points of the
sinusoidal trajectory 504 lie outside the strip 430 to be exposed.
The central regions of the movement trajectory 504, which are
arranged within the strip 430, run approximately linearly here. One
disadvantage of this concept is that on account of the overshoot of
the movement trajectory outside the strip 430 to be exposed, the
write head has relatively long dark phases in which no exposure of
the substrate within the strip 430 takes place. This results in a
lower throughput overall. An increase in the throughput can be
achieved by a reduction of the dark phases of the movement
trajectory 504. For the same light intensity, the same substrate
speed and the same scanning frequency, a reduction of the scanning
amplitude leads to a longer residence duration of the light spot
above the regions of the substrate that are to be written to. The
lower writing speed resulting therefrom leads to an increase in the
light dose per unit area. A corresponding schematic illustration of
a scanning movement with reduced dark phases is illustrated in FIG.
18.
[0076] On account of the geometry of the sinusoidal trajectory 504
and the reduced speed of the light spot 420 in the regions of the
turning points 508, 509, the residence duration of the light spot
420 on the substrate surface 301 is significantly higher in the
marginal regions 434, 436 of the strip 430 than in the central
region 435. Given constant light power of the write head, the
marginal regions 434, 436 of the strip 430 would therefore be
exposed to a significantly greater extent than its central region
435. In order to obtain a homogeneous exposure of the entire strip
430, it is thus expedient to vary the light intensity of the light
spot 420 or of the light beams 410.sub.1-410.sub.10 forming the
light spot 420 in a manner dependent on the position thereof along
the scanning direction y. By way of example, in the case of a
pulsed light source, both the switch-on and the switch-off phases
of the light source can be varied jointly or independently of one
another. Furthermore, the intensity of the light spot 420 can be
varied by modulation of the light source or of a light-guiding
element disposed downstream of the light source, such that the
intensity of the light spot turns out to be lower in the outer
regions 434, 436 of the strip 430 than in the central region 435
thereof. In order to obtain a homogeneous illumination, in this
case, both the duty ratio and the light intensity of the individual
light spots 410 forming the light spot 420 can be varied both
jointly and independently of one another. In this regard, by way of
example, individual light spots 410 of the total light spot 420 can
be switched off separately in order to reduce the light intensity.
As an alternative thereto, the light intensity of individual light
spots 410 of the total light spot 420 can be modulated in a
suitable manner.
[0077] Via a suitable intensity variation of individual light spots
410 or of the entire light spot 420, a homogeneous illumination
over a plurality of scanning periods can thus be achieved even in
the case of a sinusoidal movement trajectory 504.
[0078] In order to achieve a homogeneous exposure of the substrate
surface, the intensity of the light beams 400 that generate the
individual light spots 410 is varied in a predefined manner. This
results in a specific exposure pattern in which the arrangement of
the individual light spots on the substrate turns out to be
relatively complex on account of the sinusoidal movement
trajectory. In order to be able to write structures on the
substrate surfaces, the contours of the respective structures have
to be transferred to the exposure pattern. On account of the
abovementioned complexity of the exposure pattern, the transfer of
the structures to be written is relatively computationally
complex.
[0079] In order to simplify this method step, the complex exposure
pattern can be decomposed into two separate partial exposure
patterns. For this purpose, all light spots which lie on the
falling edges of the sinusoidal movement trajectories of the
respective light spots are combined to form a first partial
exposure pattern 520. In a manner corresponding thereto, all light
spots which lie on the rising edges of the sinusoidal movement
trajectories of the respective light spots are combined to form a
second partial exposure pattern 530. The desired structures are
subsequently transferred separately into each of the two partial
exposure patterns 520, 530. Since the desired structures are
impressed congruently in each of the partial exposure patterns 520,
530 the structures to be written are optimally reproduced in the
total exposure pattern arising as a result of the superimposition
of the two partial exposure patterns 520, 530 during the writing
process. FIG. 19 schematically illustrates the first partial
exposure pattern 520, which contains all the switch-on phases of
the individual light spots 410.sub.1 to 410.sub.10 of a total light
spot 420 during the movement from an upper turning point 508 to a
lower turning point 509. In this case, the corresponding portions
of the movement trajectories 521.sub.1-521.sub.10 of the light
spots 410.sub.1-410.sub.10 are represented via dotted lines. In
this case, the individual light spots 410.sub.1 to 410.sub.10 are
each represented via dashed lines, wherein the respective midpoints
of the light spots are represented via small circles 411. For the
sake of clarity, only the topmost and bottommost light spots
410.sub.1 to 410.sub.10 are represented via the dashed circles.
Furthermore, only the light spots and the associated trajectories
during an individual scanning movement from the upper turning point
508 to the lower turning point 509 have been illustrated, for
reasons of clarity. As indicated via dots in the drawing, the first
partial exposure pattern 520 is typically composed of a sequence of
such portions like the portion illustrated in FIG. 19. In this
case, the individual portions can be superimposed to a greater or
lesser extent depending on the application.
[0080] Analogously to FIG. 19, FIG. 20 illustrates the second
partial exposure pattern 530, which corresponds to the distribution
of the exposure spots on the substrate surface which are generated
during in each case half a scanning period in the course of the
movement of the light spot from the lower turning point 509 to the
upper turning point 508.
[0081] Although the disclosure has been more specifically
illustrated and described in detail via the preferred exemplary
embodiment, nevertheless the disclosure is not restricted by the
examples disclosed, and other variations can be derived therefrom
by the person skilled in the art, without departing from the scope
of protection of the disclosure.
LIST OF REFERENCE SIGNS
[0082] 100 Lithography apparatus [0083] 110 Light generating device
[0084] 111-119 Light sources [0085] 120 Light transferring device
[0086] 121 Optical waveguide group [0087] 122 Optical waveguide
[0088] 123 Diameter of an optical waveguide [0089] 130 Modulation
device [0090] 131 Electro-optical modulator [0091] 140 Writing
device [0092] 141 Baseplate [0093] 142 Opening in the baseplate
[0094] 143 Adjusting screw [0095] 144 Holding element [0096] 145
Write head arrangement in matrix form [0097] 150 Transport device
[0098] 151 Receptacle device [0099] 152 Window region between two
receptacle devices [0100] 160 Detection device [0101] 161 Measuring
device [0102] 162,163 Photodiodes [0103] 164 Carrier substrate
[0104] 165 Semitransmissive mirror [0105] 166 Internal photodiode
[0106] 170 Control device [0107] 171 First control line [0108] 172
Second control line [0109] 173 Third control line [0110] 174 Fourth
control line [0111] 175 Fifth control line [0112] 200 Write head
[0113] 210 Housing [0114] 211 Housing cover [0115] 212 Slot-shaped
housing opening [0116] 220 Input coupling device [0117] 221
Receptacle plate [0118] 222 Centring device/V-grooves [0119] 223
Waveguide substrate [0120] 224 Waveguide [0121] 225 Waveguide exit
facets [0122] 226 Input width [0123] 227 Output width [0124] 228
Microlens arrangement [0125] 229 Microlens [0126] 230 Optical
device/beam shaping device [0127] 231-233 Lenses of the beam
shaping device [0128] 240 Scanning device [0129] 241 Scanning
mirror [0130] 242,243 Deflection elements [0131] 244 Scanning axis
[0132] 250 Exit optical unit [0133] 251 Scanning region [0134]
251-254 Lenses of the exit optical unit [0135] 300 Substrate wafer
[0136] 301 Substrate surface [0137] 310 Test substrate wafer [0138]
311,312 Reflective test structures [0139] 400 Light beams [0140]
401 Writing beam bundle [0141] 402 Reflected light beams [0142] 410
Individual light spot of a light beam [0143] 411 Centre of an
individual light spot [0144] 420 Light spot composed of individual
light spots [0145] 430 Strip exposed by the light spot [0146] 431
Width of the strip [0147] 432 Scanning period [0148] 433 Amplitude
of the scanning movement [0149] 434 Upper marginal region of the
exposed strip [0150] 435 Central region of the exposed strip [0151]
436 Lower marginal region of the exposed strip [0152] 440 Group of
strips written to [0153] 450 Exposed total area [0154] 500
Coordinate system [0155] 501 Transport movement [0156] 502 Periodic
scanning movement [0157] 503 Periodic line compensation movement
[0158] 504 First movement trajectory [0159] 505 Second movement
trajectory [0160] 506 Scanning direction [0161] 507 Direction of
the line compensation movement [0162] 508 Upper turning point
[0163] 509 Lower turning point [0164] 510 First trajectory [0165]
511 Second trajectory [0166] 512 Third trajectory [0167] 513
Position of the first photodiode/test structure [0168] 514 Position
of the second photodiode/test structure [0169] 515 First signal
curve [0170] 516 Second signal curve [0171] 517 Third signal curve
[0172] 520 First partial exposure pattern [0173] 521 Falling edge
of the movement trajectory [0174] 530 Second partial exposure
pattern [0175] 531 Rising edge of the movement trajectory [0176] x
x-direction/transport direction [0177] y y-direction/scanning
direction [0178] z z-direction (vertical direction) [0179] I Light
intensity [0180] A Amplitude of the detection signal
* * * * *