U.S. patent application number 14/249424 was filed with the patent office on 2015-04-30 for device and method for measuring distribution of atomic resolution deformation.
This patent application is currently assigned to KOREA INSTITUTE OF MACHINERY & MATERIALS. The applicant listed for this patent is Brown University, KOREA INSTITUTE OF MACHINERY & MATERIALS. Invention is credited to Bong Kyun JANG, Jae-Hyun KIM, Kyung-Suk Kim, Hak Joo LEE, Chien-Kai Wang.
Application Number | 20150121575 14/249424 |
Document ID | / |
Family ID | 52745331 |
Filed Date | 2015-04-30 |
United States Patent
Application |
20150121575 |
Kind Code |
A1 |
JANG; Bong Kyun ; et
al. |
April 30, 2015 |
DEVICE AND METHOD FOR MEASURING DISTRIBUTION OF ATOMIC RESOLUTION
DEFORMATION
Abstract
The present invention relates to an atomic resolution
deformation distribution measurement device that can measure a
deformation rate of an atomic scale with low expense by improving
resolution using an AFM system, and the atomic resolution
deformation distribution measurement device includes: a laser
source generating a laser beam; a first cantilever and a second
cantilever provided close to a measurement specimen or a reference
specimen to cause deformation by an atomic force; an optical system
controlling a light path of the laser beam so as to cause the laser
beam to be sequentially reflected to the first cantilever and the
second cantilever and locate the first cantilever and the second
cantilever to an image point; a measurement unit measuring the
laser beam reflected from the second cantilever; and a stage on
which a measurement specimen or a reference specimen is located and
movable in X, Y, and Z axis directions.
Inventors: |
JANG; Bong Kyun; (Daejeon,
KR) ; KIM; Jae-Hyun; (Daejeon, KR) ; LEE; Hak
Joo; (Daejeon, KR) ; Kim; Kyung-Suk;
(Providence, RI) ; Wang; Chien-Kai; (Providence,
RI) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
KOREA INSTITUTE OF MACHINERY & MATERIALS
Brown University |
Daejeon
Providence |
RI |
KR
US |
|
|
Assignee: |
KOREA INSTITUTE OF MACHINERY &
MATERIALS
Daejeon
RI
Brown University
Providence
|
Family ID: |
52745331 |
Appl. No.: |
14/249424 |
Filed: |
April 10, 2014 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
61810299 |
Apr 10, 2013 |
|
|
|
Current U.S.
Class: |
850/6 |
Current CPC
Class: |
G01Q 70/06 20130101;
G01Q 20/02 20130101 |
Class at
Publication: |
850/6 |
International
Class: |
G01Q 20/02 20060101
G01Q020/02 |
Claims
1. An atomic resolution deformation distribution measurement device
comprising: a laser source generating a laser beam; a first
cantilever and a second cantilever provided close to a measurement
specimen or a reference specimen to cause deformation by an atomic
force; an optical system controlling a light path of the laser beam
so as to cause the laser beam to be sequentially reflected to the
first cantilever and the second cantilever and locate the first
cantilever and the second cantilever to an image point; and a
measurement unit measuring the laser beam reflected from the second
cantilever; and a stage on which a measurement specimen or a
reference specimen is located and movable in X, Y, and Z axis
directions.
2. The atomic resolution deformation distribution measurement
device of claim 1, wherein one of the first cantilever and the
second cantilever is located on the measurement specimen and the
other is located on the reference specimen, and the measurement
measures a result of overlapping of atom lattice location data of a
surface of the measurement specimen and atom lattice location data
of a surface of the reference specimen so as to measure atom
lattice data of the measurement specimen that is deformed with
respect to the atom lattice of the reference specimen.
3. The atomic resolution deformation distribution measurement
device of claim 1, wherein the optical system comprises at least
one mirror and at least one convex lens.
4. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a mirror
and a convex lens, and forms a light path through such that the
laser beam generated from the laser source is transmitted to the
measurement device by being sequentially transmitted or reflected
through the first cantilever, the mirror, the convex lens, and the
second cantilever.
5. The atomic resolution deformation distribution measurement
device of claim 4, wherein, in the optical system, the length of
the light path between the first cantilever, the mirror, and the
convex lens and the length of the light path between the convex
lens and the second cantilever are respectively set to be two times
a focal distance of the convex lens.
6. The atomic resolution deformation distribution measurement
device of claim 5, wherein, in the optical system, the mirror and
the convex lens are formed to be movable and the mirror is formed
to be rotatable.
7. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a first
mirror, a second mirror, and a convex lens, and forms a light path
such that laser beam generated from the laser source is transmitted
to the measurement device by being sequentially transmitted or
reflected through the first cantilever, the first mirror, the
convex lens, the second mirror, and the second cantilever.
8. The atomic resolution deformation distribution measurement
device of claim 7, wherein, in the optical system, the length of
the light path between the first cantilever, the first mirror, and
the convex lens and the length of the light path between the convex
lens, the second mirror, and the second cantilever are respectively
set to be two times the focal distance of the convex lens.
9. The atomic resolution deformation distribution measurement
device of claim 8, wherein, in the optical system, the first mirror
and the second mirror are formed to be movable and rotatable.
10. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a mirror, a
first convex lens, and a second convex lens, and forms a light path
such that the laser beam generated from the laser source is
transmitted to the measurement unit by being sequentially
transmitted or reflected through the first cantilever, the first
convex lens, the mirror, the second convex lens, and the second
cantilever.
11. The atomic resolution deformation distribution measurement
device of claim 10, wherein, in the optical system, the first
convex lens and the second convex lens respectively have the same
focal distance.
12. The atomic resolution deformation distribution measurement
device of claim 11, wherein, in the optical system, the length of
the light path between the first cantilever and the first convex
lens, and the length of the light path between the second convex
lens and the second cantilever are respectively set to be a focal
distance of the first convex lens or a focal distance of the second
convex lens, and the length of the light path between the first
convex lens, the mirror, and the second convex lens are set to be
two times the focal distance of the first convex lens or a focal
distance of the second convex lens.
13. The atomic resolution deformation distribution measurement
device of claim 12, wherein, in the optical system, the mirror, the
first convex lens, and the second convex lens are formed to be
movable and the mirror is formed to be rotatable.
14. The atomic resolution deformation distribution measurement
device of claim 12, wherein a unit body is provided in a fixed
manner in the optical system to set the length of the light path
between the first convex lens, the mirror, and the second convex
lens to be two times the focal distance of the first convex lens or
the focal distance of the second convex lens, and the unit body is
formed to be movable and rotatable.
15. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a first
mirror, a second mirror, a third mirror, and a convex lens, and
forms a light path such that the laser beam generated from the
laser source is transmitted to the measurement unit by being
sequentially transmitted or reflected through the first cantilever,
the first mirror, the convex lens, the second mirror, the convex
lens, the third mirror, and the second cantilever.
16. The atomic resolution deformation distribution measurement
device of claim 15, wherein, in the optical system, the length of
the light path between the first cantilever, the first mirror, and
the convex lens, the length of the light path between the convex
lens and the second mirror, and the length of the light path
between the convex lens, the third mirror, and the second
cantilever are respectively set to be a focal distance of the
convex lens.
17. The atomic resolution deformation distribution measurement
device of claim 16, wherein, in the optical system, the second
mirror and the convex lens are formed to be movable and the second
mirror is formed to be rotatable.
18. The atomic resolution deformation distribution measurement
device of claim 16, wherein the optical system comprises a unit
body formed in a fixed manner to set the length of the light path
between the convex lens and the second mirror to be the focal
distance of the convex lens.
19. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a mirror, a
convex lens, and a beam splitter, and forms a light path such that
the laser beam generated from the laser source is transmitted to
the measurement unit by being sequentially transmitted or reflected
through the first cantilever, the beam splitter, the convex lens,
the mirror, the convex lens, the beam splitter, and the second
cantilever.
20. The atomic resolution deformation distribution measurement
device of claim 19, wherein, in the optical system, the length of
the light path between the first cantilever, the beam splitter, and
the convex lens, the length of the light path between the convex
lens and the mirror, and the length of the light path between the
convex lens, the beam splitter, and the second cantilever are set
to be a focal distance of the convex lens.
21. The atomic resolution deformation distribution measurement
device of claim 20, wherein, in the optical system, the mirror and
the convex lens are formed to be movable and the mirror is formed
to be rotatable.
22. The atomic resolution deformation distribution measurement
device of claim 20, wherein the optical system comprises a unit
body formed in a fixed manner to set the length of the light path
between the convex lens and the mirror to be the focal distance of
the convex lens, and the unit body is formed to be movable and
rotatable.
23. The atomic resolution deformation distribution measurement
device of claim 3, wherein the optical system comprises a first
mirror, a second mirror, a third mirror, a convex lens, a prism,
and a beam splitter, and forms a light path such that the laser
beam generated from the laser beam is transmitted to the
measurement unit by being sequentially transmitted and reflected
through the prism, the beam splitter, the first cantilever, the
first mirror, the convex lens, the second mirror, the convex lens,
the first mirror, the second cantilever, the beam splitter, and the
second mirror.
24. The atomic resolution deformation distribution measurement
device of claim 23, wherein, in the optical system, the length of
the light path between the first cantilever, the first mirror, and
the convex lens, the length of the light path between the convex
lens and the second mirror, and the length of the light path
between the convex lens, the first mirror, and the second
cantilever are respectively set to be the focal distance of the
convex lens.
25. The atomic resolution deformation distribution measurement
device of claim 24, wherein, in the optical system, the second
mirror and the convex lens are formed to be movable and the second
mirror and the beam splitter are formed to be rotatable.
26. The atomic resolution deformation distribution measurement
device of claim 1, wherein the optical system comprises at least
one concave mirror.
27. The atomic resolution deformation distribution measurement
device of claim 26, wherein the optical system comprises a concave
mirror, and forms a light path such that the laser beam generated
from the laser source is transmitted to the measurement unit by
being sequentially transmitted or reflected through the first
cantilever, the concave mirror, and the second cantilever.
28. The atomic resolution deformation distribution measurement
device of claim 27, wherein, in the optical system, the length of
the light path between the first cantilever and the concave mirror
and the length of the light path between the concave mirror and the
second cantilever are set to be two times a focal distance of the
concave mirror.
29. The atomic resolution deformation distribution measurement
device of claim 28, wherein, in the optical system, the concave
mirror is formed to be movable and rotatable.
30. The atomic resolution deformation distribution measurement
device of claim 26, wherein the optical system comprises a first
concave mirror and a second concave mirror, and forms a light path
such that the laser beam generated from the laser source is
transmitted to the measurement unit by being sequentially
transmitted or reflected through the first cantilever, the first
concave mirror, the second concave mirror, and the second
cantilever.
31. The atomic resolution deformation distribution measurement
device of claim 30, wherein, in the optical system, the length of
the light path between the first cantilever and the first concave
mirror and the length of the light path between the second concave
mirror and the second cantilever are respectively set to be the
focal distance of the concave mirror, and the length of the light
path between the first concave mirror and the second concave mirror
is set to be two times the focal distance of the concave
mirror.
32. The atomic resolution deformation distribution measurement
device of claim 31, wherein, in the optical system, the first
concave mirror and the second concave mirror are formed to be
movable and the second concave mirror is formed to be
rotatable.
33. The atomic resolution deformation distribution measurement
device of claim 1, wherein the measurement unit is a position
sensitive photodiode detector (PSPD).
34. The atomic resolution deformation distribution measurement
device of claim 1, wherein the stage is connected with the
measurement unit and is movable in the Z-axis direction by being
fed back based on a measurement value of the laser beam measured by
the measurement unit.
35. A method for measuring an atomic resolution deformation
distribution using the device of claim 1, comprising: disposing one
of the first cantilever and the second cantilever on a measurement
specimen and the other on a reference specimen; controlling a light
path for the laser beam generated from the laser source by the
optical system to sequentially reflect the laser beam to the first
cantilever and the second cantilever; and measuring the laser beam
reflected from the second cantilever and then transmitted to the
measurement unit.
36. The method of claim 35, wherein the measurement unit measures a
result of overlapping of atom lattice location data of a surface of
a measurement specimen and atom lattice location data of a surface
of a reference specimen so as to measure atom lattice data of a
measurement specimen that is deformed with respect to the atom
lattice of the reference specimen.
37. The method of claim 36, further comprising: calculating the
square of a measurement signal transmitted to the measurement unit;
eliminating noise by passing the square of the measurement through
a low-pass filter; digitalizing the square of the measurement
signal of which noise is eliminated through an analog-to-digital
converter; and converting an atomic lattice structure of the
measurement specimen that is deformed with respect to the atomic
lattice of the reference specimen using the digitalized value.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims priority to and the benefit of U.S.
Patent Application No. 61/810,299 filed in the USPTO on Apr. 10,
2013, the entire contents of which are incorporated herein by
reference.
BACKGROUND OF THE INVENTION
[0002] (a) Field of the Invention
[0003] The present invention relates to a device and method for
measuring distribution of atomic resolution deformation, and a
method thereof.
[0004] (b) Description of the Related Art
[0005] The development of nanotechnology has had a ripple effect on
various technology fields such as biological fields, energy fields,
environmental fields, information fields, and the like. In
application of nanotechnology, importance of a method for precise
measuring of location and deformation in a nano/micro structure has
been highlighted.
[0006] In general, a transmission electron microscope (TEM) is used
to measure deformation of atomic scale. The transmission electron
microscope focuses electron beam and irradiates an electron beam to
a sample, and enlarges the electron beams passed through the sample
to acquire an image. That is, the transmission electron microscope
measures a defect or deformation of the nano-scale through the
atomic lattice structure. The transmission electron microscope is
advantageous in observing an atomic structure of a material with
high magnification, but it is difficult to manufacture a specimen
that can be observed using a transmission electron microscope, and
manufacturing cost is high. In addition, the transmission electron
microscope cannot observe a large-scale target, and only measures a
shape after deformation of a specimen so that data such as
deformation rate measurement cannot be easily acquired.
[0007] A scanning probe microscope (SPM) is widely used for
measuring a nano-sized structure. The scanning probe microscope
includes various types, and a scanning tunneling microscope (STM)
is the first scanning tunneling microscope that scans by
approaching a probe tip made of a rigid and stable metal (e.g.,
tungsten) having a pointed end to a specimen to be measured. The
second common scanning probe microscope is an atomic force
microscope (AFM), and a small bar called a cantilever manufactured
by micro-machining is used instead of a tungsten needle of the
STM.
[0008] The AFM operates as follows. A probe pin (or a cantilever)
is as thin as the size of several atoms, and an interaction force
is generated between an atom at the end of the probe pin and atoms
in the surface of the specimen when the probe pin closely
approaches the specimen surface. The interaction force is usually
Van der Waals force and is as weak as less than nN (10.sup.-9 N).
However, resonance of the cantilever is changed by such a weak
force, and a degree of bending of the cantilever or a variation of
the resonance of the cantilever is measured using a laser or a
photodiode so as to measure a nano-scale structure such as a curve
at a surface of a measurement specimen. In detail, a method that is
most widely used measures displacement by measuring a laser beam
transmitted to the cantilever rather than a reflection therefrom
using a position sensitive detector PSD (or a position sensitive
photodiode detector, PSPD).
[0009] The scanning probe microscope is widely used because it can
easily measure the shape of a specimen surface, and unlike the
transmission electron microscope, a specimen can be simply prepared
with a low cost. However, the scanning probe microscope has a limit
in measurement resolution so that it cannot measure an atomic
structure of a target.
[0010] In measurement of such a nano-scale structure, various
methods have been disclosed in various points of view for
improvement of resolution. Korean Patent Publication No.
2006-0024470 ("Methodology for nano scale material joint and
welding using Scanning Electron Microscope", Mar. 17, 2006)
disclosed a method for enhancing a circuit structure of a probe tip
current to maximize a discharging current for improvement of
resolution. Korean Patent No. 1060506 ("System and method of
lithography in atomic force microscope and for generating input
signal to use on lithography thereof", Aug. 24, 2011) disclosed an
algorithm that realizes image lithography with a raster method
using a scanning probe microscope to improve resolution. Korean
Patent No. 0496457 ("Head of atomic force microscope", Jun. 13,
2005) discloses a structure for improvement of an alignment
structure of an SPM and PSPD for improvement of resolution. As
described, various methods for improvement of resolution of the
scanning probe microscope have been disclosed, but none of the
methods provide an effect that overcomes the limit in the scanning
probe microscope.
[0011] U.S. Pat. No. 5,540,958 ("Method of making microscope probe
tips", Jul. 30, 1996) disclosed a method for manufacturing AFM
probe tips respectively having different resolution to widen a
measurement available range. However, the method also cannot
overcome a performance limit of the scanning probe microscope.
[0012] The above information disclosed in this Background section
is only for enhancement of understanding of the background of the
invention and therefore it may contain information that does not
form the prior art that is already known in this country to a
person of ordinary skill in the art.
SUMMARY OF THE INVENTION
[0013] The present invention has been made in an effort to provide
an atomic resolution deformation distribution measurement device
that can improve resolution of an atomic micrograph system to
observe an atomic structure of a measurement specimen, and a method
thereof.
[0014] An atomic resolution deformation distribution measurement
device according to the present invention includes: a laser source
generating a laser beam; a first cantilever and a second cantilever
provided close to a measurement specimen or a reference specimen to
cause deformation by an atomic force; an optical system controlling
a light path of the laser beam so as to cause the laser beam to be
sequentially reflected to the first cantilever and the second
cantilever and locate the first cantilever and the second
cantilever to an image point; a measurement unit measuring the
laser beam reflected from the second cantilever; and a stage on
which a measurement specimen or a reference specimen is located and
movable in X, Y, and Z axis directions.
[0015] In this case, one of the first cantilever and the second
cantilever is located on the measurement specimen and the other is
located on the reference specimen, and the measurement measures a
result of overlapping of atom lattice location data of a surface of
the measurement specimen and atom lattice location data of a
surface of the reference specimen so as to measure atom lattice
data of the measurement specimen that is deformed with respect to
the atom lattice of the reference specimen.
[0016] In addition, the optical system may include at least one
mirror and at least one convex lens.
[0017] In a first exemplary embodiment, the optical system may
include a mirror and a convex lens, and forms a light path through
such that the laser beam generated from the laser source is
transmitted to the measurement device by being sequentially
transmitted or reflected through the first cantilever, the mirror,
the convex lens, and the second cantilever. In the optical system,
it is preferred that the length of the light path between the first
cantilever, the mirror, and the convex lens and the length of the
light path between the convex lens and the second cantilever are
respectively set to be two times a focal distance of the convex
lens. In the optical system, the mirror and the convex lens are
formed to be movable and the mirror is formed to be rotatable.
[0018] In a second exemplary embodiment, the optical system
includes a first mirror, a second mirror, and a convex lens, and
forms a light path such that the laser beam generated from the
laser source is transmitted to the measurement device by being
sequentially transmitted or reflected through the first cantilever,
the first mirror, the convex lens, the second mirror, and the
second cantilever. In this case, in the optical system, the length
of the light path between the first cantilever, the first mirror,
and the convex lens and the length of the light path between the
convex lens, the second mirror, and the second cantilever are
respectively set to be two times the focal distance of the convex
lens. In the optical system, the first mirror and the second mirror
are formed to be movable and rotatable.
[0019] In a third exemplary embodiment, the optical system includes
a mirror, a first convex lens, and a second convex lens, and forms
a light path such that laser beam generated from the laser source
is transmitted to the measurement unit by being sequentially
transmitted or reflected through the first cantilever, the first
convex lens, the mirror, the second convex lens, and the second
cantilever. In this case, in the optical system, the first convex
lens and the second convex lens respectively have the same focal
distance. In the optical system, the length of the light path
between the first cantilever and the first convex lens and the
length of the light path between the second convex lens and the
second cantilever are respectively set to be a focal distance of
the first convex lens or a focal distance of the second convex
lens, and the length of the light path between the first convex
lens and the second convex lens are set to be two times a focal
distance of the first convex lens or a focal distance of the second
convex lens. In the optical system, the mirror, the first convex
lens, and the second convex lens are formed to be movable and the
mirror is formed to be rotatable. Alternatively, a unit body is
provided in a fixed manner in the optical system to set the length
of the light path between the first convex lens and the second
convex lens, to be two times the focal distance of the first convex
lens or the focal distance of the second convex lens, and the unit
body is formed to be movable and rotatable.
[0020] In a fourth exemplary embodiment, the optical system
includes a first mirror, a second mirror, a third mirror, and a
convex lens, and forms a light path such that the laser beam
generated from the laser source is transmitted to the measurement
unit by being sequentially transmitted or reflected through the
first cantilever, the first mirror, the convex lens, the second
mirror, the convex lens, the third mirror, and the second
cantilever. In this case, in the optical system, the length of the
light path between the first cantilever, the first mirror, and the
convex lens, the length of the light path between the convex lens
and the second mirror, and the length of the light path between the
convex lens, the third mirror, and the second cantilever are
preferably respectively set to be a focal distance of the convex
lens. In this case, in the optical system, the second mirror and
the convex lens are formed to be movable and the second mirror is
formed to be rotatable. Alternatively, the optical system may
include a unit body formed in a fixed manner to set the length of
the light path between the convex lens and the second mirror to be
the focal distance of the convex lens, and the unit body is formed
to be movable and rotatable.
[0021] In a fifth exemplary embodiment, the optical system includes
a mirror, a convex lens, and a beam splitter, and forms a light
path such that laser beam generated from a laser source is
transmitted to the measurement unit by being sequentially
transmitted or reflected through the first cantilever, the beam
splitter, the convex lens, the mirror, the convex lens, the beam
splitter, and the second cantilever. In this case, in the optical
system, the length of the light path between the first cantilever,
the beam splitter, and the convex lens, the length of the light
path between the convex lens and the mirror, and the length of the
light path between the convex lens, the beam splitter, and the
second cantilever are preferably set to be a focal distance of the
convex lens. In this case, in the optical system, the mirror and
the convex lens are formed to be movable and the mirror is formed
to be rotatable. Alternatively, the optical system includes a unit
body formed in a fixed manner to set the length of the light path
between the convex lens and the mirror to be the focal distance of
the convex lens, and the unit body is formed to be movable and
rotatable.
[0022] In a sixth exemplary embodiment, the optical system includes
a first mirror, a second mirror, a third mirror, a convex lens, a
prism, and a beam splitter, and forms a light path such that laser
beam generated from a laser beam is transmitted to the measurement
unit by being sequentially transmitted and reflected through the
prism, the beam splitter, the first cantilever, the first mirror,
the convex lens, the second mirror, the convex lens, the first
mirror, the second cantilever, the beam splitter, and the second
mirror. In this case, in the optical system, the length of the
light path between the first cantilever, the first mirror, and the
convex lens, the length of the light path between the convex lens
and the second mirror, and the length of the light path between the
convex lens, the first mirror, and the second cantilever are
preferably respectively set to be the focal distance of the convex
lens. In the optical system, the second mirror and the convex lens
are formed to be movable and the second mirror and the beam
splitter are formed to be rotatable.
[0023] Alternatively, the optical system comprises at least one
concave mirror.
[0024] In a seventh exemplary embodiment, the optical system
includes a concave mirror, and forms a light path such that laser
beam generated from a laser source is transmitted to the
measurement unit by being sequentially transmitted or reflected
through the first cantilever, the concave mirror, and the second
cantilever. In this case, in the optical system, the length of the
light path between the first cantilever and the concave mirror and
the length of the light path between the concave mirror and the
second cantilever are preferably set to be two times a focal
distance of the concave mirror. In this case, in the optical
system, the concave mirror is formed to be movable and
rotatable.
[0025] In an eighth exemplary embodiment, the optical system
includes a first concave mirror and a second concave mirror, and
forms a light path such that laser beam generated from a laser
source is transmitted to the measurement unit by being sequentially
transmitted or reflected through the first cantilever, the first
concave mirror, the second concave mirror, and the second
cantilever. In this case, in the optical system, the length of the
light path between the first cantilever and the first concave
mirror and the length of the light path between the second concave
mirror and the second cantilever are respectively set to be the
focal distance of the concave mirror, and the length of the light
path between the first concave mirror and the second concave mirror
is set to be two times the focal distance of the concave mirror. In
the optical system, the first concave mirror and the second concave
mirror are formed to be movable and the second concave mirror is
formed to be rotatable.
[0026] The measurement unit may be a position sensitive photodiode
detector (PSPD).
[0027] In addition, the stage is connected with the measurement
unit and is movable in the Z-axis direction by being fed back based
on a measurement value of the laser beam measured by the
measurement unit.
[0028] A method for measuring atomic resolution deformation
distribution using the above-described device includes: disposing
one of the first cantilever and the second cantilever on a
measurement specimen and the other on a reference specimen;
controlling a light path for the laser beam generated from the
laser source by the optical system to sequentially reflect the
laser beam to the first cantilever and the second cantilever; and
measuring the laser beam reflected from the second cantilever and
then transmitted to the measurement unit.
[0029] In this case, the measurement unit measures a result of
overlapping of atom lattice location data of a surface of a
measurement specimen and atom lattice location data of a surface of
a reference specimen so as to measure atom lattice data of a
measurement specimen that is deformed with respect to the atom
lattice of the reference specimen.
[0030] The method further includes: calculating the square of a
measurement signal transmitted to the measurement unit; eliminating
noise by passing the square of the measurement through a low-pass
filter; digitalizing the square of the measurement signal of which
noise is eliminated through an analog-to-digital converter; and
converting an atomic lattice structure of the measurement specimen
that is deformed with respect to the atomic lattice of the
reference specimen using the digitalized value.
[0031] According to the present invention, a limit in improvement
or resolution of a conventional scanning probe microscope is
overcome to observe lattice arrangement information of atoms of a
measurement specimen using a scanning microscope system. Since the
present invention is based on the scanning probe microscope system,
the present invention is also advantageous in that a spacemen for
measurement can be simply prepared. Thus, a conventional problem in
that when the TEM is used, high expense is required due to
equipment itself and preparation of a specimen for observation of
an atom-scale structure can be solved, thereby performing
measurement economically. Furthermore, the present invention is
also based on a scanning probe microscope system, and thus, unlike
the TEM, large-scale measurement and deformation rate measurement
can be performed and user-desired data can be more precisely and
variously measured.
BRIEF DESCRIPTION OF THE DRAWINGS
[0032] FIG. 1 shows a basic structure of a conventional AFM.
[0033] FIG. 2 is a conceptual view of a device for measuring
distribution of deformation using atomic resolution according to
the present invention.
[0034] FIG. 3 is a flowchart of a method for measuring distribution
of deformation using atomic resolution according to the present
invention.
[0035] FIG. 4 illustrates a device for measuring distribution of
deformation using atomic resolution according to a first exemplary
embodiment of the present invention.
[0036] FIG. 5 illustrates a device for measuring distribution of
deformation using atomic resolution according to a second exemplary
embodiment of the present invention.
[0037] FIG. 6 illustrates a device for measuring distribution of
deformation using atomic resolution according to a third exemplary
embodiment of the present invention.
[0038] FIG. 7 illustrates a device for measuring distribution of
deformation using atomic resolution according to a fourth exemplary
embodiment of the present invention.
[0039] FIG. 8 illustrates a device for measuring distribution of
deformation using atomic resolution according to a fifth exemplary
embodiment of the present invention.
[0040] FIG. 9 illustrates a device for measuring distribution of
deformation using atomic resolution according to a sixth exemplary
embodiment of the present invention.
[0041] FIG. 10 illustrates a device for measuring distribution of
deformation using atomic resolution according to a seventh
exemplary embodiment of the present invention.
[0042] FIG. 11 illustrates a device for measuring distribution of
deformation using atomic resolution according to an eighth
exemplary embodiment of the present invention.
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0043] Hereinafter, a device for measuring distribution of atomic
resolution deformation and a method thereof according to the
present invention will be described in detail with reference to the
accompanying drawings.
[0044] FIG. 1 shows a basic structure of a conventional atomic
force microscope (AFM). As shown in FIG. 1, a conventional atomic
force microscope (AFM) includes a laser source 110', a mirror 120,
a position sensitive photodiode detector (PSPD) 130', a stage 140',
and a cantilever 150'. An operating mechanism of the AFM is as
follows. A measurement specimen 500 is located on the stage 140',
and the cantilever 150' is disposed close to the measurement
specimen 500. Laser beams generated from the laser source 110' are
irradiated to the cantilever 150' and then reflected, and the PSPD
130' measures the reflected laser beam. In this case, at least one
mirror 120' is used to properly control a light path of the laser
beam. As previously described, when the cantilever 150' is disposed
close to the measurement specimen 500, deformation occurs in the
cantilever 150' due to an atomic force, and accordingly, a
measurement value of the PSDP 130' is changed. With such a
mechanism, a structure such as a surface curve of the measurement
specimen 500 can be calculated. In general, the stage 140' is
movable in the X-Y direction (i.e., a plane direction) as desired,
and is connected with the PSPD 130', and can be moved in the Z-axis
direction by feedback according to a measurement value from the
PSPD 130'.
[0045] Resolution of such a conventional AFM is determined by the
size and shape of the cantilever 150', and the conventional AFM
cannot precisely measure a target that is similar to the cantilever
in the side. Thus, an atomic-scaled structure cannot be measured.
In order to solve such a problem, the present invention employs an
optical system that can control a laser beam path for sequential
reflection of the irradiated laser beams two cantilevers, and at
the same time, disposes the two cantilevers on an image point to
thereby improve resolution of the convention AFM.
[0046] FIG. 2 is a conceptual view of a device for measuring
distribution of atomic resolution deformation. As described above,
an atomic resolution deformation distribution measurement device
100 according to the present invention includes a laser source 110,
an optical system 120, a measurement unit 130, a stage 140, a first
cantilever 151, and a second cantilever 152. In the atomic
resolution deformation distribution measurement device 100, the
laser source 110, the measurement unit 130, and the stage 140 are
respectively almost the same as the laser source 110', the PSPD
130', and the stage 140' of the conventional AFM 100'. That is, the
laser source 110 generates laser beams, the measurement unit 130
may be formed as a PSPD, and the stage 140 is connected with the
measurement unit 130 and can be moved in the Z-axis direction by
feedback based on a value of measured laser beam from the
measurement unit 130.
[0047] However, unlike the conventional AFM 100', two cantilevers
151 and 152 are used instead of using one cantilever, and the
optical system 120 controls a laser beam path to sequentially
reflect the laser beams to the first cantilever 151 and the second
cantilever 152 in the present invention. The optical system 120
will be described in detail through various exemplary embodiments
later, and thus a description of a structure of the optical system
120 of FIG. 2 will be omitted.
[0048] In detail, one of the first cantilever 151 and the second
cantilever 152 is disposed on a measurement specimen and the other
is disposed on a reference specimen. In FIG. 2, the measurement
specimen and the reference specimen are illustrated as the specimen
500 for convenience of description, and the measurement specimen
and the reference specimen may be formed as an integral specimen
500 as shown in the drawing or may be formed as separated
independent specimens. Hereinafter, the term "specimen" will refer
to the measurement specimen or the reference specimen, and the term
"cantilever" will refer to the first cantilever 151 or the second
cantilever 152.
[0049] As previously described, when the cantilever and the
specimen are disposed close to each other, the cantilever is bent
due to an atomic force between atoms respectively forming the
cantilever and the specimen. Conventionally, a cantilever is
deformed as a laser beam is reflected to the cantilever and then
transmitted to the PSPD, and a surface curve of the specimen is
magnified using a value of an input signal that is changed
according to deformation of the cantilever. In the present
invention, the laser beam is sequentially reflected to the first
cantilever 151 and the second cantilever 152 by the optical system
120 and then transmitted to the measurement unit 130, and thus a
result of overlapping atomic lattice location data of the surface
of the measurement specimen and atomic lattice location data of the
reference specimen surface are observed in the measurement unit
130. That is, the device 100 measures atomic lattice data of a
measurement specimen that is deformed with respect to the atomic
lattice of the reference specimen.
[0050] FIG. 3 shows a flowchart of a method for measuring atomic
resolution deformation distribution, and processes (S01 to S03)
through which the laser beam irradiated from the laser source 110
is sequentially reflected to the first cantilever 151 and the
second cantilever 152 and then transmitted to the measurement unit
130 are the same as in the previous description. With respect to
the measurement signal transmitted to the measurement unit 130, the
square of the measurement signal is calculated first (S04), and
then noise is eliminated from the signal through a low-pass filter
(S05). A frequency band used as a reference in noise elimination in
the low-ass filter can be appropriately modified by a user or by a
theoretical or experiential method. Next, the square of the
measurement signal from which the noise is eliminated is
digitalized through an analog-to-digital converter (S06), and an
atomic lattice structure of the measurement specimen that is
deformed with respect to the atomic lattice of the reference
specimen is converted to an image format using the digitalized
value (S07).
[0051] Through such a process, atomic lattice data of the
measurement specimen deformed with respect to the atomic lattice of
the reference specimen is measured. According to the device and the
method of the present invention, measurement resolution can be
improved compared to the AFM system, and an interferometer is
formed by using two cantilevers in the AFM system in the present
invention so that atomic-scale deformation in a large area can be
measured at a high speed.
[0052] The conventional AFM has a limit in resolution, and thus an
atomic structure cannot be easily measured, and the conventional
TEM cannot measure a large-sized specimen and can measure only a
shape of the specimen after deformation of the specimen so that a
deformation rate cannot be measured, and particularly, a specimen
cannot be simply manufactured, thereby causing an increase of
measurement expense. However, in the present invention, the
measurement resolution can be improved by using the interferometer
even though the AFM is applied, and at the same time, the
atomic-scale deformation rate can be measured so that resolution
can be more improved (compared to the convention AFM) and economic
efficiency can be improved (compared to the conventional TEM).
[0053] Hereinafter, various exemplary embodiments of the optical
system 120 will be described. Any type of optical systems that can
sequentially reflect a laser beam to the first cantilever 151 and
the second cantilever 152 and dispose the first and second
cantilevers 151 and 152 are respectively disposed on an image point
are applicable.
[0054] FIG. 4 to FIG. 9 respectively illustrate first to sixth
exemplary embodiments in which the optical system 120 is formed of
at least one mirror and at least one convex lens.
[0055] FIG. 4 shows a first exemplary embodiment of the atomic
resolution deformation distribution measurement device according to
the present invention. An optical system 120A according to the
first exemplary embodiment includes a mirror 120AM1 and a convex
lens 120AL1, and a light path is formed such that a laser beam
generated from the laser source 110 is transmitted to a measurement
unit 130 by being sequentially transmitted or reflected to the
first cantilever, the mirror 120AM1, the convex lens 120AL1, and
the second cantilever.
[0056] In this case, in order to locate the first and second
cantilevers 151 and 152 at the image point, it is preferred to set
the length of the light path between the first cantilever 151, the
mirror 120AM1, the convex lens 120AL1 and the length of the light
path between the convex lens 120AL1 and the second cantilever 152
to be respectively double a focal distance of the convex lens
120AL1.
[0057] In addition, when one of the first cantilever 151 and the
second cantilever 152 is replaced or a different type of cantilever
is used and thus the location of the cantilever is changed,
locations or directions of optical parts should be modified to
locate the cantilevers back to the image point. When the convex
lens 120AL1 has a fixed focal distance, the mirror 120AM1 and the
convex lens 120AL1 are formed to be movable and the mirror 120AM1
is formed to be rotatable in the optical system 120A of the first
exemplary embodiment. As an example, movement driving means are
provided for 2 degrees of freedom of location movement in the
mirror 120AM1 for distance control, and rotation driving means are
provided in the mirror 120AM1 for 2 degrees of freedom of direction
rotation, and the convex lens 120AM1 may include movement driving
means so as to control a distance while being subordinate to
movement of the mirror 120AM1. Hereinafter, locations or directions
of optical parts can be modified to locate the cantilevers back to
the image point in another exemplary embodiment, and therefore
driving means similar to the movement driving means and the
rotation driving means are included in other exemplary embodiments.
Accordingly, means for modification of locations or directions of
optical parts will be briefly described in the other exemplary
embodiments, and portions that are not described in the following
exemplary embodiments are based on the description of the first
exemplary embodiment.
[0058] FIG. 5 illustrates a second exemplary embodiment of the
atomic resolution deformation distribution measurement device of
the present invention. As shown in FIG. 5, an optical system 120B
of the second exemplary embodiment includes a first mirror 120BM1,
a second mirror 120BM2, and a convex lens 120BL1, and a light path
is formed such that a laser beam generated from the laser source
110 is transmitted to a measurement unit 130 by sequential
transition or reflection to the first cantilever 151, the first
mirror 120BM1, the convex lens 120BL1, the second mirror 120BM2,
and the second cantilever 152.
[0059] In this case, in order to locate the first and second
cantilevers 151 and 152 to the image point, the length of the light
path between the first cantilever 151, the first mirror 120BM1, and
the convex lens 120BL1, and the length of the light path between
the convex lens 120BL1, the second mirror 120BM2, and the second
cantilever 152, are preferably set to be two times a focal distance
of the convex lens 120BL1.
[0060] In this case, the first mirror 120BM1 and the second mirror
120BM2 of the optical system 120B according to the second exemplary
embodiment are formed to be movable and rotatable. As an example,
the first mirror 120BM1 and the second mirror 120BL2 are
respectively provided with a movement driving means of one degree
of freedom, and a rotation driving means of two degrees of
freedom.
[0061] FIG. 6 illustrates a third exemplary embodiment of the
atomic resolution deformation distribution measurement device of
the present invention. As shown in FIG. 6, an optical system 120C
according to the third exemplary embodiment includes a mirror
120CM1, a first convex lens 120CL1, and the second convex lens
120CL2, and a light path is formed such that a laser beam generated
from a laser source 110 is transmitted to a measurement unit 130 by
sequentially being transmitted or reflected through a first
cantilever 151, the first convex lens 120CL1, the mirror 120CM1,
the second convex lens 120CL2, and the second cantilever 152.
[0062] In this case, in the optical system 120C according to the
third exemplary embodiment, it is preferred that a focal distance
of the first convex lens 120CL1 and a focal distance of the second
convex lens 120CL2 are set to be equal to each other so as to
locate the first and second cantilevers 151 and 152 to the image
point with ease. In this case, it is preferred that the length of
the light path between the first cantilever 151 and the first
convex lens 120CL1 and the length of the light path between the
second convex lens 120CL2 and the second cantilever 152 are
respectively set to be the focal distance of the first or second
convex lens 120CL1 or 120CL2, and the length of the light path
between the first convex lens 120CL1, the mirror 120CM1, and the
second convex lens 120CL2 are set to be two times the focal
distance of the first or second convex lens 120CL1 or 120CL2 in the
optical system 120C according to the third exemplary
embodiment.
[0063] In this case, the mirror 120CM1, the first convex lens
120CL1, and the second convex lens 120CL2 are formed to be movable,
and the mirror 120CM1 is formed to be rotatable in the optical
system 120C of the third exemplary embodiment. As an example, the
mirror 120BM1 is provided with a movement driving means of two
degrees of freedom and a rotation driving means of two degrees of
freedom, and the first convex lens 120CL1 and the second convex
lens 120CL2 are respectively provided with movement driving means
with one degree of freedom.
[0064] Alternatively, a unit body may be provided in a fixed manner
in the optical system 120C of the third exemplary embodiment to set
the length of the light path between the first convex lens 120CL1
and the mirror 120CM1, and the length of the light path between the
mirror 120CM1 and the second convex lens 120CL2 to be the focal
distance of the first or second convex lens 120CL1 or 120CL2 (in
FIG. 6, the unit body is marked as a light-lined quadrangle). In
this case, the unit body itself is formed to be movable and
rotatable. As an example, the unit body may be provided with a
movement driving of two degrees of freedom and a rotation driving
means of two degrees of freedom.
[0065] FIG. 7 shows an atomic resolution deformation distribution
measurement device according to a fourth exemplary embodiment of
the present invention. As shown in FIG. 7, an optical system 120D
according to the fourth exemplary embodiment includes a first
mirror 120DM1, a second mirror 120DM2, a third mirror 120DM3, and a
convex lens 120DL1, and a laser beam generated from a laser source
110 is transmitted to a measurement unit 130 by being sequentially
transmitted or reflected through a light path formed from a first
cantilever 151 through the first mirror 120DM1, the convex lens
120DL1, the second mirror 120DM2, the convex lens 120DL1, and the
third mirror 120DM3 to a second cantilever 152.
[0066] In this case, it is preferred that the length of the light
path between the first cantilever 151, the first mirror 120DM1, and
the convex lens 120DL1, the length of the light path between the
convex lens 120DL1 and the second mirror 120DM2, and the length of
the light path between the convex lens 120DL1, the third mirror
120DM3, and the second cantilever 152 are set to be a focal
distance of the convex lens 120DL1 so as to locate the first
cantilever 151 and the second cantilever 152 to an image point in
the optical system 120D of the fourth exemplary embodiment.
[0067] In this case, in the optical system 120D of the fourth
exemplary embodiment, the second mirror 120DM2 and the convex lens
120DL1 are formed to be movable and the second mirror 120DM2 is
formed to be rotatable. As an example, the second mirror 120DM2 is
provided with a movement driving means with one degree of freedom
and a rotation driving means with two degrees of freedom, and the
convex lens 120DL1 may be provided with a movement driving means
with one degree of freedom.
[0068] Alternatively, a unit body may be provided in a fixed manner
in the optical system 120D of the fourth exemplary embodiment to
set the length of the light path between the convex lens 120DL1,
and the second mirror 120DM2 to be the focal distance of the convex
lens 120DL1 (in FIG. 7, the unit body is marked as a light-lined
quadrangle). In this case, the unit body itself is formed to be
movable and rotatable. As an example, the unit body may be provided
with a movement driving means with one degree of freedom and a
rotation driving means with two degrees of freedom.
[0069] FIG. 8 shows an atomic resolution deformation distribution
measurement device according to a fifth exemplary embodiment of the
present invention. As shown in FIG. 8, an optical system 120E
according to the fifth exemplary embodiment includes a mirror
120EM1, a convex lens 120EL1, and a beam splitter 120EB1, and a
light path is formed such that laser beam generated from a laser
source 110 is transmitted to a measurement unit 130 by being
sequentially transmitted or reflected through a first cantilever
151, the beam splitter 120EB1, the convex lens 120EL1, the mirror
120EM1, the convex lens 120EL1, the beam splitter 120EB1, and the
second cantilever 152. In the optical system 120E according to the
fifth exemplary embodiment, the beam splitter 120EB1 is provided
instead of the first mirror 120DM1 and the third mirror 120DM3.
[0070] In this case, in the optical system 120E according to the
fifth exemplary embodiment, it is preferred that the length of the
light path between the first cantilever 151, the beam splitter
120EB1, and the convex lens 120EL1, the length of the light path
between the convex lens 120EL1 and the mirror 120EM1, and the
length of the light path between the convex lens 120EL1, the beam
splitter 120EB1, and the second cantilever 152 are respectively set
to be a focal distance of the convex lens 120EL1 so as to locate
the first cantilever 151 and the second cantilever 152 to an image
point.
[0071] The mirror 120EM1 and the convex lens 120EL1 are formed to
be movable, and the mirror 120EM1 is formed to be rotatable in the
optical system 120E of the fifth exemplary embodiment. As an
example, the mirror 120EM1 may be provided with a movement driving
means with one degree of freedom and a rotation driving means of
two degrees of freedom, and the convex lens 120EL1 may be provided
with a movement driving means with one degree of freedom.
[0072] Alternatively, a unit body may be formed in a fixed manner
in the optical system 120E of the fifth exemplary embodiment to set
the length of the light path between the convex lens 120EL1 and the
mirror 120EM1 to be the focal distance of the convex lens 120EL1
(in FIG. 8, the unit body is marked as a light-lined quadrangle).
In this case, the unit body itself is formed to be movable and
rotatable. As an example, the unit body may be provided with a
movement driving means of one degree of freedom and a rotation
driving means of two degrees of freedom.
[0073] FIG. 9 shows an atomic resolution deformation distribution
measurement device according to a sixth exemplary embodiment of the
present invention. As shown in FIG. 9, an optical system 120F
according to the sixth exemplary embodiment includes a first mirror
120FM1, a second mirror 120FM2, a third mirror 120FM3, a convex
lens 120FL1, a prism 120FPM0, and a beam splitter 120FB1, and a
light path is formed such that laser beam generated from a laser
source 110 is transmitted to a measurement unit 130 by being
sequentially transmitted or reflected through the prism 120FPM0,
the beam splitter 120FB1, a first cantilever 151, the first mirror
120FM1, the convex lens 120FL1, the second mirror 120FM2, the
convex lens 120FL1, the first mirror 120FM1, a second cantilever
152, the beam splitter 120FB1, and the third mirror 120FM3. The
optical system 120F of the sixth exemplary embodiment may be a
deformation of the optical system 120D of the fourth exemplary
embodiment. FIG. 9 is a side view of a stereoscopic structure, and
while it appears that that the first cantilever 151 and the second
cantilever 152 are overlapped with each other, but substantially
the first cantilever 151 and the second cantilever 152 are
separated from each other along a direction of the depth of the
drawing.
[0074] In this case, the length of the light path between the first
cantilever 151, the first mirror 120FM1, and the convex lens
120FL1, the length of the light path between the convex lens 120FL1
and the second mirror 120FM2, the length of the light path between
the convex pens 120FL1, the first mirror 120FM1, and the second
cantilever 152, are preferably respectively set to be a focal
distance of the convex lens 120FL1 in the optical system 120F of
the sixth exemplary embodiment.
[0075] The second mirror 120FM2 and the convex lens 120FL1 are
formed to be movable, and the second mirror FM2 and the beam
splitter 120FB1 are formed to be rotatable in the optical system
120F of the sixth exemplary embodiment. In particular, FIG. 9
illustrates an exemplary alignment of a movement driving means and
a rotation driving means, and although it is not illustrated in
FIG. 9, the beam splitter 120FB1 may be provided with a rotation
driving means with two degrees of freedom.
[0076] FIG. 10 and FIG. 11 respectively illustrate an optical
system including at least one concave mirror according to seventh
and eighth exemplary embodiments of the present invention.
[0077] FIG. 10 shows an atomic resolution deformation distribution
measurement device according to a seventh exemplary embodiment of
the present invention. As shown in FIG. 10, an optical system 120G
of the seventh exemplary embodiment includes a concave mirror
120GCM1, and a light path is formed such that a laser beam
generated from a laser beam 110 is transmitted to a measurement
unit 130 by being sequentially transmitted or reflected through a
first cantilever 151, the concave mirror 120 GCM1, and a second
cantilever 152.
[0078] In this case, the length of the light path between the first
cantilever 151 and the concave mirror 120GCM1 and the length of the
light path between the concave mirror 120GCM1 and the second
cantilever 152 are preferably respectively set to be two times a
focal distance of the concave mirror 120GCM2 so as to locate the
first cantilever 151 and the second cantilever 152 to an image
point.
[0079] In the optical system 120G, the concave mirror 120GCM1 is
formed to be movable and rotatable. As an example, the concave
mirror 120GCM1 may be provided with a movement driving means with
two degrees of freedom and a rotation driving means with two
degrees of freedom.
[0080] FIG. 11 shows an atomic resolution deformation distribution
measurement device according to an eighth exemplary embodiment of
the present invention. As shown in FIG. 11, an optical system 120H
according to the eighth exemplary embodiment includes a first
concave mirror 120HCM1 and a second concave mirror 120HCM2, and a
light path is formed such that a laser beam generated from a laser
source 110 is transmitted to a measurement unit 130 by being
transmitted or reflected through a first cantilever 151, the first
concave mirror 120HCM1, the second concave mirror 120HCM2, and a
second cantilever 152.
[0081] In this case, the length of the light path between the first
cantilever 151 and the first concave mirror 120HCM1 and the length
of the light path between the second concave mirror 120HCM2 and the
second cantilever 152 are preferably respectively set to be a focal
distance of the concave mirror, and the length of the light path
between the first concave mirror 120HCM1 and the second concave
mirror 120HCM2 is preferably set to be two times the focal distance
of the concave mirror so as to locate the first cantilever 151 and
the second cantilever 152 to an image point in the optical system
120H in the eighth exemplary embodiment.
[0082] In this case, the first concave mirror 120HCM1 and the
second concave mirror 120HCM2 are formed to be movable and the
second concave mirror 120HCM2 is formed to be rotatable in the
optical system 120H. As an example, the first concave mirror
120HCM1 may be provided with a movement driving means with one
degree of freedom and the second concave mirror 120HCM2 may be
provided with a rotation driving means with two degrees of
freedom.
[0083] While this invention has been described in connection with
what is presently considered to be practical exemplary embodiments,
it is to be understood that the invention is not limited to the
disclosed embodiments, but, on the contrary, is intended to cover
various modifications and equivalent arrangements included within
the spirit and scope of the appended claims.
* * * * *