U.S. patent application number 14/455910 was filed with the patent office on 2014-11-20 for cold plasma setrilization device.
The applicant listed for this patent is Bovie Medical Corporation. Invention is credited to Gregory Konesky.
Application Number | 20140341786 14/455910 |
Document ID | / |
Family ID | 43062423 |
Filed Date | 2014-11-20 |
United States Patent
Application |
20140341786 |
Kind Code |
A1 |
Konesky; Gregory |
November 20, 2014 |
COLD PLASMA SETRILIZATION DEVICE
Abstract
A cold plasma device for large area decontamination that can
function as a scrub brush to sterilize surfaces and areas that are
otherwise difficult, time consuming and/or may cause exposure
hazards under convention sterilization methods.
Inventors: |
Konesky; Gregory; (Hampton
Bays, NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Bovie Medical Corporation |
Clearwater |
FL |
US |
|
|
Family ID: |
43062423 |
Appl. No.: |
14/455910 |
Filed: |
August 10, 2014 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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13768180 |
Feb 15, 2013 |
8802022 |
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14455910 |
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12012446 |
Feb 2, 2008 |
8377388 |
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13768180 |
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Current U.S.
Class: |
422/186.05 |
Current CPC
Class: |
H05H 1/46 20130101; A61L
9/22 20130101; B01J 2219/0896 20130101; H05H 2001/466 20130101;
H05H 2001/463 20130101; A61L 2/0011 20130101; H05H 2245/1225
20130101; A61L 2/14 20130101; B01J 19/087 20130101 |
Class at
Publication: |
422/186.05 |
International
Class: |
B01J 19/08 20060101
B01J019/08 |
Claims
1-20. (canceled)
21. A sterilization device comprising: an applicator having an
input coupled to a gas source, the applicator having a first
surface and a second surface opposite the first surface, the first
surface configured to be placed adjacent to a surface of tissue to
be sterilized; at least one output channel, the at least one output
channel having an individual wire electrode with a sharp conductive
point disposed therein; and at least one resistor coupled to the
individual wire electrode, the at least one resistor further
coupled to a power source for supplying the same electrical
potential to the individual wire electrode, wherein the individual
wire electrode is coupled to the at least one resistor such that
the individual wire electrode extends from the at least one
resistor into the at least one output channel; wherein when the
individual wire electrode is are powered by the power source with
the same electrical potential and gas is flowing through the at
least one output channel, the sharp conductive point of the
individual wire electrode creates an electric field gradient which
removes electrons from molecules of the gas and ionizes the gas to
form a cold plasma beam at the at least one output channel under
atmospheric pressure so as to sterilize the tissue in contact with
the cold plasma beam.
22. The sterilization device of claim 21, wherein the gas is
inert.
23. The sterilization device of claim 22, wherein the inert gas is
argon.
24. The sterilization device of claim 22, wherein the inert gas is
helium.
25. The sterilization device of claim 21, wherein the applicator is
disposable.
26. The sterilization device of claim 21, wherein the applicator is
reusable.
27. The sterilization device of claim 21, wherein the applicator is
mounted on a swing arm configured to be positioned as necessary for
a procedure.
28. The sterilization device of claim 27, wherein the applicator is
configured to be operated remotely.
29. The sterilization device of claim 27, wherein the applicator is
configured to be preset for operation.
30. The sterilization device of claim 21, wherein at least one
individual resistor forms a resistor network.
31. The sterilization device of claim 21, wherein the resistor
network is at least one bulk distributed resistor, the at least one
bulk distributed resistor being formed of an insulating material
that blended with at least one conductive component to produce a
desired level of equivalent resistance throughout the at least one
bulk distributed resistor.
32. The sterilization device of claim 31, wherein the at least one
bulk distributed resistor is formed with a pin array.
33. The sterilization device of claim 31, wherein the at least one
conductive component is selected from the group consisting
essentially of carbon nanotubes, carbon fibers, graphite powers,
conductive metal particles, conductive metal oxides, conductive
polymers and combinations thereof.
34. The sterilization device of claim 31, wherein the power source
directs power through the at least one bulk distributed
resistor.
35. The sterilization device of claim 21, wherein the applicator is
a hand-held, flexible device configured to adjust to contoured
surfaces.
36. The sterilization device of claim 21, wherein the applicator is
a wall-mounted, flexible device configured to adjust to contoured
surfaces.
Description
PRIORITY
[0001] The present application is a continuation application of
U.S. application Ser. No. 12/012,446, filed Feb. 2, 2008, the
contents of which are hereby incorporated by reference.
FIELD OF THE INVENTION
[0002] A large-area cold plasma decontamination device for
decontamination of nuclear, biological, medical and chemical
incidents in military, industrial and civilian situations.
BACKGROUND
[0003] Atmospheric discharge cold plasma technology has been
employed by the medical community for several years. Examples of
high power uses include tissue ablation, suture sealing and
sterilization of a tissue area. Low power uses may include
dermatologic, hemostasis and other health-field related
applications.
[0004] The term "cold plasma" is used to indicate that only a small
fraction of the inert carrier gas is ionized, although this
fraction can be adjusted to suit the particular use or application.
Typically, the ionized portion of the carrier gas can range between
approximately 10.sup.-6 (a very weak plasma beam) to approximately
10.sup.-3 (a strong beam). A plasma can be formed where a gas is
exposed to a specific amount of energy, and that energy exposure
separates the gas component molecules into a collection of ions,
electrons, charge-neutral gas molecules, and other species in
varying degrees of excitation. Effectiveness has been demonstrated
in rapid sterilization, decontamination and industrial processing.
Unlike semiconductor industry applications, the cold plasma
technology does not require a vacuum chamber. The plasma discharge
is conducted in the open air.
[0005] The mean electron energy (or temperature) of a cold plasma
is considerably higher than that of the bulk-gas molecules. Energy
is primarily added to the electrons rather than the ions and
background gas molecules, and the electrons can attain energies of
approximately 10.sup.-1 eV or higher, while background gas remains
at ambient temperature. A significant energy savings can be
realized since electrons are preferentially excited and larger ions
are left in a lower energy state in a cold plasma.
[0006] A plasma may also be formed when a modulated electric field
is applied to a pair of electrodes and exposed to the gas. The
plasma formation can cause oxygen molecules of the air passing near
the electrodes to break down into component molecules, including
reactive oxygen species ("ROS"). Organic substrates, such as
bacteria, viruses, microbes and mold spores can be exposed to ROS,
and then destroyed or rendered harmless rapidly. The same reaction
can convert much or all of the ROS back into oxygen.
[0007] Cold plasmas can provide rapid decontamination of clothing,
equipment or gear, and sterilization of medical equipment or food.
However, while present methods of decontamination and sterilization
may require long periods of time, even hours or days and generate
damaging heat in the process; a cold plasma of the present
disclosure can often sanitize an area or object very briefly, in
seconds or minutes.
[0008] It would be advantageous in a number a fields to provide a
cold plasma that can decontaminate or sterile large areas
rapidly.
SUMMARY OF THE INVENTION
[0009] This disclosure relates to a decontamination Device having,
at least, a gas source, where the gas is typically an inert gas, a
gas manifold, at least one resistor network, which may be formed of
various types of resistors, and a power source. The Device forms a
plasma that may be employed to decontaminate large areas rapidly
and efficiently in a variety applications.
FIGURES
[0010] FIG. 1 is a cross-sectional view of the general formation of
the bulk distributed resistor.
DETAILED DISCLOSURE
[0011] The disclosed atmospheric discharge cold plasma device (the
"Device") is a large-area mechanism to provide decontamination,
sterilization and general "clean-up" with, inter alia, nuclear
fallout or waste, biologicals, chemicals, and industrial waste. The
Device may be employed in any setting, including in urban outdoor
areas, in medical facilities, military facilities, airplane
hangers, storage facilities, inside tanks and other holding
facilities, and the like. The Device may be operated remotely,
preset for operation, or manually operated. It may also be
disposable or reusable. The Device provides great advantages over
the cold plasma prior art, which is generally directed to medical
uses, because very large areas may be decontaminated or sterilized
rapidly, and no prior preparation of the area is required in any
way. Electrosurgical uses of plasma are disclosed in, inter alia,
U.S. Application 2004/0116918, which is incorporated herein in its
entirety.
[0012] The Device's plasma beam is emitted via the applicator
portion of the Device and can have multiple modes of action to
achieve the desired effect. These modes include ion bombardment,
electron bombardment, thermal effects, ultra-violet emissions, and
the local generation of ozone. Via any of these modes, and
combinations thereof, the flowing inert carrier gas can help carry
away debris, and expose a clean, fresh surface. The ratio of
electrical energy input to carrier gas flow rate can be adjusted
over a wide range, to allow the overall effect to be varied over a
wide range.
[0013] The device has a scalable approach to producing a large area
plasma applicator, which can range from approximately one
millimeter diameter pin-point beam to a much larger area beam
array, which may be approximately a square meter area or more. A
large plasma beam area can be employed as a plasma scrub brush for
use in a variety of situations for decontamination and/or
sterilization. Devices can be built in a manner that allows
flexibility and can adjust to contoured surfaces. Such flexibility
may be employed in an even wider number of circumstances including
holding tanks, reactors, and the like.
[0014] One of the primary benefits of the Device, and atmospheric
discharge cold plasma technology, is the combined impact of
multiple modes of action that provide an antimicrobial action
against a wide spectrum of organisms and spores, including
bacteria, viruses, microbes, fungi, and the like. This same effect
would allow for decontamination of a wide spectrum of biological
agents typically deployed in biological weapons of mass
destruction, and yet cause little or no collateral damage to the
substrate during decontamination. The Device can be formed to
permit safe and relatively rapid decontamination of large affected
areas as compared to more typical or traditional clean-up methods.
In addition, the Device does not use hazardous chemicals or
generate hazardous waste streams, unlike previously known devices
and clean-up methods.
[0015] The Device may also be employed against chemicals using the
same modes of plasma action by breaking down chemical bonds of
chemical weapons agents, by reducing chemicals to simple compounds
such as water, carbon dioxide, and the like. The Device as a plasma
scrub bush would be particularly effective to decontaminate porous
substrates and surfaces which are highly problematic in such
situations. The Device can decontaminate the porous surfaces of
these substrates because the individual plasma beams can travel to
the substrate surface despite uneven surface levels. Again, the
Device has little or no deleterious effect(s) on the substrate
itself.
[0016] The Device may also be used to remove, isolate or destroy
radioisotope compounds, particularly those associated with weapons.
Currently, no technology exists in the prior art to reduce the
specific activity of radioisotopes, which can be deployed in a
weapon, or so called "dirty bomb". The goal of removing and
isolating radioisotopes from the affected area can be accomplished
by applying the cold plasma technology in a practical large area
applicator such as the plasma scrub brush. The Device frees the
isotopes from the contaminated surface for subsequent removal. For
example, a radioactive compound can be broken down into its
constituent components, including water. The isotope can then be
removed from the substrate with the Device and disposed of readily
with the other components.
[0017] Plasma "preprocessing" is employed in various industries to
remove contaminants from surfaces. At higher powers, the plasma
preprocessing can also roughen surfaces on a micro scale and in the
case of polymers, create dangling bonds. These processes are used
to enhance subsequent surface procedures such as coatings, adhesion
and the like but typically require the use of a vacuum chamber in
the prior art to apply a plasma at sub-atmospheric pressures. This
is particularly problematic with large or oddly shaped/non
symmetrical objects or surfaces. The Device can be employed to
preprocess or treat objects of any arbitrary size or shape in a
safe environment. Preprocessing with the Device can also permit
rapid assessment of effectiveness of any preprocessing procedure,
and allow subsequent processes to proceed as may be necessary
without breaking a vacuum seal, if a vacuum used. For example,
preprocessing of surfaces for hip or knee implant replacements can
improve bone adhesion(s). Preprocessing can also, for example,
promote adhesion of non-stick materials to other substrates or
assist adhesion of markings to surfaces where the necessary
markings would otherwise wipe off.
[0018] The Device may be formed in any convenient physical size
depending on an intended use. Medical use Devices may be small
hand-held tools or larger wall-mounted tools on swing arms or
tracks to be positioned as necessary during a medical procedure.
Medical Devices may be formed as single-use articles or multiple
use with re-sterilization. Larger Devices may be formed in the
sizes of household or industrial vacuums, or in any convenient size
that may fulfill a particular or general use need. The Device may
use any convenient power source, which may generally be determined
by the intended use at the time of manufacture. For example, a
Device intended for reuse or multiple uses that might be employed,
for example, in a hospital setting may run via an electrical cord.
Alternatively, a Device that is manufactured for a one time use may
be run on a battery, or, perhaps, a solar charge battery for larger
areas.
[0019] The Device 100 can include a gas storage tank, or holding
location, and typically the gas would be a noble or inert gas, such
as helium or argon. The gas storage tank can be operatively
connected to a conduit 102 to provide a source of gas to be fed
into the Device. The conduit 102, in turn, leads to the electrodes
104. The electrodes 104, when activated, at least partially ionize
the gas to create the plasma stream or streams 106. The number of
plasma streams 106 will be dependent on the size of the Device 100
itself, and the size of the Device applicator which may be formed
as large as approximately a square meter or more.
[0020] Power input 108 into the Device 100 can run through a power
distribution electrode 110 into a bulk distributed resistor 112, as
described below, or individual ballast resistors depending on the
size of the applicator. A plasma beam 106 can be formed by passing
the gas over a sharp conductive point, generally of an electrical
flow wire, which is held at a relatively high voltage, generally
greater than 1 KV, and at a relatively high frequency, generally in
the range of approximately 10 KHz to approximately 10 GHz.
Alternatively, a sintered metal component may be employed to
provide a sharp conductor necessary to create the strong electric
field gradient which helps pull electrons off the inert gas
molecules and ionize them. The metal particle edges of a sintered
metal component can act as sharp conductive points. Ballast
resistors may be employed to prevent plasma beams from
simultaneously functioning or firing, as depicted in FIG. 1. The
plasma beam may exhibit negative resistance and can prevent
additional beams from functioning or firing. The associated
resistance values can range from approximately 1 K.OMEGA. to
approximately 10 M.OMEGA..
[0021] Individual resistors, at least one resistor or a plurality
of resistors, may be used in cases where the number of resistors
necessary or required to function with the area of a particular
applicator would not become unwieldy. However, individual resistors
can be problematic where large numbers of resistors may be involved
as in large area applicators. Rather than employ several hundreds
or thousands of resistors for use with one applicator, a combined
bulk distributed resistor can be used as a resistor network.
[0022] The bulk distributed resistor can be formed of a slow cure
epoxy that can be blended with at least one conductive component to
produce a desired level of equivalent resistance. Alternatively,
the bulk distributed resistor may be formed of other materials,
such as, for example, room-temperature vulcanizing ("RTV") rubber,
silicones, polymers, and other materials and combinations that can
combine with conductive components and that can be hardened or
harden sufficiently for use. The conductive component can be formed
of carbon nanotubes, carbon fibers, graphite powers, conductive
metal particles, conductive metal oxides, conductive polymers, or a
combination thereof. The conductive component may form a percentage
of the resistor material in the range of approximately 0.1% or less
to approximately 80% or some what higher. In another embodiment,
the amount of conductive materials formed in the resistor may be in
the range of approximately 25% to approximately 60%. In yet another
embodiment, the amount of conductive materials formed in the
resistor may be in the range of approximately 35% to approximately
45%. The epoxy is poured into an appropriate mold, depending, inter
alia, on the desired size, shape and flexibility for a particular
form of the Device. The epoxy may then be subjected to vacuum
degassing to remove most, if not all, of any air bubbles that may
have formed during the molding process.
[0023] The bulk distributed resistor can be formed in a pin grid
array. A pin grid array can be inserted into the epoxy to an
approximate depth of not more than half the depth of the mold and
rigidly held in the desired position until the epoxy has cured.
Once the epoxy has cured, the hardened epoxy is removed from the
mold and the pin array, leaving individual channels for emitting a
plasma beam through the applicator. The equivalent resistance of
the bulk distributed resistor can have values of approximately 1
K.OMEGA. to approximately 10 M.OMEGA. between any pin and a common
distribution electrode.
[0024] A common distribution electrode 110 can be attached to the
epoxy surface near the power input source 108. The electrode 110
may be formed of conductive paints, an additional epoxy layer of
higher conductivity, a metal plate or some combination thereof. A
plurality of channels may be formed through the bulk resistor to
allow electrical flow, or other type of power, to contact the gas
as the gas flows through a gas manifold 103 having an input 102
that is connected, directly or indirectly, to the gas storage tank.
The electrical flow can ionize the gas as the power passes into the
gas manifold 103 and forms a plasma stream 106 at the point of the
electrical flow wire 104. The plasma stream 106 may then flow
through an emitter or output channel 114 that is operatively formed
on the gas manifold 103 approximately opposite the bulk resistor
112. A myriad number of plasma beam emitters 114 may be formed. The
emitters 114 can transect the Device applicator to allow the plasma
beams 106 to contact a surface outside the Device 100.
Decontamination of a surface in contact with the Device's plasma
beam 106 then occurs rapidly, with seconds or minutes.
Decontamination time frames may vary based on a number of factors,
including the type of surface, the type of contamination,
additional biological and/or chemical compounds present, and
temperature.
[0025] Alternatively, an intermediate electronegative gas conduit
may optionally be disposed in a coaxial relationship relative to
the gas conduit. A second gas conduit can be used to supply an
electronegative gas, or air such as oxygen and nitrogen to maintain
the plasma stream. Optionally, an outer aspiration conduit may also
be coupled to a negative pressure source, such as a vacuum, that
can be disposed in surrounding coaxial relationship, and also
recessed, relative to the electronegative gas conduit. An
aspiration conduit can optionally be used to remove fluid and solid
debris from the decontamination area, if desired.
[0026] Generally, oxygen and nitrogen in the atmosphere surrounding
a plasma beam can tend to confine the plasma discharge to an
elongated narrow beam. However, if plasma is applied to an enclosed
or internal cavity, the gas flow from the plasma stream displaces
any air remaining within the cavity. In order to maintain the
profile of the plasma stream within a confined space, the
intermediate electronegative gas conduit can be employed. This
intermediate electronegative gas conduit extends beyond the inner
gas conduit in order to maintain a laminar coaxial flow. Gas and
air flow rates are generally equal. However, air flow rates in
excess of the gas flow rate can be used to enhance flow-assisted
removal of smoke and debris generated during use of the Device, if
desired. Excessive flow rates of either the gas or air can induce
turbulence in the plasma stream and distort the discharge jet
shape.
[0027] Cross-boundary diffusion from the plasma stream into the
surrounding air and air diffusion into the plasma stream can limit
the effective length of the plasma stream. Inert gas can be
substituted in place of additional gas flow in the intermediate
electronegative gas conduit, which can significantly extend the
plasma stream, if desired for a specific environment. A reduced
concentration gradient of the gas can occur from an ionized jet
diffusing into non-ionized gas and vice versa. This reduced
concentration gradient can result in an overall plasma stream that
can be approximately two and two and one-half times as long as
plasma streams without a coaxial gas flow.
[0028] It will be appreciated that the disclosed Device addresses
the pressing problem of decontaminating an area without further
risk to life or exposure. A contaminated area can be secured and
sterilized or decontaminated without direct human contact in a
large number of settings that would prove unsafe or even dangerous
for humans in short term of prolonged contact with the
contaminants. The Device is also ideal for decontamination of
interior surfaces and areas, such as holding tanks, because the
Device can be formed using a flexible applicator to adapt to
specific environments and uses, and avoid human exposure to high
contamination levels enclosed within a tank.
[0029] In addition, the disclosed cold plasma Device has many uses
in different fields and applications, such as, inter alia, control
of air flow over a variety of airfoil surfaces, including missiles,
airplane wings, airplane rudders and the like. Use of the Devise
for plasma actuation may provide rapid control of the air flow for
enhanced control of the direction and maneuverability. Such uses
include those disclosed in U.S. Pat. Nos. 7,070,144, and 7,275,013;
and U.S. Patent Applications 2006/0005545, and 2007/0089795, each
of which is incorporated herein in its entirety. For example, US
Patent Application 2007/0089795 discloses a fluid actuator, or a
plurality of actuators, having two conductors, or a plurality of
conductors, on a dielectric. The application of voltage to a
conductor may form a plasma flow which can be modified and
controlled in a desired direction.
[0030] Also disclosed are microwave absorbing characteristics of
discharge plasmas which may form a "plasma shield" at higher
intensities. Such a plasma shield would prove an effective defense
against beamed-microwave directed energy weapons. Moreover, where a
plasma absorbed such directed energy, the plasma's degree of
ionization will increase, to become more effective and
self-reinforcing. Such disclosures include U.S. Pat. Nos. 4,897,285
and 6,492,951, which are incorporated herein in their entirety.
[0031] The Device, and its bulk resistor system, may be employed
with any of the incorporated disclosures, above. The Device may
provide highly efficient applications of plasma having greater
plasma output over a greater surface area, according to the desired
use.
[0032] It should be understood that the foregoing description is
only illustrative of the invention. Various alternatives and
modifications can be devised by those skilled in the art without
departing from the invention. Accordingly, the present invention is
intended to embrace all such alternatives, modifications and
variances which fall within the scope of the appended claims.
* * * * *