U.S. patent application number 14/065344 was filed with the patent office on 2014-02-20 for lithographic printing system with placement corrections.
This patent application is currently assigned to Micronic MyData AB. The applicant listed for this patent is Micronic MyData AB. Invention is credited to Torbjorn Sandstrom.
Application Number | 20140049760 14/065344 |
Document ID | / |
Family ID | 42309698 |
Filed Date | 2014-02-20 |
United States Patent
Application |
20140049760 |
Kind Code |
A1 |
Sandstrom; Torbjorn |
February 20, 2014 |
LITHOGRAPHIC PRINTING SYSTEM WITH PLACEMENT CORRECTIONS
Abstract
The technology disclosed relates to methods and devices that
compensate for displacements in a pattern or deformations of a
workpiece. In particular, this relates to using timing to
compensate for displacements along a first axis along the scanning
direction while using resampling, interpolation or a similar method
to compensate for displacements along a second axis that is
substantially orthogonal to the first axis. The scanning direction
may be an actual direction of movement of the scanning head or it
may be a direction perpendicular to an orientation of an image
projected onto a workpiece.
Inventors: |
Sandstrom; Torbjorn; (Pixbo,
SE) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Micronic MyData AB |
Taby |
|
SE |
|
|
Assignee: |
Micronic MyData AB
Taby
SE
|
Family ID: |
42309698 |
Appl. No.: |
14/065344 |
Filed: |
October 28, 2013 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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12718903 |
Mar 5, 2010 |
8570613 |
|
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14065344 |
|
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61158310 |
Mar 6, 2009 |
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Current U.S.
Class: |
355/52 |
Current CPC
Class: |
G03F 7/70433 20130101;
G03F 7/70508 20130101; G03F 7/70366 20130101; G03F 7/70516
20130101; G01B 11/303 20130101; G03F 7/70591 20130101; G03F 7/70783
20130101; G03F 7/70291 20130101 |
Class at
Publication: |
355/52 |
International
Class: |
G03F 7/20 20060101
G03F007/20 |
Claims
1. A method of correcting for deformations from an ideal rasterize
pattern when projecting an image onto workpiece, the method
including: rasterizing pattern data to an ideal grid; representing
displacements across the area that correct deformations from the
ideal pattern data as displacement vectors; and delivering data to
a modulator having numerous pixels oriented along at least a
transverse direction, using timing of the data delivery to
compensate for the displacements in a scan direction and
calculating pixel data values that compensate for the displacements
in the transverse direction.
Description
RELATED APPLICATIONS
[0001] This application is a continuation of U.S. application Ser.
No. 12/718,903, entitled "Lithographic Printing System with
Placement Corrections", filed 5 Mar. 2010, which will issue as U.S.
Pat. No. 8,570,613 on 29 Oct. 2013, which application claims the
benefit of U.S. Provisional Application No. 61/158,310, filed 6
Mar. 2009, which is hereby incorporated by reference.
[0002] This application is related to US Patent Application
entitled "Rotor Optics Imaging Method and System with Variable Dose
During Sweep"; and US Patent Application entitled "Variable Overlap
Method and Device for Stitching Together Lithographic Stripes"; and
US Patent Application entitled "Rotor Imaging System and Method
with Variable-Rate Pixel Clock"; all filed contemporaneously. The
related applications are incorporated by reference.
[0003] This application is related to U.S. patent application Ser.
No. 12/706,624, entitled "Improved SLM Device and Method", filed 16
Feb. 2010. This application is also related to U.S. patent
application Ser. No. 12/631,595, entitled "Gradient Assisted Image
Resampling In Micro-Lithographic Printing", filed 4 Dec. 2009. The
related applications are incorporated by reference.
BACKGROUND OF THE INVENTION
[0004] The technology disclosed relates to methods and devices that
compensate for displacements in a pattern or deformations of a
workpiece. In particular, this relates to using timing to
compensate for displacements along a first axis along the scanning
direction while using resampling, interpolation or a similar method
to compensate for displacements along a second axis that is
substantially orthogonal to the first axis. The scanning direction
may be an actual direction of movement of the scanning head or it
may be a direction perpendicular to an orientation of an image
projected onto a workpiece.
[0005] This design team recently has described in patent
applications of rotor arm scanning system with very high
throughput. The rotor arm scanner can, for instance, be used to
write directly to large area masks.
[0006] The use of the rotor arm for scanning, instead of a
shuttlecock with a reciprocating motion or a fixed head and a
moving bed, is a radical departure from standard lithographic and
imaging equipment. Use of the rotor presents very challenging data
path issues, as the data is presented in a Cartesian grid that
requires translation or mapping for use in a polar scanning system,
in which the actual scanning path also involves linear motion of
the workpiece as the scanning arm rotates.
[0007] Accordingly, many new components of a data path need to be
developed. Many new problems not presented by prior lithographic
technologies need to be identified and solved. Resolution of the
many constituent engineering challenges has the potential of
contributing to an overall system that has many times the pixel and
area coverage throughput of prior, reciprocating systems.
SUMMARY OF THE INVENTION
[0008] The technology disclosed relates to methods and devices that
compensate for displacements in a pattern or deformations of a
workpiece. In particular, this relates to using timing to
compensate for displacements along a first axis along the scanning
direction while using resampling, interpolation or a similar method
to compensate for displacements along a second axis that is
substantially orthogonal to the first axis. The scanning direction
may be an actual direction of movement of the scanning head or it
may be a direction perpendicular to an orientation of an image
projected onto a workpiece.
BRIEF DESCRIPTION OF THE DRAWINGS
[0009] FIG. 1 depicts a scanning system with three arms and a pair
of workpieces 111, 112 being written on opposite sides of the hub
148.
[0010] FIG. 2 further describes use of a so-called one-dimensional
SLM with anamorphic optics.
[0011] FIG. 3 depicts application of an alignment distortion map
(ADM) to a geometric pixel map (GPM) to produce new positions of
pixels in the map.
[0012] FIG. 4 relates to displacement vectors to pixel values used
to sweep a stripe with the rotor.
[0013] FIG. 5 depicts a high-level block diagram of correction
using a one demodulator.
[0014] FIG. 6 depicts additional details of timing control.
[0015] FIG. 7 depicts generic data path.
DETAILED DESCRIPTION
[0016] The following detailed description is made with reference to
the figures. Preferred embodiments are described to illustrate the
present invention, not to limit its scope, which is defined by the
claims. Those of ordinary skill in the art will recognize a variety
of equivalent variations on the description that follows.
[0017] The technology disclosed relates to a method and apparatus
for compensating for scan direction displacements along a first
axis by adjusting timing delays in loading an SLM and compensating
for the transverse direction displacements along a second axis by
resampling in 1D. The 1D resampling may use the gradient assisted
resampling method of the related application referenced above.
[0018] Applying this technology a pattern is rasterized to a
Cartesian coordinate system and then interpolation, translation or
resampling is applied to select data to drive a modulator, such as
a 1D SLM. The modulator responds to the data as it sweeps a pattern
generating beam across the surface of a workpiece. Interpolation
can be used in one dimension and time delays in loading the
modulator can be used in a second dimension of sweep to adjust the
Cartesian pattern to the pattern being drawn by the writing head
and modulator. Using rasterized data to load a 1D SLM for swept
printing is less complex than loading a 2D SLM for overlapped stamp
printing.
1D Resampling
[0019] This technology can address placement errors caused by
deformation of the workpiece, in software running on a processor,
by rasterizing a pattern onto an ideal grid, and determining
displacements in a scan direction and a transverse direction. In
the scan direction, displacements can be addressed by adjusting
timing delays in loading an SLM. In the transverse direction,
displacements can be handled by resampling or interpolation in
1D.
[0020] This approach compensates for distortion in a workpiece, for
instance, between layers that are written, by using local
displacement vectors to map the distortion, interpolating or
resampling data values along the length of a 1D SLM to compensate
in a first direction, and adjusting timing values of data fed along
the width of the 1D SLM to compensate in the second direction.
[0021] In the following sections, we elaborate on the combination
of first axis delay and second axis resampling. Then, we provide
expanded descriptions of resampling generally and a rotor system
environment in which this technology is particularly useful.
[0022] FIG. 3 depicts application of an alignment distortion map
(ADM) to a geometric pixel map (GPM) to produce new positions of
pixels in the map.
[0023] The distortion map supports compensation for alignment
errors in the position of the panel and distortions in the panel
shape. The map describes how GPM pixels should be relocated to best
fit the loaded panel. Points in the map to find the displacement
vector that defines a new position for the part of the GPM at the
map position. The middle section of FIG. 3 provides an example of
displacement vectors as a vector field. Normally the map spans the
entire panel or an entire exposure area. The resolution of the
alignment distortion map need not match the resolution of the
geometric pixel map. For GPM pixels between map points,
two-dimensional linear interpolation can be applied.
[0024] In one example, consider the exposure area 510.times.610 mm.
The grid typically is chosen according to the distortion
frequencies to be mapped. A reasonable grid scale might be 0.1
microns. Map data points include two values, for X and Y
displacement. As an order of magnitude, the displacement values
might be expected to range between zero and 300 microns for data at
the center of the map and up to 600 microns around the edges.
[0025] FIG. 4 relates to displacement vectors to pixel values used
to sweep a stripe with the rotor. At the top of FIG. 4, the image
projected from the SLM onto the workpiece is represented in a
handful of locations. The calligraphy stroke aspect of the stripe
painted is apparent from the convergence of the bounding curves
toward the sides, at X.sub.1 and X.sub.n. The inset to the figure
depicts six pixels at one projected image. Correction vectors for
the respective pixels are shown. The pixels are roughly aligned as
the displacement vectors suggest. The curve to the left represents
the resulting image from pixels in these locations.
[0026] FIG. 5 depicts a high-level block diagram of correction
using one demodulator. Along the resolved dimension of the SLM,
interpolation or translation can be used, as explained above. Data
for interpolation or translation 511 is combined with the
displacement vector to calculate 531 individual pixel values for
the SLM 553. Along the sweep direction, timing can be used to
compensate for displacement. A x-axis component of the displacement
vector is fed to a timing processor 551. The timing adjustment is
combined with the pixel values by a load controller 533, which
feeds the pixel values to the SLM 553. Timing can be handled to a
fraction of a degree, such as 1/1000 radian or 0.02 degrees.
[0027] FIG. 6 depicts additional details of timing control. Data
from a clock and delay specifications 691 are combined in one or
more stages 622, 623. Separate delay stages may be applied to
compensate for the order of invoking digital to analog converters
and for displacement according to the alignment displacement map.
After appropriate delays, the pixel values are fed to the SLM
553.
General Resampling
[0028] FIG. 7 depicts a generic data path. In addition to the GPM
721 processing domain and MPM 723 processing domain, discussed
above, a third data domain warrants discussion. The vector data
domain precedes rasterization to create the GPM. Therefore, the
three different data domains are vector data, pixel data in a
consolidated Geometrical Pixel Map (the GPM) 721, and pixel data
organized for the modulator (the MPM 723, Modulator Pixel Map).
[0029] The present disclosure relates to, gradient assisted image
re-sampling, individual adjustments of pattern image per printed
substrate by re-sampling and a data path architecture where pattern
dependent processing and modulator dependent processing can be
decoupled.
[0030] Data for a pixel-based exposure system that prints in a
sequential manner needs to be "flat" (all data contributing to one
pixel aggregated) and localized. The pattern represented as a
rendered geometrical pixel map (GPM 721) fulfils these properties
and makes a suitable format as intermediate storage.
[0031] A re-sampling process converts the GPM into modulator pixels
in a modulator pixel map (MPM 723). Image processing and
morphological operations can also be applied during this
re-sampling process. It is possible to apply the image processing
and morphological operations at both local parts of the pattern,
such as over the exposure system field of view, or globally over
the pattern. The image processing and morphological operations
include, but are not limited to, scaling, translation, rotation,
distortion and sizing. These operations can be used to compensate
both for how the exposure system projects pixels onto the
mask/substrate and for properties of the mask/substrate.
[0032] Due to fidelity requirements and the potential information
loss during the re-sampling process, the intermediate pixel map
(GPM 721) has a higher resolution than the Modulator Pixel Map (MPM
723). By using gradient information in the re-sampling process, the
memory resolution required to satisfy the requirement of the GPM
721 can be significantly reduced.
[0033] The majority of the pattern dependent processing steps are
done during generation of the GPM 721. The re-sampling is primarily
used to handle localized pattern dependent (morphological)
operations. It is advantageous to limit re-sampling to localized
pattern dependent operations, as this improves the predictability
of computational effort for the re-sampling. Predictable
computational effort, in turn, makes it easier to optimize the
configuration.
[0034] The use of the GPM 721 as intermediate storage enables
exposure system independence, since processing steps to generate
the GPM 721 can be made generic and independent from an exposure
system.
[0035] Processing requirements for data paths in high resolution
microlithography are very challenging, even using the latest and
most capable processing hardware. A contributing factor to success
in high resolution processing and in high performance computing
(HPC), generally, is parallelization. Parallelizing high resolution
processing involves dividing the processing into small pieces.
Microlithography applications that use the data paths described,
process data that has a geographical property, which works within a
coordinate system. One convenient way to divide the task is
coordinate oriented.
[0036] Processing according to the architecture disclosed can be
described in two domains, called off-line and on-line. Processing
also operates in different data domains. In this disclosure, we
refer to processing to create the geometrical pixel maps 721 as
"GPM processing." We refer to resampling of the GPM to create the
modulator pixel map 723 as "MPM processing." In the first phase of
processing, operations are done in a geometrical coordinate system
that is independent of modulator type and geometry. The second
phase is adapted to a particular modulator. It produces tiles 510
(FIG. 5) that are pieces of modulator data arranged according to
requirements from the modulator.
[0037] When discussing the data path, we call the abutting parts of
an area, covered by the pattern, "tiles" 510. Tiles can be fully
described by geometrical coordinates. We refer to tiles in both the
GPM processing and the MPM processing, even though the coordinate
systems could be quite different between the two.
[0038] Our description of the GPM processing refers to square
tiles. One should recognize that while rectangular tiles could also
be used, especially with a rectangular modulator. Generally, using
rectangular tiles would reduce performance, because tiles with long
sides will generate more extension zone area. Tiles with long sides
are also likely to traverse/cross more cell boundaries than squares
tiles thereby creating unnecessary overhead when fetching data.
[0039] To make the tiles independent of each other for parallel
processing, we use a guard bound or "halo" around the actual tile.
We process data in this halo that influences data inside the tile.
This "halo" is called an extension zone and is processed in more or
less the same way as the rest of the tile. A large extension zone
area surrounding a "true tile" area will create unnecessary
overhead. One of the factors that influences the size of the halo
is the size of the fractured pattern geometries. From simple
geometry, a square will have less extension zone area than any
rectangle of the same area. Despite a preference for square tiles,
present data path implementation also supports rectangle shaped
tiles.
Rotor Optics
[0040] Environments in which the technology disclosed is
particularly useful include a rotating arm printing or viewing
device with relay optics with a hub at one end of the arm and
optics at the other end, which couple image information with the
surface of a workpiece. The optical coupling at the hub may be
either on or off the axis of rotation. The following section
provides background on the inventive rotor system that is useful
for understanding the role of a variable dose or dose compensation
function.
[0041] A rotor arm system can write to (or read from) a workpiece.
It uses a stationary optical image device to modulate (or collect)
relayed image information. It relays the image information along
optics of at least one rotating arm between the stationary optical
image device and a surface of the workpiece. By repeatedly sweeping
a curved stripe across the surface of the workpiece, a contiguous
image may be written from overlapping partial images by stitching
together the partial images on the workpiece.
[0042] Pattern information, e.g., a partial image, is relayed
between the optical image device and the surface of the workpiece
with a substantially constant azimuthal orientation. By
"substantially constant," we include a small rotation that is
within tolerances or that is corrected in rasterizing, producing no
more than a 0.5 degree rotational variation in the angular
relationship when the relayed versions are separated by more than 5
degrees sweep of the rotating optical arm.
[0043] The rotor can have several arms, e.g. 2, 3, 4, 6, or 8 arms,
thereby multiplying the scanned surface area per time unit. Heavy,
complex, fragile machine parts, or parts that are expensive or need
many connections and services can be placed stationary near the
center or hub of the rotor and be shared by the multiple arms. An
image is relayed between a stationary image device placed at or
near the hub of the rotor and the workpiece, through the radial
arm.
[0044] The rotor system is described by reference to relay optics
because it can be used to write to or read from a workpiece. For
instance, it is useful to write directly to a large area mask or a
PCB. Or, it can be used to inspect a large area mask. It is used
with a workpiece positioning mechanism, such as a stage, details of
which are outside the scope of this disclosure.
[0045] FIG. 1 depicts a rotor scanning system with three arms and a
pair of workpieces 111, 112 being written on opposite sides of the
hub 148. This system may have a duty cycle of 100%. Each rotor
writes through an arc of 60 degrees. Only one arm 140 writes at a
time, alternatively on the two workpieces 111 and 112. The laser
energy is switched by polarization control 132 between the two SLMs
147 and 149, and the data stream is also switched between the SLMs.
Since the laser 120 and the data path 135 are among the most
expensive modules in a writing machines, this embodiment has been
designed to use laser and data channel 100% of the time while the
SLMs and the optics in the arms has lower duty cycles, 50% and 33%
respectively. This may be, for instance, an example of a writing
system with three rotating arms 140A-C. There are a variety of
alternative designs for these arms and the relay optics. The figure
conceptually depicts a laser 120 and a controller 135 sending data
to two SLMs 130 which are relayed 132, 147, 149 to the rotating
arms. It shows how each arm moves in front of each SLM and writes a
series of concentric stamps on the workpieces 111, 112. While two
workpieces are shown in this figure, more workpieces could be
positioned under a rotor, depending on its size. While the example
is described as a writing system, the direction of relay could just
as easily be from the workpiece back to a pair of detectors
positioned where the laser 120 is and elsewhere. In alternative
configurations, one workpiece might be used; four arms might be
used.
[0046] Some particularly useful applications of this technology
involve writing patterns on electronic substrates, such as: wafers'
front and back sides; PCBs; build-up, interposer and flexible
interconnection substrates; and masks, stencils, templates and
other masters.
[0047] Likewise, the rotor writer can be used for patterning panels
in displays, electronic paper, plastic logic and photovoltaic
cells. The patterning can be done by exposure of photoresist, but
also through other actions of light such as thermal or
photochemical processes: melting, evaporation, ablation, thermal
fusing, laser-induced pattern transfer, annealing, pyrolytic and
photo induced etching and deposition.
[0048] A rotor system replaces the customary motion of a Cartesian
flatbed xy stage with a polar scanning motion. Potential benefits
include high throughput, low cost and mechanical simplicity. The
scanning action is done by a rotating motion, which is mechanically
easier to build to high accuracy than straight-line motion. The
position accuracy of a point on the periphery of the rotor is
determined by the quality of a bearing and the accuracy of an angle
encoder. Both of these components can be sourced with high quality.
A rotational reduces vibrations and transient forces during
scanning and between scanning strokes. A well-balanced rotor emits
essentially no vibrations or reactive forces to the supporting
structure, while reciprocating straight movements need to reverse
their momentum twice per stroke and create strong disturbances when
doing so. A rotor may have a higher scanning velocity with less
mechanical overhead. A rotor with several arms uses nearly the
whole circle for writing. For instance, a rotor with four arms may
scan through an 80 degree arc. Out of the 360 degrees in a circle,
the rotor scans during 4.times.80=320 degrees. A reciprocating
movement needs more mechanical overhead. The overhead for
reciprocating movement gets larger with increased scanning
velocity.
[0049] Rotor systems may have a very high data rate and throughput
and may be used for other types of patterning where these
characteristics are useful: photo-setting, printing, engraving,
security marking, etc. The rotor has a smooth movement and small
mechanical overhead even at high rotation speeds, e.g. 60, 120,
300, 600 r.p.m. or higher. The scanning speed, which is the
peripheral speed of the rotor, may be higher than comparable
reciprocating systems, e.g. 2, 4, 8, 20 m/s or higher.
[0050] In practical terms, one implementation would have a rotor
one meter in diameter, spinning 3.3 turns per second with a
centripetal acceleration of 20 g. The acceleration force gives a
constant force on rotating components, such that a lens weighing 50
grams will feel a constant force outwards of 10 N. With four arms
and rotational speed, the system writes 13 strokes per second with
a peripheral velocity of 10 m/s, a mechanical speed that is
impractical with a reciprocating stage. Furthermore, with proper
balancing and design of the bearings the motion will be smooth,
have high mechanical precision and need little power to be
sustained. If the image generator is a micromechanical 1D SLM with
constant 2 MHz frame rate used for creating a 1D partial image on
the workpiece, the reloading of the SLM would occur every 5 microns
along the scanning direction and the pixel size could be 5.times.5
microns, allowing line width of less than 15 microns to be written.
With a micromechanical 1D SLM, effectively having 8000.times.1
pixels, each stroke would fill a stripe 40 mm wide with pattern,
and cover--with some reduction for the non-straight scan--0.3
square meters per second or 20 square meters per minute. This is a
very high coverage rate, compared to other writing
technologies.
[0051] FIG. 2 further describes use of a so-called one-dimensional
SLM with anamorphic optics. A light source 205 (arc lamp, gas
discharge, laser, array of lasers, laser plasma, LED, array of LEDs
etc.) illuminates a one-dimensional SLM 204. The reflected (or
transmitted in the general case) radiation is projected as a line
segment 203 on a workpiece 201. The data driving the SLM changes as
the workpiece is scanned 207 to build up an exposed image. A
strongly anamorphic optical system 206 concentrates energy from
multiple mirrors in a column (or row) to point in the image and the
entire two-dimensional illuminated array forms a narrow line
segment 203 that is swept across the workpiece. In one dimension,
the anamorphic optics demagnify the illuminated area, for instance,
by 2.times. to 5.times., so the a 60 millimeter wide SLM would
image onto a line segment 30 to 12 mm long. Along the short
dimension, the anamorphic optics strongly demagnify the column of
mirrors to focus onto a narrow area such as 3 microns wide, i.e.
essentially a single resolved line. Alternatively, the area could
be 1 or 5 microns wide or less than 10 microns wide. Focus onto a 3
micron wide area could involve an 80.times. demagnification, from
approximately 240 microns to 3 microns. The anamorphic optical path
demagnifies the row of mirrors to an extent that individual mirrors
are combined and not resolved at the image plane. As described in
related applications, the SLM could be positioned in a plane that
is in sharp focus along one dimension of the SLM and de-focused
along the other dimension. This would decrease the criticality of
the lens system.
[0052] A rotor enables many image processing instruments to be used
on large flat substrates and scanning at high speed, e.g. on solar
panels, display substrates, sheet metal, architectural glass,
roll-to-roll plastic, paper, and the like. Through the rotating
arms an image may be captured at the periphery and transferred to
the hub where a camera or an optical analytical instrument may be
situated, e.g. a reflectometer, spectrophotometer, scatterometer,
multispectral camera, polarimeter, fluorescence or
photo-luminescence instrument. Instruments that are complex, bulky
or fragile can be mounted fixed at the hub and still access any
point on the surface of, say, a two meter wide thin-film
photovoltaic panel passing on a conveyor under the rotor, thereby
enabling full-area inspection or analysis at dense grids on large
workpieces without removing sheets for analysis or stopping the
roll-to-roll flow. The rotor may have only flat optics or it may
have reflecting relays in the arms, allowing achromatic use from
far IR to deep UV. The illumination, e.g. UV for fluorescence
studies, may be brought from the hub or it may be generated within
the rotor.
[0053] As mentioned above, the disclosed technology enables many
instruments to be used on large flat substrates and scanning at
high speed, e.g. on solar panels, display substrates, sheet metal,
architectural glass, roll-to-roll plastic, paper, and the like.
Through the rotating arms an image may be captured at the periphery
and transferred to the hub where a camera or detector (e.g., a
vidicon, CCD, CID, CMOS device, and/or a TDI, intensified, gated,
avalanche, single photon, photon-counting, interferometric,
colorimetric, heterdyne, photoconductive or bolometric detector or
array) is located , or an optical analytical instrument may be
situated, (e.g., a reflectometer, spectrophotometer, colorimeter,
scatterometer, multispectral camera, polarimeter, or a
fluorescence, photo-luminescence or photoacoustic instrument).
[0054] Other possible uses are for optical measurements of heat
(infrared emission), color, flatness, smoothness, film thickness,
chemical composition, cleanliness, or for verification of pattern
integrity or fidelity . The method is particularly beneficial where
an image of the surface or an exact location of a found defect or
feature is needed. Instruments that are complex, bulky or fragile
can be mounted fixed at the hub and still access any point on the
surface of, say, a two meter wide thin-film photovoltaic panel
passing on a conveyor under the rotor, thereby enabling full-area
inspection or analysis at dense grids on large workpieces without
removing sheets for analysis or stopping the roll-to-roll flow. The
rotor may have only flat optics or it may have reflecting relays in
the arms, allowing achromatic use from far IR to deep UV. The
illumination (e.g. visible incident light for reflected-light
microscopy) may be brought from the hub or it may be generated
within the rotor. Several instruments and or writing modes may be
combined in one rotor, either by being combined in one optical arm
or by employing different ones. At least one instrument or optical
image device may emit an exciting beam through an arm and receives
an image back from the workpiece, e.g. UV for fluorescence studies.
The rotation may be continuous with a constant or varying angular
speed or alternatively be driven by in a stop and go fashion, in
particular for random-access analysis of workpieces. Focusing of
the imaging optics may be fixed, variable from time to time or
dynamic during scanning and based on feedback from focus sensors
based on interferometry, back-reflection, proximity to a fiber end,
optical triangulation, optical defocus or parallax; fluid flow,
pressure or viscous resistance; ultrasound time-of-flight or phase;
capacitance, inductance or other suitable phenomena indicating a
distance or position.
Some Particular Embodiments
[0055] The technology disclosed may be practiced as a method,
device or system. One method corrects deformations from an ideal
rasterized pattern when projecting an image onto a workpiece. This
method includes rasterizing pattern data to an ideal grid and
representing displacements across the area that correct for
deformations from the ideal pattern data. Optionally, the
displacements may be represented as displacement vectors. The
method further includes delivering data to a modulator having
numerous pixels oriented along at least the transverse direction,
using timing of the data delivery to compensate for the
displacements in the scan direction and calculating pixel data
values that compensate for the displacements in the transverse
direction.
[0056] In some implementations of this method, the modulator
projects an image onto a workpiece, with the modulator relaying the
image along a rotating arm through optics that maintain a
substantially constant orientation of the projected image onto the
workpiece relative to a first axis. These implementations further
include using the timing of the data delivery to compensate for the
displacements in the scan direction, defined as perpendicular to a
major axis of the projected image. In these implementations, the
printing head on the rotor traces an arc in a constantly changing
direction. Still, the constant orientation of the projected image
permits the scan direction to be defined relative to the image
orientation. The scan direction is a line, rather than an arc.
[0057] Another aspect of the foregoing method includes retrieving
the rasterized pattern data from one or more columns of a Cartesian
data grid and combining the columns of data to calculate pixel data
values that compensate for the displacements in the transverse
direction by resampling from the rasterize pattern data to lower
resolution modulator pattern data. In this context, resampling
includes converting higher resolution rasterize data to lower
resolution modulator data.
[0058] An alternative to resampling includes retrieving the
rasterize pattern data from at least one column of the Cartesian
data grid and interpolating between data values in the column to
produce pixel data values that compensate for the displacements in
the transverse direction.
[0059] A further aspect that can be combined with any of
implementations, aspects for alternatives above, includes updating
some of the displacement vectors that correct the deformations
while delivering the data to the modulator that compensates for the
deformations using others of the displacement vectors.
[0060] Another method that practices the technology disclosed
compensates for distortion of a workpiece while printing rasterize
data using a modulator having numerous pixels along at least a
length of the modulator. This method includes accessing local
displacement vectors stored in memory that map compensation for
distortion of workpiece and calculating data values along the
length of a modulator to compensate for the distortion in a first
direction. The method further includes adjusting timing of data
feed to the modulator to compensate for the distortion in a second
direction, substantially orthogonal to the first direction.
[0061] In general, the implementations, aspects and alternatives
applied to the first method also apply to the second method. In
some implementations, the modulator projects an image onto a
workpiece, with the modulator relaying the image along a rotating
arm through optics that maintain a substantially constant
orientation of the projected image onto the workpiece relative to a
first axis. These implementations further include using the timing
of the data delivery to compensate for the displacements in the
scan direction, defined as perpendicular to a major axis of the
projected image. In these implementations, the printing had on the
rotor traces an arc in a constantly changing direction. Still, the
constant orientation of the projected image permits the scan
direction to be defined relative to the image orientation. The scan
direction is a line, rather than an arc.
[0062] The aspects of alternative of resampling our interpolating,
described above, applies to this method. In some embodiments, this
method is combined with updating some of the displacement vectors
that correct for the distortion of the workpiece while feeding the
data to the modulator.
[0063] Various devices also implement the technology disclosed. One
is a deformation correction device that corrects for deformations
from an ideal rasterize pattern when projecting an image onto a
workpiece. This device includes a memory and at least one processor
coupled to the memory. It includes a first module running on the
processor that rasterizes pattern data to an ideal grid and an
alignment displacement map stored in the memory that represents
deformations across a workpiece from the ideal grid in a scan
direction and a transverse direction as displacement vectors. The
device further includes a modulator having numerous pixels oriented
along the least the transverse direction, the modulator coupled to
the processor. A second module running on the processor delivers
data to the modulator using timing of the data delivery to
compensate for the displacements in the scan direction and
calculating pixel data values that compensate for the displacements
in the transverse direction.
[0064] Generally, the aspects, implementations and alternatives
applicable to the methods above also can be combined with this
device.
[0065] Some implementations of this device further include an
optical path along a rotating arm from the modulator projects to a
workpiece. The modulator and optical path relay an image to the
workpiece while maintaining a substantially constant orientation of
the projected image on the workpiece relative to a first axis. In
this implementation, the scan direction is defined as perpendicular
to a major axis of the projected image.
[0066] In one aspect, the second module retrieves the rasterized
pattern data from one or more columns of a Cartesian data grid and
resamples the columns of data from the ideal grid to a lower
resolution for the delivery to the modulator. Alternatively, the
second module retrieves the rasterized pattern data from at least
one column of a Cartesian data grid and interpolates between data
values in the column to produce pixel data values that compensate
for the displacements in the transverse direction.
[0067] A further aspect, which can be combined with any the
implementations, aspects or alternatives above, includes a third
module running on the processor that updates some of the
displacement vectors in real time. The third module corrects some
of the displacement vectors while the second module delivers the
data to the modulator using others of the displacement vectors.
[0068] Another device that practices the technology disclosed
compensates for distortion of a workpiece in rasterized data
adapted for use by a modulator having numerous pixels along at
least a length of the modulator. This device includes a memory and
at least one processor coupled to the memory. It includes
displacement vectors stored in the memory that map compensation for
distortion in a first direction and in a second direction,
substantially orthogonal to the first direction. A first module
runs on the processor, that accesses the displacement vectors and
calculates data values of pixels along the length of a modulator to
compensate in data for the distortion in the first direction. A
second module runs on the processor, that adjusts timing of data
feed to the modulator to compensate for the distortion in the
second direction.
[0069] Each of the aspects, implementations and alternatives
describes the methods and the first device also can be applied to
the second device.
* * * * *