U.S. patent application number 13/314320 was filed with the patent office on 2012-12-13 for manufacturing method of roller used for manufacturing patterned retardation film.
This patent application is currently assigned to BENQ MATERIALS CORP.. Invention is credited to Fung-Hsu Wu, Lung-Hai Wu.
Application Number | 20120311861 13/314320 |
Document ID | / |
Family ID | 47291911 |
Filed Date | 2012-12-13 |
United States Patent
Application |
20120311861 |
Kind Code |
A1 |
Wu; Fung-Hsu ; et
al. |
December 13, 2012 |
MANUFACTURING METHOD OF ROLLER USED FOR MANUFACTURING PATTERNED
RETARDATION FILM
Abstract
A manufacturing method of a roller used for manufacturing a
patterned retardation film is provided. The manufacturing method
includes the following steps. A roller having a rotational axis and
a roller surface is provided. An engraving device having an
engraving end is provided. The engraving end has a plurality of
sub-micron slots which are constructed in parallel with each other.
The engraving device engraves the roller surface with a first depth
to form a plurality of first sub-micron grooves. The engraving
device engraves the roller surface with a second depth to form a
plurality of second sub-micron grooves.
Inventors: |
Wu; Fung-Hsu; (Guishan
Township, TW) ; Wu; Lung-Hai; (Taoyuan City,
TW) |
Assignee: |
BENQ MATERIALS CORP.
Gueishan Township
TW
|
Family ID: |
47291911 |
Appl. No.: |
13/314320 |
Filed: |
December 8, 2011 |
Current U.S.
Class: |
29/895 |
Current CPC
Class: |
Y10T 29/49544 20150115;
G02B 5/3083 20130101 |
Class at
Publication: |
29/895 |
International
Class: |
B21K 1/02 20060101
B21K001/02 |
Foreign Application Data
Date |
Code |
Application Number |
Jun 13, 2011 |
TW |
100120609 |
Claims
1. A manufacturing method of a roller used for manufacturing a
patterned retardation film comprising: providing a roller having a
rotational axis and a roller surface; providing an engraving device
having an engraving end, wherein the engraving end has a plurality
of sub-micron slots arranged in parallel; engraving the roller
surface with a first depth along the roller rotational direction to
form a plurality of first regions with a plurality of first
sub-micron grooves on the first regions by the engraving device,
wherein the first sub-micron grooves are substantially parallel to
the roller rotational direction; and engraving the roller surface
with a second depth along the roller rotational direction to form a
plurality of second regions with a plurality of second sub-micron
grooves on the second regions by the engraving device, wherein the
second sub-micron grooves are substantially parallel to the roller
rotational direction; wherein, the first regions with the first
sub-micron grooves and the second regions with the second
sub-micron grooves are formed on the roller surface
alternately.
2. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 1, wherein the first
depth is smaller than the second depth.
3. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 1, wherein the width
of the engraving device is substantially equal to the width of each
first region and the width of each second region.
4. A manufacturing method of a roller used for manufacturing a
patterned retardation film comprising: providing a roller having a
rotational axis and a roller surface; providing an engraving device
having an engraving end, wherein the engraving end has a plurality
of sub-micron slots arranged in parallel; engraving the roller
surface with a first depth along a direction of a
37.degree.-53.degree. angle with respect to a roller rotational
direction by the engraving device to form a plurality of first
sub-micron grooves on the roller surface; and engraving the roller
surface with a second depth along the roller rotational direction
to form a plurality of second regions with a plurality of second
sub-micron grooves by the engraving device, wherein the second
sub-micron grooves are substantially parallel to the roller
rotational direction; wherein, the second regions with second
sub-micron grooves are formed with an equal distance.
5. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 4, wherein the step
of engraving the first sub-micron grooves further comprises:
rotating the roller around the rotational axis; and moving the
engraving device along the rotational axis from one end of the
roller to the other end to engrave the rotating roller surface with
the first depth.
6. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 4, wherein the step
of engraving the second sub-micron grooves further comprises:
rotating the roller around the rotational axis; and engraving the
roller surface with the second depth by the engraving device.
7. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 4, wherein the step
of engraving the second sub-micron grooves is performed after the
step of engraving the first sub-micron grooves.
8. A manufacturing method of a roller used for manufacturing a
patterned retardation film comprising: providing a roller having a
rotational axis and a roller surface; providing an engraving device
having an engraving end, wherein the engraving end has a plurality
of sub-micron slots arranged in parallel; engraving the roller
surface with a first depth along a perpendicular direction which is
perpendicular to a roller rotational direction by the engraving
device to form a plurality of first sub-micron grooves on the
roller surface; and engraving the roller surface with a second
depth along the roller rotational direction by the engraving device
to form a plurality of second regions with a plurality of second
sub-micron grooves by the engraving device, wherein the second
sub-micron grooves are substantially parallel to the roller
rotational direction; wherein the second regions with the second
sub-micron grooves are spaced with a distance to width of the
second regions.
9. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 8, wherein the step
of engraving the first sub-micron grooves comprises: moving the
engraving device along a direction perpendicular to the roller
rotational direction to engrave the roller surface with the first
depth.
10. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 8, wherein the step
of engraving the second sub-micron grooves comprises: rotating the
roller around the rotational axis; and engraving the roller surface
with the second depth by the engraving device.
11. The manufacturing method of a roller used for manufacturing a
patterned retardation film according to claim 8, wherein the step
of engraving the second sub-micron grooves is performed after the
step of engraving the first sub-micron grooves.
Description
[0001] This application claims the benefit of Taiwan application
Serial No. 100120609, filed Jun. 13, 2011, the subject matter of
which is incorporated herein by reference.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The invention relates in general to a manufacturing method
of a roller, and more particularly to a manufacturing method of a
roller used for manufacturing a patterned retardation film.
[0004] 2. Description of the Related Art
[0005] Along the advance in the display technology, a patterned
retardation film is provided accordingly. Different optical phase
retardations can be generated through the use of the patterned
retardation film, so as to generate stereo visual effect. The
patterned retardation film can be used in the 3D display technology
such as 3D glasses, 3D TV and so on.
[0006] The patterned retardation film must maintain a certain level
of precision so as to assure its optical quality. In order to meet
the precision standard, the manufacturing speed of the patterned
retardation film cannot be effectively increased. Therefore, the
research personnel are dedicated to providing a tool which can
quickly and precisely manufacture the patterned retardation film to
meet the needs of the industries.
SUMMARY OF THE INVENTION
[0007] The invention is directed to a manufacturing method of a
roller used for manufacturing a patterned retardation film. An
engraving device is used for engraving a roller to form various
particular patterns on the surface of the roller. The roller with
particular patterns can promptly and precisely manufacture a
patterned retardation film by way of embossing.
[0008] According to an aspect of the present invention, a
manufacturing method of a roller used for manufacturing a patterned
retardation film is provided. The manufacturing method includes the
following steps. A roller having a rotational axis and a roller
surface is provided. An engraving device having an engraving end is
provided, wherein the engraving end has a plurality of sub-micron
slots which are constructed in parallel with each other. The
engraving device engraves the roller surface with a first depth
along a roller rotational direction to form a plurality of first
regions with a plurality of first sub-micron grooves. The first
sub-micron grooves are substantially parallel to the roller
rotational direction. The engraving device engraves the roller
surface with a second depth along the roller rotational direction
to form a plurality of second regions with a plurality of second
sub-micron grooves. The second sub-micron grooves are substantially
parallel to the roller rotational direction. The first region with
the first sub-micron grooves and the second region with the second
sub-micron grooves are formed on the roller surface
alternately.
[0009] According to another aspect of the present invention, a
manufacturing method of a roller used for manufacturing a patterned
retardation film is provided. The manufacturing method includes the
following steps. A roller having a rotational axis and a roller
surface is provided. An engraving device having an engraving end is
provided, wherein the engraving end has a plurality of sub-micron
slots which are constructed in parallel with each other. The
engraving device engraves the roller surface with a first depth
along a direction of a 37.degree.-53.degree. angle with respect to
a roller rotational direction to form a plurality of first
sub-micron grooves on the roller surface. The engraving device
engraves the roller surface with a second depth along the roller
rotational direction to form a plurality of second regions with a
plurality of second sub-micron grooves, wherein the second
sub-micron grooves are substantially parallel to the roller
rotational direction. The second regions with second sub-micron
grooves are spaced with a distance to the width of the second
regions.
[0010] According to yet another aspect of the present invention, a
manufacturing method of a roller used for manufacturing a patterned
retardation film is provided. The manufacturing method includes the
following steps. A roller having a rotational axis and a roller
surface is provided. An engraving device having an engraving end is
provided, wherein the engraving end has a plurality of sub-micron
slots arranged in parallel. The engraving device engraves the
roller surface with a first depth along a perpendicular direction
which is perpendicular to a roller rotational direction to form a
plurality of first sub-micron grooves on the roller surface. The
engraving device engraves the roller surface with a second depth
along the roller rotational direction to form a plurality of second
regions with a plurality of second sub-micron grooves, wherein the
second sub-micron grooves are substantially parallel to the roller
rotational direction. The second regions with second sub-micron
grooves are spaced with a distance to width of the second
regions.
[0011] The above and other aspects of the invention will become
better understood with regard to the following detailed description
of the preferred but non-limiting embodiment(s). The following
description is made with reference to the accompanying
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0012] FIG. 1 shows a flowchart of a manufacturing method of a
roller used for manufacturing a patterned retardation film of the
first embodiment;
[0013] FIGS. 2A to 2D show the processing in each step of FIG.
1;
[0014] FIG. 3 shows an explosion diagram of a patterned retardation
film manufactured by the roller of the first embodiment;
[0015] FIG. 4 shows a flowchart of a manufacturing method of a
roller used for manufacturing a patterned retardation film of the
second embodiment;
[0016] FIGS. 5A to 5B show the processing in each step of FIG.
4;
[0017] FIG. 6 shows an explosion diagram of a patterned retardation
film manufactured by the roller of the second embodiment;
[0018] FIG. 7 shows a flowchart of a manufacturing method of a
roller used for manufacturing a patterned retardation film;
[0019] FIGS. 8A to 8B show the processing in each step of FIG. 7;
and
[0020] FIG. 9 shows an explosion diagram of a patterned retardation
film manufactured by the roller of the third embodiment.
DETAILED DESCRIPTION OF THE INVENTION
[0021] A number of embodiments are disclosed for detailed
descriptions of the invention. An engraving device is used for
engraving the roller to form various particular patterns on the
roller. The roller with particular patterns can quickly and
precisely manufacture a patterned retardation film by embossing.
However, the embodiments are for exemplification purpose only, not
for limiting the scope of protection of the invention. In addition,
in the embodiments, a part of the elements are omitted to highlight
the technical features of the invention.
First Embodiment
[0022] Referring to FIG. 1 and FIGS. 2A to 2D. FIG. 1 shows a
flowchart of a manufacturing method of a roller 100 used for
manufacturing a patterned retardation film 600 (illustrated in FIG.
3) of the first embodiment. FIGS. 2A to 2D show the processing in
each step of FIG. 1. Firstly, the method begins at step S101, as
indicated in FIG. 2A, a roller 100 having a rotational axis 100c
and a roller surface 100a is provided. Before the engraving
process, the roller surface 100a is the surface of a smooth
cylinder. That is, all the diameters 100d along the rotational axis
100c are the same, and the vertical distance from any point on the
roller surface 100a to the rotational axis 100c is substantially
equivalent. In the present embodiment of the invention, the roller
100 is formed by a material such as copper (Cu).
[0023] Next, the method proceeds to step S102, as indicated in FIG.
2B, an engraving device 900 having an engraving end 910 is
provided, wherein the engraving end 910 has a plurality of
sub-micron slots 911 which are constructed in parallel with each
other. The hardness of the engraving end 910 is harder than that of
the roller 100, and can be formed by such as diamond. The width
W911 of the sub-micron slots 911 is substantially equivalent to the
interval D911.
[0024] Then, the method proceeds to step S103, as indicated in FIG.
2C, the engraving device 900 engraves the roller surface 100a with
a first depth D1 along a roller rotational direction C1 to form a
plurality of first regions 110.
[0025] Then, the method proceeds to step S103, the sub-micron slots
911 (illustrated in FIG. 2B) of the engraving device 900 form a
plurality of first sub-micron grooves 111 on the first regions 110,
wherein each of the first sub-micron grooves 111 are substantially
parallel to the roller rotational direction C1.
[0026] The width W900 of the engraving device 900 determines the
width W110 of each first region 110, so the width W900 of the
engraving device 900 of step S102 determines the width W110 of each
first region 110 of step S103.
[0027] In the present step, the roller 900 is rotated around the
rotational axis 100c, and the engraving device 900 vertically
engraves the roller surface 100a to form a circle of first region
110 with the first sub-micron grooves 111 along the roller surface
100a. Then, the engraving device 900 and the roller 100 are
separated with respect to each other (for example, the engraving
device 900 moves away from the roller 100, or the roller 100 moves
away from the engraving device 900). Then, the engraving device 900
and the roller 100 move with respect to each other for a
predetermined distance D110 along the rotational axis 100c (for
example, the engraving device 900 moves along the rotational axis
100c, or the roller 100 moves along the rotational axis 100c).
Then, the engraving device 900 and the roller 100 are closed with
respect to each other (for example, the engraving device 900 moves
towards the roller 100, or the roller 100 moves towards the
engraving device 900) to form another circle of first region 110
with the first sub-micron grooves 111.
[0028] The predetermined distance for which the engraving device
900 and the roller 100 move with respect to each other along the
rotational axis 100c is such as the width W900 of the engraving
device 900, so that the predetermined distance D110 between the
first regions 110 is substantially equal to the width W110 of the
first region 110.
[0029] Then, the method proceeds to step S104, the engraving device
900 engraves the roller surface 100a with a second depth D2 along
the roller rotational direction C1 to form a plurality of second
regions 120. In an enlargement of FIG. 2D, the roller surface 100a
before engraving is depicted in dotted lines to illustrate the size
of the second depth D2. The first depth D1 is smaller than the
second depth D2. In the present embodiment of the invention, the
first depth D1 ranges between 1 to 20 .mu.m, and the second depth
D2 ranges between 1 to 20 .mu.m.
[0030] The sub-micron slots 910 (illustrated in FIG. 2B) of the
engraving device 900 form a plurality of second sub-micron grooves
121 on the second regions 120, wherein each of the second
sub-micron grooves 121 are substantially parallel to the roller
rotational direction C1.
[0031] The width W900 of the engraving device 900 determines the
width W120 of each second region 120 with the second sub-micron
grooves 121.
[0032] Then, the method proceeds to step S104, the relative
movement between the roller 100 and the engraving device 900 is
similar to that in step S103. That is, the roller 100 is rotated
around the rotational axis 100c, and the engraving device 900
vertically engraves the roller surface 100a so as to form a circle
of second region 120 with the second sub-micron grooves 121 between
two of the first regions 110 with the first sub-micron grooves 111
along the roller surface 100a. Then, the engraving device 900 and
the roller 100 are separated with respect to each other (for
example, the engraving device 900 moves away from the roller 100,
or the roller 100 moves away from the engraving device 900). Then,
the engraving device 900 and the roller 100 move with respect to
each other for the width W110 of the first region 110 along the
rotational axis 100c (for example, the engraving device 900 moves
along the rotational axis 100c, or the roller 100 moves along the
rotational axis 100c). Then, the engraving device 900 and the
roller 100 are closed with respect to each other (for example, the
engraving device 900 moves towards the roller 100, or the roller
100 moves towards the engraving device 900) to form another circle
of second region 120 with the second sub-micron grooves 121.
[0033] Thus, the engraving device 900 can alternately form the
first regions 110 with the first sub-micron grooves 111 and the
second regions 120 with the second sub-micron grooves 121 along the
roller surface 100a with the first depth D1 and the second depth
D2. Furthermore, both each of the first sub-micron groove 111 and
each of the second sub-micron groove 121 are substantially parallel
to each other, and substantially perpendicular to the direction of
the rotational axis 100c.
[0034] Referring to FIG. 3, an explosion diagram of a patterned
retardation film 600 manufactured by the roller 100 of the first
embodiment is shown. The roller 100 is used for embossing the phase
retardation pattern 610 on a resin layer of a base substrate 601.
The first sub-micron structures 611 transferred from the first
sub-micron grooves 111 are at a lower position, and the second
sub-micron structures 621 transferred from the second sub-micron
grooves 121 are at a higher position. After a polymerizable liquid
crystal layer 620 is coated on the phase retardation pattern 610, a
patterned retardation film 600 with phase retardation effect is
formed.
Second Embodiment
[0035] Referring to FIG. 4 and FIGS. 5A to 5B. FIG. 4 shows a
flowchart of a manufacturing method of a roller 200 used for
manufacturing a patterned retardation film 700 (illustrated in FIG.
6) of the second embodiment. FIGS. 5A to 5B show the processing in
each step of FIG. 4. The flowchart of a manufacturing method of a
roller 200 used for manufacturing a patterned retardation film 700
of the present embodiment of the invention is different from the
manufacturing method of a roller 100 used for manufacturing a
patterned retardation film 600 of the first embodiment in step
S203, and other similarities are not repeated here.
[0036] Following steps S201 to S202, the method proceeds to step
S203. In step S203, as indicated in FIG. 5A, the engraving device
900 engraves the roller surface 200a with first depth D1 along a
direction of a 37.degree.-53.degree. angle with respect to the
roller rotational direction C2 to form a plurality of first
sub-micron grooves 211 on the roller surface 200a.
[0037] In the present step, the roller 200 is rotated around the
rotational axis 200c. When the roller 200 is rotated, the engraving
device 900 is moved along the rotational axis 200c to engrave the
roller surface 200a with the first depth D1. By properly
controlling the rotation speed of the roller 200 and the movement
speed of the engraving device 900 (for example, the two speed are
controlled to be the same with each other), a plurality of first
sub-micron grooves 211 can be formed on the roller surface 200a at
an angle of 37.degree.-53.degree. with respect to the rotational
axis 200c.
[0038] Then, the method proceeds to step S203, since the engraving
device 900 engraves the roller 200 at an angle of
37.degree.-53.degree. with respect to the rotational axis 200c from
one end of the roller to the other end of the roller, the first
sub-micron grooves 211 form a spiral structure. In the present
step, after the engraving device 900 changes the starting point of
engraving, the engraving device 900 engraves the roller 200 again
at an angle of 37.degree.-53.degree. with respect to the rotational
axis 200c to make the spiral first sub-micron grooves 211 spread
over the roller 200.
[0039] Then, the method proceeds to step S204, as indicated in FIG.
5B, the engraving device 900 engraves the roller surface 200c to
form a plurality of second regions 220 along the roller rotational
direction 200c in a way similar to step S104. The sub-micron slots
911 (illustrated in FIG. 2) form a plurality of second sub-micron
grooves 221 on the second regions 220, wherein the second
sub-micron grooves 221 are substantially parallel to the roller
rotational direction C1.
[0040] Thus, the engraving device 900 can alternately form the
first sub-micron grooves 211 and the second sub-micron grooves 221
along the roller surface 200 with different depths. Moreover, the
first sub-micron grooves 211 are 37.degree.-53.degree. with respect
to the rotational axis 200c, and the second sub-micron grooves 221
are substantially perpendicular to the rotational axis 200c.
[0041] Referring to FIG. 6, an explosion diagram of a patterned
retardation film 700 manufactured by the roller 200 of the second
embodiment is shown. The roller 200 is used for embossing phase
retardation pattern 710 on a resin layer of a base substrate 701.
The first sub-micron structures 711 transferred from the first
sub-micron grooves 211 are at a lower position, and the second
sub-micron structures 721 transferred from the second sub-micron
grooves 221 are at a higher position. After a polymerizable liquid
crystal layer 720 is coated on the phase retardation pattern 710, a
patterned retardation film 700 with phase retardation effect is
formed.
Third Embodiment
[0042] Referring to FIG. 7 and FIGS. 8A to 8B. FIG. 7 shows a
flowchart of a manufacturing method of a roller 300 used for
manufacturing a patterned retardation film 800 (illustrated in FIG.
9). FIGS. 8A to 8B show the processing in each step of FIG. 7. The
flowchart of a manufacturing method of a roller 300 used for
manufacturing a patterned retardation film 800 of the present
embodiment of the invention is different from the manufacturing
method of a roller 100 used for manufacturing a patterned
retardation film 600 of the first embodiment in step S303, and
other similarities are not repeated here.
[0043] Following steps S301 to S302, the method proceeds to step
S303. In step S303, as indicated in FIG. 8A, the engraving device
900 engraves the roller surface 300a with the first depth D1 in a
perpendicular direction which is perpendicular to the roller
rotational direction C1 (as the roller 300 is not rotated in FIG.
8A, the roller rotational direction C1 is illustrated in FIG. 8B)
to form a plurality of first sub-micron grooves 311 on the roller
surface 300a.
[0044] In the present step, the roller 300 is fixed. The engraving
device 900 is moved along a direction perpendicular to the roller
rotational direction C1 to engrave the roller surface 300a with the
first depth D1.
[0045] Then, the method proceeds to step S303, since the engraving
device 900 engrave the roller 300 along the perpendicular
direction, the first sub-micron grooves 311 form a horizontal lines
structure. In the present step, after the engraving device 900
changes the starting point of engraving, the engraving device 900
engraves the roller 300 again at the perpendicular direction to
make the first sub-micron grooves 311 of horizontal lines spread
over the roller 300.
[0046] Then, the method proceeds to step S304, as indicated in FIG.
8B, the engraving device 900 engraves the roller surface 300 to
form a plurality of second regions 320 along the roller rotational
direction 300c in a way similar to step S104. The sub-micron slots
911 (illustrated in FIG. 2) form a plurality of second sub-micron
grooves 321 on the second regions 320, wherein the second
sub-micron grooves 321 are substantially parallel to the roller
rotational direction C1.
[0047] Thus, the engraving device 900 can alternately form the
first sub-micron grooves 311 and the second sub-micron grooves 321
along the roller surface 300 with different depths. Moreover, the
first sub-micron grooves 311 are substantially parallel to the
rotational axis 300c, and the second sub-micron grooves 321 are
substantially perpendicular to the rotational axis 300c. And the
second regions 320 with the second sub-micron grooves 321 are
spaced with a distance to the width of the second regions 320.
[0048] Referring to FIG. 9, an explosion diagram of a patterned
retardation film 800 manufactured by the roller 300 of the third
embodiment is shown. The roller 300 is used for embossing phase
retardation pattern 810 on a resin layer of a base substrate 801.
The first sub-micron structures 811 transferred from the first
sub-micron grooves 311 are at a lower position, and the second
sub-micron structures 821 transferred from the second sub-micron
grooves 321 are at a higher position. After a polymerizable liquid
crystal layer 820 is coated on the phase retardation pattern 810, a
patterned retardation film 800 with phase retardation effect is
formed.
[0049] While the invention has been described by way of example and
in terms of the preferred embodiment(s), it is to be understood
that the invention is not limited thereto. On the contrary, it is
intended to cover various modifications and similar arrangements
and procedures, and the scope of the appended claims therefore
should be accorded the broadest interpretation so as to encompass
all such modifications and similar arrangements and procedures.
* * * * *