U.S. patent application number 13/222119 was filed with the patent office on 2012-01-19 for josephson device, method of forming josephson device and superconductor circuit.
This patent application is currently assigned to INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER, THE JURIDICAL FOUNDATION. Invention is credited to Seiji Adachi, Keiichi Tanabe, Koji Tsubone, Hironori WAKANA.
Application Number | 20120012818 13/222119 |
Document ID | / |
Family ID | 39197390 |
Filed Date | 2012-01-19 |
United States Patent
Application |
20120012818 |
Kind Code |
A1 |
WAKANA; Hironori ; et
al. |
January 19, 2012 |
JOSEPHSON DEVICE, METHOD OF FORMING JOSEPHSON DEVICE AND
SUPERCONDUCTOR CIRCUIT
Abstract
A Josephson device includes a first superconducting electrode
layer, a barrier layer, and a second superconducting electrode
layer that are successively stacked. The first and second
superconducting electrode layers are made of an oxide
superconductor material having (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y
as a main component, where an element RE is at least one element
selected from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy,
Ho, Er, Tm, Yb and Lu, and an element AE is at least one element
selected from a group consisting of Ba, Sr and Ca. The barrier
layer is made of a material that includes the element RE, the
element AE, Cu and oxygen, where the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers.
Inventors: |
WAKANA; Hironori;
(Ohira-machi, JP) ; Adachi; Seiji; (Narashino-shi,
JP) ; Tsubone; Koji; (Hiroshima, JP) ; Tanabe;
Keiichi; (Mito-Shi, JP) |
Assignee: |
INTERNATIONAL SUPERCONDUCTIVITY
TECHNOLOGY CENTER, THE JURIDICAL FOUNDATION
CHUGOKU ELECTRIC POWER CO., INC.
|
Family ID: |
39197390 |
Appl. No.: |
13/222119 |
Filed: |
August 31, 2011 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
11895256 |
Aug 23, 2007 |
8032196 |
|
|
13222119 |
|
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Current U.S.
Class: |
257/31 ;
257/E39.006 |
Current CPC
Class: |
H01L 39/2496 20130101;
Y10S 505/702 20130101; H01L 39/225 20130101 |
Class at
Publication: |
257/31 ;
257/E39.006 |
International
Class: |
H01L 39/12 20060101
H01L039/12 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 23, 2006 |
JP |
2006-226938 |
Claims
1. A Josephson device comprising a first superconducting electrode
layer, a barrier layer and a second superconducting electrode layer
that are successively stacked, wherein: said first and second
superconducting electrode layers are made of an oxide
superconductor material having (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y
as a main component, where an element RE is at least one element
selected from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy,
Ho, Er, Tm, Yb and Lu, and an element AE is at least one element
selected from a group consisting of Ba, Sr and Ca; and said barrier
layer is made of a material that includes the element RE, the
element AE, Cu and oxygen, where in cations within the material
forming the barrier layer, a Cu content is in a range of 35 At. %
to 55 At. % and an RE content is in a range of 12 At. % to 30 At.
%, and the barrier layer has a composition different from
compositions of the first and second superconducting electrode
layers.
2. The Josephson device as claimed in claim 1, wherein the Cu
content and the RE content in the composition of the barrier layer
respectively differ from those of the compositions of the first and
second superconducting electrode layers by 3 At. % or more.
3. The Josephson device as claimed in claim 1, wherein the barrier
layer has the element RE made of Y and the element AE made of Ba,
and in the cations within the material forming the barrier layer
the Cu content is in a range of 35 At. % to 55 At. % and a Y
content is in a range of 12 At. % to 30 At. %.
4. The Josephson device as claimed in claim 1, wherein: each of the
first and second superconducting electrode layers and the barrier
layer includes an element LRE, where the element LRE is at least
one element selected from a group consisting of La, Ce, Pr, Nd, Sm
and Eu; and an LRE content of the barrier layer is larger than an
LRE content of each of the first and second superconducting
electrode layers.
5. The Josephson device as claimed in claim 4, wherein the Cu
content, the RE content or the LRE content of the barrier layer is
analyzed by an Energy Distribution X-ray spectroscopy (EDX) by
irradiating an electron beam having a beam diameter of 1 nm or less
on the barrier layer.
6. A Josephson device comprising: a substrate; a first
superconducting electrode layer formed on the substrate and having
a first sloping surface portion on one end surface thereof; an
insulator layer formed on the first superconducting electron layer
and having a second sloping surface portion on one end surface
thereof, so that the first and second sloping surface portions form
a continuous sloping surface; a barrier layer deposited on the
sloping surface; and a second superconducting electrode layer
covering the barrier layer, wherein said first and second
superconducting electrode layers are made of an oxide
superconductor material having (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y
as a main component, where an element RE is at least one element
selected from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy,
Ho, Er, Tm, Yb and Lu, and an element AE is at least one element
selected from a group consisting of Ba, Sr and Ca; and said barrier
layer is made of a material that includes the element RE, the
element AE, Cu and oxygen, where in cations within the material
forming the barrier layer, a Cu content is in a range of 35 At. %
to 55 At. % and an RE content is in a range of 12 At. % to 30 At.
%, and the barrier layer has a composition different from
compositions of the first and second superconducting electrode
layers.
7. A Josephson device comprising: a substrate having a surface; a
first superconducting electrode layer formed on the surface of the
substrate; an insulator formed on the first superconducting
electrode layer and having a penetration hole penetrating the
insulator layer in a direction taken along a thickness of the
insulator layer; a barrier layer deposited on the first
superconducting electrode layer and within the penetration hole;
and a second superconducting electrode layer filling the
penetration hole and covering the barrier layer and the insulator
layer, wherein said first and second superconducting electrode
layers are made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca; and said barrier layer is made of a material that
includes the element RE, the element AE, Cu and oxygen, where in
cations within the material forming the barrier layer, a Cu content
is in a range of 35 At. % to 55 At. % and an RE content is in a
range of 12 At. % to 30 At. %, and the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers.
8. The Josephson device as claimed in claim 7, wherein each of the
first and second superconducting electrode layers and the insulator
have the Perovskite structure as its basic structure, and an atomic
plane made up of Cu and oxygen in each of the first and second
superconducting electrode layers is perpendicular to the surface of
the substrate.
9. The Josephson device as claimed in claim 7, wherein the Cu
content and the RE content in the composition of the barrier layer
respectively differ from those of the compositions of the first and
second superconducting electrode layers by 3 At. % or more.
10. The Josephson device as claimed in claim 7, wherein the barrier
layer has the element RE made of Y and the element AE made of Ba,
and in the cations within the material forming the barrier layer
the Cu content is in a range of 35 At. % to 55 At. % and a Y
content is in a range of 12 At. % to 30 At. %.
11. The Josephson device as claimed in claim 7, wherein: each of
the first and second superconducting electrode layers and the
barrier layer includes an element LRE, where the element LRE is at
least one element selected from a group consisting of La, Ce, Pr,
Nd, Sm and Eu; and an LRE content of the barrier layer is larger
than an LRE content of each of the first and second superconducting
electrode layers.
12. The Josephson device as claimed in claim 11, wherein the Cu
content, the RE content or the LRE content of the barrier layer is
analyzed by an Energy Distribution X-ray spectroscopy (EDX) by
irradiating an electron beam having a beam diameter of 1 nm or less
on the barrier layer.
13. A method of forming a Josephson device comprising the steps of:
(a) forming on a substrate a first superconducting electrode layer
made of an oxide superconductor material; (b) forming an insulator
layer covering the first superconducting electrode layer; (c)
removing a portion of the insulator layer to expose the first
superconducting electrode layer; (d) depositing a barrier layer
made of an oxide material on an exposed surface of the first
superconducting electrode layer; and (e) forming a second
superconducting electrode layer made of an oxide superconductor
material to cover the barrier layer, wherein the oxide material
forming the barrier layer includes an element RE, an element AE, Cu
and oxygen, where the element RE is at least one element selected
from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er,
Tm, Yb and Lu, and the element AE is at least one element selected
from a group consisting of Ba, Sr and Ca.
14. The method of forming the Josephson device as claimed in claim
13, wherein the oxide superconductor materials forming said first
and second superconducting electrode layers have
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca.
15. The method of forming the Josephson device as claimed in claim
13, wherein the oxide material forming the barrier layer has a Cu
content in a range of 35 At. % to 55 At. % and an RE content in a
range of 12 At. % to 30 At. %, and a composition of the oxide
material is different from compositions of the first and second
superconducting electrode layers.
16. The method of forming the Josephson device as claimed in claim
13, wherein said step (d) uses one of vacuum deposition,
sputtering, Pulsed Laser Deposition (PLD) and Chemical Vapor
Deposition (CVD).
17. The method of forming the Josephson device as claimed in claim
13, wherein said step (d) uses one of vacuum deposition, sputtering
and Pulsed Laser Deposition (PLD), and controls a composition of
the barrier layer based on a distance between the substrate and a
target and a pressure within an oxygen gas atmosphere.
18. A superconductor circuit using magnetic flux quantum as signal
carrier, comprising: at least one Josephson device comprising a
first superconducting electrode layer, a barrier layer and a second
superconducting electrode layer that are successively stacked,
wherein said first and second superconducting electrode layers are
made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca; and said barrier layer is made of a material that
includes the element RE, the element AE, Cu and oxygen, where in
cations within the material forming the barrier layer, a Cu content
is in a range of 35 At. % to 55 At. % and an RE content is in a
range of 12 At. % to 30 At. %, and the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention generally relates to Josephson
devices, methods of forming Josephson devices and superconductor
circuits, and more particularly to a Josephson device that uses an
oxide superconductor, a method of forming such a Josephson device,
and a superconductor circuit having such a Josephson device.
[0003] 2. Description of the Related Art
[0004] Ever since the YBa.sub.2Cu.sub.3O.sub.y (YBCO) copper oxide
superconductor having a critical temperature of 92K was found in
1987, active research has been made on oxide superconductors. The
Josephson device using the oxide superconductor can obtain a high
IcRn product and a junction that has a high superconductive
transition temperature. The IcRn product is a product of a maximum
superconducting current value (critical current value) Ic that can
flow through the superconducting junction at a certain temperature,
and a resistance value Rn that is obtained when the superconducting
state breaks down and the superconducting junction assumes the
normal conducting (or non-superconducting) state. This IcRn product
is an index that qualitatively represents the magnitude of the
signal and the magnitude of the sensitivity at the time of the
switching. By use of such a Josephson device, it is possible to
realize a superconductor circuit having a high-speed operation and
a sensor having a high sensitivity at temperatures of 40K or
higher.
[0005] The technique for forming or fabricating the Josephson
device utilizing the Josephson effect is essential in forming
devices using the oxide superconductor. Various structures, such as
the bi-crystal type, micro-bridge type, step-edge type and
ramp-edge type, have been proposed for the Josephson device using
the oxide superconductor.
[0006] The bi-crystal type junction can be formed with ease by
depositing a superconductor film on a substrate which is obtained
by bonding surfaces having different crystal orientations, because
crystal grains that act as a barrier layer within the
superconductor film are formed on the substrate interface. Devices
using this bi-crystal type junction, such as the SQUID devices,
have already been developed to the stage of merchandising. However,
the bi-crystal type junction can only be formed at the bonding
interface of the substrate, and is unsuited for application to
high-performance devices that require complex structures.
[0007] On the other hand, in the case of the stacked-type Josephson
device or the ramp-edge type Josephson device shown in FIG. 1A,
there are no restrictions on the location where the junction is to
be formed, and such devices are advantageous when realizing
large-scale integration of the superconductor circuits. The
ramp-edge type Josephson device shown in FIG. 1A has a substrate
101, and layers 102, 103 and 104 that are stacked on the substrate
101. The lower electrode layer 102 is made of an oxide
superconductor. The insulator layer 103 is interposed between the
lower electrode layer 102 and the upper electrode layer 104. A
junction 105 is formed via a barrier layer 102a that is formed on a
sloping surface of the lower electrode layer 102 between the upper
and lower electrode layers 104 and 102. The barrier layer of the
stacked-type or ramp-edge type Josephson device is made of a
non-superconducting material such as PrBa.sub.2Cu.sub.3O.sub.y,
SrTiO.sub.3, PrGaO.sub.3 and CeO.sub.2 or, formed by an
Interface-Engineered Junction (IEJ). The ramp-edge type Josephson
device having the IEJ shown in FIG. 1B has a substrate 101, and
layers 102 and 103 that are stacked on the substrate 101. In FIG.
1B, those parts that are the same as those corresponding parts in
FIG. 1A are designated by the same reference numerals, and a
description thereof will be omitted. The barrier layer 102a is
formed to a thickness of several nm on the sloping surface of the
lower electrode 102, by bombarding Ar ions on the sloping surface
so as to make the barrier layer 102a amorphous and forming the
upper electrode layer 103 (not shown in FIG. 1B) so as to cover the
barrier layer 102a. For this reason, compared to the Josephson
device having the junction made of a conductor material, the
Josephson device having the IEJ can suppress inconsistencies in the
junction characteristics and realize a relatively high IcRn
product.
[0008] With respect to the Josephson device having the IEJ
function, T. Satoh et al., "High-Temperature Superconducting
Edge-Type Josephson Junctions with Modified Interfaces", IEEE
Trans. Appl. Supercond. Vol. 9, No. 2, June 1999, pp. 3141-3144
reported experimental results of 10 junctions at a temperature of
4.2K including an IcRn product of 1.5 mV to 3 mV and a 1.sigma.
(.sigma.denotes standard deviation) of the maximum current value Ic
of approximately 8%. In addition, Y. Soutome et al., "HTS
Surface-Modified Junctions with Integrated Ground-Planes for SFQ
Circuits", IEICE Trans. Electron. Vol.E85-C, No. 3, March 2002, pp.
759-763 reported experimental results of 100 junctions at a
temperature of 4.2K including an IcRn product of 1.5 mV and a
1.sigma. (.sigma. denotes standard deviation) of the maximum
superconducting current value Ic of approximately 7.9%.
[0009] When considering the application of the Josephson junction
to the devices, it is desirable from the point of view of reducing
the system cost to realize a Josephson device that can operate at
high speed at a high temperature and has a high sensitivity. The
IcRn product must be large in order to realize such a Josephson
device, but a sufficiently large IcRn product has not be obtained
in T. Satoh et al. and Y. Soutome et al. referred above.
SUMMARY OF THE INVENTION
[0010] Accordingly, it is a general object of the present invention
to provide a novel and useful Josephson device, method of forming
Josephson device and superconductor circuit, in which the problems
described above are suppressed.
[0011] Another and more specific object of the present invention is
to provide a Josephson device, a method of forming Josephson device
and a superconductor circuit, having an improved IcRn product.
[0012] Still another object of the present invention is to provide
a Josephson device comprising a first superconducting electrode
layer, a barrier layer and a second superconducting electrode layer
that are successively stacked, wherein the first and second
superconducting electrode layers are made of an oxide
superconductor material having (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y
as a main component, where an element RE is at least one element
selected from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy,
Ho, Er, Tm, Yb and Lu, and an element AE is at least one element
selected from a group consisting of Ba, Sr and Ca, and the barrier
layer is made of a material that includes the element RE, the
element AE, Cu and oxygen, where in cations within the material
forming the barrier layer, a Cu content is in a range of 35 At. %
to 55 At. % and an RE content is in a range of 12 At. % to 30 At.
%, and the barrier layer has a composition different from
compositions of the first and second superconducting electrode
layers. According to the present invention, it is possible to avoid
the problem of the Cu content of the barrier layer becoming
extremely small, unlike the conventional IEJ, because the barrier
layer is a deposited layer of the oxide material, and a
satisfactory superconducting junction can be formed. As a result,
it is possible to improve the IcRn product of the Josephson device.
In addition, it is also possible to suppress inconsistencies in the
critical current value Ic. Moreover, the critical temperature of
the superconducting junction becomes high compared to that of the
conventional IEJ. Consequently, the cooling cost of the Josephson
device can be reduced. It is preferable that the compositions of
the first and second superconducting electrode layers are detected
by an analyzing method similar to that used to detect the
composition of the barrier layer, and to compare the compositions
at a distance of approximately 10 nm from the interface between the
barrier layer and the first and second superconducting electrode
layers.
[0013] A further object of the present invention, is to provide a
Josephson device comprising a substrate; a first superconducting
electrode layer formed on the substrate and having a first sloping
surface portion on one end surface thereof; an insulator layer
formed on the first superconducting electrode layer and having a
second sloping surface portion on one end surface thereof, so that
the first and second sloping surface portions form a continuous
sloping surface; a barrier layer deposited on the sloping surface;
and a second superconducting electrode layer covering the barrier
layer, wherein the first and second superconducting electrode
layers are made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca; and the barrier layer is made of a material that
includes the element RE, the element AE, Cu and oxygen, where in
cations within the material forming the barrier layer, a Cu content
is in a range of 35 At. % to 55 At. % and an RE content is in a
range of 12 At. % to 30 At. %, and the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers. According to the present
invention, it is possible to realize a ramp-edge type Josephson
device that can obtain effects similar to those described
above.
[0014] Another object of the present invention is to provide a
Josephson device comprising a substrate having a surface; a first
superconducting electrode layer formed on the surface of the
substrate; an insulator formed on the first superconducting
electrode layer and having a penetration hole penetrating the
insulator layer in a direction taken along a thickness of the
insulator layer; a barrier layer deposited on the first
superconducting electrode layer and within the penetration hole;
and a second superconducting electrode layer filling the
penetration hole and covering the barrier layer and the insulator
layer, wherein the first and second superconducting electrode
layers are made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca; and the barrier layer is made of a material that
includes the element RE, the element AE, Cu and oxygen, where in
cations within the material forming the barrier layer, a Cu content
is in a range of 35 At. % to 55 At. % and an RE content is in a
range of 12 At. % to 30 At. %, and the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers. According to the present
invention, it is possible to realize a stacked type Josephson
device that can obtain effects similar to those described
above.
[0015] Still another object of the present invention is to provide
a method of forming a Josephson device comprising the steps of (a)
forming on a substrate a first superconducting electrode layer made
of an oxide superconductor material; (b) forming an insulator layer
covering the first superconducting electrode layer; (c) removing a
portion of the insulator layer to expose the first superconducting
electrode layer; (d) depositing a barrier layer made of an oxide
material on an exposed surface of the first superconducting
electrode layer; and (e) forming a second superconducting electrode
layer made of an oxide superconductor material to cover the barrier
layer, wherein the oxide material forming the barrier layer
includes an element RE, an element AE, Cu and oxygen, where the
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and the
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca. According to the present invention, because the
barrier layer is a deposited layer, the layer quality of the
barrier layer becomes satisfactory compared to that of the barrier
layer of the conventional IEJ, and the IcRn product is improved. It
is possible to avoid damages within the crystals and to suppress
the current leak, even if the Cu content of the barrier layer is
high such that the current leak would otherwise be generated
between the first and second superconductor electrode layers of the
Josephson device using the conventional IEJ.
[0016] A further object of the present invention is to provide a
superconductor circuit using magnetic flux quantum as signal
carrier, comprising at least one Josephson device comprising a
first superconducting electrode layer, a barrier layer and a second
superconducting electrode layer that are successively stacked,
wherein the first and second superconducting electrode layers are
made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as a main component, where an
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca; and the barrier layer is made of a material that
includes the element RE, the element AE, Cu and oxygen, where in
cations within the material forming the barrier layer, a Cu content
is in a range of 35 At. % to 55 At. % and an RE content is in a
range of 12 At. % to 30 At. %, and the barrier layer has a
composition different from compositions of the first and second
superconducting electrode layers. According to the present
invention, it is possible to realize a superconductor circuit
having the Josephson device that can obtain effects similar to
those described above.
[0017] Other objects and further features of the present invention
will be apparent from the following detailed description when read
in conjunction with the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0018] FIGS. 1A and 1B are cross sectional views showing examples
of conventional Josephson devices;
[0019] FIG. 2 is a cross sectional view showing a Josephson device
in a first embodiment of the present invention;
[0020] FIG. 3 is a diagram showing a composition range of a barrier
layer;
[0021] FIGS. 4A through 4E are cross sectional views for explaining
the processes of forming the Josephson device in the first
embodiment;
[0022] FIG. 5 is a cross sectional view showing a Josephson device
in a modification of the first embodiment;
[0023] FIGS. 6A and 6B are diagrams showing a current versus
voltage characteristic of the Josephson device for embodiment
samples and comparison samples;
[0024] FIG. 7 is a cross sectional view, on an enlarged scale,
showing a superconducting junction for explaining a composition
analysis method for use in a vicinity of the barrier layer.
[0025] FIG. 8 is a diagram showing a Cu content distribution of the
superconducting junction for each of embodiment samples Emb1-1 and
comparison samples Cmp1-1.
[0026] FIG. 9 is a diagram showing a relationship between a
critical current and a barrier layer thickness for embodiment
samples Emb3 at 4.2K;
[0027] FIG. 10 is a diagram showing a relationship between the IcRn
product and the temperature for each of embodiment samples Emb3 and
comparison samples Cmp3;
[0028] FIG. 11 is a diagram showing an La element distribution of
the superconducting junction for embodiment samples Emb4;
[0029] FIG. 12 is a cross sectional view showing a Josephson device
in a second embodiment according to the present invention;
[0030] FIG. 13 is a cross sectional view showing a superconductor
circuit in a third embodiment of the present invention; and
[0031] FIG. 14 is a circuit diagram showing an equivalent circuit
of the superconductor circuit shown in FIG. 13.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0032] As a result of devoted research, the present inventors have
found that it is possible to realize a Josephson device having
satisfactory junction characteristics, such as an improved IcRn
product, by forming first and second superconducting electrode
layers from an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as the main component, and
forming at a superconducting junction between the first and second
superconducting electrode layers a barrier layer made from an oxide
material having a predetermined composition range. The element RE
is at least one element selected from a group consisting of Y, La,
Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and the element AE
is at least one element selected from a group consisting of Ba, Sr
and Ca.
[0033] The barrier layer of the Josephson device according to the
present invention is a deposited layer that includes the element
RE, the element AE, Cu and oxygen. In addition, in the cations
within the oxide material forming the barrier layer, the Cu content
is set in a range of 35 atomic percent (At. %) to 55 At. % and the
RE content is set in a range of 12 At. % to 30 At. %, and further,
the composition of the barrier layer is different from the
compositions of the first and second superconducting electrode
layers. By using this barrier layer, the present inventors have
found through experimentation that the IcRn product is improved by
30% or more compared to the IcRn product of the conventional
Josephson device having the Interface-Engineered Junction (IEJ). It
may be regarded that the functions achieved by the present
invention are due to the following.
[0034] That is, if an oxide superconductor material is used for the
Josephson device, the IcRn product is theoretically 10 mV or
higher. However, in the Josephson device having the IEJ, the IcRn
product that is actually obtained is not as high as 10 mV. For
example, in the case of a barrier layer that is made from a
YBa.sub.2Cu.sub.3O.sub.y (YBCO) (Y:Ba:Cu=17:33:50) oxide
superconductor material and is formed by bombardment of Ar ions, J.
G. Wen et al., "Atomic structure and composition of the barrier in
the modified interface high-Tc Josephson junction studied by
transmission electron microscopy", Appl. Phys. Lett., Vol. 75, No.
16, 18 Oct. 1999, pp. 2470-2472 reported that the composition ratio
becomes Y:Ba:Cu=43:30:27, S. Adachi et al., "Structure and
Formation Mechanism of Interface-Modified Layer in Ramp-Edge
Josephson Junctions With La-Doped 123-Type Superconducting
Electrodes", IEEE Trans. Appl. Supercond., Vol. 13, No. 2, June
2003, pp. 877-880 reported that the composition ratio becomes
(Y+Yb):(Ba+La):Cu=20:(38+10):32, and both J. G. Wen et al. and S.
Adachi et al. reported a considerable decrease in the Cu content.
Moreover, both J. G. Wen et al. and S. Adachi et al. reported the
IcRn product to be approximately 2 mV which is not sufficiently
high.
[0035] The barrier layer of the IEJ has a crystal phase having the
Perovskite structure. The Perovskite structure is represented by a
chemical formula ABO.sub.3, and the A ion and the B ion are
surrounded by 12 and 6 oxygens, respectively. The cation (positive
ion) having the relatively large ion radius occupies the site of
the A ion (that is, the A site), and the cation having the
relatively small ion radius occupies the site of the B ion (that
is, the B site). In the case of the composition ratio
Y:Ba:Cu=30:43:27 reported in J. G. Wen et al., the Ba ions occupy
the A site and the Cu ions occupy the B site. The Y ions must be
distributed approximately evenly to the A site and the B site. But
because it is extremely difficult for the Y ions to occupy the B
site, there is a possibility that the unstable Y will precipitate
in the form of Y.sub.2O.sub.3. The precipitation of Y.sub.2O.sub.3
has actually been confirmed in a vicinity of the interface for the
Josephson device having poor junction characteristics. In addition,
in the case of the composition in which there is considerable lack
of Cu atoms in the barrier layer, the diffusion of the Cu atoms
occurs in the vicinity of the interface of the barrier layer when
depositing the second (or upper) superconducting electrode layer,
to thereby deteriorate the superconductivity in the vicinity of the
junction interface. It may be regarded that the decrease in the
superconductive transition temperature of the superconducting
junction and the decrease in the IcRn product are caused by the
factors described above.
[0036] On the other hand, the barrier layer of the Josephson device
according to the present invention is a deposited layer that
includes the element RE, the element AE, Cu and oxygen, as
described above. In addition, in the cations within the oxide
material forming the barrier layer, the Cu content is set in a
range of 35 At. % to 55 At. % and the RE content is set in a range
of 12 At. % to 30 At. %. For this reason, it is possible to avoid
excessive Y ions (ions of the element RE) and the extreme lack of
Cu ions that were encountered in the case of the barrier layer of
the IEJ, and it may be regarded that the IcRn product of the
Josephson device according to the present invention is increased
thereby.
[0037] Embodiments of the present invention will now be described
with reference to FIG. 2 and the subsequent drawings.
First Embodiment
[0038] FIG. 2 is a cross sectional view showing a Josephson device
in a first embodiment of the present invention.
[0039] A Josephson device 10 of the first embodiment shown in FIG.
2 has the ramp-edge structure. The Josephson device 10 has a
substrate 11, a lower electrode layer 12 formed on the substrate
11, an insulator layer 13 covering the lower electrode layer 12, a
barrier layer 14, and an upper electrode layer 15 covering the
barrier layer, 14. The barrier layer 14 covers a surface of the
substrate 11, a sloping surface formed at one end of each of the
lower electrode layer 12 and the insulator layer 13, and a surface
of the insulator layer 13. A superconducting junction 16 is formed
by the lower electrode layer 12, the barrier layer 14 and the upper
electrode layer 15.
[0040] The substrate 11 is made of a material having a crystal
structure that allows epitaxial growth of the lower electrode layer
12 on the substrate 11. For example, the substrate 11 may be made
of a material selected from a group consisting of MgO, yttrium
stabilized zirconia (YSZ), SrTiO.sub.3,
(LaAlO.sub.3).sub.0.3-(SrAl.sub.0.5Ta.sub.0.5O.sub.3).sub.0.7
(LSAT), LaAlO.sub.3 and SrTiO3.
[0041] A buffer layer (not shown) may be provided on the substrate
11. When providing this buffer layer, the buffer layer is made of a
material having a crystal structure that allows epitaxial growth of
the lower electrode layer 12 on the buffer layer. For example, this
buffer layer may be made of a material selected from a group
consisting of SrTiO.sub.3, CeO.sub.2 and BaZrO.sub.3.
[0042] The lower electrode layer 12 and the upper electrode layer
15 are made of an oxide superconductor material having
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y as the main component. The
element RE is at least one element selected from a group consisting
of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and the
element AE is at least one element selected from a group consisting
of Ba, Sr and Ca. The main component
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y has the Perovskite structure as
its basic structure. (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y indicates
that the molar ratio of the element RE, the element AE, Cu and O is
1:2:3:y. The main component (RE).sub.1(AE).sub.2Cu.sub.3O.sub.y
means that, although the molar ratio 1:2:3:y is most preferable, a
slight deviation in the compositions may occur due to the
controllability of the planar surfaces of the upper and lower
electrode layers 15 and 12, the improvement in the superconducting
critical current value and the like.
[0043] For example, suitable superconductor materials that may be
used for the upper and lower electrodes 15 and 12 are YBaCuO-based
alloys such as YBa.sub.2Cu.sub.3O.sub.y (YBCO),
SmBa.sub.2Cu.sub.3O.sub.y (SBCO) and YbBa.sub.2Cu.sub.3O.sub.y
(YbBCO).
[0044] The insulator layer 13 is made of an insulator material
having the Perovskite structure as its basic structure that allows
epitaxial growth of the insulator layer 13 on the lower electrode
layer 12 and also allows epitaxial growth of the upper electrode
layer 15 on the insulator layer 13. For example, the insulator
layer 13 is preferably made of a material selected from a group
consisting of SrSnO.sub.3, SrTiO.sub.3 and PrGaO.sub.3.
[0045] The barrier layer 14 is a deposited layer that includes the
element RE, the element AE, Cu and oxygen. In the barrier layer 14,
the element RE is at least one element selected from a group
consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu,
and the element AE is at least one element selected from a group
consisting of Ba, Sr and Ca. In addition, in the cations within the
oxide material forming the barrier layer 14, the Cu content is set
in a range of 35 At. % to 55 At. % and the RE content is set in a
range of 12 At. % to 30 At. %, and further, the composition of the
barrier layer 14 is different from the compositions of the upper
and lower electrode layers 15 and 12. Because the barrier layer 14
has this composition and is a deposited layer, a satisfactory
superconducting junction 16 is formed, and it is possible to
improve the IcRn product of the Josephson device 10.
[0046] FIG. 3 is a diagram showing a composition range of the
barrier layer 14, and shows the 3-element composition of only the
cations of RE, AE and Cu. In FIG. 3, when a normal to one side is
drawn from a point indicating the composition, the length of this
normal becomes proportional to the content of the element at the
vertex confronting this one side. For example, the composition at a
point A in FIG. 3 includes an RE content of 12 At. %, an AE content
of 33 At. % and a Cu content of 55 At. %. The scale in FIG. 3
indicates the At. %.
[0047] In the cations within the oxide material forming the barrier
layer 14 shown in FIG. 2, the Cu content is set in a range of 35
At. % to 55 At. % and the RE content is set in a range of 12 At. %
to 30 At. % as shown in FIG. 3. This composition range of the oxide
material forming the barrier layer 14 falls within a hatched region
in FIG. 3 that is surrounded by connecting the points A, B, C and D
by straight lines in this order. In FIG. 3, a point M indicates the
composition of the cation of the superconductor material
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y that is the main component of
the superconductor material forming the upper and lower electrode
layers 15 and 12.
[0048] If the Cu content of the oxide material forming the barrier
layer 14 becomes less than 35 At. %, the IcRn product of the
Josephson device 10 decreases. On the other hand, if the Cu content
of the oxide material forming the barrier layer 14 exceeds 55 At.
%, the Josephson device 10 displays a Flux Flow (FF) type current
versus voltage characteristic that is not preferable. A description
on the FF type current versus voltage characteristic will be given
later in the specification.
[0049] In addition, if the RE content of the oxide material forming
the barrier layer 14 becomes less than 12 At. %, the lack of the
element RE occurs to thereby make it difficult to maintain the
Perovskite structure, and a transition is made to another phase in
which the junction displays a resistor type characteristic. On the
other hand, if the RE content of the oxide material forming the
barrier layer 14 exceeds 30 At. %, the excessive RE atoms
precipitates in the form of RE.sub.2O.sub.3 or the like to thereby
deteriorate the junction characteristics, and causes a decrease in
the IcRn product, for example.
[0050] Furthermore, the composition of the barrier layer 14 is made
different from the compositions of the upper and lower electrode
layers 15 and 12, so that the junction interface is formed and the
barrier layer 14 functions as a barrier. Preferably, the Cu content
and the RE content of the barrier layer 14 respectively differ from
those of the upper and lower electrode layers 15 and 12 by 3 At. %
or more, so that the formation of a stable barrier layer 14 becomes
possible.
[0051] Preferably, the thickness of the barrier layer 14 is set in
a range of 0.5 nm to 6 nm. If the thickness of the barrier layer 14
becomes less than 0.5 nm, the Josephson device 10 may begin to
display the FF type current versus voltage characteristic. On the
other hand, if the thickness of the barrier layer 14 exceeds 6 nm,
the IcRn product may decrease to 2 mV or less, for example. Since
the barrier layer 14 is extremely thin, the composition analysis of
the barrier layer 14 is made by an Energy Dispersive X-ray
spectroscopy (EDX) by irradiating an electron beam from a
transmission electron microscope on the barrier layer 14 by setting
the electron beam diameter to 1 nm or less, as will be described
later in the specification.
[0052] Therefore, because the Josephson device 10 in the first
embodiment has the barrier layer 14 that is formed by the deposited
layer made of the oxide material, it is possible to form a
satisfactory superconducting junction 16 by avoiding the problem of
the conventional IEJ, namely, the problem in that the Cu content of
the barrier layer becomes extremely small in the conventional IEJ.
As a result, it is possible to improve the IcRn product of the
Josephson device 10. In addition, it is possible to suppress the
inconsistency in the critical current value Ic of the Josephson
device 10. Moreover, the critical temperature of the
superconducting junction 16 of the Josephson device 10 becomes
higher than that of the conventional IEJ. As a result, it is
possible to reduce the cooling cost of the Josephson device 10.
[0053] Next, a description will be given of a method of forming the
Josephson device in the first embodiment.
[0054] FIGS. 4A through 4E are cross sectional views for explaining
the processes (or steps) of forming the Josephson device in the
first embodiment.
[0055] First, in the process shown in FIG. 4A, the lower electrode
layer 12 and the insulator layer 13 are successively formed on the
substrate 11 using the materials described above. The lower
electrode layer 12 and the insulator layer 13 may be formed by
vacuum deposition, sputtering, Pulsed Laser Deposition (PLD) or,
Chemical Vapor Deposition (CVD). Such methods of forming the lower
electrode layer 12 and the insulator layer 13 may also be used when
forming the upper electrode layer 15 and a buffer layer 31 of a
Josephson device 30 shown in FIG. 12 which will be described later.
The substrate temperature differs depending on the materials that
are used, but may be set in a range of 300.degree. C. to
800.degree. C., for example.
[0056] Next, in the process shown in FIG. 4B, a resist layer 21 is
formed on the insulator layer 13, and the resist layer 21 is
patterned to form an opening at the position where the ramp-edge is
to be formed. Then, a reflow process is carried out with respect to
the resist layer 21, and a sloping surface is formed by a side edge
surface of the resist layer 21.
[0057] Thereafter, in the process shown in FIG. 4C, the resist
layer 21 is used as a mask, and an etching process is carried out
with respect to the insulator layer 13 and the lower electrode
layer 12 by Ar ion irradiation. The Ar ion irradiation is made by
rotating the substrate 11, while maintaining an incident direction
of the Ar ion irradiation to be inclined by 30.degree., for
example, with respect to the surface of the substrate 11 (that is,
the substrate surface). As a result, a sloping surface is formed by
the side edge surfaces of the resist layer 21, the insulator layer
13 and the lower electrode layer 12, and the resist layer 21 is
thereafter removed.
[0058] Next, in the process shown in FIG. 4D, the barrier layer 14
is formed on the sloping surface portion of the lower electrode
layer 12, the (top) surface and the sloping surface portion of the
insulator layer 13, and the exposed surface of the substrate 11.
The barrier layer 14 may be deposited by vacuum deposition,
sputtering, PLD or, CVD including Metal Organic CVD (MOCVD), using
an oxide material.
[0059] When using the vacuum deposition, sputtering or PLD in the
deposition process of the barrier layer 14, the oxide material used
for the evaporation source or the target includes the element RE,
the element AE, Cu and oxygen, where the element RE is at least one
element selected from a group consisting of Y, La, Pr, Nd, Sm, Eu,
Gd, Dy, Ho, Er, Tm, Yb and Lu, and the element AE is at least one
element selected from a group consisting of Ba, Sr and Ca. An
example of such an oxide target material is
(RE).sub.1(AE).sub.2Cu.sub.3O.sub.y, including
YBa.sub.2Cu.sub.3O.sub.y and
Yb.sub.0.9La.sub.0.2Ba.sub.1.9Cu.sub.3O.sub.y.
[0060] In addition, from the point of view of achieving
satisfactory epitaxial growth of the barrier layer 14, it is
preferable to set the substrate temperature at the time of
depositing the barrier layer 14 in a range of 620.degree. C. to
760.degree. C. An inert gas, such as Ar gas and Ne gas, may be used
for the gas atmosphere within a deposition chamber, and it is
possible to further mix oxygen gas to such inert gases or, to sole
use oxygen gas. Moreover, the pressure within the deposition
chamber may be set in a range of 10 mTorr to 400 mTorr, for
example. Preferably, the surfaces of the structure shown in FIG. 4C
after removal of the resist layer 21, particularly the sloping
surface of the lower electrode layer 12, are cleaned by exposure to
oxygen plasma prior to forming the barrier layer 14.
[0061] When depositing the barrier layer 14 by PLD, it is
preferable to set the laser irradiation energy in a range of 100
mJ/cm.sup.2 to 600 mJ/cm.sup.2, the pressure of the oxygen gas that
is used as the gas atmosphere within the deposition chamber in a
range of 10 mTorr to 200 mTorr, the substrate temperature in a
range of 620.degree. C. to 740.degree. C., and the distance between
the substrate 11 and the target (that is, the substrate-target
distance) in a range of 40 mm to 100 mm. The barrier layer 14 can
be formed to have the same composition as the target, but the
composition of the barrier layer 14 may be changed by controlling
the laser irradiation energy, the substrate-target distance or, the
pressure within the deposition chamber. Such a control allows the
Cu content to be set in a range of 35 At. % to 55 At. % and the AE
content to be set in a range of 12 At. % to 30 At. % in the cations
within the oxide material forming the barrier layer 14.
[0062] In the case of the barrier layer 14 made of the YBaCuO-based
alloy, the Y content may be set in a range of 12 At. % to 30 At. %
in the cations within the oxide material forming the barrier layer
14. In order to increase the Cu content of the barrier layer 14,
for example, the substrate-target distance is decreased and the
pressure within the deposition chamber is increased. In addition,
in order to increase the Y content of the barrier layer 14, for
example, the laser irradiation energy is increased and the
substrate-target distance is increased.
[0063] The barrier layer 14 should cover the entire sloping surface
portion of the lower electrode layer 12 to an extent such that the
lower electrode layer 12 and the upper electrode layer 15 will not
make direct contact with each other.
[0064] Next, in the process shown in FIG. 4E, the upper electrode
layer 15 is formed to cover the surface of the barrier layer 14.
The upper electrode layer 15 may be formed similarly to the lower
electrode layer 12. The Josephson device 10 of this first
embodiment having the superconducting junction 16 is formed by the
above described processes. Of course, a protection layer made of
Au, for example, may be formed on the upper electrode layer 15.
[0065] According to the method of forming the Josephson device in
this first embodiment, the layer quality of the upper and lower
electrode layers 15 and 12 in the vicinity of the barrier layer 14
becomes satisfactory and the IcRn product improves compared to
those of the Josephson device having the barrier layer of the
conventional IEJ, because the barrier layer 14 is formed by the
deposition process. It is possible to avoid damages within the
crystals and to suppress the current leak, even if the Cu content
of the barrier layer 14 is high such that the current leak would
otherwise be generated between the upper and lower electrode layers
of the Josephson device using the conventional IEJ.
[0066] FIG. 5 is a cross sectional view showing a Josephson device
in a modification of the first embodiment. In FIG. 5, those parts
that are the same as those corresponding parts in FIGS. 2 and 4A
through 4E will be designated by the same reference numerals, and a
description thereof will be omitted.
[0067] As shown in FIG. 5, a Josephson device 20 in this
modification of the first embodiment has a substrate 11, a ground
plane layer 21 formed on the substrate 11, a first insulator layer
22 formed on the ground plane layer 21, a lower electrode layer 12
covering the first insulator layer 22 and also filling a
penetration hole 23 penetrating the ground plane layer 21 and the
first insulator layer 22, a second insulator layer 13 covering the
lower electrode layer 12, a barrier layer 14, an upper electrode
layer 15 covering the barrier layer 14, and a protection layer 24
covering the upper electrode layer 15. The barrier layer 14 covers
a surface of the first insulating layer 22, a sloping surface
formed at one end of each of the lower electrode layer 12 and the
second insulator layer 13, and a surface of the second insulator
layer 13. A superconducting junction 16 is formed by the lower
electrode layer 12, the barrier layer 14 and the upper electrode
layer 15.
[0068] The ground plane layer 21 may be made of a superconductor
material similar to those used for the upper and lower electrode
layers 15 and 12 shown in FIG. 2 or, may be made of a suitable
material selected from other known oxide superconductor
materials.
[0069] The first and second insulator layers 21 and 13 may be made
of a material similar to that used for the insulator layer 13 shown
in FIG. 2. The ground plane layer 21 has a function of blocking
noise such as external electromagnetic waves in its superconducting
state, and preventing an erroneous operation of the superconducting
junction 16.
[0070] Other than the provision of the ground plane layer 21, the
Josephson device 20 in this modification of the first embodiment is
similar to the Josephson device 10 in the first embodiment shown in
FIG. 2, and effects similar to those obtainable in the Josephson
device 10 can also be obtained in the Josephson device 20.
[0071] Next, a description will be given of embodiment samples in
accordance with this first embodiment, in comparison with
comparison samples.
Embodiment Sample Emb1-1
[0072] Embodiment samples Emb1-1 were formed to have the same
structure as the Josephson device 10 shown in FIG. 2 including the
barrier layer 14 formed by the ramp-edge type deposition layer.
[0073] First, a YBa.sub.2Cu.sub.3O.sub.y layer was formed, as a
lower electrode layer, on a MgO substrate to a thickness of 200 nm
by magnetron sputtering using a YBa.sub.2Cu.sub.3O.sub.y target, at
a substrate temperature of 740.degree. C., an Ar+10 Vol. % O.sub.2
atmosphere, and a pressure of 80 mTorr, where Vol. % denotes volume
percent. Then, a SrSnO.sub.3 layer was formed, as an insulator
layer, on the lower electrode layer to a thickness of 250 nm by
magnetron sputtering using a SrSnO.sub.3 target, at a substrate
temperature of 680.degree. C., an Ar+50 Vol. % O.sub.2 atmosphere,
and a pressure of 50 mTorr.
[0074] Thereafter, the lower electrode layer and the insulator were
etched by Ar ions using as a mask a resist layer having an opening
formed by photolithography in a region where a superconducting
junction is to be formed, so as to form a sloping surface by the
lower electrode layer and the insulator layer. After removing the
resist layer, surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower
electrode layer and the SrSnO.sub.3 insulator layer were cleaned by
oxygen plasma.
[0075] Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the insulator layer to a
thickness of 1 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, a laser
irradiation energy of 450 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 50 mTorr, and a substrate-target distance of 70 mm.
[0076] Next, a Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y layer
was formed, as an upper electrode, on the barrier layer to a
thickness of 200 nm by magnetron sputtering using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, a substrate
temperature of 660.degree. C., an oxygen atmosphere, and a pressure
of 200 mTorr. Thereafter, a metal electrode was formed on the upper
electrode layer by evaporation, and 16 Josephson devices were
formed by a patterning process.
[0077] The current versus voltage characteristic of the 16
Josephson devices formed in this manner were measured at 4.2K.
[0078] FIGS. 6A and 6B are diagrams showing a current versus
voltage characteristic of the Josephson device for the embodiment
samples Emb1-1 and comparison samples Cmp1-1, respectively. In
FIGS. 6A and 6B, the ordinate indicates the current represented by
0.5 mA/scale, and the abscissa indicates the voltage represented by
1.0 mV/scale.
[0079] In the case of the embodiment samples Emb1-1, all 16
Josephson devices displayed a Resistivity Shunted Junction (RSJ)
type current versus voltage characteristic. According to the RSJ
type current versus voltage characteristic, a zero voltage state is
obtained in a predetermined range even when a current is applied
across the upper and lower electrode layers, and a superconducting
current flows through the superconducting junction. When the
current applied across the upper and lower electrode layers exceeds
a predetermined value, a transition to a finite voltage state
occurs discontinuously. A logic device can be formed by utilizing
the switching between these states in the case of the Josephson
device displaying the RSJ type current versus voltage
characteristic, and such a characteristic is essential in logic
circuits. FIG. 6A shows one example of the current versus voltage
characteristic of the embodiment samples Emb1-1.
[0080] In addition, in the case of the embodiment samples Emb1-1,
the IcRn product at 4.2K was 3.0 mV to 4.0 mV, the average value of
the critical current value Ic was 0.8 mA, and an excessive current
component .DELTA.I was 10% to 30% of the critical current value Ic.
The excessive current component .DELTA.I is the current value that
is obtained by linearly extrapolating the curve in the finite
voltage state shown in FIG. 6A to a zero voltage.
[0081] Furthermore, samples for analysis by a transmission electron
microscope were made so that a cross section of the embodiment
sample Emb1-1 is exposed. A composition analysis of the barrier
layer was made using the transmission electron microscope and an
EDX apparatus by setting the electron beam diameter to 1 nm. As a
result of this composition analysis of the barrier layer, it was
found that the Y content is 21 At. %, the Ba content is 33 At. %,
the La content is 5 At. % and the Cu content is 41 At. % in the
cations forming the barrier layer. A field emission type
transmission electron microscope JEM-2010F (acceleration voltage of
200 kV) manufactured by JEOL Ltd. was used for the transmission
electron microscope, and a Si (Li) semiconductor detector UTW
manufactured by Thermo Fisher Scientific K.K. was used for the EDX
apparatus. The composition analysis was made with respect to a
region having a diameter of 1 nm. The composition analysis with
respect to the embodiment and comparison samples described
hereunder were also made using the same transmission electron
microscope and EDX apparatus.
Comparison Sample Cmp1-1
[0082] Comparison samples Cmp1-1 were formed using targets having
the same compositions as those used when forming the embodiment
samples Emb1-1, except for the barrier layer, so as to obtain
Josephson devices including a ramp-edge type IEJ.
[0083] First, a lower electrode layer and an insulator layer were
formed on a substrate, and a sloping surface was formed on the
lower electrode layer and the insulator layer, similarly to the
embodiment samples Emb1-1.
[0084] Then, surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower
electrode layer and the SrSnO.sub.3 insulator layer were cleaned by
oxygen plasma. In addition, Ar ions were irradiated for 3 minutes
at an acceleration voltage of 500 V, so as to form a barrier layer
on the sloping surface of the lower electrode layer.
[0085] Thereafter, an upper electrode layer and a metal layer were
formed, and a patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 16 Josephson devices. When
the current versus voltage characteristic of the 16 Josephson
devices formed in this manner were measured at 4.2K, all 16
Josephson devices displayed an RSJ type current versus voltage
characteristic such as that shown in FIG. 6B.
[0086] In addition, in the case of the comparison samples Cmp1-1,
the IcRn product at 4.2K was 2.0 mV to 2.5 mV, the average value of
the critical current value Ic was 0.6 mA, and an excessive current
component .DELTA.I was 10% to 30% of the critical current value
Ic.
[0087] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-1 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found that the Y content is 19 At.
%, the Ba content is 39 At. %, the La content is 12 At. % and the
Cu content is 30 At. % in the cations forming the barrier
layer.
[0088] When the embodiment samples Emb1-1 and the comparison
samples Cmp1-1 are compared, it may be seen that the IcRn product
of the embodiment samples Emb1-1 is larger than that of the
comparison samples Cmp1-1 by 30% or more. It may be regarded that
the improved IcRn product of the embodiment samples Emb1-1 is due
to the increased Cu content (cation ratio) of the barrier layer,
since the Cu content of the barrier layer of the embodiment samples
Emb1-1 is 11 At. % larger than that of the comparison samples
Cmp1-1.
[0089] FIG. 7 is a cross sectional view, on an enlarged scale,
showing a superconducting junction for explaining a composition
analysis method for use in a vicinity of the barrier layer.
[0090] The composition analysis of the superconducting junction
that is formed by the lower electrode, the barrier layer and the
upper electrode layer of the comparison samples Cmp1-1 was made by
irradiating an electron beam having a beam diameter of 1 nm
perpendicularly to the cross section of the superconducting
junction, similarly to the composition analysis made with respect
to the embodiment samples Emb1-1, and analyzing the composition
from the characteristic X-ray energy and intensity resulting from
this electron beam irradiation. In FIG. 7, a beam position C
indicates a center of the barrier layer along a direction in which
the thickness of the barrier layer is taken, and beam positions D
and E are positions deviated from the beam position C by 1.5 nm and
3.0 nm in a direction perpendicular to the surface of the barrier
layer towards the lower electrode, respectively. In addition, beam
positions B and A are positions deviated from the beam position C
by 1.5 nm and 3.0 nm in the direction perpendicular to the surface
of the barrier layer towards the upper electrode layer,
respectively.
[0091] FIG. 8 is a diagram showing a Cu content distribution of the
superconducting junction for each of the embodiment samples Emb1-1
and the comparison samples Cmp1-1. In FIG. 8, the abscissa
indicates the position from the center of the barrier layer, where
a positive (+) side indicates the lower electrode layer and a
negative (-) side indicates the upper electrode layer. The
positions -3.0 nm, -1.5 nm, 0 nm, 1.5 nm and 3.0 nm from the center
of the barrier layer in the direction perpendicular to the surface
of the barrier layer correspond to the beam positions A, B, C, D
and E shown in FIG. 7.
[0092] As may be seen from FIG. 8, a region where the Cu content of
the barrier layer is lower than the electrode layer composition
exists in a range of approximately -3.0 nm to approximately +3.0 nm
for the comparison samples Cmp1-1. On the other hand, when the same
composition analysis was made with respect to the embodiment
samples Emb1-1, the Cu content of the barrier layer was lower than
that of the electrode layer composition having a Cu content of 47.5
At. % at only the position 0 nm from the center of the barrier
layer, and the Cu content of the barrier layer was approximately
the same as that of the electrode layer composition at the
positions .+-.1.5 nm and .+-.3.0 from the center of the barrier
layer. It may be regarded that the IcRn product of the embodiment
samples Emb1-1 is improved because the barrier layer of the
embodiment samples Emb1-1 is extremely thin compared to that of the
comparison samples Cmp1-1 and the Cu deficiency of the barrier
layer virtually does not occur at the interfaces between the lower
electrode layer and the barrier layer and between the barrier layer
and the upper electrode layer. These effects are obtained by the
embodiment samples Emb1-1 because the barrier layer thereof is a
deposited layer.
Embodiment Sample Emb1-2
[0093] Embodiment samples Emb1-2 were formed using targets having
the same compositions as those used when forming the embodiment
samples Emb1-1, except for the barrier layer and the upper
electrode layer, so as to obtain Josephson devices including a
ramp-edge type barrier layer that is a deposited layer.
[0094] The barrier layer was formed on the substrate, the sloping
surface portion of the lower electrode layer, and the sloping
surface portion and the surface of the insulator layer to a
thickness of 1.5 nm by PLD, using a YBa.sub.2Cu.sub.3O.sub.y
target, at a laser irradiation energy of 450 mJ/cm.sup.2, an oxygen
atmosphere, a pressure of 50 mTorr, and a substrate-target distance
of 80 mm.
[0095] In addition, the upper electrode layer was formed on the
barrier layer to a thickness of 200 nm by magnetron sputtering,
using a YBa.sub.2Cu.sub.3O.sub.y target, at a substrate temperature
of 660.degree. C., an oxygen atmosphere, and a pressure of 200
mTorr.
[0096] By carrying out a patterning process, 16 Josephson devices
were formed. In the case of the embodiment samples Emb1-2, all 16
Josephson devices displayed an RSJ type current versus voltage
characteristic.
[0097] In addition, in the case of the embodiment samples Emb1-2,
the IcRn product at 4.2K was 2.5 mV to 3.5 mV, the average value of
the critical current value Ic was 0.6 mA, and an excessive current
component .DELTA.I was 10% to 30% of the critical current value
Ic.
[0098] Furthermore, as a result of the composition analysis of the
barrier layer, it was found that the Y content is 32 At. %, the Ba
content is 33 At. % and the Cu content is 35 At. % in the cations
forming the barrier layer.
Comparison Sample Cmp1-2
[0099] Comparison samples Cmp1-2 having the same structure as the
comparison samples Cmp1-1 were formed using targets having the same
compositions as those used when forming the embodiment samples
Emb1-1, except for the barrier layer, so as to obtain Josephson
devices including a ramp-edge type IEJ.
[0100] First, a lower electrode layer and an insulator layer were
formed on a substrate, and a sloping surface was formed on the
lower electrode layer and the insulator layer, similarly to the
embodiment samples Emb1-1.
[0101] Then, surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower
electrode layer and the SrSnO.sub.3 insulator layer were cleaned by
oxygen plasma. In addition, Ar ions were irradiated for 3 minutes
at an acceleration voltage of 500 V, so as to form a barrier layer
on the sloping surface of the lower electrode layer.
[0102] Thereafter, an upper electrode layer and a metal layer were
formed, and a patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 10 Josephson devices. When
the current versus voltage characteristic of the 10 Josephson
devices formed in this manner were measured at 4.2K, 8 Josephson
devices displayed an FF type current versus voltage characteristic.
In the FF type current versus voltage characteristic, the voltage
makes a transition from the zero voltage state to the finite
voltage state in an approximately continuous manner, and for this
reason, a sufficient switching characteristic cannot be obtained
thereby making the device unsuited for the logic device. On the
other hand, 2 Josephson devices displayed an RSJ type current
versus voltage characteristic, but the excessive current component
.DELTA.I was extremely large compared to that of the embodiment
samples Emb1-1.
[0103] In addition, in the case of the comparison samples Cmp1-2,
calculation of the IcRn product at 4.2K was not possible because
the resistance value Rn could not be derived. Moreover, the average
value of the critical current value Ic was approximately 8 mA, and
the excessive current component .DELTA.I was 98% of the critical
current value Ic.
[0104] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-2 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found that the Y content is 29 At.
%, the Ba content is 36 At. % and the Cu content is 35 At. % in the
cations forming the barrier layer.
[0105] When the embodiment samples Emb1-2 and the comparison
samples Cmp1-2 are compared, it may be seen that the Cu content is
35 At. % in the cations forming the barrier layer for each of the
embodiment samples Emb1-2 and the comparison samples Cmp1-2, but
the device characteristic of the Josephson devices according to the
comparison samples Cmp1-2 were extremely poor compared to that of
the Josephson devices according to the embodiment samples Emb1-2.
It may be regarded that this is because the barrier layer of the
embodiment samples Emb1-2 is a deposited layer, and a
superconducting junction similar to that of the embodiment samples
Emb1-1 is formed.
Comparison Sample Cmp1-3
[0106] Comparison samples Cmp1-3 having the same structure as the
embodiment samples Emb1-1 were formed using targets having the same
compositions as those used when forming the embodiment samples
Emb1-1, so as to obtain Josephson devices including a ramp-edge
type barrier layer that is a deposited layer.
[0107] The surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower electrode
layer and the SrSnO.sub.3 insulator layer were cleaned by oxygen
plasma. Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the insulator layer to a
thickness of 0.5 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a laser
irradiation energy of 600 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 150 mTorr, and a substrate-target distance of 50
mm.
[0108] A patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 16 Josephson devices. When
the current versus voltage characteristic of the 16 Josephson
devices formed in this manner were measured at 4.2K, all 16
Josephson devices displayed an FF type current versus voltage
characteristic.
[0109] In addition, in the case of the comparison samples Cmp1-3,
calculation of the IcRn product at 4.2K was not possible because
the resistance value Rn could not be derived. Moreover, the average
value of the critical current value Ic was approximately 10 mA or
larger.
[0110] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-3 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found, that the Y content is 15 At.
%, the Ba content is 26 At. % the La content is 3 At. % and the Cu
content is 56 At. % in the cations forming the barrier layer.
Comparison Sample Cmp1-4
[0111] Comparison samples Cmp1-4 having the same structure as the
embodiment samples Emb1-1 were formed using targets having the same
compositions as those used when forming the embodiment samples
Emb1-1, so as to obtain Josephson devices including a ramp-edge
type barrier layer that is a deposited layer.
[0112] The surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower electrode
layer and the SrSnO.sub.3 insulator layer were cleaned by oxygen
plasma. Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the insulator layer to a
thickness of 3 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a laser
irradiation energy of 400 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 50 mTorr, and a substrate-target distance of 90 mm.
[0113] A patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 16 Josephson devices. When
the current versus voltage characteristic of the 16 Josephson
devices formed in this manner were measured at 4.2K, all 16
Josephson devices displayed an RSJ type current versus voltage
characteristic.
[0114] In addition, in the case of the comparison samples Cmp1-4,
the IcRn product at 4.2K was 1.0 mV to 2.0 mV, the average value of
the critical current value Ic was 0.5 mA, and an excessive current
component .DELTA.I was 10% to 30% of the critical current value
Ic.
[0115] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-4 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found that the Y content is, 27 At.
%, the Ba content is 40 At. % the La content is 3 At. % and the Cu
content is 30 At. % in the cations forming the barrier layer.
Comparison Sample Cmp1-5
[0116] Comparison samples Cmp1-5 having the same structure as the
embodiment samples Emb1-1 were formed using targets having the same
compositions as those used when forming the embodiment samples
Emb1-1, so as to obtain Josephson devices including a ramp-edge
type barrier layer that is a deposited layer.
[0117] The surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower electrode
layer and the SrSnO.sub.3 insulator layer were cleaned by oxygen
plasma. Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the insulator layer to a
thickness of 5 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a laser
irradiation energy of 500 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 100 mTorr, and a substrate-target distance of 70
mm.
[0118] A patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 16 Josephson devices. When
the current versus voltage characteristic of the 16 Josephson
devices formed in this manner were measured at 4.2K, all 16
Josephson devices displayed an RSJ type current versus voltage
characteristic.
[0119] In addition, in the case of the comparison samples Cmp1-5,
the IcRn product at 4.2K was 0.4 mV to 1.0 mV, and the average
value of the critical current value Ic was 0.1 mA.
[0120] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-5 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found that the Y content is 31 At.
%, the Ba content is 40 At. % the La content is 3 At. % and the Cu
content is 60 At. % in the cations forming the barrier layer.
Comparison Sample Cmp1-6
[0121] Comparison samples Cmp1-6 having the same structure as the
embodiment samples Emb1-1 were formed using targets having the same
compositions as those used when forming the embodiment samples
Emb1-1, so as to obtain Josephson devices including a ramp-edge
type barrier layer that is a deposited layer.
[0122] The surfaces of the YBa.sub.2Cu.sub.3O.sub.y lower electrode
layer and the SrSnO.sub.3 insulator layer were cleaned by oxygen
plasma. Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the insulator layer to a
thickness of 3 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a laser
irradiation energy of 400 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 400 mTorr, and a substrate-target distance of 50
mm.
[0123] A patterning process was carried out, similarly to the
embodiment samples Emb1-1, so as to form 16 Josephson devices. When
the current versus voltage characteristic of the 16 Josephson
devices formed in this manner were measured at 4.2K, all 16
Josephson devices displayed an FF type current versus voltage
characteristic.
[0124] In addition, in the case of the comparison samples Cmp1-6,
calculation of the IcRn product at 4.2K was not possible because
the resistance value Rn could not be derived. Moreover, the average
value of the critical current value Ic was approximately 7 mA, and
the excessive current component .DELTA.I was 98% of the critical
current value Ic.
[0125] Furthermore, when a composition analysis of the barrier
layer of the comparison samples Cmp1-6 was made similarly to the
composition analysis of the barrier layer of the embodiment samples
Emb1-1 described above, it was found that the Y content is 11 At.
%, the Ba content is 33 At. % the La content is 3 At. % and the Cu
content is 53 At. % in the cations forming the barrier layer.
Embodiment Sample Emb2
[0126] Embodiment samples Emb2 were formed similarly to the
embodiment samples Emb1-1, except for the lower electrode layer,
the barrier layer and the upper electrode layer that were formed
using a SmBa.sub.2Cu.sub.3O.sub.y target, so as to obtain Josephson
devices including a ramp-edge type barrier layer that is a
deposited layer.
[0127] The lower electrode layer was formed to a thickness of 200
nm by magnetron sputtering using a SmBa.sub.2Cu.sub.3O.sub.y
target, at a substrate temperature of 780.degree. C., an Ar+10 Vol.
% O.sub.2 atmosphere, and a pressure of 100 mTorr.
[0128] The barrier layer was formed on the substrate, the sloping
surface portion of the lower electrode layer, and the sloping
surface portion and the surface of the insulator layer to a
thickness of 1 nm by PLD, using a SmBa.sub.2Cu.sub.3O.sub.y target,
at a laser irradiation energy of 500 mJ/cm.sup.2, an oxygen
atmosphere, a pressure of 50 mTorr, and a substrate-target distance
of 60 mm.
[0129] The upper electrode layer was formed to a thickness of 200
nm by magnetron sputtering using a SmBa.sub.2Cu.sub.3O.sub.y
target, at a substrate temperature of 760.degree. C., an Ar+10 Vol.
% O.sub.2 atmosphere, and a pressure of 100 mTorr.
[0130] By carrying out a patterning process, 16 Josephson devices
were formed. In the case of the embodiment samples Emb1-2, all 16
Josephson devices displayed an RSJ type current versus voltage
characteristic.
[0131] In addition, in the case of the embodiment samples Emb2, the
IcRn product at 4.2K was 3.0 mV to 3.8 mV, the average value of the
critical current value Ic was 0.9 mA, and an excessive current
component .DELTA.I was 30% of the critical current value Ic.
[0132] Furthermore, as a result of the composition analysis of the
barrier layer, it was found that the Sm content is 23 At. %, the Ba
content is 32 At. % and the Cu content is 45 At. % in the cations
forming the barrier layer.
Embodiment Sample Emb3
[0133] Embodiment samples Emb3 were formed similarly to the
embodiment samples Emb1-1, except for the lower electrode layer was
formed using a Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target,
the barrier layer was formed using a
Yb.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, the upper
electrode layer was formed using a
Yb.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, and the
thickness of the barrier layer was made different from the
thicknesses of the upper and lower electrode layers, so as to
obtain Josephson devices including a ramp-edge type barrier layer
that is a deposited layer.
[0134] The lower electrode layer was formed to a thickness of 200
nm by magnetron sputtering using the
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a substrate
temperature of 740.degree. C., an Ar+10 Vol. % O.sub.2 atmosphere,
and a pressure of 80 mTorr.
[0135] The barrier layer was formed on the substrate, the sloping
surface portion of the lower electrode layer, and the sloping
surface portion and the surface of the insulator layer to a
thickness in a range of 0.5 nm to 5 nm by PLD, using the
Yb.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a laser
irradiation energy of 450 mJ/cm.sup.2, an oxygen atmosphere, a
pressure of 70 mTorr, and a substrate-target distance of 70 mm. The
thickness of the barrier layer was determined from photographs of
the cross section in the vicinity of the superconducting junction
taken by the transmission electron microscope.
[0136] The upper electrode layer was formed to a thickness of 200
nm by magnetron sputtering using the
Yb.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a
substrate temperature of 660.degree. C., an oxygen atmosphere, and
a pressure of 200 mTorr.
[0137] FIG. 9 is a diagram showing a relationship between the
critical current and the barrier layer thickness in for the
embodiment samples Emb3 at 4.2K.
[0138] As may be seen from FIG. 9, the critical current value Ic
decreased when the thickness of the barrier layer increased. It was
thus confirmed that when the barrier layer is a deposited layer,
the critical current value Ic of the Josephson device can be
controlled by varying the thickness of the barrier layer.
[0139] In addition, in the case of the embodiment samples Emb3 with
the barrier layer thickness of 1 nm, the IcRn product at 4.2K was
2.6 mV to 3.4 mV, and an excessive current component .DELTA.I was
5% to 30% of the critical current value Ic.
[0140] Furthermore, as a result of the composition analysis of the
barrier layer, it was found that the combined content of the Y
atoms and the Yb atoms is 17 At. %, the Ba content is 27 At. %, the
La content is 4 At. % and the Cu content is 52 At. % in the cations
forming the barrier layer.
Comparison Sample Cmp3
[0141] Comparison samples Cmp3 were formed using targets having the
same compositions as those used when forming the embodiment samples
Emb3, except for the barrier layer, so as to obtain Josephson
devices including a ramp-edge type IEJ.
[0142] First, the lower electrode layer and the insulator layer
were formed on the substrate, and a sloping surface was formed on
the lower electrode layer and the insulator layer, similarly to the
embodiment samples Emb3.
[0143] Then, surfaces of the
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y lower electrode layer
and the SrSnO.sub.3 insulator layer were cleaned by oxygen plasma.
In addition, Ar ions were irradiated for 3 minutes at an
acceleration voltage of 500 V, so as to form a barrier layer on the
sloping surface of the lower electrode layer.
[0144] Thereafter, a Yb.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y
upper electrode layer and a metal layer were formed, and a
patterning process was carried out, similarly to the embodiment
samples Emb3, so as to form Josephson devices.
[0145] FIG. 10 is a diagram showing a relationship between the IcRn
product and the temperature for each of the embodiment samples Emb3
and the comparison samples Cmp3. FIG. 10 shows the relationship for
a case where the thickness of the barrier layer is 1 nm for the
embodiment samples Emb3.
[0146] As may be seen from FIG. 10, the IcRn product of the
embodiment samples Emb3 is greater than that of the comparison
samples Cmp3 at all temperatures in a range of 4.2K to 80K, and it
was confirmed that the embodiment samples Emb3 are superior
compared to the comparison samples Cmp3 having the conventional IEJ
throughout a wide temperature range. In addition, it was confirmed
that the critical temperature of the embodiment samples Emb3 is
higher than that of the comparison samples Cmp3, and that the
embodiment samples Emb3 can operate at a higher temperature than
the comparison samples Cmp3.
Embodiment Sample Emb4
[0147] Embodiment samples Emb4 were formed to have the same
structure as the Josephson device 20 shown in FIG. 5 including the
barrier layer 14 formed by the ramp-edge type deposition layer. A
YBa.sub.2Cu.sub.3O.sub.y layer was used for the ground plane layer,
and Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y layers were used
for the upper and lower electrode layers.
[0148] First, a YBa.sub.2Cu.sub.3O.sub.y layer was formed, as a
ground plane layer, on a MgO substrate to a thickness of 200 nm by
magnetron sputtering using a YBa.sub.2Cu.sub.3O.sub.y target, and a
SrSnO.sub.3 layer was formed, as a first insulator layer, on the
ground plane layer to a thickness of 250 nm using a SrSnO.sub.3
target, at a substrate temperature of 740.degree. C., an Ar+10 Vol.
% O.sub.2 atmosphere, and a pressure of 80 mTorr.
[0149] Next, a resist mask having an opening at the surface of the
first insulator layer was formed by photolithography, and a
penetration hole was formed in the first insulator layer and the
ground plane layer by dry etching.
[0150] Thereafter, a Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y
layer was formed, as a lower electrode layer, on the first
insulator layer to a thickness of 200 nm by magnetron sputtering
using a Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, at a
substrate temperature of 720.degree. C., an Ar+10 Vol. % O.sub.2
atmosphere, and a pressure of 80 mTorr. Then, a SrSnO.sub.3 layer
was formed, as a second insulator layer, on the lower electrode
layer to a thickness of 250 nm by magnetron sputtering using a
SrSnO.sub.3 target, at a substrate temperature of 680.degree. C.,
an Ar+50 Vol. % O.sub.2 atmosphere, and a pressure of 50 mTorr.
[0151] Thereafter, the lower electrode layer and the second
insulator were etched by Ar ions using as a mask a resist layer
having an opening formed by photolithography in a region where a
superconducting junction is to be formed, similarly to the
embodiment samples Emb1-1, so as to form a sloping surface by the
lower electrode layer and the second insulator layer. After
removing the resist layer, surfaces of the YBa.sub.2Cu.sub.3O.sub.y
lower electrode layer and the SrSnO.sub.3 second insulator layer
were cleaned by oxygen plasma.
[0152] Then, a barrier layer was formed on the substrate, the
sloping surface portion of the lower electrode layer, and the
sloping surface portion and the surface of the second insulator
layer to a thickness of 1 nm by PLD, using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, a laser
irradiation energy of 450 mJ/cm.sup.2, an oxygen atmosphere, and a
pressure of 50 mTorr.
[0153] Next, a Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y layer
was formed, as an upper electrode, on the barrier layer to a
thickness of 200 nm by magnetron sputtering using a
Y.sub.0.9Ba.sub.1.9La.sub.0.2Cu.sub.3O.sub.y target, a substrate
temperature of 660.degree. C., an oxygen atmosphere, and a pressure
of 200 mTorr. Thereafter, a metal electrode was formed on the upper
electrode layer by evaporation, and 16 Josephson devices were
formed by a patterning process.
[0154] All 16 Josephson devices formed in this manner displayed the
RSJ type current versus voltage characteristic.
[0155] In addition, in the case of the embodiment samples Emb4, the
IcRn product at 4.2K was 3.0 mV to 3.9 mV, the average value of the
critical current value Ic was 0.8 mA, and an excessive current
component .DELTA.I was 10% to 30% of the critical current value Ic.
The IcRn product was thus approximately 30% greater than the value
conventionally reported.
[0156] As a result of a composition analysis of the barrier layer,
it was found that the Y content is 22 At. %, the Ba content is 34
At. %, the La content is 5 At. % and the Cu content is 39 At. % in
the cations forming the barrier layer.
[0157] FIG. 11 is a diagram showing an La element distribution of
the superconductor junction for the embodiment samples Emb4. In
FIG. 11, the abscissa indicates the position from the center of the
barrier layer, where a positive (+) side indicates the lower
electrode layer and a negative (-) side indicates the upper
electrode layer. The positions -3.0 nm, -1.5 nm, 0 nm, 1.5 nm and
3.0 nm from the center of the barrier layer in the direction
perpendicular to the surface of the barrier layer correspond to the
beam positions A, B, C, D and E shown in FIG. 7.
[0158] As may be seen from FIG. 11, the La content of the barrier
layer in a range of .+-.1.5 nm from the center of the barrier layer
was 1.5 times that of each of the upper and lower electrode layers,
and it was confirmed that the La content of the barrier layer is
considerably increased. Because the ion diameter of La is greater
than those of Y, Ba and Cu, it may be regarded that a junction
interface where the composition sharply changes is formed between
the barrier layer and the lower electrode layer or the upper
electrode layer. Phenomena similar to such a phenomenon encountered
for La have been confirmed for rare earth elements having an ion
diameter greater than 0.95 .ANG., such as Pr, Nd, Sm and Eu.
Comparison Sample Cmp4
[0159] Comparison samples Cmp4 were formed using targets having the
same compositions as those used when forming the embodiment samples
Emb4, except for the barrier layer, so as to obtain Josephson
devices including a ramp-edge type IEJ.
[0160] First, a ground plane layer, a first insulator layer, a
lower electrode layer that fills a penetration hole in the first
insulator layer and the ground plane layer and also covers the
surface of the first insulator layer, and a second insulator layer
that coverts he lower electrode layer were successively formed on a
substrate, similarly to the embodiment samples Emb4. Then, a
sloping surface was formed on the lower electrode layer and the
second insulator layer, and surfaces of the lower electrode layer
and the SrSnO.sub.3 second insulator layer were cleaned by oxygen
plasma.
[0161] Thereafter, a barrier layer was formed on the sloping
surface portion of the lower electrode layer by irradiating Ar ions
at an acceleration voltage of 500 V.
[0162] Next, an upper electrode and a metal layer were formed on
the barrier layer by evaporation, similarly to the embodiment
samples Emb4, and 16 Josephson devices were formed by a patterning
process.
[0163] All 16 Josephson devices formed in this manner displayed the
RSJ type current versus voltage characteristic.
[0164] In addition, in the case of the comparison samples Cmp4, the
IcRn product at 4.2K was 1.5 mV to 2.2 mV, the average value of the
critical current value Ic was 1.3 mA, and an excessive current
component .DELTA.I was 15% to 30% of the critical current value
Ic.
[0165] As a result of a composition analysis of the barrier layer,
it was found that the Y content is 27 At. %, the Ba content is 42
At. %, the La content is 3 At. % and the Cu content is 28 At. % in
the cations forming the barrier layer.
[0166] By comparing the embodiment samples Emb4 and the comparison
samples Cmp4, it was found that the critical current value Ic at
4.2K is approximately the same for the two, but the IcRn product of
the embodiment samples Emb4 is 1.3 times to 1.6 times that of the
comparison samples Cmp4 and large compared to the comparison
samples Cmp4.
Second Embodiment
[0167] A Josephson device in a second embodiment of the present
invention has a stacked structure.
[0168] FIG. 12 is a cross sectional view showing the Josephson
device in this second embodiment according to the present
invention. In FIG. 12, those parts that are the same as those
corresponding parts in FIG. 2, FIGS. 4A through 4E and FIG. 5 are
designated by the same reference numerals, and a description
thereof will be omitted.
[0169] A Josephson device 30 of this second embodiment shown in
FIG. 12 has a substrate 11, a buffer layer 31 formed on the
substrate 11, a lower electrode layer 12 formed on the buffer layer
31, a barrier layer 34 covering a portion of the lower electrode
layer 12, an insulator layer 33 covering the surface of the lower
electrode layer 12 other than the surface having the barrier layer
34 formed thereon, and an upper electrode layer 15 covering the
barrier layer 34 and the insulator layer 33. The lower electrode
layer 12, the barrier layer 34 and the upper electrode layer 15
form a superconducting junction 36. The basic structure of each of
the upper and lower electrode layers 15 and 12 is the Perovskite
structure, and the atomic plane made up of copper and oxygen is
preferably formed perpendicularly to the surface of the substrate
11 (that is, the substrate surface).
[0170] The buffer layer 31 is grown epitaxially on the surface of
the substrate 11, and the lower electrode layer 12 is grown
epitaxially on the buffer layer 31. The buffer layer 31 is made of
a suitable material that orients the c-axis of the lower electrode
layer 12 in a direction parallel to the substrate surface. The
material used for the buffer layer 31 may be selected from oxide
materials having the Perovskite structure, such as PrGaO.sub.3,
SrTiO.sub.3 and NdGaO.sub.3.
[0171] From the point of view of satisfactorily growing the buffer
layer 31 epitaxially on the substrate 11, the substrate 11 is
preferably made of SrTiO.sub.3, LSAT, LaAlO.sub.3, NdGaO.sub.3 and
the like.
[0172] The insulator 33 is made of a material similar to that used
for the buffer layer 31. The insulator layer 33 is grown
epitaxially on the lower electrode layer 12.
[0173] The barrier layer 34 is made of a material similar to that
used for the barrier layer 14 of the first embodiment shown in FIG.
2. In other words, the barrier layer 34 includes the element RE,
the element AE, Cu and oxygen. In the barrier layer 34, the element
RE is at least one element selected from a group consisting of Y,
La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and the element
AE is at least one element selected from a group consisting of Ba,
Sr and Ca. In addition, in the cations within the oxide material
forming the barrier layer 34, the Cu content is set in a range of
35 At. % to 55 At. %, the RE content is set in a range of 12 At. %
to 30 At. %, and further, the composition of the barrier layer 34
is different from the compositions of the upper and lower electrode
layers 15 and 12.
[0174] Because the barrier layer 34 has this composition and is a
deposited layer, similarly to the barrier layer 14 of the first
embodiment, it is possible to improve the IcRn product of the
Josephson device 30. In addition, the a-axis and the b-axis of the
upper and lower electrode layers 15 and 12 become perpendicular to
the substrate surface. Since the current flows more easily along
the a-axis and the b-axis of the oxide superconductor material, it
is possible to increase the critical current value Ic and to
improve the IcRn product by making the a-axis and the b-axis of the
upper and lower electrode layers 15 and 12 perpendicular to the
junction surface, as compared to the case where the a-axis and the
b-axis of the upper and lower electrode layers 15 and 12 are not
perpendicular to the junction surface. Therefore, according to this
second embodiment, it is possible to realize the Josephson device
30 having the stacked structure and improved IcRn product.
[0175] Next, a description will be given of the method of forming
the Josephson device in the second embodiment, by referring to FIG.
12.
[0176] First, the buffer layer 31, the lower electrode layer 12,
the barrier layer 34 and the upper electrode layer 15 are
successively deposited on the substrate 11 that is made of
SrTiO.sub.3, for example. The buffer layer 31, the lower electrode
layer 12 and the upper electrode layer 15 may be formed by vacuum
deposition, sputtering, PLD or CVD. For example, the buffer layer
31 is deposited to a thickness of 20 nm by sputtering using a
PrGaO.sub.3 target. For example, the lower electrode layer 12 is
deposited by sputtering using a YBa.sub.2Cu.sub.3O.sub.y target at
a substrate temperature of 600.degree. C. and in a depressurized
atmosphere of 50 Vol. % oxygen gas and 50 Vol. % Ar gas at a
pressure of 20 Pa. The barrier layer 34 is formed similarly to the
barrier layer 14 of the first embodiment, and for example, the
barrier layer 34 is deposited to a thickness of 3 nm by PLD using a
YBa.sub.2Cu.sub.3O.sub.y target.
[0177] Thereafter, a resist layer (not shown), that covers a region
where the superconductor junction 36 is to be formed, is formed by
photolithography. Further, an etching process is carried out by Ar
ion irradiation to remove portions of the upper electrode layer 15,
the barrier layer 34 and the lower electrode layer 12.
[0178] Then, the insulator layer 33 that covers the lower electrode
layer 12 and the superconducting junction 36 is formed similarly to
the buffer layer 31, and a lift-off process is carried out to
remove the resist layer and the unnecessary portion of the
insulator layer 33 formed on the resist layer.
[0179] Next, a second upper electrode layer 15-1 is formed to cover
the upper electrode layer 15 and the insulator layer 33. The second
upper electrode layer 15-1 is formed similarly to the lower
electrode layer 12. Although omitted in FIG. 12, an electrode pad
is formed on the surface of the second upper electrode layer 15-1.
The Josephson device 30 having the stacked structure is formed in
this manner.
Third Embodiment
[0180] FIG. 13 is a cross sectional view showing a superconductor
circuit (or superconducting junction circuit) in a third embodiment
of the present invention, and FIG. 14 is a circuit diagram showing
an equivalent circuit of the superconductor circuit shown in FIG.
13. FIG. 5 described above corresponds to a cross section taken
along a line A-A in FIG. 13. In FIGS. 13 and 14, those parts that
are the same as those corresponding parts in FIG. 5 are designated
by the same reference numerals, and a description thereof will be
omitted.
[0181] As may be seen from FIGS. 5, 13 and 14, a superconductor
circuit 40 of this third embodiment includes a superconductor
junction line connecting 2 Josephson devices 41. As shown in FIG.
14, the Josephson devices 41 of the superconductor circuit 40 are
connected so that inductances 43 thereof are connected in series
and a D.C. current source 42 and a superconductor junction 15 are
connected to a node that connects the inductances 43.
[0182] The superconductor circuit 40 has the structure shown in
FIG. 5. The materials used for the substrate 11, the lower
electrode layer 12, the barrier layer 14 and the upper electrode
layer 15 are the same as those used for the substrate 11, the lower
electrode layer 12, the barrier layer 14 and the upper electrode
layer 15 of the Josephson device 10 shown in FIG. 2. In addition,
the material used for the first and second insulator layers 22 and
13 is the same as that used for the insulator layer 13 of the
Josephson device 10 shown in FIG. 2.
[0183] The lower electrode layer 12, the barrier layer 14 and the
upper electrode layer 15 form the ramp-edge type superconducting
junction 16. Of course, the Josephson device in this third
embodiment may have the stacked structure of the second embodiment
described above.
[0184] As shown in FIG. 13, the upper electrode layer of the
Josephson device 41 forms the superconducting junction 16 between
the upper and lower electrode layers 15 and 12 via the barrier
layer 14 with a predetermined junction width. The upper electrode
layer 15 connects the Josephson devices 41, and forms the inductor
43 shown in FIG. 14. In addition, a bias current from the D.C.
current source 42 is supplied to the Josephson device 41 via the
upper electrode layer 15.
[0185] The lower electrode layer 12 contacts the ground plane layer
21 via the penetration hole 23 that is formed in a portion of the
first insulator layer 22. Although not shown in FIGS. 13 and 14,
the ground plane layer 21 is grounded.
[0186] The basic operation of the superconductor circuit 40 is as
follows. That is, when a current pulse accompanying magnetic flux
quantum is supplied from the input end, this current pulses is
superimposed on the bias current that flows through the
superconducting junction 16 shown on the left side in FIG. 13, and
as shown in FIG. 7 described above, a switching occurs from the
"zero voltage state" which is a superconducting state to the
"finite voltage state" when the current flowing through the left
superconducting junction 16 exceeds the critical current value Ic.
In addition, by this switching of the left superconducting junction
16 to the "finite voltage state", the current pulse accompanying
the magnetic flux quantum flows through the superconducting
junction shown on the right side in FIG. 13, and a switching from
the "zero voltage state" to the "finite voltage state" occurs with
respect to the right superconducting junction 16 by an operation
similar to that described with respect to the left superconducting
junction 16. Accordingly, the magnetic flux quantum is successively
transferred to the adjacent Josephson devices 41. In the
superconductor circuit 40, the magnitude of the critical current
value Ic can be controlled by varying the thickness of the barrier
layer 14.
[0187] The superconductor circuit 40 of this third embodiment can
operate at a high speed because the Josephson devices 41 have the
IcRn product that is large compared to that of the conventional
Josephson devices. In addition, because the critical temperature of
the superconducting junction 16 is high, the superconductor circuit
40 can operate at a high temperature, and as a result, it is
possible to reduce the cooling cost and the size of the
apparatus.
[0188] This application claims the benefit of a Japanese Patent
Application No. 2006-226938 filed Aug. 23, 2006, in the Japanese
Patent Office, the disclosure of which is hereby incorporated by
reference.
[0189] Further, the present invention is not limited to these
embodiments, but various variations and modifications may be made
without departing from the scope of the present invention.
* * * * *