U.S. patent application number 13/241109 was filed with the patent office on 2012-01-12 for monolithic photodetector.
This patent application is currently assigned to STMICROELECTRONICS S.A.. Invention is credited to CHRISTOPHE AUMONT, CYRIL FELLOUS, NICOLAS HOTELLIER, FRAN OIS ROY.
Application Number | 20120007201 13/241109 |
Document ID | / |
Family ID | 37035344 |
Filed Date | 2012-01-12 |
United States Patent
Application |
20120007201 |
Kind Code |
A1 |
FELLOUS; CYRIL ; et
al. |
January 12, 2012 |
MONOLITHIC PHOTODETECTOR
Abstract
A photodetector including a photodiode formed in a semiconductor
substrate and a waveguide element formed of a block of a high-index
material extending above the photodiode in a thick layer of a
dielectric superposed to the substrate, the thick layer being at
least as a majority formed of silicon oxide and the block being
formed of a polymer of the general formula
R.sub.1R.sub.2R.sub.3SiOSiR.sub.1R.sub.2R.sub.3 where R.sub.1,
R.sub.2, and R.sub.3 are any carbonaceous or metal substituents and
where one of R.sub.1, R.sub.2, or R.sub.3 is a carbonaceous
substituent having at least four carbon atoms and/or at least one
oxygen atom.
Inventors: |
FELLOUS; CYRIL; (ECHIROLLES,
FR) ; HOTELLIER; NICOLAS; (GRENOBLE, FR) ;
AUMONT; CHRISTOPHE; (JARRIE, FR) ; ROY; FRAN OIS;
(SEYSSINS, FR) |
Assignee: |
STMICROELECTRONICS S.A.
MONTROUGE
FR
|
Family ID: |
37035344 |
Appl. No.: |
13/241109 |
Filed: |
September 22, 2011 |
Related U.S. Patent Documents
|
|
|
|
|
|
Application
Number |
Filing Date |
Patent Number |
|
|
12704797 |
Feb 12, 2010 |
8053801 |
|
|
13241109 |
|
|
|
|
11706928 |
Feb 14, 2007 |
7663160 |
|
|
12704797 |
|
|
|
|
Current U.S.
Class: |
257/432 ;
438/73 |
Current CPC
Class: |
H01L 27/14625 20130101;
G02B 6/1221 20130101; H01L 27/14627 20130101; H01L 27/14621
20130101 |
Class at
Publication: |
257/432 ;
438/73 |
International
Class: |
H01L 27/146 20060101
H01L027/146; H01L 31/0232 20060101 H01L031/0232; H01L 31/18
20060101 H01L031/18 |
Foreign Application Data
Date |
Code |
Application Number |
Feb 14, 2006 |
FR |
0650536 |
Claims
1-16. (canceled)
17. An electronic device, comprising: electronic circuitry; and an
image acquisition device coupled to the electronic circuitry, the
image acquisition device including a photodetector array having a
plurality of photodetectors formed on a substrate, the photodectors
being arranged in rows and columns and each photodetector
comprising: a photodiode formed in the substrate; a waveguide
including, a dielectric layer formed on the photodiode; and a
polymer element formed in the dielectric layer adjacent the
photodiode, the polymer element having the general formula
R.sub.1R.sub.2R.sub.3SiOSiR.sub.1R.sub.2R.sub.3 where R.sub.1,
R.sub.2, and R.sub.3 are any carbonaceous or metal substituents and
where one of R.sub.1, R.sub.2, or R.sub.3 is a carbonaceous
substituent having at least four carbon atoms and/or at least one
oxygen atom.
18. The electronic device of claim 17 wherein the electronic
circuitry comprises at least one of digital camera and video camera
circuitry.
19. The electronic device of claim 17 wherein the electronic
circuitry further comprises at least one of cellular telephone and
personal digital assistant circuitry.
20. A method of forming a photodetector array including a plurality
of photodetectors, the method comprising: forming a plurality of
photodiodes in the substrate, each photodiode being associated with
a respective photodetector; forming a dielectric layer on the
substrate and photodiodes; forming in the dielectric layer adjacent
each photodiode an opening, each opening being associated with the
adjacent photodetector; forming in each opening a polymer element,
the polymer element and portion of the dielectric adjacent each
photodiode forming a respective photodetector, and wherein the
polymer element has the general formula
R.sub.1R.sub.2R.sub.3SiOSiR.sub.1R.sub.2R.sub.3 where R.sub.1,
R.sub.2, and R.sub.3 are any carbonaceous or metal substituents and
where one of R.sub.1, R.sub.2, or R.sub.3 is a carbonaceous
substituent having at least four carbon atoms and/or at least one
oxygen atom.
21. The method of claim 20 wherein forming in each opening the
polymer element comprises forming the quasi-inorganic siloxane
polymer elements through a spin-on-glass process.
22. The method of claim 20 wherein the polymer elements comprise
siloxane polymer elements have an index of refraction of between
1.56 to 1.6 or 1.64 to 1.7, and wherein the dielectric layer
comprises silicon oxide having an index of refraction of 1.43.
Description
PRIORITY CLAIM
[0001] The present application is a Divisional of U.S. patent
application Ser. No. 12/704,797, filed Feb. 12, 2010; which
application is a Divisional of U.S. patent application Ser. No.
11/706,928, filed Feb. 14, 2007, now U.S. Pat. No. 7,663,160,
issued Feb. 16, 2010; which application claims the benefit of
French Patent Application No. 06/50536, filed Feb. 14, 2006; all of
the foregoing applications are incorporated herein by reference in
their entireties.
TECHNICAL FIELD
[0002] Embodiments of the present disclosure generally relate to
the field of imagers made in monolithic form. More specifically,
embodiments of the present disclosure relate to the structure of
photodetectors used in such imagers.
BACKGROUND
[0003] Fixed or mobile image acquisition devices are increasingly
used in many fields. They must be inserted into smaller and smaller
spaces. For example, image acquisition devices are inserted into
portable phones. According to another example, in the medical
field, it is desirable to have image acquisition devices of small
dimensions able to be arranged on endoscopes.
[0004] It has thus been attempted to make, in monolithic form,
image acquisition devices of small dimensions with an image quality
at least comparable to that of known optical devices.
[0005] A monolithic image acquisition device includes
photodetectors arranged at the intersection of lines and of columns
of an array.
[0006] A cross-sectional view of FIG. 1 illustrates four
photodetectors of a line or column of an image acquisition device.
A photodetector comprises a photodiode D formed in a semiconductor
substrate 1. The surface area taken up by photodiode D typically
has a side or a diameter ranging between 0.2 and 1.5 .mu.m.
Substantially above the interval separating two neighboring
photodiodes D, metal interconnects are formed in a dielectric 5.
The metal interconnects are formed of several levels of
metallization 3 and of vias. The thickness of dielectric 5 is
generally greater than the total height of metallizations 3 and
depends on technological constraints linked to standard
technological processes and/or to the circuits formed around the
image acquisition area, such as circuits for reading and processing
the acquired images. The thickness of dielectric 5 typically ranges
between 1.5 and 6.5 .mu.m.
[0007] A succession of filters F of transparent resin colored in
red R, green V, or blue B is formed in dielectric 5. Filters F
follow one another so that, on a same line, two different colors
alternate and that, on two successive lines, one color is common.
For example, a first line comprises filters according to the
sequence B-V-B-V and the next line comprises filters according to
the illustrated sequence R-V-R-V. Filters F follow one another in a
continuous fashion and the interface between two neighboring
filters F is substantially above the middle of the interval
separating two underlying photodiodes D. Thus, each photodetector
comprises a filter F associated with a photodiode D. The filter F
of each photodetector is topped with a respective converging lens
L, also made of transparent resin.
[0008] It has been provided to form in each photodetector, between
a filter F and its corresponding photodiode D, a waveguide G.
Waveguide G is formed of a waveguide block 7 surrounded with
dielectric 5. Block 7 is formed of a material with a refraction
index n.sub.7 greater than that, n.sub.5, of dielectric 5
(n.sub.7>n.sub.5). Block 7 is of straight or slightly conical
cylindrical shape. Block 7 is placed above lens L to receive the
photons injected by lens L towards photodiode D. The high portion
of block 7 is separated from filter F by a thickness of dielectric
5 negligible as to the induced light losses, typically on the order
of a few nanometers. Similarly, the bottom of block 7 is placed
above photodiode D and is separated therefrom by a thickness of
dielectric 5 on the order of a few nanometers. The presence of
waveguide G enables decreasing light intensity losses and avoiding
wrong detections linked to a dispersion of the photons and/or to
their refraction against the metallizations 3 which appear across
the relatively significant thickness of dielectric 5.
[0009] According to one example of the waveguide G, the guide is
formed of a cone of a silicon, oxygen, carbon, and nitrogen
compound called silicon oxynitride, which exhibits an index n on
the order of from 1.6 to 2.3 according to its stoichiometry formed
in a thick silicon oxide layer (SiO.sub.2) of index n=1.43. Another
example of the waveguide G uses tantalum oxide, which has an index
n on the order of 2, as a high-index material.
[0010] However, the use of such materials may raise practical
problems. In particular, block 7 of FIG. 1 of the present
application is formed by filling a deep and narrow opening in the
dielectric 5. "Deep and narrow" means in the present description an
opening having a ratio between the depth (substantially equal to
the thickness of dielectric 5) and the average diameter
(substantially equal to that of photodiode D) greater than 2. The
filling of such an opening, which is performed by chemical vapor
deposition (CVD), must be homogeneous. However, on filling of a
narrow and deep opening with compounds of silicon oxy-carbo-nitride
type or with tantalum oxide, bubbles or cavities form. Such bubbles
form traps for the received light. Further, when block 7 is formed
of a silicon oxy-carbo-nitride or of tantalum oxide, problems of
mechanical hold with peripheral silicon oxide 5 can be observed.
Moreover, some of the silicon oxy-carbo-nitrides, as well as the
tantalum oxide, deteriorate during the thermal cycles implemented
in the rest of the process, especially the encapsulation and
packaging anneals performed at temperatures from 300 to 400.degree.
C.
[0011] In another approach, a waveguide element is formed of
alumina of index 1.63 or of silicon nitride (n=1.83) formed in a
thick silicon oxide layer n=1.43. According to a variation of this
approach, the high-index block 7 is silicon oxide n=1.43, formed in
a thick dielectric layer 5 made of a material with a lower index
such as an oxysilane of index 1.39.
[0012] The use of alumina or silicon nitride in a thick silicon
oxide layer may exhibit disadvantages similar to those described
previously for tantalum oxide or silicon oxy-carbo-nitrides.
[0013] The use of silicon oxide in oxysilane may also raise
problems. In particular, this results in a significant modification
of the materials used in the optical area with respect to the
material present in the neighboring non-optical areas in which it
is desirable to keep silicon oxide as an interlevel dielectric 5.
This complicates and increases manufacturing costs. Further, the
use in a thick layer of oxysilane with a refraction index lower
than that of silicon oxide raises problems of mechanical hold, of
ability to be locally etched, especially to form metallization
levels 3 and the vias, as well as problems of resistance to thermal
stress, especially on forming of the metal levels.
SUMMARY
[0014] One embodiment is to provide a waveguide block which
overcomes at least some of the disadvantages of known
structures.
[0015] Another embodiment is to provide such a block which is
compatible with the use of silicon oxide as a thick peripheral
dielectric.
[0016] Another embodiment is to provide such a waveguide block
which is compatible with the thermal cycles implemented after its
forming and to provide such a block which is easy to manufacture in
a narrow and deep opening.
[0017] According to one embodiment, a photodetector includes a
photodiode formed in a semiconductor substrate and a waveguide
element formed of a block of a high-index material extending
vertically above the photodiode in a thick layer of a dielectric
superposed to the substrate, the thick layer being formed at least
as a majority, of silicon oxide and the block being formed of a
polymer of the general formula
R.sub.1R.sub.2R.sub.3SiOSiR.sub.1R.sub.2R.sub.3 where R.sub.1,
R.sub.2, and R.sub.3 are any carbonaceous or metal substituents and
where one of R.sub.1, R.sub.2, or R.sub.3 is a carbonaceous
substituent having at least four carbon atoms and/or at least one
oxygen atom.
[0018] The block may exhibit a ratio between its depth and its
average diameter greater than 2. A colored filter may be placed
above the block and a converging lens may also be placed above the
block. The lens may be laterally offset with respect to the block.
The polymer according to an embodiment of the present application
may be an SOG-type glass comprising tantalum, titanium, and/or
zirconium inclusions. An image acquisition device may include a
plurality of such photodetectors.
BRIEF DESCRIPTION OF THE DRAWINGS
[0019] The foregoing features of the present disclosure will be
discussed in detail in the following non-limiting description of
specific embodiments in connection with
[0020] FIG. 1, previously described, which is a partial
cross-sectional view of a known image acquisition device.
DETAILED DESCRIPTION
[0021] The following discussion is presented to enable a person
skilled in the art to make and use the present disclosure. Various
modifications to the embodiments will be readily apparent to those
skilled in the art, and the generic principles herein may be
applied to other embodiments and applications without departing
from the spirit and scope of the present disclosure. Thus, the
present disclosure is not intended to be limited to the embodiments
shown, but is to be accorded the widest scope consistent with the
principles and features disclosed herein. As usual in the
representation of semiconductor components, FIG. 1 is not drawn to
scale.
[0022] Referring to FIG. 1, an embodiment of the present disclosure
uses a block 7 formed of a polymer of the general formula
R.sub.1R.sub.2R.sub.3SiOSiR.sub.1R.sub.2R.sub.3 where R.sub.1,
R.sub.2, and R.sub.3 are any carbonaceous or metal substituents
such as tantalum, titanium, or zirconium compounds and where one of
R.sub.1, R.sub.2, or R.sub.3 is a carbonaceous substituent having
at least four carbon atoms and/or at least one oxygen atom and the
polymer having a refraction index greater than the refraction index
of silicon oxide which is equal to 1.43, this block being buried in
the silicon oxide.
[0023] Such polymers exhibit many advantages when used for forming
the waveguide blocks 7. First, as indicated previously, the
refraction index of such polymer is greater than that of the
silicon oxide dielectric 5 in which the block is formed. Interlevel
dielectric 5 then is the same in the optical areas including the
photodiodes D as in the neighboring non-optical areas. This
simplifies the fabrication process.
[0024] Further, as they are spun on and not deposited by chemical
vapor deposition (CVD) like conventionally-provided materials, the
above-described polymers can be deposited in the deep and narrow
openings having a ratio between depth and average diameter of
greater than 2.
[0025] Moreover, during the deposition, such polymers polymerize in
a chain, which reliably and reproducibly results in the forming of
a homogeneous block 7, that is, with no cavities or bubbles.
[0026] Furthermore, the compatibility between such a polymer and a
peripheral silicon oxide (dielectric 5) is good. There is no
phenomenon of mechanical separation between these polymers and
silicon oxide, nor is there any cross contamination. There are no
longer wetting defects likely to result in the forming of
cavities.
[0027] Additionally, the above-defined polymers present a high
range barrier power against the diffusion of the metal elements
constituting the colored resins of the filters F of FIG. 1. This
barrier is higher than the barrier of the known materials as
silicon oxynitride, tantalum oxide, alumina, silicon oxide silicon
nitride, methylsiloxane, silicates or phosphosilicates. Such a
barrier property is highly advantageous. It avoids deteriorating
the filters during the fabrication process due to the diffusion of
the metal elements of the colored resins in the wave guide. It
increases the performances and the lifetime of an imager using such
a waveguide. Especially, it deeply reduces the loss of performances
due to the above-described diffusion during the life of the
imager.
[0028] Moreover, such polymers exhibit a good resistance to
temperatures greater than 400.degree. C. Thus, these polymers are
thermally compatible with semiconductor circuit manufacturing
processes.
[0029] The block 7 may be formed, for example, of a quasi-inorganic
siloxane-based insulator of SOG (spun on glass) type, including or
not metallic tantalum, titanium, and/or zirconium inclusions and
having a refraction index ranging between 1.56 and 1.6, such as
manufactured by Tokyo Ohka Kogyo. Another possible polymer is a
siloxane material, having a refraction index ranging between 1.64
and 1.7 such as that manufactured by Silecs Inc.
[0030] The present disclosure is likely to have various
alterations, modifications, and improvements which will readily
occur to those skilled in the art. In particular, only those
elements of the monolithic structure of a photodetector which are
necessary to the understanding of the present disclosure have been
described. It will be within the abilities of those skilled in the
art to complete the structure to form an operative device. Further,
it should be understood by those skilled in the art that the
present disclosure applies to photodetectors of different
structures. For example, a photodetector may comprise no filter F
or lens L.
[0031] Further, it should be understood by those skilled in the art
that dielectric 5 has been considered as homogeneous as a
non-limiting example only and for clarity. In practice, dielectric
5 may be made of silicon oxide only across the greatest part of its
thickness, that is, it may have a multiple-layer structure. In
particular, dielectric 5 is typically formed of an alternation of
thick silicon oxide sub-layers separated by thin sub-layers of an
etch stop insulator such as silicon nitride. The presence of such
thin sub-layers does not affect the operation of the
photodetectors.
[0032] Moreover, embodiments have been described in the case of a
block 7 exhibiting a ratio between its depth and its average
diameter greater than 2. However, it should be understood by those
skilled in the art that such blocks may exhibit a ratio between
their depth and their average diameter which is less than 2.
[0033] Further, it should be understood by those skilled in the art
that waveguides according to embodiments have been described as
applied to a device as illustrated in FIG. 1 as a non-limiting
example only. Embodiments also apply to image acquisition devices
exhibiting a different general structure. Thus, for example,
colored filter F and lens L may altogether be radially offset with
respect to underlying block 7 to correct an angle of view which
varies from the center of the sensor to the edge of the sensor. In
this case, it should be noted that it will be preferable to form
between each block 7 and filter F a significant thickness of the
dielectric, for example, on the order of from 200 to 1,500 nm.
[0034] Generally, it will be within the abilities of those skilled
in the art to select an appropriate polymer from among the polymers
available for sale with a refraction index greater than that of the
dielectric 5 that is used.
[0035] Image acquisition devices including arrays of photodetectors
according to embodiments may be any type of electronic device
containing an image acquisition device, such as cellular phones,
digital cameras, video cameras, personal digital assistants (PDAs),
and so on.
[0036] Alterations, modifications, and improvements are intended to
be part of this disclosure, and are intended to be within the
spirit and the scope of the present disclosure. Accordingly, the
foregoing description is by way of example only and is not intended
to be limiting. The present disclosure is limited only as defined
in the following claims and the equivalents thereto.
* * * * *