U.S. patent application number 13/064962 was filed with the patent office on 2011-08-25 for vertical type semiconductor device, method of manufacturing a vertical type semiconductor device and method of operating a vertical semiconductor device.
Invention is credited to Jong-Hyuk Kang, Jong-Wook Lee, Yong-Hoon Son.
Application Number | 20110205816 13/064962 |
Document ID | / |
Family ID | 42171293 |
Filed Date | 2011-08-25 |
United States Patent
Application |
20110205816 |
Kind Code |
A1 |
Son; Yong-Hoon ; et
al. |
August 25, 2011 |
Vertical type semiconductor device, method of manufacturing a
vertical type semiconductor device and method of operating a
vertical semiconductor device
Abstract
A vertical pillar semiconductor device includes a substrate, a
single crystalline semiconductor pattern, a gate insulation layer
structure and a gate electrode. The substrate may include a first
impurity region. The single crystalline semiconductor pattern may
be on the first impurity region. The single crystalline
semiconductor pattern has a pillar shape substantially
perpendicular to the substrate. A second impurity region may be
formed in an upper portion of the single crystalline semiconductor
pattern. The gate insulation layer structure may include a charge
storage pattern, the gate insulation layer structure on a sidewall
of the single crystalline semiconductor pattern. The gate electrode
may be formed on the gate insulation layer structure and opposite
the sidewall of the single crystalline semiconductor pattern. The
gate electrode has an upper face substantially lower than that of
the single crystalline semiconductor pattern.
Inventors: |
Son; Yong-Hoon; (Yongin-si,
KR) ; Lee; Jong-Wook; (Yongin-si, KR) ; Kang;
Jong-Hyuk; (Suwon-si, KR) |
Family ID: |
42171293 |
Appl. No.: |
13/064962 |
Filed: |
April 28, 2011 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
12620923 |
Nov 18, 2009 |
7956407 |
|
|
13064962 |
|
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Current U.S.
Class: |
365/189.011 ;
257/E21.41; 438/268 |
Current CPC
Class: |
H01L 29/7923 20130101;
H01L 29/40117 20190801; H01L 29/66833 20130101; H01L 27/11578
20130101 |
Class at
Publication: |
365/189.011 ;
438/268; 257/E21.41 |
International
Class: |
H01L 21/336 20060101
H01L021/336; G11C 7/00 20060101 G11C007/00 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 18, 2008 |
KR |
10-2008-0114765 |
Claims
1. A method of manufacturing a vertical pillar semiconductor device
comprising: forming a first impurity region in a substrate; forming
a single crystalline semiconductor pattern having a pillar shape
perpendicular to the substrate; forming a second impurity region in
an upper portion of the single crystalline semiconductor pattern;
forming a gate insulation layer structure including a insulation
layer pattern, a charge storage pattern and dielectric layer
pattern on a sidewall of the single crystalline semiconductor
pattern; and forming a gate electrode on the gate insulation layer
structure, the gate electrode opposite the single crystalline
semiconductor pattern and having an upper face lower than that of
the single crystalline semiconductor pattern.
2. The method of claim 1, further comprising: storing a charge in
the charge storage pattern in order to expand a memory window.
3. The method of claim 1, wherein the single crystalline
semiconductor pattern is formed by a laser epitaxial growth (LEG)
process or a selective epitaxial growth (SEG) process.
4. The method of claim 1, wherein the charge storage layer pattern
is formed using a material having charge trap sites.
5. The method of claim 4, wherein the charge storage layer pattern
includes at least one of silicon nitride and metal oxide.
6. The method of claim 1, further comprising: forming a first hard
mask pattern enclosing an upper sidewall of the single crystalline
semiconductor pattern, wherein the gate insulation layer structure
has a linear shape and is on a bottom surface of the first hard
mask pattern, a sidewall of the single crystalline semiconductor
pattern and the substrate.
7. The method of claim 1, further comprising: forming a channel
doping region below a portion of the single crystalline
semiconductor pattern configured to contact the gate insulation
layer structure, the channel doping region changing a threshold
voltage using a pair of electrons and holes generated according to
electric conditions applied to the gate electrode, the first
impurity region and the second impurity region.
8. The method of claim 6, wherein forming the first hard mask
pattern includes forming the first hard mask pattern to have an
upper face even with a surface of the single crystalline
semiconductor pattern.
9. The method of claim 1, further comprising: forming a pad
insulation layer pattern between the substrate and a lower surface
of the gate electrode, wherein the pad insulation layer pattern
includes silicon nitride.
10. The method of claim 6, further comprising: forming first and
second insulating interlayers on the first hard mask pattern;
forming at least one bit line on the second insulating interlayer;
forming a second hard mask pattern on the at least one bit line;
and forming at least one spacer on a sidewall of the at least one
bit line.
11. The method of claim 10, further comprising: a third insulating
interlayer covering the at least one bit line; a contact plug
formed through the second and third insulating interlayers to
contact an upper face of the single crystalline semiconductor
pattern; and a wiring on the contact plug.
12. A method of operating a DRAM device comprising: providing one
transistor per cell of the DRAM device, the transistor having a
gate insulation layer structure including a charge storage pattern;
storing charge in the charge storage pattern for obtaining a memory
window; recording data in a channel doping region of the
transistor; and reading the recorded data.
13. The method of claim 12, further comprising: adjusting the
memory window by changing a programming voltage for storing the
charge in the charge storage pattern.
Description
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional of U.S. application Ser.
No. 12/620,923, filed Nov. 18, 2009, which claims priority under
U.S.C. .sctn.119 to Korean Patent Application No. 10-2008-00114765,
filed on Nov. 18, 2008, in the Korean Intellectual Property Office
(KIPO), the entire contents of each of which are incorporated
herein by reference.
BACKGROUND
[0002] 1. Field
[0003] Example embodiments relate to a vertical type semiconductor
device, a method of manufacturing a vertical type semiconductor
device and method of operating a vertical type semiconductor
device. More particularly, example embodiments relate to a vertical
type semiconductor device having a single transistor, a method of
manufacturing a vertical type semiconductor device having a single
transistor and method of operating a vertical type semiconductor
device having a single transistor.
[0004] 2. Description of the Related Art
[0005] Generally, a DRAM (dynamic random access memory) device
includes a unit cell requiring one transistor and one capacitor per
bit. The DRAM device stores data using the capacitor which may be
charged or un-charged. The DRAM device loses data stored in each
cell when power is not supplied. Because capacitors leak charge,
the data eventually fades unless the capacitor charge is refreshed
periodically.
[0006] Capacitance of the capacitor may be increased in order to
increase the refresh period. Because the capacitance is
proportional to physical size of the capacitor, integrating the
DRAM device in higher density may be difficult.
[0007] Accordingly, a 1 T DRAM which may be a capacitorless bit
cell design has been developed. The 1 T DRAM has a structure in
which a transistor may be formed on a surface of a floating body.
The 1 T DRAM stores data by storing or erasing a charge in the
floating body. Also, the 1 T DRAM reads the stored data using a
detectable shift in the threshold voltage of the transistor caused
by stored charges in the floating body.
[0008] However, the shift in the threshold voltage of the
transistor caused by stored charges may be smaller. As a result,
when data stored in the transistor is read, errors caused from a
read sensing margin may occur. Also, power consumption becomes
larger because of frequent refresh operations.
SUMMARY
[0009] Example embodiments provide a vertical type semiconductor
device of which a read sensing margin may be increased. Example
embodiments provide a method of manufacturing a vertical type
semiconductor device of which a read sensing margin may be
increased. Example embodiments provide a method of operating a
vertical type semiconductor device of which a read sensing margin
may be increased.
[0010] According to example embodiments, a vertical pillar
semiconductor device may include a substrate including a first
impurity region; a single crystalline semiconductor pattern on the
first impurity region, the single crystalline semiconductor pattern
having a pillar shape substantially perpendicular to the substrate
and including a second impurity region in an upper portion of the
single crystalline semiconductor pattern; a gate insulation layer
structure including a charge storage pattern, the gate insulation
layer structure on a sidewall of the single crystalline
semiconductor pattern; and a gate electrode on the gate insulation
layer structure and opposite the sidewall of the single crystalline
semiconductor pattern, the gate electrode having an upper face
lower than that of the single crystalline semiconductor
pattern.
[0011] The charge storage pattern may include at least one of a
silicon nitride and a metal nitride. The vertical pillar
semiconductor device may further include a first hard mask pattern
enclosing an upper sidewall of the single crystalline semiconductor
pattern, wherein the gate insulation layer structure has a linear
shape and is on a bottom surface of the first hard mask pattern, a
sidewall of the single crystalline semiconductor pattern and the
substrate.
[0012] The vertical pillar semiconductor device may further include
a channel doping region below a portion of the single crystalline
semiconductor pattern configured to contact the gate insulation
layer structure, the channel doping region changing a threshold
voltage using a pair of electrons and holes generated according to
electric conditions applied to the gate electrode, the first
impurity region and the second impurity region. Charges may be
stored in the charge storage pattern for expanding a memory window.
The gate insulation layer structure may include an insulation layer
pattern, the charge storage pattern and a blocking dielectric layer
pattern that are laterally stacked.
[0013] The insulation layer pattern may include silicon oxide. The
substrate may further include an active region and an isolation
layer, the substrate being made of single crystalline semiconductor
material. The active region and the isolation layer may have a
shape extending along a first direction. The gate electrode may
have a linear shape extending along a second direction
substantially perpendicular to the first direction.
[0014] The first hard mask pattern may include silicon nitride and
may have an upper face having a surface even with the single
crystalline semiconductor pattern. The vertical pillar
semiconductor device may further include a pad insulation layer
pattern between the substrate and a lower surface of the gate
electrode, wherein the pad insulation layer pattern includes
silicon nitride.
[0015] The vertical pillar semiconductor device may further include
first and second insulating interlayers on the first hard mask
pattern; at least one bit line on the second insulating interlayer;
a second hard mask pattern on the at least one bit line; and at
least one spacer on a sidewall of the at least one bit line. The
vertical pillar semiconductor device may further include a third
insulating interlayer covering the at least one bit line; a contact
plug formed through the second and third insulating interlayers to
contact an upper face of the single crystalline semiconductor
pattern; and a wiring on the contact plug.
[0016] According to example embodiments, a method of manufacturing
a vertical pillar semiconductor device may include forming a first
impurity region in a substrate; forming a single crystalline
semiconductor pattern having a pillar shape perpendicular to the
substrate; forming a second impurity region in an upper portion of
the single crystalline semiconductor pattern; forming a gate
insulation layer structure including a insulation layer pattern, a
charge storage pattern and dielectric layer pattern on a sidewall
of the single crystalline semiconductor pattern; and forming a gate
electrode on the gate insulation layer structure, the gate
electrode opposite the single crystalline semiconductor pattern and
having an upper face lower than that of the single crystalline
semiconductor pattern.
[0017] The method may further include storing a charge in the
charge storage pattern in order to expand a memory window. The
single crystalline semiconductor pattern may be formed by a laser
epitaxial growth (LEG) process or a selective epitaxial growth
(SEG) process. The charge storage layer pattern may be formed using
a material having charge trap sites. The charge storage layer
pattern may include at least one of silicon nitride and metal
oxide.
[0018] The method may further include forming a first hard mask
pattern enclosing an upper sidewall of the single crystalline
semiconductor pattern, wherein the gate insulation layer structure
has a linear shape and is on a bottom surface of the first hard
mask pattern, a sidewall of the single crystalline semiconductor
pattern and the substrate. The method may further include forming a
channel doping region below a portion of the single crystalline
semiconductor pattern configured to contact the gate insulation
layer structure, the channel doping region changing a threshold
voltage using a pair of electrons and holes generated according to
electric conditions applied to the gate electrode, the first
impurity region and the second impurity region.
[0019] Forming the first hard mask pattern may include forming the
first hard mask pattern to have an upper face even with a surface
of the single crystalline semiconductor pattern. The method may
further include forming a pad insulation layer pattern between the
substrate and a lower surface of the gate electrode, wherein the
pad insulation layer pattern includes silicon nitride.
[0020] The method may further include forming first and second
insulating interlayers on the first hard mask pattern; forming at
least one bit line on the second insulating interlayer; forming a
second hard mask pattern on the at least one bit line; and forming
at least one spacer on a sidewall of the at least one bit line.
[0021] The method may further include a third insulating interlayer
covering the at least one bit line; a contact plug formed through
the second and third insulating interlayers to contact an upper
face of the single crystalline semiconductor pattern; and a wiring
on the contact plug.
[0022] According to example embodiments, a method of operating a
DRAM device may include providing one transistor per cell of the
DRAM device, the transistor having a gate insulation layer
structure including a charge storage pattern; storing charge in the
charge storage pattern for obtaining a memory window; recording
data in a channel doping region of the transistor; and reading the
recorded data. The method may further include adjusting the memory
window by changing a programming voltage for storing the charge in
the charge storage pattern.
[0023] According to example embodiments, the vertical type
semiconductor device may include one transistor without a
capacitor. Thus, the vertical type semiconductor device may be
highly integrated. Also, the vertical type semiconductor device has
an increased memory window, so that a read sensing margin may be
increased and refresh characteristics may be improved.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Example embodiments will be more clearly understood from the
following detailed description taken in conjunction with the
accompanying drawings. FIGS. 1 to 14 represent non-limiting,
example embodiments as described herein.
[0025] FIG. 1 is a cross-sectional view illustrating a DRAM device
including a vertical pillar transistor in accordance with example
embodiments;
[0026] FIGS. 2-12 are cross-sectional views illustrating a method
of manufacturing a DRAM device in FIG. 1;
[0027] FIG. 13 is a graph showing each of drain currents of a DRAM
device including a vertical pillar transistor in accordance with
example embodiments according to charges stored in a charge storing
pattern; and
[0028] FIG. 14 is a graph each of drain currents of a DRAM device
including a vertical pillar transistor in accordance with example
embodiments according to programming conditions storing charges in
a charge storing pattern.
[0029] It should be noted that these Figures are intended to
illustrate the general characteristics of methods, structure and/or
materials utilized in certain example embodiments and to supplement
the written description provided below. These drawings are not,
however, to scale and may not precisely reflect the precise
structural or performance characteristics of any given embodiment,
and should not be interpreted as defining or limiting the range of
values or properties encompassed by example embodiments. For
example, the relative thicknesses and positioning of molecules,
layers, regions and/or structural elements may be reduced or
exaggerated for clarity. The use of similar or identical reference
numbers in the various drawings is intended to indicate the
presence of a similar or identical element or feature.
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
[0030] Various example embodiments will be described more fully
hereinafter with reference to the accompanying drawings, in which
some example embodiments may be illustrated. Example embodiments
may, however, be embodied in many different forms and should not be
construed as limited to example embodiments set forth herein.
Rather, these example embodiments may be provided so that this
disclosure will be thorough and complete, and will fully convey the
scope of example embodiments to those skilled in the art. In the
drawings, the sizes and relative sizes of layers and regions may be
exaggerated for clarity.
[0031] It will be understood that when an element or layer is
referred to as being "on," "connected to" or "coupled to" another
element or layer, it can be directly on, connected or coupled to
the other element or layer or intervening elements or layers may be
present. In contrast, when an element is referred to as being
"directly on," "directly connected to" or "directly coupled to"
another element or layer, there are no intervening elements or
layers present. Like numerals refer to like elements throughout. As
used herein, the term "and/or" includes any and all combinations of
one or more of the associated listed items.
[0032] It will be understood that, although the terms first,
second, third etc. may be used herein to describe various elements,
components, regions, layers and/or sections, these elements,
components, regions, layers and/or sections should not be limited
by these terms. These terms are only used to distinguish one
element, component, region, layer or section from another region,
layer or section. Thus, a first element, component, region, layer
or section discussed below could be termed a second element,
component, region, layer or section without departing from the
teachings of example embodiments.
[0033] Spatially relative terms, such as "beneath," "below,"
"lower," "above," "upper" and the like, may be used herein for ease
of description to describe one element or feature's relationship to
another element(s) or feature(s) as illustrated in the figures. It
will be understood that the spatially relative terms are intended
to encompass different orientations of the device in use or
operation in addition to the orientation depicted in the figures.
For example, if the device in the figures is turned over, elements
described as "below" or "beneath" other elements or features would
then be oriented "above" the other elements or features. Thus, the
exemplary term "below" can encompass both an orientation of above
and below. The device may be otherwise oriented (rotated 90 degrees
or at other orientations) and the spatially relative descriptors
used herein interpreted accordingly.
[0034] The terminology used herein is for the purpose of describing
particular example embodiments only and is not intended to be
limiting of example embodiments. As used herein, the singular forms
"a," "an" and "the" are intended to include the plural forms as
well, unless the context clearly indicates otherwise. It will be
further understood that the terms "comprises" and/or "comprising,"
when used in this specification, specify the presence of stated
features, integers, steps, operations, elements, and/or components,
but do not preclude the presence or addition of one or more other
features, integers, steps, operations, elements, components, and/or
groups thereof.
[0035] Example embodiments are described herein with reference to
cross-sectional illustrations that are schematic illustrations of
idealized example embodiments (and intermediate structures). As
such, variations from the shapes of the illustrations as a result,
for example, of manufacturing techniques and/or tolerances, are to
be expected. Thus, example embodiments should not be construed as
limited to the particular shapes of regions illustrated herein but
are to include deviations in shapes that result, for example, from
manufacturing. For example, an implanted region illustrated as a
rectangle will, typically, have rounded or curved features and/or a
gradient of implant concentration at its edges rather than a binary
change from implanted to non-implanted region. Likewise, a buried
region formed by implantation may result in some implantation in
the region between the buried region and the surface through which
the implantation takes place. Thus, the regions illustrated in the
figures are schematic in nature and their shapes are not intended
to illustrate the actual shape of a region of a device and are not
intended to limit the scope of example embodiments.
[0036] Unless otherwise defined, all terms (including technical and
scientific terms) used herein have the same meaning as commonly
understood by one of ordinary skill in the art to which example
embodiments belong. It will be further understood that terms, such
as those defined in commonly used dictionaries, should be
interpreted as having a meaning that is consistent with their
meaning in the context of the relevant art and will not be
interpreted in an idealized or overly formal sense unless expressly
so defined herein.
[0037] FIG. 1 is a cross-sectional view illustrating a DRAM device
including a vertical pillar transistor in accordance with example
embodiments. Referring to FIG. 1, a substrate 100 having an active
region 100a and an isolation layer 102 may be prepared. The
substrate 100 may include single crystalline semiconductor
material. For example, the substrate 100 may include single
crystalline silicon.
[0038] A trench 102a may be formed at an upper portion of the
substrate 100 and the trench may be filled with the isolation layer
102. The active region 100a and the isolation layer 102 have a
shape extending along a first direction. The active region 100a and
the isolation layer 102 may be alternatively formed at an upper
portion of the substrate 100. A first impurity region 104 may be
formed under a surface of the substrate 100 corresponding to the
active region 100a. The first impurity region 104 may serve as a
source region or a drain region.
[0039] A single crystalline semiconductor pattern 118 having a
pillar shape may be formed over the substrate corresponding to the
active region. For example, the single crystalline semiconductor
pattern 118 may include single crystalline silicon. The single
crystalline semiconductor pattern 118 may be formed by a laser
epitaxial growth (LEG) process or a selective epitaxial growth
(SEG) process. In example embodiments, the single crystalline
semiconductor pattern 118 may be formed by a LEG process, so that
the single crystalline semiconductor pattern 118 may have fewer
defects.
[0040] A gate insulation structure 121 may be formed on a sidewall
of the single crystalline semiconductor pattern 118. The gate
insulation structure 121 has a structure in which a gate insulation
layer pattern 121a, a charge storage layer pattern 121b and a
blocking dielectric layer pattern 121c may be sequentially stacked.
The gate insulation layer pattern 121a may be formed using silicon
oxide. The silicon oxide may be formed by thermally oxidizing a
sidewall of the crystalline semiconductor pattern 118. The charge
storage layer pattern 121b may be formed using material having
charge trap sites. For example, the charge storage layer pattern
121b may include silicon nitride and/or metal oxide having higher
permittivity.
[0041] As illustrated in FIG. 1, a gate electrode 122a opposite the
single crystalline semiconductor pattern 118 may be formed on the
gate insulation structure 121. For example, the gate electrode 122a
may be formed on the blocking dielectric layer pattern 121c. The
gate electrode 122a has an upper face whose level may be lower than
that of the single crystalline semiconductor pattern 118. In
example embodiments, the gate electrode 122a encloses all sidewalls
of the single crystalline semiconductor pattern 118, which may be
called a gate all around structure.
[0042] The gate insulation structure 121 may extend along the gate
electrode 122a as well as the single crystalline semiconductor
pattern 118. For example, the gate insulation structure 121 may
extend along an upper face and a lower face of the gate electrode
122a. The gate electrode 122a has a linear shape extending along a
second direction substantially perpendicular to the first
direction. For example, the gate electrode 122a extends along a
direction across the active region 100a.
[0043] A channel doping region may be formed in a portion of the
single crystalline semiconductor pattern 118 opposite the gate
electrode 122a. Because the single crystalline semiconductor
pattern 118 has a floating body shape, when the transistor is
operated, a pair of electrons and holes may be generated and may be
accumulated in the channel doping region. A second impurity region
124 may be formed in portion of the single crystalline
semiconductor pattern 118 positioned higher than the gate electrode
122a.
[0044] A first hard mask pattern 110a may be formed on the gate
electrode 122a. The first hard mask pattern 110a has an upper face
having a surface substantially horizontal to that of the single
crystalline semiconductor pattern 118. The first hard mask pattern
110a may be formed using silicon nitride.
[0045] A pad insulation layer pattern 106a may be formed between
the substrate 100 and a lower surface of the gate electrode 122a.
The pad insulation layer pattern 106a electrically insulates the
substrate 100 from the gate electrode 122a. The pad insulation
layer pattern 106a may be formed using silicon nitride.
[0046] A DRAM including only one vertical pillar transistor per
cell may be formed. The single crystalline semiconductor pattern
118 may be a channel region. Because the channel region is enclosed
by the gate electrode 122a, the channel region has a floating body
shape. The channel region of a floating body shape may serve as a
data storage region. For example, holes may be accumulated in the
channel region or removed from the channel region to change a
threshold voltage of the vertical pillar transistor. Accordingly,
data may be stored or erased.
[0047] In example embodiments, a negative charge may be stored in
the charge storage pattern 121b. When the negative charge is stored
in the charge storage pattern 121b, a threshold voltage according
to data recorded in the vertical pillar transistor may become
larger. As a result, a memory window of the DRAM may become
larger.
[0048] An additional line wiring structure may be further formed on
the vertical pillar transistor. For example, a spacer (not
illustrated) may be formed on a sidewall of the gate electrode 122a
having a linear shape extending along the second direction. A gap
between the spacers may be filled with a first insulating
interlayer 128.
[0049] A pad contact (not illustrated) through which electric
signals are applied to the first impurity region 104 may be formed.
The pad contact may be formed by a self-aligning process using the
spacer. A second insulating interlayer 134 may be formed to cover
the pad contact and the first hard mask pattern 110a. A direct
contact (not illustrated) partially contacting the pad contact may
be formed on the second insulating interlayer 134.
[0050] A bit line 140 electrically connected to the pad contact
through the direct contact and extending along the first direction
may be formed on the second insulating interlayer 134. The bit line
140 may partially contact the pad contact. A second hard mask
pattern 142 may be formed on the bit line 140. A spacer 144 may be
formed on a sidewall of the bit line 140.
[0051] A gap between the bit lines 140 may be filled with a third
insulating interlayer 146. The third insulating interlayer 146
covers the bit lines 140. A contact plug 148 may be formed through
the second and third insulating interlayers to contact to an upper
face of the single crystalline semiconductor pattern 118. The
contact plug 148 may be disposed between the adjacent bit lines
140. The contact plug 148 may be electrically insulated from the
bit lines 140. For example, the contact plug 148 may be
electrically connected to the second impurity region 124. The
contact plug may include metal and/or polysilicon.
[0052] A wiring 150 inputting or outputting electric signals to the
second impurity region 124 may be formed on the contact plug 148.
The wiring 150 may include a metal having lower resistance. The
wiring 150 may have a linear shape extending along the second
direction.
[0053] The DRAM device including the vertical pillar transistor may
be operated without an additional capacitor in each cell by storing
data in a channel region of the vertical pillar transistor. For
example, a threshold voltage may be changed by injecting holes into
the channel region with ion impacts or an avalanche effect.
Accordingly, data may be stored in each cell and each cell may be
sensed for reading the data.
[0054] The charge storage pattern may be formed in the gate
insulation structure. A difference between a threshold voltage when
data "0" may be stored in a cell and a threshold voltage when data
"1" may be stored in a cell becomes sufficiently large by injecting
charges into the charge storage pattern. The charge storage pattern
may not be used for directly storing data but adjusts the
difference between threshold voltages according to data stored in
the vertical pillar transistor. The DRAM device does not require an
additional capacitor and may include only one vertical pillar
transistor per cell. As a result, the DRAM device may be highly
integrated.
[0055] A method of operating the DRAM device in FIG. 1 will be
described. A negative charge may be injected into charge storage
patterns of the vertical pillar transistors, respectively. A memory
window of each vertical pillar transistor may be increased by the
injection of the negative charge. The injection process may be
prior to reading data recorded in the DRAM device. The injection
process may include a Fowler-Nordheim tunneling.
[0056] For example, the injection process may be prior to an
initial operation of the DRAM device. In example embodiments, the
negative charge may be injected into the charge storage patterns
during the manufacture of the vertical pillar transistor.
Alternatively, the negative charge may be injected into the charge
storage patterns before or after recording data of the DRAM device.
Alternatively, the negative charge may be injected into the charge
storage patterns before reading data of the DRAM device.
Programming data (for example, data "1") may be input into each
cell of the DRAM by applying a first voltage, a second voltage and
a third voltage to a gate electrode, a first impurity region and a
second impurity region, respectively. The first voltage may be
larger than the second voltage. The second voltage may be larger
than the third voltage. Accordingly, holes may be accumulated in a
semiconductor pattern opposite the gate. When the holes are
accumulated in the semiconductor pattern, a threshold voltage
becomes small.
[0057] Erasing data (for example, data "0") input into each cell of
the DRAM by applying a fourth voltage, a fifth voltage and a sixth
voltage to a gate electrode, a first impurity region and a second
impurity region, respectively. The fourth voltage has a polarity
opposite the fifth and sixth voltages. Accordingly, holes may be
removed from the semiconductor pattern opposite the gate. When the
holes are removed from the semiconductor pattern, a threshold
voltage may rise.
[0058] The stored data may be read by applying a seventh voltage
and an eighth voltage to the first impurity region. For example,
data in each cell may be read by sensing threshold voltages of the
vertical pillar transistor corresponding to each cell. The memory
window may be increased by charges stored in the charge storage
pattern. The above operating method may be applied to a DRAM device
having a structure in which one unit cell includes one transistor
and a charge storage pattern may be included in a gate insulation
structure of the transistor.
[0059] FIGS. 2-12 are cross-sectional views illustrating a method
of manufacturing a DRAM device in FIG. 1. Referring to FIG. 2, a
substrate 100 having an active region 100a and an isolation layer
102 may be prepared. The substrate 100 may include single
crystalline semiconductor material. For example, the substrate 100
may include single crystalline silicon. A trench 102a may be formed
at an upper portion of the substrate 100 and the trench 102a may be
filled with the isolation layer 102. Accordingly, the active region
100a and the isolation layer 102 having a shape extending along a
first direction may be formed. The active region 100a and the
isolation layer 102 may be alternatively formed at an upper portion
of the substrate 100.
[0060] Impurities may be implanted in the substrate 100 to form a
first impurity region 104. For example, the impurities may include
n-type impurities. Alternatively, the impurity region may be formed
before forming the isolation layer 102. In example embodiments,
impurities implanted in a portion of the substrate may be removed
by the shallow trench isolation process, so that the first impurity
region 104 may only be formed on the active region.
[0061] Referring to FIG. 3, a pad insulation layer 106, a first
sacrificial layer 108, a first hard mask layer 110 and a second
sacrificial layer 112 may be sequentially formed on the substrate
100. The first sacrificial layer 108 has an etching selectivity
with respect to the first hard mask layer 110 and the pad
insulation layer 106. When the first sacrificial layer 108 is
removed, the first hard mask layer 110 and the pad insulation layer
106 may not be removed. Accordingly, for example, the first hard
mask layer 110 and the pad insulation layer 106 may be formed using
the same material. For example, the first hard mask layer 110 and
the pad insulation layer 106 may be formed by depositing silicon
nitride. The first and second sacrificial layers may be formed by
depositing silicon oxide.
[0062] Referring to FIG. 4, a photoresist layer (not illustrated)
may be coated on the second sacrificial layer 112. The photoresist
layer may be patterned to form a first photoresist pattern (not
illustrated). A portion exposed by the first photoresist pattern
has a shape substantially the same as a single crystalline
semiconductor pattern of pillar shape. The first photoresist
patterns may be disposed in a predetermined or given interval.
[0063] The second sacrificial layer 112, the first hard mask layer
110, the first sacrificial layer and the pad insulation layer 106
may be sequentially etched to form a first opening 114. The first
opening 114 has a contact hole shape. The first opening 114 may be
filled with an amorphous silicon layer (not illustrated) or a
polysilicon layer. The filling process may include a chemical vapor
deposition (CVD) process. When the amorphous silicon layer is
formed in the first opening 114, p-type impurities may be implanted
in the amorphous silicon layer by in-situ. Accordingly, impurities
may be implanted in a channel region of a vertical pillar
transistor. The amorphous silicon layer may be polished to form a
preliminary semiconductor pattern 116 until an upper face of the
second sacrificial layer 112 is exposed.
[0064] Referring to FIG. 5, a phase of the preliminary
semiconductor pattern 116 may be transitioned to a single
crystalline semiconductor pattern 118 including silicon. The phase
transition process forming the single crystalline semiconductor
pattern 118 may include a LEG process or a solid phase epitaxial
(SPE) process. A heat treatment for generating the phase transition
may be performed using a laser or a furnace. The laser used in the
LEG process may have an energy density sufficient to melt the
preliminary semiconductor pattern 116. When a crystal structure of
the preliminary semiconductor pattern 116 is converted into single
crystalline silicon, the single crystalline semiconductor pattern
118 may shrink to have a height smaller than a height of the
preliminary semiconductor pattern 116.
[0065] Referring to FIG. 6, the single crystalline semiconductor
pattern 118 and the second sacrificial layer 112 may be polished to
expose the first hard mask layer 110. The second sacrificial layer
112 may be completely removed by the polishing process. The single
crystalline semiconductor pattern 118 has an upper face level to
that of the first hard mask layer 110.
[0066] In example embodiments, impurities may be implanted in an
exposed portion of the single crystalline semiconductor pattern 118
to form a second impurity region 124 (see FIG. 8) after forming the
single crystalline semiconductor pattern 118. Forming a protective
layer on the single crystalline semiconductor pattern 118 and the
first hard mask layer 110 may be further performed after forming
the second impurity region 124 (see FIG. 8). Alternatively, the
second impurity region 124 may be formed by the following
processes.
[0067] FIGS. 7 to 11 are cross-sectional views taken along a
direction different from a direction of FIGS. 3 to 6. Referring to
FIG. 7, a photoresist layer (not illustrated) may be formed on the
first hard mask layer 110 and the single crystalline semiconductor
pattern 118. The photoresist layer may be patterned to form a
second photoresist layer pattern (not illustrated) having a linear
shape. The second photoresist layer pattern extends along a second
direction substantially perpendicular to the first direction. The
second photoresist layer pattern covers the single crystalline
semiconductor pattern 118.
[0068] The first hard mask layer 110 may be anisotropically etched
using the second photoresist layer pattern as an etching mask. The
first sacrificial layer 108 below the first hard mask layer 110 may
be partially etched. Alternatively, the etching process
anisotropically etching the first sacrificial layer 108 may not be
performed.
[0069] The first hard mask pattern 110a may be formed by the
anisotropic etching process. The first hard mask pattern 110a
encloses a sidewall of the single crystalline semiconductor pattern
118 and has a linear shape extending along the second direction.
The first hard mask patterns 110a may be spaced apart from each
other in the first direction. A first sacrificial layer pattern
108a may be formed under the first hard mask pattern 110a.
[0070] Referring to FIG. 8, the first sacrificial layer pattern
108a may be removed by an isotropic etching process. The first hard
mask pattern 110a enclosing an upper sidewall of the single
crystalline semiconductor pattern 118 may remain. Gaps 119 may be
interposed between the first hard mask pattern 110a and substrates,
and the adjacent first hard mask patterns 110a. The hard mask
pattern 110a may not be supported by a layer thereunder. The first
hard mask pattern 110a has a linear shape enclosing the single
crystalline semiconductor pattern 118. Accordingly, a sidewall of
the single crystalline semiconductor pattern 118 may be partially
exposed under the first hard mask pattern 110a. A gate may be
formed on the exposed portion of the sidewall of the single
crystalline semiconductor pattern 118.
[0071] Referring to FIG. 9, the exposed sidewall of the single
crystalline semiconductor pattern 118 may be thermally oxidized to
form a gate insulation layer 120a. The gate insulation layer 120a
may include silicon oxide formed by a thermal oxidation process. As
illustrated, the gate insulation layer 120a may be formed along a
sidewall of the single crystalline semiconductor pattern 118, a
first hard mask pattern 110a and an upper face of the pad
insulation layer 106. Alternatively, the gate insulation layer 120a
may have a ring shape enclosing the exposed sidewall of the single
crystalline semiconductor pattern 118.
[0072] A charge storage layer 120b may be formed on the gate
insulation layer 120a. The charge storage layer 120b may include
material having charge trap sites. For example, the charge storage
layer 120b may include silicon nitride and/or metal oxide having
higher permittivity. A blocking dielectric layer 120c may be formed
on the charge storage layer 120b. The blocking dielectric layer
120c may be formed using silicon oxide and/or metal oxide having
higher permittivity.
[0073] After forming the gate insulation layer 120a, the charge
storage layer 120b and the blocking dielectric layer 120c, gaps 122
between the first hard mask pattern 110a and the substrate 100, and
between the adjacent first hard mask patterns 110a still remain.
For example, the gate insulation layer 120a, the charge storage
layer 120b and the blocking dielectric layer 120c are sufficiently
thin.
[0074] Referring to FIG. 10, a polysilicon layer (not illustrated)
may be formed to fill the gaps between the first hard mask pattern
110a and the substrate 100, and between the adjacent first hard
mask patterns 110a. The polysilicon layer may be doped with n-type
impurities in in-situ when forming the polysilicon layer. The
polysilicon layer may be polished to exposed an upper face of the
first hard mask pattern 110a. A polysilicon layer pattern having a
surface level to the first hard mask pattern 110a may be formed by
the polishing process. An upper face of the single crystalline
semiconductor pattern 118 may be exposed. The first hard mask
pattern 110a serves as a polish stop layer in the polishing
process. When the first hard mask pattern 110a is exposed, the
polishing process may be stopped, so that a dicing phenomenon may
be prevented or reduced.
[0075] Impurities may be implanted in an upper face of the single
crystalline semiconductor pattern 118 to form a second impurity
region 124. Because the polysilicon layer pattern may be disposed
on sidewalls of the single crystalline semiconductor pattern 118,
only the upper face of the single crystalline semiconductor pattern
118 may be exposed. Thus, a depth of the second impurity region 124
may be adjusted when forming the second impurity region 124.
[0076] The polysilicon layer pattern may be etched using the first
hard mask pattern 110a as an etching mask to form a gate electrode
122a. A photoresist pattern (not illustrated) covering the first
hard mask pattern 110a and the single crystalline semiconductor
pattern 118 may be further formed. The gate electrode 122a has a
linear shape extending along the second direction and encloses
sidewalls of the single crystalline semiconductor pattern 118.
[0077] When the gate electrode 122a may be formed, the gate
insulation layer 120a, the charge storage layer 120b and the
blocking dielectric layer 120c on the first hard mask pattern 110a
and the substrate 100 may be removed together to form the gate
insulation structure 121 including a gate insulation layer pattern
121a, the charge storage layer pattern 121b and the blocking
dielectric layer pattern 121c. A vertical pillar transistor of each
DRAM cell may be formed. The single crystalline semiconductor
pattern 118 serves as a channel region. The channel region has a
floating body shape. Data may be stored in the channel region.
[0078] Referring to FIG. 11, the pad insulation layer 106 may be
etched to form a pad insulation layer pattern 106a exposing the
first impurity region 104. Accordingly, sidewalls of the gate
electrode 122a, the first hard mask pattern 110a, the gate
insulation structure 121 and the pad insulation layer pattern 106a
may be exposed. An insulation layer (not illustrated) may be formed
on the exposed substrate 100, the first hard mask pattern 110a and
the exposed sidewalls of the gate electrode 122a, the first hard
mask pattern 110a, the gate insulation structure 121 and the pad
insulation layer pattern 106a. The insulation layer may include
silicon nitride. The insulation layer may be anisotropically etched
to form a spacer 126 on the sidewalls of the gate electrode 122a,
the first hard mask pattern 110a, the gate insulation structure 121
and the pad insulation layer pattern 106a.
[0079] A gap between the spacers may be filled with a first
insulating interlayer 128. The first insulating interlayer 128
covers the first hard mask pattern 110a. The first insulating
interlayer 128 may be formed by depositing silicon oxide. The first
insulating interlayer 128 may be partially etched to form a contact
hole (not illustrated) exposing the active region of the substrate
100. The contact hole may be filled with a conductive layer. The
conductive layer may include polysilicon doped with impurities or
metal. The conductive layer may be polished to form a pad contact
132 until a surface of the first insulating interlayer 128 is
exposed.
[0080] A second insulating interlayer 134 may be formed on the pad
contact 132 and the first hard mask pattern 110a. The second
insulating interlayer 134 may be formed by depositing silicon
oxide. The second insulating interlayer 134 may be partially etched
to form a second contact hole (not illustrated) partially exposing
the pad contact 132. The second contact hole may be filled with a
conductive layer. The conductive layer may be polished to form a
direct contact 138 until the second insulating interlayer 134 is
exposed.
[0081] A conductive layer for a bit line may be formed on the
direct contact 138. The conductive layer for a bit line may be
formed by depositing polysilicon, metal and/or metal silicide.
These may be used in alone or a combination thereof. A second hard
mask pattern 142 may be formed on the conductive layer for a bit
line. The second hard mask pattern 142 may be formed by depositing
silicon nitride and patterning the silicon nitride. The second hard
mask pattern 142 has a linear shape opposite the direct contact and
extending along the first direction.
[0082] The conductive layer for a bit line may be anisotropically
etched using the second hard mask pattern 142 as an etching mask to
form a bit line 140. The bit line 140 may be disposed between the
adjacent single crystalline semiconductor patterns 118 parallel to
each other in the first direction.
[0083] Referring to FIG. 12, an insulation layer for a spacer 144
may be formed on sidewalls of the bit line 140 and the second hard
mask pattern 142, and a surface of the second insulating interlayer
134. The insulation layer for a spacer may be anisotropically
etched to form the spacer 144 on the sidewalls of the bit line 140
and the second hard mask pattern 142. The spacer 144 may include
silicon nitride.
[0084] A gap between the spacers 144 may be filled with a third
insulating interlayer 146. The third insulating interlayer may
covers the bit lines 140. The third insulating interlayer may be
formed by depositing silicon oxide.
[0085] Referring to FIG. 1 again, portions of the first to third
insulating interlayer 128, 134 and 146 between the bit lines 140
may be anisotropically etched to form a contact hole (not
illustrated) exposing a second impurity region 124. The contact
hole may be filled with a conductive material. The conductive
material may be polished to form a contact plug 148 until the third
insulating interlayer 146 may be exposed. The conductive material
may include metal such that a resistance of the contact plug 148
may be reduced. Alternatively, the conductive material may include
polysilicon.
[0086] A wiring 150 may be formed on the contact plug 148. The
wiring may include metal. A metal layer may be formed on the
contact plug 148. The metal layer may be patterned to form the
wiring 150. The wiring 150 has a linear shape extending along the
second direction and inputs electric signals to the contact plug
148.
[0087] The DRAM device manufactured by the above processes does not
have a capacitor. Data may be recorded by injecting into or erasing
holes from a pillar pattern of a single crystalline semiconductor
using a floating body effect. Thus, processes for forming a
capacitor may be not needed so that the DRAM may be manufactured by
simpler processes.
[0088] FIG. 13 is a graph showing each of drain currents of a DRAM
device including a vertical pillar transistor in accordance with
example embodiments according to charges stored in a charge storing
pattern. When a charge was stored in a charge storage pattern and
programming data was input into a channel region of a vertical
pillar transistor, a drain current according to a voltage applied
to the drain was measured with applying about 0 V to a gate
electrode and the result was represented by reference numeral 200.
When a charge was stored in a charge storage pattern and an erasing
data was input in a channel region of a vertical pillar transistor,
a drain current according to a voltage applied to the drain was
measured with applying about 0 V to a gate electrode and the result
was represented by reference numeral 202. Programming voltage for
storing the charge was about 16V.
[0089] When a charge was not stored in a charge storage pattern and
a programming data was input in a channel region of a vertical
pillar transistor, a drain current according to a voltage applied
to the drain was measured by applying about 0 V to a gate electrode
and the result was represented by reference numeral 204. When a
charge was not stored in a charge storage pattern and erasing data
was input in a channel region of a vertical pillar transistor, a
drain current according to a voltage applied to the drain was
measured with applying about 0 V to a gate electrode and the result
was represented by reference numeral 206.
[0090] As illustrated in FIG. 13, when a charge was stored in the
charge storage pattern, the vertical pillar transistor has a memory
window of about 2.3V. For example, when a voltage applied to a gate
electrode was fixed to a predetermined or given voltage, a
difference between a drain voltage for obtaining a specific drain
current in a condition where data was stored in the vertical pillar
transistor and a drain voltage for obtaining the specific drain
current in a condition where data was not stored in the vertical
pillar transistor may be about 2.3V.
[0091] On the other hand, as shown in the reference numerals 204
and 206, when a charge was not stored in a charge storage pattern,
drain currents according to drain voltages in the same conditions
as those of the reference numerals 200 and 202 were measured. In
example embodiments, a memory window was smaller. As described
above, as a charge is stored in the charge storage pattern or not,
the memory window has different values under the same conditions.
As a result, a charge may be stored in the charge storage pattern,
so that a difference between threshold voltages according to data
recorded in the vertical pillar transistor becomes larger.
[0092] FIG. 14 is a graph each of drain currents of a DRAM device
including a vertical pillar transistor in accordance with example
embodiments according to programming conditions storing charges in
a charge storing pattern. Reference numerals 212a, 214a and 216a
represent Vd-Id curves measured when a programming data may be
input into a channel region of a vertical pillar transistor,
respectively, with changing programming conditions for storing a
charge into a charge storage pattern. Reference numerals 212b, 214b
and 216b represent curves measured when erasing data may be input
into a channel region of a vertical pillar transistor,
respectively, with changing programming conditions for storing a
charge into a charge storage pattern.
[0093] A programming voltage of about 10V for storing a charge was
applied to a gate electrode of a vertical pillar transistor used in
the curves represented by reference numerals 212a and 212b. A
programming voltage of about 12V for storing a charge was applied
to a gate electrode of a vertical pillar transistor used in the
curves represented by reference numerals 214a and 214b. A
programming voltage of about 14V for storing a charge was applied
to a gate electrode of a vertical pillar transistor used in the
curves represented by reference numerals 216a and 216b.
[0094] Reference numeral 210a represents a Vd-Id curve measured
when programming data may be input into a channel region of a
vertical pillar transistor and a charge may not be stored in a
charge storage pattern. Reference numeral 210b represents a Vd-Id
curve measured when erasing data may be input into a channel region
of a vertical pillar transistor and a charge may not be stored in a
charge storage pattern. Referring to FIG. 14, when the programming
voltage is increased, the memory window rises. Thus, a desirable
memory window may be obtained by adjusting the programming
voltage.
[0095] According to example embodiments, the vertical pillar
transistor may include only one transistor per cell and has a
sufficient read sensing margin. Thus, the vertical pillar
transistor may be used as a memory device in various electronic
apparatuses having a higher integration degree.
[0096] The foregoing is illustrative of example embodiments and is
not to be construed as limiting thereof. Although a few example
embodiments have been described, those skilled in the art will
readily appreciate that many modifications are possible in the
example embodiments without materially departing from the novel
teachings and advantages of example embodiments. Accordingly, all
such modifications are intended to be included within the scope of
example embodiments as defined in the claims. In the claims,
means-plus-function clauses are intended to cover the structures
described herein as performing the recited function and not only
structural equivalents but also equivalent structures. Therefore,
it is to be understood that the foregoing is illustrative of
various example embodiments and is not to be construed as limited
to the specific example embodiments disclosed, and that
modifications to the disclosed example embodiments, as well as
other example embodiments, are intended to be included within the
scope of the appended claims.
* * * * *