U.S. patent application number 13/122956 was filed with the patent office on 2011-08-11 for polishing pad having a tricot mesh faberic as a base.
Invention is credited to Myung Mook Kim.
Application Number | 20110195646 13/122956 |
Document ID | / |
Family ID | 42101051 |
Filed Date | 2011-08-11 |
United States Patent
Application |
20110195646 |
Kind Code |
A1 |
Kim; Myung Mook |
August 11, 2011 |
POLISHING PAD HAVING A TRICOT MESH FABERIC AS A BASE
Abstract
Disclosed herein is a polishing pad having a substrate woven in
a network form, capable of adsorbing dust generated during
polishing of an object into meshes formed in the substrate to
discharge the adsorbed dust to an external dust suction system or
receive the dust in the meshes in a pocket form, in turn improving
polishing efficiency of the polishing pad. In addition, polishing
yarns are solidly adhered to a face part with relatively wider area
on one side of the substrate so as to enhance durability of the
pad. The polishing pad according to an exemplary embodiment
includes a tricot mesh fabric 10 having a flat face part 12 formed
by densely weaving fiber yarns in a network form, as well as meshes
14 formed between such flat face parts 12, a polishing yarn layer
20 having polishing yarns adhered to the flat face part on one side
of the tricot mesh fabric 10 by an adhesive, and a top layer 30
consisting of a Velcro fabric attached to the other side of the
tricot mesh fabric 10, so as to detachably combine the polishing
pad with a hook type male Velcro component formed on a surface of a
polishing pad holder mounted on a power tool (such as a
sander).
Inventors: |
Kim; Myung Mook; (Daejeon,
KR) |
Family ID: |
42101051 |
Appl. No.: |
13/122956 |
Filed: |
September 10, 2009 |
PCT Filed: |
September 10, 2009 |
PCT NO: |
PCT/KR09/05130 |
371 Date: |
April 6, 2011 |
Current U.S.
Class: |
451/532 |
Current CPC
Class: |
B24D 11/02 20130101;
B24B 37/24 20130101; B24B 37/22 20130101 |
Class at
Publication: |
451/532 |
International
Class: |
B24D 11/00 20060101
B24D011/00 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 10, 2008 |
KR |
20-2008-0013538 |
Claims
1. A polishing pad based on a tricot mesh fabric as a substrate,
comprising: the tricot mesh fabric 10 having a flat face part 12
formed by densely weaving fiber yarns in a network form, as well as
meshes 14 formed between such flat face parts 12; a polishing yarn
layer 20 having polishing yarns adhered to the flat face part on
one side of the tricot mesh fabric 10 by an adhesive; and a top
layer 30 consisting of a Velcro fabric attached to the other side
of the tricot mesh fabric 10.
2. The polishing pad according to claim 1, wherein the top layer 30
is formed using at least one selected from a fabric, a synthetic
resin sheet and an attachable or non-attachable paper.
3. The polishing pad according to claim 2, wherein the top layer 30
is formed using a Velcro fabric.
4. A polishing pad based on a tricot mesh fabric as a substrate,
comprising: the tricot mesh fabric 10 having a flat face part 12
formed by densely weaving fiber yarns in a network form, as well as
meshes 14 formed between such flat face parts 12; and a polishing
yarn layer 20 having polishing yarns adhered to the flat face parts
on top and bottom sides of the tricot mesh fabric 10 by an
adhesive.
Description
TECHNICAL FIELD
[0001] The present invention relates to a polishing pad, more
particularly, to a polishing pad having a tricot mesh fabric as a
base material (or substrate), wherein the tricot mesh fabric
consists of fiber yarns densely woven in a network form to form a
flat face part and meshes formed between such flat face parts, and
polishing yarns adhered to the flat face part on either or both
sides of the tricot mesh fabric.
BACKGROUND ART
[0002] In manufacture of wood furniture or other wood products, a
rough surface of the furniture or wood product is generally
subjected to polishing and painting. For the polishing process, the
rough surface is usually treated using sandpaper.
[0003] The sandpaper is used for surface polishing not only wood
but also stone, synthetic resin, metal materials, etc. For brevity,
the following description will be given of wood polishing.
[0004] Typical sandpaper consists of a paper or fabric having
abrasive sand adhered to a surface thereof and is fixed into a
vibration type power sander for use. Alternatively, after attaching
a loop type female Velcro fabric to a rear side of a paper or
fabric having abrasive sand adhered to a surface thereof, the
prepared paper or fabric is used by detachably combining the female
Velcro component of the paper or fabric with a male Velcro
component placed on a polishing pad holder of an orbital sander.
However, when such existing sandpaper (that is, polishing pad) is
used to polish a surface of wood furniture, fine dust is generated
and floats in air or accumulates on a surface of an object to be
processed, in turn deteriorating workplace environment and
adversely affecting worker health, especially, the respiratory
system and eyes of the worker. Consequently, some problems
including decreased workability and tendency of workers to avoid
polishing work have been encountered.
[0005] In recent years, an apparatus for vacuum inhalation and
removal of dust generated during polishing in order to prevent
dispersion of the dust in air, wherein a polishing pad holder of a
sander has suction holes perforated to adsorb dust and the
polishing pad has holes corresponding to the suction holes of the
holder, has been developed and used. Where using a polishing pad
made of paper or fabric material having perforated holes, the
polishing pad may become torn due to punching work and a punched
part around the hole may often cause an undesirable finish, that
is, scratches on a surface of an object to be polished.
Furthermore, the dust becomes trapped between apertures of
polishing yarns adhered to the surface of the polishing pad, thus
drastically deteriorating polishing performance of the polishing
pad. As a result, polishing efficiency may be considerably
decreased.
[0006] Korean Utility Model Reg. No. 436,999 describes a polishing
pad developed by the present inventors in order to solve such
problems described above, wherein polishing yarns are adhered to
one side of a net body having fiber yarns woven in a network form
while a female Velcro component is integrated with the other side
of the net body.
[0007] The foregoing Utility Model Reg. No. 436,999 may attain
excellent effects of increasing polishing efficiency and preventing
dust scattering by suctioning the dust generated during polishing
into meshes of the net body. However, since the polishing yarn is
adhered to a surface of a fine fiber thread in the net body, the
polishing yarn is readily detached by resistance generated during
polishing, thus deteriorating durability of the polishing pad. In
addition, where the proposed polishing pad is employed in
alternative uses other than dust inhalation, the dust generated
during polishing may become trapped in fine meshes with a very
small size, thus causing difficulties in shaking the dust off as
well as deterioration of polishing performance.
Technical Problem
[0008] The present invention is directed to solving conventional
problems described above and an object of the present invention is
to provide a polishing pad with improved texture, characterized in
that the polishing pad may replace any general polishing pad or a
belt type polishing pad as well as a dust inhalation system, dust
generated during polishing may be rapidly removed from a polishing
face of the polishing pad, in turn enhancing polishing efficiency,
and the polishing pad may be repeatedly used for a long time.
Technical Solution
[0009] In order to accomplish the above purpose, an exemplary
embodiment of the present invention is to provide a polishing pad
comprising: a tricot mesh fabric having a flat face part formed by
densely weaving fiber yarns in a network form, as well as meshes
formed between such flat face parts; a polishing yarn layer having
polishing yarns adhered to the flat face part on either side of the
tricot mesh fabric by an adhesive; and a Velcro fabric attached to
the other side of the tricot mesh fabric, so as to detachably
combine the polishing pad with a hook type male Velcro component
placed on a surface of a polishing pad holder mounted on a power
tool (such as a sander).
[0010] According to a preferred embodiment of the present
invention, after forming an epoxy coating layer on the flat face
part at one side of the tricot mesh fabric to improve adhesion to
the polishing yarn, the polishing yarn is adhered thereto. Also, a
top coating layer comprising phenol resin and an anti-fouling
coating layer comprising calcium stearate are formed on a surface
of the polishing yarn layer.
[0011] Another exemplary embodiment of the present invention is to
provide a double-sided polishing pad, comprising: a tricot mesh
fabric having a flat face part formed by densely weaving fiber
yarns in a network form, as well as meshes formed between such flat
face parts; and a polishing yarn layer having polishing yarns
adhered to the flat face parts on both sides of the tricot mesh
fabric by an adhesive.
Advantageous Effects
[0012] A polishing pad of the present invention has polishing yarns
adhered to a flat and relatively wide face part of a tricot mesh
fabric as a substrate so as to have excellent adhesion, in turn
exhibiting improved durability sufficient to minimize detachment of
the polishing yarns. Such flat face part may occupy at least 50% of
a total area of the polishing pad, thus increasing polishing
performance. Dust generated during polishing is collected into an
external dust suction system through meshes formed in the tricot
mesh fabric wherein the mesh has relatively large depth and area,
or carried in pocket type meshes. Consequently, the inventive
polishing pad has advantages in that the dust does not remain on a
polishing face of the polishing pad so as to improve polishing
performance and the dust is easily removed from the meshes after
polishing, thereby enabling repetitive use of the polishing
pad.
DESCRIPTION OF THE DRAWINGS
[0013] The above and other objects, features and other advantages
of the present invention will be more clearly understood from the
following detailed description taken in conjunction with the
accompanying drawings, in which:
[0014] FIG. 1 is a perspective view and a partially enlarged view
showing a polishing pad according to an exemplary embodiment of the
present invention;
[0015] FIG. 2 is an enlarged detail view showing main components of
the polishing pad according to the exemplary embodiment of the
present invention;
[0016] FIG. 3 is a micrograph showing a tricot mesh fabric used as
a substrate of a polishing pad according to an exemplary embodiment
of the present invention;
[0017] FIG. 4 is a cross-sectional view illustrating a laminate
structure of the polishing pad according to the exemplary
embodiment of the present invention;
[0018] FIG. 5 is a cross-sectional view illustrating a laminate
structure of the polishing pad according to anther exemplary
embodiment of the present invention; and
[0019] FIG. 6 is a micrograph showing a real scale polishing pad
according to the present invention.
BEST MODE
[0020] Details of the above object and other features of the
present invention will be more clearly understood from the
following detailed description.
[0021] FIGS. 1 to 4 are views or full size photographs illustrating
a polishing pad according to an exemplary embodiment of the present
invention. The inventive polishing pad 1 comprises: a tricot mesh
fabric 10 having a flat face part 12 formed by densely weaving
fiber yarns in a network form, as well as meshes 14 formed between
such flat face parts 12; a polishing yarn layer 20 having polishing
yarns adhered to the flat face part on one side of the tricot mesh
fabric 10 by an adhesive; and a top layer 30 consisting of a Velcro
fabric attached to the other side of the tricot mesh fabric 10.
[0022] The top layer 30 made of a typical Velcro fabric (in
general, a loop type female Velcro component) in the inventive
polishing pad 1 is detachably combined with a hook type male Velcro
component formed on a surface of a polishing pad holder fixed to a
power tool (not shown).
[0023] However, the top layer used in the present invention is not
particularly restricted to such Velcro fabrics. The polishing pad
of the present invention be fabricated by attaching a fabric or
synthetic resin sheet with favorable durability or an
attachable/non-attachable paper to an upper side of a substrate
(that is, a tricot mesh fabric) having polishing yarns adhered
thereto and cutting the laminate into a long band shape, so as to
form a belt type polishing pad. Alternatively, the inventive
polishing pad may be fabricated into a sandpaper type polishing
pad. It is obviously understood that such modifications fall within
the scope of the present invention described below.
[0024] The tricot mesh fabric 10 according to preferred embodiments
of the present invention is a well known fabric used in
manufacturing internal linings of sports wear requiring desired
ventilation, wherein the fabric has a specific texture configured
of a flat face part 12 with relatively larger width (ranging from 1
to 3 mm) formed by densely weaving natural or synthetic fiber
yarns, as well as independent and elliptical meshes 14 with
relatively large diameter (ranging from 1 to 3 mm) formed between
such flat face parts 12, as shown in the micrograph of FIG. 3.
[0025] The flat face part 12 may be at least 50% of a total area of
the polishing pad. Accordingly, a real polishing area of a
polishing yarn layer attached to the flat face part 12 may occupy
at least 50% of the total area of the polishing pad, thereby
enhancing polishing performance of the polishing pad.
[0026] Woven texture of the tricot mesh fabric according to the
present invention is not particularly restricted to those shown in
accompanying drawings, instead being woven in various forms and
having meshes 14 with different sizes.
[0027] The tricot mesh fabric 10 according to the foregoing
embodiments of the present invention has a fabric thickness of
about 0.3 to 0.5 mm, therefore, a depth of each mesh 14 may range
from at least 0.3 to 0.5 mm. The polishing yarn layer 20 is formed
by adhering polishing yarns to the flat face part 12 on one side of
the tricot mesh fabric 10, followed by formation of a top coating
layer above the polishing yarn layer 20. Accordingly, the depth of
the mesh 14 may be deeper than a thickness of those layers, in turn
increasing a volume of the mesh 14. Consequently, such meshes 14
may sufficiently carry or receive dust generated during
polishing.
[0028] A first benefit of the present invention is that the
polishing yarns are attached to the entirety of the flat face part
12 of the tricot mesh fabric 10, in turn being stably combined with
the flat face part 12 having relatively wider area. Compared to a
conventional polishing pad having a typical net body as a substrate
wherein polishing yarns are adhered to outer sides of fine fiber
threads and entails a problem in that such combination of polishing
yarns with fine fiber threads is easily collapsed by friction
applied to the polishing yarns, the polishing yarns of the
inventive polishing pad form a solid polishing yarn layer and are
not readily detached during polishing, thereby favorably improving
durability of the polishing pad.
[0029] Another benefit of the present invention is that a region of
the polishing pad, to which polishing yarns are adhered, occupies
at least 50% of a total area of the polishing pad so as to improve
polishing performance of the polishing pad, in turn considerably
reducing a time required for polishing.
[0030] An additional benefit of the present invention is that a
size of each mesh 14 is relatively large so that a volume of the
mesh is sufficiently increased, thereby allowing easy discharge of
dust through the mesh to an external dust suction system during
polishing, and shaking off the dust when using the inventive pad as
a general polishing pad without suction behavior, compared to a net
body described in Korean Utility Model Reg. No. 436,999 which has a
dense gap between fiber yarns of the net body, causing decrease in
mesh size and volume as well as difficulties in removing dust when
the dust enters into the gap, thus considerably deteriorating
polishing performance and preventing repeated use thereof.
[0031] Accordingly, the present invention has various advantages
such as improved polishing performance, minimum dust scattering
during polishing and repeated use of a polishing pad.
[0032] A process for attachment of polishing yarns used in the
present invention is substantially the same as described in Korean
Utility Model Reg. No. 436,999 by the present applicant, wherein an
adhesive may be applied to combine the polishing yarns with a
substrate after forming an epoxy coating layer on the flat face
part 12 of the tricot mesh fabric 10 as the substrate in order to
improve adhesion. Furthermore, a top coating layer comprising
phenol resin is formed above the polishing yarns and an
anti-fouling coating layer comprising calcium stearate is
preferably formed above the top coating layer.
[0033] FIG. 5 illustrates a double-sided polishing pad according to
another exemplary embodiment of the present invention, which
comprises a tricot mesh fabric 10 having a flat face part 12 formed
by densely weaving fiber yarns in a network form, as well as meshes
14 formed between such flat face parts 12; and a polishing yarn
layer 20 having polishing yarns adhered to the flat face parts on
top and bottom sides of the tricot mesh fabric 10 by an
adhesive.
[0034] The polishing yarn layer in the foregoing embodiment is
formed by the same procedures as described in the above first
embodiment and, therefore, a detailed description thereof would be
omitted for brevity.
[0035] For the double-sided polishing pad fabricated according to
the above embodiment, both the top and bottom sides of the tricot
mesh fabric 10 on which the polishing yarn layers 20 are formed can
be used, thus enabling maximum polishing work with minimum cost and
effort. Therefore, such double-sided polishing pad may be suitably
used for manual tasks or a clip type polishing tool equipped with a
polishing pad.
[0036] FIG. 6 is an enlarged micrograph showing a real scale
polishing pad having polishing yarns adhered to a flat face part 12
except for meshes 14 of a tricot mesh fabric. From the photograph,
it can be seen that a surface of a polishing yarn layer 20 is
rough. Surface roughness of the polishing yarn layer 20 may be
desirably adjusted by selecting a particle size of the polishing
yarn.
* * * * *