U.S. patent application number 12/810137 was filed with the patent office on 2010-10-28 for gas supply structure.
This patent application is currently assigned to TOYOTA JIDOSHA KABUSHIKI KAISHA. Invention is credited to Akinori Ichikawa, Yasuyuki Iida.
Application Number | 20100269956 12/810137 |
Document ID | / |
Family ID | 40824109 |
Filed Date | 2010-10-28 |
United States Patent
Application |
20100269956 |
Kind Code |
A1 |
Iida; Yasuyuki ; et
al. |
October 28, 2010 |
GAS SUPPLY STRUCTURE
Abstract
A gas supply structure includes a nozzle having a gas supply
passage, and a receptacle having an insertion hole into which the
nozzle is inserted to achieve connection, wherein the receptacle is
provided with a first O-ring that is provided in the vicinity of
the insertion hole for the purpose of gas sealing, and a second
O-ring that is provided further downstream the gas supply path than
the first O-ring for the purpose of gas sealing, a portion of the
second O-ring is bonded to a recessed section in the receptacle
using a bonding material, and a foreign matter removal member is
positioned closer to the insertion hole than the second O-ring. The
foreign matter removal member is provided within the receptacle so
as to partially protrude from an inner peripheral surface that
extends from the insertion hole of the receptacle.
Inventors: |
Iida; Yasuyuki; (Toyota-shi,
JP) ; Ichikawa; Akinori; (Toyota-shi, JP) |
Correspondence
Address: |
KENYON & KENYON LLP
1500 K STREET N.W., SUITE 700
WASHINGTON
DC
20005
US
|
Assignee: |
TOYOTA JIDOSHA KABUSHIKI
KAISHA
Toyota-shi
JP
|
Family ID: |
40824109 |
Appl. No.: |
12/810137 |
Filed: |
December 9, 2008 |
PCT Filed: |
December 9, 2008 |
PCT NO: |
PCT/JP2008/072348 |
371 Date: |
June 22, 2010 |
Current U.S.
Class: |
141/311R |
Current CPC
Class: |
F16L 21/03 20130101;
F16L 21/035 20130101; Y02T 90/40 20130101; Y02E 60/32 20130101;
H01M 8/04201 20130101; H01M 8/04089 20130101; Y02E 60/50 20130101;
H01M 2250/20 20130101 |
Class at
Publication: |
141/311.R |
International
Class: |
B65B 1/04 20060101
B65B001/04 |
Foreign Application Data
Date |
Code |
Application Number |
Dec 27, 2007 |
JP |
2007-336307 |
Claims
1. A gas supply structure, comprising a nozzle that supplies a gas,
a receptacle that receives supply of the gas by insertion of the
nozzle therein, an O-ring that is provided within the receptacle,
seals the nozzle and the receptacle, and slides against the nozzle
during insertion of the nozzle, and a foreign matter removal member
that is provided within the receptacle in a position closer to an
insertion hole for the nozzle than the O-ring, the gas supply
structure further comprising an insertion hole-side O-ring that is
provided in the receptacle in a vicinity of an insertion hole.
2. A gas supply structure, comprising a nozzle that supplies a gas,
a receptacle that receives supply of the gas by insertion of the
nozzle therein, an O-ring that is provided on the nozzle, seals the
nozzle and the receptacle, and slides against the receptacle during
insertion of the nozzle, and a foreign matter removal member that
is provided on the nozzle in a position closer to a tip of the
nozzle than the O-ring.
3. A gas supply structure, comprising a receptacle that receives
supply of a gas by insertion of a nozzle therein, an O-ring that is
provided within the receptacle, seals the nozzle and the
receptacle, and slides against the nozzle during insertion of the
nozzle, and a foreign matter removal member that is provided within
the receptacle in a position closer to an insertion hole for the
nozzle than the O-ring, the gas supply structure further comprising
an insertion hole-side O-ring that is provided in the receptacle in
a vicinity of an insertion hole.
4. A gas supply structure, comprising a receptacle that receives
supply of a gas by insertion of a nozzle therein, an O-ring that is
provided on the nozzle, seals the nozzle and the receptacle, and
slides against the receptacle during insertion of the nozzle, and a
foreign matter removal member that is provided on the nozzle in a
position closer to a tip of the nozzle than the O-ring.
5. (canceled)
6. The gas supply structure according to claim 2, further
comprising an insertion hole-side O-ring that is provided in the
receptacle in a vicinity of an insertion hole.
7. (canceled)
8. The gas supply structure according to claim 4, further
comprising an insertion hole-side O-ring that is provided in the
receptacle in a vicinity of an insertion hole.
9. The gas supply structure according to claim 1, further
comprising a tank for storing the gas, a filter having a small loss
coefficient disposed in an upstream side of a gas passage
connecting the receptacle to the tank, and a filter having a large
loss coefficient disposed in a downstream side of the gas
passage.
10. The gas supply structure according to claim 2, further
comprising a tank for storing the gas, a filter having a small loss
coefficient disposed in an upstream side of a gas passage
connecting the receptacle to the tank, and a filter having a large
loss coefficient disposed in a downstream side of the gas
passage.
11. The gas supply structure according to claim 3, further
comprising a tank for storing the gas, a filter having a small loss
coefficient disposed in an upstream side of a gas passage
connecting the receptacle to the tank, and a filter having a large
loss coefficient disposed in a downstream side of the gas
passage.
12. The gas supply structure according to claim 4, further
comprising a tank for storing the gas, a filter having a small loss
coefficient disposed in an upstream side of a gas passage
connecting the receptacle to the tank, and a filter having a large
loss coefficient disposed in a downstream side of the gas
passage.
13. The gas supply structure according to claim 1, wherein the
foreign matter removal member has a sliding resistance, determined
based on a pull-out load measurement, that is not less than 300 N
and not more than 500 N.
14. The gas supply structure according to claim 2, wherein the
foreign matter removal member has a sliding resistance, determined
based on a pull-out load measurement, that is not less than 300 N
and not more than 500 N.
15. The gas supply structure according to claim 3, wherein the
foreign matter removal member has a sliding resistance, determined
based on a pull-out load measurement, that is not less than 300 N
and not more than 500 N.
16. The gas supply structure according to claim 4, wherein the
foreign matter removal member has a sliding resistance, determined
based on a pull-out load measurement, that is not less than 300 N
and not more than 500 N.
Description
[0001] This is a 371 national phase application of
PCT/JP2008/072348 filed 9 Dec. 2008, claiming priority to Japanese
Patent Application No. JP 2007-336307 filed 27 Dec. 2007, the
contents of which are incorporated herein by reference.
FIELD OF THE INVENTION
[0002] The present invention relates to a gas supply structure, and
relates particularly to a gas supply structure having improved gas
sealing properties.
BACKGROUND OF THE INVENTION
[0003] Fuel cells are mounted in electric vehicles and hybrid
vehicles. Further, solid polymer fuel cells maybe used as these
fuel cells. The mechanism for electric power generation within
these solid polymer fuel cells generally involves supplying a fuel
gas such as a hydrogen-containing gas to a fuel electrode (the
anode-side electrode) and supplying an oxidant gas such as a gas
containing mainly oxygen (O.sub.2) or air to an air electrode (the
cathode-side electrode), wherein the hydrogen-containing gas
supplied to the fuel electrode is decomposed into electrons and
hydrogen ions (H.sup.+) under the action of the electrode catalyst,
and these electrons pass through an external circuit to migrate
from the fuel electrode to the air electrode, thereby generating an
electric current. Meanwhile, the hydrogen ions (H.sup.+) pass
through an electrolyte membrane sandwiched between the fuel
electrode and the air electrode to reach the air electrode, and
undergo bonding with oxygen and the electrons that have passed
though the external circuit, thus generating reaction water
(H.sub.2O).
[0004] In order to enable the fuel cell described above to be
supplied with a hydrogen-containing gas (such as hydrogen gas), the
electric vehicle or hybrid vehicle is fitted with a hydrogen fuel
storage system. This hydrogen fuel storage system comprises a
high-pressure hydrogen container, and a hydrogen filling connector
that functions as the fastening section when filling the
high-pressure hydrogen container with high-pressure hydrogen from a
dispenser at a hydrogen station.
[0005] As illustrated in FIG. 9, a conventional hydrogen filling
connector 300 comprises a nozzle for supplying hydrogen gas (which
is not shown in the figure) and a receptacle 70 having an insertion
hole 72 into which the nozzle is inserted, and is provided with an
O-ring 74 that seals the vicinity around the insertion hole 72 of
the receptacle 70. The hydrogen filling connector 300 illustrated
in FIG. 9 is a gas supply structure that can be used in the filling
of high-pressure hydrogen gas of 35 MPa, and represents a standard
shape for a hydrogen filling connector prescribed in ISO 17268.
[0006] The driving range for a vehicle in which the high-pressure
hydrogen container has been filled with 35 MPa high-pressure
hydrogen gas using the type of hydrogen filling connector 300
illustrated in FIG. 9 is approximately 350 km, which is somewhat
inadequate compared with the 500 km range typically desired in the
market. On the other hand, constraints on the vehicle package mean
increasing the size of the high-pressure hydrogen container is
impossible, and as a result, it has recently been proposed that the
filling pressure for the high-pressure hydrogen gas be increased
from 35 MPa to 70 MPa. This increase in pressure in the filling gas
has made it necessary to reduce the diameter of the nozzle of the
hydrogen filling connector, and as a result, the nozzle length has
increased, and better gas sealing properties in the vicinity of the
tip of the nozzle are now required.
[0007] For example, one example of a novel structure for a hydrogen
filling connector capable of hydrogen filling at 70 MPa that has
been proposed by a German company (hereafter referred to as "the
German proposed shape") is illustrated in FIG. 10. As illustrated
in FIG. 10, a hydrogen filling connector 400 of the German proposed
shape comprises a nozzle 10 having a gas supply passage 12, and a
receptacle 80 having an insertion hole 82 into which the nozzle 10
is inserted to achieve connection, wherein the receptacle 80 is
provided with a first O-ring 84 that is provided in the vicinity of
the insertion hole 82 for the purpose of gas sealing, and a second
O-ring 88 that is provided further downstream the gas supply path
than the first O-ring 84 for the purpose of gas sealing, and a
portion of the second O-ring 88 is bonded to a recessed section in
the receptacle 80 using a bonding material 87.
[0008] Further, one example of a novel structure for a hydrogen
filling connector capable of hydrogen filling at 70 MPa that has
been proposed by a Japanese company (hereafter referred to as "the
Japanese proposed shape") is illustrated in FIG. 11. As illustrated
in FIG. 11, a hydrogen filling connector 500 of the Japanese
proposed shape comprises a nozzle 90 having a gas supply passage
92, and a receptacle 40 having an insertion hole 42 into which the
nozzle 90 is inserted to achieve connection, wherein the receptacle
40 is provided with a first O-ring 44 that is provided in the
vicinity of the insertion hole 42 for the purpose of gas sealing,
and a second O-ring 98 that is provided at the tip of the nozzle 90
for the purpose of gas sealing, and a portion of the second O-ring
98 is bonded to a recessed section provided in the vicinity of the
tip of the nozzle 90 using a bonding material 97.
[0009] However, as the nozzle length increases, there is an
increased possibility that foreign matter adhered to the nozzle
surface may become incorporated within the gas from the nozzle tip
inside the receptacle gas passage. Neither the German proposed
shape nor the Japanese proposed shape is provided with a device for
inhibiting foreign matter contamination.
[0010] Patent Document 1 proposes a fuel filling system comprising
a nozzle for gas filling, and a receptacle into which gas is
supplied from the nozzle, wherein the system is provided with a
malfunction diagnosis device that diagnoses any malfunction of the
receptacle or nozzle during gas filling. However, the fuel filling
system proposed in Patent Document 1 is not provided with a device
for inhibiting foreign matter contamination.
[0011] Patent Document 2 proposes a structure for an optical
communication sleeve in which an engagement member having a
protruding sliding surface is provided on the inner peripheral
surface of a ferrule insertion hole of the optical communication
sleeve, so that upon insertion, dust on the surface of the ferrule
is removed, thereby preventing dust from penetrating inside the
optical communication sleeve. Further, Patent Documents 3 and 4
propose structures for filters used in removing toxic components or
contaminants from a passing gas stream.
[0012] Patent Document 1: JP 2006-177253 A
[0013] Patent Document 2: JP 2005-241882 A
[0014] Patent Document 3: JP 2003-225540 A
[0015] Patent Document 4: JP 08-75098 A
SUMMARY OF INVENTION
Problems to be Solved by the Invention
[0016] As mentioned above, none of the novel structures for
hydrogen filling connectors that have been proposed to accommodate
the transition to increased pressure of the filling gas is provided
with a device for inhibiting contamination of the receptacle gas
passage by foreign matter that has adhered to the nozzle surface as
a result of the increased nozzle length.
[0017] Accordingly, in the case of a hydrogen filling connector of
the German proposed shape, if the nozzle is inserted into the
receptacle insertion hole during gas filling with foreign matter
adhered to the nozzle surface, then the foreign matter adheres to
the O-rings inside the receptacle, which are provided so that no
space exists between the nozzle and the O-rings, and adheres
particularly to the O-ring provided in the vicinity of the nozzle
tip. If this foreign matter causes damage to the O-ring surface,
then there is a possibility that the sealing properties may
deteriorate. Similarly, in the case of a hydrogen filling connector
of the Japanese proposed shape, if foreign matter is adhered to the
inner peripheral surface of the receptacle insertion hole, then
that foreign matter tends to adhere to the O-ring in the vicinity
of the nozzle tip, and if this causes damage to the O-ring surface,
then there is a possibility that the sealing properties may
deteriorate.
[0018] Furthermore, during filling of the liquid fuel, in order to
prevent an increase in temperature of the high-pressure hydrogen
container (such as a tank), filling is typically conducted with the
liquid fuel at a low temperature of approximately -40.degree. C.
During this filling, if water has adhered to the nozzle of the
hydrogen filling connector then it freezes and bonds to the nozzle
as ice, which can make it difficult to remove the nozzle from the
receptacle. Moreover, if the nozzle is forcibly pulled out of the
receptacle in this state, then there is a possibility that the
O-rings inside the hydrogen filling connector may partially detach,
resulting in a loss in the sealing properties. These issues
associated with low-temperature liquid fuel filling are difficult
to resolve with conventional hydrogen filling connector structures
and the conventional technologies described above.
[0019] The present invention has been developed in light of the
issues described above, and provides a gas supply structure that is
able to prevent foreign matter on the nozzle surface from adhering
to the O-rings inside the gas supply structure when the nozzle is
inserted in the receptacle during gas filling.
Means to Solve the Problems
[0020] In order to achieve the object described above, the gas
supply structure of the present invention has the features
described below.
(1) A gas supply structure comprising a nozzle that supplies a gas,
a receptacle that receives supply of the gas by insertion of the
nozzle therein, an O-ring that is provided within the receptacle,
seals the nozzle and the receptacle, and slides against the nozzle
during insertion of the nozzle, and a foreign matter removal member
that is provided within the receptacle in a position closer to an
insertion hole for the nozzle than the O-ring, and further
comprising an insertion hole-side O-ring that is provided in the
receptacle in a vicinity of an insertion hole.
[0021] Because the foreign matter removal member provided in the
receptacle is positioned closer to the insertion hole for the
nozzle than the O-ring provided within the receptacle, the foreign
matter removal member removes foreign matter that exists on the
nozzle surfaces, starting from the tip of the nozzle, as the nozzle
undergoes insertion within the receptacle. Accordingly, foreign
matter on the tip of the nozzle and the nozzle surface is inhibited
from adhering to the O-ring.
(2) A gas supply structure comprising a nozzle that supplies a gas,
a receptacle that receives supply of the gas by insertion of the
nozzle therein, an O-ring that is provided on the nozzle, seals the
nozzle and the receptacle, and slides against the receptacle during
insertion of the nozzle, and a foreign matter removal member that
is provided on the nozzle in a position closer to the tip of the
nozzle than the O-ring.
[0022] Because the foreign matter removal member provided on the
nozzle is positioned closer to the tip of the nozzle than the
O-ring provided on the nozzle, the foreign matter removal member is
able to remove foreign matter that exists on the inner peripheral
surface that extends inwards from the insertion hole of the
receptacle as the nozzle undergoes insertion within the receptacle.
Accordingly, adhesion of foreign matter to the O-ring provided on
the nozzle is inhibited.
(3) A gas supply structure comprising a receptacle that receives
supply of a gas by insertion of a nozzle therein, an O-ring that is
provided within the receptacle, seals the nozzle and the
receptacle, and slides against the nozzle during insertion of the
nozzle, and a foreign matter removal member that is provided within
the receptacle in a position closer to an insertion hole for the
nozzle than the O-ring, and further comprising an insertion
hole-side O-ring that is provided in the receptacle in a vicinity
of an insertion hole.
[0023] Because the foreign matter removal member provided in the
receptacle is positioned closer to the insertion hole for the
nozzle than the O-ring provided within the receptacle, the foreign
matter removal member removes foreign matter that exists on the
nozzle surfaces, starting from the tip of the nozzle, as the nozzle
undergoes insertion within the receptacle. Accordingly, foreign
matter on the tip of the nozzle and the nozzle surface is inhibited
from adhering to the O-ring.
(4) A gas supply structure comprising a receptacle that receives
supply of a gas by insertion of a nozzle therein, an O-ring that is
provided on the nozzle, seals the nozzle and the receptacle, and
slides against the nozzle during insertion of the nozzle, and a
foreign matter removal member that is provided on the nozzle in a
position closer to the tip of the nozzle than the O-ring. (5) The
gas supply structure according to (2) or (4) above, further
comprising an insertion hole-side O-ring provided in the receptacle
in the vicinity of the insertion hole. (6) The gas supply structure
according to any one of (1) to (5) above, further comprising a tank
for storing the gas, a filter having a small loss coefficient
disposed in the upstream side of a gas passage connecting the
receptacle to the tank, and a filter having a large loss
coefficient disposed in the downstream side of the gas passage.
[0024] The two filters described above trap foreign matter within
the gas supplied to the tank, and by combining a filter having a
relatively small loss coefficient with a filter having a relatively
large loss coefficient, the differential pressure before and after
the two filters can be reduced compared with the case of a single
filter. As a result, blockages of the entire filtering system
within the gas passage can be inhibited.
(7) The gas supply structure according to any one of (1) to (6)
above, wherein the foreign matter removal member has a sliding
resistance, determined on the basis of a pull-out load measurement,
that is not less than 300 N and not more than 500 N.
[0025] By using a foreign matter removal member having the sliding
resistance defined above, the removal performance is improved for
foreign matter that exists inside the gas supply structure, and
particularly for water.
Effect of the Invention
[0026] The present invention is able to inhibit foreign matter
contamination of gas supply structures.
BRIEF DESCRIPTION OF THE DRAWINGS
[0027] FIG. 1 is a partially cutaway cross-sectional view
illustrating one example of a gas supply structure according to a
first embodiment of the present invention in a state prior to
insertion.
[0028] FIG. 2 is a partially cutaway cross-sectional view
illustrating the gas supply structure according to the first
embodiment of the present invention in a state following
insertion.
[0029] FIG. 3 is a partially cutaway cross-sectional view
illustrating a gas supply structure according to a second
embodiment of the present invention in a state prior to
insertion.
[0030] FIG. 4 is a partially cutaway cross-sectional view
illustrating the gas supply structure according to the second
embodiment of the present invention in a state following
insertion.
[0031] FIG. 5 is a schematic illustration of one example of a gas
passage of a gas supply structure according to a third embodiment
of the present invention.
[0032] FIG. 6 is a schematic illustration of one example of the
structure of a filter having a small loss coefficient used in the
gas supply structure according to the third embodiment of the
present invention.
[0033] FIG. 7 is a graph illustrating the relationship between the
differential pressure before and after a filter having a small loss
coefficient, and the upstream gas pressure.
[0034] FIG. 8 is a graph illustrating the relationship between the
differential pressure before and after a filter having a large loss
coefficient, and the upstream gas pressure.
[0035] FIG. 9 is a partially cutaway cross-sectional view
illustrating one example of the structure of a hydrogen filling
connector designed for a filling gas pressure of 35 MPa.
[0036] FIG. 10 is a partially cutaway cross-sectional view
illustrating one example of the structure of a hydrogen filling
connector having a German proposed shape designed for a filling gas
pressure of 70 Mpa.
[0037] FIG. 11 is a partially cutaway cross-sectional view
illustrating one example of the structure of a hydrogen filling
connector having a Japanese proposed shape designed for a filling
gas pressure of 70 Mpa.
DESCRIPTION OF THE REFERENCE SYMBOLS
[0038] 10, 30: Nozzle [0039] 12, 32: Gas supply passage [0040] 20,
40: Receptacle [0041] 22, 42: Insertion hole [0042] 24, 44: First
O-ring [0043] 26, 36: Foreign matter removal member [0044] 27, 37:
Bonding material [0045] 28, 38: Second O-ring [0046] 50: Gas
passage [0047] 52, 54: Filter [0048] 100, 200: Gas supply
structure
DETAILED DESCRIPTION
[0049] Embodiments of the present invention are described below
with reference to the drawings. Further, the gas supply structure
of the present invention is described below using the example of a
hydrogen filling connector that is used for filling high-pressure
gas at 70 MPa.
[0050] An example of a gas supply structure according to a first
embodiment of the present invention is illustrated in FIG. 1 and
FIG. 2. As illustrated in FIG. 1 and FIG. 2, the gas supply
structure 100 of this embodiment comprises a nozzle 10 that
supplies gas, a receptacle 20 that receives supply of the gas by
insertion of the nozzle 10 therein, an O-ring that seals the nozzle
10 and the receptacle 20, and a foreign matter removal member 26
that inhibits foreign matter on the tip of the nozzle 10 from
adhering to the O-ring.
[0051] In this description, the term "foreign matter" used in both
this embodiment and the other embodiments described below describes
substances that can adhere to the tip and surface of the nozzle,
and includes dust and moisture and the like.
[0052] In a more detailed description, the gas supply structure 100
according to the present embodiment comprises, in the case of the
aforementioned German proposed shape, a nozzle 10 having a gas
supply passage 12, and a receptacle 20 having an insertion hole 22
into which the nozzle 10 is inserted to achieve connection, wherein
the receptacle 20 is provided with a first O-ring 24 that is
provided in the vicinity of the insertion hole 22 for the purpose
of gas sealing, and a second O-ring 28 that is provided further
downstream the gas supply path than the first O-ring 24 for the
purpose of gas sealing, a portion of the second O-ring 28 is bonded
to a recessed section in the receptacle 20 using a bonding material
27, and a foreign matter removal member 26 is positioned closer to
the insertion hole 22 than the second O-ring 28. Further, the
foreign matter removal member 26 is provided within the receptacle
20 so as to partially protrude from the inner peripheral surface
that extends from the insertion hole 22 of the receptacle 20.
[0053] There are no particular limitations on the positioning of
the foreign matter removal member 26 within the receptacle 20,
provided, as described above, the foreign matter removal member 26
is closer to the insertion hole 22 than the second O-ring 28.
However, in terms of enabling removal of foreign matter from the
tip and surface of the nozzle 10 during insertion of the nozzle 10,
the foreign matter removal member 26 is most preferably positioned
in the vicinity of the insertion hole 22 of the receptacle 20,
adjacent to, and downstream from, the first O-ring 24, although may
be provided favorably at any position between the first O-ring 24
and the second O-ring 28. From the ultimate viewpoint of preventing
the adhesion of foreign matter to the second O-ring 28, the foreign
matter removal member 26 may also be positioned upstream from, and
immediately adjacent to, the second O-ring 28.
[0054] A description of the foreign matter removal operation by the
gas supply structure of the first embodiment is presented below
with reference to FIG. 1 and FIG. 2. FIG. 1 illustrates the state
prior to insertion of the nozzle 10 within the receptacle 20. As
illustrated in FIG. 1, the foreign matter removal member 26 is
provided around the inner peripheral surface of the receptacle 20
so as to partially protrude from the surface. Accordingly, as the
nozzle 10 is inserted into the insertion hole 22 of the receptacle
20, the surface of the nozzle 10, starting from the tip of the
nozzle 10, makes sequential sliding contact with the foreign matter
removal member 26, and as a result, foreign matter is removed from
the surface of the nozzle 10, starting from the tip of the nozzle
10, enabling a cleaned tip and surface of the nozzle 10 to press
against the second O-ring 28 within the receptacle 20, as
illustrated in FIG. 2. Accordingly, adhesion of foreign matter to
the second O-ring 28 is inhibited, meaning that surface damage of
the second O-ring 28 caused by foreign matter can be prevented, and
that the gas sealing properties between the nozzle 10 and the
receptacle 20, such as high-pressure gas sealing at 70 MPa, can be
favorably maintained.
[0055] The nozzle 10 and the receptacle 20 in this embodiment are
formed of metal, and from the viewpoints of workability and
strength, are preferably formed of stainless steel or the like.
[0056] On the other hand, the material of the foreign matter
removal member 26 in the present embodiment may be any material
having sufficient elasticity and/or flexibility to prevent damage
to the surface of the nozzle 10 during sliding contact. Examples of
materials that may be used include rubbers and flexible resins, and
the use of polytetrafluoroethylene (PTFE) is preferred.
[0057] Furthermore, the foreign matter removal member 26 may be
provided on the inner peripheral surface of the receptacle 20 as
either a single continuous ring or as a non-continuous ring, and
the portion of the foreign matter removal member 26 protruding from
the inner peripheral surface may be either a blade-like form or a
brush-like form. Further, the length of the protruding portion may
be selected appropriately in accordance with the degree of
elasticity or flexibility of the selected foreign matter removal
member 26.
[0058] Moreover, the foreign matter removal member 26 preferably
has a sliding resistance, determined on the basis of a pull-out
load measurement, that is not less than 300 N and not more than 500
N. Ensuring a sliding resistance that satisfies this range means
that when the foreign matter removal member 26 slides against the
surface of the nozzle 10 during insertion of the nozzle 10, the
nozzle 10 suffers no damage, while any foreign matter on the tip
and surface of the nozzle 10 is able to be removed. The removal
performance is particularly favorable when the foreign matter is
water. For example, when a liquid fuel is used to fill a
high-pressure hydrogen container (such as a tank), and the filling
is conducted with the liquid fuel at a low temperature of
approximately -40.degree. C., any water on the surface of the
nozzle 10 is removed by the foreign matter removal member 26 as the
nozzle 10 is inserted into the receptacle 20, and therefore there
is no possibility of water freezing on the second O-ring 28 where
there is no gap between the nozzle 10 and the receptacle 20,
meaning damage such as partial detachment of the second O-ring 28
can be prevented from occurring during connection and disconnection
of the nozzle 10 and the receptacle 20.
[0059] Next is a description of an example of a gas supply
structure according to a second embodiment of the present invention
with reference to FIG. 3 and FIG. 4. As illustrated in FIG. 3 and
FIG. 4, the gas supply structure 200 of this embodiment comprises a
nozzle 30 that supplies gas, a receptacle 40 that receives supply
of the gas by insertion of the nozzle 30 therein, an O-ring that
seals the nozzle 30 and the receptacle 40, and a foreign matter
removal member 36 that inhibits foreign matter on the tip of the
nozzle 30 from adhering to the O-ring.
[0060] In a more detailed description, the gas supply structure 200
according to the present embodiment comprises, in the case of the
aforementioned Japanese proposed shape, a nozzle 30 having a gas
supply passage 32, and a receptacle 40 having an insertion hole 42
into which the nozzle 30 is inserted to achieve connection, wherein
the receptacle 40 is provided with a first O-ring 44 that is
provided in the vicinity of the insertion hole 42 for the purpose
of gas sealing, a second O-ring 38 is provided at the tip of the
nozzle 30 for the purpose of gas sealing, and a portion of the
second O-ring 38 is bonded to a recessed section provided near the
tip of the nozzle 30 using a bonding material 37. The foreign
matter removal member 36 is provided on the nozzle 30 in a position
closer to the tip of the nozzle 30 than the second O-ring 38.
[0061] There are no particular limitations on the positioning of
the foreign matter removal member 36 on the nozzle 30, provided, as
described above, the foreign matter removal member 36 is closer to
the tip of the nozzle 30 than the second O-ring 38. However, in
terms of enabling removal of foreign matter on the inner peripheral
surface of the receptacle 40 during insertion of the nozzle 30, the
foreign matter removal member 36 is most preferably positioned in
the vicinity of the tip of the nozzle 30, although in terms of
preventing foreign matter adhesion to the second O-ring 38, may be
provided favorably at any position adjacent to the second O-ring 38
and on the side of the tip of the nozzle 30.
[0062] A description of the foreign matter removal operation by the
gas supply structure of the second embodiment is presented below
with reference to FIG. 3 and FIG. 4. FIG. 3 illustrates the state
prior to insertion of the nozzle 30 within the receptacle 40. As
illustrated in FIG. 3, the foreign matter removal member 36 is
provided on the surface of the nozzle 30 so as to partially
protrude from the nozzle surface. Accordingly, as the nozzle 30 is
inserted into the insertion hole 42 of the receptacle 40, the
foreign matter removal member 36 makes sliding contact with the
inner peripheral surface that extends inwards from the insertion
hole 42 of the receptacle 40, and as a result, foreign matter is
removed from the inner peripheral surface of the receptacle 40,
enabling a cleaned inner peripheral surface of the receptacle 40 to
press against the second O-ring 38 on the nozzle 30, as illustrated
in FIG. 4. Accordingly, adhesion of foreign matter to the third
O-ring 28 is inhibited, meaning that surface damage of the second
O-ring 28 caused by foreign matter can be prevented, and that gas
sealing properties between the nozzle 30 and the receptacle 40,
such as high-pressure gas sealing at 70 MPa, can be favorably
maintained.
[0063] In a similar manner to that described above for the first
embodiment, the nozzle 30 and the receptacle 40 in the second
embodiment are formed of a metal such as stainless steel.
Furthermore, in a similar manner to that described above for the
first embodiment, the material of the foreign matter removal member
36 may be any material having sufficient elasticity and/or
flexibility to prevent damage to the surface of the receptacle 40
during sliding contact. Examples of materials that may be used
include rubbers and flexible resins, and the use of
polytetrafluoroethylene (PTFE) is preferred.
[0064] Furthermore, the foreign matter removal member 36 may be
provided on the surface of the nozzle 30 as either a single
continuous ring or as a non-continuous ring, the portion of the
foreign matter removal member 36 protruding from the surface of the
nozzle 30 may be either a blade-like form or a brush-like form, and
the length of the protruding portion may be selected appropriately
in accordance with the degree of elasticity or flexibility of the
selected foreign matter removal member 36.
[0065] Moreover, in a similar manner to that described above for
the first embodiment, the foreign matter removal member 36
preferably has a sliding resistance, determined on the basis of a
pull-out load measurement, that is not less than 300 N and not more
than 500 N. Ensuring a sliding resistance that satisfies this range
means that when the foreign matter removal member 36 slides against
the inner peripheral surface of the receptacle 40 during insertion
of the nozzle 30, the receptacle 40 suffers no damage, while any
foreign matter on the inner peripheral surface of the receptacle 40
is able to be removed. The removal performance is particularly
favorable when the foreign matter is water. When a liquid fuel is
used to fill a high-pressure hydrogen container (such as a tank) in
the manner described above, and the filling is conducted with the
liquid fuel at a low temperature of approximately -40.degree. C.,
any water on the surface of the receptacle 40 is removed by the
foreign matter removal member 36 on the nozzle 30, and therefore
there is no possibility of water freezing on the second O-ring 38
where there is no gap between the nozzle 30 and the receptacle 40,
meaning damage such as partial detachment of the second O-ring 38
can be prevented from occurring during connection and disconnection
of the nozzle 30 and the receptacle 40.
[0066] An example of a gas supply structure according to a third
embodiment of the present invention is illustrated in FIG. 5. As
illustrated in FIG. 5, the gas supply structure of this embodiment
is based on the gas supply structure of the first or second
embodiment described above, and further comprises a tank for
storing the gas, a filter 52 having a small loss coefficient that
is disposed in the upstream side of a gas passage 50 connecting the
receptacle to the tank, and a filter 54 having a large loss
coefficient that is disposed in the downstream side of the gas
passage 50.
[0067] FIG. 7 is a graph illustrating the relationship between the
differential pressure before and after the filter 52 having a
relatively small loss coefficient (that is the value of
.DELTA.P.sub.f=P.sub.0-P.sub.1 in FIG. 1), and the gas pressure
upstream from the filter 52. As illustrated in FIG. 7, the higher
the upstream gas pressure, the lower the value of the differential
pressure (.DELTA.P.sub.f=P.sub.0-P.sub.1) becomes. On the other
hand, FIG. 8 is a graph illustrating the relationship between the
differential pressure before and after the filter 54 having a
relatively large loss coefficient (that is the value of
.DELTA.P.sub.s=P.sub.1-P.sub.2 in FIG. 1), and the gas pressure
upstream from the filter 54. As illustrated in FIG. 8, the higher
the upstream gas pressure, the higher the value of the differential
pressure (.DELTA.P.sub.s=P.sub.0-P.sub.1) becomes. Accordingly, by
disposing the filter 52 having a relatively small loss coefficient
within the upstream side of the gas passage 50 where the
high-pressure gas first reaches, the differential pressure
.DELTA.P.sub.f before and after the filter 52 can be reduced, and
blocking of the filter 52 can be prevented, while the filter 52
traps any relatively large foreign matter within the gas supplied
to the tank. As a result, even when the high-pressure gas, from
which a portion of the foreign matter has been removed, passes
through the filter 54 having a relatively large loss coefficient
disposed within the downstream side of the gas passage 50, the
differential pressure .DELTA.P.sub.s can be reduced compared to a
conventional structure in which only the filter 54 is provided, and
blocking of the filter with foreign matter is less likely to
occur.
[0068] In other words, by combining the filter 52 having a
relatively small loss coefficient with the filter 54 having a
relatively large loss coefficient, foreign matter within the gas
supplied to the tank can be trapped more reliably, and the values
of the differential pressure .DELTA.P.sub.f and .DELTA.P.sub.s
before and after the filters 52 and 54 can be reduced compared with
cases in which only a single filter is provided, and particularly
the case in which only the filter 54 is provided, meaning blockages
of the entire filtering system within the gas passage 50 can be
inhibited.
[0069] Mesh-like filters may be used as the filter 52 having a
small loss coefficient, and the distance between the wires that
form the mesh-like filter is preferably approximately 0.2 mm,
although the present invention is not limited to this value.
Further, either a single filter 52 may be provided, or two or more
filters may be used in combination. For example, as illustrated in
FIG. 6, filters 52 having the same distance between wires may be
gradually rotated in one direction and either stacked together or
positioned with a certain spacing therebetween. By using two or
more filters in this manner, the effective pore size of the filter
52 can be altered, or if the filters are positioned with a certain
spacing therebetween, the differential pressure can be reduced.
[0070] Sintered metal filters may be used as the filter 54 having a
large loss coefficient, and a sintered metal filter having a pore
size of approximately 5 .mu.m is preferred, although the present
invention is not limited to filters of this pore size.
[0071] Furthermore, the respective passage pore sizes for the
filter 52 and the filter 54 can be selected appropriately in
accordance with the gas pressure of the passing gas and the nature
of the foreign matter incorporated within the gas.
[0072] Although the present invention has been described in detail
above, the scope of the present invention is not limited to the
specific configurations described above.
[0073] Furthermore, the detailed description, claims, drawings and
abstract of the invention disclosed in Japanese Patent Application
No. 2007-336307, filed on Dec. 27, 2007, are deemed to be
incorporated in their entirety within the present application.
INDUSTRIAL APPLICABILITY
[0074] A gas supply structure of the present invention may be used
within any application that is used for supplying a gas, but is
particularly suited to high-pressure gas filling applications, and
is ideal for the hydrogen filling connectors mounted in movable
structures such as vehicles.
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