U.S. patent application number 12/652843 was filed with the patent office on 2010-05-06 for structure for pattern formation, method for pattern formation, and application thereof.
Invention is credited to Daigo AOKI, Shinichi HIKOSAKA, Hironori KAMIYAMA, Mitsuhiro KASHIWABARA, Hironori KOBAYASHI, Manabu YAMAMOTO.
Application Number | 20100112311 12/652843 |
Document ID | / |
Family ID | 27577233 |
Filed Date | 2010-05-06 |
United States Patent
Application |
20100112311 |
Kind Code |
A1 |
KOBAYASHI; Hironori ; et
al. |
May 6, 2010 |
STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND
APPLICATION THEREOF
Abstract
A structure for pattern formation adapted for optically forming
a pattern, characterized by comprising: a photocatalyst-containing
layer provided on a substrate, the photocatalyst-containing layer
containing a material of which the wettability is variable through
photocatalytic action upon pattern-wise exposure.
Inventors: |
KOBAYASHI; Hironori;
(Tokyo-to, JP) ; YAMAMOTO; Manabu; (Tokyo-to,
JP) ; AOKI; Daigo; (Tokyo-to, JP) ; KAMIYAMA;
Hironori; (Tokyo-to, JP) ; HIKOSAKA; Shinichi;
(Tokyo-to, JP) ; KASHIWABARA; Mitsuhiro;
(Tokyo-to, JP) |
Correspondence
Address: |
LADAS & PARRY LLP
224 SOUTH MICHIGAN AVENUE, SUITE 1600
CHICAGO
IL
60604
US
|
Family ID: |
27577233 |
Appl. No.: |
12/652843 |
Filed: |
January 6, 2010 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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11867791 |
Oct 5, 2007 |
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12652843 |
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09882409 |
Jun 15, 2001 |
7575845 |
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11867791 |
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09284161 |
Apr 8, 1999 |
6294313 |
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PCT/JP98/03547 |
Aug 10, 1998 |
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09882409 |
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Current U.S.
Class: |
428/195.1 ;
427/162; 430/322 |
Current CPC
Class: |
G03F 7/095 20130101;
G03F 7/0043 20130101; B41C 1/1041 20130101; B41N 1/006 20130101;
B29D 11/00365 20130101; G02B 3/0056 20130101; Y10T 428/24802
20150115; G03F 7/0005 20130101; G02B 5/201 20130101; G03F 7/0007
20130101; G02B 3/0012 20130101; G03F 7/001 20130101; G03F 7/11
20130101; G03F 7/0757 20130101 |
Class at
Publication: |
428/195.1 ;
430/322; 427/162 |
International
Class: |
B32B 3/00 20060101
B32B003/00; G03F 7/00 20060101 G03F007/00; B05D 5/06 20060101
B05D005/06 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 8, 1997 |
JP |
214845/1997 |
Oct 31, 1997 |
JP |
300295/1997 |
Nov 14, 1997 |
JP |
313041/1997 |
Mar 27, 1998 |
JP |
100369/1998 |
Mar 31, 1998 |
JP |
85955/1998 |
Mar 31, 1998 |
JP |
86293/1998 |
Jun 12, 1998 |
JP |
165392/1998 |
Jun 15, 1998 |
JP |
167316/1998 |
Jun 15, 1998 |
JP |
183370/1998 |
Claims
1. A method for pattern formation adapted for optically forming a
pattern, wherein a structure for pattern formation comprises: a
substrate; a photocatalyst-containing layer provided on the
substrate; and, provided on the photocatalyst-containing layer, a
layer containing a material of which wettability is variable
through photocatalytic action, and the structure is pattern-wise
exposed to vary the wettability of the surface of the structure
through photocatalytic action.
2. The method for pattern formation according to claim 1, wherein
the pattern-wise exposure of the photocatalyst-containing layer is
carried out by light beam exposure.
3. The method for pattern formation according to claim 1, wherein
the pattern-wise exposure of the photocatalyst-containing layer is
carried out by exposure through a photomask.
4. The method for pattern formation according to claim 1, wherein
the pattern-wise exposure of the photocatalyst-containing layer is
carried out while heating the structure for pattern formation.
5. An element comprising the structure for pattern formation
adapted for optically forming a pattern, wherein the structure for
pattern formation further comprises: the substrate; the
photocatalyst-containing layer provided on the substrate; and,
provided on the photocatalyst-containing layer, the layer
containing the material of which the wettability is variable
through photocatalytic action upon pattern-wise exposure, and
wherein a functional layer provided on the structure for pattern
formation in its areas corresponding to a pattern, of the structure
for pattern formation, obtained by the pattern-wise exposure
according to claim 1.
6. An element produced by transferring a functional layer onto
another substrate, the functional layer being provided on the
structure for pattern formation in its areas corresponding to a
pattern, of the structure for pattern formation, obtained by the
pattern-wise exposure according to claim 1.
7. A process for producing an element comprising steps of:
providing the structure for pattern formation adapted for optically
forming a pattern which comprises: the substrate; the
photocatalyst-containing layer provided on the substrate; and,
provided on the photocatalyst-containing layer, the layer
containing the material of which the wettability is variable
through photocatalytic action upon pattern-wise exposure, and
forming a functional layer provided on the structure for pattern
formation in its areas corresponding to a pattern, of the structure
for pattern formation, obtained by the pattern-wise exposure
according to claim 1.
8. A process for producing an element comprising a step of
transferring a functional layer onto another substrate, the
functional layer being provided on the structure for pattern
formation in its areas corresponding to a pattern, of the structure
for pattern formation, obtained by the pattern-wise exposure
according to claim 1, whereby the functional layer is formed on the
another substrate.
9. The process for producing an element according to claim 7,
comprising the steps of : forming a composition for a functional
layer onto the whole surface of the structure for pattern
formation; and forming a patterned functional layer on the
structure for pattern formation only in its wettability-varied
exposed areas by utilizing repellency of unexposed areas.
10. The process for producing an element according to claim 7,
comprising the steps of : forming a composition for a functional
layer onto the whole surface of the structure for pattern
formation; and forming a patterned functional layer on the
structure for pattern formation by removing the functional layer in
its unexposed areas to from a patterned functional layer.
11. The process for producing an element according to claim 8,
comprising the steps of : forming a composition for a functional
layer onto the whole surface of the structure for pattern
formation; and forming a patterned functional layer on the
structure for pattern formation only in its wettability-varied
exposed areas by utilizing repellency of unexposed areas.
12. The process for producing an element according to claim 8,
comprising the steps of : forming a composition for a functional
layer onto the whole surface of the structure for pattern
formation; and forming a patterned functional layer on the
structure for pattern formation by removing the functional layer in
its unexposed areas to from a patterned functional layer.
13. The process for producing an element according to claim 7,
wherein the functional layer is formed on the structure for pattern
formation by coating a composition for a functional layer.
14. The process for producing an element according to claim 8,
wherein the functional layer is formed on the structure for pattern
formation by coating a composition for a functional layer.
15. The process for producing an element according to claim 7,
wherein the functional layer is formed on the structure for pattern
formation by ejecting a composition for a functional layer through
a nozzle.
16. The process for producing an element according to claim 8,
wherein the functional layer is formed on the structure for pattern
formation by ejecting a composition for a functional layer through
a nozzle.
17. The process for producing an element according to claims 7,
wherein the functional layer is formed on the structure for pattern
formation by thermal or pressure transfer from a film coated with a
composition for a functional layer.
18. The process for producing an element according to claims 8,
wherein the functional layer is formed on the structure for pattern
formation by thermal or pressure transfer from a film coated with a
composition for a functional layer.
19. The process for producing an element according to claim 7,
wherein the functional layer is formed on the structure for pattern
formation by film formation utilizing vacuum.
20. The process for producing an element according to claim 8,
wherein the functional layer is formed on the structure for pattern
formation by film formation utilizing vacuum.
21. The process for producing an element according to claim 7,
wherein the functional layer is formed on the structure for pattern
formation by film formation utilizing electroless plating.
22. The process for producing an element according to claim 8,
wherein the functional layer is formed on the structure for pattern
formation by film formation utilizing electroless plating.
Description
TECHNICAL FIELD
[0001] The present invention relates to a novel structure for
pattern formation usable for various applications, preferably a
structure for pattern formation utilizing a variation in
wettability and a method for pattern formation, and application
thereof to printing, color filters, lenses and the like.
BACKGROUND ART
[0002] Prior art techniques relevant to first invention A will be
described.
[0003] Structures for pattern formation comprising a substrate
having on its surface areas different from neighboring areas in
wettability, for example, by liquids have been used in various
technical fields. For example, in structures for pattern formation
used in printing of designs, images, letters and the like, a
pattern is provided which, upon transfer of a printing ink,
receives or repels the ink. In some cases, this pattern is in the
form of a patterned layer or a transferred layer formed on the
structure for pattern formation according to a variation in
wettability.
[0004] This will described by taking printing as an example. In
plates for lithography, i.e., a kind of printing method, printing
ink-receptive lipophilic areas and printing ink-unreceptive areas
are provided on a flat plate. In use, an ink image to be printed is
formed on the lipophilic areas and then transferred and printed
onto paper or the like.
[0005] In this printing, a pattern of letters, figures or the like
is formed on an original plate for a printing plate to prepare a
printing plate that is then mounted on a printing machine. A large
number of proposals have been made on original plates for printing
plates that are used in offset printing which is representative
lithography.
[0006] Plates for offset printing may be produced by a method
wherein the original plate for a printing plate is exposed through
a mask with a pattern drawn thereon followed by development, and a
method wherein the original plate for a printing plate is directly
exposed by electrophotography to prepare a printing plate. The
original plate for an electrophotographic offset printing plate is
prepared by a method which comprises the steps of: providing a
photoconductive layer composed mainly of photoconductive particles
of zinc oxide or the like and a binder resin on a conductive
substrate to form a photoreceptor; exposing the photoreceptor by
electrophotography to form a highly lipophilic image on the surface
of the photoreceptor; and subsequently treating the photoreceptor
with a desensitizing liquid to hydrophilify nonimage areas to
prepare an original plate for offset printing. High critical
surface tension areas are immersed in water or the like and is
consequently lipophobified, and a printing ink is received by the
lipophilic image areas followed by transfer onto paper or the
like.
[0007] An original plate for waterless lithography has also been
used wherein, instead of the immersion in water to form lipophobic
areas, highly lipophobic areas are formed without relying upon
immersion in water or the like to form ink-receptive areas and
ink-unreceptive areas.
[0008] Further, a method for producing an original plate for
lithography using a heat mode recording material has been proposed
which can realize the formation of highly ink-receptive areas and
ink-repellent areas by laser beam irradiation. Heat mode recording
materials can eliminate the need to provide the step of development
and the like, and advantageously enables printing plates to be
produced simply by forming an image using a laser beam. They,
however, suffer from problems associated with the regulation of
laser beam intensity, the disposal of residues of solid materials
denatured by the laser, the plate wear and the like.
[0009] Furthermore, photolithography is known as a method for
forming a high definition pattern. In this method, for example, a
photoresist layer coated onto a substrate is pattern-wise exposed,
and the exposed photoresist is developed, followed by etching.
Alternatively, a functional material is used in a photoresist, and
the photoresist is exposed to directly form a contemplated
pattern.
[0010] The formation of a high definition pattern by
photolithography has been used for the formation of color patterns
in color filters for liquid crystal displays and the like, the
formation of microlenses, the production of high definition
electric circuit boards, the production of chromium masks for
pattern-wise exposure and other applications. In these methods,
however, in addition to the use of the photoresist, development
using a liquid developing solution or etching should be carried out
after the exposure. This poses problems including the necessity of
treating waste liquid. Further, use of a functional material as the
photoresist disadvantageously raises problems including
deterioration of the photoresist by an alkaline liquid or the like
used in the development.
[0011] Formation of a high definition pattern for color filters or
the like by printing or the like has also been carried out.
Patterns formed by printing suffer from problems of positional
accuracy and the like, and, hence, in this method, it is difficult
to form high definition patterns.
[0012] In order to solve these problems, the present inventors have
already proposed, in Japanese Patent Application No. 214845/1997, a
structure for pattern formation and a method for pattern formation
wherein a material, of which the wettability is variable through
photocatalytic action, is used to form a pattern. According to the
present invention, in the structure and method for pattern
formation using a photocatalyst, structure and method for pattern
formation having better properties are provided.
[0013] It is an object of the first invention A to provide a novel
structure for pattern formation and a method for pattern formation.
It is another object of the first invention A to provide a novel
original plate for a printing plate that can solve the problems of
the conventional original plates for printing plates. It is a
further object of the first invention A to provide a structure for
pattern formation and a method for pattern formation that can be
used to provide functional elements having excellent
properties.
[0014] Prior art techniques relevant to second invention B will be
described.
[0015] In liquid crystal display devices (LCDs), color filters are
used in both active matrix system and simple matrix system in order
to cope with an increasing demand for color display in recent
years. For example, in liquid crystal displays of active matrix
system using a thin film transistor (TFT), the color filter has
color patterns of the three primary colors of red (R), green (G),
and blue (B), and electrodes corresponding respectively to pixels
of R, G, and B are turned on or off to permit a liquid crystal to
function as a shutter, whereby light passes through pixels of R, G,
and B to perform color display. In the case of color mixing, liquid
crystal shutters corresponding to two or more pixels are opened to
mix colors together so that, on the principle of additive color
process, a viewer sees a different color on the retina.
[0016] Examples of methods for producing conventional color filters
include a dyeing method which comprises coating a dyeing substrate
onto a transparent substrate, exposing the coated substrate through
a photomask, conducting development to form a pattern, and dyeing
the pattern to form a colored layer, a pigment dispersion method
which comprises previously dispersing a color pigment in a
photosensitive resist layer provided on a transparent substrate,
exposing the resist layer through a photomask, and conducting
development to form a colored layer, a printing method which
comprises printing colored layers using printing inks onto a
transparent substrate, and an electrodeposition method which
comprises forming a transparent electrode pattern on a transparent
substrate and repeating, three times for R, G, and B, the
energization of the transparent electrode pattern in an electrode
liquid of a predetermined color to electrodeposit the color,
thereby forming patterns of the colors.
[0017] In the conventional dyeing method and pigment dispersion
method, however, material loss cannot be avoided in the step of
coating the transparent substrate by spin coating or the like, and,
further, the step of development and the step of washing are
necessary for the formation of a pattern of each color. This makes
it difficult to improve the efficiency of use of the material and
to simplify the process and hence hinders a reduction in production
cost. On the other hand, for the printing method, the formation of
high definition patterns is difficult, and, for the
electrodeposition method, the shape of patterns formable by the
electrodeposition is limited.
[0018] In order to eliminate the above problems, a process for
producing a color filter by ink-jet system has been developed. This
process, however, is still unsatisfactory for solution to the
problems.
[0019] The second invention B has been made under these
circumstances. It is an object of the present invention to provide
a color filter having high definition and free from defects such as
dropouts and to provide a production process of a color filter that
is excellent in efficiency of use of the material and includes
neither the step of development nor the step of washing, that is,
is simple in process.
[0020] Prior art techniques relevant to the third invention will be
described.
[0021] Among lenses used in the art, particularly a microlens or a
microlens array comprising orderly arranged microlenses has been
utilized in fine optics and other fields. For example, there is an
ever-increasing demand for use of the microlens or the microlens
array as components constituting liquid crystal displays and as
components adjacent to charge coupled solid-state image pick-up
device (CCD) used in video cameras and the like.
[0022] For the production of microlenses, for example, Japanese
Patent Laid-Open Nos. 21901/1991 and 164904/1993 disclose a
production process which comprises forming a transparent heat
deformable resin pattern by etching through a mask and heat
deforming the heat deformable resin pattern to form a microlens. In
this process, however, the formation of fine lenses is difficult
because the direction of etching is isotropic. Further, the
regulation of the focal length of the lens is limited, and the
process is complicate.
[0023] Japanese Patent Laid-Open No. 165932/1990 discloses another
conventional process for producing a microlens which comprises
ejecting droplets of a composition for a lens onto a transparent
substrate and curing the deposited droplets to form a microlens
array. In this process, however, the shape of the lens is
restricted by the contact angle between the transparent substrate
and the composition for the lens, making it difficult to regulate
the focal length. Further, in order to provide a specific contact
angle, a composition for a lens having a specific surface tension
should be selected. This narrows the range of selectable materials.
Furthermore, the shape of the contact face is limited to a circular
one, and a contact face having a polygonal pattern cannot be
provided. A further problem is that enhancing the radius of
curvature requires for the substrate to repel the composition for a
lens. This deteriorates the adhesion.
[0024] Further, Japanese Patent Laid-Open No. 206429/1993 proposes
a method wherein functions of a microlens array and a color filter
array comprising a plurality of stacked color filters can be
realized by a single color microlens array layer.
[0025] The color microlens array may be produced, for example, by a
process described in Japanese Patent Laid-Open No. 206429/1993.
This process comprises forming a color filter array by
photolithography, forming microlens dies on respective color
filters, and transferring the dies onto the color filter array by
isotropic etching to form a microlens of the color filter array.
Further, Japanese Patent Application No. 201793/1996 discloses a
production process which comprises forming recesses in a lens form
in a glass substrate by using a photoresist and glass etching and
filing colored lens materials into respective color portions. In
the former production process, however, the process is very
complicate, and, in the latter production process, a lens is formed
in recesses of a glass substrate, posing problems including that it
is very difficult to control the step of etching and the effect of
lens cannot be attained without increasing the refractive index of
the lens forming material.
[0026] The third invention C solves the above problems. It is an
object of the present invention to provide a process for producing
a lens in a simple manner, particularly a production process that
can produce fine microlenses and a microlens array with good
positional accuracy and enables the focal length of microlenses to
be easily altered, and lenses, microlenses, and a microlens array
produced by the production process.
[0027] Prior art techniques relevant to the fourth invention D will
be described.
[0028] In plates for lithography, i.e., a kind of printing method,
printing ink-receptive lipophilic areas and printing
ink-unreceptive areas are provided on a flat plate. In use, an ink
image to be printed is formed on the lipophilic areas, and the
image is then transferred and printed onto paper or the like.
[0029] In this printing, various original plates for printing
plates are used. After formation of a pattern of letters, figures
or the like on plates, the plates are used for printing. A large
number of proposals have been made on original plates for printing
plates used in offset printing, representative lithographic plates.
Among them, original plates for offset printing plates directly
prepared by electrophotography have been widely used in the art.
The original plate for an electrophotographic offset printing plate
is prepared by a method which comprises the steps of: providing a
photoconductive layer composed mainly of photoconductive particles
of zinc oxide or the like and a binder resin on a conductive
substrate to form a photoreceptor; exposing the photoreceptor by
electrophotography to form a highly lipophilic image on the surface
of the photoreceptor; and subsequently treating the photoreceptor
with a desensitizing liquid to hydrophilify nonimage areas to
prepare an original plate for offset printing. High critical
surface tension areas are immersed in water or the like and is
consequently lipophobified, and a printing ink is received by the
lipophilic image areas followed by transfer onto paper or the
like.
[0030] An original plate for waterless lithography has also been
used wherein, instead of the immersion in water to form lipophobic
areas, highly lipophobic areas are formed without relying upon
immersion in water or the like to form ink-receptive areas and
ink-unreceptive areas.
[0031] Further, a method for producing an original plate for
lithography using a heat mode recording material has been proposed
which can realize the formation of highly ink-receptive areas and
ink-repellent areas by laser beam irradiation.
[0032] Heat mode recording materials can eliminate the need to
provide the step of development and the like, and advantageously
enables an original printing plate to be produced simply by forming
an image using a laser beam. They, however, suffer from problems
associated with the regulation of laser beam intensity, the
disposal of residues of solid materials denatured by the laser, the
plate wear and the like.
[0033] In order to solve these problems, the present inventors have
already proposed, in Japanese Patent Application No. 214845/1997, a
structure for pattern formation and a method for pattern formation
wherein a material of which the wettability is variable through
photocatalytic action is used to form a pattern. In this
connection, the production of press plates having excellent
properties by utilizing original plates for printing plates using
the pattern forming structure using a photocatalyst has been
desired in the art.
[0034] It is an object of the fourth invention D to provide a press
plate having excellent properties by utilizing an original plate
for a printing plate using a structure for pattern formation
prepared through photocatalytic action.
DISCLOSURE OF THE INVENTION
[0035] Re: First Invention A
[0036] The present invention provides a structure for pattern
formation adapted for optically forming a pattern, the structure
comprising a photocatalyst-containing layer provided on a
substrate, the photocatalyst-containing layer containing a material
of which the wettability is variable through photocatalytic action
upon pattern-wise exposure.
[0037] The present invention also provides a structure for pattern
formation adapted for optically forming a pattern, the structure
comprising: a substrate; a photocatalyst-containing layer provided
on the substrate; and, provided on the photocatalyst-containing
layer, a layer that is decomposable and removable through
photocatalytic action upon pattern-wise exposure.
[0038] The present invention further provides a structure for
pattern formation adapted for optically forming a pattern, the
structure comprising: a substrate; a photocatalyst-containing layer
provided on the substrate; and, provided on the
photocatalyst-containing layer, a layer containing a material of
which the wettability is variable through photocatalytic action
upon pattern-wise exposure.
[0039] The present invention further provides a structure for
pattern formation adapted for optically forming a pattern, the
structure comprising a composition layer, the composition layer
comprising a photocatalyst, a material decomposable through
photocatalytic action upon pattern-wise exposure, and a binder.
[0040] In the above structure for pattern formation, the
photocatalyst-containing layer may contain a compound having
siloxane bonds.
[0041] In the above structure for pattern formation, the
photocatalyst-containing layer may contain silicone.
[0042] In the above structure for pattern formation, fluoroalkyl
groups may be bonded to silicon atoms in the silicone.
[0043] In the above structure for pattern formation, the silicone
may have been prepared from a composition containing an
organoalkoxysilane.
[0044] In the above structure for pattern formation, the silicone
may have been prepared from a composition containing a reactive
silicone compound.
[0045] In the above structure for pattern formation, the pattern
forming structure may be an original plate for a printing
plate.
[0046] The present invention further provides a method for pattern
formation adapted for optically forming a pattern comprising
exposing pattern-wise
[0047] a structure for pattern formation comprising: a substrate; a
photocatalyst-containing layer provided on the substrate, the
photocatalyst-containing layer containing a material of which the
wettability is variable through photocatalytic action,
[0048] a structure for pattern formation comprising: a substrate; a
photocatalyst-containing layer provided on the substrate; and,
provided on the photocatalyst-containing layer, a layer containing
a material of which the wettability is variable through
photocatalytic action,
[0049] a structure for pattern formation comprising: a substrate; a
photocatalyst-containing layer provided on the substrate; and,
provided on the photocatalyst-containing layer, a layer that, upon
pattern-wise exposure, is decomposable and removable through
photocatalytic action, or
[0050] a structure for pattern formation comprising: a substrate;
and a composition layer provided on the substrate, the composition
layer comprising a photocatalyst, a material decomposable through
photocatalytic action upon pattern-wise exposure, and a binder,
[0051] to vary the wettability of the surface of the structure
through photocatalytic action.
[0052] In the above method for pattern formation, the pattern-wise
exposure of the photocatalyst-containing layer may be carried out
by light beam exposure.
[0053] In the above method for pattern formation, the pattern-wise
exposure of the photocatalyst-containing layer may be carried out
by exposure through a photomask.
[0054] In the above method for pattern formation, the pattern-wise
exposure of the photocatalyst-containing layer may be carried out
while heating the structure for pattern formation.
[0055] The present invention further provides an element
characterized by comprising: a substrate; the above structure for
pattern formation provided on the substrate; and a functional layer
provided on the structure for pattern formation in its areas
corresponding to a pattern, of the structure for pattern formation,
obtained by the above pattern-wise exposure.
[0056] The present invention further provides an element produced
by transferring a functional layer onto another substrate, the
functional layer being provided on a structure for pattern
formation in its areas corresponding to a pattern, of the structure
for pattern formation, obtained by the above pattern-wise
exposure.
[0057] The present invention further relates to a process for
producing an element, comprising the steps of: providing the above
structure for pattern formation on a substrate; and forming a
functional layer provided on the structure for pattern formation in
its areas corresponding to a pattern, of the structure for pattern
formation, obtained by the above pattern-wise exposure.
[0058] The present invention further relates to a process for
producing an element, comprising the step of transferring a
functional layer onto another substrate, the functional layer being
provided on a structure for pattern formation in its areas
corresponding to a pattern, of the structure for pattern formation,
obtained by the above pattern-wise exposure, whereby the functional
layer is formed on the another substrate.
[0059] The above process for producing an element may comprise the
steps of: forming a composition for a functional layer onto the
whole surface of a structure for pattern formation; and forming a
patterned functional layer on the structure for pattern formation
only in its wettability-varied exposed areas by utilizing the
repellency of unexposed areas.
[0060] The above process for producing an element may comprise the
steps of: forming a composition for a functional layer onto the
whole surface of a structure for pattern formation; and removing
the functional layer in its unexposed areas to form a patterned
functional layer.
[0061] The above process for producing an element may comprise the
steps of: forming a composition for a functional layer onto the
whole surface of a structure for pattern formation; and forming a
patterned functional layer on the structure for pattern formation
only in its wettability-varied exposed areas by utilizing the
repellency of unexposed areas.
[0062] The above process for producing an element may comprise the
steps of: forming a composition for a functional layer onto the
whole surface of a structure for pattern formation; and removing
the functional layer in its unexposed areas to form a patterned
functional layer.
[0063] In the above process for producing an element, the
functional layer may be formed on the structure for pattern
formation by coating a composition for a functional layer.
[0064] In the above process for producing an element, the
functional layer may be formed on the structure for pattern
formation by ejecting a composition for a functional layer through
a nozzle.
[0065] In the above process for producing an element the functional
layer may be formed on the structure for pattern formation by
thermal or pressure transfer from a film coated with a composition
for a functional layer.
[0066] In the above process for producing an element, the
functional layer may be formed on the structure for pattern
formation by film formation utilizing vacuum.
[0067] In the above process for producing an element, the
functional layer may be formed on the structure for pattern
formation by film formation utilizing electroless plating.
[0068] Re: Second Invention B
[0069] In order to attain the above object, the present invention
provides a color filter comprising: a transparent substrate; a
colored layer provided on the transparent substrate, the colored
layer comprising a plurality of colors formed in a predetermined
pattern; and a light shielding layer located at each boundary
region between two adjacent colored layers, at least one of the
colored layer and the light shielding layer having been formed on
the transparent substrate through a wettability-variable component
layer in its areas having specific wettability.
[0070] Further, the present invention provides a color filter
comprising: a transparent substrate; a wettability-variable
component layer provided on the transparent substrate; a colored
layer of a plurality of colors provided in a predetermined pattern
on the wettability-variable component layer in its areas having
specific wettability; and a light shielding layer located at each
boundary region between two adjacent colored layers.
[0071] Further, the present invention provides a color filter
comprising: a transparent substrate provided with a light shielding
layer in a predetermined pattern; a wettability-variable component
layer provided on the transparent substrate so as to cover the
light shielding layer; and a colored layer of a plurality of colors
provided in a predetermined pattern on the wettability-variable
component layer in its areas having specific wettability, the light
shielding layer being located at each boundary region between two
adjacent colored layers.
[0072] Further, the present invention provides a color filter
comprising: a transparent substrate provided with a light shielding
layer in a predetermined pattern; laminates, in number of desired
colors, put on the transparent substrate so as to cover the light
shielding layer, the laminates each comprising a
wettability-variable component layer and a colored layer provided
in a predetermined pattern on the wettability-varied component
layer in its areas having specific wettability, the light shielding
layer being located at each boundary region between two adjacent
colored layers.
[0073] Further, the present invention provides a color filter
comprising: a transparent substrate; a wettability-variable
component layer provided on the transparent substrate; a light
shielding layer provided in a predetermined pattern on the
wettability-variable component layer in its areas having specific
wettability; laminates, in number of desired colors, put on the
wettability-variable component layer so as to cover the light
shielding layer, the laminates each comprising a
wettability-variable component layer and a colored layer provided
in a predetermined pattern on the wettability-variable component
layer in its areas having specific wettability, the light shielding
layer being located at each boundary region between two adjacent
colored layers.
[0074] In the color filter of the present invention, the areas
having specific wettability may be areas having high critical
surface tension.
[0075] In the color filter of the present invention, the
wettability-variable component layer may be a
photocatalyst-containing layer comprising at least a binder and a
photocatalyst, the binder may contain an organopolysiloxane
prepared from a composition containing a chloro- or alkoxysilane,
or the binder may contain an organopolysiloxane prepared from a
composition containing a reactive silicone.
[0076] In the color filter of the present invention, the
wettability-variable component layer may be an organic polymer
resin layer.
[0077] The present invention further provides a process for
producing a color filter, comprising:
[0078] the first step of forming areas having specific wettability
in a predetermined pattern on a transparent substrate and
depositing a coating composition for a light shielding layer onto
the areas having specific wettability to form a light shielding
layer; and
[0079] the second step of forming areas having specific wettability
in a predetermined pattern on the transparent substrate and
depositing a coating composition for a colored layer onto the areas
having specific wettability to form a colored layer.
[0080] In the first step, a photocatalyst-containing layer
comprising at least a binder and a photocatalyst may be formed on
the transparent substrate and is then irradiated with light to
permit light exposed areas to have high critical surface tension
through photocatalytic action, thereby forming the areas having
specific wettability, and, in the second step, the
photocatalyst-containing layer is irradiated with light to permit
light exposed areas to have high critical surface tension through
photocatalytic action, thereby forming the areas having specific
wettability.
[0081] The present invention further provides a process for
producing a color filter, comprising:
[0082] the first step of forming areas having specific wettability
in a predetermined pattern on a transparent substrate provided with
a light shielding layer of a predetermined pattern; and
[0083] the second step of depositing a coating composition for a
colored layer onto the areas having specific wettability to form a
colored layer.
[0084] In the first step, a photocatalyst-containing layer
comprising at least a binder and a photocatalyst may be formed on
the transparent substrate provided with the light shielding layer
of a predetermined pattern so as to cover the light shielding
layer, followed by irradiation with light to permit light exposed
areas to have high critical surface tension through photocatalytic
action, thereby forming the areas having specific wettability.
[0085] The present invention further provides a process for
producing a color filter, comprising repeating the procedure for
forming areas having specific wettability in a predetermined
pattern on a transparent substrate, provided with a light shielding
layer of a predetermined pattern, and depositing a coating
composition for a colored layer onto the areas having specific
wettability to form a colored layer as many times as required to
form a necessary number of colored layers of a plurality of
colors.
[0086] In the above process for producing a color filter, a
photocatalyst-containing layer comprising at least a binder and a
photocatalyst may be formed on the transparent substrate provided
with the light shielding layer of a predetermined pattern so as to
cover the light shielding layer, followed by irradiation with light
to permit light exposed areas to have high critical surface tension
through photocatalytic action, thereby forming the areas having
specific wettability.
[0087] The present invention further provides a process for
producing a color filter, comprising:
[0088] the first step of forming areas having specific wettability
in a predetermined pattern on a transparent substrate and
depositing a coating composition for a light shielding layer onto
the areas having specific wettability to form a light shielding
layer;
[0089] the second step of repeating the procedure for forming areas
having specific wettability in a predetermined pattern on the
transparent substrate and depositing a coating composition for a
colored layer onto the wettable areas to form a colored layer as
many times as required to form a necessary number of colored layers
of a plurality of colors.
[0090] In the first step, a photocatalyst-containing layer
comprising at least a binder and a photocatalyst may be formed on
the transparent substrate followed by irradiation with light to
permit light exposed areas to have high critical surface tension
through photocatalytic action, thereby forming the areas having
specific wettability, and, in the second step, a
photocatalyst-containing layer comprising at least a binder and a
photocatalyst may be formed so as to cover the light shielding
layer followed by irradiation with light to permit light exposed
areas to have high critical surface tension through photocatalytic
action, thereby forming the areas having specific wettability.
[0091] In the above process for producing a color filter, exposure
of the photocatalyst-containing layer to light may be carried out
by any one of pattern-wise exposure through a mask and a light beam
exposure.
[0092] In the above process for producing a color filter, the
deposition of the coating composition for a light shielding layer
and/or the coating composition for a colored layer may be carried
out by any one of a coating method, a nozzle ejection method, and a
vacuum thin film formation method. In the vacuum thin film
formation method, after the formation of a thin film, the thin film
formed of a coating composition for a light shielding layer or a
coating composition for a colored layer deposited on areas other
than the areas having specific wettability may be removed.
[0093] In the above inventions, areas having specific wettability
have high wettability by the composition for a light shielding
layer and the composition for a colored layer, so that the
composition for a light shielding layer and the composition for a
colored layer are selectively deposited only onto areas having
specific wettability to form a light shielding layer and a colored
layer with high accuracy. The photocatalyst-containing layer in its
light exposed areas are brought to a high critical surface tension
state through photocatalytic action to form the above areas having
specific wettability.
[0094] Re: Third Invention
[0095] The present inventors have found that selective deposition
of a liquid containing a material for a lens onto a pattern based
on a difference in wettability followed by curing to form a lens
can attain the above object. Specifically, the present invention
provides a process for producing a lens, comprising the steps
of:
[0096] forming a pattern based on a difference in wettability on
the surface of a substrate;
[0097] depositing a liquid containing a material for a lens on the
surface of the substrate in its areas having specific wettability;
and
[0098] curing the liquid containing the material for a lens to form
a lens.
[0099] Re: Fourth Invention D
[0100] The present invention provides a plate for lithography,
comprising: a substrate; a layer provided on the substrate, the
wettability of the layer being variable upon pattern-wise exposure;
a resin layer provided on areas of which the wettability has been
varied upon pattern-wise exposure; and areas that have been
hydrophilified or lipophilified upon whole exposure.
[0101] In the plate for lithography, the layer of which the
wettability is variable upon exposure may comprise: a
photocatalyst; and a material of which the wettability is variable
through photocatalytic action.
[0102] In the plate for lithography, the material of which the
wettability is variable may comprise a silicone resin.
[0103] In the plate for lithography, the resin layer may be ink
repellent.
[0104] In the plate for lithography, the ink-repellent resin may be
a silicone resin.
[0105] In the plate for lithography, the ink-repellent resin layer
may be a silicone resin layer that has been crosslinked by a
condensation reaction of SiOH groups with a hydrolyzable
crosslinking agent.
[0106] In the plate for lithography, the ink-repellent resin layer
may be a silicone resin layer that has been crosslinked by an
addition reaction of SiH groups with vinyl groups.
[0107] In the above plate for lithography, the resin layer may be
ink receptive and water repellent.
[0108] The present invention further provides a process for
producing a plate for lithography, comprising the steps of: putting
a layer onto a substrate, the wettability of the layer being
variable through photocatalytic action upon pattern-wise exposure;
pattern-wise exposing the layer; coating a resin composition to
selectively form a resin layer on wettability-varied areas; and
then conducting exposure to vary the wettability of areas not
provided with the resin layer.
BRIEF DESCRIPTION OF THE DRAWINGS
[0109] FIG. 1 is a diagram showing one embodiment of the present
invention;
[0110] FIG. 2 is a diagram showing another embodiment of the
present invention;
[0111] FIG. 3 is a diagram showing still another embodiment of the
present invention;
[0112] FIG. 4 is a diagram showing a further embodiment of the
present invention;
[0113] FIG. 5 is a diagram showing the relationship between light
irradiation time and wettability of structures for pattern
formation according to the present invention;
[0114] FIG. 6 is a diagram showing a further embodiment of the
present invention;
[0115] FIG. 7 is a diagram showing a further embodiment of the
present invention;
[0116] FIG. 8 is a diagram showing the relationship between light
irradiation time and wettability of structures for pattern
formation according to the present invention;
[0117] FIG. 9 is a diagram showing one embodiment of the process
for producing an element according to the present invention;
[0118] FIG. 10 is a diagram showing another embodiment of the
process for producing an element according to the present
invention;
[0119] FIG. 11 is a diagram showing still another embodiment of the
process for producing an element according to the present
invention;
[0120] FIG. 12 is a diagram showing a further embodiment of the
process for producing an element according to the present
invention;
[0121] FIG. 13 is a schematic cross-sectional view showing one
embodiment of the color filter according to the present
invention;
[0122] FIG. 14 is a schematic cross-sectional view showing another
embodiment of the color filter according to the present
invention;
[0123] FIG. 15 is a schematic cross-sectional view showing still
another embodiment of the color filter according to the present
invention;
[0124] FIG. 16 is a schematic cross-sectional view showing a filter
embodiment of the color filter according to the present
invention;
[0125] FIG. 17 is a flow diagram illustrating one embodiment of the
process for producing a color filter according to the present
invention;
[0126] FIG. 18 is a flow diagram illustrating another embodiment of
the process for producing a color filter according to the present
invention;
[0127] FIG. 19 is a plan view showing the state of a mask at the
time of light exposure of a photocatalyst-containing layer in the
process for producing a color filter according to the present
invention shown in FIG. 18;
[0128] FIG. 20 is a flow diagram illustrating another embodiment of
the process for producing a color filter according to the present
invention;
[0129] FIG. 21 is a flow diagram illustrating still another
embodiment of the process for producing a color filter according to
the present invention;
[0130] FIG. 22 is a diagram illustrating regulation of the focal
length in the process for producing a lens according to the present
invention;
[0131] FIG. 23 is a cross-sectional view showing a microlens array
according to a preferred embodiment of the present invention;
[0132] FIG. 24 is a cross-sectional view showing a color microlens
array according to a preferred embodiment of the present
invention;
[0133] FIG. 25 is a diagram illustrating the production process of
a microlens using a photocatalyst according to a preferred
embodiment of the present invention;
[0134] FIG. 26 is a cross-sectional view showing one embodiment of
a microlens array having a light shielding layer according to a
preferred embodiment of the present invention;
[0135] FIG. 27 is a plan view, showing a microlens array having a
light shielding layer according to a preferred embodiment of the
present invention, as viewed from the light shielding layer
side;
[0136] FIG. 28 is a cross-sectional view showing one embodiment of
an image pick-up device using a microlens array having a light
shielding layer according to a preferred embodiment of the present
invention;
[0137] FIG. 29 is a cross-sectional view showing one embodiment of
an image pick-up device comprising a color microlens array having a
light shielding layer according to a preferred embodiment of the
present invention;
[0138] FIG. 30 is a cross-sectional view showing one embodiment of
a display using a microlens array having a light shielding layer
according to a preferred embodiment of the present invention;
[0139] FIG. 31 is a cross-sectional view showing one embodiment of
a liquid crystal display using a color microlens array having a
light shielding layer according to a preferred embodiment of the
present invention;
[0140] FIG. 32 is a diagram illustrating a process for producing a
press plate of the printing plate according to the present
invention;
[0141] FIG. 33 is a diagram illustrating a process for producing a
press plate of the printing plate according to the present
invention; and
[0142] FIG. 34 is a diagram illustrating a printing process using
the lithographic plate according to the present invention.
BEST MODE FOR CARRYING OUT THE INVENTION
[0143] Re: First Invention A
[0144] The present invention relates to a structure for pattern
formation and a method for pattern formation wherein a pattern is
formed by utilizing the action of a photocatalyst that, upon light
irradiation, creates a chemical change of materials present around
it. According to the present invention, the pattern, when used in
printing of designs, images, letters and the like, refers to areas
that, upon transfer of the printing ink, receive or repel the ink.
Further, the structure for pattern formation according to the
present invention may be utilized in applications other than
printing. In this case, the pattern connotes areas, formed on a
structure for pattern formation in response to a change in
wettability, having properties different from those around them,
and areas, on another substrate, obtained by transfer of the above
areas onto the another substrate.
[0145] The mechanism of action of the photocatalyst typified by
titanium oxide according to the present invention has not been
fully elucidated yet. However, it is considered that carriers
produced by light irradiation influence the chemical structure of
the organic material through a direct reaction with a neighboring
compound, or otherwise by active oxygen species produced in the
presence of oxygen and water.
[0146] Proposals utilizing the photocatalytic action include one
wherein oil stains are decomposed by light irradiation to
hydrophilify the oil stains, enabling the oil stains to be washed
away by water, one wherein a hydrophilic film is formed on the
surface of glass or the like to impart antifogging properties, and
one wherein a photocatalyst-containing layer is formed on the
surface of tiles or the like to form the so-called antimicrobial
tiles or the like that can reduce the number of bacteria floating
in air.
[0147] Enhancement in receptivity of pattern areas to printing
inks, toners or the like, or repellency of non-pattern areas to ink
or the like by utilizing a material of which the wettability is
variable through photocatalytic action, a layer which can be
decomposed and removed by photocatalytic action, a layer containing
a material of which the wettability is variable through
photocatalytic action, a layer having a composition comprising a
material decomposable through photocatalytic action and a binder
and the like has realized the structure for pattern formation
according to the present invention.
[0148] Photocatalysts usable in the structure for pattern formation
and the method for pattern formation according to the present
invention include metal oxides known as photosemiconductors, such
as titanium oxide (TiO.sub.2), zinc oxide (ZnO), tin oxide
(SnO.sub.2), strontium titanium oxide (SrTiO.sub.3), tungsten oxide
(WO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), and iron oxide
(Fe.sub.2O.sub.3). Among them, titanium oxide is particularly
preferred because it has high band gap energy and is chemically
stable, nontoxic, and easily available.
[0149] Titanium oxide may be in anatase form or rutile form with
anatase form of titanium oxide being preferred.
[0150] Preferably, the anatase form of titanium has a small
particle diameter because the photocatalytic reaction takes place
efficiently. The average particle diameter is preferably not more
than 50 nm, more preferably not more than 20 nm. Examples of
anatase form of titanium oxide usable herein include hydrochloric
acid peptization type titania sols (STS-02, average crystal
diameter 7 nm, manufactured by Ishihara Sangyo Kaisha Ltd.) and
nitric acid peptization type titania sols (TA-15, average crystal
diameter 12 nm, manufactured by Nissan Chemical Industries
Ltd.).
[0151] The photocatalyst-containing layer according to the present
invention may be formed by dispersing a photocatalyst in a binder.
The photocatalyst has a fear of decomposing the binder as well upon
photoexcitation. Therefore, the binder should have satisfactory
resistance to photo-oxidation by the photocatalyst. Further, when
use of the structure for pattern formation as printing plates is
taken into consideration, plate wear and abrasion resistance are
also required of the photocatalyst-containing layer.
[0152] A silicone resin having siloxane bonds (--Si--O--) in its
main skeleton may be used as the binder that can satisfy the above
requirements.
[0153] In the silicone resin, organic groups are bonded to silicon
atoms. As described in detail in working examples, upon
photoexcitation of the photocatalyst, the organic groups bonded to
silicon atoms in the silicone molecule are replaced with
oxygen-containing groups, resulting in improved wettability.
Therefore, the silicone resin functions also as a material of which
the wettability is variable.
[0154] The silicone resin may be a hydrolysis condensate or a
cohydrolysis condensate of at least one member selected from
silicon compounds represented by general formula Y.sub.nSiX.sub.4-4
wherein n is 1 to 3; Y represents an alkyl, fluoroalkyl, vinyl,
amino, or epoxy group; and X represents a halogen or a methoxyl,
ethoxyl, or acetyl group.
[0155] Specific examples thereof include methyltrichlorosilane,
methyltribromosilane, methyltrimethoxysilane,
methyltriethoxysilane, methyltriisopropoxysilane,
methyl-tri-t-butoxysilane; ethyltrichlorosilane,
ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane,
ethyltriisopropoxysilane, ethyl-tri-t-butoxysilane;
n-propyltrichlorosilane, n-propyltribromosilane,
n-propyltrimethoxysilane, n-propyltriethoxysilane,
n-propyltriisopropoxysilane, n-propyl-tri-t-butoxysilane;
n-hexytrichlorosilane, n-hexyltribromosilane,
n-hexyltrimethoxysilane, n-hexyltriethoxysilane,
n-hexyltriisopropoxysilane, n-hexyl-tri-t-butoxysilane;
n-decyltrichlorosilane, n-decyltribromosilane,
n-decyltrimethoxysilane, n-decyltriethoxysilane,
n-decyltriisopropoxysilane, n-decyl-tri-t-butoxysilane;
n-octadecyltrichlorosilane, n-octadecyltribromosilane,
n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane,
n-octadecyltriisopropoxysilane, n-octadecyl-tri-t-butoxysilane;
phenyltrichlorosilane, phenyltribromosilane,
phenyltrimethoxysilane, phenyltriethoxysilane,
phenyltrisopropoxysilane, phenyl-tri-t-butoxysilane;
tetrachlorosilane, tetrabromosilane, tetramethoxysilane,
tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane;
dimethyldichlorosilane, dimethyldibromosilane,
dimethyldimethoxysilane, dimethyldiethoxysilane;
diphenyldichlorosilane, diphenyldibromosilane,
diphenyldimethoxysilane, diphenyldiethoxysilane;
phenylmethyldichlorosilane, phenylmethyldibromosilane,
phenylmethyldimethoxysilane, phenylmethyldiethoxysilane;
trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane,
triethoxyhydrosilane, triisopropoxyhydrosilane,
ti-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltibromosilane,
vinyltrimethoxysilane, vinyltriethoxysilane,
vinyltriisopropoxysilane, vinyl-tri-t-butoxysilane;
trifluoropropyltrichlorosilane, trifluoropropyltribromosilane,
trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane,
trifluoropropyltriisopropoxysilane,
trifluoropropyl-tri-t-butoxysilane;
.gamma.-glycidoxypropylmethyldimethoxysilane,
.gamma.-glycidoxypropylmethyldiethoxysilane,
.gamma.-glycidoxypropyltrimethoxysilane,
.gamma.-glycidoxypropyltriethoxysilane,
.gamma.-glycidoxypropyltriisopropoxysilane,
.gamma.-glycidoxypropyl-tri-t-butoxysilane;
.gamma.-methacryloxypropylmethyldimethoxysilane,
.gamma.-methacryloxypropylmethyldiethoxysilane,
.gamma.-methacryloxypropyltrimethoxysilane,
.gamma.-methacryloxypropyltriethoxysilane,
.gamma.-methacryloxypropyltriisopropoxysilane,
.gamma.-methacryloxypropyl-tri-t-butoxysilane;
.gamma.-aminopropylmethyldimethoxysilane,
.gamma.-aminopropylmethyldiethoxysilane,
.gamma.-aminopropyltrimethoxysilane,
.gamma.-aminopropyltriethoxysilane,
.gamma.-aminopropyltriisopropoxysilane,
.gamma.-aminopropyl-tri-t-butoxysilane;
.gamma.-mercaptopropylmethyldimethoxysilane,
.gamma.-mercaptopropylmethyldiethoxysilane,
.gamma.-mercaptopropyltrimethoxysilane,
.gamma.-mercaptopropyltriethoxysilane,
.gamma.-mercaptopropyltnisopropoxysilane,
.gamma.-mercaptopropyl-tri-t-butoxysilane;
.beta.-(3,4-epoxycyclohexyl)ethyltrimethoxysilane,
.beta.-(3,4-epoxycyclohexyl)ethyltriethoxysilane; and partial
hydrolyzates thereof; and mixtures thereof.
[0156] When the binder layer comprises an organoalkoxysilane,
preferably, 10 to 30% by weight of the organoalkoxysilane is
accounted for by a bifunctional silicone precursor, for example, a
dialkoxydimethylsilane. When use of the organoalkoxysilane in the
sol-gel process is contemplated, preferably, the organoalkoxysilane
is composed mainly of a trialkoxymethylsilane which is a
trifunctional silicone precursor from the viewpoint of improving
the crosslinking density. When a difference in wettability is
created as in the present invention, incorporation of a large
amount of dimethylsiloxane component rather than a methylsiloxane
component can improve water repellency and oil repellency.
[0157] The silicone molecule may contain fluoroalkyl groups as
organic groups bonded to silicon atoms. In this case, the critical
surface tension of unexposed areas are further lowered. Therefore,
the repellency of the ink and the composition for a functional
layer by the unexposed areas is improved, the function of
inhibiting the deposition of the ink or the composition for a
functional layer is increased, and, in addition, the range of
usable materials for the ink or the composition for a functional
layer is increased.
[0158] Specifically, the silicone is formed from at least one
member selected from hydrolysis condensates and cohydrolysis
condensates of the following fluoroalkylsilanes. Compounds
containing fluoroalkyl groups include the following compounds.
Compounds generally known as fluorosilane coupling agents may also
be used. [0159]
CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0160]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0161]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0162]
CF.sub.3(CF.sub.2).sub.9CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0163]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0164]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2CH.sub.2Si(OCH.sub.3).su-
b.3, [0165]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3,
[0166] CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3,
[0167]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3-
, [0168]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.-
3).sub.3, [0169]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3-
, [0170] CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0171]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0172]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0173]
CF.sub.3(CF.sub.2).sub.gCH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0174]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0175]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0176]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0177]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3 (OCH.sub.3).sub.2,
[0178]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(O-
CH.sub.3).sub.2, [0179]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0180]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0181] CF.sub.3(CF.sub.2).sub.3 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0182]
CF.sub.3(CF.sub.2).sub.5 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, [0183] CF.sub.3(CF.sub.2).sub.7 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0184]
CF.sub.3(CF.sub.2).sub.9 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, and [0185]
CF.sub.3(CF.sub.2).sub.7SO.sub.2N(C.sub.2H.sub.5)CH.sub.2CH.sub.2CH.sub.2-
Si(OCH.sub.3).sub.3
[0186] In order to provide better repellency of the ink and the
composition for a functional layer by unexposed areas, the silicone
is preferably a reactive linear silicone, more preferred a silicone
prepared by crosslinking dimethylpolysiloxane at low crosslinking
density. Typically, silicones obtained by crosslinking compounds
comprising the following repeating units are preferred:
##STR00001##
wherein n is an integer of two or more; and R.sup.1 and R.sup.2
represent a substituted or unsubstituted alkyl, alkenyl, aryl, or
cyanoalkyl group having 1 to 10 carbon atoms. R.sup.1 and R.sup.2
preferably represent a methyl group because the surface free energy
of the silicone is the smallest. The molar proportion of the methyl
group is preferably not less than 600%.
[0187] The molecular weight of the silicone is preferably 500 to
1,000,000. When the molecular weight is excessively small, the
content of R.sup.1 and R.sup.2 is relatively low, making it
difficult to develop the water repellency, oil repellency and the
like. On the other hand, when the molecular weight is excessively
large, the content of the end in X and Y is low, posing a problem
that the crossing density is small.
[0188] X and Y, which may be the same or different, are selected
from the following groups. R represents a hydrocarbon chain having
10 or less carbon atoms.
##STR00002##
[0189] Reactive modified silicones usable in the present invention
may be either one wherein crosslinking is performed by condensation
or one wherein crosslinking is performed in the presence of a
crosslinking agent. When the crosslinking is performed by
condensation, a tin, zinc, lead, calcium, or manganese salt of
carboxylic acid, preferably, a laurate or chloroplatinic acid, may
be added as a catalyst.
[0190] On the other hand, when the crosslinking is performed in the
presence of a crosslinking agent, crosslinking agents usable herein
include isocyanates commonly used as crosslinking agents in the
art. Preferred examples thereof are as follows:
##STR00003##
[0191] The reactive silicone compound may be of aqueous emulsion
type. The aqueous emulsion type compound is easy to handle because
an aqueous solvent is used.
[0192] According to the present invention, the water repellency and
the oil repellency may be enhanced by incorporating the reactive
silicone compound as the binder in combination with a stable
organosiloxane compound that does not cause any crosslinking
reaction, such as dimethylpolysiloxane.
[0193] In this case, not less than 60% by weight of the siloxane
contained in a layer formed from a compound containing a reactive
silicone compound is preferably accounted for by the siloxane
obtained from the reactive silicone compound. When the proportion
is less than 60% by weight, the amount of dimethylsiloxane is
reduced, unfavorably resulting in deteriorated water repellency and
oil repellency.
[0194] The binder may be an amorphous silica precursor. Preferred
are silicon compounds represented by general formula SiX.sub.4
wherein X represents a halogen, a methoxy, ethoxy, or acetyl group
or the like, silanols which are hydrolyzates of the silicon
compounds, and polysiloxanes having an average molecular weight of
not more than 3000.
[0195] Specific examples thereof include tetraethoxysilane,
tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane,
and tetramethoxysilane. In this case, a photocatalyst-containing
film may be formed by homogeneously dispersing an amorphous silica
precursor and photocatalyst particles in a nonaqueous solvent,
utilizing moisture in air to form a silanol through hydrolysis on a
substrate, and conducting dehydropolycondensation at room
temperature. When the dehydropolycondensation of the silanol is
carried out at 100.degree. C. or above, the degree of
polymerization is increased, realizing improved strength of the
film surface. These binders may be used alone or as a mixture of
two or more.
[0196] Titanium oxide alone may be used for the film formation
without use of any binder. In this case, amorphous titania is
formed on a substrate followed by firing to cause a phase change to
crystalline titania. The amorphous titania may be obtained, for
example, by hydrolyzing and dehydrocondensing an inorganic salt of
titanium, such as titanium tetrachloride, titanium sulfate, or
hydrolyzing and dehydrocondensing an organotitanium compound, such
as tetraethoxytitanium, tetraisopropoxytitanium,
tetra-n-propoxytitanium, tetrabutoxytitanium, or
tetramethoxytitanium, in the presence of an acid.
[0197] Next, the amorphous titania may be transformed to anatase
form of titania by firing at 400 to 500-C and may be transformed to
rutile form of titania by filing at 600 to 700.degree. C.
[0198] In the layer containing at least one of an organosiloxane
and amorphous silica, and a photocatalyst, the content of
photocatalyst is preferably 5 to 60% by weight, more preferably 20
to 400% by weight.
[0199] The photocatalyst and the binder may be dispersed in a
solvent to prepare a coating liquid followed by coating of the
liquid. Solvents usable herein include alcoholic organic solvents,
such as ethanol and isopropanol.
[0200] Titanium, aluminum, zirconium, and chromium coupling agents
may also be used.
[0201] The photocatalyst-containing coating liquid may be coated
onto the substrate by spray coating, dip coating, roll coating,
bead coating or the like. When an ultraviolet curable component is
contained as the binder, curing by ultraviolet irradiation results
in the formation of a photocatalyst-containing composition layer on
the substrate.
[0202] The excitation wavelength of the anatase form of titania is
not more than 380 nm. Therefore, the excitation of this type of
photocatalysts should be carried out using ultraviolet light.
Ultraviolet light sources usable herein include mercury lamps,
metal halide lamps, xenon lamps, excimer lamps, excimer layer, YAG
laser, and other ultraviolet light sources. The wettability of the
film surface may be varied by varying the ultraviolet light
intensity, exposure and the like.
[0203] When the exposure is carried out using a fine beam of a
laser or the like, a desired image pattern may be directly formed
without use of any mask. In the case of other light sources, a
pattern is formed by light irradiation using a mask with a desired
pattern formed thereon. Pattern forming masks usable herein include
masks wherein a pattern is formed on a metal sheet, such as vapor
deposition masks, photomasks wherein a pattern is formed using a
metallic chromium on a glass sheet, and, for printing applications,
plate preparation films.
[0204] The structure for pattern formation may be rendered
sensitive to visible and other wavelengths by doping with metal
ions of chromium, platinum, palladium or the like, by addition of
fluorescent materials, or addition of photosensitive dyes. Examples
of dyes usable herein include cyanine dyes, carbocyanine dyes,
dicarbocyanine dyes, hemicyanine dyes, and other cyanine dyes.
Other useful dyes include diphenylmethane dyes, for example,
triphenylmethane dyes, such as Crystal Violet and basic fuchsine,
xanthene dyes, such as Rhodamine B, Victoria Blue, Brilliant Green,
Malachite Green, Methylene Blue, pyrylium salts, benzopyrylium
salts, trimethylbenzopyrylium salts, and triallylcarbonium
salts.
[0205] When a mask is used in exposing the structure for pattern
formation according to the present invention, the resolution can be
enhanced by conducting the exposure in intimate contact of the mask
with the photocatalyst-containing layer. In this case, however, the
sensitivity is remarkably lowered. Preferably, the exposure is
carried out while leaving a spacing of about 100 .mu.m between the
mask and the photocatalyst-containing layer.
[0206] Exposure while blowing air into between the mask and the
structure for pattern formation can accelerate the reaction and can
improve the sensitivity and, in addition, can prevent heterogeneous
exposure derived from a difference in position between the center
portion and the portion around the portion. Further, exposure while
heating of the structure for pattern formation can improve the
sensitivity. Furthermore, a fine pattern may also be formed by
reduction projection exposure wherein the image of a mask pattern
is reduced using a reduction optical system.
[0207] Substrates usable in the structure for pattern formation
according to the present invention include glasses, metals, such as
aluminum and alloys thereof, plastics, woven fabrics, and nonwoven
fabrics that are used according to application of the structure for
pattern formation or elements with a pattern formed thereon.
According to the structure for pattern formation according to the
present invention, prior to the coating of the composition for a
photocatalyst-contain g layer, a primer layer may be formed on the
substrate from the viewpoints of an improvement in adhesion, an
improvement in surface roughness, the prevention of substrates from
being deteriorated through photocatalytic action, the prevention of
a lowering in photocatalytic activity and the like. Materials for
the primer layer usable herein include resins composed mainly of a
siloxane structure, fluororesins, epoxy resins, and polyurethane
resins.
[0208] According to one embodiment of the structure for pattern
formation according to the present invention, as shown in FIG. 1
(A), a structure 101 for pattern formation may comprise a
photocatalyst-containing layer 141 provided either directly or
through a primer layer 103 on a substrate 102. As shown in FIG. 1
(B), in order to record pattern information, exposure 106 is
carried out in a predetermined pattern 105. As shown in FIG. 1 (C),
allyl chains of the silicone compound are converted to OH groups
through the action of a photocatalyst 107, and high critical
surface tension areas 108 are formed in the surface having low
critical surface tension according to the exposed pattern,
permitting pattern information to be recorded by utilizing a
difference in wettability between the high critical surface tension
areas 108 and the low critical surface tension areas 109.
[0209] The structure for pattern formation according to a second
embodiment of the present invention, as shown in FIG. 2 (A),
comprises a substrate 102, a primer layer 103 provided on the
substrate 102, a photocatalyst-containing layer 142 provided on the
primer layer 103, and a wettability-variable material layer 110
provided on the photocatalyst-containing layer 142, the wettability
of the wettability-variable material layer 110 being variable
through photocatalytic action upon exposure to light. As shown in
FIG. 2 (B), exposure 106 is carried out in a pattern 105 to form,
as shown in FIG. 2 (C), areas 111 having specific wettability
according to the pattern. Thus, pattern information is
recorded.
[0210] In the case of the second embodiment, a
photocatalyst-containing layer of a hydrolyzate or a partial
hydrolyzate of a composition comprising a photocatalyst dispersed
in a binder precursor or the like is formed, and a thin film an
organic material having low critical surface tensions then formed.
The photocatalyst layer may be formed by the photocatalyst per se.
The thin film of an organic material may be used by solution
coating, surface grafting, surfactant treatment, or gaseous phase
film formation such as PVD or CVD.
[0211] Organic materials usable herein include monomeric compounds,
polymeric compounds, and surfactants, the wettability of these
materials being variable by the photocatalyst.
[0212] Specific examples of organic materials usable herein include
silane compounds that permit organic groups to be converted to
hydroxyl groups through photocatalytic action, such as silane
coupling agents, chlorosilanes, alkoxysilanes, or hydrolysis
condensates and cohydrolysis condensates of two or more of
them.
[0213] The structure for pattern formation according to a third
embodiment of the present invention, as shown in FIG. 3 (A),
comprises a substrate 102, a photocatalyst-containing layer 143
provided on the substrate 102, and a material layer 112 provided on
the photocatalyst-containing layer 143, the layer 112 being formed
of a material that, upon light irradiation, can be decomposed and
removed through photocatalytic action. As shown in FIG. 3 (B),
exposure 106 is carried out in a pattern 105, and, as shown in FIG.
3 (C), areas having specific wettability 113 are formed according
to the pattern. Thus, pattern information is recorded.
[0214] In the third embodiment, a photocatalyst-containing layer of
a hydrolyzate or a partial hydrolyzate of a composition comprising
a photocatalyst dispersed in a binder precursor or the like is
formed, and a thin film of an organic material having low critical
surface tension is then formed. The catalyst layer may be formed by
the photocatalyst per se. The thin film of an organic material may
be used by solution coating, surface grafting, surfactant
treatment, or gaseous phase film formation such as PVD or CVD.
[0215] Specific examples of organic materials usable herein include
hydrocarbon nonionic surfactants, such as NIKKOL BL, BC, BO, and BB
series manufactured by Nihon Surfactant Kogyo K.K.; and fluoro or
silicone nonionic surfactants, such as ZONYL FSN and FSO,
manufactured by E.I. du Pont de Nemours & Co., SurfluonS-141
and 145 manufactured by Asahi Glass Co., Ltd., Megafac F-141 and
144 manufactured by Dainippon Ink and Chemicals, Inc., Ftergent
F-200 and F-251, manufactured by Neos Co., Ltd.; Unidyne DS-401 and
402 manufactured by Daikin Industries, Ltd., and Fluorad FC-170 and
176 manufactured by Sumitomo 3M Ltd. Cationic, anionic, and
amphoteric surfactants may also be used.
[0216] Examples of organic materials other than surfactants usable
herein include oligomers and polymers, such as polyvinyl alcohol,
unsaturated polyesters, acrylic resins, polyethylene, diallyl
phthalate, ethylene propylene diene monomer, epoxy resin, phenolic
resin, polyurethane, melamine resin, polycarbonate, polyvinyl
chloride, polyamide, polyimide, styrene butadiene rubber,
chloroprene rubber, polypropylene, polybutylene, polystyrene,
polyvinyl acetate, nylon, polyester, polybutadiene,
polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide,
and polyisoprene.
[0217] The structure for pattern formation according to a fourth
embodiment of the present invention, as shown in FIG. 4 (A),
comprises a substrate 102, a primer layer 103 provided on the
substrate 102, and a photocatalyst-containing layer 144 containing
a photocatalyst, a binder, and a photocatalytically decomposable
material 116, comprising a hydrophobic portion 114 and a
hydrophilic portion 115, decomposable through photocatalytic action
upon exposure to light. A layer consisting of the photocatalyst and
the photocatalytically decomposable material alone may be formed
instead of the photocatalyst-containing layer. As shown in FIG. 4
(B), exposure 106 is carried out in a predetermined pattern 105. As
a result, as shown in FIG. 4 (C), the photocatalytically
decomposable material 116 comprising the hydrophobic portion 114
and the hydrophilic portion 115 present in predetermined areas is
decomposed by photocatalytic action to form areas 117 of which the
surface wettability has been varied according to the exposed 106
pattern. Thus, pattern information is recorded.
[0218] Preferred materials capable of varying the wettability of
the surface include those that can regulate the wettability of the
photocatalyst-containing layer as desired by varying the kind and
amount thereof added, for example, surfactants.
[0219] Surfactants are preferred as the material capable of varying
the wettability, and specific examples thereof include hydrocarbon
nonionic surfactants, such as NIKKOL BL, BC, BO, and BB series
manufactured by Nihon Surfactant Kogyo K.K.; and fluoro or silicone
nonionic surfactants, such as ZONYL FSN and FSO, manufactured by
E.I. du Pont de Nemours & Co., SurfluonS-141 and 145
manufactured by Asahi Glass Co., Ltd., Megafac F-141 and 144
manufactured by Dainippon Ink and Chemicals, Inc., Ftergent F-200
and F-251, manufactured by Neos Co., Ltd.; Unidyne DS-401 and 402
manufactured by Daikin Industries, Ltd., and Fluorad FC-170 and 176
manufactured by Sumitomo 3M Ltd. Cationic, anionic, and amphoteric
surfactants may also be used.
[0220] Examples of organic materials other than surfactants usable
herein include oligomers and polymers, such as polyvinyl alcohol,
unsaturated polyesters, acrylic resins, polyethylene, diallyl
phthalate, ethylene propylene diene monomer, epoxy resin, phenolic
resin, polyurethane, melamine resin, polycarbonate, polyvinyl
chloride, polyamide, polyimide, styrene butadiene rubber,
chloroprene rubber, polypropylene, polybutylene, polystyrene,
polyvinyl acetate, nylon, polyester, polybutadiene,
polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide,
and polyisoprene.
[0221] Use of a composition comprising 5 to 60% by weight of the
photocatalyst, 95 to 400% by weight of amorphous silica, and 0.1 to
55% by weight of the material of which the wettability is variable
through photocatalytic action is preferred.
[0222] According to the structure for pattern formation of the
present invention, the surface free energy is varied through the
action of the catalyst in the composition, and the
wettability-varied areas have varied receptivity to printing ink.
Therefore, the structure for pattern formation may be used as
printing plates. Use of the structure for pattern formation
according to the present invention as an original plate for a
printing plate can eliminate the need to provide the step of wet
development and the like and can offer a feature that the
preparation of a printing plate is completed simultaneously with
exposure. The formation of a pattern on the structure for pattern
formation according to the present invention may be performed by
exposure through a process film or the like or by direct pattern
formation using a laser or the like.
[0223] In preparing an original plate for a printing plate,
substrates usable herein include those commonly used in offset
printing plates, such as aluminum. Alternatively, a pattern may be
formed by coating a photocatalyst-contain g layer onto a screen of
a woven fabric or a nonwoven fabric and exposing the
photocatalyst-containing layer. When the substrate is constituted
by a material, such as a plastic, that has a fear of being
deteriorated by the photo-oxidation activity of the photocatalyst,
a silicone, a fluororesin or the like may be previously coated onto
the substrate to form a protective layer. The substrate may be in
any desired form, such as a sheet, a ribbon, or a roll.
[0224] A photochromic material, which undergoes a change in color
upon exposure to light, such as spiropyrone, or an organic dye
decomposable through photocatalytic action may be incorporated into
the composition to form a visualized pattern.
[0225] When unexposed areas are designed to be receptive to
printing ink and repellent to dampening water, the structure for
pattern formation according to the present invention may be used
also as conventional offset printing plates using dampening
water.
[0226] When use of the structure for pattern formation according to
the present invention as an element with a pattern laminated
thereon is contemplated, various functional layers may be formed in
a pattern form on various substrates by regulating the wettability
of the surface of the structure for pattern formation. Functional
properties refer to optical properties (such as refraction, light
selective absorption, reflection, polarization, light transmission,
light selective transmission, nonlinear optical properties,
luminescence of phosphor or phosphorescence, and photochromism),
magnetic properties (such as hard magnetic properties, soft
magnetic properties, nonmagnetic properties, and magnetic
permeability), electric and electronic properties (such as electric
conductivity, insulating properties, piezoelectric properties,
pyroelectric properties, and dielectric properties), chemical
properties (such as adsorption, desorption, catalytic activity,
water absorption, oil absorption, ion conductivity, oxidation
reduction properties, electrochemical properties, and
electrochromic properties), mechanical properties (such as abrasion
resistance), thermal properties (such as heat transfer, heat
insulation, and infrared radiation properties), and biological
functions (such as biocompatibility and antithrombogenicity).
[0227] Functional elements may be prepared by coating a composition
for a functional layer onto a structure for pattern formation. The
composition for a functional layer may be a composition that
enables only one of unexposed areas and exposed areas in the
structure for pattern formation with a pattern formed thereon to be
wetted.
[0228] For the pattern, the numerical value of the wettability is
not limited so far as the surface of the pattern has areas
different from each other in wettability, that is, functional layer
composition-depositable areas and functional layer
composition-undepositable areas. The surface having areas different
from each other in wettability may be the surface of the substrate
per se or the substrate surface after surface treatment such as
dampening water treatment.
[0229] Although no particular limitation is imposed, for example,
when the surface having areas different from each other in
wettability is the surface of the substrate per se, preferably, the
unexposed areas of the structure for pattern formation have a
critical surface tension of not more than 50 mN/m, preferably not
more than 30 mN/m. Preferred materials include silicone resin and
silicone resin having a fluorocarbon group. The composition for a
functional layer preferably comprises a material having a higher
surface tension than the critical surface tension on the unexposed
areas of the structure for pattern formation.
[0230] In this case, compositions for a functional layer usable
herein include liquid compositions of ultraviolet curable monomers
or the like not diluted with any solvent and liquid compositions
diluted with solvents. In the case of liquid compositions diluted
with solvents, preferred solvents are those having high surface
tension, such as water and ethylene glycol.
[0231] The lower the viscosity of the composition for a functional
layer, the shorter the pattern formation time. In the case of
liquid compositions diluted with solvents, an increase in viscosity
due to evaporation of solvents and a change in surface tension
occur at the time of pattern formation. Therefore, the solvents
preferably have low volatility.
[0232] The composition for a functional layer may be applied by
coating means, such as dip coating, roll coating, or blade coating,
nozzle ejection means including ink jetting, electroless plating or
the like. When the composition for a functional layer contains as a
binder a component curable by ultraviolet light, heat, electron
beams or the like, curing treatment permits a pattern of various
functional layers to be formed through the structure for pattern
formation on the substrate.
[0233] After the formation of a functional layer on the whole area,
the functional layer in its portions on the unexposed areas may be
removed by utilizing a difference in adhesion between the interface
of exposed areas/functional layer and the interface of unexposed
areas/functional layer, for example, by post treatment, such as
intimate contact with a pressure-sensitive adhesive tape followed
by separation of the functional layer in its contemplated areas,
blowing of air, or solvent treatment, thereby performing
patterning.
[0234] The unexposed areas and the exposed areas are not required
to completely repel the functional layer or to permit the
functional layer to be completely deposited thereon, and a pattern
of areas different from each other in amount of deposition due to
different adhesion may be formed.
[0235] Further, the functional layer may be formed by vacuum
formation such as PVD or CVD. Even when the functional layer is
formed on the whole area, utilization of a difference between
adhesion of exposed areas to functional layer and the adhesion of
unexposed areas to functional layer enables patterning, for
example, by post treatment, for example, separation using a
pressure-sensitive adhesive tape, blowing of air, or solvent
treatment, thereby performing patterning. In the case of film
formation using vacuum, the functional layer may be laminated on
the whole area of the structure for pattern formation, or
alternatively, reactivity with the exposed areas or the unexposed
areas may be utilized to selectively form the functional layer on
the exposed areas or the unexposed areas.
[0236] Compositions for a functional layer include those wherein
properties of the functional layer can be developed by mere
formation of a functional layer on the structure for pattern
formation and those wherein mere formation of a functional layer on
the structure for pattern formation does not develop properties of
the functional layer and, after the layer formation, post
treatment, such as chemical treatment, ultraviolet treatment, or
heat treatment, is necessary.
[0237] Next, elements which can be prepared using the structure for
pattern formation according to the present invention will be
described.
[0238] Color filters for liquid crystal display devices and the
like have a high definition pattern with a plurality of color
pixels of red, green, blue and the like formed thereon. Application
of the structure for pattern formation according to the present
invention can realize the production of high definition color
filters. For example, pattern-wise exposure of a
photocatalyst-containing layer provided on a transparent glass
substrate followed by coating of a colored layer composition for a
color filter onto the exposed photocatalyst-containing layer
permits the colored layer composition to be coated only onto
exposed areas due to a change in wettability of the exposed areas.
This can reduce the amount of the composition for a colored layer
used. Further, since the layer of the composition for a colored
layer is formed only onto the pattern, use of a photosensitive
resin composition as the composition for a colored layer can
eliminate the need to provide the step of development or the like,
and simple photocuring after the coating can provide a high
resolution color filter.
[0239] The structure for pattern formation according to the present
invention may be used in the production of microlenses. For
example, light is circularly applied to the
photocatalyst-containing layer provided on the transparent
substrate to form a wettability-varied circular pattern. When a
composition for a lens is then dropped on wettability-varied areas,
the droplets are spread only onto the exposed areas, and further
dropping of the composition results in varied contact angle of the
droplet. Subsequent curing provides lenses having various shapes or
focal lengths. Therefore, high definition microlenses can be
obtained.
[0240] Use of the structure for pattern formation according to the
present invention in metal film formation by electroless plating
results in the formation of metal films of a desired pattern.
[0241] For example, a desired metal pattern may be formed by
applying light to the structure for pattern formation according to
the present invention to form a pattern of areas having
predetermined increased critical surface tension, i.e., high
critical surface tension areas, treating the high critical surface
tension areas with a pretreatment liquid for chemical plating and
immersing the pretreated material in a chemical plating liquid to
form a desired metal pattern. According to this method, a metal
pattern can be formed without the formation of a resist pattern,
making it possible to produce printed boards, electronic circuit
elements and the like.
[0242] The structure for pattern formation according to the present
invention may be used in the formation of a metal or other pattern
by film formation techniques using vacuum.
[0243] For example, a pattern having higher adhesion is prepared by
light irradiation, and a metal component, such as aluminum, is then
heated in vacuo to deposit the meal component on the whole area of
the structure for pattern formation to form a thin meal film. Since
there is a difference in bond strength of thin metal layer between
pattern-formed areas and pattern-unformed areas, a patterned thin
metal layer may be formed by pressing a pressure sensitive adhesive
against the surface of the thin film and removing the thin film, or
by removing the thin film with a chemical.
[0244] When the removal is carried out using a pressure sensitive
adhesive, bringing the adhesive face of a sheet coated with a
pressure sensitive adhesive into contact with the surface of the
thin film followed by separation of the sheet coated with the
pressure sensitive adhesive permits the thin film in its areas
other than the pattern-formed areas to be separated due to a
difference in adhesion between the pattern-formed areas and the
pattern-unformed areas. Thus, a metal pattern call be formed.
According to this method, a metal pattern can be formed without the
formation of any resist pattern. This makes it possible to prepare
printed boards, electronic circuit elements and the like having a
higher definition pattern than the printing method.
[0245] The process for producing an element according to the
present invention will be described with reference to the
accompanying drawings.
[0246] FIG. 9 is a cross-sectional view illustrating one embodiment
of the process for producing an element according to the present
Invention.
[0247] In the step of pattern-wise exposure shown in FIG. 9 (A), as
shown in A1, a structure 101 for pattern formation comprising a
substrate 102 having thereon a photocatalyst-containing layer 104
is subjected to exposure 106 through a photomask 120 according to a
pattern of an element to be formed. Alternatively, as shown in A2,
a pattern is formed directly on the structure 101 for pattern
formation by a laser 121 having a wavelength in an ultraviolet
region or the like. Thus, areas 113 having specific wettability are
formed on the surface of the structure for pattern formation.
[0248] Next, in the step of forming a film on the whole area shown
in FIG. 9 (B), a functional layer 125 is formed on the whole area
of the structure for pattern formation by coating using a blade
coater 122 as shown in B1, by coating using a spin coater 123 as
shown in B2, or by film formation means 124 utilizing vacuum, such
as CVD, as shown in B3.
[0249] The exposed areas and the unexposed areas of the functional
layer 125 provided on the structure for pattern formation are
different from each other in adhesion due to a difference in
surface free energy created by exposure of the structure for
pattern formation.
[0250] Next, in the step of separation shown in FIG. 9 (C), a
functional layer 128 is formed by bringing the adhesive face of a
pressure sensitive adhesive tape 126 into intimate contact with the
functional layer and separating the tape from the end of the
functional layer to remove the functional layer in its areas formed
on the unexposed areas, by ejecting air through an air ejection
nozzle 127, or by removing the functional layer in its areas having
low adhesion with the aid of a release agent.
[0251] FIG. 10 is a cross-sectional view illustrating another
embodiment of the process for producing an element according to the
present invention.
[0252] As with the process shown in FIG. 9, in the process shown in
FIG. 10, a functional layer 125 is formed on a structure 101 for
pattern formation by a method as shown in FIG. 10 (A).
Subsequently, as shown in FIG. 10 (B), a substrate 129 for element
formation is brought into intimate contact with the functional
layer.
[0253] As shown in FIG. 10 (C), the functional layer 125 is
transferred onto the substrate 129 for element formation to prepare
an element having a functional layer 128.
[0254] FIG. 11 is a cross-sectional view illustrating still another
embodiment of the process for producing an element according to the
present invention.
[0255] As shown in FIG. 11 (A), a structure 101 for pattern
formation comprising a substrate 102 having thereon a
photocatalyst-containing layer 104 is subjected to exposure 106
according to a pattern of an element to be formed through a
photomask 120. Thus, areas 113 having specific wettability are
formed.
[0256] Next, as shown in FIG. 11 (B), a thermal transfer material
132 comprising a hot-melt composition layer 131 provided on a sheet
130 is put on the structure for pattern formation so that the
surface of the hot-melt composition layer faces the exposed surface
of the structure for pattern formation.
[0257] As shown in FIG. 11 (C), a hot plate 133 is then pressed
against the thermal transfer material 132 on its sheet side.
[0258] As shown in FIG. 11 (D), after cooling, the thermal transfer
material 132 is removed to finally form a pattern 105 as shown in
FIG. 11 (E).
[0259] FIG. 12 is a cross-sectional view illustrating a further
embodiment of the process for producing an element according to the
present invention.
[0260] As shown in FIG. 12 (A), a structure 101 for pattern
formation is exposed through a photomask 102 to form unexposed
areas and areas 113 having specific wettability.
[0261] As shown in FIG. 12 (B), an ultraviolet curable resin
composition 136 is ejected through an ejection nozzle 135 toward
the wettability-varied areas 113.
[0262] As shown in FIG. 12 (C), the ultraviolet curable resin
composition ejected onto the exposed areas is risen due to a
difference in surface tension created by a difference in
wettability between the unexposed areas and the exposed areas.
[0263] Next, as shown in FIG. 12 (D), ultraviolet light 137 for
curing can be applied to form microlenses 138.
[0264] Re: Second Invention B
[0265] The best mode for carrying out the invention will be
described with reference to the accompanying drawings.
Color Filter of Present Invention
[0266] FIG. 13 is a schematic longitudinal sectional view showing
one embodiment of the color filter according to the present
invention. In FIG. 13, a color filter 201 according to the present
invention comprises a transparent substrate 202, a
photocatalyst-containing layer 203 as a wettability-variable
component layer provided on the transparent substrate 202, a black
matrix (a light shielding layer) 204 and a colored layer 205 of a
plurality of colors provided on the photocatalyst-containing layer
203 in its areas having specific wettability (high critical surface
tension areas), and a protective layer 206 provided so as to cover
the black matrix 204 and the colored layer 205. In this color
filter 201, the black matrix 204 is located at each boundary region
between two adjacent colored layers 205.
[0267] FIG. 14 is a schematic longitudinal sectional view showing
another embodiment of the color filter according to the present
invention. In FIG. 14, a color filter 211 according to the present
invention comprises a transparent substrate 212, a black matrix (a
light shielding layer) 214 provided on the transparent substrate
212, a photocatalyst-containing layer 213 as a wettability-variable
component layer provided on the transparent substrate 212 so as to
cover the black matrix 214, a colored layer 215 of a plurality of
colors provided on the photocatalyst-containing layer 213 in its
areas having specific wettability (high critical surface tension
areas), and a protective layer 216 provided so as to cover the
colored layer 215. In this color filter 211, the black matrix 214
is located at each boundary region between two adjacent colored
layers 215.
[0268] FIG. 15 is a schematic longitudinal sectional view showing
still another embodiment of the color filter according to the
present invention. In FIG. 15, a color filter 221 according to the
present invention comprises: a transparent substrate 222; a black
matrix (a light shielding layer) 224 provided on the transparent
substrate 222; provided on the transparent substrate 222 so as to
cover the black matrix 224 in the following order, a laminate
comprising a photocatalyst-containing layer 223a as a first
wettability-variable component layer and a red colored layer 225R
provided on the photocatalyst-containing layer 223a in its areas
having specific wettability (high critical surface tension areas),
a laminate comprising a photocatalyst-containing layer 223b as a
second wettability variable component layer and a green colored
layer 225G provided on the photocatalyst-containing layer 223b in
its areas having specific wettability (high critical surface
tension areas), and a laminate comprising a
photocatalyst-containing layer 223c as a third wettability-variable
component layer and a blue colored layer 225B provided on the
photocatalyst-containing layer 223c in its areas having specific
wettability (high critical surface tension areas); and a protective
layer 226 provided so as to cover the colored layer 225. In this
color filter 221, the black matrix 224 is located at each boundary
region between two adjacent colored layers 225.
[0269] FIG. 16 is a schematic longitudinal sectional view showing a
further embodiment of the color filter according to the present
invention. In FIG. 16, a color filter 231 according to the present
invention comprises: a transparent substrate 232; a
photocatalyst-containing layer 233a as a first wettability-variable
component layer provided on the transparent substrate 232; a black
matrix (a light shielding layer) 234 provided on the
photocatalyst-containing layer 233a in its areas having specific
wettability (high critical surface tension areas); provided on the
first photocatalyst-containing layer 233a so as to cover the black
matrix 234 in the following order, a laminate comprising a
photocatalyst-containing layer 233b as a second
wettability-variable component layer and a red colored layer 235R
provided on the photocatalyst-containing layer 233b in its areas
having specific wettability high critical surface tension areas), a
laminate comprising a photocatalyst-containing layer 233c as a
third wettability-variable component layer and a green colored
layer 235G provided on the photocatalyst-containing layer 233c in
its areas having specific wettability (high critical surface
tension areas), and a laminate comprising a
photocatalyst-containing layer 233d as a fourth
wettability-variable component layer and a blue colored layer 235B
provided on the photocatalyst-containing layer 233d in its areas
having specific wettability (high critical surface tension areas);
and a protective layer 236 provided so as to cover the colored
layer 235. In this color filter 231, the black matrix 234 is
located at each boundary region between two adjacent colored layers
235.
[0270] Next, the construction of color filters according to the
present invention will be described.
(Transparent Substrate)
[0271] Materials for transparent substrates 202, 212, 222, and 232
constituting the color filters 201, 211, 221, and 231 include
transparent rigid materials, such as quartz glass, Pyrex glass, and
synthetic quartz sheets, and flexible transparent flexible
materials, such as transparent resin films and optical resin
sheets. Among them, particularly glass 7059 manufactured by Corning
has small coefficient of thermal expansion and hence has excellent
dimensional stability and workability in heat treatment at a high
temperature. Further, this glass is an alkali-free glass not
containing an alkali component and hence is suitable in color
filters for active matrix type color liquid crystal display
derives.
(Wettability-Variable Component Layer)
[0272] The photocatalyst-containing layer 203, 213, 223, or 233 as
the wettability-variable component layer constituting the color
filter 201, 211, 221, or 231 comprises at least a binder and a
photocatalyst and, upon exposure to light, permits the critical
surface tension to be increased through photocatalytic action to
form a high critical surface tension layer.
[0273] The mechanism of the following action of the photocatalyst
typified by titanium oxide, in the photocatalyst-containing layer
according to the present invention has not been fully elucidated
yet However, it is considered that carriers produced by light
irradiation changes the chemical structure of the organic material
through a direct reaction with a neighboring compound, or otherwise
active oxygen species produced in the presence of oxygen and
water.
[0274] Proposals utilizing the photocatalytic action include one
wherein oil stains are decomposed by light irradiation to
hydrophilify the oil stains, enabling the oil stains to be washed
away by water, one wherein a high critical surface tension layer is
formed on the surface of glass or the like to impart antifogging
properties, and one wherein a photocatalyst-containing layer is
formed on the surface of tiles or the like to form the so-called
antimicrobial tiles or the like that can reduce the number of
bacteria floating in air.
[0275] According to the present invention, when a
photocatalyst-containing layer is used as the wettability-variable
component layer, the photocatalyst varies the wettability of light
exposed areas through the action of organic groups as a part of the
binder or the oxidation, decomposition or the like of additives to
bring the exposed areas to a high critical surface tension state,
creating a large difference in wettability between exposed areas
and unexposed areas and enhancing the receptivity and repellency to
the composition for a light shielding layer and the composition for
a colored layer. This can realize the color filter.
[0276] The surface having high critical surface tension is not
limited by the numerical value of the wettability. However, for
example, the wettability in terms of contact angle with water is
preferably not more than 40.degree., more preferably not more than
10.degree.. In the present invention, the contact angle may be
measured by dropping a water droplet on the surface through a
microsyringe and, 30 sec after that, measuring the contact angle
using a contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.).
[0277] Photocatalysts usable in the present invention include metal
oxides known as photosemiconductors, such as titanium oxide
(TiO.sub.2), zinc oxide (ZnO), tin oxide (SnO.sub.2), strontium
titanate (SrTiO.sub.3), tungsten oxide (WO.sub.3), bismuth oxide
(Bi.sub.2O.sub.3), and iron oxide (Fe.sub.2O.sub.3). Among them,
titanium oxide is particularly preferred because it has high band
gap energy and is chemically stable, nontoxic, and easily
available.
[0278] Titanium oxide may be in anatase form or rutile form with
anatase form of titanium oxide being preferred. The excitation
wavelength of the anatase form of titanium oxide is not more than
380 nm. Examples of the anatase form of titanium oxide include
hydrochloric acid peptization type titania (anatase form) sols
(STS-02, average particle diameter 7 nm, manufactured by Ishihara
Sangyo Kaisha Ltd.; and ST-K01, manufactured by Ishihara Sangyo
Kaisha Ltd.) and nitric acid peptization type titania (anatase
form) sols (TA-15, average particle diameter 12 nm, manufactured by
Nissan Chemical Industries Ltd.).
[0279] A photocatalyst having a smaller particle diameter can more
effectively causes the photocatalytic reaction and hence is
preferred. Use of a photocatalyst having an average particle
diameter of preferably not more than 50 nm, more preferably not
more than 20 nm, is preferred. Further, the photocatalyst having a
smaller particle diameter can advantageously provide a
photocatalyst-containing layer having smaller surface roughness. A
surface roughness of the photocatalyst-containing layer exceeding
10 nm is unfavorable because the lowering in the water repellency
and the oil repellency of the photocatalyst-containing layer in its
unexposed areas is unsatisfactory.
[0280] According to the present invention, the binder used in the
photocatalyst-containing layer preferably has a binding energy high
enough to avoid the decomposition of the main skeleton upon
photoexcitation of the photocatalyst, and example thereof include
(1) organopolysiloxanes that hydrolyze and polycondensate a chloro-
or alkoxysilane or the like by a sol-gel reaction or the like to
develop large strength and (2) organopolysiloxanes obtained by
crosslinking reactive silicones having excellent water repellency
or oil repellency.
[0281] In the case of (1), the organopolysiloxane is composed
mainly of a hydrolysis condensate or a cohydrolysis condensate of
at least one member selected from silicon compounds represented by
general formula Y.sub.nSiX.sub.4-n, wherein n is 1 to 3; Y
represents an alkyl, fluoroalkyl, vinyl, amino, or epoxy group; and
X represents a halogen or a methoxy, ethoxy, or acetyl group.
[0282] Specific examples thereof include methyltrichlorosilane,
methyltribromosilane, methyltrimethoxysilane,
methyltriethoxysilane, methyltriisopropoxysilane,
methyl-tri-t-butoxysilane; ethyltrichlorosilane,
ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane,
ethyltriisopropoxysilane, ethyl-tri-t-butoxysilane;
n-propyltrichlorosilane, n-propyltribromosilane,
n-propyltrimethoxysilane, n-propyltriethoxysilane,
n-propyltriisopropoxysilane, n-propyl-tri-t-butoxysilane;
n-hexytrichlorosilane, n-hexyltribromosilane,
n-hexyltrimethoxysilane, n-hexyltriethoxysilane,
n-hexyltriisopropoxysilane, n-hexyl-tri-t-butoxysilane;
n-decyltrichlorosilane, n-decyltribromosilane,
n-decyltrimethoxysilane, n-decyltriethoxysilane,
n-decyltriisopropoxysilane, n-decyl-tri-t-butoxysilane;
n-octadecyltrichlorosilane, n-octadecyltribromosilane,
n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane,
n-octadecyltriisopropoxysilane, n-octadecyl-tri-t-butoxysilane;
phenyltrichlorosilane, phenyltribromosilane,
phenyltrimethoxysilane, phenyltriethoxysilane,
phenyltriisopropoxysilane, phenyl-tri-t-butoxysilane;
tetrachlorosilane, tetrabromosilane, tetramethoxysilane,
tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane;
dimethyldichlorosilane, dimethyldibromosilane,
di-methyldimethoxysilane, dimethyldiethoxysilane;
diphenyldichlorosilane, diphenyldibromosilane,
diphenyldimethoxysilane, diphenyldiethoxysilane;
phenylmethyldichlorosilane, phenylmethyldibromosilane,
phenylmethyldimethoxysilane, phenylmethyldiethoxysilane;
trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane,
triethoxyhydrosilane, triisopropoxyhydrosilane,
ti-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltribromosilane,
vinyltrimethoxysilane, vinyltriethoxysilane,
vinyltriisopropoxysilane, vinyl-tri-t-butoxysilane;
trifluoropropyltrichlorosilane, trifluoropropyltribromosilane,
trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane,
tifluoropropyltriisopropoxysilane,
trifluoropropyl-tri-t-butoxysilane;
.gamma.-glycidoxypropylmethyldimethoxysilane,
.gamma.-glycidoxypropylmethyldiethoxysilane,
.gamma.-glycidoxypropyltrimethoxysilane,
.gamma.-glycidoxypropyltriethoxysilane,
.gamma.-glycidoxypropyltriisopropoxysilane,
.gamma.-glycidoxypropyl-tri-t-butoxysilane;
.gamma.-methacryloxypropylmethyldimethoxysilane,
.gamma.-methacryloxypropylmethyldiethoxysilane,
.gamma.-methacryloxypropyltrimethoxysilane,
.gamma.-methacryloxypropyltriethoxysilane,
.gamma.-methacryloxypropyltriisopropoxysilane,
.gamma.-methacryloxypropyl-tri-t-butoxysilane;
.gamma.-aminopropylmethyldimethoxysilane,
.gamma.-aminopropylmethyldiethoxysilane,
.gamma.-aminopropyltrimethoxysilane,
.gamma.-aminopropyltriethoxysilane,
.gamma.-aminopropyltriisopropoxysilane,
.gamma.-aminopropyl-ti-t-butoxysilane;
.gamma.-mercaptopropylmethyldimethoxysilane,
.gamma.-mercaptopropylmethyldiethoxysilane,
.gamma.-mercaptopropyltrimethoxysilane,
.gamma.-mercaptopropyltriethoxysilane,
.gamma.-mercaptopropyltliisopropoxysilane,
.gamma.-mercaptopropyl-tri-t-butoxysilane;
.beta.-(3,4-epoxycyclohexylethyltrimethoxysilane,
.beta.-(3,4-epoxycyclohexyl)ethyltriethoxysilane; and partial
hydrolyzates thereof; aid mixtures thereof.
[0283] Further, polysiloxanes containing fluoroalkyl groups are
particularly preferred as the binder. Specific examples thereof
include a hydrolysis condensate or a cohydrolysis condensate of at
least one member selected from the following fluoroalkylsilanes. In
general, polysiloxanes known as fluorine silane coupling agents may
be used. [0284]
CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0285]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0286]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0287]
CF.sub.3(CF.sub.2).sub.gCH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0288]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0289]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0290]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0291]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3, [0292]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.1)C.sub.2H.sub.2Si(OCH.sub.3).sub.3-
, [0293]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.1)C.sub.2H.sub.4Si(OCH.sub.-
3).sub.3, [0294]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3-
, [0295] CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0296]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0297]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0298]
CF.sub.3(CF.sub.2).sub.gCH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0299]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0300]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0301]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0302]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3 (OCH.sub.3).sub.2,
[0303]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(O-
CH.sub.3).sub.2, [0304]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0305]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0306] CF.sub.3(CF.sub.2).sub.3 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0307]
CF.sub.3(CF.sub.2).sub.5 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, [0308] CF.sub.3(CF.sub.2).sub.7 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0309]
CF.sub.3(CF.sub.2).sub.9 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, and [0310]
CF.sub.3(CF.sub.2).sub.7SO.sub.2N(C.sub.2H.sub.5)C.sub.2H.sub.4CH.sub.2Si-
(OCH.sub.3).sub.3.
[0311] Use of the polysiloxanes containing fluoroalkyl groups as
the binder results in markedly improved water repellency and oil
repellency of the photocatalyst-containing layer in its unexposed
areas and can develop the function of inhibiting the deposition of
the black matrix composition and the composition for a colored
layer.
[0312] Examples of reactive silicones (2) include compounds having
a skeleton represented by the following general formula B-1.
##STR00004##
[0313] wherein n is an integer of two or more; and R.sup.1 and
R.sup.2 represent a substituted or unsubstituted allyl, alkenyl,
aryl, or cyanoalkyl group having 1 to 10 carbon atoms. Not more
than 40% by mole of the whole is accounted for by vinyl, phenyl, or
phenyl halide. R.sup.1 and R.sup.2 preferably represent a methyl
group because the surface free energy of the silicone is the
smallest. The molar proportion of the methyl group is preferably
not less than 60%. Further, the chain end or the side chain has in
its molecular chain at least one reactive group, such as a hydroxyl
group.
[0314] A stable organosilicon compound not causing any crosslinking
reaction, such as dimethylpolysiloxane, together with the
organopolysiloxane, may be incorporated into the binder.
[0315] According to the present invention, the
photocatalyst-containing layer may comprise a surfactant in
addition to the photocatalyst and the binder. Specific examples of
surfactants usable herein include hydrocarbon nonionic surfactants,
such as NIKKOL BL, BC, BO, and BB series manufactured by Nikko
Chemicals Co., Ltd.; and fluoro or silicone nonionic surfactants,
such as ZONYL FSN and FSO, manufactured by E.I. du Pont de Nemours
& Co., SurfluonS-141 and 145 manufactured by Asahi Glass Co.,
Ltd., Megafac F-141 and 144 manufactured by Dainippon Ink and
Chemicals, Inc., Ftergent F-200 and E-251, manufactured by Neos
Co., Ltd.; Unidyne DS-401 and 402 manufactured by Daikin
Industries, Ltd., and Fluorad FC-170 and 176 manufactured by
Sumitomo-3M Ltd. Cationic, anionic, and amphoteric surfactants may
also be used.
[0316] Further, besides the surfactant, the following compound may
be incorporated into the photocatalyst-containing layer: oligomers
and polymers, such as polyvinyl alcohol, unsaturated polyesters,
acrylic resins, polyethylene, diallyl phthalate, ethylene propylene
diene monomer, epoxy resin, phenolic resin, polyurethane, melamine
resin, polycarbonate, polyvinyl chloride, polyamide, polyimide,
styrene butadiene rubber, chloroprene rubber, polypropylene,
polybutylene, polystyrene, polyvinyl acetate, polyester,
polybutadiene, polybenzimidazole, polyacrylonitrile,
epichlorohydrin, polysulfide, and polyisoprene.
[0317] The photocatalyst-containing layer 203, 213, 223, or 233
constituting the color filter 201, 211, 221, or 231 may be formed
by dispersing a photocatalyst, a binder and optionally other
additives in a solvent to prepare a coating liquid and coating the
coating liquid. Preferred solvents usable herein include alcoholic
organic solvents, such as ethanol and isopropanol. The coating
liquid may be coated by a conventional coating method such as spin
coating, spray coating, dip coating, roll coating, or bead coating.
When the coating liquid contains an ultraviolet curable component
as the binder, the photocatalyst-containing layer may be formed by
curing through ultraviolet irradiation.
[0318] The content of the photocatalyst in the
photocatalyst-containing layer may be generally 5 to 60% by weight,
preferably 20 to 40% by weight. The thickness of the
photocatalyst-containing layer is preferably not more than 10
.mu.m.
[0319] According to the present invention, besides the
photocatalyst-containing layer, an organic polymeric resin layer
may be used as the wettability-variable component layer for color
filter 201, 211, 221, or 231. Organic polymers, such as
polycarbonate, polyethylene, polyethylene terephthalate, polyamide,
and polystyrene, when exposed to ultraviolet light, particularly
exposed to ultraviolet light containing a large amount of a
component of low wavelengths of not more than 250 nm, cause
cleavage of polymer chains to reduce the molecular weight. This
creates surface roughening to change the wettability and hence
brings the exposed areas to a high critical surface tension state.
This phenomenon can be utilized to create a large difference in
wettability between exposed areas and unexposed areas, thereby
enhancing the receptivity and repellency to the composition for a
light shielding layer and the composition for a colored layer to
obtain a color filter. As described above, the high critical
surface tension refers to a state of preferably not more than
40.degree., more preferably not more than 10.degree., in terms of
contact angle with water.
(Black Matrix)
[0320] The black matrixes 204 and 234 constituting the color
filters 201 and 231 are formed respectively on the
photocatalyst-containing layer 203 in its high critical surface
tension areas and the first photocatalyst-containing layer 233a in
its high critical surface tension areas and are located at each
boundary region between display pixels of colored layers 205 and
235 and outside the colored layer formation regions. The black
matrix 204 or 234 comprises a resin binder containing fine
particles of carbon, a metal oxide, an inorganic pigment, an
organic pigment or the like. The thickness of the black matrix may
be in the range of 0.5 to 10 .mu.m. The resin binder may comprise
one aqueous resin or a mixture of two or more aqueous resins
selected from polyacrylamide, polyvinyl alcohol, gelatin, casein,
cellulose and the like. Further, an o/w emulsion type resin
composition, for example, an emulsion of a reactive silicone, may
also be used as the resin binder.
[0321] The black matrix 214 or 224 constituting the color filter
211 or 221 is provided at each boundary region between display
pixels of the color layer 215 or 225 and outside the colored layer
formation regions. The black matrix 214 or 224 may be formed by
forming an about 1000 to 2000 .ANG.-thick thin metal film of
chromium or the like by sputtering, vacuum deposition or the like
and patterning the thin film, by forming a resin layer of a
polyimide resin, an acrylic resin, an epoxy resin or the like
containing light shielding particles, such as fine particles of
carbon, and patterning the resin layer, by forming a photosensitive
resin layer containing light shielding particles, such as fine
particles of carbon or a metal oxide, and patterning the
photosensitive resin layer, or by other method.
(Colored Layer)
[0322] The colored layer 205, 215, 225 or 235 is provided on the
photocatalyst-containing layer in its high critical surface tension
areas, and a red pattern, a green pattern, and a blue pattern are
arranged in a desired pattern form. The colored layer comprises a
layer of a colorant, such as an inorganic pigment, an organic
pigment, or a dye, or comprises a layer of a binder containing the
colorant. The resin binder may be one aqueous resin or a mixture of
two or more aqueous resins selected from polyacrylamide, polyvinyl
alcohol, gelatin, casein, cellulose and the like. An o/w emulsion
type resin composition, for example, an emulsion of a reactive
silicone, may also be used as the resin binder.
[0323] The red pattern, the green pattern, and the blue pattern
constituting the colored layer may be arranged in any conventional
form of stripe, mosaic, triangle, four pixel disposition and the
like.
(Protective Layer)
[0324] The protective layer 206, 216, 226 or 236 functions to
flatten the surface of the color filter and to prevent the elution
of the colored layer or the components contained in the colored
layer and the photocatalyst-containing layer into a liquid crystal
layer. The thickness of the protective layer may be determined by
taking into consideration the light transmission of the material
used, the surface state of the color filter and the like, for
example, may be in the range of 0.1 to 2.0 .mu.m. The protective
layer may be formed using a material selected from, for example,
conventional transparent photosensitive resins, two-component
curable transparent resins and the like that have light
transmittance and the like required of the transparent protective
layer.
Process for Producing Color Filter According to Present
Invention
FIRST EMBODIMENT
[0325] Next, an embodiment of the process for producing a color
filter according to the present invention will be described by
taking a color filter 201 shown in FIG. 13 as an example with
reference to FIG. 17.
(First Step)
[0326] In the first step, a photocatalyst-containing layer 203 as a
wettability-variable component layer is formed on a transparent
substrate 202 (FIG. 17 (A)). The photocatalyst-containing layer 203
may be formed by dispersing the photocatalyst, the binder, and
optionally other additives in a solvent to prepare a coating
liquid, coating the coating liquid, and allowing hydrolysis and
polycondensation to proceed to strongly fix the photocatalyst in
the binder. Preferred solvents usable herein include alcoholic
organic solvents, such as ethanol and isopropanol. The coating
liquid may be coated by a conventional coating method, such as spin
coating, spray coating, dip coating, roll coating, or bead
coating.
[0327] Next, the photocatalyst-containing layer 203 in its black
matrix forming areas are exposed to light to bring light exposed
areas 203' to a high critical surface tension state through
photocatalytic action. Thus, areas having specific wettability are
formed (FIG. 17 (B)). This exposure to light may be pattern-wise
exposure by means of a mercury lamp, a metal halide lamp, a xenon
lamp or the like through a photomask for a black matrix.
Alternatively, a laser, such as an excimer laser or a YAG laser,
may be applied to directly form a pattern of the black matrix. The
wavelength of the light used in this light irradiation may be
generally not more than 400 nm, preferably not more than 380 nm.
The exposure in the light irradiation may be one that is necessary
for the light exposed areas 203' to develop high critical surface
tension (for example, a water contact angle of not more than
10.degree.).
[0328] A coating composition for the black matrix is then deposited
on the light exposed areas 203' and cured to form a black matrix
204 (FIG. 17 (C)). The black matrix composition may be deposited on
the exposed areas 203' by coating the coating composition onto the
photocatalyst-containing layer 203 according to a conventional
coating method, such as spray coating, dip coating, roll coating,
or bead coating. In this case, the coating composition is repelled
by the unexposed areas having low critical surface tension and
removed, so that the coating composition is selectively deposited
only onto the exposed areas having high critical surface tension
(areas having specific wettability) 203'. Alternatively, the black
matrix composition may be deposited onto the exposed areas 203' by
a nozzle ejection method, such as ink jetting. In this case, the
black matrix composition fed into the exposed areas 203' through
the nozzle ejection is homogeneously diffused and deposited in the
exposed areas 203' showing high critical surface tension, whereas
the black matrix composition are not diffused in the unexposed
areas having low critical surface tension. In this case, even
though the coating composition fed by the nozzle ejection overflows
from the exposed areas 203', the overflowed composition is repelled
by the unexposed areas having low critical surface tension and
finally deposited within the exposed areas 203'.
[0329] Further, the formation of the black matrix 204 may be
carried out by film formation utilizing vacuum. Specifically, the
black matrix 204 may be formed by a method which comprises forming
a thin metal film on the exposed photocatalyst-containing layer 203
by vapor deposition or the like and patterning the thin metal film
utilizing a difference in adhesion between the unexposed areas and
the exposed areas 203', that is, by separation using a
pressure-sensitive adhesive tape, by solvent treatment or by other
method.
(Second Step)
[0330] Next, red pattern 205R forming areas on the
photocatalyst-containing layer 203 are exposed to light to bring
exposed areas 203' to a high critical surface tension state through
photocatalytic action to form areas having specific wettability
(FIG. 17 (D)). As with the light irradiation in the step of forming
the black matrix (first step), this light irradiation may be any of
pattern-wise exposure and light beam exposure. A coating
composition for a red pattern is fed to the
photocatalyst-containing layer 203. As with the feed of the coating
composition in the step of forming the black matrix (first step),
the coating composition for a red pattern may be fed by a coating
method, a nozzle ejection method, such as ink jetting, a film
formation method utilizing vacuum or the like. The coating
composition fed to the photocatalyst-containing layer is repelled
by the black matrix 204 and the unexposed areas having low critical
surface tension and removed, so that the coating composition is
selectively deposited only onto the exposed areas 203' having high
critical surface tension. The coating composition for a red pattern
deposited onto the exposed areas 203' is cured to form a red
pattern 205R (FIG. 17 (E)). When the red pattern 205R is formed by
the film formulation method utilizing vacuum, a thin film of the
coating composition for a red pattern is formed on the exposed
photocatalyst-containing layer 203 by vapor deposition or the like,
followed by patterning of the thin film utilizing a difference in
adhesion between the unexposed areas and the exposed areas 203',
that is, by separation using a pressure-sensitive adhesive tape, by
solvent treatment or by other method, to form a red pattern
205P.
[0331] The same procedure as used in the formation of a red pattern
is repeated to form a green pattern 205G and a blue pattern 205B.
Thus, a colored layer 205 comprising a red pattern, a green
pattern, and a blue pattern is formed. A protective layer 206 is
formed on the colored layer 205 to obtain a color filter 201 shown
in FIG. 13 (FIG. 17 (F)).
[0332] When the nozzle ejection method is used in the second step
and each color pattern (pixel) is surrounded by the black matrix
204, it is possible to form a colored layer by a method which
comprises applying light to the whole areas of the
photocatalyst-containing layer 203 with the black matrix 204 formed
thereon in the first step to bring the whole area of the
photocatalyst-containing layer to a high critical surface tension
through photocatalytic action and feeding and homogeneously
diffusing and depositing a coating composition for a color pattern
onto the pattern forming areas for each color through a nozzle,
followed by curing to form a colored layer.
[0333] When an organic polymeric resin layer is used as the
wettability-variable component layer, light irradiation is carried
out using ultraviolet light containing a large amount of a
component of low wavelengths of not more than 250 nm.
SECOND EMBODIMENT
[0334] Next, the second embodiment of the process for producing a
color filter according to the present invention will be described
by taking a color filter 211 shown in FIG. 14 as an example with
reference to FIG. 18.
(First Step)
[0335] In the first step, a photocatalyst-containing layer 213 is
formed on a transparent substrate 212 with a black matrix 214
previously formed thereon (FIG. 18 (A)). The
photocatalyst-containing layer 213 may be formed in the same manner
as used in the formation of the photocatalyst-containing layer in
the first embodiment.
[0336] Next, the photocatalyst-containing layer 213 in its red
pattern forming areas are exposed to light to bring light exposed
areas 213' to a high critical surface tension state through
photocatalytic action. Thus, areas having specific wettability are
formed (FIG. 18 (B)). As with the light irradiation in the step of
forming a black matrix (first step) in the first embodiment, the
light irradiation may be pattern-wise exposure or light beam
exposure.
(Second Step)
[0337] Next, a coating composition for a red pattern is fed to the
photocatalyst-containing layer 213. As with the feed of the coating
composition in the step of forming the black matrix (first step) in
the first embodiment, the coating composition for a red pattern may
be fed by a coating method, a nozzle ejection method, such as ink
jetting, a film formation method utilizing vacuum or the like. The
coating composition fed to the photocatalyst-containing layer is
repelled by the unexposed areas having low critical surface tension
and removed, so that the coating composition is selectively
deposited only onto the exposed areas 213' having high critical
surface tension. The coating composition for a red pattern
deposited onto the exposed areas 213' is cured to form a red
pattern 215R (FIG. 18 (C)).
[0338] The same procedure as used in the formation of the red
pattern is repeated to form a green pattern 215G and a blue pattern
215B. Thus, a colored layer 215 comprising a red pattern, a green
pattern, and a blue pattern is formed. A protective layer 216 is
formed on the colored layer 215 to obtain a color filter 211 shown
in FIG. 14 (FIG. 18 (D)).
[0339] When the nozzle ejection method is used in the second step
and a pattern of the black matrix 214 is formed so as to surround
each color pattern (pixel), it is possible to form a colored layer
by a method which comprises applying light to the whole area of the
photocatalyst-containing layer 213 formed on the transparent
substrate 212 in the first step so as to cover the black matrix 214
through a mask M, as shown in FIG. 19, having a light shielding
pattern (a hatched region shown in FIG. 19) of which the line width
(w) is smaller than the line with (W) of the black matrix 214,
thereby bringing the whole area of the photocatalyst-containing
layer to a high critical surface tension state through
photocatalytic action, and, thereafter, feeding and homogeneously
diffusing and depositing a coating composition for a color pattern
onto the pattern forming areas for each color through a nozzle,
followed by curing to form a colored layer.
[0340] When an organic polymeric resin layer is used as the
wettability-variable component layer, light irradiation is carried
out using ultraviolet light containing a large amount of a
component of low wavelengths of not more than 250 nm.
THIRD EMBODIMENT
[0341] Next, the third embodiment of the process for producing a
color filter according to the present invention still be described
by taking a color filter 221 shown in FIG. 15 as an example with
reference to FIG. 20.
[0342] At the outset, a first photocatalyst-containing layer 223a
is formed on a transparent substrate 222 with a black matrix 224
previously formed thereon. Next, the photocatalyst-containing layer
223a in its red pattern forming areas are exposed to light to bring
light exposed areas 223'a to a high critical surface tension state
through photocatalytic action. Thus, areas having specific
wettability are formed (FIG. 20 (A)). The first
photocatalyst-containing layer 223a may be formed in the same
manner as used in the formation of the photocatalyst-containing
layer 203 in the first embodiment. As with the light irradiation in
the step of forming a black matrix (first step) in the first
embodiment, the exposure of the first photocatalyst-containing
layer 223a to light may be pattern-wise exposure or light beam
exposure. Next, a coating composition for a red pattern is fed to
the first photocatalyst-containing layer 223a. As with the feed of
the coating composition in the step of forming the black matrix
(first step) in the first embodiment, the coating composition for a
red pattern may be fed by a coating method, a nozzle ejection
method, such as ink jetting, a film formation method utilizing
vacuum or the like. The coating composition fed to the first
photocatalyst-containing layer is repelled by the unexposed areas
having low critical surface tension and removed, so that the
coating composition is selectively deposited only onto the exposed
areas 223'a having high critical surface tension. The coating
composition for a red pattern deposited onto the exposed areas
223'a is cured to form a red pattern 225R (FIG. 20 (B)). Thus, a
laminate comprising a first photocatalyst-containing layer 223a and
a red pattern 225R formed on the photocatalyst-containing layer
223a in its exposed areas (high critical surface tension areas)
223'a is formed on the transparent substrate 222.
[0343] In the same manner as used in the formation of the red
pattern, a second photocatalyst-containing layer 223b is formed.
The photocatalyst-containing layer 223b on its green pattern 225G
forming areas is exposed to light to bring exposed areas 223'b to a
high critical surface tension state through photocatalytic action.
Thus, areas having specific wettability are formed (FIG. 20 (C)). A
coating composition for a green pattern is deposited onto the
exposed areas 223'b, following by curing to form a green pattern
225G (FIG. 20 (D)). Thus, a laminate comprising a second
photocatalyst-containing layer 223b and a green pattern 225G formed
on the photocatalyst-containing layer 223b in its exposed areas
(high critical surface tension areas) 223'b is formed on the
transparent substrate 222.
[0344] The above procedure is repeated to form, on the transparent
substrate 222, a laminate comprising a third
photocatalyst-containing layer 223c and a blue pattern 225B formed
on the photocatalyst-containing layer 223c in its exposed areas
(high critical surface tension areas) 223'c. Thus, a colored layer
225 comprising a red pattern, a green pattern, and a blue pattern
is formed. A protective layer 226 is formed on the colored layer
225 to obtain a color filter 221 shown in FIG. 15 (FIG. 20
(E)).
[0345] When an organic polymeric resin layer is used as the
wettability-variable component layer, the light irradiation is
carried out using ultraviolet light containing a large amount of a
component of low wavelengths of not more than 250 nm.
FOURTH EMBODIMENT
[0346] Next, the fourth embodiment of the process for producing a
color filter according to the present invention will be described
by taking a color filter 231 shown in FIG. 16 as an example with
reference to FIG. 21.
(First Step)
[0347] In the first step, a first photocatalyst-containing layer
233a is formed on a transparent substrate 232. The
photocatalyst-containing layer 233a on its black matrix forming
areas is exposed to light to bring exposed areas 233'a to a high
critical surface tension state through photocatalytic action. Thus,
areas having specific wettability are formed (FIG. 21(A)). The
first photocatalyst-containing layer 233a may be formed in the same
manner as used in the formation of the photocatalyst-containing
layer 203 in the first embodiment As with the light irradiation in
the step of forming a black matrix (second step) in the first
embodiment, the exposure of the first photocatalyst-containing
layer 233a to light may be pattern-wise exposure or light beam
exposure.
[0348] Next, a coating composition for a black matrix is deposited
on the exposed areas 233'a, followed by curing to form a black
matrix 234 (FIG. 21 (B)). As with the deposition of the black
matrix composition in the step of forming a back matrix (first
step) in the first embodiment, the deposition of the black matrix
composition onto the exposed areas 233'a may be carried out by a
coating method, a nozzle ejection method, such as ink jetting, a
film formation method utilizing vacuum or the like.
(Second Step)
[0349] A second photocatalyst-containing layer 233b is formed onto
the first catalyst-containing layer 233a so as to cover the black
matrix 234 formed on the first step. The photocatalyst-containing
layer 233b on its red pattern forming areas is exposed to light to
bring exposed areas 233'b to a high critical surface tension state
through photocatalytic action. Thus, areas having specific
wettability are formed (FIG. 21 (C)). The second
photocatalyst-contain ng layer 233a may be formed in the same
manner as used in the formation of the first
photocatalyst-containing layer 233a. As with the exposure of the
first photocatalyst-containing layer 233a to light, the exposure of
the second photocatalyst-containing layer 233b to light may be
pattern-wise exposure or light beam exposure. Subsequently, a
coating composition for a red pattern is fed to the second
photocatalyst-containing layer 233b. As with the feed of the
coating composition in the step of forming a black matrix (second
step) in the first embodiment, the feed of the coating composition
for a red pattern may be fed by a coating method, a nozzle ejection
method, such as ink jetting, a film formation method utilizing
vacuum or the like. The coating composition fed to the
photocatalyst-containing layer is repelled by the black matrix 234
and the unexposed areas having low critical surface tension and
removed, so that the coating composition is selectively deposited
only onto the exposed areas 233'b having high critical surface
tension. The coating composition for a red pattern deposited onto
the exposed areas 233'b is cured to form a red pattern 235R (FIG.
21 (D)). Thus, a laminate comprising a second catalyst-containing
layer 233b and a red pattern 235R formed on the
photocatalyst-containing layer 233b in its exposed areas (high
critical surface tension areas) 233'b is formed on the first
photocatalyst-containing layer 233a.
[0350] The same procedure is repeated to form, on the second
photocatalyst-containing layer 233b, a laminate comprising a third
photocatalyst-containing layer 233c and a green pattern 235G formed
on the photocatalyst-containing layer 233c in its exposed areas
(high critical surface tension areas) 233'c. Further, a laminate
comprising a fourth photocatalyst-containing layer 233d and a blue
pattern 235B formed on the photocatalyst-containing layer 233d in
its exposed areas (high critical surface tension areas) 233'd is
formed on the third photocatalyst-containing layer 233c. Thus, a
colored layer 235 comprising a red pattern, a green pattern, and a
blue pattern is formed. A protective layer 236 is formed on the
colored layer 235 to obtain a color filter 231 shown in FIG. 16
(FIG. 21 (E)).
[0351] As described above, according to the present invention, the
composition for a black matrix and the composition for a colored
layer can be deposited selectively onto the black matrix or colored
layer forming areas. Therefore, the coating composition can be very
efficiently utilized.
[0352] When an organic polymeric resin layer is used as the
wettability-variable component layer, the light irradiation is
carried out using ultraviolet light containing a large amount of a
component of low wavelengths of not more than 250 nm.
[0353] In the above embodiments of the color filter and the process
for producing a color filter, the number of colors and position of
the colored layer and the like are illustrative only and are not
intended to limit the present invention.
[0354] Re: Third Invention C
[0355] Pattern Based on Difference in Wettability
[0356] (Wettability)
[0357] The substrate used in the present invention has on its
surface areas different from each other in wettability, that is,
areas on which a liquid containing a lens forming material
(hereinafter referred to also as "lens composition") is depositable
and areas on which the lens composition is undepositable. The
numerical value of the wettability is not particularly limited so
far as the surface of the substrate has areas different from each
other in wettability. The surface having areas different from each
other in wettability may be the surface of the substrate per se or
the substrate surface after surface treatment such as dampening
water treatment.
[0358] In the present invention, the wettability may be evaluated,
for example, by the contact angle of the surface with a liquid
containing only a dispersion force component, such as a saturated
hydrocarbon liquid, a liquid having a hydrogen bond, such as water,
or a liquid containing a dispersion force component and a polar
component, such as methylene iodide, or by surface free energy of
the solid surface or the critical surface tension of the solid
surface. Although no particular limitation is imposed, the
wettability of the substrate used in the present invention may be,
for example, not less than 70 dyne/cm for areas having higher
wettability and, for example, not more than 30 dyne/cm for areas
having lower wettability.
[0359] (Wettability Variation Method)
[0360] Methods for varying the wettability of the surface of the
substrate to form a pattern include, but are not limited to, a
method wherein the surface of the substrate is modified, a method
wherein a film having different wettability is partially formed on
the surface of the substrate, a method wherein a film on the
surface of the substrate is partially removed to form areas having
different wettability, and a method wherein a film is formed on the
whole surface of the substrate followed by partial modification of
the film.
[0361] Among them, a preferred method is to form a film on the
whole surface of the substrate followed by partial modification of
the film. In particular, the formation of a
photocatalyst-containing layer, of which the wettability is
variable upon light irradiation on the whole surface of the
substrate, followed by light irradiation to form a pattern is more
advantageous, for example, in that development is unnecessary, no
waste is produced in the transfer or removal at the time of pattern
formation, areas having different wettability can be formed without
providing a large difference in level, and the material is
inexpensive. Further, microlenses can be mass produced with high
accuracy.
[0362] (Form of Pattern)
[0363] A composition for a lens may be deposited onto either the
wettability-varied areas or the wettability-unvaried areas, and the
form of the pattern is not particularly limited so far as lenses
can be formed. Preferably, the pattern for the lens composition
deposited may be in any of square, circle, regular hexagon and the
like.
[0364] The number of areas on which the lens composition are to be
deposited is not limited. Preferably, a large number of deposited
areas are orderly provided.
[0365] The size of the pattern may be properly designed according
to applications. The process for producing a lens according to the
present invention also features the formation of fine microlenses.
For example, microlenses having a very small diameter of, for
example, 2 .mu.m can be produced.
[0366] Although the area ratio of the lens composition-deposited
region to the lens composition-undeposited region is not limited,
it may be, for example, 10000:1 to 1:10000.
[0367] (Lens Forming Material)
[0368] Materials for the lens of the present invention are not
particularly limited so far as they are transparent materials that,
after deposition as a liquid onto a substrate, can be cured and,
after curing, can function as a lens according to applications.
[0369] Examples of materials usable for the lens of the present
invention include combinations of photocurable resins with
photopolymerization initiators, and thermosetting resins. Among
them, photocurable resins, such as ultraviolet curable resins, are
preferred because they can be easily and rapidly cured and the
temperature of the lens forming material and the substrate does not
become high at the time of curing.
[0370] When the material is colored with a colorant to prepare a
color lens having the function of a color filter, colorants usable
herein include dyes, inorganic pigments, and organic pigments.
[0371] More specific examples of materials usable for lenses are as
follows.
[0372] (1) Photocurable Resin Composition
[0373] Photocurable resin compositions which may be preferably used
in the present invention are highly transparent to visible light.
The photocurable resin composition refers to a monomer or an
oligomer that has at least one functional group and is ionically
polymerized or radically polymerized by ions or radical generated
upon application of a curing energy radiation to a
photopolymerization initiator to increase the molecular weight or
to form a crosslinked structure. The functional group refers to an
atomic group or a bonding form causative of reactions of vinyl,
carboxyl, or hydroxyl groups.
[0374] Monomers and oligomers usable herein include unsaturated
polyester, enethiol, acrylic and other monomers and oligomers.
Among them, acrylic monomers and oligomers are preferred from the
viewpoints of curing speed and the range of selectable properties.
Representative examples of acrylic monomers and oligomers usable
herein include the following compounds.
[0375] (1-1) Monofunctional Compounds
[0376] 2-Ethylhexyl acrylate, 2-ethylhexyl EO adduct acrylate,
ethoxy diethylene glycol acrylate, 2-hydroxyethyl acrylate,
2-hydroxypropyl acrylate, caprolactone adduct of 2-hydroxyethyl
acrylate, 2-phenoxyethyl acrylate, phenoxydiethylene glycol
acrylate, nonyl phenol EO adduct acrylate, acrylate which has been
caprolactone added to nonyl phenol EO adduct,
2-hydroxy-3-phenoxypropyl acrylate, tetrahydrofurfuryl acrylate,
furfuryl alcohol caprolactone adduct acrylate, acryloylmorpholine,
dicyclopentenyl acrylate, dicyclopentanyl acrylate,
dicyclopentenyloxyethyl acrylate, isobornyl acrylate,
4,4-dimethyl-1,3-dioxolane caprolactone adduct acrylate, and
3-methyl-5,5-dimethyl-1,3-dioxolane caprolactone adduct
acrylate.
[0377] (1-2) Polyfunctional Compounds
[0378] Hexanediol diacrylate, neopentyl glycol diacrylate,
polyethylene glycol diacrylate, tripropylene glycol diacrylate,
hydroxypivalic acid neopentyl glycol ester diacrylate,
hydroxypivalic acid neopentyl glycol ester caprolactone adduct
diacrylate, acrylic acid adduct of 1,6-hexanediol diglycidyl ether,
diacrylate of acetal compound of hydroxypivalaldehyde with
trimethylolpropane, 2,2-bis[4-(acryloyloxydiethoxy)phenyl]propane,
2,2-bis[4-(acryloyloxydiethoxy)phenyl]methane, hydrogenated
bisphenol ethylene oxide adduct diacrylate, tricyclodecane
dimethanol diacrylate, trimethylolpropane triacrylate,
pentaerythritol triacrylate, trimethylolpropane propylene oxide
adduct triacrylate, glycerin propylene oxide adduct triacrylate,
mixture of dipentaerythritol hexaacrylate with pentaacrylate,
dipentaerythritol caprolactone adduct acrylate,
tris(acryloyloxyethyl)isocyanurate, 2-acryloyloxyethyl phosphate
and the like.
[0379] (2) Photopolymerization Initiator
[0380] The photopolymerization initiator used in the present
invention is not particularly limited and may be selected from
conventional polymerization initiators. Representative examples of
photopolymerization initiators usable herein include the following
compounds.
[0381] (2-1) Carbonyl Compounds
[0382] Acetophenone, benzophenone, Michler's ketone, benzyl,
benzoin, benzoin ether, benzyl dimethyl ketal, benzoin benzoate,
.alpha.-acyloxime ester and the like.
[0383] (2-2) Sulfur Compounds
[0384] Tetramethylthiuram monosulfide, thioxanthones and the
like.
[0385] (2-3) phosphorus compounds
[0386] 2,4,6-Trimethylbenzoyl diphenylphosphinoxide and the
like
[0387] (3) Thermoplastic Resin Composition
[0388] Thermoplastic resin compositions having high transparency to
visible light region. Preferred are thermoplastic resin
compositions that are excellent in transparency, as well as in
optical properties, such as refractive index, dispersion
properties, and birefringence. Representative examples of
thermoplastic resin compositions usable herein include homopolymers
or copolymers of polycarbonate, polymethyl methacrylate, and methyl
phthalate, polyethylene terephthalate, polystyrene, diethylene
glycol bisallyl carbonate, acrylonitrile/styrene copolymer, methyl
methacrylate styrene copolymer, and poly(-4-methylpentene-1).
[0389] (4) Colorant
[0390] In the lens according to the present invention, dissolution
of a dye in a material for a lens, dispersion of a pigment in the
material for a lens or the like to color the material can provide a
color lens. The colorant usable in the present invention may be any
of a dye, an organic pigment and an inorganic pigment which are
commonly used in color filters. Among them, materials are preferred
which can provide high color density and are less likely to cause
fading at the time of curing of the lens and in use, and examples
thereof are as follows:
[0391] dyes, for example, azo dyes, anthraquinone dyes, indigoid
dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes,
methine dyes, quinoline dyes, nitro dyes, benzoquinone dyes,
naphthoquinone dyes, naphthalimide dyes, perinone dyes, pyrylium
dyes, thiopyrylium dyes, azulenium dyes, and squarylium salt dyes,
and organic pigments, for example, dianthraquinone, copper
halogenide phthalocyanine, copper phthalocyanine, and other
phthalocyanine pigments, polycyclic quinone pigments, such as
perylene pigments and pyranthrone pigments, indigo pigments,
quinacridone pigments, pyrrole pigments, pyrrolopyrrole pigments,
and azo pigments. Other dyes and pigments may also be used so far
as they can satisfy colorant requirements. Further, the colorants
may be used in any combination of two or more in any desired ratio
so far as there are no other limitations.
[0392] (Composition for Lens)
[0393] The composition for a lens is not particularly limited so
far as the composition contains materials for the lens.
[0394] Compositions for a lens include a liquid comprising a
monomer and a polymerization initiator, a solution or a dispersion
of a monomer and a polymerization initiator, a liquid comprising an
oligomer and a polymerization initiator, a solution or a dispersion
of an oligomer and a polymerization initiator, and a solution or a
dispersion of a monomer, an oligomer, and a polymerization
initiator.
[0395] A material liquid for a color lens may be a solution or a
dispersion prepared by dissolving or dispersing a colorant in the
above material liquid.
[0396] (Areas on Which Composition for Lens is to be Deposited)
[0397] In the process for producing a lens according to the present
invention, the composition for a lens may be deposited onto any
area of a pattern based on a difference in wettability on the
surface of a substrate. In other words, the composition may be
deposited onto the surface of the substrate in its
wettability-varied areas or wettability-unvaried areas. In one
specific example thereof, the composition may be deposited onto
high wettability areas or high critical surface tension areas, or
alternatively may be deposited onto low wettability areas or low
critical surface tension areas. When the composition for a lens is
deposited onto the low critical surface tension areas, preferably,
the high critical surface tension areas are previously coated with
dampening water, followed by deposition of the composition for a
lens onto the low critical surface tension areas while avoiding
direct contact of the lens composition with the high critical
surface tension areas.
[0398] (Adjustment of Focal Length of Lens)
[0399] One of great features of the process for producing a lens
according to the present invention is that the adjustment of the
focal length of the lens, that is, varying the curvature, can be
very easily performed.
[0400] A specific example of the adjustment of the focal length of
the lens according to the present invention will be described with
reference to FIG. 22. A photocatalyst-containing layer 303 having
low wettability by the composition for a lens is provided on a
transparent substrate 301. A part of the photocatalyst-containing
layer 303 constitutes a wettability-varied photocatalyst-containing
layer having high wettability by the composition for a lens and
corresponding to areas on which the composition for a lens is to be
deposited (hereinafter referred to also as "modified
photocatalyst-containing layer 303"). Further, a composition 302
for a lens is deposited on the modified photocatalyst-containing
layer 303'. FIG. 22 (A) shows an embodiment wherein a small amount
of the composition 302 for a lens has been deposited. Even when the
amount of the composition 302 for a lens is small, the composition
is spread over the whole modified photocatalyst-containing layer
303', making it possible to form microlenses having small curvature
and long focal length. FIG. 22 (B) shows an embodiment wherein a
medium amount of the composition for a lens has been deposited. As
compared with FIG. 22 (A), microlenses having larger curvature and
shorter focal length are formed. FIG. 22 (C) shows an embodiment
wherein a large amount of the composition for a lens has been
deposited. Although the amount of the composition 302 for a lens is
large, the composition is not spread on the
photocatalyst-containing layer 303 having low wettability. As a
result, microlenses having high curvature and short focal length
are formed.
[0401] Thus, the process for producing a lens according to the
present invention has an advantage that the focal length of the
microlens can be simply regulated by varying the amount of the
composition for a lens deposited per place. Further, since the size
of the bottom is specified by the size of the pattern,
advantageously, a change in amount of the composition for a lens
does not results in a change in the size of the bottom.
Furthermore, even though the composition for a lens is deposited on
a position slightly deviated from an originally predetermined
position, the difference in wettability permits the position of the
composition for a lens to be corrected to the position of the
pattern. Therefore, a microlens array having very high positional
accuracy can be advantageously produced.
[0402] (Deposition of Composition for Lens by Coating)
[0403] In the process for producing a lens according to the present
invention, the composition for a lens may be deposited by coating
onto the surface of the substrate. Specific examples of coating
methods usable herein include dip coating, roll coating, bead
coating, spin coating, air doctor coating, blade coating, knife
coating, rod coating, gravure coating, rotary screen coating, kiss
coating, slot orifice coating, spray coating, cast coating, and
extrusion coating. These coating methods are advantageous in that a
large amount of lens shapes can be prepared in short time.
[0404] An array of lenses of a plurality of colors may be produced
by repeating, one color by one color as many times as required for
the necessary number of colors, the step of forming a pattern based
on a difference in wettability on the surface of the substrate, the
step of depositing the colored composition for a lens by the
coating method as described above, and optionally the step of
curing the composition for a lens.
[0405] (Deposition of Composition for Lens by Ejection Through
Nozzle)
[0406] In the process for producing a lens according to the present
invention, the composition for a lens can be deposited onto the
surface of the substrate by ejection through a nozzle. Specific
examples of ejection methods usable herein include ejection using
microsyringe, ejection using a dispenser, ink jetting, a method
wherein the composition for a lens is ejected from a needle by
external stimulation, such as an electric field, a method wherein
the composition for a lens is ejected from a vibrating element,
such as piezo element, which is vibrated by external stimulation,
and a method wherein a composition for a lens deposited on a needle
is deposited on the surface of the substrate. These methods are
advantageous in that lens shapes having a large contact angle and
large height can be prepared.
[0407] When an array of lenses of a plurality of colors is
produced, nozzles in the necessary number of colors as described
above are used, and colored compositions for a lens containing
materials for lenses of respective colors are ejected through
respective nozzles and deposited onto the surface of the
substrate.
[0408] When an array of lenses of a plurality of colors is produced
through a nozzle for a single color, the array of color lenses may
be produced by repeating, one color by one color as many times as
required for the necessary number of colors, the step of forming a
pattern based on a difference in wettability on the surface of the
substrate, the step of depositing the colored composition for a
lens by ejection through the nozzle as described above, and
optionally the step of curing the composition for a lens.
[0409] (Microlens Array)
[0410] In the process for producing a lens according to the present
invention, preferably, microlenses are orderly arranged to produce
a microlens array. The sequence of the microlens array correspond
to the pattern based on a difference in wettability, and the shape
of the bottom of the microlens also corresponds to the pattern
based on a difference in wettability. Therefore, the position and
shape of the microlenses according to a preferred embodiment of the
present invention are high. Further, the accuracy of the
composition for a lens can be deposited only onto areas having high
wettability. In this case, the contact is more intimate, and,
hence, microlenses having higher strength can be produced. The
contact surface can be designed to be not only circular but also
polygonal. Therefore, as compared with circular lenses, the area of
other portions than the lens shape can be reduced, making it
possible to easily produce an array of microlenses having a high
numerical aperture.
[0411] Further, deposition of the colored composition for a lens
can provide, as with the above microlenses, an array of color
microlenses having high positional and shape accuracy, high
adhesion and strength, and high numerical aperture can be easily
produced.
[0412] FIG. 23 is a cross-sectional view of a microlens array
according to a preferred embodiment of the present invention. The
microlens array comprises: a substrate 301 having thereon a
photocatalyst-containing layer 303 and a wettability-varied
modified photocatalyst-containing layer 303'; and lenses 302
provided on the unmodified photocatalyst-containing layer 303.
[0413] FIG. 24 is a cross-sectional view of a color microlens array
according to a preferred embodiment of the present invention. The
color microlens array comprises: a substrate 301 having thereon a
photocatalyst-containing layer 303 and a wettability-varied
modified photocatalyst-containing layer 303'; and a first color
lens 315, a second color lens 316, and a third color lens 317
provided on the unmodified photocatalyst-containing layer 303.
[0414] Substrate
[0415] For the material constituting the substrate, a pattern based
on a difference in wettability may be formed on the surface thereof
either in itself or by forming a layer. The material is not
particularly limited so far as it may form microlenses. When the
material for the substrate is transparent and the transparent
material is used, there is no need to provide the step of removing
the lenses from the substrate. This is very effective in producing
a microlens array. Materials for the above substrate are not
particularly limited and may be inorganic or organic materials so
far as they are commonly used in the production of microlens
arrays. Preferred examples thereof include soda glass, quartz
glass, optical glass (BSC7, manufactured by HOYA), glass for
electronics (such as alkali-free glass), translucent ceramics,
plastic films and sheets of polycarbonate, methyl methacrylate
homopolymer or copolymer, polyethylene terephthalate, and
polystyrene.
[0416] The shape and thickness of the substrate may be varied
depending-upon applications, and the substrate may be in any fold
commonly used in the art.
Photocatalyst-containing Layer
[0417] (Principle of Variation in Wettability)
[0418] According to a preferred embodiment of the present
invention, a photocatalyst capable of creating a chemical change in
materials (such as a binder) around it upon light irradiation may
be used to form a pattern based on a difference in wettability on
light exposed areas. The mechanism of the action of the
photocatalyst typified by titanium oxide according to a preferred
embodiment of the present invention has not been fully elucidated.
However, it is considered that carriers produced in the
photocatalyst upon light irradiation directly change the chemical
structure of the binder and the like, or otherwise active oxygen
species produced in the presence of oxygen and water changes the
chemical structure of the binder and the like. Thus, the
wettability of the surface of the substrate is varied.
[0419] According to a preferred embodiment of the present
invention, the photocatalyst changes the wettability of light
exposed areas through oxidation, decomposition or the like of
organic groups as a part of the binder and additives to bring the
exposed areas to a high critical surface tension state. This
creates a large difference in wettability between the exposed areas
and the unexposed areas to record pattern information.
[0420] (Photocatalyst Material)
[0421] Preferred photocatalyst materials usable in the present
invention include, for example, metal oxides known as
photosemiconductors, such as titanium oxide (TiO.sub.2), zinc oxide
(ZnO), tin oxide (SnO.sub.2), strontium titanate (SrTiO.sub.3),
tungsten oxide (WO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), and
iron oxide (Fe.sub.2O.sub.3). Among them, titanium oxide is
particularly preferred because it has high band gap energy and is
chemically stable, nontoxic, and easily available.
[0422] Titanium oxide as the photocatalyst may be in anatase form
or rutile form with anatase form of titanium oxide being preferred.
Specific examples of anatase form of titanium oxide usable herein
include hydrochloric acid peptization type titania sols (STS-02,
average crystal diameter 7 nm, manufactured by Ishihara Sangyo
Kaisha Ltd.) and nitric acid peptization type titania sols (TA-15,
average crystal diameter 12 nm, manufactured by Nissan Chemical
Industries Ltd.).
[0423] Preferably, the photocatalyst has a small particle diameter
because the photocatalytic reaction takes place efficiently to
render the surface roughness of the photocatalyst-containing layer
small. The average particle diameter is preferably not more than 50
nm, more preferably not more than 20 nm.
[0424] The content of the photocatalyst in the
photocatalyst-containing layer is preferably 5 to 60% by weight,
more preferably 20 to 40% by weight.
[0425] (Binder Component)
[0426] According to a preferred embodiment of the present
invention, the binder used in the photocatalyst-containing layer
preferably has a binding energy high enough to avoid the
decomposition of the main skeleton upon photoexcitation of the
photocatalyst, and example thereof include (1) organopolysiloxanes
that hydrolyze and polycondensate a chloro- or alkoxysilane or the
like by a sol-gel reaction or the like to develop large strength
and (2) organopolysiloxanes obtained by crosslinking reactive
silicones having excellent water repellency or oil repellency.
[0427] In the case of (1), the organopolysiloxane is composed
mainly of a hydrolysis condensate or a cohydrolyzate of at least
one member selected from silicon compounds represented by general
formula Y.sub.nSiX.sub.4-n wherein n is 1 to 3; Y represents an
alkyl, fluoroalkyl, vinyl, amino, or epoxy group; and X represents
a halogen or a methoxy, ethoxy, or acetyl group.
[0428] Specific examples thereof include methyltrichlorosilane,
methyltribromosilane, methyltrimethoxysilane,
methyltriethoxysilane, methyltriisopropoxysilane,
methyl-tri-t-butoxysilane; ethyltrichlorosilane,
ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane,
ethyltriisopropoxysilane, ethyl-tri-t-butoxysilane;
n-propyltrichlorosilane, n-propyltribromosilane,
n-propyltrimethoxysilane, n-propyltriethoxysilane,
n-propyltriisopropoxysilane, n-propyl-tri-t-butoxysilane;
n-hexytrichlorosilane, n-hexyltribromosilane,
n-hexyltrimethoxysilane, n-hexyltriethoxysilane,
n-hexyltriisopropoxysilane, n-hexyl-tri-t-butoxysilane;
n-decyltrichlorosilane, n-decyltribromosilane,
n-decyltrimethoxysilane, n-decyltriethoxysilane,
n-decyltriisopropoxysilane, n-decyl-tri-t-butoxysilane;
n-octadecyltrichlorosilane, n-octadecyltribromosilane,
n-octadecyltriethoxysilane, n-octadecyltriethoxysilane,
n-octadecyltriisopropoxysilane, n-octadecyl-tri-t-butoxysilane;
phenyltrichlorosilane, phenylribromosilane, phenyltrimethoxysilane,
phenyltriethoxysilane, phenyltrisopropoxysilane,
phenyl-tri-t-butoxysilane; tetrachlorosilane, tetrabromosilane,
tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane,
dimethoxydiethoxysilane; dimethyldichlorosilane,
dimethyldibromosilane, dimethyldimethoxysilane,
dimethyldiethoxysilane; diphenyldichlorosilane,
diphenyldibromosilane, diphenyldimethoxysilane,
diphenyldiethoxysilane; phenylmethyldichlorosilane,
phenylmethyldibromosilane, phenylmethyldimethoxysilane,
phenylmethyldiethoxysilane; trichlorohydrosilane,
tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane,
triisopropoxyhydrosilane, tri-t-butoxyhydrosilane;
vinyltrichlorosilane, vinyltribromosilane, vinyltrimethoxysilane,
vinyltriethoxysilane, vinyltriisopropoxysilane,
vinyl-tri-t-butoxysilane; trifluoropropyltrichlorosilane,
trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane,
trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane,
trifluoropropyl-tri-t-butoxysilane; Y
glycidoxypropylmethyldimethoxysilane, Y
glycidoxypropylmethyldiethoxysilane,
.gamma.-glycidoxypropyltrimethoxysilane,
.gamma.-glycidoxypropyltriethoxysilane,
.gamma.-glycidoxypropyltriisopropoxysilane,
.gamma.-glycidoxypropyl-tri-t-butoxysilane;
.gamma.-methacryloxypropylmethyldimethoxysilane,
.gamma.-methacryloxypropylmethyldiethoxysilane,
.gamma.-methacryloxypropyltrimethoxysilane,
.gamma.-methacryloxypropyltriethoxysilane,
.gamma.-methacryloxypropyltriisopropoxysilane,
.gamma.-methacryloxypropyl-tri-t-butoxysilane;
.gamma.-aminopropylmethyldimethoxysilane,
.gamma.-aminopropylmethyldiethoxysilane,
.gamma.-aminopropyltrimethoxysilane,
.gamma.-aminopropyltriethoxysilane,
.gamma.-aminopropyltriisopropoxysilane,
.gamma.-aminopropyl-tri-t-butoxysilane;
.gamma.-mercaptopropylmethyldimethoxysilane,
.gamma.-mercaptopropylmethyldiethoxysilane,
.gamma.-mercaptopropyltrimethoxysilane,
.gamma.-mercaptopropyltriethoxysilane,
.gamma.-mercaptopropyltriisopropoxysilane,
.gamma.-mercaptopropyl-tri-t-butoxysilane;
.beta.-(3,4-epoxycyclohexyl)ethyltirimethoxysilane,
.beta.-(3,4-epoxycyclohexyl)ethyltriethoxysilane; and partial
hydrolyzates thereof; and mixtures thereof.
[0429] The binder is particularly preferably a polysiloxane
containing a fluoroalkyl group, specifically at least one member
selected from hydrolysis condensates and cohydrolysis condensates
of the following fluoroalkylsilanes. Polysiloxanes generally known
as fluorosilane coupling agents may also be used. [0430]
CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0431]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0432]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0433]
CF.sub.3(CF.sub.2).sub.9CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0434]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0435]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0436]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0437]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3, [0438]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.2Si(OCH.sub.3).sub.3-
, [0439]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.-
3).sub.3, [0440]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3-
, [0441] CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0442]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0443]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0444]
CF.sub.3(CF.sub.2).sub.9CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0445]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0446]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0447]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0448]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3 (OCH.sub.3).sub.2,
[0449]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(O-
CH.sub.3).sub.2, [0450]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0451]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0452] CF.sub.3(CF.sub.2).sub.3 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0453]
CF.sub.3(CF.sub.2).sub.5 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, [0454] CF.sub.3(CF.sub.2).sub.7 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0455]
CF.sub.3(CF.sub.2).sub.9 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, and [0456]
CF.sub.3(CF.sub.2).sub.7SO.sub.2N(C.sub.2H.sub.5)C.sub.2H.sub.4CH.sub.2Si-
(OCH.sub.3).sub.3.
[0457] Use of polysiloxanes containing fluoroalkyl groups as the
binder results in markedly improved water repellency and oil
repellency of the photocatalyst-containing layer in its unexposed
areas and can improve the function of inhibiting deposition of lens
compositions and coating compositions for black matrixes.
[0458] Examples of reactive silicones (2) include compounds having
a skeleton represented by the following general formula.
--(Si(R.sup.1)(R.sup.2)O).sub.n--
[0459] wherein n is an integer of two or more; and R.sup.1 and
R.sup.2 represent a substituted or unsubstituted allyl, alkenyl,
aryl, or cyanoalkyl group having 1 to 10 carbon atoms. Preferably,
not more than 40% by mole of the whole is accounted for by vinyl,
phenyl, or phenyl halide. R.sup.1 and/or R.sup.2 preferably
represent a methyl group because the surface free energy of the
silicone is the smallest. The molar proportion of the methyl group
is preferably not less than 60%. Further, the chain end or the side
chain has in its molecular chain at least one reactive group, such
as a hydroxyl group.
[0460] A stable organosilicon compound not causing any crosslinking
reaction, such as dimethylpolysiloxane, together with the
organopolysiloxane, may be incorporated into the binder.
[0461] (Other Components of Photocatalyst-Containing Layer)
[0462] A surfactant may be incorporated into the
photocatalyst-containing layer preferably used in the present
invention from the viewpoint of lowering the wettability of
unexposed areas. The surfactant is not particularly limited so far
as it can be removed by decomposition. Specific examples of
preferred surfactants usable herein include hydrocarbon
surfactants, such as NIKKOL BL, BC, BO, and BB series manufactured
by Nihon Surfactant Kogyo K.K.; and fluoro or silicone nonionic
surfactants, such as ZONYL FSN and FSO, manufactured by E.I. du
Pont de Nemours & Co., Surfluon S-141 and 145 manufactured by
Asahi Glass Co., Ltd., Megafac F-141 and 144 manufactured by
Dainippon Ink and Chemicals, Inc., Ftergent F-200 and F-251,
manufactured by Neos Co., Ltd.; Unidyne DS-401 and 402 manufactured
by Daikin Industries, Ltd., and Fluorad FC-170 and 176 manufactured
by Sumitomo 3M Ltd. Cationic, anionic and amphoteric surfactants
may also be used.
[0463] Further, besides the surfactant, the following compound may
be incorporated into the photocatalyst-containing layer preferably
used in the present invention: oligomers and polymers, such as
polyvinyl alcohol, unsaturated polyesters, acrylic resins,
polyethylene, diallyl phthalate, ethylene propylene diene monomer,
epoxy resin, phenolic resin, polyurethane, melamine resin,
polycarbonate, polyvinyl chloride, polyamide, polyimide, styrene
butadiene rubber, chloroprene rubber, polypropylene, polybutylene,
polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene,
polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide,
and polyisoprene.
[0464] (Method for Forming Photocatalyst-Containing Layer)
[0465] The method for forming the photocatalyst-containing layer is
not particularly limited. For example, a photocatalyst-containing
coating liquid may be coated onto a substrate by spray coating, dip
coating, roll coating, bead coating or the like to form a
photocatalyst-containing layer. When the coating liquid contains an
ultraviolet curable component as the binder, the
photocatalyst-containing composition layer may be formed on the
substrate by curing through ultraviolet irradiation.
[0466] When a coating liquid containing a photocatalyst or the like
is used, solvents used in the coating liquid is not particularly
limited. For example, organic solvents, for example, alcohols, such
as ethanol and isopropanol, may be used.
(Light for Exposure to Induce Photocatalytic Action)
[0467] The exposure light for inducing photocatalytic action is not
particularly limited so far as the photocatalyst can be excited.
Examples thereof include ultraviolet light, visible light, infrared
radiation and, in addition, electromagnetic waves and radiations
having shorter or longer wavelength than these lights.
[0468] For example, the anatase form of titania is used as the
photocatalyst, the excitation wavelength thereof is not more than
380 nm. Therefore, in this case, the photocatalyst can be excited
by ultraviolet light. Ultraviolet light sources usable herein
include mercury lamps, metal halide lamps, xenon lamps, excimer
laser, and other ultraviolet light sources. The wettability of the
layer surface may be varied by varying the intensity exposure and
the like.
[0469] FIG. 25 is an explanatory view showing one embodiment of the
process for producing a microlens using the above photocatalyst
according to a preferred embodiment of the present invention. As
shown in FIG. 25 (A), a photocatalyst-containing layer 303 is
formed on a substrate 301, a photomask 304 is put on the
photocatalyst-containing layer 303, and light 305 is applied to the
photocatalyst-containing layer 303 through the photomask 304 to
form a modified photocatalyst-containing layer 303'. Next, as shown
in FIG. 25 (B), a composition for a lens ejected through an
ejection nozzle 306 and deposited onto the modified
photocatalyst-containing layer 303' to form a lens 302.
[0470] Light Shielding Layer
[0471] The light shielding layer preferably used in the lens of the
present invention is formed so that the position and the shape
conform to the position and the shape of the lens. The light
shielding layer functions to prevent incidence of unnecessary light
around the lens into the lens. More preferably, the light shielding
layer is provided on a microlens array.
[0472] According to a preferred embodiment of the present
invention, the light shielding layer may be formed by any method
without limitation. Preferably, however, as with the lens, the
light shielding layer is formed by utilizing a difference in
wettability. Specifically, a pattern based on a difference in
wettability for a light shielding pattern corresponding to the lens
pattern is formed on the backside of a transparent substrate that
is the side on which the lens is not formed. A liquid containing a
material for a light shielding layer is deposited onto areas having
specific wettability for the light shielding layer pattern of the
substrate, and the liquid containing a material for the light
shielding layer is cured to produce lenses having a light shielding
layer.
[0473] The material for the light shielding layer is not limited so
far as it is generally used in the art. An example of the material
for the light shielding layer is a thin layer of a light shielding
resin layer formed using a coating material of an acrylic
thermoplastic resin containing carbon black.
[0474] FIG. 26 shows a cross-sectional view showing a microlens
array having a light shielding layer according to a preferred
embodiment of the present invention. In FIG. 26, a
photocatalyst-containing layer 303 is provided on a substrate 301.
A lens 302 is provided on the photocatalyst-containing layer 303 in
its areas other than the modified catalyst-containing layer 303'.
Further, the photocatalyst-containing layer 303 is provided also on
the substrate 301 in its side (backside) not provided with the lens
302, and a light shielding layer 307 is provided on the modified
photocatalyst-containing layer 303'.
[0475] FIG. 27 is a plan view of a microlens array having a light
shielding layer as viewed from the side on which the light
shielding layer is provided. As can be seen from the drawing, an
opening of the light shielding layer 307 is provided at a position
corresponding to the center of the lens 302.
[0476] Application to Image Pick-up Device
[0477] The microlens array according to a preferred embodiment of
the present invention can be preferably used as a component
adjacent to or in intimate contact with an image pick-up element,
for example, CCD, in order to enhance the photosensitivity of image
pick-up devices. In this case, preferably, a light shielding layer
is provided, for example, from the viewpoint of avoiding an adverse
effect onto properties, such as a lowering in contrast due to stray
light. The thickness of the photocatalyst-containing layer is
preferably small for enhancement of light transmission, prevention
of the photocatalyst-containing layer from developing color due to
interference of light, and other purposes. The thickness is
preferably not more than 1 .mu.m, more preferably not more than 0.2
.mu.m.
[0478] FIG. 28 is a cross-sectional view showing one embodiment of
an image pick-up device using a microlens array having a light
shielding layer. In the image pick-up device, a microlens array 320
having a light shielding layer 307 is provided on an image pick-up
element section 318 comprising a color filter 309 and a
photoelectric transducer 301. Incident light 308 enters the image
pick-up element section 318 through the microlens array.
[0479] The color microlens array according to a preferred
embodiment of the present invention can have both the function of
the color filter as a constituent element of the image pick-up
element and the function of the microlens array. This can realize
an image pick-up element that has a simple construction not using
any color filter and the function of the microlens array. In this
case, preferably, a light shielding layer is provided, for example,
from the viewpoint of avoiding an adverse effect on properties,
such as a lowering in contrast and a lowering in chroma due to
stray light. The thickness of the photocatalyst-containing layer is
preferably small for enhancement of light transmission, prevention
of the photocatalyst-containing layer from developing color due to
interference of light, and other purposes. The thickness is
preferably not more than 1 .mu.m, more preferably not more than 0.2
.mu.m.
[0480] FIG. 29 is a cross-sectional view showing one embodiment of
an image pick-up device using a microlens array 321 having a light
shielding layer 307. In the image pick-up device, a color microlens
having a light shielding layer is provided on a photoelectric
transducer. Incident light 308 enters the photoelectric transducer
310 through the color microlens array.
[0481] Application to Display
[0482] The microlens array according to a preferred embodiment of
the present invention may be preferably used, for example, as a
component adjacent to or in intimate contact with displays, for
example, liquid crystal displays, in order to enhance the
brightness in the direction of a viewer. In this case, preferably,
a light shielding layer is provided in order to inhibit an adverse
effect of external light around displays, such as indoor lighting
and sunlight, and to improve display quality. Further, the
thickness of the photocatalyst-containing layer is preferably small
for enhancement of light transmission, prevention of the
photocatalyst-containing layer from developing color due to
interference of light, and other purposes. The thickness is
preferably not more than 1 .mu.m, more preferably not more than 0.2
.mu.m.
[0483] FIG. 30 is a cross-sectional view showing one embodiment of
a liquid crystal display using a microlens array 320 having a light
shielding layer 307. A microlens provided with a light shielding
layer is provided on a liquid crystal display. Light emitted from
the liquid crystal display is released into the exterior as
luminescence 311 through the microlens array.
[0484] The color microlens array according to a preferred
embodiment of the present invention can have both the function of a
color filter as a constituent element of the display and the
function of the microlens array. This can realize a display that
has a simple construction not using any color filter and the
function of the microlens array.
[0485] In this case, preferably, a light shielding layer is
provided in order to inhibit an adverse effect of external light
around displays, such as indoor lighting and sunlight, and to
improve display quality. Further, the thickness of the
photocatalyst-containing layer is preferably small for enhancement
of light transmission, prevention of the photocatalyst-containing
layer from developing color due to interference of light, and other
purposes. The thickness is preferably not more than 1 .mu.m, more
preferably not more than 0.2 .mu.m.
[0486] FIG. 31 is a cross-sectional view showing one embodiment of
a liquid crystal display using a color microlens array having a
light shielding layer. The liquid crystal display comprises a light
source 314, a liquid crystal element 313, and a color microlens
array 321 having a light shielding layer 307. Light emitted through
the liquid crystal element 313 from the light source 314 is
released into the exterior as luminescence 311 through the color
microlens array 321.
[0487] Re: Fourth Invention D
[0488] According to the present invention, patterns, such as
designs, images, and letters, are formed on an original plate for
lithography having a photocatalyst-containing layer that can cause
a chemical change in materials around the photocatalyst upon light
irradiation, and the resultant plate is used as a lithographic
plate.
[0489] The mechanism of action of the photocatalyst typified by
titanium oxide according to the present invention has not been
fully elucidated. However, it is considered that carriers produced
by light irradiation changes the chemical structure of the organic
material through a direct reaction with a neighboring compound, or
otherwise by active oxygen species produced in the presence of
oxygen and water.
[0490] Proposals utilizing the photocatalytic action include one
wherein oil stains are decomposed by light irradiation to
hydrophilify the oil stains, enabling the oil stains to be washed
away by water, one wherein a high critical surface tension film is
formed on the surface of glass or the like to impart antifogging
properties, and one wherein a photocatalyst-containing layer is
formed on the surface of tiles or the like to form the so-called
antimicrobial tiles or the like that can reduce the number of
bacteria floating in air.
[0491] According to the present invention, a change in wettability
between areas where a pattern is formed and areas where no pattern
is formed is created through the action of decomposition of organic
materials by the photocatalyst, thereby enhancing the receptivity
of the pattern-formed areas to printing ink or the ink repellency
to obtain a lithographic plate.
[0492] Photocatalysts usable in the lithographic plate according to
the present invention include metal oxides known as
photosemiconductors, such as titanium oxide (TiO.sub.2), zinc oxide
(ZnO), tin oxide (SnO.sub.2), strontium titanate (SrTiO.sub.3),
tungsten oxide (WO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), and
iron oxide (Fe.sub.2O.sub.3). Among them, titanium oxide is
particularly preferred because it has high band gap energy and is
chemically stable, nontoxic, and easily available.
[0493] Titanium oxide may in anatase form or rutile form with
anatase form of titanium oxide being preferred.
Preferably, the anatase form of titanium oxide has an average
particle diameter of not more than 20 nm. Examples of anatase form
of titanium oxide usable herein include hydrochloric acid
peptization type titania sols (STS-02, average crystal diameter 7
nm, manufactured by Ishihara Sangyo Kaisha Ltd.) and nitric acid
peptization type titania sols (TA-15, average crystal diameter 12
nm, manufactured by Nissan Chemical Industries Ltd.).
[0494] The photocatalyst-containing layer according to the present
invention may be formed by dispersing a photocatalyst in a binder.
The photocatalyst has a fear of decomposing the binder as well upon
photoexcitation. Therefore, the binder should be composed mainly of
a material having high binding energy. When use as a printing plate
is taken into consideration, plate wear and abrasion resistance are
also required of the photocatalyst-containing layer. Therefore, the
binder is preferably a silicone resin that has a main skeleton
having high binding energy, is crosslinked by a sol-gel reaction or
the like to develop large strength, and, through photocatalytic
action, undergoes a change in wettability. The silicone resin is
composed mainly of a hydrolysis condensate or a cohydrolysis
condensate of at least one member selected from silicon compounds
represented by general formula Y.sub.nSiX.sub.4-n, wherein n is 1
to 3; Y represents an alkyl, fluoroalkyl, vinyl, amino, or epoxy
group; and X represents a halogen or a methoxy, ethoxy, or acetyl
group.
[0495] Specific examples thereof include methyltrichlorosilane,
methyltribromosilane, methyltrimethoxysilane,
methyltriethoxysilane, methyltriisopropoxysilane,
methyl-tri-t-butoxysilane; ethyltrichlorosilane,
ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane,
ethyltniisopropoxysilane, ethyl-tri-t-butoxysilane;
n-propyltrichlorosilane, n-propyltribromosilane,
n-propyltrimethoxysilane, n-propyltriethoxysilane,
n-propyltriisopropoxysilane, n-propyl-tri-t-butoxysilane;
n-hexytrichlorosilane, n-hexyltribromosilane,
n-hexyltrimethoxysilane, n-hexyltrimethoxysilane,
n-hexylhtisopropoxysilane, n-hexyl-tri-t-butoxysilane;
n-decyltrichlorosilane, n-decyltribromosilane,
n-decyltrimethoxysilane, n-decyltrimethoxysilane,
n-decyltriisopropoxysilane, n-decyl-tri-t-butoxysilane;
n-octadecyltrichlorosilane, n-octadecyltribromosilane,
n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane,
n-octadecyltriisopropoxysilane, n-octadecyl-tri-t-butoxysilane;
phenyltrichlorosilane, phenylribromosilane, phenyltrimethoxysilane,
phenyltriethoxysilane, phenyltriisopropoxysilane,
phenyl-tri-t-butoxysilane; tetrachlorosilane, tetrabromosilane,
tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane,
dimethoxydiethoxysilane; dimethyldichlorosilane,
dimethyldibromosilane, dimethyldimethoxysilane,
dimethyldiethoxysilane; diphenyldichlorosilane,
diphenyldibromosilane, diphenyldimethoxysilane,
diphenyldiethoxysilane; phenylmethyldichlorosilane,
phenylmethyldibromosilane, phenylmethyldimethoxysilane,
phenylmethyldiethoxysilane; trichlorohydiosilane,
tribromohydrosilane, trimethoxyhydrosilane, haiethoxyhydrosilane,
triisopropoxyhydrosilane, tri-t-butoxyhydrosilane;
vinyltrichlorosilane, vinylthibromosilane,
vinyl-tri-t-butoxysilane, vinyltriethoxysilane,
vinyltriisopropoxysilane, vinyl-tri-t-butoxysilane;
trifluoropropyltrichlorosilane, tlifluoropropyltTibromosilane,
trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane,
trifluoropropyltriisopropoxysilane,
trifluoropropyl-tri-t-butoxysilane;
.gamma.-glycidoxypropylmethyldimethoxysilane,
.gamma.-glycidoxypropylmethyldiethoxysilane,
.gamma.-glycidoxpropyltimetloxysilane,
.gamma.-glycidoxypropyltietlhoxysilane,
.gamma.-glycidoxypropyltriisopropoxysilane,
.gamma.-glycidoxypropyl-tri-t-butoxysilane;
.gamma.-methacryloxypropylmethyldimethoxysilane,
.gamma.-methacryloxypropylmethyldiethoxysilane,
.gamma.-methacryloxypropyltrimethoxysilane,
.gamma.-methacryloxypropyltriethoxysilane,
.gamma.-methacryloxypropyltriisopropoxysilane,
.gamma.-methacryloxypropyl-tri-t-butoxysilane;
.gamma.-aminopropylmethyldimethoxysilane,
.gamma.-aminopropylmethyldiethoxysilane,
.gamma.-aminopropyltrimethoxysilane,
.gamma.-aminopropyltriethoxysilane,
.gamma.-aminopropyltiisopropoxysilane,
.gamma.-aminopropyl-tri-t-butoxysilane;
.gamma.-mercaptopropylmethyldimethoxysilane,
.gamma.-mercaptopropylmethyldiethoxysilane,
.gamma.-mercaptopropyltrimethoxysilane,
.gamma.-mercaptopropyltriethoxysilane,
.gamma.-mercaptopropyltriisopropoxysilane,
7-mercaptopropyl-tri-t-butoxysilane;
.beta.-(3,4-epoxycyclohexyl)ethyltrimethoxysilane,
.beta.-(3,4-epoxycyclohexyl)ethyltriethoxysilane; and partial
hydrolyzates thereof; and mixtures thereof.
[0496] The photocatalyst-containing layer in the original plate for
lithography according to the present invention may contain a
fluoroalkyl chain, specifically at least one member selected from
hydrolysis condensates and cohydrolysis condensates of the
following fluoroalkylsilanes. Further, compounds having fluoroalkyl
groups include the following compounds. Compounds generally known
as fluorosilane coupling agents may also be used. [0497]
CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0498]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0499]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0500]
CF.sub.3(CF.sub.2).sub.9CH.sub.2CH.sub.2Si(OCH.sub.3).sub.3, [0501]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0502]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0503]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2
CH.sub.2Si(OCH.sub.3).sub.3, [0504]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3, [0505]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.1Si(OCH.sub.3).sub.3-
, [0506]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.-
3).sub.3, [0507]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4Si(OCH.sub.3).sub.3-
, [0508] CF.sub.3(CF.sub.2).sub.3CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0509]
CF.sub.3(CF.sub.2).sub.5CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0510]
CF.sub.3(CF.sub.2).sub.7CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0511]
CF.sub.3(CF.sub.2).sub.9CH.sub.2CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0512]
(CF.sub.3).sub.2CF(CF.sub.2).sub.4CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0513]
(CF.sub.3).sub.2CF(CF.sub.2).sub.6CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0514]
(CF.sub.3).sub.2CF(CF.sub.2).sub.8CH.sub.2 CH.sub.2SiCH.sub.3
(OCH.sub.3).sub.2, [0515]
CF.sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3 (OCH.sub.3).sub.2,
[0516]
CF.sub.3(CF.sub.2).sub.3(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(O-
CH.sub.3).sub.2, [0517]
CF.sub.3(CF.sub.2).sub.5(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0518]
CF.sub.3(CF.sub.2).sub.7(C.sub.6H.sub.4)C.sub.2H.sub.4SiCH.sub.3(OCH.sub.-
3).sub.2, [0519] CF.sub.3(CF.sub.2).sub.3 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0520]
CF.sub.3(CF.sub.2).sub.5 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3, [0521] CF.sub.3(CF.sub.2).sub.7 CH.sub.2
CH.sub.2Si(OCH.sub.2 CH.sub.3).sub.3, [0522]
CF.sub.3(CF.sub.2).sub.9 CH.sub.2 CH.sub.2Si(OCH.sub.2
CH.sub.3).sub.3,
[0523] Further, titanium, aluminum, zirconium, and chromium
coupling agents may also be used.
[0524] Use of these coupling agents can enhance crosslinking and
increase the strength.
[0525] Use of these fluoroalkylsilanes can markedly improve the oil
repellency and can develop the function of inhibiting the
deposition of the resin composition.
[0526] The content of the photocatalyst in the layer containing the
photocatalyst and the organosiloxane is preferably 5 to 50% by
weight, more preferably 20 to 40% by weight. The photocatalyst and
the binder are dispersed in a solvent to prepare a coating liquid
following by coating. Solvents usable herein include alcoholic
organic solvents, such as ethanol and isopropanol.
[0527] Preferably, the photocatalyst has a small particle diameter
because the photocatalytic reaction takes place efficiently. The
average particle diameter is preferably not more than 50 nm, more
preferably not more than 20 nm.
[0528] The excitation wavelength of the anatase form of titania is
not more than 380 nm. Therefore, the excitation of this type of
catalysts should be carried out using ultraviolet light.
Ultraviolet light sources usable herein include mercury lamps,
metal halide lamps, xenon lamps, excimer lamps, excimer layer, YAG
laser, and other ultraviolet light sources. The wettability of the
film surface may be varied by varying the ultraviolet light
intensity, exposure and the like.
[0529] When the exposure is carried out using a fine beam of a
laser or the like, a desired image pattern may be directly formed
without use of any mask. In the case of other light sources, a
pattern is formed by light irradiation using a mask with a desired
pattern formed thereon. Pattern forming masks usable herein include
masks wherein a pattern is formed on a metal sheet, such as vapor
deposition masks, photomasks wherein a pattern is formed using a
metallic chromium on a glass sheet, and, for printing applications,
plate preparation films.
[0530] When a mask is used, the resolution can be enhanced by
conducting the exposure in intimate contact of the mask with the
photocatalyst-containing layer. In this case, however, the
sensitivity is remarkably lowered. Preferably, the exposure is
carried out while leaving a spacing of about 100 .mu.m between the
mask and the photocatalyst-containing layer.
[0531] The photocatalyst-containing layer may be rendered sensitive
to visible light and the like by ion doping, by addition of
fluorescent materials, or addition of photosensitive dyes. Examples
of photosensitive dyes which may be added to the structure for
pattern formation include cyanine dyes, carbocyanine dyes,
dicarbocyanine dyes, hemicyanine dyes, and other cyanine dyes.
Other useful dyes include diphenylmethane dyes, for example,
triphenylmethane dyes, such as Crystal Violet and basic fuchsine,
xanthene dyes, such as Rhodamine B, Victoria Blue, Brilliant Green,
Malachite Green, Methylene Blue, pyrylium salts, benzopyrylium
salts, trimethinebenzopyrylium salts, and triallylcarbonium
salts.
[0532] The photocatalyst-containing coating liquid may be coated
onto the substrate by spray coating, dip coating, roll coating,
bead coating or the like. When an ultraviolet curable component is
contained as the binder, curing by ultraviolet irradiation results
in the formation of a photocatalyst-containing composition layer on
the substrate. Substrates usable in the lithographic plate
according to the present invention include glasses, metals,
plastics, woven fabrics, and nonwoven fabrics.
[0533] The present invention will be described with reference to
the accompanying drawings. FIGS. 32 and 33 are diagrams showing one
embodiment of the process for producing a printing plate according
to the present invention.
[0534] As shown in FIG. 32 (A), an original plate 401 for a
printing plate may be produced by forming a
photocatalyst-containing composition layer 441 directly or through
a primer layer 403 on a substrate 402. As shown in FIG. 32 (B), in
order to record pattern information, exposure 406 is carried out in
a predetermined pattern 405. As shown in FIG. 32 (C), alkyl chains
of the silicone compound are converted to OH groups through the
action of a photocatalyst 407 to change the wettability of the
surface according to the exposed pattern. Unexposed areas are in
the state of low surface free energy 408, while exposed areas
undergo a change in wettability. Therefore, coating of a resin
layer composition 409 permits a layer of the resin layer
composition 409 to be selectively formed on the wettability-varied
areas 410.
[0535] Next, as shown in FIG. 33 (A), heat or ultraviolet light is
applied to cure the resin layer composition 409, thereby forming a
resin layer 411 that can withstand printing and the like. Further,
as shown in FIG. 33 (B), after the formation of the resin layer,
the whole area exposure 412 is carried out without a mask and the
like.
[0536] As shown in FIG. 33 (C), upon exposure, the action of the
photocatalyst 407 in areas not provided with the cured layer
permits the alkyl chain of the silicone compound to be converted to
OH group and the low surface free energy areas 408 to be brought to
high surface free energy areas 413.
[0537] The lithographic plate thus obtained may be used in any of
waterless plating and plating using dampening water.
[0538] FIG. 34 is a diagram illustrating use of a lithographic
plate in printing.
[0539] FIG. 34 (A) shows an embodiment wherein the lithographic
plate is used as a waterless plate in printing, and FIG. 34 (B)
shows an embodiment wherein the lithographic plate is used as a
printing plate using dampening water.
[0540] When the resin layer 411 having low surface free energy is
ink repellent, as shown in FIG. 34 (A), the resin layer 411, due to
the ink repellency, repels ink 414 and cannot receive the ink. The
ink is deposited only onto areas not provided with the resin layer,
and printing is performed by transfer of the deposited ink onto a
printing medium.
[0541] On the other hand, when the resin layer 411 is receptive to
ink, dampening water 415 is deposited onto areas other than the
resin layer 411. Since the resin layer 411 can receive ink,
printing can be carried out by transfer of ink onto a printing
medium.
[0542] Further, incorporation of a photochromic material, which
undergoes a change in color upon light irradiation, such as
spiropyran, an organic dye decomposable through photocatalytic
action or the like into the composition can form a visualized
pattern.
[0543] An embodiment will be described wherein the original plate
for a printing plate is a waterless plate.
[0544] The ink repellent layer used in the present invention may be
formed of a silicone rubber or a fluorocompound, such as a rubber
having in its molecule fluorine with the silicone rubber being
preferred. The silicone rubber layer is obtained by sparsely
crosslinking a linear organopolysiloxane, preferably
dimethylpolysiloxane. A typical silicone rubber layer is formed of
a silicone rubber comprising repeating units represented by the
following formula D-1:
##STR00005##
wherein n is an integer of two or more; and R.sup.1 and R.sup.2
each independently represent a substituted or unsubstituted alkyl,
alkenyl, aryl, or cyanoalkyl group having 1 to 10 carbon atoms. Not
more than 40% of the whole R.sup.1 and R.sup.2 is accounted for by
vinyl, phenyl, vinyl halide or phenyl halide. Not less than 60% of
R.sup.1 and R.sup.2 is preferably accounted for by a methyl group.
Further, the chain end or the side chain has in its molecular chain
at least one hydroxyl group.
[0545] When the silicone rubber layer applied to the printing plate
according to the present invention may be a condensation type
crosslinkable silicone rubber (an RTV or LTV silicone rubber). A
silicone rubber with a part of R.sup.1 and R.sup.2 of the
organopolysiloxane chain being substituted by a hydrogen atom may
also be used as the silicone rubber. Further, silicone rubbers may
also be used wherein ends represented by formulae D-2, D-3, and D-4
are crosslinked. In some cases, an excessive amount of a
crosslinking agent is allowed to exist.
##STR00006##
wherein R.sup.1 and R.sup.2 are as defined in formula D-1; and
R.sup.3 and R.sup.4 represent a monovalent lower alkyl. A catalyst,
such as a carboxylate of a metal, such as till, zinc, lead,
calcium, or manganese, for example, dibutyltin laurate, tin(II)
octate, or a napthtenate of the above metal, or chloroplatinic
acid, is added to the silicone rubber which is subjected to
condensation type crosslinking.
[0546] Regarding the formulation of the components used in the
condensation type silicone rubber, for example, to 100 parts by
weight of the compound comprising repeating units represented by
formula D-1 are added 0.1 to 100 parts by weight of the compound
having a structure represented by formula D-3 or D-4 and optionally
0 to 50 parts by weight of a conventional catalyst.
[0547] Further, a silicone rubber layer wherein crosslinking has
been carried out by an addition reaction of formula D-5 with
formula D-6. The silicone rubber is produced by reacting a
polyvalent hydrodieneorganopolysiloxane with a polysiloxane having
in its molecule two or more bonds of formula D-6, preferably by
crosslinking curing of a composition comprising the following
components:
##STR00007##
[0548] Specifically,
TABLE-US-00001 (1) Organopolysiloxane having at least two alkenyl
groups 100 parts by weight (preferably vinyl group), per molecule,
directly bonded to silicon atom (2) Organohydrogenpolysiloxane
having at least two groups of 0.1 to 1000 parts by weight formula 5
per molecule (3) Addition catalyst 0.00001 to 10 parts by
weight
[0549] The alkenyl group in the component (1) may be located at the
end or at an intermediate position of the molecular chain. Organic
groups other than the alkenyl group are substituted or
unsubstituted alkyl group and aryl group. The component (1) may
have a very small amount of hydroxyl group.
[0550] Hydrogen in the component (2) may be located at the end or
at an intermediate position of the molecular chain. Organic groups
other than hydrogen are selected from the same group as described
in connection with the component (1). Regarding the organic group
in the components (1) and (2), not less than 60% of the total
number of groups is preferably accounted for by a methyl group from
the viewpoint of ink repellency.
[0551] For the components (1) and (2), the molecular structure may
be of straight chain, cyclic, or branched chain. Preferably, the
molecular weight of any one of the components (1) and (2) exceeds
1000 from the viewpoint of properties of rubber. Further,
preferably, the molecular weight of the component (2) exceeds
1000.
[0552] Examples of the component (1) include .alpha.,
.omega.-divinylpolydimethylsiloxane and a methylvinyl
siloxane/dimethylsiloxane copolymer with both ends thereof being a
methyl group.
[0553] Examples of the component (2) includes polydimethylsiloxane
with both ends thereof being a hydrogen atom, .alpha.,
.omega.-dimethylpolymethylhydrodienesiloxane, a
methylhydrodienesiloxane/dimethylsiloxane copolymer with both ends
thereof being a methyl group, and a cyclic
polymethylhydrodienesiloxane.
[0554] The addition catalyst in the component (3) may be properly
selected from conventional catalysts. Platinum compounds are
particularly preferred. Examples thereof include platinum, platinum
chloride, chloroplatinic acid, and olefin coordinated platinum.
[0555] Vinyl-containing organopolysiloxanes, such as
tetracyclo(methylvinyl)siloxane, carbon-carbon triple
bond-containing alcohols, acetone, methyl ethyl ketone, methanol,
ethanol, propylene glycol monomethyl ether and other crosslinking
inhibitors may be added from the viewpoint of regulating the curing
rate of the composition. In these compositions, upon mixing of the
three components, an addition reaction occurs to initiate curing.
The curing rate rapidly increases with increasing the reaction
temperature. For this reason, in order to elongate the pot life for
the composition to be converted to rubber and, at the same time, to
shorten the curing time on the photocatalyst-containing layer,
curing conditions are preferably such that, until the composition
is completely cured, the composition is held at such high
temperature conditions that the properties of the substrate and the
photocatalyst-containing layer remains unchanged. This is preferred
from the viewpoint of stable adhesion to the
photocatalyst-containing layer.
[0556] In addition to the above components, conventional adhesion
imparting agents, such as alkenyltnialloxysilanes,
hydroxy-containing organopolysiloxanes as the composition of the
condensation type silicone rubber layer, and silane (or siloxane)
containing hydrolyzable function groups may be added to these
compositions. Further, conventional fillers, such as silica, may
also be added from the viewpoint of improving the strength of the
rubber.
[0557] Further, instead of the silicone rubber, a fluororesin may
be used as the ink repellent layer. Fluororesins usable herein are
as follows.
[0558] (1) Copolymer resin of perfluoroalkyl methacrylate and
acrylic monomer having hydroxy group, e.g., 2-hydroxyethyl
methacrylate
[0559] (2) Copolymer resin of perfluoroalkyl methacrylate and
glycidyl methacrylate
[0560] (3) Copolymer resin of perfluoroalkyl methacrylate and
methacrylic acid
[0561] (4) Copolymer resin of perfluoroalkyl methacrylate and
maleic anhydride
[0562] When the fluororesin has both an active hydrogen functional
group and a functional group reactive with active hydrogen, or when
a mixture of a fluororesin having an active hydrogen functional
group with a fluororesin having a functional group reactive with
active hydrogen is used, a crosslinking agent may be used.
[0563] Regarding the proportions of the components in the
fluororesin layer, preferably 60 to 100% by weight, more preferably
80 to 98% by weight, of the whole layer is accounted for by
fluororesin.
[0564] Next, the plate used with dampening water will be
described.
[0565] In the plate used with dampening water, materials for the
resin layer in which ink receptive areas are formed include, for
example, acrylic resins using methacrylic acid, methacrylic esters
or the like, vinyl acetate resin, copolymer of vinyl acetate with
ethylene or vinyl chloride or the like, vinyl chloride resin,
vinylidene chloride resin, vinyl acetal resin, such as
polyvinylbutyral, polystyrene, copolymers including
styrene/butadiene copolymer and styrene/methacrylic ester
copolymer, polyethylene, polypropylene and chlorination products
thereof, polyester resins (for example, polyethylene terephthalate,
polyethylene isophthalate, and polycarbonate of bisphenol A),
polyamide resins (for example, polycapramide, polyhexamethylene
adipamide, and polyhexamethylene sebacamide), phenolic resin,
xylene resin, alkyd resin, vinyl-modified alkyd resin, gelatin,
cellulose ester derivatives, such as carboxymethylcellulose, waxes,
polyolefins, and waxes. The resin composition is coated, and the
coating is cured by heat or light. Thus, patterned areas having
good ink receptivity and plate wear are formed.
[0566] Coating methods usable herein include roll coating, air
knife coating, bar coating, and spin coating.
[0567] Further, according to the present invention, coating to form
a thick film can prevent light to reach the underlying layer. This
can prevent the photocatalytic reaction.
EXAMPLES
[0568] The following examples further illustrate the present
invention.
Example A-1
[0569] 30 g of GlascaHPC7002 (Japan Synthetic Rubber Co., Ltd.) and
10 g of Glasca HPC402H (Japan Synthetic Rubber Co., Ltd.), an
alkylalkoxysilane, were mixed together. The mixture was stirred for
5 min in a stirring apparatus. The resultant solution was spin
coated on a glass substrate having an area of 7.5 cm.sup.2. The
coated substrate was dried at a temperature of 150.degree. C. for
10 min. Thus, a 2 .mu.m-thick sodium ion block layer was
formed.
[0570] Next, 15 g of Glasca HPC7002 (Japan Synthetic Rubber Co.,
Ltd.), 5 g of Glasca HPC402H Japan Synthetic Rubber Co., Ltd.), and
a titania sol (TA-15, manufactured by Nissan Chemical Industries
Ltd.) were mixed together. The resultant solution was spin coated
onto the substrate with a sodium ion block layer formed thereon.
The assembly was dried at a temperature of 150.degree. C. for 10
min, permitting hydrolysis and polycondensation to proceed. Thus, a
structure for pattern formation comprising a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed through an organopolysiloxane was prepared.
[0571] The structure for pattern formation was irradiated with
ultraviolet light at an intensity of 6.6 mW/cm.sup.2 using a xenon
lamp. In this case, a change in contact angle between the structure
and water with the elapse of time was measured with a contact angle
goniometer (Model CA-Z, manufactured by Kyowa Interface Science
Co., Ltd.). The results are shown in FIG. 5. As is apparent from
the drawing, the contact angle gradually decreased and reached not
more than 10.degree..
[0572] Separately, the structure for pattern formation was
irradiated with ultraviolet light through a lattice-like mask.
Exposure to ultraviolet light at an intensity of 6.6 mW/cm.sup.2
for 6 hr using a xenon lamp resulted in the formation of a pattern
wherein the wettability of exposed areas and the wettability of
unexposed areas were different from each other and were 90 and
102.degree., respectively.
Example A-2
[0573] A 20 wt % dimethylformamide solution of a composition for a
primer layer (Kan-coat 90T-25-3094, manufactured by Kansai Paint
Co., Ltd.) was coated on a 0.15 mm-thick degreased aluminum sheet.
The coated aluminum sheet was dried at 200.degree. C. for 1 min.
Thus, a 3 .mu.m-thick primer layer was formed. A
photocatalyst-containing layer as described in Example A-1 was
formed on the primer layer to prepare an original plate for a
waterless printing plate.
[0574] Subsequently, a pattern was formed under conditions of
Nd:YAG laser (355 nm A-Physic Star Line) and recording energy 300
mJ/cm.sup.2. The printing plate thus obtained was mounted on an
offset printing machine (Alpha New Ace, manufactured by Alpha Giken
K. K.), and printing was carried out on a coated paper using an ink
for waterless printing (Inctec Waterless S Deep Blue, manufactured
by The Inctec Inc.) at a printing speed of 5000 sheets/hr. As a
result, 20,000 sheets of good prints could be obtained.
[0575] Printing was carried out in the same manner as described
above, except that exposure was carried out using, instead of the
laser, a xenon lamp through a gradation negative film having
halftone dots of 2 to 98% with 175 lines/in. As a result, good
prints could be obtained.
Example A-3
[0576] 3 g of Glasca HPC7002 (Japan Synthetic Rubber Co., Ltd.), a
silica sol, and 1 g of HPC402H (Japan Synthetic Rubber Co., Ltd.),
an alkylalkoxysilane, were mixed together. The mixture was stirred
for 5 min. The resultant solution was spin coated on a glass
substrate having an area of 7.5 cm.sup.2. Thus, a 2 .mu.m-thick
sodium ion block layer was formed.
[0577] Next, 3 g of isopropyl alcohol, 0.75 g of a silica sol
(Glasca HPC7002, manufactured by Japan Synthetic Rubber Co., Ltd.),
0.25 g of an alkylalkoxysilane (Glasca HPC402H, manufactured by
Japan Synthetic Rubber Co., Ltd.), and 0.15 g of a
fluoroalkylsilane (MF-160E manufactured by Tohchem Products
Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide)
were mixed together. The resultant dispersion was stirred for 20
min while maintaining the temperature at 100.degree. C. Thereafter,
2 g of titanium oxide (titanium oxide coating liquid ST-K01, solid
content 10% by weight, manufactured by Ishihara Sangyo Kaisha Ltd.)
was added thereto, followed by stirring for additional 30 min.
[0578] The resultant dispersion was spin coated on the substrate
with a sodium block layer formed thereon. The assembly was dried at
a temperature of 150.degree. C. for 10 min, permitting hydrolysis
and polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed through an organopolysiloxane was formed. The average
roughness of the surface of the photocatalyst-containing layer was
measured by the tracer method and found to be Ra=2 nm.
[0579] Further, the photocatalyst-containing layer was irradiated
with ultraviolet light at an intensity of 70 mW/cm.sup.2 for 2 min
using a high pressure mercury lamp through a lattice-like mask. In
this case, the contact angle of the photocatalyst-containing layer
with water and n-octane was measured with a contact angle
goniometer (Model CA-Z, manufactured by Kyowa Interface Science
Co., Ltd.). The results are shown in Table A-4.
Example A-4
[0580] A sodium ion block layer was prepared in the same manner as
in Example A-3. Next, 3 g of isopropyl alcohol, 0.4 g of an
organosilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.),
0.15 g of a fluoroalkylsilane (MF-160E, manufactured by Tohchem
Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 2 g of titanium oxide (titanium oxide coating liquid ST-K01,
solid content 10% by weight, manufactured by Ishihara Sangyo Kaisha
Ltd.) were mixed together. The resultant dispersion was stirred for
20 min while maintaining the temperature at 100.degree. C. The
resultant dispersion was spin coated on the substrate with a sodium
block layer formed thereon. The assembly was dried at a temperature
of 150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organopolysiloxane was formed. The average roughness of
the surface of the photocatalyst-containing layer was measured by
the tracer method and found to be Ra=2 nm. Further, the
photocatalyst-containing layer was irradiated with ultraviolet
light at an intensity of 70 mW/cm.sup.2 for 2 min using a high
pressure mercury lamp through a lattice-like mask. In this case,
the contact angle of the photocatalyst-containing layer with water
and n-octane was measured with a contact angle goniometer (Model
CA-Z, manufactured by Kyowa Interface Science Co., Ltd.). The
results are shown in Table A-4.
Example A-5
[0581] A 0.3 .mu.m-thick photocatalyst-containing layer was spin
coated onto a polycarbonate substrate in the same manner as in
Example A-4. The photocatalyst-containing layer was irradiated with
ultraviolet light at an intensity of 70 mW/cm.sup.2 for 2 min using
a high pressure mercury lamp through a chart mask with a resolution
of 50 lp/mm.
[0582] Various liquids having known surface tension were dropped on
the photocatalyst-containing layer to measure the contact angle
between the photocatalyst-containing layer and the liquids with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.), and the critical surface tension was
determined by Zisman plotting. As a result, the critical surface
tension was 14.6 mN/m for unexposed areas and was 72.3 mN/m for
exposed areas.
[0583] Next, an ink for waterless lithography (Inctec Waterless S
Deep Blue, manufactured by The Inctec Inc.) was coated on the whole
area of the exposed photocatalyst-containing layer by means of an
RI tester (Model RI-2 tester, manufactured by Ishlawajima
Industrial Machinery Co., Ltd.). As shown in FIG. 6, in the
unexposed areas, the oil repellent nature repelled the ink, and the
ink was selectively coated only in the exposed areas. Thus, a deep
blue stripe pattern 118 of 50 lp/mm was obtained on a transparent
polycarbonate substrate 102 through a photocatalyst layer 104.
Example A-6
[0584] 3 g of Glasca HPC7002 (Japan Synthetic Rubber Co., Ltd.), a
silica sol, and 1 g of HPC402H (Japan Synthetic Rubber Co., Ltd.),
an alkylalkoxysilane, were mixed together. The mixture was stirred
for 5 min. The resultant solution was spin coated on a 0.15
mm-thick degreased aluminum sheet to form a 2 .mu.m-thick primer
layer.
[0585] Next, photocatalyst-containing layers as described in
Examples A-3 and A-4 were formed on the primer layer to obtain
original plates for waterless printing plates.
[0586] Subsequently, a pattern was formed under conditions of
Nd:YAG laser (355 nm A-Physic Star Line) and recording energy 200
mJ/cm.sup.2. The printing plates thus obtained were mounted on an
offset printing machine (Alpha New Ace, manufactured by Alpha Giken
K.K.), and printing was carried out on a coated paper using an ink
for waterless printing (Inctec Waterless S Deep Blue, manufactured
by The Inctec Inc.) at a printing speed of 5000 sheets/hr. As a
result, 20,000 sheets of good prints could be obtained.
[0587] Further, printing properties were evaluated in the same
manner as described above, except that exposure was carried out
using, instead of the laser, a high pressure mercury lamp at an
intensity of 70 mW/cm.sup.2 for 2 min through a gradation negative
pattern having halftone dots of 2 to 98% with 175 lines/in. As a
result, good prints could be obtained.
Example A-7
[0588] A sodium ion block layer was prepared in the same manner as
in Example A-3. Next, 3 g of isopropyl alcohol, 2.2 g of an
organosilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.),
0.15 g of a fluoroalkylsilane (MF-160E, manufactured by Tohchem
Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 0.2 g of titanium oxide powder (ST-21, average particle
diameter 20 nm, manufactured by Ishihara Sangyo Kaisha Ltd.) were
mixed together. The resultant dispersion was stirred for 20 min
while maintaining the temperature at 100.degree. C. The resultant
dispersion was spin coated on the substrate with a sodium ion block
layer formed thereon. The assembly was dried at a temperature of
150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organosiloxane was formed. The average roughness of the
surface of the photocatalyst-containing layer was measured by the
tracer method and found to be Ra=4 nm. Further, the
photocatalyst-containing layer was irradiated with ultraviolet
light at an intensity of 70 mW/cm.sup.2 for 5 min using a high
pressure mercury lamp through a lattice-like mask. In this case,
the contact angle of the photocatalyst-containing layer with water
and n-octane was measured with a contact angle goniometer (Model
CA-Z, manufactured by Kyowa Interface Science Co., Ltd.). The
results are shown in Table A-4.
Example A-8
[0589] A 0.3 .mu.m-thick photocatalyst-containing layer formed in
the same manner as in Example A-7 was irradiated with ultraviolet
light at an intensity of 70 mW/cm.sup.2 for 5 min using a high
pressure mercury lamp through a mask with light shielding layers
having a size of 150.times.300 .mu.m disposed at intervals of 30
.mu.m.
[0590] Various liquids having known surface tension were dropped on
the photocatalyst-containing layer to measure the contact angle
between the photocatalyst-containing layer and the liquids with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.), and the critical surface tension was
determined by Zisman plotting. As a result, the critical surface
tension was 15.4 mN/m for unexposed areas and was 73.3 mN/m for
exposed areas.
[0591] Next, 4 g of carbon black (#950, manufactured by Mitsubishi
Chemical Corporation), 0.7 g of polyvinyl alcohol (Gosenol AH-26,
manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), and
95.3 g of water were mixed together and dissolved with heating. The
solution was centrifuged at 12000 rpm and filtered through a
1-.mu.m glass filter to prepare a composition for a light shielding
pattern.
[0592] The surface tension of the composition for a light shielding
pattern was measured with a tension meter (Model PD-Z, manufactured
by Kyowa Interface Science Co., Ltd.) and found to be 37.5
mN/m.
[0593] This composition was blade-coated on the whole area of the
exposed photocatalyst-containing layer under conditions of blade
interval 40 .mu.m and speed 0.6 m/min. As shown in FIG. 7, the
composition for a light shielding pattern was repelled by the
unexposed areas and was selectively coated only in the exposed
areas. Heating at 100.degree. C. for 30 min resulted in the
formation of a lattice-like light shielding pattern 119 through a
photocatalyst layer 104 on a glass substrate 102.
Example A-9
[0594] A sodium ion block layer was prepared in the same manner as
in Example A-3. Next, 3 g of isopropyl alcohol, 2.2 g of an
organosilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.),
0.15 g of a fluoroalkylsilane (MF-160E, manufactured by Tohchem
Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 0.2 g of titanium oxide powder (ST-21, average particle
diameter 20 nm, manufactured by Ishihara Sangyo Kaisha Ltd.) were
mixed together. The resultant dispersion was stirred for 20 min
while maintaining the temperature at 100.degree. C. The resultant
dispersion was spin coated on the substrate with a sodium ion block
layer formed thereon. The assembly was dried at a temperature of
150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organosiloxane was formed. The average roughness of the
surface of the photocatalyst-containing layer was measured by the
tracer method in the same manner as in Example A-1 and found to be
Ra=4 nm. Further, the photocatalyst-containing layer was irradiated
with ultraviolet light at an intensity of 70 mW/cm.sup.2 for 5 min
using a high pressure mercury lamp through a lattice-like mask. In
this case, the contact angle of the photocatalyst-containing layer
with water and n-octane was measured with a contact angle
goniometer (Model CA-Z, manufactured by Kyowa Interface Science
Co., Ltd.). The results are shown in Table A-4.
Example A-10
[0595] A sodium ion block layer was formed on a glass substrate in
the same manner as in Example A-3. A photocatalyst-containing layer
was then formed in the same manner as in Example A-9, followed by
exposure in the same manner as in Example A-9.
[0596] Unexposed areas and exposed areas were subjected to
elementary analysis using an X-ray photoelectron spectroscopic
device (ESCALAB220-I-XL, manufactured by V. G. Scientific).
Quantitative calculation was conducted by Shirley's background
correction and Scofield's relative sensitivity coefficient
correction. The results were expressed in terms of relative value
by presuming the weight of Si to be 100 and shown in Table A-1.
TABLE-US-00002 TABLE A-1 Si C O Ti F Unexposed area 100 98 179 21
40 Exposed area 100 21 220 20 0
[0597] Table A-1 shows that exposure decreases the proportion of
carbon and fluorine and increases the proportion of oxygen. As is
apparent from the results of Example A-9, since the
photocatalyst-containing layer has reduced contact angle with
water, it is considered that organic groups bonded to silicon
atoms, such as methyl and fluoroalkyl groups, have been substituted
by oxygen-containing groups, such as hydroxyl groups.
Example A-11
[0598] A sodium ion block layer was prepared in the same manner as
in Example A-3. Next, 3 g of isopropyl alcohol, 0.4 g of an
organosilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.),
0.75 g of a fluoroalkylsilane (MF-160E, manufactured by Tohchem
Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 2 g of titanium oxide (titanium oxide coating liquid ST-K01,
solid content 10% by weight, manufactured by Ishihara Sangyo Kaisha
Ltd.) were mixed together. The resultant dispersion was stirred for
60 min while maintaining the temperature at 100.degree. C. The
resultant dispersion was spin coated on the substrate with a sodium
ion block layer formed thereon. The assembly was dried at a
temperature of 150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organosiloxane was formed. Further, the
photocatalyst-containing layer was irradiated with ultraviolet
light at an intensity of 70 mW/cm.sup.2 for 10 min using a high
pressure mercury lamp through a lattice-like mask. In this case,
the contact angle of the photocatalyst-containing layer with water
and n-octane was measured with a contact angle goniometer (Model
CA-Z, manufactured by Kyowa Interface Science Co., Ltd.). The
results are shown in Table A-4.
Example A-12
[0599] A 0.3 .mu.m-thick photocatalyst-containing layer was formed
in the same manner as in Example A-4. The photocatalyst-containing
layer was irradiated with ultraviolet light at an intensity of 70
mW/cm.sup.2 for 2 min using a high pressure mercury lamp through a
mask having light shielding layers provided at a pitch of 100
.mu.m. A photosensitive resin composition for color pixels of a
color filter was dropped by means of a dispenser (1500 XL,
manufactured by EFD). As a result, the composition could wet and
spread on exposed areas to form pixels.
Example A-13
[0600] 3 g of isopropyl alcohol, 0.3 g of an organosilane (TSL8113,
manufactured by Toshiba Silicone Co., Ltd.), 0.45 g of a
fluoroalkylsilane (MF-160E, manufactured by Tohchem Products
Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 2 g of titanium oxide (titanium oxide coating liquid ST-K01,
solid content 10% by weight, manufactured by Ishihara Sangyo Kaisha
Ltd.) were mixed together. The resultant dispersion was stirred for
20 min while maintaining the temperature at 100.degree. C. The
resultant dispersion was spin coated on a 0.3 mm-thick aluminum
sheet. The coated substrate was dried at a temperature of
150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 0.5 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organosiloxane was formed.
[0601] The structure for pattern formation thus obtained was heated
on a hot plate at various temperatures. In this state, heat rays
were removed from light emitted from an ultrahigh pressure mercury
lamp (UXM-3500, Model ML-40D lamp house, manufactured by Ushio
Inc.), and only ultraviolet light with wavelengths ranging from 241
nm to 271 nm was applied at an intensity of 8.1 mW/cm.sup.2 for 300
sec. The contact angle of the photocatalyst-containing layer with
water was measured with a contact angle goniometer (Model CA-Z,
manufactured by Kyowa Interface Science Co., Ltd.). The results are
shown in Table A-2. As is apparent from Table A-2, heating
accelerated photocatalytic reaction.
TABLE-US-00003 TABLE A-2 Before exposure After exposure 25
130.degree. 118.degree. 60.degree. C. 130.degree. 40.degree.
100.degree. C. 130.degree. Below 5.degree.
Example A-14
[0602] A photocatalyst-containing layer was formed on a quartz
glass having a size of 10 cm in length.times.10 cm in width in the
same manner as in Example A-3. A negative-working photomask with a
light-permeable portion having a size of 150 .mu.m.times.300 .mu.m
disposed at intervals of 30 .mu.m was brought to intimate contact
with the structure for pattern formation or was disposed into the
structure for pattern formation while leaving a space of 100 .mu.m.
Ultraviolet light with wavelengths ranging from 320 to 390 nm was
then applied using a high pressure mercury lamp at an intensity of
70 mW/cm.sup.2 for 2 min. The contact angle of the
photocatalyst-containing layer with water was measured with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). The results are summarized in Table
A-3.
TABLE-US-00004 TABLE A-3 Unexposed area Exposed area Intimate
contact 113.degree. Below 97.degree. Leaving space of 100 .mu.m
113.degree. Below 5.degree.
Example A-15
[0603] The negative-working photomask as described in Example A-14
was disposed on the structure for pattern formation while leaving a
space of 100 .mu.m in the same manner as in Example A-14. Exposure
was performed in the same manner as in Example A-14, except that
the exposure was carried out while spraying air onto exposing areas
of the structure for pattern formation. As a result, exposure for
70 sec provided a contact angle with water of not more than
5.degree..
Example A-16
[0604] On a glass substrate having a size of 10 cm in
length.times.10 cm in width.times.0.1 cm in thickness were formed a
primer layer and a photocatalyst-containing layer in the same
manner as in Example A-10. Ultraviolet light with wavelengths
ranging from 320 nm to 390 nm was then applied at an intensity of
70 mW/cm.sup.2 for 7 min from a high pressure mercury lamp through
a photomask with a light shielding portion having a size of 100
.mu.m in length.times.100 .mu.m in width formed thereon at
intervals of 20 .mu.m.
[0605] Next, an ink ribbon comprising a hot-melt ink composition
layer having the following composition as a hot-melt ink layer
provided on a 10 .mu.m-thick polyester film was brought to intimate
contact with the pattern-wise exposed photocatalyst-containing
layer. The assembly was then heated at 90.degree. C., and the ink
ribbon was then peeled off at a speed of 150 mm/sec and an angle of
70.degree..
TABLE-US-00005 Carbon black (#25, manufactured by Mitsubishi 20
pts. wt. Chemical Corporation) Ethylene-vinyl acetate copolymer
(manufactured 10 pts. wt. by DuPont-Mitsui Polychemicals Co., Ltd.)
Carnauba wax 10 pts. wt. Paraffin wax (HNP-11, manufactured by
Nippon 60 pts. wt. Seiro Co., Ltd.)
[0606] As a result, the ink was not adhered to the unexposed areas
of the structure for pattern formation, and the ink could be
transferred only onto the exposed areas to form a light shielding
pattern.
Example A-17
[0607] On a glass substrate having a size of 10 cm in
length.times.10 cm in width.times.0.1 cm in thickness were formed a
primer layer and a photocatalyst-containing layer in the same
manner as in Example A-10. Thus, a structure for pattern formation
was prepared. Ultraviolet light with wavelengths ranging from 320
nm to 390 nm was then applied to the structure for pattern
formation at an intensity of 70 mW/cm.sup.2 for 7 min from a high
pressure mercury lamp through a photomask with a 5 .mu.m-width line
provided thereon at the same intervals as the line width.
[0608] Next, the exposed structure for pattern formation was
immersed in a liquid having a concentration of 12.5 ml/liter,
prepared by diluting a sensitizer liquid for chemical plating
(S-10X for glass/ceramics, manufactured by C.Uyemura & Company
Ltd.), at 25.degree. C. while swinging for 20 sec. After washing
with water, the exposed structure for pattern formation was
immersed in a liquid having a concentration of 12.5 ml/liter,
prepared by diluting a reduction catalyst liquid (a palladium
colloid catalyst A-10X, manufactured by C.Uyemura & Company
Ltd.) at 25.degree. C. while swinging for 20 sec and was then
immersed with swinging for one hr in an electroless nickel plating
solution (Nimuden LPX, manufactured by C.Uyemura & Company
Ltd.) at 80.degree. C. Thus, a 0.5 .mu.m-thick nickel layer could
be formed on the exposed areas.
[0609] Further, the plated structure for pattern formation was
immersed with swinging for 5 min in an electroless gold plating
bath (ELGB511, manufactured by C.Uyemura & Company Ltd.) at
90.degree. C. to form a 0.1 .mu.m-thick gold layer on the nickel
pattern. The plated structure for pattern formation was then
immersed with swinging for one hr in an electroless gold plating
bath for thick plating (GCBEL2M, manufactured by C.Uyemura &
Company Ltd.) at 60.degree. C. to form a 2 .mu.m-thick gold
layer.
Example A-18
[0610] The same composition as described in Example A-4 was spin
coated onto a quartz glass substrate having a size of 10 cm in
length.times.10 cm in width.times.0.1 cm in thickness to form a 0.4
.mu.m-thick photocatalyst-containing layer. The
photocatalyst-containing layer was then irradiated with ultraviolet
light using a mercury lamp at an intensity of 70 mW/cm.sup.2 for 90
sec through a photomask with a pattern of rectangles having an
opening size of 23 .mu.m.times.12 .mu.m. Thus, a transparent
substrate comprising a photocatalyst-containing layer having
thereon a rectangular pattern with high surface free energy was
obtained.
[0611] A thin layer of a perylene pigment having a chemical
structure represented by formula A-4 was vacuum deposited onto the
whole area of the transparent substrate under conditions of degree
of vacuum 1.times.10.sup.-5 Torr and deposition rate 1 nm/sec. The
surface of the thin layer was washed with acetone. As a result, the
deposit was separated only from the unexposed areas due to the
difference between the adhesion of the pigment to the exposed areas
and the adhesion of the pigment to the unexposed areas. Thus, a
rectangular pattern of red pigment with the size of the rectangle
being 23 .mu.m.times.12 .mu.m could be obtained.
##STR00008##
Example A-19
[0612] The same composition as described in Example A-4 was spin
coated onto a 100 .mu.m-thick polyimide film to form a 0.4
.mu.m-thick photocatalyst-containing layer. The
photocatalyst-containing layer was then exposed to light using a
mercury lamp at an intensity of 70 mW/cm.sup.2 for 90 sec through a
negative-working photomask having a circuit pattern written in a
width of 50 .mu.m to form a transparent substrate comprising a
photocatalyst-containing layer having thereon a high surface energy
portion.
[0613] Next, aluminum was vacuum deposited onto the whole area of
the transparent substrate under conditions of degree of vacuum
1.times.10.sup.-5 Torr and deposition rate 4 nm/sec. A cellophane
pressure sensitive adhesive tape (JIS Z 1522, manufactured by
Sekisui) was applied onto the surface of the thin layer of aluminum
and then peeled off under conditions of 135.degree. and speed 300
mm/sec. As a result, the deposit layer was separated only from the
unexposed areas due to the difference between the adhesion of the
thin layer of aluminum to the transparent substrate in its exposed
areas and the adhesion of the thin layer of aluminum to the
transparent substrate in its unexposed areas, and a circuit pattern
having a circuit of 50 .mu.m in width and 0.1 .mu.m in layer
thickness could be obtained.
Example A-20
[0614] The same composition as described in Example A-4 was spin
coated onto a quartz glass substrate to form a 0.3 .mu.m-thick
photocaltayst-containing layer. The photocatalyst-containing layer
was then irradiated with ultraviolet light using a mercury lamp at
an intensity of 70 mW/cm.sup.2 for 2 min through a mask with an
opening diameter of 5 mm.
[0615] Various liquids having known surface tension were dropped on
the photocatalyst-containing layer to measure the contact angle
between the photocatalyst-containing layer and the liquids with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.), and the critical surface tension was
determined by Zisman plotting. As a result, the critical surface
tension was 14.6 mN/m for unexposed areas and was 72.3 mN/m for
exposed areas.
[0616] Next, 100 parts by weight of a ultraviolet curable monomer
(Beam Set 770, manufactured by Arakawa Chemical Industries, Ltd.)
and 5 parts by weight of a curing initiator (Irgacure 1700,
manufactured by Ciba Specialty Chemicals, K.K.) were mixed together
to prepare an ultraviolet curable composition.
[0617] The surface tension of the ultraviolet curable monomer
composition was measured with a tension meter (Model PD-Z,
manufactured by Kyowa Interface Science Co., Ltd.) and found to be
35 mN/m. Further, the viscosity was measured with a viscometer
(CJV5000, manufactured by Chichibu-Onoda) and found to be 4.3
mPasec. This ultraviolet curable monomer was spin coated on the
whole area of the exposed photocatalyst-containing layer.
[0618] The ultraviolet curable monomer composition was repelled by
the unexposed areas and was selectively coated only onto the
exposed areas. Ultraviolet light was then applied using a high
pressure mercury lamp an intensity of 70 mW/cm.sup.2 for 3 min. As
a result, a pattern of circles, with a diameter of 5 mm, of the
ultraviolet cured resin was obtained.
Comparative Example A-1
[0619] A commercially available original plate for offset printing
was evaluated for properties using a thermal plate Pearl dry
(manufactured by Presstek) in the same manner as in Example A-3.
The results are summarized in Table A-4.
Comparative Example A-2
[0620] A waterless offset plate HGII (manufactured by Toray
Industries, Inc.), a commercially available original plate for
offset printing, was evaluated for properties in the same manner as
in Example A-3. The results are summarized in Table A-4.
Comparative Example A-3
[0621] A photocatalyst-containing layer was formed in the same
manner as in Example A-4, except that the fluoroalkylsilane was not
used. The photocatalyst-containing layer was evaluated for
properties in the same manner as in Example A-4. The results are
summarized in Table A-4.
Comparative Example A-4
[0622] A sodium ion block layer was prepared in the same manner as
in Example A-3. Next, 3 g of isopropyl alcohol, 2.2 g of an
organosilane (TSL8113, manufactured by Toshiba Silicone Co., Ltd.),
0.15 g of a fluoroalkylsilane (MF-160E, manufactured by Tohchem
Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 0.2 g of titanium oxide powder (ST-41, average particle
diameter 50 nm, manufactured by Ishihara Sangyo Kaisha Ltd.) were
mixed together. The resultant dispersion was stirred for 20 min
while maintaining the temperature at 100.degree. C. The resultant
dispersion was spin coated on the substrate with a sodium ion block
layer formed thereon. The assembly was dried at a temperature of
150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organosiloxane was formed. The average roughness of the
surface of the photocatalyst-containing layer was measured by the
tracer method in the same manner as in Example A-1 and found to be
Ra=30 nm. Further, the photocatalyst-containing layer was
irradiated with ultraviolet light at an intensity of 70 mW/cm.sup.2
for 5 min using a high pressure mercury lamp through a lattice-like
mask. In this case, the contact angle of the
photocatalyst-containing layer with water and n-octane was measured
with a contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). The results are summarized in Table
A-4.
TABLE-US-00006 TABLE A-4 Exposed area Unexposed area Water n-Octane
Water n-Octane Ex. A-3 Below 5.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-4 Below 5.degree. Below 5.degree. 107.degree.
47.degree. Ex. A-7 Below 5.degree. Below 5.degree. 105.degree.
40.degree. Ex. A-9 Below 5.degree. Below 5.degree. 100.degree.
30.degree. Ex. A-11 Below 5.degree. Below 5.degree. 151.degree.
77.degree. Comp. Ex. A-1 84.degree. Below 5.degree. 105.degree.
11.degree. Comp. Ex. A-2 104.degree. 5.degree. 116.degree.
13.degree. Comp. Ex. A-3 Below 5.degree. Below 5.degree. 86.degree.
10.degree. Comp. Ex. A-4 10.degree. 10.degree. 105.degree.
26.degree.
Example A-21
[0623] A 20 wt % dimethylformamide solution of a composition for a
primer layer (Kan-coat 90T-25-3094, manufactured by Kansai Paint
Co., Ltd.) was coated on a 0.15 mm-thick degreased aluminum sheet.
The coated aluminum sheet was dried at 200.degree. C. for 1 min.
Thus, a 3 .mu.m-thick primer layer was formed.
[0624] Next, 3 g of isopropyl alcohol, 4.2 g of an organosilane
(TSL8113, manufactured by Toshiba Silicone Co., Ltd.), and 0.2 g of
titanium oxide powder (ST-01, average particle diameter 7 nm,
manufactured by Ishihara Sangyo Kaisha Ltd.) were mixed together.
The mixture was stirred for 60 min while maintaining the
temperature at 100.degree. C. The resultant dispersion was spin
coated onto the substrate having thereon a primer layer. The
assembly was dried at 150.degree. C. for 5 min, permitting
hydrolysis and polycondensation to proceed. Thus, a layer was
formed.
[0625] Ultraviolet irradiation was carried out using a high
pressure mercury lamp at an intensity of 70 mW/cm.sup.2 for 10 min.
In this case, the contact angle with water and n-octane was
measured with a contact angle goniometer (Model CA-Z, manufactured
by Kyowa Interface Science Co., Ltd.). The results are summarized
in Table A-5.
TABLE-US-00007 TABLE A-5 Before irradiation After irradiation Water
72.degree. 0.degree. n-Octane Below 6.degree. Below 5.degree.
[0626] Further, the original plate for lithography using dampening
water was exposed to light from the above mercury lamp through a
gradation positive-working mask having halftone dots of 2 to 98%
with 175 lines/in. Thus, a pattern was formed.
[0627] Next, the printing plate thus obtained was mounted on an
offset printing machine (Alpha New Ace, manufactured by Alpha Giken
K.K.), and printing was carried out on a coated paper using a
printing ink (ACROS(EIKUROSU) Deep Red, manufactured by The Inctec
Inc.) and dampening water (a liquid prepared by diluting a clean
etch liquid 20 times with water, manufactured by Nikken Chemicals
Co., Ltd.) at a printing speed of 5000 sheets/hr. As a result,
20,000 sheets of good prints could be obtained.
Example A-22
[0628] 2.7 g of tetraethoxysilane Si(OC.sub.2H.sub.6).sub.4, 38.7 g
of ethanol, and 4.5 g of 2 N hydrochloric acid were mixed together.
The mixture was stirred for 10 min. The resultant solution was spin
coated onto a substrate, and the coated substrate was dried at
80.degree. C. for 30 min. Thus, a 0.2 .mu.m-thick sodium ion block
layer was formed.
[0629] Tetraethoxysilane Si(OC.sub.2H.sub.5).sub.4 (0.62 g), 0.96 g
of titania sol ((TA-15, manufactured by Nissan Chemical Industries
Ltd.), 26.89 g of ethanol, and 0.32 g of pure water were mixed
together. The mixture was stirred for 10 min. The resultant
dispersion was spin coated on the substrate with the sodium ion
block layer formed thereon. The assembly was dried at a temperature
of 150.degree. C. for 30 min, permitting hydrolysis and
polycondensation to proceed. Thus, a 0.2 .mu.m-thick
photocatalyst-containing layer, having high surface free energy,
with a photocatalyst being strongly fixed in silica was prepared as
sample A-1.
[0630] Next, a solution of 5% by weight of an olive oil in
cyclohexanone was spin coated onto the photocatalyst-containing
layer of sample A-1 at a coverage of 1 g/m.sup.2. The coating was
dried at a temperature of 80.degree. C. for 10 min to from an
organic material layer having low surface free energy. Thus, sample
A-2 was prepared.
[0631] Sample A-1 and sample A-2 were irradiated with ultraviolet
light from a mercury lamp at an intensity of 230 mW/cm.sup.2 for 5
min. Thereafter, the contact angle of the samples with water was
measured with a contact angle goniometer (Model CA-Z, manufactured
by Kyowa Interface Science Co., Ltd.). The results are summarized
in Table A-6. As a result, it was found that, in sample A-2, the
organic material layer was degraded and removed by photocatalytic
action and this brought sample A-2 to the same state as sample A-1
which is the sample before coating. For sample A-1 having a high
critical surface tension layer, the wettability after light
irradiation was substantially the same as the wettability before
light irradiation.
TABLE-US-00008 TABLE A-6 Before irradiation After irradiation
Sample A-1 8.degree. 7.degree. Sample A-2 47.degree. 7.degree.
[0632] Further, a 2 wt % aqueous solution of polyvinyl alcohol
(Gosenol AH-26, manufactured by Nippon Synthetic Chemical Industry
Co., Ltd.) was spin coated onto the surface of sample A-1 to a
thickness of 0.2 .mu.m. The coating was heated at 80.degree. C. for
45 min to form a film. Subsequently, the film was irradiated with
ultraviolet light from a mercury lamp at an intensity of 280
mW/cm.sup.2 for 8 min. The contact angle of the film with water was
measured with a contact angle goniometer (Model CA-Z, manufactured
by Kyowa Interface Science Co., Ltd.). As a result, the contact
angle before light irradiation and the contact angle after light
irradiation were 62.degree. and not more than 5.degree.,
respectively.
Example A-23
[0633] A solution of 5% by weight of a mixture of 94.99% by weight
of polydimethylsiloxane having a hydroxyl group at its both ends
(degree of polymerization 700), 5% by weight of
methyltriacetoxysilane, and 0.01% by weight of dibutyltin dilaurate
in Isopar E (manufactured by Exxon Chemical) was spin coated onto
sample A-1 of Example A-22 to a thickness of 0.2 .mu.m. The coating
was dried at 100.degree. C. for 10 min to form a film.
[0634] The film was then irradiated with light from a mercury lamp
at an intensity of 50 mW/cm.sup.2 for one min. As a result, the
wettability in terms of the contact angle was changed from
130.degree. to not more than 5.degree..
[0635] A 20 wt % dimethylformamide solution of a composition for a
primer layer (Kan-coat 90T-25-3094, manufactured by Kansai Paint
Co., Ltd) was coated onto a degreased aluminum sheet having a
thickness of 0.15 mm. The coated aluminum sheet was dried at
200.degree. C. for one min to form a 3 .mu.m-thick primer
layer.
[0636] Next, a photocatalyst-containing layer and a
wettability-variable material layer as described in Example A-22
were formed onto the primer layer to prepare an original plate for
waterless plate.
[0637] Subsequently, a pattern was formed under conditions of
Nd:YAG laser (355 nm A-Physic Star Line) and recording energy 200
mJ/cm.sup.2. The printing plate thus obtained was mounted on an
offset printing machine (Alpha New Ace, manufactured by Alpha Giken
K.K.), and printing was carried out on a coated paper using an ink
for waterless printing (Inctec Waterless S Deep Blue, manufactured
by The Inctec Inc.) at a printing speed of 5000 sheets/hr. As a
result, 20,000 sheets of good prints could be obtained.
Example A-24
[0638] A sodium block layer was formed on a soda-lime glass
substrate having a size of 10 cm in length.times.10 cm in
width.times.0.1 cm in thickness in the same manner as in Example
A-22. A solution prepared by mixing 1 g of tetraethoxytitanium
(Ti(OC.sub.2H.sub.5).sub.4), 9 g of ethanol, and 0.1 g of
hydrochloric acid together was spin coated on the block layer.
[0639] The assembly was heated at 150.degree. C. for 10 min to form
a 0.1 .mu.m-thick amorphous titania layer. The amorphous titania
layer was heated at 400.degree. C. for 10 min to create a phase
change to an anatase form of titania layer.
[0640] A wettability-variable layer was formed on the titania layer
in the same manner as in Example A-23 and then irradiated with
light from a mercury lamp at an intensity of 50 mW/cm.sup.2 through
a chart mask having a resolution of 50 lp/mm for 2 min.
[0641] Next, an ink for waterless lithography (Inctec Waterless S
Yellow, manufactured by The Inctec Inc.) was coated on the whole
area of the exposed pattern forming structure by means of an RI
tester (Model RI-2 tester, manufactured by Ishikawajima Industrial
Machinery Co., Ltd.). As a result, a yellow pattern was obtained
wherein the unexposed areas repelled the ink due to its oil
repellency with the ink selectively coated only on the exposed
area.
Example A-25
[0642] A glass substrate provided with a sodium ion block layer was
prepared in the same manner as in Example A-1. Next, 0.14 g of a
surfactant (BL-2, manufactured by Nihon Surfactant Kogyo K.K.),
0.62 g of tetraethoxysilane Si(OC.sub.2H.sub.5).sub.4, 0.96 g of a
titania sol (TA-15, manufactured by Nissan Chemical Industries
Ltd.), 26.89 g of ethanol, and 0.32 g of water were mixed together.
The mixture was stirred for 10 min. The resultant dispersion was
spin coated on the substrate with the 0.2 .mu.m-thick sodium ion
block layer formed thereon.
[0643] The assembly was then dried at a temperature of 150.degree.
C. for 30 min, permitting hydrolysis and polycondensation to
proceed. Thus, a 0.2 .mu.m-thick photocatalyst-containing layer
with a photocatalyst and a surfactant being strongly fixed in
silica was formed. The sample thus obtained was irradiated with
ultraviolet light from a xenon lamp at an intensity of 3
mW/cm.sup.2. In this case, a change in contact angle between the
sample and water with the elapse of time was measured with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). The results are shown in FIG. 8. As
is apparent from FIG. 8, the contact angle (63.degree. before light
irradiation) gradually decreased with the elapse of irradiation
time and, about 80 min after the initiation of irradiation, reached
6.degree..
Example A-26
[0644] 3 g of Glasca HPC7002 (Japan Synthetic Rubber Co., Ltd.), a
silica sol, and 1 g of HPC402H (Japan Synthetic Rubber Co., Ltd.),
an alkylalkoxysilane, were mixed together. The mixture was stirred
for 5 min. The resultant solution was spin coated on a 0.15
mm-thick aluminum sheet to form a 2 .mu.m-thick primer layer.
[0645] Next, a photocatalyst-containing layer as described in
Examples A-23 was formed on the primer layer to obtain an original
plate for a printing plate.
[0646] Further, the original plate for lithography using dampening
water was exposed to light from the above xenon lamp through a
gradation positive-working film having halftone dots of 2 to 98%
with 175 lines/in. Thus, a pattern was formed.
[0647] Next, the printing plate thus obtained was mounted on an
offset printing machine (Alpha New Ace, manufactured by Alpha Giken
K. K.), and printing was carried out on a coated paper using an
offset printing ink (ACROS(EIKUROSU) Deep Red, manufactured by The
Inctec Inc.) and dampening water at a printing speed of 5000
sheets/hr. As a result, 20,000 sheets of good prints could be
obtained.
Example A-27
[0648] A composition as described in Example A-4 was spin coated
onto a transparent substrate of quartz glass to form a 0.4
.mu.m-thick photocatalyst-containing layer. Subsequently, the
coating was irradiated with light from a mercury lamp at an
intensity of 70 mW/cm.sup.2 through a mask having a circular
pattern with a opening diameter of 9 mm for 90 sec. Thus, a
transparent substrate having thereon a highly wettable circular
pattern was obtained.
[0649] 1000 g of a water-soluble ultraviolet curable ester acrylate
resin (AQ-7, manufactured by Arakawa Chemical Industries, Ltd.), 50
g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), and 25 g of water were mixed together.
The mixture was stirred for 3 min. 30 .mu.l of the mixed liquid was
dropped through a microsyringe on the center of the circular
pattern utilizing a difference in wettability formed on the
transparent substrate.
[0650] Subsequently, light was applied from a mercury lamp at an
intensity of 70 mW/cm.sup.2 for 10 sec. Thus, a lens having a
diameter of 9 mm and a focal length of 45 mm was prepared.
Example A-28
[0651] A composition as described in Example A-4 was spin coated
onto a transparent substrate of quartz glass to form a 0.4
.mu.m-thick photocatalyst-containing layer. Subsequently, the
coating was irradiated with light from a mercury lamp at an
intensity of 70 mW/cm.sup.2 through a mask having a circular
pattern with a opening diameter of 1 mm for 90 sec. Thus, a
transparent substrate having thereon a highly wettable circular
pattern was obtained.
[0652] 1000 g of a water-soluble ultraviolet curable ester acrylate
resin (AQ-7, manufactured by Arakawa Chemical Industries, Ltd.), 50
g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), and 125 g of water were mixed together.
The mixture was stirred for 3 min. The mixed liquid was spin coated
onto the circular pattern utilizing a difference in wettability
formed on the transparent substrate to a thickness of 20 .mu.m. As
a result, the mixed liquid was deposited only onto the circular
portion. Subsequently, light was applied from a mercury lamp at an
intensity of 70 mW/cm.sup.2 for 3 sec. Thus, a lens having a
diameter of 1 mm and a focal length of 2.5 mm was prepared.
Example A-29
[0653] A 20 wt % dimethylformamide solution of a primer (a primer
paint for metals, Kan-coat 90T-25-3094, manufactured by Kansai
Paint Co., Ltd.) was coated on a 0.23 mm-thick degreased aluminum
sheet. The coated aluminum sheet was dried at 200.degree. C. for 1
min. Thus, a 3 .mu.m-thick primer layer was formed.
[0654] A composition comprising 9 g of polydimethylsiloxane of
which both ends had been modified with OH(X-22-160AS, functional
group equivalent 112, manufactured by The Shin-Etsu Chemical Co.,
Ltd.), 1 g of a crosslinking agent (polyisocyanate, Coronate L,
manufactured by Nippon Polyurethane Industry Co., Ltd.), 0.05 g of
butyltin dilaurate, 1 g of titanium oxide powder (ST-01, particle
diameter 7 nm, Ishihara Sangyo Kaisha Ltd.), 5 g of 1,4-dioxane,
and 5 g of isopropanol was coated onto the primer layer. The
coating was dried at 120.degree. C. for 2 min to form a 1
.mu.m-thick photocatalyst-containing layer. Thus, an original plate
for a printing plate was obtained. The average roughness of the
surface of the photocatalyst-containing layer was measured by the
tracer method and found to be Ra=2 nm.
[0655] The original plate was then irradiated with an excimer laser
at 248 nm at an intensity of 200 mJ/cm.sup.2 to form a pattern and
to induce a photocatalytic reaction.
[0656] The contact angle of exposed areas with water and n-octane
was measured with a contact angle goniometer (Model CA-Z,
manufactured by Kyowa Interface Science Co., Ltd.). A result, a
difference in wettability could be confirmed. The results of
measurement are shown in Table A-7.
Example A-30
[0657] The printing plate prepared in Example A-29 was mounted on
an offset printing machine (Komori Sprint Four Color Machine), and
printing was carried out using a printing ink (Dri-o-color Deep
Blue ink, manufactured by Dainippon Ink and Chemicals, Inc.) onto
coated paper. As a result, good prints could be obtained.
Example A-31
[0658] A primer layer was formed onto a 0.23 mm-thick aluminum
substrate in the same manner as in Example A-29. Subsequently, a
composition comprising 8 g of polydimethylsiloxane of which both
ends had been modified with OH(X-22-160AS, manufactured by The
Shin-Etsu Chemical Co., Ltd.), 1 g of polydimethylsiloxane (KF96,
manufactured by The Shin-Etsu Chemical Co., Ltd.), 1 g of a
crosslinking agent (polyisocyanate, Coronate L, manufactured by
Nippon Polyurethane Industry Co., Ltd.), 0.05 g of dibutyltin
dilaurate, 1 g of titanium oxide powder (ST-01, particle diameter 7
nm, Ishihara Sangyo Kaisha Ltd.), 5 g of toluene, and 5 g of
isopropanol was coated onto the primer layer. The coating was dried
at 150.degree. C. for 2 min to form a 1 .mu.m-thick
photocatalyst-containing layer. Thus, an original plate for a
printing plate was obtained.
[0659] The average roughness of the surface of the
photocatalyst-containing layer was measured by the tracer method
and found to be Ra=2 nm.
[0660] The original plate was then irradiated with an excimer laser
at 248 nm at an intensity of 200 mJ/cm.sup.2 to form a pattern and
to induce a photocatalytic reaction.
[0661] The contact angle of exposed areas with water and n-octane
was measured with a contact angle goniometer (Model CA-Z,
manufactured by Kyowa Interface Science Co., Ltd.). Aa result, a
difference in wettability could be confirmed. The results of
measurement are shown in Table A-7.
[0662] Further, in the same manner as in A-30, the printing plate
thus prepared was mounted on an offset printing machine (Komori
Sprint Four Color Machine), and printing was carried out using a
printing ink (Dri-o-color Deep Blue ink, manufactured by Dainippon
Ink and Chemicals, Inc.) onto coated paper. As a result, good
prints could be obtained.
Example A-32
[0663] 3 g of a silica sol (Glasca HPC7002, manufactured by Japan
Synthetic Rubber Co., Ltd.) and 1 g of an alkylalkoxysilane
(HPC402H, manufactured by Japan Synthetic Rubber Co., Ltd.) were
mixed together, and the mixture was stirred for 5 min. The
resultant solution was spin coated onto a glass substrate having an
area of 7.5 cm.sup.2 to form a 2 .mu.m-thick sodium ion block
layer.
[0664] Next, 3 g of isopropyl alcohol, 0.76 g of a silica sol
(Glasca HPC7002, manufactured by Japan Synthetic Rubber Co., Ltd.),
0.25 g of an alkylalkoxysilane (Glasca HPC402H, manufactured by
Japan Synthetic Rubber Co., Ltd.), and 0.15 g of a
fluoroalkylsilane (MF-160E, manufactured by Tohchem Products
Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide)
were mixed together. The resultant dispersion was stirred for 20
min while maintaining the temperature at 100.degree. C. Thereafter,
2 g of titanium oxide (ST-K01, a liquid for titanium oxide, solid
content 10% by weight, manufactured by Ishihara Sangyo Kaisha Ltd.)
was added thereto, followed by stirring for additional 30 min.
[0665] The resultant dispersion was spin coated on the substrate
with a sodium block layer formed thereon. The assembly was dried at
a temperature of 150.degree. C. for 10 min, permitting hydrolysis
and polycondensation to proceed. Thus, a 3 .mu.m-thick
photocatalyst-containing layer with a photocatalyst being strongly
fixed by an organopolysiloxane was formed.
[0666] A dispersion prepared by mixing 1 g of polydimethylsiloxane
of which both ends had been modified with OH(X-22-160AS,
manufactured by The Shin-Etsu Chemical Co., Ltd.), 2 g of a silica
sol (Glasca HPC7002, manufactured by Japan Synthetic Rubber Co.,
Ltd.), and 1 g of an alkylalkoxysilane (HPC402H, manufactured by
Japan Synthetic Rubber Co., Ltd.) and stirring the mixture for 5
min was coated onto the photocatalyst-containing layer. The coating
was dried at a temperature of 150.degree. C. for 20 min. Thus, a
pattern forming structure having a dried film thickness of 0.5
.mu.m.
[0667] The average roughness of the surface of the pattern forming
structure was measured by the tracer method and found to be Ra=2
nm.
[0668] The pattern forming structure was then irradiated with a YAG
laser at 365 nm at an intensity of 200 mJ/cm.sup.2 to form a
pattern and to induce a photocatalytic reaction.
[0669] The contact angle of exposed areas with water and n-octane
was measured with a contact angle goniometer (Model CA-Z,
manufactured by Kyowa Interface Science Co., Ltd.). The results of
measurement are shown in Table A-7.
[0670] In the same manner as in Example A-27, the original plate
for a printing plate was mounted on an offset printing machine
(Komori Sprint Four Color Machine), and printing was carried out
using a printing ink (Dri-o-color Deep Blue ink, manufactured by
Dainippon Ink and Chemicals, Inc.) onto coated paper. As a result,
good prints could be obtained.
Example A-33
[0671] A primer layer was formed onto a 0.23 mm-thick aluminum
substrate in the same manner as in Example A-29. 0.76 g of an
emulsion type polydimethylsiloxane (an addition reaction type)
(KM-768, effective component 30%, manufactured by The Shin-Etsu
Chemical Co., Ltd.), 1.34 g of water, 1 g of a titanium oxide sol
(STS-01, particle diameter 7 nm, manufactured by Ishihara Sangyo
Kaisha Ltd.), 0.008 g of a catalyst for an addition reaction
(PM-6A), and 0.012 g of a catalyst for an addition reaction (PM-6B)
were mixed together. The mixture was coated onto the primer layer.
The coating was dried at 160.degree. C. for one min to form a 1
.mu.m-thick photocatalyst-containing layer.
[0672] A mask was brought to an intimate contact with the
photocatalyst-containing layer, followed by ultraviolet irradiation
from a high pressure mercury lamp at an intensity of 70 mW/cm.sup.2
for 10 min to conduct a photocatalytic reaction. Thereafter, the
contact angle of the sample with water and n-octante was measured
with a contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). The results are shown in Table
A-7.
Example A-34
[0673] A 20 wt % dimethylformamide solution of a primer (a primer
paint for metals, Kan-coat 90T-25-3094, manufactured by Kansai
Paint Co., Ltd.) was coated on a 0.23 mm-thick degreased aluminum
sheet. The coated aluminum sheet was dried at 200.degree. C. for 1
min. Thus, a 3 .mu.m-thick primer layer was formed.
[0674] 3 g of a silica sol (Glasca HPC7002, manufactured by Japan
Synthetic Rubber Co., Ltd.) and 1 g of an alkylalkoxysilane
(HPC402H, manufactured by Japan Synthetic Rubber Co., Ltd.) were
mixed together, and the mixture was stirred by means of a stirrer
for 5 min. The resultant solution was blade coated onto the primer
layer. The coating was dried at 100.degree. C. for 10 min.
[0675] Next, 3 g of isopropyl alcohol, 0.75 g of a silica sol
(Glasca HPC7002, solid content 12%, manufactured by Japan
Syntlhetic Rubber Co., Ltd.), 0.25 g of an alkoxysilane (HPC402H,
solid content 50%, manufactured by Japan Synthetic Rubber Co.,
Ltd.), 0.15 g of a fluoroalkylsilane (MF-160E, manufactured by
Tohchem Products Corporation: a 50 wt % isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 0.15 g of diethoxydimethylsilane (TSL8112, manufactured by
Toshiba Silicone Co., Ltd.) were mixed together. The resultant
solution was stirred for 20 min while maintaining the temperature
at 100.degree. C. Thereafter, 2 g of a liquid for coating of
titanium oxide (ST-K01, solid content 10%, manufactured by Ishihara
Sangyo Kaisha Ltd.) was added thereto, followed by stirring for
additional 30 min. The resultant dispersion was spin coated. The
coating was dried at a temperature of 150.degree. C. for 10 min,
permitting hydrolysis and polycondensation to proceed. Thus, a 3
.mu.m-thick photocatalyst-containing layer with a photocatalyst
being strongly fixed by an organopolysiloxane was formed to obtain
a structure for pattern formation. The content of dimethylsiloxane
unit in the formed layer was 40%. The surface roughness of the
pattern forming structure was measured by the tracer method and
found to be Ra=2 nm.
[0676] The pattern forming structure was then irradiated with
ultraviolet light from a high pressure mercury lamp at an intensity
of 70 mW/cm.sup.2 through a lattice-like mask for 5 min. The
contact angle of the sample with water and n-octane was measured
with a contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). The results of measurement are shown
in Table A-7. The pattern forming structure with a pattern formed
thereon was mounted on an offset printing machine (Komori Sprint
Four Color Machine), and printing was carried out using an ink for
waterless printing (Dri-o-color Deep Blue ink, manufactured by
Dainippon Ink and Chemicals, Inc.) onto coated paper. As a result,
good prints could be obtained.
Example A-35
[0677] A YAG laser at 355 nm was pattern-wise applied at an
intensity of 200 mJ/cm.sup.2 onto a pattern forming structure
prepared as described in Example A-34 to conduct a photocatalytic
reaction. The contact angle of exposed areas with water and
n-octane was measured with a contact angle goniometer (Model CA-Z,
manufactured by Kyowa Interface Science Co., Ltd.). The results of
measurement are shown in Table A-7.
[0678] The pattern forming structure with a pattern formed thereon
was mounted on an offset printing machine (Komori Sprint Four Color
Machine), and printing was carried out using an ink for waterless
printing (Dri-o-color Deep Blue ink, manufactured by Dainippon Ink
and Chemicals, Inc.) onto coated paper. As a result, good prints
could be obtained.
Example A-36
[0679] A pattern forming structure was prepared in the same manner
as in Example A-31, except that the amount of
diethoxydimethylsilane (TSL8112, manufactured by Toshiba Silicone
Co., Ltd.) used in the photocatalyst-containing layer was changed
to 0.03 g and the content of the dimethylsiloxane unit was changed
to 10%. The pattern forming structure thus obtained was evaluated
in the same manner as in Example A-31. The results are shown in
Table A-7.
[0680] Printing was carried out on coated paper in the same manner
as in Example A-31. As a result, good prints free from smudges
could be obtained.
Example A-37
[0681] A 20 wt % dimethylformamide solution of a primer (a primer
paint for metals, Kan-coat 90T-25-3094, manufactured by Kansai
Paint Co., Ltd.) was coated on a 0.23 mm-thick degreased aluminum
sheet. The coated aluminum sheet was dried at 200.degree. C. for 1
min. Thus, a 3 .mu.m-thick primer layer was formed.
[0682] 3 g of a silica sol (Glasca HPC7002, manufactured by Japan
Synthetic Rubber Co., Ltd.) and 1 g of an alkylalkoxysilane
(HPC402H, manufactured by Japan Synthetic Rubber Co., Ltd.) were
mixed together, and the mixture was stirred by means of a stirrer
for 5 min. The resultant solution was blade coated onto the primer
layer. The coating was dried at 100.degree. C. for 10 min.
[0683] Next, 3 g of isopropyl alcohol, 0.75 g of a silica sol
(Glasca IHPC7002, manufactured by Japan Synthetic Rubber Co.,
Ltd.), 0.25 g of an alkylalkoxysilane (HPC402H, manufactured by
Japan Synthetic Rubber Co., Ltd.), 0.15 g of a fluoroalkylsilane
(MF-160E, manufactured by Tohchem Products Corporation: a 50 wt %
isopropyl ether solution of
N-[3-(trimethoxysilyl)propyl]-N-ethylperfluorooctanesulfonamide),
and 0.30 g of diethoxydimethylsilane were mixed together. The
resultant solution was stirred for 20 min while maintaining the
temperature at 100.degree. C. Thereafter, 2 g of a liquid for
coating of titanium oxide (ST-K01, solid content 10%, manufactured
by Ishihara Sangyo Kaisha Ltd.) was added thereto, followed by
stirring for additional 30 min. The resultant dispersion was spin
coated.
[0684] A dispersion prepared by mixing 3 g of isopropyl alcohol, 3
g of a silica sol (Glasca HPC7002, manufactured by Japan Synthetic
Rubber Co., Ltd.), and 1 g of an alkylalkoxysilane (HPC402H,
manufactured by Japan Synthetic Rubber Co., Ltd.) and stirring the
mixture for 5 min was coated on the coating to form a 0.2
.mu.m-thick coating. Thus, a pattern forming structure was
prepared.
[0685] The pattern forming structure was then exposed to a YAG
laser at an energy density of 200 mJ/cm.sup.2 through a
lattice-like mask to form a pattern. Thus, a printing plate was
prepared. The contact angle of the sample thus obtained with water
and n-octane was measured with a contact angle goniometer (Model
CA-Z, manufactured by Kyowa Interface Science Co., Ltd.). The
results of measurement are shown in Table A-7.
[0686] The pattern forming structure with a pattern formed thereon
was mounted on an offset printing machine (Komori Sprint Four Color
Machine), and printing was carried out using an ink for waterless
printing (Dri-o-color Deep Blue ink, manufactured by Dainippon Ink
and Chemicals, Inc.) onto coated paper. As a result, good prints
could be obtained.
Comparative Example A-5
[0687] A machine plate was prepared in the same manner as in
Example A-29, except that the substrate was not treated with the
primer. The plate was mounted on a printing machine in the same
manner as in Example A-30. As a result, the
photocatalyst-containing layer, as partially separated from the
aluminum substrate, indicating that the adhesion of the
photocatalyst-containing layer to the substrate was unsatisfactory.
Further, the plate was crosscut with a cutter, and a peeling test
was carried out using a mending tape (Scotch Mending Tape,
manufactured by Sumitomo 3M Ltd.). As a result, the plate provided
with a primer layer was free from the separation of the
photocatalyst-containing layer, whereas the plate not provided with
any primer layer caused the separation of the
photocatalyst-containing layer.
Comparative Example A-6
[0688] A commercially available original plate for offset printing
was evaluated for properties using a thermal plate Pearl dry
(manufactured by Presstek) in the same manner as in Example A-29.
The results are shown in Table A-7.
Comparative Example A-7
[0689] A waterless offset plate HGII (manufactured by Toray
Industries, Inc.), a commercially available original plate for
offset printing, was evaluated for properties in the same manner as
in Example A-29. The results are shown in Table A-7.
Comparative Example A-8
[0690] A pattern forming structure was prepared in the same manner
as in Example A-34, except that the amount of
diethoxydimethylsilane (TSL8112, manufactured by Toshiba Silicone
Co., Ltd.) used in the photocatalyst-containing layer was changed
to 0.2 g and the content of the dimethylsiloxane unit was changed
to 50%. The roughness of the surface of the
photocatalyst-containing layer was measured by the tracer method
and found to be Ra=500 nm, indicating that the surface of the
photocatalyst-containing layer is rough. This high roughness made
it impossible to prepare a plate for printing.
Comparative Example A-9
[0691] A pattern forming structure was prepared in the same manner
as in Example A-31, except that the amount of
diethoxydimethylsilane (TSL8112, manufactured by Toshiba Silicone
Co., Ltd.) used in the photocatalyst-containing layer was changed
to 0.01 g and the content of the dimethylsiloxane unit was changed
to 5%. The pattern forming structure was evaluated in the same
manner as in Example A-31. The results are shown in Table A-7.
Further, the surface roughness was measured by the tracer method
and found to be Ra=50 nm.
[0692] Printing was carried out on coated paper in the same manner
as in Example A-34. As a result, smudges occurred.
TABLE-US-00009 TABLE A-7 Exposed area Unexposed area Water n-Octane
Water n-Octane Ex. A-29 Below 5.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-31 Below 5.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-32 Below 5.degree. Below 5.degree. 115.degree.
15.degree. Ex. A-33 Below 5.degree. Below 5.degree. 107.degree.
15.degree. Ex. A-34 Below 5.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-35 Below 80.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-36 Below 70.degree. Below 5.degree. 113.degree.
16.degree. Ex. A-37 Below 60.degree. Below 5.degree. 115.degree.
15.degree. Comp. Ex. A-6 84.degree. Below 5.degree. 105.degree.
11.degree. Comp. Ex. A-7 104.degree. Below 5.degree. 116.degree.
13.degree. Comp. Ex. A-9 80.degree. Below 5.degree. 115.degree.
20.degree.
[0693] In the pattern forming structures according to the first
invention A, a photocatalyst-containing layer is provided on a
substrate. By virtue of this construction, a pattern can be formed
by varying the wettability of the surface of the substrate through
photocatalytic action created in response to light irradiation.
This can realize the formation of a pattern without development and
other steps. Therefore, the pattern forming structures according to
the present invention can be used for a wide variety of
applications including original plates for printing plates and
functional elements.
[0694] The following examples demonstrates use of a
photocatalyst-containing layer as a wettability-variable component
layer.
Example B-1
Preparation of Composition for Photocatalyst-Containing Layer
[0695] A coating liquid for a photocatalyst-containing layer (a
composition for a photocatalyst-containing layer) was prepared
according to the following formulation.
TABLE-US-00010 (Formulation of composition for
photocatalyst-containing layer) Photocatalyst-containing
composition (ST-K01, 2 pts. wt. manufactured by Ishihara Sangyo
Kaisha Ltd.) Organoalkoxysilane (TSL8113, manufactured 0.4 pt. wt.
by Toshiba Silicone Co., Ltd. Fluoroalkylsilane (MF-160E,
manufactured 0.3 pt. wt. by Tohchem Products Corporation) Isopropyl
alcohol 3 pts. wt.
[0696] This composition for a photocatalyst-containing layer was
spin coated onto a transparent substrate of soda-glass. The coating
was dried at a temperature of 150.degree. C. for 10 min, permitting
hydrolysis and polycondensation to proceed. Thus, a transparent
photocatalyst-containing layer (thickness 0.5 .mu.m) with a
photocatalyst being strongly fixed in an organopolysiloxane was
formed. The photocatalyst-containing layer was pattern-wise exposed
to light from a mercury lamp (wavelength 365 nm) at an intensity of
70 mW/cm.sup.2 through a mask for 50 sec. The contact angle of
exposed areas and unexposed areas with water was measured with a
contact angle goniometer (Model CA-Z, manufactured by Kyowa
Interface Science Co., Ltd.). In this case, a water droplet was
dropped on the sample through a microsyringe, and 30 sec after
that, the contact angle was measured. As a result, the contact
angle of the unexposed areas with water was 142.degree., while the
contact angle of the exposed areas with water was not more than
10.degree.. This confirms that the exposed areas function as high
critical surface tension areas and a pattern can be formed by
utilizing a difference in wettability between the exposed areas and
the unexposed areas.
Formation of Black Matrix
[0697] A photocatalyst-con g layer was formed on a transparent
substrate in the same manner as described above (corresponding to
FIG. 17 (A)).
[0698] The photocatalyst-containing layer was irradiated with light
from a mercury lamp (wavelength 365 nm) at an intensity of 70
mW/cm.sup.2 for 50 sec through a mask for a black matrix having a
matrix-like opening pattern (opening line width 30 .mu.m) so that
exposed areas had high critical surface tension (not more than
10.degree. in terms of contact angle with water) (corresponding to
FIG. 17 (B)).
[0699] Separately, a mixture having the following composition was
dissolved by heating at 90.degree. C., centrifuged at 12,000 rpm,
and then filtered through a 1-.mu.m glass filter. 1% by weight of
ammonium dichromate as a crosslinking agent was added to the
resultant aqueous colored resin solution to prepare a coating
liquid for a black matrix (a black matrix composition).
TABLE-US-00011 (Black matrix composition) Carbon black (#950,
manufactured by 4 pts. wt. Mitsubishi Chemical Corporation)
Polyvinyl alcohol (Gosenol AH-26, manufactured by 0.7 pt. wt.
Nippon Synthetic Chemical Industry Co., Ltd.,) Ion-exchanged water
95.3 pts. wt.
[0700] Next, the coating liquid for a black matrix (black matrix
composition) was blade coated onto the whole area of the
photocatalyst-containing layer. As a result, the black matrix
composition was repelled by the unexposed areas in the
photocatalyst-containing layer and selectively coated only onto the
exposed areas. Thereafter, the assembly was dried at 60.degree. C.
for 3 min and then exposed to light from a mercury lamp to cure the
black matrix composition, followed by heat treatment at 150.degree.
C. for 30 min to form a black matrix (corresponding to FIG. 17
(C)).
Formation of Colored Layer
[0701] At the outset, each mixture having the following composition
was milled and dispersed by means of a triple roll mill,
centrifuged at 12,000 rpm, and then filtered through a 1-.mu.m
glass filter. 1% by weight of ammonium dichromate as a crosslinking
agent was added to the resultant aqueous colored resin solutions to
prepare a composition for a red pattern, a composition for a green
pattern, and a composition for a blue pattern.
TABLE-US-00012 (Formulation of composition for red pattern) C.I.
Pigment Red 168 1 pt. wt. 5 wt % aqueous solution of polyvinyl
alcohol 10 pts. wt. (average degree of polymerization of polyvinyl
alcohol 1750, degree of saponification 88 mol %) (Formation of
composition for green pattern) C.I. Pigment Green 36 1 pt. wt. 5 wt
% aqueous solution of polyvinyl alcohol 10 pts. wt. (average degree
of polymerization of polyvinyl alcohol 1750, degree of
saponification 88 mol %) (Formation of composition for blue
pattern). C.I. Pigment Blue 60 1 pt. wt. 5 wt % aqueous solution of
polyvinyl alcohol 10 pts. wt. (average degree of polymerization of
polyvinyl alcohol 1750, degree of saponification 88 mol %)
[0702] Next, a red pattern forming region in the
photocatalyst-containing layer with the black matrix formed thereon
was irradiated with light at an intensity of 70 mW/cm.sup.2 for 50
sec from a mercury lamp (wavelength 365 nm) through a mask having
an opening pattern for a colored layer having a size of 150
.mu.m.times.300 .mu.m so that exposed areas had high critical
surface tension (not more than 10.degree. in terms of contact angle
with water) (corresponding to FIG. 17 (D)).
[0703] The composition for a red pattern was then blade coated onto
the whole area of the photocatalyst-containing layer. As a result,
the composition for a red pattern was repelled by unexposed areas
in the photocatalyst-containing layer and selectively coated only
onto exposed areas. The assembly was then dried at 60.degree. C.
for 3 min and exposed to light from a mercury lamp to cure the
composition for a red pattern, followed by heat treatment at
150.degree. C. for 30 min. Thus, a red pattern was formed
(corresponding to FIG. 17 (E)).
[0704] Similarly, a green pattern forming region in the
photocatalyst-containing layer was irradiated with light, and the
composition for a green pattern was selectively coated only onto
exposed areas, followed by curing treatment and heat treatment to
form a green pattern. Further, similarly, a blue pattern forming
region in the photocatalyst-containing layer was irradiated with
light, and the composition for a blue pattern was selectively
coated only onto exposed areas, followed by curing treatment and
heat treatment to form a blue pattern.
[0705] Subsequently, a two component mixing type thermosetting
agent (SS7265, manufactured by Japan Synthetic Rubber Co., Ltd.)
was spin coated as a protective layer onto the colored layer. The
coating was cured at 200.degree. C. for 30 min to form a protective
layer. Thus, a color filter of the present invention as shown in
FIG. 13 was produced (corresponding to FIG. 17 (F)).
Example B-2
Preparation of Composition for Photocatalyst-containing Layer
[0706] A composition for a photocatalyst-containing layer was
prepared according to the following formulation.
TABLE-US-00013 (Formulation of composition for
photocatalyst-containing layer) Photocatalyst-containing
formulation (STS-01, 1 pt. wt. manufactured by Ishihara Sangyo
Kaisha Ltd.) Reactive silicone (KM-768, manufactured by 0.76 pt.
wt. The Shin-Etsu Chemical Co., Ltd) Catalyst (CAT-PM6A:CAT-PM6B =
4:6, 0.02 pt. wt. manufactured by The Shin-Etsu Chemical Co., Ltd)
Water 1.34 pts. wt.
[0707] This composition for a photocatalyst-containing layer was
spin coated onto a transparent substrate of soda-lime glass. The
coating was heat treated at a temperature of 160.degree. C. for 1
min. Thus, a transparent photocatalyst-containing layer (thickness
0.5 .mu.m) with a photocatalyst being strongly fixed in an
organopolysiloxane was formed. The photocatalyst-containing layer
was pattern-wise exposed to light from a mercury lamp (wavelength
365 nm) at an intensity of 70 mW/cm.sup.2 through a mask for 100
sec. The contact angle of exposed areas and unexposed areas with
water was measured in the same manner as in Example B-1. As a
result, the contact angle of unexposed areas with water was
115.degree., while the contact angle of exposed areas with water
was not more than 10.degree.. This confirms that the exposed areas
function as high critical surface tension areas and a pattern can
be formed by utilizing a difference in wettability between the
exposed areas and the unexposed areas.
Formation of Black Matrix
[0708] A photocatalyst-containing layer was formed in the same
manner as described above. The photocatalyst-containing layer in
its black matrix forming region was irradiated with light from a
mercury lamp (wavelength 365 nm) at an intensity of 70 mW/cm.sup.2
for 100 sec. The black matrix composition was selectively coated
only onto the exposed areas, followed by heat treatment to form a
black matrix (corresponding to FIGS. 17 (A) to (C)).
Formation of Colored Layer
[0709] Pigment Red 168, Pigment Green 36, and Pigment Blue 60 were
provided as pigments. Coating liquids for respective color patterns
were prepared using these pigments according to the following
formulation.
TABLE-US-00014 (Formulation of compositions for color patterns)
Pigment 3 pts. wt. Nonionic surfactant (NIKKOL BO-10TX, 0.05 pt.
wt. manufactured by Nikko Chemicals Co., Ltd.) Polyvinyl alcohol
(Shin-Etsu Poval AT, 0.6 pt. wt. manufactured by The Shin-Etsu
Chemical Co., Ltd) Water 97 pts. wt.
[0710] Next, the whole area of the photocatalyst-containing layer
with the black matrix formed thereon was irradiated with light at
an intensity of 70 mW/cm.sup.2 for 100 sec from a mercury lamp
(wavelength 365 nm) so that exposed areas had high critical surface
tension (not more than 100 in terms of contact angle with
water).
[0711] Subsequently, the composition for a red pattern was dropped
as dots having a diameter of 120 .mu.m on the center portion of
each red pattern forming region surrounded by the black matrix
through a nozzle. Similarly, the composition for a green pattern
was dropped as dots having a diameter of 120 .mu.m on the center
portion of each green pattern forming region surrounded by the
black matrix through a nozzle. Further, the composition for a blue
pattern was dropped as dots having a diameter of 120 .mu.m on the
center portion of each blue pattern forming region surrounded by
the black matrix through a nozzle. The compositions for respective
color pattern, which had been dropped, were repelled by the black
matrix and homogeneously diffused in and selectively deposited onto
respective color pattern forming regions having high critical
surface tension surrounded by the black matrix. Thereafter, the
assembly was heat treated at 100.degree. C. for 45 min. Thus, a
colored layer comprising a red pattern, a green pattern, and a blue
pattern was formed.
[0712] A two component thermosetting agent (SS7265, manufactured by
Japan Synthetic Rubber Co., Ltd.) was then spin coated as a
protective layer onto the colored layer. The coating was cured at
200.degree. C. for 30 min to form a protective layer. Thus, a color
filter of the present invention having a construction as shown in
FIG. 13 was produced.
Example B-3
Formation of Photocatalyst-containing Layer
[0713] A composition for a photocatalyst-containing layer as
described in Example B-1 was spin coated onto a transparent
substrate of soda glass having a black matrix of a thin layer
pattern having an opening size of 90 .mu.m.times.300 .mu.m and a
line width of 30 .mu.m. The coated substrate was dried at a
temperature of 150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a transparent
photocatalyst-containing layer (thickness 0.5 .mu.m) with a
photocatalyst being strongly fixed in an organopolysiloxane was
formed (corresponding to FIG. 18 (A)).
Formation of Colored Layer
[0714] Next, the photocatalyst-containing layer was irradiated with
light at an intensity of 70 mW/cm.sup.2 for 50 sec from a mercury
lamp (wavelength 365 nm) through a mask for a red pattern so that
exposed areas had high critical surface tension (not more than
10.degree. in terms of contact angle with water (corresponding to
FIG. 18 (B)). Separately, 1 g of C.I. Pigment Red 168 was mixed
into 10 g of an aqueous solution prepared by diluting an aqueous
emulsion silicone (K-768, manufactured by The Shin-Etsu Chemical
Co., Ltd.) three times with water. The mixture was milled and
dispersed by means of a triple roll mill, centrifuged at 12,000
rpm, and then filtered through a 1-.mu.m glass filter. 0.1 g of a
curing catalyst (Catalyst PM-6A:Catalyst PM-6B=4; 6 (manufactured
by The Shin-Etsu Chemical Co., Ltd.)) was added to the aqueous
colored resin solution to prepare a coating liquid (a thermosetting
resin composition) for a red pattern.
[0715] Next, the composition for a red pattern was bar coated onto
the whole area of the photocatalyst-containing layer. As a result,
the composition for a red pattern was repelled by the
photocatalyst-containing layer in its unexposed areas and
selectively deposited only onto exposed areas. Thereafter, the
coating was cured at 160.degree. C. for 30 sec. Thus, a red pattern
was formed (corresponding to FIG. 18 (C)).
[0716] Next, the photocatalyst-containing layer with a red pattern
formed thereon was irradiated with light at an intensity of 70
mW/cm.sup.2 for 50 sec from a mercury lamp (wavelength 365 nm)
through a mask for a blue pattern so that exposed areas had high
critical surface tension (not more than 10.degree. in terms of
contact angle with water).
[0717] Separately, 1 g of C.I. Pigment Blue 60 was mixed into 10 g
of an aqueous solution prepared by diluting an aqueous emulsion
silicone (K-768, manufactured by The Shin-Etsu Chemical Co., Ltd.)
three times with water. A coating liquid (a thermosetting resin
composition) for a blue pattern was prepared in the same manner as
described above in connection with the coating liquid for a red
pattern.
[0718] Next, the composition for a blue pattern was bar coated onto
the whole area of the photocatalyst-containing layer. As a result,
the composition for a blue pattern was repelled by the red pattern
areas and the photocatalyst-containing layer in its unexposed areas
and selectively deposited only onto exposed areas. Thereafter, the
coating was cured at 160.degree. C. for 30 sec. Thus, a blue
pattern was formed.
[0719] Further, the photocatalyst-containing layer having thereon a
red pattern and a blue pattern was irradiated with light at an
intensity of 70 mW/cm.sup.2 for 50 sec from a mercury lamp
(wavelength 365 nm) through a mask for a green pattern so that
exposed areas had high critical surface tension (not more than
10.degree. in terms of contact angle with water).
[0720] Separately, 1 g of Lionol Green 2Y-301 (manufactured by Toyo
Ink Manufacturing Co., Ltd.) was mixed into 10 g of a 10 wt %
aqueous solution of polyvinyl alcohol (average degree of
polymerization 1750, degree of saponification 88 mol %). The
mixture was milled and dispersed by means of a triple roll mill,
centrifuged at 12,000 rpm, and then filtered through a 1-.mu.m
glass filter. 1% by weight of ammonium dichromate as a crosslinking
agent was added to the resultant aqueous colored resin solutions to
prepare a coating liquid (a photosensitive resin composition) for a
green pattern.
[0721] Next, the composition for a green pattern was bar coated
onto the whole area of the photocatalyst-containing layer. As a
result, the composition for a green pattern was repelled by the red
pattern areas, the blue pattern areas, and the
photocatalyst-containing layer in its unexposed areas and
selectively deposited only onto exposed areas. Thereafter, the
assembly was dried at 60.degree. C. for 3 min and then exposed to
light from a mercury lamp to cure the composition for a green
pattern and, at the same time, to bring the
photocatalyst-containing layer to a high critical surface tension
state. Subsequently, heat treatment was carried out at 150.degree.
C. for 30 min to form a green pattern.
[0722] Next, a two component thermosetting agent (SS7265,
manufactured by Japan Synthetic Rubber Co., Ltd.) was spin coated
as a protective layer onto the colored layer. The coating was cured
at 200.degree. C. for 30 min to form a protective layer. Thus, a
color filter of the present invention having a construction as
shown in FIG. 14 was produced.
Example B-4
Formation of Photocatalyst-containing Layer
[0723] A composition for a photocatalyst-containing layer as
described in Example B-1 was spin coated onto a transparent
substrate of soda glass having a black matrix of a thin layer
pattern of chromium having an opening size of 140 .mu.m.times.260
.mu.m and a line width of 30 .mu.m. The coated substrate was dried
at a temperature of 150.degree. C. for 10 min, permitting
hydrolysis and polycondensation to proceed. Thus, a transparent
photocatalyst-containing layer (thickness 0.5 .mu.m) with a
photocatalyst being strongly fixed in an organopolysiloxane was
formed (corresponding to FIG. 18 (A)).
Formation of Colored Layer
[0724] Next, a mask having a light shielding pattern (pattern pitch
155 .mu.m.times.275 .mu.m) with the line width (20 .mu.m) being
smaller than the line width (30 .mu.m) of the black matrix was
registered with the black matrix, and the photocatalyst-containing
layer was irradiated with light from a mercury lamp (wavelength 365
nm) through the mask at an intensity of 70 mW/cm.sup.2 for 50 sec
so that exposed areas had high critical surface tension (not more
than 10.degree. in terms of contact angle with water) (see FIG.
19).
[0725] Each of the exposed areas (high critical surface tension
areas) had a size of 150 .mu.m.times.270 .mu.m, and the unexposed
areas existed in a width of 20 .mu.m on the black matrix.
[0726] Pigment Red 168, Pigment Green 36, and Pigment Blue 60 were
then provided as pigments. Coating liquids for respective color
patterns were prepared using these pigments according to the
following formulation.
TABLE-US-00015 (Formulation of compositions for color patterns)
Pigment 3 pts. wt. Nonionic surfactant (NIKKOL BO-10TX, 0.05 pt.
wt. manufactured by Nikko Chemicals Co., Ltd.) Polyvinyl alcohol
(Shin-Etsu Poval AT, 0.6 pt. wt. manufactured by The Shin-Etsu
Chemical Co., Ltd) Water 97 pts. wt.
[0727] Subsequently, the composition for a red pattern was dropped
as dots having a diameter of 120 .mu.m on the center portion of
each red pattern forming region surrounded by the black matrix
through a nozzle. Similarly, the composition for a green pattern
was dropped as dots having a diameter of 120 .mu.m on the center
portion of each green pattern forming region surrounded by the
black matrix through a nozzle. Further, the composition for a blue
pattern was dropped as dots having a diameter of 120 .mu.m on the
center portion of each blue pattern forming region surrounded by
the black matrix through a nozzle. The compositions for respective
color patterns, which had been dropped, were repelled by the
unexposed areas on the black matrix and homogeneously diffused in
and selectively deposited onto respective color pattern forming
regions having high critical surface tension surrounded by the
black matrix. Thereafter, the assembly was heat treated at
100.degree. C. for 45 min. Thus, a colored layer comprising a red
pattern, a green pattern, and a blue pattern was formed.
[0728] A two component thermosetting agent (SS7265, manufactured by
Japan Synthetic Rubber Co., Ltd.) was then spin coated as a
protective layer onto the colored layer. The coating was cured at
200.degree. C. for 30 min to form a protective layer. Thus, a color
filter of the present invention having a construction as shown in
FIG. 14 was produced.
Example B-5
Formation of Photocatalyst-containing Layer
[0729] A composition for a photocatalyst-containing layer as
described in Example B-1 was spin coated onto a transparent
substrate of soda glass having a black matrix of a thin layer
pattern having an opening size of 90 .mu.m.times.300 .mu.m and a
line width of 30 .mu.m. The coated substrate was dried at a
temperature of 150.degree. C. for 10 min, permitting hydrolysis and
polycondensation to proceed. Thus, a transparent
photocatalyst-containing layer (thickness 0.5 .mu.m) with a
photocatalyst being strongly fixed in an organopolysiloxane was
formed.
Formation of Colored Layer
[0730] Pigment Red 168, Pigment Green 36, and Pigment Blue 60 were
first provided as pigments. Each mixture having the following
composition was milled and dispersed by means of a triple roll
mill, centrifuged at 12,000 rpm, and then filtered through a
1-.mu.m glass filter. 1% by weight of ammonium dichromate as a
crosslinking agent was added to the resultant aqueous colored resin
solutions to prepare a coating liquid for a red pattern, a coating
liquid for a green pattern, and a coating liquid for a blue pattern
(photosensitive resin compositions).
TABLE-US-00016 (Fomulation of mixtures) Pigment 1 pt. wt. 10 wt %
aqueous solution of polyvinyl alcohol 10 pts. wt. (average degree
of polymerization of polyvinyl alcohol 1750, degree of
saponification 88 mol %)
[0731] A photocatalyst-containing layer was formed onto the
photocatalyst-containing layer with a black matrix formed thereon
in the same manner as in Example B-1. The photocatalyst-containing
layer was irradiated with light from a mercury lamp (wavelength 365
nm) at an intensity of 70 mW/cm.sup.2 for 50 sec through a mask for
a red pattern to bring exposed areas to a high critical surface
tension state (not more than 10 in terms of contact angle with
water) (corresponding to FIG. 20 (A)).
[0732] Next, the composition for a red pattern was bar coated onto
the whole area of the photocatalyst-containing layer. As a result,
the composition for a red pattern was repelled by the
photocatalyst-containing layer in its unexposed areas and
selectively deposited only onto exposed areas. Thereafter, the
assembly was dried at 60.degree. C. for 3 min and then exposed to
light from a mercury lamp to cure the composition for a red
pattern. Subsequently, heat treatment was carried out at
150.degree. C. for 30 min to form a red pattern (corresponding to
FIG. 20 (B)).
[0733] Similarly, a photocatalyst-containing layer was formed onto
the photocatalyst-containing layer with a red pattern formed
thereon in the same manner as in Example B-1. The
photocatalyst-containing layer in its green pattern forming region
was irradiated with light (corresponding to FIG. 20 (C)), and the
composition for a green pattern was coated and selectively
deposited only onto exposed areas, followed by curing treatment and
heat treatment to form a green pattern (corresponding to FIG. 20
(D)).
[0734] Further, a photocatalyst-containing layer was formed onto
the photocatalyst-containing layer with a green pattern formed
thereon in the same manner as in Example B-1. The
photocatalyst-containing layer in its blue pattern forming region
was irradiated with light, and the composition for a blue pattern
was coated and selectively deposited only onto exposed areas,
followed by curing treatment and heat treatment to form a blue
pattern.
[0735] Next, a two component thermosetting agent (SS7265,
manufactured by Japan Synthetic Rubber Co., Ltd.) was spin coated
as a protective layer onto the colored layer. The coating was cured
at 200.degree. C. for 30 min to form a protective layer. Thus, a
color filter of the present invention having a construction as
shown in FIG. 15 was produced (corresponding to FIG. 20 (E)).
Example B-6
Formation of Black Matrix
[0736] A photocatalyst-containing layer was formed in the same
manner as in Example B-1. The photocatalyst-containing layer in its
black matrix forming region was irradiated with light. The black
matrix composition was coated and selectively deposited onto the
exposed areas, followed by heat treatment to form a black matrix
(corresponding to FIGS. 21 (A) to (B)).
Formation of Colored Layer
[0737] Pigment Red 168, Pigment Green 36, and Pigment Blue 60 were
first provided as pigments. Each mixture having the following
composition was milled and dispersed by means of a triple roll
mill, centrifuged at 12,000 rpm, and then filtered through a
1-.mu.m glass filter. 1% by weight of ammonium dichromate as a
crosslinking agent was added to the resultant aqueous colored resin
solutions to prepare a coating liquid for a red pattern, a coating
liquid for a green pattern, and a coating liquid for a blue pattern
(photosensitive resin compositions).
TABLE-US-00017 (Formulation of mixtures) Pigment 1 pt. wt. 10 wt %
aqueous solution of polyvinyl alcohol 10 pts. wt. (average degree
of polymerization of polyvinyl alcohol 1750, degree of
saponification 88 mol %)
[0738] A photocatalyst-containing layer was then formed onto the
photocatalyst-containing layer with a black matrix formed thereon
in the same manner as in Example B-1. The photocatalyst-containing
layer was irradiated with light from a mercury lamp (wavelength 365
nm) at an intensity of 70 mW/cm.sup.2 for 50 sec through a mask for
a red pattern to bring exposed areas to a high critical surface
tension state (not more than 10.degree. in terms of contact angle
with water) (corresponding to FIG. 21 (C)).
[0739] Next, the composition for a red pattern was bar coated onto
the whole area of the photocatalyst-containing layer. As a result,
the composition for a red pattern was repelled by the
photocatalyst-containing layer in its unexposed areas and
selectively deposited only onto exposed areas. Thereafter, the
assembly was dried at 60.degree. C. for 3 min and then exposed to
light from a mercury lamp to cure the composition for a red
pattern. Subsequently, heat treatment was carried out at
150.degree. C. for 30 min to form a red pattern (corresponding to
FIG. 21 (D)).
[0740] Similarly, a photocatalyst-containing layer was formed onto
the photocatalyst-containing layer with a red pattern formed
thereon in the same manner as in Example B-1. The
photocatalyst-containing layer in its green pattern forming region
was irradiated with light, and the composition for a green pattern
was coated and selectively deposited only onto exposed areas,
followed by curing treatment and heat treatment to form a green
pattern. Further, a photocatalyst-containing layer was formed onto
the photocatalyst-containing layer with a green pattern formed
thereon in the same manner as in Example B-1. The
photocatalyst-containing layer in its blue pattern forming region
was irradiated with light, and the composition for a blue pattern
was coated and selectively deposited only onto exposed areas,
followed by curing treatment and heat treatment to form a blue
pattern.
[0741] Next, a two component thermosetting agent (SS7265,
manufactured by Japan Synthetic Rubber Co., Ltd.) was spin coated
as a protective layer onto the colored layer. The coating was cured
at 200.degree. C. for 30 min to form a protective layer. Thus, a
color filter of the present invention having a construction as
shown in FIG. 16 was produced (corresponding to FIG. 21 (E)).
Example B-7
Formation of Black Matrix
[0742] A photocatalyst-containing layer was first formed in the
same manner as in Example B-1. The photocatalyst-containing layer
in its black matrix forming region was irradiated with light. The
black matrix composition was coated and selectively deposited onto
the exposed areas, followed by heat treatment to form a black
matrix.
Formation of Colored Layer
[0743] A photocatalyst-containing layer was formed onto the
photocatalyst-containing layer with a black matrix formed thereon
in the same manner as in Example B-1. The photocatalyst-containing
layer thus formed was then irradiated with light from a mercury
lamp (wavelength 365 nm) at an intensity of 70 mW/cm.sup.2 for 90
sec through a mask having an opening portion (rectangular opening
having a size of 23 .mu.m.times.12 .mu.m) to bring exposed areas to
a high critical surface tension state (not more than 10.degree. in
terms of contact angle with water).
[0744] A thin layer of a perylene pigment having a chemical
structure represented by formula B-2 was vacuum deposited onto the
photocatalyst-containing layer under conditions of degree of vacuum
1.times.10.sup.-5 Torr and deposition rate 10 .ANG./sec to form a
thin layer of a red pigment on the whole area of the
photocatalyst-containing layer.
[0745] The surface of the thin layer of a red pigment was washed
with acetone. As a result, the thin layer of the red pigment was
separated only from the unexposed areas due to the difference
between the adhesion of the red pigment to the exposed areas and
the adhesion of the red pigment to the unexposed areas in the
photocatalyst-containing layer. Thus, a rectangular (23
.mu.m.times.12 .mu.m) red pattern constituted by a thin layer
(layer thickness 0.4 .mu.m) of a red pigment could be formed on the
exposed areas.
##STR00009##
Example B-8
Formation of Black Matrix
[0746] A photocatalyst-containing layer was first formed in the
same manner as in Example B-1. The photocatalyst-containing layer
in its black matrix forming region was irradiated with light. The
black matrix composition was coated and selectively deposited onto
the exposed areas, followed by heat treatment to form a black
matrix.
Formation of Colored Layer
[0747] A photocatalyst-containing layer was formed onto the
photocatalyst-containing layer with a black matrix formed thereon
in the same manner as in Example B-1. The photocatalyst-containing
layer thus formed was then irradiated with light from a mercury
lamp (wavelength 365 nm) at an intensity of 70 mW/cm.sup.2 for 90
sec through a mask having an opening portion (rectangular opening
having a size of 23 .mu.m.times.12 .mu.m) to bring exposed areas to
a high critical surface tension state (not more than 10.degree. in
terms of contact angle with water).
[0748] A thin layer of a perylene pigment having a chemical
structure represented by formula B-3 was vacuum deposited onto the
photocatalyst-containing layer under conditions of degree of vacuum
1.times.10.sup.-5 Torr and deposition rate 10 .ANG./sec to form a
thin layer of a blue pigment on the whole area of the
photocatalyst-containing layer.
[0749] The surface of the thin layer of a blue pigment was washed
with methanol. As a result, the thin layer of the blue pigment was
separated only from the unexposed areas due to the difference
between the adhesion of the blue pigment to the exposed areas and
the adhesion of the blue pigment to the unexposed areas in the
photocatalyst-containing layer. Thus, a rectangular (23
.mu.m.times.12 .mu.m) blue pattern constituted by a thin layer
(layer thickness 0.4 .mu.m) of a blue pigment could be formed on
the exposed areas.
##STR00010##
[0750] The following examples demonstrate use of an organic polymer
resin layer as the wettability-variable component layer.
Example B-9
Formation of Organic Polymer-containing Layer
[0751] Polycarbonate (Iupilon Z400, manufactured by Mitsubishi Gas
Chemical Co., Ltd.) was dissolved in a 3:2 mixed liquid of
dichloromethane and 1,1,2-trichloroethane to prepare a
polycarbonate solution having a solid content of 10% by weight.
[0752] The polycarbonate solution was then coated onto a
transparent substrate provided with a black matrix of a thin layer
pattern of chromium having an opening size of 140 .mu.m.times.260
.mu.m and a line width of 30 .mu.m to a thickness of 100 .mu.m. The
coating was leveled for 15 min and dried at 80.degree. C. for 120
min to form an organic polymer resin layer as a
wettability-variable component layer. The contact angle of the
organic polymer resin layer with water was measured in the same
manner as in Example B-1 and found to be 85.degree. C.
Formation of Colored Layer
[0753] Next, a photomask having a light shielding pattern (pattern
pitch 155 .mu.m.times.275 .mu.m) with the line width (20 .mu.m)
being smaller than the line width (30 .mu.m) of the black matrix
was registered with the black matrix through an organic polymer
resin layer, and the organic polymer resin layer was exposed to
light from an excimer lamp (an excimer lamp 172, exposure
wavelength 172 mm, manufactured by Heleus) at an output of 90 W for
10 sec through this photomask to create surface roughening. Thus,
exposed areas were brought to a high critical surface tension (not
more than 20.degree. in terms of contact angle with water).
[0754] Each of the exposed areas (high critical surface tension
areas) had a size of 150 .mu.m.times.270 .mu.m, and the unexposed
areas existed in a width of 20 .mu.m on the black matrix.
[0755] Pigment Red 168, Pigment Green 36, and Pigment Blue 60 were
then provided as pigments. Coating liquids for respective color
patterns were prepared using these pigments according to the same
formulation as used in Example B-4.
[0756] Subsequently, the composition for a red pattern was dropped
as dots having a diameter of 90 .mu.m on the center portion of each
red pattern forming region surrounded by the black matrix through a
nozzle. Similarly, the composition for a green pattern was dropped
as dots having a diameter of 90 .mu.m on the center portion of each
green pattern forming region surrounded by the black matrix through
a nozzle. Further, the composition for a blue pattern was dropped
as dots having a diameter of 90 .mu.m on the center portion of each
blue pattern forming region surrounded by the black matrix through
a nozzle. The compositions for respective color patterns, which had
been dropped, were repelled by unexposed areas on the black matrix
and homogeneously diffused in and selectively deposited in
respective color pattern forming regions having high critical
surface tension surrounded by the black matrix. Thereafter, the
assembly was heat treated at 100.degree. C. for 45 min. Thus, a
colored layer comprising a red pattern, a green pattern, and a blue
pattern was formed.
[0757] A two component thermosetting agent (SS7265, manufactured by
Japan Synthetic Rubber Co., Ltd.) was then spin coated as a
protective layer onto the colored layer. The coating was cured at
200.degree. C. for 30 min to form a protective layer. Thus, a color
filter of the present invention having a construction as shown in
FIG. 14 was produced.
(Evaluation)
[0758] The color filters prepared in Examples B-1 to B-9 were
observed under an optical microscope. As a result, the black matrix
and the colored layer were free from discoloration, color mixing,
dropouts, and uneven color and other defects.
[0759] As is apparent from the foregoing detailed description,
according to the second invention B, the wettability by the
composition for a light shielding layer and the composition for a
colored layer is higher in areas having specific wettability, and,
upon supply of the composition for a light shielding layer and the
composition for a colored layer, the composition for a light
shielding layer and the composition for a colored layer are
selectively and surely deposited only onto the areas having
specific wettability, while they are repelled by the other areas.
This makes it possible to form a light shielding layer and a
colored layer with high accuracy, which in turn can realize the
provision of high resolution color filters. Further, the coating
compositions are selectively deposited only onto areas where the
light shielding layer and the colored layer are to be formed.
Therefore, the materials can be efficiently used, and the step of
development and washing and the step of treating waste water are
unnecessary. This simplifies the process. Further, using a
photocatalyst-containing layer or an organic polymer resin layer as
the wettability-variable component layer for specific wettability
areas enhances the critical surface tension of exposed areas
through photocatalytic action to bring the exposed areas to a high
critical surface tension state (to form areas having specific
wettability), or roughens the surface through a reduction in
molecular weight as a result of cleavage of a polymer chain to
bring the exposed areas to a high critical surface tension (to form
areas having specific wettability), while the low critical surface
tension of the unexposed areas remained unchanged. Upon supply of
the composition for a light shielding layer and the composition for
a colored layer onto the photocatalyst-containing layer or the
organic polymer resin layer, the composition for a light shielding
layer and the composition for a colored layer are repelled by the
unexposed areas and are selectively and surely deposited only onto
the exposed areas having high wettability (high critical surface
tension areas).
Example C-1
(Photocatalyst-containing Layer) (For Waterless Printing)
[0760] 3 g of isopropyl alcohol, 0.4 g of an organosilane (TSL8113,
manufactured by Toshiba Silicone Co., Ltd.), 0.3 g of a
fluoroalkylsilane (MF-160E, manufactured by Tohchem Products
Corporation), and 2 g of an inorganic coating composition for a
photocatalyst (ST-K01, manufactured by Ishihara Sangyo Kaisha
Ltd.). This composition for a photocatalyst-containing layer was
spin coated onto a transparent substrate of quartz glass. The
coating was dried at a temperature of 150.degree. C. for 10 min,
permitting hydrolysis and polycondensation to proceed. Thus, a
transparent photocatalyst-containing layer (thickness 0.2 .mu.M)
with a photocatalyst being strongly fixed in an organopolysiloxane
was formed. The photocatalyst-containing layer was pattern-wise
exposed to light from a mercury lamp at an intensity of 70
mW/cm.sup.2 through a mask for 50 sec. The contact angle of exposed
areas and unexposed areas with water was measured with a contact
angle goniometer (Model CA-Z, manufactured by Kyowa Interface
Science Co., Ltd.). As a result, the contact angle of the unexposed
areas with water was 142.degree., while the contact angle of the
exposed areas with water was not more than 10.degree. Thus, a
pattern was formed by utilizing a difference in wettability between
the exposed areas and the unexposed areas.
Example C-2
(Microlens) (Waterless) (Coating)
[0761] The photocatalyst-containing layer described in Example C-1
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a negative-working photomask having
a circular pattern with several openings having a diameter of 50
.mu.m being arranged at intervals of 2 .mu.m to prepare a
transparent substrate having thereon a circular pattern having high
wettability. 1000 g of a water-soluble UV curable resin (AQ-9,
ester acrylate resin, manufactured by Arakawa Chemical Industries,
Ltd.), 50 g of a curing initiator (Irgacure 1173, manufactured by
Ciba Specialty Chemicals, K.K.), and 125 g of distilled water
(manufactured by Junsei Chemical Corporation) were mixed together,
and the mixture was stirred for 3 min. The mixed liquid was coated
by bead coating (slide coating) onto the transparent substrate
having thereon a circular pattern utilizing a difference in
wettability to a thickness of 12 .mu.m. As a result, the mixed
liquid was selectively deposited onto the exposed areas (circular
pattern areas). The assembly was then exposed at an intensity of 70
mW/cm.sup.2 from a mercury lamp for 5 sec to prepare an array of
microlenses having a diameter of 50 .mu.m and a focal length of 1
mm.
Example C-3
(Microlens) (Waterless) (Ejection)
[0762] The photocatalyst-containing layer described in Example C-1
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a negative-working photomask having
a circular pattern with a plurality of openings having a diameter
of 200 .mu.m being arranged at intervals of 100 .mu.m. Thus, a
transparent substrate having thereon a circular pattern having high
wettability was prepared.
[0763] 1000 g of a water-soluble UV curable resin (AQ-11, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
50 g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), and 25 g of distilled water
(manufactured by Junsei Chemical Corporation) were mixed together,
and the mixture was stirred for 3 min. The mixed liquid was ejected
in an amount of 0.0001 ml on the center of the circular pattern
portion on the transparent substrate having a circular pattern
utilizing a difference in wettability by a liquid precision
constant rate ejection apparatus (Dispenser 1500XL-15, manufactured
by EFD). As a result, the ejected liquid was spread only onto the
circular pattern portion without spreading onto the other areas.
The assembly was then exposed at an intensity of 70 mW/cm.sup.2
from a mercury lamp for 10 sec to prepare an array of microlenses
having a diameter of 200 .mu.m and a focal length of 500 .mu.m.
Example C-4
(Photocatalyst-containing Layer) (Dampening Water)
[0764] 3 g of isopropyl alcohol, 4.2 g of an organosilane (TSL8113,
manufactured by Toshiba Silicone Co., Ltd.), and 0.2 g of a
titanium oxide powder (ST-01, average particle diameter 7 nm,
manufactured by Ishihara Sangyo Kaisha Ltd.) were mixed together.
The mixture was stirred for 20 min while maintaining the
temperature at 100.degree. C. The resultant dispersion was spin
coated onto a transparent substrate of quartz-glass. The coating
was dried at a temperature of 150.degree. C. for 10 min, permitting
hydrolysis and polycondensation to proceed. Thus, a 0.2 .mu.m-thick
layer was formed. The layer was irradiated with ultraviolet light
from a higher pressure mercury lamp at an intensity of 70
mW/cm.sup.2 for 50 sec. The contact angle of the sample with water
and n-octane was measured with a contact angle goniometer (Model
CA-Z, manufactured by Kyowa Interface Science Co., Ltd.). As a
result, before the irradiation, the contact angle was 72.degree.
for water and not more than 5.degree. for n-octane, while after the
irradiation, the contact angle was 0.degree. for water and not more
than 5.degree. for n-octane.
Example C-5
(Microlens) (Dampening Water) (Ejection)
[0765] The photocatalyst-containing layer described in Example C-4
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a positive-working photomask having
a square pattern with a plurality of openings having a size of 200
.mu.m.times.200 .mu.m being arranged at intervals of 100 .mu.m.
Thus, a transparent substrate having thereon a square pattern
utilizing a difference in wettability was prepared. A solution
(dampening water) prepared by mixing 10 g of a clean etch liquid
manufactured by Nikken Chemicals Co., Ltd. and 190 g of distilled
water (manufactured by Junsei Chemical Corporation) together was
spin coated onto the transparent substrate having a square pattern
utilizing a difference in wettability. As a result, the mixed
liquid was coated only onto exposed areas (areas other than the
square pattern).
[0766] 1000 g of UV curable resin (Beam Set 267, acrylic resin,
manufactured by Arakawa Chemical Industries, Ltd.) and 50 g of a
curing initiator (Irgacure 184, manufactured by Ciba Specialty
Chemicals, K.K.) were mixed together, and the mixture was stirred
for 3 min. The mixed liquid was ejected in an amount of 0.0001 ml
on the center of the square pattern portion not coated with the
clean etch liquid in the transparent substrate by a liquid
precision constant rate ejection apparatus (Dispenser 1500XL-15,
manufactured by EFD). As a result, the ejected liquid was spread
only onto the square pattern portion without spreading onto the
other areas. The assembly was then exposed at an intensity of 70
mW/cm.sup.2 from a mercury lamp for 10 sec to prepare an array of
microlenses having a square bottom of 200 .mu.m.times.200 .mu.m and
a focal length of 500 .mu.m.
Example C-6
(Colored microlens) (Waterless) (Ejection)
[0767] The photocatalyst-containing layer described in Example C-1
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a negative-working photomask having
a circular pattern with a plurality of openings having a diameter
of 200 .mu.m being arranged at intervals of 100 .mu.m. Thus, a
transparent substrate having thereon a circular pattern having high
wettability was prepared.
[0768] 10 g of a water-soluble UV curable resin (AQ-11, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a red dye (Rose Bengal, manufactured by Tokyo Chemical Industry
Co., Ltd.) were mixed together. The mixture was stirred for 3 min
to prepare a composition for a red lens.
[0769] 10 g of a water-soluble UV curable resin (AQ-11, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a green dye (Brilliant Green, manufactured by Tokyo Chemical
Industry Co., Ltd.) were mixed together. The mixture was stirred
for 3 min to prepare a composition for a green lens.
[0770] 10 g of a water-soluble UV curable resin (AQ-11, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a blue dye (Victoria Blue, manufactured by Tokyo Chemical Industry
Co., Ltd.) were mixed together. The mixture was stirred for 3 min
to prepare a composition for a blue lens.
[0771] The compositions for lenses were ejected in an amount of
0.0001 ml on the center of the circular pattern portion, specified
for red, green, and blue, on the transparent substrate having a
circular pattern utilizing a difference in wettability by a liquid
precision constant rate ejection apparatus (Dispenser 1500XL-15,
manufactured by EED). As a result, the ejected liquid was spread
only onto the circular pattern portion without spreading onto the
other areas. The assembly was then exposed at an intensity of 70
mW/cm.sup.2 from a mercury lamp for 10 sec to prepare an array of
colored microlenses having a diameter of 200 .mu.m and a focal
length of 500 .mu.m.
Example C-7
(Colored microlens) (Waterless) (Coating)
[0772] The photocatalyst-containing layer described in Example C-1
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a negative-working photomask having
a circular pattern with a plurality of openings having a diameter
of 200 .mu.m being arranged at intervals of 100 .mu.m in the
longitudinal direction and at intervals of 700 .mu.m in the lateral
direction. Thus, a transparent substrate having thereon a circular
pattern having high wettability was prepared.
[0773] 10 g of a water-soluble UV curable resin (AQ-9, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 1173, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a red dye (Rose Bengal, manufactured by Tokyo Chemical Industry
Co., Ltd.) were mixed together. The mixture was stirred for 3 min
to prepare a composition for a red lens.
[0774] 10 g of a water-soluble UV curable resin (AQ-9, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 1173, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a green dye (Brilliant Green, manufactured by Tokyo Chemical
Industry Co., Ltd.) were mixed together. The mixture was stirred
for 3 min to prepare a composition for a green lens.
[0775] 10 g of a water-soluble UV curable resin (AQ-9, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
0.5 g of a curing initiator (Irgacure 1173, manufactured by Ciba
Specialty Chemicals, K.K.), 1.25 g of distilled water, and 0.5 g of
a blue dye (Victoria Blue, manufactured by Tokyo Chemical Industry
Co., Ltd.) were mixed together. The mixture was stirred for 3 min
to prepare a composition for a blue lens.
[0776] The composition for a red lens was dip coated onto a
transparent substrate having thereon a circular pattern utilizing a
difference in wettability to a thickness of 12 .mu.m. As a result,
the mixed liquid was deposited only onto the exposed areas
(circular pattern areas). The assembly was exposed to light from a
mercury lamp at an intensity of 70 mW/cm.sup.2 for 10 sec to cure
the coating.
[0777] A photocatalyst-containing layer was formed on the substrate
having thereon a red lens in the same manner as described above. A
circular pattern having high wettability was formed while leaving a
space of 100 .mu.m from the longitudinal column of the red lens in
the same manner as described above. A green lens was formed in the
same manner as described above in connection with the formation of
the red lens, except that the composition for a green lens was
used.
[0778] The above procedure was repeated, except that a composition
for a blue lens was used. As a result, a blue lens was formed
between the longitudinal columns of red and green while leaving a
space of 100 .mu.m from the longitudinal columns of red and green.
Thus, an array of color microlenses having a diameter of 200 .mu.m
and a focal length of 1 mm.
Example C-8
(Light Shielding Layer) (Waterless) (Coating)
[0779] The photocatalyst-containing layer described in Example C-1
was formed on the backside of the quartz glass as the substrate for
an array of microlenses having a diameter of 100 .mu.m and arranged
at intervals of 10 .mu.m. Next, a photomask with openings having a
diameter of 10 .mu.m and arranged at intervals of 100 .mu.m was
registered with the lenses, followed by pattern-wise exposure to
light from a mercury lamp.
[0780] 4 g of carbon black (#950, Mitsubishi Chemical Corporation),
0.7 g of polyvinyl alcohol (Gosenol AH-26, Nippon Synthetic
Chemical Industry Co., Ltd.), and 95.3 g of ion-exchanged water
were mixed together while heating at 90.degree. C. to prepare a
solution which was then centrifuged at 12000 rpm and filtered
through a 1-.mu.m glass filter to prepare a composition for a light
shielding layer. The composition for a light shielding layer was
blade coated onto the whole area of the exposed
photocatalyst-containing layer. As a result, the composition was
repelled by unexposed areas and selectively deposited only onto
exposed areas. The coating was then heated at 150.degree. C. for 30
min to form a light shielding layer.
Example C-9
(Light Shielding Layer) (Waterless) (Ejection)
[0781] The photocatalyst-containing layer described in Example C-1
was formed on the backside of the quartz glass as the substrate for
an array of microlenses having a diameter of 700 .mu.m and arranged
at intervals of 10 .mu.m. Next, a photomask with openings having a
diameter of 10 .mu.m and arranged at intervals of 700 .mu.m was
registered with the lenses, followed by pattern-wise exposure to
light from a mercury lamp.
[0782] Next, the composition for a light shielding layer described
in Example C-8 was ejected by means of a dispenser (manufactured by
EFD) onto the exposed areas to deposit the composition for a light
shielding layer only onto exposed areas. The assembly was then
heated at 150.degree. C. for 30 min to form a light shielding
layer.
Example C-10
(Light Shielding Layer) (Dampening water) (Coating)
[0783] The photocatalyst-containing layer described in Example C-4
was formed on the backside of the quartz glass as the substrate for
an array of microlenses having a diameter of 100 .mu.m and arranged
at intervals of 10 .mu.m. Next, a photomask with light shielding
areas having a diameter of 10 .mu.m and arranged at intervals of
100 .mu.m was registered with the lenses, followed by pattern-wise
exposure to light from a mercury lamp.
[0784] Dampening water (a liquid prepared by diluting a clean etch
liquid 20 times with water, manufactured by Nikken Chemicals Co.,
Ltd.) was blade coated onto the whole area. As a result, the
dampening water selectively wet only exposed areas.
[0785] A printing ink (ACROS(EIKUROSU) Black, manufactured by The
Inctec Inc.) was roll coated at 30 rpm onto the whole area. As a
result, the ink was selectively deposited only onto unexposed
areas. The coating was heated at 100.degree. C. for 3 min to remove
the dampening water. Thus, a light shielding layer was formed.
Example C-11
(Light Shielding Layer) (Dampening Water) (Ejection)
[0786] The photocatalyst-containing layer described in Example C-4
was formed on the backside of the quartz glass as the substrate for
an array of microlenses having a diameter of 700 .mu.m and arranged
at intervals of 10 .mu.m. Next, a photomask with light shielding
areas having a diameter of 10 .mu.m and arranged at intervals of
700 .mu.m was registered with the lenses, followed by pattern-wise
exposure to light from a mercury lamp.
[0787] Dampening water (a liquid prepared by diluting a clean etch
liquid 20 times with water, manufactured by Nikken Chemicals Co.,
Ltd.) was blade coated onto the whole area. As a result, the
dampening water selectively wet only exposed areas.
[0788] A solution prepared by diluting a printing ink (ACROS
(EIKUROSU) Black, manufactured by The Inctec Inc.) three times with
n-hexadecane was ejected by means of a dispenser (manufactured by
EFD) onto unexposed areas to deposit the printing ink only onto the
unexposed areas. The assembly was then heated at 100.degree. C. for
30 min to remove the dampening water. Thus, a light shielding layer
was formed.
Example C-12
(Microlens) (Ejection) (Variation in Focal Length by Varying Amount
of Ejection: Comparative Example)
[0789] The photocatalyst-containing layer described in Example C-1
was spin coated onto a transparent substrate of quartz glass. The
coating was exposed at an intensity of 70 mW/cm.sup.2 from a
mercury lamp for 90 sec through a mask having a circular pattern
with the diameter of the opening being 9 mm. Thus, a transparent
substrate having thereon a circular pattern having high wettability
was prepared.
[0790] 1000 g of a water-soluble UV curable resin (AQ-7, ester
acrylate resin, manufactured by Arakawa Chemical Industries, Ltd.),
50 g of a curing initiator (Irgacure 184, manufactured by Ciba
Specialty Chemicals, K.K.), and 25 g of distilled water
(manufactured by Junsei Chemical Corporation) were mixed together.
The mixture was stirred for 3 min. The mixed liquid was ejected in
an amount of 15 to 55 .mu.L through a microsyringe onto the center
of the circular pattern portion on the transparent substrate having
thereon the circular pattern utilizing a difference in wettability.
As a result, the ejected liquid was spread only onto the circular
pattern portion and was not spread onto the other areas. The larger
the amount of the liquid dropped, the larger the contact angle with
the substrate. The assembly was exposed to light from a mercury
lamp at an intensity of 70 mW/cm.sup.2 for 10 sec to cure the
coating. Thus, lenses having a diameter of 9 mm and a focal length
of 27 to 90 mm could be designed and prepared by varying the amount
of the resin mixed liquid ejected.
[0791] For comparison, the resin mixed liquid was ejected in an
amount of 15 to 55 .mu.L onto a transparent substrate of quartz
glass not having a photocatalyst-containing layer (a substrate not
having a wettable pattern). In this case, ejection of the liquid in
a larger amount resulted in wetting in a larger area and unstable
shape in wetted area, that is, various shapes in wetted area.
Further, the contact angle of the liquid with the substrate
remained unchanged when the amount of the liquid ejected was
increased. The assembly was exposed to light from a mercury lamp at
an intensity of 70 mW/cm.sup.2 for 10 sec. The lenses thus obtained
had uncontrolled shape, diameter, and focal length. The contact
angle of the liquid with the substrate and the diameter and focal
length of the resultant lenses as a function of the amount of the
resin solution (composition for a lens) ejected are shown in the
following table.
TABLE-US-00018 Substrate with a wettable pattern formed thereon
Among of resin mixed Contact angle of Radius Focal length liquid
dropped liquid with substrate of lens of lens (.mu.L) (.degree.)
(mm) (mm) 15.0 12.4 9.0 90.4 20.0 16.3 9.0 52.0 30.0 19.5 9.0 46.3
40.0 22.6 9.0 40.3 50.0 33.4 9.0 31.2 55.0 38.4 9.0 27.8
TABLE-US-00019 Substrate with a wettable pattern not formed thereon
Among of resin Contact angle of mixed liquid liquid with Radius
Focal length of dropped substrate of lens lens (.mu.L) (.degree.)
(mm) (mm) 15.0 18.9 8.0 70.0 20.0 22.6 7.0 68.3 30.0 18.4 9.0 70.5
40.0 24.1 10.0 66.5 50.0 22.6 11.0 68.0 55.0 22.6 12.0 68.0
[0792] According to the third invention C, there is provided a
process for simply producing a lens that, particularly in the
production of microlenses and an array of microlenses, can provide
high positional accuracy and shape accuracy and can produce
microlenses, and facilitates the regulation of the local length.
Further, a simple process for forming a light shielding layer of
lenses can be also provided.
Example D-1
[0793] 3 g of isopropyl alcohol, 0.4 g of an organosilane (TSL8113,
manufactured by Toshiba Silicone Co., Ltd.), 0.15 g of a
fluoroalkylsilane (MF-160E, manufactured by Tohchem Products
Corporation), and 2 g of a titanium oxide coating composition for a
photocatalyst (ST-K01, manufactured by Ishihara Sangyo Kaisha Ltd.)
were mixed together. The resultant dispersion was stirred for 20
min while maintaining the temperature at 100.degree. C. to prepare
a composition for a photocatalyst-containing layer. The composition
was spin coated onto a 0.15 mm-thick polyester film. The coated
polyester was dried at 130.degree. C. for 10 min, permitting
hydrolysis and polycondensation to proceed. Thus, a
photocatalyst-containing layer with a photocatalyst being strongly
fixed in an organopolysiloxane was obtained.
[0794] The photocatalyst layer was exposed to light from a mercury
lamp (HI-40N, manufactured by Japan Storage Battery Co., Ltd.) at
an intensity of 70 mW/cm.sup.2 (365 nm) for 50 sec through a
gradation negative-working mask having halftone dots of 2 to 98%
with 175 lines/in.
[0795] After the exposure, the contact angle of the
photocatalyst-containing layer with water was not more than
5.degree. for exposed areas and 107.degree. for unexposed
areas.
[0796] Next, the following silicone rubber composition was roll
coated at 400 m/min onto the exposed photocatalyst-containing
layer.
TABLE-US-00020 (1) Polydimethylsiloxane having silanol on 86 g its
both ends (number average molecular weight 100,000) (2)
Ethyltriacetoxysilane 13.9 g (3) Dibutyltin diacetate 0.1 g (4)
Toluene 300 g
[0797] As a result, the silicone rubber composition could be coated
only onto the photoreceptive areas, that is, the wettability-varied
areas. The assembly was dried at 120.degree. C. for 2 min to form a
pattern of a 1.5 .mu.m-thick silicone rubber layer. Next, under the
same conditions, the whole area exposure was carried out using a
mercury lamp to vary the wettability of the areas not provided with
the silicone rubber layer. The printing plate thus obtained was
mounted on an offset printing machine (Alpha New Ace, manufactured
by Alpha Giken K.K.), and printing was carried out on a coated
paper using a printing ink (Inctec Waterless S Deep Blue,
manufactured by The Inctec Inc.) at a printing speed of 5000
sheets/hr. As a result, 20,000 sheets of good prints could be
obtained.
Example D-2
[0798] The photocatalyst-containing layer described in Example D-1
was formed on a 0.15 mm-thick aluminum sheet in the same manner as
in Example D-1. The photocatalyst-containing layer was then exposed
to light from a mercury lamp through a gradation negative-working
mask having halftone dots of 2 to 98% with 175 lines/in in the same
manner as in Example D-1. The following O/W type emulsion type
silicone composition was roll coated at 450 m/min onto the exposed
photocatalyst-containing layer.
TABLE-US-00021 (1) Polydimethylsiloxane having hydroxyl group 95 g
on its both ends (number average molecular weight 100,000) (2)
Methyltriacetoxysilane 5 g (3) Dibutyltin dilaurate 0.01 g (4)
Dodecylbenzenesulfonic acid 5 g
[0799] As a result, the composition was coated only onto the
exposed areas, that is, the wettability-varied areas. The assembly
was dried at 120.degree. C. for 10 mm to form a pattern of a 1.5
.mu.m-thick silicone rubber layer. Next, under the same conditions,
the whole area exposure was carried out using a mercury lamp to
vary the wettability of the areas not provided with the silicone
rubber layer.
[0800] The printing plate thus obtained was mounted on an offset
printing machine (Alpha New Ace, manufactured by Alpha Giken K.
K.), and printing was carried out on a coated paper using a
printing ink (Inctec Waterless S Deep Blue, manufactured by The
Inctec Inc.) at a printing speed of 5000 sheets/hr. As a result,
20,000 sheets of good prints could be obtained.
Example D-3
[0801] The photocatalyst-containing layer described in Example D-1
was formed on a 0.15 mm-thick polyester film in the same manner as
in Example D-1. The photocatalyst layer was then exposed to light
from a mercury lamp through a gradation negative-working mask
having halftone dots of 2 to 98% with 175 lines/in in the same
manner as in Example D-1. The following silicone rubber composition
was roll coated at 400 m/min onto the exposed
photocatalyst-containing layer.
TABLE-US-00022 (1) Polydimethylsiloxane having vinyl group 100 g on
its both ends (2)
(CH.sub.3)SiO(Si(CH.sub.3).sub.2O).sub.30(SiH(CH.sub.3)O).sub.10Si(CH.-
sub.3) 312.8 g (3) Chloroplatinic acid/methyl vinyl cyclic complex
0.1 g (4) Toluene 200 g
[0802] As a result, the silicone rubber composition was coated only
onto the exposed areas, that is, the wettability-varied areas. The
assembly was dried at 120.degree. C. for 5 min to form a 1.5
.mu.m-thick patterned silicone rubber layer. Next, under the same
conditions, the whole area exposure was carried out using a mercury
lamp to vary the wettability of the areas not provided with the
silicone rubber layer.
[0803] The printing plate thus obtained was mounted on an offset
printing machine (Alpha New Ace, manufactured by Alpha Giken K.K.),
and printing was carried out on a coated paper using a printing ink
(Inctec Waterless S Yellow, manufactured by The Inctec Inc.) at a
printing speed of 5000 sheets/hr. As a result, 20,000 sheets of
good prints could be obtained.
Example D-4
[0804] The photocatalyst-containing layer described in Example D-1
was formed on a 0.15 mm-thick aluminum substrate in the same manner
as in Example D-1. The photocatalyst layer was then exposed to
light from a mercury lamp through a gradation negative-working mask
having halftone dots of 2 to 98% with 175 lines/in in the same
manner as in Example D-1.
[0805] The following composition was roll coated at 520 m/min onto
the exposed photocatalyst-containing layer.
TABLE-US-00023 (1) KAYARAD D-310, manufactured by Nippon 18 g
Kayaku Co., Ltd.) (2) Darocur 1173, manufactured by Ciba-Geigy 0.9
g Limited) (3) Xylene 20 g
[0806] As a result, the composition was coated only onto the
exposed areas, that is, the wettability-varied areas. The assembly
was then irradiated with ultraviolet light from a mercury lamp at
an intensity of 70 mW/cm.sup.2 for 50 sec to cure the composition
and, at the same time, to vary the wettability of the areas not
wetted by the composition. Thus, a printing plate was obtained
which had a surface having an enhanced critical surface tension of
not more than 10.degree. in terms of contact angle thereof with
water.
[0807] The printing plate thus obtained was mounted on an offset
printing machine (Alpha New Ace, manufactured by Alpha Giken K.K.),
and printing was carried out on coated paper using a printing ink
(ACROS(EIKUROSU) Deep Red, manufactured by The Inctec Inc.) and
dampening water (a liquid prepared by diluting a clean etch liquid
20 times with water, manufactured by Nikken Chemicals Co., Ltd.) at
a printing speed of 5000 sheets/hr. As a result, 20,000 sheets of
good prints could be obtained.
[0808] Thus, according to the plate for lithography of the fourth
invention D, a photocatalyst-containing composition layer is formed
on a substrate, the wettability of the surface is varied by
photocatalytic action created in response to light irradiation, and
a resin layer is coated, followed by the whole area exposure to
form areas having enhanced critical surface tension in areas other
than the resin layer. This can realize the production of plates for
waterless lithography or lithography using dampening water that
possesses high plate wear.
* * * * *