U.S. patent application number 12/580057 was filed with the patent office on 2010-02-11 for method of manufacturing organic electro-luminescence device.
This patent application is currently assigned to CHUNGHWA PICTURE TUBES, LTD.. Invention is credited to Huai-An Li, Pei-Yu Liu, Yu-Cheng Lo, Jiun-Ming Wang.
Application Number | 20100035188 12/580057 |
Document ID | / |
Family ID | 37803150 |
Filed Date | 2010-02-11 |
United States Patent
Application |
20100035188 |
Kind Code |
A1 |
Liu; Pei-Yu ; et
al. |
February 11, 2010 |
METHOD OF MANUFACTURING ORGANIC ELECTRO-LUMINESCENCE DEVICE
Abstract
A manufacturing method of an organic electro-luminescence device
is disclosed. The manufacturing method of an organic
electro-luminescence device includes sequential steps of: providing
a substrate first; forming a first electrode layer on the
substrate; forming an insulating layer on the substrate, wherein
the insulating layer includes a plurality of openings for exposing
the first layer; forming a conducting layer on the sidewall of the
insulating layer and on the first electrode layer in the openings;
forming a light-emitting layer on the conducting layer in the
openings; and finally forming a second electrode layer on the
light-emitting layer. The organic electro-luminescence device
formed by the above manufacturing method is capable of providing
the light-emitting layer with a uniform thickness and therefore
raising of yield of the fabricating process and improving of the
displaying quality of the organic electro-luminescence device.
Inventors: |
Liu; Pei-Yu; (Taipei City,
TW) ; Li; Huai-An; (Taoyuan County, TW) ; Lo;
Yu-Cheng; (Taipei City, TW) ; Wang; Jiun-Ming;
(Changhua County, TW) |
Correspondence
Address: |
J C PATENTS
4 VENTURE, SUITE 250
IRVINE
CA
92618
US
|
Assignee: |
CHUNGHWA PICTURE TUBES,
LTD.
Taoyuan
TW
|
Family ID: |
37803150 |
Appl. No.: |
12/580057 |
Filed: |
October 15, 2009 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
11214946 |
Aug 29, 2005 |
7635947 |
|
|
12580057 |
|
|
|
|
Current U.S.
Class: |
430/319 ; 427/66;
445/35 |
Current CPC
Class: |
H01L 27/3246 20130101;
H01L 51/0026 20130101; H01L 51/56 20130101 |
Class at
Publication: |
430/319 ; 445/35;
427/66 |
International
Class: |
G03F 7/20 20060101
G03F007/20; H01J 9/02 20060101 H01J009/02; B05D 5/06 20060101
B05D005/06; B05D 5/12 20060101 B05D005/12 |
Claims
1. A manufacturing method of an organic electro-luminescence
device, comprising steps of: providing a substrate; forming a first
electrode layer on the substrate; forming an insulating layer on
the substrate, wherein the insulating layer has a plurality of
openings for exposing the first electrode layer; forming a
conducting layer on a sidewall of the insulating layer and on the
first electrode layer in the openings; forming a light-emitting
layer on the conducting layer in the openings; and forming a second
electrode layer on the light-emitting layer.
2. The manufacturing method of an organic electro-luminescence
device according to claim 1, wherein the step of forming the first
electrode layer comprises: forming an electrode material layer on
the substrate; and patterning the electrode material layer to form
the first electrode layer.
3. The manufacturing method of an organic electro-luminescence
device according to claim 2, wherein the electrode material layer
is patterned by performing a photolithography and etching
process.
4. The manufacturing method of an organic electro-luminescence
device according to claim 1, wherein the step of forming the
insulating layer comprises: forming an insulating material layer on
the substrate; and patterning the insulating material layer to form
the insulating layer.
5. The manufacturing method of an organic electro-luminescence
device according to claim 4, wherein a material of the insulating
layer includes photosensitive materials and the insulating material
layer is patterned by performing exposure and development to the
insulating material layer.
6. The manufacturing method of an organic electro-luminescence
device according to claim 1, wherein the step of forming the
conducting layer comprises: forming a conducting material layer on
the substrate; and patterning the conducting material layer to form
the conducting layer.
7. The manufacturing method of an organic electro-luminescence
device according to claim 6, wherein the electrode material layer
is patterned by performing a photolithography and etching
process.
8. The manufacturing method of an organic electro-luminescence
device according to claim 1, wherein a method of forming the
light-emitting layer including an ink-jet technique.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional application of and claims
priority benefit of U.S. application Ser. No. 11/214,946, filed on
Aug. 29, 2005, now allowed. The entirety of the above-mentioned
patent application is hereby incorporated by reference herein and
made a part of this specification.
BACKGROUND OF THE INVENTION
[0002] 1. Field of Invention
[0003] The invention relates to a light emitting device and a
manufacturing method thereof. In particular, the invention relates
to an organic electro-luminescence device and a manufacturing
method thereof.
[0004] 2. Description of Related Art
[0005] With rapid advancement of semi-conductor devices and
displays, the multimedia of modem societies proceeds more quickly.
In respect of displays, owning to extraordinary features such as
higher quality, better space utilization, lower power consumption
and free of radiation, the flat panel display has gradually
replacing traditional displays as the mainstream of the marketplace
nowadays.
[0006] The flat panel display includes liquid crystal display
(LCD), organic electro-luminescence display (OEL display), plasma
display panel (PDP), etc. Here, the electro-luminescence device is
a dots matrix type display having emissive devices. Also, the OEL
device owns characteristics: no viewing angle restriction, low
manufacturing cost, high response speed (up to a hundred times that
of the liquid crystals), low power consumption, wide operating
temperature range, light weight and easily miniaturized and
streamlined as demanded. Hence, OEL device has the greatest
potential to become the dominant type in the next generation of
flat panel displays.
[0007] FIG. 1 is a cross-section schematic view of one organic
electro-luminescence device (OEL device) in the prior art.
Referring to FIG. 1 please, the OEL device is disposed on a
substrate 100. As shown, the patterned insulating layer 120 has a
plurality of openings 122 in which an anode layer 110 is disposed.
Also, a light-emitting layer 130 is disposed on the anode layer 110
in the openings 122, and a cathode layer 140 is disposed on the
light-emitting layer 130. During the manufacturing process of an
OEL device, the ink-jet technique is usually used to fill
light-emitting materials into the openings 122 to form the
light-emitting layer 130. However, due to different materials of
the anode layer 110 and insulating layer 120, the surfaces of the
anode layer 110 and the sidewall of the insulating layer 120 have
different absorption properties with respect to light-emitting
materials. And thus the thickness of the formed light-emitting
layer 130 is not uniform and it may lead to a phenomenon so-called
lip height, as shown in FIG. 2A. Furthermore, if there is still
residual light-emitting material remained on the insulating layer
120, light-emitting materials originally in both sides of the
insulating layer 120 will cross over the insulating layer 120 and
get blended.
[0008] The problems mentioned above would cause reduction of yield
of the fabricating process and deterioration of displaying quality
for the OEL device. Thus, ways to overcome the mentioned problems
due to the interface of various materials between the anode layer
and insulating layer and to form a uniform light-emitting layer are
crucial keys to the raising of yield for the fabricating process of
OEL device and the improved displaying quality thereof.
SUMMARY OF THE INVENTION
[0009] In view of this, the invention provides a manufacturing
method of an organic electro-luminescence device (OEL device)
capable of forming a light-emitting layer with a uniform thickness,
and further raising yield of the fabricating process of an OEL
device and displaying quality thereof.
[0010] The invention also provides an organic electro-luminescence
device (OEL device) featuring of a light-emitting layer with a
uniform thickness, and therefore provides better yield of the
fabricating process of an OEL device and better displaying
quality.
[0011] The invention also provides a manufacturing method of an
organic electro-luminescence device. The manufacturing method of an
organic electro-luminescence device sequentially comprises steps
of: providing a substrate; forming a first electrode layer on the
substrate; forming an insulating layer on the substrate, wherein
the insulating layer includes a plurality of openings for exposing
the first layer; forming a conducting layer on the sidewall of the
insulating layer and on the first electrode layer in the openings;
forming a light-emitting layer on the conducting layer in the
openings; and finally forming a second electrode layer on the
light-emitting layer.
[0012] In one embodiment of the invention, the step of forming the
first electrode layer, for example, is to form an electrode
material layer on the substrate and patterning the electrode
material layer by a photolithography and etching process to form
the first electrode layer.
[0013] In one embodiment of the invention, the step of forming the
insulating layer, for example, is to form an insulating material
layer on the substrate and patterning the insulating material layer
by performing exposure and development to form the insulating
layer. Wherein, a material of the insulating layer is a
photosensitive material for example.
[0014] In one embodiment of the invention, the step of forming the
conducting layer, for example, is to form an conducting material
layer on the substrate and patterning the conducting material layer
by performing a photolithography and etching process to form the
conducting layer.
[0015] In one embodiment of the invention, the light-emitting layer
may be formed by an inkjet technique.
[0016] The invention also provides an organic electroluminescence
device. The organic electroluminescence device comprises a
substrate, a first electrode layer, an insulating layer, a
conducting layer, a light-emitting layer, and a second electrode
layer. The first electrode layer is disposed on the substrate, and
the insulating layer disposed on the substrate comprises a
plurality of openings for exposing the first electrode layer.
Additionally, the conducting layer is disposed on the sidewall of
the patterned insulating layer and on the first electrode layer in
the openings. The light-emitting layer is disposed on the
conducting layer in the openings, and the second electrode layer is
disposed on the light-emitting layer.
[0017] In one embodiment of the invention, the substrate for
example is a transparent glass, and a material of the transparent
substrate is glass.
[0018] In one embodiment of the invention, the substrate for
example is an active device array substrate such as a thin film
transistor substrate.
[0019] In one embodiment of the invention, a material of the first
electrode layer, for example, is a transparent conducting material
such as Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO), for
example.
[0020] In one embodiment of the invention, a material of the
conducting layer, for example, is a transparent conducting material
such as Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO).
[0021] In one embodiment of the invention, a material of the
light-emitting layer, for example, is a polymer electro-luminescent
material.
[0022] The organic electro-luminescence device and the
manufacturing method thereof according to the invention is to form
a conducting layer on the first electrode layer and on the sidewall
of the insulating layer in the OEL device. Accordingly, the yield
of the fabricating process and the displaying quality of the OEL
device can be effectively improved. Therefore, the thickness of the
light-emitting layer can be uniform due to formation of the
light-emitting layer on the conducting layer i.e. on the interface
of same material. Accordingly, the yield of the fabricating process
and the displaying quality of an OEL device according to the
invention can be effectively improved.
[0023] It is to be understood that both the foregoing general
description and the following detailed description are exemplary,
and are intended to provide further explanation of the invention as
claimed.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024] The accompanying drawings are included to provide a further
understanding of the invention, and are incorporated in and
constitute a part of this specification. The drawings illustrate
embodiments of the invention and, together with the description,
serve to explain the principles of the invention.
[0025] FIG. 1 is a cross-section schematic view of one
electro-luminescence device in the prior art.
[0026] FIGS. 2A to 2B are cross-section schematic view of another
electro-luminescence device in the prior art.
[0027] FIGS. 3A to 3I are flowcharts schematically showing the
manufacturing of an electro-luminescence device according to one
embodiment of the invention.
DESCRIPTION OF EMBODIMENTS
[0028] FIGS. 3A to 3I are flowcharts, sequentially and
schematically illustrating the manufacturing method of an organic
electro-luminescence device (OEL Device) according to one
embodiment of the invention.
[0029] A substrate 200 is provided first, as shown in FIG. 3A. In
one embodiment, the substrate 200 for example is a transparent
glass substrate for the manufacturing of a passive-type organic
electro-luminescence device. In one another embodiment, the
substrate 200 on which a plurality of active devices are formed,
such as a thin film transistor array (TFT array), is used for
manufacturing an active-type organic electro-luminescence device.
In addition, an electrode material layer 210 is formed on the
substrate 200 by utilizing the physical vapor deposition (PVD) or
the chemical vapor deposition (CVD).
[0030] Next, referring to FIG. 3B, a step of patterning the
electrode material layer 210 is performed to form an electrode
layer 212. Here, the electrode layer 212, can be served as an anode
in the organic electro-luminescence device, for example. In one
embodiment, for example, the electrode material layer 210 is
patterned by performing a photolithography and etching process.
Besides, the electrode layer 212 for example is made of a
transparent conducting material, which can be Indium Tin Oxide
(ITO) or Indium Zinc Oxide (IZO).
[0031] Later, as shown in FIG. 3C, an insulating material layer 220
is formed on the substrate 200 by utilizing the chemical vapor
deposition (CVD), wherein the insulating material layer 220 covers
the electrode layer 212, and the material of the insulating
material layer 220 can be a photosensitive material.
[0032] Subsequently, in FIGS. 3D and 3E, a step of an exposure
process and a development process for patterning of the insulating
material layer 220 is performed to form an insulating layer 222.
Here, the insulating layer 222 owns a plurality of openings 224 for
exposing at least part of the electrode layer 212.
[0033] Then, as shown in FIG. 3F a conducting material layer 230 is
formed on the substrate 200 by utilizing the physical vapor
deposition (PVD) or the chemical vapor deposition (CVD), and a step
of patterning the conducting material layer 230 is performed. In
one embodiment, the conducting material layer 230 can be patterned
by performing a photolithography and etching process, for
example.
[0034] In FIG. 3G, after patterning the conducting material layer
230, a conducting layer 232 is formed. The conducting layer 232 is
disposed on the sidewall of the insulating layer 222 and on the
electrode layer 212 in the openings 224 for exposing top surface of
the insulating layer 222. It is worthy to note that a material of
the conducting layer 232, which can be Indium Tin Oxide (ITO) or
Indium Zinc Oxide (IZO), is identical to that of the electrode
layer 212.
[0035] And then in FIG. 3H, a light-emitting layer 240 is formed on
the exposed conducting layer 232 in the openings 224. In the
present embodiment, the light-emitting layer 240 is formed on the
conducting layer 232 by an ink-jet technique for example.
Furthermore, a material of the light-emitting layer 240 can be a
polymer electro-luminescent material for instance.
[0036] It can easily understood that Evaporation method or other
proper methods can also be utilized to form the light-emitting
layer 240 with a small-molecule electro-luminescent material in
other embodiments of the invention.
[0037] Finally, an electrode layer 250 is formed on the
light-emitting layer 240 by utilizing the physical vapor deposition
(PVD) or the chemical vapor deposition (CVD) as shown in FIG. 3I.
Here, the electrode layer 250, for example, can be served as a
cathode in the organic electro-luminescence device, and a material
of the electrode layer 250 can be a transparent conducting material
such as Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO).
[0038] Please refer to FIGS. 2A, 2B, and 3I simultaneously. It is
worthy to note that the manufacturing method of an OEL device based
on the invention is to form a material layer, a conducting layer
232 such as Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO), on
the electrode layer 212 and on the sidewall of the insulating layer
222 before forming the light-emitting layer 240 in the opening 224.
Thus, formation of the conducting layer 232 is mainly aimed at
obtaining the light-emitting layer 240 with a uniform thickness by
allowing the light-emitting materials to be formed on the same
material interface i.e. on the conducting layer 232. By doing so,
the lip height phenomenon shown in FIG. 2A or blending of
light-emitting materials shown in FIG. 2B can be effectively
avoided, and yield of the fabricating process and the displaying
quality of the OEL device utilizing the invention can be further
improved.
[0039] In addition, the manufacturing method of an OEL device
according to the invention can also be applied in the fabricating
process that is to form a coating layer on the interface between
two different materials. Take one for example. In the fabricating
process of the color filter (CF), after the formation of the black
matrix owning a plurality of openings, a photoresist layer or other
adaptive material layers can be formed on the sidewall of the black
matrix and the exposed substrate thereof. Subsequently, a
color-filtering layer with a more uniform thickness is formed on
this material layer so as to raise yield of the fabricating process
of the color filter.
[0040] To sum up, the OEL device and the manufacturing method
thereof of the invention is to prevent the phenomenon of the prior
art having an inconsistent layer thickness due to the interface
between different materials, by forming a conducting layer, that is
capable of increasing adhesive property of materials, on top
surface of the electrode layer and on the sidewall of the
insulating layer in the OEL device. Accordingly, the yield of the
fabricating process and the displaying quality of the OEL device
can be effectively improved.
[0041] It will be apparent to those skilled in the art that various
modifications and variations can be made to the structure of the
invention without departing from the scope or spirit of the
invention. In view of the foregoing descriptions, it is intended
that the invention covers modifications and variations of this
invention if they fall within the scope of the following claims and
their equivalents.
* * * * *