U.S. patent application number 12/490200 was filed with the patent office on 2009-10-22 for semiconductor light emitting device and method for fabricating the same.
This patent application is currently assigned to PANASONIC CORPORATION. Invention is credited to Tetsuzo UEDA.
Application Number | 20090261372 12/490200 |
Document ID | / |
Family ID | 34863493 |
Filed Date | 2009-10-22 |
United States Patent
Application |
20090261372 |
Kind Code |
A1 |
UEDA; Tetsuzo |
October 22, 2009 |
SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR FABRICATING THE
SAME
Abstract
A semiconductor light emitting device is composed of a blue
light emitting diode, a red light emitting layer grown epitaxially
on the blue light emitting diode, and an insulating material
containing a YAG fluorescent material. The red light emitting layer
is made of, e.g., undoped In.sub.0.4Ga.sub.0.6N having a forbidden
band width of 1.9 eV and formed on a p-type semiconductor layer to
have a configuration consisting of a plurality of mutually
spaced-apart islands.
Inventors: |
UEDA; Tetsuzo; (Osaka,
JP) |
Correspondence
Address: |
GREENBLUM & BERNSTEIN, P.L.C.
1950 ROLAND CLARKE PLACE
RESTON
VA
20191
US
|
Assignee: |
PANASONIC CORPORATION
Osaka
JP
|
Family ID: |
34863493 |
Appl. No.: |
12/490200 |
Filed: |
June 23, 2009 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
11060425 |
Feb 18, 2005 |
7569863 |
|
|
12490200 |
|
|
|
|
Current U.S.
Class: |
257/98 ;
257/E33.061 |
Current CPC
Class: |
H01L 2224/05001
20130101; H01L 2224/05169 20130101; H01L 2224/0603 20130101; H01L
24/03 20130101; H01L 33/08 20130101; H01L 24/16 20130101; H01L
2224/05111 20130101; H01L 2224/05644 20130101; H01L 2224/14
20130101; H01L 2224/05023 20130101; H01L 2224/05144 20130101; H01L
24/05 20130101; H01L 2224/05124 20130101; H01L 2224/05568 20130101;
H01L 2224/05558 20130101; H01L 2224/06102 20130101; H01L 2224/05017
20130101; H01L 2224/05155 20130101; H01L 2224/1703 20130101; H01L
2224/05644 20130101; H01L 2924/00014 20130101; H01L 2224/05111
20130101; H01L 2924/00014 20130101; H01L 2224/05124 20130101; H01L
2924/00014 20130101; H01L 2224/05144 20130101; H01L 2924/00014
20130101; H01L 2224/05155 20130101; H01L 2924/00014 20130101; H01L
2224/05169 20130101; H01L 2924/00014 20130101 |
Class at
Publication: |
257/98 ;
257/E33.061 |
International
Class: |
H01L 33/00 20060101
H01L033/00 |
Foreign Application Data
Date |
Code |
Application Number |
Feb 19, 2004 |
JP |
2004-042329 |
Feb 19, 2004 |
JP |
2004-042330 |
Claims
1. A semiconductor light emitting device comprising: a light
emitting diode comprising a plurality of semiconductor layers for
emitting first emission light; a semiconductor film provided to
absorb the first emission light and emit second emission light; and
a transparent electrode provided in the light emitting diode,
wherein the semiconductor film emits the second emission light
through optical excitation by the first emission light, wherein the
transparent electrode transmits the first emission light or the
second emission light, wherein the semiconductor film and the
transparent electrode are located on a light emitting surface of
the light emitting diode, and and wherein the transparent electrode
is provided with a plurality of openings and the semiconductor film
is located in each of the openings on a light emitting surface of
the light emitting diode.
2. The semiconductor light emitting device of claim 1, further
comprising: a fluorescent material covering the light emitting
diode and the semiconductor film, wherein the fluorescent material
absorbs the first emission light and emits third emission
light.
3. The semiconductor light emitting device of claim 1, wherein the
light emitting diode or the semiconductor film is formed on a
substrate made of a single crystal.
4. The semiconductor light emitting device of claim 3, wherein the
substrate transmits the first emission light and the second
emission light.
5. The semiconductor light emitting device of claim 3, wherein the
single crystal is sapphire, silicon carbide, gallium nitride,
aluminum nitride, magnesium oxide, lithium gallium oxide, lithium
aluminum oxide, lithium aluminum oxide, or a mixed crystal of
lithium gallium oxide and lithium aluminum oxide.
6. The semiconductor light emitting device of claim 1, wherein the
semiconductor film is formed to cover a part of the transparent
electrode in the vicinity of the openings.
7. The semiconductor light emitting device of claim 6, wherein the
semiconductor film has a crystal defect density which is lower in
the portion thereof located on the transparent electrode than in
each of the portions thereof located over the individual openings
of the transparent electrode.
8. The semiconductor light emitting device of claim 1, wherein the
first emission light is blue light or ultraviolet light.
9. The semiconductor light emitting device of claim 8, wherein the
semiconductor film is excited by the first emission light to emit
the second emission light which is red light.
10. The semiconductor light emitting device of claim 1, wherein the
semiconductor film is composed of a plurality of semiconductor
films which are stacked in layers and emit emission light
components having different wavelengths from each of the stacked
layers.
11. The semiconductor light emitting device of claim 1, further
comprising a metal film in a portion of the electrode and having a
thickness of at least 10 .mu.m, wherein a current is injected in
the light emitting diode through the metal film.
12. The semiconductor light emitting device of claim 11, wherein
the metal film is made of gold, copper, or silver.
13. The semiconductor light emitting device of claim 1, wherein the
light emitting diode is provided with a metal electrode having a
reflectivity of 60% or more with respect to the first emission
light or the second emission light.
14. The semiconductor light emitting device of claim 13, wherein
the metal electrode is composed of a single-layer film or a
multi-layer film each made of at least one material selected from
the group consisting of gold, platinum, copper, silver, and
rhodium.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional of application Ser. No.
11/060,425, filed Feb. 18, 2005, which is incorporated by reference
herein in its entirety.
[0002] The teachings of Japanese Patent Applications JP 2004-42329
and JP 2004-42330, each filed Feb. 19, 2004, are entirely
incorporated herein by reference, inclusive of the claims,
specification, and drawings.
BACKGROUND OF THE INVENTION
[0003] The present invention relates to a semiconductor light
emitting device which is applicable to, e.g., a white light
emitting diode and to a method for fabricating the same.
[0004] A gallium nitride-based (GaN-based) group III-V nitride
semiconductor (InGaAlN) in which GaN has a large forbidden
bandwidth of, e.g., 3.4 eV at a room temperature is a material
which can implement a light emitting device capable of a high
output in the blue or green wavelength band or even in the
ultraviolet wavelength band. The GaN-based semiconductor has
already been commercialized as a blue/green light emitting diode in
various display panels, large-scale display devices, and traffic
signals.
[0005] On the other hand, a white light emitting diode which
provides white light by exciting a YAG fluorescent material with
emission light from a blue light emitting diode has also been
commercialized already for various applications including the back
light of a liquid crystal display panel.
[0006] If the white light emitting diode can be enhanced in
brightness and light emitting efficiency, a semiconductor
illuminating device as a replacement for currently prevailing
fluorescent and incandescent lamps can be provided. Accordingly,
white light emitting diodes for illumination are predicted to
create an extremely large market in the future.
[0007] For illumination purposes, the improvement of the manner in
which color appears when a white light emitting diode is used for
illumination, i.e., a color rendering property is important in
addition to the enhancement of brightness and the light emitting
efficiency.
[0008] Since each of the white light emitting diodes that have been
commercialized heretofore has used a method which excites a YAG
(Yttrium Aluminum Garnet) fluorescent material with emission light
at about 470 nm from a blue light emitting diode and thereby
obtains yellow emission light (see, e.g., S. Nakamura et al., "The
Blue Laser Diode" Springer-Verlag Berlin Heidelberg N.Y.: See p.
216), the problem has been encountered that the amount of red
emission light in an emission spectrum is small and the color
rendering property is consequently inferior to that of light from a
fluorescent lamp and light from an incandescent lamp.
[0009] At present, there is no red fluorescent material that
exhibits a sufficiently high excitation efficiency upon excitation
caused by blue emission light. To improve the color rendering
property, therefore, it is particularly necessary to enhance the
brightness of a red light emitting fluorescent material.
[0010] Referring to FIG. 36, a description will be given herein
below to a structure of a conventional white light emitting diode
which provides white light by mixing blue light from a GaN-based
blue light emitting diode with yellow light which is outputted
through the excitation of a YAG fluorescent material with the blue
light and to the light emission characteristics thereof.
[0011] As shown in FIG. 36, the white light emitting diode is
composed of a blue light emitting diode 300 for outputting blue
light at a wavelength of 470 nm which has been mounted on a package
310 to have upper and side surfaces thereof covered with an
insulating material 320 containing a YAG fluorescent material.
[0012] A method for fabricating the blue light emitting diode 300
will be described, in which an n-type GaN layer 302, an active
layer 303 made of InGaN, and a p-type GaN layer 304 are formed
successively on a substrate 301 made of sapphire by, e.g.,
MOCVD
(Metal Organic Chemical Vapor Deposition),
[0013] Next, dry etching using, e.g., a chlorine gas is performed
with respect to the n-type GaN layer 304 and the active layer 303,
thereby selectively exposing a part of the n-type GaN layer 302.
Subsequently, an n-side electrode 305 composed of a multilayer film
of titanium and gold is formed on the exposed portion of the n-type
GaN layer 302. On the other hand, a p-side transparent electrode
306 composed of a multilayer film of nickel and gold and having a
reduced thickness of 10 nm or less for the transmission of light
emitted from the active layer 303 is formed on the p-type GaN layer
304.
[0014] Next, a pad electrode 307 made of gold is formed selectively
on the p-side transparent electrode 306, whereby a majority of the
blue light emitted from the active layer 303 passes through the
p-side transparent electrode 306.
[0015] Next, the blue light emitting diodes 300 in the form of a
wafer is divided into square chips each having, e.g., 350-.mu.m
sides. Each of the chips is mounted at a specified position on the
package 310 and then wire bonding is performed with respect to the
n-side electrode and the pad electrode 307. Subsequently, the
insulting material 320 containing the YAG fluorescent material is
coated or applied dropwise to cover the blue light emitting diode
300 and then hardened.
[0016] The light emission characteristics of the white light
emitting diode thus obtained are as shown in FIG. 37 so that white
light which is a mixture of blue emission light 300A from the blue
light emitting diode 300 and yellow emission light 320A from the
YAG fluorescent material 320 is emitted.
[0017] However, the conventional white light emitting diode has the
problem of a poor white color rendering property, as shown in FIG.
37, due to the small amount of the red emission light component in
a spectrum obtained from the blue light emitting diode 300.
SUMMARY OF THE INVENTION
[0018] In view of the conventional problems described above, it is
therefore an object of the present invention to provide a white
light emitting diode made of a GaN-based compound semiconductor
having an excellent color rendering property.
[0019] To attain the object, the present invention provides a
structure wherein a light emitting diode for emitting
short-wavelength light such as blue light or ultraviolet light has
a semiconductor layer which is excited by light emitted from the
light emitting diode to release long-wavelength light such as green
light or red light.
[0020] The present invention also provides another structure
wherein another n-type semiconductor layer is provided to come in
contact with a p-type semiconductor layer composing the light
emitting diode in conjunction with an n-type semiconductor layer
such that a tunnel current is allowed to flow between the other
n-type semiconductor layer and the p-type semiconductor layer. The
arrangement obviates the necessity for a transparent electrode used
for the light emitting diode.
[0021] Specifically, a first semiconductor light emitting device
according to the present invention comprises: a light emitting
diode for emitting first emission light; and a semiconductor film
provided in a portion of the light emitting diode to absorb the
first emission light and emit second emission light, wherein the
semiconductor film emits the second emission light through optical
excitation by the first emission light.
[0022] The first semiconductor light emitting device allows the
light emitting diode to output blue light as the first emission
light and allows the semiconductor film to absorb the blue first
emission light and release the second emission light, which is
either red light or green light, so that the white light emitting
diode having an excellent color rendering property is provided.
[0023] Preferably, the first semiconductor light emitting device
further comprises: a transparent electrode provided in the light
emitting diode, wherein the transparent electrode transmits the
first emission light or the second emission light. The arrangement
enhances the efficiency with which a current is injected in the
light emitting diode to cause light emission from the diode.
[0024] In the first semiconductor light emitting device, the
semiconductor film is preferably formed on a part of a light
emitting surface of the semiconductor light emitting device. In the
arrangement, a part of the first emission light is absorbed by the
semiconductor film so that there is no conversion of the remaining
part of the first emission light to the second emission light. This
ensures the emission of white light having an excellent color
rendering property.
[0025] Preferably, the first semiconductor light emitting device
further comprises: a fluorescent material covering the light
emitting diode and the semiconductor film, wherein the fluorescent
material absorbs the first emission light and emits third emission
light. In the case where a YAG fluorescent material is used for the
fluorescent material, the arrangement allows the emission of
high-brightness yellow light through excitation caused by blue
light. By combining the yellow light from the fluorescent material
with the high-brightness red light from the semiconductor film,
therefore, white light having an excellent color rendering property
is obtainable.
[0026] In the first semiconductor light emitting device, the light
emitting diode or the semiconductor film is preferably formed on a
substrate made of a single crystal. The arrangement allows the
formation the light emitting diode or the semiconductor film on the
substrate made of a single crystal by epitaxial growth. As a
result, the crystal property of the light emitting diode or the
semiconductor film is improved and therefore a high-brightness
white light emitting diode can be provided.
[0027] In the first semiconductor light emitting device, the
substrate preferably transmits the first emission light and the
second emission light. The arrangement allows the extraction of the
first emission light and the second emission light through the
substrate. Accordingly, in the case where the light emitting diode
and the semiconductor film are formed on the substrate in this
order, e.g., so-called flip-chip mounting can be performed which
forms an electrode made of a material having a high reflectivity
with respect to each of the first emission light and the second
emission light on the semiconductor film and mounts the formed
electrode in opposing relation to the surface of a package. As a
result, a white light emitting diode featuring an excellent heat
dissipation property and high brightness can be obtained.
[0028] In the case where the transparent electrode is provided, the
transparent electrode is preferably provided with a plurality of
openings and the semiconductor film is preferably formed in each of
the openings on a light emitting surface of the light emitting
diode. The arrangement allows the second emission light from the
semiconductor film to be extracted without passing through the
transparent electrode so that a reduction in brightness due to the
absorption of light by the transparent electrode no more occurs. In
addition, the semiconductor film is in contact with the light
emitting diode so that the brightness of the second emission light
is also enhanced.
[0029] In this case, the semiconductor film is preferably formed in
mutually divided relation in each of the openings on a light
emitting surface of the light emitting diode.
[0030] In this case, the semiconductor film is preferably formed to
cover a part of the transparent electrode in the vicinity of the
openings.
[0031] In the first the semiconductor light emitting device, the
semiconductor film has a crystal defect density which is lower in
the portion thereof located on the transparent electrode than in
each of the portions thereof located over the individual openings
of the transparent electrode.
[0032] In the case where the semiconductor film or the light
emitting diode is thus formed to grow selectively in a lateral
direction from each of the openings in the transparent electrode,
the crystal property of the portion of the semiconductor film or
the light emitting diode located on the transparent electrode is
improved so that light emission is performed with higher
brightness.
[0033] In the first semiconductor light emitting device, the first
emission light is preferably blue light or ultraviolet light.
[0034] In this case, the semiconductor film is preferably excited
by the first emission light to emit the second emission light which
is red light. In the arrangement, if the semiconductor film and the
light emitting diode are covered with, e.g., an insulating material
containing a YAG fluorescent material, a white light emitting diode
having an excellent white color rendering property is
obtainable.
[0035] In the first semiconductor light emitting device, the
semiconductor film is preferably composed of a plurality of
semiconductor films which are stacked in layers and emit emission
light components having different wavelengths from each of the
stacked layers.
[0036] In the first semiconductor light emitting device, the
semiconductor film is preferably doped with impurities and excited
by the first emission light to emit the second emission light in a
visible range via energy levels resulting from the impurities. The
arrangement allows high-brightness light emission from the
semiconductor film doped with the impurity via the energy level of
the impurity which can serve as a high-brightness luminescent
center. As a result, the brightness of the second emission light
can be enhanced and the color rendering property can further be
improved.
[0037] In the first semiconductor light emitting device, the
semiconductor film is preferably doped with an impurity to emit the
second emission light in a visible range through light emission
from inner-shell transition of the impurities. The arrangement
realizes high-efficiency red light emission and allows a white
light emitting diode having a more excellent color rendering
property to be obtained.
[0038] In this case, the impurity is preferably Eu, Sm, or Yb.
[0039] Preferably, the impurities in the semiconductor film are
introduced by ion implantation. The arrangement allows the
semiconductor film to be doped with the impurity with high
controllability.
[0040] In the first semiconductor light emitting device, the light
emitting diode or the semiconductor layer is preferably composed of
a compound semiconductor containing nitrogen. The arrangement
ensures the emission of high-brightness blue light or ultraviolet
light as the first emission light and the emission of
high-brightness red light as the second emission light so that
white light having an excellent color rendering property is
obtainable.
[0041] In the first semiconductor light emitting device, the
transparent electrode is preferably composed of a conductive
material containing nickel or indium tin oxide (ITO) each having a
thickness more than 0 nm and not more than 20 nm. The arrangement
reduces the absorption of light emitted and absorbed by the
transparent electrode. In addition, since nickel, e.g., can form an
excellent ohmic contact with a nitride semiconductor layer, a white
light emitting diode featuring high brightness and a reduced series
resistance can be provided.
[0042] In the case where an insulating material containing a
fluorescent material is provided, the fluorescent material is
preferably yttrium aluminum garnet (YAG). The arrangement allows
high-brightness yellow light to be obtained by using the blue
excitation light from the light emitting diode. By mixing the blue
emission light with the red second emission light from the
semiconductor film, e.g., a high-brightness light emitting diode
having an excellent white color rendering property can be
provided.
[0043] In the case where the light-emitting diode is formed on the
substrate made of a single crystal, there can be used sapphire,
silicon carbide, gallium nitride, aluminum nitride, magnesium
oxide, lithium gallium oxide, lithium aluminum oxide, lithium
aluminum oxide, or a mixed crystal of lithium gallium oxide and
lithium aluminum oxide as the single crystal. Since the use of such
a single crystal allows a nitride semiconductor layer having an
excellent crystal property to be formed on the substrate,
higher-brightness blue or ultraviolet light can be obtained as the
first emission light so that higher-brightness red second emission
light is obtainable by using the first emission light as the
excitation light.
[0044] Preferably, the first semiconductor light emitting device
further comprises a metal film provided in the light emitting diode
and having a thickness of at least 10 .mu.m, wherein a current is
injected in the light emitting diode through the metal film. The
arrangement allows heat generated from the light emitting diode in
operation to dissipate through the metal film so that a white light
emitting diode having an excellent heat dissipation property and
capable of high-output operation is obtainable.
[0045] In this case, the metal film is preferably made of gold,
copper, or silver.
[0046] In the first semiconductor light emitting device, the light
emitting diode is preferably provided with a metal electrode having
a reflectivity of 60% or more with respect to the first emission
light or the second emission light. The arrangement remarkably
increases the efficiency with which emission light is
extracted.
[0047] In this case, the metal electrode is preferably composed of
a single-layer film or a multi-layer film each made of at least one
material selected from the group consisting of gold, platinum,
copper, silver, and rhodium.
[0048] A first method for fabricating a semiconductor light
emitting device according to the present invention comprises the
steps of: (a) forming a light emitting diode composed of a
plurality of semiconductor layers on a substrate made of a single
crystal; and (b) selectively forming, on the light emitting diode,
a semiconductor film which absorbs first emission light and emits
second emission light through the optical excitation by the first
emission light.
[0049] Since the first method for fabricating a semiconductor light
emitting device allows the light emitting diode formed on the
substrate made of the single crystal to emit blue light as the
first emission light and allows the semiconductor film formed
selectively on the light emitting diode to absorb the blue first
emission light and release the second emission light which is
either red or green, a white light emitting diode having an
excellent color rendering property can be provided.
[0050] Preferably, the first method for fabricating a semiconductor
light emitting device further comprises the step of: (c) between
the steps (a) and (b) or after the step (b), forming a transparent
electrode which transmits the first emission light on the light
emitting diode.
[0051] In this case, the step (c) preferably includes the step of
providing a plurality of openings in the transparent electrode. The
arrangement allows the second emission light released from the
semiconductor film to be extracted without passing through the
transparent electrode so that a brightness reduction due to the
absorption of light by the transparent electrode no more occurs. As
a result, a high-brightness white light emitting diode can be
obtained.
[0052] In this case, the semiconductor film is preferably formed in
the step (b) to selectively grow from each of the regions of an
upper surface of the light emitting diode which are exposed through
the plurality of openings of the transparent electrode.
[0053] Preferably, the first method for fabricating a semiconductor
light emitting device further comprises the step of: (d) after the
step (b), irradiating the surface of the substrate opposite to the
light emitting diode with light having a wavelength which is not
absorbed by the substrate but is absorbed by the semiconductor
layers composing the light emitting diode to separate the substrate
from the diode. The arrangement allows a white light emitting diode
having an excellent heat dissipation property and capable of
large-output operation to be provided through the separation of the
substrate when the substrate is made of a material having a poor
heat dissipation property such as, e.g., sapphire.
[0054] In this case, the step (d) preferably includes forming, in a
part of the semiconductor layers irradiated with the light, a
decomposition layer resulting from thermal decomposition of the
irradiated semiconductor layers. Even when the substrate has a
relatively larger area, the arrangement allows no-split separation
of the substrate from the light emitting diode with high
reproducibility.
[0055] A second method for fabricating a semiconductor light
emitting device according to the present invention comprises the
steps of: (a) forming a semiconductor film on a substrate made of a
single crystal; and (b) forming a light emitting diode composed of
a plurality of semiconductor layers on the semiconductor film,
wherein the semiconductor film absorbs first emission light emitted
from the light emitting diode and emits second emission light
through the optical excitation by the first emission light.
[0056] Since the second method for fabricating a semiconductor
light emitting device allows the semiconductor film and the light
emitting diode to be formed on the substrate made of the single
crystal, allows the light emitting diode to output, e.g., blue
light as first emission light, and allows the semiconductor film to
absorb the blue first emission light and release the second
emission light, which is either red or green, a white light
emitting diode having an excellent white color rendering property
can be provided.
[0057] Preferably, the second method for fabricating a
semiconductor light emitting device further comprises the step of:
(c) between the steps (a) and (b), forming a transparent electrode
which transmits the first emission light on the semiconductor
film.
[0058] In this case, the step (c) preferably includes the step of
providing a plurality of openings in the transparent electrode.
[0059] In this case, a lower one of the plurality of semiconductor
layers is preferably formed in the step (b) to selectively grow
from each of the regions of an upper surface of the semiconductor
film which are exposed through the plurality of openings of the
transparent electrode.
[0060] Preferably, the second method for fabricating a
semiconductor light emitting device further comprises the step of:
(d) after the step (b), irradiating the surface of the substrate
opposite to the semiconductor film with light having a wavelength
which is not absorbed by the substrate but is absorbed by the
semiconductor film to separate the substrate from the semiconductor
film.
[0061] In this case, the step (d) preferably includes forming, in a
part of the semiconductor layers irradiated with the light, a
decomposition layer resulting from thermal decomposition of the
irradiated semiconductor layers.
[0062] Preferably, the first or second method for fabricating a
semiconductor light emitting device further comprises the step of:
(e) after the step (d), forming a metal film on the light emitting
diode or on the semiconductor film.
[0063] A second semiconductor light emitting device according to
the present invention comprises: a light emitting diode composed of
a first n-type semiconductor layer, a p-type semiconductor layer,
and a second n-type semiconductor layer which are formed
successively to emit first emission light; and a semiconductor film
provided in the light emitting diode to absorb the first emission
light and emit second emission light through the optical excitation
by the first emission light, wherein when a voltage is applied such
that the second n-type semiconductor layer has a positive potential
relative to the first n-type semiconductor layer, a current flows
from the second n-type semiconductor layer to the first n-type
semiconductor layer.
[0064] Since the second semiconductor light emitting device allows
the light emitting diode to output blue light as the first emission
light and allows the semiconductor film to absorb the blue first
emission light and release the second emission light, which is
either red or green, a white light emitting diode having an
excellent white color rendering property can be provided. In
addition, when an operating current is injected in the light
emitting diode, a structure is adopted in which a so-called tunnel
current flows in a p.sup.+n.sup.+ junction composed of the p-type
semiconductor layer and the second n-type semiconductor layer so
that a rectifying property is obtained by applying a voltage
between the second n-type semiconductor layer and the first n-type
semiconductor layer such that it is higher to the second n-type
semiconductor layer than to the first n-type semiconductor layer.
Since the heavily doped second n-type semiconductor layer has a low
resistance, a current is more likely to be dispersed in the
in-plane direction of a pn junction surface. This obviates the
necessity to use the transparent electrode and enhances the
brightness of the emission light.
[0065] In the second semiconductor light emitting device, an
impurity concentration in preferably each of the p-type
semiconductor layer and the second n-type semiconductor layer is
10.sup.18 cm.sup.3 or more. This more positively allows a tunnel
current to flow in the p.sup.+n.sup.+ junction between the p-type
semiconductor layer and the second n-type semiconductor layer.
[0066] Preferably, the second semiconductor light emitting device
further comprises: a fluorescent material covering the light
emitting diode and the semiconductor film which absorbs the first
emission light and emits third emission light through the optical
excitation by the first emission light.
[0067] In the case where a YAG fluorescent material, e.g., is used
for a fluorescent material, the arrangement allows high-brightness
yellow light to be emitted as the third emission light through
excitation caused by blue light. As a result, a white light
emitting diode having an excellent color rendering property can be
provided by combining the yellow third emission light with the
high-brightness second emission light which is red.
[0068] In the second semiconductor light emitting device, the light
emitting diode or the semiconductor film is preferably formed on a
substrate made of a single crystal. Since the arrangement allows
the light emitting diode and the semiconductor film to be formed on
the substrate made of the single crystal by epitaxial growth, the
crystal property of each of the first n-type semiconductor layer,
the p-type semiconductor layer, the second n-type semiconductor
layer, and the semiconductor film is improved so that a
high-brightness white light emitting diode is obtainable. In
addition, since the second emission light released from the
semiconductor film can be extracted through the substrate,
flip-chip mounting which forms, e.g., a high-reflectivity electrode
on the semiconductor film can be performed so that a white light
emitting diode having an excellent heat dissipation property is
provided.
[0069] Preferably, the second semiconductor light emitting device
further comprises: a metal film provided on the light emitting
diode to have a thickness of at least 10 .mu.m, wherein an
operating current is injected in the light emitting diode through
the metal film. The arrangement allows heat generated from the
light emitting diode in operation to dissipate through the metal
film so that a white light emitting diode having an excellent heat
dissipation property and capable of high-output operation is
obtainable.
[0070] In this case, the metal film is preferably made of gold,
copper, or silver.
[0071] In the second semiconductor light emitting device, the light
emitting diode is preferably provided with a metal electrode having
a reflectivity of 60% or more with respect to the first emission
light or the second emission light. In the arrangement, the first
or second emission light is reflected strongly by the metal
electrode so that the efficiency with which emission light is
extracted is remarkably improved.
[0072] In this case, the metal electrode is preferably composed of
a single-layer film or a multi-layer film each made of at least one
material selected from the group consisting of gold, platinum,
copper, silver, and rhodium.
[0073] In the second semiconductor light emitting device, the first
emission light is preferably blue light or ultraviolet light. The
arrangement allows a white light emitting diode having an excellent
white color rendering property to be obtained by, e.g., covering
the light emitting diode and the semiconductor film with an
insulating material containing a YAG fluorescent material.
[0074] In the second semiconductor light emitting device, the
second emission light is preferably red light. The arrangement
provides a white light emitting diode having an excellent white
color rendering property by covering the light emitting diode and
the semiconductor film with an insulating material which contains a
YAG fluorescent material and emits blue light as the first emission
light.
[0075] In the second semiconductor light emitting device, the
semiconductor film is preferably composed of a plurality of
semiconductor films which are stacked in layers and emit emission
light components having different wavelengths from each of the
stacked layers. The arrangement allows a white light emitting diode
having an excellent white color rendering property to be provided
by constituting the plurality of semiconductor films such that they
emit light in three colors which are red, green, and blue through
excitation caused by, e.g., ultraviolet light.
[0076] In the second semiconductor light emitting device, the
semiconductor film is preferably doped with impurities and the
semiconductor film is preferably excited by the first emission
light to emit the second emission light in a visible range via
energy levels resulting from the impurities. The arrangement
provides high-brightness emission light via the energy level of the
impurity which may serve as a high-brightness luminescent center in
the semiconductor film doped with the impurity. Accordingly, the
brightness of the second emission light can be enhanced and the
color rendering property can further be improved.
[0077] In the second semiconductor light emitting device, the
semiconductor film is preferably doped with impurities to emit the
second emission light in a visible range through light emission
from inner-shell transition of the impurities. The arrangement
allows high-efficiency red light emission and provides a white
light emitting diode having a more excellent color rendering
property.
[0078] In this case, the impurity is preferably Eu, Sm, or Yb.
[0079] Preferably, the impurities of the semiconductor film in the
impurity are introduced by ion implantation. The arrangement allows
the semiconductor film to be doped with the impurity with high
controllability.
[0080] In the second semiconductor light emitting device, the light
emitting diode or the semiconductor film is preferably made of a
compound semiconductor containing nitrogen. The arrangement ensures
the emission of high-brightness blue light or ultraviolet light as
the first emission light and the emission of high-brightness red
light as the second emission light so that white light having an
excellent color rendering property is obtainable.
[0081] In the case where the light emitting diode and the
semiconductor film are covered with an insulating material
containing a fluorescent material, the fluorescent material is
preferably yttrium aluminum garnet (YAG). The arrangement allows
high-brightness yellow light to be obtained by using the blue
excitation light from the light emitting diode. By mixing the blue
emission light with the red second emission light from the
semiconductor film, e.g., a high-brightness light emitting diode
having an excellent white color rendering property can be
provided.
[0082] In the case where the light emitting diode or the
semiconductor film is formed on the substrate made of a single
crystal, the single crystal is preferably sapphire, silicon
carbide, gallium nitride, aluminum nitride, magnesium oxide,
lithium gallium oxide, lithium aluminum oxide, or a mixed crystal
of lithium gallium oxide and lithium aluminum oxide. Since the use
of such a single crystal allows a nitride semiconductor layer
having an excellent crystal property to be formed on the substrate,
higher-brightness blue or ultraviolet light can be obtained as the
first emission light so that higher-brightness red second emission
light is obtainable by using the first emission light as the
excitation light.
[0083] A third method for fabricating a semiconductor light
emitting device according to the present invention comprises the
steps of: (a) successively depositing a first n-type semiconductor
layer, a p-type semiconductor layer, and a second n-type
semiconductor layer on a substrate made of a single crystal to form
a light emitting diode; and (b) selectively forming, on the light
emitting diode, a semiconductor film which absorbs first emission
light emitted from the light emitting diode and emit second
emission light through the optical excitation by the first emission
light, wherein an impurity concentration in each of the p-type
semiconductor layer and the second n-type semiconductor layer is
set in the step (a) to allow a current to flow from the second
n-type semiconductor layer to the first n-type semiconductor layer
when a voltage is applied such that the second n-type semiconductor
layer has a positive potential relative to the first n-type
semiconductor layer.
[0084] Since the third method for fabricating a semiconductor light
emitting device allows the light emitting diode to output blue
light as the first emission light and allows the semiconductor film
to absorb the blue first emission light and release the second
emission light, which is either red or green, a white light
emitting diode having an excellent white color rendering property
can be provided. In addition, an impurity concentration in each of
the p-type semiconductor layer and the second n-type semiconductor
layer is set to allow a tunnel current to flow in the
p.sup.+n.sup.+ junction surface therebetween so that a rectifying
property is obtained by applying a voltage between the second
n-type semiconductor layer and the first n-type semiconductor layer
such that it is higher to the second n-type semiconductor layer
than to the first n-type semiconductor layer. Since the heavily
doped second n-type semiconductor layer has a low resistance, a
current is more likely to be dispersed in the in-plane direction of
the pn junction surface. This obviates the necessity to use the
transparent electrode and enhances the brightness of the emission
light.
[0085] In the third method for fabricating a semiconductor light
emitting device, the impurity concentration in each of the p-type
semiconductor layer and the second n-type semiconductor layer is
preferably 10.sup.18 cm.sup.3 or more.
[0086] Preferably, the third method for fabricating a semiconductor
light emitting device further comprises the step of: (c) after the
step (b), separating the substrate from the light emitting diode.
The arrangement allows a white light emitting diode having an
excellent heat dissipation property and capable of large-output
operation to be provided through the separation of the substrate
when the substrate is made of a material having a poor heat
dissipation property such as, e.g., sapphire.
[0087] In this case, the step (c) preferably includes the step of
irradiating the surface of the substrate opposite to the light
emitting diode with light having a wavelength which is not absorbed
by the substrate but is absorbed by the semiconductor layers
composing the light emitting diode to form, in a part of the
semiconductor layers irradiated with the light, a decomposition
layer resulting from decomposition of the semiconductor layers.
Even when the substrate has a relatively larger area, the
arrangement allows no-split separation of the substrate from the
light emitting diode with high reproducibility.
[0088] In this case, the third method for fabricating a
semiconductor light emitting device preferably further comprises
the steps of: (d) prior to the step (c), bonding a holding
substrate made of a material other than that of the substrate to
the light emitting diode or to the semiconductor film; and (e)
after the step (c), separating the holding substrate from the light
emitting diode or from the semiconductor film. The arrangement
suppresses the occurrence of a crack in the semiconductor film in
the process in which stress in the semiconductor is reduced by
thermal decomposition during the formation the decomposition layer
in the step (c). Accordingly, even when the substrate having a
large area is used, the substrate can be separated without causing
a crack in the light emitting diode.
BRIEF DESCRIPTION OF THE DRAWINGS
[0089] FIGS. 1A and 1B show a semiconductor light emitting device
according to a first embodiment of the present invention, of which
FIG. 1A is a cross-sectional view thereof and FIG. 1B is a plan
view thereof;
[0090] FIG. 2 is a graph showing an emission spectrum obtained from
the semiconductor light emitting device according to the first
embodiment;
[0091] FIGS. 3A through 3C are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the first
embodiment;
[0092] FIGS. 4A through 4C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the first
embodiment;
[0093] FIG. 5 is a cross-sectional view showing a semiconductor
light emitting device according to a second embodiment of the
present invention;
[0094] FIGS. 6A and 6B show a semiconductor light emitting device
according to a third embodiment of the present invention, of which
FIG. 6A is a cross-sectional view thereof and FIG. 6B is a plan
view thereof;
[0095] FIGS. 7A through 7D are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the third
embodiment;
[0096] FIGS. 8A through 8C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the third
embodiment;
[0097] FIGS. 9A and 9B show a semiconductor light emitting device
according to a fourth embodiment of the present invention, of which
FIG. 9A is a cross-sectional view thereof and FIG. 9B is a plan
view thereof;
[0098] FIG. 10 is a graph showing an emission spectrum obtained
from the semiconductor light emitting device according to the
fourth embodiment;
[0099] FIGS. 11A through 11C are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the fourth
embodiment;
[0100] FIGS. 12A and 12B are cross-sectional views illustrating the
individual process steps of the method for fabricating the
semiconductor light emitting device according to the fourth
embodiment;
[0101] FIGS. 13A and 13B show a semiconductor light emitting device
according to a fifth embodiment of the present invention, of which
FIG. 13A is a cross-sectional view thereof and FIG. 13B is a plan
view thereof;
[0102] FIG. 14 is a graph showing an emission spectrum obtained
from the semiconductor light emitting device according to the fifth
embodiment;
[0103] FIGS. 15A through 15E are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the fifth
embodiment;
[0104] FIGS. 16A through 16C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the fifth
embodiment;
[0105] FIGS. 17A and 17B show a semiconductor light emitting device
according to a sixth embodiment of the present invention, of which
FIG. 17A is a cross-sectional view thereof and FIG. 17B is a plan
view thereof;
[0106] FIGS. 18A through 18D are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the sixth
embodiment;
[0107] FIGS. 19A through 19C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the sixth
embodiment;
[0108] FIG. 20 is a cross-sectional view showing a semiconductor
light emitting device according to a seventh embodiment of the
present invention;
[0109] FIG. 21 is a plan view showing the semiconductor light
emitting device according to the seventh embodiment;
[0110] FIG. 22 is a graph showing the concentration profile of Eu
ions used to dope a red light emitting Eu doped layer in the
semiconductor light emitting device according to the seventh
embodiment;
[0111] FIG. 23 is a graph showing an emission spectrum obtained
from the semiconductor light emitting device according to the
seventh embodiment;
[0112] FIGS. 24A through 24D are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the seventh
embodiment;
[0113] FIGS. 25A through 25C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the seventh
embodiment;
[0114] FIGS. 26A and 26B show a semiconductor light emitting device
according to an eighth embodiment of the present invention, of
which FIG. 26A is a cross-sectional view thereof and FIG. 26B is a
plan view thereof;
[0115] FIG. 27A is a graph showing voltage-current characteristics
in the presence and absence of a tunnel junction and FIG. 27B is a
graph showing current-light output characteristics in the presence
and absence of a tunnel junction;
[0116] FIG. 28 is a graph showing an emission spectrum obtained
from the semiconductor light emitting device according to the
eighth embodiment;
[0117] FIGS. 29A through 29E are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the eighth
embodiment;
[0118] FIGS. 30A and 30B show a semiconductor light emitting device
according to a ninth embodiment of the present invention, of which
FIG. 30A is a cross-sectional view thereof and FIG. 30B is a plan
view thereof;
[0119] FIG. 31 is a graph showing an emission spectrum obtained
from the semiconductor light emitting device according to the ninth
embodiment;
[0120] FIGS. 32A through 32D are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the ninth
embodiment;
[0121] FIGS. 33A and 33B show a semiconductor light emitting device
according to a tenth embodiment of the present invention, of which
FIG. 33A is a cross-sectional view thereof and FIG. 33B is a plan
view thereof;
[0122] FIGS. 34A through 34D are cross-sectional views illustrating
the individual process steps of a method for fabricating the
semiconductor light emitting device according to the tenth
embodiment;
[0123] FIGS. 35A through 35C are cross-sectional views illustrating
the individual process steps of the method for fabricating the
semiconductor light emitting device according to the tenth
embodiment;
[0124] FIG. 36 is a cross-sectional view showing a conventional
white light emitting diode; and
[0125] FIG. 37 is a graph showing an emission spectrum obtained
from the conventional white light emitting diode.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Embodiment 1
[0126] A first embodiment of the present invention will be
described with reference to the drawings.
[0127] FIG. 1A shows a cross-sectional structure of a semiconductor
light emitting device according to the first embodiment and FIG. 1B
shows a plan structure thereof.
[0128] As shown in FIGS. 1A and 1B, a semiconductor light emitting
device according to the first embodiment is composed of: a blue
light emitting diode 10 mounted at a specified position on a
package 20 as a mounting member; a red light emitting layer 15
grown epitaxially on the blue light emitting diode 10; and an
insulating material 19 containing an yttrium aluminum garnet (YAG)
fluorescent material. In FIG. 1B, the depiction of the insulating
material 19 is omitted.
[0129] The blue light emitting diode 10 is composed of: an n-type
semiconductor layer 12 made of n-type GaN; an active layer 13
having a multiple quantum well structure made of InGaN; and a
p-type semiconductor layer 14 made of p-type
Al.sub.0.05Ga.sub.0.95N which are epitaxially grown successively on
a substrate 11 made of, e.g., sapphire. The active layer 13 is
composed of three well layers each made of In.sub.0.35Ga.sub.0.65N
having a thickness of 2 nm and three barrier layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 10 nm which are
alternately stacked, thereby emitting blue light at 470 nm.
[0130] The red light emitting layer 15 is made of, e.g., undoped
In.sub.0.4Ga.sub.0.6N with a forbidden band width of 1.9 eV and
formed on the p-type semiconductor layer 14 to have a matrix
configuration of discrete and spaced-apart squares with 2-.mu.m to
20-.mu.m sides when viewed in a plan view. Each square of the red
light emitting layer 15 is excited by light outputted from the blue
light emitting diode 10 to emit red light at 650 nm. Red light can
be obtained from the red light emitting layer 15 by doping the red
light emitting layer 15 with, e.g., zinc (Zn) and thereby reducing
the composition of In, magnesium (Mg), or silicon (Si). By thus
reducing the composition of In, a lattice mismatch with an underlie
layer made of GaN normally used can be suppressed and crystal
defects in the red light emitting layer 15 can be reduced so that
high-brightness light emission is enabled. At this time, the
emission light released from the red light emitting layer 15 is
mixed with excitation light in a visible range which is generated
via an energy level resulting from the impurity used for
doping.
[0131] A transparent electrode 16 made of ITO (Indium Tin Oxide)
has been formed over the entire surface of the p-type semiconductor
layer 14 including the red light emitting layer 15. In addition, a
p-side electrode 17 made of gold (Au) has been formed selectively
on a region of the p-type semiconductor layer 14 via the
transparent electrode 16.
[0132] The n-type semiconductor layer 12 has a portion thereof
exposed and an n-side electrode 18 composed of a multilayer film of
titanium (Ti) and gold (Au) has been formed on the exposed
region.
[0133] It is to be noted that required metal fine lines are
connected by wire bonding to the p-side and n-side electrodes 17
and 18, thought they are not depicted.
[0134] The insulating material 19 containing the YAG fluorescent
material has been formed in such a manner that it is coated or
applied dropwise onto the package 20 to cover the blue light
emitting diode 10, the transparent electrode 16, the p-side
electrode 17, and the n-side electrode 18. The insulating material
19 is excited by the blue light outputted from the blue light
emitting diode 10 and emits yellow light.
[0135] Film forming conditions for the transparent electrode 16
have been optimized such that the transparent electrode 16 does not
absorb the blue light from the blue light emitting diode 10 and a
contact resistance with the p-type semiconductor layer 14 becomes,
e.g., 1.times.10.sup.-3 .OMEGA.cm.sup.2 or less.
[0136] A current is injected into the blue light emitting diode 10
via the p-side electrode 17, the transparent electrode 16, and the
p-type semiconductor layer 14. The blue light emitting diode 10 is
capable of operating at a relatively low voltage of, e.g., about 3
V. Accordingly, white light having the spectrum shown in FIG. 2 can
be obtained by injecting a current of, e.g., 20 mA into the blue
light emitting diode 10 and thereby causing the emission of blue
light at a wavelength of 470 nm. In FIG. 2, the emission spectrum
is composed of the transmitted component 10A of the blue light at a
wavelength of 470 nm, yellow light 19A with a peak wavelength of
550 nm from the YAG fluorescent material, and red light 15A at a
wavelength of 650 nm from the red light emitting layer 15. The blue
light 10A, the yellow light 19A, and the red light 15A are mixed to
provide white light.
[0137] Thus, the first embodiment allows one-chip integration of a
light emitting diode in which the red light emitting layer 15 which
receives blue light outputted from the blue light emitting diode 10
and emits red light through excitation caused thereby is provided
between the insulating material 19 containing the YAG fluorescent
material which emits yellow light and the blue light emitting diode
10 which emits blue light. Accordingly, the intensity of emission
light in the red range is higher than in an emission spectrum
obtained from the conventional white light emitting diode shown in
FIG. 23 which provides white light by exciting the YAG fluorescent
material with blue light from the blue light emitting diode. This
allows a white light emitting diode which outputs white light
having an excellent color rendering property to be provided.
[0138] The blue light emitting diode 10 may also be formed with an
underlie layer made of GaN and a thin-film buffer layer made of GaN
or AlN being interposed between the substrate 11 made of sapphire
and the n-type semiconductor layer 12.
[0139] The active layer 13 may also be constituted to have the
composition of In which is nonuniform in the in-plane direction
(direction parallel to a substrate surface) of the active layer
13.
[0140] Instead of varying a lattice constant in each of the n-type
semiconductor layer 12, the active layer 13, the p-type
semiconductor layer 14, and the read semiconductor layer 15 which
have been formed on the substrate 11, the composition of a group
III element in a quaternary or higher-order mixed crystal may also
be varied in forming the blue light emitting diode 10 and the red
light emitting layer 15. This provides a structure from which
high-brightness light emission can be obtained without incurring a
crystal defect due to a lattice mismatch and the resulting
nonradiative recombination.
[0141] In the first embodiment, the YAG fluorescent material and
the red light emitting layer 15 are excited by the output light
received thereby from the blue light emitting diode 10 and emit
yellow light and red light, respectively, thereby providing white
light. However, an ultraviolet light emitting diode which output
ultraviolet light at a wavelength of, e.g., 340 nm may also be
formed in place of the blue light emitting diode 10. In this case,
a blue light emitting fluorescent material and a green light
emitting fluorescent material are added to the insulating material
19.
[0142] It is also possible to separate the substrate 11 made of
sapphire from the blue light emitting diode 10 and provide a metal
film in place of the separated substrate. The arrangement allows
the use of the provided metal film as an n-side electrode and
obviates the necessity to form the n-side electrode 18 by exposing
the n-type semiconductor layer 12.
[0143] Instead of ITO, a translucent multilayer film made of nickel
(Ni) and gold (Au) which are stacked in layers may also be used to
form the transparent electrode 16.
[0144] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0145] FIGS. 3A through 3C and FIGS. 4A through 4C show the
cross-sectional structures of the semiconductor light emitting
device according to the first embodiment in the individual process
steps of the fabrication method therefor. The drawings show, of a
wafer on which a plurality of semiconductor light elements can be
formed simultaneously, only one element formation region.
[0146] First, as shown in FIG. 3A, the n-type semiconductor layer
12 made of n-type GaN, the active layer 13 having a multiple
quantum well structure made of InGaN, the p-type semiconductor
layer 14 made of p-type Al.sub.0-05Ga.sub.0.95N, and the red light
emitting layer 15 made of undoped In.sub.0.4Ga.sub.0.6N are grown
successively by MOCVD (Metal Organic Chemical Vapor Deposition) on
the substrate 11 made of sapphire having a principal surface of
which the plane orientation is, e.g., the (0001) plane. As
described above, the active layer 13 is composed of the three
quantum well layers each made of In.sub.0.35Ga.sub.0.65N having a
thickness of 2 nm and the three barrier layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 10 nm, which are
alternately stacked. However, the structure of the active layer 13
is not limited thereto provided that the emission wavelength is
about 470 nM. It is possible to form an underlie layer made of GaN
and a thin-film buffer layer made of GaN or AlN between the
substrate 11 and the n-type semiconductor layer 12. It is also
possible to form the active layer 13 such that the composition of
In is nonuniform in the in-plane direction (direction parallel to
the substrate surface) of the active layer 13. It is also possible
to obtain red emission light by using InGaN doped with, e.g., zinc,
magnesium, or silicon, instead of using undoped
In.sub.0.4Ga.sub.0.6N, and thereby forming the red light emitting
layer 15 such that the composition of In is lower than 0.4.
[0147] Next, as shown in FIG. 3B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 15.
Subsequently, the red light emitting layer 15 and an upper portion
of the p-type semiconductor layer 14 are selectively removed by ICP
(Inductive Coupled Plasma) etching using, e.g., a chlorine
(Cl.sub.2) gas by using the formed metal thin film as a mask. At
this stage, the portion of the red light emitting layer 15
overlying the p-side electrode formation region is also
removed.
[0148] Next, as shown in FIG. 3C, the metal thin film for the mask
is removed and then the transparent electrode 16 which is made of
ITO with a thickness of about 300 nm and transmits visible light is
formed by, e.g., radio-frequency (RF) sputtering over the
selectively exposed portions of the p-type semiconductor layer 14
and the red light emitting layer 15 that has been divided into the
plurality of islands each configured as a square when viewed in a
plan view. Subsequently, the portion of the transparent electrode
16 overlying the n-side electrode formation region is removed by
wet etching using, e.g., an aqueous hydrogen chloride (HCl)
solution. Thereafter, a thermal process is performed in an oxygen
atmosphere at a temperature of, e.g., about 600.degree. C., thereby
reducing the contact resistance and the resistivity of the
transparent electrode 16 and improving the transmittance
thereof.
[0149] Next, as shown in FIG. 4A, the respective portions of the
p-type semiconductor layer 14 and the active layer 13 each
overlying the n-side electrode formation region 12a are selectively
removed by ICP etching, whereby the n-side electrode formation
region 12a of the n-type semiconductor layer 12 is exposed.
[0150] Next, as shown in FIG. 4B, the n-side electrode 18 as an
ohmic electrode composed of a multilayer film of titanium (Ti) and
gold (Au) is formed by, e.g., sputtering on the n-side electrode
formation region 12a of the n-type semiconductor layer 12.
Thereafter, sintering may also be performed appropriately in a
nitrogen atmosphere at a temperature of, e.g., about 550.degree. C.
to reduce the contact resistance of the n-side electrode 18.
Subsequently, the p-side electrode 17 made of gold (Au) and serving
as a p-side electrode pad is formed selectively by, e.g.,
sputtering on the p-side electrode formation region of the
transparent electrode 16. The order in which the n-side electrode
18 and the p-side electrode 17 are formed may also be reversed.
[0151] Next, as shown in FIG. 4C, after the formation of the p-side
electrode 17, the resulting structure is divided into light
emitting diode chips each having a 350-.mu.m square size by, e.g.,
dicing. Subsequently, each of the chips resulting from the division
is mounted on the specified region of the package 20 by using,
e.g., a silver (Ag) paste. Thereafter, wire bonding is performed
with respect to the p-side electrode 17 and the n-side electrode 18
and the insulating material 19 containing a YAG fluorescent
material is further applied to cover the chip.
[0152] Thus, the fabrication method according to the first
embodiment allows one-chip integration of a white light emitting
diode in which the red light emitting layer 15 and the YAG
fluorescent material are excited by the blue light from the blue
light emitting diode 10. This enables the intensity of emission
light in the red range to be higher than in the conventional white
light emitting diode. As a result, it becomes possible to provide a
white light emitting diode which outputs white light having an
excellent color rendering property.
Embodiment 2
[0153] A second embodiment of the present invention will be
described with reference to the drawings.
[0154] FIG. 5 shows a cross-sectional structure of a semiconductor
light emitting device according to the second embodiment. The
description of the components shown in FIG. 5 which are the same as
those shown in FIG. 1A will be omitted by retaining the same
reference numerals.
[0155] As shown in FIG. 5, the blue light emitting diode 10 in
which the red light emitting layer 15 is formed selectively on the
p-type semiconductor layer 14 is mounted by so-called flip-chip
mounting such that the red light emitting layer 15 is opposed to
the mounting surface of the package 20.
[0156] The p-type semiconductor layer 14 and the red light emitting
layer 15 are connected electrically to the p-side electrode pad
(not shown) of the package 20 by the p-side electrode 17 made of a
multilayer film of platinum (Pt) and gold (Au) and a first bump 22
made of silver. On the other hand, the n-side electrode 18 is
connected electrically to the n-side electrode pad (not shown) of
the package 20 by a second bump 23 made of silver (Ag). The blue
light emitting diode 10 containing the red light emitting layer 15
is covered with the insulating material 19 containing a YAG
fluorescent material.
[0157] Thus, in the semiconductor light emitting device according
to the second embodiment, the blue light from the active layer 13
and the red light emitted from the red light emitting layer 15
through excitation caused by the blue light is released upward
through the substrate 11 made of sapphire. In addition, the blue
light outputted from the active layer 13 excites a YAG fluorescent
material and the excited YAG fluorescent material emits yellow
light, as stated previously.
[0158] Consequently, even in the structure in which output light is
extracted from the substrate 11 due to flip-chip mounting, the red
light emitting layer 15 provided in the blue light emitting diode
10 allows the enhancement of an amount of emission light in the red
range. As a result, it becomes possible to provide a white light
emitting diode which outputs white light having an excellent color
rendering property.
[0159] In addition, the structure in which output light is
extracted from the substrate 11 according to the second embodiment
obviates the necessity to provide the transparent electrode 16 on
the surface of the p-side semiconductor layer 14.
Embodiment 3
[0160] A third embodiment of the present invention will be
described with reference to the drawings.
[0161] FIG. 6A shows a cross-sectional structure of a semiconductor
light emitting device according to the third embodiment and FIG. 6B
shows a plan structure thereof. The description of the components
shown in FIGS. 6A and 6B which are the same as those shown in FIGS.
1A and 1B will be omitted by retaining the same reference
numerals.
[0162] As shown in FIGS. 6A and 6B, the semiconductor light
emitting device according to the third embodiment is composed of:
the blue light emitting diode 10 mounted at a specified position on
the package 20 as a mounting member; the red light emitting layer
15 grown epitaxially on the blue light emitting diode 10; and the
insulating material 19 containing an yttrium aluminum garnet (YAG)
fluorescent material.
[0163] The third embodiment is different from the first embodiment
in that the transparent electrode 16 made of ITO covers only the
upper surface of the p-type semiconductor layer 14 without covering
the red light emitting layer 15. Accordingly, an emission spectrum
obtained from the semiconductor light emitting device according to
the third embodiment shows a spectrum pattern equal to the pattern
shown in FIG. 2.
[0164] Thus, one-chip integration of the light emitting device is
realized in which the red light emitting layer 15 and the YAG
fluorescent material are excited by the blue light from the blue
light emitting diode 10. This allows the enhancement of an amount
of emission light in the red range to a value larger than in the
conventional white light emitting diode which provides white light
by exciting the YAG fluorescent material with the light emitted
from the blue light emitting diode. As a result, it becomes
possible to provide a white light emitting diode having an
excellent white color rendering property. In addition, since the
red light emitting layer 15 is not covered with the transparent
electrode 16, the red light is no more absorbed by the transparent
electrode 16 so that red emission light with a higher intensity is
obtainable. This allows a white light emitting diode having a more
excellent color rendering property to be provided.
[0165] Preferably, the size of the red light emitting layer 15
having a pattern consisting of discrete islands each configured as
a square when viewed in a plan view is determined to allow a
current injected from the transparent electrode 16 into the p-type
semiconductor layer 14 to be sufficiently diffused in the active
layer 13.
[0166] In the third embodiment also, an ultraviolet light emitting
diode which outputs ultraviolet light at a wavelength of, e.g., 340
nm may also be formed in place of the blue light emitting diode 10.
In this case, a blue light emitting fluorescent material and a
green light emitting fluorescent material are added to the
insulating material 19.
[0167] It is also possible to separate the substrate 11 made of
sapphire from the blue light emitting diode 10 and provide a metal
film in place of the separated substrate. The arrangement allows
the provided metal film to be used as an n-side electrode and
obviates the necessity to form the n-side electrode 18 by exposing
the n-type semiconductor layer 12.
[0168] Instead of ITO, a translucent multilayer film composed of
nickel (Ni) and gold (Au) which are stacked in layers may also be
used to form the transparent electrode 16. Alternatively, the
transparent electrode 16 may also be composed of a multilayer film
of Ni and ITO.
[0169] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0170] FIGS. 7A through 7D and FIGS. 5A through 5C show the
cross-sectional structures of the semiconductor light emitting
device according to the third embodiment in the individual process
steps of the fabrication method therefor.
[0171] First, as shown in FIG. 7A, the n-type semiconductor layer
12 made of n-type GaN, the active layer 13 having a multiple
quantum well structure made of InGaN, the p-type semiconductor
layer 14 made of p-type Al.sub.0.05Ga.sub.0.95N, and the red light
emitting layer 15 made of undoped In.sub.0.4Ga.sub.0.6N are grown
successively by MOCVD on the substrate 11 made of sapphire having a
principal surface of which the plane orientation is, e.g., the
(0001) plane. The active layer 13 is composed of three quantum well
layers each made of In.sub.0.35Ga.sub.0.65N having a thickness of 2
nm and three barrier layers each made of In.sub.0.02Ga.sub.0.98N
having a thickness of 10 nm, which are alternately stacked.
However, the structure of the active layer 13 is not limited
thereto provided that the emission wavelength is about 470 nm. It
is possible to form an underlie layer made of GaN and a thin-film
buffer layer made of GaN or AlN between the substrate 11 and the
n-type semiconductor layer 12. It is also possible to form the
active layer 13 such that the composition of In is nonuniform in
the in-plane direction (direction parallel to the substrate
surface) of the active layer 13. It is also possible to obtain red
emission light by using InGaN doped with, e.g., zinc, magnesium, or
silicon, instead of using undoped In.sub.0.4Ga.sub.0.6N, and
thereby forming the red light emitting layer 15 such that the
composition of In is lower than 0.4.
[0172] Next, as shown in FIG. 7B, a resist film 51 having a pattern
consisting of a plurality of discrete and spaced-apart squares each
having, e.g., 2-.mu.m to 20-.mu.m sides is formed on the red light
emitting layer 15. Subsequently, the red light emitting layer 15
and an upper portion of the p-type semiconductor layer 14 are
selectively removed by ICP dry etching using, e.g., a chlorine
(Cl.sub.2) gas by using the formed resist film 51 as a mask. At
this stage, the portion of the red light emitting layer 15
overlying the p-side electrode formation region is also
removed.
[0173] Next, as shown in FIG. 7C, the transparent electrode 16
which is made of ITO with a thickness of about 300 nm and transmits
visible light is formed by, e.g., electron beam vapor deposition on
each of the selectively exposed portions of the p-type
semiconductor layer 14 including the red light emitting layer 15
that has been divided into the plurality of islands each configured
as a square when viewed in a plan view and the resist film 51
covering the individual islands of the red light emitting layer
15.
[0174] Next, as shown in FIG. 7D, the transparent electrode 16
formed selectively only on the p-type semiconductor layer 14 is
obtained by a so-called lift-off process which removes the resist
film 51. Subsequently, the portion of the transparent electrode 16
overlying the n-side electrode formation region is removed by wet
etching using, e.g., an aqueous hydrogen chloride (HCl) solution.
Thereafter, a thermal process is performed in an oxygen atmosphere
at a temperature of, e.g., about 600.degree. C., thereby reducing
the contact resistance and the resistivity of the transparent
electrode 16 and improving the transmittance thereof.
[0175] Next, as shown in FIG. 8A, the respective portions of the
p-type semiconductor layer 14 and the active layer 13 overlying the
n-side electrode formation region 12a is selectively removed by ICP
etching, whereby the n-side electrode formation region 12a of the
n-type semiconductor layer 12 is exposed.
[0176] Next, as shown in FIG. 5B, the n-side electrode 18 as an
ohmic electrode composed of a multilayer film of titanium (Ti) and
gold (Au) is formed by, e.g., sputtering on the n-side electrode
formation region 12a of the n-type semiconductor layer 12.
Thereafter, sintering may also be performed appropriately to reduce
the contact resistance of the n-side electrode 18 in a nitrogen
atmosphere at a temperature of, e.g., about 550.degree. C.
Subsequently, the p-side electrode 17 made of gold (Au) and serving
as a p-side electrode pad is formed selectively by, e.g.,
sputtering on the p-side electrode formation region of the
transparent electrode 16. The order in which the n-side electrode
18 and the p-side electrode 17 are formed may also be reversed.
[0177] Next, as shown in FIG. 8C, the p-side electrode 17 is formed
and then divided into light emitting diode chips each having a
350-.mu.m square size by, e.g., dicing. Subsequently, each of the
chips resulting from the division is mounted on the specified
region of the package 20 by using, e.g., a silver (Ag) paste.
Thereafter, wire bonding is performed with respect to the p-side
electrode 17 and the n-side electrode 18 and the insulating
material 19 containing a YAG fluorescent material is further
applied to cover the chip.
[0178] Thus, the fabrication method according to the third
embodiment allows one-chip integration of a white light emitting
diode in which the red light emitting layer 15 and the YAG
fluorescent material are excited by the blue light outputted from
the blue light emitting diode 10. This enables the intensity of
emission light in the red range to be higher than in the
conventional white light emitting diode. As a result, it becomes
possible to provide a white light emitting diode which outputs
white light having an excellent color rendering property.
[0179] In addition, since the red light emitting layer 15 is not
covered with the transparent electrode 16, there is no more
absorption of the red light by the transparent electrode 16 so that
red emission light with a higher intensity is obtainable. This
provides white light having a more excellent color rendering
property.
Embodiment 4
[0180] A fourth embodiment of the present invention will be
described with reference to the drawings.
[0181] FIG. 9A shows a cross-sectional structure of a semiconductor
light emitting device according to the fourth embodiment and FIG.
9B shows a plan structure thereof. The description of the
components shown in FIGS. 9A and 9B which are the same as those
shown in FIGS. 1A and 1B will be omitted by retaining the same
reference numerals.
[0182] As shown in FIGS. 9A and 9B, the semiconductor light
emitting device according to the fourth embodiment is composed of:
the blue light emitting diode 10; a green light emitting layer 24
grown epitaxially on the blue light emitting diode 10; and the red
light emitting layer 15 grown epitaxially on the green light
emitting layer 24.
[0183] The fourth embodiment is different from the first embodiment
in that it provides the green light emitting layer 24 which is made
of In.sub.0.2Ga.sub.0.5N and excited by blue light at a wavelength
of 470 nm emitted from the blue light emitting diode 10 to emit
green light at a wavelength of 555 nm and thereby obviates the
necessity for the insulating material 19 covering the blue light
emitting diode 10 and containing a YAG fluorescent material which
emits yellow light.
[0184] Green light and red light can be obtained from the green
light emitting layer 24 and the red light emitting layer 15 by
doping each of the red light emitting layer 15 and the green light
emitting layer 24 with, e.g., zinc (Zn), magnesium (Mg), or silicon
(Si) and thereby reducing the composition of In in each of the
light emitting layers. By thus reducing the composition of In, a
lattice mismatch with an underlie layer made of GaN normally used
can be suppressed and crystal defects in the green light emitting
layer 24 and the red light emitting layer 15 can be reduced so that
high-brightness light emission is enabled.
[0185] White light having the spectrum shown in FIG. 10 can be
obtained by injecting a current of, e.g., 20 mA into the blue light
emitting diode 10 and thereby causing the emission of blue light at
a wavelength of 470 nm. In FIG. 10, the emission spectrum is
composed of the transmitted component 10A of the blue light at a
wavelength of 470 nm, green emission light 24A with a peak
wavelength of 555 nm from the green light emitting layer 24, and
the red light 15A at a wavelength of 650 nm from the red light
emitting layer 15. The blue light 10A, the green light 24A, and the
red light 15A are mixed to provide white light.
[0186] Thus, the fourth embodiment allows one-chip integration of a
light emitting diode in which the green light emitting layer 24 and
the red light emitting layer 15 which receive blue light outputted
from the blue light emitting diode 10 and generate green light and
red light through excitation caused by the received blue light are
provided on the blue light emitting diode 10. Accordingly, the
intensity of emission light in the red range is higher than in an
emission spectrum obtained from the conventional white light
emitting diode which provides white light by exciting the YAG
fluorescent material with blue light from the blue light emitting
diode. This allows a white light emitting diode which outputs white
light having an excellent color rendering property to be
provided.
[0187] Although white light has been obtained in the fourth
embodiment through the reception of the output light from the blue
light emitting diode 10, the excitation of the green light emitting
layer 24 and the red light emitting layer 15, and the emission of
green light and red light therefrom, an ultraviolet light emitting
diode which outputs ultraviolet light at a wavelength of, e.g., 340
nm may also be formed in place of the blue light emitting diode 10.
In this case, the ultraviolet light emitting diode is covered with
an insulating material containing a blue light emitting fluorescent
material.
[0188] It is also possible to separate the substrate 11 made of
sapphire from the blue light emitting diode 10 and provide a metal
film in place of the separated substrate. The arrangement allows
the provided metal film to be used as an n-side electrode and
obviates the necessity to form the n-side electrode 18 by exposing
the n-type semiconductor layer 12.
[0189] Instead of ITO, a translucent multilayer film composed of
nickel (Ni) and gold (Au) which are stacked in layers may also be
used to form the transparent electrode 16. Alternatively, the
transparent electrode 16 may also be composed of a multilayer film
of Ni and ITO.
[0190] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0191] FIGS. 11A through 11C and FIGS. 12A and 12B show the
cross-sectional structures of the semiconductor light emitting
device according to the fourth embodiment in the individual process
steps of the fabrication method therefor.
[0192] First, as shown in FIG. 11A, the n-type semiconductor layer
12 made of n-type GaN, the active layer 13 having a multiple
quantum well structure made of InGaN, the p-type semiconductor
layer 14 made of p-type Al.sub.0.05Ga.sub.0.95N, the green light
emitting layer 24 made of undoped In.sub.0.02Ga.sub.0.8N, and the
red light emitting layer 15 made of undoped In.sub.0.4Ga.sub.0.6N
are grown successively by MOCVD on the substrate 11 made of
sapphire having a principal surface of which the plane orientation
is, e.g., the (0001) plane. The active layer 13 is composed of
three quantum well layers each made of In.sub.0.35Ga.sub.0.65N
having a thickness of 2 nm and three barrier layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 10 nm, which are
alternately stacked. However, the structure of the active layer 13
is not limited thereto provided that the emission wavelength is
about 470 nm. The forbidden band width of the green light emitting
layer 24 is 2.3 eV and emits green light at 555 nm. The forbidden
band width of the red light emitting layer 15 is 1.9 eV and emits
red light at 650 nm. It is possible to form an underlie layer made
of GaN and a thin-film buffer layer made of GaN or AlN between the
substrate 11 and the n-type semiconductor layer 12. It is also
possible to obtain green emission light and red emission light by
using InGaN doped with, e.g., zinc, magnesium, or silicon, instead
of using undoped In.sub.0.2Ga.sub.0.8N and In.sub.0.4Ga.sub.0.6N,
and thereby forming the green light emitting layer 24 and the red
light emitting layer 15 such that the composition of In is lower
than 0.2 and 0.4, respectively.
[0193] Next, as shown in FIG. 11B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 15.
Subsequently, the red light emitting layer 15, the green light
emitting layer 24, and an upper portion of the p-type semiconductor
layer 14 are selectively removed by ICP etching using, e.g., a
chlorine (Cl.sub.2) gas by using the formed metal thin film as a
mask. At this stage, the respective portions of the red light
emitting layer 15 and the green light emitting layer 24 overlying
the p-side electrode formation region are also removed.
[0194] Next, as shown in FIG. 11C, the metal thin film is removed
and then the transparent electrode 16 which is made of ITO with a
thickness of about 300 mm and transmits visible light is formed by,
e.g., RF sputtering over the selectively exposed portions of the
p-type semiconductor layer 14 and the red light emitting layer 15
that has been divided into the plurality of islands each configured
as a square when viewed in a plan view. Subsequently, the portion
of the transparent electrode 16 overlying the n-side electrode
formation region is removed by wet etching using, e.g., an aqueous
hydrogen chloride (HCl) solution. Thereafter, a thermal process is
performed in an oxygen atmosphere at a temperature of, e.g., about
600.degree. C., thereby reducing the contact resistance and the
resistivity of the transparent electrode 16 and improving the
transmittance thereof.
[0195] Next, as shown in FIG. 12A, the respective portions of the
p-type semiconductor layer 14 and the active layer 13 overlying the
n-side electrode formation region 12a are selectively removed by
ICP etching, whereby the n-side electrode formation region 12a of
the n-type semiconductor layer 12 is exposed.
[0196] Next, as shown in FIG. 12B, the n-side electrode 18 as an
ohmic electrode composed of a multilayer film of titanium (Ti) and
gold (Au) is formed by, e.g., sputtering on the exposed n-side
electrode formation region 12a of the n-type semiconductor layer
12. Thereafter, sintering may also be performed appropriately to
reduce the contact resistance of the n-side electrode 18 in a
nitrogen atmosphere at a temperature of, e.g., about 550.degree. C.
Subsequently, the p-side electrode 17 made of gold (Au) and serving
as a p-side electrode pad is formed selectively by, e.g.,
sputtering on the p-side electrode formation region of the
transparent electrode 16. The order in which the n-side electrode
18 and the p-side electrode 17 are formed may also be reversed.
Thereafter, the resulting structure is divided into light emitting
diode chips each having a 350-.mu.m square size by, e.g., dicing.
Subsequently, each of the chips resulting from the division is
mounted on the specified region of a package (not shown) by using,
e.g., a silver (Ag) paste. Thereafter, wire bonding is performed
with respect to the p-side electrode 17 and the n-side electrode
18.
[0197] Thus, the fabrication method according to the fourth
embodiment allows one-chip integration of a white light emitting
diode in which the green light emitting layer 24 and the red light
emitting layer 15 are excited by the blue light from the blue light
emitting diode 10. This enables the intensity of emission light in
the red range to be higher than in the conventional white light
emitting diode. As a result, it becomes possible to provide a white
light emitting diode which outputs white light having an excellent
color rendering property.
[0198] In addition, the step of applying the insulating material
containing the YAG fluorescent material can be eliminated so that
the fabrication process is simplified.
Embodiment 5
[0199] A fifth embodiment of the present invention will be
described with reference to the drawings.
[0200] FIG. 13A shows a cross-sectional structure of a
semiconductor light emitting device according to the fifth
embodiment and FIG. 13B shows a plan structure thereof.
[0201] As shown in FIGS. 13A and 13B, the semiconductor light
emitting device according to the fifth embodiment is composed of:
an ultraviolet light emitting diode 30; a blue light emitting layer
25; the green light emitting layer 24; and the red light emitting
layer 15, each of which has been grown epitaxially on the
ultraviolet light emitting diode 30.
[0202] The ultraviolet light emitting diode 30 is composed of: an
n-type semiconductor layer 32 made of, e.g., n-type
Al.sub.0.1Ga.sub.0.9N; an active layer 33 having a multiple quantum
well structure made of InGaN and AlGaN; and a p-type semiconductor
layer 34 made of p-type Al.sub.0.15Ga.sub.0.85N. The active layer
33 is composed of five well layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 1.5 nm and five
barrier layers each made of Al.sub.0.15Ga.sub.0.05N having a
thickness of 10 nm which are alternately stacked, thereby emitting
ultraviolet light at 340 nm.
[0203] The n-side electrode 18 composed of a multilayer structure
of titanium (Ti) and gold (Au) has been formed on the entire
surface of the n-type semiconductor layer 32 opposite to the active
layer 33. A plating layer 31 made of gold (Au) with a thickness of
10 .mu.m or more, e.g., about 50 .mu.m has been formed on the
entire surface of the n-side electrode 18 opposite to the n-type
semiconductor layer 32 to substantially function as the n-side
electrode. Preferably, a material having a reflectivity of 60% or
more with respect to ultraviolet light, blue light, green light,
and red light is used herein for the n-side electrode 18. For
example, a single layer film made of, e.g., gold (Au), platinum
(Pt), copper (Cu), silver (Ag), or rhodium (Rh) or a multilayer
film containing at least two of the foregoing elements can be used.
For the gold plating layer 31, copper (Cu) or silver (Ag) can be
used instead of gold (Au).
[0204] The blue light emitting layer 25 is made of, e.g., undoped
In.sub.0.15Ga.sub.0.85N with a forbidden band width of 2.6 eV and
formed on the p-type semiconductor layer 34 to have a configuration
consisting of a plurality of discrete and spaced-apart islands. The
green light emitting layer 24 is made of, e.g., undoped
In.sub.0.2Ga.sub.0.8N with a forbidden band width of 2.2 eV and
formed on the blue light emitting layer 25 to have the same plan
configuration as the blue light emitting layer 25. The red light
emitting layer 15 is made of, e.g., undoped In.sub.0.4Ga.sub.0.6N
with a forbidden band width of 1.9 eV and formed on the green light
emitting layer 24 to have the same plan configuration as the green
light emitting layer 24. The blue light emitting layer 25, the
green light emitting layer 24, and the red light emitting layer 15
are excited by the ultraviolet light outputted from the ultraviolet
light emitting diode 30 to emit blue light at a wavelength of 470
nm, green light at a wavelength of 555 nm, and red light at a
wavelength of 650 nm. Blue light emission, green light emission,
and red light emission can be obtained from the blue light emitting
layer 25, the green light emitting layer 24, and the red light
emitting layer 15 by doping each of the blue light emitting layer
25, the green light emitting layer 24, and the red light emitting
layer 15 with, e.g., zinc (Zn), magnesium (Mg), or silicon (Si) and
thereby reducing the composition of In in each of the light
emitting layers. By thus reducing the composition of In, a lattice
mismatch with an underlie layer made of GaN normally used can be
suppressed and crystal defects in the blue light emitting layer 25,
in the green light emitting layer 24, and in the red light emitting
layer 15 can be reduced so that high-brightness light emission is
enabled.
[0205] On the entire surface of the p-type semiconductor layer 34
including the blue light emitting layer 25, the green light
emitting layer 24, and the red light emitting layer 15, the
transparent electrode made of ITO has been formed. Further, the
p-side electrode 17 made of gold (Au) has been formed on a region
of the p-type semiconductor layer 34 with the transparent electrode
16 being interposed therebetween.
[0206] A current is injected into the ultraviolet light emitting
diode 30 via the p-side electrode 17, the transparent electrode 16,
and the p-type semiconductor layer 34. The ultraviolet light
emitting diode 30 is capable of operating at a relatively low
voltage of, e.g., about 3 V. Accordingly, white light having the
spectrum shown in FIG. 14 can be obtained by injecting a current
of, e.g., 20 mA into the ultraviolet light emitting diode 30 and
thereby causing the emission of ultraviolet light at a wavelength
of 340 .mu.m. In FIG. 14, the emission spectrum is composed of the
transmitted component 30A of the ultraviolet light at a wavelength
of 340 nm which is low in intensity, blue light 25A with a peak
wavelength of 470 nm from the blue light emitting layer 25, green
light 24A with a peak wavelength of 555 nm from the green light
emitting layer 24, and the red light 15A at a wavelength of 650 nm
from the red light emitting layer 15. The blue light 25A, the green
light 24A, and the red light 15A are mixed to provide white
light.
[0207] The fifth embodiment is characterized in that the n-side
electrode 18 is formed over the entire surface (back surface) of
the n-type semiconductor layer 32 opposite to the active layer 33
by removing the substrate made of sapphire for epitaxial growth and
the gold plating layer 31 is further provided. The arrangement
remarkably improves the heat dissipation property of the
ultraviolet light emitting diode 30 and allows a higher-output
white light emitting diode to be provided. In addition, since the
n-side electrode 18 and the p-side electrode 17 are disposed in
opposing relation with the active layer 33 interposed therebetween,
a series resistance between the n-side electrode 18 and the p-side
electrode 17 can be reduced advantageously. Since the insulating
substrate made of sapphire or the like has been removed, it is
unnecessary to provide the n-side electrode 18 on the upper portion
of the n-type semiconductor layer 32. This achieves a reduction in
chip size and allows the elimination of the step of etching away
the n-side semiconductor layer 32 from the side of the p-type
semiconductor layer 34.
[0208] Thus, the fifth embodiment allows one-chip integration of a
light emitting diode in which the blue light emitting layer 25, the
green light emitting layer 24, and the red light emitting layer 15
which receive ultraviolet light outputted from the ultraviolet
light emitting diode 30 and generate blue light, green light, and
red light through excitation caused by the received ultraviolet
light are provided on the ultraviolet light emitting diode 30.
Accordingly, the intensity of emission light in the red range is
higher than in an emission spectrum obtained from the conventional
white light emitting diode which provides white light by exciting
the YAG fluorescent material with blue light from the blue light
emitting diode. This allows a white light emitting diode which
outputs white light having an excellent color rendering property to
be implemented.
[0209] In addition, the substrate made of sapphire which is not
excellent in heat dissipation property is removed and the gold
plating layer 31 which is excellent in heat dissipation property is
provided in place thereof. As a result, a white light emitting
diode featuring a higher output and an excellent color rending
property can be provided.
[0210] In the case where the ultraviolet light emitting diode 30 is
replaced with the blue light emitting diode 10 used in the fourth
embodiment, the blue light emitting layer 25 need not be
provided.
[0211] Instead of ITO, a translucent multilayer film composed of
nickel (Ni) and gold (Au) which are stacked in layers may also be
used to form the transparent electrode 16. Alternatively, the
transparent electrode 16 may also be composed of a multilayer film
of Ni and ITO.
[0212] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0213] FIGS. 15A through 15E and FIGS. 16A through 16C show the
cross-sectional structures of the semiconductor light emitting
device according to the fifth embodiment in the individual process
steps of the fabrication method therefor.
[0214] First, as shown in FIG. 15A, the n-type semiconductor layer
32 made of n-type Al.sub.0.1Ga.sub.0.9N, the active layer 33 having
a multiple quantum well structure made of InGaN and AlGaN, the
p-type semiconductor layer 34 made of p-type
Al.sub.0.15Ga.sub.0.85N, the blue light emitting layer 25 made of
undoped In.sub.0.15Ga.sub.0.85N, the green light emitting layer 24
made of undoped In.sub.0.2Ga.sub.0.8N, and the red light emitting
layer 15 made of undoped In.sub.0.4Ga.sub.0.6N are grown
successively by MOCVD on the substrate 11 made of sapphire having a
principal surface of which the plane orientation is, e.g., the
(0001) plane. The active layer 33 is composed of five quantum well
layers each made of In.sub.0.2Ga.sub.0.98N having a thickness of
1.5 nm and five barrier layers each made of Al.sub.0.15Ga.sub.0.85N
having a thickness of 10 nm, which are alternately stacked.
However, the structure of the active layer 33 is not limited
thereto provided that the emission wavelength is about 470-nm. The
forbidden band width of the blue light emitting layer 25 is 2.6 eV
and emits blue light at 340 nm. The forbidden band width of the
green light emitting layer 24 is 2.3 eV and emits green light at
555 nm. The forbidden band width of the red light emitting layer 15
is 1.9 eV and emits red light at 650 nm. It is possible to form an
underlie layer made of GaN and a thin-film buffer layer made of GaN
or AlN between the substrate 11 and the n-type semiconductor layer
32. It is also possible to obtain blue light emission, green light
emission, and red light emission by using InGaN doped with, e.g.,
zinc, magnesium, or silicon in which the composition of In is lower
than 0.2, instead of using undoped In.sub.0.15Ga.sub.0.85N,
In.sub.0.2Ga.sub.0.8N, and In.sub.0.4Ga.sub.0.6N, and thereby
forming the blue light emitting layer 25, the green light emitting
layer 24, and the red light emitting layer 15 such that the
composition of In is lower than 0.4.
[0215] Next, as shown in FIG. 15B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 15.
Subsequently, the red light emitting layer 15, the green light
emitting layer 24, the blue light emitting layer 25, and an upper
portion of the p-type semiconductor layer 14 are removed
selectively by ICP etching using, e.g., a chlorine (Cl.sub.2) gas
by using the formed metal thin film as a mask. At this stage, the
respective portions of the red light emitting layer 15, the green
light emitting layer 24, and the blue light emitting layer 25
overlying the p-side electrode formation region are also
removed.
[0216] Next, as shown in FIG. 15C, the metal thin film is removed
and then the transparent electrode 16 which is made of ITO with a
thickness of about 300 nm and transmits visible light is formed by,
e.g., RF sputtering over the selectively exposed portions of the
p-type semiconductor layer 14 and the red light emitting layer 15
that has been divided into the plurality of islands each configured
as a square when viewed in a plan view. Subsequently, a thermal
process is performed in an oxygen atmosphere at a temperature of,
e.g., about 600.degree. C., thereby reducing the contact resistance
and the resistivity of the transparent electrode 16 and improving
the transmittance thereof.
[0217] Next, as shown in FIG. 15D, the p-side electrode 17 made of
gold (Au) and serving as a p-side electrode pad is formed
selectively by, e.g., sputtering on the p-side electrode formation
region of the transparent electrode 16.
[0218] Next, as shown in FIG. 15E, after the formation of the
p-side electrode 17, a holding substrate 52 made of silicon and the
transparent electrode 16 including the p-side electrode are bonded
to each other by using, e.g., an epoxy-based adhesive agent 53. The
material of the holding substrate 52 is not limited to silicon. A
polymer film may also be used for the holding substrate 52.
[0219] Next, as shown in FIG. 16A, a high-output and
short-wavelength pulse laser beam which is not absorbed by the
substrate 11 but is absorbed by the n-type semiconductor layer 32,
such as the third-harmonic beam of a YAG laser at a wavelength of,
e.g., 355 nm or a KrF excimer laser beam at a wavelength of 248 nm,
is applied in a scanning manner to the surface of the substrate 11
opposite to the holding substrate 52 for the irradiation thereof.
At this time, the applied laser beam is absorbed by the portion of
the n-type semiconductor layer 32 made of Al.sub.0.1Ga.sub.0.9N
which is adjacent to the interface between itself and the substrate
11. As a result, the portion of the n-type semiconductor layer 32
which is adjacent to the interface with the substrate 11 is heated
and, if the temperature becomes, e.g., 900.degree. C. or higher
through the absorption of the laser beam, the portion of the n-type
semiconductor layer 32 adjacent to the interface with the substrate
11 is decomposed into a metal gallium (Ga) gas, a metal aluminum
(Al) gas, and a nitrogen (N.sub.2) gas, so that a decomposition
layer is formed. In the case of using a YAG laser as the laser beam
for forming the decomposition layer, a semiconductor thin film made
of gallium nitride (GaN) is inserted between the substrate 11 and
the n-type semiconductor layer 32 to accelerate the absorption of
the YAG laser beam and the decomposition layer is formed by
irradiating the inserted semiconductor thin film with the YAG laser
beam.
[0220] Then, the substrate 11 formed with the decomposition layer
is separated from the n-type semiconductor layer 32 by heating the
substrate 11 to a temperature not less than 29.degree. C., which is
a melting point of gallium, or by immersing the substrate 11 in an
aqueous hydrogen chloride (HCl) solution and thereby melting or
removing metal gallium contained in the decomposition layer.
Thereafter, the n-side electrode 18 composed of a multilayer film
of titanium (Ti) and gold (Au) is formed by, e.g., electron beam
vapor deposition on the exposed surface from which the substrate 11
has been separated and removed. Subsequently, the gold plating
layer 31 with a thickness of about 50 .mu.m is formed by
electrolytic plating using the gold (Au) layer of the n-side
electrode 18 as an underlie, whereby the structure shown in FIG.
16B is obtained.
[0221] Next, as shown in FIG. 16C, the adhesive agent 53 is removed
by using, e.g., acetone so that the holding substrate 52 is
removed. Then, the resulting structure is divided into light
emitting diode chips each having a 350-.mu.m square size by, e.g.,
dicing. Subsequently, each of the chips resulting from the division
is mounted on the specified region of a package (not shown) by
using, e.g., a silver (Ag) paste. Thereafter, wire bonding is
performed with respect to the p-side electrode 17, whereby the
white light emitting diode is obtained.
[0222] Thus, the fabrication method according to the fifth
embodiment allows one-chip integration of a white light emitting
diode in which the blue light emitting layer 25, the green light
emitting layer 24, and the red light emitting layer 15 are excited
by the ultraviolet light outputted from the ultraviolet light
emitting diode 30. This enables the intensity of emission light in
the red range to be higher than in the conventional white light
emitting diode. As a result, it becomes possible to provide a white
light emitting diode which outputs white light having an excellent
color rendering property.
[0223] In addition, the step of applying the insulating material
containing the YAG fluorescent material can be eliminated so that
the fabrication process is simplified. Moreover, the sapphire
substrate 11 which is not excellent in heat dissipation property is
removed and the gold plating layer 31 which is excellent in heat
dissipation property is provided in place thereof so that a higher
output is produced.
Embodiment 6
[0224] A sixth embodiment of the present invention will be
described with reference to the drawings.
[0225] FIG. 17A shows a cross-sectional structure of a
semiconductor light emitting device according to the sixth
embodiment and FIG. 17B shows a plan structure thereof. The
description of the components shown in FIGS. 17A and 17B which are
the same as those shown in FIGS. 13A and 13B will be omitted by
retaining the same reference numerals.
[0226] The semiconductor light emitting device according to the
sixth embodiment is the same as the semiconductor light emitting
device according to the fifth embodiment in that it is composed of
the ultraviolet light emitting diode 30, the blue light emitting
layer 25, the green light emitting layer 24, and the red light
emitting layer 15 each formed thereon. The semiconductor light
emitting device according to the sixth is different from the
semiconductor light emitting device according to the fifth
embodiment in that the transparent electrode 16 is formed on the
p-type semiconductor layer 34 to have a plurality of openings 16a
each configured as a square when viewed in a plan view and the blue
light emitting layer 25 is grown epitaxially by using the
transparent electrode 16 having the plurality of openings 16a as a
mask for selective growth. Accordingly, an emission spectrum
obtained from the semiconductor light emitting device according to
the sixth embodiment shows a spectrum pattern equal to the pattern
shown in FIG. 14.
[0227] The injection of a current into the ultraviolet light
emitting diode 30 is performed via the transparent electrode 16
that has been patterned to be used as the mask for selective growth
and the p-type semiconductor layer 34.
[0228] Since an area occupied by the blue light emitting layer 25,
the green light emitting layer 24, and the red light emitting layer
15 can be increased in the sixth embodiment, the intensity of white
light can be increased.
[0229] In addition, the portion grown laterally over the
transparent electrode 16 used as the mask for selective growth,
i.e., in a direction parallel to the upper surface of the
transparent electrode 16 has an improved crystal property so that a
crystal dislocation density is low. As a result, high-brightness
visible light can be emitted through excitation caused by the
ultraviolet light outputted from the ultraviolet light emitting
diode 30.
[0230] In addition, the n-side electrode 18 is formed over the
entire surface (back surface) of the n-type semiconductor layer 32
opposite to the active layer 33 by removing the substrate made of
sapphire for epitaxial growth and the gold plating layer 31 is
further provided. The arrangement remarkably improves the heat
dissipation property of the ultraviolet light emitting diode 30 and
allows a higher-output white light emitting diode to be provided.
In addition, since the n-side electrode 18 and the p-side electrode
17 are disposed in opposing relation with the active layer 33
interposed therebetween, a series resistance between the n-side
electrode 18 and the p-side electrode 17 can be reduced
advantageously. Since the insulating substrate made of sapphire or
the like has been removed, it is unnecessary to provide the n-side
electrode 18 on the upper portion of the n-type semiconductor layer
32. This achieves a reduction in chip size and allows the
elimination of the step of etching away the n-side semiconductor
layer 32 from the side of the p-type semiconductor layer 34.
[0231] Thus, the sixth embodiment allows one-chip integration of a
white light emitting diode in which the blue light emitting layer
25, the green light emitting layer 24, and the red light emitting
layer 15 which receive ultraviolet light outputted from the
ultraviolet light emitting diode 30 and generate blue light, green
light, and red light through excitation caused by the received
light are provided on the ultraviolet light emitting diode 30.
Accordingly, the intensity of emission light in the red range is
higher than in an emission spectrum obtained from the conventional
white light emitting diode which provides white light by exciting
the YAG fluorescent material with blue light from the blue light
emitting diode. This allows a white light emitting diode which
outputs white light having an excellent color rendering property to
be provided.
[0232] In addition, the substrate made of sapphire which is not
excellent in heat dissipation property is removed and the gold
plating layer 31 which is excellent in heat dissipation property is
provided in place thereof. As a result, a white light emitting
diode featuring a higher output and an excellent color rending
property can be provided.
[0233] In the case where the ultraviolet light emitting diode 30 is
replaced with the blue light emitting diode 10 used in the fourth
embodiment, the blue light emitting layer 25 need not be
provided.
[0234] Instead of ITO, a translucent multilayer film composed of
nickel (Ni) and gold (Au) which are stacked in layers may also be
used to form the transparent electrode 16. Alternatively, the
transparent electrode 16 may also be composed of a multilayer film
of Ni and ITO.
[0235] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0236] FIGS. 18A through 18D and FIGS. 19A through 19C show the
cross-sectional structures of the semiconductor light emitting
device according to the sixth embodiment in the individual process
steps of the fabrication method therefor.
[0237] First, as shown in FIG. 18A, the n-type semiconductor layer
32 made of n-type Al.sub.0.1Ga.sub.0.9N, the active layer 33 having
a multiple quantum well structure made of InGaN and AlGaN and the
p-type semiconductor layer 34 made of p-type Al.sub.0.15Ga.sub.0.85
are grown successively by MOCVD on the substrate 11 made of
sapphire having a principal surface of which the plane orientation
is, e.g., the (0001) plane. The active layer 33 is composed of five
quantum well layers each made of In.sub.0.02Ga.sub.0.98N having a
thickness of 1.5 nm and five barrier layers each made of
Al.sub.0.15Ga.sub.0.85N having a thickness of 10 nm, which are
alternately stacked. However, the structure of the active layer 33
is not limited thereto provided that the emission wavelength is
about 340 nm. Subsequently, the transparent electrode 16 made of
ITO with a thickness of about 300 nm is formed by, e.g., RF
sputtering on the p-type semiconductor layer 34 and then the
plurality of openings 16a each configured as a square with 2-.mu.m
to 20-.mu.m sides when viewed in a plan view are formed in the
transparent electrode 16 by using, e.g., an aqueous hydrofluoric
acid (HF) solution. Thereafter, a thermal process is performed in
an oxygen atmosphere at a temperature of, e.g., about 600.degree.
C., thereby reducing the contact resistance and the resistivity of
the transparent electrode 16 and improving the transmittance
thereof.
[0238] Next, as shown in FIG. 18B, the blue light emitting layer 25
made of undoped In.sub.0.15Ga.sub.0.85N, the green light emitting
layer 24 made of undoped In.sub.0.2Ga.sub.0.8N, and the red light
emitting layer 15 made of undoped In.sub.0.4Ga.sub.0.6N are grown
successively by MOCVD on the p-type semiconductor layer 34 by using
the transparent electrode 16 formed with the plurality of openings
16a as a mask. At this time, the size of each of the openings 16a
provided in the transparent electrode 16 is preferably minimized
within a range which allows planar growth of the blue light
emitting layer 25 because, e.g., a crystal defect is likely to
occur in the portion of the blue light emitting layer 25 overlying
the opening 16a. The forbidden band width of the blue light
emitting layer 25 is 2.6 eV herein and emits blue light at 470 nm.
The forbidden band width of the green light emitting layer 24 is
2.3 eV and emits green light at 555 nm. The forbidden band width of
the red light emitting layer 15 is 1.9 eV and emits red light at
650 nm. It is possible to form an underlie layer made of GaN and a
thin-film buffer layer made of GaN or AlN between the substrate 11
and the n-type semiconductor layer 32. It is also possible to
obtain blue light emission, green light emission, and red light
emission by using InGaN doped with, e.g., zinc, magnesium, or
silicon, instead of using undoped In.sub.0.15Ga.sub.0.85N,
In.sub.0.2Ga.sub.0.8N, and In.sub.0.4Ga.sub.0.6N, and thereby
forming the blue light emitting layer 25, the green light emitting
layer 24, and the red light emitting layer 15 such that the
composition of In is lower than 0.2 and 0.4, respectively.
[0239] Next, as shown in FIG. 18C, the p-side electrode 17 made of
gold (Au) and serving as a p-side electrode pad is formed
selectively by, e.g., sputtering on the p-side electrode formation
region of the transparent electrode 16.
[0240] Next, as shown in FIG. 18D, after the formation of the
p-side electrode 17, a holding substrate 52 made of silicon, the
transparent electrode 16 including the p-side electrode, and the
red light emitting layer 15 are bonded to each other by using,
e.g., an epoxy-based adhesive agent 53. The material of the holding
substrate 52 is not limited to silicon. A polymer film may also be
used for the holding substrate 52.
[0241] Next, as shown in FIG. 19A, a high-output and
short-wavelength pulse laser beam, such as the third-harmonic beam
of a YAG laser at a wavelength of 355 nm or a KrF excimer laser
beam at a wavelength of 248 nm, is applied in a scanning manner to
the surface of the substrate 11 opposite to the holding substrate
52 for the irradiation thereof. At this time, the applied laser
beam is absorbed by the portion of the n-type semiconductor layer
32 made of Al.sub.0.1Ga.sub.0.9N which is adjacent to the interface
between itself and the substrate 11. As a result, the portion of
the n-type semiconductor layer 32 which is adjacent to the
interface with the substrate 11 is heated and, if the temperature
becomes 900.degree. C. or higher through the absorption of the
laser beam, the portion of the n-type semiconductor layer 32
adjacent to the interface with the substrate 11 is decomposed into
a metal gallium (Ga) gas, a metal aluminum (Al) gas, and a nitrogen
(N.sub.2) gas, so that a decomposition layer is formed. In the case
of using a YAG laser as the laser beam for forming the
decomposition layer, a semiconductor thin film made of gallium
nitride (GaN) is inserted between the substrate 11 and the n-type
semiconductor layer 32 to accelerate the absorption of the YAG
laser beam and the decomposition layer is formed by irradiating the
inserted semiconductor thin film with the YAG laser beam.
[0242] Then, the substrate 11 formed with the decomposition layer
is separated from the n-type semiconductor layer 32 by heating the
substrate 11 to a temperature not less than 29.degree. C., which is
a melting point of gallium, or by immersing the substrate 11 in an
aqueous hydrogen chloride (HCl) solution and thereby melting or
removing metal gallium contained in the decomposition layer.
Thereafter, the n-side electrode 18 composed of a multilayer film
of titanium (Ti) and gold (Au) is formed by, e.g., electron beam
vapor deposition on the exposed surface from which the substrate 11
has been separated and removed. Subsequently, the gold plating
layer 31 with a thickness of about 50 .mu.m is formed by
electrolytic plating using the gold (Au) layer of the n-side
electrode 18 as an underlie, whereby the structure shown in FIG.
19B is obtained.
[0243] Next, as shown in FIG. 19C, the adhesive agent 53 is removed
by using, e.g., acetone so that the holding substrate 52 is
removed. Then, the resulting structure is divided into light
emitting diode chips each having a 350-.mu.m square size by, e.g.,
dicing. Subsequently, each of the chips resulting from the division
is mounted on the specified region of a package (not shown) by
using, e.g., a silver (Ag) paste. Thereafter, wire bonding is
performed with respect to the p-side electrode 17, whereby the
white light emitting diode is obtained.
[0244] Thus, the fabrication method according to the sixth
embodiment allows one-chip integration of a white light emitting
diode in which the blue light emitting layer 25, the green light
emitting layer 24, and the red light emitting layer 15 are excited
by the ultraviolet light outputted from the ultraviolet light
emitting diode 30. This enables the intensity of emission light in
the red range to be higher than in the conventional white light
emitting diode. As a result, it becomes possible to provide a white
light emitting diode which outputs white light having an excellent
color rendering property.
[0245] In addition, since the transparent electrode 16 does not
cover the blue light emitting layer 25, the green light emitting
layer 24, and the red light emitting layer 15, the brightness of
each of the blue emission light, the green emission light, and the
red emission light is enhanced.
[0246] Moreover, since the step of applying the insulating material
containing the YAG fluorescent material can be eliminated, the
fabrication process is simplified. Furthermore, the sapphire
substrate 11 which is not excellent in heat dissipation property is
removed and the gold plating layer 31 which is excellent in heat
dissipation property is provided in place thereof so that a higher
output is produced.
[0247] Although each of the fifth and sixth embodiments has
described the separation method which applies the high-output
short-wavelength pulse laser beam for the separation of the
substrate 11 made of sapphire, the separation of the substrate 11
is not limited to the method using laser irradiation. It is also
possible to, e.g., use the substrate 11 made of silicon (Si) or
gallium arsenide (GaAs) in place of the substrate 11 made of
sapphire and separate and remove the substrate 11 by wet etching
using an acid.
Embodiment 7
[0248] A seventh embodiment of the present invention will be
described with reference to the drawings.
[0249] FIG. 20 shows a cross-sectional structure of a semiconductor
light emitting device according to the seventh embodiment and FIG.
21 shows a plan structure thereof when viewed from the side with
the electrode. The description of the components shown in FIGS. 21
and 22 which are the same as those shown in FIGS. 1A and 1B will be
omitted by retaining the same reference numerals.
[0250] The semiconductor light emitting device according to the
seventh embodiment is the same as the semiconductor light emitting
device according to the first embodiment in that it is composed of
the blue light emitting diode 10, the red light emitting layer 15
grown epitaxially on the blue light emitting diode 10, and the
insulating material 19 containing an yttrium aluminum garnet (YAG)
fluorescent material. In FIG. 21 also, the depiction of the
insulating material 19 is omitted.
[0251] The semiconductor light emitting device according to the
seventh embodiment is different from the semiconductor light
emitting device according to the first embodiment in that a red
light emitting Eu doped layer 150 made of undoped
Al.sub.0.5Ga.sub.0.5N is provided in place of the red light
emitting layer 15 made of undoped InGaN.
[0252] The red light emitting Eu doped layer 150 has been formed by
implanting europium (Eu) ions into the epitaxially grown AlGaN
layer under such implant conditions that, e.g., an acceleration
voltage is about 200 keV and a dose is about 1.times.10.sup.15
cm.sup.-2. Under these implant conditions, as shown in FIG. 22, the
red light emitting Eu doped layer 150 shows a relatively shallow Eu
concentration profile having a peak of 1.times.10.sup.20 cm.sup.-3
at a depth of about 75 nm from the surface of the AlGaN layer. It
will easily be appreciated that the Eu concentration profile can be
changed by adjusting the acceleration voltage and the dose.
[0253] When the red light emitting Eu doped layer 150 receives
visible light or ultraviolet light, inner-shell electrons in Eu
atoms used for doping are excited and release red light at a
wavelength of 622 nm on returning from the excited state to a
ground state. By increasing the dose of implanted Eu ions, the
emission intensity of the red excitation light can be enhanced.
[0254] The semiconductor composing the red light emitting Eu doped
layer 150 is not limited to AlGaN. Ga may also be used instead. It
is also possible to use a semiconductor layer having a multiple
quantum well layer composed of a pair of In.sub.0.02Ga.sub.0.98N
and Al.sub.0.4Ga.sub.0.6N.
[0255] The doping of the semiconductor layer with Eu is not limited
to a method which performs ion implantation after epitaxial growth.
Doping with Eu may also be performed during epitaxial growth.
[0256] White light having the spectrum shown in FIG. 23 can be
obtained by injecting a current of, e.g., 20 mA into the blue light
emitting diode 10 and thereby causing the emission of blue light at
a wavelength of 470 nm. In FIG. 23, the emission spectrum is
composed of the transmitted component 10A of the blue light at a
wavelength of 470 nm, yellow emission light 19A with a peak
wavelength of 550 nm from the YAG fluorescent material, and red
light 150A at a wavelength of 622 nm from the red light emitting Eu
doped layer 150. The blue light 10A, the yellow light 19A, and the
red light 150A are mixed to provide white light.
[0257] Thus, the seventh embodiment allows one-chip integration of
a light emitting diode which provides white light by exciting the
YAG fluorescent material contained in the red light emitting Eu
doped layer 150 and the insulating material 19 with light outputted
from the blue light emitting diode 10. Accordingly, the intensity
of emission light in the red range is higher in the semiconductor
light emitting device according to the seventh embodiment than in
the conventional white light emitting diode which excites the YAG
fluorescent material with light outputted from the blue light
emitting diode. This allows white light having an excellent color
rendering property to be outputted.
[0258] It is also possible to provide the ultraviolet light
emitting diode 30 which outputs ultraviolet light at a wavelength
of 340 nm in place of the blue light emitting diode 10 and excite
each of the blue light emitting fluorescent material, the green
light emitting fluorescent material, and the red light emitting Eu
doped layer 150 with the ultraviolet light to provide white
light.
[0259] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0260] FIGS. 24A through 24D and FIGS. 25A through 25C show the
cross-sectional structures of the semiconductor light emitting
device according to the seventh embodiment in the individual
process steps of the fabrication method therefor.
[0261] First, as shown in FIG. 24A, the n-type semiconductor layer
12 made of r-type GaN, the active layer 13 having a multiple
quantum well structure made of InGaN, the p-type semiconductor
layer 14 made of p-type A.sub.0.05Ga.sub.0.95N, and an undoped
Al.sub.0.5Ga.sub.0.5N layer 150B are grown successively by MOCVD
(Metal Organic Chemical Vapor Deposition) on the substrate 11 made
of sapphire having a principal surface of which the plane
orientation is, e.g., the (0001) plane in the same manner as in the
first embodiment. The n-type semiconductor layer 12, the active
layer 13, and the p-type semiconductor layer 14 emit blue light at
a wavelength of, e.g., 470 nm through current injection.
[0262] Next, as shown in FIG. 24B, europium (Eu) ions are implanted
into the grown Al.sub.0.5Ga.sub.0.5N layer 150B under such implant
conditions that, e.g., an acceleration voltage is about 200 kV and
the dose is about 1.times.10.sup.15 cm.sup.-2. Preferably, the
substrate 11 is heated herein to about 500.degree. C. during the
implantation of Eu ions. Under these implant conditions, the
concentration profile of Eu ions implanted in the
Al.sub.0.5Ga.sub.0.5N layer 150B has a peak at a depth of 75 nm
from the surface of the Al.sub.0.5Ga.sub.0.5N layer 150B.
Subsequently to the ion implantation, annealing is performed in a
nitrogen atmosphere at about 1000.degree. C. for the activation of
the Eu ions, thereby obtaining the red light emitting Eu doped
layer 150 from the Al.sub.0.5Ga.sub.0.5N layer 150B. As described
above, the red light emitting Eu doped layer 150 emits red light at
a wavelength of 622 nm through excitation caused by visible light
or ultraviolet light.
[0263] Next, as shown in FIG. 24C, the red light emitting Eu doped
layer 150 and an upper portion of the p-type semiconductor layer 14
are selectively removed by ICP etching using, e.g., a chlorine
(Cl.sub.2) gas by using a metal mask (not shown) having a pattern
consisting of a plurality of discrete and spaced-apart squares that
has been placed on the red light emitting Eu doped layer 150. At
this stage, the portion of the red light emitting Eu doped layer
150 overlying the p-side electrode formation region is also
removed.
[0264] Next, as shown in FIG. 24D, the metal mask is removed and
then the transparent electrode 16 which is made of ITO with a
thickness of about 300 nm and transmits visible light is formed
over the selectively exposed portions of the p-type semiconductor
layer 14 and the red light emitting Eu doped layer 150 that has
been divided into a plurality of islands each configured as a
square when viewed in a plan view. Subsequently, the portion of the
transparent electrode 16 overlying the n-side electrode formation
region is removed by wet etching using, e.g., an aqueous hydrogen
chloride (HCl) solution. Thereafter, a thermal process is performed
in an oxygen atmosphere at a temperature of, e.g. about 600.degree.
C., thereby reducing the contact resistance and the resistivity of
the transparent electrode 16 and improving the transmittance
thereof.
[0265] Next, as shown in FIG. 25A, the respective portions of the
p-type semiconductor layer 14 and the active layer 13 overlying the
n-side electrode formation region 12a are removed selectively by
ICP etching so that the n-side electrode formation region 12a of
the n-type semiconductor layer 12 is exposed.
[0266] Next, as shown in FIG. 25B, the n-side electrode 18 as an
ohmic electrode composed of a multilayer film of titanium (Ti) and
gold (Au) is formed on the exposed n-side electrode formation
region 12a of the n-type semiconductor layer 12 by, e.g.,
sputtering. Thereafter, sintering may also be performed
appropriately in a nitrogen atmosphere at a temperature of, e.g.,
about 550.degree. C. to reduce the contact resistance of the n-side
electrode 18. Subsequently, the p-side electrode 17 made of gold
(Au) and serving as a p-side electrode pad is formed selectively
by, e.g., sputtering on the p-side electrode formation region of
the transparent electrode 16.
[0267] Next, as shown in FIG. 25C, the resulting structure is
divided into light emitting diode chips each having a 350-.mu.m
square size by, e.g., dicing. Subsequently, each of the chips
resulting from the division is mounted on the specified region of
the package 20 by using, e.g., a silver (Ag) paste. Thereafter,
wire bonding is performed with respect to the p-side electrode 17
and the n-side electrode 18 and the insulating material 19
containing a YAG fluorescent material is further applied to cover
the chip.
[0268] Thus, the fabrication method according to the seventh
embodiment allows one-chip integration of a white light emitting
diode in which the red light emitting Eu doped layer 150 and the
YAG fluorescent material are excited by the blue light from the
blue light emitting diode 10. This enables the intensity of
emission light in the red range to be higher than in the
conventional white light emitting diode. As a result, it becomes
possible to provide a white light emitting diode which outputs
white light having an excellent color rendering property.
[0269] Although the seventh embodiment has doped the red light
emitting Eu doped layer 150 with europium (Eu) as an element
serving as a luminescent center, the doping element is not limited
to Eu. Instead of Eu, samarium (Sm) or ytterbium (Yb) may also be
used.
[0270] In each of the first through seventh embodiments, the plane
orientation of the principal surface of sapphire used as the
substrate for epitaxial growth is not particularly limited. In the
case of using, e.g., sapphire, a plane orientation at an off-angle
from a representative (typical) plane orientation, such as the
(0001) plane, may also be adopted.
[0271] The material of the substrate for epitaxial growth is not
limited to sapphire. Besides sapphire, there can be used silicon
carbide (SiC), zinc oxide (ZnO), silicon (Si), gallium arsenide
(GaAs), gallium phosphide (GaP), indium phosphide (InP), gallium
nitride (GaN), aluminum nitride (AlN), magnesium oxide (MgO), or
lithium aluminum gallium oxide (LiAl.sub.xGa.sub.1-xO.sub.2 (where
0.ltoreq.x.ltoreq.1)).
[0272] The composition of each of the n-type semiconductor layers
12 and 32, the active layers 13 and 33, and the p-type
semiconductor layers 14 and 34 and the composition of the layer
which emits light through excitation, such as the red light
emitting layer 15, are not limited to those shown in the individual
embodiments. The method for crystal growth is not limited to MOCVD
and a semiconductor layer formed by using, e.g., an MBE (Molecular
Beam Epitaxy) process or a HVPE (Hydride Vapor Phase Epitaxy)
process may also be contained. Each of the semiconductor layers may
also contain a group V element such as arsenide (As) or phosphorous
(P) or a group III element such as boron (B).
Embodiment 8
[0273] An eighth embodiment of the present invention will be
described with reference to the drawings.
[0274] FIG. 26A shows a cross-sectional structure of a
semiconductor light emitting device according to the eighth
embodiment and FIG. 26B shows a plan structure thereof.
[0275] As shown in FIGS. 26A and 26B, the semiconductor light
emitting device according to the eighth embodiment is composed of:
a blue light emitting diode 110 mounted at a specified position on
a package 120 as a mounting member; a red light emitting layer 116
grown epitaxially on the blue light emitting diode 110; and an
insulating material 119 containing an yttrium aluminum garnet (YAG)
fluorescent material. In FIG. 26B, the depiction of the insulating
material 119 is omitted.
[0276] The blue light emitting diode 110 is composed of: an n-type
semiconductor layer 112 made of n-type GaN; an active layer 113
having a multiple quantum well structure made of InGaN; a
p.sup.+-type semiconductor layer 114 made of p.sup.+-type
Al.sub.0.05Ga.sub.0.95N; and an n.sup.+-type semiconductor layer
115 made of n.sup.+-type A.sub.0.05Ga.sub.0.95N which are
epitaxially grown successively on a substrate 111 made of, e.g.,
sapphire. The active layer 113 is composed of three well layers
each made of In.sub.0.35Ga.sub.0.65N having a thickness of 2 nm and
three barrier layers each made of In.sub.0.02Ga.sub.0.98N having a
thickness of 10 nm which are alternately stacked, thereby emitting
blue light at 470 nm.
[0277] The red light emitting layer 116 is made of, e.g., undoped
In.sub.0.4Ga.sub.0.6N with a forbidden band width of 1.9 eV and
formed on the n.sup.+-type semiconductor layer 115 to have a matrix
configuration consisting of discrete and spaced-apart squares each
with 2-1 .mu.m to 20-.mu.m sides when viewed in a plan view. Each
square of the red light emitting layer 116 is excited by blue light
outputted from the blue light emitting diode 110 and emits red
light at 650 nm. Red light can be obtained from the red light
emitting layer 116 by doping the red light emitting layer 15 with,
e.g., zinc (Zn), magnesium (Mg), or silicon (Si) and thereby
reducing the composition of In. By thus reducing the composition of
In, a lattice mismatch with an underlie layer made of GaN normally
used can be suppressed and crystal defects in the red light
emitting layer 116 can be reduced so that high-brightness light
emission is enabled. At this time, the emission light released from
the red light emitting layer 116 is visible light generated via an
energy level resulting from the impurity used for doping and blue
excitation light is mixed in the visible light.
[0278] Thus, in the semiconductor light emitting device according
to the eighth embodiment, the n.sup.+-type semiconductor layer 115
is formed on the p.sup.+-type semiconductor layer 114 of the blue
light emitting diode 110 such that the p.sup.+-type semiconductor
layer 114 and the n.sup.+-type semiconductor layer 115 form a
p.sup.+n.sup.+junction.
[0279] In the specification of the present application, a
p.sup.+-type semiconductor layer indicates a p-type semiconductor
layer in which the concentration of a p-type dopant, e.g.,
magnesium (Mg) is about 1.times.10.sup.21 cm.sup.-3 and an
n.sup.+-type semiconductor layer indicates an n-type semiconductor
layer in which the concentration of an n-type dopant, e.g., silicon
(Si) is about 1.times.10.sup.19 cm.sup.13.
[0280] The present invention can achieve an effect provided that
the impurity concentration in each of the p.sup.+-type
semiconductor layer 114 and the n.sup.+-type semiconductor layer
115 is 1.times.10.sup.18 cm.sup.3 or more.
[0281] When a voltage higher than the voltage applied to the n-type
semiconductor layer 112 is applied to the n.sup.+-type
semiconductor layer 115 between the p.sup.+-type semiconductor
layer 114 and the n.sup.+-type semiconductor layer 115,
voltage-current characteristics close to a low-resistance ohmic
characteristic are shown due to a tunnel current generated in the
p.sup.+n.sup.+ junction. Consequently, the same rectifying property
as provided by a normal pn junction is obtainable.
[0282] FIG. 27A shows the result of a comparison made between
respective current-voltage characteristics when a tunnel junction
(n.sup.+pn junction) is formed and when a normal pn junction is
formed. FIG. 27B shows the result of a comparison made between
respective current-light output characteristics when the tunnel
junction (n.sup.+pn junction) is formed and when the normal pn
junction is formed. As can be seen from FIG. 27A, an operating
voltage during the rising edge is higher than when the normal pn
junction is formed. However, a light output is larger when the
tunnel junction is formed provided that the injected current has
the same value, as can be seen from FIG. 27B.
[0283] In the case of adopting the conventional structure in which
the p-type semiconductor layer is provided on the active layer, the
transparent electrode occupying a large area should normally be
provided on the high-resistance p-type semiconductor layer, In the
semiconductor light emitting device according to the eighth
embodiment, however, an injected current is sufficiently diffused
even in a lateral direction (direction parallel to the substrate)
without providing a transparent electrode on the n.sup.+-type
semiconductor layer 115 since the low-resistance n.sup.+-type
semiconductor layer 115 is provided on the p.sup.+-type
semiconductor layer 114. This obviates the necessity to provide a
transparent electrode and allows respective ohmic electrodes
provided in the n-type semiconductor layer 112 and the n.sup.+-type
semiconductor layer 115, which will be described later, to have the
same compositions. As a result, the n-type semiconductor layer 112
and the n.sup.+-type semiconductor layer 115 can be formed by the
same process and the fabrication process for the semiconductor
light emitting device can significantly be simplified.
[0284] A first ohmic n-side electrode 117 composed of a multilayer
structure in which titanium (Ti), aluminum (Al), nickel (Ni), and
gold (Au) films are stacked in layers is formed selectively on a
region of the p.sup.+-type semiconductor layer 115.
[0285] The n.sup.+-type semiconductor layer 112 has an exposed
region and a second ohmic n-side electrode 118 composed of a
multilayer structure in which titanium (Ti), aluminum (Al), nickel
(Ni), and gold (Au) films are stacked in layers is formed on the
exposed region. To the first and second n-side electrodes 117 and
118, required metal thin lines are connected by wire bonding,
though they are not depicted.
[0286] The insulating material 119 containing the YAG fluorescent
material is formed as follows: The insulating material 119 is
coated or applied dropwise onto the package 120 to cover the blue
light emitting diode 110, the red light emitting layer 116, the
first n-side electrode 117, and the second n-side electrode 118 and
then hardened. The insulating material 119 is excited by blue light
outputted from the blue light emitting diode 110 to emit yellow
light.
[0287] A current is injected into the blue light emitting diode 110
via the first n-side electrode 117, the n.sup.+-type semiconductor
layer 115, and the p-type semiconductor layer 114. Accordingly,
white light having the spectrum shown in FIG. 28 can be obtained by
injecting a current of, e.g., 20 mA into the blue light emitting
diode 110 and thereby causing the emission of blue light at a
wavelength of 470 nm. In FIG. 28, the emission spectrum is composed
of the transmitted component 110A of the blue light at a wavelength
of 470 nm, yellow emission light 119A with a peak wavelength of 550
nm from the YAG fluorescent material, and the red light 116A at a
wavelength of 650 nm from the red light emitting layer 116. The
blue light 110A, the yellow light 119A, and the red light 116A are
mixed to provide white light.
[0288] Thus, the eighth embodiment allows one-chip integration of a
light emitting diode in which the red light emitting layer 116
which receives blue light outputted from the blue light emitting
diode 110 and generates red light through excitation caused thereby
is provided between the insulating material 119 containing the YAG
fluorescent material which emits yellow light and the blue light
emitting diode 110 which emits blue light. Accordingly, the
intensity of emission light in the red range is higher than in an
emission spectrum obtained from the conventional white light
emitting diode shown in FIG. 37 which provides white light by
exciting the YAG fluorescent material with blue light from the blue
light emitting diode. This allows a white light emitting diode
which outputs white light having an excellent color rendering
property to be provided.
[0289] In addition, when an operating current is injected in the
blue light emitting diode 110, a so-called tunnel current flows in
the p.sup.+n.sup.+ junction formed between the p.sup.+-type
semiconductor layer 114 and the n.sup.+-type semiconductor layer
115 so that a rectifying property is obtained by applying a voltage
between the n.sup.+-type semiconductor layer 115 and the n-type
semiconductor layer 112 such that it is higher to the n.sup.+-type
semiconductor layer 115 than to the n-type semiconductor layer 112.
Moreover, since the n.sup.+-type semiconductor layer 115 is low in
resistance, the injected current is more likely to be diffused in
the in-plane direction of the n.sup.+-type semiconductor layer 115.
This obviates the necessity to use a transparent electrode as used
conventionally and enhances the brightness of the emission
light.
[0290] The blue light emitting diode 110 may also be formed with an
underlie layer made of GaN and a thin-film buffer layer made of GaN
or AlN being interposed between the substrate 111 made of sapphire
and the n-type semiconductor layer 112.
[0291] Although the eighth embodiment has patterned the red light
emitting layer 116 into islands each configured as a square when
viewed in a plan view, it need not necessarily be patterned. For
example, the red light emitting layer 116 may also be formed over
the entire upper surface of the n.sup.+-type semiconductor layer
115 except for the region thereof to be formed with the first
n-side electrode 117. In the case of forming the red light emitting
layer 116 over the entire surface, the area of the red light
emitting layer 116 is optimized to a value which optimizes the
color rendering property of the output light.
[0292] The active layer 113 may also be constituted to have the
composition of In which is nonuniform in the in-plane direction
(direction parallel to a substrate surface) of the active layer
113.
[0293] Instead of varying a lattice constant in each of the n-type
semiconductor layer 112, the active layer 113, the p.sup.+-type
semiconductor layer 114, the n.sup.+-type semiconductor layer 115,
and the read semiconductor layer 116 which have been formed on the
substrate 111, the composition of a group III element in a
quaternary or higher-order mixed crystal may also be varied in
forming the blue light emitting diode 110 and the red light
emitting layer 116. This provides a structure from which
high-brightness light emission can be obtained without incurring a
crystal defect due to a lattice mismatch and the resulting
nonradiative recombination.
[0294] In the eighth embodiment, the YAG fluorescent material and
the red light emitting layer 116 are excited by the output light
received thereby from the blue light emitting diode 110 and emit
yellow light and red light, respectively, thereby providing white
light. However, an ultraviolet light emitting diode which output
ultraviolet light at a wavelength of, e.g., 340 nm may also be
formed in place of the blue light emitting diode 110. In this case,
a blue light emitting fluorescent material and a green light
emitting fluorescent material are added to the insulating material
119.
[0295] It is also possible to separate the substrate 111 made of
sapphire from the blue light emitting diode 110 and provide a metal
film in place of the separated substrate. The arrangement allows
the use of the provided metal film as an n-side electrode and
obviates the necessity to form the n-side electrode 118 by exposing
the n-type semiconductor layer 112.
[0296] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0297] FIGS. 29A through 29E show the cross-sectional structures of
the semiconductor light emitting device according to the eighth
embodiment in the individual process steps of the fabrication
method therefor. The drawings show, of a wafer on which a plurality
of semiconductor light elements can be formed simultaneously, only
one element formation region.
[0298] First, as shown in FIG. 29A, the n-type semiconductor layer
112 made of n-type GaN, the active layer 113 having a multiple
quantum well structure made of InGaN, the p.sup.+-type
semiconductor layer 114 made of p.sup.+-type
Al.sub.0.05Ga.sub.0.95N, the n.sup.+-type semiconductor layer 115
made of n.sup.+-type Al.sub.0.05Ga.sub.0.95N, and the red light
emitting layer 116 made of undoped In.sub.0.4Ga.sub.0.6N are grown
successively by MOCVD (Metal Organic Chemical Vapor Deposition) on
the substrate 111 made of sapphire having a principal surface of
which the plane orientation is, e.g., the (0001) plane. As
described above, the p.sup.+n.sup.+ junction formed between the
p.sup.+-type semiconductor layer 114 and the n.sup.+-type
semiconductor layer 115 shows current-voltage characteristics close
to a low-resistance ohmic characteristic due to the tunnel current.
On the other hand, the active layer 113 is composed of three
quantum well layers each made of In.sub.0.35Ga.sub.0.65N having a
thickness of 2 nm and three barrier layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 10 mm, which are
alternately stacked. However, the structure of the active layer 113
is not limited thereto provided that the emission wavelength is
about 470 nm. It is possible to form an underlie layer made of GaN
and a thin-film buffer layer made of GaN or AlN between the
substrate 111 and the n-type semiconductor layer 112. It is also
possible to form the active layer 113 such that the composition of
In is nonuniform in the in-plane direction (direction parallel to
the substrate surface) of the active layer 113. It is also possible
to obtain red emission light by using InGaN doped with, e.g., zinc,
magnesium, or silicon, instead of using undoped
In.sub.0.4Ga.sub.0.6N, and thereby forming the red light emitting
layer 116 such that the composition of In is lower than 0.4.
[0299] Next, as shown in FIG. 29B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 116.
Subsequently, the red light emitting layer 116 and an upper portion
of the n.sup.+-type semiconductor layer 115 are selectively removed
by ICP (Inductive Coupled Plasma) etching using, e.g., a chlorine
(Cl.sub.2) gas by using the formed metal thin film as a mask. At
this stage, the portion of the red light emitting layer 116
overlying the first n-side electrode formation region is also
removed.
[0300] Next, as shown in FIG. 29C, the respective portions of the
n.sup.+-type semiconductor layer 115, the p.sup.+-type
semiconductor layer 114, and the active layer 113 overlying the
second n-side electrode formation region 112a are selectively
removed by ICP etching, whereby the second n-side electrode
formation region 112a of the n-type semiconductor layer 112 is
exposed.
[0301] Next, as shown in FIG. 29D, a resist film (not shown) having
opening patterns corresponding to the second n-side electrode
formation region 112a and to the first n-side electrode formation
region of the n.sup.+-type semiconductor layer 115 is formed by
lithography after dry etching. Subsequently, an electrode formation
film composed of a multilayer film of Ti, Al, Ni, and Au is formed
by, e.g., electron beam vapor deposition over the entire surface of
the formed resist film. Then, the first and second n-side
electrodes 117 and 118, each of which is an ohmic electrode, are
formed simultaneously from the electrode formation film by a
so-called lift-off process which removes the resist film. To reduce
the contact resistance of each of the first and second n-side
electrodes 117 and 118, sintering may also be performed
appropriately in a nitrogen atmosphere at a temperature of, e.g.,
about 550.degree. C.
[0302] Next, as shown in FIG. 29E, after the formation of the first
and second n-side electrodes 117 and 118, the resulting structure
is divided into light emitting diode chips each having a 350-.mu.m
square size by, e.g., dicing. Subsequently, each of the chips
resulting from the division is mounted on the specified region of
the package 120 by using, e.g., a silver (Ag) paste. Thereafter,
wire bonding is performed with respect to the first and second
n-side electrodes 117 and 118 and the insulating material 119
containing a YAG fluorescent material is further applied to cover
the chip.
[0303] Thus, the fabrication method according to the eighth
embodiment allows one-chip integration of a white light emitting
diode in which the red light emitting layer 116 and the YAG
fluorescent material are excited by the blue light from the blue
light emitting diode 110. This enables the intensity of emission
light in the red range to be higher than in the conventional white
light emitting diode. As a result, it becomes possible to provide a
white light emitting diode which outputs white light having an
excellent color rendering property.
[0304] In addition, since the n.sup.+-type semiconductor layer 115
made of a nitride is lower in impurity energy level than a p-type
semiconductor layer made of a nitride or a p.sup.+-type
semiconductor layer and therefore can be reduced in resistance, the
diffusion of the current in a lateral direction (direction parallel
to the substrate surface) is sufficiently large so that a
transparent electrode as shown in the conventional embodiment need
not be provided. This not only simplifies the fabrication process
but also eliminates the absorption of the emission light by a
transparent electrode, which occurs when the transparent electrode
is provided. As a result, a high-brightness white light emitting
diode can be provided.
[0305] Moreover, the first and second n-side electrodes 117 and
118, each of which is an ohmic electrode, do not have different
compositions but have the same composition, in contrast to the
p-side electrode and the n-side electrode having different
compositions according to the conventional embodiment. Accordingly,
the first and second n-side electrodes 117 and 118 can be formed
simultaneously in the same process step. This simplifies the
fabrication process and allows fabrication at a lower cost.
[0306] Although the eighth embodiment has adopted a structure in
which the output light from the semiconductor light emitting device
is extracted from the side with the n.sup.+-type semiconductor
layer 115, so-called flip-chip mounting may also be performed which
forms a high-reflectivity electrode composed of a multilayer film
using, e.g., platinum (Pt), rhodium (Rh), or silver (Ag) for the
lower layer thereof and using gold (Au) for the upper layer thereof
on the red light emitting layer 116 and the n.sup.+-type
semiconductor layer 115 and mounts the high-reflectivity electrode
on the upper surface of the package 120 with a silver bump or the
like interposed between the high-reflectivity electrode and the
package 120. If flip-chip mounting is performed, the output light
passes through the substrate 111 made of sapphire to be extracted
so that a high-brightness white light emitting diode is
provided.
Embodiment 9
[0307] A ninth embodiment of the present invention will be
described with reference to the drawings.
[0308] FIG. 30A shows a cross-sectional structure of a
semiconductor light emitting device according to the ninth
embodiment and FIG. 30B shows a plan structure thereof. The
description of the components shown in FIGS. 30A and 30B which are
the same as those shown in FIGS. 26A and 26B will be omitted by
retaining the same reference numerals.
[0309] As shown in FIGS. 30A and 30B, the semiconductor light
emitting device according to the ninth embodiment is composed of:
an ultraviolet light emitting diode 130; a blue light emitting
layer 121; a green light emitting layer 122; and the red light
emitting layer 116, each of which has been grown epitaxially on the
ultraviolet light emitting diode 130.
[0310] The ninth embodiment is different from the eighth embodiment
in that it has provided the ultraviolet light emitting diode 130 as
the light emitting diode in place of the blue light emitting diode
110 and newly provided the blue light emitting layer 121 and the
green light emitting layer 122 which are excited by ultraviolet
light at a wavelength of 340 nm outputted from the ultraviolet
light emitting diode 130 to emit blue light at a wavelength of 470
n and green light at a wavelength of 555 nm, respectively, thereby
obviating the necessity for the insulating material 119 containing
a YAG fluorescent material and covering the ultraviolet light
emitting diode 130.
[0311] The ultraviolet light emitting diode 130 is composed of: an
n-type semiconductor layer 132 made of, e.g., n-type
Al.sub.0.1Ga.sub.0.9N; an active layer 133 having a multiple
quantum well structure made of InGaN and AlGaN; a p.sup.+-type
semiconductor layer 134 made of p.sup.+-type
Al.sub.0.15Ga.sub.0.85N; and an n.sup.+-type semiconductor layer
135 made of n.sup.+-type Al.sub.0.15Ga.sub.0.85N. The active layer
133 is composed of five well layers each made of
In.sub.0.02Ga.sub.0.98N having a thickness of 1.5 nm and five
barrier layers each made of Al.sub.0.15Ga.sub.0.85N having a
thickness of 10 nm which are alternately stacked, thereby emitting
ultraviolet light at 340 nm.
[0312] The blue light emitting layer 121 is made of, e.g., undoped
In.sub.0.15Ga.sub.0.85N with a forbidden band width of 2.6 eV and
formed on the n.sup.+-type semiconductor layer 135 to have a
configuration consisting of a plurality of discrete and
spaced-apart islands. The green light emitting layer 122 is made
of, e.g., undoped In.sub.0.2Ga.sub.0.8N with a forbidden band width
of 2.2 eV and formed on the blue light emitting layer 121 to have
the same plan configuration as the blue light emitting layer 121.
The red light emitting layer 116 is made of, e.g., undoped
In.sub.0.4Ga.sub.0.6N with a forbidden band width of 1.9 eV and
formed on the green light emitting layer 122 to have the same plan
configuration as the green light emitting layer 122. The blue light
emitting layer 121, the green light emitting layer 122, and the red
light emitting layer 116 are excited by the ultraviolet light
outputted from the ultraviolet light emitting diode 130 to emit
blue light at a wavelength of 470 nm, green light at a wavelength
of 555 nm, and red light at a wavelength of 650 nm. Blue light
emission, green light emission, and red light emission can be
obtained from the blue light emitting layer 121, the green light
emitting layer 122, and the red tight emitting layer 116 by doping
each of the blue light emitting layer 121, the green light emitting
layer 122, and the red light emitting layer 116 with, e.g., zinc
(Zn), magnesium (Mg), or silicon (Si) and thereby reducing the
composition of In in each of the light emitting layers. By thus
reducing the composition of In, a lattice mismatch with an underlie
layer made of GaN normally used can be suppressed and crystal
defects in the blue light emitting layer 121, in the green light
emitting layer 122, and in the red light emitting layer 116 can be
reduced so that high-brightness light emission is enabled.
[0313] If a voltage is applied between the n-type semiconductor
layer 132 of the ultraviolet light emitting diode 130 and the
n.sup.+-type semiconductor layer 135 thereof to be higher to the
n.sup.+-type semiconductor layer 135 than to the n-type
semiconductor layer 132, voltage-current characteristics close to a
low-resistance ohmic characteristic are observed due to a tunnel
current occurring in the p.sup.+n.sup.+ junction, as described in
the eighth embodiment, so that the same rectifying property as
obtained with a normal pn junction is obtainable. In addition, the
injected current is diffused sufficiently even in a lateral
direction (direction parallel to the substrate) without providing a
transparent electrode on the n.sup.+-type semiconductor layer 135,
the first n-side electrode 117 provided on the n.sup.+-type
semiconductor layer 135 and the second n-side electrode 118
provided on the n-type semiconductor layer 132 can be formed to
have the same composition, as will be described later. This allows
the first n-side electrode and the second n-side electrode 118 to
be formed in one process step and remarkably simplifies a
fabrication process for the semiconductor light emitting
device.
[0314] A current is injected into the ultraviolet light emitting
diode 130 via the first n-side electrode 117, the n.sup.+-type
semiconductor layer 135, and the p.sup.+-type semiconductor layer
134. Accordingly, white light having the spectrum shown in FIG. 31
can be obtained by injecting a current of, e.g., 20 mA into the
ultraviolet light emitting diode 130 and thereby causing the
emission of ultraviolet light at a wavelength of 340 nm. In FIG.
31, the emission spectrum is composed of the transmitted component
130A of the ultraviolet light at a wavelength of 340 nm which is
low in intensity, blue light 121A with a peak wavelength of 470 nm
from the blue light emitting layer 121, green light 122A with a
peak wavelength of 555 nm from the green light emitting layer 122,
and the red light 116A at a wavelength of 650 nm from the red light
emitting layer 116. The blue light 121A, the green light 122A, and
the red light 116A are mixed to provide white light.
[0315] Thus, the ninth embodiment allows one-chip integration of a
light emitting diode in which the blue light emitting layer 121,
the green light emitting layer 122, and the red light emitting
layer 116 which receive ultraviolet light outputted from the
ultraviolet light emitting diode 130 and generate blue light, green
light, and red light through excitation caused by the received
ultraviolet light are provided on the ultraviolet light emitting
diode 130. Accordingly, the intensity of emission light in the red
range is higher than in an emission spectrum obtained from the
conventional white light emitting diode which provides white light
by exciting the YAG fluorescent material with blue light from the
blue light emitting diode. This allows a white light emitting diode
which outputs white light having an excellent color rendering
property to be provided.
[0316] In addition, when an operating current is injected in the
ultraviolet light emitting diode 130, a so-called tunnel current
flows in the p.sup.+n.sup.+ junction formed between the
p.sup.+-type semiconductor layer 134 and the n.sup.+-type
semiconductor layer 135 so that a rectifying property is obtained
by applying a voltage between the n.sup.+-type semiconductor layer
135 and the n-type semiconductor layer 132 such that it is higher
to the n.sup.+-type semiconductor layer 135 than to the n-type
semiconductor layer 132. Moreover, since the n.sup.+-type
semiconductor layer 135 is low in impurity energy level and can be
reduced in resistance, the injected current is more likely to be
diffused in the in-plane direction of the n-type semiconductor
layer 135. This obviates the necessity to use a transparent
electrode as used conventionally and enhances the brightness of the
emission light. Moreover, since an insulating material containing a
YAG fluorescent material is unnecessary, the steps of forming the
transparent electrode and the insulating material containing the
YAG fluorescent material can be omitted so that the fabrication
process is simplified.
[0317] For easy transmission of the excitation light, the thickness
of each of the red light emitting layer 116 and the green light
emitting layer 122 is minimized provided that sufficient emission
light is obtained.
[0318] The ultraviolet light emitting diode 130 may also be formed
with an underlie layer made of GaN and a thin-film buffer layer
made of GaN or AlN being interposed between the substrate 111 made
of sapphire and the n-type semiconductor layer 132.
[0319] Although the ninth embodiment has patterned each of the blue
light emitting layer 121, the green light emitting layer 122, and
the red light emitting layer 116 into islands each configured as a
square when viewed in a plan view, they need not necessarily be
patterned. For example, each of the blue light emitting layer 121,
the green light emitting layer 122, and the red light emitting
layer 116 may also be formed over the entire upper surface of the
n.sup.+-type semiconductor layer 135 except for the region thereof
to be formed with the first n-side electrode 117. In the case of
forming each of the light emitting layers 121, 122, and 116 over
the entire surface, the area of the light emitting layer is
optimized to a value which optimizes the color rendering property
of the output light.
[0320] In the case where the ultraviolet light emitting diode 130
is replaced with the blue light emitting diode 110 used in the
eighth embodiment, the blue light emitting layer 121 need not be
provided.
[0321] It is also possible to separate the substrate 111 made of
sapphire from the ultraviolet light emitting diode 130 and provide
a metal film in place of the separated substrate. The arrangement
allows the provided metal film to be used as an n-side electrode
and obviates the necessity to form the second n-side electrode 118
by exposing the n-type semiconductor layer 132.
[0322] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0323] FIGS. 32A through 32D show the cross-sectional structures of
the semiconductor light emitting device according to the ninth
embodiment in the individual process steps of the fabrication
method therefor.
[0324] First, as shown in FIG. 32A, the n-type semiconductor layer
132 made of n-type GaN, the active layer 133 having a multiple
quantum well structure made of InGaN, the p.sup.+-type
semiconductor layer 134 made of p.sup.+-type
Al.sub.0.05Ga.sub.0.95N, the n.sup.+-type semiconductor layer 135
made of n.sup.+-type Al.sub.0.05Ga.sub.0.95N, the blue light
emitting layer 121 made of undoped In.sub.0.15Ga.sub.0.85N, the
green light emitting layer 122 made of undoped
In.sub.0.2Ga.sub.0.8N, and the red light emitting layer 116 made of
undoped In.sub.0.4Ga.sub.0.6N are grown successively by MOCVD on
the substrate 111 made of sapphire having a principal surface of
which the plane orientation is, e.g., the (0001) plane. As stated
previously, the p.sup.+n.sup.+ junction formed between the
p.sup.+-type semiconductor layer 134 and the n.sup.+-type
semiconductor layer 135 shows voltage-current characteristics close
to a low-resistance ohmic characteristic due to the tunnel current.
The active layer 133 is composed of five quantum well layers each
made of In.sub.0.02Ga.sub.0.85N having a thickness of 1.5 nm and
five barrier layers each made of Al.sub.0.15Ga.sub.0.85N having a
thickness of 10 nm, which are alternately stacked. However, the
structure of the active layer 133 is not limited thereto provided
that the emission wavelength is about 340 nm. The forbidden band
width of the blue light emitting layer 121 is 2.6 eV and emits blue
light at 470 nm. The forbidden band width of the green light
emitting layer 122 is 2.3 eV and emits green light at 555 nm. The
forbidden band width of the red light emitting layer 116 is 1.9 eV
and emits red light at 650 nm. It is possible to form an underlie
layer made of GaN and a thin-film buffer layer made of GaN or AlN
between the substrate 111 and the n-type semiconductor layer 132.
The active layer 133 may also be constituted to have the
composition of In which is nonuniform in the in-plane direction
(direction parallel to a substrate surface) of the active layer
133. It is also possible to obtain red emission light by using
InGaN doped with, e.g., zinc, magnesium, or silicon, instead of
using undoped In.sub.0.4Ga.sub.0.6N, and thereby forming the red
light emitting layer 116 such that the composition of In is lower
than 0.4.
[0325] Next, as shown in FIG. 32B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 116.
Subsequently, respective upper portions of the red light emitting
layer 116, the green light emitting layer 122, the blue light
emitting layer 121, and the n.sup.+-type semiconductor layer 135
are selectively removed by ICP etching using, e.g., a chlorine
(Cl.sub.2) gas by using the formed metal thin film as a mask. At
this stage, the respective portions of the red light emitting layer
116, the green light emitting layer 122, and the blue light
emitting layer 121 overlying the first n-side electrode formation
region are also removed.
[0326] Next, as shown in FIG. 32C, the respective portions of the
n.sup.+-type semiconductor layer 135, the p.sup.+-type
semiconductor layer 134, and the active layer 133 overlying the
second n-side electrode formation layer 132a are selectively
removed by ICP etching, whereby the n-side electrode formation
layer 132a of the n-type semiconductor layer 132 is exposed.
[0327] Next, as shown in FIG. 32D, a resist film (not shown) having
opening patterns corresponding to the second n-side electrode
formation layer 132a and to the first n-side electrode formation
region of the n.sup.+-type semiconductor layer 135 is formed by
lithography after dry etching. Subsequently, an electrode formation
film composed of a multilayer film of Ti, Al, Ni, and Au is formed
by, e.g., electron beam vapor deposition over the entire surface of
the formed resist film. Then, the first and second n-side
electrodes 117 and 118, each of which is an ohmic electrode, are
formed from the electrode formation film by a so-called lift-off
process which removes the resist film. To reduce the contact
resistance of each of the first and second n-side electrodes 117
and 118, sintering may also be performed appropriately in a
nitrogen atmosphere at a temperature of, e.g., about 550.degree. C.
Subsequently, the resulting structure is divided into light
emitting diode chips each having a 350-.mu.m square size by, e.g.,
dicing. Further, each of the chips resulting from the division is
mounted on the specified region of the package 120 by using, e.g.,
a silver (Ag) paste. Thereafter, wire bonding is performed with
respect to the first and second n-side electrodes 117 and 118.
[0328] Thus, the fabrication method according to the ninth
embodiment allows one-chip integration of a white light emitting
diode in which the blue light emitting layer 121, the green light
emitting layer 122, and the red light emitting layer 116 are
excited by the ultraviolet light from the ultraviolet light
emitting diode 130. This enables the intensity of emission light in
the red range to be higher than in the conventional white light
emitting diode. As a result, it becomes possible to provide a white
light emitting diode which outputs white light having an excellent
color rendering property.
[0329] In addition, since the n.sup.+-type semiconductor layer 135
made of a nitride is lower in impurity energy level than a p-type
semiconductor layer made of a nitride or a p.sup.+-type
semiconductor layer and therefore can be reduced in resistance, the
diffusion of the current in a lateral direction (direction parallel
to the substrate surface) is sufficiently large so that a
transparent electrode as shown in the conventional embodiment need
not be provided. This not only simplifies the fabrication process
but also eliminates the absorption of the emission light by a
transparent electrode, which occurs when the transparent electrode
is provided. As a result, a high-brightness white light emitting
diode can be provided.
[0330] In the fabrication method according to the ninth embodiment,
the step of providing an insulating material containing a YAG
fluorescent material is unnecessary. In addition, since the first
and second n-side electrodes 117 and 118, each of which is an ohmic
electrode, have the same composition, they can be formed in the
same process step. This further simplifies the fabrication process
and allows fabrication at lower cost.
[0331] In the ninth embodiment also, it is possible to form an
electrode made of a high-reflectivity material as described in the
eighth embodiment and perform flip-chip mounting which mounts the
formed electrode made of the high-reflectivity material with a
silver bump or the like interposed between the package and the
electrode.
Embodiment 10
[0332] A tenth embodiment of the present invention will be
described with reference to the drawings.
[0333] FIG. 33A shows a cross-sectional structure of a
semiconductor light emitting device according to the tenth
embodiment and FIG. 33B shows a plan structure thereof. The
description of the components shown in FIGS. 33A and 33B which are
the same as those shown in FIGS. 30A and 30B will be omitted by
retaining the same reference numerals.
[0334] The tenth embodiment is different from the ninth embodiment
in that a substrate made of sapphire is separated and removed from
the ultraviolet light emitting diode 130 during the epitaxial
growth thereof, the second n-side electrode 118 composed of a
multilayer structure of titanium (Ti) and gold (Au) is provided on
the surface of the n-type semiconductor layer 132 from which the
substrate has been removed, and a plating layer 131 made of gold
(Au) with a thickness of 10 .mu.m or more, e.g., about 50 .mu.m is
provided to substantially function as the n-side electrode.
Preferably, a material having a reflectivity of 60% or more with
respect to ultraviolet light, blue light, green light, and red
light is used herein for the second n-side electrode 118. For
example, a single layer film made of, e.g., gold (Au), platinum
(Pt), copper (Cu), silver (Ag), or rhodium (Rh) or a multilayer
film containing at least two of the foregoing elements can be used.
For the gold plating layer 131, copper (Cu) or silver (Ag) can be
used instead of gold (Au).
[0335] If ultraviolet light at a wavelength of 340 .mu.m is
generated by injecting a current of, e.g., 20 mA in the ultraviolet
light emitting diode 130, white light having a spectrum pattern
equal to the spectrum shown in FIG. 31 is obtained.
[0336] With the arrangement, the semiconductor light emitting
device according to the tenth embodiment can be integrated as one
chip in which the blue light emitting layer 121, the green light
emitting layer 122, and the red light emitting layer 116 which
receive ultraviolet light outputted from the ultraviolet light
emitting diode 130 and generate blue light, green light, and red
light through excitation caused by the received ultraviolet light
are provided on the ultraviolet light emitting diode 130, similarly
to the semiconductor light emitting device according to the ninth
embodiment. Accordingly, the intensity of emission light in the red
range is higher than in an emission spectrum obtained from the
conventional white light emitting diode which provides white light
by exciting the YAG fluorescent material with blue light from the
blue light emitting diode. This allows a white light emitting diode
which outputs white light having an excellent color rendering
property to be provided.
[0337] Since it is unnecessary to provide an insulating material
containing a YAG fluorescent material and a transparent electrode
as provided conventionally, the absorption of emission light by the
transparent electrode, which occurs when the transparent electrode
is provided, is no more observed so that higher brightness is
achieved.
[0338] In addition, the tenth embodiment has formed the second
n-side electrode 118 over the entire surface (back surface) of the
n-type semiconductor layer 132 opposite to the active layer 133 by
removing the substrate made of sapphire for epitaxial growth and
further provided the gold plating layer 131 with a relatively large
thickness of 50 .mu.m. The arrangement significantly improves the
heat dissipation property of the ultraviolet light emitting diode
130 and allows a higher-output white light emitting diode to be
provided. In addition, since the second n-side electrode 118 and
the first n-side electrode 117 are disposed in opposing relation
with the active layer 133 interposed therebetween, a series
resistance between the second n-side electrode 118 and the first
n-side electrode 117 can be reduced advantageously. Since the
insulating substrate made of sapphire or the like has been removed,
it is unnecessary to provide the second n-side electrode 118 on the
upper portion of the n-type semiconductor layer 132. This achieves
a reduction in chip size and allows the elimination of the step of
etching away the n-side semiconductor layer 132 from the side of
the p.sup.+-type semiconductor layer 134.
[0339] For easy transmission of the excitation light, the thickness
of each of the red light emitting layer 116 and the green light
emitting layer 122 is minimized provided that sufficient emission
light is obtained.
[0340] The ultraviolet light emitting diode 130 may also be formed
with an underlie layer made of GaN and a thin-film buffer layer
made of GaN or AlN being interposed between the substrate 111 made
of sapphire and the n-type semiconductor layer 132.
[0341] Although the tenth embodiment has patterned each of the blue
light emitting layer 121, the green light emitting layer 122, and
the red light emitting layer 116 into islands each configured as a
square when viewed in a plan view, they need not necessarily be
patterned. For example, the blue light emitting layer 121, the
green light emitting layer 122, and the red light emitting layer
116 may also be formed over the entire upper surface of the
n.sup.+-type semiconductor layer 135 except for the region thereof
to be formed with the first n-side electrode 117. In the case of
forming each of the light emitting layers 121, 122, and 116 over
the entire surface, the area of the light emitting layer is
optimized to a value which optimizes the color rendering property
of the output light.
[0342] In the case where the ultraviolet light emitting diode 130
is replaced with the blue light emitting diode 110 used in the
eighth embodiment, the blue light emitting layer 121 need not be
provided.
[0343] Referring to the drawings, a description will be given
herein below to a method for fabricating the semiconductor light
emitting device thus constructed.
[0344] FIGS. 34A through 34D and FIGS. 35A through 35C show the
cross-sectional structures of the semiconductor light emitting
device according to the tenth embodiment in the individual process
steps of the fabrication method therefor.
[0345] First, as shown in FIG. 34A, the n-type semiconductor layer
132 made of n-type GaN, the active layer 133 having a multiple
quantum well structure made of InGaN, the p.sup.+-type
semiconductor layer 134 made of p.sup.+-type
Al.sub.0.05Ga.sub.0.95N, the n.sup.+-type semiconductor layer 135
made of n.sup.+-type Al.sub.0.05Ga.sub.0.95N, the blue light
emitting layer 121 made of undoped In.sub.0.15Ga.sub.0.85N, the
green light emitting layer 122 made of undoped
In.sub.0.2Ga.sub.0.8N, and the red light emitting layer 116 made of
undoped In.sub.0.4Ga.sub.0.6N are grown successively by MO CVD on
the substrate 111 made of sapphire having, a principal surface of
which the plane orientation is, e.g., the (0001) plane. As stated
previously, the p.sup.+n.sup.+ junction formed between the
p.sup.+-type semiconductor layer 134 and the n.sup.+-type
semiconductor layer 135 shows voltage-current characteristics close
to a low-resistance ohmic characteristic due to the tunnel current.
The active layer 133 is composed of five quantum well layers each
made of In.sub.0.02Ga.sub.0.98N having a thickness of 1.5 nm and
five barrier layers each made of Al.sub.0.15Ga.sub.0.85N having a
thickness of 10 nm, which are alternately stacked. However, the
structure of the active layer 133 is not limited thereto provided
that the emission wavelength is about 340 nm. The forbidden band
width of the blue light emitting layer 121 is 2.6 eV and emits blue
light at 470 mm. The forbidden band width of the green light
emitting layer 122 is 2.3 eV and emits green right at 555 nm. The
forbidden band width of the red light emitting layer 116 is 1.9 eV
and emits red light at 650 mm. It is possible to form an underlie
layer made of GaN and a thin-film buffer layer made of GaN or AlN
between the substrate 111 and the n-type semiconductor layer 132.
The active layer 133 may also be constituted to have the
composition of In which is nonuniform in the in-plane direction
(direction parallel to a substrate surface) of the active layer
133. It is also possible to obtain red emission light by using
InGaN doped with, e.g., zinc, magnesium, or silicon, instead of
using undoped In.sub.0.4Ga.sub.0.6N, and thereby forming the red
light emitting layer 116 such that the composition of In is lower
than 0.4.
[0346] Next, as shown in FIG. 34B, a metal thin film (not shown)
made of nickel and having a pattern consisting of a plurality of
discrete and spaced-apart squares each having, e.g., 2-.mu.m to
20-.mu.m sides is formed on the red light emitting layer 116.
Subsequently, respective upper portions of the red light emitting
layer 116, the green light emitting layer 122, the blue light
emitting layer 121, and the n.sup.+-type semiconductor layer 135
are selectively removed by ICP etching using, e.g., a chlorine
(Cl.sub.2) gas by using the formed metal thin film as a mask. At
this stage, the respective portions of the red light emitting layer
116, the green light emitting layer 122, and the blue light
emitting layer 121 overlying the first n-side electrode formation
region are also removed.
[0347] Next, as shown in FIG. 34C, a resist film (not shown) having
an opening pattern corresponding to the first n-side electrode
formation region of the n.sup.+-type semiconductor layer 135 is
formed by lithography after dry etching. Subsequently, an electrode
formation film composed of a multilayer film of Ti, Al, Ni, and Au
is formed by, e.g., electron beam vapor deposition over the entire
surface of the formed resist film. Then, the first n-side electrode
117, which is an ohmic electrode, is formed from the electrode
formation film by a so-called lift-off process which removes the
resist film. To reduce the contact resistance of the first n-side
electrode 117, sintering may also be performed appropriately in a
nitrogen atmosphere at a temperature of, e.g., about 550.degree.
C.
[0348] Next, as shown in FIG. 34D, after the formation of the first
p-side electrode 117, a holding substrate 151 made of silicon is
bonded to the n.sup.+-type semiconductor layer 135 containing the
first n-side electrode 117, the red light emitting layer 116, and
the like by using, e.g., an epoxy-based adhesive agent 152. The
material of the holding substrate 151 is not limited to silicon. A
polymer film may also be used for the holding substrate 151.
[0349] Next, as shown in FIG. 35A, a high-output and
short-wavelength pulse laser beam which is not absorbed by the
substrate 111 but is absorbed by the n-type semiconductor layer
132, such as the third-harmonic beam of a YAG laser at a wavelength
of 355 m or a KrF excimer laser beam at a wavelength of 248 nm, is
applied in a scanning manner to the surface of the substrate 111
opposite to the holding substrate 151 for the irradiation thereof.
At this time, the applied laser beam is absorbed by the portion of
the n-type semiconductor layer 132 made of GaN which is adjacent to
the interface between itself and the substrate 111. As a result,
the portion of the n-type semiconductor layer 132 which is adjacent
to the interface with the substrate 111 is heated and, if the
temperature becomes 900.degree. C. or higher through the absorption
of the laser beam, the portion of the n-type semiconductor layer
132 adjacent to the interface with the substrate 111 is decomposed
into a metal gallium (Ga) gas and a nitrogen (N.sub.2) gas, so that
a decomposition layer is formed.
[0350] Then, the substrate 111 formed with the decomposition layer
is separated from the n-type semiconductor layer 132 by heating the
substrate 111 to a temperature not less than 29.degree. C., which
is a melting point of gallium, or by immersing the substrate 111 in
an aqueous hydrogen chloride (HCl) solution and thereby melting or
removing metal gallium contained in the decomposition layer.
Thereafter, the second n-side electrode 118 composed of a
multilayer film of titanium (Ti) and gold (Au) is formed by, e.g.,
electron beam vapor deposition on the exposed surface from which
the substrate 111 has been separated and removed. Subsequently, the
gold plating layer 131 with a thickness of about 50 .mu.m is formed
by electrolytic plating using the gold (Au) layer of the second
n-side electrode 118 as an underlie, whereby the structure shown in
FIG. 35B is obtained.
[0351] Next, as shown in FIG. 35C, the adhesive agent 53 is removed
by using, e.g., acetone so that the holding substrate 151 is
removed. Then, the resulting structure is divided into light
emitting diode chips each having a 350-.mu.m square size by, e.g.,
dicing. Subsequently, each of the chips resulting from the division
is mounted on the specified region of a package (not shown) by
using, e.g., a silver (Ag) paste. Thereafter, wire bonding is
performed with respect to the first n-side electrode 117, whereby
the white light emitting diode is obtained.
[0352] Thus, the fabrication method according to the tenth
embodiment allows one-chip integration of a white light emitting
diode in which each of the blue light emitting layer 121, the green
light emitting layer 122, and the red light emitting layer 116 is
excited by the ultraviolet light outputted from the ultraviolet
light emitting diode 130. This enables the intensity of emission
light in the red range to be higher than in the conventional white
light emitting diode. As a result, it becomes possible to provide a
white light emitting diode outputs white light having an excellent
color rendering property.
[0353] In addition, since the n.sup.+-type semiconductor layer 135
made of a nitride is lower in impurity energy level than a p-type
semiconductor layer made of a nitride or a p.sup.+-type
semiconductor layer and therefore can be reduced in resistance, the
diffusion of the current in a lateral direction (direction parallel
to the substrate surface) is sufficiently large so that a
transparent electrode as shown in the conventional embodiment need
not be provided. This not only simplifies the fabrication process
but also eliminates the absorption of the emission light by a
transparent electrode, which occurs when the transparent electrode
is provided. As a result, a high-brightness white light emitting
diode can be provided.
[0354] In addition, the substrate made of sapphire which is not
excellent in heat dissipation property is removed and the gold
plating layer 131 which is excellent in heat dissipation property
is provided in place thereof so that a higher output is
produced.
[0355] Although the tenth embodiment has described the separation
method which applies the high-output short-wavelength pulse laser
beam for the separation of the substrate 111 made of sapphire, the
separation of the substrate 111 is not limited to the method using
laser irradiation. It is also possible to, e.g., use the substrate
111 made of silicon (Si) or gallium arsenide (GaAs) in place of the
substrate 111 made of sapphire and separate and remove the
substrate 111 by wet etching using an acid.
[0356] In each of the ninth and tenth embodiments, the plane
orientation of the principal surface of sapphire used as the
substrate for epitaxial growth is not particularly limited. In the
case of using, e.g., sapphire, a plane orientation at an off-angle
from a representative (typical) plane orientation, such as the
(0001) plane, may also be adopted.
[0357] The material of the substrate for epitaxial growth is not
limited to sapphire. Besides sapphire, there can be used silicon
carbide (SiC), zinc oxide (ZnO), silicon (Si), gallium arsenide
(GaAs), gallium phosphide (GaP), indium phosphide (InP), gallium
nitride (GaN), aluminum nitride (AlN), magnesium oxide (MgO), or
lithium aluminum gallium oxide (LiAl.sub.xGa.sub.1-xO.sub.2 (where
0.ltoreq.x.ltoreq.1)).
[0358] The composition of each of the nitride semiconductor layers
composing the blue light emitting diode 110 and the ultraviolet
light emitting diode 130 and the composition of each of the nitride
semiconductor layers composing the individual layers which emit
light through excitation, such as the red light emitting layer 116,
are not limited to those shown in the individual embodiments. The
method for crystal growth is not limited to MOCVD and a
semiconductor layer formed by using, e.g., an MBE (Molecular Beam
Epitaxy) process or a HVPE (Hydride Vapor Phase Epitaxy) process
may also be contained. Each of the semiconductor layers may also
contain a group V element such as arsenide (As) or phosphorous (P)
or a group III element such as boron (B) as a constituent
element.
[0359] As described above, the semiconductor light emitting device
according to the present invention allows one-chip integration of a
high-output white light emitting diode structure featuring an
excellent color rendering property and high brightness and is
useful as the back light of a liquid crystal display device, a
white light source for illumination, or the like.
* * * * *