U.S. patent application number 12/014145 was filed with the patent office on 2009-07-16 for manufacturing method of isothermal vapor chamber and product thereof.
Invention is credited to Chin-Wen WANG.
Application Number | 20090178784 12/014145 |
Document ID | / |
Family ID | 40849657 |
Filed Date | 2009-07-16 |
United States Patent
Application |
20090178784 |
Kind Code |
A1 |
WANG; Chin-Wen |
July 16, 2009 |
Manufacturing Method of Isothermal Vapor Chamber And Product
Thereof
Abstract
A manufacturing method of a isothermal vapor chamber and a
product thereof are to use an integrated manner to form an orifice
directly on a plate body of a isothermal vapor chamber. Through the
orifice, the operations of injecting working fluid and degassing or
vacuating can be proceeded. The orifice is functionally similar to
a degassing tube or a vacuating tube of the prior arts. However,
since the orifice is integrated on the plate body of the isothermal
vapor chamber body, it can be pressed to seal the isothermal vapor
chamber after an operation of degassing. Therefore, the vacuity in
the isothermal vapor chamber and the stored amount of the working
fluid, and it is easier for manufacture.
Inventors: |
WANG; Chin-Wen; (Pingzhen
City, TW) |
Correspondence
Address: |
HDLS Patent & Trademark Services
P.O. BOX 220746
CHANTILLY
VA
20153-0746
US
|
Family ID: |
40849657 |
Appl. No.: |
12/014145 |
Filed: |
January 15, 2008 |
Current U.S.
Class: |
165/104.26 |
Current CPC
Class: |
F28D 15/0233 20130101;
F28D 15/04 20130101; F28F 3/12 20130101; B23P 2700/09 20130101;
B23P 15/26 20130101; F28D 15/0283 20130101 |
Class at
Publication: |
165/104.26 |
International
Class: |
F28D 15/00 20060101
F28D015/00 |
Claims
1. A manufacturing method of an isothermal vapor chamber, including
following steps: a) combining corresponding two plates to form a
hollow plate body having an accommodating space therein; b)
integratedly forming a projected orifice on one of the plates,
wherein the orifice communicates to the accommodating space; c)
sealing circumferential edges of the plate body except the orifice;
d) vacuating the accommodating space in the plate body via the
orifice; and e) pressing the orifice to close up.
2. The manufacturing method according to claim 1, wherein step c)
further includes sealing the two plates by means of welding.
3. The manufacturing method of according to claim 2, wherein the
welding means is meant by a diffusive or plasma welding
process.
4. The manufacturing method according to claim 1, wherein step d)
further includes injecting a working fluid into the plate body via
the orifice.
5. The manufacturing method according to claim 1, further
comprising a step f after the step e: melting the orifice.
6. An isothermal vapor chamber, comprising: a hollow plate body
composed of two plates, having an accommodating space therein,
wherein circumferential edges of the plate body are all formed as
sealing sides, outer edges of the sealing sides are all arranged
with welding portions, a projected orifice integratedly extends
from one of the sealing sides, and one portion of the orifice is of
a flat shape to be sealed; and a capillary structure attached on
inner walls of the plate body.
7. The isothermal vapor chamber according to claim 6, wherein each
contour of the two plates is of a rectangular shape, and at least
one beveled corner is reserved at an intersection of any two
adjacent sealing sides of the two plate, while the orifice is
located at the corner.
8. The isothermal vapor chamber according to claim 6, wherein each
contour of the two plates is of a circular shape.
9. The isothermal vapor chamber according to claim 6, wherein the
orifice includes a shrunk tube and an expanded tube communicated to
one end of the shrunk tube, and the flat part of the orifice is
just the shrunk tube.
10. The isothermal vapor chamber according to claim 9, wherein an
outer edge of the expanded tube of the orifice is further formed as
a sealing side.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention generally relates to a cooling
technique, in particular, to a heat pipe.
[0003] 2. Description of Prior Art
[0004] An isothermal vapor chamber is a kind of heat pipes formed
as a flat plate, which has a similar working principle as a common
heat pipe. Namely, through an internal environment of vacuum, a
working fluid contained therein can generate a phase change from
liquid to vapor for transferring heat from a heated end to a
cooling end. The working fluid condenses into liquid phase at the
cooling end, flows back to the heated end and repeats the
cycle.
[0005] However, an isothermal vapor chamber is different from a
heat pipe in terms of manufacture process. The tube body of a heat
pipe is usually formed as a tube configuration, one end of which
can be sealed first, then another side of which can be processed
with the operations of injecting working fluid and degassing.
Immediately after the degassing is finished, the tube body is
sealed so as to complete a manufacturing process of a heat pipe.
Nonetheless, the plate body of an isothermal vapor chamber is form
as a flat plate, which is constructed by closing two plates that
are closed up. Not only do the circumferential edges of the closing
two plates have to be sealed, but also an injection port has to be
pre-made as well, such that it may process aforementioned
operations, such as: an injection of working fluid, a de-aeration,
or an evacuation, etc. During the manufacturing process of an
isothermal vapor chamber according to the prior arts, a de-aerating
tube or an evacuating tube has to be inserted into the injection
port first, such that it is possible to process the operations of
an injection of working fluid, a de-aeration, and an evacuation.
After aforementioned operations are finished, the de-aerating tube
or the evacuating tube has to be removed, so that it is possible to
seal the injection port subsequently. Under such circumstance, the
vacuity in the isothermal vapor chamber and the stored amount of
the working fluid will be influenced and out of accurate control.
In the meantime, the manufacturing process is more difficult.
[0006] Accordingly, aiming to solve aforementioned shortcomings,
after a substantially devoted study, in cooperation with the
application of relatively academic principles, the inventor has at
last proposed the present invention that is designed reasonably to
possess the capability to improve the prior arts significantly.
SUMMARY OF THE INVENTION
[0007] The invention is mainly to provide a manufacturing method of
an isothermal vapor chamber and a product thereof. According to the
invention, an integrating manner is applied to form an orifice
directly on a plate body of an isothermal vapor chamber for being
able to process the operations of an injection of working fluid, a
de-aeration, and an evacuation. The orifice is functionally similar
to a degassing tube or a vacuating tube in the prior arts but,
since the orifice is integrated on the plate body of the isothermal
vapor chamber, as soon as aforementioned operations have been
processed, an immediate pressing and sealing operation can be
subsequently processed, so it is possible to accurately control the
vacuity in the isothermal vapor chamber and the stored amount of
the working fluid. Furthermore, its manufacturing method is much
easier.
[0008] To achieve the above-mentioned objects, the invention is to
provide an isothermal vapor chamber, which includes a hollow plate
body and a capillary structure attached on inner walls thereof.
According to the invention, the plate body is constructed by
closing two plates. There are sealing sides formed around the
circumferences of the closing two plates. Particularly, a welding
part is arranged at the outer edges between the sealing sides of
the closing two plates, and a projected orifice is integrated on
any one of the sealing sides.
BRIEF DESCRIPTION OF DRAWING
[0009] The features of the invention believed to be novel are set
forth with particularity in the appended claims. The invention
itself, however, may be best understood by reference to the
following detailed description of the invention, which describes a
number of exemplary embodiments of the invention, taken in
conjunction with the accompanying drawings, in which:
[0010] FIG. 1 is a step flowchart of a method according to the
present invention;
[0011] FIG. 2 is a perspective explosive view of the isothermal
vapor chamber according to the present invention;
[0012] FIG. 3 is a perspective assembled view of the isothermal
vapor chamber according to the present invention;
[0013] FIG. 4 is a partially enlarging view of the "A" part in FIG.
3;
[0014] FIG. 5 is an illustration of the isothermal vapor chamber in
FIG. 4, in which the circumferential edges have been sealed;
[0015] FIG. 6 is a cross-sectional view of the isothermal vapor
chamber in FIG. 5 sectioned along a "6-6" sectional line;
[0016] FIG. 7 is an illustration of the isothermal vapor chamber in
FIG. 5, in which the orifice has been pressed to be sealed;
[0017] FIG. 8 is an illustration of the isothermal vapor chamber in
FIG. 7, in which the orifice has been melted to be sealed;
[0018] FIG. 9 is an explosively perspective view of the isothermal
vapor chamber according to another preferable embodiment of the
present invention;
[0019] FIG. 10 is a partially enlarging view of a pressed and
sealed orifice of the isothermal vapor chamber according to a
further preferable embodiment of the present invention; and,
[0020] FIG. 11 is an illustration of the isothermal vapor chamber
in FIG. 10, in which some parts of the orifice have been cut
off.
DETAILED DESCRIPTION OF THE INVENTION
[0021] In cooperation with attached drawings, the technical
contents and detailed description of the present invention are
described thereinafter according to a number of preferable
embodiments, being not used to limit its executing scope. Any
equivalent variation and modification made according to appended
claims is all covered by the claims claimed by the present
invention.
[0022] Please refer to FIG. 1, which is a step flowchart of a
method according to the present invention. The invention is to
provide a manufacturing method of an isothermal vapor chamber and a
product thereof, its method including following steps:
[0023] First, the method combines two plates to form a hollow plate
body having an accommodating space in step S1. Secondly, the method
forms a projected orifice on one of the plates in step S2. After
step S2, the method seals circumferential edges of the plate body
except the orifice in step S3. Next, the method vacuates the
accommodating space via the orifice in step S4. Finally, the method
press the orifice to close up in step S5.
[0024] As shown in FIG. 2, the two plates 10, 11 forming the plate
body 1 of the isothermal vapor chamber are illustrated. The two
plates 10, 11 are closed up to constitute the plate body 1, in
which the accommodating space 12 is formed therein, as shown in
FIG. 6. The closing two plates 10, 11 respectively shown as a
substantially flat plate are all made of materials with good heat
conductivity, such as: aluminum, copper, etc. According to the
preferable embodiments of the present invention, the accommodating
space 12 is formed by flatly projecting one plate 10 outwardly.
Additionally, a capillary structure 2 is attached on inner walls of
the accommodating space 12.
[0025] As shown in FIG. 3, there are sealing sides 100, 110 formed
around the all circumferential edges of the closing two plates 10,
11. The sealing sides 100, 110 are to seal the accommodating space
12 in the plate body 1 after the two plates 10, 11 have been closed
up. In this case, each contour of the closing two plates 10, 11 is
all shown as a rectangular shape. At any intersection of two
adjacent sealing sides 100, 110 of the closing two plates 10, 11,
at least a beveled corner 101, 111 is reserved. Thereby, the
projected orifice 13 is integrated at the comers 101, 111 of any
one of the closing two plates 10, 11. In the meantime, the orifice
13 is communicated to the aforementioned accommodating space 12.
The orifice 13 is located at the corner 101 of the upper closing
plate 10. More specifically, as shown in FIG. 4, the orifice 13
includes: a shrunk tube 130 communicated to the accommodating space
12, an expanded tube 131 communicated to an end of the shrunk tube
130, and a through hole 132 sequentially penetrating the expanded
tube 131 and the shrunk tube 130 from an outer edge of the corner
101 for being communicated to the accommodating space 12.
[0026] As shown in FIG. 5, after the two plates 10, 11 are closed
up, their circumferential sides are sealed through a jointing or
welding manner, for example, diffusive or plasma weld, while the
orifice 13 is reserved not to seal. The accommodating space 12 can
be processed with several operations via the expanded tube 131 of
the orifice 13, for example, injecting working fluid and degassing
or vacuating. It is easier for processing the operations, such as
injecting working fluid, because the diameter of the expanded tube
131 is larger than that of the shrunk tube 130.
[0027] As shown in FIG. 6, immediately after a degassing or
vacuating operation is finished, the shrunk tube 130 of the orifice
13 is pressed by means for die-stamping. It is easier to control
the sealing quality of the isothermal vapor chamber during the
sealing operation, because the diameter of the shrunk tube 130 is
smaller than that of the expanded tube 131. Furthermore, as shown
in FIG. 7, the pressed orifice 13 will seal the through hole 132
due to its deformation, by means of which the orifice 13 is sealed,
and thus a vacuity of the accommodating space 12 may be maintained.
In other words, a manufacturing process of the isothermal vapor
chamber is preliminarily completed.
[0028] As shown in FIG. 8, in order to ensure a sealing
effectiveness of the orifice 13, it is also possible to melt the
expanded tube of the orifice 13 in a further step. Namely, after
the expanded tube 131 of the orifice 13 is sealed through melting
its own material, an outer edge of the through hole 132 of the
orifice 13 may be furthermore sealed.
[0029] Furthermore, as shown in FIG. 9, each contour of the closing
two plate 10, 11 may also be a circular shape, while the sealing
sides 100, 110 of the two closing plates is correspondingly
circulars surrounding the plates. More specifically, the sealing
sides 100, 110 of the two closing plates 10, 11 are all a flat
block 102, 112 projected outwardly, such that the orifice 13 is
integrated on any one block of the two flat blocks 102, 112 of the
closing two plates 10, 11. In this preferable embodiment, the
orifice 13 is still located at the flat block 102 of the upper
plate 10.
[0030] As shown in FIG. 10, the sealing process of the
circumferential sides of the two closing plates 10, 11 and the
pressing process of the orifice part 13 to be sealed are same as
those steps described thereinbefore. However, after the shrunk tube
130 of the orifice 13 is pressed to be sealed, the flat blocks 102,
112 of the closing two plates are then cut off and, once again, the
unsealed sealing sides 100, 110 of the closing two plates 10, 11
are sealed by means of jointing or welding, thus that a circular
isothermal vapor chamber is obtained, just as shown in FIG. 11.
[0031] According to aforementioned step flowchart, it is possible
to obtain a manufacturing method of the above-mentioned isothermal
vapor chamber.
[0032] In addition, referring back to FIG. 6 and FIG. 7, the
isothermal vapor chamber provided by the invention includes: a
plate body 1; an accommodating space 12 formed in the plate body 1;
and a capillary structure 2 attached on inner walls of the
accommodating space 12. In this preferable embodiment, the plate
body 1 is constructed by closing two plates 10, 11, on
circumferential edges of which sealing sides 100, 110 are all
formed, between which a welding portion 14 is formed due to a
welding process, and a projected orifice 13 is integrated at any
one of the two sealing sides 100, 110. At least one part of the
orifice 13 is shown as a flat shape to be sealed. Or, as further
shown in FIG. 8, an outer edge of a through hole 132 of the orifice
part 13 is formed as a sealing side 133, resulting from a melting
process.
[0033] According to aforementioned structure, an isothermal vapor
chamber of the present invention is thereby obtained.
[0034] Summarizing aforementioned description, the invention is an
indispensably novel structure for a compressor indeed, which may
positively reach the expected usage objective for solving the
drawbacks of the prior arts, and which extremely possesses the
innovation and progressiveness to completely fulfill the applying
merits of new type patent, according to which the invention is
thereby applied. Please examine the application carefully and grant
it as a formal patent for protecting the rights of the
inventor.
[0035] However, the aforementioned description is only a preferable
embodiment according to the present invention, being not used to
limit the patent scope of the invention, so equivalently structural
variation made to the contents of the present invention, for
example, description and drawings, is all covered by the claims
claimed thereinafter.
* * * * *