U.S. patent application number 11/958816 was filed with the patent office on 2008-07-03 for substrate transporting apparatus, substrate platform shelf and substrate processing apparatus.
Invention is credited to Ichiro Mitsuyoshi.
Application Number | 20080159832 11/958816 |
Document ID | / |
Family ID | 39584217 |
Filed Date | 2008-07-03 |
United States Patent
Application |
20080159832 |
Kind Code |
A1 |
Mitsuyoshi; Ichiro |
July 3, 2008 |
SUBSTRATE TRANSPORTING APPARATUS, SUBSTRATE PLATFORM SHELF AND
SUBSTRATE PROCESSING APPARATUS
Abstract
In a substrate processing apparatus consisting of an indexer
block and a processing block, a substrate is transported between
the indexer block and the processing block by an indexer robot. The
indexer robot includes two hands that are provided one above the
other on a rotating stage. The other hand moves in a vertical
direction to one hand. A difference in height between the one hand
and the other hand can be adjusted so as to be equal to spacing
between substrate storing grooves of a carrier where the substrate
that is to be carried into the indexer block is stored. In
addition, the difference in height between the one hand and the
other hand can be adjusted so as to be equal to spacing between
support plates of a substrate platform provided between the indexer
block and the processing block.
Inventors: |
Mitsuyoshi; Ichiro;
(Kyoto-shi, JP) |
Correspondence
Address: |
OSTROLENK FABER GERB & SOFFEN
1180 AVENUE OF THE AMERICAS
NEW YORK
NY
100368403
US
|
Family ID: |
39584217 |
Appl. No.: |
11/958816 |
Filed: |
December 18, 2007 |
Current U.S.
Class: |
414/217 ;
134/140 |
Current CPC
Class: |
H01L 21/67766 20130101;
H01L 21/67781 20130101 |
Class at
Publication: |
414/217 ;
134/140 |
International
Class: |
B65G 1/12 20060101
B65G001/12; B08B 13/00 20060101 B08B013/00 |
Foreign Application Data
Date |
Code |
Application Number |
Dec 27, 2006 |
JP |
2006-352000 |
Claims
1. A substrate transporting apparatus that transports a substrate
between a storing container having a plurality of stages of storing
grooves where the substrate is stored in a substantially horizontal
posture and a substrate platform shelf having a plurality of stages
of storing shelves where the substrate is placed in the
substantially horizontal posture, comprising: first and second
substrate holders that are provided one above the other and hold
the substrate in the substantially horizontal posture; a driving
mechanism that advances and withdraws said first and second
substrate holders in a substantially horizontal direction while
moving said first and second substrate holders for transferring and
receiving the substrate to and from said storing container and
transferring and receiving the substrate to and from said substrate
platform shelf; and an adjusting mechanism that adjusts a
difference in height between said first substrate holder and said
second substrate holder, wherein said adjusting mechanism adjusts
the difference in height between said first and second substrate
holders to be the same as a difference in height between said
storing grooves of said storing container when the substrate is
transferred and received between said storing container and said
first and second substrate holders and adjusts the difference in
height between said first and second substrate holders to be the
same as a difference in height between the storing shelves of said
substrate platform shelf when the substrate is transferred and
received between said substrate platform shelf and said first and
second substrate holders.
2. The substrate transporting apparatus according to claim 1,
wherein said driving mechanism individually advances and withdraws
said first and second substrate holders in the substantially
horizontal direction for transferring and receiving the substrate
to and from said storing container and for transferring and
receiving the substrate to and from said substrate platform
shelf.
3. A substrate platform shelf for transferring and receiving a
substrate between a first substrate transporting apparatus having
first and second substrate holders that are provided one above the
other and a second substrate transporting apparatus having third
and fourth substrate holders that are provided one above the other,
comprising: a plurality of stages of storing shelves that support
the substrates in substantially horizontal postures, respectively;
and an adjusting mechanism that adjusts a difference in height
between the storing shelves, wherein said adjusting mechanism
adjusts the difference in height between said storing shelves to be
the same as a difference in height between said first and second
substrate holders when the substrate is transferred and received to
and from said first substrate transporting apparatus and adjusts
the difference in height between said storing shelves to be the
same as a difference in height between said third and fourth
substrate holders when the substrate is transferred and received to
and from said second substrate transporting apparatus.
4. The substrate platform shelf according to claim 3, wherein each
stage of the storing shelves includes a set of shelves arranged at
a predetermined spacing within a substantially horizontal plane and
a plurality of support members that are provided in said set of
shelves and support a lower surface of the substrate.
5. A substrate processing apparatus that performs processing on a
substrate, comprising: a processing region for processing the
substrate; a carrying in and out region for carrying the substrate
into and out of said processing region; and an interface that
transfers and receives the substrate between said processing region
and said carrying in and out region, wherein said carrying in and
out region includes a container platform where a storing container
having a plurality of stages of storing grooves for storing the
substrate in a substantially horizontal posture is placed, and a
first substrate transporting apparatus that transports the
substrate between the storing container placed in said container
platform and said interface, said processing region includes a
processing unit that performs processing on the substrate and a
second substrate transporting apparatus that transports the
substrate between said interface and said processing unit, said
interface includes a substrate platform shelf having a plurality of
stages of storing shelves where the substrate is placed in the
substantially horizontal posture, said first substrate transporting
apparatus includes first and second substrate holders that are
provided on above the other and hold the substrate in the
substantially horizontal posture, a driving mechanism that advances
and withdraws said first and second substrate holders in a
substantially horizontal direction while moving said first and
second substrate holders for transferring and receiving the
substrate to and from said storing container and for transferring
and receiving the substrate to and from said substrate platform
shelf, and an adjusting mechanism that adjusts a difference in
height between said first substrate holder and said second
substrate holder, and said adjusting mechanism adjusts the
difference in height between said first and second substrate
holders to be the same as a difference in height between said
storing grooves of said storing container when the substrate is
transferred and received between said storing container and said
first and second substrate holders, and adjusts the difference in
height between said first and second substrate holders to be the
same as a difference in height between the storing shelves of said
substrate platform shelf when the substrate is transferred and
received between said substrate platform shelf and said first and
second substrate holders.
6. The substrate processing apparatus according to claim 5, wherein
said processing unit includes a cleaning processing unit that
cleans the substrate.
7. A substrate processing apparatus that performs processing on a
substrate, comprising: a processing region for processing a
substrate; a carrying in and out region for carrying the substrate
into and out of said processing region; and an interface that
transfers and receives the substrate between said processing region
and said carrying in and out region, wherein said carrying in and
out region includes a container platform where a storing container
having a plurality of stages of storing grooves for storing the
substrate in a substantially horizontal posture is placed, a first
substrate transporting apparatus having first and second substrate
holders that are provided one above the other and transports the
substrate between the storing container placed in said container
platform and said interface, said processing region includes a
processing unit that performs processing on the substrate and a
second substrate transporting apparatus having third and fourth
substrate holders that are provided one above the other and
transports the substrate between said interface and said processing
unit, said interface includes a substrate platform shelf having a
plurality of stages of storing shelves where the substrate is
placed in the substantially horizontal posture, said substrate
platform shelf includes a plurality of stages of storing shelves
that support the substrates in the substantially horizontal
postures, respectively, and an adjusting mechanism that adjust a
difference in height between the storing shelves, and said
adjusting mechanism adjusts the difference in height between said
storing shelves to be the same as a difference in height between
said first and second substrate holders when the substrate is
transferred and received to and from said first substrate
transporting apparatus, and adjusts the difference in height
between said storing shelves to be the same as a difference in
height between said third and fourth substrate holders when the
substrate is transferred and received to and from said second
substrate transporting apparatus.
8. The substrate processing apparatus according to claim 7, wherein
said processing unit includes a cleaning processing unit that
cleans the substrate.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention relates to a substrate transporting
apparatus that transports a substrate, a substrate platform shelf
where the substrate is placed and a substrate processing apparatus
that processes the substrate.
[0003] 2. Description of the Background Art
[0004] Substrate processing apparatuses have been conventionally
used to perform various types of processes on substrates such as
semiconductor wafers, glass substrates for photomasks, glass
substrates for liquid crystal displays, glass substrates for plasma
displays, substrates for optical disks, substrates for magnetic
disks, substrates for magneto-optical disks or the like.
[0005] The substrate processing apparatus described in JP 10-150090
A is explained as an example of the substrate processing apparatus.
FIG. 11 is a plan view showing the substrate processing apparatus
described in JP 10-150090 A. As shown in FIG. 11, this substrate
processing apparatus 900 includes an indexer 910 and a processing
module 920.
[0006] The indexer 910 includes an indexer robot 912 that moves
back and forth along an indexer transport path 911 that linearly
extends and a cassette platform 913 where a plurality of carriers C
can be placed along the indexer transport path 911. The plurality
of substrates W are stored in the carriers C.
[0007] The processing module 920 includes a main transport robot
922 that moves back and forth along a main transport path 921 that
is perpendicular to the indexer transport path 911 and a pair of
unit sections 930A, 930B provided such that the main transport path
921 is sandwiched therebetween. Processing chambers 933, 934 for
performing processing on the substrate W are provided in each of
the unit sections 930A, 930B. In the substrate processing apparatus
900, transportation of the substrate W is performed as follows.
[0008] First, the carrier C is carried into the cassette platform
913 from outside of the substrate processing apparatus 900. Then,
the unprocessed substrate W stored in the carrier C is taken out by
the indexer robot 912 and transferred to the main transport robot
922.
[0009] The substrate W transferred to the main transport robot 922
is carried into the processing chambers 933, 934 and subjected to
cleaning processing. Thereafter, the processed substrate W is again
stored in the carrier C by the main transport robot 922 and the
indexer robot 912.
[0010] In the above-described substrate processing apparatus 900,
the indexer robot 912 includes a substrate taking out arm for
taking the unprocessed substrate W out of the carrier C and a
substrate storing arm for storing the processed substrate W in the
carrier C.
[0011] For example, the indexer robot 912 takes the unprocessed
substrate W out of the carrier C and transports it, and transfers
the substrate W to the main transport robot 922. Also, the indexer
robot 912 receives the processed substrate W from the main
transport robot 922 and transports it, and stores the substrate W
in the carrier C.
[0012] In the operation of the indexer robot 912, the carrier C of
which the indexer robot 912 takes the unprocessed substrate W out
and the carrier C in which the indexer robot 912 stores the
processed substrate W are different from each other in some
cases.
[0013] In this case, after storing the processed substrate W in one
carrier C, the indexer robot 912 must move along the indexer
transport path 911 toward the other carrier C in which the
unprocessed substrate W is stored. This prevents the throughput in
the substrate processing apparatus 900 from being improved.
[0014] Therefore, it is proposed that the operation speed of the
indexer robot 912 is increased to improve the throughput in the
substrate processing apparatus 900. However, the operation speed of
the indexer robot 912 can not be remarkably increased due to the
following reasons.
[0015] In the carriers C, the spacing for storing the substrates W
is very small in order to store more of the substrate W. Thus, the
substrate taking out arm and the substrate storing arm of the
indexer robot 912 are manufactured so that their radial thicknesses
are small, corresponding to the spacing for storing the substrate W
in the carriers C. Therefore, rigidity of the substrate taking out
arm and the substrate storing arm is not very high.
[0016] Accordingly, if the operation speed of the indexer robot 912
is remarkably increased, vibration, deformation or the like is
generated to each of the arms. This causes poor transportation of
the substrate W.
SUMMARY OF THE INVENTION
[0017] It is an object of the present invention to provide a
substrate transporting apparatus, a substrate platform shelf and a
substrate processing apparatus capable of sufficiently reducing
transport time of a substrate.
[0018] (1) According to an aspect of the present invention, a
substrate transporting apparatus that transports a substrate
between a storing container having a plurality of stages of storing
grooves where the substrate is stored in a substantially horizontal
posture and a substrate platform shelf having a plurality of stages
of storing shelves where the substrate is placed in the
substantially horizontal posture includes first and second
substrate holders that are provided one above the other and hold
the substrate in the substantially horizontal posture, a driving
mechanism that advances and withdraws the first and second
substrate holders in a substantially horizontal direction while
moving the first and second substrate holders for transferring and
receiving the substrate to and from the storing container and
transferring and receiving the substrate to and from the substrate
platform shelf, and an adjusting mechanism that adjusts a
difference in height between the first and second substrate
holders, wherein the adjusting mechanism adjusts the difference in
height between the first and second substrate holders to be the
same as a difference in height between the storing grooves of the
storing container when the substrate is transferred and received
between the storing container and the first and second substrate
holders and adjusts the difference in height between the first and
second substrate holders to be the same as a difference in height
between the storing shelves of the substrate platform shelf when
the substrate is transferred and received between the substrate
platform shelf and the first and second substrate holders.
[0019] The substrate transporting apparatus transfers and receives
the substrate to and from the storing container having the
plurality of stages of storing grooves by using the first and
second substrate holders that are provided one above the other. The
difference in height between the first and second substrate holders
is adjusted to be the same as the difference in height between the
storing grooves of the storing container by the adjusting mechanism
when the substrate is transferred and received.
[0020] Thus, the first and second substrate holders can be easily
inserted between the storing grooves of the storing container,
respectively, by being advanced in the substantially horizontal
direction by the driving mechanism. Accordingly, the plurality of
substrates are smoothly transferred and received between the first
and second substrate holders and the storing grooves of the storing
container.
[0021] In addition, the substrate transporting apparatus transfers
and receives the substrate to and from the substrate platform shelf
having the plurality of stages of storing shelves by using the
first and second substrate holders. The difference in height
between the first and second substrate holders is adjusted to be
the same as the difference in height between the storing shelves of
the substrate platform shelf by the adjusting mechanism when the
substrate is transferred and received.
[0022] Thus, the first and second substrate holders can be easily
inserted between the storing shelves of the substrate platform
shelf, respectively, by being advanced in the substantially
horizontal direction by the driving mechanism. Accordingly, the
plurality of substrates are smoothly transferred and received
between the first and second substrate holders and the storing
shelves of the substrate platform shelf.
[0023] As described above, even though the difference in height
between the storing grooves of the storing container and the
difference in height between the storing shelves of the substrate
platform shelf are different from each other, the first and second
substrate holders can simultaneously transfer and receive the
plurality of substrates to and from the storing container and to
and from the substrate platform shelf. This allows the transport
time of the substrate to be sufficiently reduced.
[0024] (2) The driving mechanism may individually advance and
withdraw the first and second substrate holders in the
substantially horizontal direction for transferring and receiving
the substrate to and from the storing container and for
transferring and receiving the substrate to and from the substrate
platform shelf.
[0025] In this case, the first and second substrate holders are
individually advanced and withdrawn in the substantially horizontal
direction. This allows the single substrate to be transferred and
received between the first or second substrate holders and the
storing container. Moreover, the single substrate can be
transferred and received between the first or second substrate
holders and the substrate storing shelf.
[0026] (3) According to another aspect of the present invention, a
substrate platform shelf for transferring and receiving a substrate
between a first substrate transporting apparatus having first and
second substrate holders that are provided one above the other and
a second substrate transporting apparatus having third and fourth
substrate holders that are provided one above the other includes a
plurality of stages of storing shelves that support the substrates
in substantially horizontal postures respectively and an adjusting
mechanism that adjusts a difference in height between the storing
shelves, wherein the adjusting mechanism adjusts the difference in
height between the storing shelves to be the same as a difference
in height between the first and second substrate holders when the
substrate is transferred and received to and from the first
substrate transporting apparatus and adjusts the difference in
height between the storing shelves to be the same as a difference
in height between the third and fourth substrate holders when the
substrate is transferred and received to and from the second
substrate transporting apparatus.
[0027] In the substrate platform shelf, the substrate is
transferred and received between the plurality of stages of storing
shelves that support the substrate in the substantially horizontal
posture and the first substrate transporting apparatus.
[0028] The difference in height between the storing shelves is
adjusted to be the same as the difference in height between the
first and second substrate holders by the adjusting mechanism when
the substrate is transferred and received. This allows the first
and second substrate holders to be easily inserted between the
storing shelves, respectively. Accordingly, the plurality of
substrates are smoothly transferred and received between the
plurality of stages of storing shelves and the first substrate
transporting apparatus.
[0029] In addition, the substrate is transferred and received
between the storing shelf and the second substrate transporting
apparatus in this substrate platform shelf. The difference in
height between the storing shelves is adjusted to be the same as
the difference in height between the third and fourth substrate
holders by the adjusting mechanism when the substrate is
transferred and received. This allows the third and fourth
substrate holders to be easily inserted between the storing
shelves, respectively. Accordingly, the plurality of substrates are
smoothly transferred and received between the plurality of stages
of storing shelves and the second substrate transporting
apparatus.
[0030] As described above, since the difference in height between
the storing shelves can be adjusted by the adjusting mechanism, the
plurality of substrates can be simultaneously transferred and
received between the plurality of stages of storing shelves and the
first and second substrate transporting apparatuses, even though
the difference in height between the first and second substrate
holders of the first substrate transporting apparatus and the
difference in height between the third and fourth substrate holders
of the second substrate transporting apparatus are different from
each other. This allows the transport time of the substrate to be
sufficiently reduced.
[0031] (4) Each stage of the storing shelves may include a set of
shelves arranged at a predetermined spacing within a substantially
horizontal plane and a plurality of support members that are
provided in the set of shelves and support a lower surface of the
substrate.
[0032] In this case, a space is formed between the shelves on each
stage of the storing shelves. This allows the first and second
substrate holders to be more easily inserted into the space formed
between the shelves when the substrate is transferred and received
between the plurality of stages of storing shelves and the first
substrate transporting apparatus.
[0033] Furthermore, the third and fourth substrate holders can be
more easily inserted into the space formed between the shelves when
the substrate is transferred and received between the plurality of
stages of storing shelves and the second substrate transporting
apparatus.
[0034] Accordingly, the plurality of substrates are more smoothly
transferred and received between the plurality of stages of storing
shelves and the first substrate transporting apparatus and between
the plurality of stages of storing shelves and the second substrate
transporting apparatus.
[0035] (5) According to still another aspect of the present
invention, a substrate processing apparatus that performs
processing on a substrate includes a processing region for
processing the substrate, a carrying in and out region for carrying
the substrate into and out of the processing region, and an
interface that transfers and receives the substrate between the
processing region and the carrying in and out region, wherein the
carrying in and out region includes a container platform where a
storing container having a plurality of stages of storing grooves
for storing the substrate in a substantially horizontal posture is
placed and a first substrate transporting apparatus that transports
the substrate between the storing container placed in the container
platform and the interface, the processing region includes a
processing unit that performs processing on the substrate and a
second substrate transporting apparatus that transports the
substrate between the interface and the processing unit, the
interface includes a substrate platform shelf having a plurality of
stages of storing shelves where the substrate is placed in the
substantially horizontal posture, the first substrate transporting
apparatus includes first and second substrate holders that are
provided on above the other and hold the substrate in the
substantially horizontal posture, a driving mechanism that advances
and withdraws the first and second substrate holders in a
substantially horizontal direction while moving the first and
second substrate holders for transferring and receiving the
substrate to and from the storing container and for transferring
and receiving the substrate to and from the substrate platform
shelf and an adjusting mechanism that adjusts a difference in
height between the first and second substrate holders and the
adjusting mechanism adjusts the difference in height between the
first and second substrate holders to be the same as a difference
in height between the storing grooves of the storing container when
the substrate is transferred and received between the storing
container and the first and second substrate holders and adjusts
the difference in height between the first and second substrate
holders to be the same as a difference in height between the
storing shelves of the substrate platform shelf when the substrate
is transferred and received between the substrate platform shelf
and the first and second substrate holders.
[0036] In the substrate processing apparatus, the storing container
is placed in the container platform in the carrying in and out
region. The substrates are stored in substantially horizontal
postures in the plurality of storing grooves of the storing
container. The first substrate transporting apparatus in the
carrying in and out region transports the substrate between the
storing container on the container platform and the substrate
platform shelf in the interface. The substrates are placed in the
substantially horizontal postures in the plurality of stages of
storing shelves of the substrate platform shelf.
[0037] The second substrate transporting apparatus in the
processing region transports the substrate between the substrate
platform shelf in the interface and the processing unit. Thus, the
substrate stored in the storing container in the carrying in and
out region is transported by the first and second substrate
transporting apparatuses to be processed in the processing unit.
Moreover, the substrate processed in the processing unit is
transported by the second and first substrate transporting
apparatuses to be stored in the storing container in the carrying
in and out region.
[0038] The first substrate transporting apparatus transfers and
receives the substrate to and from the storing container having the
plurality of stages of storing grooves by using the first and
second substrate holders that are provided one above the other. The
difference in height between the first and second substrate holders
is adjusted to be the same as the difference in height between the
storing grooves of the storing container by the adjusting mechanism
when the substrate is transferred and received.
[0039] This allows the first and second substrate holders to be
easily inserted between the storing grooves of the storing
container, respectively, by being advanced in the substantially
horizontal direction by the driving mechanism. Thus, the plurality
of substrates are smoothly transferred and received between the
first and second substrate holders and the storing grooves of the
storing container.
[0040] Moreover, the first substrate transporting apparatus
transfers and receives the substrate to and from the substrate
platform shelf having the plurality of stages of storing shelves by
using the first and second substrate holders. The difference in
height between the first and second substrate holders is adjusted
to be the same as the difference in height between the storing
shelves of the substrate platform shelf by the adjusting mechanism
when the substrate is transferred and received.
[0041] Accordingly, the first and second holders can be easily
inserted between the storing shelves of the substrate platform
shelf, respectively, by being advanced in the substantially
horizontal direction by the driving mechanism. Accordingly, the
plurality of substrates are smoothly transferred and received
between the first and second substrate holders and the storing
shelves of the substrate platform shelf.
[0042] As described above, even though the difference in height
between the storing grooves of the storing container and the
difference in height between the storing shelves of the substrate
platform shelf are different from each other, the first and second
substrate holders of the first substrate transporting apparatus can
simultaneously transfer and receive the plurality of substrates to
and from the storing container and to and from the substrate
platform shelf. As a result, the transport time of the substrate is
sufficiently reduced and the throughput in the substrate processing
is sufficiently improved.
[0043] (6) The processing unit may include a cleaning processing
unit that cleans the substrate. In this case, the substrate is
cleaned by the cleaning processing unit.
[0044] (7) According to a further aspect of the present invention,
a substrate processing apparatus that performs processing on a
substrate includes a processing region for processing a substrate,
a carrying in and out region for carrying the substrate into and
out of the processing region, and an interface that transfers and
receives the substrate between the processing region and the
carrying in and out region, wherein the carrying in and out region
includes a container platform where a storing container having a
plurality of stages of storing grooves for storing the substrate in
a substantially horizontal posture is placed, a first substrate
transporting apparatus having first and second substrate holders
that are provided one above the other and transports the substrate
between the storing container placed in the container platform and
the interface, the processing region includes a processing unit
that performs processing on the substrate and a second substrate
transporting apparatus having third and fourth substrate holders
that are provided one above the other and transports the substrate
between the interface and the processing unit, the interface
includes a substrate platform shelf having a plurality of stages of
storing shelves where the substrate is placed in the substantially
horizontal posture, the substrate platform shelf includes a
plurality of stages of storing shelves that support the substrates
in the substantially horizontal postures, respectively, and an
adjusting mechanism that adjust a difference in height between the
storing shelves and the adjusting mechanism adjusts the difference
in height between the storing shelves to be the same as a
difference in height between the first and second substrate holders
when the substrate is transferred and received to and from the
first substrate transporting apparatus and adjusts the difference
in height between the storing shelves to be the same as a
difference in height between the third and fourth substrate holders
when the substrate is transferred and received to and from the
second substrate transporting apparatus.
[0045] In the substrate processing apparatus, the storing container
is placed in the container platform in the carrying in and out
region. The substrates are stored in the substantially horizontal
postures in the plurality of storing grooves of the storing
container. The first substrate transporting apparatus in the
carrying in and out region transports the substrate between the
storing container on the container platform and the substrate
platform shelf in the interface. The substrates are placed in the
substantially horizontal postures in the plurality of stages of
storing shelves of the substrate platform shelf.
[0046] The second substrate transporting apparatus in the
processing region transports the substrate between the substrate
platform shelf in the interface and the processing unit. Thus, the
substrate stored in the storing container in the carrying in and
out region is transported by the first and second substrate
transporting apparatuses to be processed in the processing unit.
Moreover, the substrate processed in the processing unit is
transported by the second and first substrate transporting
apparatuses to be stored in the storing container in the carrying
in and out region.
[0047] The first substrate transporting apparatus transfers and
receives the substrate to and from the substrate platform shelf
having the plurality of stages of storing shelves by using the
first and second substrate holders that are provided one above the
other. The difference in height between the storing shelves is
adjusted to be the same as the difference in height between the
first and second substrate holders by the adjusting mechanism when
the substrate is transferred and received. This allows the first
and second substrate holders to be easily inserted between the
storing shelves, respectively. Thus, the plurality of substrates
are smoothly transferred and received between the plurality of
stages of storing shelves and the first substrate transporting
apparatus.
[0048] Moreover, the second substrate transporting apparatus
transfers and receives the substrate to and from the substrate
platform shelf having the plurality of stages of storing shelves by
using the third and fourth substrate holders that are provided one
above the other. The difference in height between the storing
shelves is adjusted to be the same as the difference in height
between the third and fourth substrate holders by the adjusting
mechanism when the substrate is transferred and received. This
allows the third and fourth substrate holders to be easily inserted
between the storing shelves, respectively. Accordingly, the
plurality of substrates are smoothly transferred and received
between the plurality of stages of storing shelves and the second
substrate transporting apparatus.
[0049] As described above, since the difference in height between
the storing shelves can be adjusted by the adjusting mechanism, the
plurality of substrates can be simultaneously transferred and
received between the plurality of stages of storing shelves and the
first and second substrate transporting apparatuses, even though
the difference in height between the first and second substrate
holders of the first substrate transporting apparatus and the
difference in height between the third and fourth substrate holders
of the second substrate transporting apparatus are different from
each other. As a result, the transport time of the substrate is
sufficiently reduced and the throughput in the substrate processing
is sufficiently improved.
[0050] (8) The processing unit may include a cleaning processing
unit that cleans the substrate. In this case, the substrate is
cleaned by the cleaning processing unit.
[0051] Other features, elements, characteristics, and advantages of
the present invention will become more apparent from the following
description of preferred embodiments of the present invention with
reference to the attached drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0052] FIG. 1 is a plan view and a schematic side view of a
substrate processing apparatus according to a first embodiment;
[0053] FIG. 2 is a diagram schematically showing a sectional view
taken along the line A-A of FIG. 1 (a);
[0054] FIG. 3 is a vertical sectional view for explaining
configurations of a carrier and a substrate platform of FIG. 1;
[0055] FIG. 4 is a side view of an indexer robot;
[0056] FIG. 5 is a plan view of the indexer robot;
[0057] FIG. 6 is a side view and a plan view of a main robot;
[0058] FIG. 7 is a diagram for explaining a configuration of a top
surface cleaning unit;
[0059] FIG. 8 is a diagram for explaining a configuration of a
substrate platform used for a substrate processing apparatus
according to a second embodiment;
[0060] FIG. 9 is a diagram showing an example of a case where a
spacing between support plates that are vertically adjacent to each
other is changed in the substrate platform of FIG. 8;
[0061] FIG. 10 is a side view of an indexer robot used for the
substrate processing apparatus according to the second embodiment;
and
[0062] FIG. 11 is a plan view showing a substrate processing
apparatus described in JP 10-150090 A.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0063] A substrate transporting apparatus, a substrate platform
shelf and a substrate processing apparatus according to one
embodiment of the present invention are described. In the following
description, a substrate refers to a semiconductor wafer, a glass
substrate for a photomask, a glass substrate for a liquid crystal
display, a glass substrate for a plasma display, a substrate for an
optical disk, a substrate for a magnetic disk, a substrate for a
magneto-optical disk or the like.
[1] First Embodiment
[0064] (1) Configuration of a Substrate Processing Apparatus
[0065] FIG. 1(a) is a plan view of a substrate processing apparatus
according to a first embodiment of the present invention and FIG.
1(b) is a schematic side view in which the substrate processing
apparatus of FIG. 1(a) is seen from the direction of the arrow X.
FIG. 2 is a diagram schematically showing a cross section of FIG. 1
(a) taken along the line A-A.
[0066] As shown in FIG. 1(a), the substrate processing apparatus
100 includes an indexer block 10 and a processing block 11. The
indexer block 10 and the processing block 11 are provided in
parallel to each other.
[0067] The indexer block 10 is provided with a plurality of carrier
platforms 40, an indexer robot IR and a controller 4. A carrier C
that stores a plurality of substrates W in multiple stages is
placed on each of the carrier platforms 40. Details of the carrier
C will be described later.
[0068] The indexer robot IR is constructed so that it can move in
the direction of the arrow U (FIG. 1 (a)), rotate around a vertical
axis and move up and down. Hands IRH1, IRH2 for transferring and
receiving the substrate W are provided one above the other in the
indexer robot IR. The hands IRH1, IRH2 hold a peripheral portion of
the lower surface of the substrate W and an outer circumference of
the substrate W. Details of the indexer robot IR will be described
later.
[0069] The controller 4 consists of a computer or the like
including a CPU (central processing unit) and controls each
component in the substrate processing apparatus 100.
[0070] As shown in FIG. 1 (b), a plurality of top surface cleaning
units SS and a main robot MR are provided in the processing block
11. In this example, one side of the processing block 11 has a
vertical stack of the four top surface cleaning units SS, and the
other side of the processing block 11 has a vertical stack of
another four top surface cleaning units SS.
[0071] The main robot MR is provided between the plurality of top
surface cleaning units SS positioned on the one side of the
processing bock 11 and the plurality of top surface cleaning units
SS positioned on the other side of the processing block 11. The
main robot MR is constructed so that it can rotate around a
vertical axis and move up and down.
[0072] Moreover, hands MRH1, MRH2 for transferring and receiving
the substrate W are provided one above the other in the main robot
MR. The hands MRH1, MRH2 hold the peripheral portion of the lower
surface of the substrate W and the outer circumference of the
substrate W. Details of the main robot MR will be described
later.
[0073] As shown in FIG. 2, substrate platforms PASS1, PASS2 for
transferring and receiving the substrate W between the indexer
robot IR and the main robot MR are provided one above the other
between the indexer block 10 and the processing block 11.
[0074] The plurality of substrates W can be placed in multiple
stages in each of the substrate platforms PASS1, PASS2. The upper
substrate platform PASS1 is used for transporting the substrate W
from the processing block 11 to the indexer block 10, and the lower
substrate platform PASS2 is used for transporting the substrate W
from the indexer block 10 to the processing block 11. Details of
the substrate platforms PASS1, PASS2 will be described later.
[0075] (2) Summary of Operations of the Substrate Processing
Apparatus
[0076] Next, a summary of operation of the substrate processing
apparatus 100 is described with reference to FIG. 1 and FIG. 2.
Note that an operation of each structural element of the substrate
processing apparatus 100, described below, is controlled by the
controller 4 of FIG. 1.
[0077] First, the indexer robot IR takes the two unprocessed
substrates W out of one of the carriers C placed on the carrier
platforms 40 by using the two hands IRH1, IRH2 that are provided
one above the other. The indexer robot IR rotates around the
vertical axis while moving in the direction of the arrow U, and
places the two unprocessed substrates W on the substrate platform
PASS2.
[0078] The main robot MR moves up and down while rotating around
the vertical axis, and receives the substrate W from the substrate
platform PASS2 by using the lower hand MRH2. Next, the main robot
MR takes the substrate W after top surface cleaning processing out
of any of the top surface cleaning units SS by the upper hand MRH1,
and carries the substrate W held by the hand MRH2 into the top
surface cleaning unit SS. Then, the main robot MR again moves up
and down while rotating around the vertical axis, and places the
substrate W held by the upper hand MRH1 on the substrate platform
PASS1.
[0079] The indexer robot IR takes the two processed substrates W
out of the substrate platform PASS1 by using the two hands IRH1,
IRH2. The indexer robot IR rotates around the vertical axis while
moving in the direction of the arrow U, and stores the two
processed substrates W in one of the carriers C placed on the
carrier platforms 40.
[0080] In the substrate processing apparatus 100 according to the
present embodiment, such transport operations of the substrate W by
the indexer robot IR and the main robot MR are successively
repeated.
[0081] (3) Configurations of the Carrier and the Substrate
Platform
[0082] FIG. 3 is a vertical sectional view for explaining
configurations of the carrier C and the substrate platform PASS1,
PASS2 of FIG. 1.
[0083] FIG. 3 (a) shows a vertical sectional view of the carrier C
of FIG. 1. As shown in FIG. 3 (a), the carrier C has a box shape
with one face being open (an opening C1).
[0084] A plurality of substrate storing grooves C2 extending along
a horizontal direction are formed inside the carrier C extending in
a vertical direction.
[0085] Each of the substrate storing grooves C2 stores the
substrate W. A spacing GA between the substrate storing grooves C2
that are vertically adjacent to each other is set to be
approximately 10 mm, for example. In this case, the substrates W
are stored at the spacing of about 10 mm in the carrier C. Reducing
the spacing GA between the substrate storing grooves C2 allows a
larger number of substrates W to be stored in the carrier C.
[0086] FIG. 3 (b) shows a vertical sectional view of the substrate
platform PASS1, PASS2 of FIG. 1. As shown in FIG. 3 (b), the
substrate platform PASS1, PASS2 has the configuration in which a
plurality of support plates 51 are stacked in multiple stages by a
plurality of support posts 52.
[0087] A plurality of support pins PN that support the lower
surface of the substrate W are provided on the support plate 51.
The substrate W is temporarily placed on the support pins PN of the
substrate platform PASS1, PASS2 when the substrate W is transferred
and received between the indexer robot IR and the main robot MR. In
this substrate platform PASS1, PASS2, a spacing GC between the
support plates 51 that are vertically adjacent to each other is
approximately 45 mm, for example. In this case, the substrates W
are placed at the spacing of about 45 mm in the substrate platform
PASS1, PASS2.
[0088] In the present embodiment, the spacing GC between the
support plates 51 that are vertically adjacent to each other in the
substrate platform PASS1, PASS2 is set to be larger than the
spacing GA between the substrate storing grooves C2 of the carrier
C.
[0089] Optical sensors (not shown) that detect the presence or
absence of the substrate W are provided per support plate 51 in the
substrate platform PASS1, PASS2. This allows determination as to
whether or not the substrate W is placed in the substrate platform
PASS1, PASS2 to be made.
[0090] (4) Configuration of the Indexer Robot
[0091] Next, the detailed configuration of the indexer robot IR is
described. FIG. 4 is a side view of the indexer robot IR, and FIG.
5 is a plan view of the indexer robot IR.
[0092] As shown in FIG. 4 and FIG. 5, the indexer robot IR includes
a transport rail 210, a moving support post 220, a lifting
supporter 230 and a base 240.
[0093] The transport rail 210 is attached to the floor face of the
indexer block 10. The moving support post 220 extending in the
vertical direction is attached on the transport rail 210. One end
of the lifting supporter 230 extending in the horizontal direction
is attached to the moving support post 220. The base 240 is
attached to the other end of the lifting supporter 230.
[0094] A horizontally moving mechanism 211 consisting of, for
example, a set of a ball screw and a motor and the like is provided
in the transport rail 210 extending in the horizontal direction.
The moving support post 220 is moved along the transport rail 210
in the horizontal direction (the arrow MV1) by the horizontally
moving mechanism 211.
[0095] A vertically moving mechanism 221 consisting of, for
example, a ball screw, a motor and the like is provided in the
moving support post 220. The lifting supporter 230 is moved along
the moving support post 220 in the vertical direction (the arrow
MV2) by the vertically moving mechanism 221. Accordingly, the base
240 can move in the horizontal and vertical directions.
[0096] A rotation stage 250 is provided on the base 240 so as to be
rotatable with respect to the base 240. The rotation stage 250 is
rotated by a rotating mechanism 241 (the arrow MV3) provided inside
the base 240. The rotating mechanism 241 is constituted by, for
example, a motor.
[0097] A lifting shaft 260 is provided so as to stand at the
rotation stage 250. In addition, a hand IRH1 is connected to the
upper surface of the rotation stage 250 by a multi-joint type arm
IAM1, and a hand IRH2 is connected to the upper surface of the
rotation stage 250 by the lifting shaft 260 and a multi-joint type
arm IAM2.
[0098] The multi-joint type arms IAM1, IAM2 are independently
driven by driving mechanisms that are not shown, respectively, and
advance and withdraw the respective hands IRH1, IRH2 in the
horizontal direction (the arrow MV4) while maintaining them in
fixed postures.
[0099] The hand IRH1 is provided to have a certain height with
respect to the rotation stage 250 and positioned above the hand
IRH2.
[0100] A ball screw 261 is provided inside the lifting shaft 260.
The ball screw 261 is connected to a motor 251 that is provided
inside the rotation stage 250. The operation of the motor 251
rotates the ball screw 261, so that the multi-joint type arm IAM2
attached to the lifting shaft 260 is moved in the vertical
direction (the arrow MV5).
[0101] Thus, a difference in height between the hand IRH1 and the
hand IRH2 is changed within a predetermined range. In the example
shown in FIG. 4, the difference in height between the hand IRH1 and
the hand IRH2 when the multi-joint type arm IAM2 is moved to the
highest position of the lifting shaft 260 is shown by an arrow HG1.
Moreover, the difference in height between the hand IRH1 and the
hand IRH2 when the multi-joint type arm IAM2 is moved to the lowest
position of the lifting shaft 260 is shown by an arrow HG2.
[0102] The difference in height between the hand IRH1 and the hand
IRH2 shown by the arrow HG1 is set to be equal to the spacing GA
between the substrate storing grooves C2 of the carrier C of FIG. 3
(a), for example, and the difference in height between the hand
IRH1 and the hand IRH2 shown by the arrow HG2 is set to be equal to
the spacing GC between the support plates 51 of the substrate
platform PASS1, PASS2 of FIG. 3 (b), for example.
[0103] As shown in FIG. 5, the hands IRH1, IRH2 have the same
shape, and are formed to be substantially U-shaped, respectively.
The hand IRH1 has two claw portions IRH1 extending substantially in
parallel to each other, and the hand IRH2 has two claw portions
IH12 extending substantially in parallel to each other.
[0104] In addition, a plurality of support pins 271 are attached to
the upper surfaces of the hands IRH1, IRH2, respectively. In the
present embodiment, the respective four support pins 271 are
attached on the upper surfaces of the hands IRH1, IRH2, at
substantially equal distances from each other along the outer
circumference of the substrate W placed thereon. The peripheral
portion of the lower surface of the substrate W and the outer
circumference of the substrate W are held by the four support pins
271.
[0105] Each of the hands IRH1, IRH2 has a thickness of
approximately 4 mm, for example. Thus, the hands IRH1, IRH2 can be
inserted between the plurality of substrates W stored in the
carrier C of FIG. 3 (a).
[0106] The operations of the horizontally moving mechanism 211, the
vertically moving mechanism 221, the rotating mechanism 241 and the
motor 251, mentioned above, are controlled by the controller 4 of
FIG. 1.
[0107] (5) Configuration of the Main Robot
[0108] Next, a detailed configuration of the main robot MR is
described. FIG. 6 (a) is a side view of the main robot MR, and the
FIG. 6 (b) is a plan view of the main robot MR.
[0109] As shown in FIG. 6 (a) and FIG. 6(b), the main robot MR
includes a base 21, to which a moving portion 22 is attached so as
to be able to vertically move and rotate with respect to the base
21. The hands MRH1 and MRH2 are connected to the moving portion 22
by the multi-joint type arms AM1 and AM2, respectively.
[0110] The moving portion 22 is rotated around the vertical axis by
a rotation driving mechanism 26 that is provided in the base 21
while being moved up and down by a lifting mechanism 25 that is
provided in the base 21.
[0111] The multi-joint type arms AM1, AM2 are independently driven
by driving mechanisms that are not shown, respectively, and advance
and withdraw the respective hands MRH1, MRH2 in the horizontal
direction while maintaining them in fixed postures.
[0112] The hands MRH1, MRH2 are provided to have certain heights
with respect to the moving portion 22, respectively, and the hand
MRH1 is positioned above the hand MRH2. A difference M1 (FIG. 6
(a)) in height between the hand MRH1 and the hand MRH2 is
maintained constant.
[0113] Note that the difference M1 in height between the hand MRH1
and the hand MRH2 may be set to be substantially equal to, for
example, the spacing GC between the support plates 51 that are
vertically adjacent to each other in the substrate platform PASS1,
PASS2 shown in FIG. 3 (b).
[0114] The hands MRH1, MRH2 have the same shape, and are formed to
be substantially U-shaped, respectively. The hand MRH1 has two claw
portions H11 extending substantially in parallel to each other, and
the hand MRH2 has two claw portions H12 extending substantially in
parallel to each other. In addition, a plurality of support pins 23
are attached on the upper surfaces of the hands MRH1, MRH2,
respectively.
[0115] In the present embodiment, the respective four support pins
23 are attached on the upper surfaces of the hands MRH1, MRH2, at
substantially equal distances from each other along the outer
circumference of the substrate W placed thereon. The peripheral
portion of the lower surface of the substrate W and the outer
circumference of the substrate W are held by the four support pins
23.
[0116] Each of the hands MRH1, MRH2 is formed to be thicker than
the hands IRH1, IRH2 of the indexer robot IR, and has a thickness
of approximately 7 mm, for example. Accordingly, the hands MRH1,
MRH2 have high rigidity compared to the hands IRH1, IRH2 of the
indexer robot IR.
[0117] Moreover, heights of the support pins PN are set so that the
hands MRH1, MRH2 of the main robot MR can be easily inserted
between the support plate 51 and the substrate W in the substrate
platform PASS1, PASS2 of FIG. 3 (b).
[0118] (6) Details of the Top Surface Cleaning Unit
[0119] Next, the top surface cleaning unit SS shown FIG. 1 is
described. FIG. 7 is a diagram for explaining a configuration of
the top surface cleaning unit SS. In the top surface cleaning unit
SS shown in FIG. 7, the cleaning processing of the substrate W by
using a brush (hereinafter referred to as the scrub cleaning
processing) is performed.
[0120] First, the details of the top surface cleaning unit SS is
described with reference to FIG. 7. As shown in FIG. 7, the top
surface cleaning unit SS includes a spin chuck 61 for rotating the
substrate W around a vertical axis passing through the center of
the substrate W while holding the substrate W horizontally. The
spin chuck 61 is secured to the upper end of a rotation shaft 63
that is rotated by a chuck rotation driving mechanism 62.
[0121] As described above, the substrate W with the top surface
thereof directed upward is carried into the top surface cleaning
unit SS. When the scrub cleaning processing is performed, the back
surface of the substrate W is held by suction on the spin chuck
61.
[0122] A motor 64 is provided outside the spin chuck 61. A rotation
shaft 65 is connected to the motor 64. An arm 66 is coupled to the
rotation shaft 65 so as to extend in the horizontal direction, and
a substantially cylindrical brush cleaner 70 is provided on the tip
of the arm 66.
[0123] In addition, above the spin chuck 61, a liquid discharge
nozzle 71 is provided for supplying a cleaning liquid or a rinse
liquid (pure water) onto the top surface of the substrate W held by
the spin chuck 61.
[0124] The liquid discharge nozzle 71 is connected to a supply pipe
72, and the cleaning liquid and the rinse liquid are selectively
supplied to the liquid discharge nozzle 71 through this supply pipe
72.
[0125] In the scrub cleaning processing, the motor 64 rotates the
rotation shaft 65. Thus, the arm 66 turns within a horizontal
plane, and the brush cleaner 70 moves between a position outside
the substrate W and a position above the center of the substrate W,
centered around the rotation shaft 65. A lifting mechanism (not
shown) is provided in the motor 64. The lifting mechanism lifts and
lowers the brush cleaner 70 in the position outside the substrate W
and the position above the center of the substrate W by lifting and
lowering the rotation shaft 65.
[0126] When the scrub cleaning processing is started, the substrate
W with the top surface thereof directed upward is rotated by the
spin chuck 61. Moreover, the cleaning liquid or the rinse liquid is
supplied to the liquid discharge nozzle 71 through the supply pipe
72. Thus, the cleaning liquid or the rinse liquid is supplied onto
the top surface of the substrate W that rotates. In this state, the
brush cleaner 70 is swung and moved up and down by the rotation
shaft 65 and the arm 66. Accordingly, the scrub cleaning processing
is performed on the top surface of the substrate W. Note that since
the suction-type spin chuck 61 is used in the top surface cleaning
unit SS, the peripheral portion and the outer circumference of the
substrate W can be simultaneously cleaned.
[0127] (7) Effects
[0128] As described with reference to FIG. 4, the difference in
height between the hand IRH1 and the hand IRH2 in the indexer robot
IR can be changed within a predetermined range.
[0129] Thus, the indexer robot IR can adjust the difference in
height between the hand IRH1 and the hand IRH2 to be small
(approximately 10 mm, for example), corresponding to the spacing GA
between the substrate storing grooves C2 that are vertically
adjacent to each other when taking the two substrates W out of the
carrier C.
[0130] Accordingly, the indexer robot IR can insert the hand IRH1
and the hand IRH2 between the plurality of substrates W stored in
the carrier C, and easily take out the two substrates W stored
vertically adjacent to each other.
[0131] In addition, the indexer robot IR can adjust the difference
in height between the hand IRH1 and the hand IRH2 to be larger
(approximately 45 mm, for example), corresponding to the spacing GC
between the support plates 51 that are vertically adjacent to each
other during the transport of the taken out two substrates W to the
substrate platform PASS2.
[0132] Thus, the indexer robot IR can easily place the two
substrates W held by the hand IRH1 and the hand IRH2 on the support
plates 51 that are vertically adjacent to each other in the
substrate platform PASS2.
[0133] Furthermore, the indexer robot IR can similarly adjust the
difference in height between the hand IRH1 and the hand IRH2 when
transporting the two substrates W from the substrate platform PASS1
to the carrier C.
[0134] Thus, the two substrates W at a time can be transported
between the carrier C and the substrate platforms PASS1, PASS2.
This allows the transport time of the substrate W between the
carrier C and the substrate platforms PASS1, PASS2 to be reduced
and the improvement of the throughput in the substrate processing
apparatus 100 to be achieved.
[0135] Note that since the multi-joint type arms IAM1, IAM2 are
independently driven by the driving mechanisms that are not shown,
respectively, in the indexer robot IR, it is also possible that the
substrates W are transported one by one between the carrier C and
the substrate platforms PASS1, PASS2.
[0136] (8) Modifications
[0137] While the top surface of the substrate W is cleaned by using
the brush in the top surface cleaning unit SS in the present
embodiment, the present invention is not limited to this and the
top surface of the substrate W can be cleaned by using a chemical
liquid.
[0138] In addition, while the main robot MR uses the hand MRH2 for
holding the unprocessed substrate W and uses the hand MRH1 for
holding the substrate W subjected to the scrub cleaning processing,
conversely, the hand MRH1 may be used for holding the unprocessed
substrate W and the hand MRH2 may be used for holding the substrate
W subjected to the scrub cleaning processing.
[0139] Moreover, while the multi-joint type transport robots that
linearly advance and withdraw their hands by moving their joints
are used as the indexer robot IR and the main robot MR in the
above-described embodiment, the present invention is not limited to
this and linear-type transport robots that advance and withdraw
their hands by linearly sliding them with respect to the substrate
W may be used.
[0140] In the present embodiment, when the difference M1 (FIG. 6
(a)) in height between the hand MRH1 and the hand MRH2 is set to be
substantially equal to the spacing GC between the support plates 51
that are vertically adjacent to each other in the substrate
platform PASS1, PASS2 shown in FIG. 3(b), the main robot MR may
transfer and receive the two substrates W to and from the substrate
platforms PASS1, PASS2.
[0141] In this case, the main robot MR can insert the hand MRH1 and
the hand MRH2 between the support plates 51 that are adjacent to
each other in the substrate platform PASS1, PASS2, and easily take
out the two substrates W placed vertically adjacent to each other.
Furthermore, the two substrates W held by the hand MRH1 and the
hand MRH2 can be placed on the support plates 51 that are adjacent
to each other in the substrate platform PASS1, PASS2.
[0142] Accordingly, the transport time of the substrate W between
the substrate platforms PASS1, PASS2 and the top surface cleaning
unit SS can be reduced.
[0143] While the two hands IRH1, IRH2 are provided in the indexer
robot IR in the present embodiment, the number of the hands
provided in the indexer robot IR is not limited as long as it is
not less than two. The number of the hands may be three or four,
for example.
[2] Second Embodiment
[0144] A configuration of a substrate processing apparatus
according to a second embodiment is different from the
configuration of the substrate processing apparatus 100 according
to the first embodiment in the following points.
[0145] (1) Configuration of Substrate Platform
[0146] A substrate platform used in the substrate processing
apparatus according to the present embodiment has the following
configuration. FIG. 8 is a diagram for explaining the configuration
of the substrate platform used for the substrate processing
apparatus according to the second embodiment.
[0147] FIG. 8 (a) shows a plan view of the substrate platform
PASS1, PASS2 of the present embodiment, and FIG. 8 (b) shows a
cross section of FIG. 8 (a) taken along the line B-B.
[0148] As shown in FIG. 8 (a) and FIG. 8 (b), the substrate
platform PASS1, PASS2 of the present embodiment includes a
plurality of sets of support plates 51P arranged so as to face each
other within the horizontal plane. The sets of support plates 51P
are stacked in multiple stages by a plurality of cylinders 510. The
plurality of support pins PN that support the lower surface of the
substrate W are provided on each set of support plates 51P.
[0149] The hands IRH1, IRH2 of the indexer robot IR and the hands
MRH1, MRH2 of the main robot MR can be inserted between the sets of
two support plates 51P. Accordingly, the substrate W transported by
the indexer robot IR and the main robot MR is temporarily placed on
the plurality of support pins PN provided on each set of support
plates 51P.
[0150] An air cylinder, an oil cylinder or the like is used as the
above-mentioned cylinder 510, for example. Each of the cylinders
510 is connected to a cylinder synchronization mechanism 500. The
cylinder synchronization mechanism 500 is controlled by the
controller 4 and supplies a fluid (for example, air, oil or the
like) to the plurality of cylinders 510 while synchronizing the
plurality of cylinders 510.
[0151] Thus, each of the cylinders 510 performs a telescoping
operation in the vertical direction depending on a supply amount of
the fluid (for example, air, oil or the like) from the cylinder
synchronization mechanism 500. Accordingly, the spacing GC between
the support plates 51P that are vertically adjacent to each other
is changed within a predetermined range in the substrate platforms
PASS1, PASS2 of the present embodiment.
[0152] FIG. 9 is a diagram showing an example of the case where the
spacing GC between the support plates 51P that are vertically
adjacent to each other is changed in the substrate platform PASS1,
PASS2 of FIG. 8.
[0153] As shown in FIG. 9, the spacing GC between the support
plates 51P that are vertically adjacent to each other is changed
from a maximum spacing HG3 shown by the dotted line to a minimum
spacing HG4 shown by the solid line, for example.
[0154] The maximum spacing HG3 between the support plates 51P is
set to be substantially equal to the difference M1 in height
between the hand MRH1 and the hand MRH2 of the main robot MR of
FIG. 6 (a), for example. The minimum spacing HG4 between the
support plates 51P is set to be approximately 10 mm, for example,
so as to be equal to, for example, the spacing GA of FIG. 3
(a).
[0155] Note that the maximum spacing HG3 between the support plates
51P may be set to be approximately 45 mm so as to be equal to, for
example, the spacing GC of FIG. 3 (b).
[0156] Also in the substrate platforms PASS1, PASS2 of the present
embodiment, optical sensors (not shown) that detect the presence or
absence of the substrate W are provided corresponding to each set
of support plates 51P.
[0157] (2) Configuration of the Indexer Robot
[0158] FIG. 10 is a side view of the indexer robot IR used for the
substrate processing apparatus according to the second embodiment.
As shown in FIG. 10, the motor 251, the lifting shaft 260 and the
ball screw 261 of FIG. 4 are not provided in the indexer robot IR
of the present embodiment.
[0159] The hand IRH1 is connected to the upper surface of the
rotation stage 250 by the multi-joint type arm IAM1 and the hand
IRH2 is connected to the upper surface of the rotation stage 250 by
the multi-joint type arm IAM2 in the indexer robot IR of the
present embodiment.
[0160] Accordingly, the multi-joint type arms IAM1, IAM2 do not
move in the vertical direction to the rotation stage 250, and are
provided to have certain heights from the rotation stage 250. Thus,
a difference N1 (FIG. 10) in height between the hand IRH1 and the
hand IRH2 is maintained constant.
[0161] Here, the difference N1 in height between the hand IRH1 and
the hand IRH2 is set to be, for example, approximately 10 mm so as
to be equal to, for example, the spacing GA of FIG. 3 (a).
[0162] (3) Effects
[0163] In the present embodiment, the difference N1 (FIG. 10) in
height between the hand IRH1 and the hand IRH2 in the indexer robot
IR is set to be equal to the spacing GA between the substrate
storing grooves C2 that are vertically adjacent to each other in
the carrier C.
[0164] Accordingly, the indexer robot IR can insert the hand IRH1
and the hand IRH2 between the plurality of substrates W stored in
the carrier C for taking the two substrates W out of the carrier C.
Thus, the two substrates W stored vertically adjacent to each other
are easily taken out of the carrier C.
[0165] Here, as described with reference to FIG. 8 and FIG. 9, the
spacing GC between the support plates 51P that are vertically
adjacent to each other in the substrate platform PASS1, PASS2 is
changed within the predetermined range.
[0166] Thus, the spacing GC between the support plates 51 that are
vertically adjacent to each other can be adjusted to be the minimum
spacing HG4 in the substrate platforms PASS1, PASS2 when the two
substrates W are transported by the indexer robot IR, for
example.
[0167] As described above, the minimum spacing HG4 between the
support plates 51P is equal to the spacing GA between the substrate
storing grooves C2 that are vertically adjacent to each other in
the carrier C. Accordingly, the indexer robot IR can easily place
the two substrates W held by the hand IRH1 and the hand IRH2 on the
support plates 51P in the substrate platform PASS2 since the
difference N1 in height between the hand IRH1 and the hand IRH2 is
equal to the spacing GA between the substrate storing grooves
C2.
[0168] Furthermore, the indexer robot IR can easily take out the
two substrates W placed on the support plates 51P in the substrate
platform PASS1 by using the hand IRH1 and the hand IRH2.
[0169] Thus, also in the substrate processing apparatus 100
according to the present embodiment, the two substrates W at a time
can be transported between the carrier C and the substrate
platforms PASS1, PASS2. This allows the improvement of the
throughput in the substrate processing apparatus 100 to be
achieved.
[0170] The spacing GC between the support plates 51 that are
vertically adjacent to each other can be adjusted to be the maximum
spacing HG3 in the substrate platforms PASS1, PASS2 when the
substrates W are transported to the top surface cleaning unit SS by
the main robot MR, for example.
[0171] The maximum spacing HG3 between the support plates 51P is
sufficiently larger than the spacing GA between the substrate
storing grooves C2 that are vertically adjacent to each other in
the carrier C, and is substantially equal to the difference M1 in
height between the hand MRH1 and the hand MRH2 of the main robot
MR.
[0172] Accordingly, the hands MRH1, MRH2 of the main robot MR
having larger thicknesses than those of the hands IRH1, IRH2 of the
indexer robot IR are easily inserted between the plurality of
substrates W placed on the support plates 51P in the substrate
platforms PASS1, PASS2. This allows the substrates W to be reliably
transferred and received between the main robot MR and the
substrate platforms PASS1, PASS2.
[3] Correspondences Between Structural Elements in Claims and
Elements in the Embodiments
[0173] In the following paragraphs, non-limiting examples of
correspondences between various elements recited in the claims
below and those described above with respect to various embodiments
of the present invention are explained.
[0174] In the above described embodiments, the carrier C is an
example of a storing container, the support plates 51, 51P are
examples of a storing shelf, the substrate platforms PASS1, PASS2
are examples of a substrate platform shelf and an interface and the
indexer robot IR is an example of a substrate transporting
apparatus and a first substrate transporting apparatus.
[0175] The transport rail 210, the horizontally moving mechanism
211, the moving support post 220, the vertically moving mechanism
221, the lifting supporter 230, the base 240, the rotating
mechanism 241, the rotation stage 250 and the multi-joint type arms
IAM1, IAM2 are examples of a driving mechanism.
[0176] The hand IRH1 is an example of a first substrate holder, the
hand IRH2 is an example of a second substrate holder, the motor
251, the lifting shaft 260 and the ball screw 261 as well as the
cylinder synchronization mechanism 500 and the cylinder 510 are
examples of an adjusting mechanism.
[0177] The hand MRH1 is an example of a third holder, the hand MRH2
is an example of a fourth holder, the main robot MR is an example
of a second substrate transporting apparatus, the support pin PN is
an example of a support member, the processing block 11 is an
example of a processing region, the indexer robot 10 is an example
of a carrying in and out region, the carrier platform 40 is an
example of a container platform, and the top surface cleaning unit
SS is an example of a processing unit and a cleaning processing
unit.
[0178] Note that as each of various elements recited in the claims,
various other elements having configurations or functions described
in the claims can be also used.
[0179] While preferred embodiments of the present invention have
been described above, it is to be understood that variations and
modifications will be apparent to those skilled in the art without
departing the scope and spirit of the present invention. The scope
of the present invention, therefore, is to be determined solely by
the following claims.
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