U.S. patent application number 11/358306 was filed with the patent office on 2008-03-13 for mask carrier treatment to prevent haze and esd damage.
This patent application is currently assigned to Taiwan Semiconductor Manufacturing Company, Ltd.. Invention is credited to Chih-Wing Chang, Chung-Jen Chen, Hsin-Yuan Chen, Chun-Yi Ho, J. F. Lee, S. Y. Liang, Chih-Chien Wang.
Application Number | 20080060974 11/358306 |
Document ID | / |
Family ID | 39168490 |
Filed Date | 2008-03-13 |
United States Patent
Application |
20080060974 |
Kind Code |
A1 |
Liang; S. Y. ; et
al. |
March 13, 2008 |
Mask carrier treatment to prevent haze and ESD damage
Abstract
A reticle carrier including a base portion and a cover portion
at least partially detachable from the base portion. The base
portion and the cover portion are configured to collectively house
a reticle in a region collectively defined by the base portion and
the cover portion when the base portion and the cover portion are
fully attached. At least a portion of an interior surface of at
least one of the base portion and the cover portion is treated with
a sulfide-absorbing composition, such as silver or a
silver-containing alloy.
Inventors: |
Liang; S. Y.; (Hsin-Chu,
TW) ; Chang; Chih-Wing; (Hsin-Chu, TW) ; Chen;
Hsin-Yuan; (Tainan, TW) ; Chen; Chung-Jen;
(Tainan City, TW) ; Lee; J. F.; (Pingtung, TW)
; Wang; Chih-Chien; (Hsin-Chu, TW) ; Ho;
Chun-Yi; (Tainan, TW) |
Correspondence
Address: |
HAYNES AND BOONE, LLP
901 Main Street, Suite 3100
Dallas
TX
75202
US
|
Assignee: |
Taiwan Semiconductor Manufacturing
Company, Ltd.
Hsin-Chu
TW
|
Family ID: |
39168490 |
Appl. No.: |
11/358306 |
Filed: |
February 21, 2006 |
Current U.S.
Class: |
206/723 |
Current CPC
Class: |
G03F 1/66 20130101; G03F
7/70741 20130101 |
Class at
Publication: |
206/723 |
International
Class: |
B65D 85/00 20060101
B65D085/00 |
Claims
1. A reticle carrier, comprising: a base portion; and a cover
portion at least partially detachable from the base portion,
wherein: the base portion and the cover portion are configured to
collectively house a reticle in a region collectively defined by
the base portion and the cover portion when the base portion and
the cover portion are fully attached, and at least a portion of an
interior surface of at least one of the base portion and the cover
portion is treated with a sulfide-absorbing composition.
2. The reticle carrier of claim 1 wherein the sulfide-absorbing
composition at least partially comprises silver.
3. The reticle carrier of claim 1 wherein the at least a portion of
an interior surface of each of the base portion and the cover
portion is treated with the sulfide-absorbing composition.
4. The reticle carrier of claim 1 wherein the sulfide-absorbing
composition is coated on the treated portion of the interior
surface.
5. The reticle carrier of claim 1 wherein the sulfide-absorbing
composition is implanted into the treated portion of the interior
surface.
6. The reticle carrier of claim 1 wherein surfaces defining the
region configured to house the reticle are substantially treated
with the sulfide-absorbing composition.
7. The reticle carrier of claim 1 wherein at least a portion of an
exterior surface of at least one of the base portion and the cover
portion is treated with the sulfide-absorbing composition.
8. The reticle carrier of claim 1 wherein a substantial portion of
the exterior of the base portion and the cover portion are
substantially treated with the sulfide-absorbing composition.
9. The reticle carrier of claim 1 wherein at least a portion of at
least one of the base portion and the cover portion substantially
comprises an electrostatic dissipative composition.
10. A method, comprising: positioning a reticle in a reticle
carrier, the reticle carrier having an interior space configured to
receive and contain the reticle; and treating at least a portion of
one of the reticle and an internal surface of the interior space
with a sulfide-absorbing composition.
11. The method of claim 10 wherein the sulfide-absorbing
composition at least partially comprises silver.
12. The method of claim 10 wherein treating at least a portion of
one of the reticle and the internal surface of the interior space
includes coating at least a portion of one of the reticle and the
internal surface of the interior space with the sulfide-absorbing
composition.
13. The method of claim 10 wherein treating at least a portion of
one of the reticle and the internal surface of the interior space
includes implanting at least a portion of one of the reticle and
the internal surface of the interior space with the
sulfide-absorbing composition.
14. The method of claim 10 wherein treating at least a portion of
one of the reticle and the internal surface of the interior space
includes treating a substantial portion of a surface of the reticle
with the sulfide-absorbing composition.
15. The method of claim 10 wherein treating at least a portion of
one of the reticle and the internal surface of the interior space
includes treating a substantial portion of a surface of a pellicle
coupled to the reticle with the sulfide-absorbing composition.
16. The method of claim 10 wherein treating at least a portion of
one of the reticle and the internal surface of the interior space
includes treating a substantial portion of the internal surface of
the interior space with the sulfide-absorbing composition.
17. An apparatus, comprising: a reticle carrier having an internal
region configured to house at least one reticle, wherein the
reticle carrier at least partially comprises an electrostatic
dissipative composition; and a sulfide-absorbing member located at
least partially within the internal region of the reticle
carrier.
18. The apparatus of claim 17 wherein the sulfide-absorbing member
is a metallic member having the electrostatic dissipative
composition, is integral to the reticle carrier, and at least
partially defines the internal region of the reticle carrier.
19. The apparatus of claim 17 wherein the sulfide-absorbing member
comprises a non-sulfide-absorbing structure, wherein at least a
portion of a surface of the non-sulfide-absorbing structure is
coated with a sulfide-absorbing composition.
20. The apparatus of claim 17 wherein the sulfide-absorbing member
comprises a non-sulfide-absorbing structure, wherein at least a
portion of a surface of the non-sulfide-absorbing structure is
implanted with a sulfide-absorbing composition.
Description
[0001] This application is related to commonly-assigned U.S.
application Ser. No. 11/236,169, entitled "FULLY ELECTRIC FIELD
SHIELDING RETICLE POD," filed Sep. 27, 2005.
BACKGROUND
[0002] When not in use, reticles and other masks are housed in
reticle pods and/or similar reticle carriers. The carriers are
often made of dissipative material to reduce the risk of
electrostatic discharge (ESD) inadvertently damaging the reticle
when the reticle is being transferred to or from the carrier.
Generally, the reticle is housed in a carrier until its utilization
during lithographic processing, such as in a scanner or stepper.
Thereafter, the reticle is returned to the same carrier or another
carrier until its next use.
[0003] When the reticle is employed during lithography processing,
the exposure light utilized for pattern transfer can enhance
sulfide and ammonia in the environment. The subsequent reaction can
result in the formation of a haze on the reticle, whether on the
glass side and/or patterned (chromium) side. Moreover, previous
attempts to prevent the formation of such haze generally result in
increased risk of ESD damage.
BRIEF DESCRIPTION OF THE DRAWINGS
[0004] The present disclosure is best understood from the following
detailed description when read with the accompanying figures. It is
emphasized that, in accordance with the standard practice in the
industry, various features are not drawn to scale. In fact, the
dimensions of the various features may be arbitrarily increased or
reduced for clarity of discussion.
[0005] FIG. 1 is a sectional view of at least a portion of an
embodiment of apparatus according to aspects of the present
disclosure.
[0006] FIG. 2 is a sectional view of the apparatus shown in FIG. 1
in a subsequent stage of manufacture according to aspects of the
present disclosure.
[0007] FIG. 3 is a perspective view of at least a portion of an
embodiment of the apparatus shown in FIG. 1.
[0008] FIG. 4 is a perspective view of a portion of the apparatus
shown in FIG. 3.
[0009] FIG. 5 is a magnified view of a portion of the apparatus
shown in FIG. 4.
[0010] FIG. 6 is a perspective view of a portion of the apparatus
shown in FIG. 3.
[0011] FIG. 7 is a magnified view of a portion of the apparatus
shown in FIG. 6.
[0012] FIG. 8 is a top view of at least a portion of an embodiment
of apparatus according to aspects of the present disclosure, the
apparatus being depicted in a closed configuration.
[0013] FIG. 9 is a front view of the apparatus shown in FIG. 8, the
apparatus being depicted in the closed configuration of FIG. 8.
[0014] FIG. 10 is a top view of the apparatus shown in FIG. 9, the
apparatus being depicted in an open configuration.
DETAILED DESCRIPTION
[0015] It is to be understood that the following disclosure
provides many different embodiments, or examples, for implementing
different features of various embodiments. Specific examples of
components and arrangements are described below to simplify the
present disclosure. These are, of course, merely examples and are
not intended to be limiting. In addition, the present disclosure
may repeat reference numerals and/or letters in the various
examples. This repetition is for the purpose of simplicity and
clarity and does not in itself dictate a relationship between the
various embodiments and/or configurations discussed. Moreover, the
formation of a first feature over or on a second feature in the
description that follows may include embodiments in which the first
and second features are formed in direct contact, and may also
include embodiments in which additional features may be formed
interposing the first and second features, such that the first and
second features may not be in direct contact.
[0016] Referring to FIG. 1, illustrated is a sectional view of at
least a portion of an embodiment of apparatus 100 according to
aspects of the present disclosure. The apparatus 100 may be or
include a container or carrier (hereafter collectively referred to
as a container) configured to house at least one reticle 110.
However, the scope of the present disclosure is not limited to such
implementations. For example, aspects of the present disclosure may
be applicable or readily adaptable to containers utilized to house
other ESD-sensitive object(s), whether for storage and/or
transportation. Such ESD-sensitive objects may include, without
limitation, photomasks and other masks. The container apparatus 100
may also be referred to as reticle box, reticle pod or reticle
carrier. The container 100 may be configured to contain a single
reticle 100 or multiple reticles, including multiple different
reticles.
[0017] The container 100 may include a base portion 102 and a cover
portion 104. The base portion 102 and cover portion 104 are
configured to substantially envelope the one or more reticles 110
being stored and/or transported via the container 100. For example,
as in the embodiment depicted in FIG. 1, the base portion 102 and
the cover portion 104 may be configured to cooperate to form a
six-sided box. However, the base portion 102 may not necessarily
exhibit the substantially planar shape depicted in FIG. 1, yet may
still be configured to cooperate with the cover portion 104 to form
a box or otherwise-shaped enclosure.
[0018] The base portion 102 and/or the cover portion 104 may
partially or substantially comprise a dissipative material (e.g.,
electrostatic dissipative material). The dissipative material may
include cellophane, glassine and/or other materials, including
those having a surface resistivity ranging between about 10.sup.5
ohms/in.sup.2 and about 10.sup.12 ohms/in.sup.2. Alternatively, or
additionally, the base portion 102 and cover portion 104 may
partially or substantially comprise a plastic material and/or other
dielectric materials. For example, the base portion 102 and cover
portion 104 may include a multilayer structure including a layer of
plastic film and a layer of electrostatic-dissipative material
film, which may be adhered or otherwise coupled to one another.
[0019] The cover portion 104 may be configured to include one or
more doors located in one or more of its side walls operable to
provide one or more openings through which one or more reticles 110
may be transferred into and out of the container 100.
Alternatively, or additionally, such door may be located on the
base portion 102 and/or a portion of the cover portion 104 distally
opposing and, possibly, substantially parallel to the base portion
102. The cover portion 104 may also include a handle extending from
or coupled to one or more of the outer surfaces of the cover
portion 104 and/or the base portion 102. For example, such handle
may be configured to aid human or automatic handling of the
container apparatus 100.
[0020] The reticle 110 includes a substantially transparent
substrate 112 having an opaque pattern 114 formed thereon. The
substrate 112 may partially or substantially comprise fused quartz
(e.g., SiO.sub.2) and/or calcium fluoride (e.g., CaF.sub.2), and/or
other materials or combinations thereof. The reticle 110 also
includes a patterned absorption layer 114 formed on the substrate
112, such as may include chromium, iron oxide, or an inorganic film
made with MoSi, ZrSiO, SiN, and/or TiN, among other materials. The
reticle 110 may also include a plurality of phase-shifting
features, such as may be etched into or deposited onto the
substrate 112, or such as may be integral to the absorption layer
114 for phase shifting of a radiation beam incident thereon. The
patterned layer 114 may partially or substantially comprise MoSi,
which may also function as a phase shifter. The shifter may also be
incorporated into a phase-shift mask (PSM).
[0021] The reticle 110 may also include a pellicle 116, which may
be supported at a distance from the substrate 112 by a standoff or
pellicle frame 118. The pellicle 116 may be offset from the
substrate 112 by an amount such that any particulates or
contaminants may settle on the pellicle 116 instead of on the
substrate 112. For example, if such contaminants are allowed to
settle on the substrate 112, the pattern transferred from the
reticle 110 to a working piece (e.g., a silicon process wafer) may
be inaccurate. However, by employing the pellicle 116 at an offset
distance from the substrate 112, the contaminants may instead
settle on the pellicle 116, which may be out of the focal plane of
the exposure apparatus employed to transfer the pattern of the
absorption layer 114. Consequently, the contaminants may have less
or no effect on the accuracy of the pattern transferred to the
working piece.
[0022] The pellicle 116 may comprise a thin layer (e.g., relative
to the thickness of the substrate 112) that is stretched or
otherwise formed over the frame 118 above the surface of the
substrate 112. The pellicle 116 may be substantially transparent,
at least optically, relative to the exposure apparatus employed
during pattern transfer.
[0023] The container 100 may also include one or more support
members 106 configured to individually or collectively support one
or more reticles 110 inside the container 100. The support members
106 may be formed integrally with the base portion 102 and/or the
cover portion 104. Alternatively, the support members 106 may be
discrete members that are coupled to the base portion 102 and/or
the cover portion 104 by adhesive, welding, threaded or other
mechanical fasteners, and/or other coupling means.
[0024] The container apparatus 100, the reticle 110, and/or
portions thereof may be commercially available apparatus. For
example, the container apparatus 100 may be (or be substantially
similar to) a reticle pod commercially available from Microtome
Precision, Inc., of Colorado Springs, Colo. Examples of such
Microtome reticle pods include the E111 SEMI SPRA 99101-00 (a
SEMI-compliant, 150 mm, single reticle pod for automated
operations) and the E111 SEMI SPRA 99101-00 (a SEMI-compliant, 150
mm, single reticle pod for manual operations). Additional examples
of Microtome reticle pods include the E112 SEMI MRC 99600-00 (a
SEMI-compliant, 6 inch, multi-reticle cassette), the 6 inch
multi-reticle cassette 87620-00 (for use on ASML equipment), the
E112 SEMI MRPA 21321-00 (a SEMI-compliant, 150 mm, multi-reticle
pod for automated operations), and the E112 SEMI MRPM 21320-00 (a
SEMI-compliant, 150 mm, multi-reticle pod for manual
operations).
[0025] The reticle 110 may substantially conform to industry
standard SEMI P1 or SEMI P34, and the pellicle 118 may
substantially conform to industry standard SEMI P5. The lateral
dimensions of the reticle 110 (with or without the pellicle 118)
may range between about 5 inches and about 6 inches, with a
thickness of about 3/32-inch, 1/8-inch or 1/4-inch. The overall
lateral dimensions of the apparatus 100 may range between about 4
inches and about 9 inches, with an overall thickness ranging
between about one-half inch and about 2 inches. Of course, the
scope of the present disclosure is not limited to such
dimensions.
[0026] Referring to FIG. 2, illustrated is a sectional view of the
container apparatus 100 shown in FIG. 1 in a subsequent
manufacturing stage according to aspects of the present disclosure.
One or more surfaces of one or more of the above-described
components of the container 100 may include an absorbing layer 120.
The absorbing layer 120 may be formed on one or more external
surfaces 104a of the cover portion 104, one or more internal
surfaces 104b of the cover portion 104, one or more external
surfaces 102a of the base portion 102, and/or one or more internal
surfaces 102b of the base portion 102. The absorbing layer 120 may
additionally or alternatively be formed on one or more surfaces of
the reticle substrate 112 and/or one or more surfaces of the
reticle pellicle 116. While the embodiment shown in FIG. 2 includes
an absorbing layer 120 on each of these surfaces, other embodiments
may not include such extensive coverage of absorbing layers 120.
For example, the reticle substrate 112 and/or pellicle 116 may
include absorbing layers 120 even if the base portion 102 and/or
cover portion 104 do not, and the base portion 102 and/or cover
portion 104 may include absorbing layers 120 even if the reticle
substrate 112 and/or pellicle 116 do not.
[0027] Each absorbing layer 120 may partially or substantially
comprise silver (Ag). A characteristic of silver is its ability to
absorb sulfide. Consequently, sulfide may be partially or
substantially absorbed by the absorbing layer(s) 120, thus reducing
or eliminating the sulfide-ammonia reaction that conventionally
forms a haze on the reticle substrate 112 and/or pellicle 116.
However, other materials may also or additionally be employed in
one or more of the absorbing layers 120. One or more of the
absorbing layers 120 may also or alternatively include stainless
steel, copper, aluminum, iron, nickel, or combinations thereof.
[0028] One or more of the absorbing layers 120 may have a thickness
ranging between about 0.6 mm and about 1.0 mm, although other
thicknesses are also within the scope of the present disclosure.
The absorbing layer(s) 120 may be formed by electroplating,
electroless plating, spin-on coating, chemical vapor deposition
(CVD), physical vapor deposition (PVD) such as evaporation and
sputtering, or a combination thereof. The absorbing layer(s) 120
may also be formed by implant or doping procedures. The container
apparatus 100 may also include one or more adhesive layers to
enhance the adhesion of one or more of the absorbing layers 120 to
underlying surfaces. Each absorbing layer 120 may also be
substantially similar in composition and/or manufacture, although
other embodiments may include different absorbing layers 120 that
vary in composition and/or manufacture.
[0029] Aspects of the present disclosure may allow the elimination
of the haze which conventionally formed on the reticle substrate
112, pellicle 116 and/or portions of the container apparatus 100
due to the reaction of sulfide and ammonia. Alternatively, such
aspects may substantially decrease the rate at which the haze
conventionally forms. In either case, the lifetime (e.g., exposure
cycles and/or storage duration) of the reticle 110 and/or pellicle
116 may be substantially increased.
[0030] Moreover, such results can be achieved even with the base
portion 102 and/or the cover portion 104 being substantially
metallic, including in a manner that substantially prevents or
reduces electric fields passing through the base and/or cover
portions 102, 104, isolating charge items in the environment. Thus,
one embodiment within the scope of the present disclosure can
include modifying a commercially available reticle pod, cassette,
carrier, etc. by forming the above-described absorbing layer(s) 120
on one or more surfaces. Alternatively, such formation of the
absorbing layer(s) 120 may be performed by the manufacturer of the
reticle pod, cassette or carrier, whether such formation includes
deposition and/or doping processing. However, the elimination or
reduction of haze on the reticle substrate 112 and/or pellicle 116
resulting from the reaction of sulfide and ammonia can also or
alternatively be achieved by covering or implanting at least a
portion of the reticle substrate 112 and/or pellicle 116 with the
above-described absorbing layer(s) 120.
[0031] In either case, the number of reticles and/or pellicles
which are conventionally scrapped due to haze formation or ESD
damage can be substantially reduced with the implementation of one
or more aspects of the present disclosure. Moreover, as a result of
reduced, delayed or eliminated haze formation, wafer yield can also
be improved with the implementation of one or more aspects of the
present disclosure.
[0032] Additionally, aspects of the above-described absorbing
layer(s) 120 may be applicable or readily adaptable to a reticle
operation environment, in contrast to the reticle storage and
transportation environment of the container apparatus 100. For
example, by coating, implanting or otherwise treating surfaces of
the reticle operation environment (e.g., within a lithographic
pattern transfer apparatus) with silver and/or other absorbing
materials, haze formation on the reticle may also be reduced,
delayed or eliminated during and after reticle operations.
[0033] Aspects of the present disclosure are also applicable or
readily adapted to non-conventional reticle carrier apparatus. For
example, in contrast to coating the surfaces of a conventional
reticle carrier apparatus with a sulfide- or ammonia-absorbing
composition, the structure of a reticle carrier apparatus can
substantially comprise a sulfide- or ammonia-absorbing composition.
Thus, in one embodiment, the base and cover portions 102, 104 shown
in FIGS. 1 and 2 may substantially comprise silver, for example.
Moreover, such structure may also be doped or implanted with one or
more dissipative materials, in contrast to embodiments described
above in which the base and cover portions 102, 104 substantially
comprise one or more dissipative materials that are doped or
implanted with one or more sulfide- or ammonia-absorbing
materials.
[0034] In a related embodiment, a liner, sheet, plate or other
component may be coupled inside the apparatus 100, and may
partially or substantially comprise silver and/or another absorbing
composition, and/or may be coated with silver and/or another
absorbing composition. Thus, in contrast to coating or implanting
an absorbing composition into an existing apparatus (e.g., a
commercially available reticle container), or in addition to such
processing, the additional component may be coupled inside the
apparatus 100, whether by adhesive, welding, threaded or other
mechanical fasteners, and/or otherwise.
[0035] Referring to FIG. 3, illustrated is a perspective view of at
least a portion an embodiment of the apparatus 100 shown in FIGS. 1
and 2, herein designated by the reference numeral 150. The
container apparatus 150 is substantially similar to the container
apparatus 100 shown in FIGS. 1 and 2, with the possible
exceptions/additions described below.
[0036] The apparatus 150 includes a base portion 152 and a cover
portion 154 which may be substantially similar in composition and
manufacture to the base portion 102 and cover portion 104 shown in
FIGS. 1 and 2, but may have a different shape compared to the base
and cover portions 102, 104. When assembled, the base portion 152
may be substantially enclosed by the cover portion 154. For
example, only tabs 153 of the base portion 152 are visible in FIG.
3. The tabs 153 may be function in the alignment and/or engagement
of the base and cover portions 152, 154.
[0037] The apparatus 150 also includes a handle 160 secured to or
extending from the cover portion 154. The handle 160 may be
configured for manual and/or automated operations involving the
apparatus 150. The apparatus 150 may also include an exterior
platform 162 secured to or extending from the cover portion 154.
The platform 162 may aid in stacking multiple instances of the
apparatus 150, particular where the handle 160 is externally
positioned in a central portion of the cover portion 154, such as
in the embodiment depicted in FIG. 3. For example, the height to
which the platform 162 extends from the cover portion 154 may be
about equal to or greater than the height to which the handle
extends from the cover portion 154 (or other mutual reference
point). Consequently, the platform 162 may provide a substantially
flat or planar surface upon which an additional instance of the
apparatus 150 may be stacked with greater stability, at least
compared to the stability of such stacking in the absence of the
platform 162.
[0038] The platform 162 may include a perimeter and/or inner
profile (whether two-dimensional or three-dimensional) that
substantially conforms or otherwise cooperates with a corresponding
profile of the base portion 152. Consequently, engagement or other
cooperation of the corresponding perimeters and/or profiles of the
platform 162 of a first instance of the apparatus 150 and the base
portion 152 of a second instance of the apparatus 150 may limit the
relative lateral translation of the first and second instances of
the apparatus 150 when stacked one upon the other. Thus, for
example, the height of the platform 162 relative to the handle 160
may provide roll, pitch and/or vertical stability when multiple
instances of the apparatus 150 are stacked, and the corresponding
perimeters and/or profiles of the platform 162 and the base portion
152 may simultaneously provide lateral and/or yaw stability.
[0039] The exterior surfaces 154a of the cover portion 154, the
handle 160 and/or the platform 162 may be partially or
substantially treated with one or more absorbing layers 170. Each
absorbing layer 170 may be substantially similar in composition and
manufacture to the absorbing layer 120 described above. For
example, the absorbing layer(s) 170 may substantially comprise
silver, and may be applied to the cover portion 152, handle 160
and/or platform 162 by plating or implant processes.
[0040] Referring to FIG. 4, illustrated is a perspective view of
the inside of the cover portion 154 shown in FIG. 3. A substantial
portion of the interior surfaces 154b of the cover portion 154 is
coated with an absorbing layer 170 partially or substantially
comprising silver and/or other sulfide-absorbing compositions. FIG.
4 also depicts that the cover portion 154 may include various
supports and/or mechanisms for positioning and securing a reticle,
possibly in conjunction with corresponding supports and/or
mechanisms of the base portion 152.
[0041] FIG. 5 is a magnified perspective view of a portion of the
cover portion 154 shown in FIG. 4. Referring to FIGS. 4 and 5,
collectively, the container apparatus 150 may contain one or more
standoffs 164 which may reduce or prevent erosion of the absorbing
layer 170 in response to contact with the reticle or other
structure within the apparatus 150. For example, the standoffs 164
may partially or substantially comprise iron, rubber, plastic,
and/or other materials selected to prevent rubbing, wearing,
chipping, scratching, or otherwise comprising the integrity of the
absorbing layer 170. The standoffs 164 may be coupled to the
absorbing layer and/or other portion of the cover portion 154 by
adhesive, bonding, welding, threaded or other mechanical fasteners,
and/or other means. The coupling between the standoffs 164 may be a
detachable coupling, such that the standoffs 164 may be replaced
when necessary. The standoffs 164 may also be coated with silver
and/or other sulfide-absorbing compositions. Such coating may be
applied to the standoffs 164 before or after the standoffs 164 are
secured to the cover portion 154.
[0042] Referring to FIG. 6, illustrated is a perspective view of
the inside of the base portion 152 shown in FIG. 3. A substantial
portion of the interior surfaces 152b of the base portion 152 is
coated with an absorbing layer 170 partially or substantially
comprising silver and/or other sulfide-absorbing compositions. FIG.
6 also depicts that the base portion 152 may include various
supports and/or mechanisms for positioning and securing a reticle,
possibly in conjunction with corresponding supports and/or
mechanisms of the cover portion 154.
[0043] FIG. 7 is a magnified perspective view of a portion of the
base portion 152 shown in FIG. 6. Referring to FIGS. 6 and 7,
collectively, the container apparatus 150 may contain one or more
standoffs 166 which may reduce or prevent erosion of the absorbing
layer 170 in response to contact with the reticle or other
structure within the apparatus 150. The standoffs 166 may be
substantially similar to the standoffs 164, at least with respect
to composition, manufacture and assembly.
[0044] FIG. 8 is a top view of at least a portion of an embodiment
of a container apparatus 200 according to aspects of the present
disclosure, and FIG. 9 is a front view of the apparatus 200 shown
in FIG. 8. Referring to FIGS. 8 and 9, collectively, the container
200 may be a mask package for housing reticles with or without
pellicles during storage and/or transportation. At least in this
regard, the container 200 may be substantially similar to the
apparatus 100 and/or the apparatus 150 described above, such as
with respect to composition, manufacture, and/or functionality.
[0045] For example, each of the containers 100, 150 and 200 may be
configured to house reticles with minimal contact to the reticles,
including to the extent that the containers may be easily opened
and closed for the addition or removal of one or more reticles. The
containers 100, 150 and 200 may also be configured to minimize
particle generation during the opening and closing of the
containers 100, 150 and 200, as well as during translation of
reticles in and out of the containers 100, 150 and 200. For
example, and as described above, the containers 100, 150 and 200
may comprise two structural halves or portions, such as the base
portions 102, 152 described above and the cover portions 104, 154
described above. The container apparatus 200 also includes a base
portion 202 and a cover portion 204, which may be hinged together
to facilitate opening and closing the container 200 without
separating the base and covering portions 202, 204 (the base
portions 102, 152 and the cover portions 104, 154 may be similarly
hinged). For example, the base portion 202 may be hinge-coupled to
the cover portion 204 by a roller hinge, which may minimize
particle generation relative to other types of hinges. However,
other embodiments within the scope of the present disclosure may
include hinges other than or in addition to roller hinges to couple
the base portion 202 and the cover portion 204.
[0046] The container apparatus 200, as well as the apparatus 100
and 150 described above and others within the scope of the present
disclosure, may be configured to house a single reticle or multiple
reticles. In either case, the housed reticles may include pellicles
on one or both sides. The reticles may include Ultratech reticles,
Nikon reticles, GCA reticles, ASM reticles, and/or Canon reticles,
among other commercially available examples, although
future-developed or non-conventional reticles may also be housed
with the apparatus 200.
[0047] The apparatus 200 may also include latching means 270
configured to keep the apparatus 200 closed after rotating the base
portion 202 and cover portion 204 towards each other. The latching
means 270 may comprise any commercially available latches, hooks,
fasteners, and/or other structure for maintaining the closed
configuration shown in FIG. 8. The latching means 270 may also
include robotic-compatible latching means.
[0048] An absorbing material may substantially cover the external
surfaces 202a of the base portion 202 and the external surfaces
204a of the cover portion 204. The absorbing material may be
substantially similar to the absorbing layer 120 described above,
at least with respect to composition and manufacture. For example,
the base and cover portions 202, 204 may substantially comprise an
aluminum, iron or steel structure that is partially or
substantially plated or otherwise coated with silver, other
sulfide-absorbing materials, and/or combinations or alloys thereof.
The composition of such structure may also or alternatively
comprise other electrostatic dissipative materials. The structure
of the base and cover portions 202, 204 may, alternatively,
substantially comprise silver, other sulfide-absorbing materials,
and/or combinations or alloys thereof, in contrast to merely being
plated or otherwise coated with a sulfide-absorbing
composition.
[0049] The apparatus 200 may be configured to be generally compact
and/or otherwise able to be stacked with other instances of the
apparatus 200. For example, the base portion 202 may include a
recess 202c, and the cover portion 204 may include a protrusion
204c configured to be received by the recess 202c. The perimeters
of the protrusion 204c and the recess 202c may be configured such
that, when multiple instances of the apparatus 200 are stacked in a
vertical direction, the protrusion 204c and the recess 202c
cooperate to restrain or limit relative translation of the base and
cover portions 202, 204 in a horizontal direction.
[0050] For example, the perimeters of the protrusion 204c and the
recess 202c may substantially follow or conform to the outer
perimeters of the base and cover portions 202, 204, although being
offset radially inward. However, such similarity between the shape
or lateral profile of the protrusion 204c and recess 202c relative
to the perimeters of the base and cover portions 202, 204 may not
exist in some embodiments within the scope of the present
disclosure, such that the protrusion 204c and/or the recess 202c
may have otherwise-shaped perimeters or lateral profiles, including
those with less or no similarity to the perimeter of the base or
cover portions 202, 204. Moreover, the base portion 202 may include
a protrusion instead of the recess 202c, such that the cover
portion 204 includes a recess instead of the protrusion 204c. The
height/depth of the protrusion 204c and/or the recess 202c, may
range between about 1.0 mm and about 2.0 cm, such as about 5.0 mm.
However, the depth of the recess 202c may be at least slightly
greater than the height of the protrusion 204c. Similarly, the
lateral dimensions of the recess 202c may be at least slightly
greater than the lateral dimensions of the protrusion 204c.
[0051] Referring to FIG. 10, illustrated is a top view of the
apparatus 200 shown in FIGS. 8 and 9. The apparatus 200 is depicted
in FIG. 10 as being oriented in an open configuration, as opposed
to the closed configuration depicted in FIGS. 8 and 9. The
apparatus 200 may include one or more landing pads 210 configured
to prevent tearing or otherwise damaging the reticles housed in the
apparatus 200, and/or the pellicles of such reticles. The landing
pads 210 may be substantially to the standoffs 164 described above,
at least with respect to composition and/or manufacture. However,
the landing pads 210 may not have the same shape as the standoffs
164, and may not have the same shapes as other ones of the landing
pads 210. The landing pads 210 may be secured to the inside
surfaces of the base and/or cover portions 202, 204 by adhesive,
welding, threaded or other mechanical fasteners, and/or other
means. The landing pads 210 may also be formed integral to the base
and/or cover portions 202, 204, such as by a press-forming
manufacturing process. In such embodiments, the raised surface of
the landing pads 210 may be coated or treated with a material other
than the silver or other sulfide-absorbing composition coating the
remainder of the base and cover portions 202, 204, such as a
material coating selected to minimize damage resulting from
physical contact with the reticle or pellicle.
[0052] The apparatus 200 also includes one or more guides 220 each
configured to minimize damage to the house reticle(s). For example,
the guides 220 may have rounded corners and edges, thereby
minimizing the potential for scratching a reticle or tearing a
pellicle when positioning a reticle between the guides 220. The
guides 220 may also be sized and positioned within the base and/or
cover portions 202, 204 such that the housed reticle(s) is secured
in a central portion of the inner cavity of the apparatus 200.
Consequently, the housed reticle(s) may be protected against impact
forces suffered by the exterior of the apparatus 200.
[0053] The apparatus 200 can also include one or more hinges 280
coupling the base and cover portions 202, 204. The hinges 280 may
be roller hinges, as described above, although other types of
hinges are also within the scope of the present disclosure, such as
butt hinges, continuous hinges, spring hinges, paumelle or olive
knuckle hinges, and others. The hinges 280 may also be configured
such that the base and cover portions 202, 204 are detachable when
the latches 270 are released, such as may be accomplished via loose
joint hinges or other hinges having two separable parts.
[0054] In view of all of the above, it should be readily apparent
to those skilled in the pertinent art that the present disclosure
introduces a reticle carrier including, at least in one embodiment,
a base portion and a cover portion at least partially detachable
from the base portion. The base portion and the cover portion are
configured to collectively house a reticle in a region collectively
defined by the base portion and the cover portion when the base
portion and the cover portion are fully attached. At least a
portion of an interior surface of at least one of the base portion
and the cover portion is treated with a sulfide-absorbing
composition, such as silver or a silver-containing alloy.
[0055] Another embodiment of similar apparatus includes a reticle
carrier and a sulfide-absorbing member. The reticle carrier has an
internal region configured to house at least one reticle, wherein
the reticle carrier at least partially comprises an electrostatic
dissipative composition. The reticle carrier may be a commercially
available product, in some embodiments. The sulfide-absorbing
member is located at least partially within the internal region of
the reticle carrier.
[0056] According to aspects of these and other embodiments within
the scope of the present disclosure, the various environments to
which a reticle is exposed and which include sulfide can be less
damaging when ammonia is present. That is, the sulfide-absorbing
member or similarly treated surface of the reticle carrier may at
least partially absorb the sulfide in such embodiments.
Consequently, the conventional sulfide-ammonia reaction--that
results in a haze forming on the reticle and/or other proximate
surfaces--may be reduced, and possibly eliminated to a substantial
degree. Moreover, this advantage can be obtained even while the
structure of the reticle carrier partially or substantially
comprises an electrostatic dissipative composition. Accordingly,
the above-described haze reduction can be achieved while
maintaining adequate levels of ESD protection.
[0057] The present disclosure also introduces a method comprising,
at least in one embodiment, positioning a reticle in a reticle
carrier having an interior space configured to receive and contain
the reticle. The method also includes treating at least a portion
of the reticle, an internal surface of the interior space, or both,
with a sulfide-absorbing composition. Aspects of this method and
others within the scope of the present disclosure may be similarly
advantageous relative to the apparatus aspects and advantages
described above.
[0058] The foregoing outlines features of several embodiments so
that those skilled in the art may better understand the aspects of
the present disclosure. Those skilled in the art should appreciate
that they may readily use the present disclosure as a basis for
designing or modifying other processes and structures for carrying
out the same purposes and/or achieving the same advantages of the
embodiments introduced herein. Those skilled in the art should also
realize that such equivalent constructions do not depart from the
spirit and scope of the present disclosure, and that they may make
various changes, substitutions and alterations herein without
departing from the spirit and scope of the present disclosure.
* * * * *