U.S. patent application number 11/907548 was filed with the patent office on 2008-02-21 for apparatus and process for vacuum sublimation.
This patent application is currently assigned to Industrial Technology Research Institute. Invention is credited to Jun-Yi Chen, Shyue-Ming Jang, Long-Shuenn Jean, Bang-I Liou, Sheng Yang.
Application Number | 20080044327 11/907548 |
Document ID | / |
Family ID | 34215145 |
Filed Date | 2008-02-21 |
United States Patent
Application |
20080044327 |
Kind Code |
A1 |
Jang; Shyue-Ming ; et
al. |
February 21, 2008 |
Apparatus and process for vacuum sublimation
Abstract
A vertical and a horizontal vacuum sublimation apparatus with
high efficiency and processes thereof are provided, especially for
the materials having high melting point and low vapor pressure. The
vertical sublimation purification apparatus comprises a sublimation
channel body, a material rack, a heating evaporation device, a
condensation device, an incubating device and a product scratching
device. The horizontal sublimation purification apparatus comprises
a sublimation channel body, a material carrier, a heating
evaporation device and two end pipes. The apparatuses of the
present invention can be applied on high purity chemicals from mass
production, and are capable of sublimating and purifying OLED
illumination layer materials including ALq.sub.3, NPB and CuPc,
which have high melting temperature and low vapor pressure.
Inventors: |
Jang; Shyue-Ming; (Hsinchu
City, TW) ; Yang; Sheng; (Hsinchu City, TW) ;
Liou; Bang-I; (Hsinchu City, TW) ; Chen; Jun-Yi;
(Hsinchu City, TW) ; Jean; Long-Shuenn; (Dalin
Township, TW) |
Correspondence
Address: |
BACON & THOMAS, PLLC
625 SLATERS LANE
FOURTH FLOOR
ALEXANDRIA
VA
22314
US
|
Assignee: |
Industrial Technology Research
Institute
Chutung
TW
|
Family ID: |
34215145 |
Appl. No.: |
11/907548 |
Filed: |
October 15, 2007 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
10660715 |
Sep 12, 2003 |
|
|
|
11907548 |
Oct 15, 2007 |
|
|
|
Current U.S.
Class: |
422/307 |
Current CPC
Class: |
B01D 7/00 20130101 |
Class at
Publication: |
422/307 |
International
Class: |
B01B 1/00 20060101
B01B001/00 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 28, 2003 |
TW |
092123728 |
Claims
1. A horizontal sublimation apparatus, comprising: a sublimation
channel body; a material carrier located inside said sublimation
channel body for storing materials ready to be evaporated; a
heating evaporation device surrounding an evaporation pipe to
control heating temperatures according to different materials for
evaporating said materials; an end pipe mounted respectively at two
ends of said sublimation channel body with one said end pipe
connecting to a vacuum air extracting system and the other said end
pipe being sealed; and a pipe-end sealing device for connecting two
ends of said sublimation channel body to said two end pipes for
achieving preferable sealing effect of said sublimation channel
body.
2. The horizontal sublimation apparatus as claimed in claim 1,
wherein material carrier can be in the shape of a boat, a tank, a
circular plate or any other forms that can be used to store
materials.
3. The horizontal sublimation apparatus as claimed in claim 1,
wherein said pipe-end sealing device is a screw nut.
Description
[0001] This application is a divisional application of pending U.S.
application Ser. No. 10/660,715 filed Sep. 12, 2003.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention provides a vertical and a horizontal
vacuum sublimation apparatuses with high efficiency and processes
thereof, which can be applied on high purity chemicals from mass
production.
[0004] 2. Description of Related Art
[0005] With the development of IT and electrical industries, the
requirements for the quality of electronic components are
continuously rising. The purity of the chemicals used in electronic
components is the main quality-affecting factor. Some chemicals
cannot be purified via distillation process since their melting
temperature is higher than their decomposition temperature.
Sublimation purification is one of the processes for obtaining high
purity chemicals. It can be applied to chemicals with high melting
temperature and sublimation characteristics. It is based on these
sublimation characteristics that purification can be realized via
high vacuum heating sublimation process, where contaminants must be
blocked off from the sublimation process. Products with extremely
high purity can only be obtained under a strictly controlled
operation environment to produce high quality electronic
components. Some illumination layer materials are used in the
production of OLED components, such as electron transport layer
(ETL) materials-Aluminum Tri (8-Hydroxyquinolinate) (Alq.sub.3);
hole injection layer (HIL) materials-Copper Phthalocyanine (CuPc);
hole transport (HTL) layer
materials-N,N'-bisphenyl-N,N'-bis(1-naphthyl)-benzidine
(abbreviated as NPB), etc. The purification of these chemicals
cannot be realized through distillation process since their melting
temperature is higher than their decomposition temperature.
However, high purity products can be obtained through vacuum
sublimation process based on their sublimation characteristics to
produce high quality electronic components.
[0006] Although the earlier approach of promoting sublimation vapor
with noble gases could lower the requirements on the vacuum degree
of the system, but the residual substances that cannot be
sublimated in the sublimation materials have low apparent density
so that they are easy to flow with noble gases, which resulting in
products that are contaminated by flowing residues. High vacuum
system is therefore designed to overcome the above disadvantage. In
addition, the vapor pressure of some materials, such as CuPc, is
extremely low that a system with vacuum degree of 10.sup.-6 mbar
temperature of 600.degree. C. is required. Otherwise, these
materials can not be evaporated. If the pressure of system were too
high, the vapor from the sublimation process would collide with the
residual air in the system, causing the sublimated materials to
fall back into the evaporation tank and creating partial
vaporization-condensation circulation, thus resulting in
difficulties with product output. Recently, with the continuously
increasing demand for such high purity chemicals, materials
produced by small-scale purification apparatuses can no longer meet
the demand because of their quality difference between each product
group and limited productivity. As a result, it is necessary to
design a vacuum sublimation apparatus that can be applied to mass
production.
[0007] Instead of considering the purity of products and the
convenient operational approaches required by mass production, the
processes revealed by existing patent documents primarily are
concerned with improving sublimation efficiency. In the
manufacturing process of OLED materials, the purity of the
materials is the key factor to a successful production. How to
obtain high purity sublimated products from mass production is the
main challenge of these apparatuses.
[0008] The apparatus of Japanese patent JP10158820, owned by
Japanese company-ULVAC JAPAN, can be utilized to purify
photoelectric materials, such as
N,N'-Bisphenyl-N,N'-bis(3-methylphenyl)-benzidine (TPD). The design
aims at improving heating evenness and rate with noble gases as
heat carriers. This process is usually not applied to the
purification of the chemicals with low vapor pressure, such as
CuPc, since products are easily contaminated by flowing residues
and high vacuum environment cannot be realized. In addition, U.S.
Pat. No. 5,377,429, owned by American company-Micron Semiconductor,
disclosed a sublimation device to purify the organic metal
chemicals employed in the semiconductor industry, such as
tetrakis-dimethyl-amino titanium[Ti(N(CH.sub.3).sub.2).sub.4]
(abbreviated as TDMAT). The unique features of the design are:
vaporization and condensation take place in the same vertical
vessel; materials, located at the bottom of the vessel, are mixed
with ceramic beads which act as heat carriers; and the sublimation
vessel consists of a mixing device to increase the surface area for
heat conduction. During the purification process, vapor will rise
and condense on the upper part of the vessel wall, and products can
be scratched off after sublimation. However, materials are likely
to be spattered, thus causing contamination on products during the
mixing process, and products thereof are also difficult to collect.
Japanese patent JP200093701, owned by Japanese company-Nippon Steel
Chemical Group, outlined an apparatus with separate vaporization
and condensation devices, while temperatures thereof are
individually controlled through induction heating to purify
photoelectric materials, such as Alq.sub.3. However, such process
cannot apply to mass production due to its poor heating efficiency
and incapability to reach the required sublimation temperature
(500.degree. C.). U.S. Pat. No. 4,407,488, owned by German
company-Leybold-Heraeus GmbH, did not point out what types of
materials can be purified by the apparatus. The disclosed
sublimation system consists of multiple groups of vaporization
plates. Under a vacuum environment, heat is absorbed by plate edges
and distributed on plate surfaces to heat and vaporize thin layers
of materials on the same plate surfaces. This particular heating
process is likely to produce uneven temperature on plate surfaces,
thus making the purity of products harder to improve.
SUMMARY OF THE INVENTION
[0009] To overcome the well-known problems of the sublimation
technique mentioned above, the present invention provides a
vertical and a horizontal vacuum sublimation apparatuses and
processes thereof, preferably for the materials having high melting
point and low vapor pressure. The present invention can be suitably
applied on high purity chemicals from mass production, and overcome
the foregoing drawbacks caused by conventional sublimation
technologies.
[0010] The object of the present invention is to provide a vertical
sublimation apparatus comprising a sublimation channel body, a
material rack for storing materials that will be evaporated, a
heating evaporation device surrounding the evaporation pipe for
controlling the heating temperature according to different
materials for evaporating said materials, a condensation device
surrounding the upper part of the sublimation channel body for
controlling the condensation temperature required by different
evaporated materials, an incubating device for maintaining the
temperature of the vapor channels and products and a product
scratching device.
[0011] The structure of the above-mentioned material rack comprises
a plurality of rails and fixed rings, wherein the rails are fixed
by two fixed rings. The material rack is located in the evaporation
pipe for storing materials that will be evaporated.
[0012] The above-mentioned incubating device comprises a vapor
channel incubating device and a product incubating device. The
vapor channel incubating device, which surrounds the outlet port of
the channels, maintains the temperature of the sublimated vapor
that the vapor would transport continuously into the sublimation
channel body. The product incubating device, which surrounds the
lower part of the sublimation channel body, prevents the
accumulation of the sublimated vapor.
[0013] The above-mentioned product scratching device comprises a
central axis for shifting up/down and/or rotating the scratching
device, fixed rings, central support and sawtooth, wherein the
sawtooth is located near the fixed rings beneath the central
support to scratch off the condensed products from the wall of the
sublimation channel body.
[0014] A product storage tank is formed underneath the sublimation
channel body for storing products. The condensed products, when
scratched off by the scratching device, would fall into the product
storage tank and be collected later.
[0015] The above-mentioned vertical sublimation apparatus further
comprises heat shield devices, which, made of quartz wool, are
located at the two ends of the sublimation channel body and at one
end of the evaporation pipe further away from the sublimation
channel body. The devices serve to maintain a certain temperature
inside the sublimation apparatus.
[0016] The above-mentioned vertical sublimation apparatus further
comprises sealing caps located at the end of the channels with heat
shield device and locked by O-rings to prevent vacuum leakage.
[0017] Another object of the present invention is to provide a
horizontal sublimation apparatus, which comprises a sublimation
channel body, a material carrier located inside the above-mentioned
sublimation channel body for storing materials that will be
evaporated, a heating evaporation device which surrounds the
sublimation channel body for controlling the heating temperature
according to different materials for evaporating said materials,
two end pipes located at the two ends of the above-mentioned
sublimation channel body wherein the pipe at one end connects to
the vacuum r extraction system, whereas the pipe at the other end
is sealed, and pipe-end sealing devices for connecting the two ends
of the above-mentioned sublimation channel body with the two end
pipes to achieve perfect sealing for the sublimation channel
body.
[0018] The above-mentioned material carrier could be in the shape
of a boat, a tank, a circular plate or any other forms that can be
used to store materials without particular restrictions.
[0019] The above-mentioned pipe-end sealing devices are screw nuts.
When connecting the sublimation channel body with the two end
pipes, the perfect sealing effect can be realized by combing a
screw nut with an O-ring, and then screwing the screw nut into the
thread at the two ends of the sublimation channel body until it is
tightened up.
[0020] Another object of the present invention is to provide a
high-efficiency vapor collection device disposed between the
sublimation channel body and the vacuum system of the two said
sublimation apparatuses, for condensing the uncondensed and ionized
vapor via low temperature, thus preventing the vacuum pump from
being contaminated, so that the vacuum pump can be put to long-term
use without being necessary to clean.
[0021] The above-mentioned vapor collection device comprises a
collecting bottle filled with wires to expanding the contacting
surface for vapor condensed; an inlet pipe for connecting with the
above-mentioned vacuum sublimation apparatus, such that ionized
vapor can be guided into the collecting bottle; and an exhaust pipe
for connecting with the vacuum extraction system.
[0022] Another object of the present invention is to provide a
vacuum sublimation purification process, applied to the vertical
sublimation purification apparatus, which comprises the following
steps: place materials on the material rack; turn on the vacuum
extraction device; turn on the heating evaporation device to
achieve the required sublimation temperature of the materials; turn
on all incubating devices to maintain the condensation temperature;
scratch and collect products at a regular time interval during the
evaporation process; cool down the temperature after evaporation is
completed and take out products from the product storage tank.
[0023] Another object of the present invention is to provide a
vacuum sublimation purification process applied to the horizontal
sublimation purification apparatus, which comprises following
steps: place materials in the material carrier; place the material
carrier at the center of the sublimation channel body; tighten up
and seal the two end pipes; turn on the vacuum extraction device;
turn on the heating evaporation device to control the temperature
between the center and the two ends of the sublimation channel
body; cool down the temperature and break the vacuum after
evaporation is completed, then scratch and collect products.
[0024] The conditions of employing the vertical or horizontal
sublimation apparatus of the present invention to purify Alq.sub.3
through sublimation are: evaporation temperature is
350.about.450.degree. C., and the preferable evaporation
temperature is 370.about.400.degree. C. Condensation temperature is
250.about.350.degree. C., and the preferable condensation
temperature is 270.about.320.degree. C. Evaporation temperature is
50.about.100.degree. C. higher than condensation temperature.
System pressure is 1.about.1.times.10.sup.-6 mbar, and the
preferable system pressure is 0.3.about.1.times.10.sup.-6 mbar.
[0025] The preconditions of employing the vertical or horizontal
sublimation apparatus of the present invention to purify NPB
through sublimation are: evaporation temperature is
250.about.350.degree. C., and the preferable evaporation
temperature is 270.about.300.degree. C. Condensation temperature is
150.about.250.degree. C., and the preferable condensation
temperature is 170.about.220.degree. C. Evaporation temperature is
30.about.80.degree. C. higher than condensation temperature. System
pressure is 0.1.times.1.times.10.sup.-6 mbar, and the preferable
system pressure is 0.03.about.1.times.10.sup.-6 mbar.
[0026] The preconditions of employing the vertical or horizontal
sublimation apparatus of the present invention to purify CuPc
through sublimation are: evaporation temperature is
500.about.650.degree. C., and the preferable evaporation
temperature is 550.about.600.degree. C. Condensation temperature is
400.about.500.degree. C., and the preferable condensation
temperature is 430.about.480.degree. C. Evaporation temperature is
50.about.100.degree. C. higher than condensation temperature.
System pressure is 0.1.about.1.times.10.sup.-6 mbar, and the
preferable system pressure is 0.03.about.1.times.10.sup.-6mbar.
[0027] The vacuum sublimation purification process of the
above-mentioned vertical and horizontal sublimation apparatuses
allows vacuum to be broken and products to be taken out after the
materials have completely sublimated and purified.
[0028] The fundamental object of the present invention is to create
a high efficiency vacuum heating sublimation apparatus, which can
be applied to mass production. High purity products can be produced
since the sublimation temperature and the vacuum degree could reach
650.degree. C. and 10.sup.-6 mbar respectively, and the heating and
condensation temperatures can be adjusted and controlled. The heat
conductivity and the vacuum degree of the apparatuses of the
present invention meet the standards of small-scale apparatuses,
while the convenient and sustainable operational approach thereof
meets the requirement of mass production. In addition, the
apparatuses are capable of sustaining appropriate product purity,
conducting commercial operations and producing large quantities of
high purity products.
BRIEF DESCRIPTION OF THE DRAWINGS
[0029] FIG. 1 shows a schematic diagram of the vertical sublimation
apparatus of the present invention.
[0030] FIG. 2A shows a side view of the material rack of the
present invention.
[0031] FIG. 2B shows a sectional view of the material rack of the
present invention dissecting along the A-A section line shown in
FIG. 2A.
[0032] FIG. 3A shows a side view of the scratching device of the
present invention.
[0033] FIG. 3B shows a sectional view of the scratching device of
the present invention dissecting along the A-A section line shown
in FIG. 3A.
[0034] FIG. 4 shows a schematic diagram of the horizontal
sublimation apparatus of the present invention.
[0035] FIG. 5 shows a separate view of the sublimation channel
body, two end pipes, and pipe-end sealing devices respectively
inside the horizontal sublimation apparatus.
[0036] FIG. 6 shows a three-dimensional view of the material
carrier of the present invention.
[0037] FIG. 7 shows a schematic diagram of the vapor collection
system of the present invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
[0038] FIG. 1 illustrates a vertical sublimation apparatus 100 of
the present invention. According to FIG. 1, the apparatus comprises
a high temperature and corrosion resistant sublimation channel body
1, which is a hollow cylinder made of quartz glass; a material rack
2 for storing materials that will be evaporated; a heating
evaporation device 3, surrounding the evaporation pipe 4, for
controlling the heating temperature based on different materials
and realizing evaporation; a condensation device 5, surrounding the
upper part of the sublimation channel body 1, for controlling the
condensation temperature required by different evaporated materials
to achieve high purity; an incubating device 6, 7, which consists
of a vapor channel incubating device 6 and a product incubating
device 7. The vapor channel incubating device 6, surrounding the
outlet port of the vapor channel (not shown on the figure), keeps
the temperature of sublimated vapor and transports vapor
continuously into the sublimation channel body 1. The product
incubating device 7, surrounding the lower part of the sublimation
channel body 1, avoids accumulation of some of the sublimated
vapor; and a product scratching device 8.
[0039] The above-mentioned vertical sublimation apparatus 100
further comprises heat shield devices 9 formed by stuffing quartz
wool into cylindrical containers made of quartz, with all ends
thereof being sealed after air extraction such that the internal
pressure thereof reaches under 10.sup.-6 mbar in a vacuum state.
The heat shield devices 9 are then respectively placed into the b,
c ends of the above-mentioned sublimation channel body 1 and the a
end of the evaporation pipe 4 so as to achieve the heat-shielding
effect. In addition, the above-mentioned vertical sublimation
apparatus 100 further comprises sealing caps 10, located at the end
of channel a, b, c, and locked by O-rings (not shown on the figure)
to prevent vacuum leakage. With the vertical sublimation
purification apparatus 100 of the present invention, appropriate
vacuum condition can be achieved by extracting air through the
vacuum extraction mouth 11, which is connected to the sublimation
channel body 1.
[0040] FIG. 2A outlines the detailed structure of the
above-mentioned material rack 2. FIG. 2B is the sectional view of
FIG. 2A when dissecting along the A-A line. The material rack 2
comprises of a plurality of rails 21 and fixed rings 22, where all
rails 21 are fixed by two fixed rings 22. The material rack 2 is
located in the evaporation pipe 4 to store materials that will be
evaporated. First, the materials in the gap are placed between the
material rack 2 and the evaporation pipe 4 through the a end of the
evaporation pipe shown in FIG. 1. Then the temperature of the
heating evaporation device 3 is controlled to heat and evaporate
the materials. When the sublimated vapor has diffused into the
condensation region 91 (the upper part of the sublimation channel
body 1), it will be condensed on the walls of the channel under the
temperature control of the condensation device 5. As the thickness
of the condensed materials has reached a certain limit, temperature
can no longer be lowered to the condensation point due to the
materials' poor heat dissipation capability. Therefore it is
necessary to turn on the product scratching device 8 at a regular
time interval to scratch off the sublimated products from the
surface of the condensation region 91 and push them into the
product storage tank 92 via twisting and downward pushing
operation. A product storage tank 92 is formed below the
above-mentioned sublimation channel body 1. Without breaking the
vacuum, the product scratching operation is repeated until all the
materials stored in the material rack 2 have been evaporated. In
the end, large quantities of high purity products can be retrieved
by breaking the vacuum and opening the channel on the b end of the
sublimation channel body 1.
[0041] FIG. 3A outlines the detailed structure of the
above-mentioned product scratching device 3. FIG. 3B is the
sectional view of FIG. 3A dissecting along the A-A line. The
scratching device 8 comprises a central axis 81 for shifting
up/down or rotating the position of the scratching device 8; two
fixed rings 82; a central support 83 made by crossing two glass
plates; and sawtooth 84, located near the fixed rings 82 beneath
the central support 83, for scratching off the products condensed
on the walls of the sublimation channel body 1.
[0042] FIG. 4 illustrates a horizontal sublimation apparatus 200 of
the present invention. According to FIG. 4, the apparatus comprises
a sublimation channel body 30; a material carrier 31 located inside
the sublimation channel body 30 for storing materials that will be
evaporated; a heating evaporation device 32, including the
above-mentioned sublimation channel body 30, for controlling the
heating temperature based on different materials and realizing
evaporation; two end pipes 33 and 34, located at the two ends of
the above-mentioned sublimation channel body 30, where pipe 34
connects with the vacuum extraction system, pipe 33 is sealed; and
a pipe-end sealing device 35 for connecting the two ends of the
above-mentioned sublimation channel body 30 with the two end pipes
33 and 34 to achieve perfect sealing effect for the sublimation
channel body 30.
[0043] FIG. 5 provides decomposition diagrams for the
above-mentioned sublimation channel body 30, two end pipes 33, 34,
and pipe-end sealing device 35. When connecting the sublimation
channel body 30 with the two end pipes 33 and 34, perfect sealing
effect can be realized by combing a screw nut with an O-ring and
screwing the screw nut into the thread 36 between the two ends of
the sublimation channel body 30.
[0044] FIG. 6 outlines the above-mentioned material carrier 31.
First, place materials in the material carrier and then place the
material carrier at the center of the sublimation channel body 30,
tighten up and seal the two end pipes, extract air by connecting
pipe 34 with the vacuum system, turn off and lock the heating
evaporation device 32 and heat materials with controlled
temperature. The heated materials will diffuse into the two ends of
the sublimation channel body 30 and condense in regions with lower
temperatures. Finally, cool down the temperature and break the
vacuum after all materials have been evaporated to scratch and
collect products.
[0045] FIG. 7 outlines the vapor collection device of the present
invention. According to FIG. 7, the device compromises a collecting
bottle 41 filled with wires 42 for expanding the contacting surface
between vapor and cold temperature to increase collecting
efficiency; an inlet pipe 43, tightened up by a crew nut 45
combined with an O-ring, for connecting the vacuum sublimation
apparatus, such that uncondensed vapor can be guided into the
collecting bottle; and an exhaust pipe 44 for connecting the vacuum
extraction system. The vapor collection device 40, disposed between
the sublimation channel body and the vacuum system of the two
above-mentioned sublimation apparatuses (the vapor collection
device 40 is placed in the barrel which contains liquid nitrogen),
aims at condensing uncondensed vapor via low temperature, thus
preventing the vacuum pump from being contaminated, so that the
vacuum pump can be put to long-term use without being necessary to
clean.
[0046] The above-mentioned vapor collection device is an additional
feature that can be installed between the sublimation apparatus of
the present invention and the vacuum system if necessary. Since
protecting the vacuum system is an important issue, it is highly
recommended to install the vapor collection device which serves to
avoid the contamination of the vacuum system by the vapor
overflowed from the sublimation channel body.
[0047] Another object of the present invention is to provide a
vacuum sublimation purification process, which applies to the
above-mentioned vertical sublimation purification apparatus. The
following steps are included in the method: place materials on the
material rack; turn on the vacuum extraction device; turn on the
heating evaporation device to achieve the required sublimation
temperature of the materials; turn on all incubating devices, such
as the vapor channel and the product incubating devices, to
maintain the condensation temperature. In addition, when the
thickness of the condensed materials has reached a certain limit,
temperature can no longer be lowered to the condensation point
during the evaporation process due to their poor heat dissipation
capability. Therefore it is necessary to scratch and collected
products at a regular time interval. High purity products can be
obtained by cooling down the temperature and breaking vacuum, and
then taking out products from the product storage tank after
evaporation is completed.
[0048] Another object of the present invention is to provide a
vacuum sublimation purification process, which applies to the
above-mentioned horizontal sublimation purification apparatus. The
following steps are included in the method: place materials in the
material carrier; place the material carrier at the center of the
sublimation channel body; tighten up and seal the two end pipes;
turn on the vacuum extraction device; and turn on the heating
evaporation device to control the temperature between the center
and the two ends of the sublimation channel body. In the end, high
purity products can be obtained by cooling down the temperature and
breaking vacuum, and then scratching and collecting products after
evaporation is completed.
[0049] The following examples are used to further prove the
advantages of the present invention. They are not listed to limit
the claims of the present invention.
EXAMPLE 1
[0050] Place 250 grams of Alq.sub.3 in the evaporation region of
the vertical sublimation purification apparatus, close the sealing
cap of the pipe, extract air until vacuum degree reaches
3.2.times.10.sup.-5 mbar, heat the heating evaporation device and
maintain its temperature at 350.degree. C., maintain the
temperature of the condensation device at 260.degree. C., maintain
the temperature of the vapor channel incubating device at
330.degree. C., maintain the temperature of the product incubating
device at 120.degree. C., and turn on the product scratching device
at a regular time interval during the condensation process. When
sublimation has completed, pressure has dropped to the initial
value, and all heating evaporation and incubating devices have been
turned down, 170.5 g of products and 79.1 g of residues can be
collected after cooling, achieving 68.2% yield after
sublimation.
EXAMPLE 2
[0051] Place 200 grams of NPB in the boat shaped material carrier
of the vertical sublimation purification apparatus, place the
material carrier at the center of the sublimation channel body,
twist and tighten the two end pipes until they are sealed, extract
air by connecting the end pipe at the air extraction end with the
vacuum system until the vacuum degree reaches 4.5.times.10.sup.-6
mbar, raise the temperature of the center in the heating
evaporation device and maintain it at 330.degree. C., and maintain
the exterior temperature at 220.degree. C. After three hours of
sublimation, 147.0 g of products and 52.4 g of residues can be
retrieved, achieving 73.5% yield after sublimation.
EXAMPLE 3
[0052] Place 330 grams of CuPc in the boat shaped material carrier
of the vertical sublimation purification apparatus, place the
material carrier at the center of the sublimation channel body,
twist and tighten two end pipes until they are sealed, extract air
by connecting the end pipe at the air extraction end with the
vacuum system until vacuum degree reaches 9.2.times.10.sup.-6 mbar,
raise the temperature of the center in the heating evaporation
device and maintain it at 600.degree. C., and maintain the exterior
temperature at 500.degree. C. After sublimation, 241.8 g of
products and 84.7 g of residues can be retrieved, achieving 73.2%
yield after sublimation.
[0053] In summary, the sublimation purification apparatuses and
processes of the present invention have clear advantages compared
to the well-known ones. It provides convenient operational
processes and meets the requirement of mass production with its
improved apparatuses. In addition, the apparatus is capable of
sustaining appropriate product purity, conducting business
operations and producing large quantities of high purity
products.
[0054] Although successful implementations of the present invention
have been listed above, they are not limiting the applications of
the present invention. Anyone who is familiar with the present
invention can make modifications and improvements provided that
their actions are within the spirit and scope of the present
invention. The protected scope of the present invention is
referenced to the later attached claims.
* * * * *