U.S. patent application number 11/819198 was filed with the patent office on 2007-11-01 for semiconductor device and method for fabricating the same.
This patent application is currently assigned to MATSUSHIDA ELECTRIC INDUSTRIAL CO., LTD.. Invention is credited to Yutaka Hirose, Atsuhiko Kanda, Tomohiro Murata, Tsuyoshi Tanaka, Yasuhiro Uemoto.
Application Number | 20070254419 11/819198 |
Document ID | / |
Family ID | 34510025 |
Filed Date | 2007-11-01 |
United States Patent
Application |
20070254419 |
Kind Code |
A1 |
Kanda; Atsuhiko ; et
al. |
November 1, 2007 |
Semiconductor device and method for fabricating the same
Abstract
A semiconductor device has a first nitride semiconductor layer,
a second nitride semiconductor layer formed on the first nitride
semiconductor layer and having such a composition as to generate a
2-dimensional electron gas layer in the upper portion of the first
nitride semiconductor layer, and an electrode having an ohmic
property and formed selectively on the second nitride semiconductor
layer. The second nitride semiconductor layer includes a contact
area having at least one inclined portion with a bottom or wall
surface thereof being inclined toward the upper surface of the
first nitride semiconductor layer and defining a depressed
cross-sectional configuration. The electrode is formed on the
contact area.
Inventors: |
Kanda; Atsuhiko; (Hyogo,
JP) ; Tanaka; Tsuyoshi; (Osaka, JP) ; Uemoto;
Yasuhiro; (Shiga, JP) ; Hirose; Yutaka;
(Kyoto, JP) ; Murata; Tomohiro; (Osaka,
JP) |
Correspondence
Address: |
MCDERMOTT WILL & EMERY LLP
600 13TH STREET, NW
WASHINGTON
DC
20005-3096
US
|
Assignee: |
MATSUSHIDA ELECTRIC INDUSTRIAL CO.,
LTD.
Osaka
JP
|
Family ID: |
34510025 |
Appl. No.: |
11/819198 |
Filed: |
June 26, 2007 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
10970026 |
Oct 22, 2004 |
7247891 |
|
|
11819198 |
Jun 26, 2007 |
|
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Current U.S.
Class: |
438/172 ;
257/E21.407; 257/E21.45; 257/E27.132; 257/E29.253 |
Current CPC
Class: |
H01L 29/7787 20130101;
H01L 27/14656 20130101; H01L 29/66462 20130101; H01L 27/1463
20130101; H01L 29/2003 20130101; H01L 27/14636 20130101; H01L
27/14609 20130101 |
Class at
Publication: |
438/172 ;
257/E21.45 |
International
Class: |
H01L 21/338 20060101
H01L021/338 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 23, 2003 |
JP |
2003-363121 |
Claims
1-6. (canceled)
7. A method for fabricating a semiconductor device, the method
comprising the steps of: forming, on a first nitride semiconductor
layer, a second nitride semiconductor layer having such a
composition as to form a 2-dimensional electron gas layer in an
upper portion of the first nitride semiconductor layer; selectively
forming, in an upper portion of the second nitride semiconductor
layer, a contact area having at least one inclined portion whose
bottom or wall surface is inclined toward an upper surface of the
first nitride semiconductor layer and defining a depressed
cross-sectional configuration; and forming an electrode having an
ohmic property on the contact area.
8. The method of claim 7, wherein the step of forming the contact
area includes the steps of: forming a resist film on the second
nitride semiconductor layer and exposing a region of the resist
film for forming the contact area at a dosage to a degree that the
resist film is not exposed completely by using an interference
exposure process to form a periodic striped pattern which is
projecting and depressed in cross section in the contact area
forming region of the resist film; and performing etching with
respect to the second nitride semiconductor layer by using the
resist film formed with the periodic pattern as a mask to transfer
the periodic pattern onto the contact area of the second nitride
semiconductor layer.
9. The method of claim 7, wherein the step of forming the contact
area includes the steps of: forming a resist film on the second
nitride semiconductor layer and exposing the resist film to an
electron beam to cause a proximity effect on a region of the resist
film for forming the contact area by using an electron beam
exposure process to form a periodic striped pattern which is
projecting and depressed in cross section in the contact area
forming region of the resist film; and performing etching with
respect to the second nitride semiconductor layer by using the
resist film formed with the periodic pattern by a mask to transfer
the periodic pattern onto the contact area of the second nitride
semiconductor layer.
10. The method of claim 7, wherein the step of forming the contact
area includes the step of irradiating a region of the second
nitride semiconductor layer to be formed into the contact area with
an ion beam to form a periodic striped pattern which is projecting
and depressed in cross section in the contact area of the second
nitride semiconductor layer.
11. A semiconductor device comprising: a first nitride
semiconductor layer; a second nitride semiconductor layer formed on
the first nitride semiconductor layer, including a contact area
exposing a part of the first nitride semiconductor layer, and
having such a composition as to generate a 2-dimensional electron
gas layer in an upper portion of the first nitride semiconductor
layer; and an electrode having an ohmic property and formed on the
contact area, wherein the contact area is a stepped portion
composed of an exposed portion formed by partly lowering an upper
surface of the first nitride semiconductor layer to a level
reaching the 2-dimensional electron gas layer and an end portion
facing the exposed portion of the second nitride semiconductor
layer and the electrode is formed to cover the stepped portion.
12. The semiconductor device of claim 11, wherein an impurity
having a conductivity has been introduced into a region of the
stepped portion located in the vicinity of an interface between the
first and second nitride semiconductor layers.
13. The semiconductor device of claim 12, wherein the impurity is
silicon having an n-type conductivity.
14. The semiconductor device of claim 12, wherein the impurity is
magnesium having a p-type conductivity.
15. The semiconductor device of claim 11, wherein the electrode is
composed of one layer made of a metal selected from the group
consisting of titanium, strontium, aluminum, niobium, vanadium,
zirconium, hafnium, chromium, tungsten, molybdenum, rhodium,
rhenium, cobalt, and lanthanum, of at least two layers each made of
a metal selected from the group, of an alloy layer containing at
least two metals selected from the group, or of a conductive
compound containing at least one metal selected from the group and
oxygen, nitrogen, or boron.
16. The semiconductor device of claim 11, wherein a general formula
of a material composing the first nitride semiconductor layer is
Al.sub.xIn.sub.yGa.sub.1-x-yN (where x and y satisfy
0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, and
0.ltoreq.x+y.ltoreq.1), a general formula of a material composing
the second nitride semiconductor layer is
Al.sub.uIn.sub.yGa.sub.1-u-vN (where u and v satisfy
0.ltoreq.u.ltoreq.1, 0.ltoreq.v.ltoreq.1, and
0.ltoreq.u+v.ltoreq.1), and a composition of the second nitride
semiconductor layer and a composition of the first nitride
semiconductor layer are such that u representing an Al ratio is
larger than x representing an Al ratio and v representing an In
ratio is smaller than y representing an In ratio.
17. A semiconductor device comprising: a first nitride
semiconductor layer; a second nitride semiconductor layer formed on
the first nitride semiconductor layer, having a contact area
forming region defining a depressed cross-sectional configuration,
and having such a composition as to generate a 2-dimensional
electron gas layer in an upper portion of the first nitride
semiconductor layer; and an electrode having an ohmic property and
formed selectively on the second nitride semiconductor layer,
wherein the second nitride semiconductor layer includes a contact
area composed of a third nitride semiconductor layer containing a
first impurity having a conductivity and buried in the contact area
forming region and the electrode is formed on the contact area.
18. The semiconductor device of claim 17, wherein a second impurity
having the same conductivity as the first impurity has been
introduced into a bottom portion of the contact area forming region
of the second nitride semiconductor layer.
19. The semiconductor device of claim 18, wherein each of the first
and second impurities is silicon.
20. The semiconductor device of claim 18, wherein each of the first
and second impurities is magnesium.
21. The semiconductor device of claim 17, wherein the electrode is
composed of one layer made of a metal selected from the group
consisting of titanium, strontium, aluminum, niobium, vanadium,
zirconium, hafnium, chromium, tungsten, molybdenum, rhodium,
rhenium, cobalt, and lanthanum, of at least two layers each made of
a metal selected from the group, of an alloy layer containing at
least two metals selected from the group, or of a conductive
compound containing at least one metal selected from the group and
oxygen, nitrogen, or boron.
22. The semiconductor device of claim 17, wherein a general formula
of a material composing the first nitride semiconductor layer is
Al.sub.xIn.sub.yGa.sub.1-x-yN (where x and y satisfy
0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, and
0.ltoreq.x+y.ltoreq.1), a general formula of a material composing
the second nitride semiconductor layer is
Al.sub.uIn.sub.vGa.sub.1-u-vN (where u and v satisfy
0.ltoreq.u.ltoreq.1, 0.ltoreq.v.ltoreq.1, and
0.ltoreq.u+v.ltoreq.1), and a composition of the second
nitride-semiconductor layer and a composition of the first nitride
semiconductor layer are such that u representing an Al ratio is
larger than x representing an Al ratio and v representing an In
ratio is smaller than y representing an In ratio.
23. A method for fabricating a semiconductor device, the method
comprising the steps of: forming, on a first nitride semiconductor
layer, a second nitride semiconductor layer having such a
composition as to form a 2-dimensional electron gas layer in an
upper portion of the first nitride semiconductor layer; selectively
forming a contact area forming region defining a depressed
cross-sectional configuration in an upper portion of the second
nitride semiconductor layer; forming and burying a third nitride
semiconductor layer in the contact area forming region of the
second nitride semiconductor layer, while introducing a first
impurity having a conductivity therein, to form a contact area
composed of the third nitride semiconductor layer in the contact
area forming region; and forming an electrode having an ohmic
property on the contact area.
24. The method of claim 23, further comprising, prior to forming
the contact area, the step of: introducing a second impurity having
the same conductivity as the first impurity into a bottom portion
of the contact area forming region of the second nitride
semiconductor layer.
25-27. (canceled)
28. A method for fabricating a semiconductor device, the method
comprising the steps of: forming, on a first nitride semiconductor
layer, a second nitride semiconductor layer having such a
composition as to form a 2-dimensional electron gas layer in an
upper portion of the first nitride semiconductor layer; selectively
forming a contact area defining a depressed cross-sectional
configuration in an upper portion of the second nitride
semiconductor layer; forming an insulating film on the second
nitride semiconductor layer to cover an entire surface thereof
including the contact area; performing an etch-back process with
respect to the formed insulating film to form a sidewall composed
of the insulating film on an inner wall surface of the contact
area; introducing an impurity having a conductivity into a bottom
portion of the contact area of the second nitride semiconductor
layer; and forming an electrode having an ohmic property such that
an inner side of the contact area including the sidewall is covered
therewith.
29-32. (canceled)
33. A semiconductor device comprising: a semiconductor layer having
a carrier concentration that varies along a direction of depth; and
an electrode having an ohmic property and formed selectively on the
semiconductor layer, wherein the semiconductor layer has a contact
area formed by partly removing an upper portion thereof and the
electrode is formed in the contact area.
34. The semiconductor device of claim 33, wherein the contact area
has a lowermost portion thereof positioned at a distance of not
less than 1 nm and not more than 50 nm from a peak position of the
carrier concentration in the semiconductor layer located
therebelow.
35. The semiconductor device of claim 33, wherein the contact area
has a lowermost portion thereof disposed at a position coincident
with a peak position of the carrier concentration in the
semiconductor layer.
36. The semiconductor device of claim 35, wherein the electrode
contains platinum or palladium.
37. The semiconductor device of claim 33, wherein the semiconductor
layer is made of a group III-V nitride semiconductor represented by
a general formula Al.sub.xIn.sub.yGa.sub.1-x-yN (where x and y
satisfy 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, and
0.ltoreq.x+y.ltoreq.1).
38. The semiconductor device of claim 37, wherein the electrode
contains platinum or palladium.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims priority under 35 U.S.C. .sctn.119
on Patent Application No. 2003-363121 filed in Japan on Oct. 23,
2004, the entire contents of which are hereby incorporated by
reference.
BACKGROUND OF THE INVENTION
[0002] The present invention relates to a semiconductor device
composed of a group III-V nitride semiconductor and, more
particularly, to a semiconductor device having an ohmic electrode
formed on a group III-V nitride semiconductor layer and to a method
for fabricating the same.
[0003] Studies have been made on the application of a group III-V
nitride semiconductor, i.e., a mixed crystal compound semiconductor
represented by the general formula Al.sub.xIn.sub.yGa.sub.1-x-y
(where x and y satisfy 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1,
and 0.ltoreq.x+y.ltoreq.1) not only to an optical device using a
wide band gap and a direct transition band structure, which
physically characterize the mixed crystal compound semiconductor,
but also to an electronic device using a high breakdown electric
field and a high saturation electron velocity, which also
characterize the mixed crystal compound semiconductor. In
particular, a hetero-junction field effect transistor (hereinafter
referred to as HFET) using a 2-dimensional electron gas
(hereinafter referred to as 2DEG) appearing at the interface
between an Al.sub.xGa.sub.1-xN layer (where 0<x.ltoreq.1 is
satisfied) and a GaN layer, each epitaxially grown on a
semi-insulating substrate, as well as a hetero-junction bipolar
transistor (hereinafter referred to as HBT) have been developed
progressively as high-output RF devices.
[0004] In the HFET, an electron density is over 10.sup.13 cm.sup.-2
due to electrons supplied from a carrier supply layer made of,
e.g., AlGaN and serving also as an n-type barrier layer and to
charges resulting from a polarization effect (spontaneous
polarization, i.e., piezo polarization). The electron density is
higher than that in a HFET made of an AlGaAs-based compound
semiconductor by about one order of magnitude.
[0005] In addition, a group III-V nitride semiconductor such as
gallium nitride (GaN) features a high breakdown voltage
characteristic due to its relatively large band gap energy of 3.4
eV. Because such electric characteristics as a high breakdown
voltage and a high current density can be expected, studies have
been made on the application of electronic devices using group
III-V nitride semiconductors typically represented by the HFET and
HBT as ultra-high-speed and large-output devices in smaller
sizes.
[0006] Although the electronic devices using group III-V nitride
semiconductors are thus promising as ultra-high-speed devices and
large-output devices, various improvements and modification should
be made to realize ultra-high-speed and large-output devices by
using such nitride semiconductors.
[0007] As a first problem to be solved to realize an
ultra-high-speed and large-output device using a group III-V
nitride semiconductor, a reduction in contact resistance can be
listed.
[0008] A description will be given herein below to a conventional
GaN semiconductor device (HFET) using a group III-V nitride
semiconductor with reference to FIG. 16 (see, e.g., Japanese
Laid-Open Patent Publication No. 2003-59946).
[0009] As shown in FIG. 16, a GaN semiconductor device A has a
first semiconductor layer 3 made of undoped GaN and formed on a
substrate 1 with a buffer layer 2 interposed therebetween and a
second semiconductor layer 4 made of undoped AlGaN which is larger
in band gap energy than the first semiconductor layer 3 and formed
on the first semiconductor layer 3. Consequently, a 2DEG layer 6 is
formed in the region of the first semiconductor layer 3 located in
the vicinity of the interface with the second semiconductor layer
4.
[0010] A Schottky gate electrode G is formed on the second
semiconductor layer 4. The upper portions of the regions of the
second semiconductor layer 4 located on both sides of the gate
electrode G are partly removed such that two contact areas 4A are
formed. A source electrode S and a drain electrode D, each of which
is an ohmic electrode, are formed on the respective contact areas
4A. The exposed surface of the second semiconductor layer 4 is
covered with an insulating film 7.
[0011] Thus, the conventional GaN semiconductor device A forms the
contact areas 4A as regions to be formed with the ohmic electrodes
by partly removing the upper portions of the second semiconductor
layer 4 for generating the 2DEG layer 6 in the first semiconductor
layer 3 and thereby reduces the distance between the 2DEG layer 6
and each of the ohmic electrodes S and D such that the contact
resistance between the first semiconductor layer 3 and each of the
ohmic electrodes S and D is reduced.
[0012] However, the conventional GaN semiconductor device mentioned
above has the problems of a damage to the second semiconductor
layer 4 caused by etching during the formation of the contact areas
4A and a reduction in the concentration of an electron gas in the
2DEG layer 6 caused by the etching damage to the second
semiconductor layer 4.
[0013] Although the surface of the second semiconductor layer 4,
especially the surface portions thereof located on both sides of
the gate electrode G are covered with the insulating film 7, a
leakage current (gate leakage) easily flows between the gate
electrode G and the second semiconductor layer 4 under the
influence of a surface level resulting from the exposure of the end
faces. As a result, the electric characteristics (operating
characteristics) of the device deteriorate even though the contact
resistance is reduced.
[0014] There is also the problem that it is difficult to determine
the end point of etching for forming the contact areas 4A having a
depressed configuration.
SUMMARY OF THE INVENTION
[0015] It is therefore an object of the present invention to solve
the foregoing conventional problems and improve the operating
characteristics of a device, while reducing the contact resistance
of an ohmic electrode provided on a group III-V nitride
semiconductor.
[0016] As a result of making various studies for a reduction in the
contact resistance of the ohmic electrode provided on the group
III-V nitride semiconductor, the present inventors have made the
following finding. That is, the mere lowering of the level of the
upper surface of the second semiconductor layer 4 in parallel
relation to the upper surface of the first semiconductor layer 3
reduces the series resistance component of an ohmic contact but
also reduces the concentration of an electron gas in the 2DEG layer
6 disadvantageously. Thus, a reduction in contact resistance and an
increase in the concentration of the electron gas have a trade-off
relationship therebetween.
[0017] Based on the finding, a first semiconductor device according
to the present invention is constructed as a semiconductor device
having a first semiconductor layer and a second semiconductor layer
formed on the first semiconductor layer to generate a 2DEG layer in
the upper portion of the first semiconductor layer, wherein the
second semiconductor layer is formed with an ohmic contact area
having at least one part thereof inclined toward the upper surface
of the first semiconductor layer to define a depressed
cross-sectional configuration.
[0018] A second semiconductor device according to the present
invention is constructed such that a first semiconductor layer is
formed with an ohmic contact area in direct contact with a 2DEG
layer formed in the first semiconductor layer.
[0019] A third semiconductor device according to the present
invention is constructed such that a third semiconductor layer
containing an impurity is buried in the region of a second
semiconductor layer located under an ohmic contact area.
[0020] A fourth semiconductor device according to the present
invention is constructed such that the portion of a second
semiconductor layer to be formed with an ohmic contact area is
selectively removed, an impurity is introduced into the bottom
portion of a depressed portion resulting from the selective
removal, and the inner wall of the depressed portion is covered
with an insulating film.
[0021] A fifth semiconductor device according to the present
invention is constructed such that even a structure obtained by
providing a third semiconductor layer serving as a so-called cap
layer on a second semiconductor layer is provided with the
structure of the first semiconductor device according to the
present invention, i.e., with a structure in which a third
semiconductor layer is formed with an ohmic contact area having at
least one part thereof inclined toward the upper surface of a
second semiconductor layer to define a depressed cross-sectional
configuration.
[0022] A sixth semiconductor device according to the present
invention is aimed at a laser device or HBT made of, e.g., a group
III-V nitride semiconductor and not having a 2DEG layer which is
constructed such that the upper surface of an ohmic contact area is
selectively lowered to a level coincident with or in the vicinity
of the peak position of a carrier concentration in a semiconductor
layer containing carriers.
[0023] Specifically, a first semiconductor device according to the
present invention comprises: a first nitride semiconductor layer; a
second nitride semiconductor layer formed on the first nitride
semiconductor layer and having such a composition as to generate a
2-dimensional electron gas (2DEG) layer in an upper portion of the
first nitride semiconductor layer; and an electrode having an ohmic
property and formed selectively on the second nitride semiconductor
layer, wherein the second nitride semiconductor layer includes a
contact area having at least one inclined portion whose bottom or
wall surface is inclined toward an upper surface of the first
nitride semiconductor layer and defining a depressed
cross-sectional configuration and the electrode is formed on the
contact area.
[0024] In the first semiconductor device, the distance between the
lowermost portion of the contact area and the 2DEG layer linearly
changes. Consequently, the contact area having the inclined portion
has at least one optimum region where the contact resistance is
reduced and the concentration of an electron gas has a sufficient
value. This allows improvements in the operating characteristics of
the device, while achieving a reduction in the contact resistance
of the ohmic electrode. As a result, it becomes possible to
implement a higher-speed and higher-output semiconductor device
using a group III-V nitride semiconductor.
[0025] In the first semiconductor device, a lowermost portion of
the contact area is preferably positioned at a distance of not less
than 1 nm and not more than 1 .mu.m from the 2-dimensional electron
gas layer.
[0026] In the first semiconductor device, a bottom portion of the
contact area is preferably formed with a striped pattern which is
projecting and depressed in cross section with a periodicity of 1
nm to 1 .mu.m. In the arrangement, the contact area has a plurality
of optimum regions where the contact resistance is reduced and the
concentration of the electron gas has a sufficient value so that
the contact resistance of the ohmic electrode is further
reduced.
[0027] In the first semiconductor device, the electrode is
preferably formed to cover at least one of the bottom surface and
the wall surface of the contact area. In the arrangement, a leakage
current flowing via a surface level developed at the wall surface
is absorbed by the ohmic electrode so that the operating
characteristics are improved.
[0028] A first method for fabricating a semiconductor device
according to the present invention comprises the steps of: forming,
on a first nitride semiconductor layer, a second nitride
semiconductor layer having such a composition as to form a
2-dimensional electron gas layer in an upper portion of the first
nitride semiconductor layer; selectively forming, in an upper
portion of the second nitride semiconductor layer, a contact area
having at least one inclined portion whose bottom or wall surface
is inclined toward an upper surface of the first nitride
semiconductor layer and defining a depressed cross-sectional
configuration; and forming an electrode having an ohmic property on
the contact area.
[0029] According to the first method for fabricating a
semiconductor device, the effects achieved by the first
semiconductor device are obtainable. In addition, due to the
inclined bottom portion of the contact area, if the contact area is
formed by etching, an optimum region where the contact resistance
is reduced and the concentration of an electron gas has a
sufficient value necessarily exists even though the end point of
the etching slightly shifts upward or downward. This prevents the
characteristics of the device from being adversely affected.
[0030] In the first method for fabricating a semiconductor device,
the step of forming the contact area preferably includes the steps
of: forming a resist film on the second nitride semiconductor layer
and exposing a region of the resist film for forming the contact
area at a dosage to a degree that the resist film is not exposed
completely by using an interference exposure process to form a
periodic striped pattern which is projecting and depressed in cross
section in the contact area forming region of the resist film; and
performing etching with respect to the second nitride semiconductor
layer by using the resist film formed with the periodic pattern as
a mask to transfer the periodic pattern onto the contact area of
the second nitride semiconductor layer.
[0031] The arrangement ensures the formation of the periodic
striped pattern which is projecting and depressed in cross section
in the contact area of the second nitride semiconductor layer.
[0032] In the first method for fabricating a semiconductor device,
the step of forming the contact area preferably includes the steps
of: forming a resist film on the second nitride semiconductor layer
and exposing the resist film to an electron beam to cause a
proximity effect on a region of the resist film for forming the
contact area by using an electron beam exposure process to form a
periodic striped pattern which is projecting and depressed in cross
section in the contact area forming region of the resist film; and
performing etching with respect to the second nitride semiconductor
layer by using the resist film formed with the periodic pattern by
a mask to transfer the periodic pattern onto the contact area of
the second nitride semiconductor layer.
[0033] The arrangement ensures the formation of the periodic
striped pattern which is projecting and depressed in cross section
in the contact area of the second nitride semiconductor layer.
[0034] In the first method for fabricating a semiconductor device,
the step of forming the contact area preferably includes the step
of irradiating a region of the second nitride semiconductor layer
to be formed into the contact area with an ion beam to form a
periodic striped pattern which is projecting and depressed in cross
section in the contact area of the second nitride semiconductor
layer.
[0035] The arrangement ensures the formation of the periodic
striped pattern which is projecting and depressed in cross section
in the contact area of the second nitride semiconductor layer.
[0036] A second semiconductor device according to the present
invention comprises: a first nitride semiconductor layer; a second
nitride semiconductor layer formed on the first nitride
semiconductor layer, including a contact area exposing a part of
the first nitride semiconductor layer, and having such a
composition as to generate a 2-dimensional electron gas (2DEG)
layer in an upper portion of the first nitride semiconductor layer;
and an electrode having an ohmic property and formed on the contact
area, wherein the contact area is a stepped portion composed of an
exposed portion formed by partly lowering an upper surface of the
first nitride semiconductor layer to a level reaching the
2-dimensional electron gas layer and an end portion facing the
exposed portion of the second nitride semiconductor layer and the
electrode is formed to cover the stepped portion.
[0037] In the second semiconductor device, the contact area has
been formed into the stepped portion and the ohmic electrode has
been formed to cover the stepped portion so that the electrode is
allowed to be in direct contact with the 2DEG layer. This not only
reduces the contact resistance of the ohmic electrode but also
reduces a channel resistance and thereby allows significant
improvements in the operating characteristics of the device.
[0038] In the second semiconductor device, an impurity having a
conductivity has preferably been introduced into a region of the
stepped portion located in the vicinity of an interface between the
first and second nitride semiconductor layers. In the arrangement,
a potential barrier at the interface between the first and second
nitride semiconductor layers is reduced so that the contact
resistance of the ohmic electrode is further reduced.
[0039] In this case, silicon may be used as an n-type impurity and
magnesium may be used as a p-type impurity.
[0040] A third semiconductor device according to the present
invention comprises: a first nitride semiconductor layer; a second
nitride semiconductor layer formed on the first nitride
semiconductor layer, having a contact area forming region defining
a depressed cross-sectional configuration, and having such a
composition as to generate a 2-dimensional electron gas layer in an
upper portion of the first nitride semiconductor layer; and an
electrode having an ohmic property and formed selectively on the
second nitride semiconductor layer, wherein the second nitride
semiconductor layer includes a contact area composed of a third
nitride semiconductor layer containing a first impurity having a
conductivity and buried in the contact area forming region and the
electrode is formed on the contact area.
[0041] In the third semiconductor device, the potential barrier
between the electrode and the second nitride semiconductor layer
can be reduced by providing the third nitride semiconductor layer
containing the first impurity. This achieves a reduction in the
contact resistance of the ohmic electrode without reducing the
concentration of an electron gas in the 2DEG layer and allows
improvements in the operating characteristics of the device.
[0042] In this case, a second impurity having the same conductivity
as the first impurity has preferably been introduced into a bottom
portion of the contact area forming region of the second nitride
semiconductor layer. In the arrangement, a potential barrier in the
region of the second nitride semiconductor layer in the vicinity of
the interface with the third nitride semiconductor layer can also
be reduced so that the contact resistance of the ohmic electrode is
further reduced.
[0043] In this case, silicon may be used as the first and second
impurities and magnesium may be used as the first and second
impurities.
[0044] A third method for fabricating a semiconductor device
according to the present invention comprises the steps of: forming,
on a first nitride semiconductor layer, a second nitride
semiconductor layer having such a composition as to form a
2-dimensional electron gas layer in an upper portion of the first
nitride semiconductor layer; selectively forming a contact area
forming region defining a depressed cross-sectional configuration
in an upper portion of the second nitride semiconductor layer;
forming and burying a third nitride semiconductor layer in the
contact area forming region of the second nitride semiconductor
layer, while introducing a first impurity having a conductivity
therein, to form a contact area composed of the third nitride
semiconductor layer in the contact area forming region; and forming
an electrode having an ohmic property on the contact area.
[0045] Preferably, the third method for fabricating a semiconductor
device further comprises, prior to forming the contact area, the
step of: introducing a second impurity having the same conductivity
as the first impurity into a bottom portion of the contact area
forming region of the second nitride semiconductor layer.
[0046] A fourth semiconductor device according to the present
invention comprises: a first nitride semiconductor layer; a second
nitride semiconductor layer formed on the first nitride
semiconductor layer and having such a composition as to generate a
2-dimensional electron gas layer in an upper portion of the first
nitride semiconductor layer; and an electrode having an ohmic
property and formed selectively on the second nitride semiconductor
layer, wherein the second nitride semiconductor layer has a contact
area defining a depressed cross-sectional configuration, the
contact area has a bottom portion containing an impurity having a
conductivity introduced therein and a sidewall composed of an
insulating film on an inner wall surface thereof, and the electrode
is formed to cover an inner side of the contact area including the
sidewall.
[0047] In the fourth semiconductor device, the sidewall composed of
the insulating film can suppress a leakage current caused in the
wall surface by the damage undergone by the wall surface during the
processing of the contact area defining a depressed cross-sectional
configuration. This allows improvements in the operating
characteristics of the device, while achieving a reduction in the
contact resistance of the ohmic electrode.
[0048] A fourth method for fabricating a semiconductor device
according to the present invention comprises the steps of: forming,
on a first nitride semiconductor layer, a second nitride
semiconductor layer having such a composition as to form a
2-dimensional electron gas layer in an upper portion of the first
nitride semiconductor layer; selectively forming a contact area
defining a depressed cross-sectional configuration in an upper
portion of the second nitride semiconductor layer; forming an
insulating film on the second nitride semiconductor layer to cover
an entire surface thereof including the contact area; performing an
etch-back process with respect to the formed insulating film to
form a sidewall composed of the insulating film on an inner wall
surface of the contact area; introducing an impurity having a
conductivity into a bottom portion of the contact area of the
second nitride semiconductor layer; and forming an electrode having
an ohmic property such that an inner side of the contact area
including the sidewall is covered therewith.
[0049] A fifth semiconductor device according to the present
invention comprises: a first nitride semiconductor layer; a second
nitride semiconductor layer formed on the first nitride
semiconductor layer and having such a composition as to generate a
2-dimensional electron gas layer in an upper portion of the first
nitride semiconductor layer; a third nitride semiconductor layer
formed on the second nitride semiconductor layer and smaller in
band gap energy than the second nitride semiconductor layer; and an
electrode having an ohmic property and formed selectively on the
third nitride semiconductor layer, wherein the third nitride
semiconductor layer includes a contact area having at least one
inclined portion whose bottom or wall surface is inclined toward an
upper surface of the second nitride semiconductor layer and
defining a depressed cross-sectional configuration and the
electrode is formed on the contact area.
[0050] In each of the first to fifth semiconductor devices, for the
electrode having an ohmic property, there may be used one layer
made of a metal selected from the group consisting of titanium,
strontium, aluminum, niobium, vanadium, zirconium, hafnium,
chromium, tungsten, molybdenum, rhodium, rhenium, cobalt, and
lanthanum, at least two layers each made of a metal selected from
the group, an alloy layer containing at least two metals selected
from the group, or a conductive compound containing at least one
metal selected from the group and oxygen, nitrogen, or boron.
[0051] In each of the first to fourth semiconductor devices, a
general formula of a material composing the first nitride
semiconductor layer is Al.sub.xIn.sub.yGa.sub.1-x-yN (where x and y
satisfy 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, and
0.ltoreq.x+y.ltoreq.1), a general formula of a material composing
the second nitride semiconductor layer is
Al.sub.uIn.sub.vGa.sub.1-u-vN (where u and v satisfy
0.ltoreq.u.ltoreq.1, 0.ltoreq.v.ltoreq.1, and
0.ltoreq.u+v.ltoreq.1), and a composition of the second nitride
semiconductor layer and a composition of the first nitride
semiconductor layer are preferably such that u representing an Al
ratio is larger than x representing an Al ratio and v representing
an In ratio is smaller than y representing an In ratio.
[0052] In the fifth semiconductor device, a general formula of a
material composing the first nitride semiconductor layer is
Al.sub.xIn.sub.yGa.sub.1-x-yN (where x and y satisfy
0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, and
0.ltoreq.x+y.ltoreq.1), a general formula of a material composing
the second nitride semiconductor layer is
Al.sub.uIn.sub.vGa.sub.1-u-vN (where u and v satisfy
0.ltoreq.u.ltoreq.1, 0.ltoreq.v.ltoreq.1, and
0.ltoreq.u+v.ltoreq.1), a general formula of a material composing
the third nitride semiconductor layer is
Al.sub.lIn.sub.mGa.sub.1-l-mN (where l and m satisfy
0.ltoreq.l.ltoreq.1, 0.ltoreq.m.ltoreq.1, and
0.ltoreq.l+m.ltoreq.1), a composition of the second nitride
semiconductor layer and a composition of the first nitride
semiconductor layer are preferably such that u representing an Al
ratio is larger than x representing an Al ratio and v representing
an In ratio is smaller than y representing an In ratio, and a
composition of the third nitride semiconductor layer and the
composition of the second nitride semiconductor layer are
preferably such that 1 representing an Al ratio is smaller than u
representing the Al ratio and m representing an In ratio is larger
than v representing the In ratio.
[0053] A sixth semiconductor device according to the present
invention comprises: a semiconductor layer having a carrier
concentration that varies along a direction of depth; and an
electrode having an ohmic property and formed selectively on the
semiconductor layer, wherein the semiconductor layer has a contact
area formed by partly removing an upper portion thereof and the
electrode is formed in the contact area.
[0054] In the sixth semiconductor device, the contact resistance
between the electrode and the semiconductor layer can be reduced
and the operating characteristics of the device can be
improved.
[0055] In the sixth semiconductor device, the contact area
preferably has a lowermost portion thereof positioned at a distance
of not less than 1 nm and not more than 50 nm from a peak position
of the carrier concentration in the semiconductor layer located
therebelow.
[0056] In the sixth semiconductor device, the contact area
preferably has a lowermost portion thereof disposed at a position
coincident with a peak position of the carrier concentration in the
semiconductor layer.
[0057] In the sixth semiconductor device, the semiconductor layer
is preferably made of a group III-V nitride semiconductor
represented by a general formula Al.sub.xIn.sub.yGa.sub.1-x-yN
(where x and y satisfy 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1,
and 0.ltoreq.x+y.ltoreq.1).
[0058] In the sixth semiconductor device, the electrode having an
ohmic property preferably contains platinum or palladium.
BRIEF DESCRIPTION OF THE DRAWINGS
[0059] FIG. 1 is a structural cross-sectional view showing a
semiconductor device according to a first embodiment of the present
invention;
[0060] FIGS. 2A to 2C are structural cross-sectional views
illustrating the semiconductor device according to the first
embodiment in the individual process steps of a fabrication method
therefor;
[0061] FIGS. 3A to 3E are cross-sectional views each showing a
structural example of each of ohmic electrodes in the semiconductor
device according to the first embodiment;
[0062] FIG. 4 is a structural cross-sectional view showing a
semiconductor device according to a second embodiment of the
present invention;
[0063] FIGS. 5A to 5C are structural cross-sectional views
illustrating the semiconductor device according to the second
embodiment in the individual process steps of a fabrication method
therefor;
[0064] FIG. 6 is a structural cross-sectional view showing a
semiconductor device according to a third embodiment of the present
invention;
[0065] FIGS. 7A to 7C are structural cross-sectional views
illustrating the semiconductor device according to the third
embodiment in the individual process steps of a fabrication method
therefor;
[0066] FIG. 8 is a structural cross-sectional view showing a
semiconductor device according to a fourth embodiment of the
present invention;
[0067] FIGS. 9A to 9D are structural cross-sectional views
illustrating the semiconductor device according to the fourth
embodiment in the individual process steps of a fabrication method
therefor;
[0068] FIG. 10 is a structural cross-sectional view showing a
semiconductor device according to a fifth embodiment of the present
invention;
[0069] FIGS. 11A to 11D are structural cross-sectional views
illustrating the semiconductor device according to the fifth
embodiment in the individual process steps of a fabrication method
therefor;
[0070] FIG. 12A is a structural cross-sectional view showing a
semiconductor device according to a sixth embodiment of the present
invention;
[0071] FIG. 12B is a structural cross-sectional view showing a
semiconductor device according to a first variation of the sixth
embodiment of the present invention;
[0072] FIG. 12C is a structural cross-sectional view showing a
semiconductor device according to a second variation of the sixth
embodiment of the present invention;
[0073] FIG. 13A is a perspective view showing a semiconductor
device according to a seventh embodiment of the present
invention;
[0074] FIG. 13B is a pre-processing structural cross-sectional view
of a p-type contact layer in the semiconductor device according to
the seventh embodiment;
[0075] FIG. 13C is a post-processing structural cross-sectional
view of the p-type contact layer in the semiconductor device
according to the seventh embodiment;
[0076] FIG. 14A is a structural cross-sectional view showing a
semiconductor device according to an eighth embodiment of the
present invention;
[0077] FIG. 14B is a pre-processing structural cross-sectional view
of a base layer in the semiconductor device according to the eighth
embodiment;
[0078] FIG. 14C is a post-processing structural cross-sectional
view of the base layer in the semiconductor device according to the
eighth embodiment;
[0079] FIGS. 15A to 15D are structural cross-sectional views
illustrating the semiconductor device according to the eighth
embodiment in the individual process steps of a fabrication method
therefor; and
[0080] FIG. 16 is a structural cross-sectional view showing a
conventional semiconductor device (HFET).
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Embodiment 1
[0081] A first embodiment of the present invention will be
described with reference to the drawings.
[0082] FIG. 1 shows a cross-sectional structure of a HFET as a
semiconductor device according to the first embodiment. As shown in
FIG. 1, a buffer layer 12 made of aluminum nitride (AlN) or gallium
nitride (GaN) with a thickness of about 1 .mu.m, a first nitride
semiconductor layer 13 made of gallium nitride (GaN) with a
thickness of about 1 .mu.m and a low concentration of n-type
carriers, i.e., i (intrinsic)-type gallium nitride, and a second
nitride semiconductor layer 14 made of i-type aluminum gallium
nitride (Al.sub.0.26Ga.sub.0.74N) with a thickness of about 25 nm
are formed successively on a substrate 11 made of silicon carbide
(SiC).
[0083] Since Al.sub.0.26Ga.sub.0.74N composing the second nitride
semiconductor layer 14 is larger in electron band gap energy than
GaN composing the first nitride semiconductor layer 13, a 2DEG
layer 13a is formed in the region of the first nitride
semiconductor layer 13 located in the vicinity of the interface
with the second nitride semiconductor layer 14, more specifically
at a depth of about 10 nm from the interface.
[0084] A gate electrode 15 composed of a multilayer film made of,
e.g., nickel (Ni) and gold (Au) is formed on the second nitride
semiconductor layer 14 in Schottky contact therewith. The regions
of the second nitride semiconductor layer 14 located on both sides
of the gate electrode 15 have been formed into contact areas 14a
each having an inclined portion with a bottom surface (upper
surface) thereof being inclined outwardly toward the upper surface
of the first nitride semiconductor layer 13 and defining a
depressed cross-sectional configuration. On the respective contact
areas 14a, ohmic source and drain electrode 16 and 17 (having an
ohmic property) each composed of a multilayer film made of, e.g.,
titanium (Ti) and aluminum (Al) are formed to cover the respective
bottom and wall surfaces of the contact areas 14a.
[0085] Preferably, the second nitride semiconductor layer 14 has a
thickness of about 2 nm to 1 .mu.m.
[0086] Preferably, the lowermost portion of each of the contact
areas 14a is positioned at a distance of not less than 1 nm from
the 2 DEG layer 13a. When the thickness of the second nitride
semiconductor layer 14 is over 1 .mu.m, the lowermost portion of
each of the contact areas 14a is positioned at a distance of not
more than 1 .mu.m from the 2 DEG layer 13a.
[0087] Thus, according to the first embodiment, the second nitride
semiconductor layer 14 which generates the 2DEG layer 13a in the
upper portion of the first nitride semiconductor layer 13 has the
contact areas 14a each having the inclined portion with the bottom
surface thereof being inclined toward the upper surface of the
first nitride semiconductor layer 13 and defining a depressed
cross-sectional configuration so that the distance between the
lowermost portion of each of the contact areas 14a and the 2DEG
layer 13a changes linearly. It follows therefore that each of the
contact areas 14a having the inclined bottom portions has at least
one optimum region where the contact resistance is reduced and the
concentration of an electron gas has a sufficient value. As a
result, it becomes possible to improve the operating
characteristics of the device with the 2DEG layer 13a having a
sufficient electron gas concentration, while reducing the contact
resistance of each of the ohmic source and drain electrodes 16 and
17.
[0088] A description will be given herein below to a method for
fabricating the HFET thus constructed with reference to the
drawings. FIGS. 2A to 2C show the cross-sectional structures of the
HFET according to the first embodiment in the individual process
steps of the fabrication method.
[0089] First, as shown in FIG. 2A, the buffer layer 12 made of
aluminum nitride or gallium nitride, the first nitride
semiconductor layer 13 made of i-type gallium nitride, and the
second nitride semiconductor layer 14 made of i-type aluminum
gallium nitride (Al.sub.0.26Ga.sub.0.74N) are grown successively on
the substrate 11 made of silicon carbide by, e.g., metalorganic
chemical vapor deposition (MOCVD). The method for depositing each
of the nitride semiconductor layers is not limited to MOCVD.
Instead of MOCVD, it is also possible to use molecular beam epitaxy
(MBE).
[0090] Next, as shown in FIG. 2B, the contact areas 14a each having
the inclined portion with the bottom surface thereof being inclined
toward the upper surface of the first nitride semiconductor layer
13 and defining a depressed cross-sectional configuration are
formed in mutually spaced apart relation by lithography and dry
etching using a chlorine gas which are performed by using, as a
mask, a first resist pattern (not shown) having openings
corresponding to the contact area forming regions. To form the
contact areas 14a with the inclined portions having the inclined
bottom surfaces, the openings (depressed portions) of the resist
pattern are formed with portions inclined in the direction of
depth. Specifically, the resist pattern is formed with the portions
inclined in the direction of depth by performing pattern exposure
at an over dose or by performing an additional thermal process
after normal patterning.
[0091] Next, as shown in FIG. 2C, the first resist pattern is
removed by ashing or the like and then a second resist pattern (not
shown) having openings for exposing the contact areas 14a is formed
by lithography on the second nitride semiconductor layer 14. On the
second resist pattern formed, an electrode forming film composed of
a multilayer film made of titanium and aluminum is deposited by,
e.g., electron beam vapor deposition. Then, the ohmic source and
drain electrodes 16 and 17 composed of the electrode forming film
are formed on the respective contact areas 14a by a so-called
lift-off process for removing the unwanted portion of the deposited
electrode forming film together with the second resist pattern.
Subsequently, a third resist pattern (not shown) having an opening
for exposing a region to be formed with a gate electrode between
the source and drain electrodes 16 and 17 is formed and a gate
electrode forming film made of nickel and gold is deposited by,
e.g., electron beam vapor deposition. By further performing a
lift-off process, the gate electrode 15 is formed from the gate
electrode forming film. It is to be noted that the order in which
the source and drain electrodes 16 and 17 and the gate electrode 15
are formed is insignificant.
[0092] In the first embodiment, each of the contact areas 14a has a
cross section configured as an inverted right angle triangle which
is inclined more deeply with distance from the corresponding one of
the side surfaces of the gate electrode 15 and the source and drain
electrodes 16 and 17 are formed to cover the respective inclined
portions and inner wall surfaces of the contact areas 14a and have
the end portions thereof reaching the upper surface of the second
nitride semiconductor layer 14. As a result, the respective wall
surfaces of the contact areas 14a which are substantially
perpendicular to the substrate surface are positioned externally of
the gate electrode 15 so that a leakage current resulting from a
surface level which easily occurs at the wall surface of the second
nitride semiconductor layer 14 is suppressed. Since the source and
drain electrodes 16 and 17 are completely covering the respective
bottom surfaces (inclined portions) and wall surfaces of the
contact areas 14a, portions damaged by etching during the formation
of the contact areas 14a are not exposed so that the operating
characteristics of the transistor are prevented from being
adversely affected by the etching damage.
[0093] A description will be given herein below to other structural
examples of the cross-sectional configuration of each of the
contact areas 14a for forming ohmic electrodes provided in the
second nitride semiconductor layer 14 and the configuration of each
of the ohmic electrodes with respect to FIGS. 3A to 3E.
[0094] Although each of the structural examples does not satisfy
the two conditions requiring the provision of the respective wall
surfaces of the contact areas 14a which are substantially
perpendicular to the substrate surface on the opposite sides of the
gate electrode 15 and the complete coverage of the respective inner
surfaces of the contact areas 14a with the electrodes, each of the
contact areas 14a is formed with a region close to the 2DEG layer
and a region far away therefrom in the direction of depth because
the bottom surface of each of the contact areas 14a is inclined
relative to the upper surface of the first nitride semiconductor
layer 13. This achieves the effect of providing at least one
optimum region where the contact resistance of each of the source
and drain electrodes 16 and 17 as the ohmic electrodes is reduced
and the concentration of an electron gas has a sufficient, value.
As a result, it becomes possible to improve the operating
characteristics of the device, while reducing the contact
resistance of each of the ohmic electrodes 16 and 17.
[0095] In the first structural example shown in FIG. 3A, the
cross-sectional configuration of each of the contact areas 14a is
the same as in the first embodiment but each of the source and
drain electrodes 16 and 17 as the ohmic electrodes is formed only
on a part of the inclined portion (bottom surface) of the
corresponding one of the contact areas 14a. The arrangement saves
materials for forming the ohmic electrodes.
[0096] In the second structural example shown in FIG. 3B, each of
the contact areas 14a has a cross section configured as an inverted
isosceles (V-shaped) triangle. The arrangement allows easier
processing of the contact areas 14a than in the case where the
cross section of each of the contact areas 14a is an inverted right
triangle.
[0097] In the third structural example shown in FIG. 3C, each of
the ohmic electrodes 16 and 17 is formed on a part of the bottom
surface of the corresponding one of the contact areas 14a each
having a V-shaped cross-sectional configuration according to the
second structural example.
[0098] In the fourth structural example shown in FIG. 3D, the
inclined portion of each of the contact areas 14a is formed to have
a cross section configured as an inverted right triangle which is
inclined more deeply with approach toward the corresponding one of
the side surfaces of the gate electrode 15 and the ohmic electrodes
16 and 17 are formed to cover the respective bottom and wall
surfaces of the contact areas 14a.
[0099] In the fifth structural example shown in FIG. 3E, each of
the ohmic electrodes 16 and 17 is formed on a part of the bottom
surface of the corresponding one of the contact areas 14a according
to the fourth structural example.
Embodiment 2
[0100] A second embodiment of the present invention will be
described with reference to the drawings.
[0101] FIG. 4 shows a cross-sectional structure of a HFET as a
semiconductor device according to the second embodiment. The
description of the components shown in FIG. 4 which are the same as
those shown in FIG. 1 will be omitted by retaining the same
reference numerals.
[0102] Each of contact areas 14b provided in the second nitride
semiconductor layer 14 according to the second embodiment is formed
with a striped pattern which is projecting and depressed in cross
section with a periodicity of 1 m to 1 .mu.m.
[0103] In the arrangement, each of the contact areas 14b has a
plurality of optimum regions equal in number to the periodicity
where the contact resistance is reduced and the concentration of an
electron gas has a sufficient value so that the contact resistance
of each of the ohmic electrodes 16 and 17 is further reduced.
[0104] Preferably, the second nitride semiconductor layer 14
according to the second embodiment has a thickness of about 2 nm to
1 .mu.m.
[0105] Preferably, the deepest portion of each of the contact areas
14b is positioned at a distance of not less than 1 nm and not more
than 1 .mu.m from the upper surface of the 2DEG layer 13a.
[0106] A description will be given herein below to a method for
fabricating the HFET thus constructed with reference to the
drawings. FIGS. 5A to 5C show the cross-sectional structures of the
HFET according to the second embodiment in the individual process
steps of the fabrication method.
[0107] First, as shown in FIG. 5A, the buffer layer 12 made of
aluminum nitride (AlN) or gallium nitride (GaN), the first nitride
semiconductor layer 13 made of i-type gallium nitride (GaN), and
the second nitride semiconductor layer 14 made of i-type aluminum
gallium nitride (Al.sub.0.26Ga.sub.0.74N) are grown successively on
the substrate 11 made of silicon carbide (SiC) by, e.g., MOCVD. As
a method for depositing each of the nitride semiconductor layers,
MBE may also be used instead of MOCVD.
[0108] Subsequently, a resist film 60 is coated on the second
nitride semiconductor layer 14 and then interference exposure is
performed in a lithographic step, while the regions of the resist
film 60 for forming contact areas are exposed in an under-dose
condition in which a dosage is lower than normally, whereby the
periodic striped pattern which is projecting and depressed in cross
section is formed in the contact area forming regions of the resist
film 60. Thus, the portions of the resist film 60 corresponding to
the spaces of the line-and-space periodic pattern formed therein
are not opened (penetrated).
[0109] Next, dry etching using a chlorine gas is performed with
respect to the second nitride semiconductor layer by using, as a
mask, the resist film 60 formed with the periodic pattern. The
resist film 60 is then removed, whereby the periodic pattern is
transferred onto the contact areas 14b of the second nitride
semiconductor layer 14, as shown in FIG. 5B.
[0110] Next, as shown in FIG. 5C, a first resist pattern (not
shown) having openings for exposing the contact areas 14b is formed
by lithography on the second nitride semiconductor layer 14. On the
first resist pattern formed, an electrode forming film composed of
a multilayer film made of titanium and aluminum is deposited by,
e.g., electron beam vapor deposition. Then, the ohmic source and
drain electrodes 16 and 17 composed of the electrode forming film
are formed on the respective contact areas 14a by a so-called
lift-off process. Subsequently, a second resist pattern (not shown)
having an opening for exposing a region to be formed with a gate
electrode between the source and drain electrodes 16 and 17 is
formed and a gate electrode forming film composed of a multilayer
film made of nickel and gold is deposited by, e.g., electron beam
vapor deposition. By further performing a lift-off process, the
gate electrode 15 is formed from the gate electrode forming film.
It is to be noted that the order in which the source and drain
electrodes 16 and 17 and the gate electrode 15 are formed is also
insignificant herein.
[0111] Preferably, the periodic pattern provided in each of the
contact areas 14b is oriented in a direction in which a current
flows, i.e., in a direction perpendicular to the direction in which
the source and drain electrodes 16 and 17 are opposed to each
other, as shown in FIG. 14.
Variation 1 of Fabrication Method
[0112] A description will be given to a first variation of the
method for forming the periodic pattern in the bottom portion of
each of the contact areas 14b.
[0113] For example, electron beam exposure is performed to exert a
proximity effect on the contact area forming regions of the resist
film 60 and thereby form the periodic striped pattern which is
projecting and depressed in cross section in the contact area
forming regions. Herein, the proximity effect means a phenomenon
that respective unexposed parts of patterns adjacent to each other
are slightly exposed by ion beams implanted to the patterns.
Thereafter, dry etching is performed with respect to the second
nitride semiconductor layer 14 by using the resist film 60 formed
with the periodic pattern as a mask in the same manner as in the
second embodiment.
Variation 2 of Fabrication Method
[0114] As a second variation, the periodic striped pattern which is
projecting and depressed in cross section may also be formed in
each of the contact areas 14b of the second nitride semiconductor
layer 14 by directly irradiating the contact area forming regions
of the second nitride semiconductor layer 14 with a beam of argon
(Ar) ions or the like without using the resist film 60.
Embodiment 3
[0115] A third embodiment of the present invention will be
described with reference to the drawings.
[0116] FIG. 6 shows a cross-sectional structure of a HFET as a
semiconductor device according to the third embodiment. The
description of the components shown in FIG. 6 which are the same as
those shown in FIG. 1 will be omitted by retaining the same
reference numerals.
[0117] In the first nitride semiconductor layer 13 according to the
third embodiment, each of contact areas 13b as regions to be formed
with the source and drain electrodes 16 and 17 as the ohmic
electrodes is configured as a stepped portion composed of an
exposed portion formed by partly lowering the upper surface of the
first nitride semiconductor layer 13 to a level reaching the
2-dimensional electron gas layer 13a and of an end portion of the
second semiconductor layer 14 facing the exposed portion of the
first semiconductor layer. Accordingly, the source and drain
electrodes 16 and 17 are formed to cover the respective stepped
portions.
[0118] According to the third embodiment, the source and drain
electrodes 16 and 17 are allowed to be in direct contact with the
2DEG layer 13a so that not only the contact resistance but also a
channel resistance are reduced, which greatly improves the
operating characteristics of the device.
[0119] Preferably, an n-type dopant composed of silicon or the like
is introduced into each of the end portions of the second nitride
semiconductor layer 14 facing the respective contact areas (stepped
portions) 13b to come in contact with the 2DEG layer 13a. The
arrangement lowers potential barriers between the first and second
nitride semiconductor layers 13 and 14 and the ohmic electrodes 16
and 17 and thereby further reduces the contact resistance of each
of the ohmic electrodes 16 and 17.
[0120] A description will be given herein below to a method for
fabricating the HFET thus constructed with reference to the
drawings. FIGS. 7A to 7C show the cross-sectional structures of the
HFET according to the third embodiment in the individual process
steps of the fabrication method.
[0121] First, as shown in FIG. 7A, the buffer layer 12 made of
aluminum nitride (AlN) or gallium nitride (GaN), the first nitride
semiconductor layer 13 made of i-type gallium nitride (GaN), and
the second nitride semiconductor layer 14 made of i-type aluminum
gallium nitride (Al.sub.0.26Ga.sub.0.74N) are grown successively on
the substrate 11 made of silicon carbide (SiC) by, e.g., MOCVD. As
a method for depositing each of the nitride semiconductor layers,
MBE may also be used instead of MOCVD.
[0122] Next, as shown in FIG. 7B, the respective regions of the
second and first nitride semiconductor layers 14 and 13 to be
formed into the contact areas are etched by lithography and dry
etching using a chlorine gas which are performed by using, as a
mask, a first resist pattern (not shown) having openings
corresponding to the contact area forming regions. The etching
performed herein partly lowers the upper surface of the first
nitride semiconductor layer 13 to a depth of about 10 nm.
[0123] Next, as shown in FIG. 7C, the first resist pattern is
removed and then a second resist pattern (not shown) having
openings for exposing the contact areas 13b is formed by
lithography on the second nitride semiconductor layer 14. On the
second resist pattern formed, an electrode forming film composed of
a multilayer film made of titanium and aluminum is deposited by,
e.g., electron beam vapor deposition. Then, the ohmic source and
drain electrodes 16 and 17 composed of the electrode forming film
are formed on the respective contact areas 13b by a lift-off
process. Subsequently, a third resist pattern (not shown) having an
opening for exposing a region to be formed with a gate electrode
between the source and drain electrodes 16 and 17 is formed and a
gate electrode forming film composed of a multilayer film made of
nickel and gold is deposited by, e.g., electron beam vapor
deposition. By further performing a lift-off process, the gate
electrode 15 is formed from the gate electrode forming film. It is
to be noted that the order in which the source and drain electrodes
16 and 17 and the gate electrode 15 are formed is also
insignificant herein.
Embodiment 4
[0124] A fourth embodiment of the present invention will be
described with reference to the drawings.
[0125] FIG. 8 shows a cross-sectional structure of a HFET as a
semiconductor device according to the fourth embodiment. The
description of the components shown in FIG. 8 which are the same as
those shown in FIG. 1 will be omitted by retaining the same
reference numerals.
[0126] In the fourth embodiment, third nitride semiconductor layers
each made of n-type aluminum gallium nitride
(Al.sub.0.26Ga.sub.0.74N) containing silicon are buried in the
respective regions of the second nitride semiconductor layer 14 to
be formed with the source and drain electrodes 16 and 17 as the
ohmic electrodes which are located under the individual electrodes
16 and 17 and the buried third nitride semiconductor layers form
contact areas 21.
[0127] In addition, doped regions 14c containing a dopant of the
same conductivity type as that of the third nitride semiconductor
layers are formed in the regions of the second nitride
semiconductor layer 14 located in the vicinity of the interfaces
with the contact areas 21.
[0128] According to the fourth embodiment, the potential barrier of
electrons between the second nitride semiconductor layer 14 and
each of the ohmic electrodes 16 and 17 can be lowered by providing
the contact areas 21 composed of the third nitride semiconductor
layers containing, e.g., an n-type dopant. In addition, the doped
regions 14c also lower the potential barrier between the second
nitride semiconductor layer 14 and each of the contact areas 21
(the third nitride semiconductor layers). As a result, it becomes
possible to reduce the contact resistance without reducing the
concentration of the electron gas in the 2DEG layer 13a and thereby
improve the operating characteristics of the device.
[0129] Although the doped regions 14c have been provided in the
regions of the second nitride semiconductor layer 14 in contact
with the contact areas 21, the doped regions 14c need not
necessarily be provided.
[0130] It can also be considered to impart a conductivity to the
second nitride semiconductor layer 14 instead of burying, in the
second nitride semiconductor layer 14, the third nitride
semiconductor layers having the same composition and the same
conductivity type as the second nitride semiconductor layer 14.
However, the second nitride semiconductor layer 14 imparted with a
conductivity can reduce the contact resistance but aggravates
scattering by a dopant, e.g., scattering by a donor if the
conductivity is of n-type so that the RF characteristics of the
transistor are degraded. If the second nitride semiconductor layer
14 is composed of i-type aluminum gallium nitride in the same
manner as in each of the foregoing embodiments, the concentration
of the electron gas in the 2DEG layer 13a is reduced and the
contact resistance is increased disadvantageously. Thus, the second
nitride semiconductor layer 14 has a region where an amount of an
impurity with which it is doped is optimum.
[0131] Accordingly, the fourth embodiment has selectively
introduced the impurity only in the respective contact areas 21
underlying the ohmic electrodes 16 and 17 and thereby achieved a
sufficient reduction in the contact resistance of each of the ohmic
electrodes 16 and 17 without degrading the RF characteristics.
[0132] A description will be given herein below to a method for
fabricating the HFET thus constructed with reference to the
drawings. FIGS. 9A to 9D show the cross-sectional structures of the
HFET according to the fourth embodiment in the individual process
steps of the fabrication method.
[0133] First, as shown in FIG. 9A, the buffer layer 12 made of
aluminum nitride (AlN) or gallium nitride (GaN), the first nitride
semiconductor layer 13 made of i-type gallium nitride (GaN), and
the second nitride semiconductor layer 14 made of i-type aluminum
gallium nitride (Al.sub.0.26Ga.sub.0.74N) are grown successively on
the substrate 11 made of silicon carbide (SiC) by, e.g., MOCVD. As
a method for depositing each of the nitride semiconductor layers,
MBE may also be used instead of MOCVD.
[0134] Next, as shown in FIG. 9B, the contact area forming regions
14d of the second nitride semiconductor layer 14 are etched by
lithography and dry etching using a chlorine gas which are
performed by using, as a mask, a first resist pattern (not shown)
having openings corresponding to the contact area forming regions
14d. It is preferred herein to position the lowermost portion of
each of the contact area forming regions 14d at a distance of not
less than 1 nm from the 2DEG layer 13a.
[0135] Next, as shown in FIG. 9C, ions of, e.g., silicon are
implanted by ion implantation using a first resist pattern not
shown or a second resist pattern (not shown) having the same
pattern as the first resist pattern as a mask to form the n-type
doped regions 14c in the exposed portions of the contact area
forming regions 14d of the second nitride semiconductor layer
14.
[0136] Next, as shown in FIG. 9D, a mask film (hard mask) (not
shown) made of silicon oxide (SiO.sub.2) or the like having
openings corresponding to the contact area forming regions 14d is
formed by CVD and the third nitride semiconductor layers are
regrown, while doping them with silicon having the same
conductivity type as the doped regions 14c by using the formed mask
film, so that the contact areas 21 composed of the third nitride
semiconductor layers are formed.
[0137] Thereafter, a third resist pattern (not shown) having
openings for exposing the contact areas 21 is formed on the second
nitride semiconductor layer 14 by lithography and an electrode
forming film composed of a multilayer film made of titanium and
aluminum is deposited on the formed third resist pattern by, e.g.,
electron beam vapor deposition. Then, the ohmic source and drain
electrodes 16 and 17 each composed of the electrode forming film
are formed on the respective contact areas 21 by a lift-off
process. Subsequently, a fourth resist pattern (not shown) having
an opening for exposing a region to be formed with a gate electrode
between the source and drain electrodes 16 and 17 is formed and a
gate electrode forming film composed of a multilayer film made of
nickel and gold is deposited by, e.g., electron beam vapor
deposition. By further performing a lift-off process, the gate
electrode 15 is formed from the gate electrode forming film. It is
to be noted that the order in which the source and drain electrodes
16 and 17 and the gate electrode 15 are formed is also
insignificant herein.
[0138] It is also possible to provide a sidewall made of, e.g.,
silicon oxide (SiO.sub.2) on the inner wall surface of each of the
contact area forming regions 14d.
Embodiment 5
[0139] A fifth embodiment of the present invention will be
described with reference to the drawings.
[0140] FIG. 10 shows a cross-sectional structure of a HFET as a
semiconductor device according to the fifth embodiment. The
description of the components shown in FIG. 10 which are the same
as those shown in FIG. 1 will be omitted by retaining the same
reference numerals.
[0141] In the fifth embodiment, the respective contact areas 14a
each having a depressed cross-sectional configuration to be formed
with the source and drain electrodes 16 and 17 as the ohmic
electrodes are formed in the second nitride semiconductor layer 14
and the doped regions 14c containing a dopant having an n-type
conductivity are formed in the respective regions of the second
nitride semiconductor layer 14 which are located under the ohmic
electrodes 16 and 17. In addition, sidewalls 22 made of, e.g.,
silicon oxide (SiO.sub.2) are provided on the inner wall surfaces
of the contact areas 14a.
[0142] Preferably, the second nitride semiconductor layer 14 has a
thickness of about 2 nm to 1 .mu.m.
[0143] Preferably, the lowermost portion of each of the contact
areas 14a is positioned at a distance of not less than 1 nm and not
more than 1 .mu.m from the 2DEG layer 13a.
[0144] According to the fifth embodiment, the dopant has been
introduced into the bottom portion of each of the contact areas 14a
of the second nitride semiconductor layer 14 so that the potential
barrier between the second nitride semiconductor layer 14 and each
of the ohmic electrodes 16 and 17 is reduced. In addition, the
sidewalls 22 provided on the respective inner wall surfaces of the
contact areas 14a each defining a depressed cross-sectional
configuration prevent the wall surfaces damaged by etching during
the formation of the contact areas 14a from being exposed and
thereby prevents a leakage current from flowing via a surface level
developed at the wall surfaces by the etching damage.
[0145] As a result, the contact resistance can be reduced by
providing the contact areas 14a each defining a depressed
cross-sectional configuration to bring the ohmic electrodes 16 and
17 provided on the second nitride semiconductor layer 14 closer to
the 2DG layer 13a and the doped regions 14c provided in the
respective bottom portions of the contact areas 14a to reduce the
potential barriers, while the operating characteristics of the
transistor can be improved by providing the sidewalls 22 covering
the wall surfaces damaged by etching.
[0146] A description will be given herein below to a method for
fabricating the HFET thus constructed with reference to the
drawings. FIGS. 11A to 11D show the cross-sectional structures of
the HFET according to the fifth embodiment in the individual
process steps of the fabrication method.
[0147] First, as shown in FIG. 1A, the buffer layer 12 made of
aluminum nitride (AlN) or gallium nitride (GaN), the first nitride
semiconductor layer 13 made of i-type gallium nitride (GaN), and
the second nitride semiconductor layer 14 made of i-type aluminum
gallium nitride (Al.sub.0.26Ga.sub.0.74N) are grown successively on
the substrate 11 made of silicon carbide (SiC) by, e.g., MOCVD. As
a method for depositing each of the nitride semiconductor layers,
MBE may also be used instead of MOCVD.
[0148] Next, as shown in FIG. 11B, the contact area forming regions
of the second nitride semiconductor layer 14 are etched by
lithography and dry etching using a chlorine gas which are
performed by using, as a mask, a first resist pattern (not shown)
having openings corresponding to the contact area forming regions
so that the contact areas 14a each defining a depressed
cross-sectional configuration are formed. It is preferred herein to
position the lowermost portion of each of the contact areas 14a at
a distance of not less than 1 nm from the 2DEG layer 13a.
[0149] Subsequently, the first resist pattern is removed and an
insulating film made of silicon oxide is formed on the second
nitride semiconductor layer 14 to cover the entire surface thereof
including the contact areas 14a. The insulating film formed is
etched back to form the sidewalls 22 each composed of the
insulating film on the respective inner wall surfaces of the
contact areas 14a.
[0150] Next, as shown in FIG. 11C, ions of, e.g., silicon are
implanted by ion implantation using a second resist pattern (not
shown) having openings for exposing the respective contact areas
14a so that the n-type doped regions 14c are formed in the contact
areas 14a of the second nitride semiconductor layer 14.
[0151] Next, as shown in FIG. 11D, the second resist pattern is
removed and then a third resist pattern (not shown) having openings
for exposing the contact areas 14a is formed on the second nitride
semiconductor layer 14. On the third resist pattern formed, an
electrode forming film composed of a multilayer film made of
titanium and aluminum is deposited by, e.g., electron beam vapor
deposition. Then, the ohmic source and drain electrodes 16 and 17
composed of the electrode forming film are formed on the respective
contact areas 14a by a lift-off process. Subsequently, a fourth
resist pattern (not shown) having an opening for exposing a region
to be formed with a gate electrode between the source and drain
electrodes 16 and 17 is formed and a gate electrode forming film
made of nickel and gold is deposited by, e.g., electron beam vapor
deposition. By further performing a lift-off process, the gate
electrode 15 is formed from the gate electrode forming film. It is
to be noted that the second resist pattern may also be used as a
substitute for the third resist pattern and the order in which the
source and drain electrodes 16 and 17 and the gate electrode 15 are
formed is insignificant.
Embodiment 6
[0152] A sixth embodiment of the present invention will be
described with reference to the drawings.
[0153] FIG. 12A shows a cross-sectional structure of a HFET as a
semiconductor device according to the sixth embodiment. The
description of the components shown in FIG. 12A which are the same
as those shown in FIG. 1 will be omitted by retaining the same
reference numerals.
[0154] As shown in FIG. 12A, the HEFT according to the sixth
embodiment has a third nitride semiconductor layer 23 made of
n-type gallium nitride (GaN) with a thickness of, e.g., about 50 nm
which is formed, as a cap layer for forming an ohmic electrode, on
the second nitride semiconductor layer 14 made of aluminum gallium
nitride (Al.sub.0.26Ga.sub.0.74N) for generating the 2DEG layer 13a
serving as a channel layer in the upper portion of the first
nitride semiconductor layer 13. The third nitride semiconductor
layer 23 contains silicon (Si) as an n-type dopant at a
concentration of about 1.times.10.sup.19 cm.sup.-3.
[0155] A Schottky gate electrode 15 composed of a multilayer film
made of, e.g., nickel (Ni) and gold (Au) is formed selectively on
the third nitride semiconductor layer 23. The regions of the third
nitride semiconductor layer 23 located on both sides of the gate
electrode 15 have been formed into contact areas 23a each having an
inclined portion with a bottom surface (upper surface) thereof
being inclined outwardly toward the upper surface of the second
nitride semiconductor layer 14 and defining a depressed
cross-sectional configuration. On the respective contact areas 23a,
ohmic source and drain electrodes 16 and 17 each composed of a
multilayer film made of, e.g., titanium (Ti) and aluminum (Al) are
formed to cover the respective bottom and wall surfaces of the
contact areas 23a.
[0156] According to the sixth embodiment, the third nitride
semiconductor layer 23 serving as the cap layer does not contain
aluminum (Al) in the composition thereof, similarly to the first
nitride semiconductor layer 13, so that the band gap energy thereof
is smaller than that of the second nitride semiconductor layer 14
containing aluminum. Accordingly, the potential barrier between the
third nitride semiconductor layer 23 and each of the ohmic
electrodes 16 and 17 is reduced. In addition, the third nitride
semiconductor layer 23 is provided with the contact areas 23a each
defining a depressed cross-sectional configuration so that a series
resistance down to the first nitride semiconductor layer 13 is
reduced.
[0157] Since each of the contact areas 23a is formed to have a
cross-sectional configuration which becomes deeper with distance
from the gate electrode 15, wall surfaces substantially
perpendicular to the substrate surface are on opposite sides of the
gate electrode 15 so that a leakage current flowing via a surface
level developed at the wall surfaces is suppressed. As a result, it
becomes possible to improve the operating characteristics of the
device, while reducing the contact resistance of each of the ohmic
source and drain electrodes 16 and 17.
Variation 1 of Embodiment 6
[0158] FIG. 12B shows a cross-sectional structure of a HFET
according to a first variation of the sixth embodiment. As shown in
FIG. 12B, in the HFET according to the first variation, the
inclined portion of each of the contact areas 23a defining a
depressed cross-sectional configuration extends through the third
nitride semiconductor layer 23 to have the bottom corner thereof
reaching the lower portion of the second nitride semiconductor
layer 14.
[0159] Preferably, the lowermost portion of each of the contact
areas 23a is positioned at a distance of not less than 1 nm and not
more than 1 .mu.m from the 2DEG layer 13a.
[0160] In the arrangement, each of the contact areas 23a having the
inclined bottom portions has at least one optimum region where the
contact resistance is reduced and the concentration of the electron
gas in the 2DEG layer 13a has a sufficient value, in the same
manner as in the first embodiment. As a result, it becomes possible
to further improve the operating characteristics of the device with
the 2DEG layer 13a having a sufficient electron gas concentration,
while reducing the contact resistance of each of the ohmic source
and drain electrodes 16 and 17.
Variation 2 of Embodiment 6
[0161] FIG. 12C shows a cross-sectional structure of a HFET
according to a second variation of the sixth embodiment. As shown
in FIG. 12C, in the HEFT according to the second variation, the
respective inclined portions of the contact areas 23a each defining
a depressed cross-sectional configuration are entirely provided in
the second nitride semiconductor layer 23 under the third nitride
semiconductor layer 23.
[0162] It is also preferred herein that the lowermost portion of
each of the contact areas 23a is positioned at a distance of not
less than 1 nm and not more than 1 .mu.m from the 2DEG layer
13a.
[0163] The arrangement further reduces the contact resistance than
in the first variation and provides at least one optimum region
where the concentration of the electron gas in the 2DEG layer 13a
has a sufficient value. As a result, it becomes possible to further
improve the operating characteristics of the device with the 2DEG
layer 13a having a sufficient electron gas concentration, while
further reducing the contact resistance of each of the ohmic source
and drain electrodes 16 and 17.
[0164] Although silicon carbide (SiC) has been used for the
substrate 11 in each of the first to sixth embodiments, it is also
possible to use sapphire (monocrystalline Al.sub.2O.sub.3), silicon
(Si), or gallium arsenide (GaAs) instead.
[0165] For the buffer layer 12, a multilayer structure made of
aluminum nitride and gallium nitride may also be used.
[0166] In the composition of aluminum gallium nitride
(A.sub.xlGa.sub.1-xN) composing the second nitride semiconductor
layer 14, x representing an Al composition ratio is not limited to
0.26 provided that it satisfies 0.1.ltoreq.x.ltoreq.0.5.
[0167] The composition of the second nitride semiconductor layer 14
is sufficient provided that the band gap energy thereof is larger
than that of the first nitride semiconductor layer 13. If the first
nitride semiconductor layer 13 is composed of, e.g., indium gallium
nitride (InGaN) instead of gallium nitride (GaN), x representing
the Al composition ratio may also be set to 0. If the first nitride
semiconductor layer 13 is composed of aluminum gallium nitride
(Al.sub.yGa.sub.1-yN), on the other hand, it is necessary to adjust
y representing the Al composition ratio in the first nitride
semiconductor layer 13 to be smaller than x representing the Al
composition ratio in the second nitride semiconductor layer 14.
[0168] The material of the first nitride semiconductor layer 13 is
not limited to i-type. It is also possible to use an n-type
material to compose the first nitride semiconductor layer 13a
having a single-layer or multilayer structure such that the carrier
concentration therein has a specified distribution, e.g., a
distribution in which the carrier concentration increases
upwardly.
[0169] As the material of each of the electrodes 16 and 17, there
can be used one metal selected from the group consisting of
titanium (Ti: with a work function of 4.33 eV), strontium (Sr),
aluminum (Al: with a work function of 4.28 eV), niobium (Nb: with a
work function of 4.30 eV), vanadium (V: with a work function of
4.30 eV), zirconium (Zr: with a work function of 4.05 eV), hafnium
(Hf: with a work function of 3.90 eV), chromium (Cr: with a work
function of 4.50 eV), tungsten (W: with a work function of 4.55
eV), molybdenum (Mo: with a work function of 4.60 eV), rhodium
(Ph), rhenium (Re), cobalt (Co: with a work function of 5.00 eV),
and lanthanum (La), a multilayer film made of at least two metals
selected from the group, an alloy containing at least two metals
selected from the group, or a conductive compound containing at
least one metal selected from the group and oxygen (O), nitrogen
(N), or boron (B).
Embodiment 7
[0170] A seventh embodiment of the present invention will be
described with reference to the drawings.
[0171] FIG. 13 shows a semiconductor laser device as a
semiconductor device according to the seventh embodiment. As shown
in FIG. 13, the semiconductor laser device according to the seventh
embodiment is composed of a buffer layer 32 made of n-type gallium
nitride (GaN) with a thickness of 2 .mu.m; an n-type clad layer 33
made of n-type aluminum gallium nitride (Al.sub.0.15Ga.sub.0.085N)
with a thickness of 1 .mu.m; an active layer 34 made of indium
gallium nitride (In.sub.0.1Ga.sub.0.9N) with a thickness of 3 nm; a
p-type clad layer 35 made of p-type aluminum gallium nitride
(Al.sub.0.15Ga.sub.0.85N) and having a ridge portion with a
thickness of 1.2 .mu.m; a p-type contact layer 36 made of p-type
gallium nitride (GaN) with a thickness of 50 nm and having a
depressed portion formed in the upper portion thereof; and a p-side
ohmic electrode 37 composed of a multilayer structure made of,
e.g., nickel (Ni), platinum (Pt), and gold (Au) and buried in the
depressed portion of the p-type contact layer 36 which are formed
successively on a substrate 31 made of, e.g., n-type gallium
nitride (GaN) and also of: an n-type ohmic electrode 38 composed of
a multilayer structure made of, e.g., titanium (Ti) and aluminum
(Al) and formed on the surface of the substrate 31 opposite to the
buffer layer 32.
[0172] Preferably, the active layer 34 has a multiple quantum well
structure including 2 to 10 pairs of barrier layers made of gallium
nitride and well layers made of indium gallium nitride.
[0173] As has been well known, holes injected from the p-side ohmic
electrode 37 and electrons injected from the n-side ohmic electrode
38 recombine in the active layer 34 to generate light. The light
resulting from the recombination is confined to resonate in the
n-type clad layer 33 and the p-type clad layer 35, each of which is
larger in band gap energy and refractive index than the active
layer 34, and is outputted as a laser beam having a wavelength of
about 400 nm from one end face of the active layer 34.
[0174] The seventh embodiment is characterized in that the p-side
ohmic electrode 37 formed on the p-type contact layer 36 made of
p-type gallium nitride is formed in the depressed portion formed in
the upper portion of the p-type contact layer 36. The depressed
portion has been formed to have a depth at a distance of about 1 nm
from the peak position of the impurity concentration, i.e., an
acceptor concentration, which is located therebelow.
[0175] Specifically, the thickness of the p-type contact layer 36
is about 50 nm as shown in FIG. 13B and a specified concentration
distribution is observed even when the p-type contact layer 36 is
uniformly doped with magnesium as a p-type impurity by MOCVD or the
like.
[0176] In view of this, the present embodiment has removed the
surface portion of the p-type contact layer 36 after growth to
provide a spacing of about 1 nm between the bottom surface of the
resulting depressed portion and the peak position of the acceptor
concentration located therebelow by an etching or ion beam process
prior to the formation of the p-side ohmic electrode 37, as shown
in FIG. 13C. The distance between the bottom surface of the
depressed portion and the peak position located therebelow may be
adjusted appropriately to a value not less than about 1 nm and not
more than 100 nm. The arrangement ensures a reduction in the
contact resistance of the p-side ohmic electrode 37.
[0177] As the configuration of the p-type contact layer 36 with the
depressed portion according to the seventh embodiment, the
configuration of the contact area according to any of the first to
fifth embodiments of the present invention may also be used.
Embodiment 8
[0178] An eighth embodiment of the present invention will be
described with reference to the drawings.
[0179] FIG. 14 shows a HBT as a semiconductor device according to
the eighth embodiment. As shown in FIG. 14, the HBT according to
the eighth embodiment is composed of: a first buffer layer 42 made
of aluminum nitride (AlN) with a thickness of about 20 nm; a second
buffer layer 43 made of gallium nitride with a thickness of about
15 nm; a sub-collector layer 44 made of n-type gallium nitride
(GaN) with a thickness of about 500 nm; a collector layer 45 made
of n-type aluminum gallium nitride (Al.sub.0.1Ga.sub.0.9N) with a
thickness of about 500 nm; a base layer 46 made of p-type gallium
nitride (GaN) with a thickness of about 70 nm; and an emitter layer
47 made of n-type aluminum gallium nitride
(Al.sub.0.25Ga.sub.0.75N) with a thickness of about 30 nm which are
formed successively on a substrate 41 made of, e.g., sapphire.
[0180] An ohmic emitter electrode 48 composed of a multilayer
structure made of, e.g., nickel (Ni), platinum (Pt), and gold (Au)
is formed on the emitter layer 47. An ohmic base electrode 49
composed of a multilayer structure made of, e.g., titanium (Ti) and
aluminum (Al) is formed on the partly exposed portion of the base
layer 46. An ohmic collector electrode 50 composed of a multilayer
structure made of, e.g., titanium (Ti) and aluminum (Al) is formed
on the partly exposed portion of the sub-collector layer 44.
[0181] The eighth embodiment is characterized in that the base
layer 46 made of p-type gallium nitride has a contact area 46a
formed by partly removing an upper portion of the base layer 46 to
reach a level substantially coincident with the peak position of
the p-type impurity concentration in the base layer 46, i.e., the
acceptor concentration and the base electrode 49 is formed on the
depressed contact area 46a.
[0182] As shown in FIG. 14B, a specified concentration distribution
is observed in the p-type base layer 46 after crystal growth even
when the base layer 46 is uniformly doped with magnesium as a
p-type impurity by MOCVD or the like.
[0183] In view of this, the present embodiment has removed the
entire surface of the exposed based layer 46 or at least one part
thereof before forming the base electrode 49 such that the level of
the bottom surface of the resulting depressed portion is coincident
with the peak position of the acceptor concentration, as shown in
FIG. 14C. The arrangement ensures a reduction in the contact
resistance of the base electrode 49.
[0184] Referring to the drawings, a description will be given to a
method for fabricating the HBT thus constructed. FIGS. 15A to 15D
show the cross-sectional structures of the HBT according to the
eighth embodiment in the individual process steps of the
fabrication method.
[0185] First, as shown in FIG. 15A, the first buffer layer 42 made
of aluminum nitride (AlN) with a thickness of about 20 nm and the
second buffer layer 43 made of gallium nitride (GaN) with a
thickness of about 15 nm are formed by, e.g., MBE on the substrate
41 made of sapphire. Then, the sub-collector layer 44 made of
n-type gallium nitride (GaN) with a thickness of about 500 nm and
doped with silicon (Si) at a relatively high concentration of
1.times.10.sup.19 cm.sup.-3 and the collector layer 45 made of
n-type aluminum gallium nitride (Al.sub.0.1Ga.sub.0.9) with a
thickness of about 500 nm and doped with silicon (Si) at a
concentration of 2.times.10.sup.17 cm.sup.-3 are formed
successively on the nitrogen surface of the second buffer layer 43.
Subsequently, the base layer 46 made of p-type gallium nitride
(GaN) with a thickness of about 70 nm and doped with magnesium (Mg)
at a relatively high concentration of 4.times.10.sup.19 cm.sup.-3
is formed on the collector layer 45. Thereafter, the emitter layer
47 made of n-type aluminum gallium nitride
(Al.sub.0.25Ga.sub.0.75N) with a thickness of about 30 nm and doped
with silicon (Si) at a concentration of 5.times.10.sup.17 cm.sup.-3
is formed on the base layer 46.
[0186] Next, as shown in FIG. 15B, a first mask pattern (not shown)
made of silicon oxide for masking the emitter formation region is
formed on the emitter layer 47 and dry etching is performed by
using a chlorine gas and the first mask pattern formed, thereby
forming an emitter mesa and exposing the underlying base layer
46.
[0187] Next, as shown in FIG. 15C, the first mask pattern is
removed and then a second mask pattern (not shown) made of silicon
oxide for masking the emitter layer 47 and the base formation
region of the exposed base layer 46 is formed. Dry etching is
performed with respect to the base layer 46 and the collector layer
45 by using a chlorine gas the second mask pattern formed, thereby
forming a base mesa and a collector mesa and exposing the
sub-collector layer 44.
[0188] Subsequently, the entire surface of the exposed base layer
46 or at least one part thereof is removed by an etching or ion
beam process so that the contact area 46a having the bottom portion
thereof at a level substantially coincident with the peak position
of the acceptor concentration is formed. The contact area 46a may
also be formed before the sub-collector layer 44 is exposed.
[0189] Next, as shown in FIG. 15D, the second mask pattern is
removed. Then, the emitter electrode 48 is formed on the emitter
layer 47, the base electrode 49 is formed on the contact area 46a
of the base layer 46, and the collector electrode 50 is formed on
the sub-collector layer 44, each by, e.g., electron beam vapor
deposition. It is to be noted that the order in which the
individual electrodes 48, 49, and 50 are formed is
insignificant.
[0190] In the arrangement, an electric field is generated in the
base layer 46 from the collector layer 45 toward the emitter layer
47 so that the transit time of carriers is reduced and the RF
characteristics are improved.
[0191] In addition, the electric field generated in the base layer
46 accumulates holes in the vicinity of the base electrode 49 so
that the base resistance is reduced.
[0192] The contact area 46a provided in the base layer 46 according
to the eight embodiment may also be applied to a bipolar transistor
not having a heterojunction.
[0193] It is also possible to apply the configuration of the
contact area according to any of the first to fifth embodiments of
the present invention to the cross-sectional configuration of the
contact area 46a provided in the base layer 46 according to the
eighth embodiment.
[0194] Thus, the semiconductor device according to the present
invention and the fabrication method therefor have the effects of
reducing the contact resistance of an ohmic electrode provided on a
group III-V nitride semiconductor and implementing a higher-speed
and higher-output semiconductor device using the nitride
semiconductor. Hence, the present invention is applied usefully to
a semiconductor device having an ohmic electrode formed on a
nitride semiconductor layer or the like.
* * * * *