U.S. patent application number 11/401835 was filed with the patent office on 2007-07-26 for wafer-transferring pod capable of monitoring processing environment.
This patent application is currently assigned to PROMOS TECHNOLOGIES INC.. Invention is credited to Ya Ling Po, Ting Sing Wang.
Application Number | 20070170090 11/401835 |
Document ID | / |
Family ID | 38284474 |
Filed Date | 2007-07-26 |
United States Patent
Application |
20070170090 |
Kind Code |
A1 |
Po; Ya Ling ; et
al. |
July 26, 2007 |
Wafer-transferring pod capable of monitoring processing
environment
Abstract
A wafer-transferring pod capable of monitoring process
environment comprises a body and a sampling mechanism positioned on
a top surface, a back surface or one of two side surfaces of the
body for adsorbing contamination. The sampling mechanism comprises
an inner chamber filled with adsorbent such as glass wool and a
plurality of openings positioned on sidewalls of the inner chamber.
In addition, the sampling mechanism may comprise a movable door and
an opening for a user to absorb the air from the body without
opening a front cover of the wafer-transferring pod. Further, the
sampling mechanism may comprise an inner member positioned on the
body and an outer member buckled into the inner member, wherein the
inner member and the outer member have an opening through which the
user can absorb the air in the body without opening the front cover
of the wafer-transferring pod.
Inventors: |
Po; Ya Ling; (Hsinchu,
TW) ; Wang; Ting Sing; (Hsinchu, TW) |
Correspondence
Address: |
OLIFF & BERRIDGE, PLC
P.O. BOX 19928
ALEXANDRIA
VA
22320
US
|
Assignee: |
PROMOS TECHNOLOGIES INC.
HSINCHU
TW
|
Family ID: |
38284474 |
Appl. No.: |
11/401835 |
Filed: |
April 12, 2006 |
Current U.S.
Class: |
206/711 ;
206/205; 220/745 |
Current CPC
Class: |
H01L 21/67393 20130101;
H01L 21/67017 20130101 |
Class at
Publication: |
206/711 ;
220/745; 206/205 |
International
Class: |
B65D 85/00 20060101
B65D085/00; B65D 81/24 20060101 B65D081/24; B65D 90/22 20060101
B65D090/22 |
Foreign Application Data
Date |
Code |
Application Number |
Jan 25, 2006 |
TW |
095102791 |
Claims
1. A wafer-transferring pod, comprising: a body configured to
receive a plurality of wafers; and a sampling mechanism positioned
on the body for adsorbing contaminations from an interior of the
body.
2. The wafer-transferring pod of claim 1, wherein the body has a
back surface, and the sampling mechanism is positioned on the back
surface.
3. The wafer-transferring pod of claim 1, wherein the body has two
side surfaces, and the sampling mechanism is positioned on one of
the two side surfaces.
4. The wafer-transferring pod of claim 1, wherein the body has a
top surface, and the sampling mechanism is positioned on the top
surface.
5. The wafer-transferring pod of claim 1, wherein the sampling
mechanism includes a chamber having adsorbents therein.
6. The wafer-transferring pod of claim 5, wherein the adsorbents
include glass wool.
7. The wafer-transferring pod of claim 5, wherein the chamber
includes a plurality of openings, and the interior of the body
communicates with that of the chamber via the openings.
8. A wafer-transferring pod, comprising: a body configured to
receive a plurality of wafers; and a sampling mechanism positioned
on the body for a user to adsorb air from an interior of the
body.
9. The wafer-transferring pod of claim 8, wherein the body has a
back surface, and the sampling mechanism is positioned on the back
surface.
10. The wafer-transferring pod of claim 8, wherein the body has two
side surfaces, and the sampling mechanism is positioned on one of
the two side surfaces.
11. The wafer-transferring pod of claim 8, wherein the body has a
top surface, and the sampling mechanism is positioned on the top
surface.
12. The wafer-transferring pod of claim 8, wherein the sampling
mechanism includes a movable door.
13. The wafer-transferring pod of claim 12, wherein the movable
door is made of polyetherimide.
14. The wafer-transferring pod of claim 8, wherein the sampling
mechanism is an opening.
15. The wafer-transferring pod of claim 8, wherein the sampling
mechanism includes: an inner member positioned on the body; and an
outer member configured to engage with the inner member; wherein
the inner member and the outer member have an opening through which
the user can absorb the air from the body.
16. The wafer-transferring pod of claim 15, wherein the sampling
mechanism further includes adsorbent sheet positioned between the
inner member and the outer member.
17. The wafer-transferring pod of claim 16, wherein the adsorbent
sheet is made of glass wool.
18. The wafer-transferring pod of claim 15, wherein the sampling
mechanism further includes a plug for sealing up the opening.
Description
BACKGROUND OF THE INVENTION
[0001] (A) Field of the Invention
[0002] The present invention relates to a wafer-transferring pod
capable of monitoring the processing environment, and more
particularly, to a wafer-transferring pod capable of monitoring the
processing environment as a wafer is experiencing the
processing.
[0003] (B) Description of the Related Art
[0004] The fabrication of an integrated circuit device on a wafer
needs a plurality of processing apparatuses having a reaction
chamber, and the wafer is transferred between these processing
apparatuses by a wafer-transferring system. Presently, integrated
circuit manufacturing companies locate the wafer in a
wafer-transferring pod, and use a robot to move the wafer from the
pod to the reaction chamber where the reaction process actually
occurs. Consequently, it only needs to control the grade of clarity
in a smaller internal space of the pod, rather than a larger space
of the entire clean room, which can dramatically lower the cost on
controlling the grade of clarity. The internal space of the pod
possesses a higher grade of clarity; however, opening or closing
the pod on transferring the wafer between the pod and the
processing apparatus is likely to introduce some contaminations
from the clean room having a lower grade of clarity into the pod
having a higher grade of clarity and the reaction chamber of the
processing apparatus, which is one of the pollution sources of the
reaction chamber and the wafer in the pod.
[0005] To analyze the pollution source, the prior art uses a
sampling accessory capable of sucking air from some dubious areas
such as the reaction chamber of the processing apparatus, the
internal space of the pod or a transferring interface between the
processing apparatus and the pod. An adsorbent in the sampling
accessory is then used in some chemical analysis procedures to
characterize the composition of the sampled air so as to infer the
pollution source based on the outcome of the chemical analysis.
Particularly, the prior art needs to open a front cover of the pod
before using the sampling accessory to suck air from the internal
space of the pod, but opening the front cover of the pod itself
generates some contaminations. In addition, using the sampling
accessory to suck air in the open pod also pollutes the internal
space of the pod. Consequently, there are several pollution
sources, and it is quite difficult to discover the actual one.
[0006] Further, what the prior art does is a post-sampling, i.e.,
the prior art performs the sampling from the processing environment
after the pollution occurs, and then infers reversely the
generation mechanism of the pollution based on the result of the
chemical analysis. Since the environment in which post-sampling is
performed may be different from that in which the pollution
actually occurs, the prior art analysis technique itself possesses
a certain inaccuracy.
SUMMARY OF THE INVENTION
[0007] The primary objective of the present invention is to provide
a wafer-transferring pod, which is capable of monitoring the
process environment as a wafer is experiencing the fabrication
process and preventing the wafer from being polluted by inserting a
sampling accessory into the wafer-transferring pod or by opening
the wafer-transferring pod.
[0008] In order to achieve the above-mentioned objective and avoid
the problems of the prior art, one embodiment of the present
invention discloses a wafer-transferring pod that comprises a body
capable of receiving a plurality of wafers and a sampling mechanism
positioned on the body. The sampling mechanism can be positioned on
a top surface, a back surface or one of two side surfaces of the
body for adsorbing contaminations. One embodiment of the sampling
mechanism comprises an inner chamber filled with adsorbent such as
glass wool and a plurality of openings positioned on the sidewalls
of the inner chamber. In another embodiment, the sampling mechanism
may comprise a movable door and an opening positioned on the body
for a user to absorb air from the body via the opening without
opening a front cover of the wafer-transferring pod. In a further
embodiment, the sampling mechanism may comprise an inner member
positioned on the body and a outer member buckled into the inner
member, wherein the inner member and the outer member have an
opening through which the user can absorb the air from the body
without opening the front cover of the wafer-transferring pod.
[0009] To do sampling, the prior art needs to perform actions such
as opening the front cover of the wafer-transferring pod or
inserting the sampling accessory into the wafer-transferring pod;
however, these actions generate contaminations to cause pollution.
On the contrary, the present invention disposes a sampling
mechanism on the wafer-transferring pod, and the sampling of air in
the wafer-transferring pod is performed via the sampling mechanism
without inserting a sampling accessory into the wafer-transferring
pod or opening the front cover of the wafer-transferring pod.
Consequently, the present invention can prevent the wafer in the
wafer-transferring pod from being polluted by inserting a sampling
accessory into the wafer-transferring pod or opening the front
cover of the wafer-transferring pod. In addition, the present
invention allows the performing of the sampling during the
fabrication process, i.e., achieves an on-line sampling instead of
the post-sampling.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] The objectives and advantages of the present invention will
become apparent upon reading the following description and upon
reference to the accompanying drawings in which:
[0011] FIG. 1 illustrates a wafer-transferring pod according to one
embodiment of the present invention;
[0012] FIG. 2 illustrates a wafer-transferring pod according to
another embodiment of the present invention; and
[0013] FIG. 3 and FIG. 4 illustrate a wafer-transferring pod
according to another embodiment of the present invention.
DETAILED DESCRIPTION OF THE INVENTION
[0014] FIG. 1 illustrates a wafer-transferring pod 10 according to
one embodiment of the present invention. The wafer-transferring pod
10 comprises a body 20 capable of receiving a plurality of wafers
12 and a sampling mechanism 30 positioned on the body 20. The
sampling mechanism 30 can be positioned on a back surface 24, a
bottom surface 26, a top surface 28 or one of two side surfaces
32A, 32B of the body 20 for adsorbing contaminations, and the wafer
12 is transferred into and out of the wafer-transferring pod 10
through an opening sealed up by a front cover 22. The sampling
mechanism 30 comprises an inner chamber 42 positioned below the top
surface 28, an adsorbent 44 such as glass wool in the inner chamber
42 and a top cover 48. There are several openings 46 positioned on
the sidewalls of the inner chamber 42, and pollutions in air can be
adsorbed by the adsorbent 44 in the inner chamber 42 as air flows
though the sampling mechanism 30 via these opening 46.
[0015] When the wafer 12 in the wafer-transferring pod 10 is
transferred into a reaction chamber to experience a semiconductor
fabrication process such as the deposition process, the etching
process or the lithographic process, the adsorbent 44 can adsorb
contaminations from air in the interior of the wafer-transferring
pod 10 as the wafer 12 is transferred from the reaction chamber
back to the wafer-transferring pod 10, i.e., sampling in an on-line
manner. Particularly, the contaminations in the wafer-transferring
pod 10 are discharged from the wafer 12 into air in the interior of
the wafer-transferring pod 10 as the wafer 12 is transferred back
to the wafer-transferring pod 10 after the fabrication process is
completed in the reaction chamber. Subsequently, one can open the
top cover 48 of the sampling mechanism 40 and take out the
adsorbent 44 from the inner chamber 42 to identify the
contamination by a certain chemical analysis technique.
[0016] FIG. 2 illustrates a wafer-transferring pod 60 having a
sampling mechanism 30' according to another embodiment of the
present invention. The sampling mechanism 30' of the
wafer-transferring pod 60 comprises a guiding frame 62 positioned
on the back surface 24, a movable door 64 and an opening 66.
Preferably, the guiding frame 62 and the movable door 64 are made
of polyetherimide to avoid the generation of the contamination on
opening or closing the movable door 64. Pulling up the movable door
64 exposes the opening 66 on the back surface 24, and the size of
the opening 66 is substantially the same as that of a sampling head
56 of a sampling accessory 54. During the fabrication process, the
movable door 64 is pulled down to shadow the opening 66 so as to
prevent communication of air between the exterior and the interior
of the wafer-transferring pod 10 via the opening 66. To do
sampling, the movable door 64 is pulled up and the sampling head 56
engages with the opening 66 to suck air from the interior of the
wafer-transferring pod 10.
[0017] FIG. 3 and FIG. 4 illustrate a wafer-transferring pod 80
according to another embodiment of the present invention. The
wafer-transferring pod 80 comprises a sampling mechanism 70
including an inner member 72 positioned on the top surface 28 of
the body 20 and an outer member 74 buckled into the inner member
72, wherein the inner member 72 have an opening 73 and the outer
member 74 have an opening 75 communicating the interior of the
wafer-transferring pod 10 with the external environment. During the
fabrication process, a plug 78 is used to seal up the opening 75.
To do sampling, the plug 78 is removed and the sampling head 56
engages with the opening 75 to suck air from the interior of the
wafer-transferring pod 10 without opening the front cover 22 of the
wafer-transferring pod 10. Preferably, the sample mechanism 70 may
further comprise an adsorbent sheet 76 made of glass wool
positioned between the inner member 72 and the outer member 74 to
adsorb contaminations from the interior of the wafer-transferring
pod 10.
[0018] To do sampling, the prior art needs to perform actions such
as opening the front cover of the wafer-transferring pod or
inserting the sampling accessory into the wafer-transferring pod;
however, these actions generate contaminations to cause pollution.
On the contrary, the present invention disposes a sampling
mechanism on the wafer-transferring pod, and the sampling of air in
the wafer-transferring pod is performed via the sampling mechanism
without inserting a sampling accessory into the wafer-transferring
pod or opening the front cover of the wafer-transferring pod.
Consequently, the present invention can prevent the wafer in the
wafer-transferring pod from being polluted by inserting a sampling
accessory into the wafer-transferring pod or opening the front
cover of the wafer-transferring pod. In addition, the present
invention allows the performing of the sampling during the
fabrication process, i.e., achieves an on-line sampling instead of
the post-sampling.
[0019] The above-described embodiments of the present invention are
intended to be illustrative only. Numerous alternative embodiments
may be devised by those skilled in the art without departing from
the scope of the following claims.
* * * * *